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WO2001030562A1 - Procede et dispositif pour impression en relief et graphique, et produit correspondant - Google Patents

Procede et dispositif pour impression en relief et graphique, et produit correspondant Download PDF

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Publication number
WO2001030562A1
WO2001030562A1 PCT/US2000/029939 US0029939W WO0130562A1 WO 2001030562 A1 WO2001030562 A1 WO 2001030562A1 US 0029939 W US0029939 W US 0029939W WO 0130562 A1 WO0130562 A1 WO 0130562A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
embossing
station
path
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2000/029939
Other languages
English (en)
Inventor
James A. Jordan
Joseph S. Kucherovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universal Packaging Corp
Original Assignee
Universal Packaging Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universal Packaging Corp filed Critical Universal Packaging Corp
Priority to AU14461/01A priority Critical patent/AU1446101A/en
Publication of WO2001030562A1 publication Critical patent/WO2001030562A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B31MAKING ARTICLES OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER; WORKING PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31FMECHANICAL WORKING OR DEFORMATION OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31F1/00Mechanical deformation without removing material, e.g. in combination with laminating
    • B31F1/07Embossing, i.e. producing impressions formed by locally deep-drawing, e.g. using rolls provided with complementary profiles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B31MAKING ARTICLES OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER; WORKING PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31FMECHANICAL WORKING OR DEFORMATION OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31F2201/00Mechanical deformation of paper or cardboard without removing material
    • B31F2201/07Embossing
    • B31F2201/0707Embossing by tools working continuously
    • B31F2201/0715The tools being rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B31MAKING ARTICLES OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER; WORKING PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31FMECHANICAL WORKING OR DEFORMATION OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31F2201/00Mechanical deformation of paper or cardboard without removing material
    • B31F2201/07Embossing
    • B31F2201/0784Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B31MAKING ARTICLES OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER; WORKING PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31FMECHANICAL WORKING OR DEFORMATION OF PAPER, CARDBOARD OR MATERIAL WORKED IN A MANNER ANALOGOUS TO PAPER
    • B31F2201/00Mechanical deformation of paper or cardboard without removing material
    • B31F2201/07Embossing
    • B31F2201/0784Auxiliary operations
    • B31F2201/0792Printing

