WO2003014067A1 - PROCESS FOR PRODUCING ß-OXONITRILE COMPOUND OR ALKALI METAL SALT THEREOF - Google Patents
PROCESS FOR PRODUCING ß-OXONITRILE COMPOUND OR ALKALI METAL SALT THEREOF Download PDFInfo
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- WO2003014067A1 WO2003014067A1 PCT/JP2002/007893 JP0207893W WO03014067A1 WO 2003014067 A1 WO2003014067 A1 WO 2003014067A1 JP 0207893 W JP0207893 W JP 0207893W WO 03014067 A1 WO03014067 A1 WO 03014067A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- oxonitrile
- metal salt
- alkali metal
- compound according
- producing
- Prior art date
Links
- -1 ALKALI METAL SALT Chemical class 0.000 title claims abstract description 40
- 150000001875 compounds Chemical class 0.000 title claims abstract description 38
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims abstract description 36
- 239000002585 base Substances 0.000 claims abstract description 13
- 150000003839 salts Chemical class 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 5
- 230000003472 neutralizing effect Effects 0.000 claims abstract description 3
- 239000002253 acid Substances 0.000 claims abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract 2
- 239000001257 hydrogen Substances 0.000 claims abstract 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 7
- 239000008096 xylene Substances 0.000 claims description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 6
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 6
- 239000012312 sodium hydride Substances 0.000 claims description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims description 4
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 claims description 4
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 claims description 4
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 claims description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 claims description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 claims description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 claims description 2
- 239000004914 cyclooctane Substances 0.000 claims description 2
- 229940035429 isobutyl alcohol Drugs 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- JILPJDVXYVTZDQ-UHFFFAOYSA-N lithium methoxide Chemical group [Li+].[O-]C JILPJDVXYVTZDQ-UHFFFAOYSA-N 0.000 claims description 2
- LTRVAZKHJRYLRJ-UHFFFAOYSA-N lithium;butan-1-olate Chemical compound [Li+].CCCC[O-] LTRVAZKHJRYLRJ-UHFFFAOYSA-N 0.000 claims description 2
- AZVCGYPLLBEUNV-UHFFFAOYSA-N lithium;ethanolate Chemical compound [Li+].CC[O-] AZVCGYPLLBEUNV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052987 metal hydride Inorganic materials 0.000 claims description 2
- 150000004681 metal hydrides Chemical class 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 claims description 2
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 2
- SYXYWTXQFUUWLP-UHFFFAOYSA-N sodium;butan-1-olate Chemical compound [Na+].CCCC[O-] SYXYWTXQFUUWLP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 7
- 150000001340 alkali metals Chemical class 0.000 claims 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- MKNZKCSKEUHUPM-UHFFFAOYSA-N potassium;butan-1-ol Chemical compound [K+].CCCCO MKNZKCSKEUHUPM-UHFFFAOYSA-N 0.000 claims 1
- 150000001733 carboxylic acid esters Chemical class 0.000 abstract description 7
- 159000000000 sodium salts Chemical class 0.000 description 28
- AMQCWPDDXYOEER-UHFFFAOYSA-N 3-cyano-2-butanone Chemical compound N#CC(C)C(C)=O AMQCWPDDXYOEER-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000003786 synthesis reaction Methods 0.000 description 15
- 239000000843 powder Substances 0.000 description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 238000002955 isolation Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 10
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- BNOSMUJYKYEPSR-UHFFFAOYSA-N 2-ethyl-3-oxobutanenitrile Chemical compound CCC(C#N)C(C)=O BNOSMUJYKYEPSR-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- IATHTLTVQXMDPC-UHFFFAOYSA-N 2-methyl-3-oxopropanenitrile Chemical compound O=CC(C)C#N IATHTLTVQXMDPC-UHFFFAOYSA-N 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- QSQMLMUBVHLHFM-UHFFFAOYSA-N 2-methyl-3-oxo-3-phenylpropanenitrile Chemical compound N#CC(C)C(=O)C1=CC=CC=C1 QSQMLMUBVHLHFM-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 4
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- ULOLYMLVVVIGDA-UHFFFAOYSA-N [Na].C(#N)C(C(C)=O)C Chemical compound [Na].C(#N)C(C(C)=O)C ULOLYMLVVVIGDA-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229940095102 methyl benzoate Drugs 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- VXCUURYYWGCLIH-UHFFFAOYSA-N Dodecanenitrile Chemical compound CCCCCCCCCCCC#N VXCUURYYWGCLIH-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C253/00—Preparation of carboxylic acid nitriles
- C07C253/30—Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
Definitions
- the present invention relates to a method for producing an /?-Oxonitrile compound or a metal salt thereof useful as a raw material for synthesis of medicines, agricultural chemicals and the like.
