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WO2003018500A1 - Solution de traitement de surface a composants multiples destinee au traitement de precision dune plaque de base en verre - Google Patents

Solution de traitement de surface a composants multiples destinee au traitement de precision dune plaque de base en verre Download PDF

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Publication number
WO2003018500A1
WO2003018500A1 PCT/JP2002/008564 JP0208564W WO03018500A1 WO 2003018500 A1 WO2003018500 A1 WO 2003018500A1 JP 0208564 W JP0208564 W JP 0208564W WO 03018500 A1 WO03018500 A1 WO 03018500A1
Authority
WO
WIPO (PCT)
Prior art keywords
base plate
glass base
surface treating
hydrofluoric acid
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/008564
Other languages
English (en)
French (fr)
Inventor
Hirohisa Kikuyama
Masayuki Miyashita
Tatsuhiro Yabune
Tadahiro Ohmi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stella Chemifa Corp
Original Assignee
Stella Chemifa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stella Chemifa Corp filed Critical Stella Chemifa Corp
Priority to EP02762858A priority Critical patent/EP1426346A4/en
Priority to KR1020047002328A priority patent/KR100828112B1/ko
Priority to US10/487,770 priority patent/US20070029519A1/en
Publication of WO2003018500A1 publication Critical patent/WO2003018500A1/ja
Anticipated expiration legal-status Critical
Priority to US12/237,981 priority patent/US8066898B2/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)
PCT/JP2002/008564 2001-08-24 2002-08-26 Solution de traitement de surface a composants multiples destinee au traitement de precision dune plaque de base en verre Ceased WO2003018500A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02762858A EP1426346A4 (en) 2001-08-24 2002-08-26 SURFACE TREATMENT SOLUTION FOR FINE PROCESSING OF A GLASS BASIC PLATE WITH MULTIPLE COMPONENTS
KR1020047002328A KR100828112B1 (ko) 2001-08-24 2002-08-26 다성분을 가지는 글라스 기판용 미세가공 표면처리액
US10/487,770 US20070029519A1 (en) 2001-08-24 2002-08-26 Surface treating solution for fine processing of glass base plate having a plurality of components
US12/237,981 US8066898B2 (en) 2001-08-24 2008-09-25 Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001255387A JP5132859B2 (ja) 2001-08-24 2001-08-24 多成分を有するガラス基板用の微細加工表面処理液
JP2001-255387 2001-08-24

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10/487,770 A-371-Of-International US20070029519A1 (en) 2001-08-24 2002-08-26 Surface treating solution for fine processing of glass base plate having a plurality of components
US12/237,981 Division US8066898B2 (en) 2001-08-24 2008-09-25 Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients

Publications (1)

Publication Number Publication Date
WO2003018500A1 true WO2003018500A1 (fr) 2003-03-06

Family

ID=19083362

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/008564 Ceased WO2003018500A1 (fr) 2001-08-24 2002-08-26 Solution de traitement de surface a composants multiples destinee au traitement de precision dune plaque de base en verre

Country Status (7)

Country Link
US (2) US20070029519A1 (ja)
EP (1) EP1426346A4 (ja)
JP (1) JP5132859B2 (ja)
KR (1) KR100828112B1 (ja)
CN (1) CN100364910C (ja)
TW (2) TW200409831A (ja)
WO (1) WO2003018500A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111363551A (zh) * 2020-03-19 2020-07-03 常州星海电子股份有限公司 超大功率光阻玻璃芯片刻蚀用腐蚀液及腐蚀工艺

