WO2002031216A2

WO2002031216A2 - Apparatus for continuous sputter-deposition

Info

Publication number: WO2002031216A2
Application number: PCT/US2001/031597
Authority: WO
Inventors: Jean-Marc Lemmer; Marcel Schloremberg
Original assignee: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique CRVC SARL
Current assignee: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique CRVC SARL
Priority date: 2000-10-11
Filing date: 2001-10-11
Publication date: 2002-04-18
Anticipated expiration: 2003-04-11
Also published as: AU2002211575A1; WO2002031216A3

Abstract

A sputter coating apparatus includes at least a first sputter coating line (58) and a second sputter coating line (59). The first and second sputter coating lines may be operated in parallel with one another in certain embodiments in order to independently form coating systems and respective coated articles. However, the two coating lines may also be utilized so as to operate in series with one another to form a coated article. In the latter case, a transition zone (60) is provided between an end of the first line and an end of the second line so as to selectively couple an output of the first line to an input of the second line when it is desired to utilize the two sputter coating lines in series with one another. In such a manner, it is possible to avoid many of the inefficiencies associated with conventional sputter coating apparatuses and processes.

Description

This is a continuation-in-part (CIP) application of U.S. Serial No. 09/685,568,

filed October 11, 2000, the disclosure of which is hereby incorporated herein by

reference.

APPARATUS FORSPUTTER-COATING GLASS AND CORRESPONDINGMETHOD

This invention relates to an apparatus for sputter coating glass, and corresponding

method.

BACKGROUND AND SUMMARY OF THE INVENTION

Sputter coated glass articles are known in the art. For example, see U.S. Patent

Nos. 5,770,321, 5,298,048, and 5,403,458, the disclosures of which are all hereby

incorporated herein by reference. Sputter coated layer systems on glass substrates are

typically utilized for achieving solar management properties (e.g., low emissivity or low-

E) in many types of glass articles, including but not limited to architectural windows,

automotive windows, automotive windshields, and the like.

Sputter coating may be an electric discharge process, often conducted in a vacuum

chamber in the presence of one or more gases. A sputter coating apparatus typically

includes at least one vacuum chamber in which a substrate is located, a power source, an

anode, and one or more specially prepared cathode targets of or covered with a material

to be used in creating a layer on the substrate. When an electric potential is applied to the cathode target, the gas(es) forms a plasma that bombards the target causing particles of

the coating material to be liberated or lifted from the target itself. The liberated coating

material from the target falls onto the underlying substrate and adheres thereto. When

conducted in the presence of a "reactive" gas, a reactive product of the coating material

from the target and the gas may be deposited on the substrate.

Unfortunately, conventional sputter coating apparatuses suffer from certain

inefficiencies, especially when one desires or needs to manufacture different types of

sputter coated articles using the same sputter coating apparatus.

Consider, for purposes of examples only, a scenario where one wishes to

manufacture the coated articles of Figures 1 and 2 utilizing a sputter coating apparatus.

The coated article of Figure 1 includes glass substrate 1 on which are located silicon

nitride (Si₃N ) layer 2, nichrome or nichrox (NiCr or NiCrO_x) layer 3, silver (Ag) layer 4,

nichrome or nichrox (NiCr or NiCrO_x) layer 5, and silicon nitride (Si₃N₄) layer 6.

Optionally, another layer (e.g., a dielectric layer) may also be provided between substrate

1 and layer 2. Further details regarding the coated article of Figure 1 may be found in

U.S. Patent No. 5,770,321, incorporated herein by reference. Meanwhile, the coated

article of Figure 2 also includes layers 2-6 provided on glass substrate 1. However, the

coated article of Figure 2 further includes a thicker silicon nitride (Si₃N₄) layer 6a

(instead of layer 6 shown in Figure 1), nichrome or nichrox (NiCr or NiCrO_x) layer 7, second silver (Ag) layer 8, nichrome or nichrox (NiCr or NiCrO_x) layer 9, and silicon

nitride (Si₃N₄) layer 10. The coating system of Figure 2 may be referred to as a dual

silver coating system because it includes first and second silver (Ag) layers 4 and 8

provided for infrared (IR) radiation reflection, respectively, as opposed to the single

silver layer 4 provided in the coated article of Figure 1.

