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WO2005114265A1 - Transformateur de flux lumineux - Google Patents

Transformateur de flux lumineux Download PDF

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Publication number
WO2005114265A1
WO2005114265A1 PCT/US2005/016562 US2005016562W WO2005114265A1 WO 2005114265 A1 WO2005114265 A1 WO 2005114265A1 US 2005016562 W US2005016562 W US 2005016562W WO 2005114265 A1 WO2005114265 A1 WO 2005114265A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
housing
chamber
light source
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2005/016562
Other languages
English (en)
Inventor
Bernard J. Eastlund
Michael W. Ingram
Reginald W. Clark
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novatron Inc
Original Assignee
Novatron Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Novatron Inc filed Critical Novatron Inc
Publication of WO2005114265A1 publication Critical patent/WO2005114265A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements

Definitions

  • the elliptical reflector 10 has a specularly reflective interior surface 12, which may be used to reflect light 14 from a light source 16 towards a point 18 at which the intensity of the light is very high.
  • elliptical reflectors such as the reflector 10 of Figure 1 are able to shape light so as to increase the light flux along a given line 18, it would be desirable to provide a more efficient method or system for increasing light flux and directing the light to a particular area.
  • Conventional optical systems typically do not uniformly illuminate an object or surface region without considerable design and expensive focusing elements, because of the finite size of the light-emitting region of a lamp. Accordingly, improved methods and systems for focusing a light source are desired.
  • an apparatus for exposing surfaces on objects to UV radiation including an outer housing having an inner surface area, where at least some of said inner surface area is diffusely reflective to UV radiation, a UV light source located within the housing, and at least one aperture in the housing, where the aperture permits UV radiation to exit the chamber.
  • an apparatus for exposing surfaces on objects to UV radiation including a housing having an inner surface area, where at least some of said inner surface area is diffusely reflective to UV radiation, a spectrally selective surface within the housing where the spectrally selective surface includes a material with wavelength dependent absorbing, transmitting, and/or reflecting characteristics, a UV light source located within the housing, and an aperture in the housing, where the aperture permits light to exit the housing.
  • a method for focusing light including generating light within a chamber, reflecting the light off of at least one substantially Lambertian reflective surface on an inner surface of the chamber, and selectively permitting light to leave the chamber based on the direction in which said light is traveling.
  • an apparatus for exposing surfaces on objects to UV radiation including a UV light source, a housing including means for increasing the flux density of the generated light, and an aperture.
  • the invention comprises an apparatus for exposing surfaces on one or more objects to UV radiation comprising an outer housing having an inner surface area, wherein at least some of the inner surface area is diffusely reflective to UV radiation, a UV light source located within or outside the housing, and providing UV radiation to the interior of the housing.
  • the one or more objects are positioned within the housing and receive a substantially uniform exposure to UV radiation.
  • the invention comprises a method of curing a material with UV radiation comprising reflecting UV light from a diffusely reflective surface and illuminating a curable material with the reflected light.
  • Figure 1 is a cross-sectional view of an elliptical reflector.
  • Figure 2A is a diagram illustrating light reflected from a specular reflector.
  • Figure 2B is a diagram illustrating light reflected from a diffuse reflector.
  • Figure 3 A is a cross-sectional view of one embodiment of a light transformer box, which is located over a roller system.
  • Figure 3B is a view of the underside of the light transformer box of Figure 1 A.
  • Figure 4A is a cross-sectional view of another embodiment of a light transformer box, which has light focusing structures located at edges of an aperture.
  • Figure 4B is a schematic view of the underside of the light transformer box of Figure 2A.
  • Figure 5 is a schematic view of the underside of another embodiment of a light transformer box which has multiple apertures.
  • Figure 6 is a cross-sectional view of another embodiment of a light transformer box which has multiple light sources.
  • Figure 7 is a cross-sectional view of another embodiment of a light transformer box having features which reduce the amount of infrared light transmitted through the exposure slot.
  • Figure 8 is a cross-sectional view of another embodiment of a light transformer box in which light is transmitted out of the transformer box via optical fibers coupled to apertures.
