WO2003064380A1 - Process for production of trifluoromethylbenzenesulfonyl chlorides - Google Patents
Process for production of trifluoromethylbenzenesulfonyl chlorides Download PDFInfo
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- WO2003064380A1 WO2003064380A1 PCT/JP2003/000782 JP0300782W WO03064380A1 WO 2003064380 A1 WO2003064380 A1 WO 2003064380A1 JP 0300782 W JP0300782 W JP 0300782W WO 03064380 A1 WO03064380 A1 WO 03064380A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/02—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof
- C07C303/22—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof from sulfonic acids, by reactions not involving the formation of sulfo or halosulfonyl groups; from sulfonic halides by reactions not involving the formation of halosulfonyl groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/02—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof
- C07C303/04—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof by substitution of hydrogen atoms by sulfo or halosulfonyl groups
- C07C303/06—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof by substitution of hydrogen atoms by sulfo or halosulfonyl groups by reaction with sulfuric acid or sulfur trioxide
Definitions
- the present invention relates to a method for producing a trifluoromethylbenzenesulfol chloride compound.
- X and Y are the same or different and each represent a hydrogen atom or a halogen atom.
- the trifluoromethylbenzenesulfonyl chloride compound represented by the following formula is described in, for example, the journal “Ob Medicinal” Chemistry, Vol. 41, No. 4885-48889 (pp. 1989) It is a compound useful as an intermediate for synthesizing pharmaceuticals, as described in.
- a method for producing the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) for example, a method of directly converting a trifluoromethylbenzene compound into a chloromethyl sulfonyl compound is known (Japanese Patent Publication No. — 9 191 issue).
- a trifluorosulfonylation reaction is carried out by dropping a trifluoromethylbenzene compound into a mixture of chlorosulfonic acid and fuming sulfuric acid, and then the reaction is carried out in a large amount of ice.
- This is a method in which the target compound is isolated and purified after the addition of a liquid to hydrolyze the excess cloulosulfonic acid and dilute fuming sulfuric acid.
- Japanese Patent Application Laid-Open No. 2-15772 / 57 discloses that a trifluoromethylbenzene compound is reacted with fuming sulfuric acid and chlorosulfonic acid, and an inert solvent is added to the obtained reaction solution to convert the target compound into an inert solvent.
- This is a method in which the target compound is extracted and extracted from the extract. Since this method does not add the reaction solution to a large amount of ice, it aims at avoiding decomposition of the target compound and improving the yield of the target compound.
- the inventors of the present invention have examined the methods described in JP-A-63-149492 and JP-A-2-157257, and found that the general formula (3) Among the trifluoromethylbenzenesulfonyl chloride compounds represented by the formula, especially when at least one of X and Y is a fluorine atom, the trifluoromethylbenzenesulfur present on the benzene ring of the starting compound during the reaction. Most of the methyl groups are hydrolyzed and converted to hepoxyl groups, and as a result, the target compound is obtained in a low yield of only about 10%. It was found that the product could not be manufactured (see Comparative Examples 1 and 2 described below).
- An object of the present invention is to provide a new process for industrially advantageously producing a trifluoromethylbenzenesulfonyl chloride compound of the general formula (3).
- Another object of the present invention is to provide a method for producing the trifluoromethylbenzenesulfonyl chloride compound in high yield and high purity.
- the present inventor has made intensive studies to achieve the above object. As a result, they have found that the above object can be achieved by reacting a benzotrifluoride compound with sulfur trioxide and then chlorinating the resulting compound.
- the present invention has been completed based on such findings.
- the present invention provides a compound represented by the general formula (1) 2
- the present invention provides a method for producing a trifluoromethylbenzenesulfonide compound represented by the formula:
- the benzotrifluoride compound represented by the general formula (1) used as a starting material is an easily available known compound.
- benzotrifluoride compound represented by the general formula (1) examples include benzotrifluoride, 2-fluorobenzotrifluoride, 4-fluorobenzobenzofluoride, and 2,4-difluorobenzotrifluoride.
- the reaction between the benzotrifluoride compound represented by the general formula (1) and sulfur trioxide is carried out without a solvent or in a suitable inert solvent, preferably in an inert solvent.
- inert solvent examples include chloroform, dichloromethane, 1,2-dichloroethane, and halogenated hydrocarbons such as carbon tetrachloride. These inert solvents can be used alone or in combination of two or more.
- the use ratio of the benzotrifluoride compound represented by the general formula (1) to sulfur trioxide is usually about 1 to 10 mol, preferably about 1 to 4 mol per 1 mol of the former.
- the reaction between the benzotrifluoride compound represented by the general formula (1) and sulfur trioxide is a sulfonation reaction, and the sulfonic acid compound represented by the general formula (2) Is generated.
- This sulfonation reaction is carried out usually at a temperature of about 10 ° C. to about the boiling point of the inert solvent, preferably about 20 to 50 ° C., and more preferably about 30 to 40 ° C.
- the reaction is completed in about 0.1 to 10 hours, preferably about 1 to 3 hours, depending on the reaction temperature.
- the benzotrifluoride compound of the general formula (1) is gradually added to a predetermined amount of sulfur trioxide, or the benzene of the general formula (1) is added. It is advisable to gradually add sulfur trioxide to the zotrifluoride compound.
- sulfur trioxide may be dissolved in the inert solvent, or the benzotrifluoride compound of the general formula (1) may be dissolved in the inert solvent.
- the temperature of the mixture gradually increases.
- the addition rate when mixing the benzotrifluoride compound of the general formula (1) with sulfur trioxide is adjusted so that the temperature of the mixture is maintained in the range of 30 to 40 ° C. Is more preferred.
- the resulting sulfonic acid compound represented by the general formula (2) is then chlorinated.
- the sulfonic acid compound of the general formula (2) formed by the sulfonation reaction may be once isolated and subjected to the next chlorination, but from the viewpoint of the efficiency of the reaction, the general formula (2) It is preferred that the sulfonic acid compound is subjected to the next chlorination reaction as it is without isolation.
- the present invention it is desirable to remove unreacted sulfur trioxide or sulfur trioxide and an inert solvent present in the reaction mixture before chlorination.
- Known removal means can be widely applied to these removals. Examples of such a removing means include distillation under reduced pressure.
- the sulfur trioxide removed from the reaction mixture can be recovered and reused, which is advantageous in terms of production cost, waste liquid treatment, and the like.
- the chlorination of the sulfonic acid compound of the general formula (2) is performed, for example, by allowing a chlorinating agent to act on the sulfonic acid compound of the general formula (2).
