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WO2005115956A1 - Process for producing high-purity terephthalic acid - Google Patents

Process for producing high-purity terephthalic acid Download PDF

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Publication number
WO2005115956A1
WO2005115956A1 PCT/JP2005/009461 JP2005009461W WO2005115956A1 WO 2005115956 A1 WO2005115956 A1 WO 2005115956A1 JP 2005009461 W JP2005009461 W JP 2005009461W WO 2005115956 A1 WO2005115956 A1 WO 2005115956A1
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Prior art keywords
terephthalic acid
pressure
mother liquor
cooling
solid
Prior art date
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PCT/JP2005/009461
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French (fr)
Japanese (ja)
Inventor
Katsuhiko Fukui
Motoki Numata
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Priority to CN2005800174093A priority Critical patent/CN1960960B/en
Publication of WO2005115956A1 publication Critical patent/WO2005115956A1/en
Anticipated expiration legal-status Critical
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42Separation; Purification; Stabilisation; Use of additives
    • C07C51/43Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation

Definitions

  • the present invention relates to a method for producing high-purity terephthalic acid.
  • the process is as follows.
  • the raw material para-xylene is air-oxidized to terephthalic acid with a catalyst in a high-temperature, high-pressure acetic acid solvent.
  • an intermediate 4 carboxybenzaldehyde is by-produced together with terephthalic acid.
  • the slurry containing these is crystallized and separated into solid and liquid to obtain crude terephthalic acid crystals.
  • the crude terephthalic acid crystals are dissolved in water under high-temperature and high-pressure conditions to form an aqueous solution, and 4-carboxybenzaldehyde contained in the crude terephthalic acid is hydrogen reduced to paratoluic acid having high water solubility.
  • the mixture is depressurized and cooled, and terephthalic acid with low water solubility is crystallized from the aqueous solution and recovered as high-purity terephthalic acid.
  • Patent Document 2 JP-A-5-58948
  • the present invention increases the recovery rate of the secondary crystals precipitated by cooling the primary separation mother liquor and increases the secondary separation mother liquor having a low turbidity (SS concentration). It is an object of the present invention to provide a method for producing high-purity terephthalic acid, which can obtain terephthalic acid. Another object of the present invention is to provide a method for producing high-purity terephthalic acid that can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment.
  • the present inventors have conducted intensive studies to solve the above problems, and as a result, found that the above problems can be solved by depressurizing and cooling the primary separated mother liquor in multiple stages and crystallizing it, and completed the present invention.
  • the gist of the present invention resides in the following (1) to (11).
  • a dissolving step of dissolving the above crude terephthalic acid in an aqueous solvent under high temperature and pressure to obtain a crude terephthalic acid aqueous solution (b)
  • Cooling is performed by using a plurality of cooling tanks for cooling by evaporating the water solvent in the mother liquor by lowering the pressure, the last of which is reduced to below atmospheric pressure, and the temperature of the last cooling tank is reduced to 40 to A method for producing high-purity terephthalic acid at 70 ° C.
  • At least one of the cooling tanks used in the crystallization step (f) has a stirring blade having a distance from the inner wall of the cooling tank of 10 mm or more and 50 mm or less. )) The method for producing high-purity terephthalic acid according to any one of the above).
  • the downstream side of the filter of the filter is set at a pressure higher than the atmospheric pressure, and the upstream side of the filter of the filter is set at a pressure higher than that of the downstream side of the filter, and the filtration is performed.
  • the separated mother liquor obtained in the filtration step (g) is brought into contact with a synthetic adsorbent to remove paratoluic acid, and then provided to the dissolution step (b) in the above (6) to (8).
  • (11) The method for producing high-purity terephthalic acid according to any one of (6) to (10), wherein the concentration of the suspended substance in the separated mother liquor obtained in the filtration step (g) is 200 mg ZL or less. .
  • the primary separation mother liquor is cooled to increase the recovery rate of secondary crystals precipitated, and a secondary separation mother liquor with low turbidity (SS concentration) is obtained.
  • SS concentration turbidity
  • a method for producing high-purity terephthalic acid it is possible to provide a method for producing high-purity terephthalic acid, which can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment.
  • FIG. 1 is a flowchart showing an example of a method for producing terephthalic acid which is effective in the present invention.
  • the method for producing high-purity terephthalic acid of the present invention comprises the steps of: (a) preparing a crude terephthalic acid containing 4-carboxybenzaldehyde by oxidizing noraxylene;
  • a dissolving step of dissolving the above crude terephthalic acid in an aqueous solvent under high temperature and pressure to obtain a crude terephthalic acid aqueous solution (b)
  • crude terephthalic acid is produced by subjecting para-xylene to liquid phase oxidation with molecular oxygen in an acetic acid solvent in the presence of a catalyst.
  • a catalyst which is conventionally known to be usable in this reaction is used.
  • a heavy metal such as a cobalt compound, a manganese compound, an iron compound, and a chromium compound is used.
  • bromine compounds are present in the reaction system in a dissolved state. Among them, a combination of a cobalt compound or a manganese compound and a bromine compound is preferred.
  • these compounds are usually used in such a manner that the concentration of SlO in the Connort reactor is 10 to 5000 ppm, the manganese atom is 10 to 5000 ppm, and the bromine atom is 10 to 10000 ppm.
  • molecular oxygen a mixed gas of an inert gas and oxygen is usually used, and for example, air or oxygen-enriched air is used.
  • the molar ratio of molecular oxygen to paraxylene supplied to the reactor is usually 3 to 20 times, preferably 2 to 4 times.
  • the ratio of para-xylene to acetic acid supplied to the reactor is usually 1 to 50% by weight.
  • the water concentration in the reaction system is usually 5 to 20% by weight, preferably 5 to 15% by weight.
  • the temperature of the oxidation reaction is usually from 160 to 260 ° C, preferably from 170 to 210, and the pressure is usually from 0.5 to higher as long as the reaction system can maintain a liquid phase at a reaction temperature or higher. 5 MPa, preferably 1-2 MPa, and the residence time is usually 10-200 minutes.
  • terephthalic acid generated in the oxidation reaction step usually precipitates as crystals to form a slurry.
  • terephthalic acid may be dissolved.
  • a crystallization step of cooling the reaction solution or the like is provided to precipitate terephthalic acid to form a slurry.
  • the slurry is subjected to solid-liquid separation to obtain crude terephthalic acid crystals.
  • the terephthalic acid slurry obtained in the oxidation reaction step is in a pressurized state
  • the terephthalic acid slurry may be subjected to solid-liquid separation as it is, or may be subjected to depressurized cooling or the like, followed by solid-liquid separation.
  • solid-liquid separation if it is possible to separate the crystal and the mother liquor, filtration, centrifugation and the like can be mentioned. Wash and dry as necessary After drying, crude terephthalic acid crystals (crude terephthalic acid C) are obtained.
  • the "crude terephthalic acid” in the present invention means terephthalic acid containing 1000 to 1 OOOOppm of 4 carboxybenzaldehyde.
  • the oxidation step (a) when the paraxylene A is oxidized, the oxidization reaction of one of the alkyl groups, which is different from the terephthalic acid alone, completely proceeds.
  • 4 By-products including carboxybenzaldehyde hereinafter abbreviated as "4CBA" are produced.
  • Crude terephthalic acid C power also removes these by-products and performs the following steps to obtain high-purity terephthalic acid.
  • the crude terephthalic acid C is slurried with water D in the slurrying tank 12, and the starting slurry E is heated to a high temperature and high pressure by a pump 12a and a heater 12b to be dissolved in water. E '.
  • the above terephthalic acid has a low solubility in water.
  • the above high temperature and high pressure require that the terephthalic acid can be dissolved in water. This temperature is preferably 230 ° C or more and 320 ° C or less depending on the slurry concentration. 2 If the temperature is lower than 30 ° C, the solubility is not sufficient. If the temperature exceeds 320 ° C, energy is wasted.
  • this pressure needs to be a pressure that can maintain the liquid phase in the above temperature range, and is desirably 2.8 MPa or more and 11.3 MPa or less.
  • the concentration of the slurry obtained in the dissolving step (b) is usually 20 to 40 wt%, preferably 25 to 35 wt%. If the slurry concentration is too high, clogging in the apparatus will occur, and if the slurry concentration is too low, the amount of mother liquor will increase, and the equipment corresponding to the production volume will increase in size. From the viewpoint of preventing clogging, it is preferable that the slurry concentration is kept constant.
  • the aqueous solution E ′ of terephthalic acid obtained in the above-mentioned dissolution step is sent to the hydrogenation reactor 13 and catalytically reduced with the introduced hydrogen F in the presence of a catalyst, A reduction reaction solution G is obtained.
  • the conditions of this catalyst and the conditions in the hydrogenation reactor 13 must be such that the above 4CBA is reduced and the above terephthalic acid is not reduced. This is because the above 4CBA contained in the aqueous solution E 'is reduced to paratoluic acid having high water solubility. It is desirable to carry out this reduction at the highest possible rate.
  • the hydrogenation catalyst examples include ruthenium, rhodium, palladium, platinum, osmium, etc., groups 8 to 10 (IUPAC inorganic A metal catalyst is used (according to the revised chemical nomenclature (1998)), and is usually used as a fixed bed supported on a carrier such as activated carbon. Of these, palladium supported on activated carbon is preferred.
  • the hydrogenation temperature is usually 260-320. C, preferably 270-300.
  • the partial pressure of C and hydrogen is usually 0.5 to 20 kgZcm 2 G.
  • the reduction reaction solution G obtained in the reduction step (c) is introduced into the crystallization tank 14, and the temperature is maintained within a range where the above-mentioned paratoluic acid remains dissolved. And the pressure is reduced to crystallize the above terephthalic acid to form slurry H.
  • the temperature of the last crystallization tank 14 may be controlled to a temperature condition such that paratoluic acid does not co-crystallize with terephthalic acid.
  • the temperature must be 120 ° C or higher and 200 ° C or lower. It is desirable that the temperature be between 180 ° C and 180 ° C.
  • the pressure at this time needs to be 0.20 MPa or more and 1.56 MPa or less, and preferably 0.27 MPa or more and 1. OOMPa or less. If the temperature and pressure are lower than those conditions, paratoluic acid, not only terephthalic acid alone, will co-crystallize, lowering the purity of the resulting high-purity terephthalic acid crystals. On the other hand, if the temperature and pressure are kept higher than these conditions, the crystallization amount of terephthalic acid obtained is reduced, and the efficiency is reduced.
  • the slurry H is introduced into a solid-liquid separator, and the slurry H power is used as a primary separation mother! 3 ⁇ 4 to obtain a high-purity terephthalic acid cake containing the high-purity terephthalic acid crystals.
  • This high-purity terephthalic acid cake is preferably washed with a washing device and then dried to obtain primary crystals of high-purity terephthalic acid crystals. It is more preferable that the processes are performed collectively in the solid-liquid separation and washing device 15 because the process can be simplified.
  • the operation when the slurry H is separated into solid and liquid by one solid-liquid separation and washing device 15 and washed is as follows.
  • the slurry H and the washing liquid I are introduced into the solid-liquid separation and washing device 15.
  • As the cleaning solution I water is more preferable.
  • the slurry H is subjected to solid-liquid separation, and the separated cake is washed with a washing solution I to obtain a high-purity terephthalic acid cake L as a primary separation mother! 3 ⁇ 4 [Separate from the primary mother. 3 ⁇ 4 Discharge the cleaning effluent K, which mainly consists of the components of the cleaning liquid I.
  • the primary separation discharged from the solid-liquid separation and washing device 15 The temperature of the mother!
  • 3 ⁇ 4 is the same as the crystallization conditions in the first crystallization step (d), and is preferably 120 ° C or more and 200 ° C or less, more preferably 130 ° C or more and 180 ° C or less.
  • the pressure should be higher than the pressure of the final crystallization tank in the crystallization step (d) in order to suppress the temperature decrease due to the pressure release. Specifically, the pressure is desirably 0 to 1 MPa higher than the pressure of the final crystallization tank in the crystallization step (d). In the solid-liquid separation step (e), it is desirable to operate so that the supplied slurry H is not cooled.
  • Examples of the solid-liquid separation and washing device 15 capable of performing solid-liquid separation and washing in a batch as described above include, for example, a screen bowl type centrifuge, a rotary vacuum filter, a horizontal belt filter, etc., and particularly preferably a screen. It is a bowl type centrifuge.
  • the high-purity terephthalic acid crystal L obtained by drying the high-purity terephthalic acid cake L in the drying device 16 to remove the remaining adhesion liquid can be obtained.
  • the drying device 16 is, for example, a rotary drier or a fluidized bed drier, and is operated at a drying outlet operation temperature of 70 ° C to 180 ° C using a heat source such as steam in the presence of ventilation gas. .
  • the above primary separation mother! 3 ⁇ 4 [and the washing effluent K still contain active ingredients, and it is necessary to recover as much of these as possible to make high-purity terephthalic acid crystals.
  • the active ingredient refers to the terephthalic acid and another compound that can be converted to the terephthalic acid by acidification or the like such as paratoluic acid. Including both.
  • the solid content refers to a precipitated component of the active ingredient.
  • washing discharge K has a low content of paratoluic acid, it is desirable to return it directly as the solvent in the dissolving step (b).
  • washing effluent K contains a solid