  • Transforming non-uniform light radiation from an arbitrarily shaped light source i.e. linear, spherical, cylindrical etc.
  • an arbitrarily shaped light source i.e. linear, spherical, cylindrical etc.
  • the emission from a 6-inch long cylindrical UV lamp could be collected and transformed by the light transformer to produce a uniform flux density pattern over a circular, square or triangular area with a characteristic dimension of, for example, 10 inches or more.
  • the emission from a short cylindrical lamp could be shaped to produce uniform flux density over a rectangular pattern that is much longer than the axial length of the lamp. Shaping of light may be used in applications, such as, for example, UV curing of inks and coatings.
  • Alternate applications which could utilize the shaping of light include, but are not limited to, high efficiency light beams, infrared drying or cooking, medical light applications, and decorative light applications.
  • the light transformer can also be used to produce highly uniform illumination patterns over the surfaces of 3-dimensional objects with complicated surface shapes. Such objects can, for example, be introduced into the light transformer cavity where they will be exposed to highly uniform flux density from all directions. This approach can, for example, provide uniform curing of all the surfaces of 3-dimensional objects without the need to translate or move the object or lamp relative to one another.
  • Elliptical reflectors of the type discussed with respect to Figure 1 generally utilize a specularly reflective surface.
  • Figure 2A is a diagram illustrating light 20 reflected from a specular reflector 22 and and Figure 2B is a diagram illustrating light reflected from a diffuse reflector 24.
  • the incident light is represented as solid lines, and the reflected light is represented as dashed lines.
  • the specular reflector 22 reflects an incident light 20 predominately in one direction, which is determined by the angle of incidence.
  • a specular reflector is a mirror in which the angle of incidence and the angle of reflection are substantially identical.
  • the diffuse reflector 24 reflects the incident light 20 in all directions regardless of the angle at which it is incident on the diffuse reflector 24.
  • a diffuse reflecting surface is typically referred to as Lambertian.
  • a Lambertian surface is defined as a surface from which the energy emitted in any direction is proportional to the cosine of the angle which that direction makes with the normal to the surface.
  • diffuse reflector 24 represents a portion of a panel in a light transformer
  • incident light 20 will be scattered from the panel in all directions regardless of the shape of the diffuse reflector 24 and the relationship of other panels in the light transformer.
  • the fluence within the transformer may be substantially uniform regardless of the chamber geometry, light source geometry, and light source location within the light transformer.
  • a substantially uniform illumination inside the light transformer is possible regardless of the geometric shape of the chamber and the location of the light source within the chamber.
  • Figure 3 A is a cross-sectional end-view of an embodiment of a light transformer 30.
  • the light transformer 30 comprises a chamber 32.
  • the walls 34 of the chamber 32 are lined on the inside with a material which is a highly diffuse reflective surface, such as a Lambertian reflector having high reflectivity, hi one embodiment, the highly diffuse reflective surface may comprise one or more of: SpectralonTM which has a reflectivity of about 94%, ODM, manufactured by Gigahertz- optik, which has a reflectivity of 95%, and DRP which has a reflectivity of 99.4 to 99.9%.
  • SpectralonTM which has a reflectivity of about 94%
  • ODM manufactured by Gigahertz- optik
  • DRP which has a reflectivity of 99.4 to 99.9%.
  • SpectralonTM which is a highly Lambertian, thermoplastic material that can be machined into a wide variety of shapes to suit various reflectance component requirements, may be purchased from Labsphere, Inc.
  • DRP can be purchased in sheet form, with a peel and stick backing from W.L. Gore and Associates.
  • the walls may be lined with a highly reflective material that comprises an Alzak oxidized aluminum, which has a reflectivity of about 86%.
  • the light transformer 30 comprises a light source 36 located within a light housing reflector 38.
  • the light source 36 may be any source of UV, such as a microwave-excited UV source such of the type manufactured by Fusion UV Systems, fric; a flashlamp or a pulsed lamp, which provides broad spectrum pulsed light and can be purchased through vendors such as Fenix, of Yuma, Ariz.; medium pressure mercury arc lamps, available from Hanovia Corp.; or germicidal lamps.