- chlorinating agent known chlorinating agents can be widely used, and examples thereof include thionyl chloride, phosphorus oxychloride, phosphorus pentachloride, chlorosulfonic acid, and sulfuryl chloride. Can be. These chlorinating agents can be used alone or in combination of two or more. Among these chlorinating agents, thiol chloride is preferred.
- the chlorination of the sulfonic acid compound of the general formula (2) is carried out without a solvent or in a suitable inert solvent, preferably without a solvent.
- the inert solvent examples include halogenated hydrocarbons such as methylene chloride, dichloroethane, and carbon tetrachloride; aromatic hydrocarbons such as toluene, cyclobenzene, and xylene; and aliphatic hydrocarbons such as n-hexane and n-heptane. And the like. These inert solvents can be used alone or in combination of two or more.
- At least one selected from the group consisting of an amide compound and a pyridine compound may be present in the reaction system as a catalyst.
- amide compound examples include dimethylformamide, getylformamide, dimethylacetamide, N-methylpyrrolidone, and the like.
- pyridine compound examples include pyridine, 4-dimethylaminopyridine and the like.
- the usage of at least one selected from the group consisting of amide compounds and pyridine compounds is usually about 0.001 to 0.1 mol per 1 mol of the sulfonic acid compound of the general formula (2). .
- the ratio of the sulfonic acid compound of the general formula (2) to the chlorinating agent is usually about 1 to 5 mol, preferably about 1.2 to 2.2 mol, per 1 mol of the former. Good.
- the chlorination reaction is usually performed at about 0 to 160 ° C., preferably about 60 to 11 O, more preferably about 65 to 100 ° C., and particularly preferably about 70 to 90 ° C. .
- the chlorination reaction varies depending on the reaction temperature, but is usually completed in about 1 to 10 hours, preferably in about 2 to 5 hours.
- trifluoromethylbenzenesulfonyl chloride compound represented by (3) Isolate the trifluoromethylbenzenesulfonyl chloride compound represented by (3) it can.
- the obtained trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) can be used as it is as an intermediate for synthesizing a drug or the like.
- the reaction solution after completion of the reaction is concentrated under reduced pressure, and then an inert solvent is added to the obtained concentrated solution to inactivate the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3). It is preferable to dissolve in a solvent, wash the solution with water, and concentrate. In this way, the target trifluoromethylbenzenesulfoerck sulfide compound represented by the general formula (3) can be isolated with even higher purity.
- the inert solvent used for the extraction of the reaction solution is preferably the same as the inert solvent used for the chlorination reaction, for example, halogenated hydrocarbons such as methylene chloride, dichloroethane, carbon tetrachloride, toluene, and the like. Examples thereof include aromatic hydrocarbons such as benzene and xylene, and aliphatic hydrocarbons such as n-hexane and n-heptane. These inert solvents can be used alone or in combination of two or more.
- halogenated hydrocarbons such as methylene chloride, dichloroethane, carbon tetrachloride, toluene, and the like.
- aromatic hydrocarbons such as benzene and xylene
- aliphatic hydrocarbons such as n-hexane and n-heptane.
- the unreacted chlorinating agent can be recovered and reused, which is advantageous in terms of production cost, waste liquid treatment, and the like.
- the sulfur trioxide used in the sulfonation reaction, the inert solvent, and the chlorinating agent used in the chlorination reaction are removed from the reaction solution, the target compound is extracted for extraction. The amount of the inert solvent used can be greatly reduced.
- the amount of the inert solvent used may be generally 1 to 10 times, preferably 2 to 5 times, the volume of the reaction solution to be subjected to the extraction treatment.
- the inert solvent from which the target compound has been extracted may contain a small amount of a chlorinating agent that has not been recovered.
- the mixed impurities can be removed by washing the solvent with water.
- the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) which is the object of the present invention, can be produced with high purity.
- the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) can be obtained in high yield (for example, 90% or more) and high purity (for example, 95% or less).
- the above method can be provided.
- the method of the present invention is particularly suitable for the production of fluorine-substituted trifluoromethylbenzenesulfonyl chloride compounds such as 2-fluoro-5-trifluoromethylbenzenesulfonyl chloride and 4-fluoro-3_trifluoromethylbenzenesulfonyl chloride. I have.
- sulfur trioxide used in the sulfonation reaction and the chlorinating agent used in the chlorination reaction can be recovered and reused. For this reason, waste liquid treatment becomes unnecessary, and the amount of sulfur trioxide and the chlorinating agent can be reduced, so that the production cost can be suppressed.
- the amount of an inert solvent used for extracting a target compound can be significantly reduced.
- the process of the present invention is extremely advantageous as an industrial process for producing a trifluoromethylbenzenesulfonyl chloride compound of the general formula (3).
- reaction solution was depressurized to distill methylene chloride and triacid sulfur, and these were recovered. Further, 24 ml of thionyl chloride and several drops of dimethylformamide were added to the reaction solution, and the mixture was heated under reflux for 5 hours. After cooling the reaction solution to 4 Ot, thionyl chloride was distilled off under reduced pressure and collected. After cooling the reaction solution to 10, 100 ml of 1,2-dichloroethane was added, and 10 Om1 of water was added while cooling so that the liquid temperature did not exceed 10, to separate a 1,2-dichloroethane solution. The 1,2-dichloroethane solution was dried and concentrated under reduced pressure to obtain 28 g of 4-monofluoro-3-trifluoromethylbenzenesulfonyl chloride (yield 99%, purity 98%).
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Abstract
Description
明 細 書 Specification
トリフルォロメチルベンゼンスルホニルク口リド化合物の製造方法 Method for producing trifluoromethylbenzenesulfonyl chloride compound
技 術 分 野 Technical field
本発明は、 トリフルォロメチルベンゼンスルホエルクロリド化合物の製造方法 に関する。 The present invention relates to a method for producing a trifluoromethylbenzenesulfol chloride compound.
背 景 技 術 Background technology
一般式 ( 3 ) General formula (3)
[式中、 X及び Yは、 同一又は異なって、 水素原子又はハロゲン原子を示す。 ] で表されるトリフルォロメチルベンゼンスルホニルクロリド化合物は、 例えば、 ジャーナル 'ォブ ·メディシナル 'ケミストリ一, 第 4 1巻, 第 4 8 8 5— 4 8 8 9頁 (1 9 9 8年) に記載されているように、 医薬品を合成するための中 間体として有用な化合物である。 [Wherein, X and Y are the same or different and each represent a hydrogen atom or a halogen atom. For example, the trifluoromethylbenzenesulfonyl chloride compound represented by the following formula is described in, for example, the journal “Ob Medicinal” Chemistry, Vol. 41, No. 4885-48889 (pp. 1989) It is a compound useful as an intermediate for synthesizing pharmaceuticals, as described in.