- the problem to be solved by the present invention is to solve the above-mentioned problems and to obtain a high-yield /?-Oxonitrile compound or an alkali metal salt thereof, which is industrially suitable /?-Oxonitrile compound or
- R 1 and R 2 represent a group that does not participate in the reaction, provided that R 2 excludes a hydrogen atom,
- R 3 represents an alkyl group
- the nitrile compound and the base represented by are reacted in a sealed container at 145 to 300 to obtain a compound represented by the general formula (3).
- a method for producing an alkali metal salt of a /?-Oxonitrile compound characterized by obtaining an alkali metal salt of a /?-Oxonitrile compound represented by the formula: BEST MODE FOR CARRYING OUT THE INVENTION
- the carboxylic acid ester used in the reaction of the present invention is a compound represented by the aforementioned general formula (1).
- R 1 is a group which does not participate in the reaction, and is preferably a hydrogen atom, an alkyl group which may have a substituent or an aryl group, and specifically, for example, hydrogen Atom; lower alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group and butyl group; and aryl group having 6 to 14 carbon atoms such as phenyl group, naphthyl group and anthryl group.
- these groups include various isomers.
- substituents for the alkyl group or aryl group include lower alkoxy groups having 1 to 4 carbon atoms such as methoxy, ethoxy, propoxy, and butoxy groups; and fluorine, chlorine, bromine, and iodine atoms. And a halogen atom.
- the number and positions of the substituents are not particularly limited.
- R 2 is a group that does not participate in the reaction except for a hydrogen atom. And is preferably an alkyl group or an aryl group which may have a substituent. Specifically, for example, a group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, a propyl group, and a butyl group. Lower alkyl groups; aryl groups having 6 to 14 carbon atoms, such as phenyl, naphthyl and anthryl groups. These groups include various isomers.
- substituents for the alkyl group or aryl group include lower alkoxy groups having 1 to 4 carbon atoms such as methoxy, ethoxy, propoxy, and butoxy groups; and fluorine, chlorine, bromine, and iodine atoms. And a halogen atom.
- the number and positions of the substituents are not particularly limited.
- carboxylate represented by the general formula (1) examples include, for example, formate, acetate, propionate, and butyrate.
- the nitrile compound used in the reaction of the present invention is a compound represented by the above general formula (2).
- R 3 is an alkyl group, preferably an alkyl group having 1 to 10 carbon atoms, specifically, for example, a methyl group, an ethyl group, a propyl group, a butyl group Pentyl, hexyl, heptyl, octyl, nonyl, decyl and the like. These groups include various isomers.
- nitrile compound represented by the general formula (2) examples include: Tolyl, pendecanitrile, dodecanenitrile (each compound includes each isomer) and the like.
- the amount of the nitrile compound to be used is preferably 0.05 to 20 mol, more preferably 0.1 to 10 mol, per 1 mol of the carboxylic acid ester.
- the amount of the base to be used is preferably 0.05 to 10 mol, more preferably 0.1 to 5 mol, per 1 mol of the carboxylic acid ester.
- the reaction of the present invention is carried out in a closed reactor.
- the reactor used include, for example, an autoclave.
- the reaction of the present invention is carried out in the presence or absence of a solvent.
- the solvent to be used is not particularly limited as long as it does not participate in the reaction. Examples thereof include cycloaliphatic hydrocarbons such as cyclohexane, cycloheptane and cyclooctane; 1,2-dichloromouth ethane and the like.
- Aromatic hydrocarbons such as toluene, xylene and cumene; halogenated aromatic hydrocarbons such as benzene and bromobenzene; nitrated aromatic hydrocarbons such as nitrobenzene; methanol Alcohols such as ethanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol and t-butyl alcohol, and preferably, cycloaliphatic hydrocarbons and aromatic hydrocarbons. used. These solvents may be used alone or in combination of two or more.
- the amount of the solvent to be used is appropriately adjusted depending on the uniformity of the solution and the stirring property, but is preferably from 0 to 100 ml, more preferably from 0 to 20 ml, per 1 g of the carboxylate.
- the reaction of the present invention is carried out, for example, by mixing a carboxylic acid ester, a nitrile compound, a base and a solvent in an atmosphere of an inert gas such as nitrogen or argon, and performing a self-pressure in a closed container at 145 to 300. It is carried out by a method such as stirring under.
- the self-pressure refers to a pressure in a closed reactor that is generated by vaporization of a reaction mixture or a part thereof during a reaction, and is usually higher than normal pressure.
- LOMPa LOMPa
- the reaction temperature of the present invention varies depending on the reaction pressure, but is preferably from 150 to 200.
- the alkali metal salt of a 9-oxonitrile compound can be obtained by the reaction of the present invention, which can be obtained by, for example, concentrating and filtering after completion of the reaction. Further, the alkali metal salt is neutralized by adding an inorganic acid such as hydrochloric acid, nitric acid or sulfuric acid or an organic acid such as acetic acid or benzoic acid in an aqueous solution to obtain a free -oxonitrile compound. Can be done. Further, these can be further purified by a general method such as recrystallization, distillation, column chromatography and the like.