To manufacture both the coated article of Figure 1 and the coated article of Figure

2 using the same sputter coating apparatus, one would typically obtain a sputter coating

apparatus as shown in Figure 3. The Fig. 3 sputter coating apparatus includes enough

targets and zones to enable each of layers 2-10 to be deposited on a substrate 1 (i.e., it is

large enough and has enough capacity to enable either the Fig. 1 or the Fig. 2 article to be

made therein). In particular, the sputter coating apparatus includes six different zones

(i.e., zones 1-6) which are separated from one another by curtains or walls 52. Zone 1

includes targets 21-26. Zone 2 includes targets 27-29. Zone 3 includes targets 30-35.

Zone 4 includes targets 36-41. Zone 5 includes targets 42-44. Zone 6 includes targets

46-50. A different gas (e.g., argon, nitrogen, oxygen, etc.) may be utilized in each zone

at low pressure, while vacuum pumps 51 are provided between zones in order to keep

gaseous atmospheres from one zone from significantly leaking into an contaminating

adjacent zone(s). In order to manufacture the coated article of Figure 1 using the sputter coating

apparatus of Figure 3, a typical line speed of the sputter coater is 205 inches per minute

for this five layer system. For the Fig. 1 coating system to be deposited, targets 21-26 in

zone 1 are silicon (Si) targets, while nitrogen gas at low pressure is provided in that zone.

Following deposition of silicon nitride layer 2 in zone 1 using targets 21-26, the substrate

1 passes into zone 2 via a conveyor. In zone 2, targets 27 and 29 are of nickel and/or

chrome, while target 28 is of silver. An argon (Ar) atmosphere may be utilized in zone 2.

After the nichrome layers 3 and 5 and silver layer 4 are deposited in zone 2, a conveyor

moves the substrate into zone 3 beneath targets 30-35. In zone 3, targets 30-35 are of

silicon (Si) while a nitrogen (N₂) gas at low pressure is utilized in that zone. Each of

zones 1-3 may be maintained at a pressure of from about 1.0 to 3.0 x 10° Torr, or any

other pressure disclosed in any of the aforesaid '321, '048 and '458 patents. Upon leaving

zone 3, the coating system of Figure 1 will have been formed. Thus, zones 4-6 and their

respective targets 36-50 are inoperative in the Figure 3 apparatus when the coated article

of Figure 1 is deposited as discussed above. Unfortunately, the inoperation of these three

zones 4-6 is wasteful, and also presents a requirement for passing a coated article through

inoperative zones thereby leading to potential contamination and/or undesirable delay.

However, when it is desired to manufacture the coated article of Figure 2 utilizing

the apparatus of Figure 3, zones 1-3 are set up and utilized as described above regarding the Fig. 1 article. In addition, zones 4-6 are set up just like zones 1-3, respectively. Thus,

the upper half of silicon nitride layer 6a and layers 7-10 are deposited in zones 4-6. In

other words, targets 36-41 are silicon targets in a nitrogen atmosphere of zone 4, targets

42 and 44 are nickel and/or chrome targets in an argon atmosphere in zone 5, target 43 is

a silver target in the same argon atmosphere of zone 5, and targets 45-50 are silicon

targets in a mtrogen atmosphere of zone 6. Thus, all six zones (i.e., zones 1-6) are

utilized when forming the layer system of the Figure 2 coated article.

Unfortunately, as can be seen from the above, it is often desired to manufacture

coated articles of different types such as those of Figures 1 and 2. If this is to be done

utilizing the same sputter coating apparatus, such an apparatus must be obtained which

has enough zones and targets to enable the coating system having the largest number of

layers to be manufactured. Thus, one desiring to manufacture the articles of both Figure

1 and Figure 2 would have to purchase a sputter coating apparatus such as that shown in

Figure 3 having sufficient zones and targets to accommodate the Figure 2 article.