一般式 (3 ) で表されるトリフルォロメチルベンゼンスルホニルクロリド化合 物の製造法としては、 例えば、 トリフルォロメチルベンゼン化合物を直接クロ口 スルホニル化する方法が知られている (特公昭 5 4— 9 1 9 1号公報) 。 この方 法は、 下記反応式に示すように、 クロロスルホン酸と発煙硫酸との混合液にトリ フルォロメチルベンゼン化合物を滴下してクロロスルホニル化反応を行い、 次い で多量の氷中に反応液を添加して、 過剰に存在するク口ロスルホン酸を加水分解 すると共に発煙硫酸を希釈した後、 目的化合物を単離、 精製する方法である。 As a method for producing the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3), for example, a method of directly converting a trifluoromethylbenzene compound into a chloromethyl sulfonyl compound is known (Japanese Patent Publication No. — 9 191 issue). In this method, as shown in the following reaction formula, a trifluorosulfonylation reaction is carried out by dropping a trifluoromethylbenzene compound into a mixture of chlorosulfonic acid and fuming sulfuric acid, and then the reaction is carried out in a large amount of ice. This is a method in which the target compound is isolated and purified after the addition of a liquid to hydrolyze the excess cloulosulfonic acid and dilute fuming sulfuric acid.
(1) (3) (13)
[式中、 X及び Yは前記に同じ。 ] [Wherein, X and Y are the same as above. ]
しかしながら、 この方法では、 反応液を氷中に添加した際に、 目的化合物が水 と接触してスルホン酸ィ匕合物に分解されるために、 目的化合物の収率低下が避け られない。 また、 多量の硫酸が廃液として生成するために廃液処理の必要が生じ、 工業的製造法として不利である。 However, in this method, when the reaction solution is added to ice, the target compound is not dissolved in water. , It is decomposed into a sulfonic acid conjugate, so that the yield of the target compound is inevitably reduced. Also, since a large amount of sulfuric acid is generated as a waste liquid, it is necessary to treat the waste liquid, which is disadvantageous as an industrial production method.
上記特公昭 5 4— 9 1 9 1号公報に記載されている製造法の改良法として、 ト リフルォロメチルベンゼン化合物を発煙硫酸を用いて 3 0〜7 0 °Cでスルホン化 反応を行った後、 引続きクロロスルホン酸を添加して 2 0〜6 0 °Cでクロロスル ホニル化反応を行う方法が開発されている (特開昭 6 3 - 1 0 4 9 5 2号公報) 。 しかしながら、 特開昭 6 3— 1 0 4 9 5 2号公報に記載の方法でも、 クロロス ルホニル化終了後に反応液を多量の氷中に添加して目的化合物を単離するので、 目的化合物の分解は避けられず、 従って目的化合物の収率改善効果は不充分であ る。 As an improvement of the production method described in Japanese Patent Publication No. 54-9-1191, a sulfonation reaction of a trifluoromethylbenzene compound with fuming sulfuric acid at 30 to 70 ° C is performed. After that, a method has been developed in which chlorosulfonic acid is subsequently added to carry out a chlorosulfonylation reaction at 20 to 60 ° C (Japanese Patent Application Laid-Open No. 63-14952). However, even with the method described in Japanese Patent Application Laid-Open No. 63-14952, the target compound is isolated by adding the reaction solution to a large amount of ice after completion of the chlorosulfonylation. Therefore, the effect of improving the yield of the target compound is insufficient.
更に、 特開平 2— 1 5 7 2 5 7号公報は、 トリフルォロメチルベンゼン化合物 を発煙硫酸及びクロロスルホン酸と反応させ、 得られる反応液に不活性溶媒を加 えて目的化合物を不活性溶媒中に抽出し、 抽出液から目的化合物を単離、 精製す る方法である。 この方法は、 多量の氷中に反応液を添加するものではないので、 目的化合物の分解を回避し、 目的化合物の収率向上を目指すものである。 Further, Japanese Patent Application Laid-Open No. 2-15772 / 57 discloses that a trifluoromethylbenzene compound is reacted with fuming sulfuric acid and chlorosulfonic acid, and an inert solvent is added to the obtained reaction solution to convert the target compound into an inert solvent. This is a method in which the target compound is extracted and extracted from the extract. Since this method does not add the reaction solution to a large amount of ice, it aims at avoiding decomposition of the target compound and improving the yield of the target compound.
しかしながら、 特開平 2— 1 5 7 2 5 7号公報記載の方法は、 反応液に直接不 活性溶媒を加えて抽出するので、 抽出効率が極めて悪く、 しかも何回も大量の不 活性溶媒で抽出する必要があるために、 コスト高になるばかりでなく、 操作が煩 雑になる。 しかも、 反応に使用される発煙硫酸及びクロロスルホン酸は、 不活性 溶媒の抽出液中に取り込まれるので、 抽出液から発煙硫酸及びクロロスルホン酸 を取り除く操作が必要になる。 従って、 該方法は、 工業的な製造法としては極め て不適当である。 However, the method described in Japanese Patent Application Laid-Open No. 2-15772 / 57 involves extraction with the addition of an inert solvent directly to the reaction solution, so that the extraction efficiency is extremely poor, and the extraction is repeated many times with a large amount of the inert solvent. This not only increases the cost but also complicates the operation. Moreover, since fuming sulfuric acid and chlorosulfonic acid used in the reaction are taken into the extract of the inert solvent, it is necessary to remove fuming sulfuric acid and chlorosulfonic acid from the extract. Therefore, this method is extremely unsuitable as an industrial production method.