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5197902B2 (ja) * 2001-08-31 2013-05-15 ステラケミファ株式会社 多成分を有するガラス基板用の微細加工表面処理液
WO2007032502A1 (ja) * 2005-09-12 2007-03-22 Nippon Sheet Glass Company, Limited 暗色セラミックス焼結体の分離用水溶液及び分離方法
JP5095161B2 (ja) * 2005-09-12 2012-12-12 日本板硝子株式会社 暗色セラミックス焼結体の分離方法
JP4902159B2 (ja) 2005-09-12 2012-03-21 日本板硝子株式会社 セラミックス焼結体及びガラスの分離回収方法
WO2008004469A1 (fr) * 2006-07-03 2008-01-10 Konica Minolta Opto, Inc. Procédé de nettoyage est procédé de production d'un substrat de verre, et disque magnétique utilisant ce substrat de verre
CN100516305C (zh) * 2007-08-06 2009-07-22 江阴市润玛电子材料有限公司 半导体用氟表面蚀刻液及其制备方法
KR100868228B1 (ko) * 2007-12-04 2008-11-11 주식회사 켐트로닉스 유리 기판용 식각액 조성물
PL384490A1 (pl) * 2008-02-18 2009-08-31 Doros Teodora D. A. Glass Sposób wytwarzania szkła wzorzystego, przeznaczonego zwłaszcza do budowy kolektorów i baterii słonecznych oraz szklarni
US8673163B2 (en) 2008-06-27 2014-03-18 Apple Inc. Method for fabricating thin sheets of glass
US7810355B2 (en) 2008-06-30 2010-10-12 Apple Inc. Full perimeter chemical strengthening of substrates
WO2010101961A2 (en) 2009-03-02 2010-09-10 Apple Inc. Techniques for strengthening glass covers for portable electronic devices
US20110019354A1 (en) * 2009-03-02 2011-01-27 Christopher Prest Techniques for Strengthening Glass Covers for Portable Electronic Devices
US9138963B2 (en) * 2009-12-14 2015-09-22 United Technologies Corporation Low sulfur nickel base substrate alloy and overlay coating system
US9778685B2 (en) 2011-05-04 2017-10-03 Apple Inc. Housing for portable electronic device with reduced border region
AU2011212982B9 (en) * 2010-02-02 2014-10-02 Apple Inc. Enhanced chemical strengthening glass of covers for portable electronic devices
CN101807004B (zh) * 2010-03-08 2012-07-11 彩虹集团电子股份有限公司 一种用于彩色显像管网版生产的工作版的制做方法
US9213451B2 (en) 2010-06-04 2015-12-15 Apple Inc. Thin glass for touch panel sensors and methods therefor
US8923693B2 (en) 2010-07-30 2014-12-30 Apple Inc. Electronic device having selectively strengthened cover glass
US10189743B2 (en) 2010-08-18 2019-01-29 Apple Inc. Enhanced strengthening of glass
US8873028B2 (en) 2010-08-26 2014-10-28 Apple Inc. Non-destructive stress profile determination in chemically tempered glass
US8824140B2 (en) 2010-09-17 2014-09-02 Apple Inc. Glass enclosure
CN102653451A (zh) * 2011-03-01 2012-09-05 三福化工股份有限公司 玻璃基板连续结晶式化学蚀刻方法与设备
US9725359B2 (en) 2011-03-16 2017-08-08 Apple Inc. Electronic device having selectively strengthened glass
US10781135B2 (en) 2011-03-16 2020-09-22 Apple Inc. Strengthening variable thickness glass
US9128666B2 (en) 2011-05-04 2015-09-08 Apple Inc. Housing for portable electronic device with reduced border region
US9315412B2 (en) * 2011-07-07 2016-04-19 Corning Incorporated Surface flaw modification for strengthening of glass articles
US9944554B2 (en) 2011-09-15 2018-04-17 Apple Inc. Perforated mother sheet for partial edge chemical strengthening and method therefor
US9516149B2 (en) 2011-09-29 2016-12-06 Apple Inc. Multi-layer transparent structures for electronic device housings
US10144669B2 (en) 2011-11-21 2018-12-04 Apple Inc. Self-optimizing chemical strengthening bath for glass
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
US8684613B2 (en) 2012-01-10 2014-04-01 Apple Inc. Integrated camera window
US8773848B2 (en) 2012-01-25 2014-07-08 Apple Inc. Fused glass device housings
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9090046B2 (en) 2012-04-16 2015-07-28 Applied Materials, Inc. Ceramic coated article and process for applying ceramic coating
CN104684859B (zh) * 2012-05-31 2019-07-12 康宁股份有限公司 用于湿酸性蚀刻中污泥控制的方法
US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
US9447365B2 (en) 2012-07-27 2016-09-20 Applied Materials, Inc. Enhanced cleaning process of chamber used plasma spray coating without damaging coating
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
US9946302B2 (en) 2012-09-19 2018-04-17 Apple Inc. Exposed glass article with inner recessed area for portable electronic device housing
US20160017263A1 (en) * 2013-03-14 2016-01-21 Applied Materials, Inc. Wet cleaning of a chamber component
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9459661B2 (en) 2013-06-19 2016-10-04 Apple Inc. Camouflaged openings in electronic device housings