  • solid-liquid separation may be performed by another solid-liquid separator before returning to the dissolving step (b). This is because if the solid-liquid separation and washing are performed at the same time by the solid-liquid separation and washing device 15 as described above, the omission is likely to occur, and the washing effluent K may contain solids. . Further, if crystallization is performed in advance before separation by the above-mentioned solid-liquid separation device, the amount of components that can be recovered by solid-liquid separation is improved. At that time, the solid content may be collected by sending it to the crystallization tank 14 or the like, or separated. The liquid component may be used as the solvent used in the slurrying tank 12 described above.
  • the primary separated mother bite is cooled using a plurality of pressure relief cooling tanks, and the terephthalic acid contained in the primary separated mother bite is contained. Crystallize secondary crystals that have the same strength as acid-paratoluic acid and collect them.
  • the multi-stage means that two or more pressure relief cooling tanks are installed in series, and in each tank, dissolved components are deposited by sequentially lowering the respective temperatures according to the pressure.
  • the pressure-relieving cooling tank is a tank whose pressure is lower than the pressure of the liquid to be introduced, and the boiling point of the main component of the liquid at the pressure in the tank is equal to or lower than the temperature of the liquid before introduction. It means something that is When the liquid is introduced into the pressure-release cooling tank, a part of the liquid evaporates, and the rest of the liquid is cooled to the boiling point under the changed pressure. At this time, if the liquid is a solution, the solute that exceeds the solubility after cooling is crystallized.
  • the first pressure-release cooling tank 17, which is the first pressure-release cooling tank has a pressure equal to or higher than the atmospheric pressure and the solid-liquid separation step ( e) Primary separation mother discharged from! ⁇
  • the desired temperature is below 100 ° C and the primary separation mother discharged from the solid-liquid separation step (e)! (E.g., if the pressure is below 100 ° C (e.g., the pressure is reduced to 100 ° C and the temperature is lower than the temperature at the time of solid-liquid separation in the solid-liquid separation step (e)). Is preferable.).
  • At least one of the above-described multi-stage pressure-reducing cooling tanks is desirably provided with a stirring blade having a distance from the inner wall of the pressure-reducing cooling tank of 10 mm or more and 50 mm or less. Better.
  • the stirring blade is an anchor-type stirring blade that is more desirable as the portion adjacent to the inner wall of the pressure-release cooling tank at the above-mentioned interval is longer. Since the purity of the terephthalic acid is relatively low in the above-mentioned pressure-reducing cooling bath, terephthalic acid is crystallized. There is. When the liquid in the vicinity of the wall is appropriately flowed by the stirring blade rotating near the wall of the tank, the adhesion of the terephthalic acid or the like to the wall can be suppressed.
  • the distance between the stirring blade and the wall surface is desirably 10 mm or more, because if it is too close, the pressure relief cooling tank itself may be damaged.
  • the first pressure relief cooling tank 17, which is the first pressure relief cooling tank is most likely to have the largest amount of crystallization. More desirable.
  • the above-described stirring blades may be provided in all of the plurality of pressure-reducing cooling tanks.
  • the rotation speed of the anchor-type stirring blade is 3.Orpm or more, The speed is preferably 30 rpm or less, more preferably 5 rpm or more and 20 rpm or less. 3. If the rotation speed is less than Orpm, the effect of stirring cannot be fully exhibited, and the crystallized crystals may adhere to the inner wall side surface below the liquid surface as a lump. On the other hand, a speed of 30 rpm is sufficient for agitation, and even if the speed is higher than that, it is a waste of energy. 3 ⁇ 4 is scattered in the cooling tank, causing lumps to adhere above the liquid level in the tank.
  • the pressure in the final pressure-reducing cooling tank 18, which is the last pressure-reducing cooling tank among the above-described multiple pressure-releasing cooling tanks, is reduced to below atmospheric pressure, and the temperature of the cooling tank is reduced.
  • the pressure in the final pressure relief cooling tank 18 is 0.00 It is 7 MPa or more and 0.03 MPa or less, preferably 0.02 to 0.03 MPa. If the pressure exceeds 0.03 MPa and the temperature is too high, the crystallization may not be thorough and the recovery may be insufficient. On the other hand, if the pressure is less than 0.007 MPa and the temperature is too low, the pressure on the final pressure-reducing cooling tank 18 may be too large because the degree of pressure reduction is high.
  • a single or a plurality of pressure-release cooling tanks may be provided between the first pressure-release cooling tank 17 and the final pressure-release cooling tank 18 to perform stepwise crystallization. ! ⁇ .
  • the secondary slurry O obtained by crystallizing the terephthalic acid or the like in the second crystallization step (f) is introduced into the filter 19 as a filtration step (g), and the secondary separation mother liquor is obtained. P and secondary crystal Q are separated into solid and liquid.
  • the filter 19 used here can set the downstream side of the filter to a pressure state higher than the atmospheric pressure, and further, can set the upstream side of the filter to a pressure higher than that of the downstream side of the filter, and can also set the forward direction. It is desirable that solid-liquid separation be performed by cake filtration because filtration can be easily performed.
  • the above-mentioned secondary slurry O is easier to handle and handle by crystallizing it in the above-mentioned multi-stage pressure-reducing cooling tank! / Although it is easy to adhere and has properties, it is difficult for ordinary filtration. This is because it is difficult to progress.
  • the upstream side of the filter refers to the side to which the second crystallization step (f) force has been sent
  • the downstream side of the filter refers to the side for discharging the secondary separation mother liquor P
  • the forward direction refers to the secondary side. This refers to the direction in which the flow of the slurry O or the secondary separation mother liquor P is directed from the upstream side of the filter to the downstream side of the filter.
  • cake filtration particles are trapped on the filter pores by a cross-linking phenomenon, a filter cake layer is formed on one surface of the filter shortly after the start of filtration, and the cake layer is used as a filter for the subsequent filtration. This is a mechanism in which filtration proceeds while acting.
  • Examples of the filter 19 operated in this manner include a Fundaback filter manufactured by Ishikawajima-Harima Heavy Industries, Ltd., and a cricket filter manufactured by Tsukishima Kikai Co., Ltd.
  • the secondary crystal Q contains not only terephthalic acid but also partially reduced impurities such as paratoluic acid. These cannot be used as such as terephthalic acid products. Therefore, these impurities are removed by the above-mentioned terephthalic acid by oxidizing in the above-mentioned acidifying step (a).
  • Tallic acid can be used, and the overall yield of the method for producing high-purity terephthalic acid according to the present invention can be improved.
  • the above-mentioned secondary separated mother liquor P preferably has a suspended substance concentration of 200 mg ZL or less, more preferably 100 mg ZL or less, and still more preferably 50 mg ZL or less.
  • the suspended substance concentration means the weight of suspended matter such as paratoluic acid which is dispersed without being dissolved in the solvent with respect to the total weight of the secondary separation mother liquor P, and is described in JIS K 0101. Analyzed according to the method. At least a part of the secondary separation mother liquor P is discharged out of the system because the concentration of impurities in the system is not too high, so that paratoluic acid contained in the secondary separation mother liquor P is discarded.
  • the synthetic adsorbent an organic synthetic adsorbent is usually used.
  • SEPABEADS SP825, SP850, SP207 SEPABEADS is a registered trademark of Mitsubishi Chemical Corporation
  • AMBERLITE XAD-4, XAD-16 AMBERLIT ⁇ is a registered trademark of Rohm & Haas Company
  • a synthetic adsorbent, an acrylic synthetic adsorbent such as DIAION HP2MG (DIAION is a registered trademark of Mitsubishi Chemical Corporation), AMBERLITE XAD-7, XAD-8, etc. can be used.
  • a non-polar organic synthetic adsorbent especially a synthetic adsorbent having a porous copolymer power of a monovinyl conjugate and a polyvinyl conjugate, especially a styrene-dibutylbenzene synthetic adsorbent is used.
  • paratoluic acid has a benzene ring, it is easily adsorbed by a styrene-divinylbenzene-based synthetic adsorbent.
  • the specific surface area of the adsorbent is usually 400 ⁇ 1500m 2 Zg, preferably 600 ⁇ 1000m 2 Zg, pore volume is typically 0. 5 ⁇ 3mLZg, preferably 1. 0 ⁇ 2.
  • OmL / g, pore size is usually 10 to : LOOOA, preferably 50-50 ⁇ .
  • the adsorbent is usually packed in the adsorption tower so that the height of the packed bed is about 1.5 to 4. Om. Depending on when the supply of the liquid to be treated is stopped, in general, if the height of the packed bed is too low, the utilization efficiency of the adsorbent decreases.
  • the supply rate of the liquid to be treated to the adsorption tower is typically 0.5 to 30 mZhr for LV. , SV is usually 0. 5 ⁇ 20hr _1.
  • the P in the secondary separation mother liquor that has been subjected to the adsorption treatment has a reduced paratoluic acid concentration, so that it can be easily reused in the production step, preferably as a solvent in the dissolution step or a washing liquid for the separation cake after the solid-liquid separation step.
  • paratoluic acid is an intermediate in the conversion of paraxylene to terephthalic acid, and the paratoluic acid adsorbed on the synthetic adsorbent is recovered using a desorbing solution, and It is preferable to supply to the process ⁇ .
  • S Suspended substance (mgZD, a: Weight of filter medium and watch glass containing suspended substance (mg), b: Weight of filter medium and watch glass (mg), V: Sample (ml)
  • An acetic acid solution containing para-xylene and a catalyst an acetic acid solution of cobalt acetate and manganese acetate and hydrogen bromide
  • a separated mother liquor recycled from a subsequent solid-liquid separation step and air are continuously supplied to the stirring tank.
  • an oxidizing reaction was performed at an operating temperature of 190 ° C. and an operating pressure of 1.23 MPa (absolute pressure) while adjusting the liquid level so that the residence time was 1 hour.
  • the distillate vapor is finally cooled to 40 ° C by a multi-stage condenser, and the oxygen concentration in the exhaust gas is adjusted to 2.5 vol%.
  • the operation was carried out after setting.
  • the condensate obtained from each condenser was integrated and refluxed to the oxidation reactor, and a part of the condensate was withdrawn so that the concentration of water in the mother liquor of the slurry withdrawn was 10% by weight.
  • the slurry concentration of the slurry from which the reactor power was also extracted was 35% by weight, and the concentration of cobalt Z manganese Z bromine in the reaction mother liquor was 300Z300Z1000ppm by weight.
  • the slurry from which the power of the reactor was also withdrawn was continuously supplied to a stirring tank together with air, and at an operating temperature of 181 ° C, an operating pressure of 1.15 MPa (absolute pressure), and a residence time of 15 minutes.
  • the low-temperature re-oxidation reaction was performed while adjusting the liquid level so as to be as follows.
  • the distillate steam was finally cooled to 40 ° C by a multi-stage condenser, and the operation was performed with the oxygen concentration in the exhaust gas adjusted to 6 vol%.
  • the condensed liquid obtained from each condenser was integrated and refluxed to the low-temperature re-oxidation reactor.
  • the slurry from which the power of the low-temperature refining reactor was extracted was crystallized to 90 ° C, and the slurry obtained by the crystallization was supplied to a rotary vacuum filter to perform solid-liquid separation and washing. I got it.
  • the operating pressure was atmospheric pressure.
  • the separated crude terephthalic acid cake was dried with a steam rotary dryer to obtain crude terephthalic acid crystals.
  • This crude terephthalic acid was supplied to the process for producing high-purity terephthalic acid shown in Fig. 1.
  • aqueous solution E ' containing 30% by weight of crude terephthalic acid at high temperature and pressure was obtained.
  • the temperature and pressure of the aqueous solution E ′ sent to the hydrogenation reactor 13 were 290 ° C. and 8.7 MPa (89 kgfZcm 2 ′ gauge), respectively.
  • the crystallization tank 14 in which the five crystallization tanks are connected in series is cooled stepwise by depressurization evaporation, and finally cooled to a temperature of 155 ° C. After cooling to C, the solute was crystallized.
  • the slurry H obtained by the crystallization is separated into a high-purity terephthalic acid cake L containing primary crystals and a primary separation mother! 3 ⁇ 4 [The high-purity terephthalic acid cake L was washed with washing water, dried in a drier 16 and recovered as high-purity terephthalic acid crystals M.
  • the primary separating mother bite is reduced in pressure to the atmospheric pressure in the first pressure relief cooling tank 17 provided with the anchor type stirring blades, and is then cooled by releasing the pressure to 100 ° C.
  • the crystallization to be the second crystallization step (f) was performed.
  • the rotation speed of the anchor type stirring blade was 10 rpm, and the gap between the anchor type stirring blade and the side surface of the inner wall was 10 mm.
  • the obtained intermediate slurry N at 100 ° C was finally discharged with a steam ejector. It was introduced into the pressure cooling tank 18, the operating pressure was set to 0.02 MPa, and the pressure was reduced to 60 ° C. under reduced pressure.
  • the secondary slurry O thus obtained was charged as a filter 19 into a Fundaback filter (R56-86-25) manufactured by Ishikawa-Harima Heavy Industries, Ltd., and was subjected to solid-liquid separation.
  • the suspended substance concentration of the secondary mother liquor P obtained here was measured according to the above method, and was 30 mgZl.
  • the primary separated mother liquor is cooled to increase the recovery rate of secondary crystals precipitated, and a secondary separated mother liquor having a low turbidity (SS concentration) is obtained.
  • SS concentration turbidity
  • a method for producing high-purity terephthalic acid it is possible to provide a method for producing high-purity terephthalic acid, which can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment. The industrial value of the present invention is remarkable.

