WO2001025362A1 - Sheet for transferring photocatalyst - Google Patents
Sheet for transferring photocatalyst Download PDFInfo
- Publication number
- WO2001025362A1 WO2001025362A1 PCT/JP2000/006825 JP0006825W WO0125362A1 WO 2001025362 A1 WO2001025362 A1 WO 2001025362A1 JP 0006825 W JP0006825 W JP 0006825W WO 0125362 A1 WO0125362 A1 WO 0125362A1
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- WO
- WIPO (PCT)
- Prior art keywords
- resin
- sheet
- layer
- transfer film
- photocatalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
- B01J37/0244—Coatings comprising several layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/391—Physical properties of the active metal ingredient
- B01J35/395—Thickness of the active catalytic layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0272—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing elements other than those covered by B01J31/0201 - B01J31/0255
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/06—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
Definitions
- the present invention transfers a photocatalytic film with excellent long-term adhesiveness to any substrate such as plastic film, sheet, board, molded product, paper, wood, metal, etc., and provides antibacterial, deodorant, and harmful substances for photocatalyst.
- Transfer sheet capable of imparting functions such as decomposition removal of soil, antifouling, antifogging, and droplets, a method for transferring a photocatalyst layer using the transfer sheet, and a photocatalyst layer obtained by the method.
- molded products furthermore, there is no appearance defect such as transparent, film unevenness and non-uniform interference fringes on substrates of any shape such as plate, sheet and film of thermoplastic resin.
- the film containing the photosemiconductor powder may contain an adhesive binder, and as the binder, a synthetic resin or an inorganic substance can be used.
- the bonding layer can be formed on the surface of the article, on the coating containing the optical semiconductor powder, or on both, and can fix the coating containing the optical semiconductor powder on the surface of the article.
- a synthetic resin, a silicone resin, and other inorganic substances JP-A-9-122771 discloses that a release layer is formed on a sheet substrate, a photocatalyst-containing layer is further formed thereon, and a corrosion-resistant intermediate layer is further formed thereon.
- a transfer sheet which is formed and further has a pressure sensitive adhesive or a heat sensitive adhesive formed thereon. It is described that water glass, colloidal silica, polyorganosiloxane, fluoropolymer, acrylic silicone resin, zinc phosphate, cement, and the like can be suitably used for the corrosion resistant intermediate layer. Furthermore, there is described a method of transferring a photocatalyst layer by press-bonding or thermo-compressing a transfer target using the transfer sheet. Japanese Patent Application Laid-Open No.
- 9-122473 discloses a transfer sheet in which a release material is applied to the surface of a sheet base material, and further overlaid, and a mixture of a photocatalyst and an adhesive is applied thereto, or a release material is applied to the surface of the sheet base material
- a transfer sheet is described in which a material layer and an adhesive layer are sequentially superposed and applied, and a photocatalyst is embedded in the adhesive layer.
- the adhesive include polyvinyl alcohol, starch, a mixture of atearliestmargin and water, rubber, vinyl chloride, and phenol resin. Further, there is described a method in which the transfer sheet is placed in a mold, and a resin member is injection-molded to transfer a photocatalyst to the surface of a molded product.
- An adhesive has been proposed as one of the methods for easily fixing the photocatalyst on the substrate.However, since the strong photooxidation of the photocatalyst can easily oxidize and decompose organic substances, the photocatalyst can be used. It is difficult to use an organic resin as an adhesive for the purpose of transferring and adhering to a transfer object, and the main component of the photocatalyst layer was specifically composed of an inorganic substance having a weak adhesive force. Also, a method of transferring and bonding the photocatalyst layer via an adhesive layer has been proposed. In this case as well, when an organic material is used for the adhesive layer, the adhesive at the interface with the photocatalyst layer is used. As a result, there is a problem that the photocatalytic layer is decomposed, and the adhesive strength is reduced in a short time, and the photocatalytic layer is peeled off.
- both the photocatalyst layer and the organic adhesive layer have poor adhesion, and there is a problem that they are peeled off during transfer and use.
- an acrylic silicon resin can be used, but no specific example is described.
- the method of producing a resin having a photocatalyst layer by transferring the photocatalyst layer is more advantageous than other methods in that the photocatalyst layer can be formed regardless of the shape of the substrate to be transferred.
- the thickness of the photocatalyst layer is l ⁇ m or more, the wear resistance of the film decreases, such as cracking of the film. Therefore, it is preferable that the thickness be 1 or less.
- the present invention is a transfer film or sheet provided with a photocatalyst layer on a base film or sheet.
- the transfer film has no cracks or transfer leakage at the time of transfer, and the transferred film exhibits excellent long-term adhesion.
- Adhesion consists of a photocatalyst layer, an inorganic layer, and an adhesive layer provided on a transfer film or sheet, film or sheet base material, which is a siloxane cross-linkable resin containing 60% by weight of silicone, in this order.
- a photocatalyst layer, an inorganic layer, a resin having specific properties on a transfer film or sheet whose layer is a siloxane cross-linkable resin containing 0.5 to 60% by weight of silicone, or a film or sheet base material To solve the above problems by using a transfer film or sheet having layers provided in this order.
- the resin is extruded onto a transfer film or sheet having a photocatalyst layer, and is coated and laminated, and the transfer film or sheet is pressed during the process of extruding the resin.
- the present inventors have found that a photocatalyst layer having good properties and appearance and having excellent long-term adhesiveness can be industrially supported on a resin, thereby completing the present invention.
- the adhesive layer has a silicone content of 0.5 to 60% by weight in terms of silicon dioxide.
- a transfer film or sheet comprising a siloxane cross-linked resin containing
- Consstitution 2 In a transfer film or sheet in which a photocatalyst layer, an inorganic layer, and an adhesive layer are provided in this order on the surface of a film or sheet substrate, the adhesive layer is 0.5 to 60% by weight in terms of silicon dioxide.
- (Constitution 4) The transfer film or sheet according to any one of (Constitution 1) to (Constitution 3), wherein a primer layer is provided on the adhesive layer.
- the primer layer is characterized by comprising a resin having a number average molecular weight of 20,000 or less and a glass transition point of 110 to 100 ° C. (Structure 4) or (Structure 5) Transfer film or sheet according to
- R 1 represents an alkyl group having 1 to 8 carbon atoms (which may be substituted with an amino group, a carboxyl group, or a chlorine atom)
- R 2 represents an alkyl group having 1 to 8 carbon atoms.
- n 4 is an integer of 2 to 4
- 1 ⁇ + 112 + 113 + 114 Represents an integer of 4.
- the resin portion of the siloxane cross-linkable resin of the adhesive layer is an acrylic resin, an epoxy resin, an acrylic silicon resin, or an epoxy silicon resin, wherein any of (Configuration 1) to (Configuration 9) is provided.
- the inorganic layer is represented by the formula (II)
- n represents an organoalkoxysilane or a hydrolyzed / condensed product of an alkoxysilane represented by the following formula: A transfer film or sheet according to any one of (Configuration 2) to (Configuration 12),
- the photocatalyst layer is a photocatalyst particle composite containing 25 to 95% by weight of a metal oxide gel and / or a metal hydroxide gel.
- the metal oxide gel and / or metal hydroxide gel in the photocatalyst layer is one or two selected from silicon, aluminum, titanium, zirconium, magnesium, diobium, tantalum, tungsten, and tin.
- (Structure 16) The transfer film or sheet according to any one of (Structure 1) to (Structure 15), wherein the thickness of the photocatalyst layer is 1 or less.
- (Structure 17) The transfer film or sheet according to any one of (Structure 2) to (Structure 16), wherein the total thickness of the inorganic layer and the photocatalyst layer is 1 m or less.
- (Structure 19) A step of preparing the transfer film or sheet according to any one of (Structure 1) to (Structure 18), a step of pressing an adhesive layer surface of the transfer film or sheet against a surface of a transfer target, and A method for transferring a photocatalyst layer, comprising a step of peeling a substrate in a transfer film or a sheet,
- the step of pressing the adhesive layer surface of the transfer film or sheet against the surface of the transfer object is a step of pressing the adhesive layer surface of the transfer film or sheet against the surface of the transfer object while applying heat.
- (Structure 22) The method for transferring a photocatalyst layer according to any one of (Structure 19) to (Structure 21), wherein the shape of the transfer target is a plate, a sheet, or a film.
- (Structure 23) A molded article provided with a photocatalytic layer obtained by the method according to any one of (Structure 19) to (Structure 22) is irradiated with light having an ultraviolet intensity of 3 mWZ cm 2 for 500 hours, and then subjected to JISK 5400 Of photocatalyst layer by grid tape method specified in Japan A molded article provided with a photocatalyst layer having an evaluation score of 6 or more;
- (Constitution 24) A photocatalyst layer obtained by the method according to any one of (Constitution 19) to (Constitution 22)
- a molded article provided with a photocatalyst layer characterized in that the total light transmittance of the photocatalyst layer and the adhesive layer or the total light transmittance of the photocatalyst layer, the inorganic layer and the adhesive layer to light having a wavelength of 550 nm is 70% or more. Molded products,
- the transfer film or sheet having a photocatalyst layer is the transfer film or sheet according to any one of (Constitution 1) to (Constitution 18).
- (Structure 26) A method for producing a resin structure having a photocatalyst layer according to any one of (Structure 26) to (Structure 27),
- (Structure 29) The photocatalyst layer according to any one of (Structure 25) to (Structure 28), wherein the resin of the resin structure is a polycarbonate resin, an acrylic resin, a polyvinyl chloride resin, or a polystyrene resin. Resin manufacturing method,
- (Structure 30) The resin structure having a photocatalyst layer according to any one of (Structure 25) to (Structure 29), wherein the resin of the resin structure has a plate shape, a sheet shape, or a film shape. Body manufacturing method,
- the structure of the transfer film or sheet having a photocatalyst layer is a structure in which the structure of the photocatalyst layer 2 alone, the photocatalyst layer 2, and the adhesive layer 3 are laminated in this order on the surface of the substrate 1 on which the structure to be transferred is installed.
- a structure in which layers 5 made of a resin having a number average molecular weight of not more than 200 and a glass transition point of 110 to 100 ° C. are laminated in this order can be exemplified.
- a structure as shown in Figs. 1-3 is preferred ⁇ ,.
- the film-like or sheet-like base material used in the present invention is not particularly limited, and can be appropriately selected from an organic material, an inorganic material, or a composite material thereof. Examples thereof include polypropylene, acrylic resin, polyethylene terephthalate, polyvinyl chloride, polycarbonate, and polystyrene.
- the thickness of the substrate is preferably in the range of 3 m to 500 m, and more preferably in the range of 16 im to 100 m.
- the surface of the substrate is preferably smooth, and a substrate having a thickness variation of 10% or less is particularly preferable for forming a photocatalytic layer having a uniform thickness.
- any siloxane crosslinkable resin containing 0.5 to 60% by weight of silicone in terms of silicon dioxide can be used.
- Acrylic resin, epoxy resin, polyester resin, urethane resin, alkyd resin, etc. can be used as the siloxane cross-linkable resin, but acrylic resin and epoxy resin have the best adhesion to the object to be transferred.
- an acryl silicone resin or an epoxy silicone resin into which a crosslinkable alkoxysilane moiety or a halogenosilane moiety has been introduced can also be suitably used.
- the proportion of the organic moiety in the silicone-containing siloxane crosslinkable resin is preferably at least 40% by weight.
- the organic portion means a portion other than silicon equivalent in terms of silicon dioxide. If the amount is less than 40% by weight, the transfer to the transfer target will not be successful, and the long-term adhesiveness of the film will decrease.
- a resin having a larger number of cross-linking points in the siloxane cross-linkable resin has better adhesion to the photocatalyst layer or the inorganic layer.
- the crosslinking point is, for example, an ester or carboxylic acid in an acrylic resin, a hydroxyl group, an unsaturated bond, an alkoxy in an epoxy resin.
- a silane portion and the like can be exemplified.
- silicone When silicone is added as a cross-linking agent to the siloxane cross-linkable resin, the adhesion to the photocatalyst layer or the inorganic layer is improved.
- the amount of addition is in the range of 0.5 to 60% by weight in terms of silicon dioxide, and the effect is most effective when it is in the range of 20 to 40% by weight.
- the weight ratio indicates a combination of the two. If the amount of the silicone exceeds 60% by weight, the adhesiveness to the transfer object is deteriorated.
- R represents an alkyl group having 1 to 8 carbon atoms (which may be substituted by an amino group, a carboxyl group, or a chlorine atom). Specifically, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, methoxymethyl, dimethylaminomethyl, methoxethyl, dimethylaminoethyl, Examples thereof include a chloroethyl group, a chloropropyl group, and an acetoethyl group.
- R 2 represents an alkyl group having 1 to 8 carbon atoms substituted with an alkyl group having 1 to 8 carbon atoms or an alkoxy group, and specifically, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n- Examples thereof include a butyl group, a t-butyl group, a methoxymethyl group, a methoxethyl group, and an acetoethyl group.
- Specific examples of the compound represented by the formula (I) include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-butoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, and ethyltriisopropoate.
- methyltrichlorosilane methyltributanesilane, ethyltrichlorosilane, ethyltribromosilane, ⁇ -propyltrichlorosilane, ⁇ -propyltribromosilane, ⁇ -hexyltrichlorosilane, ⁇ —Hexyltribromosilane, ⁇ -decyltrichlorosilane, ⁇ -decyltribromosilane, ⁇ -decyltrimethoxysilane, ⁇ -decyltriethoxysilane, ⁇ -decyltriisopropoxysilane, ⁇ -decyltri-t-butoxysilane, n— N-octadecyltrichlorosilane, n-octadecyltrimethoxysilane, n-octadecyltrilane,
- a light stabilizer and / or an ultraviolet absorber can be mixed in the adhesive layer for the purpose of improving durability.