Definitions

  • the invention to pertains to a method and apparatus for producing an image or functional relief on a flat surface by applying a liquid coating to the surface in a predefined area and subsequently solidifying the coating while it is in contact with an embossing tool.
  • a relief on a substrate such as a web material
  • known methods of producing a relief on a substrate use heat and pressure to mechanically deform the surface of the material.
  • An embossing tool, or shim can be mounted on the outside surface of a heated roller. A web material may then be fed between the heated roller and an opposing roller. Under these conditions of heat and pressure, the shim may engage the material and mechanically deforms it to provide the relief. The relief may be produced across the full width of the web.
  • the production process itself can be relatively expensive for these known methods. High energy levels can be required to create the conditions necessary to deform the web material, resulting in higher production costs. Also, because the shim produces a relief across the entire web surface, additional processing may be needed where the desired product has a relief over a limited area.
  • One type of additional processing can be the application of ink or lacquer to the web to mask the relief, leaving only a portion of the relief visible. The processed material that is covered is essentially wasted, leading to higher material costs.
  • the present invention provides a system for producing a combination of a relief and graphics on a flat surface.
  • the system has at least one print station having a first substrate path, and at least one embossing station having a second substrate path.
  • the second substrate path cooperates with the first substrate path.
  • the at least one embossing station has a coating device, an embossing device, and a curing device.
  • the coating device is at a first location along the second substrate path.
  • the embossing device is at a second location along the along the second substrate path.
  • the second location is spaced from the first location.
  • the curing device is at a third location along the second substrate path.
  • the present invention also provides an embossing station for imparting a relief onto a substrate.
  • the embossing station has a substrate path, a coating device at a first location along the substrate path, an embossing device at a second location spaced from the first location along the substrate path, and a curing device at a third location along the substrate path.
  • the second and third locations can be located on either opposite sides of the second substrate path or on a common side of the second substrate path. Curing can be performed by an actinic radiation source such as an ultraviolet light source or an electron beam source.
  • the present invention yet also provides a method of providing a relief on a substrate. The method comprises providing a substrate, providing an embossing station, and feeding the substrate through the embossing station.
  • the embossing station includes a coating portion adapted to coat the substrate with a liquid resin over a predefined area, an embossing portion adapted to form a light diffraction pattern in the liquid resin over the predefined area, and a curing portion adapted to cure the liquid resin on the substrate.
  • the substrate engages the coating portion and the coating portion coats the substrate with the liquid resin over the predefined area.
  • the substrate engages the embossing portion and the embossing portion forms the relief light diffraction pattern in the liquid resin over the predefined area.
  • the curing portion cures the liquid resin on the substrate.
  • the present invention further provides a method of creating a product with an optical effect.
  • the method comprises coating a substrate with a resin at a first location along a path and embossing a light diffraction pattern in the resin at a second location along the path. The second location is different from the first location.
  • the present invention yet further provides a product that comprises a shrinkable substrate and a cured resin applied to the shrinkable substrate.
  • the cured resin can be a radiation cured liquid resin with at least one surface relief diffraction pattern, such as hologram.
  • Figure 1 is a schematic illustration of a first embodiment of a system.
  • Figure 2 is a schematic illustration of a second embodiment of a system.
  • Figure 3 is a schematic illustration is a first embodiment of an embossing station.
  • Figure 4 is a schematic illustration is a second embodiment of an embossing station.
  • Figure 5 is a schematic illustration is a third embodiment of an embossing station.
  • Figure 6 is a plan view of a product produced by the claimed methods and apparatuses.
  • Figure 1 shows a schematic layout of an embodiment of a system 10 for producing a relief on a surface of a web or substrate 20, which can be a supported or unsupported.
  • the substrate 20 may comprise any flexible material, including paper, film, foil, or combinations thereof.
  • the system 10 has a print station 12 having a first substrate path 12a, and an embossing station 14 having a second substrate path 14a.
  • the second substrate path 14a of the embossing station 14 cooperates with the first substrate path 12a of the print station 12 as schematically illustrated with broken lines in Figure 1.