Unfortunately, many of these zones and targets are wasted and not utilized when only the

article of Figure 1 is manufactured (i.e., certain zones and/or targets would likely be

inoperative during manufacture of the Figure 1 article). In other words, a significant

portion of the coating apparatus may not be used when certain coated articles having a

small number of layer(s) are being manufactured. Yet another problem is that when it is desired to upgrade a particular sputter coating apparatus, the line (i.e., all zones 1-6) must

be shut down.

In view of the above, it will be appreciated by those skilled in the art that there

exist a need for a sputter coating apparatus which can more efficiently manufacture

sputter coated articles of different types without wasting significant resources (e.g., zones

and/or targets). There also exists a need in the art for a corresponding method.

It is a purpose of different embodiments of this invention to fulfill any and/or all

of the above described needs in the art, and/or other needs which will become apparent to

the skilled artisan once given the following disclosure.

An object of this invention is to provide a sputter coating apparatus capable of

more efficiently depositing different types of sputter coated layer systems.

Another object of this invention is to provide a sputter coating apparatus including

first and second sputter coating lines that are selectively coupleable to one another via a

transition zone. Each of the first and second sputter coating lines may be independently

utilized to deposit particular coating systems on a substrate. However, when it is desired

to deposit a coating system having more than a predetermined number of layers (e.g., a

layer system having more layers than either of the lines is capable for depositing), the

transition zone couples the two lines together thereby enabling an incompleted sputter coated article leaving the first sputter coating line to be routed to the second sputter

coating line so that additional layer(s) may be sputter coated thereon. Thus, the two

sputter coating lines may be used either independently (e.g., run in parallel to one

another), or alternatively may be used in conjunction with one another (e.g., run in series

with one another).

Yet another object of this invention is to fulfill any and/or all of the aforesaid

objects and/or needs.

Generally speaking, certain embodiments of this invention fulfill one or more of

the above-listed needs and/or objects by providing a sputter coating apparatus

comprising:

a first sputter coating line including a plurality of zones and a plurality of targets;

a second sputter coating line including a plurality of zones and a plurality of

targets; and

a transition zone coupled to the first sputter coating line and the second sputter

coating line, said transition zone selectively coupling the first and second sputter coating

lines to one another so that when not coupled to one another the first and second lines can

run in parallel with one another and when coupled to one another by the transition zone

the first and second lines run in series with one another. Certain other embodiments of this invention fulfill one or more of the above-listed

needs and/or objects by providing a method of sputter coating a glass substrate, the

method comprising the steps of:

providing the glass substrate;

causing the glass substrate to pass through a first sputter coating line including a

plurality of zones and a plurality of targets so that at least first and second layers are

sputtered onto the first substrate in the first sputter coating line;

determining whether it is desired to provide additional layers on the glass

substrate, and if so then upon the glass substrate exiting the first sputter coating line

causing the glass substrate to be forwarded to a second sputter coating hne including a

plurality of zones and a plurality of targets; and

causing the glass substrate to pass through the second sputter coating line so that at

least third and fourth layers are sputtered onto the first substrate over the first and second

layers in the second sputter coating line.

IN THE DRAWINGS

Figure 1 is sectional view of a conventional sputter coated article.

Figure 2 is a sectional view of another sputter coated article.

Figure 3 is a schematic diagram of a conventional sputter coating apparatus. Figure 4 is a schematic functional diagram of a sputter coating apparatus

according to an embodiment of this invention, the sputter coating apparatus including two

sputter coating lines capable of running in parallel with one another or alternatively in

series with one another.

Figure 5 is a schematic functional diagram of either the sputter coating hne "A"

and/or the sputter coating line "B" of Figure 4.

Figure 6 is a schematic functional diagram of the adjustable transition zone of the

Figure 4 sputter coating apparatus.

Figure 7 is a flowchart illustrating certain steps taken during the course of carrying

out a particular embodiment of this invention.

Figure 8 is a schematic functional diagram of a transition zone for selectively

coupling ends of first and second sputter coating lines according to another embodiment

of this invention.