更に、 特開昭 6 3— 1 0 4 9 5 2号公報及び特開平 2— 1 5 7 2 5 7号公報に 記載の方法について、 本発明者が検討を加えたところ、 一般式 (3 ) で表される トリフルォロメチルベンゼンスルホニルクロリド化合物の中でも、 特に X及び Y の少なくとも 1つがフッ素原子を示す化合物である場合には、 反応途中に原料化 合物のベンゼン環上に存在するトリフルォロメチル基の大部分が加水分解を受け て力ルポキシル基に変換され、 その結果僅か 1 0 %程度の低収率でしか目的化合 物を製造し得ないことが判明した (後記比較例 1及び比較例 2参照) 。 Further, the inventors of the present invention have examined the methods described in JP-A-63-149492 and JP-A-2-157257, and found that the general formula (3) Among the trifluoromethylbenzenesulfonyl chloride compounds represented by the formula, especially when at least one of X and Y is a fluorine atom, the trifluoromethylbenzenesulfur present on the benzene ring of the starting compound during the reaction. Most of the methyl groups are hydrolyzed and converted to hepoxyl groups, and as a result, the target compound is obtained in a low yield of only about 10%. It was found that the product could not be manufactured (see Comparative Examples 1 and 2 described below).
発 明 の 開 示 Disclosure of the invention
本発明の一つの目的は、 一般式 (3 ) のトリフルォロメチルベンゼンスルホ二 ルク口リド化合物を工業的に有利に製造する新しい製造方法を提供することであ る。 An object of the present invention is to provide a new process for industrially advantageously producing a trifluoromethylbenzenesulfonyl chloride compound of the general formula (3).
本発明の他の一つの目的は、 上記トリフルォロメチルベンゼンスルホニルクロ リド化合物を高収率且つ高純度で製造し得る製造方法を提供することである。 本発明者は、 上記目的を達成すべく鋭意研究を重ねてきた。 その結果、 ベンゾ トリフルオリド化合物に三酸化硫黄を反応させ、 次いで生成する化合物を塩素化 することにより上記目的を達成できることを見い出した。 本発明は、 斯かる知見 に基づき完成されたものである。 Another object of the present invention is to provide a method for producing the trifluoromethylbenzenesulfonyl chloride compound in high yield and high purity. The present inventor has made intensive studies to achieve the above object. As a result, they have found that the above object can be achieved by reacting a benzotrifluoride compound with sulfur trioxide and then chlorinating the resulting compound. The present invention has been completed based on such findings.
本発明は、 一般式 (1 ) 2 The present invention provides a compound represented by the general formula (1) 2
[式中、 X及び Yは、 同一又は異なって、 水素原子又はハロゲン原子を示す。 ] で表されるベンゾトリフルオリド化合物! 酸化硫黄を反応させ、 次いで生成す る一般式 (2 ) [Wherein, X and Y are the same or different and each represent a hydrogen atom or a halogen atom. A benzotrifluoride compound represented by the general formula (2)
[式中、 X及び Yは前記に同じ。 ] [Wherein, X and Y are the same as above. ]
で表されるスルホン酸化合物に塩素化剤を反応させることにより、 一般式 (3 ) [式中、 X及び Yは前記に同じ。 ] By reacting a chlorinating agent with the sulfonic acid compound represented by the general formula (3) [Wherein, X and Y are the same as above. ]
で表されるトリフルォロメチルベンゼンスルホ二)レク口リド化合物を製造する方 法を提供する。 The present invention provides a method for producing a trifluoromethylbenzenesulfonide compound represented by the formula:
本発明において、 出発原料として用いられる一般式 (1 ) で表されるベンゾト リフルオリド化合物は、 入手容易な公知の化合物である。 In the present invention, the benzotrifluoride compound represented by the general formula (1) used as a starting material is an easily available known compound.
一般式 (1 ) で表されるベンゾトリフルオリド化合物としては、 例えば、 ベン ゾトリフルオリド、 2—フルォロベンゾトリフルオリド、 4—フルォ口べンゾト リフルオリド、 2 , 4—ジフルォロベンゾトリフルオリド、 2—クロ口べンゾト リフルオリド、 4—クロ口べンゾトリフルオリド、 2 , 4—ジクロロべンゾトリ フルオリド、 2—クロ口一 4—フルォロベンゾトリフルオリド、 2—フルオロー 4 _クロ口べンゾトリフルオリド、 2—ブロモベンゾトリフルオリド、 4—ブロ モベンゾトリフルオリド、 2 , 4—ジブロモベンゾトリフルオリド、 2—ブロモ 一 4一フルォロベンゾトリフルオリド、 2 _フルオロー 4—ブロモベンゾトリフ ルオリド、 2—ブロモー 4一クロ口べンゾトリフルオリド、 4—プロモー 2—ク ロロべンゾトリフルオリド等を挙げることができる。 Examples of the benzotrifluoride compound represented by the general formula (1) include benzotrifluoride, 2-fluorobenzotrifluoride, 4-fluorobenzobenzofluoride, and 2,4-difluorobenzotrifluoride. , 2-chloro benzotrifluoride, 4-chloro benzotrifluoride, 2,4-dichlorobenzotrifluoride, 2-chloro 4-fluorobenzotrifluoride, 2-fluoro 4-fluor Benzotrifluoride, 2-bromobenzotrifluoride, 4-bromobenzotrifluoride, 2,4-dibromobenzotrifluoride, 2-bromo-14-fluorobenzotrifluoride, 2-fluoro-4-bromobenzotrif Fluoride, 2-bromo-4-benzobenzotrifluoride, 4-promo 2-chlorobenzotrifluoride, etc. be able to.
一般式 (1 ) で表されるベンゾトリフルオリド化合物と三酸化硫黄との反応は、 無溶媒下又は適当な不活性溶媒中、 好ましくは不活性溶媒中で行われる。 The reaction between the benzotrifluoride compound represented by the general formula (1) and sulfur trioxide is carried out without a solvent or in a suitable inert solvent, preferably in an inert solvent.
不活性溶媒としては、 例えばクロ口ホルム、 ジクロロメタン、 1 , 2—ジクロ ロェタン、 四塩化炭素等のハロゲン化炭化水素等を挙げることができる。 これら の不活性溶媒は、 1種単独で又は 2種以上混合して使用できる。 Examples of the inert solvent include chloroform, dichloromethane, 1,2-dichloroethane, and halogenated hydrocarbons such as carbon tetrachloride. These inert solvents can be used alone or in combination of two or more.
一般式 (1 ) で表されるベンゾトリフルオリド化合物と三酸化硫黄との使用割 合は、 前者 1モルに対して後者を通常 1〜1 0モル程度、 好ましくは 1〜4モル 程度である。 The use ratio of the benzotrifluoride compound represented by the general formula (1) to sulfur trioxide is usually about 1 to 10 mol, preferably about 1 to 4 mol per 1 mol of the former.
