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WO2004111307A1 - Method and apparatus for chemical etching on laminar components - Google Patents

Method and apparatus for chemical etching on laminar components Download PDF

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Publication number
WO2004111307A1
WO2004111307A1 PCT/EP2004/006638 EP2004006638W WO2004111307A1 WO 2004111307 A1 WO2004111307 A1 WO 2004111307A1 EP 2004006638 W EP2004006638 W EP 2004006638W WO 2004111307 A1 WO2004111307 A1 WO 2004111307A1
Authority
WO
WIPO (PCT)
Prior art keywords
laminar
chemical etching
etching
component
components according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2004/006638
Other languages
French (fr)
Inventor
Thomas Matthaes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RESCO Srl
Original Assignee
RESCO Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RESCO Srl filed Critical RESCO Srl
Publication of WO2004111307A1 publication Critical patent/WO2004111307A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces

Definitions

  • the present invention relates to a method and an apparatus for chemical etching on laminar components.
  • the acid product is sprayed by means of nozzles that are arranged above the conveyed material and flows on the surface of the panel in a substantially radial direction. This entails that the liquid that originates from one jet interferes with the liquid of the adjacent jet, forming turbulences and stagnation regions characterized by greater thickness at the center of the panels and lower thickness toward the edges.
  • the side of the plate that lies close to the nozzle is struck by the spray with a higher pressure, which as such is not uniform.
  • the aim of the present invention is to provide a method for chemical etching on laminar components that is improved with respect to the methods of the cited prior art.
  • an object of the invention is to provide a method that reduces the forming of turbulences and stagnation regions.
  • a further object of the invention is to provide a method for chemical etching that allows to achieve higher etching uniformity.
  • a further object is to provide a method that is more efficient and precise than the methods currently in use.
  • a method for chemical etching on laminar components characterized in that it comprises a step in which an etching liquid is sprayed onto a laminar component from one side, making it flow over the surface of the laminar component toward one side, an additional step in which the etching liquid is sprayed from the opposite side, making it flow over the surface of the laminar component in the opposite direction, and a further step in which the etching liquid is sprayed substantially centrally onto the laminar component.
  • an apparatus for chemical etching on laminar components comprising a means for conveying a laminar component and a plurality of nozzles, characterized in that it comprises a series of nozzles arranged on one side and a second series of nozzles arranged on the other side with respect to the direction of motion of the laminar component, and at least one nozzle that is adapted to spray substantially centrally with respect to the laminar component.
  • an apparatus for chemical etching according to the invention comprises at least one etching chamber that has two rows of rollers, an upper row 2 and a lower row 3, suitable to convey a panel.
  • the etching liquid is sprayed by means of nozzles 8 at the sides of the chamber, which are arranged along two rows 6 and 7 that are parallel to the traction direction and above the conveyance level.
  • the inclination of the nozzles is such that the jet 9 covers the entire length of the rollers 2 and 3, i.e., the width of the conveyed panel.
  • the nozzles 8 are arranged symmetrically in front of each other and spray in the space between two consecutive rollers 2.
  • a first step only the nozzles 8 of the left row 6 operate, and the jet 9 covers the entire width of the panel, over the surface of which the fluid flows horizontally toward the right row 7 of nozzles without causing turbulences or stagnation regions.
  • a second step the nozzles 8 of the right row 7 are activated and the nozzles of the left row 6 are deactivated, producing a situation that is symmetrical with respect to the preceding one and in which the etching liquid flows uniformly, over the surface of the panel, toward the left row 6 of nozzles.
  • the panel is sprayed by an upper central nozzle 10, which is located in the center of the conveyance width and at such a height that the jet 11 covers the entire width of the panel.
  • the central nozzle 10 acts continuously over time, during both the first step and the second step, spraying a precise amount of liquid, which flows horizontally over the panel without turbulence, starting from a center, which is the projection of the central nozzle 10 on the panel, and moving radially outward.
  • This type of jet 11 produces a very uniform etching that is slightly deeper at the center, compensating the previous jets, which removed slightly more material at the sides, and reaching as a whole a greater uniformity than the lateral nozzles 8 alone.
  • Each one of the three steps described above includes the uniform flow of the liquid in a single direction, which is different for the three steps.
  • the lack of mutually opposite motions leads to the elimination or substantial reduction of the stagnation regions and of turbulences.
  • the number of lateral nozzles to be interleaved with the central one can vary according to specific requirements.
  • the invention achieves the intended aim and objects, a method for chemical etching on laminar components having been provided which eliminates or substantially reduces the forming of turbulences and stagnation regions, allowing a more uniform and precise etching than conventional methods.
  • An advantage of the invention is that the apparatus does not require additional modules, since its dimensions are similar to those of ordinary machines.
  • the materials used, as well as the dimensions, may of course be any according to requirements and to the state of the art.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