- a light stabilizer which can be used a hindered amine type is good, but other substances can also be used.
- As the ultraviolet absorber a triazole type or the like can be used.
- a silane coupling agent for the purpose of controlling the siloxane crosslinking reaction, a silane coupling agent, an acid-base catalyst, a metal chelate catalyst or the like can be added.
- additives such as a surfactant and an antifoaming agent of 5% by weight or less can be added.
- the thickness of the adhesive layer is 1 m or more, preferably 3 m or more. If it is less than l im, the transfer becomes difficult, and the long-term adhesion after the transfer deteriorates.
- various printing methods such as gravure printing, roll coating method, flow coating method, sheet forming method, spray spraying method, dip coating method, spin coating method A method such as the law can be used.
- the drying temperature varies depending on the material of the base sheet, the type of the solvent and the resin, but is generally preferably 150 ° C. or lower.
- a mer layer is provided.
- any material can be used as long as it is generally used, depending on the material of the transfer object.
- resins having a number average molecular weight of more than 200,000 Alternatively, the number average molecular weight is not more than 20, 000, and the glass transition point is 110 to 100 ° C, preferably 10 to 80 ° C. C, and more preferably a resin in the range of 30 to 80 ° C. is used. In the case of a resin having a number average molecular weight of more than 200,000, its glass transition point is not restricted.
- a resin having an elongation percentage of the coating film dried at room temperature to 60 ° C. in the range of 30 to 150%, particularly preferably in the range of 50 to 130%.
- the material used for one layer of the polymer include a polyvinyl isobutyl ether, an acrylic ester resin, an olefin chloride resin, a rubber resin, a pressure-sensitive adhesive such as a polyethylene-vinyl acetate copolymer, or a styrene resin. Styrene-acrylic copolymer, acryl resin, phenol resin, epoxy resin, acryl silicone resin, epoxy silicone resin, urethane resin, polyester resin, etc., and acryl silicone resin or epoxy silicone resin is particularly preferable. .
- the thickness of the primer layer is not particularly limited as long as it does not affect properties such as transparency, but is preferably in the range of 0.05 to 5 ⁇ m. At 0.05 m or less, there is no effect of improving adhesion, and at 5 ⁇ or more, the effect of improving adhesion does not change much.
- the metal oxide gel and / or metal hydroxide gel in the photocatalyst layer not only fixes the photocatalyst and firmly adheres to the siloxane crosslinked resin of the adhesive layer, but also removes the photocatalyst layer from the base film or sheet after transfer. This has the effect of facilitating peeling. In addition, since the gel is porous, it has an adsorptive property and has an effect of enhancing photocatalytic activity.
- the content of the metal oxide gel and / or metal hydroxide gel in the photocatalyst layer is preferably in the range of 25 to 95% by weight. If it is less than 25% by weight, the adhesion to the adhesive layer will be insufficient, and if it is more than 95% by weight, the photocatalytic activity will be insufficient.
- the material of the metal oxide gel and metal or hydroxide gel include gay, aluminum, titanium, zirconium, magnesium, diobium, tantalum, tungsten, and tin. Also, these were mixed As the gel, a composite oxide gel prepared by a method such as a coprecipitation method can be used. In order to mix with the photocatalyst, it is preferable to mix in a sol state before forming a gel, or to mix in a raw material stage before preparing a sol. Gel preparation methods include hydrolysis of metal salts, neutralization decomposition, ion exchange, and hydrolysis of metal alkoxides. The photocatalyst powder is uniformly dispersed in the gel.
- any method can be used as long as it can be obtained in the state described above.
- a large amount of impurities are present in the gel, the adhesiveness and catalytic activity of the photocatalyst will be adversely affected. Therefore, a gel with few impurities is preferred. In particular, if the gel contains more than 5% of organic matter, the photocatalytic activity will decrease.
- the photocatalyst of the photocatalyst layer T i 0 2, ZnO, S rT i 0 3, C d S, G aP, I nP, GaAs, B aT i 0 3, K2Nb0 3, F e 2 0 3, T a 2 0 5, WO 3.
- SnO There B i 2 0 3, N i O, Cu 2 0, S i C, illustrate the S i 0 2, Mo S 2 , I nPb, Ru0 2, C e 0 2 , etc. And an anatase type titanium oxide is particularly preferable.
- the following coating method can be used.
- the photocatalyst can be dispersed in the state of a precursor solution of a metal oxide sol and a precursor of a metal or metal hydroxide sol, and can be hydrolyzed or neutralized during coating to form a sol or a gel.
- an acid or alkali peptizer may be added for stabilization.
- a surfactant, an antifoaming agent and a silane coupling agent can be added in an amount of 5% by weight or less based on the photocatalyst in the sol suspension.
- the drying temperature at the time of forming the photocatalyst layer is preferably 50 ° C. or more and 150 ° C. or less, depending on the material of the base film or sheet.
- the thickness of the photocatalyst layer is higher when the photocatalyst layer is thicker, but if it is 2 or more, the film may be cracked when the substrate sheet is peeled off after the completion of the transfer.
- the value is 1 or less, a transparent film having a total light transmittance of 80% or more and a haze ratio of 2% or less of the film after transfer at a wavelength of 550 nm is obtained, and the appearance of the transfer object is not impaired at all. It is also useful in terms of sex.
- the inorganic layer has the effect of improving the adhesion between the photocatalyst layer and the adhesive layer, the effect of improving the wear resistance of the photocatalyst layer, and the effect of reducing color development due to interference fringes derived from the photocatalyst layer thickness.
- R represents an alkyl group which may have a substituent having 1 to 4 carbon atoms
- R is an alkyl group which may have a substituent having 1 to 5 carbon atoms or 1 carbon atom.
- n represents 0 or 1.
- the main component is an organoalkoxysilane or a hydrolyzed / condensed product of an alkoxysilane represented by the following formula:
- Specific examples of the silane compound represented by the formula ( ⁇ ) include those similar to the specific examples of the silane compound represented by the formula (I).
- a silicic acid sol, an alumina sol, a zirconium sol, or the like can be added.
- the same coating method as that for forming the adhesive layer can be used.
- 5% by weight or less of a surfactant, an antifoaming agent and a silane coupling agent can be added.
- the drying temperature at the time of forming the inorganic layer varies depending on the material of the base sheet, but is preferably from 50 ° C to 150 ° C.
- the thickness of the inorganic layer is from 0.1 / m to 2 m, and preferably the total film thickness of the photocatalyst layer and the inorganic layer is from 0.1 ⁇ to 1 / m. If it is more than 2 m, the film may crack when the base sheet is peeled off after transfer is completed.
- the transfer film or sheet of the present invention the photocatalyst layer, the inorganic layer, a resin having a number average molecular weight of 20,000 or more and / or a number average molecular weight of 20,000 or less, Further, a layer made of a resin having a glass transition point of 110 to 100 ° C. is provided in this order.
- a resin having a glass transition point of 1 to 100 ° C, preferably 10 to 80 ° C (: more preferably 30 to 80 ° C) is used. Is preferred.
- a resin having a number average molecular weight of 200,000 or more its glass transition point is not limited, and for example, a resin in the range of 110 to 100 ° C can be used. .
- pressure-sensitive adhesives such as polyvinyl isobutyl ether, acrylic ester resin, chlorinated olefin resin, rubber resin, polyethylene-vinyl acetate copolymer, or styrene resin, styrene-acrylic copolymer, acrylic Examples thereof include a resin, a phenol resin, an epoxy resin, an acrylic silicone resin, an epoxy silicone resin, a polyurethane resin, and a polyester resin, and an acrylic silicone resin or an epoxy silicon resin is particularly preferred.
- a light stabilizer and / or an ultraviolet absorber can be mixed in the resin layer for the purpose of improving durability.
- a light stabilizer that can be used a hindered amine type is preferable, but other substances can also be used.
- As the ultraviolet absorber a triazole type or the like can be used.
- additives such as a surfactant and an antifoaming agent of 5% by weight or less can be added.
- the thickness of the resin layer is at least ⁇ , preferably at least 3 m. If it is less than 1 m, transfer becomes difficult, and the long-term adhesion after transfer deteriorates.
- the same coating method as when forming the adhesive layer can be used.
- the drying temperature varies depending on the material of the base film or sheet, the type of the solvent and the resin, but is generally preferably 150 ° C. or lower.
- a release layer can be provided on the base film or sheet for the purpose of making the base film or sheet easily peelable after the transfer.
- the material melamine, silicon, fluorine, acrylic thermosetting resin alone or a mixture thereof can be used. It is also possible to adjust the peel strength by adding additives such as silicon, fluorine, polyester and polyethylene to the above resin.
- Preparing the transfer film or sheet as a transfer method A method for transferring a photocatalytic layer, which includes a step of pressing the adhesive layer surface of the film or sheet against the surface of the transfer object and a step of peeling off the base material in the transfer film or sheet, can be exemplified.
- the step of pressing against the transfer object can be performed by any method such as heating and / or pressing.
- any method such as an in-mold transfer method for transferring at the time of production of a plastic molded article or a roll transfer method for transferring a film or a plate onto a plane can be used.
- Methods for maintaining the cross-linking reaction point include reducing the hydrolysis rate of the cross-linking silicon alkoxy group (Si-OR) or replacing the cross-linking alkoxy group with an alkoxy group having a larger number of carbon atoms by an alkoxy exchange reaction. Or increasing the glass transition temperature of the resin part. Further, after the transfer film or the sheet substrate is peeled off, a post-treatment such as heating can be further performed. At this time, even if the crosslinking reaction is advanced in the adhesive layer, the adhesion is similarly improved.
- a method in which the transfer film or sheet of the present invention is placed in a mold, a resin member is injection-molded, and a photocatalyst is transferred to the surface of a molded product can be exemplified.
- the transfer target can be transferred in a complicated shape by using a method such as vacuum compression bonding.
- a method such as vacuum compression bonding.
- a plate, a sheet, or a film is particularly preferable.
- the step of peeling the substrate in the transfer film or sheet is exemplified by a method in which the transfer sheet is peeled by applying shear stress, tensile stress, or the like, or a method in which the transfer sheet is peeled by using the oxidizing power of a photocatalyst by irradiating ultraviolet rays. be able to.
- the sheet substrate After transfer, the sheet substrate also acts as a protective film to prevent damage to the photocatalyst layer unless it is peeled off.
- the adhesiveness of the photocatalyst layer by the grid tape method specified in JISK540 was evaluated. It is a molded article provided with a photocatalyst layer having 6 or more points.
- the molded article obtained by using the present invention comprises a photocatalyst layer and an adhesive layer or a photocatalyst layer.
- the method for forming a photocatalyst layer on a resin according to the present invention is characterized in that a molten resin is extrusion-coated on a transfer film or a sheet having a photocatalyst and is continuously manufactured.
- Extrusion coating can be exemplified by a method in which a molten resin is extruded into a film form from a slit die called a T-die and applied to a substrate.
- a film having a three-layer structure including the photocatalyst layer, or a film having a four-layer structure including the photocatalyst and the adhesive layer can be continuously manufactured.
- the adhesiveness can be further increased.
- Another method of forming a photocatalyst layer on a resin according to the present invention is characterized in that a molten resin is extruded and laminated between a transfer film or a sheet having a photocatalyst and a substrate to be transferred, and is continuously manufactured.
- Extrusion lamination in this case is also called sanguinche lamination, in which molten resin is extruded from a slit die into a film and applied to the substrate, and another substrate is supplied from an unwinder called a sanding machine Then, it shows the method of bonding together.
- the transfer film or sheet can be used as a substrate coated with the molten resin or as a substrate supplied from the unwinder. In this case, a three-layer coated film or the like can be manufactured continuously.
- Another method for forming the photocatalyst layer of the present invention on a resin is to press-bond a transfer film or sheet having a photocatalyst layer during the step of cooling the melt-extruded resin on a cooling port. It is characterized by being manufactured continuously.
- This method is used in a method of mixing and heating materials and continuously extruding a molten resin from an extruder through a die, and in a chill roll method in which a resin is extruded and then rapidly cooled by a cooling roll.
- a transfer film is laminated on the extruded resin and both are cooled at a time to produce a resin structure having a photocatalyst layer. Resin having photocatalyst layer
- the material of the resin having the photocatalyst layer is not particularly limited as long as it is a thermoplastic resin, and specific examples thereof include a polyethylene resin, a polypropylene resin, and a polyethylene terephthalate resin.
- a polyethylene resin a polypropylene resin
- a polyethylene terephthalate resin a polyethylene terephthalate resin
- acrylic resin, polyvinyl chloride resin, polycarbonate resin and polystyrene resin are particularly preferred.
- the shape is not particularly limited, but is preferably a plate, sheet, or film.
- the thickness is preferably in the range of 3 to 200 m, and more preferably in the range of 16 to 100 m.
- the film surface should be smooth, but the surface may be uneven for the purpose of patterning during transfer.
- the structure of a transfer film or sheet having a photocatalyst layer is a structure in which a photocatalyst layer alone, a photocatalyst layer, and an adhesive layer are laminated in this order on a substrate surface on which a structure to be transferred is placed, or a photocatalyst layer.
- An example is a structure in which an inorganic layer, an inorganic layer, and an adhesive layer are laminated in this order.
- a structure having an adhesive layer is preferable in consideration of the adhesion to the transfer target. Specific examples of the structure, material, and the like are preferably the transfer film or sheet described above.
- 1 to 3 are diagrams schematically showing preferred structures in the transfer film of the present invention.