一般式 (1 ) で表されるベンゾトリフルオリド化合物と三酸化硫黄との反応は、 スルホン化反応であり、 該反応により一般式 (2 ) で表されるスルホン酸化合物 が生成する。 The reaction between the benzotrifluoride compound represented by the general formula (1) and sulfur trioxide is a sulfonation reaction, and the sulfonic acid compound represented by the general formula (2) Is generated.
このスルホン化反応は、 通常一 1 0 °C〜不活性溶媒の沸点付近、 好ましくは 2 0〜5 0 °C程度、 より好ましくは 3 0〜4 0 °C程度で行われる。 該反応は、 反応 温度により異なるが、 通常 0 . 1〜 1 0時間程度、 好ましくは 1〜 3時間程度で 終了する。 This sulfonation reaction is carried out usually at a temperature of about 10 ° C. to about the boiling point of the inert solvent, preferably about 20 to 50 ° C., and more preferably about 30 to 40 ° C. The reaction is completed in about 0.1 to 10 hours, preferably about 1 to 3 hours, depending on the reaction temperature.
該スルホン化反応の好ましい実施態様を示すと、 例えば所定量の三酸化硫黄に 一般式 (1 ) のべンゾトリフルオリド化合物を徐々に添加していくか、 又は一般 式 (1 ) のべンゾトリフルオリド化合物に三酸化硫黄を徐々に添加していくのが よい。 不活性溶媒を用いる場合、 三酸化硫黄を不活性溶媒に溶解しておいてもよ いし、 一般式 (1 ) のべンゾトリフルオリド化合物を不活性溶媒に溶解しておい てもよい。 In a preferred embodiment of the sulfonation reaction, for example, the benzotrifluoride compound of the general formula (1) is gradually added to a predetermined amount of sulfur trioxide, or the benzene of the general formula (1) is added. It is advisable to gradually add sulfur trioxide to the zotrifluoride compound. When an inert solvent is used, sulfur trioxide may be dissolved in the inert solvent, or the benzotrifluoride compound of the general formula (1) may be dissolved in the inert solvent.
一般式 (1 ) のべンゾトリフルオリド化合物と三酸化硫黄とを混合すると、 混 合物の温度が徐々に上昇する。 本発明では、 混合物の温度が 3 0〜4 0 °Cの範囲 を維持するように、 一般式 (1 ) のべンゾトリフルオリド化合物と三酸化硫黄と を混合する際の添加速度を調整するのがより好ましい。 When the benzotrifluoride compound of the general formula (1) is mixed with sulfur trioxide, the temperature of the mixture gradually increases. In the present invention, the addition rate when mixing the benzotrifluoride compound of the general formula (1) with sulfur trioxide is adjusted so that the temperature of the mixture is maintained in the range of 30 to 40 ° C. Is more preferred.
本発明では、 次いで生成する一般式 (2 ) で表されるスルホン酸化合物を塩素 化する。 スルホン化反応で生成する一般式 (2 ) のスルホン酸化合物を一旦単離 して次の塩素化を行ってもよいが、 反応の効率性の観点からスルホン化反応で生 成する一般式 (2 ) のスルホン酸化合物を単離することなく反応混合物のまま次 の塩素化反応に供するのが好ましい。 In the present invention, the resulting sulfonic acid compound represented by the general formula (2) is then chlorinated. The sulfonic acid compound of the general formula (2) formed by the sulfonation reaction may be once isolated and subjected to the next chlorination, but from the viewpoint of the efficiency of the reaction, the general formula (2) It is preferred that the sulfonic acid compound is subjected to the next chlorination reaction as it is without isolation.
更に、 本発明では、 塩素化に先立ち、 反応混合物中に存在する未反応の三酸化 硫黄又は三酸化硫黄及び不活性溶媒を除去しておくのが望ましい。 これらの除去 には、 公知の除去手段を広く適用できる。 このような除去手段としては、 例えば 減圧蒸留等が挙げられる。 反応混合物から除去された三酸化硫黄は、 回収して再 使用できるので、 製造コスト、 廃液処理等の点で有利である。 Further, in the present invention, it is desirable to remove unreacted sulfur trioxide or sulfur trioxide and an inert solvent present in the reaction mixture before chlorination. Known removal means can be widely applied to these removals. Examples of such a removing means include distillation under reduced pressure. The sulfur trioxide removed from the reaction mixture can be recovered and reused, which is advantageous in terms of production cost, waste liquid treatment, and the like.
一般式 (2 ) のスルホン酸化合物の塩素化は、 例えば一般式 (2 ) のスルホン 酸化合物に塩素化剤を作用させることにより行われる。 The chlorination of the sulfonic acid compound of the general formula (2) is performed, for example, by allowing a chlorinating agent to act on the sulfonic acid compound of the general formula (2).
塩素化剤としては、 公知の塩素化剤を広く使用でき、 例えば塩化チォニル、 ォ キシ塩化リン、 五塩化リン、 クロロスルホン酸、 塩化スルフリル等を挙げること ができる。 これらの塩素化剤は、 1種単独で又は 2種以上混合して使用できる。 これら塩素化剤の中でも、 塩化チォエルが好ましい。 As the chlorinating agent, known chlorinating agents can be widely used, and examples thereof include thionyl chloride, phosphorus oxychloride, phosphorus pentachloride, chlorosulfonic acid, and sulfuryl chloride. Can be. These chlorinating agents can be used alone or in combination of two or more. Among these chlorinating agents, thiol chloride is preferred.
一般式 (2 ) のスルホン酸化合物の塩素化は、 無溶媒下又は適当な不活性溶媒 中で、 好ましくは無溶媒下で行われる。 The chlorination of the sulfonic acid compound of the general formula (2) is carried out without a solvent or in a suitable inert solvent, preferably without a solvent.
不活性溶媒としては、 例えば塩化メチレン、 ジクロロエタン、 四塩化炭素等の ハロゲン化炭化水素、 トルエン、 クロ口ベンゼン、 キシレン等の芳香族炭化水素、 n—へキサン、 n—ヘプタン等の脂肪族炭化水素等を挙げることができる。 これ らの不活性溶媒は、 1種単独で又は 2種以上混合して使用できる。 Examples of the inert solvent include halogenated hydrocarbons such as methylene chloride, dichloroethane, and carbon tetrachloride; aromatic hydrocarbons such as toluene, cyclobenzene, and xylene; and aliphatic hydrocarbons such as n-hexane and n-heptane. And the like. These inert solvents can be used alone or in combination of two or more.