  • the housing reflector 38 is also lined on the inside with material which is a Lambertian reflector with high reflectivity. Light emitted from the light source 36 is reflected many times from the reflective surfaces of light housing reflector 38 and walls 34, building up a high value of light flux that effectively multiplies the flux of the lamp by factors of 30 or more.
  • the factor by which the flux is increased is dependent on the reflectivity of the Lambertian material lining the interior of the light transformer 30. A higher reflectivity will result in a larger increase in the effective flux of the lamp.
  • the radiance of the surfaces inside the chamber 32 is given by where ⁇ . chorus ( ⁇ ) is the spectral power (Watts/nm) input to a chamber of surface area
  • R( ⁇ ) is the reflectivity of the chamber walls and internal surfaces as a function of wavelength
  • f( ⁇ ) is the ratio of absorbing surface area to reflecting surface area, where the spectral dependence in f( ⁇ ) arises from the spectral properties of the absorbing and reflecting surfaces.
  • such systems are designed with spectrally flat material properties, so the wavelength dependence is negligible.
  • the value of f( ⁇ ) may advantageously be 0.05 or less, h addition, the irradiance on an object within the chamber will be substantially uniform throughout the chamber as long as there is no direct line-of-sight between the object and the input source.
  • the object irradiance is about 6 times the wall radiance for a rectangular-shaped chamber.
  • An exposure slot 40 for useful light rays allows some of this trapped and flux- multiplied light to escape.
  • This light may then strike a surface that benefits from exposure to the light, such as a surface having, for example, a coating that requires UV curing, h Figure 3A, a surface 42 is shown suspended by rollers 44, and positioned underneath the exposure slot 40, such that a portion of the surface 42 is exposed to light which passes through the exposure slot 40.
  • the rollers 44 can advance the surface 42, so as to expose a strip of the surface 42 to light over time.
  • the rollers 44 and the surface 42 may comprise a portion of a conveyor system, on which material to be exposed to light may be placed.
  • the rollers and surface may comprise a system for passing a sheet or film of material to be exposed to light underneath the exposure slot.
  • a light baffle 46 may be used to prevent most or all of the light rays from the light source 36 from entering the main portion of the chamber 32 without first reflecting off the housing reflector 38.
  • the surfaces of the light baffle 46 are advantageously also coated with a highly reflective Lambertian material.
  • the use of such a baffle may be particularly advantageous in alternate embodiments of a light transformer in which an item to be cured via UV or cooked via infrared is placed within the chamber itself, hi these embodiments, of course, an aperture or exposure slot for UV light exit from the housing is not necessary.
  • a light battle such as baffle 46 may be placed closer to the exposure slot 40, so as to simply prevent direct rays from the light source 36 from exiting the exposure slot 40 without first reflecting off the enclosure walls 34.
  • the main portion of the light transformer 30 is rectangular in cross-section, forming a box shape.
  • the main portion of the light transformer 30 may be a cylinder or a frustum.
  • the housing reflector 38 may be part of an ellipsoid, or may be any other extension of the cavity 32 within the light transformer 30. In yet other embodiments, there may be no distinct light housing reflector 38, such that the light source 36 is simply placed within a cavity. Also, the position of the light source 36, while depicted near the upper portion of the light housing reflector 38 in Figure 3 A, may be placed elsewhere as appropriate.
  • the exemplary materials discussed previously are examples of "substantially Lambertian" materials.
  • FIG. 4A is a cross- sectional view of an exemplary light transformer 56.
  • the light transformer 56 includes light focusing structures 58 near the exposure slot 40 that are configured to increase concentration of the light leaving the slot exposure slot 40.
  • these light focusing structures 58 are inverted triangular shapes.
  • the light focusing structures 58 help select light rays approaching the exit slot 40 that are more normal to the surface 42 to be exposed so that the rays will strike the surface to be exposed in a desired limited exposure region, h one embodiment, the light focusing structures 58 also reflect some rays exiting the slot at a shallower angle to the treated surface back into a narrower area on the treated surface.
  • the light focusing structures 58 shown in Figure 4 A are also covered with a material that is a substantially Lambertian reflector with high reflectivity.