  • the substrate paths 12a, 14a have been schematically indicated as following a linear track, the paths 12a, 14a may follow a track having any combination of linear and arcuate portions.
  • the print station 12 imparts an image on the substrate 20 and the embossing station 14 imparts a relief on the substrate 20.
  • the print station 12 can be a rotary screen printer, a gravure printer, a flexo graph printer, an offset printer, or a letterpress printer.
  • the system 10 can further include a feeder, including at least one roller, located along at least one of the first and second substrate paths 12a, 14a.
  • the system 10 can also include a plurality of print stations 12 (two are shown).
  • the first print station 12' is adapted to impart a first image on a substrate 20, and the second print station 12" is adapted to impart a second image on the substrate 20.
  • An embossing station 14 is disposed following the first and second print stations 12',12".
  • a metalizing station 16, which applies a reflective or absorbent coating to the substrate 20, can be disposed following the embossing station 14.
  • a drying oven 13 can be included immediately following the second print station 12" for drying the substrate 20 prior to embossing, and the system 10 may further include a cooling station 18 operatively associated with the embossing station 14.
  • a first embodiment of the embossing station 14 comprises a coating device 30, an embossing device 40, a curing device 60, and the appropriate mechanical rollers and fixtures for feeding the substrate 20 through the embossing station 14.
  • the embossing station 14 has a substrate path 14a, a coating device 30 at a first location along the substrate path 14a, an embossing device 40 at a second location spaced from the first location along the substrate path 14a, and a curing device 60 at a third location along the substrate path 14a.
  • the coating device 30 supplies a liquid resin over a predefined area of the substrate 20, the embossing device 40 forms a surface relief in the liquid resin at the predefined area of the subsfrate 20, and the curing device 60 solidifies the liquid resin on the substrate 20.
  • the second and third locations are shown on opposite sides of the subsfrate path 14a.
  • the embossing device 40 can be disposed along the path 14a between two or more rollers 54,56. At least one of the rollers 54,56 can be adjustably positioned with respect to at least one of the first and second paths. As shown, the first and second rollers 54,56 can be disposed within the embossing station 14.
  • the embossing device 40 can be a member 42 with a surface 44 having an embossing pattern.
  • the member 42 can be a cylinder with a circumferential surface 44 having the embossing pattern.
  • the member 42 can be constructed of substantially translucent material, such as quartz.
  • the coating device 30 supplies a liquid resin over a predefined area of the substrate 20, the embossing device 40 forms a surface relief pattern in the liquid resin at the predefined area of the substrate 20, and the curing device 60 solidifies the liquid resin on the substrate 20.
  • a metallizing station 16 can provide a metal layer to the substrate 20.
  • a first type of embossing device 40 can include a flat sheet that is wrapped around the outer surface of a cylindrical member 42 to form a continuous surface 44. The flat sheet can be adhered to the cylindrical member 42 using standard 0.15" flexo "sticky back.” The technique of forming the flat sheet involves first inscribing a photo-resist material with a laser to form a photographic negative of the desired relief. The photo-resist is then coated with a nickel alloy, which retains the photographic positive of the relief image. This nickel alloy sheet is removed from the photo-resist and serves as the flat sheet.
  • the embossing device 40 can be formed as a cylindrical member 42 having an embossing pattern that is formed directly on its circumferential surface 44. Different patterns can be formed across the longitudinal dimension of the embossing device 40.
  • a shaft 48 of the cylindrical member 42 can be mounted in bearing blocks (not shown) in a manner that allows the cylindrical member 42 to rotate.
  • the fluid cooling system 18 can be disposed in the periphery of the cylindrical member 42.
  • water can enter the cooling system 50 through rotary unions (not shown) at either end of the cylindrical member 42.
  • the actinic radiation source 60 e.g., an actinic radiation unit, is preferably an ultraviolet (UV) light extending parallel to the axis of the cylindrical member 42.
  • the source 60 can be shielded by baffle 62 so that the substrate 20 is exposed to the light only at a point of contact between the substrate 20 and the embossing device 40.
  • the baffle 62 also provides automatic dampening of the substrate 20 on startup and shutdown of the embossing station 14. In operation, the substrate 20 enters the embossing station 14 and passes around the first roller 54, the embossing device 40, and the second roller 56 so that the substrate 20 appropriately contacts the cylindrical member 42.
  • the position of the rollers 54,56 can be adjustable so that the angle and degree of wrap between the substrate 20 and the cylindrical member 42 may be varied.
  • a coated side 22 of the substrate 20 is in contact with the cylindrical member 42.
  • the substrate 20 is exposed to UV radiation from the source 60 over the limited contact area and the coating is cured.
  • the substrate 20 then passes around the second roller 56 and out of the embossing station 14.