- a photocatalyst coating liquid (Nippon Soda's Bidginga-1 NDC-1) is prepared by dispersing photocatalyst particles in silica sol on a polyethylene terephthalate film (Toyobo E5001) with a thickness of 2 ⁇ zm that has not been subjected to surface treatment. 30 C: solid content concentration 8%) After coating with a bar coater to a film thickness of 0.5 m, it was dried at 120 ° C to prepare a PET film with a photocatalytic layer (A-1).
- a polysiloxane-added siloxane-crosslinked acryl resin solution Y (Nippon Soda's Vidova NRC-300A: solid content concentration 10%) is coated to a film thickness of 5 im, dried at 120 ° C, and transferred to a transfer sheet ( T-1) was created. Then, the acrylic resin plate surface as a transfer object, by superimposing the transfer sheet (T one 1), laminated with a 5 k pressure GZcm 2 at 180 ° C, peeling the substrate sheet, the outermost surface Prepared an acrylic resin plate (P-1) consisting of a photocatalyst layer.
- (A-2) was produced under the same conditions as in Example 1 except that only the film thickness was 0.2 m. Furthermore, a polysiloxane-added siloxane crosslinked acryl resin solution (Nippon Soda's Vidova -NRC-300A: solid content concentration 10%) is coated to a film thickness of 5 m, dried at 120 ° C, and transferred to a transfer sheet. (T-2) was created. Then, the acrylic resin plate surface as a transferred object, overlapping the transfer sheet (T one 2), laminated with a 5 kg / cm 2 of pressure at 180 ° C, by peeling the substrate sheet, the outermost An acrylic resin plate (P-2) with a photocatalytic layer on the surface was prepared.
- a polysiloxane-added siloxane crosslinked acryl resin solution (Nippon Soda's Vidova -NRC-300A: solid content concentration 10%) is coated to a film thickness of 5 m, dried at 120 ° C, and transferred to
- (A-2) was prepared in the same manner as in Example 2, and (A-2) a coating solution of an inorganic layer (a glass power T 2106 solution and a glass power H 501 solution of Nippon Synthetic Rubber: 95: 5 was coated with a bar coater to a thickness of 0.3 and dried at 120 ° C to produce a PET film (B-1) with an inorganic layer of a photocatalyst layer. Furthermore, a polysiloxane-added siloxane cross-linked acrylic resin solution (Nippon Soda's Vistreta-NRC-300A: solid content concentration 10%) is coated to a film thickness of 5, dried at 120 ° C, and transferred to a transfer sheet (T- 3) was created.
- a coating solution of an inorganic layer a glass power T 2106 solution and a glass power H 501 solution of Nippon Synthetic Rubber: 95: 5 was coated with a bar coater to a thickness of 0.3 and dried at 120 ° C to produce a PET film (
- a transfer sheet (T-1) prepared in the same manner as in Example 1 was used as an acrylic resin film. (Kanebuchi Chemical Sanjuren 004NAT, thickness 50 m) and transferred at 140 ° C with a pressure of 5 kg / cm 2 using a heating and pressing roll. By peeling the transfer sheet substrate, an acrylic resin film (P-4) with the photocatalyst layer on the outermost surface was created.
- the transfer sheet (T-3) prepared in the same manner as in Example 3 was overlaid on an acrylic resin film (Sanjuren 004NAT manufactured by Kaneka Chemical Co., thickness 50 / m) and heated at 140 ° C under a pressure of 5 kcm 2. Transfer was performed using a pressure roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-5) having a photocatalyst layer on the outermost surface was created.
- Example 1 transfer sheet was adjusted (T-1) a polystyrene resin plate (two Tsu Seo one resin, 2 mm thickness) overlaid, heat and pressure at 5 k gZcm 2 pressure at 80 ° C Transfer was performed using a roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-6) with the outermost surface being a photocatalyst layer was prepared.
- the transfer sheet (T-13) adjusted in the same manner as in Example 3 was placed on a polystyrene resin plate (made of Nippon Resin, 2 mm thick), and at 80 ° C. and a pressure of 5 kg / cm 2 . Transfer was performed using a heating and pressing roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-7) having the photocatalyst layer on the outermost surface was created.
- a transfer sheet (T-1) prepared in the same manner as in Example 1 a copolymer polyester solution Byron 300 (manufactured by Toyobo Co., Ltd.) was coated with a bar coater so as to have a film thickness of 0.5 ⁇ . After drying, the sheet was dried at 120 ° C to prepare a transfer sheet (T-4) with a single primer layer.
- a transfer sheet (T-12) prepared in the same manner as in Example 2 an acrylic silicon resin solution ZEMRAC YC 3623 (manufactured by Kanegafuchi Chemical Co., Ltd.) was applied with a bar coater to a thickness of 0.5 m. After coating, it was dried at 120 ° C. to prepare a transfer sheet (T-5) with a primer layer.
- the transfer sheet (T-5) is laminated on the surface of the polycarbonate plate, laminated at 150 ° C and a pressure of 5 kg / cm 2 , and the substrate sheet is peeled off. P-9) was created.
- a transfer sheet (T-3) prepared in the same manner as in Example 3 an acrylic silicon resin solution Zemurac YC 3623 (manufactured by Kanegafuchi Chemical Co., Ltd.) was applied to the transfer sheet (0.5 mm) to a thickness of 0.5 m. After coating, the resultant was dried at 120 ° C. to prepare a transfer sheet (T-6) with a single primer layer.
- a PET film with a photocatalytic layer and an inorganic layer in the same manner as in Example 3 except that Nissan Chemical Snowtex IPA-ST adjusted to 1% solid content with water Z ethanol 1 Z1 as the inorganic layer coating liquid was used.
- B-2 transfer sheet (T-17), and resin plate (P-11) were adjusted.
- a transfer sheet with a primer layer (T-10) and a resin plate (P-14) were prepared in the same manner except that a silicone resin solution ZEMRAC YC5920 (manufactured by Kaneka Chemical Co., Ltd.) was used.
- Example 3 a PET film (B-1) with a photocatalyst layer and an inorganic layer was prepared. Further, the surface is coated with acryl silicone resin solution ZEMRAC YC 3623 (manufactured by Kane-buchi Chemical Co., Ltd.) using a bar coater so that the film thickness becomes 0.
- acryl silicone resin solution ZEMRAC YC 3623 manufactured by Kane-buchi Chemical Co., Ltd.
- the acrylic resin plate surface as a transfer object the transfer sheet (T - 1 1) a lap, laminated with a 5 k pressure GZC m 2 at 180 ° C, by peeling the base sheet, An acrylic resin plate (P-15) with a photocatalyst layer on the outermost surface was prepared.
- the acrylic resin plate surface as a transferred object overlapping the transfer sheet (T one 12), and laminating over preparative at 5 kg / cm 2 of pressure at 180 ° C, by peeling the base sheet
- an acrylic resin plate (P-16) with a photocatalyst layer on the outermost surface was prepared.
- Comparative Example 2 L a siloxane cross-linkable resin, is coated with an acrylic resin-based transparent ink manufactured by Showa Ink Co., Ltd. as a coating liquid for the adhesive layer (A-1) to a thickness of 5 m on the film, and then dried at 60 ° C. Then, a transfer sheet (T-1 13) was created.
- the above-mentioned transfer sheet (T-13) is laminated on the surface of the acrylic resin plate as the transfer object, laminated at 180 ° C under a pressure of 5 kg / cm 2 , and the base sheet is peeled off. Then, an acryl resin plate (P-17) having a photocatalyst layer on the outermost surface was prepared.
- test plates (P-1) to (P-17) obtained in the examples were evaluated by the following methods.
- the adhesiveness was evaluated by a cross-cut tape test specified in JIS K5400.
- the interval between cuts was 2 mm, and the number of squares was 25.
- the evaluation score was based on the criteria described in JIS K5400.
- the adhesion was measured by a grid tape method specified in JISK 5400, and the durability was evaluated.
- the evaluation score is the same as for the adhesiveness evaluation.
- hydrophilicity measurement sample After washing the photocatalyst layer on the sample surface with ethanol, it was dried at 60 ° C for 30 minutes to obtain a hydrophilicity measurement sample. After irradiating the sample with light having an ultraviolet intensity of 2 mWZ cm 2 for 24 hours using black light, the contact angle of the surface with distilled water was measured with a contact angle measuring instrument (Elma 360 S type).
- the evaluation criteria for hydrophilicity were as follows.
- Comparative Example 1 since the metal oxide gel or metal hydroxide gel was not contained in the photocatalyst layer, the transfer was incomplete and the appearance was impaired, as well as the adhesiveness and durability. Only those with poor properties and poor photocatalytic activity were obtained.
- Comparative Example 2 since a normal transfer resin was used for the adhesive layer, the resin was decomposed by the photooxidation action of the photocatalyst, and the film was peeled off in the durability test.
- a photocatalyst core in which photocatalyst particles are dispersed in silica sol on a 25 / m-thick polyethylene terephthalate film (Toyobo E5001) with no surface treatment Apply a coating solution X (Nippon Soda's birisoner NDC-130 C: solids concentration 8%) with a mouth coater at a rate of 2 OmZ to a film thickness of 0.3 m at 120 ° C. After drying, a PET film with a photocatalyst layer (A-3) was prepared.
- a polysiloxane-added siloxane-crosslinked acryl resin solution Y (Nippon Soda's bidover -NRC-300A: solid content concentration 10%) was coated at a rate of 2 OmZ using a roll coater to a film thickness of 3 ⁇ . After drying at 120 ° C, a transfer sheet (T_13) was prepared. Next, the molten polycarbonate is extruded from a die on a transfer sheet ( ⁇ -13), rapidly cooled by a cooling roll, and the base sheet is peeled off. P-18) was created.
- the transfer sheet (T_13) prepared in Example 16 was laminated on a cooling roll, and the transfer sheet was subjected to the cooling step together with the polystyrene resin.
- a polystyrene film (20-20) having the photocatalyst layer on the outermost surface was created.
- test plates ( ⁇ -18) to ( ⁇ -20) obtained in Examples 16 to 18 were evaluated by the method described above, and the results are shown in Table 2.
- Table 2 The characteristics of the test plates ( ⁇ -18) to ( ⁇ -20) obtained in Examples 16 to 18 were evaluated by the method described above, and the results are shown in Table 2.
- the photocatalyst layer is firmly adhered to the object to be transferred by using the siloxane cross-linkable resin containing 0.5 to 60% by weight of silicon as silicon dioxide in the adhesive layer.
- the strong photooxidation effect of the photocatalyst does not impair its adhesiveness, and in the long term, antibacterial, deodorant, release of harmful substances by photocatalyst, antifouling, antifogging, drip, etc. Function can be maintained. Further, a structure having a similar function can be obtained by transfer without using the above-mentioned adhesive layer and using a resin having specific properties.
