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WO2004041760A3 - Fluorinated polymers - Google Patents

Fluorinated polymers Download PDF

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Publication number
WO2004041760A3
WO2004041760A3 PCT/US2003/035223 US0335223W WO2004041760A3 WO 2004041760 A3 WO2004041760 A3 WO 2004041760A3 US 0335223 W US0335223 W US 0335223W WO 2004041760 A3 WO2004041760 A3 WO 2004041760A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluorinated polymers
compounds
present
fluorine
hydroxyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2003/035223
Other languages
French (fr)
Other versions
WO2004041760A2 (en
Inventor
Andrew J Poss
Jing Ji Ma
Der Puy Michael Van
David Nalewajek
Haridasan K Nair
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Priority to AU2003291279A priority Critical patent/AU2003291279A1/en
Publication of WO2004041760A2 publication Critical patent/WO2004041760A2/en
Publication of WO2004041760A3 publication Critical patent/WO2004041760A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/40—Halogenated unsaturated alcohols
    • C07C33/44—Halogenated unsaturated alcohols containing rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C35/48—Halogenated derivatives
    • C07C35/52—Alcohols with a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F32/08—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having two condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Provided are compounds described by the formula (I), wherein W, X, Y and Z are independently selected from the group consisting of hydrogen, fluorine, hydroxyl, substituted alkyl and unsubstituted alkyl. Also provided are methods of making compounds of the present invention, and polymers derived from one or more compounds of the present invention.
PCT/US2003/035223 2002-11-05 2003-11-03 Fluorinated polymers Ceased WO2004041760A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003291279A AU2003291279A1 (en) 2002-11-05 2003-11-03 Fluorinated polymers

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43288602P 2002-11-05 2002-11-05
US60/432,886 2002-11-05

Publications (2)

Publication Number Publication Date
WO2004041760A2 WO2004041760A2 (en) 2004-05-21
WO2004041760A3 true WO2004041760A3 (en) 2004-06-24

Family

ID=32313166

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/035223 Ceased WO2004041760A2 (en) 2002-11-05 2003-11-03 Fluorinated polymers

Country Status (2)

Country Link
AU (1) AU2003291279A1 (en)
WO (1) WO2004041760A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5719514B2 (en) * 2009-02-08 2015-05-20 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ Coating compositions suitable for use with overcoated photoresist
US8883407B2 (en) 2009-06-12 2014-11-11 Rohm And Haas Electronic Materials Llc Coating compositions suitable for use with an overcoated photoresist

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4104392A1 (en) * 1991-02-14 1992-08-20 Hoechst Ag Light wave guide and new polymers - are based on poly:norbornene or poly:norbornadiene prods. partic. contg. fluoro or fluoro-alkyl substits.
WO2000067072A1 (en) * 1999-05-04 2000-11-09 E.I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
US6468712B1 (en) * 2000-02-25 2002-10-22 Massachusetts Institute Of Technology Resist materials for 157-nm lithography
WO2003073169A2 (en) * 2002-02-21 2003-09-04 Honeywell International Inc. Fluorinated molecules and methods of making and using same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4104392A1 (en) * 1991-02-14 1992-08-20 Hoechst Ag Light wave guide and new polymers - are based on poly:norbornene or poly:norbornadiene prods. partic. contg. fluoro or fluoro-alkyl substits.
WO2000067072A1 (en) * 1999-05-04 2000-11-09 E.I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
US6468712B1 (en) * 2000-02-25 2002-10-22 Massachusetts Institute Of Technology Resist materials for 157-nm lithography
WO2003073169A2 (en) * 2002-02-21 2003-09-04 Honeywell International Inc. Fluorinated molecules and methods of making and using same

Non-Patent Citations (13)

* Cited by examiner, † Cited by third party
Title
BRAENDLIN, H. P. ET AL., J. AMER. CHEM. SOC., vol. 84, 1962, pages 2112 - 2115 *
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276799, Database accession no. 2056783 *
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276800, Database accession no. 1875563 (BRN) *
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276801, Database accession no. 3241179 (BRN) *
DATABASE CROSSFIRE BEILSTEIN [online] Beilstein Institut zur Förderung der Chemischen Wissenschaften, Frankfurt am Main, DE; XP002276802, Database accession no. 1926324 (BRN) *
HUNG, RAYMOND J. ET AL.: "Resist Materials for 157 nm Microlithography: An Update", ADVANCES IN RESIST TECHNOLOGY AND PROCESSING - PROCEEDINGS OF SPIE- THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 2001, pages 385 - 395, XP009012603 *
JORNAL OF ORGANIC CHEMISTRY, vol. 44, 1979, pages 3485 - 3491 *
KEROV, I. I. ET AL., PET. CHEM. USSR (ENGL. TRANSL.), vol. 38, no. 3, 1998, pages 156 - 163 *
MCBEE EARL T. ET AL.: "Stereochemistry of the Diels-Alder Reaction. V. Fluorinated Trans-Olefinic Acids and Derivatives with Cyclopentadiene", JOURNAL OF ORGANIC CHEMISTRY, vol. 38, no. 4, 1973, pages 632 - 636, XP002245294 *
MCBEE ET AL., J. AMER. CHEM. SOC., vol. 77, 1955, pages 917 *
PIRKLE, WILLIAM H. ET AL.: "Use of Liquid-Crystal-Induced Circular Dichroism for Determination of Absolute Configuration of Alcohols and Oxaziridines", JOURNAL OF ORGANIC CHEMISTRY, vol. 45, 1980, pages 1379 - 1382, XP002957666 *
SHONO, TATSUYA ET AL.: "A Novel Trifluoromethylation of Aldehydes and Ketones Promoted by an Electrogenerated Base", JOURNAL OF ORGANIC CHEMISTRY, vol. 56, 1991, pages 2 - 4, XP002276797 *
VOHRA, VAISHALI RAGHU ET AL: "Highly transparent resist platforms for 157-nm microlithography: an updat", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING (2002), 4690(PT. 1, ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX), 84-93, XP001180659 *

Also Published As

Publication number Publication date
WO2004041760A2 (en) 2004-05-21
AU2003291279A1 (en) 2004-06-07

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