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WO2004060567A1 - Separateur centrifuge - Google Patents

Separateur centrifuge Download PDF

Info

Publication number
WO2004060567A1
WO2004060567A1 PCT/JP2002/013613 JP0213613W WO2004060567A1 WO 2004060567 A1 WO2004060567 A1 WO 2004060567A1 JP 0213613 W JP0213613 W JP 0213613W WO 2004060567 A1 WO2004060567 A1 WO 2004060567A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning liquid
fly
liquid receiving
bowl
residual layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/013613
Other languages
English (en)
Japanese (ja)
Inventor
Koji Fujimoto
Atsushi Onodera
Jun Ohashi
Motoki Numata
Takayuki Isogai
Katsunori Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Tomoe Engineering Co Ltd
Original Assignee
Mitsubishi Chemical Corp
Tomoe Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp, Tomoe Engineering Co Ltd filed Critical Mitsubishi Chemical Corp
Priority to AU2002360053A priority Critical patent/AU2002360053A1/en
Priority to PCT/JP2002/013613 priority patent/WO2004060567A1/fr
Priority to US10/540,472 priority patent/US7140494B2/en
Priority to PCT/JP2003/016873 priority patent/WO2004058410A1/fr
Priority to EP09008729A priority patent/EP2108458B1/fr
Priority to CNB2003801074619A priority patent/CN100337755C/zh
Priority to CN200710089696XA priority patent/CN101041145B/zh
Priority to EP03768302A priority patent/EP1579918B8/fr
Priority to AU2003292669A priority patent/AU2003292669A1/en
Publication of WO2004060567A1 publication Critical patent/WO2004060567A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04B—CENTRIFUGES
    • B04B15/00—Other accessories for centrifuges
    • B04B15/12—Other accessories for centrifuges for drying or washing the separated solid particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04B—CENTRIFUGES
    • B04B3/00—Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering
    • B04B3/04—Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering discharging solid particles from the bowl by a conveying screw coaxial with the bowl axis and rotating relatively to the bowl