Figure 9 is a schematic functional diagram of an apparatus according to another

embodiment of this invention. DETAILED DESCRIPTIONS OF CERTAIN EMBODIMENTS OF THIS

INVENTION

Referring now more particularly to the accompanying drawings in which like

reference numerals indicate like parts throughout the several views.

Figure 4 is a schematic functional diagram of a sputter coating apparatus

according to an embodiment of this invention. The sputter coating apparatus of Figure 4

includes a first sputter coating line 58, a second sputter coater line 59, and adjustable

transition zone 60 coupling respective ends of the two sputter coating lines. Figure 5 is a

schematic functional diagram of both the first sputter coater line 58 and the second

sputter coater line 59 of Figure 4. As can be seen, each of the lines 58 and 59 have three

zones (zones 1-3) in this exemplary embodiment and include targets 21-35. Transition

zone 60 is provided at the end of each sputter coating line 58, 59 so as to enable the lines

to be selectively coupled to one another when desired. In other words, the two sputter

coating lines 58, 59 may be used independently from one another so as to operate in

parallel to one another when each hne is depositing an entire coating system on a

substrate independent of the other line. Alternatively, when it is desired to form a larger

coating system having more layers than one of lines 58, 59 is capable of depositing on a

substrate, then transition zone is capable of coupling hnes 58 and 59 to one another so

that the lines operate in series with one another in forming the larger coating system on

the substrate. Referring to Figure 4-5, exemplary uses of this embodiment are described as

follows. Consider a situation where one desires to manufacture significant quantities of

sputter coated articles as shown in Figure 1. In such a case, each of sputter coating lines

58 and 59 is set up so that targets 21-26 are silicon (Si) targets in a nitrogen atmosphere

of zone 1, targets 27 and 29 are nickel and/or nickel-chrome targets in an argon (Ar)

atmosphere of zone 2, target 28 is a silver (Ag) target in the argon atmosphere of zone 2,

and targets 30-35 are silicon (Si) targets in a nitrogen atmosphere of zone 3. Thus, in

each coating line 58, 59, zones 1 and 3 deposit the respective silicon nitrides layer 2 and

6, while layers 3-5 are deposited in zone 2. In other words, coating line 58 functions to

form the layer system of the Fig. 1 coated article, as does coating line 59. The two lines

may work on parallel with one another in an independent manner. When operating in

parallel with one another, hnes 61 and 62 in Figure 4 illustrate respective paths of

substrates being coated as they pass through the respective sputter coating lines and

transition zone 60, so that Fig. 1 coated articles formed in each of lines 58 and 59 exit

transition zone 60 as illustrated.

Accordingly, it can be seen that the sputter coating apparatus of Figures 4-5

enables coated articles as shown in Figure 1 to be manufactured without the requirement

for a significant number of inoperative zones and/or chambers. In other words,

significant or substantial portions of both sputter coating hne 58 and sputter coating line 59 are in operation at all times during the manufacture of Figure 1 coated articles.

Significant resources are not being wasted. Alternatively, in other embodiments of this

invention it is possible to run sputter coating lines 58 and 59 in parallel with one another

while line 58 is forming a first type of layer system (e.g., Si₃N₄/NiCr/Ag/NiCr/Si₃N₄)

and line 59 is forming a second type of layer system (e.g., SnO/Ag/SnO) on respective

substrates 1.

However, consider the scenario where one desires to utilize the Figure 4-5 sputter

coating apparatus to manufacture coated articles as shown in Figure 2 (e.g., a dual silver

layer system). In such a case, the first sputter coating line 58 is set up to deposit layers 2-

5 and a lower portion of layer 6a on substrate 1. Upon leaving the first sputter coating

line 58, the incomplete coated article enters transition zone 60 which directs the

incomplete coated article to an end of the second sputter coating line 59 as shown by

dotted line 63 in Figure 4. Reversible sputter coating line 59 is set up so as to deposit the

remainder of layers 6a as well as layers 7-10 on substrate 1. The resulting Figure 2

coated article exits the second coating line 59 at the other end 67 thereof as shown in

Figure 4. Thus, the two coating lines 58 and 59 work in series with one another as a first

portion of the coating system is deposited by sputter coating line 58 and a second

subsequent portion of the coating system is deposited by sputter coating line 59.