- Example 1 Example 1
- Example 2 (Synthesis of 3-cyano-2-butanone) A 300 ml glass flask was charged with 30.0 g (0.25 mol) of sodium salt of 3-cyano-2-butanone synthesized in the same manner as in Example 1, 40 ml of water and 100 ml of ethyl acetate. . Then, 21.7 ml (0.26 mol) of concentrated hydrochloric acid was slowly added, and then the organic layer was taken out and dried over anhydrous magnesium sulfate. After filtration, the filtrate was concentrated under reduced pressure to obtain 23.3 g of 3-cyano-2-butanone as a colorless liquid (isolation yield: 96.0%).
- Example 8 Synthesis of sodium salt of 2-benzoylpropionitrile
- a 100 ml glass vessel equipped with a stirrer, thermometer and pressure gauge 17.71 g (0.13 mol) of methyl benzoate, 8.27 g (0.15 mol) of propionitrile, 5.41 g (0.10 mol) of sodium methoxide Mol) and 40 ml of toluene, and reacted in a sealed reactor under a nitrogen atmosphere at 170 under self-pressure (0.49 MPa (gauge pressure)) for 2 hours.
- the mixture was cooled to room temperature, and the precipitate was filtered and dried to obtain 15.80 g of sodium salt of 2-benzoylpropionitrile as a colorless powder (isolation yield: 87.2%).
- the /?-Oxonitrile compound or its alkali metal salt can be produced in high yield. It is possible to provide a method for producing an industrially suitable /?-Oxonitrile compound or an alkali metal salt thereof.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/485,495 US7141693B2 (en) | 2001-08-02 | 2002-08-02 | Process for producing β-oxonitrile compound or alkali metal salt thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-234659 | 2001-08-02 | ||
| JP2001234659 | 2001-08-02 |
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| WO2003014067A1 true WO2003014067A1 (en) | 2003-02-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/JP2002/007893 WO2003014067A1 (en) | 2001-08-02 | 2002-08-02 | PROCESS FOR PRODUCING ß-OXONITRILE COMPOUND OR ALKALI METAL SALT THEREOF |
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| Country | Link |
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| US (1) | US7141693B2 (ja) |
| WO (1) | WO2003014067A1 (ja) |
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| JP2009253694A (ja) * | 2008-04-07 | 2009-10-29 | Visionere Corp | 情報処理システム及び情報処理方法 |
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| US20100010216A1 (en) * | 2006-12-28 | 2010-01-14 | Mitsui Chemicals Agro, Inc | 2-fluorinated acyl-3-aminoacrylonitrile derivative and method for producing the same |
| CA2679287A1 (en) | 2007-03-02 | 2008-09-12 | Basf Se | Method for the production of .beta.-ketonitriles |
| WO2016001110A1 (en) | 2014-06-30 | 2016-01-07 | Basf Se | Process for producing 2-propionylalkanonitriles |
| CN115010676A (zh) * | 2022-05-10 | 2022-09-06 | 浙江海昇药业股份有限公司 | 一种4,5-二甲基-3-氨基异噁唑的制备方法和应用 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63264448A (ja) * | 1988-02-29 | 1988-11-01 | Shionogi & Co Ltd | 新規β−ケトニトリル |
| JPH02300155A (ja) * | 1989-05-11 | 1990-12-12 | Fuji Photo Film Co Ltd | 2―アシル―2―アリールオキシ又はヘテロ環オキシアセトニトリル類およびアミノピラゾール類の製造方法 |
| JP2000086637A (ja) * | 1998-09-10 | 2000-03-28 | Nissan Chem Ind Ltd | ピラゾール化合物及びその製造法 |
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|---|---|---|---|---|
| RO71248A2 (ro) | 1977-05-27 | 1982-02-26 | Intreprinderea De Medicamente,Ro | Procedeu de obtinere a &-acetilpropionitrilului |
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- 2002-08-02 US US10/485,495 patent/US7141693B2/en not_active Expired - Fee Related
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63264448A (ja) * | 1988-02-29 | 1988-11-01 | Shionogi & Co Ltd | 新規β−ケトニトリル |
| JPH02300155A (ja) * | 1989-05-11 | 1990-12-12 | Fuji Photo Film Co Ltd | 2―アシル―2―アリールオキシ又はヘテロ環オキシアセトニトリル類およびアミノピラゾール類の製造方法 |
| JP2000086637A (ja) * | 1998-09-10 | 2000-03-28 | Nissan Chem Ind Ltd | ピラゾール化合物及びその製造法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009253694A (ja) * | 2008-04-07 | 2009-10-29 | Visionere Corp | 情報処理システム及び情報処理方法 |
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| US7141693B2 (en) | 2006-11-28 |
| US20040171863A1 (en) | 2004-09-02 |
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