  • the cylindrical member 42 and curing device 60 are located on opposite sides of the subsfrate 20, i.e., the cylindrical member 42 is located on the coated side 22 of the substrate 20, while the UV light source 60 is located on the opposite side of the substrate 20. Therefore, this embodiment is ideally for use with transparent substrate materials, because the UV radiation must pass through the substrate 20 to cure the coating. The UV radiation may not pass through opaque materials, and therefore no curing would take place.
  • Figure 4 shows a second embodiment of an embossing station 14'.
  • the embossing station 14' comprises the embossing device 40, and the appropriate mechanical rollers 54,56 and fixtures for moving the substrate through the station 14', as in the first embodiment.
  • the substrate 20 is exposed to actinic radiation over a limited contact area as the coated side 22 of the substrate 20 contacts the cylindrical member 42.
  • the actinic radiation source 60' comprises an electron beam radiation source.
  • the curing device 60' is not located on the coated side 22 of the substrate 20.
  • electron beam radiation can pass through opaque materials and cure an embossed coating.
  • This second embodiment therefore, is not limited to clear materials and may be used on any substrate material.
  • FIG. 5 shows the third embodiment of an embossing station 14".
  • the embossing station 14" of this embodiment comprises an embossing device 40', an actinic radiation unit 60", and the appropriate mechanical rollers 54,56 and fixtures for moving the substrate 20 through the station 14'.
  • This embodiment presents a different design and arrangement of the elements wherein the cylindrical member 42' and curing device 60" are both located on the print side 22 of the substrate 20.
  • the cylindrical member 42' comprises a transparent tubular member with the embossing pattern formed on its exterior surface.
  • This transparent cylindrical member 42' may be made of glass, but in a preferred embodiment comprises quartz, which possesses improved heat stability and transparency to UV radiation.
  • the cylindrical member 42' is arranged as a roller that is supported with the appropriate bearing blocks (not shown).
  • the actinic radiation source 60' in this embodiment comprises a tubular UV light arranged concentrically inside the transparent cylindrical member 42'.
  • a baffle 62' shields the light so that, when the substrate 20 is passed through the embossing station 14", only that portion of the substrate 20 which is in direct contact with the cylindrical member 42' is exposed.
  • a cooling system 18, which is employed to dissipate the heat in the cylindrical member 42', comprises rotary unions (not shown) which allow water to enter, and channels (not shown) which circulate water around the periphery of the cylindrical member 42'.
  • the embossing station 14" of this embodiment can operate on any substrate material because the exposure to the curing device 60' is located on the inside of the transparent cylindrical member 42, i.e., on the print side 22 of the substrate 20.
  • the substrate 20 passes around the first roller 54, then contacts the cylindrical member 42' with the coated side 22 towards the cylindrical member 42'.
  • the UV light 60' irradiates only that portion of the substrate 20 that is in contact with the cylindrical member 42' and cures the radiation curable coating.
  • the substrate 20 then passes the second roller 56 and leaves the embossing station 14".
  • Transparent or opaque materials may be processed in the embossing station 14" because the UV radiation does not have to pass through the substrate 20. Rather, the UV source is a ⁇ anged inside the transparent cylindrical member 42' and i ⁇ adiates the substrate 20 from within the cylindrical member 42' as the substrate 20 passes.
  • the disclosed embodiments, their combinations, and the equivalents thereof provide a method of producing a relief on a substrate.
  • the method involves providing a substrate and an embossing station.
  • the embossing station includes a coating portion adapted to coat the substrate with a liquid resin over a predefined area, an embossing portion adapted to form a light diffraction pattern in the liquid resin over the predefined area, and a curing portion adapted to cure the liquid resin on the substrate.
  • the substrate is fed through the embossing station.
  • the coating portion coats the substrate with the liquid resin over the predefined area.
  • the method further includes providing a printing station and feeding the subsfrate through the printing station, the printing station imparting an image onto the subsfrate.
  • the step of feeding the substrate through the printing station can be performed prior to feeding the substrate through the embossing station.
  • a feeder can be provided for supplying the substrate into engagement with the embossing portion.
  • a feeder can be provided for withdrawing the subsfrate from the embossing portion.
  • the substrate can be transparent or opaque.
  • the curing portion of the embossing station can be disposed in the embossing portion.
  • the embossing station can further include providing a cooling portion operatively connected to the embossing portion for cooling the embossing portion.
  • the method can further include providing a metallizing station, the metallizing station provides a metallizing layer on the relief light diffraction pattern.