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Abstract
Description
明細書 Specification
光触媒転写シ一ト Photocatalytic transfer sheet
技術分野: Technical field:
本発明は、 プラスチック製フィルム、 シート、 板、 成形品、 紙、 木材、 金属な どあらゆる基材に、 長期的な接着性に優れた光触媒膜を転写し、 光触媒の抗菌、 消臭、 有害物質の分解除去、 防汚、 防曇、 流滴等の機能を付与することが可能な 転写シート、 該転写シートを用いた光触媒層の転写方法、 及び、 該方法によって 得られた光触媒層を備えた成形品に関し、 さらに熱可塑性樹脂の形状が板状、 シ ート状、 フィルム状等のあらゆる形状の基体上に、 透明で、 膜ムラゃ不均一な干 渉縞などの外観不良がなく、 しかも長期的な接着性に優れた光触媒膜を連続的に 担持し、 光触媒の抗菌、 消臭、 有害物質の分解除去、 防汚、 防曇、 流滴等の機能 を付与することを可能にする光触媒層を有する樹脂の製造方法に関するものであ o 従来技術: The present invention transfers a photocatalytic film with excellent long-term adhesiveness to any substrate such as plastic film, sheet, board, molded product, paper, wood, metal, etc., and provides antibacterial, deodorant, and harmful substances for photocatalyst. Transfer sheet capable of imparting functions such as decomposition removal of soil, antifouling, antifogging, and droplets, a method for transferring a photocatalyst layer using the transfer sheet, and a photocatalyst layer obtained by the method. Regarding molded products, furthermore, there is no appearance defect such as transparent, film unevenness and non-uniform interference fringes on substrates of any shape such as plate, sheet and film of thermoplastic resin. A photocatalyst that carries a photocatalyst film with excellent long-term adhesiveness and can provide functions such as antibacterial, deodorant, decomposition and removal of harmful substances, antifouling, antifogging, and drip of the photocatalyst. Related to a method for producing a resin having a layer Oh o the prior art:
従来、 光触媒層をを有する樹脂の製造方法として、 樹脂上にシート成形法、 フ ローコ一ティング法、 ロールコーティング法、 グラビア印刷法、 スクリーン印刷 法、 スプレー吹き付け法、 ディップコーティング法、 刷毛塗り法、 スピンコーテ ィング法等の手法を用いて光触媒を含むコーティング液を塗布する方法が採用さ れてきたが、 中でもあらかじめ光触媒層を形成させた転写シ一トを用いた転写方 法は、 量産性に優れているため、 工業的に大量生産する場合に好適である。 特開平 9一 1 3 5 8 8 9号公報には、 フィルム上に積層された光半導体粉末を 含有する被膜を接合層を介して、 物品に転写して被覆層を形成させる方法が記載 されている。 上記、 光半導体粉末を含有する皮膜は、 接着バインダーを含有して いてもよく、 バインダーとしては、 合成樹脂、 又は、 無機物等が使用できること が記載されている。 更に、 接合層は、 物品上の表面でも、 光半導体粉末を含有す る皮膜上いずれか、 又は両方に形成することができ、 光半導体粉末を含有する皮 膜を物品上の表面に固定できるものであれば特に限定されず、 合成樹脂、 シリコ ーン樹脂、 その他の無機物等が例示されている。 特開平 9一 2 2 7 1 6 9号公報には、 シ一ト基材上に、 剥離層が形成され、 更 にその上に、 光触媒含有層が形成され更にその上に耐蝕性中間層が形成され、 更 にその上に、 感圧接着剤又は感熱接着剤が形成されている転写シートが記載され ている。 耐蝕性中間層には、 水ガラス、 コロイダルシリカ、 ポリオルガノシロキ サン、 フッ素系ポリマー、 アクリルシリコン樹脂、 リン酸亜鉛、 セメント等が好 適に利用できることが記載されている。 更に、 上記転写シートを用いて、 転写対 象物に圧着又は熱圧着することにより光触媒層を転写する方法が記載されている。 特開平 9一 2 2 0 7 3 4号公報には、 シート基材表面に離形材を塗布し更に重 ねて光触媒と接着材の混合物を塗布した転写シート、 又はシート基材表面に離形 材層、 接着材層とを順次重ねて塗布し、 接着材層に光触媒を埋設した転写シート が記載されている。 接着材としては、 ポリビニルアルコール、 デンプン、 アタリ ルェマルジヨンと水との混合物、 ゴム、 塩化ビニール、 フヱノール樹脂等が例示 されている。 また、 上記転写シートを金型内に配置し、 樹脂部材を射成型して成 形品の表面に光触媒を転写する方法が記載されている。 発明の開示: Conventionally, as a method for producing a resin having a photocatalyst layer, sheet molding, flow coating, roll coating, gravure printing, screen printing, spray spraying, dip coating, brush coating, etc. A method of applying a coating solution containing a photocatalyst using a method such as a spin coating method has been adopted, but a transfer method using a transfer sheet in which a photocatalyst layer has been formed in advance is excellent in mass productivity. Therefore, it is suitable for industrial mass production. Japanese Patent Application Laid-Open No. 91-35889 describes a method of forming a coating layer by transferring a coating containing an optical semiconductor powder laminated on a film to an article via a bonding layer. I have. It is described that the film containing the photosemiconductor powder may contain an adhesive binder, and as the binder, a synthetic resin or an inorganic substance can be used. Further, the bonding layer can be formed on the surface of the article, on the coating containing the optical semiconductor powder, or on both, and can fix the coating containing the optical semiconductor powder on the surface of the article. There is no particular limitation as long as it is a synthetic resin, a silicone resin, and other inorganic substances. JP-A-9-122771 discloses that a release layer is formed on a sheet substrate, a photocatalyst-containing layer is further formed thereon, and a corrosion-resistant intermediate layer is further formed thereon. A transfer sheet is described which is formed and further has a pressure sensitive adhesive or a heat sensitive adhesive formed thereon. It is described that water glass, colloidal silica, polyorganosiloxane, fluoropolymer, acrylic silicone resin, zinc phosphate, cement, and the like can be suitably used for the corrosion resistant intermediate layer. Furthermore, there is described a method of transferring a photocatalyst layer by press-bonding or thermo-compressing a transfer target using the transfer sheet. Japanese Patent Application Laid-Open No. 9-122473 discloses a transfer sheet in which a release material is applied to the surface of a sheet base material, and further overlaid, and a mixture of a photocatalyst and an adhesive is applied thereto, or a release material is applied to the surface of the sheet base material A transfer sheet is described in which a material layer and an adhesive layer are sequentially superposed and applied, and a photocatalyst is embedded in the adhesive layer. Examples of the adhesive include polyvinyl alcohol, starch, a mixture of atarilemargin and water, rubber, vinyl chloride, and phenol resin. Further, there is described a method in which the transfer sheet is placed in a mold, and a resin member is injection-molded to transfer a photocatalyst to the surface of a molded product. DISCLOSURE OF THE INVENTION:
光触媒を基体上に容易に固定する方法の一つとしては、 接着剤を用 、る方法が 提案されたきたが、 光触媒の強い光酸化作用で有機物が容易に酸化分解されてし まうため、 光触媒を転写対象物に転写 ·接着する目的で接着剤として有機系樹脂 を用いることは困難であり、 光触媒層の主成分は具体的には接着力の弱い無機物 で構成されていた。 また、 光触媒層を接着層を介して転写 ·接着する方法が提案 されているが、 この場合においても、 接着層に有機物を使用する場合には、 光触 媒層との界面で接着剤が光触媒により光酸化分解し、 短時間に接着力が低下し、 光触媒層が剥離してしまうという問題があつた。 An adhesive has been proposed as one of the methods for easily fixing the photocatalyst on the substrate.However, since the strong photooxidation of the photocatalyst can easily oxidize and decompose organic substances, the photocatalyst can be used. It is difficult to use an organic resin as an adhesive for the purpose of transferring and adhering to a transfer object, and the main component of the photocatalyst layer was specifically composed of an inorganic substance having a weak adhesive force. Also, a method of transferring and bonding the photocatalyst layer via an adhesive layer has been proposed. In this case as well, when an organic material is used for the adhesive layer, the adhesive at the interface with the photocatalyst layer is used. As a result, there is a problem that the photocatalytic layer is decomposed, and the adhesive strength is reduced in a short time, and the photocatalytic layer is peeled off.
光触媒層と有機接着層の間に光触媒の光酸化作用に強い耐蝕性中間層を設ける ことが特開平 9一 2 2 7 1 6 9号公報に提案されているが、 水ガラス、 コロイダ ルシリカ、 セメント、 リン酸亜鉛、 リン酸アルミニウム等の無機質の場合、 光触 媒層および接着層の両層との接着性が悪く、 転写が不完全であったり、 膜が剥離 してしまうという問題がある。 また、 ポリオルガノシロキサンを使用した場合、 膜に可とう性がなく、 しかも有機接着層と密着性が悪いために、 転写時や使用時 の機械的変形や熱熱膨張収縮で膜がひび割れたり、 剥離したりするという問題が ある。 また、 ポリフッ化ビニルやポリフッ化ビニルデン等フッ素樹脂の場合、 光 触媒層および有機質接着層の両層とも接着性が悪く、 転写時および使用時に剥離 してしまうという問題がある。 更に、 アクリルシリ コン樹脂を使用できる記載が あるものの、 具体的な例は記載されていない。 It has been proposed in Japanese Patent Application Laid-Open No. Hei 9-122771 to provide a corrosion-resistant intermediate layer that is strong against the photooxidation action of the photocatalyst between the photocatalyst layer and the organic adhesive layer. However, water glass, colloidal silica, cement In the case of inorganic materials such as zinc phosphate and aluminum phosphate, there is a problem that adhesion to both the photocatalytic layer and the adhesive layer is poor, transfer is incomplete, and the film is peeled off. When using polyorganosiloxane, Since the film is not flexible and has poor adhesion to the organic adhesive layer, there is a problem that the film is cracked or peeled due to mechanical deformation or thermal expansion / contraction during transfer or use. Further, in the case of a fluororesin such as polyvinyl fluoride or polyvinyldene fluoride, both the photocatalyst layer and the organic adhesive layer have poor adhesion, and there is a problem that they are peeled off during transfer and use. Furthermore, there is a description that an acrylic silicon resin can be used, but no specific example is described.
また、 光触媒層を転写させて光触媒層を有する樹脂を製造する方法は、 転写対 象物の基材の形状に係わらず光触媒層を形成させることができる点で他の方法よ りも有利であるが、 厳密に光触媒層の構造を制御して工業的に大量生産する方法 は知られていない。 特に光触媒層の膜厚は、 l ^ m以上にすると、 膜がひび割れ 等を起こすなど膜の耐摩耗性が低下するので、 1 以下にするのが好ましいと されているが、 膜厚を薄くすればするほど膜厚の少しの変化で干渉色の出現の原 因となるため、 外観を損なわない様に樹脂上に光触媒層を形成させるには、 膜厚 を高度に均一に制御する必要があり、 従来のように転写方法でそのような制御が されたことの記載はない。 In addition, the method of producing a resin having a photocatalyst layer by transferring the photocatalyst layer is more advantageous than other methods in that the photocatalyst layer can be formed regardless of the shape of the substrate to be transferred. However, there is no known method of strictly controlling the structure of the photocatalyst layer for industrial mass production. In particular, if the thickness of the photocatalyst layer is l ^ m or more, the wear resistance of the film decreases, such as cracking of the film. Therefore, it is preferable that the thickness be 1 or less. As the film thickness increases, a slight change in the film thickness may cause the appearance of interference colors.Therefore, in order to form a photocatalytic layer on a resin without impairing the appearance, it is necessary to control the film thickness highly uniformly. However, there is no description that such control was performed by the transfer method as in the related art.
本発明は基材フィルムまたはシートに光触媒層を設けた転写フィルムまたはシ ートで、 転写時に膜のひび割れや転写漏れがなく、 さらに、 転写した後の膜が優 れた長期接着性を示す転写フィルムまたはシー ト、 該転写フィルムまたはシー ト を用いた転写方法、 及び該転写方法により製造される成形品を提供することを目 的とし、 さらに透明性、 外観が良好で、 優れた長期接着性を有する光触媒層をあ らゆる基体上に均一に形成させる工業的製造方法を提供することを目的とする。 本発明者らは、 上記課題を解決するために鋭意研究した結果、 フィルムまたは シ—ト基材表面上に、光触媒層、接着層をこの順番で設けた構成で、接着層が 0. 5 - 6 0重量%のシリコ一ンを含有するシロキサン架橋型樹脂である転写フィル ムまたはシート、 フィルムまたはシート基材表面上に、 光触媒層、 無機層、 接着 層をこの順番で設けた構成で、 接着層が 0. 5〜 6 0重量%のシリ コーンを含む シロキサン架橋型樹脂である転写フィルムまたはシート、 又はフィルムまたはシ 一ト基材表面上に、 光触媒層、 無機層、 特定の性質を有する樹脂層をこの順番で 設けた転写フィルムまたはシートを用いることにより、 上記課題を解決すること ができることを見出し、 さらに光触媒層を有する転写フィルムまたはシ一ト上に 樹脂を押出しコ一ティング ·ラミネートすることにより、 また樹脂を押出し成形 する工程中に転写フィルムまたはシートを圧着することで、 透明性、 外観が良好 で、 優れた長期接着性を有する光触媒層を樹脂上に工業的に担持できることを見 出し、 本発明を完成するに至った。 The present invention is a transfer film or sheet provided with a photocatalyst layer on a base film or sheet. The transfer film has no cracks or transfer leakage at the time of transfer, and the transferred film exhibits excellent long-term adhesion. Aims to provide a film or sheet, a transfer method using the transfer film or sheet, and a molded article produced by the transfer method, and further have excellent transparency and appearance, and excellent long-term adhesion. It is an object of the present invention to provide an industrial production method for uniformly forming a photocatalyst layer having the above on all substrates. The present inventors have conducted intensive studies to solve the above-mentioned problems, and as a result, a photocatalyst layer and an adhesive layer were provided in this order on a film or sheet substrate surface, and the adhesive layer was 0.5-. Adhesion consists of a photocatalyst layer, an inorganic layer, and an adhesive layer provided on a transfer film or sheet, film or sheet base material, which is a siloxane cross-linkable resin containing 60% by weight of silicone, in this order. A photocatalyst layer, an inorganic layer, a resin having specific properties on a transfer film or sheet whose layer is a siloxane cross-linkable resin containing 0.5 to 60% by weight of silicone, or a film or sheet base material To solve the above problems by using a transfer film or sheet having layers provided in this order. The resin is extruded onto a transfer film or sheet having a photocatalyst layer, and is coated and laminated, and the transfer film or sheet is pressed during the process of extruding the resin. The present inventors have found that a photocatalyst layer having good properties and appearance and having excellent long-term adhesiveness can be industrially supported on a resin, thereby completing the present invention.
すなわち、 本発明は、 That is, the present invention
(構成 1) フィルム状又はシート状基材表面に、 光触媒層、 接着層がこの順番で 設けられた転写フィルムまたはシ一トにおいて、接着層が二酸化ケイ素換算で 0. 5〜60重量%のシリコーンを含有するシロキサン架橋型樹脂からなることを特 徵とする転写フィルム又はシ一ト、 (Constitution 1) In a transfer film or sheet having a photocatalyst layer and an adhesive layer provided in this order on the surface of a film or sheet substrate, the adhesive layer has a silicone content of 0.5 to 60% by weight in terms of silicon dioxide. A transfer film or sheet comprising a siloxane cross-linked resin containing
(構成 2) フィルム状又はシート状基材表面に、 光触媒層、 無機層、 接着層がこ の順番で設けられた転写フィルムまたはシートにおいて、 接着層が二酸化ケイ素 換算で 0. 5〜60重量%のシリコーンを含有するシロキサン架橋型樹脂からな ることを特徵とする転写フィルム又はシ一ト、 (Constitution 2) In a transfer film or sheet in which a photocatalyst layer, an inorganic layer, and an adhesive layer are provided in this order on the surface of a film or sheet substrate, the adhesive layer is 0.5 to 60% by weight in terms of silicon dioxide. A transfer film or sheet characterized by comprising a silicone-containing siloxane cross-linkable resin,
(構成 3) 接着層が二酸化ケイ素換算で 20〜40重量%のシリコーンを含有す るシロキサン架橋型樹脂からなることを特徴とする (構成 1) 又は (構成 2) に 記載されている転写フィルム又はシ一ト、 (Structure 3) The transfer film or the transfer film according to (Structure 1) or (Structure 2), wherein the adhesive layer is made of a siloxane cross-linkable resin containing 20 to 40% by weight of silicone in terms of silicon dioxide. Sheet,
(構成 4) 接着層上にプライマー層を設けたことを特徴とする (構成 1) 〜 (構 成 3) のいずれかに記載の転写フィルムまたはシート、 (Constitution 4) The transfer film or sheet according to any one of (Constitution 1) to (Constitution 3), wherein a primer layer is provided on the adhesive layer.