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Abstract

A process for producing high-purity terephthalic acid which comprises: an oxidation step (a) in which p-xylene is oxidized to obtain crude terephthalic acid; a dissolution step (b) in which the crude terephthalic acid is dissolved in a water solvent to obtain an aqueous solution of the crude terephthalic acid; a reduction step (c) in which the aqueous solution of the crude terephthalic acid is brought into contact with hydrogen to obtain a liquid resulting from a reduction reaction; a crystallization step (d) in which the liquid resulting from a reduction reaction is cooled to crystallize high-purity terephthalic acid; a solid-liquid separation step (e) in which the slurry obtained in the crystallization step (d) is subjected to solid-liquid separation; and a crystallization step (f) in which the isolated mother liquor obtained in the solid-liquid separation step (e) is cooled to form crystals consisting mainly of the terephthalic acid and p-toluic acid contained in the mother liquor, wherein the cooling of the mother liquor is conducted using two or more cooling tanks which have a reduced pressure so as to vaporize the water solvent contained in the mother liquor and in which the last cooling tank is regulated so as to have a pressure below the atmospheric pressure and a temperature of 40-70°C.

Description

高純度テレフタル酸の製造方法  Method for producing high-purity terephthalic acid

技術分野  Technical field

[0001] 本発明は、高純度テレフタル酸の製造方法に関する。  The present invention relates to a method for producing high-purity terephthalic acid.

背景技術  Background art

[0002] 高純度テレフタル酸製造プロセスでは、ノ ラキシレン力も高純度テレフタル酸を製 造するために、まず原料パラキシレンを酸ィ匕して粗テレフタル酸を生成させ、次いで 、これに含まれる中間体生成物である 4 カルボキシベンズアルデヒドを還元し、パラ トルィル酸にして除去することで、高純度テレフタル酸を製造する。  [0002] In the high-purity terephthalic acid production process, in order to produce high-purity terephthalic acid with noraxylene power, first, raw para-xylene is oxidized to generate crude terephthalic acid, and then an intermediate contained therein is produced. The product, 4 carboxybenzaldehyde, is reduced to paratoluic acid and removed to produce high-purity terephthalic acid.

[0003] その工程は次の通りである。原料であるパラキシレンを高温高圧の酢酸溶媒中で触 媒により、テレフタル酸に空気酸化する。このときテレフタル酸とともに、中間体である 4 カルボキシベンズアルデヒドが副生成する。これらを含んだスラリーを晶析、固液 分離して粗テレフタル酸結晶を得る。次いで、この粗テレフタル酸結晶を高温高圧条 件下で水に溶解させて水溶液にし、上記粗テレフタル酸に含まれる 4—カルボキシ ベンズアルデヒドを、水溶性の高いパラトルィル酸に水素還元する。その後放圧冷却 して、水溶性の低いテレフタル酸を水溶液から晶析させ、高純度テレフタル酸として 回収する。  [0003] The process is as follows. The raw material para-xylene is air-oxidized to terephthalic acid with a catalyst in a high-temperature, high-pressure acetic acid solvent. At this time, an intermediate 4 carboxybenzaldehyde is by-produced together with terephthalic acid. The slurry containing these is crystallized and separated into solid and liquid to obtain crude terephthalic acid crystals. Next, the crude terephthalic acid crystals are dissolved in water under high-temperature and high-pressure conditions to form an aqueous solution, and 4-carboxybenzaldehyde contained in the crude terephthalic acid is hydrogen reduced to paratoluic acid having high water solubility. Thereafter, the mixture is depressurized and cooled, and terephthalic acid with low water solubility is crystallized from the aqueous solution and recovered as high-purity terephthalic acid.

[0004] ここで、高純度テレフタル酸を分離した一次分離母液には、テレフタル酸やパラトル ィル酸などの有効成分が溶解されており、生産性の向上や排水負荷の低減のため、 晶析槽にお 、て攪拌しながら冷却して析出させ、二次結晶を回収することが知られ ている (特許文献 1、特許文献 2)。  [0004] Here, active components such as terephthalic acid and paratoluic acid are dissolved in the primary separation mother liquor from which high-purity terephthalic acid has been separated, and crystallization is performed to improve productivity and reduce drainage load. It is known that a secondary crystal is recovered by cooling in a tank while stirring to precipitate a secondary crystal (Patent Documents 1 and 2).

[0005] しかしながら、この一次分離母液を一挙に所定の最終温度まで冷却すると、結晶の 粒径が細かくなり、濾過機などの回収装置を用いて二次結晶を回収するに当たり、フ ィルターの目詰まりや、回収率の低減などの不具合が生じる。また、この二次結晶物 は付着性が高ぐプロペラ型攪拌翼やパドル型攪拌翼を用いた晶析では槽の内壁付 近までは十分な攪拌をすることができず、内壁側面に付着物が形成される。さらに、 上記晶析処理によって生じる蒸気に飛沫同伴する微粉が晶析槽内の気相部の側面 に付着する。これらの装置付着物が成長して脱離すると配管などの閉塞を招く原因 にもなるため、定期的に設備を止めて洗浄するなどの清掃作業を行う必要があった。 特許文献 1 :特開昭 52— 128344号公報 [0005] However, when the primary separated mother liquor is cooled to a predetermined final temperature at once, the crystal particle diameter becomes finer, and when the secondary crystal is recovered using a recovery device such as a filter, the filter is clogged. In addition, problems such as a decrease in the recovery rate occur. In addition, this secondary crystal cannot be sufficiently agitated until near the inner wall of the tank by crystallization using a propeller-type stirring blade or paddle-type stirring blade, which has high adhesion, so Is formed. Furthermore, fine powder entrained in the vapor generated by the above-mentioned crystallization treatment is formed on the side of the gas phase in the crystallization tank. Adheres to If the deposits on these devices grow and become detached, they may cause clogging of pipes and the like. Therefore, it was necessary to periodically perform cleaning work such as stopping and cleaning the facilities. Patent Document 1: JP-A-52-128344

特許文献 2:特開平 5 - 58948号公報  Patent Document 2: JP-A-5-58948

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0006] そこで本発明は、高純度テレフタル酸を製造するにあたり、上記一次分離母液を冷 却して析出される二次結晶の回収率を高め、濁度 (SS濃度)の低い二次分離母液を 得ることができる、高純度テレフタル酸の製造方法を提供することを目的とする。また 、冷却処理に際して、閉塞の原因となる系内付着物の形成や、塊状物の発生を抑制 できる高純度テレフタル酸の製造方法を提供することを目的とする。 [0006] Therefore, in the production of high-purity terephthalic acid, the present invention increases the recovery rate of the secondary crystals precipitated by cooling the primary separation mother liquor and increases the secondary separation mother liquor having a low turbidity (SS concentration). It is an object of the present invention to provide a method for producing high-purity terephthalic acid, which can obtain terephthalic acid. Another object of the present invention is to provide a method for producing high-purity terephthalic acid that can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment.

課題を解決するための手段  Means for solving the problem

[0007] 本発明者等は上記課題を解決すべく鋭意検討した結果、一次分離母液を多段で 放圧冷却し晶析することにより上記課題を解決できることを見出し、本発明を完成す るに至った。即ち、本発明の要旨は下記(1)〜(11)に存する。 [0007] The present inventors have conducted intensive studies to solve the above problems, and as a result, found that the above problems can be solved by depressurizing and cooling the primary separated mother liquor in multiple stages and crystallizing it, and completed the present invention. Was. That is, the gist of the present invention resides in the following (1) to (11).

[0008] (1) パラキシレンを酸化して、 4 カルボキシベンズアルデヒドを含有する粗テレフ タル酸を得る酸化工程 (a)、 [0008] (1) An oxidation step of oxidizing para-xylene to obtain crude terephthalic acid containing 4 carboxybenzaldehyde (a),

上記粗テレフタル酸を、高温高圧下で水溶媒に溶解させて粗テレフタル酸水溶液 を得る溶解工程 (b)ゝ  A dissolving step of dissolving the above crude terephthalic acid in an aqueous solvent under high temperature and pressure to obtain a crude terephthalic acid aqueous solution (b)

上記粗テレフタル酸水溶液を、触媒の存在下で水素と接触させることにより、上記 4 カルボキシベンズアルデヒドをパラトルィル酸に還元した還元反応液を得る還元ェ 程 (c)ゝ  A reduction step (c) of obtaining a reduction reaction solution obtained by reducing the carboxybenzaldehyde to paratoluic acid by bringing the crude terephthalic acid aqueous solution into contact with hydrogen in the presence of a catalyst.

上記還元反応液を放圧蒸発させて 120〜200°Cに冷却し、高純度テレフタル酸の 結晶を晶析させる晶析工程 (d)、  A crystallization step (d) of evaporating the reduction reaction solution under reduced pressure and cooling to 120 to 200 ° C to crystallize high-purity terephthalic acid crystals.

上記晶析工程 (d)で得られたスラリーを、上記高純度テレフタル酸結晶からなる結 晶と、分離母液とに固液分離する固液分離工程 (e)、  A solid-liquid separation step (e) of solid-liquid separation of the slurry obtained in the crystallization step (d) into crystals comprising the high-purity terephthalic acid crystals and a separation mother liquor;

上記分離母液を冷却し、上記固液分離工程 (e)で得られた分離母液に含有される テレフタル酸やパラトルィル酸から主としてなる結晶を晶析させる晶析工程 (f)、 を有する高純度テレフタル酸の製造方法にぉ 、て、 Cooling the separated mother liquor, and crystallizing a crystal mainly composed of terephthalic acid or paratoluic acid contained in the separated mother liquor obtained in the solid-liquid separation step (e) (f), The method for producing high-purity terephthalic acid having

圧力を下げることにより母液中の水溶媒を蒸発させて冷却を行う冷却槽を複数段用 いて冷却し、そのうちの最後の冷却槽を大気圧未満に減圧し、最後の冷却槽の温度 を 40〜70°Cとする、高純度テレフタル酸の製造方法。  Cooling is performed by using a plurality of cooling tanks for cooling by evaporating the water solvent in the mother liquor by lowering the pressure, the last of which is reduced to below atmospheric pressure, and the temperature of the last cooling tank is reduced to 40 to A method for producing high-purity terephthalic acid at 70 ° C.

[0009] (2) 晶析工程 (f)で用いる冷却槽のうち、最初の冷却槽は、放圧蒸発させて 100[0009] (2) The first of the cooling tanks used in the crystallization step (f) is depressurized and evaporated.

°C〜固液分離工程 (e)における固液分離時の温度未満に冷却する上記(1)に記載 の高純度テレフタル酸の製造方法。 The method for producing high-purity terephthalic acid according to the above (1), wherein the temperature is cooled to a temperature lower than the temperature at the time of solid-liquid separation in the solid-liquid separation step (e).

[0010] (3) 最初の冷却槽を、大気圧まで放圧蒸発させる上記(2)に記載の高純度テレフ タル酸の製造方法。 (3) The method for producing high-purity terephthalic acid according to the above (2), wherein the first cooling tank is depressurized and evaporated to atmospheric pressure.

[0011] (4) 晶析工程 (f)で用いる冷却槽が、アンカー型攪拌翼を有する上記(1)〜 (3) の!、ずれかに記載の高純度テレフタル酸の製造方法。  (4) The method for producing high-purity terephthalic acid according to any one of (1) to (3) above, wherein the cooling tank used in the crystallization step (f) has an anchor-type stirring blade.

[0012] (5) 晶析工程 (f)で用いる冷却槽のうち、少なくとも一つが、その冷却槽の内壁と の間隔が 10mm以上かつ 50mm以下である攪拌翼を有する上記(1)〜(4)のいず れかに記載の高純度テレフタル酸の製造方法。 [0012] (5) At least one of the cooling tanks used in the crystallization step (f) has a stirring blade having a distance from the inner wall of the cooling tank of 10 mm or more and 50 mm or less. )) The method for producing high-purity terephthalic acid according to any one of the above).

[0013] (6) 晶析工程 (f)で得られるスラリーを、濾過機を用いて、結晶と分離母液とに固 液分離する濾過工程 (g)、 (6) A filtration step (g) of solid-liquid separation of the slurry obtained in the crystallization step (f) into crystals and a separated mother liquor using a filter,

を有する上記(1)〜(5)の 、ずれかに記載の高純度テレフタル酸の製造方法。  The method for producing high-purity terephthalic acid according to any one of the above (1) to (5), comprising:

[0014] (7) 濾過工程 (g)で分離された結晶を、酸化工程 (a)に供与する上記 (6)に記載 の高純度テレフタル酸の製造方法。 (7) The method for producing high-purity terephthalic acid according to (6) above, wherein the crystals separated in the filtration step (g) are provided to the oxidation step (a).

[0015] (8) 濾過工程 (g)で、濾過機のフィルター下流側を大気圧以上の圧力状態とし、 該濾過機のフィルター上流側を上記のフィルター下流側より高 、圧力状態として、濾 過機の順方向へケーキ濾過により固液分離を行う上記(6)又は(7)に記載の高純度 テレフタル酸の製造方法。 (8) In the filtration step (g), the downstream side of the filter of the filter is set at a pressure higher than the atmospheric pressure, and the upstream side of the filter of the filter is set at a pressure higher than that of the downstream side of the filter, and the filtration is performed. The method for producing high-purity terephthalic acid according to (6) or (7), wherein solid-liquid separation is performed by cake filtration in a forward direction of the machine.

[0016] (9) 濾過工程 (g)で得られた分離母液を、直接に、又は間接的に、溶解工程 (b) に供与する上記(6)〜(8)の 、ずれかに記載の高純度テレフタル酸の製造方法。 (9) The method according to (6) to (8), wherein the separated mother liquor obtained in the filtration step (g) is directly or indirectly provided to the dissolution step (b). A method for producing high-purity terephthalic acid.