  • the curing portion can include providing an actinic radiation source, such as an ultraviolet light source or an electron beam source.
  • the disclosed embodiments, their combinations, and the equivalents thereof also provide a method of creating a product with an optical effect by coating a substrate with a resin at a first location along a path and embossing a light diffraction pattern in the resin at a second, different location along the path.
  • the method further includes printing a graphic image on the substrate, for example applying ink to the substrate.
  • the printing can be performed in a variety of ways, including rotary screen printing, gravure printing, flexography printing, offset printing, and letterless printing.
  • the printing can include applying a first graphic image and applying a second graphic image to the substrate. The printing can occur on a predetermined area of the subsfrate and coating can also occur on the predetermined area.
  • the substrate can be composed of either paper, film, or foil.
  • the method can also be performed by solidifying a liquid resin on the substrate, such as curing a resin with actinic radiation from either an ultraviolet light or an electron beam source.
  • the disclosed embodiments, their combinations, and the equivalents thereof also provide a product including a shrinkable substrate and a cured resin applied to the shrinkable substrate.
  • the cured resin can be a radiation cured liquid resin with at least one surface relief diffraction pattern, such as a hologram.
  • the product may also further include at least one graphic image, applied in ink, on the shrinkable substrate.
  • the shrinkable substrate may include a first side and a second side, and cured resin and the ink can be applied to different predetermined locations on the first side of the shrinkable substrate.
  • cured resin is applied to the first side of the shrinkable subsfrate and the ink can be applied to the second side of the shrinkable substrate.
  • the ink can be applied in one or more ink coatings.
  • the shrinkable substrate can be constructed of a heat shrinkable material, such as PVC and PETG.
  • Figure 6 shows an example of a thin plastic substrate that can be produced using the method and apparatus according to the present disclosure.
  • Three coatings can be applied to the substrate, including two of ink and one of a radiation curable coating, by a system substantially in accordance with the schematic of Figure 2.
  • a product 100 can be produced in a system 10 having two graphics printing stations 12',12" and an embossing station 14.
  • a substrate 20 is fed to the first printing station 12', where a background ink coating 102 is applied.
  • the substrate 20 proceeds to the second printing station 12", where a second ink coating is applied, e.g., showing indicia such as company name 104.
  • a radiation curable coating is applied to the substrate 20 in register with the previously applied coatings, e.g., in the form of a company logo 104.
  • the substrate 20 can be fed through a drying oven 24 to remove the solvent content of the ink, before entering the embossing station 14.
  • the embossing station 14 as the substrate 20 contacts the embossing device 40, it is irradiated and the radiation curable coating was cured.
  • the embossing tool 42 can comprise a master hologram, which produces a hologram on the substrate in the shape of the logo 104, i.e., "UP" in this example.
  • the shape of the area formed as a hologram in this case "UP" was controlled by the coating process.
  • the optical effect of the embossing tool was reproduced only over the coated area.
  • the system, apparatus, processes, and products as disclosed above are belived to have a number of advantages.
  • the use of actinic radiation for curing allows the process to be conducted near room temperature, i.e., without using high heat and pressure. Consequently, tool life is extended, energy costs are reduced, and the range of usable substrate materials is greatly expanded.
  • Subsfrate materials such as shrink films can be relieved with holograms using the disclosed process prior to being placed on packages and other containers.
  • the relieved shrink films can serve a variety of purposes, such as decoration, product identification, or security.
  • Security devices can include tamper-evident sleeves, bands, or labels.
  • a hologram on a tamper-evident security device can be very difficult to counterfeit and may lead to greater product safety.
  • the coating device which can be used to apply the radiation curable liquid (e.g., a photopolymer) to a predefined area of the substrate material, can be a printing device similar to those used in the printing station.
  • the size, shape, and depth of the relieved surface is controlled by the printing process, not by the relieving tool as is believed to be done in the known processes. This allows the production of a relief in a desired shape, such as a logo or design, without additional masking steps.
  • the process of forming a relief can also be integrated with available printing technologies to apply graphics or other coatings, such as inks or lacquers, in register with the relief.
  • the relief may comprise a variety of optical effects, including holograms or refraction, diffusion, or diffraction effects. This feature provides a graphic designer with greater flexibility in creating effects, while maintaining the higher production speeds available with printing devices.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Holo Graphy (AREA)