Adjustable transition zone 60 selectively couples the output end of first coating Hne 58 to an input output end of coating line 59. Thus, layer 2 is deposited in zone 1 of Hne 58,

layers 3-5 in zone 2 of line 58, the first half of layer 6a in zone 3 of line 58, the second

half of layer 6a in zone 3 of Hne 59, layers 7-9 in zone 2 of line 59, and layer 10 in zone 1

of sputter coating line 59 (e.g., zones 1-3 of line 58 may be set up in the same manner as

zone 1-3 of line 59 so that the incomplete coated article exiting line 58 may enter the

second sputter coating Hne 59 from either end thereof as a function of convenience).

As can be seen by the different substrate paths illustrated by reference numerals 62

and 63 in Figure 4, sputter coating line 59 is reversible in that substrates may pass

therethrough in either direction depending upon the functionality of transition zone 60

(i.e., whether transition zone 60 is causing coated articles exiting Hnes 58, 59 to pass

straight through as shown by reference numerals 61 and 62 to exit the overall coating

apparatus, or whether transition zone 60 is directing incomplete coated articles exiting

coating line 58 to an input of coating line 59 as shown by reference numeral 63).

Figure 6 is a functional top view diagram of transition zone 60 which selectively

couples respective ends of sputter coating lines 58 and 59 according to the Figure 4-5

embodiment of this invention. As can be seen, transition zone 60 includes conveyor 70

coupled to an output end of sputter coating line 58, rotatable conveyor platform 71

including conveyor 75 which may be selectively deployable in different positions,

conveyor 72 provided between a potential output of conveyor 75 and conveyor 74, conveyor 73 provided between another potential output of conveyor 75 and an output of

the overall sputter coating apparatus, and reversible conveyor 74 provided at an

input/output of sputter coating line 59. End 83 of line 59 can function as an output end

when lines 58 and 59 are operating in parallel with one another, and as an input end of

Hne 59 when Hnes 58 and 59 are operating in series with one another. Platform 71 and

conveyor 75 thereon are selectively deployable in different positions in order to

selectively couple output end 81 of sputter coating line 58 to an input/output 83 end of

sputter coating line 59 when desired.

When sputter coating Hnes 58 and 59 are not coupled together by transition zone

60, platform 71 and conveyor 75 are in the position illustrated in Figure 6 by solid lines

so that lines 58 and 59 are operating in parallel with one another. In this case, for

example, Figure 1 coated articles may be exiting sputter coating line 58 at output 81 and

are being conveyed to the overall output of the apparatus by conveyor 70 which dumps

articles onto conveyor 75 which dumps them onto conveyor 73. Likewise, Figure 1

coated articles may simultaneously be exiting output 83 of sputter coating Hne 59, and

being forwarded to the output of the overall apparatus by conveyor 74 as shown by the

solid lines illustrated in conveyor 74.

When it is desired make a larger coating system (e.g., the layer system of Fig. 2)

on a substrate having more layers than either of lines 58, 59 is capable of forming, then the direction of conveyor 74 may be reversed and platform 71 may be rotated 85 in order

to selectively couple output 81 of sputter coating Hne 58 to an input end 83 of sputter

coating line 59. See Fig. 6 in this regard. Rotation 85 moves conveyor 75 from the sohd

line position to the dotted line position shown in Figure 6. Accordingly, an incomplete

coated article exits coating line 58 at 81 onto conveyor 70 (e.g., when making the Fig. 2

layer system, the coated article at this point may include layers 2-5 and half of layer 6a on

substrate 1). The incomplete article is dumped onto conveyor 75 by conveyor 70. Once

on conveyor 75, platform 71 rotates 85 until conveyor 75 is in the position illustrated in

dotted lines in Figure 6. Conveyor 75 then dumps the incomplete article onto conveyor

72, which in turn dumps the incomplete coated article onto conveyor 74 which is

traveling in direction 86 (i.e., its reverse direction). Conveyor 74 then conveys the

incomplete coated article to input 83 of coating line 59 so that the additional layer(s) can

be sputter coated thereon (e.g., the rest of layer 6a and layers 7-10 may be deposited on

substrate 1 in line 59).