A system for chemical etching on laminar components, including a step in which the etching liquid is sprayed onto the panel from one side of the etching chamber, flowing over the surface of the panel away from the side from which it is sprayed, a subsequent step in which the liquid is sprayed onto the panel from the opposite side of the chamber, flowing in the direction that is opposite with respect to the previous direction, and an additional step in which the etching liquid is sprayed onto the panel substantially at the center.

Description

METHOD AND APPARATUS FOR CHEMICAL ETCHING ON LAMINAR COMPONENTS
The present invention relates to a method and an apparatus for chemical etching on laminar components.
It is known that metallic materials, such as iron, copper and others, are subjected to chemical etching by using machines provided with one or more etching chambers inside which traction rollers produce the sliding advancement, in a horizontal position, of the panels to be etched, which are sprayed with an acid product.
The acid product is sprayed by means of nozzles that are arranged above the conveyed material and flows on the surface of the panel in a substantially radial direction. This entails that the liquid that originates from one jet interferes with the liquid of the adjacent jet, forming turbulences and stagnation regions characterized by greater thickness at the center of the panels and lower thickness toward the edges.
These stagnation regions brake the jet, reducing its force, altering its geometry and reducing the speed with which the liquid flows over the surface of the panel, slowing the chemical etching and compromising the uniformity of the treatment.
In another conventional method, the side of the plate that lies close to the nozzle is struck by the spray with a higher pressure, which as such is not uniform.
The aim of the present invention is to provide a method for chemical etching on laminar components that is improved with respect to the methods of the cited prior art. Within this aim, an object of the invention is to provide a method that reduces the forming of turbulences and stagnation regions.
A further object of the invention is to provide a method for chemical etching that allows to achieve higher etching uniformity.
A further object is to provide a method that is more efficient and precise than the methods currently in use.
This aim and these and other objects that will become better apparent hereinafter are achieved by a method for chemical etching on laminar components, characterized in that it comprises a step in which an etching liquid is sprayed onto a laminar component from one side, making it flow over the surface of the laminar component toward one side, an additional step in which the etching liquid is sprayed from the opposite side, making it flow over the surface of the laminar component in the opposite direction, and a further step in which the etching liquid is sprayed substantially centrally onto the laminar component.
This aim and these objects are further achieved by an apparatus for chemical etching on laminar components, comprising a means for conveying a laminar component and a plurality of nozzles, characterized in that it comprises a series of nozzles arranged on one side and a second series of nozzles arranged on the other side with respect to the direction of motion of the laminar component, and at least one nozzle that is adapted to spray substantially centrally with respect to the laminar component. Further characteristics and advantages of the present invention will become better apparent from the description of preferred but not exclusive embodiments thereof, illustrated by way of nonlimiting example in the accompanying drawing, which is a perspective view of a detail of the apparatus according to the invention.
With reference to the figure, an apparatus for chemical etching according to the invention, generally designated by the reference numeral 1 , comprises at least one etching chamber that has two rows of rollers, an upper row 2 and a lower row 3, suitable to convey a panel.
The etching liquid is sprayed by means of nozzles 8 at the sides of the chamber, which are arranged along two rows 6 and 7 that are parallel to the traction direction and above the conveyance level. The inclination of the nozzles is such that the jet 9 covers the entire length of the rollers 2 and 3, i.e., the width of the conveyed panel.
The nozzles 8 are arranged symmetrically in front of each other and spray in the space between two consecutive rollers 2.
In a first step, only the nozzles 8 of the left row 6 operate, and the jet 9 covers the entire width of the panel, over the surface of which the fluid flows horizontally toward the right row 7 of nozzles without causing turbulences or stagnation regions.
In a second step, the nozzles 8 of the right row 7 are activated and the nozzles of the left row 6 are deactivated, producing a situation that is symmetrical with respect to the preceding one and in which the etching liquid flows uniformly, over the surface of the panel, toward the left row 6 of nozzles. After a series of these steps, the panel is sprayed by an upper central nozzle 10, which is located in the center of the conveyance width and at such a height that the jet 11 covers the entire width of the panel.
The central nozzle 10 acts continuously over time, during both the first step and the second step, spraying a precise amount of liquid, which flows horizontally over the panel without turbulence, starting from a center, which is the projection of the central nozzle 10 on the panel, and moving radially outward.
This type of jet 11 produces a very uniform etching that is slightly deeper at the center, compensating the previous jets, which removed slightly more material at the sides, and reaching as a whole a greater uniformity than the lateral nozzles 8 alone.
Each one of the three steps described above includes the uniform flow of the liquid in a single direction, which is different for the three steps. The lack of mutually opposite motions leads to the elimination or substantial reduction of the stagnation regions and of turbulences. The number of lateral nozzles to be interleaved with the central one can vary according to specific requirements.
In practice it has been found that the invention achieves the intended aim and objects, a method for chemical etching on laminar components having been provided which eliminates or substantially reduces the forming of turbulences and stagnation regions, allowing a more uniform and precise etching than conventional methods.
An advantage of the invention is that the apparatus does not require additional modules, since its dimensions are similar to those of ordinary machines.
The method according to the invention is susceptible of numerous modifications and variations, within the scope of the appended claims. All the details may be replaced with technically equivalent components.
The materials used, as well as the dimensions, may of course be any according to requirements and to the state of the art.