[0017] (10) 濾過工程 (g)で得られた分離母液を、合成吸着材と接触させてパラトルィル 酸を除去した後、溶解工程 (b)に供与する上記 (6)〜(8)のいずれかに記載の高純 度テレフタル酸の製造方法。 [0018] (11) 濾過工程 (g)で得られた分離母液内の懸濁物質濃度が 200mgZL以下で ある上記(6)〜(10)の 、ずれかに記載の高純度テレフタル酸の製造方法。 (10) The separated mother liquor obtained in the filtration step (g) is brought into contact with a synthetic adsorbent to remove paratoluic acid, and then provided to the dissolution step (b) in the above (6) to (8). The method for producing highly pure terephthalic acid according to any one of the above. (11) The method for producing high-purity terephthalic acid according to any one of (6) to (10), wherein the concentration of the suspended substance in the separated mother liquor obtained in the filtration step (g) is 200 mg ZL or less. .

発明の効果  The invention's effect

[0019] 本発明により、高純度テレフタル酸を製造するにあたり、上記一次分離母液を冷却 して析出される二次結晶の回収率を高め、濁度 (SS濃度)の低い二次分離母液を得 ることができる、高純度テレフタル酸の製造方法を提供することができる。また、冷却 処理に際して、閉塞の原因となる系内付着物の形成や、塊状物の発生を抑制できる 高純度テレフタル酸の製造方法を提供することができる。  According to the present invention, in producing high-purity terephthalic acid, the primary separation mother liquor is cooled to increase the recovery rate of secondary crystals precipitated, and a secondary separation mother liquor with low turbidity (SS concentration) is obtained. And a method for producing high-purity terephthalic acid. In addition, it is possible to provide a method for producing high-purity terephthalic acid, which can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment.

図面の簡単な説明  Brief Description of Drawings

[0020] [図 1]本発明に力かるテレフタル酸の製造方法の例を示すフロー図である。 FIG. 1 is a flowchart showing an example of a method for producing terephthalic acid which is effective in the present invention.

符号の説明  Explanation of symbols

[0021] 12 スラリー化槽 [0021] 12 Slurry tank

12a ポンプ  12a pump

12b ヒーター  12b heater

13 水添反応器  13 Hydrogenation reactor

14 晶析槽  14 Crystallization tank

15 固液分離及び洗浄装置  15 Solid-liquid separation and washing equipment

16 乾燥装置  16 Drying equipment

17 第一放圧冷却槽  17 First pressure relief cooling tank

18 最終放圧冷却槽  18 Final pressure relief cooling tank

19 濾過機  19 Filtration machine

A パラキシレン  A para-xylene

B 酸素含有ガス  B Oxygen-containing gas

C 粗テレフタル酸  C Crude terephthalic acid

D 水  D water

E 開始スラリー  E Starting slurry

E' 水溶液  E 'aqueous solution

F 水素 G 還元反)心揿 F hydrogen G reduction anti)

H スラリー  H slurry

I 洗浄液  I Cleaning liquid

J 一次分離母液  J Primary separation mother liquor

K 洗浄排出液  K Wash drainage

L 高純度テレフタル酸ケーキ  L High purity terephthalic acid cake

M 高純度テレフタル酸結晶  M High purity terephthalic acid crystal

N 中間スラリー  N Intermediate slurry

O 二次スラリー  O Secondary slurry

P 二次分離母液  P Secondary separation mother liquor

Q 二次結晶  Q secondary crystal

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0022] 以下、この発明について詳細に説明する。 Hereinafter, the present invention will be described in detail.

[0023] 本発明の高純度テレフタル酸の製造方法は、ノラキシレンを酸ィ匕して、 4—カルボ キシベンズアルデヒドを含有する粗テレフタル酸を得る酸ィ匕工程 (a)、  [0023] The method for producing high-purity terephthalic acid of the present invention comprises the steps of: (a) preparing a crude terephthalic acid containing 4-carboxybenzaldehyde by oxidizing noraxylene;

上記粗テレフタル酸を、高温高圧下で水溶媒に溶解させて粗テレフタル酸水溶液 を得る溶解工程 (b)ゝ  A dissolving step of dissolving the above crude terephthalic acid in an aqueous solvent under high temperature and pressure to obtain a crude terephthalic acid aqueous solution (b)

上記粗テレフタル酸水溶液を、触媒の存在下で水素と接触させることにより、上記 4 カルボキシベンズアルデヒドをパラトルィル酸に還元した還元反応液を得る還元ェ 程 (c)ゝ  A reduction step (c) of obtaining a reduction reaction solution obtained by reducing the carboxybenzaldehyde to paratoluic acid by bringing the crude terephthalic acid aqueous solution into contact with hydrogen in the presence of a catalyst.

上記還元反応液を放圧蒸発させて 120〜200°Cに冷却し、高純度テレフタル酸の 結晶を晶析させる晶析工程 (d)、  A crystallization step (d) of evaporating the reduction reaction solution under reduced pressure and cooling to 120 to 200 ° C to crystallize high-purity terephthalic acid crystals.

上記晶析工程 (d)で得られたスラリーを、上記高純度テレフタル酸結晶からなる結 晶と、分離母液とに固液分離する固液分離工程 (e)、  A solid-liquid separation step (e) of solid-liquid separation of the slurry obtained in the crystallization step (d) into crystals comprising the high-purity terephthalic acid crystals and a separation mother liquor;

上記分離母液を冷却し、上記固液分離工程 (e)で得られた分離母液に含有される テレフタル酸やパラトルィル酸から主としてなる結晶を晶析させる晶析工程 (f)、 を有する高純度テレフタル酸の製造方法にぉ 、て、  Cooling the separated mother liquor and crystallizing a crystal mainly composed of terephthalic acid or paratoluic acid contained in the separated mother liquor obtained in the solid-liquid separation step (e) (f), In the method for producing the acid,

圧力を下げることにより母液中の水溶媒を蒸発させて冷却を行う冷却槽を複数段用 いて冷却し、そのうちの最後の冷却槽を大気圧未満に減圧し、最後の冷却槽の温度 を 40〜70°Cとすることを特徴とする。 For multiple stages of cooling tanks for cooling by evaporating the water solvent in the mother liquor by lowering the pressure And the pressure in the last cooling tank is reduced to below atmospheric pressure, and the temperature of the last cooling tank is set to 40 to 70 ° C.

[0024] まず粗テレフタル酸生成工程 (a)では、触媒の存在下、酢酸溶媒中で分子状酸素 によりパラキシレンを液相酸ィ匕することにより粗テレフタル酸を生成させる。この工程 は周知であり、触媒としては、従来よりこの反応に用い得ることが知られている触媒が 用いられ、具体的には、コバルト化合物、マンガンィ匕合物、鉄化合物、クロム化合物 などの重金属化合物及び臭素化合物等が挙げられる。これらは溶解した状態で反応 系に存在している。なかでも好ましいのは、コバルト化合物又はマンガンィ匕合物と臭 素化合物との組み合わせである。この場合、これらの化合物は、通常、溶媒に対して 、コノルト原子力 SlO〜5000ppm、マンガン原子が 10〜5000ppm、臭素原子が 10 〜10000ppmとなるように用 ヽられる。  First, in the crude terephthalic acid producing step (a), crude terephthalic acid is produced by subjecting para-xylene to liquid phase oxidation with molecular oxygen in an acetic acid solvent in the presence of a catalyst. This step is well-known, and as the catalyst, a catalyst which is conventionally known to be usable in this reaction is used. Specifically, a heavy metal such as a cobalt compound, a manganese compound, an iron compound, and a chromium compound is used. And bromine compounds. These are present in the reaction system in a dissolved state. Among them, a combination of a cobalt compound or a manganese compound and a bromine compound is preferred. In this case, these compounds are usually used in such a manner that the concentration of SlO in the Connort reactor is 10 to 5000 ppm, the manganese atom is 10 to 5000 ppm, and the bromine atom is 10 to 10000 ppm.

[0025] 分子状酸素としては、通常は不活性ガスと酸素との混合ガスが用いられ、例えば、 空気や酸素富化空気が用いられる。反応器に供給するパラキシレンに対する分子状 酸素のモル比は、通常 3〜20モル倍、好ましくは 2〜4モル倍である。  As the molecular oxygen, a mixed gas of an inert gas and oxygen is usually used, and for example, air or oxygen-enriched air is used. The molar ratio of molecular oxygen to paraxylene supplied to the reactor is usually 3 to 20 times, preferably 2 to 4 times.

[0026] 反応器に供給する酢酸に対するパラキシレンの比率は、通常 1〜50重量%である 。反応系内の水分濃度は、通常 5〜20重量%であり、好ましくは 5〜 15重量%である  [0026] The ratio of para-xylene to acetic acid supplied to the reactor is usually 1 to 50% by weight. The water concentration in the reaction system is usually 5 to 20% by weight, preferably 5 to 15% by weight.

[0027] 酸化反応の温度は、通常 160〜260°C、好ましくは170〜210で、圧力は、反応温 度において反応系が液相を保持できる圧力以上であればよぐ通常 0. 5〜5MPa、 好ましくは 1〜 2MPa、滞留時間は通常 10〜 200分である。 [0027] The temperature of the oxidation reaction is usually from 160 to 260 ° C, preferably from 170 to 210, and the pressure is usually from 0.5 to higher as long as the reaction system can maintain a liquid phase at a reaction temperature or higher. 5 MPa, preferably 1-2 MPa, and the residence time is usually 10-200 minutes.

[0028] テレフタル酸は溶媒である酢酸に溶け難 、ため、通常、酸化反応工程で生成した テレフタル酸は結晶として析出し、スラリーを形成する。し力しながら、溶媒の量、反 応温度、圧力によっては、テレフタル酸が溶解している場合がある。この場合には、 反応液を冷却等する晶析工程を設けてテレフタル酸を析出させ、スラリーを形成させ る。このスラリーを固液分離して、粗テレフタル酸結晶を取得する。酸化反応工程で 得られたテレフタル酸スラリーは加圧状態にあるが、そのまま固液分離しても、放圧 冷却等してから固液分離してもよい。固液分離の方法としては、結晶と母液とが分離 できるものであればよぐ濾過、遠心分離などが挙げられる。必要に応じて洗浄、乾 燥を行 、粗テレフタル酸結晶(粗テレフタル酸 C)を得る。 [0028] Since terephthalic acid is hardly soluble in acetic acid as a solvent, terephthalic acid generated in the oxidation reaction step usually precipitates as crystals to form a slurry. However, depending on the amount of solvent, reaction temperature and pressure, terephthalic acid may be dissolved. In this case, a crystallization step of cooling the reaction solution or the like is provided to precipitate terephthalic acid to form a slurry. The slurry is subjected to solid-liquid separation to obtain crude terephthalic acid crystals. Although the terephthalic acid slurry obtained in the oxidation reaction step is in a pressurized state, the terephthalic acid slurry may be subjected to solid-liquid separation as it is, or may be subjected to depressurized cooling or the like, followed by solid-liquid separation. As a method for solid-liquid separation, if it is possible to separate the crystal and the mother liquor, filtration, centrifugation and the like can be mentioned. Wash and dry as necessary After drying, crude terephthalic acid crystals (crude terephthalic acid C) are obtained.

[0029] なお、本発明における「粗テレフタル酸」は、 4 カルボキシベンズアルデヒドを 100 0〜 1 OOOOppm含有するテレフタル酸を意味する。  [0029] The "crude terephthalic acid" in the present invention means terephthalic acid containing 1000 to 1 OOOOppm of 4 carboxybenzaldehyde.

[0030] 上記の酸化工程 (a)にお 、てパラキシレン Aを酸ィ匕する際には、上記テレフタル酸 だけではなぐ片方のアルキル基の酸ィ匕反応が完全に進行して ヽな 、4 カルボキ シベンズアルデヒド(以下、「4CBA」と略す。)をはじめとする副生成物が生成する。 粗テレフタル酸 C力もこれらの副生成物を取り除き、高純度テレフタル酸を得るため に以下の工程を行う。  [0030] In the oxidation step (a), when the paraxylene A is oxidized, the oxidization reaction of one of the alkyl groups, which is different from the terephthalic acid alone, completely proceeds. 4 By-products including carboxybenzaldehyde (hereinafter abbreviated as "4CBA") are produced. Crude terephthalic acid C power also removes these by-products and performs the following steps to obtain high-purity terephthalic acid.

[0031] 上記溶解工程 (b)として、上記の粗テレフタル酸 Cをスラリー化槽 12において水 D でスラリー化し、この開始スラリー Eをポンプ 12a及びヒーター 12bにより高温高圧にし て水に溶解させ、水溶液 E'にする。上記テレフタル酸は水への溶解度が低ぐ上記 の高温高圧とは、上記テレフタル酸が水に溶解することができる状態であることが必 要である。この温度はスラリー濃度による力 230°C以上、 320°C以下が望ましい。 2 30°C未満では溶解度が十分ではなぐ 320°Cを超えてしまうと、エネルギーが無駄 になり、さらに温度が高すぎるとテレフタル酸が分解して別の物質を生じるおそれが ある力もである。また、この圧力は、上記の温度範囲で液相を維持できるだけの圧力 である必要があり、 2. 8MPa以上、 11. 3MPa以下であることが望ましい。  [0031] In the dissolving step (b), the crude terephthalic acid C is slurried with water D in the slurrying tank 12, and the starting slurry E is heated to a high temperature and high pressure by a pump 12a and a heater 12b to be dissolved in water. E '. The above terephthalic acid has a low solubility in water. The above high temperature and high pressure require that the terephthalic acid can be dissolved in water. This temperature is preferably 230 ° C or more and 320 ° C or less depending on the slurry concentration. 2 If the temperature is lower than 30 ° C, the solubility is not sufficient. If the temperature exceeds 320 ° C, energy is wasted. If the temperature is too high, terephthalic acid may be decomposed to produce another substance. Further, this pressure needs to be a pressure that can maintain the liquid phase in the above temperature range, and is desirably 2.8 MPa or more and 11.3 MPa or less.