  • FIG. 4B is a cross-sectional bottom view of the light transformer 56, including the slot for useful light rays 40 and the light focusing structures 58. As illustrated in Figure 4B, the light focusing structures 58 are configured to focus the light exiting the slot 40 to a narrower area than is possible without them. Although not depicted, light focusing structures having other configurations are contemplated.
  • light focusing structures similar to 58 could alternately be placed along the upper and lower edges of the exposure slot 40, in addition to or in place of the light focusing structures 58 depicted along the side edges of the slot, so as to give additional control over the shape of the area exposed to light from the exposure slot 40.
  • the power exiting the box, P mt , through the exposure slot 40 is related to the box geometry and the box light multiplying factor, M, by the expression:
  • a UV microwave energized lamp such as model F300 sold by Fusion Systems UV, produces about 200 watts of UV between 200 and 300 nm. Using this lamp as a source in the flux multiplying box described above is estimated to result in a flux in the opening of about 2.35 W/cm . h comparison, the peak flux of the same Fusion Systems UV F300 at the focus of its elliptical reflector 1.1 W/cm 2 . The focal width of the F300 in the plane of the exposed surface is about 0.55 inches. Thus, through the use of the light transformer 1000, the peak flux provided by an F300 may be more than doubled.
  • the area irradiated by that peak flux may be more than doubled at the same time.
  • the flux from an elliptical reflector such as the Fusion Systems UV elliptical reflector will have a substantially different profile perpendicular to the lamp axis in the plane of lamp focus than would the flux exiting through the exposure slot of a transformer box 30 or 56.
  • the flux from the transformer box will have a higher peak and a more even profile across the disclosure slot.
  • the profile of the flux from the transformer box will likely be lower than that of the elliptical reflector, as light from a transformer box such as 56 can be directed to a much narrower region, by selectively permitting only light traveling in certain directions to leave the transformer box, both through the use of the exposure slot and through the use of light focusing structures as discussed above.
  • a medium pressure mercury arc could also be used as the light source, with comparable improvements. Use of such a light source may provide many advantages for the curing industry.
  • the light flux transformer 30 can transform the light from a source to a desired exposure pattern using slots of various shapes.
  • Figure 5 schematically depicts the underside of an embodiment of a transformer box having a pattern of exposure slots 40 that would allow multiple spots to be exposed on a target surface, h an embodiment in which the target surface is moving relative to exposure slots 40, this pattern of exposure slots can be used to expose individual lines on a target surface.
  • this pattern of exposure slots can be used to expose individual lines on a target surface.
  • flux intensities much greater than possible with single lamps and focusing reflectors are possible using the light transformer system.
  • Figure 6 is a cross-sectional view of another embodiment of a light transformer 60, including two light sources 36 mounted in light housing reflectors 38.
  • the light transformer 60 increases the peak intensity coming through the exposure slot 40, up to about double that of a light transformer having a single light source 36, such as that depicted in Figures 3A and 3B.
  • a peak intensity of about 4 times a conventional lamp with an elliptical reflector is possible, hi addition, more than two lamps 36 could be used, leading to higher and possibly more useful intensities.
  • the light transformer 60 also includes baffles 46. As discussed above, depending on the placement of these baffles 46 relative to the light sources 36, these baffles may serve to prevent light from entering the main portion of the chamber 32 without first reflecting off of the light housing reflectors 38, or may prevent light from exiting the disclosure slot without reflecting off of an interior surface of the light transformer 60.
  • relatively small spectra modifying wafers 62 are placed in the light transformer in order to control the spectrum of light coming through the exposure slot.
  • a wafer 62 that reflects UV light, but absorbs infrared light could significantly reduce the amount of infrared light from the light striking the surface to be exposed. Because the light is advantageously reflected multiple times within the light transformer 60, such a wafer may be placed anywhere in the chamber, and a significant effect on the composition of the outgoing light may be obtained.
  • a spectrally selective absorbing material is placed inside the chamber in order to introduce a spectral dependence in L as described in the equation above, since /will not be flat across the spectrum.
  • a schott glass filter with a cutoff wavelength of 230 nm could be placed inside the chamber.