Definitions

  • a screw conveyer is provided in a bowl, these are rotatably supported, and the processed material is separated from a stock solution supplied into the bowl, and the inner periphery of one end side of the bowl is provided.
  • a centrifugal separator for washing and dewatering the processing object with a screen provided along the surface, a cleaning liquid receiving part for receiving a cleaning liquid supplied to the inside of the hub of the screw conveyer; And a washing nozzle for ejecting the washing liquid toward the screen section.
  • a centrifuge is used for purifying various crystals in the fields of the chemical industry and the food industry. Background art
  • a cleaning nozzle for ejecting the cleaning liquid toward the relevant part is provided on the hub of the screw conveyor, and the cleaning liquid is sprayed all over the crystal being transported by the screen part. Cleaning was done by doing.
  • Patent Literature 1 Japanese Patent Application Laid-Open No. 2000-3202583.
  • the crystals are transported by the conveyor. After a long operation, the remaining layer of the crystal does not move, and is pressed against the outer periphery of the flight, so that the crystal becomes hardened.
  • the present invention has been made in view of the above-mentioned problems of the prior art.
  • a process particularly a crystal or the like, in a main part of a screen part is used.
  • the gist of the present invention to achieve the above-mentioned object lies in the following inventions.
  • a screw conveyer is provided in a bowl, and these are relatively rotatably supported to separate a processed material from a stock solution supplied into the bowl, and an inner peripheral surface on one end side of the bowl.
  • a centrifugal separator for washing and dewatering the above-mentioned processed material in a screen part provided along the line, a cleaning liquid receiving part for receiving the cleaning liquid supplied into the hub of the screw conveyor, A washing nozzle for jetting a washing liquid in a washing liquid receiving section toward the screen section,
  • a plurality of residual layer cleaning liquids are arranged at predetermined intervals in the cleaning liquid receiver along the spiral direction of the fly at a position adjacent to a surface of the screw conveyor on the side opposite to the processed material transfer surface. Make a hole,
  • a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
  • the cleaning liquid in the cleaning liquid receiving portion that protrudes from each of the remaining layer cleaning liquid discharge holes is transferred from the gap between the outer peripheral edge of the fly and the cover flight between the outer peripheral edge of the fly and the inner peripheral surface of the screen portion.
  • a centrifugal separator characterized by ejecting directly to the residual material that is generated in the gap between the two.
  • the cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the bowl, so that a cleaning range in the screen portion can be selected.
  • the centrifuge according to [1].
  • a screw conveyer is provided in the bowl, and these are relatively rotatably supported to separate the processed material from the undiluted solution supplied into the bowl, and to have an inner periphery on one end side of the powl.
  • a washing liquid receiving portion for receiving the washing liquid supplied to the hub of the screw conveyor, and a washing liquid in the washing liquid receiving portion to the screen portion.
  • a centrifugal separator having a wash nozzle that gushes out
  • a residual layer cleaning liquid receiving portion for receiving a cleaning liquid for cleaning a residual layer processed product generated in a gap between an outer peripheral edge of the screw conveyor and the inner peripheral surface of the screen portion is provided. It is provided separately from the inside of the washing liquid receiving section,
  • a plurality of connecting pipes are provided at a position adjacent to a surface of the freight opposite to the processed material conveying surface, at predetermined intervals along a spiral direction of the freight, at a bottom side of the residual layer cleaning liquid receiving portion. Is provided, and a plurality of residual layer cleaning liquid discharge holes are provided in the hub of the screw conveyor so that the connection pipes communicate with each other. Attach a narrow cover fly that extends in the helical direction of the fly with a predetermined gap left on the side surface.
  • the cleaning liquid in the cleaning liquid receiving portion for the residual layer which protrudes from each of the cleaning liquid discharge holes for the residual layer, is jetted directly from the gap between the outer peripheral edge of the flight and the force par flight toward the residual layer processing object.
  • a centrifuge characterized by the above.
  • a feed tube for supplying a stock solution extending in the axial direction is inserted into the inside of the hub of the screw conveyor,
  • a cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening for the cleaning liquid supply path is provided in the middle of the feed tube overlapping the cleaning liquid receiving section in the radial direction.
  • a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving part is formed, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving part.
  • Cleaning solution for the residual layer The centrifuge according to [3], wherein an opening for the supply path is provided.
  • a screw conveyor is provided in the bowl, and these are relatively rotatably supported.
  • the processed material is separated from the stock solution supplied into the bowl, and the inner peripheral surface at one end of the bowl is provided.
  • a centrifugal separator for washing and dewatering the processed material in a screen section provided along the line, wherein a cleaning liquid receiving section for receiving the cleaning liquid supplied to the inside of the haptic of the screw conveyor;
  • a centrifugal separator having a cleaning nozzle for jetting a cleaning liquid in a receiving portion toward the screen portion,