[0032] なお、溶解工程 (b)において得られるスラリーの濃度は、通常 20〜40wt%であり、 好ましくは 25〜35wt%である。スラリー濃度が高すぎると装置内における閉塞を引 き起こし、低すぎると母液量が増え、生産量見合いの設備が大型化してしまう。閉塞 防止の観点から、スラリー濃度は一定に保持されることが好ま 、。  [0032] The concentration of the slurry obtained in the dissolving step (b) is usually 20 to 40 wt%, preferably 25 to 35 wt%. If the slurry concentration is too high, clogging in the apparatus will occur, and if the slurry concentration is too low, the amount of mother liquor will increase, and the equipment corresponding to the production volume will increase in size. From the viewpoint of preventing clogging, it is preferable that the slurry concentration is kept constant.

[0033] 次に還元工程 (c)として、上記溶解工程により得られたテレフタル酸の水溶液 E'は 、水添反応器 13へ送り、触媒存在下において、導入した水素 Fにより接触還元させ て、還元反応液 Gを得る。この触媒と水添反応器 13内の条件とは、上記 4CBAを還 元し、上記テレフタル酸は還元しないものである必要がある。水溶液 E'に含まれる上 記 4CBAを、水溶性の高いパラトルィル酸に還元するためである。この還元は、出来 るだけ高い率で行うことが望ましい。この水素添加も周知であり、水素添加触媒として は、ルテニウム、ロジウム、パラジウム、白金、オスミウムなどの 8〜10族(IUPAC無機 化学命名法改訂版(1998)による)金属触媒が用いられ、通常、活性炭などに担体 に担持して固定床として用いる。これらのなかでも活性炭に担持させたパラジウムが 好ましい。水素添加の温度は、通常 260〜320。C、好ましくは 270〜300。C、水素の 分圧は通常 0. 5〜20kgZcm2Gである。 Next, as the reduction step (c), the aqueous solution E ′ of terephthalic acid obtained in the above-mentioned dissolution step is sent to the hydrogenation reactor 13 and catalytically reduced with the introduced hydrogen F in the presence of a catalyst, A reduction reaction solution G is obtained. The conditions of this catalyst and the conditions in the hydrogenation reactor 13 must be such that the above 4CBA is reduced and the above terephthalic acid is not reduced. This is because the above 4CBA contained in the aqueous solution E 'is reduced to paratoluic acid having high water solubility. It is desirable to carry out this reduction at the highest possible rate. This hydrogenation is also well known, and examples of the hydrogenation catalyst include ruthenium, rhodium, palladium, platinum, osmium, etc., groups 8 to 10 (IUPAC inorganic A metal catalyst is used (according to the revised chemical nomenclature (1998)), and is usually used as a fixed bed supported on a carrier such as activated carbon. Of these, palladium supported on activated carbon is preferred. The hydrogenation temperature is usually 260-320. C, preferably 270-300. The partial pressure of C and hydrogen is usually 0.5 to 20 kgZcm 2 G.

[0034] さらに第一晶析工程 (d)として、上記還元工程 (c)で得られた還元反応液 Gを晶析 槽 14に導入し、上記パラトルィル酸を溶解させたままとなる範囲で温度と圧力とを下 げ、上記テレフタル酸を晶析させてスラリー Hにする。ここで、晶析槽 14を直列に複 数段、好ましくは 3〜6段設けて、段階的に圧力を下げて冷却 (放圧蒸発冷却)し、上 記テレフタル酸を晶析させるとより望ましい。最後の晶析槽 14の温度はパラトルィル 酸がテレフタル酸と共晶しな 、温度条件にコントロールすればよく、具体的には 120 °C以上、 200°C以下であることが必要であり、 130°C以上、 180°C以下であると望ま しい。この際の圧力は 0. 20MPa以上、 1. 56MPa以下であることが必要であり、 0. 27MPa以上、 1. OOMPa以下であると望ましい。これらの条件よりもさらに低温低圧 になると、上記テレフタル酸だけではなぐパラトルィル酸も共晶してしまい、得られる 高純度テレフタル酸結晶の純度を下げてしまう。一方で、これらの条件よりも高温高 圧のままであると、得られるテレフタル酸の晶析量が少なくなり、効率が悪くなる。  [0034] Further, as a first crystallization step (d), the reduction reaction solution G obtained in the reduction step (c) is introduced into the crystallization tank 14, and the temperature is maintained within a range where the above-mentioned paratoluic acid remains dissolved. And the pressure is reduced to crystallize the above terephthalic acid to form slurry H. Here, it is more desirable to provide a plurality of crystallization tanks 14 in series, preferably 3 to 6 stages, and gradually lower the pressure to cool (decompression evaporative cooling) to crystallize the above terephthalic acid. . The temperature of the last crystallization tank 14 may be controlled to a temperature condition such that paratoluic acid does not co-crystallize with terephthalic acid. Specifically, the temperature must be 120 ° C or higher and 200 ° C or lower. It is desirable that the temperature be between 180 ° C and 180 ° C. The pressure at this time needs to be 0.20 MPa or more and 1.56 MPa or less, and preferably 0.27 MPa or more and 1. OOMPa or less. If the temperature and pressure are lower than those conditions, paratoluic acid, not only terephthalic acid alone, will co-crystallize, lowering the purity of the resulting high-purity terephthalic acid crystals. On the other hand, if the temperature and pressure are kept higher than these conditions, the crystallization amount of terephthalic acid obtained is reduced, and the efficiency is reduced.

[0035] その次に固液分離工程 (e)として、上記スラリー Hを固液分離機に導入し、このスラ リー H力 一次分離母! ¾ [を分離して、高純度の上記テレフタル酸の結晶を含んだ高 純度テレフタル酸ケーキを得る。この高純度テレフタル酸ケーキは、洗浄装置におい て洗浄した後、乾燥して高純度テレフタル酸結晶からなる一次結晶とすると望ましぐ 上記固液分離機と上記洗浄装置とで行う工程を、一つの固液分離及び洗浄装置 15 においてまとめて行うと、工程が簡素化でき、より望ましい。  Next, in the solid-liquid separation step (e), the slurry H is introduced into a solid-liquid separator, and the slurry H power is used as a primary separation mother! ¾ to obtain a high-purity terephthalic acid cake containing the high-purity terephthalic acid crystals. This high-purity terephthalic acid cake is preferably washed with a washing device and then dried to obtain primary crystals of high-purity terephthalic acid crystals. It is more preferable that the processes are performed collectively in the solid-liquid separation and washing device 15 because the process can be simplified.

[0036] 上記のように、一つの固液分離及び洗浄装置 15によって上記スラリー Hを固液分 離し、洗浄するときの作業は以下のようになる。固液分離及び洗浄装置 15にスラリー Hと洗浄液 Iとを導入する。洗浄液 Iとしては、水がより望ましい。スラリー Hを固液分離 し、分離されたケーキを洗浄液 Iにより洗浄して、高純度テレフタル酸ケーキ Lを一次 分離母! ¾ [から分離して取り出し、一次分離母! ¾ [と、主に洗浄液 Iの成分からなる洗 浄排出液 Kを排出する。ここで、固液分離及び洗浄装置 15から排出される一次分離 母! ¾ [の温度は、第一晶析工程 (d)における晶析条件と同等であり、 120°C以上、 20 0°C以下が望ましぐ 130°C以上、 180°C以下であるとより望ましぐまた圧力につい ては、放圧による温度低下を抑えるために、晶析工程 (d)の最終晶析槽の圧力よりも 高い圧力であることが必要である。具体的には、晶析工程 (d)の最終晶析槽の圧力 よりも 0〜lMPa高い圧力であることが望ましい。この固液分離工程 (e)において、供 給されるスラリー Hが冷却されな 、ように操作することが望ま 、。このように固液分離 と洗浄とをまとめて行うことのできる固液分離及び洗浄装置 15としては、例えばスクリ ーンボウル型遠心分離機やロータリーバキュームフィルター、水平ベルトフィルター 等が挙げられ、特に好ましくはスクリーンボウル型遠心分離機である。 [0036] As described above, the operation when the slurry H is separated into solid and liquid by one solid-liquid separation and washing device 15 and washed is as follows. The slurry H and the washing liquid I are introduced into the solid-liquid separation and washing device 15. As the cleaning solution I, water is more preferable. The slurry H is subjected to solid-liquid separation, and the separated cake is washed with a washing solution I to obtain a high-purity terephthalic acid cake L as a primary separation mother! ¾ [Separate from the primary mother. ¾ Discharge the cleaning effluent K, which mainly consists of the components of the cleaning liquid I. Here, the primary separation discharged from the solid-liquid separation and washing device 15 The temperature of the mother! ¾ [is the same as the crystallization conditions in the first crystallization step (d), and is preferably 120 ° C or more and 200 ° C or less, more preferably 130 ° C or more and 180 ° C or less. The pressure should be higher than the pressure of the final crystallization tank in the crystallization step (d) in order to suppress the temperature decrease due to the pressure release. Specifically, the pressure is desirably 0 to 1 MPa higher than the pressure of the final crystallization tank in the crystallization step (d). In the solid-liquid separation step (e), it is desirable to operate so that the supplied slurry H is not cooled. Examples of the solid-liquid separation and washing device 15 capable of performing solid-liquid separation and washing in a batch as described above include, for example, a screen bowl type centrifuge, a rotary vacuum filter, a horizontal belt filter, etc., and particularly preferably a screen. It is a bowl type centrifuge.

[0037] このようにして得られた高純度テレフタル酸ケーキ Lを、乾燥装置 16で乾燥させるこ とにより、残留する付着液を除去することで、高純度テレフタル酸結晶 Mを得ることが できる。上記乾燥装置 16は回転式乾燥機や流動床式乾燥機等が挙げられ、通気ガ スの存在下、水蒸気等の熱源に用いて乾燥出口操作温度が 70°C〜180°Cで実施さ れる。 [0037] The high-purity terephthalic acid crystal L obtained by drying the high-purity terephthalic acid cake L in the drying device 16 to remove the remaining adhesion liquid can be obtained. The drying device 16 is, for example, a rotary drier or a fluidized bed drier, and is operated at a drying outlet operation temperature of 70 ° C to 180 ° C using a heat source such as steam in the presence of ventilation gas. .

[0038] 一方で、上記の一次分離母! ¾ [と洗浄排出液 Kには、まだ有効成分が含まれており 、これらを出来るだけ多く回収して、高純度テレフタル酸結晶にする必要がある。なお 上記有効成分とは、上記テレフタル酸と、例えばパラトルィル酸のように酸ィ匕等により 上記テレフタル酸にすることができるその他の化合物とを 、 、、溶解して 、る成分と 固形分とをどちらも含む。また、上記固形分とは、上記有効成分のうち、析出している 成分を示す。  [0038] On the other hand, the above primary separation mother! ¾ [and the washing effluent K still contain active ingredients, and it is necessary to recover as much of these as possible to make high-purity terephthalic acid crystals. The active ingredient refers to the terephthalic acid and another compound that can be converted to the terephthalic acid by acidification or the like such as paratoluic acid. Including both. In addition, the solid content refers to a precipitated component of the active ingredient.

[0039] まず、洗浄排出液 Kは、パラトルィル酸の含有量が少な 、ため、直接的に上記の溶 解工程 (b)の溶媒として戻すと望ま 、。  First, since the washing discharge K has a low content of paratoluic acid, it is desirable to return it directly as the solvent in the dissolving step (b).

[0040] また、洗浄排出液 Kが固形分を含んでいる場合には、溶解工程 (b)に戻す前に、 別の固液分離装置によって固液分離してもよい。上記の固液分離及び洗浄装置 15 で固液分離と洗浄とをまとめて行うと、目漏れが発生しやすいために、洗浄排出液 K には固形分が含まれていることがあるためである。また、上記の別の固液分離装置に よって分離する前に、予め晶析を行っておくと、固液分離により回収できる成分量が 向上する。その際には、固形分を晶析槽 14などに送って回収してもよいし、分離した 液体分を上記のスラリー化槽 12で用いる溶媒として用いてもょ 、。 [0040] Further, when the washing effluent K contains a solid, solid-liquid separation may be performed by another solid-liquid separator before returning to the dissolving step (b). This is because if the solid-liquid separation and washing are performed at the same time by the solid-liquid separation and washing device 15 as described above, the omission is likely to occur, and the washing effluent K may contain solids. . Further, if crystallization is performed in advance before separation by the above-mentioned solid-liquid separation device, the amount of components that can be recovered by solid-liquid separation is improved. At that time, the solid content may be collected by sending it to the crystallization tank 14 or the like, or separated. The liquid component may be used as the solvent used in the slurrying tank 12 described above.

[0041] 次に、一次分離母銜については、第二晶析工程 (f)として、一次分離母銜を複数 段の放圧冷却槽を用いて冷却し、一次分離母銜が含有する上記テレフタル酸ゃパ ラトルイル酸等力もなる二次結晶を晶析させて、これを回収する。複数段とは直列に 放圧冷却槽を 2段以上設置した構成であり、各槽において圧力見合いでそれぞれの 温度を順次下げることにより溶解成分を析出させる。 Next, as for the primary separated mother bite, in the second crystallization step (f), the primary separated mother bite is cooled using a plurality of pressure relief cooling tanks, and the terephthalic acid contained in the primary separated mother bite is contained. Crystallize secondary crystals that have the same strength as acid-paratoluic acid and collect them. The multi-stage means that two or more pressure relief cooling tanks are installed in series, and in each tank, dissolved components are deposited by sequentially lowering the respective temperatures according to the pressure.