  • Such a filter could be designed to transmit >90% of the incident radiation that is above 230 nm, and absorb ⁇ 99% of the incident radiation that is below -230 nm.
  • the absorbing fraction would be ⁇ 10 to 100 times larger for wavelengths >230 nm than for those less than 230 nm.
  • the surface radiance in the chamber and the irradiance incident on an object inside the chamber or at the chamber wall would be an order of magnitude larger above 230 nm.
  • This technique could obviously be applied at any wavelength or wavelength band where an appropriate absorber can be fabricated.
  • Infrared radiation may be reduced using a similar technique.
  • infrared discriminating materials commonly available will either reflect or transmit incident radiation, rather than absorbing the incident radiation. These are commonly referred to as hot (infrared reflecting) or cold (infrared transmitting) mirrors. If a cold mirror were placed in the chamber, such as on the chamber floor, it would have little or no effect on the spectral content of the chamber since the offending wavelengths are not absorbed.
  • IR radiation would be transmitted thru the mirror, reflected off the chamber floor, and transmitted back thru the mirror into the chamber with minimal losses; other wavelengths would be reflected back into the chamber on the first surface of the mirror rather than from the chamber wall.
  • a cold mirror 64 could be used by placing the mirror 64 over an absorber 66 in the chamber 32.
  • the visible and UV wavelengths are reflected by the cold mirror 64 with high efficiency (typically >90%) while the IR is transmitted with somewhat lower efficiency (typically >80%).
  • This way, mainly IR radiation would be incident on the absorber 66, since most of the UV and visible wavelengths are reflected by the mirror 64 back into the chamber 32.
  • baffles 46 can be used to ensure that light from light source 36 is reflected off of the interior walls at least once, and usually many times, even a small absorber 66 can have a significant effect on the spectral composition of the light exiting through aperture 40.
  • a cold mirror 64 can be placed over a hole or opening 68 in the chamber 32.
  • the transmitted IR can pass out of the chamber 32, never to return.
  • / ( ⁇ ) may be quite high in the IR but remains low in the UV-VIS, so the cavity will multiply the UV-VIS well, but not the IR.
  • the use of a cold mirror 64 method has several advantages over simply using an IR absorber, such as the wafer 62 of Figure 6.
  • the mirror does not get hot, as it is non-absorbing.
  • the absorbing material may be chosen independent of its reflecting properties, whereas the wafer 62 of Figure 6 may have a detrimental effect on the increase in light flux density produced by the light transformer box at desired wavelengths if it is not reflective at those wavelengths.
  • the absorbing material may be more easily cooled, as it can be located on the wall or outside of the chamber. Forth, when the mirror is placed over an opening in the wall, no absorber is needed, further simplifying the design and decreasing the amount of heat buildup which may occur due to light absorption in the light transformer 60.
  • Figure 8 is a cross-sectional end view of a light transformer 74, where optical fibers 76 are coupled to slots or holes 78 in the light transformer 74.
  • the optical fibers 76 can be used to guide light to precise locations, and can be used to expose multiple parts of an object to light from different angles at the same time. For instance, two light-guiding optical fibers 76 could be used to simultaneously cure opposite surfaces of a material. In addition, because light can propagate through the optical fibers 76 by means of total internal reflection, the light exiting the end of the optical fiber may be roughly collimated, enabling precision illumination or exposure of certain areas to light. In these embodiments, baffles could still be provided to block any direct line of sight between the lamp and the entrances to the optical fibers.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Appareil pour exposer des surfaces d’objet à des radiations UV comprenant une source lumineuse (36) et une chambre (32) ayant une surface intérieure recouverte d’un matériau réfléchissant, qui peut être un réflecteur Lambertien. La lumière produite par la source lumineuse (36) est réfléchie, généralement plusieurs fois, à l’intérieur de la chambre (32), augmentant significativement le flux lumineux à travers un trou (40) dans la chambre (32). Une méthode pour augmenter le flux lumineux est également décrite, dans laquelle la lumière produite par une source lumineuse (36) est réfléchie plusieurs fois dans une chambre (32), avant d’être libérée de la chambre (32) par une ouverture (40).
