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WO2003034475A1 - Method and device for gas displacement, mask protective device, mask, and method and device for exposure - Google Patents

Method and device for gas displacement, mask protective device, mask, and method and device for exposure Download PDF

Info

Publication number
WO2003034475A1
WO2003034475A1 PCT/JP2002/010552 JP0210552W WO03034475A1 WO 2003034475 A1 WO2003034475 A1 WO 2003034475A1 JP 0210552 W JP0210552 W JP 0210552W WO 03034475 A1 WO03034475 A1 WO 03034475A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
space
mask
gas replacement
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/010552
Other languages
French (fr)
Japanese (ja)
Inventor
Hiroyuki Nagasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP2003537107A priority Critical patent/JPWO2003034475A1/en
Publication of WO2003034475A1 publication Critical patent/WO2003034475A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A gas replacement device capable of efficiently and stably replacing gas in a space formed between a mask and a protective member installed through a frame member, comprising the mask, a pellicle, and a gas replacement mechanism for a gas replacement chamber capable of replacing gas inside a first space formed in the space thereof from a pellicle frame with specific gas and feeding the specific gas to the gas replacement chamber, wherein a first opening part allowing the inside of the first space to communicate with the outside is provided in the pellicle frame, and a space forming member forming a second space is connected to the pellicle frame on the opposite side of the first space through the pellicle, whereby, since the gas replacement mechanism for the gas replacement chamber feeds the specific gas to the gas replacement chamber, the specific gas can be fed to the first space through the first opening part.
PCT/JP2002/010552 2001-10-10 2002-10-10 Method and device for gas displacement, mask protective device, mask, and method and device for exposure Ceased WO2003034475A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003537107A JPWO2003034475A1 (en) 2001-10-10 2002-10-10 Gas replacement method and apparatus, mask protection apparatus, mask, exposure method and apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001313136 2001-10-10
JP2001-313136 2001-10-10

Publications (1)

Publication Number Publication Date
WO2003034475A1 true WO2003034475A1 (en) 2003-04-24

Family

ID=19131676

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010552 Ceased WO2003034475A1 (en) 2001-10-10 2002-10-10 Method and device for gas displacement, mask protective device, mask, and method and device for exposure

Country Status (2)

Country Link
JP (1) JPWO2003034475A1 (en)
WO (1) WO2003034475A1 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010700A (en) * 2003-06-23 2005-01-13 Toppan Printing Co Ltd Exposure plate inspection apparatus and inspection method
JP2009182339A (en) * 2004-12-07 2009-08-13 Asml Netherlands Bv Lithographic apparatus, reticle exchange unit, and device manufacturing method
US7619718B2 (en) 2003-10-07 2009-11-17 Asml Holding N.V. Method and system for active purging of pellicle volumes
JP2013539559A (en) * 2010-09-08 2013-10-24 アデイクセン・バキユーム・プロダクト Method and apparatus for removing contamination of reticle with pellicle
US9403196B2 (en) 2010-06-29 2016-08-02 Adixen Vacuum Products Treatment device for transport and storage boxes
US9779972B2 (en) 2009-12-18 2017-10-03 Adixen Vacuum Products Method and device for controlling the manufacture of semiconductor by measuring contamination
US11868041B2 (en) * 2017-05-10 2024-01-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106233201A (en) * 2014-05-02 2016-12-14 三井化学株式会社 Protecting film component blocks, protecting film assembly and manufacture method thereof, exposure master and the manufacture method of manufacture method, exposure device and semiconductor device thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627644A (en) * 1992-07-08 1994-02-04 Seiko Epson Corp Pellicle and production of pellicle
JP2001267200A (en) * 2000-03-14 2001-09-28 Nikon Corp Gas replacement method and apparatus, and exposure method and apparatus
JP2002033258A (en) * 2000-07-17 2002-01-31 Nikon Corp Exposure apparatus, mask apparatus, pattern protection apparatus, and device manufacturing method
JP2002372777A (en) * 2001-06-18 2002-12-26 Canon Inc Gas replacement method and exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627644A (en) * 1992-07-08 1994-02-04 Seiko Epson Corp Pellicle and production of pellicle
JP2001267200A (en) * 2000-03-14 2001-09-28 Nikon Corp Gas replacement method and apparatus, and exposure method and apparatus
JP2002033258A (en) * 2000-07-17 2002-01-31 Nikon Corp Exposure apparatus, mask apparatus, pattern protection apparatus, and device manufacturing method
JP2002372777A (en) * 2001-06-18 2002-12-26 Canon Inc Gas replacement method and exposure apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010700A (en) * 2003-06-23 2005-01-13 Toppan Printing Co Ltd Exposure plate inspection apparatus and inspection method
US7619718B2 (en) 2003-10-07 2009-11-17 Asml Holding N.V. Method and system for active purging of pellicle volumes
JP2009182339A (en) * 2004-12-07 2009-08-13 Asml Netherlands Bv Lithographic apparatus, reticle exchange unit, and device manufacturing method
US9779972B2 (en) 2009-12-18 2017-10-03 Adixen Vacuum Products Method and device for controlling the manufacture of semiconductor by measuring contamination
US9403196B2 (en) 2010-06-29 2016-08-02 Adixen Vacuum Products Treatment device for transport and storage boxes
JP2013539559A (en) * 2010-09-08 2013-10-24 アデイクセン・バキユーム・プロダクト Method and apparatus for removing contamination of reticle with pellicle
US11868041B2 (en) * 2017-05-10 2024-01-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Also Published As

Publication number Publication date
JPWO2003034475A1 (en) 2005-02-03

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