Once an incomplete coated article exiting line 58 has been forwarded to conveyor

72 by conveyor 75, platform 71 may rotate back to the solid line position shown in Figure

6 in order to accept another complete or incomplete coated article from output 81 of

coating line 59. Whether or not additional layer(s) are to be deposited on newly received

article(s) determines whether or not platform 71 causes an article received thereon to be forwarded to conveyor 72 or conveyor 73. Likewise, the direction of conveyor 74 is

determined by whether or not end 83 of coating line 59 is functioning as an output or an

input (end 83 functions as an input when receiving incomplete coated articles from

conveyor 72 and platform 71).

Figure 7 is a flowchart illustrating certain steps carried out and in accordance with

an embodiment of this invention. Referring to Figures 4-7, and especially Figure 7, a

substrate 1 (e.g., soda-lime-silica glass substrate) is first provided (step 90). Substrate 1

is then conveyed through a first sputter coating line 58 so that a pluraHty of layer(s) can

be deposited thereon (step 91) (e.g., layers 2-6 of Fig. 1, or layers 2-6a of Fig. 2). The

coated article including a plurality of sputter coated layers on substrate 1 then exits the

first sputter coating line 58 and enters transition zone 60 (step 92). A determination is

then made by controller 101 as to whether or not the desired layer system has been

completed or whether additional layers need to be sputter-coated thereon (step 93). This

determination by controller 101 may be based upon input from a keyboard, or any other

suitable means such as a programmed listing of articles to be made by the system. If it is

determined that the layering system has been completed and no additional layers need be

sputtered thereon, then the sputter coated article exits the transition zone (step 94) and the

overall sputter coating apparatus (step 95) when conveyor 75 is in the position shown in

Figure 6 by solid lines. However, when controller 101 (which may access and utilize programs stored in memory 103) determines in step 93 that the layering system is

incomplete and requires additional layer(s), then controller 101 causes motor 105 to

rotate platform/disk 71 so as to move conveyor 75 and the coated article thereon to the

position 90 shown in dotted lines in Figure 6. Then, the coated article is conveyed to end

83 of sputter coating line 59 via conveyor 72 and conveyor 74 (step 96). The coated

article enters sputter coating line 59 so that additional layers (e.g., the remainder of layer

6a and layers 7-10) can be sputtered thereon (step 97). After passing through sputter

coating Hne 59, the article exits the coating apparatus/system at 67 (step 95).

It is noted that transition zone 60 is preferably maintained in a given atmosphere

(e.g., argon atmosphere) at a low pressure similar to the pressures in zones 1-3 (e.g., from

about 1.0 to 3.0 x 10^"J Torr) according to certain -embodiments of this invention, so as to

reduce the potential for contamination of coated articles when traveHng between coating

lines 58 and 59.

Figure 8 is a functional schematic diagram of a transition zone for selectively

coupling sputter coating line 58 and sputter coating line 59 according to another

embodiment of this invention. This embodiment is similar to that of Figs. 4-6, except

that the two lines 58 and 59 are staggered relative to one another so that second line 59

need not have a reversible conveyor. In other words, in the Fig. 8 embodiment end 83 of second sputter coating line 59 is an input end of line 59 regardless of whether Hnes 58

and 59 are operating in parallel or in series.

An exemplary operation of the Fig. 8 embodiment is as follows. A substrate 1 is

fed into and passes through first sputter coating Hne 58 including targets 21-35 (see Fig.