  • a cleaning liquid for a residual layer which receives a cleaning liquid for cleaning a residual layer processing product generated in a gap between an outer peripheral edge of the flight of the star conveyor and an inner peripheral surface of the screen portion inside one end of a hub of the screw conveyor.
  • a receiving chamber is provided separately from the cleaning liquid receiving section,
  • a plurality of cleaning liquid introduction pipes for remaining layers are arranged at predetermined intervals in the circumferential direction of the hub in a state in which a plurality of cleaning liquid introduction pipes for remaining layers penetrate through the fly and extend in the hub axis direction on the outer periphery of the hap of the screw conveyor.
  • One end side of the layer cleaning liquid introduction pipe is connected to the remaining layer cleaning liquid receiving chamber,
  • a narrow-width force par flight that extends in the spiral direction of the flight with a predetermined gap between the opposite surface is attached.
  • the cleaning liquid that jumps out of each of the residual layer cleaning liquid discharge holes is passed through a gap between the outer periphery of the flight and the cover flight.
  • the cover flight is provided with a gradient with respect to the surface on the opposite side of the flight from a side close to the hub to a side close to the outer peripheral edge of the fly at a predetermined interval.
  • the centrifuge described in the above [1] when the stock solution is supplied into the powl, the stock solution is separated into a processed product and a mother liquor in the bowl by centrifugal force, and the processed product is processed on the inner peripheral surface of the bowl.
  • the processed material is conveyed by a screw conveyor provided with a rotation difference from the bowl.
  • the processed material is not sufficiently conveyed by the conveyer, and is removed in the middle of t conveyance, which forms the remaining layer.
  • the liquor is attached to the surface of impurities and mother liquor itself generated during the manufacturing process, and is provided along the inner peripheral surface on one end side of the powl to wash these extraneous substances.
  • cleaning is performed by spraying the cleaning liquid toward the processed product through the cleaning nozzle in the hap of the screw conveyor.
  • the cleaning liquid here is supplied to the cleaning liquid receiving section in the hub via a cleaning liquid supply path separately provided in a feed tube for supplying the undiluted liquid into the bowl.
  • the cleaning liquid in the cleaning liquid receiving portion is jetted from the cleaning nozzle.
  • the cleaning liquid is arranged at predetermined intervals along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. Protrude into the bowl from the multiple remaining layer cleaning solution discharge holes.
  • the cleaning liquid does not scatter, and extends along the outer peripheral edge of the opposite surface of the fly in a spiral direction of the fly with a predetermined gap from the opposite surface.
  • Cover fly It is jetted directly from the narrow gap between the ground and the outer periphery of the flight toward the remaining layer processing material.
  • the cleaning nozzle in addition to the overall cleaning of the processed material by the cleaning nozzle, it is also possible to perform, in particular, the local cleaning of the remaining layer processed material, so that the remaining layer processed material is prevented from sticking and the mobility is improved, and the transport is performed.
  • the permeability of the cleaning solution to the whole processed material is also improved. Therefore, clogging of the processing object in the screen part can be prevented beforehand, and the amount of cleaning liquid for replacing impurities in the original processing object can be suppressed, and the processing in the screen part can be suppressed. It is also possible to reduce the amount of leakage of an object.
  • the cleaning liquid receiving portion when the cleaning liquid receiving portion is provided with a partition plate for partitioning the inside of the cleaning liquid receiving portion into a plurality of portions in the axial direction of the screen portion of the powl, for example, supplying the undiluted solution into the bowl
  • the cleaning liquid may be supplied to all the sections of the cleaning liquid receiving section via a cleaning liquid supply path separately provided in the feed tube, or the cleaning liquid may be supplied only to some of the sections. Is also possible.
  • the cleaning liquid is jetted only to the screen portion in the range overlapping the bowl in the radial direction in the section of the cleaning liquid receiving portion to which the cleaning liquid is supplied, so that the cleaning range in the screen portion is appropriately selected. Can be done.
  • the cleaning liquid receiving portion for receiving the cleaning liquid for cleaning the remaining layer of the processed material is formed in the cleaning liquid receiving portion independently of the inside of the cleaning liquid receiving portion.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving portion is disposed along the spiral direction of the fly at a position adjacent to the surface of the fly opposite to the processing object transport surface. It passes through the connection pipes provided at predetermined intervals and jumps out of the residual layer cleaning liquid discharge hole provided in the hub of the screw conveyor.
  • the washing liquid that has flown out into the bowl does not scatter, and along the outer peripheral edge on the surface on the opposite side of the fly, a narrow cover fly that extends in the spiral direction of the fly, and an outer peripheral edge of the fly Is ejected directly toward the residual layer processing object from a narrow gap between the above.
  • the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material can be improved.
  • a cleaning liquid supply path for supplying the cleaning liquid to the cleaning liquid receiving section is formed in the feed tube, and an opening of the cleaning liquid supply path is provided in the middle of the feed tube radially overlapping the cleaning liquid receiving section.