本発明においては、 反応を円滑に進行させるために、 反応系内に触媒としてァ ミド化合物及びピリジン化合物からなる群より選ばれた少なくとも 1種を存在さ せてもよい。 In the present invention, in order to allow the reaction to proceed smoothly, at least one selected from the group consisting of an amide compound and a pyridine compound may be present in the reaction system as a catalyst.
アミド化合物としては、 例えば、 ジメチルホルムアミド、 ジェチルホルムアミ ド、 ジメチルァセトアミド、 N—メチルピロリドン等が挙げられる。 Examples of the amide compound include dimethylformamide, getylformamide, dimethylacetamide, N-methylpyrrolidone, and the like.
ピリジン化合物としては、 例えば、 ピリジン、 4—ジメチルァミノピリジン等 が挙げられる。 Examples of the pyridine compound include pyridine, 4-dimethylaminopyridine and the like.
アミド化合物及びピリジン化合物からなる群より選ばれた少なくとも 1種の使 用量は、 一般式 (2 ) のスルホン酸化合物 1モルに対して、 通常 0 . 0 0 0 1〜 0 . 1モル程度である。 The usage of at least one selected from the group consisting of amide compounds and pyridine compounds is usually about 0.001 to 0.1 mol per 1 mol of the sulfonic acid compound of the general formula (2). .
一般式 (2 ) のスルホン酸化合物と塩素化剤との使用割合は、 前者 1モルに対 して後者を通常 1〜 5モル程度、 好ましくは 1 . 2〜2. 2モル程度とするのが よい。 The ratio of the sulfonic acid compound of the general formula (2) to the chlorinating agent is usually about 1 to 5 mol, preferably about 1.2 to 2.2 mol, per 1 mol of the former. Good.
塩素化反応は、 通常 0〜1 6 0 °C程度、 好ましくは 6 0〜1 1 O 程度、 より 好ましくは 6 5〜1 0 0 程度、 特に好ましくは 7 0〜9 0 °C程度で行われる。 塩素化反応は、 反応温度により異なるが、 通常 1〜1 0時間程度、 好ましくは 2 〜 5時間程度で完結する。 The chlorination reaction is usually performed at about 0 to 160 ° C., preferably about 60 to 11 O, more preferably about 65 to 100 ° C., and particularly preferably about 70 to 90 ° C. . The chlorination reaction varies depending on the reaction temperature, but is usually completed in about 1 to 10 hours, preferably in about 2 to 5 hours.
一般式 (2 ) のスルホン酸化合物の塩素化により、 目的とする一般式 (3 ) で 表されるトリフルォロメチルベンゼンスルホニルク口リド化合物が生成する。 塩素化反応終了後、 本発明では、 反応液を減圧下に濃縮することにより一般式 By chlorination of the sulfonic acid compound of the general formula (2), the desired trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) is formed. After completion of the chlorination reaction, in the present invention, the reaction solution is concentrated under reduced pressure to obtain the general formula
( 3 ) で表されるトリフルォロメチルベンゼンスルホニルクロリド化合物を単離 できる。 得られた一般式 ( 3 ) で表されるトリフルォロメチルベンゼンスルホ二 ルクロリド化合物は、 そのまま医薬品等を合成するための中間体として使用する ことができる。 Isolate the trifluoromethylbenzenesulfonyl chloride compound represented by (3) it can. The obtained trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) can be used as it is as an intermediate for synthesizing a drug or the like.
本発明では、 反応終了後の反応液を減圧下に濃縮し、 次いで得られる濃縮液に 不活性溶媒を加えて、 一般式 (3 ) で表されるトリフルォロメチルベンゼンスル ホニルクロリド化合物を不活性溶媒中に溶解させ、 その溶液を水洗し、 濃縮する のが好ましい。 このようにして、 目的とする一般式 (3 ) で表されるトリフルォ ロメチルベンゼンスルホエルク口リド化合物をより一層高純度で単離することが できる。 In the present invention, the reaction solution after completion of the reaction is concentrated under reduced pressure, and then an inert solvent is added to the obtained concentrated solution to inactivate the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3). It is preferable to dissolve in a solvent, wash the solution with water, and concentrate. In this way, the target trifluoromethylbenzenesulfoerck sulfide compound represented by the general formula (3) can be isolated with even higher purity.
反応液の抽出に使用される不活性溶媒としては、 塩素化反応に使用される不活 性溶媒と同種のものがよく、 例えば塩化メチレン、 ジクロロェタン、 四塩化炭素 等のハロゲン系炭化水素、 トルエン、 クロ口ベンゼン、 キシレン等の芳香族炭化 水素、 n—へキサン、 n—ヘプタン等の脂肪族炭化水素等を挙げることができる。 これらの不活性溶媒は、 1種単独で又は 2種以上混合して使用できる。 The inert solvent used for the extraction of the reaction solution is preferably the same as the inert solvent used for the chlorination reaction, for example, halogenated hydrocarbons such as methylene chloride, dichloroethane, carbon tetrachloride, toluene, and the like. Examples thereof include aromatic hydrocarbons such as benzene and xylene, and aliphatic hydrocarbons such as n-hexane and n-heptane. These inert solvents can be used alone or in combination of two or more.
塩素化反応終了後、 反応液を減圧下に濃縮する方法を採用すると、 未反応の塩 素化剤を回収して再使用できるので、 製造コスト、 廃液処理等の点で有利である。 本発明の方法では、 スルホン化反応に使用された三酸化硫黄及び不活性溶媒並 びに塩素化反応で使用された塩素化剤が反応液から除去されているので、 目的化 合物抽出のための不活性溶媒の使用量を大幅に抑制することができる。 If a method of concentrating the reaction solution under reduced pressure after completion of the chlorination reaction is employed, the unreacted chlorinating agent can be recovered and reused, which is advantageous in terms of production cost, waste liquid treatment, and the like. In the method of the present invention, since the sulfur trioxide used in the sulfonation reaction, the inert solvent, and the chlorinating agent used in the chlorination reaction are removed from the reaction solution, the target compound is extracted for extraction. The amount of the inert solvent used can be greatly reduced.
不活性溶媒の使用量は、 抽出処理されるべき反応液に対して、 通常 1〜1 0倍 容量、 好ましくは 2〜 5倍容量でよい。 The amount of the inert solvent used may be generally 1 to 10 times, preferably 2 to 5 times, the volume of the reaction solution to be subjected to the extraction treatment.