(構成 5) プライマー層の膜厚が 0. 05〜5 mの範囲であることを特徴とす る (構成 4) に記載の転写フィルムまたはシート、 (Structure 5) The transfer film or sheet according to (Structure 4), wherein the thickness of the primer layer is in the range of 0.05 to 5 m.
(構成 6) プライマ一層が、 数平均分子量が 20, 000以上の樹脂からなるこ とを特徴とする (構成 4) 又は (構成 5) に記載の転写シート、 (Structure 6) The transfer sheet according to (Structure 4) or (Structure 5), wherein the primer layer is made of a resin having a number average molecular weight of 20,000 or more.
(構成 7) プライマ一層が、 数平均分子量が 20, 000以下であり、 かつガラ ス転移点が一 10〜100°Cである樹脂からなることを特徴とする (構成 4) 又 は (構成 5) に記載の転写フィルムまたはシート、 (Structure 7) The primer layer is characterized by comprising a resin having a number average molecular weight of 20,000 or less and a glass transition point of 110 to 100 ° C. (Structure 4) or (Structure 5) Transfer film or sheet according to
(構成 8) 樹脂が、 アクリルシリコン樹脂、 またはエポキシシリコン樹脂である ことを特徴とする (構成 6) または (構成 7) に記載の転写フィルムまたはシー 卜、 (構成 9) シリコーンが式 (I) (Structure 8) The transfer film or sheet according to (Structure 6) or (Structure 7), wherein the resin is an acrylic silicone resin or an epoxy silicone resin. (Structure 9) Silicone has the formula (I)
S i C 1 n! (OH) n^1 n3 (OR2) n4 - (I) S i C 1 n! (OH) n ^ 1 n 3 (OR 2) n 4 - (I)
〔式中、 R1は (ァミノ基、 カルボキシル基、 または塩素原子で置換されてもよ い) 炭素数 1〜8のアルキル基を表し、 R2は、 炭素数 1〜8のアルキル基もし くはアルコキシ基で置換されてもよい炭素数 1〜8のアルキル基を表し、 は 0から 2の整数を表し、 n4は 2から 4の整数であり、 かつ 1^+ 112+ 113+ 114 = 4の整数を表す。〕 で表される化合物の重縮合反応生成物であるポリシロキサン であることを特徴とする (構成 1) 〜 (構成 8) のいずれかに記載の転写フィル ムまたはシー ト、 [Wherein, R 1 represents an alkyl group having 1 to 8 carbon atoms (which may be substituted with an amino group, a carboxyl group, or a chlorine atom), and R 2 represents an alkyl group having 1 to 8 carbon atoms. Represents an alkyl group having 1 to 8 carbon atoms which may be substituted with an alkoxy group, represents an integer of 0 to 2, n 4 is an integer of 2 to 4, and 1 ^ + 112 + 113 + 114 = Represents an integer of 4. A transfer film or sheet according to any one of (Configuration 1) to (Configuration 8), which is a polysiloxane that is a polycondensation reaction product of the compound represented by the following formula:
(構成 10) 接着層のシロキサン架橋型樹脂の樹脂部が、 アクリル樹脂、 ェポキ シ樹脂、 アクリルシリコン樹脂、 又はエポキシシリコン樹脂であることを特徴と する (構成 1) 〜 (構成 9) のいずれかに記載の転写フィルムまたはシート、 (Configuration 10) The resin portion of the siloxane cross-linkable resin of the adhesive layer is an acrylic resin, an epoxy resin, an acrylic silicon resin, or an epoxy silicon resin, wherein any of (Configuration 1) to (Configuration 9) is provided. The transfer film or sheet described in
(構成 1 1) フィルム状又はシ— ト状基材表面に、 光触媒層、 無機層、 数平均分 子量が 20, 000以上の樹脂及び または数平均分子量が 20, 000以下で あり、 かつガラス転移点が一 10〜100°Cである樹脂からなる層がこの順番で 設けられたことを特徴とする転写フィルムまたはシート、 (Structure 11) A photocatalytic layer, an inorganic layer, a resin having a number average molecular weight of 20,000 or more and / or a number average molecular weight of 20,000 or less, and a glass on the surface of a film-like or sheet-like substrate. A transfer film or sheet, wherein a layer made of a resin having a transition point of 10 to 100 ° C is provided in this order,
(構成 12) 樹脂が、 アクリルシリ コン樹脂、 またはエポキシシリコン樹脂であ ることを特徴とする (構成 1 1) に記載の転写フィルムまたはシー ト、 (Configuration 12) The transfer film or sheet according to (Configuration 11), wherein the resin is an acrylic silicon resin or an epoxy silicon resin.
(構成 13) 無機層が、 式 (II) (Structure 13) The inorganic layer is represented by the formula (II)
nS i (OR 4— n … (II) nS i (OR 4 — n … (II)
(式中、 Rは炭素数 1〜4の置換基を有していてもよいアルキル基を表わし、 R !は、 炭素数 1〜 5の置換基を有していもよいアルキル基または炭素数 1〜 4の 置換基を有していてもよいァシル基を表わし、 nは 0又は 1を表わす。 )で表わ されるオルガノアルコキシシランもしくはアルコキシシランの加水分解 ·縮合物 を主成分とする無機塗膜であることを特徴とする (構成 2) 〜 (構成 12) のい ずれかに記載の転写フィルムまたはシ一ト、 (Wherein, R represents an alkyl group which may have a substituent having 1 to 4 carbon atoms, and R! Is an alkyl group which may have a substituent having 1 to 5 carbon atoms or 1 carbon atom. And n represents 0 or 1. n) represents an organoalkoxysilane or a hydrolyzed / condensed product of an alkoxysilane represented by the following formula: A transfer film or sheet according to any one of (Configuration 2) to (Configuration 12),
(構成 14) 光触媒層が、 金属酸化物ゲル及び/または金属水酸化物ゲルを 25 〜95重量%含有する光触媒粒子複合体であることを特徴とする(構成 1)〜(構 成 13) のいずれかに記載の転写フィルムまたはシート、 (構成 15)光触媒層中の金属酸化物ゲル及び 又は金属水酸化物ゲルが、珪素、 アルミニウム、 チタニウム、 ジルコニウム、 マグネシウム、 二オビゥム、 タンタ ラム、 タングステン、 錫の中から選ばれた 1種もしくは 2種以上の金属酸化物ゲ ルもしくは金属水酸化物ゲルであることを特徴とする (構成 14) に記載の転写 フィルムまたはシート、 (Configuration 14) The photocatalyst layer is a photocatalyst particle composite containing 25 to 95% by weight of a metal oxide gel and / or a metal hydroxide gel. Transfer film or sheet according to any of the above, (Constitution 15) The metal oxide gel and / or metal hydroxide gel in the photocatalyst layer is one or two selected from silicon, aluminum, titanium, zirconium, magnesium, diobium, tantalum, tungsten, and tin. A transfer film or sheet according to (Configuration 14), which is at least one kind of metal oxide gel or metal hydroxide gel;
(構成 16) 光触媒層の厚みが、 1 以下であることを特徴とする (構成 1) 〜 (構成 15) のいずれかに記載の転写フィルムまたはシート、 (Structure 16) The transfer film or sheet according to any one of (Structure 1) to (Structure 15), wherein the thickness of the photocatalyst layer is 1 or less.
(構成 17) 無機層および光触媒層の合計の厚みが、 1 m以下であることを特 徴とする (構成 2) 〜 (構成 16) のいずれかに記載の転写フィルムまたはシー 卜、 (Structure 17) The transfer film or sheet according to any one of (Structure 2) to (Structure 16), wherein the total thickness of the inorganic layer and the photocatalyst layer is 1 m or less.
(構成 18)基材と光触媒層との間に剥離層を設けることを特徴とする(構成 1) ~ (構成 17) のいずれかに記載の転写フィルムまたはシート、 (Constitution 18) The transfer film or sheet according to any one of (Constitution 1) to (Constitution 17), wherein a release layer is provided between the substrate and the photocatalyst layer.
(構成 19) (構成 1) ~ (構成 18) のいずれかに記載の転写フィルム又はシ 一トを準備する工程、 前記転写フィルムまたはシー トの接着層面を転写対象物表 面に押し付ける工程、 及び転写フイルムまたはシート中の基材を剥離させる工程 を含むことを特徴とする光触媒層の転写方法、 (Structure 19) A step of preparing the transfer film or sheet according to any one of (Structure 1) to (Structure 18), a step of pressing an adhesive layer surface of the transfer film or sheet against a surface of a transfer target, and A method for transferring a photocatalyst layer, comprising a step of peeling a substrate in a transfer film or a sheet,
(構成 20) 前記転写フィルムまたはシー トの接着層面を転写対象物表面に押し 付ける工程が、 前記転写フィルムまたはシー卜の接着層面を転写対象物表面に熱 を加えながら押し付ける工程であることを特徴とする (構成 19) に記載の光触 媒層の転写方法、 (Constitution 20) The step of pressing the adhesive layer surface of the transfer film or sheet against the surface of the transfer object is a step of pressing the adhesive layer surface of the transfer film or sheet against the surface of the transfer object while applying heat. The method for transferring a photocatalyst layer according to (Configuration 19),
(構成 21) 前記転写フィルムまたはシー卜の接着層面を転写対象物表面に押し 付ける工程中に、 接着層のシロキサン架橋型樹脂の架橋反応を進行させることを 特徴とする (構成 19) または (構成 20) に記載の光触媒層の転写方法、 (Structure 21) The structure according to (Structure 19) or (Structure), wherein a cross-linking reaction of the siloxane cross-linkable resin of the adhesive layer proceeds during the step of pressing the adhesive layer surface of the transfer film or the sheet against the surface of the transfer object. 20) The method for transferring a photocatalyst layer according to
(構成 22) 転写対象物の形状が、 板状、 シート状、 またはフィルム状であるこ とを特徴とする (構成 19) 〜 (構成 21) のいずれかに記載の光触媒層の転写 方法、 (Structure 22) The method for transferring a photocatalyst layer according to any one of (Structure 19) to (Structure 21), wherein the shape of the transfer target is a plate, a sheet, or a film.
(構成 23) (構成 19) 〜 (構成 22) のいずれかに記載の方法によって得ら れた光触媒層を備えた成形品において、 紫外線強度 3 mWZ cm 2の光を 500 時間照射後、 J I S K 5400に規定の碁盤目テープ法による光触媒層の接着 性が、 評価点数 6点以上であることを特徴とする光触媒層を備えた成形品、 (構成 24) (構成 19) 〜 (構成 22) のいずれかに記載の方法によって得ら れた光触媒層を備えた成形品において、 波長 550 nmの光に対する、 光触媒層 と接着層もしくは光触媒層と無機層と接着層の合計の全光線透過率が 70%以上 であることを特徴とする光触媒層を備えた成形品、 (Structure 23) A molded article provided with a photocatalytic layer obtained by the method according to any one of (Structure 19) to (Structure 22) is irradiated with light having an ultraviolet intensity of 3 mWZ cm 2 for 500 hours, and then subjected to JISK 5400 Of photocatalyst layer by grid tape method specified in Japan A molded article provided with a photocatalyst layer having an evaluation score of 6 or more; (Constitution 24) A photocatalyst layer obtained by the method according to any one of (Constitution 19) to (Constitution 22) A molded article provided with a photocatalyst layer, characterized in that the total light transmittance of the photocatalyst layer and the adhesive layer or the total light transmittance of the photocatalyst layer, the inorganic layer and the adhesive layer to light having a wavelength of 550 nm is 70% or more. Molded products,
(構成 25) 光触媒層を有する転写フィルムまたはシ一ト上で溶融した樹脂を押 出コーティングし連続的に製造することを特徴とする光触媒層を有する樹脂構造 体の製造方法、 (Structure 25) A method for producing a resin structure having a photocatalyst layer, wherein a resin melted on a transfer film or a sheet having a photocatalyst layer is extrusion-coated and continuously produced,
(構成 26) 光触媒層を有する転写フィルムまたはシ一トと転写される基体の間 に溶融樹脂を押出しラミネートし連続的に製造することを特徴とする光触媒層を 有する樹脂構造体の製造方法、 (Structure 26) A method for producing a resin structure having a photocatalyst layer, comprising continuously extruding and laminating a molten resin between a transfer film or a sheet having a photocatalyst layer and a substrate to be transferred,
(構成 27) 溶融押出しされた樹脂を冷却ロール上で冷却する工程中に光触媒層 を有する転写フィルムまたはシートを圧着させて連続的に製造することを特徴と する光触媒層を有する樹脂構造体の製造方法、 (Structure 27) Manufacturing of a resin structure having a photocatalyst layer, characterized in that the melt-extruded resin is continuously manufactured by pressing a transfer film or sheet having the photocatalyst layer during the step of cooling on a cooling roll. Method,
(構成 28) 光触媒層を有する転写フィルムまたはシートが、 (構成 1) 〜 (構 成 18) のいずれかに記載の転写フィルムまたはシ一トであることを特徴とする (Constitution 28) The transfer film or sheet having a photocatalyst layer is the transfer film or sheet according to any one of (Constitution 1) to (Constitution 18).