[0042] なお、上記放圧冷却槽とは、導入する液体の圧力よりも低圧にした槽であり、その 槽内の圧力における上記液体の主成分の沸点が、導入前の上記液体の温度以下で あるようにしたものをいう。この放圧冷却槽に液体を導入すると、液体の一部は蒸発し 、液体の残りは変化後の圧力下における沸点まで冷却される。このとき、液体が溶液 である場合には、冷却後の溶解度を超えた分の溶質を晶析させる。 [0042] The pressure-relieving cooling tank is a tank whose pressure is lower than the pressure of the liquid to be introduced, and the boiling point of the main component of the liquid at the pressure in the tank is equal to or lower than the temperature of the liquid before introduction. It means something that is When the liquid is introduced into the pressure-release cooling tank, a part of the liquid evaporates, and the rest of the liquid is cooled to the boiling point under the changed pressure. At this time, if the liquid is a solution, the solute that exceeds the solubility after cooling is crystallized.

[0043] 複数段の上記放圧冷却槽を用いて段階的に冷却し、晶析させることによって、一段 のみの放圧冷却や、一段の放圧冷却と熱交換による冷却とを組み合わせて晶析させ る場合に比べて、冷却及び Zまたは晶析が不均一化するのを抑えることができるの で、より徹底した晶析を行えることにより得られる固形物の量が増し、かつその得られ る固形物の性状が取り扱いやすいものとなる。また、上記放圧冷却槽内や、上記放 圧冷却槽に導入する配管で上記有効成分の結晶が固着するのを抑えることもできる [0043] By using a plurality of stages of the above-mentioned pressure-reducing cooling tanks to perform stepwise cooling and crystallization, crystallization is performed by only one-stage pressure-reducing cooling or a combination of one-stage pressure-reducing cooling and cooling by heat exchange. As compared with the case where the crystallization is performed, non-uniformity of cooling and Z or crystallization can be suppressed, so that a more thorough crystallization can be performed, so that the amount of solids obtained and increased The properties of the solid are easy to handle. Further, it is also possible to suppress the crystal of the active ingredient from being fixed in the pressure-reducing cooling tank or in a pipe introduced into the pressure-reducing cooling tank.

[0044] このため、上記の複数段の放圧冷却槽のうち、最初の放圧冷却槽である第一放圧 冷却槽 17は、圧力が大気圧以上であり、かつ上記固液分離工程 (e)から排出される 一次分離母! ¾ [の圧力未満であることが望ましぐ温度は 100°C以上であり、かつ上 記固液分離工程 (e)から排出される一次分離母! ¾ [の温度未満 (例えば、放圧蒸発さ せて 100°C〜固液分離工程 (e)における固液分離時の温度未満に冷却すればよぐ 放圧蒸発は、大気圧まで放圧蒸発させることが好ましい。)であることが望ましい。大 気圧未満にまで一挙に減圧すると、減圧幅が大きすぎて晶析が不均一化したり、得 られる結晶の大きさが小さくなつたりして、複数段の放圧冷却槽を設ける意義が薄れ てしまう。また温度は、大気圧における水の沸点が 100°Cであるため、それ以上とな る。一方、一次分離母銜の圧力と温度を下回らなければ晶析が出来ない。 [0045] また、上記の複数段の放圧冷却槽のうち、少なくとも一つは、その放圧冷却槽の内 壁との間隔が 10mm以上かつ 50mm以下である攪拌翼を有するものであると望まし い。また、この攪拌翼は、上記の間隔で上記放圧冷却槽の内壁と近接している部分 が長いほど望ましぐアンカー型攪拌翼であるとより望ましい。上記放圧冷却槽では 純度の比較的低 、テレフタル酸が晶析するため、通常の攪拌翼を用いて 、るだけで は、壁面に上記テレフタル酸等の結晶が付着して固化してしまうおそれがある。そこ で、槽の壁面に近接して回転する攪拌翼によって、壁面近傍の液体を適度に流動さ せると、上記壁面への上記テレフタル酸等の付着を抑えることができる。ただし、近す ぎると上記放圧冷却槽そのものを傷つけるおそれがあるので、上記攪拌翼と上記壁 面との間隔は 10mm以上であることが望ましい。特に、最初の放圧冷却槽である第 一放圧冷却槽 17は、最も晶析量が多くなる可能性が高いため、第一放圧冷却槽 17 に上記の攪拌翼が設けられているとより望ましい。また、これらの複数段の放圧冷却 槽のすべてに上記の攪拌翼が設けられて 、てもよ 、。 [0044] For this reason, among the above-described multiple-stage pressure-release cooling tanks, the first pressure-release cooling tank 17, which is the first pressure-release cooling tank, has a pressure equal to or higher than the atmospheric pressure and the solid-liquid separation step ( e) Primary separation mother discharged from!温度 The desired temperature is below 100 ° C and the primary separation mother discharged from the solid-liquid separation step (e)! (E.g., if the pressure is below 100 ° C (e.g., the pressure is reduced to 100 ° C and the temperature is lower than the temperature at the time of solid-liquid separation in the solid-liquid separation step (e)). Is preferable.). If the pressure is reduced to a pressure lower than atmospheric pressure at once, the width of the pressure reduction is too large to make the crystallization non-uniform, and the size of the obtained crystals is becoming smaller. I will. The temperature is higher because the boiling point of water at atmospheric pressure is 100 ° C. On the other hand, crystallization cannot be performed unless the pressure and temperature of the primary separation mouthpiece are lower than the pressure and temperature. [0045] Further, at least one of the above-described multi-stage pressure-reducing cooling tanks is desirably provided with a stirring blade having a distance from the inner wall of the pressure-reducing cooling tank of 10 mm or more and 50 mm or less. Better. In addition, it is more desirable that the stirring blade is an anchor-type stirring blade that is more desirable as the portion adjacent to the inner wall of the pressure-release cooling tank at the above-mentioned interval is longer. Since the purity of the terephthalic acid is relatively low in the above-mentioned pressure-reducing cooling bath, terephthalic acid is crystallized. There is. When the liquid in the vicinity of the wall is appropriately flowed by the stirring blade rotating near the wall of the tank, the adhesion of the terephthalic acid or the like to the wall can be suppressed. However, the distance between the stirring blade and the wall surface is desirably 10 mm or more, because if it is too close, the pressure relief cooling tank itself may be damaged. In particular, the first pressure relief cooling tank 17, which is the first pressure relief cooling tank, is most likely to have the largest amount of crystallization. More desirable. In addition, the above-described stirring blades may be provided in all of the plurality of pressure-reducing cooling tanks.

[0046] 上記の放圧冷却槽で、上記アンカー型攪拌翼を用いて一次分離母! ¾ [力 上記二 次結晶を晶析させる際、上記アンカー型攪拌翼の回転数は 3. Orpm以上、 30rpm 以下であることが好ましぐ 5rpm以上、 20rpm以下であるとより望ましい。 3. Orpmに 満たないと、攪拌の効果が発揮しきれずに、液面より下の内壁側面に晶析した結晶 が塊として付着するおそれがある。一方、 30rpmの速度があれば攪拌には十分であ り、それ以上速くしてもエネルギーの無駄であるば力りでなぐ一次分離母! ¾ [が放圧 冷却槽内で飛び散らされることで、槽の液面より上に塊が付着する要因となる。  [0046] In the above-mentioned pressure-reducing cooling tank, the primary separation mother using the anchor-type stirring blade! ¾ [force] When crystallizing the secondary crystal, the rotation speed of the anchor-type stirring blade is 3.Orpm or more, The speed is preferably 30 rpm or less, more preferably 5 rpm or more and 20 rpm or less. 3. If the rotation speed is less than Orpm, the effect of stirring cannot be fully exhibited, and the crystallized crystals may adhere to the inner wall side surface below the liquid surface as a lump. On the other hand, a speed of 30 rpm is sufficient for agitation, and even if the speed is higher than that, it is a waste of energy. ¾ is scattered in the cooling tank, causing lumps to adhere above the liquid level in the tank.

[0047] さらに、上記の複数段の放圧冷却槽では、上記テレフタル酸だけではなぐ上記パ ラトルィル酸やその他の副生成物も出来うる力ぎり晶析させることが望ましい。この第 ニ晶析工程 (f)でも晶析できな 、成分は、後述の濾過工程 (g)で回収することができ ず、二次分離母液 Pとして排出されるため、晶析させる物質を上記テレフタル酸に限 らず、全ての有効成分を出来る限り晶析させて、回収できるようにする。  [0047] Further, in the above-described multi-stage pressure-reducing cooling tank, it is desirable to crystallize vigorously as much as possible, not only the terephthalic acid but also the paratolic acid and other by-products. Components that cannot be crystallized in the second crystallization step (f) cannot be recovered in the filtration step (g) described below and are discharged as a secondary mother liquor P. Not only terephthalic acid but also all active ingredients should be crystallized as much as possible so that they can be recovered.

[0048] このため、本発明においては上記の複数段の放圧冷却槽のうち、最後の放圧冷却 槽である最終放圧冷却槽 18の圧力を大気圧未満に減圧し、冷却槽の温度を 40〜8 0°C、好ましくは 50〜70°Cとする。具体的には、最終放圧冷却槽 18の圧力は 0. 00 7MPa以上、 0. 03MPa以下であり、好ましく ίま 0. 02〜0. 03MPaである。圧力力0 . 03MPaを超え、また、温度が高すぎると、晶析が徹底せず、回収が不十分になつ てしまうおそれがある。一方で、圧力が 0. 007MPa未満であり、温度が低すぎると、 減圧度が高いので最終放圧冷却槽 18への負担が大きくなりすぎるおそれがある。 [0048] For this reason, in the present invention, the pressure in the final pressure-reducing cooling tank 18, which is the last pressure-reducing cooling tank among the above-described multiple pressure-releasing cooling tanks, is reduced to below atmospheric pressure, and the temperature of the cooling tank is reduced. To 40 to 80 ° C, preferably 50 to 70 ° C. Specifically, the pressure in the final pressure relief cooling tank 18 is 0.00 It is 7 MPa or more and 0.03 MPa or less, preferably 0.02 to 0.03 MPa. If the pressure exceeds 0.03 MPa and the temperature is too high, the crystallization may not be thorough and the recovery may be insufficient. On the other hand, if the pressure is less than 0.007 MPa and the temperature is too low, the pressure on the final pressure-reducing cooling tank 18 may be too large because the degree of pressure reduction is high.

[0049] なお、上記の第一放圧冷却槽 17と最終放圧冷却槽 18との間に、さらに単数、又は 複数の放圧冷却槽を設けて、段階的な晶析を行ってもよ!ヽ。  [0049] A single or a plurality of pressure-release cooling tanks may be provided between the first pressure-release cooling tank 17 and the final pressure-release cooling tank 18 to perform stepwise crystallization. ! ヽ.

[0050] 上記の第二晶析工程 (f)で上記テレフタル酸等を晶析することによって得られた二 次スラリー Oは、濾過工程 (g)として濾過機 19に導入し、二次分離母液 Pと二次結晶 Qとを固液分離する。  [0050] The secondary slurry O obtained by crystallizing the terephthalic acid or the like in the second crystallization step (f) is introduced into the filter 19 as a filtration step (g), and the secondary separation mother liquor is obtained. P and secondary crystal Q are separated into solid and liquid.

[0051] ここで用いる濾過機 19は、フィルター下流側を大気圧以上の圧力状態にし、さらに 、濾過機のフィルター上流側をフィルター下流側よりも高 、圧力状態にできるもので あり、かつ順方向へケーキ濾過により固液分離を行うものであると、濾過を進行させ やすくなり望ましい。上記の二次スラリー Oは、上記の複数段の放圧冷却槽で晶析さ せることにより取り扱 、やすくはなって!/、るものの、付着しやす 、性状ではあるので、 通常の濾過では進行しにくいためである。なお、上記フィルター上流側とは上記第二 晶析工程 (f)力 送られてきた側を 、、上記フィルター下流側とは二次分離母液 P を排出する側をいい、順方向とは二次スラリー Oや二次分離母液 Pの流れが上記フィ ルター上流側から上記フィルター下流側へ向力う方向をいう。また上記のケーキ濾過 とは、フィルター細孔上で架橋現象によって粒子が捕捉され、濾過開始後間もなぐ フィルタ一面上に濾過ケーキ層が形成され、そのケーキ層がその後の濾過に対して フィルターの作用をしつつ濾過が進行する機構である。このように操作する濾過機 1 9としては、例えば、石川島播磨重工業 (株)製のフンダバックフィルター、月島機械( 株)製のクリケットフィルターなどが挙げられる。  [0051] The filter 19 used here can set the downstream side of the filter to a pressure state higher than the atmospheric pressure, and further, can set the upstream side of the filter to a pressure higher than that of the downstream side of the filter, and can also set the forward direction. It is desirable that solid-liquid separation be performed by cake filtration because filtration can be easily performed. The above-mentioned secondary slurry O is easier to handle and handle by crystallizing it in the above-mentioned multi-stage pressure-reducing cooling tank! / Although it is easy to adhere and has properties, it is difficult for ordinary filtration. This is because it is difficult to progress. The upstream side of the filter refers to the side to which the second crystallization step (f) force has been sent, the downstream side of the filter refers to the side for discharging the secondary separation mother liquor P, and the forward direction refers to the secondary side. This refers to the direction in which the flow of the slurry O or the secondary separation mother liquor P is directed from the upstream side of the filter to the downstream side of the filter. In the above-mentioned cake filtration, particles are trapped on the filter pores by a cross-linking phenomenon, a filter cake layer is formed on one surface of the filter shortly after the start of filtration, and the cake layer is used as a filter for the subsequent filtration. This is a mechanism in which filtration proceeds while acting. Examples of the filter 19 operated in this manner include a Fundaback filter manufactured by Ishikawajima-Harima Heavy Industries, Ltd., and a cricket filter manufactured by Tsukishima Kikai Co., Ltd.