  • a residual layer cleaning liquid supply path for supplying the residual layer cleaning liquid to the residual layer cleaning liquid receiving section is formed in the feed tube, and in the middle of a feed tube radially overlapping the residual layer cleaning liquid receiving section.
  • a cleaning liquid receiving chamber for a residual layer for receiving a cleaning liquid for cleaning a residual layer of the processed material is provided inside the one end side of the hap, separately from the cleaning liquid receiving section.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving chamber is introduced into a plurality of residual layer cleaning liquid introduction pipes arranged on the outer periphery of the hub.
  • each residual-layer cleaning liquid introduction pipe jumps into the bowl through a plurality of residual-layer cleaning liquid discharge holes provided at predetermined intervals in the middle of each residual-layer cleaning liquid introduction pipe. .
  • the cleaning solution that has popped out here Along with the outer peripheral edge on the opposite side of the fly, a narrow gap between the cover fly in the spiral direction of the fly and the outer peripheral edge of the fly is directed toward the residual layer processing object. It is gushing directly. This makes it possible to increase the permeability of the cleaning liquid to the processed material and the mobility of the residual layer processed material, as in the above [1] and [3].
  • the cover fly is moved from the side close to the hub to the side close to the outer peripheral edge of the fly with respect to the opposite surface of the fly.
  • the cleaning liquid is ejected from the hub side in a wide range, the received cleaning liquid can be applied to the remaining layer processing material from a narrower area by attaching the supporting liquid through a support plate arranged at predetermined intervals with a gradient that gradually narrows the gap. It can be spouted directly.
  • FIG. 1 is a longitudinal sectional view showing a main part of a centrifuge according to a first embodiment of the present invention.
  • FIG. 2 is a longitudinal sectional view showing the whole of the centrifuge according to the first embodiment of the present invention.
  • FIG. 3 is a sectional view taken along line III-II of FIG.
  • FIG. 4 is a longitudinal sectional view showing a main part of a centrifuge according to a second embodiment of the present invention.
  • FIG. 5 is a longitudinal sectional view showing a main part of a centrifuge according to a third embodiment of the present invention.
  • FIG. 6 is a sectional view taken along line VI-VI of FIG.
  • FIG. 7 is a longitudinal sectional view showing a main part of a centrifuge according to a fourth embodiment of the present invention.
  • FIG. 8 is a sectional view taken along the line VI II-VIII of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 to 3 show a first embodiment of the present invention.
  • the centrifugal separator 10 is called a screen bowl type centrifugal separator.
  • the centrifugal separator 10 includes a screw con- troller 40 in a substantially cylindrical bowl 20. Rotatably supported on the powl
  • the processing solution to be processed and the mother liquor are configured to be separately separated from the stock solution supplied into the storage solution.
  • the treated material corresponds to various crystals in the fields of the chemical industry and the food industry.
  • terephthalic acid as a raw material for pet bottles and polyester fibers
  • paraxylene as a raw material for terephthalic acid
  • CD — R terephthalic acid
  • Bisphenol which is a raw material for OM
  • glutamin soda which is a raw material for chemical seasonings
  • Various solvents correspond to the mother liquor.
  • Each seed crystal has an unpolymerized substance / a solvent constituting the slurry adhered to the crystal surface during the manufacturing process, and these adhered substances can be washed and replaced with a washing liquid (a specific other solvent or the like).
  • a washing liquid a specific other solvent or the like
  • the bow 20 and the screw conveyor 40 inside the bow 20 are rotatably supported inside the casing 11 via shafts 12a and 12b.
  • the bowl 20 and the screw conveyor 40 are rotationally driven at a slight differential speed by a differential device 14 provided continuously with the bearing 13 on one side.
  • a differential device 14 itself is publicly known, and a detailed description thereof will be omitted.
  • the interior of the casing 11 is defined so as to correspond to a discharge port 24, a screen portion 30, a dam portion 26, and the like provided in a bowl 20 described below.
  • a crystal discharge port 15 communicating with the discharge port 24 and a cleaning liquid discharge communicating with the screen section 30 are provided at a lower portion of the casing 11.
  • An opening 16 and a mother liquor outlet 11 communicating with the dam portion 26 are provided, respectively.
  • One end of the bowl 20 (the right side in Fig. 2) is the direction of crystal discharge.
  • the large-diameter parallel cylindrical section 21 and the other ends in the order from the other end of the bowl 20 (the left side in Fig. 2). It is divided into a tapered portion 22 whose inner diameter gradually decreases toward one end, and a small-diameter parallel cylindrical portion 23.
  • a crystal outlet 24 is opened, and at the distal end of the large-diameter parallel cylindrical portion 21, the liquid depth in the radial direction of the bowl 20 is regulated.
  • a dam 26 is provided which can discharge the mother liquor from which the crystals have been separated out of the bowl 20.
  • the small-diameter parallel cylindrical portion 23 has a large number of filtrate discharge holes 25 formed on the wall surface, and the inner peripheral side is covered with a cylindrical filter medium 31 in the entire circumferential direction, and the screen portion is formed. It is 30.
  • the size of the filtrate discharge hole 25 does not need to take into account the crystal particle diameter, but the filter medium 31 is made of a material having a large number of micropores or slits whose diameter is smaller than the crystal particle diameter. .
