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WO2003050586A3 - Facette de miroir et miroir a facettes - Google Patents

Facette de miroir et miroir a facettes Download PDF

Info

Publication number
WO2003050586A3
WO2003050586A3 PCT/EP2002/012792 EP0212792W WO03050586A3 WO 2003050586 A3 WO2003050586 A3 WO 2003050586A3 EP 0212792 W EP0212792 W EP 0212792W WO 03050586 A3 WO03050586 A3 WO 03050586A3
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
facet
facetted
mirror surface
facets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2002/012792
Other languages
German (de)
English (en)
Other versions
WO2003050586A2 (fr
Inventor
Wolfgang Singer
Markus Weiss
Andreas Seifert
Frank Melzer
Heinz Mann
Andreas Heisler
Hubert Holderer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to AU2002356606A priority Critical patent/AU2002356606A1/en
Publication of WO2003050586A2 publication Critical patent/WO2003050586A2/fr
Publication of WO2003050586A3 publication Critical patent/WO2003050586A3/fr
Priority to US10/841,846 priority patent/US7090362B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

L'invention concerne une facette de miroir (3) conçue pour un miroir à facettes (1) et présentant une surface miroir (4). Dans un mode de réalisation préféré de l'invention, la surface miroir (4) de la facette de miroir (3) présente une forme sphérique, la face de la facette miroir (3) qui est opposée à la surface miroir (4) présente également une forme sphérique, et les deux sphères comportent des centres (M, M') différents. La facette de miroir (3) peut néanmoins être configurée de manière que la face qui est opposée à la surface miroir (4) présente une forme plane. Les facettes de miroir (3) peuvent être réunies pour constituer un miroir à facettes (1), les facettes de miroir (3) étant à cet effet posées sur un élément porteur commun (2).
PCT/EP2002/012792 2001-11-09 2002-11-15 Facette de miroir et miroir a facettes Ceased WO2003050586A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002356606A AU2002356606A1 (en) 2001-12-12 2002-11-15 Mirror facet and facetted mirror
US10/841,846 US7090362B2 (en) 2001-11-09 2004-05-07 Facet mirror having a number of mirror facets

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160932 2001-12-12
DE10160932.9 2001-12-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/011773 Continuation-In-Part WO2003040796A1 (fr) 2001-11-09 2002-10-22 Miroir inclinable

Publications (2)

Publication Number Publication Date
WO2003050586A2 WO2003050586A2 (fr) 2003-06-19
WO2003050586A3 true WO2003050586A3 (fr) 2003-12-18

Family

ID=7708871

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/012792 Ceased WO2003050586A2 (fr) 2001-11-09 2002-11-15 Facette de miroir et miroir a facettes

Country Status (2)

Country Link
AU (1) AU2002356606A1 (fr)
WO (1) WO2003050586A2 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10302664A1 (de) * 2003-01-24 2004-07-29 Carl Zeiss Smt Ag Verfahren zur Herstellung eines Facettenspiegels
US7246909B2 (en) 2003-01-24 2007-07-24 Carl Zeiss Smt Ag Method for the production of a facetted mirror
DE102005056914A1 (de) 2005-11-29 2007-05-31 Carl Zeiss Smt Ag Projektionsbelichtungsystem
DE102006031654A1 (de) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facettenspiegel mit einer Vielzahl von Spiegelsegmenten
DE102006056035A1 (de) 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007008448A1 (de) * 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel
DE102012202047A1 (de) * 2012-02-10 2013-01-17 Carl Zeiss Smt Gmbh Zerstörungsfreies stoffschlüssiges Verbinden von Komponenten zur Herstellung von optischen Elementen
DE102012223754A1 (de) * 2012-12-19 2014-05-15 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur automatisierten Montage von Facettenspiegeln und entsprechend hergestellte Facettenspiegel
DE102013203035A1 (de) 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh Optisches modul
DE102013212363A1 (de) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facettenspiegel, insbesondere für die EUV-Projektionslithografie
EP3704546A1 (fr) * 2017-10-30 2020-09-09 ASML Holding N.V. Ensemble destiné à être utilisé pour la photolithographie de semi-conducteurs et son procédé de fabrication
DE102021203475A1 (de) * 2021-04-08 2022-10-13 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels einer Projektionsbelichtungsanlage für die Mikrolithographie

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254210A (ja) * 1985-09-03 1987-03-09 Canon Inc 角度調整装置
JPH07199038A (ja) * 1994-01-10 1995-08-04 Sumitomo Heavy Ind Ltd 凹面鏡のあおり調整装置
JPH0996757A (ja) * 1995-10-02 1997-04-08 Olympus Optical Co Ltd 光路偏向装置
WO1998014815A1 (fr) * 1996-10-01 1998-04-09 Hara Smith Stephen C O Reflecteur ajustable
EP0916984A1 (fr) * 1997-11-15 1999-05-19 Canon Kabushiki Kaisha Dispositif de déflexion d lumière et son réseau
JP2000167683A (ja) * 1998-12-03 2000-06-20 Mitsubishi Electric Corp 反射鏡による光路調整装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254210A (ja) * 1985-09-03 1987-03-09 Canon Inc 角度調整装置
JPH07199038A (ja) * 1994-01-10 1995-08-04 Sumitomo Heavy Ind Ltd 凹面鏡のあおり調整装置
JPH0996757A (ja) * 1995-10-02 1997-04-08 Olympus Optical Co Ltd 光路偏向装置
WO1998014815A1 (fr) * 1996-10-01 1998-04-09 Hara Smith Stephen C O Reflecteur ajustable
EP0916984A1 (fr) * 1997-11-15 1999-05-19 Canon Kabushiki Kaisha Dispositif de déflexion d lumière et son réseau
JP2000167683A (ja) * 1998-12-03 2000-06-20 Mitsubishi Electric Corp 反射鏡による光路調整装置

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 011, no. 248 (P - 604) 13 August 1987 (1987-08-13) *
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 11 26 December 1995 (1995-12-26) *
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 08 29 August 1997 (1997-08-29) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 09 13 October 2000 (2000-10-13) *

Also Published As

Publication number Publication date
AU2002356606A1 (en) 2003-06-23
WO2003050586A2 (fr) 2003-06-19
AU2002356606A8 (en) 2003-06-23

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