[0052] 上記の二次結晶 Qは上記の工程のいずれかに戻して有効成分を再利用することが 望ましいが、特に上記の酸ィ匕工程 (a)に戻すとより望ましい。上記の通り、二次結晶 Qには上記テレフタル酸だけではなぐ部分還元された上記パラトルィル酸などの不 純物が含まれている力 これらはそのままでは上記テレフタル酸の製品として使えな い。そこで、上記の酸ィ匕工程 (a)で酸ィ匕することにより、これらの不純物を上記テレフ タル酸とすることができ、この発明に力かる高純度テレフタル酸の製造方法全体の収 率を向上させることができる。 It is desirable to return the secondary crystal Q to any of the above steps to reuse the active ingredient, but it is more preferable to return to the above-mentioned oxidation step (a). As described above, the secondary crystal Q contains not only terephthalic acid but also partially reduced impurities such as paratoluic acid. These cannot be used as such as terephthalic acid products. Therefore, these impurities are removed by the above-mentioned terephthalic acid by oxidizing in the above-mentioned acidifying step (a). Tallic acid can be used, and the overall yield of the method for producing high-purity terephthalic acid according to the present invention can be improved.

[0053] 一方、上記の二次分離母液 Pは、その懸濁物質濃度が 200mgZL以下であること が望ましぐ lOOmgZL以下であることが更に望ましぐ 50mgZL以下であると特に 望ましい。なお、ここで懸濁物質濃度とは、二次分離母液 Pの全体重量に対する、溶 媒に溶けずに分散しているパラトルィル酸などの浮遊物の重量を意味し、 JIS K 0 101に記載された方法に従って分析される。二次分離母液 Pの少なくとも一部は、系 内の不純物濃度を高くしすぎないために系外に排出されるため、二次分離母液 Pに 含まれるパラトルィル酸が廃棄されることになり、この発明に力かるテレフタル酸の製 造方法全体の収率を下げることになつてしまうからである。更に、二次分離母液 Pの 少なくとも一部を直接に又は間接的に製造工程の溶媒として再利用する場合には、 ノラトルィル酸の系内蓄積を抑制する必要がある。  On the other hand, the above-mentioned secondary separated mother liquor P preferably has a suspended substance concentration of 200 mg ZL or less, more preferably 100 mg ZL or less, and still more preferably 50 mg ZL or less. Here, the suspended substance concentration means the weight of suspended matter such as paratoluic acid which is dispersed without being dissolved in the solvent with respect to the total weight of the secondary separation mother liquor P, and is described in JIS K 0101. Analyzed according to the method. At least a part of the secondary separation mother liquor P is discharged out of the system because the concentration of impurities in the system is not too high, so that paratoluic acid contained in the secondary separation mother liquor P is discarded. This is because the overall yield of the method for producing terephthalic acid, which is important for the invention, is reduced. Further, when at least a part of the secondary separation mother liquor P is directly or indirectly reused as a solvent in the production process, it is necessary to suppress the accumulation of noraturilic acid in the system.

[0054] 二次分離母液中 Pに含まれるパラトルィル酸の除去には、二次分離母液中 Pを合 成吸着材と接触させる方法がある。上記合成吸着材としては、通常は有機合成吸着 剤を用いる。 ί列えば、 SEPABEADS SP825, SP850, SP207 (SEPABEADS は三菱化学社の登録商標)、 AMBERLITE XAD— 4、 XAD— 16 (AMBERLIT Εはローム &ハース社の登録商標)などのスチレンージビュルベンゼン系の合成吸 着剤や、 DIAION HP2MG (DIAIONは三菱化学社の登録商標)、 AMBERLIT E XAD— 7、 XAD— 8などのアクリル系合成吸着剤を用いることができる。好ましく は無極性の有機合成吸着剤、特にモノビニルイ匕合物とポリビ-ルイ匕合物との多孔質 共重合体力もなる合成吸着剤、なかでもスチレン—ジビュルベンゼン系合成吸着剤 を用いる。パラトルィル酸はベンゼン環を有しているので、スチレン一ジビニルベンゼ ン系の合成吸着剤に吸着され易い。吸着材の比表面積は通常 400〜1500m2Zg、 好ましくは 600〜1000m2Zg、細孔容積は通常 0. 5〜3mLZg、好ましくは 1. 0〜 2. OmL/g,細孔径は通常 10〜: LOOOA、好ましくは 50〜50θΑである。吸着剤は 、通常は充填層高が 1. 5〜4. Om程度となるように吸着塔に充填する。被処理液の 供給停止をどの時点で行うかにもよるが、一般に充填層高が低すぎると吸着剤の利 用効率が低下する。吸着塔への被処理液の供給速度は LVが通常 0. 5〜30mZhr 、 SVが通常 0. 5〜20hr_1である。吸着処理された二次分離母液中 Pはパラトルィル 酸濃度が低減されており、好ましくは溶解工程の溶媒や固液分離工程後の分離ケー キ洗浄液として製造工程へ再利用が容易となる。また、パラトルィル酸はパラキシレン カもテレフタル酸へ酸ィ匕される際の酸ィ匕中間体であり、合成吸着剤に吸着させたパ ラトルイル酸は脱離液を用いて回収し、酸ィ匕工程へ供給することが好まし ヽ。 [0054] For removal of paratoluic acid contained in P in the secondary separated mother liquor, there is a method of bringing P in the secondary separated mother liquor into contact with the synthetic adsorbent. As the synthetic adsorbent, an organic synthetic adsorbent is usually used. For example, SEPABEADS SP825, SP850, SP207 (SEPABEADS is a registered trademark of Mitsubishi Chemical Corporation), AMBERLITE XAD-4, XAD-16 (AMBERLITΕ is a registered trademark of Rohm & Haas Company) A synthetic adsorbent, an acrylic synthetic adsorbent such as DIAION HP2MG (DIAION is a registered trademark of Mitsubishi Chemical Corporation), AMBERLITE XAD-7, XAD-8, etc. can be used. Preferably, a non-polar organic synthetic adsorbent, especially a synthetic adsorbent having a porous copolymer power of a monovinyl conjugate and a polyvinyl conjugate, especially a styrene-dibutylbenzene synthetic adsorbent is used. Since paratoluic acid has a benzene ring, it is easily adsorbed by a styrene-divinylbenzene-based synthetic adsorbent. The specific surface area of the adsorbent is usually 400~1500m 2 Zg, preferably 600~1000m 2 Zg, pore volume is typically 0. 5~3mLZg, preferably 1. 0~ 2. OmL / g, pore size is usually 10 to : LOOOA, preferably 50-50〜. The adsorbent is usually packed in the adsorption tower so that the height of the packed bed is about 1.5 to 4. Om. Depending on when the supply of the liquid to be treated is stopped, in general, if the height of the packed bed is too low, the utilization efficiency of the adsorbent decreases. The supply rate of the liquid to be treated to the adsorption tower is typically 0.5 to 30 mZhr for LV. , SV is usually 0. 5~20hr _1. The P in the secondary separation mother liquor that has been subjected to the adsorption treatment has a reduced paratoluic acid concentration, so that it can be easily reused in the production step, preferably as a solvent in the dissolution step or a washing liquid for the separation cake after the solid-liquid separation step. In addition, paratoluic acid is an intermediate in the conversion of paraxylene to terephthalic acid, and the paratoluic acid adsorbed on the synthetic adsorbent is recovered using a desorbing solution, and It is preferable to supply to the process 工程.

[0055] 以下、実施例によりこの発明を具体的に説明する。 Hereinafter, the present invention will be described specifically with reference to examples.

[懸濁物質濃度の測定方法 (JIS K 0101) ]  [Method for measuring suspended solids concentration (JIS K 0101)]

懸濁物質 (水中に懸濁している物質)は次の操作のとおり、試料をろ過し、ろ過材上 に残留した物質を 105〜: L 10°Cで乾燥し、質量をはかる。  For suspended substances (substances suspended in water), filter the sample and dry the substance remaining on the filter media at 105 ° C as follows:

(a)ガラス繊維ろ紙を用いる場合はあらかじめろ過器に取り付け、水で十分に吸引洗 浄した後、このろ過材を、時計皿上に置き、 105〜110でで約1時間加熱し、デシケ 一ター中で放冷した後、その質量をはかる。  (a) When using a glass fiber filter paper, attach it to a filter in advance and thoroughly wash it with water.After that, place this filter material on a watch glass and heat it at 105-110 for about 1 hour. After cooling in the oven, measure its mass.

(b)ろ過材をろ過器に取り付け、試料の適量をろ過器に注ぎいれて吸引ろ過する。 試料容器及びろ過管の器壁に付着した物質は、水でろ過材上に洗い落とし、ろ過材 上の残留物質に合わせ、これを水で数回洗浄する。  (b) Attach a filter medium to the filter, pour an appropriate amount of the sample into the filter, and perform suction filtration. The substance adhering to the sample container and the wall of the filter tube should be washed off on the filter medium with water, adjusted to the residual substance on the filter medium, and washed several times with water.

(c)残留物は、ろ過材とともにピンセットなどを用いてろ過器力 注意して取り外し、 (a )で用いた時計皿上に移し、 105〜110°Cで 2時間加熱し、先のデシケーター中で放 冷した後、その質量をはかる。  (c) Carefully remove the residue with a filter medium using tweezers etc. together with the filter media, transfer to the watch glass used in (a), heat at 105-110 ° C for 2 hours, and place in the desiccator. After cooling in, measure the mass.

(d)次の式によって懸濁物質 (mgZDを算出する。  (d) The suspended substance (mgZD is calculated by the following formula.

[0056] S= (a-b) X 1000/V [0056] S = (a-b) X 1000 / V

ここに、 S:懸濁物質 (mgZD、 a:懸濁物質を含んだろ過材及び時計皿の質量 (mg) 、 b:ろ過材及び時計皿の質量 (mg)、 V:試料 (ml)  Where, S: Suspended substance (mgZD, a: Weight of filter medium and watch glass containing suspended substance (mg), b: Weight of filter medium and watch glass (mg), V: Sample (ml)

実施例 1  Example 1

[0057] パラキシレン、触媒 (酢酸コバルト、酢酸マンガンの酢酸溶液および臭化水素)を含 む酢酸溶液、後段の固液分離工程からリサイクルされる分離母液及び、空気を撹拌 槽に連続的に供給し、操作温度 190°C、操作圧力 1. 23MPa (絶対圧)で、滞留時 間 1時間になるように液面を調整しながら酸ィ匕反応を行った。また、留出蒸気は多段 の凝縮器により最終的に 40°Cまで冷却させ、排ガス中の酸素濃度が 2. 5vol%に調 整して運転を実施した。また各凝縮器カゝら得られる凝縮液は統合して酸ィ匕反応器に 還流し、その一部は反応抜き出しスラリーの母液中水分濃度が 10重量%となるように 抜き出した。酸ィ匕反応器力も抜き出されるスラリーのスラリー濃度は 35重量%、反応 母液中のコバルト Zマンガン Z臭素濃度が 300Z300Z1000重量 ppmであった。 [0057] An acetic acid solution containing para-xylene and a catalyst (an acetic acid solution of cobalt acetate and manganese acetate and hydrogen bromide), a separated mother liquor recycled from a subsequent solid-liquid separation step, and air are continuously supplied to the stirring tank. Then, an oxidizing reaction was performed at an operating temperature of 190 ° C. and an operating pressure of 1.23 MPa (absolute pressure) while adjusting the liquid level so that the residence time was 1 hour. The distillate vapor is finally cooled to 40 ° C by a multi-stage condenser, and the oxygen concentration in the exhaust gas is adjusted to 2.5 vol%. The operation was carried out after setting. The condensate obtained from each condenser was integrated and refluxed to the oxidation reactor, and a part of the condensate was withdrawn so that the concentration of water in the mother liquor of the slurry withdrawn was 10% by weight. The slurry concentration of the slurry from which the reactor power was also extracted was 35% by weight, and the concentration of cobalt Z manganese Z bromine in the reaction mother liquor was 300Z300Z1000ppm by weight.

[0058] 酸ィ匕反応器力も抜き出されたスラリーは、空気と共に撹拌槽に連続的に供給し、操 作温度 181°C、操作圧力 1. 15MPa (絶対圧)で、滞留時間 15分になるように液面 調整しながら低温追酸化反応を行った。また、留出蒸気は多段の凝縮器により最終 的に 40°Cまで冷却させ、排ガス中の酸素濃度が 6vol%に調整して運転を実施した。 また各凝縮器カゝら得られる凝縮液は統合して低温追酸ィ匕反応器に還流した。  [0058] The slurry from which the power of the reactor was also withdrawn was continuously supplied to a stirring tank together with air, and at an operating temperature of 181 ° C, an operating pressure of 1.15 MPa (absolute pressure), and a residence time of 15 minutes. The low-temperature re-oxidation reaction was performed while adjusting the liquid level so as to be as follows. The distillate steam was finally cooled to 40 ° C by a multi-stage condenser, and the operation was performed with the oxygen concentration in the exhaust gas adjusted to 6 vol%. The condensed liquid obtained from each condenser was integrated and refluxed to the low-temperature re-oxidation reactor.