(構成 26) 〜 (構成 27) のいずれかに記載の光触媒層を有する樹脂構造体の 製造方法、 (Structure 26) A method for producing a resin structure having a photocatalyst layer according to any one of (Structure 26) to (Structure 27),
(構成 29) 樹脂構造体の樹脂がポリカーボネート樹脂、 アクリル樹脂、 ポリ塩 化ビニル樹脂、 ポリスチレン樹脂であることを特徴とする (構成 25) 〜 (構成 28) のいずれかに記載の光触媒層を有する樹脂の製造方法、 (Structure 29) The photocatalyst layer according to any one of (Structure 25) to (Structure 28), wherein the resin of the resin structure is a polycarbonate resin, an acrylic resin, a polyvinyl chloride resin, or a polystyrene resin. Resin manufacturing method,
(構成 30) 樹脂構造体の樹脂の形状が板状、 シート状、 又はフィルム状である ことを特徴とする (構成 25) 〜 (構成 29) のいずれかに記載の光触媒層を有 する樹脂構造体の製造方法、 (Structure 30) The resin structure having a photocatalyst layer according to any one of (Structure 25) to (Structure 29), wherein the resin of the resin structure has a plate shape, a sheet shape, or a film shape. Body manufacturing method,
に関する。 About.
光触媒層を有する転写フィルムまたはシートの構造は、 転写する構造体を設置 するための基材 1表面上に、 光触媒層 2単独の構造、 光触媒層 2、 接着層 3をこ の順番に積層した構造、 光触媒層 2、 無機層 4、 及び接着層 3をこの順番に積層 した構造、 光触媒層 2、 無機層 4、 数平均分子量が 20, 000以上の樹脂及び または数平均分子量が 2 0 , 0 0 0以下、かつガラス転移点が一 1 0〜1 0 0 °C である樹脂からなる層 5をこの順番に積層した構造等を例示することができ、 転 写対象物との密着性を考慮すると図 1〜3に示すような構造体が好まし ^、。 The structure of the transfer film or sheet having a photocatalyst layer is a structure in which the structure of the photocatalyst layer 2 alone, the photocatalyst layer 2, and the adhesive layer 3 are laminated in this order on the surface of the substrate 1 on which the structure to be transferred is installed. , A photocatalyst layer 2, an inorganic layer 4, and an adhesive layer 3 laminated in this order, a photocatalyst layer 2, an inorganic layer 4, a resin having a number average molecular weight of 20,000 or more, Alternatively, a structure in which layers 5 made of a resin having a number average molecular weight of not more than 200 and a glass transition point of 110 to 100 ° C. are laminated in this order can be exemplified. Considering the adhesion to the object to be photographed, a structure as shown in Figs. 1-3 is preferred ^ ,.
基材 Base material
本発明において使用されるフィルム状またはシ一ト状基材については特に限定 されるものではなく、 有機材料、 無機材料またはこれらの複合材料から適宜選択 することができ、 具体的には、 ポリエチレン、 ポリプロピレン、 アクリル樹脂、 ポリエチレンテレフタレート、 ポリ塩化ビニル、 ポリカーボネート、 ポリスチレ ン等を例示することができる。 基材の厚さは、 3 m~ 5 0 0 mが範囲が好ま しく、 さらに 1 6 i m〜 1 0 0 mの範囲が特に好ましい。 The film-like or sheet-like base material used in the present invention is not particularly limited, and can be appropriately selected from an organic material, an inorganic material, or a composite material thereof. Examples thereof include polypropylene, acrylic resin, polyethylene terephthalate, polyvinyl chloride, polycarbonate, and polystyrene. The thickness of the substrate is preferably in the range of 3 m to 500 m, and more preferably in the range of 16 im to 100 m.
また、基材の表面は滑らかであることが好ましく、特に膜厚のバラツキが 1 0 % 以下の基材が、 膜厚が均一な光触媒層を形成するのに好ましい。 接着層としては、 二酸化ケイ素換算で 0 . 5〜6 0重量%のシリコーンを含有 するシロキサン架橋型樹脂であればどのようなものでも使用できる。 シロキサン 架橋型樹脂としては、 アクリル樹脂、 エポキシ樹脂、 ポリエステル樹脂、 ウレタ ン樹脂、 アルキッ ド樹脂などが使用できるが、 アクリル樹脂、 エポキシ樹脂が転 写対象物との接着性に最も優れている。 また、 樹脂の一部にシロキサン結合、 シ ラザン結合、 炭素—ゲイ素結合等を介して、 ビニルアルコキシシラン等を用いて 直接主鎖中に、又は、不飽和結合に対してヒ ドロシリレーションすることにより、 架橋可能なアルコキシシラン部分、 又はハロゲノシラン部分を導入したァクリル シリコン樹脂、 又はエポキシシリコン樹脂を好適に用いることもできる。 The surface of the substrate is preferably smooth, and a substrate having a thickness variation of 10% or less is particularly preferable for forming a photocatalytic layer having a uniform thickness. As the adhesive layer, any siloxane crosslinkable resin containing 0.5 to 60% by weight of silicone in terms of silicon dioxide can be used. Acrylic resin, epoxy resin, polyester resin, urethane resin, alkyd resin, etc. can be used as the siloxane cross-linkable resin, but acrylic resin and epoxy resin have the best adhesion to the object to be transferred. Hydrosilylation of a part of the resin directly into the main chain using vinylalkoxysilane, etc., through a siloxane bond, silazane bond, carbon-gay bond, etc., or to an unsaturated bond Accordingly, an acryl silicone resin or an epoxy silicone resin into which a crosslinkable alkoxysilane moiety or a halogenosilane moiety has been introduced can also be suitably used.
シリコーンを含有するシロキサン架橋型樹脂中の有機部分の割合は、 4 0重 量%以上が好ましい。 この場合有機部分とは、 二酸化ケイ素換算されたシリコ一 ン以外の部分を表わす。 4 0重量%未満だと転写対象物への転写が上手くいかな かったり、 膜の長期接着性が低下したりする。 The proportion of the organic moiety in the silicone-containing siloxane crosslinkable resin is preferably at least 40% by weight. In this case, the organic portion means a portion other than silicon equivalent in terms of silicon dioxide. If the amount is less than 40% by weight, the transfer to the transfer target will not be successful, and the long-term adhesiveness of the film will decrease.
また、 シロキサン架橋型樹脂中の架橋点は多い樹脂の方が、 光触媒層もしくは 無機層との接着性が良くなる。 この場合、 架橋点とは、 例えば、 アクリル樹脂中 のエステル又はカルボン酸、 エポキシ樹脂中の水酸基、 不飽和結合、 アルコキシ シラン部分等を例示することができる。 In addition, a resin having a larger number of cross-linking points in the siloxane cross-linkable resin has better adhesion to the photocatalyst layer or the inorganic layer. In this case, the crosslinking point is, for example, an ester or carboxylic acid in an acrylic resin, a hydroxyl group, an unsaturated bond, an alkoxy in an epoxy resin. A silane portion and the like can be exemplified.
シリコーンを架橋剤としてシロキサン架橋型樹脂に添加すると、 光触媒層もし くは無機層との接着性が向上する。添加量としては、二酸化ケイ素に換算して 0. 5〜 6 0重量%の範囲であり、 特に 2 0〜4 0重量%の範囲の時に最も効果が現 れる。 この場合、 シロキサン架橋型樹脂中にゲイ素分が含まれる場合、 両者をあ わせた重量比率を表わす。 シリコーンの量が 6 0重量%を超えると、 転写対象物 との接着性が悪くなる。 When silicone is added as a cross-linking agent to the siloxane cross-linkable resin, the adhesion to the photocatalyst layer or the inorganic layer is improved. The amount of addition is in the range of 0.5 to 60% by weight in terms of silicon dioxide, and the effect is most effective when it is in the range of 20 to 40% by weight. In this case, when a siloxane component is contained in the siloxane cross-linkable resin, the weight ratio indicates a combination of the two. If the amount of the silicone exceeds 60% by weight, the adhesiveness to the transfer object is deteriorated.
シリコーンとしては、 式 (I) で表わされる化合物の重縮合反応生成物である ポリシロキサンが特に好ましい。 式 (I) 中、 R ま、 (ァミノ基、 カルボキシル 基、 または塩素原子で置換されてもよい) 炭素数 1〜 8のアルキル基を表す。 具 体的には、 メチル基、 ェチル基、 n—プロピル基、 イソプロピル基、 n —ブチル 基、 t —ブチル基、 メ トキシメチル基、 ジメチルァミノメチル基、 メ トキシェチ ル基、 ジメチルアミノエチル基、 クロ口ェチル基、 クロ口プロピル基、 ァセトキ ェチル基等を例示することができる。 As the silicone, polysiloxane which is a polycondensation reaction product of the compound represented by the formula (I) is particularly preferred. In the formula (I), R represents an alkyl group having 1 to 8 carbon atoms (which may be substituted by an amino group, a carboxyl group, or a chlorine atom). Specifically, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, methoxymethyl, dimethylaminomethyl, methoxethyl, dimethylaminoethyl, Examples thereof include a chloroethyl group, a chloropropyl group, and an acetoethyl group.
R2は炭素数 1〜 8のアルキル基もしくはアルコキシ基で置換された炭素数 1 〜 8のアルキル基を表し、 具体的にはメチル基、 ェチル基、 n—プロピル基、 ィ ソプロピル基、 n—ブチル基、 t—ブチル基、 メ トキシメチル基、 メ トキシェチ ル基、 ァセトキエチル基等を例示することができる。 R 2 represents an alkyl group having 1 to 8 carbon atoms substituted with an alkyl group having 1 to 8 carbon atoms or an alkoxy group, and specifically, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n- Examples thereof include a butyl group, a t-butyl group, a methoxymethyl group, a methoxethyl group, and an acetoethyl group.
式 (I) で表わされる化合物として、 具体的には、 メチルトリメ トキシシラン、 メチルトリエトキシシラン、 メチルトリイソプロボキシシラン、 メチルトリ t 一 ブトキシシラン、 ェチルトリメ トキシシラン、 ェチルトリエトキシシラン、 ェチ ルトリイソプロボキシシラン、 ェチルトリ t —ブトキシシラン、 n—プロピルト リメ トキシシラン、 n—プロピルトリエトキシシラン、 n —プロピルトリイソプ ロボキシシラン、 n—プロピルトリ t —ブトキシシラン、 n—へキシルトリメ ト キシシラン、 n—へキシルトリエトキシシラン、 n—へキシルトリイソプロポキ シシラン、 n—へキシノレトリ tーフ 卜キシシラン、 テトラメ トキシシラン、 テト ラエトキシシラン、 テトラブトキシシラン、 ジメ トキシジエトキシシラン、 ジメ チルジメ トキシシラン、 ジメチルジェトキシシラン、 ビニルトリメ トキシシラン、 ビニルトリエトキシシラン、 ビニルトリイソプロボキシシラン、 ビニルトリ t 一 ブトキシシラン、 トリフルォロプロビルトリメ トキシシラン、 トリフルォロプロ ピルトリエトキシシラン、 トリフルォロプロピルトリイソプロボキシシラン、 ト リフルォロプロピルトリ t—ブトキシシラン、 7—グリシドキシプロピルメチル ジメ トキシシラン、 ァ一グリシドキシプロピルメチルジェトキシシラン、 7—グ リシドキシプロピルトリメ トキシシラン、 7—グリシドキシプロピルトリエトキ シシラン、 7—グリシドキシプロピルトリイソプロボキシシラン、 ァ一グリシド キシプロピルトリ t—ブトキシシラン、 7—アミノプロピルメチルジメ トキシシ ラン、 ァ一ァミノプロピルメチルジェトキシシラン、 ァーァミノプロピルトリメ トキシシラン、 ァ一ァミノプロピルトリエトキシシラン、 ァ一ァミノプロビルト リイソプロボキシシラン、 7—ァミノプロピルトリ t —ブトキシシラン、 7—メ ルカプトプロピルメチルジメ トキシシラン、 7—メルカプトプロピルメチルジェ トキシシラン、 ァーメルカプトプロビルトリメ トキシシラン、 ァ _メルカプトプ 口ピルトリエトキシシラン、 7—メルカプトプロピルトリイソプロボキシシラン、 ァ一メルカプトプロピルトリ t 一ブトキシシラン、 β— ( 3 , 4—エポキシシク 口へキシル) ェチルトリメ トキシシラン、 β— ( 3, 4一エポキシシクロへキシ ル) ェチルトリエトキシシラン等を例示することができる。 Specific examples of the compound represented by the formula (I) include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-butoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, and ethyltriisopropoate. Xysilane, ethyltri-t-butoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane, n-hexyltrimethoxysilane, n-hexyltri Ethoxysilane, n-hexyltriisopropoxysilane, n-hexynoletrito-ethoxysilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane, dimethyl Dimethoxy silane, dimethyl ethoxy silane, vinyl trimethoxy silane, vinyl triethoxy silane, vinyl triisopropoxy silane, vinyl tri Butoxysilane, trifluoropropyl trimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane, 7-glycidoxypropylmethyl dimethoxysilane, fragrance Sidoxypropylmethyl ethoxysilane, 7-glycidoxypropyltrimethoxysilane, 7-glycidoxypropyltriethoxysilane, 7-glycidoxypropyltriisopropoxysilane, α-glycidoxypropyltrit-butoxysilane, 7 - aminopropyl methyl dimethyl Tokishishi orchid, § one § amino propyl methyl jet silane, § chromatography § amino propyl trimethinecyanine Tokishishiran, § one § amino propyl triethoxysilane, § one Aminopurobiruto Riiso Roboxy silane, 7-Aminopropyltri-t-butoxysilane, 7-Mercaptopropylmethyldimethoxysilane, 7-Mercaptopropylmethylethoxysilane, Amercaptopropyltrimethoxysilane, A_Mercaptopyl Pyrtriethoxysilane, 7— Mercaptopropyltriisopropoxysilane, α-mercaptopropyltri-t-butoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxy Examples include silane and the like.