  • edge wire screen, a porous ceramic molded body, or the like may be used.
  • the inner peripheral surface of the parallel cylindrical portion 23 is shaved by the thickness of the filter medium 31.
  • the screw conveyor 40 is composed of a hub 41 serving as a rotating shaft thereof, and a fly 42 provided in a screw-shape on the outer periphery of the hub 41. It is formed so as to be conveyed to one end (right side in Fig. 2).
  • the screw conveyor 40 and the bowl 20 have different speeds between the outer peripheral edge of the fly 42 and the inner peripheral surface of the parallel tube portion 23 (the surface of the filter medium 31 of the screen portion 30). It is set so that there is a gap in the radial direction due to the structure that rotates with.
  • the hub 41 has a cleaning liquid receiving section 43 for receiving the cleaning liquid supplied therein, and the cleaning liquid in the cleaning liquid receiving section 43 is filled with the cleaning liquid in the bowl 20. And a cleaning nozzle 45 ejecting toward the cleaning section 30.
  • the cleaning liquid receiving portion 43 is a portion surrounded by a partition extending to a predetermined width in the axial direction over the entire inner circumferential surface of the hub 41.
  • a cleaning liquid discharge hole 44 is provided at predetermined intervals on a peripheral wall of the hap 41, which is a bottom side of the cleaning liquid receiving portion 43, and a cleaning communicating with the cleaning liquid discharge hole 44 is provided on an outer peripheral surface side of the hub 41.
  • Nozzles 45 are provided.
  • the cleaning nozzle 45 is arranged at a position slightly opposite to the center of the pitch of the fly 42 as shown in FIG. 1 (left side in FIG. 1) and facing the screen portion 30 in the radial direction. I have.
  • a predetermined interval is provided along the spiral direction of the fly 42 at a position adjacent to the surface 42b opposite to the processed material transfer surface 42a of the fly 42.
  • a plurality of residual layer cleaning liquid discharge holes 48 are provided.
  • the remaining-layer cleaning liquid discharge hole 48 is used to directly jet the cleaning liquid in the cleaning liquid receiving section 43 toward the remaining layer crystal on the screen section 30 separately from the cleaning nozzle 45. Things.
  • a predetermined gap is provided with respect to the surface 42b on the opposite side.
  • a narrow cover flight 50 extending in the helical direction 2 is attached.
  • the cleaning liquid that jumps out from the residual layer cleaning liquid discharge hole 48 is jetted directly to the residual layer crystal from a gap between the outer periphery of the light 42 and the cover fly 50. I have.
  • the cover flight 50 has a gradient with respect to the surface 42 b on the opposite side of the flight 42 that gradually narrows the gap from the side close to the hap 41 to the side close to the outer periphery of the fly 42. It is arranged in a state of being attached, and is attached via a support plate 51 arranged at predetermined intervals along the spiral direction of the fly 42.
  • a feed tube 60 for supplying a stock solution extending in the axial direction is inserted inside the hap 41.
  • the starting end of the feed tube 60 extends outside from the hub 41 and the bowl 20 to become a stock solution supply port 61, and the end of the feed tube 60 is arranged substantially in the center of the hub 41 and has a stock solution outlet 6.
  • the cleaning liquid supply pipe 71 for supplying the cleaning liquid to the cleaning liquid receiving section 43 is inserted into the feed tube 60.
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60. Also, in the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 43 in the hub 41, an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. are doing.
  • the undiluted solution is supplied into the bowl 20 via a feed tube 6, 0 using a drive source such as a pump.
  • the undiluted solution sent from the undiluted solution supply port 61 of the feed tube 60 exits from the undiluted solution outlet 62 located near the center of the hub 41 of the screw conveyer 40, and is damped in the powls 2,0. It is stuck to a predetermined depth set in 26.
  • the undiluted solution is subjected to the action of centrifugal force in the poule 20 and the crystals are settled and separated from the mother liquor.
  • the crystal that settles to the inner peripheral surface of the bowl 20 due to the action of the centrifugal force is turned into the tapered portion of the powl 20 by the fly 42 of the screw conveyor 40 rotating at a slightly different speed from the bowl 20. 22 and is drained when it moves on the outer circumferential surface of the tapered section 22 to the inner diameter side from the liquid depth set in advance in the dam section 26, and is further transferred to the screen section 30 Is done.
  • Crystals that have been drained during transportation have impurities and mother liquor themselves generated during the manufacturing process adhered to the surface, and crystals that have reached the screen section 30 have cleaning nozzles 4 located in the hub 41. Washed by the washing liquid spouted from 5,
  • the washing liquid is generally pure water, acetic acid, pure phenol, sulfuric acid, hydrochloric acid, or the like.
  • the washing liquid receiving section 4 3 in the hub 41 is provided via the washing liquid supply pipe 71 inserted separately into the feed tube 60. Supplied to The cleaning liquid received in the cleaning liquid receiving portion 43 passes through the cleaning liquid discharge hole 44 on the peripheral wall of the hub 41 and is discharged from the cleaning nozzle 45.
  • the crystal undergoes the washing and draining action in the screen section 30 and is further conveyed to the discharge port 24 side.
  • the outer periphery of the screen conveyor 40 and the screen section 3 0 A residual layer of crystals is formed in the gap between the inner peripheral surface. Apart from the cleaning by the cleaning nozzle 45, such residual layer crystals are directly and locally cleaned by a cleaning liquid sprayed from the outer periphery of the fly 42.