[0059] 低温追酸ィ匕反応器力も抜き出されたスラリーは、 90°Cまで晶析した後に、この晶析 で得られたスラリーをロータリーバキュームフィルターに供給して固液分離と洗浄を行 つた。ここで操作圧力は大気圧であった。分離された粗テレフタル酸ケーキはスチー ムロータリードライヤーで乾燥させて粗テレフタル酸結晶を得た。  [0059] The slurry from which the power of the low-temperature refining reactor was extracted was crystallized to 90 ° C, and the slurry obtained by the crystallization was supplied to a rotary vacuum filter to perform solid-liquid separation and washing. I got it. Here, the operating pressure was atmospheric pressure. The separated crude terephthalic acid cake was dried with a steam rotary dryer to obtain crude terephthalic acid crystals.

[0060] この粗テレフタル酸を、図 1に示す高純度テレフタル酸の製造工程に供与した。溶 媒として水 Dを使用して粗テレフタル酸を 30重量%含む高温高圧である水溶液 E 'を 得た。上記図 1に示す工程において、水添反応器 13に送られる水溶液 E'の温度及 び圧力を、それぞれ、 290°C、 8. 7MPa (89kgfZcm2 'ゲージ)とした。 [0060] This crude terephthalic acid was supplied to the process for producing high-purity terephthalic acid shown in Fig. 1. Using water D as a solvent, an aqueous solution E 'containing 30% by weight of crude terephthalic acid at high temperature and pressure was obtained. In the process shown in FIG. 1, the temperature and pressure of the aqueous solution E ′ sent to the hydrogenation reactor 13 were 290 ° C. and 8.7 MPa (89 kgfZcm 2 ′ gauge), respectively.

[0061] これに引き続く第一晶析工程 (d)では、 5つの上記晶析槽を直列に接続した晶析 槽 14を用いて段階的に放圧蒸発により冷却させ、最終的に温度 155°Cまで冷却し、 溶質を晶析させた。晶析により得られたスラリー Hは、固液分離及び洗浄装置 15で、 一次結晶を含んだ高純度テレフタル酸ケーキ Lと、一次分離母! ¾ [とに分離させ、上 記高純度テレフタル酸ケーキ Lは洗浄水で洗浄後、乾燥装置 16で乾燥させた後、高 純度テレフタル酸結晶 Mとして回収した。  [0061] In the subsequent first crystallization step (d), the crystallization tank 14 in which the five crystallization tanks are connected in series is cooled stepwise by depressurization evaporation, and finally cooled to a temperature of 155 ° C. After cooling to C, the solute was crystallized. The slurry H obtained by the crystallization is separated into a high-purity terephthalic acid cake L containing primary crystals and a primary separation mother! ¾ [The high-purity terephthalic acid cake L was washed with washing water, dried in a drier 16 and recovered as high-purity terephthalic acid crystals M.

[0062] 一方で、一次分離母銜は、アンカー型攪拌翼を設けた第一放圧冷却槽 17におい て、圧力を大気圧まで低下させ、 100°Cまで放圧冷却させて、一段目の第二晶析ェ 程 (f)となる晶析を行った。上記アンカー型攪拌翼の回転数は 10rpm、上記アンカ 一型攪拌翼と内壁側面との隙間は 10mmとした。  [0062] On the other hand, the primary separating mother bite is reduced in pressure to the atmospheric pressure in the first pressure relief cooling tank 17 provided with the anchor type stirring blades, and is then cooled by releasing the pressure to 100 ° C. The crystallization to be the second crystallization step (f) was performed. The rotation speed of the anchor type stirring blade was 10 rpm, and the gap between the anchor type stirring blade and the side surface of the inner wall was 10 mm.

[0063] 次いで、得られた 100°Cの中間スラリー Nを、スチームェジェクタ一を備えた最終放 圧冷却槽 18に導入し、操作圧力を 0. 02MPaとし、 60°Cまで減圧冷却した。こうして 得られた二次スラリー Oを、濾過機 19として石川播磨重工業 (株)製のフンダバックフ ィルター (R56— 86— 25型)に投入し、固液分離した。ここで得られた二次分離母液 Pの懸濁物質濃度を上記方法に従って測定したところ、 30mgZlであった。 [0063] Next, the obtained intermediate slurry N at 100 ° C was finally discharged with a steam ejector. It was introduced into the pressure cooling tank 18, the operating pressure was set to 0.02 MPa, and the pressure was reduced to 60 ° C. under reduced pressure. The secondary slurry O thus obtained was charged as a filter 19 into a Fundaback filter (R56-86-25) manufactured by Ishikawa-Harima Heavy Industries, Ltd., and was subjected to solid-liquid separation. The suspended substance concentration of the secondary mother liquor P obtained here was measured according to the above method, and was 30 mgZl.

[0064] この結果、上記の第一放圧冷却槽 17及び最終放圧冷却槽 18では、 1ヶ月間、内 壁側面に析出物が付着、成長することが無く安定して二次結晶 Qの回収処理をする ことができた。 [0064] As a result, in the first pressure-release cooling tank 17 and the final pressure-release cooling tank 18, the precipitates do not adhere to and grow on the inner wall side surface for one month, and the secondary crystal Q The collection process could be performed.

[0065] 本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲 を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明ら かである。  Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. is there.

[0066] 本出願は、 2004年 5月 28日出願の日本特許出願 (特願 2004— 159786)に基づ くものであり、その内容はここに参照として取り込まれる。  [0066] This application is based on Japanese Patent Application (No. 2004-159786) filed on May 28, 2004, the contents of which are incorporated herein by reference.

産業上の利用可能性  Industrial applicability

[0067] 本発明により、高純度テレフタル酸を製造するにあたり、上記一次分離母液を冷却 して析出される二次結晶の回収率を高め、濁度 (SS濃度)の低い二次分離母液を得 ることができる、高純度テレフタル酸の製造方法を提供することができる。また、冷却 処理に際して、閉塞の原因となる系内付着物の形成や、塊状物の発生を抑制できる 高純度テレフタル酸の製造方法を提供することができる。本発明の工業的価値は顕 著である。 According to the present invention, in producing high-purity terephthalic acid, the primary separated mother liquor is cooled to increase the recovery rate of secondary crystals precipitated, and a secondary separated mother liquor having a low turbidity (SS concentration) is obtained. And a method for producing high-purity terephthalic acid. In addition, it is possible to provide a method for producing high-purity terephthalic acid, which can suppress formation of deposits in the system that cause blockage and generation of lumps during cooling treatment. The industrial value of the present invention is remarkable.

Claims

請求の範囲 The scope of the claims [1] パラキシレンを酸化して、 4 カルボキシベンズアルデヒドを含有する粗テレフタル 酸を得る酸化工程 (a)ゝ  [1] Oxidation step of oxidizing para-xylene to obtain crude terephthalic acid containing 4-carboxybenzaldehyde (a) ゝ 上記粗テレフタル酸を、高温高圧下で水溶媒に溶解させて粗テレフタル酸水溶液 を得る溶解工程 (b)ゝ  A dissolving step of dissolving the above crude terephthalic acid in an aqueous solvent under high temperature and pressure to obtain a crude terephthalic acid aqueous solution (b) 上記粗テレフタル酸水溶液を、触媒の存在下で水素と接触させることにより、上記 4 カルボキシベンズアルデヒドをパラトルィル酸に還元した還元反応液を得る還元ェ 程 (c)ゝ  A reduction step (c) of obtaining a reduction reaction solution obtained by reducing the carboxybenzaldehyde to paratoluic acid by bringing the crude terephthalic acid aqueous solution into contact with hydrogen in the presence of a catalyst. 上記還元反応液を放圧蒸発させて 120〜200°Cに冷却し、高純度テレフタル酸の 結晶を晶析させる晶析工程 (d)、  A crystallization step (d) of evaporating the reduction reaction solution under reduced pressure and cooling to 120 to 200 ° C to crystallize high-purity terephthalic acid crystals. 上記晶析工程 (d)で得られたスラリーを、上記高純度テレフタル酸結晶からなる結 晶と、分離母液とに固液分離する固液分離工程 (e)、  A solid-liquid separation step (e) of solid-liquid separation of the slurry obtained in the crystallization step (d) into crystals comprising the high-purity terephthalic acid crystals and a separation mother liquor; 上記分離母液を冷却し、上記固液分離工程 (e)で得られた分離母液に含有される テレフタル酸やパラトルィル酸から主としてなる結晶を晶析させる晶析工程 (f)、 を有する高純度テレフタル酸の製造方法にぉ 、て、  Cooling the separated mother liquor and crystallizing a crystal mainly composed of terephthalic acid or paratoluic acid contained in the separated mother liquor obtained in the solid-liquid separation step (e) (f), In the method for producing the acid, 圧力を下げることにより母液中の水溶媒を蒸発させて冷却を行う冷却槽を複数段用 いて冷却し、そのうちの最後の冷却槽を大気圧未満に減圧し、最後の冷却槽の温度 を 40〜70°Cとする、高純度テレフタル酸の製造方法。  Cooling is performed by using a plurality of cooling tanks for cooling by evaporating the water solvent in the mother liquor by lowering the pressure, the last of which is reduced to below atmospheric pressure, and the temperature of the last cooling tank is reduced to 40 to A method for producing high-purity terephthalic acid at 70 ° C. [2] 晶析工程 (f)で用いる冷却槽のうち、最初の冷却槽は、放圧蒸発させて 100°C〜 固液分離工程 (e)における固液分離時の温度未満に冷却する請求項 1に記載の高 純度テレフタル酸の製造方法。 [2] The first cooling tank among the cooling tanks used in the crystallization step (f) is depressurized and evaporated to a temperature of 100 ° C to a temperature lower than the temperature at the time of solid-liquid separation in the solid-liquid separation step (e). Item 4. The method for producing high-purity terephthalic acid according to Item 1. [3] 最初の冷却槽を、大気圧まで放圧蒸発させる請求項 2に記載の高純度テレフタル 酸の製造方法。 3. The method for producing high-purity terephthalic acid according to claim 2, wherein the first cooling tank is depressurized and evaporated to atmospheric pressure. [4] 晶析工程 (f)で用いる冷却槽が、アンカー型攪拌翼を有する請求項 1に記載の高 純度テレフタル酸の製造方法。  [4] The method for producing high-purity terephthalic acid according to claim 1, wherein the cooling tank used in the crystallization step (f) has an anchor-type stirring blade. [5] 晶析工程 (f)で用いる冷却槽のうち、少なくとも一つが、その冷却槽の内壁との間隔 が 10mm以上かつ 50mm以下である攪拌翼を有する請求項 1に記載の高純度テレ フタル酸の製造方法。 [5] The high-purity terephthalate according to claim 1, wherein at least one of the cooling tanks used in the crystallization step (f) has a stirring blade having a distance from the inner wall of the cooling tank of 10 mm or more and 50 mm or less. Method for producing acid. [6] 晶析工程 (f)で得られるスラリーを、濾過機を用いて、結晶と分離母液とに固液分 離する濾過工程 (g)、 [6] A filtration step (g) of solidifying the slurry obtained in the crystallization step (f) into crystals and a separated mother liquor using a filter, を有する請求項 1に記載の高純度テレフタル酸の製造方法。  2. The method for producing high-purity terephthalic acid according to claim 1, comprising: [7] 濾過工程 (g)で分離された結晶を、酸化工程 (a)に供与する請求項 6に記載の高 純度テレフタル酸の製造方法。 [7] The method for producing high-purity terephthalic acid according to claim 6, wherein the crystals separated in the filtration step (g) are supplied to the oxidation step (a). [8] 濾過工程 (g)で、濾過機のフィルター下流側を大気圧以上の圧力状態とし、該濾 過機のフィルター上流側を上記のフィルター下流側より高 、圧力状態として、濾過機 の順方向へケーキ濾過により固液分離を行う請求項 6に記載の高純度テレフタル酸 の製造方法。 [8] In the filtration step (g), the downstream side of the filter of the filter is set to a pressure higher than the atmospheric pressure, the upstream side of the filter of the filter is set to a higher pressure than the downstream side of the filter, and the pressure state is set. 7. The method for producing high-purity terephthalic acid according to claim 6, wherein solid-liquid separation is performed by cake filtration in the direction. [9] 濾過工程 (g)で得られた分離母液を、直接に、又は間接的に、溶解工程 (b)に供 与する請求項 6に記載の高純度テレフタル酸の製造方法。  [9] The method for producing high-purity terephthalic acid according to claim 6, wherein the separated mother liquor obtained in the filtration step (g) is directly or indirectly supplied to the dissolution step (b). [10] 濾過工程 (g)で得られた分離母液を、合成吸着材と接触させてパラトルィル酸を除 去した後、溶解工程 (b)に供与する請求項 6に記載の高純度テレフタル酸の製造方 法。 [10] The purified mother liquor obtained in the filtration step (g) is brought into contact with a synthetic adsorbent to remove paratoluic acid, and then supplied to the dissolution step (b). Production method. [11] 濾過工程 (g)で得られた分離母液内の懸濁物質濃度が 200mgZL以下である請 求項 6に記載の高純度テレフタル酸の製造方法。  [11] The method for producing high-purity terephthalic acid according to claim 6, wherein the concentration of suspended solids in the separated mother liquor obtained in the filtration step (g) is 200 mgZL or less.
PCT/JP2005/009461 2004-05-28 2005-05-24 Process for producing high-purity terephthalic acid Ceased WO2005115956A1 (en)

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WO2010049697A2 (en) * 2008-10-31 2010-05-06 Invista Technologies S.A.R.L. Improved pure carboxylic acid filtration
BR112013020492A2 (en) * 2011-02-21 2016-10-25 Hitachi Ltd method for treating a mother liquor separated from a purified terephthalic acid
CN103408421B (en) * 2013-08-21 2015-10-28 深圳市超纯环保股份有限公司 The method of purification of terephthalic acid
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CN112774579B (en) * 2020-12-28 2023-05-30 南京延长反应技术研究院有限公司 Intelligent micro-interface reaction system and method for hydrofining of crude terephthalic acid
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