5) so that layer 2 is deposited in zone 1, layers 3-5 in zone 2, and layer 6 or half of layer

6a in zone 3. The article including these layers exits the first sputter coating line 58 via

conveyor 70. The article is fed onto conveyor 75. It is determined (either at this time or

in advance) whether additional layer(s) have to be deposited onto the article. If not, then

platform 71 remains in the position shown in fig. 8 and conveyor 75 forwards the article

with complete layering system thereon to conveyor 73 which takes the coated article out

of transition zone 60 and out of the overall sputter coating apparatus. However, if it is

desired to provide additional layer(s) on the article, then platform 71 rotates as discussed

above until conveyor 75 is in position 90 shown in dotted lines in Fig. 8. This enables

conveyor 75 to forward the article to conveyor 92 which need not be reversible in all

embodiments. Once on conveyor 92, the article enters second sputter coating line 59

including zones 1-3 and respective targets (e.g., see Fig. 5). In second line 59, the

remainder of layer 6a is sputtered on in zone 1, layers 7-9 are sputtered on in zone 2, and

layer 10 is sputtered on in zone 3 of line 59. Alternatively, lines 58 and 59 may operate in parallel with one another so that each can form the layering system of Fig. 1 on

respective substrates 1 at the same time.

It is also noted that the coated articles of Figures 1 and 2 are provided for purposes

of example only and are not intended to be limiting. The sputter coating apparatus of

Figures 4-6 and 8, and method of Figure 7, may be utilized to manufacture any type of

sputter coated article according to different embodiments of this invention. Coating lines

58 and 59 may be operated in the same direction in parallel with one another as shown by

paths 61 and 62 when the two lines are not coupled to one another. However, when it is

desired to utilize both lines 58 and 59 to manufacture a single coated article, transition

zone 60 functions to selectively couple an output end of a first line to an input end of a

second line so that the lines 58 and 59 run in series with one another. The second line

may be reversible in nature so that its input end may also function as an output end when

it is operating in series with the first line (e.g., path 62). Moreover, the instant invention

need not be limited to sputter coating apparatuses, and may be used in conjunction with

other types of layer deposition systems.

Figure 9 is a functional top view diagram of transition zone or chamber 101 which

selectively couples respective ends or portions of sputter coating lines 58 and 59

according to the Figure 4-5 embodiment of this invention. As illustrated, each coating

line includes a transfer chamber 102, a buffer chamber 103, and an exit chamber 104. Transfer zone or chamber 101 in this embodiment is located between the buffer chambers

103 of the two sputter coating lines. As illustrated, transfer in chamber/zone 101 is

performed by enabling coated glass to be moved in the chamber/zone 101 in a direction

perpendicular to the line directions of Hnes 58, 59. Accordingly, buffer chambers 103

also are capable of causing coated glass to be transferred in both the (a) line directions of

Hnes 58, 59 (i.e., the same direction the glass is transported during sputter coating in the

line), and (b) directions transverse to the Hne directions of lines 58, 59. Chambers 101

and 103 may be approximately the same size as one another.

Transition zone/chamber 101 preferably has a gate and/or valve 105 at each end

thereof, such gates/valves being selectively openable/closeable in order to allow coated

glass to enter/leave the chamber 101 and thus be transferred from one coating line to the

other coating line.

Transition zone/chamber 101 may include a conveyor (e.g., reversible conveyor)

coupled to the buffer chamber 103 of coating line 58 and the buffer chamber 103 of line

59 so as to enable coated glass to be transferred from one coating line to the other.

Controller 106, using program(s) stored in memory 107, selectively controls gates 105

and a conveyor of the chamber 101 so as to enable such transfers when desired.

Exit chambers 104 can function as output ends of the coating lines when lines 58

and 59 are operating in parallel with one another (i.e., where substrates proceed through the coating lines along paths 110 shown in dotted lines). Thus, when sputter coating lines

58 and 59 are not coupled together by transition zone 101, the coating lines 58 and 59

are operating in parallel with one another so that substrates proceeding therethrough

move along paths 110 (dotted lines) and Figure 1 coated articles may be formed and

caused to exit sputter coating lines 58 and 59 at exit chambers 104.

