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WO2003023832A1 - Procede et systeme d'exposition, et procede de construction de dispositif associe - Google Patents

Procede et systeme d'exposition, et procede de construction de dispositif associe Download PDF

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Publication number
WO2003023832A1
WO2003023832A1 PCT/JP2002/009102 JP0209102W WO03023832A1 WO 2003023832 A1 WO2003023832 A1 WO 2003023832A1 JP 0209102 W JP0209102 W JP 0209102W WO 03023832 A1 WO03023832 A1 WO 03023832A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
transmittance
short
density filter
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/009102
Other languages
English (en)
Japanese (ja)
Inventor
Jun Ishikawa
Hisashi Nishinaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP2003527780A priority Critical patent/JPWO2003023832A1/ja
Publication of WO2003023832A1 publication Critical patent/WO2003023832A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un procédé et un système d'exposition apte à maintenir une grande uniformité de répartition d'exposition malgré des variations de transmittance à court terme dans un système optique. Une lumière d'exposition d'une lentille (9) à perspective spatiale sert à éclairer une zone d'éclairage (35) sur un réticule via un premier système de lentille (12), un deuxième système de lentille (13) et un filtre de densité (51) entraîné en rotation, ainsi qu'un obturateur fixe (14A), pour transférer une image modèle d'un réticule sur une plaquette au moyen d'un système optique de projection et selon un procédé d'exposition au balayage. Une répartition de transmittance unidimensionnelle, linéairement symétrique par rapport à une ligne traversant un axe optique, est réalisée sur le filtre de densité (51), dont l'angle de rotation est commandé de manière à uniformiser la répartition de l'éclairage sur la zone d'éclairage (35) dans une direction sans balayage (direction X), lorsqu'une irrégularité d'éclairage symétrique au centre se présente à court terme, pour diminuer l'éclairement à proximité de l'axe optique dans la zone d'éclairage (35), du fait des variations de transmittance à court terme dans le système optique de projection.
PCT/JP2002/009102 2001-09-07 2002-09-06 Procede et systeme d'exposition, et procede de construction de dispositif associe Ceased WO2003023832A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003527780A JPWO2003023832A1 (ja) 2001-09-07 2002-09-06 露光方法及び装置、並びにデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-272769 2001-09-07
JP2001272769 2001-09-07

Publications (1)

Publication Number Publication Date
WO2003023832A1 true WO2003023832A1 (fr) 2003-03-20

Family

ID=19098083

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009102 Ceased WO2003023832A1 (fr) 2001-09-07 2002-09-06 Procede et systeme d'exposition, et procede de construction de dispositif associe

Country Status (2)

Country Link
JP (1) JPWO2003023832A1 (fr)
WO (1) WO2003023832A1 (fr)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006018972A1 (fr) * 2004-08-17 2006-02-23 Nikon Corporation Dispositif optique d’eclairage, procede de regulation pour dispositif optique d’eclairage, systeme d’exposition et procede d’exposition
JP2006324660A (ja) * 2005-05-19 2006-11-30 Asml Holding Nv 照明ビーム調整手段を用いた装置と方法
JP2007027240A (ja) * 2005-07-13 2007-02-01 Nikon Corp 照明光学装置、露光装置、および露光方法
JP2010517310A (ja) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
WO2010073795A1 (fr) * 2008-12-24 2010-07-01 株式会社 ニコン Système optique d'éclairage, appareil d'exposition et procédé de fabrication de dispositif
JP2010157650A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010157649A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010232688A (ja) * 2010-07-08 2010-10-14 Nikon Corp 照明光学装置の調整方法、露光装置、および露光方法
JP2011171776A (ja) * 2004-06-04 2011-09-01 Canon Inc 照明光学系及び露光装置
US8081295B2 (en) 2005-03-15 2011-12-20 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
JP2019117417A (ja) * 2019-04-24 2019-07-18 株式会社ニコン 露光装置
CN115309001A (zh) * 2021-05-07 2022-11-08 佳能株式会社 照明光学系统、曝光装置及制造物品的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09190969A (ja) * 1996-01-10 1997-07-22 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
WO1999036832A1 (fr) * 1998-01-19 1999-07-22 Nikon Corporation Dispositif d'eclairement et appareil de sensibilisation
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09190969A (ja) * 1996-01-10 1997-07-22 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
WO1999036832A1 (fr) * 1998-01-19 1999-07-22 Nikon Corporation Dispositif d'eclairement et appareil de sensibilisation
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置

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US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9146474B2 (en) 2003-04-09 2015-09-29 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9164393B2 (en) 2003-04-09 2015-10-20 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9423697B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9244359B2 (en) 2003-10-28 2016-01-26 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9146476B2 (en) 2003-10-28 2015-09-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9429848B2 (en) 2004-02-06 2016-08-30 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9423694B2 (en) 2004-02-06 2016-08-23 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9140990B2 (en) 2004-02-06 2015-09-22 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2011171776A (ja) * 2004-06-04 2011-09-01 Canon Inc 照明光学系及び露光装置
JP2006059834A (ja) * 2004-08-17 2006-03-02 Nikon Corp 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
WO2006018972A1 (fr) * 2004-08-17 2006-02-23 Nikon Corporation Dispositif optique d’eclairage, procede de regulation pour dispositif optique d’eclairage, systeme d’exposition et procede d’exposition
US9235133B2 (en) 2004-08-17 2016-01-12 Nikon Corporation Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
US8081295B2 (en) 2005-03-15 2011-12-20 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US9110383B2 (en) 2005-03-15 2015-08-18 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2006324660A (ja) * 2005-05-19 2006-11-30 Asml Holding Nv 照明ビーム調整手段を用いた装置と方法
JP2007027240A (ja) * 2005-07-13 2007-02-01 Nikon Corp 照明光学装置、露光装置、および露光方法
JP2010517310A (ja) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
US9057963B2 (en) 2007-09-14 2015-06-16 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US9366970B2 (en) 2007-09-14 2016-06-14 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
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US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
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US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
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US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
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US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
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US8947635B2 (en) 2008-12-24 2015-02-03 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
JP2010157649A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010157650A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010232688A (ja) * 2010-07-08 2010-10-14 Nikon Corp 照明光学装置の調整方法、露光装置、および露光方法
JP2019117417A (ja) * 2019-04-24 2019-07-18 株式会社ニコン 露光装置
JP7060848B2 (ja) 2019-04-24 2022-04-27 株式会社ニコン 露光装置
CN115309001A (zh) * 2021-05-07 2022-11-08 佳能株式会社 照明光学系统、曝光装置及制造物品的方法
US12461446B2 (en) 2021-05-07 2025-11-04 Canon Kabushiki Kaisha Illumination optical system, exposure apparatus and method of manufacturing article

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