目的化合物を抽出した不活性溶媒には、 回収されなかった微量の塩素化剤等が 混入する場合があるが、 該溶媒を水で洗浄することにより、 混入された不純物を 取り除くことができる。 斯くして、 本発明の目的とする一般式 (3 ) で表される 卜リフルォロメチルベンゼンスルホニルクロリド化合物を純度よく製造すること ができる。 The inert solvent from which the target compound has been extracted may contain a small amount of a chlorinating agent that has not been recovered. However, the mixed impurities can be removed by washing the solvent with water. Thus, the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3), which is the object of the present invention, can be produced with high purity.
発明の効果 The invention's effect
本発明の方法によれば、 一般式 (3 ) のトリフルォロメチルベンゼンスルホ二 ルクロリド化合物を高収率 (例えば 9 0 %以上) 且つ高純度 (例えば 9 5 %以 上) で製造し得る製造方法を提供することができる。 本発明の方法は、 特に 2— フルオロー 5一トリフルォロメチルベンゼンスルホニルクロリド、 4一フルォロ — 3 _トリフルォロメチルベンゼンスルホニルクロリド等のフッ素置換トリフル ォロメチルベンゼンスルホニルクロリド化合物の製造に適している。 According to the method of the present invention, the trifluoromethylbenzenesulfonyl chloride compound represented by the general formula (3) can be obtained in high yield (for example, 90% or more) and high purity (for example, 95% or less). The above method can be provided. The method of the present invention is particularly suitable for the production of fluorine-substituted trifluoromethylbenzenesulfonyl chloride compounds such as 2-fluoro-5-trifluoromethylbenzenesulfonyl chloride and 4-fluoro-3_trifluoromethylbenzenesulfonyl chloride. I have.
本発明の方法では、 スルホン化反応に使用される三酸化硫黄及び塩素化反応で 使用される塩素化剤を回収し、 これらを再使用することができる。 このため、 廃 液処理が不必要になり、 また三酸化硫黄及び塩素化剤の使用量を減じることがで きるので、 製造コストを抑制することができる。 In the method of the present invention, sulfur trioxide used in the sulfonation reaction and the chlorinating agent used in the chlorination reaction can be recovered and reused. For this reason, waste liquid treatment becomes unnecessary, and the amount of sulfur trioxide and the chlorinating agent can be reduced, so that the production cost can be suppressed.
本発明の方法では、 目的化合物抽出のための不活性溶媒の使用量を大幅に抑制 することができる。 According to the method of the present invention, the amount of an inert solvent used for extracting a target compound can be significantly reduced.
従って、 本発明の方法は、 一般式 (3 ) のトリフルォロメチルベンゼンスルホ ニルク口リド化合物の工業的な製造方法として極めて有利である。 Therefore, the process of the present invention is extremely advantageous as an industrial process for producing a trifluoromethylbenzenesulfonyl chloride compound of the general formula (3).
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
以下に実施例を掲げて、 本発明をより一層明らかにする。 Hereinafter, the present invention will be further clarified with reference to examples.
実施例 1 Example 1
三酸化硫黄 3 0 g及び塩化メチレン 3 0 gの混合液に、 4—フルォロベンゾト リフルオリド 1 5 gを 2 0 °Cで滴下した。 滴下が進行すると反応液の温度が徐々 に上昇するが、 反応液の温度が 3 0〜3 5での範囲を維持するように滴下速度を 調整した。 滴下終了後 2時間撹拌した。 反応液の NMRスペクトルから、 原料で ある 4—フルォロベンゾ卜リフルオリドの消失を確認した。 To a mixed solution of 30 g of sulfur trioxide and 30 g of methylene chloride, 15 g of 4-fluorobenzotrifluoride was added dropwise at 20 ° C. As the addition proceeded, the temperature of the reaction solution gradually increased, but the addition speed was adjusted so that the temperature of the reaction solution was maintained in the range of 30 to 35. After completion of the dropwise addition, the mixture was stirred for 2 hours. From the NMR spectrum of the reaction solution, it was confirmed that 4-fluorobenzotrifluoride as the raw material had disappeared.
次に、 反応液を減圧下で塩ィ匕メチレン及び三酸化硫黄を蒸留し、 これらを回収 した。 更に、 反応液に、 塩ィ匕チォニル 2 4m l及びジメチルホルムアミドを数滴 加え、 5時間加熱還流した。 反応液を 4 0 に冷却後、 減圧下に塩化チォニルを 蒸留し、 これを回収した。 反応液を 1 0 に冷却後、 n—へキサン 1 0 0 m lを 加え、 液温が 1 0 °Cを越えないように冷却しながら水 1 0 0 m lを加えて、 n— へキサン溶液を分離した。 n—へキサン溶液を乾燥後、 減圧濃縮して、 2 _フル オロー 5—トリフルォロメチルベンゼンスルホニルクロリド 2 2 . 8 g (収率 9 5 %, 純度 9 6 %) を得た。 Next, methylene chloride and sulfur trioxide were distilled from the reaction solution under reduced pressure, and these were recovered. Further, to the reaction solution were added 24 ml of Shiridani Thionyl and several drops of dimethylformamide, and the mixture was heated under reflux for 5 hours. After cooling the reaction solution to 40, thionyl chloride was distilled off under reduced pressure and collected. After cooling the reaction mixture to 100, 100 ml of n-hexane was added, and 100 ml of water was added while cooling so that the liquid temperature did not exceed 10 ° C. separated. After drying the n-hexane solution, the solution was concentrated under reduced pressure to obtain 22.8 g of 2-fluoro-5-trifluoromethylbenzenesulfonyl chloride (95% yield, 96% purity).
沸点: 8 0〜 8 5 °CZ 5 mmH g NMRスぺク卜ル (δ p pm) : Boiling point: 80 to 85 ° CZ 5 mmH g NMR spectrum (δ p pm):
8. 26 -8. 28 (1H, m) , 8. 01-8. 05 (1H, m) , 7. 51 (1 H, t, 9 Hz) 8.26 -8.28 (1H, m), 8.01-8.05 (1H, m), 7.51 (1H, t, 9 Hz)
実施例 2 Example 2
三酸化硫黄 37 g及び塩化メチレン 37 gの混合液に、 2—フルォロベンゾト リフルオリド 19 gを 20°Cで滴下した。 滴下が進行すると反応液の温度が徐々 に上昇するが、 反応液の温度が 30〜35°Cの範囲を維持するように滴下速度を 調整した。 滴下終了後 2時間撹拌した。 反応液の NMRスペクトルから、 原料で ある 2—フルォロベンゾトリフルオリドの消失を確認した。 To a mixture of 37 g of sulfur trioxide and 37 g of methylene chloride, 19 g of 2-fluorobenzotrifluoride was added dropwise at 20 ° C. The temperature of the reaction solution gradually increased as the dropwise addition proceeded, but the dropping speed was adjusted so that the temperature of the reaction solution was maintained in the range of 30 to 35 ° C. After completion of the dropwise addition, the mixture was stirred for 2 hours. From the NMR spectrum of the reaction solution, disappearance of the starting material, 2-fluorobenzotrifluoride, was confirmed.