Still referring to Fig. 9, when it is desired make a larger coating system (e.g., the

layer system of Fig. 2) on a substrate having more layers than either of lines 58, 59 is

capable of forming, then transition zone/chamber 101 may be used (including opening of

gates/valves 105) to selectively couple the buffer chambers 103 of the respective Hnes 58,

59 thereby coupling sputter coating line 58 to sputter coating line 59. Path 111 is now

used in the Fig. 9 embodiment. Accordingly, an incomplete coated article exits coating

line 58 at 81 and moves into the buffer chamber 103 of Hne 58. From this buffer, the

incomplete article is caused to change directions (see path 111 in Fig. 9) and proceed into

transition zone 101 (e.g., via a conveyor) and then out of zone 101 and into buffer 103 of

the other sputter coating line 59 (e.g., when making the Fig. 2 layer system, the coated

article at this point may include layers 2-5 and half of layer 6a on substrate 1). The

incomplete article is then dumped on line 59 (which is in reverse) and enters the Hne at

83 so that the additional layer(s) can be sputter coated thereon (e.g., the rest of layer 6a

and layers 7-10 may be deposited on substrate 1 in line 59). Then, what had been an input end of line 59 becomes an output end of line 59 when Fig. 2 coated articles are

made in accordance with the Fig. 9 embodiment of this invention.

Still referring to Fig. 9, Fig. 1 coated articles may be produced using one or both

lines 58, 59 for several days at a time (or alternatively, for only several hours at a time).

Then, gates 105 may be opened (manually, or automatically via controller) so that Fig. 2

coated articles can be produced using lines 58-59 as described above. Thus, there is no

need to make a determination in the controller after each glass sheet runs through whether

the next sheet will go to the other line or not (however, this may in fact be done in certain

embodiments).

Once given the above disclosure, many other features, modifications, and

improvements will become apparent to the skilled artisan. Such other features,

modifications, and improvements are therefore considered to be a part- of this invention,

the scope of which is to be determined by the following claims.

Claims

WHAT IS CLAIMED IS:

1. A sputter coating apparatus comprising:

a first sputter coating Hne including a plurality of zones and a plurality of

targets;

a second sputter coating Hne including a plurahty of zones and a plurality

of targets; and

a transition chamber or zone including first and second gates or valves

which may be selectively opened, said transition chamber being selectively coupleable to

the first sputter coating line and the second sputter coating line,

said transition chamber selectively coupling the first and second sputter

coating lines to one another so that when not coupled to one another the first and second

lines can run in parallel with one another and when coupled to one another by the

transition chamber the first and second Hnes run in series with one another.

2. The sputter coating apparatus of claim 1, wherein said transition chamber is

maintained at a pressure less than atmospheric pressure.

3. The sputter coating apparatus of claim 2, wherein said transition chamber is

maintained at a pressure of from about 1.0 to 3.0 x 10^"'3 Torr.

4. The sputter coating apparatus of claim 1, wherein said second sputter coating

Hne is reversible so that a first end of said second sputter coating Hne is an output end of

said second sputter coating line when the first and second sputter coating lines are

running in parallel to one another and said first end of said second sputter coating line is

an input end of said second sputter coating line when said first and second sputter coating

lines are running in series with one another.

5. The sputter coating apparatus of claim 1, wherein said transition chamber

comprises a conveyor that may be selectively moves between first and second positions

depending upon whether said first and second sputter coating lines are running in parallel

or in series with one another.

6. A method of sputter coating a glass substrate, the method comprising:

providing the glass substrate;

sputtered onto the first substrate in the first sputter coating Hne;

upon the glass substrate exiting the first sputter coating line, forwarding the glass

substrate to a second sputter coating line including a plurality of zones and a plurality of

targets; and causing the glass substrate to pass through the second sputter coating Hne so that at

layers in- the second sputter coating Hne.

7. A method of operating a sputter coating apparatus, the method comprising:

providing first and second sputter coating lines selectively coupleable to one

another;

causing a substrate to pass through the first sputter coating line so that at least first

and second layers are sputtered onto the substrate in the first sputter coating line;

determining whether additional layer(s) is/are to be sputtered onto the substrate;

based upon a result of said determining step, determining whether to forward the

substrate to the second sputter coating line or to an apparatus exit area.