Abstract

L'invention concerne un système, un poste de gaufrage, et un procédé permettant l'impression graphique et en relief sur un substrat, et un produit correspondant. Le système comporte au moins un poste d'impression (12) offrant un premier trajet d'avancement de substrat, et au moins un poste de gaufrage (14) offrant un second trajet d'avancement de substrat, lequel est équipé d'un appareil de revêtement (16), d'un appareil de gaufrage (40) et d'un appareil de cuisson (60). L'appareil de revêtement (16) est situé en un premier emplacement le long du second trajet de substrat, et l'appareil de gaufrage (40) est situé en un deuxième emplacement le long du second trajet de substrat, sachant que ce second emplacement est espacé du premier. L'appareil de cuisson (60) est situé en un troisième emplacement le long du second trajet de substrat. Les deuxième et troisième emplacements peuvent être situés sur les deux côtés opposés du second trajet de substrat ou sur le même côté du second trajet de substrat. L'appareil de cuisson (60) peut être une source de rayonnement actinique, du type ultraviolet ou faisceau électronique.
PCT/US2000/029939 1999-10-28 2000-10-30 Procede et dispositif pour impression en relief et graphique, et produit correspondant Ceased WO2001030562A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU14461/01A AU1446101A (en) 1999-10-28 2000-10-30 Relief and graphics method, apparatus and product

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16190999P 1999-10-28 1999-10-28
US60/161,909 1999-10-28

Publications (1)

Publication Number Publication Date
WO2001030562A1 true WO2001030562A1 (fr) 2001-05-03

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITPI20090097A1 (it) * 2009-07-31 2011-02-01 Leonardo Panettieri Substrato patinato per la stampa e relativo metodo di produzione
WO2012091654A1 (fr) * 2010-12-29 2012-07-05 Tetra Laval Holdings & Finance S.A. Procédé de production d'un matériau d'emballage porteur d'un motif répété d'encre d'impression
EP2307198A4 (fr) * 2008-05-22 2016-01-06 Inx Internat Ink Co Procede de transfert de microstructures holographiques et autres ou d' images refractives sur un revetement de resine sur bande lors d'un enregistrement par impression sur bande
US20170291407A1 (en) * 2016-04-06 2017-10-12 The Procter & Gamble Company Method of Making a Patterned Flexographic Printing Plate
EP3242165A1 (fr) 2011-06-21 2017-11-08 Basf Se Impression de réseaux de diffraction sur un substrat polymère