  • the cleaning liquid in the cleaning liquid receiving portion 43 flows along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a. From the plurality of remaining layer cleaning liquid discharge holes 48 arranged at predetermined intervals.
  • the cleaning liquid that has come out here does not scatter, and is scattered between the force par flute 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. Are ejected directly from the narrow gap toward the residual layer crystal.
  • the force par flight 50 is located close to the outer periphery of the fly 42 from the side close to the hub 41 with respect to the opposite surface 42 b of the fly 42. Attached via the support plates 51 arranged at predetermined intervals with a gradient that gradually narrows the gap toward the side, so that the cleaning liquid ejecting from the cleaning liquid discharge holes 48 for each remaining layer can be received and received over a wide area.
  • the cleaning liquid can be jetted locally and directly to the remaining layer crystals from a narrow range.
  • the cleaning liquid ejected from the outer periphery of the cleaning nozzle 45 and the fly 42 passes through the filter medium 31 after washing the crystals and remaining layer crystals, and is discharged from the filtrate discharge hole 25 to the outside of the bowl 20. Is done. Further, the crystals washed and drained in the screen section 30 are discharged to the outside of the bowl 20 from the discharge port 24 and finally collected from the crystal discharge port 15 in the casing 11. .
  • FIG. 4 shows a second embodiment of the present invention.
  • the cleaning liquid receiving portion 43 includes a partition plate 43 that divides the inside of the cleaning liquid receiving portion 43 in the axial direction of the screen portion 30 of the bowl 20 into a plurality. Is provided so that the cleaning range in the screen section 30 can be selected.
  • the same parts as those in the first embodiment are denoted by the same reference numerals, and redundant description will be omitted.
  • the cleaning liquid is supplied to one of the cleaning liquid receiving portions 43, which is partitioned by the partition plate 43a (the left portion in FIG. 4).
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • One of the inside of the washing liquid receiving portion 43 in the hub 41 is partitioned by the partition plate 43a (in FIG. 4, In the middle of the feed tube 60 radially overlapping the left side portion), an opening 71 b of the cleaning liquid supply tube 71 is opened substantially perpendicular to the axial direction.
  • the starting end of the cleaning liquid supply pipe 73 forms a cleaning liquid supply port 73 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • the cleaning liquid is supplied in the middle of the feed tube 60 radially overlapping the other part (the right part in FIG. 4) of the cleaning liquid receiving portion 43 in the hub 41, which is partitioned by the partition plate 43a.
  • the opening 73 b of the tube 73 is opened substantially at right angles to the axial direction.
  • the inside of the cleaning liquid receiving portion 43 is divided into two in the axial direction by one partition plate 43a, but it is a matter of course that the present invention is not limited to this mode.
  • two partition plates 43a are provided to divide the inside of the cleaning liquid receiving portion 43 into three in the axial direction, or two partition plates 43a are provided and the inside of the cleaning liquid receiving portion 43 It may be divided into four in the direction.
  • the cleaning liquid receiving section 4 3 is provided via the cleaning liquid supply path 71 and the cleaning liquid supply path 73 provided separately in the feed tube 60 for supplying the undiluted liquid into the powl 20.
  • the cleaning liquid may be supplied to all of the compartments, or the cleaning liquid may be supplied only to some of the compartments.
  • FIG. 5 and FIG. 6 show a third embodiment of the present invention.
  • the cleaning liquid receiving portion 43 receives the cleaning liquid for cleaning the residual layer crystals in the cleaning liquid receiving portion 43. 6 is provided separately from the inside of the cleaning liquid receiving section 43.
  • the residual layer cleaning liquid receiving portion 46 is provided with a partition extending at a predetermined width in the axial direction over the entire circumferential direction at both ends of the cylindrical member, and a connection pipe is provided at a predetermined interval on the bottom side. 47 is protruded, and the residual layer cleaning liquid receiving portion 46 is fixedly mounted in the cleaning liquid receiving portion 43 so as to be separated from the inner peripheral surface of the hub 41 by the respective connection pipes 47. .
  • each connection pipe 47 extends along the spiral direction of the fly 42 at a position adjacent to the surface 42 b of the fly 42 opposite to the processing surface 42 a.
  • the hub 41 is provided with a cleaning liquid discharge hole 48 for a residual layer on the peripheral wall of the hub 41, to which the connection pipes 47 communicate.
  • the cleaning liquid in the cleaning liquid receiving portion 46 for the residual layer which flows out from the cleaning liquid discharge hole 48 for the residual layer.
  • the cleaning liquid is jetted directly from the gap between the cover fly 50 and the outer periphery 42 to the residual crystal. It has become to be.
  • a cleaning liquid supply pipe 71 serving as a cleaning liquid supply path for supplying a cleaning liquid to the cleaning liquid receiving section 43, and a cleaning liquid is supplied to the residual layer cleaning liquid receiving section 46.
  • the cleaning liquid supply pipes 72 for the residual layer forming the supply path of the cleaning liquid for the residual layer are separately introduced.
  • the starting end of the cleaning liquid supply pipe 71 forms a cleaning liquid supply port 71 a that opens substantially perpendicularly to the axial direction on the starting end side of the feed tube 60.
  • an opening 71b of the cleaning liquid supply pipe 71 is opened substantially at right angles to the axial direction. I have.