上記例示したシラン化合物以外にも、 メチルトリクロルシラン、 メチルトリブ 口ムシラン、 ェチルトリクロルシラン、 ェチルトリブロムシラン、 η—プロピル トリクロルシラン、 η—プロピルトリブロムシラン、 η—へキシルトリクロルシ ラン、 η—へキシルトリブロムシラン、 η—デシルトリクロ口レシラン、 η—デ シルトリブロムシラン、 η—デシルトリメ トキシシラン、 η—デシルトリエトキ シシラン、 η—デシルトリイソプロボキシシラン、 η—デシルトリ t —ブトキシ シラン、 n—ォクタデシルトリクロルシラン、 n—ォクタデシルトリブ口ムシラ ン、 n—ォクタデシルトリメ トキシシラン、 n—才クタデシルトリエトキシシラ ン、 n—ォクタデシルトリイソプロボキシシラン、 n—ォクタデシルトリ tーブ トキシシラン、 フエニルトリクロルシラン、 フエニルトリブロムシラン、 フエ二 ルトリメ トキシシラン、 フヱニルトリエトキシシラン、 フヱニルトリイソプロボ キシシラン、 フエニルトリ t —ブトキシシラン、 テトラクロルシラン、 テトラブ 口ムシラン、 ジメチルジクロルシラン、 ジメチルジブ口ムシラン、 ジフエ二ルジ クロルシラン、 ジフエニルジブ口ムシラン、 ジフエ二ルジメ トキシシラン、 ジフ ェニルジェトキシシラン、 フエニルメチルジクロルシラン、 フエニルメチルジブ 口ムシラン、 フエ二ルメチルジメ トキシシラン、 フヱニルメチルジェトキシシラ ン ; トリクロルヒドロシラン、 トリブロムヒドロシラン、 トリメ トキシヒ ドロシ ラン、 トリエトキシヒ ドロシラン、 トリイソプロボキシヒ ドロシラン、 トリ t— ブトキシヒ ドロシラン、 ビニルトリクロルシラン、 ビニルトリブロムシラン、 ト リフルォロプロピルトリクロルシラン、トリフルォロプロピルトリブロムシラン、 7—メタァクリロキシプロピルメチルジメ トキシシラン、 ァーメタァクリロキシ プロピルメチルジェトキシシラン、 7—メタアタリロキシプロピルトリメ トキシ シラン、 7—メタァクリロキシプロピルトリエトキシシラン、 7—メタァクリロ キシプロピルトリイソプロボキシシラン、 7—メタァクリロキシプロピルトリ t —ブトキシシラン等のシラン化合物を例示することができる。 In addition to the silane compounds exemplified above, methyltrichlorosilane, methyltributanesilane, ethyltrichlorosilane, ethyltribromosilane, η-propyltrichlorosilane, η-propyltribromosilane, η-hexyltrichlorosilane, η —Hexyltribromosilane, η-decyltrichlorosilane, η-decyltribromosilane, η-decyltrimethoxysilane, η-decyltriethoxysilane, η-decyltriisopropoxysilane, η-decyltri-t-butoxysilane, n— N-octadecyltrichlorosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltrit-silane Butoxysilane, Enyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane, tetrachlorosilane, tetrabutylsilane, dimethyldichlorosilane, dimethyldib Mouth silane, diphenyl Chlorosilane, diphenyldimethoxysilane, diphenyldimethoxysilane, diphenylethoxysilane, phenylmethyldichlorosilane, phenylmethyldimethoxysilane, phenylmethyldimethoxysilane, phenylmethylethoxysilane; trichlorohydrosilane, tribromo Hydrosilane, trimethoxyhydroxysilane, triethoxyhydroxysilane, triisopropoxyhydrosilane, trit-butoxyhydroxysilane, vinyltrichlorosilane, vinyltribromosilane, trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, 7-meta Acryloxypropylmethyldimethoxysilane, methacryloxypropylmethyljetoxysilane, 7-metaaryloxypropyltrimethy Examples thereof include silane compounds such as xylene, 7-methacryloxypropyltriethoxysilane, 7-methacryloxypropyltriisopropoxysilane, and 7-methacryloxypropyltri-t-butoxysilane.
接着層中に耐久性を向上させる目的で光安定化剤及び 又は紫外線吸収剤等を 混合することができる。 使用できる光安定化剤としては、 ヒンダ一ドアミン系が 良いが、 その他の物でも使用可能である。 紫外線吸収剤としてはトリァゾール系 などが使用できる。 A light stabilizer and / or an ultraviolet absorber can be mixed in the adhesive layer for the purpose of improving durability. As a light stabilizer which can be used, a hindered amine type is good, but other substances can also be used. As the ultraviolet absorber, a triazole type or the like can be used.
シロキサン架橋反応を制御する目的で、 シランカップリング剤、 酸塩基触媒、 金属キレート触媒等を添加することもできる。 For the purpose of controlling the siloxane crosslinking reaction, a silane coupling agent, an acid-base catalyst, a metal chelate catalyst or the like can be added.
接着性や操作性を良くする目的で、 5重量%以下の界面活性剤や消泡剤などの 各種添加剤を添加することができる。 For the purpose of improving adhesiveness and operability, various additives such as a surfactant and an antifoaming agent of 5% by weight or less can be added.
接着層の厚さは、 1 m以上、 好ましくは 3 m以上が望ましい。 l i m未満 だと、 転写が困難になり、 更に転写後の長期接着性が悪くなる。 The thickness of the adhesive layer is 1 m or more, preferably 3 m or more. If it is less than l im, the transfer becomes difficult, and the long-term adhesion after the transfer deteriorates.
接着層を光触媒層が塗布された基材シート上に塗布するには、 グラビア印刷な ど各種印刷法、 ロールコーティング法、 フローコーティング法、 シート成形法、 スプレー吹き付け法、 ディ ップコーティ ング法、 スピンコーティング法等の方法 が使用できる。 To apply the adhesive layer on the substrate sheet coated with the photocatalyst layer, various printing methods such as gravure printing, roll coating method, flow coating method, sheet forming method, spray spraying method, dip coating method, spin coating method A method such as the law can be used.
乾燥する温度は、 基材シート材質、 溶媒や樹脂の種類によっても異なるが、一 般的に 1 5 0 °C以下が好ましい。 The drying temperature varies depending on the material of the base sheet, the type of the solvent and the resin, but is generally preferably 150 ° C. or lower.
転写および転写対象物との接着性を向上させる目的で、 接着層上に更にブラィ マー層を設けるのが好ましい。 プライマー層としては、 転写対象物の材質に応じ て、 通常使用されているものであれば、 どのような物でも使用できるが、 中でも 特に、 数平均分子量が 2 0, 0 0 0以上の樹脂、 または数平均分子量が 2 0, 0 0 0以下、 かつガラス転移点が一 1 0〜1 0 0 °C、 好ましくは 1 0〜8 0。C、 さ らに好ましくは 3 0〜8 0 °Cの範囲である樹脂を用いるのが好ましい。 数平均分 子量が 2 0, 0 0 0以上の樹脂の場合、 そのガラス転移点を制限されることはな い。 さらに、 室温〜 6 0 °Cで乾燥した塗膜の伸び率が、 3 0〜1 5 0 %の範囲の 樹脂を用いるのが好ましく、 特に 5 0〜1 3 0 %の範囲の樹脂が好ましい。 ブラ イマ一層に用いられる材質として、具体的には、ポリビニルイソブチルエーテル、 アクリルエステル系樹脂、 塩化ォレフィ ン系樹脂、 ゴム系樹脂、 ポリエチレン— 酢酸ビニル共重合体等の感圧接着剤、 又はスチレン樹脂、 スチレン—アクリル共 重合体、 ァクリル樹脂、 フヱノール樹脂、エポキシ樹脂、 ァクリルシリコン樹脂、 エポキシシリコン樹脂、ウレタン樹脂、ポリエステル樹脂等を例示することでき、 特にァクリルシリコン樹脂、 またはエポキシシリコン樹脂が好ましい。 In order to improve the transfer and the adhesion to the transfer target, a further brush Preferably, a mer layer is provided. As the primer layer, any material can be used as long as it is generally used, depending on the material of the transfer object. Among them, resins having a number average molecular weight of more than 200,000, Alternatively, the number average molecular weight is not more than 20, 000, and the glass transition point is 110 to 100 ° C, preferably 10 to 80 ° C. C, and more preferably a resin in the range of 30 to 80 ° C. is used. In the case of a resin having a number average molecular weight of more than 200,000, its glass transition point is not restricted. Further, it is preferable to use a resin having an elongation percentage of the coating film dried at room temperature to 60 ° C. in the range of 30 to 150%, particularly preferably in the range of 50 to 130%. Specific examples of the material used for one layer of the polymer include a polyvinyl isobutyl ether, an acrylic ester resin, an olefin chloride resin, a rubber resin, a pressure-sensitive adhesive such as a polyethylene-vinyl acetate copolymer, or a styrene resin. Styrene-acrylic copolymer, acryl resin, phenol resin, epoxy resin, acryl silicone resin, epoxy silicone resin, urethane resin, polyester resin, etc., and acryl silicone resin or epoxy silicone resin is particularly preferable. .
プライマー層の膜厚は透明性等の性質に影響を及ぼさない範囲であれば、 特に 限定されないが、 0. 0 5〜5〃mの範囲であるのが好ましい。 0. 0 5 m以 下では、 接着性向上の効果がなく、 5 μ πι以上では、 密着性向上の効果が大きく は変化しない。 光触媒層中の金属酸化物ゲル及び Ζまたは金属水酸化物ゲルは、 光触媒を固着 し、 接着層のシロキサン架橋型樹脂と強固に接着させるだけでなく、 転写後に基 材フィルムまたはシートから光触媒層を剥離しやすくする効果がある。 また、 ゲ ルが多孔質であることから吸着性を持っており、光触媒活性を高める効果もある。 この金属酸化物ゲル及び または金属水酸化物ゲルの光触媒層中での含有量は、 2 5〜9 5重量%の範囲が好ましい。 2 5重量%以下では、 接着層との接着が不 十分になり、 9 5重量%以上では、 光触媒活性が不十分となる。 The thickness of the primer layer is not particularly limited as long as it does not affect properties such as transparency, but is preferably in the range of 0.05 to 5 μm. At 0.05 m or less, there is no effect of improving adhesion, and at 5 μππ or more, the effect of improving adhesion does not change much. The metal oxide gel and / or metal hydroxide gel in the photocatalyst layer not only fixes the photocatalyst and firmly adheres to the siloxane crosslinked resin of the adhesive layer, but also removes the photocatalyst layer from the base film or sheet after transfer. This has the effect of facilitating peeling. In addition, since the gel is porous, it has an adsorptive property and has an effect of enhancing photocatalytic activity. The content of the metal oxide gel and / or metal hydroxide gel in the photocatalyst layer is preferably in the range of 25 to 95% by weight. If it is less than 25% by weight, the adhesion to the adhesive layer will be insufficient, and if it is more than 95% by weight, the photocatalytic activity will be insufficient.
金属の酸化物ゲル及びノまたは水酸化物ゲルの材質としては、 具体的にはゲイ 素、 アルミニウム、 チタニウム、 ジルコニウム、 マグネシウム、 二オビゥム、 タ ンタラム、 タングステン、 錫を例示することができる。 また、 これらを混合した ゲルでも、共沈法などの方法で作られる複合酸化物ゲルを使用することができる。 光触媒と混合するためには、ゲルとなる前のゾルの状態で混合するか、もしくは、 ゾルを調製する前の原料の段階で混合するのが好ましい。 ゲルを調製する方法に は、 金属塩を加水分解する方法、 中和分解する方法、 イオン交換する方法、 金属 アルコキシドを加水分解する方法等があるが、 ゲルの中に光触媒粉末が均一に分 散された状態で得られるものであればいずれの方法も使用可能である。 但し、 ゲ ル中に多量の不純物が存在すると、 光触媒の接着性や触媒活性に悪影響を与える ので、 不純物の少ないゲルの方が好ましい。 特に、 ゲルの中に有機物が 5%以上 存在すると、 光触媒活性が低下する。 Specific examples of the material of the metal oxide gel and metal or hydroxide gel include gay, aluminum, titanium, zirconium, magnesium, diobium, tantalum, tungsten, and tin. Also, these were mixed As the gel, a composite oxide gel prepared by a method such as a coprecipitation method can be used. In order to mix with the photocatalyst, it is preferable to mix in a sol state before forming a gel, or to mix in a raw material stage before preparing a sol. Gel preparation methods include hydrolysis of metal salts, neutralization decomposition, ion exchange, and hydrolysis of metal alkoxides.The photocatalyst powder is uniformly dispersed in the gel. Any method can be used as long as it can be obtained in the state described above. However, if a large amount of impurities are present in the gel, the adhesiveness and catalytic activity of the photocatalyst will be adversely affected. Therefore, a gel with few impurities is preferred. In particular, if the gel contains more than 5% of organic matter, the photocatalytic activity will decrease.
光触媒層中の光触媒としては、 T i 02、 ZnO、 S rT i 03、 C d S、 G aP、 I nP、 GaAs、 B aT i 03、 K2Nb03、 F e203、 T a 205、 WO 3. SnOい B i 203、 N i O、 Cu20、 S i C、 S i 02、 Mo S2、 I nPb、 Ru02、 C e 02等を例示することができ、 中でもアナターゼ型酸 化チタンが特に好ましい。 又、 これらの光触媒に P t、 Rh、 Ru02、 Nb、 C u、 S n、 N i 0などの金属及び金属酸化物を添加した公知の組み合わせが全 て使用できる。 光触媒層中の光触媒の含有量は、 多量なほど触媒活性が高くなる が、 接着性の点から 75重量%以下が好ましい。 The photocatalyst of the photocatalyst layer, T i 0 2, ZnO, S rT i 0 3, C d S, G aP, I nP, GaAs, B aT i 0 3, K2Nb0 3, F e 2 0 3, T a 2 0 5, WO 3. SnO There B i 2 0 3, N i O, Cu 2 0, S i C, illustrate the S i 0 2, Mo S 2 , I nPb, Ru0 2, C e 0 2 , etc. And an anatase type titanium oxide is particularly preferable. Moreover, these photocatalyst P t, Rh, Ru0 2, Nb, C u, S n, known combinations the addition of metals and metal oxides, such as N i 0 is total and available. As for the content of the photocatalyst in the photocatalyst layer, the larger the content, the higher the catalytic activity becomes.