次に、 反応液を減圧にして塩化メチレン及び三酸ィ匕硫黄を蒸留し、 これらを回 収した。 更に、 反応液に、 塩化チォニル 24ml及びジメチルホルムアミドを数 滴加え、 5時間加熱還流した。 反応液を 4 Otに冷却後、 減圧下に塩化チォニル を蒸留し、 これを回収した。 反応液を 10 に冷却後、 1, 2—ジクロロェタン 100mlを加え、 液温が 10 を越えないように冷却しながら水 10 Om 1を 加えて、 1, 2—ジクロロェタン溶液を分離した。 1, 2—ジクロロェタン溶液 を乾燥後、 減圧濃縮して、 4一フルオロー 3 _トリフルォロメチルベンゼンスル ホニルクロリド 28 g (収率 99%、 純度 98%) を得た。 Next, the reaction solution was depressurized to distill methylene chloride and triacid sulfur, and these were recovered. Further, 24 ml of thionyl chloride and several drops of dimethylformamide were added to the reaction solution, and the mixture was heated under reflux for 5 hours. After cooling the reaction solution to 4 Ot, thionyl chloride was distilled off under reduced pressure and collected. After cooling the reaction solution to 10, 100 ml of 1,2-dichloroethane was added, and 10 Om1 of water was added while cooling so that the liquid temperature did not exceed 10, to separate a 1,2-dichloroethane solution. The 1,2-dichloroethane solution was dried and concentrated under reduced pressure to obtain 28 g of 4-monofluoro-3-trifluoromethylbenzenesulfonyl chloride (yield 99%, purity 98%).
沸点: 85〜 89 5 mmH g Boiling point: 85-89 5 mmH g
NMRスぺクトル (δ p pm) : NMR spectrum (δ p pm):
8. 2 - 8. 4 (2H, m) , 7. 50 (1 Η, t, J==9Hz) 8.2-8.4 (2H, m), 7.50 (1 Η, t, J == 9Hz)
比較例 1 Comparative Example 1
特開昭 63 - 104952号公報に記載の方法に従って、 4一フルオロー 3— トリフルォロメチルベンゼンスルホニルク口リドを製造した。 According to the method described in JP-A-63-104952, 4-fluoro-3-trifluoromethylbenzenesulfonyl chloride was prepared.
即ち、 60%発煙硫酸 2 Omlに 4—フルォロベンゾトリフルオリド 33 gを 50 で 1時間かけて滴下し、 同温度にて更に 1時間撹拌した。 次にこの混合物 にクロロスルホン酸 (67ml) を 50 で徐々に滴下した。 20°Cまで冷却し ながら 2時間撹拌した。 反応液を 500 gの氷に注ぎ、 撹拌した。 n—へキサン を加え、 析出した結晶を濾別し、 n—へキサン層を分液ロートでとり濃縮、 乾燥 して、 4一フルオロー 3—トリフルォロメチルベンゼンスルホニルクロリド 5. 2 g (収率 10%) を得た。 That is, 33 g of 4-fluorobenzotrifluoride was added dropwise to 2 Oml of 60% fuming sulfuric acid at 50 over 1 hour, followed by stirring at the same temperature for 1 hour. Next, chlorosulfonic acid (67 ml) was gradually added dropwise to the mixture at 50. The mixture was stirred for 2 hours while cooling to 20 ° C. The reaction solution was poured into 500 g of ice and stirred. n-Hexane was added, and the precipitated crystals were separated by filtration. The n-hexane layer was taken with a separatory funnel, concentrated and dried to obtain 4-fluoro-3-trifluoromethylbenzenesulfonyl chloride 5. 2 g (10% yield) were obtained.
比較例 2 Comparative Example 2
特開平 2—157257号公報に記載の方法に従って、 4一フルオロー 3—ト リフルォロメチルベンゼンスルホニルクロリドを製造した。 According to the method described in JP-A-2-157257, 4-fluoro-3-trifluoromethylbenzenesulfonyl chloride was produced.
- 即ち、 60%発煙硫酸 15ml及びクロロスルホン酸 30mlの混合液を一 5 °Cに冷却し、 これに 4一フルォロベンゾトリフルォリドを混合液の温度が 0 °C以 上にならないように冷却しながら滴下した。 反応液を 0°Cで更に 4時間撹拌した。 反応液に n—へキサン 100mlを加え、 1時間撹拌後、 n—へキサン層を分取 した。 更に、 同じ操作を 2回繰り返した。 -That is, a mixture of 15 ml of 60% fuming sulfuric acid and 30 ml of chlorosulfonic acid is cooled to 15 ° C, and 4-fluorobenzotrifluoride is added to the mixture so that the temperature of the mixture does not exceed 0 ° C. While cooling. The reaction was stirred at 0 ° C for another 4 hours. 100 ml of n-hexane was added to the reaction solution, and after stirring for 1 hour, the n-hexane layer was separated. Further, the same operation was repeated twice.
得られた n—へキサン層を合わせて水 300mlで水洗し、 硫酸マグネシウム で乾燥後、 濃縮して、 4—フルオロー 3—トリフルォロメチルベンゼンスルホ二 ルクロリド 5 g (収率 10%) を得た。 The obtained n-hexane layers were combined, washed with water (300 ml), dried over magnesium sulfate, and concentrated to obtain 4-fluoro-3-trifluoromethylbenzenesulfonyl chloride (5 g, yield 10%). Was.
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| JP2002020039A JP2003221377A (en) | 2002-01-29 | 2002-01-29 | Method for producing trifluoromethylbenzene sulfonyl chloride compound |
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| JPH02169561A (en) * | 1988-12-23 | 1990-06-29 | Mitsui Toatsu Chem Inc | Production of 3-trifluoromethylbenzene sulfonyl chlorides |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH02169561A (en) * | 1988-12-23 | 1990-06-29 | Mitsui Toatsu Chem Inc | Production of 3-trifluoromethylbenzene sulfonyl chlorides |
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