  • the starting end of the residual-layer cleaning liquid supply pipe 72 forms a residual-layer cleaning liquid supply port 72 a that opens substantially perpendicularly to the axial direction on the start end side of the feed tube 60.
  • the supply pipe 72 for the cleaning liquid for the residual layer is opened in the middle of the feed tube 60 radially overlapping the cleaning liquid receiving portion 46 for the residual layer in the hub 41.
  • the outlet 72b is opened substantially perpendicular to the axial direction.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving portion 46 is applied to the surface 42b of the fly 42 opposite to the processing object transport surface 42a. At the adjacent position, through the connecting pipes 47 provided at predetermined intervals along the spiral direction of the fly 42, the residual layer cleaning liquid provided in the hub 41 of the screw compressor 40. Jump out of the discharge hole 4 8.
  • the cleaning liquid that has flown into the bowl 20 is not scattered, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42 b on the opposite side of the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal.
  • the cleaning liquid is supplied separately to the cleaning liquid receiving section 43 and the residual layer cleaning liquid receiving section 46 in a state where they are separated from each other, the amount of the cleaning liquid ejected from the cleaning nozzle 45 and the cover Since the amount of the cleaning liquid ejected from the narrow gap between the freight 50 and the fringe 42 can be controlled separately from the outside, the replacement rate of crystal cleaning and the amount of leaks are reduced. Therefore, it is possible to easily adjust both of the optimal amounts of the cleaning liquid for achieving the above-mentioned conditions.
  • FIG. 7 and FIG. 8 show a fourth embodiment of the present invention.
  • the residual layer cleaning liquid receiving chamber 54 for receiving the cleaning liquid for cleaning the residual layer crystals is provided inside one end of the hap 41 of the screw conveyor 40. It is provided separately from the cleaning liquid receiving section 43. In the present embodiment, the remaining layer cleaning liquid receiving chamber 54 is provided at the foremost portion of the hub 41.
  • a plurality of cleaning liquid introduction pipes 53 for the remaining layer penetrate the aforementioned fly 42 and extend in the axial direction of the hub 41, and extend in the circumferential direction of the hub 41. They are mounted so as to be arranged at predetermined intervals. Said At the bottom of the residual layer cleaning liquid receiving chamber 54, a residual layer cleaning liquid communication hole 54a is drilled, and one end of each residual layer cleaning liquid introduction pipe 53 communicates with the residual layer cleaning liquid. It is connected to the remaining layer cleaning liquid receiving chamber 54 through the hole 54a.
  • the other end of the cleaning liquid introduction pipe 53 for each residual layer is closed, but in the middle of each of the cleaning liquid introduction pipes 53 for the residual layer, the surface 4 2 b on the opposite side of the fly 42 is placed.
  • a plurality of residual layer cleaning liquid discharge holes 53 a are provided at predetermined intervals along the spiral direction of the fly 42.
  • the cleaning liquid in the cleaning liquid receiving chamber 54 for the residual layer which protrudes from each of the cleaning liquid discharge holes 53 for the residual layer is supplied to the crystal of the residual layer through the gap between the force par flute 50 and the outer periphery of the fly 42. So that it can be spouted directly.
  • an opening 72b of the residual layer cleaning liquid supply pipe 72 is substantially in the axial direction. It opens at right angles.
  • the cleaning liquid supplied to the residual layer cleaning liquid receiving chamber 54 is supplied to the plurality of residual layer cleaning liquid introduction pipes 53 arranged on the outer periphery of the hub 41. Respectively.
  • the cleaning liquid introduced into each of the remaining layer cleaning liquid introduction pipes 53 is provided with a plurality of remaining layer cleaning liquid discharge holes 53 provided at predetermined intervals in the middle of each of the remaining layer cleaning liquid introduction pipes 53. Go through a and jump into bowl 20. '
  • the cleaning liquid that has flown out into the bowl 20 ⁇ does not splatter, and is not scattered between the cover fly 50 attached along the outer peripheral edge of the surface 42b opposite to the fly 42 and the outer peripheral edge of the fly 42. From the narrow gap between them, it is possible to jet directly toward the remaining layer crystal. As a result, it is possible to separately wash the processed material with the cleaning nozzle 45 and the remaining layer crystal with each of the remaining layer cleaning solution introduction pipes 53, and to change the type and amount of each cleaning solution. It can be different.
  • cleaning liquid can be directly sprayed from the outer periphery of the fry of a screen conveyor to the remaining layer processed material adhering to the outer peripheral surface of a screen part. Therefore, the mobility of this residual layer is improved, and the permeability of the entire cleaning liquid is increased.Therefore, only the residual layer treated material is locally washed to increase the liquid content of the treated product, thereby preventing the residual layer from solidifying. Becomes possible.
  • the amount of the processing object is proportional to the amount of the cleaning liquid passing through the processing object layer, and the amount is proportional to the opening of the screen part. Leakage of the processed material occurs, but by spraying the cleaning liquid directly from the outer peripheral edge of the frit onto the remaining processed material as described above, the remaining processed material is prevented from sticking to the processed material being transported. Since the permeability of the cleaning liquid is improved, the amount of the cleaning liquid for replacing impurities in the original processed material can be suppressed, and the total leak amount of the processed material in the screen area can be reduced. It becomes.