Claims

1. A method for chemical etching on laminar components, characterized in that it comprises a step in which an etching liquid is sprayed onto a laminar component from one side, making it flow over the surface of said laminar component toward one side, an additional step in which said etching liquid is sprayed from the opposite side, making it flow over the surface of said laminar component in the opposite direction, and a further step in which said etching liquid is sprayed substantially centrally onto said laminar component.
2. The method for chemical etching on laminar components according to claim 1 , characterized in that said steps for spraying on one side and on the other side are alternated in time.
3. The method for chemical etching on laminar components according to claim 1 or 2, characterized in that during said step for central spraying of said etching liquid, the jet of said etching liquid covers the entire width of said laminar component.
4. The method for chemical etching on laminar components according to one or more of the preceding claims, characterized in that during said central spraying step said etching liquid flows horizontally over the surface of said laminar component, expanding in a radial direction.
5. The method for chemical etching on laminar components according to one or more of the preceding claims, characterized in that said central spraying step is continuous and affects at different times every point of said panel.
6. An apparatus for chemical etching on laminar components, comprising a means for conveying a laminar component and a plurality of nozzles, characterized in that it comprises a series of said nozzles arranged on one side and a second series of said nozzles arranged on the other side with respect to the direction of motion of said laminar component, and at least one nozzle that is suitable to spray substantially centrally with respect to said laminar component.
7. The apparatus for chemical etching on laminar components according to claim 6, characterized in that said central nozzle is in a central position with respect to the direction of motion of said laminar component.
8. The apparatus for chemical etching on laminar components according to one or more of the preceding claims, characterized in that said means for conveying said laminar component comprises a plurality of rollers arranged in rows, an upper row and a lower row.
9. The apparatus for chemical etching on laminar components according to one or more of the preceding claims, characterized in that said rollers comprise a covering made of soft PVC.
10. The apparatus for chemical etching on laminar components according to one or more of the preceding claims, characterized in that it comprises at least one etching chamber in which said laminar component is conveyed by means of said rollers in order to be treated.
PCT/EP2004/006638 2003-06-19 2004-06-18 Method and apparatus for chemical etching on laminar components Ceased WO2004111307A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001240A ITMI20031240A1 (en) 2003-06-19 2003-06-19 METHOD AND EQUIPMENT FOR CHEMICAL ATTACK ON LAMINARY ELEMENTS
ITMI2003A01240 2003-06-19