PCT/US2005/016562 2004-05-13 2005-05-11 Transformateur de flux lumineux Ceased WO2005114265A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57155204P 2004-05-13 2004-05-13
US60/571,552 2004-05-13

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150069265A1 (en) * 2013-09-06 2015-03-12 Sensor Electronic Technology, Inc. Ultraviolet Diffusive Illumination
EP3086178A1 (fr) * 2008-05-23 2016-10-26 Esko-Graphics Imaging GmbH Durcissement de plaques d'impression photodurcissables utilisant un tunnel de lumière de parois réfléchissantes et présentant une section transversale polygonale similaire à un kaléidoscope
US11773016B2 (en) 2018-12-14 2023-10-03 Corning Incorporated Diffuse reflector and methods of use
US12344552B2 (en) 2021-10-08 2025-07-01 Corning Incorporated Spacer and methods for optimizing optical fiber curing process

Citations (4)

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Publication number Priority date Publication date Assignee Title
DE3902643A1 (de) * 1989-01-30 1990-12-13 Metz Luft Und Trocknungsanlage Uv-strahler
US5059191A (en) * 1989-03-25 1991-10-22 Gesellschaft fur Strahlen-und Unweltforschung mbH (GSF) Method and apparatus for the irradiation of cavities
US20010009701A1 (en) * 1995-04-27 2001-07-26 Peter Schmitt Process and device for curing UV printing ink
DE10106032A1 (de) * 2000-02-25 2001-09-27 Laser Lab Goettingen Ev Vorrichtung und Verfahren zur homogenen Ausleuchtung einer kleinen Fläche mit der Ulbricht'schen Kugel

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Publication number Priority date Publication date Assignee Title
DE3902643A1 (de) * 1989-01-30 1990-12-13 Metz Luft Und Trocknungsanlage Uv-strahler
US5059191A (en) * 1989-03-25 1991-10-22 Gesellschaft fur Strahlen-und Unweltforschung mbH (GSF) Method and apparatus for the irradiation of cavities
US20010009701A1 (en) * 1995-04-27 2001-07-26 Peter Schmitt Process and device for curing UV printing ink
DE10106032A1 (de) * 2000-02-25 2001-09-27 Laser Lab Goettingen Ev Vorrichtung und Verfahren zur homogenen Ausleuchtung einer kleinen Fläche mit der Ulbricht'schen Kugel

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Title
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3086178A1 (fr) * 2008-05-23 2016-10-26 Esko-Graphics Imaging GmbH Durcissement de plaques d'impression photodurcissables utilisant un tunnel de lumière de parois réfléchissantes et présentant une section transversale polygonale similaire à un kaléidoscope
US20150069265A1 (en) * 2013-09-06 2015-03-12 Sensor Electronic Technology, Inc. Ultraviolet Diffusive Illumination
WO2015035132A1 (fr) * 2013-09-06 2015-03-12 Sensor Electronic Technology, Inc. Éclairage diffus ultraviolet
CN105518380A (zh) * 2013-09-06 2016-04-20 传感器电子技术股份有限公司 紫外线漫射照射
US9550004B2 (en) 2013-09-06 2017-01-24 Sensor Electronic Technology, Inc. Ultraviolet diffusive illumination
US20170095585A1 (en) * 2013-09-06 2017-04-06 Sensor Electronic Technology, Inc. Ultraviolet Diffusive Illumination
CN105518380B (zh) * 2013-09-06 2019-01-29 传感器电子技术股份有限公司 紫外线漫射照射
US10245338B2 (en) 2013-09-06 2019-04-02 Sensor Electronic Technology, Inc. Ultraviolet diffusive illumination
US10456486B2 (en) 2013-09-06 2019-10-29 Sensor Electronic Technology, Inc. Ultraviolet diffusive illumination
DE112014004109B4 (de) * 2013-09-06 2021-05-20 Sensor Electronic Technology Inc. Diffuse Ultraviolettbeleuchtung
US11773016B2 (en) 2018-12-14 2023-10-03 Corning Incorporated Diffuse reflector and methods of use
US12344552B2 (en) 2021-10-08 2025-07-01 Corning Incorporated Spacer and methods for optimizing optical fiber curing process

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