Landscapes

  • Centrifugal Separators (AREA)

Abstract

L'invention concerne un séparateur centrifuge à bol perforé permettant de supprimer les baisses de rendement due à l'obstruction par un matériau à traiter, par exemple des cristaux, de la partie tamis constituant une des parties principales du séparateur, et de réduire les fuites de matériau à traiter dans la partie tamis. Ce séparateur comprend un réceptacle (43) de liquide de nettoyage installé dans le moyeu (41) d'un transporteur (40) à vis, et recevant un liquide de nettoyage destiné à une buse (45) de nettoyage. Une pluralité d'orifices (48) permettant la sortie d'un liquide destiné au nettoyage de la couche résiduelle, sont formés dans le réceptacle (43) de liquide de nettoyage. Le liquide de nettoyage injecté dans le bol (20) à travers de chaque orifice (48) de sortie de liquide de nettoyage de couche résiduelle, est injecté directement en direction de la couche résiduelle de matériau à traiter, à travers un espace étroit formé entre un filet (50) recouvrant en forme de bande étroite s'étendant direction hélicoïdale, sur la surface (42b) du filet opposée à la surface (42a) servant au transport du matériau à traiter, et la périphérie externe du filet.
PCT/JP2002/013613 2002-12-26 2002-12-26 Separateur centrifuge Ceased WO2004060567A1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
AU2002360053A AU2002360053A1 (en) 2002-12-26 2002-12-26 Centrifugal separator
PCT/JP2002/013613 WO2004060567A1 (fr) 2002-12-26 2002-12-26 Separateur centrifuge
US10/540,472 US7140494B2 (en) 2002-12-26 2003-12-26 Centrifugal machine
PCT/JP2003/016873 WO2004058410A1 (fr) 2002-12-26 2003-12-26 Centrifugeuse
EP09008729A EP2108458B1 (fr) 2002-12-26 2003-12-26 Séparateur par centrifugation
CNB2003801074619A CN100337755C (zh) 2002-12-26 2003-12-26 离心分离机
CN200710089696XA CN101041145B (zh) 2002-12-26 2003-12-26 离心分离机
EP03768302A EP1579918B8 (fr) 2002-12-26 2003-12-26 Centrifugeuse
AU2003292669A AU2003292669A1 (en) 2002-12-26 2003-12-26 Centrifugal machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2002/013613 WO2004060567A1 (fr) 2002-12-26 2002-12-26 Separateur centrifuge

Publications (1)

Publication Number Publication Date
WO2004060567A1 true WO2004060567A1 (fr) 2004-07-22

Family

ID=32697300

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/013613 Ceased WO2004060567A1 (fr) 2002-12-26 2002-12-26 Separateur centrifuge

Country Status (2)

Country Link
AU (1) AU2002360053A1 (fr)
WO (1) WO2004060567A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112387428A (zh) * 2020-12-04 2021-02-23 成都高分离心机有限公司 离心机的螺旋推料器及卧螺离心机

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4513750Y1 (fr) * 1969-09-17 1970-06-11
US5509882A (en) * 1994-09-12 1996-04-23 Tetra Laval Holdings & Finance S.A. Decanter centrifuge having an offset conveyor flight to aid rinsing
US5653673A (en) * 1994-06-27 1997-08-05 Amoco Corporation Wash conduit configuration in a centrifuge apparatus and uses thereof
JPH1028899A (ja) * 1996-07-16 1998-02-03 Tsukishima Kikai Co Ltd スクリーン・ボウルデカンタ遠心分離機
WO2000071260A1 (fr) * 1999-05-21 2000-11-30 Tomoe Engineering Co.,Ltd. Separateur centrifuge de type decanteur
JP2003062487A (ja) * 2001-08-29 2003-03-04 Mitsubishi Chemicals Corp 固液分離方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4513750Y1 (fr) * 1969-09-17 1970-06-11
US5653673A (en) * 1994-06-27 1997-08-05 Amoco Corporation Wash conduit configuration in a centrifuge apparatus and uses thereof
US5509882A (en) * 1994-09-12 1996-04-23 Tetra Laval Holdings & Finance S.A. Decanter centrifuge having an offset conveyor flight to aid rinsing
JPH1028899A (ja) * 1996-07-16 1998-02-03 Tsukishima Kikai Co Ltd スクリーン・ボウルデカンタ遠心分離機
WO2000071260A1 (fr) * 1999-05-21 2000-11-30 Tomoe Engineering Co.,Ltd. Separateur centrifuge de type decanteur
JP2003062487A (ja) * 2001-08-29 2003-03-04 Mitsubishi Chemicals Corp 固液分離方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112387428A (zh) * 2020-12-04 2021-02-23 成都高分离心机有限公司 离心机的螺旋推料器及卧螺离心机
CN112387428B (zh) * 2020-12-04 2021-11-16 成都高分离心机有限公司 离心机的螺旋推料器及卧螺离心机

Also Published As

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AU2002360053A1 (en) 2004-07-29

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