Publications (1)

Publication Number Publication Date
WO2004111307A1 true WO2004111307A1 (en) 2004-12-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/006638 Ceased WO2004111307A1 (en) 2003-06-19 2004-06-18 Method and apparatus for chemical etching on laminar components

Country Status (2)

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IT (1) ITMI20031240A1 (en)
WO (1) WO2004111307A1 (en)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1239858A (en) * 1968-02-27 1971-07-21 Hoellmueller Maschbau H Oscillating nozzle holder for etching machines
DE2215334A1 (en) * 1972-03-29 1973-10-11 Adam Pill Continuous etching plant - has rotating star wheels to progress the flat charge
DE2643852A1 (en) * 1976-09-29 1978-03-30 Wesero Maschinenbau Gmbh Plant for etching, washing and drying printed circuit boards - using cabinet contg. vertical stack of horizontal conveyor belts pref. of PVC reinforced with glass fibre
US4964365A (en) * 1988-11-03 1990-10-23 D.E.M. Controls Of Canada Immersion process machine
US4985111A (en) * 1990-03-02 1991-01-15 Chemcut Corporation Process and apparatus for intermittent fluid application
US5272798A (en) * 1992-08-05 1993-12-28 Kolene Corporation Method and apparatus for descaling metal strip
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus
DE19842971A1 (en) * 1998-09-19 2000-04-13 Gewerk Keramchemie Process for pickling steel material comprises moving the material through a vessel and spraying with a pickling solution containing hydrochloric acid
EP1122338A2 (en) * 2000-01-31 2001-08-08 SMS Demag AG Apparatus for spraying, pickling or rinsing liquids on metal objects

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1239858A (en) * 1968-02-27 1971-07-21 Hoellmueller Maschbau H Oscillating nozzle holder for etching machines
DE2215334A1 (en) * 1972-03-29 1973-10-11 Adam Pill Continuous etching plant - has rotating star wheels to progress the flat charge
DE2643852A1 (en) * 1976-09-29 1978-03-30 Wesero Maschinenbau Gmbh Plant for etching, washing and drying printed circuit boards - using cabinet contg. vertical stack of horizontal conveyor belts pref. of PVC reinforced with glass fibre
US4964365A (en) * 1988-11-03 1990-10-23 D.E.M. Controls Of Canada Immersion process machine
US4985111A (en) * 1990-03-02 1991-01-15 Chemcut Corporation Process and apparatus for intermittent fluid application
US5272798A (en) * 1992-08-05 1993-12-28 Kolene Corporation Method and apparatus for descaling metal strip
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus
DE19842971A1 (en) * 1998-09-19 2000-04-13 Gewerk Keramchemie Process for pickling steel material comprises moving the material through a vessel and spraying with a pickling solution containing hydrochloric acid
EP1122338A2 (en) * 2000-01-31 2001-08-08 SMS Demag AG Apparatus for spraying, pickling or rinsing liquids on metal objects

Also Published As

Publication number Publication date
ITMI20031240A1 (en) 2004-12-20
ITMI20031240A0 (en) 2003-06-19

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