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9472416B2 (en) 2013-10-21 2016-10-18 Applied Materials, Inc. Methods of surface interface engineering
US9488857B2 (en) 2014-01-10 2016-11-08 Corning Incorporated Method of strengthening an edge of a glass substrate
CN103880293A (zh) * 2014-02-12 2014-06-25 惠晶显示科技（苏州）有限公司 一种玻璃二次强化用蚀刻液及其制备方法和应用
US9886062B2 (en) 2014-02-28 2018-02-06 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
KR20150112093A (ko) * 2014-03-26 2015-10-07 삼성디스플레이 주식회사 터치 스크린 패널 및 이의 제조 방법
KR102192920B1 (ko) * 2014-05-16 2020-12-18 동우 화인켐 주식회사 유리 힐링용 조성물
CN104556716B (zh) * 2014-12-30 2017-08-11 宜昌南玻显示器件有限公司 蚀刻液及电容式触摸屏用玻璃的二次强化方法
CN105236754B (zh) * 2015-08-27 2018-05-18 惠晶显示科技（苏州）有限公司 一种液晶显示面板玻璃酸刻前表面处理方法
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN112573833B (zh) * 2019-09-29 2022-03-18 比亚迪股份有限公司 对型材的表面进行处理的方法
CN112851131A (zh) * 2019-11-26 2021-05-28 惠州市清洋实业有限公司 一种用于处理摄像头镜片cd纹蚀刻液及其使用方法
CN114761519B (zh) * 2021-05-20 2023-06-30 斯泰拉化工公司 微细加工处理剂、和微细加工处理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52144020A (en) * 1976-05-26 1977-12-01 Seiko Instr & Electronics Method of etching glass surface
JPS5747744A (en) * 1980-08-30 1982-03-18 Toyo Glass Kk Etching method for glass
EP0444809A1 (en) * 1990-02-28 1991-09-04 AT&T Corp. Matte finishes on optical fibers and other glass articles
JPH06333912A (ja) * 1993-05-26 1994-12-02 Asahi Glass Co Ltd フッ酸系エッチング液
JPH1036140A (ja) * 1996-07-20 1998-02-10 Shinetsu Quartz Prod Co Ltd シリカガラス治具表面処理液及びそれを用いた処理方法
JP2002110554A (ja) * 2000-09-28 2002-04-12 Shinetsu Quartz Prod Co Ltd 半導体工業用シリカガラス治具およびその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4080188A (en) * 1976-11-22 1978-03-21 Corning Glass Works Durable substrates having porous antireflection coatings
US4273826A (en) * 1979-12-03 1981-06-16 Owens-Illinois, Inc. Process of making glass articles having antireflective coatings and product
JPH04185693A (ja) * 1990-11-21 1992-07-02 Hitachi Ltd 抵抗膜のエッチング液組成物及びそれを使用したエッチング方法
FR2682946B1 (fr) * 1991-10-25 1995-02-24 Claudio Speziari Composition pour la renovation du verre et procede de mise en óoeuvre.
JPH07131155A (ja) * 1993-11-01 1995-05-19 Hitachi Ltd 多層配線基板の製造方法及び多層配線基板
US5695661A (en) * 1995-06-07 1997-12-09 Micron Display Technology, Inc. Silicon dioxide etch process which protects metal
JP2000164586A (ja) * 1998-11-24 2000-06-16 Daikin Ind Ltd エッチング液
KR100327342B1 (ko) * 1999-10-27 2002-03-06 윤종용 반도체소자 제조용 식각조성물 및 이 식각조성물을 이용한 식각방법
US6709875B2 (en) * 2001-08-08 2004-03-23 Agilent Technologies, Inc. Contamination control for embedded ferroelectric device fabrication processes
JP5197902B2 (ja) * 2001-08-31 2013-05-15 ステラケミファ株式会社 多成分を有するガラス基板用の微細加工表面処理液
JP4185693B2 (ja) 2002-02-21 2008-11-26 ソニーケミカル＆インフォメーションデバイス株式会社 電気装置の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52144020A (en) * 1976-05-26 1977-12-01 Seiko Instr & Electronics Method of etching glass surface
JPS5747744A (en) * 1980-08-30 1982-03-18 Toyo Glass Kk Etching method for glass
EP0444809A1 (en) * 1990-02-28 1991-09-04 AT&T Corp. Matte finishes on optical fibers and other glass articles
JPH06333912A (ja) * 1993-05-26 1994-12-02 Asahi Glass Co Ltd フッ酸系エッチング液
JPH1036140A (ja) * 1996-07-20 1998-02-10 Shinetsu Quartz Prod Co Ltd シリカガラス治具表面処理液及びそれを用いた処理方法
JP2002110554A (ja) * 2000-09-28 2002-04-12 Shinetsu Quartz Prod Co Ltd 半導体工業用シリカガラス治具およびその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TATSUHIRO YABUNE ET AL.: "Handotai kako gijutsu to gurosesukurin-ka FDP-yo glass kiban no etchant ni kansuru gijutsu", THE INSTITUTE OF ELECTRONICS, INFORMATION AND COMMUNICATION ENGINEERS GIJUTSU KENKYU HOKOKU, vol. 101, no. 350, 9 October 2001 (2001-10-09), pages 51 - 56, XP002962362 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111363551A (zh) * 2020-03-19 2020-07-03 常州星海电子股份有限公司 超大功率光阻玻璃芯片刻蚀用腐蚀液及腐蚀工艺

Also Published As

Publication number Publication date
JP5132859B2 (ja) 2013-01-30
US20090075486A1 (en) 2009-03-19
TW200409831A (en) 2004-06-16
KR20040039292A (ko) 2004-05-10
US20070029519A1 (en) 2007-02-08
EP1426346A1 (en) 2004-06-09
JP2003063842A (ja) 2003-03-05
TWI298748B (ja) 2008-07-11
US8066898B2 (en) 2011-11-29
KR100828112B1 (ko) 2008-05-08
CN100364910C (zh) 2008-01-30
TWI316973B (ja) 2009-11-11
EP1426346A4 (en) 2009-03-25
CN1608037A (zh) 2005-04-20

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