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3808024A (en) * 1972-02-24 1974-04-30 Armstrong Cork Co Embossed surface covering having enhanced three-dimensional effect
US3859110A (en) * 1972-11-06 1975-01-07 Brown & Williamson Tobacco Corp Surface finishes
US4084500A (en) * 1976-02-09 1978-04-18 Hallmark Cards, Incorporated Synthetic resin cured in place rotary embossing counter roller
US4816295A (en) * 1981-07-06 1989-03-28 C.A.M. Graphics Co., Inc. Method for imparting an apparent finish to the surface of an article
US5281499A (en) * 1988-01-25 1994-01-25 Bussard Janice W Moisture and abrasion resistant holographic products
US5327825A (en) * 1993-05-12 1994-07-12 Transfer Print Foils, Inc. Seamless holographic transfer
US5339730A (en) * 1991-06-28 1994-08-23 Kaysersberg Method for printing-embossing paper sheets
US5455129A (en) * 1988-01-25 1995-10-03 Bussard; Janice W. Holographic products with sealed edges
US5467708A (en) * 1995-03-15 1995-11-21 Gencorp Inc. Direct applied embossing casting method
US5587261A (en) * 1990-12-20 1996-12-24 Exxon Chemical Patents Inc. UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3808024A (en) * 1972-02-24 1974-04-30 Armstrong Cork Co Embossed surface covering having enhanced three-dimensional effect
US3859110A (en) * 1972-11-06 1975-01-07 Brown & Williamson Tobacco Corp Surface finishes
US4084500A (en) * 1976-02-09 1978-04-18 Hallmark Cards, Incorporated Synthetic resin cured in place rotary embossing counter roller
US4816295A (en) * 1981-07-06 1989-03-28 C.A.M. Graphics Co., Inc. Method for imparting an apparent finish to the surface of an article
US5281499A (en) * 1988-01-25 1994-01-25 Bussard Janice W Moisture and abrasion resistant holographic products
US5455129A (en) * 1988-01-25 1995-10-03 Bussard; Janice W. Holographic products with sealed edges
US5587261A (en) * 1990-12-20 1996-12-24 Exxon Chemical Patents Inc. UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating
US5339730A (en) * 1991-06-28 1994-08-23 Kaysersberg Method for printing-embossing paper sheets
US5327825A (en) * 1993-05-12 1994-07-12 Transfer Print Foils, Inc. Seamless holographic transfer
US5467708A (en) * 1995-03-15 1995-11-21 Gencorp Inc. Direct applied embossing casting method

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2307198A4 (fr) * 2008-05-22 2016-01-06 Inx Internat Ink Co Procede de transfert de microstructures holographiques et autres ou d' images refractives sur un revetement de resine sur bande lors d'un enregistrement par impression sur bande
ITPI20090097A1 (it) * 2009-07-31 2011-02-01 Leonardo Panettieri Substrato patinato per la stampa e relativo metodo di produzione
RU2579348C2 (ru) * 2010-12-29 2016-04-10 Тетра Лаваль Холдингз Энд Файнэнс С.А. Способ изготовления упаковочного материала, снабженного повторяющимся рисунком, выполненным печатной краской
JP2014507308A (ja) * 2010-12-29 2014-03-27 テトラ ラバル ホールデイングス エ フイナンス ソシエテ アノニム 印刷インクの繰り返しパターンを設けたパッケージ材料の製造方法
CN103269869B (zh) * 2010-12-29 2015-12-16 利乐拉瓦尔集团及财务有限公司 制造设有重复的印刷油墨图案的包装材料的方法
CN103269869A (zh) * 2010-12-29 2013-08-28 利乐拉瓦尔集团及财务有限公司 制造设有重复的印刷油墨图案的包装材料的方法
WO2012091654A1 (fr) * 2010-12-29 2012-07-05 Tetra Laval Holdings & Finance S.A. Procédé de production d'un matériau d'emballage porteur d'un motif répété d'encre d'impression
EP3242165A1 (fr) 2011-06-21 2017-11-08 Basf Se Impression de réseaux de diffraction sur un substrat polymère
US20170291407A1 (en) * 2016-04-06 2017-10-12 The Procter & Gamble Company Method of Making a Patterned Flexographic Printing Plate
WO2017176538A1 (fr) * 2016-04-06 2017-10-12 The Procter & Gamble Company Procédé de fabrication d'une plaque d'impression flexographique à motifs
CN109073967A (zh) * 2016-04-06 2018-12-21 宝洁公司 制造图案化的柔性版印刷板的方法
US11285712B2 (en) 2016-04-06 2022-03-29 The Procter & Gamble Company Method of making a patterned flexographic printing plate
CN109073967B (zh) * 2016-04-06 2022-04-26 宝洁公司 制造图案化的柔性版印刷板的方法

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