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WO2003050587A3 - Katadioptrisches reduktionsobjektiv - Google Patents

Katadioptrisches reduktionsobjektiv Download PDF

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Publication number
WO2003050587A3
WO2003050587A3 PCT/EP2002/008037 EP0208037W WO03050587A3 WO 2003050587 A3 WO2003050587 A3 WO 2003050587A3 EP 0208037 W EP0208037 W EP 0208037W WO 03050587 A3 WO03050587 A3 WO 03050587A3
Authority
WO
WIPO (PCT)
Prior art keywords
catadioptrical
image
object plane
plane
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2002/008037
Other languages
English (en)
French (fr)
Other versions
WO2003050587A2 (de
Inventor
David R Shafer
Alexander Epple
Wilhelm Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to EP02747468A priority Critical patent/EP1456705A2/de
Priority to AU2002317875A priority patent/AU2002317875A1/en
Priority to JP2003551585A priority patent/JP2005512151A/ja
Publication of WO2003050587A2 publication Critical patent/WO2003050587A2/de
Publication of WO2003050587A3 publication Critical patent/WO2003050587A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)

Abstract

Ein katadioptrisches Projektionsobjektiv, welches ein in einer Objektebene angeordnetes Muster unter Erzeugung eines reellen Zwischenbilds in eine Bildebene abbildet, hat zwischen der Objektebene und der Bildebene einen katadioptrischen ersten Objektivteil und einen Konkavspiegel und einer Strahlumlenkeinrichtung und hinter der Strahlumlenkeinrichtung einen dioptrischen zweiten Objektivteil. Die Strahlumlenkeinrichtung hat eine vorzugsweise vollreflektierende erste Spiegelfläche zur Umlenkung der von der Objektebene kommenden Strahlung zum Konkavspiegel. In einem optischen Nahbereich der Objektebene, in welchem die Hauptstrahlhöhe des äußersten Feldpunktes der vom Objekt kommenden Strahlung größer ist als die Randstrahlhöhe, ist hinter der ersten Spiegelfläche zwischen dieser und dem Konkavspiegel positive Brechkraft angeordnet. Dadurch ist ein objektseitig telezentrisches Projektionsobjektiv möglich, das bei moderaten Anforderungen an die Beschichtung von Spiegelflächen gut korrigierbar und mit relative kleinen Linsendimensionen realisierbar ist.
PCT/EP2002/008037 2001-12-10 2002-07-19 Katadioptrisches reduktionsobjektiv Ceased WO2003050587A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02747468A EP1456705A2 (de) 2001-12-10 2002-07-19 Katadioptrisches reduktionsobjektiv
AU2002317875A AU2002317875A1 (en) 2001-12-10 2002-07-19 Catadioptrical reduction lens
JP2003551585A JP2005512151A (ja) 2001-12-10 2002-07-19 カタジオプトリック縮小対物レンズ

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33927501P 2001-12-10 2001-12-10
US60/339,275 2001-12-10

Publications (2)

Publication Number Publication Date
WO2003050587A2 WO2003050587A2 (de) 2003-06-19
WO2003050587A3 true WO2003050587A3 (de) 2003-11-13

Family

ID=23328263

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008037 Ceased WO2003050587A2 (de) 2001-12-10 2002-07-19 Katadioptrisches reduktionsobjektiv

Country Status (4)

Country Link
EP (1) EP1456705A2 (de)
JP (1) JP2005512151A (de)
AU (1) AU2002317875A1 (de)
WO (1) WO2003050587A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
EP1690139B1 (de) 2003-12-02 2009-01-14 Carl Zeiss SMT AG Optisches projektionssystem
KR101391470B1 (ko) * 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
DE102005030839A1 (de) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581379A (en) * 1993-02-15 1996-12-03 Omron Corporation Rectangular based convex microlenses surrounded within a frame and method of making
US5691802A (en) * 1994-11-07 1997-11-25 Nikon Corporation Catadioptric optical system and exposure apparatus having the same
US5768031A (en) * 1995-12-01 1998-06-16 Lg Electronics Inc. Objective lens
EP0989434A2 (de) * 1998-07-29 2000-03-29 Carl Zeiss Catadioptrisches System und dieses verwendender Belichtungsapparat
US20010017830A1 (en) * 1996-10-23 2001-08-30 Konica Corporation. Method for recording / reproducing optical information recording medium, optical pickup apparatus, objective lens and design method of objective lens
WO2001065296A1 (en) * 2000-03-03 2001-09-07 Nikon Corporation Reflection/refraction optical system and projection exposure apparatus comprising the optical system
US20010024327A1 (en) * 2000-03-23 2001-09-27 Hisayoshi Fujimoto Lens array and lens array assembly
US6313949B1 (en) * 1999-08-11 2001-11-06 Fuji Photo Optical Co., Ltd. Fly eye lens

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581379A (en) * 1993-02-15 1996-12-03 Omron Corporation Rectangular based convex microlenses surrounded within a frame and method of making
US5691802A (en) * 1994-11-07 1997-11-25 Nikon Corporation Catadioptric optical system and exposure apparatus having the same
US5768031A (en) * 1995-12-01 1998-06-16 Lg Electronics Inc. Objective lens
US20010017830A1 (en) * 1996-10-23 2001-08-30 Konica Corporation. Method for recording / reproducing optical information recording medium, optical pickup apparatus, objective lens and design method of objective lens
EP0989434A2 (de) * 1998-07-29 2000-03-29 Carl Zeiss Catadioptrisches System und dieses verwendender Belichtungsapparat
US6313949B1 (en) * 1999-08-11 2001-11-06 Fuji Photo Optical Co., Ltd. Fly eye lens
WO2001065296A1 (en) * 2000-03-03 2001-09-07 Nikon Corporation Reflection/refraction optical system and projection exposure apparatus comprising the optical system
US20010024327A1 (en) * 2000-03-23 2001-09-27 Hisayoshi Fujimoto Lens array and lens array assembly

Also Published As

Publication number Publication date
JP2005512151A (ja) 2005-04-28
AU2002317875A1 (en) 2003-06-23
AU2002317875A8 (en) 2003-06-23
WO2003050587A2 (de) 2003-06-19
EP1456705A2 (de) 2004-09-15

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