光触媒層を基材フィルムまたはシート上へ形成するには、 金属酸化物ゾル及び Z又は金属水酸化物ゾル溶液中に光触媒を分散した懸濁液を用 L、、 接着層を形成 するのと同様のコート方法を用 、ることができる。 金属酸化物ゾル及びノ又は金 属水酸化物ゾルの前駆体溶液の状態で光触媒を分散し、 コート時に加水分解や中 和分解してゾル化もしくはゲル化させることもできる。ゾルを使用する場合には、 安定化のために、 酸やアルカリの解膠剤等が添加することもできる。 また、 接着 性及び Z又は操作性をよくするために、 ゾル懸濁液中の光触媒に対して 5重量% 以下の界面活性剤、消泡剤ゃシラン力ップリング剤などを添加することができる。 光触媒層形成時の乾燥温度としては、 基材フィルムまたはシートの材質によって も異なる力、 50°C以上 150°C以下が好ましい。 To form a photocatalyst layer on a substrate film or sheet, use a suspension in which a photocatalyst is dispersed in a metal oxide sol and Z or a metal hydroxide sol solution.L. Same as forming an adhesive layer The following coating method can be used. The photocatalyst can be dispersed in the state of a precursor solution of a metal oxide sol and a precursor of a metal or metal hydroxide sol, and can be hydrolyzed or neutralized during coating to form a sol or a gel. When using a sol, an acid or alkali peptizer may be added for stabilization. Further, in order to improve the adhesiveness and Z or operability, a surfactant, an antifoaming agent and a silane coupling agent can be added in an amount of 5% by weight or less based on the photocatalyst in the sol suspension. The drying temperature at the time of forming the photocatalyst layer is preferably 50 ° C. or more and 150 ° C. or less, depending on the material of the base film or sheet.
光触媒層の厚みは、 厚い方が活性が高いが、 2 以上になると、 転写終了後 基材シートを剥がす時に膜がひび割れることがあるので、 これ以下が好ましい。 1 以下にすると、転写後の膜の波長 550 nmの全光線透過率が 80 %以上、 ヘイズ率が 2 %以下の透明な膜が得られ、 転写対象物の外観を全く損なわなくな り、 装飾性の上でも有用となる。 The thickness of the photocatalyst layer is higher when the photocatalyst layer is thicker, but if it is 2 or more, the film may be cracked when the substrate sheet is peeled off after the completion of the transfer. When the value is 1 or less, a transparent film having a total light transmittance of 80% or more and a haze ratio of 2% or less of the film after transfer at a wavelength of 550 nm is obtained, and the appearance of the transfer object is not impaired at all. It is also useful in terms of sex.
無機層 Inorganic layer
無機層は、 光触媒層と接着層との接着性を向上させる効果と光触媒層の耐摩耗 性を向上させる効果、 更に、 光触媒層膜厚に由来する干渉縞による発色を低減さ せる効果がある。 無機層の材質としては、 式 (Π) RnS i (OR,) 4_n The inorganic layer has the effect of improving the adhesion between the photocatalyst layer and the adhesive layer, the effect of improving the wear resistance of the photocatalyst layer, and the effect of reducing color development due to interference fringes derived from the photocatalyst layer thickness. For the material of the inorganic layer, the formula (Π) R n S i (OR,) 4 _ n
(式中、 Rは炭素数 1~4の置換基を有していてもよいアルキル基を表わし、 R ,は、 炭素数 1〜 5の置換基を有していもよいアルキル基または炭素数 1〜 4の 置換基を有していてもよいァシル基を表わし、 nは 0又は 1を表わす。 )で表わ されるオルガノアルコキシシランもしくはアルコキシシランの加水分解 ·縮合物 を主成分とする。 式 (Π) で表されるシラン化合物として具体的には、 式 (I) で示したシラン化合物の具体例と同様のものを例示することができる。 硬化速度 の制御、 膜のひび割れ防止、 化学的耐久性向上、 屈折率の制御等の目的で、 シリ 力ゾル、 アルミナゾル、 ジルコ二ァゾルなどを添加することもできる。 (Wherein, R represents an alkyl group which may have a substituent having 1 to 4 carbon atoms, and R, is an alkyl group which may have a substituent having 1 to 5 carbon atoms or 1 carbon atom. And n represents 0 or 1. The main component is an organoalkoxysilane or a hydrolyzed / condensed product of an alkoxysilane represented by the following formula: Specific examples of the silane compound represented by the formula (Π) include those similar to the specific examples of the silane compound represented by the formula (I). For the purpose of controlling the curing speed, preventing cracking of the film, improving the chemical durability, and controlling the refractive index, etc., a silicic acid sol, an alumina sol, a zirconium sol, or the like can be added.
無機層を光触媒層上へ形成するには、 接着層を形成するのと同様のコート方法 を用いることができる。 接着性及び Zまたは操作性をよくするために、 5重量% 以下の界面活性剤、 消泡剤ゃシランカツプリング剤などを添加するこことができ る。 無機層形成時の乾燥温度としては、 基材シート材質によっても異なるが、 5 0°C以上 150°C以下が好ましい。 To form the inorganic layer on the photocatalyst layer, the same coating method as that for forming the adhesive layer can be used. In order to improve adhesion and Z or operability, 5% by weight or less of a surfactant, an antifoaming agent and a silane coupling agent can be added. The drying temperature at the time of forming the inorganic layer varies depending on the material of the base sheet, but is preferably from 50 ° C to 150 ° C.
無機層の厚みは、 0. 1 /m以上 2 m以下が、 好ましくは光触媒層と無機層 の合計膜厚が 0. 1 μπι以上 1 / m以下である。 2 m以上だと、 転写終了後基 材シートを剥がす時に膜がひび割れることがある。 The thickness of the inorganic layer is from 0.1 / m to 2 m, and preferably the total film thickness of the photocatalyst layer and the inorganic layer is from 0.1 μπι to 1 / m. If it is more than 2 m, the film may crack when the base sheet is peeled off after transfer is completed.
また、 本発明の転写フィルムまたはシートは、 フィルム状またはシート状基材 表面に、 光触媒層、 無機層、 数平均分子量が 20, 000以上の樹脂及び/また は数平均分子量が 20, 000以下、 かつガラス転移点が一 10〜1 00°Cであ る樹脂からなる層がこの順番で設けられたことを特徴とする。 Further, the transfer film or sheet of the present invention, the photocatalyst layer, the inorganic layer, a resin having a number average molecular weight of 20,000 or more and / or a number average molecular weight of 20,000 or less, Further, a layer made of a resin having a glass transition point of 110 to 100 ° C. is provided in this order.
数平均分子量が 20, 000以下の場合、そのガラス転移点は一 10〜1 00°C、 好ましくは 10〜80° (:、 さらに好ましくは 30〜80°Cである樹脂を用いるの が好ましい。 数平均分子量が 2 0 , 0 0 0以上の樹脂の場合、 そのガラス転移点 を制限されることはなく、 例えば、 一 1 0〜1 0 0 °Cの範囲の樹脂を使用するこ とができる。 さらに、 室温〜 6 0 °Cで乾燥した塗膜の伸び率が、 3 0〜1 5 0 % の範囲の樹脂を用いるのが好ましく、 特に 5 0〜1 3 0 %の範囲の樹脂が好まし い。 具体的には、 ポリビニルイソブチルエーテル、 アクリルエステル系樹脂、 塩 化ォレフイン系樹脂、 ゴム系樹脂、 ポリエチレン—酢酸ビニル共重合体等の感圧 接着剤、 又はスチレン樹脂、 スチレン一アクリル共重合体、 アクリル樹脂、 フエ ノール樹脂、 エポキシ樹脂、 アクリルシリコン樹脂、 エポキシシリコン樹脂、 ゥ レタン樹脂、 ポリエステル樹脂等を例示することでき、 特にアクリルシリコン樹 脂、 またはエポキシシリ コン樹脂が好ましい。 When the number average molecular weight is 20,000 or less, a resin having a glass transition point of 1 to 100 ° C, preferably 10 to 80 ° C (: more preferably 30 to 80 ° C) is used. Is preferred. In the case of a resin having a number average molecular weight of 200,000 or more, its glass transition point is not limited, and for example, a resin in the range of 110 to 100 ° C can be used. . Further, it is preferable to use a resin having an elongation percentage of the coating film dried at room temperature to 60 ° C. in the range of 30 to 150%, particularly preferably in the range of 50 to 130%. No. Specifically, pressure-sensitive adhesives such as polyvinyl isobutyl ether, acrylic ester resin, chlorinated olefin resin, rubber resin, polyethylene-vinyl acetate copolymer, or styrene resin, styrene-acrylic copolymer, acrylic Examples thereof include a resin, a phenol resin, an epoxy resin, an acrylic silicone resin, an epoxy silicone resin, a polyurethane resin, and a polyester resin, and an acrylic silicone resin or an epoxy silicon resin is particularly preferred.
該樹脂層中に耐久性を向上させる目的で光安定化剤及び 又は紫外線吸収剤等 を混合することができる。 使用できる光安定化剤としては、 ヒンダードアミン系 が良いが、 その他の物でも使用可能である。 紫外線吸収剤としてはトリァゾ一ル 系などが使用できる。 A light stabilizer and / or an ultraviolet absorber can be mixed in the resin layer for the purpose of improving durability. As a light stabilizer that can be used, a hindered amine type is preferable, but other substances can also be used. As the ultraviolet absorber, a triazole type or the like can be used.
接着性や操作性を良くする目的で、 5重量%以下の界面活性剤や消泡剤などの 各種添加剤を添加することができる。 For the purpose of improving adhesiveness and operability, various additives such as a surfactant and an antifoaming agent of 5% by weight or less can be added.
該樹脂層の厚さは、 Ι μ πι以上、 好ましくは 3 m以上が望ましい。 l m未 満だと、 転写が困難になり、 更に転写後の長期接着性が悪くなる。 The thickness of the resin layer is at least Ιμπι, preferably at least 3 m. If it is less than 1 m, transfer becomes difficult, and the long-term adhesion after transfer deteriorates.
該樹脂層を光触媒層、 無機層が塗布された基材フィルムまたはシート上に塗布 するには、 接着層を形成すると同様のコ一ト方法を用いることができる。 In order to apply the resin layer on the base film or sheet on which the photocatalyst layer and the inorganic layer are applied, the same coating method as when forming the adhesive layer can be used.
乾燥する温度は、 基材フィルムまたはシートの材質、 溶媒や樹脂の種類によつ ても異なるが、 一般的に 1 5 0 °C以下が好ましい。 The drying temperature varies depending on the material of the base film or sheet, the type of the solvent and the resin, but is generally preferably 150 ° C. or lower.
剥離層 Release layer
転写後に基材フィルムまたはシートを剥がしやすくする目的で基材フィルムま たはシート上に剥離層を設けることができる。 材質としては、 メラミン、 シリコ ン、 フッ素、 アクリル系熱硬化樹脂の単独または混合物等が使用できる。 上記樹 脂にシリコン、 フッ素、 ポリエステル、 ポリエチレン等の添加剤を加えて剥離強 度を調整する事も可能である。 A release layer can be provided on the base film or sheet for the purpose of making the base film or sheet easily peelable after the transfer. As the material, melamine, silicon, fluorine, acrylic thermosetting resin alone or a mixture thereof can be used. It is also possible to adjust the peel strength by adding additives such as silicon, fluorine, polyester and polyethylene to the above resin.
転写方法として、 前記転写フィルムまたはシートを準備する工程、 前記転写フ イルムまたはシートの接着層面を転写対象物表面に押し付ける工程、 及び転写フ イルムまたはシート中の基材を剥離させる工程を含むことを特徴とする光触媒層 の転写方法を例示することができる。 転写対象物に押し付ける工程は、 加熱及び 又は加圧等どのような方法でも使用できる。 加熱加圧する方法として例えば、 プラスチック成形体製造時に転写するインモールド転写法やフィルムや板などの 平面転写するロール転写法などどのような方法も使用することができる。 Preparing the transfer film or sheet as a transfer method; A method for transferring a photocatalytic layer, which includes a step of pressing the adhesive layer surface of the film or sheet against the surface of the transfer object and a step of peeling off the base material in the transfer film or sheet, can be exemplified. The step of pressing against the transfer object can be performed by any method such as heating and / or pressing. As the method of heating and pressurizing, any method such as an in-mold transfer method for transferring at the time of production of a plastic molded article or a roll transfer method for transferring a film or a plate onto a plane can be used.
また、 本発明の転写フィルムまたはシートの接着層面を転写対象物表面に押し 付ける工程中に、 接着層のシロキサン架橋樹脂の架橋反応を進行させると接着層 と転写対象物との接着性が向上する。 架橋反応点を保持する方法としては、 架橋 点シリコンアルコキシ基 (S i - O R) の加水分解率を減らしたり、 架橋点アル コキシ基をアルコキシ交換反応により、 より炭素数の多いアルコキシ基に置換し たり、 樹脂部のガラス転移温度を高くしたりする方法がある。 また、 転写フィル ムまたはシート基材を剥離後、更に加熱等の後処理を行うこともできる。その際、 接着剤層において架橋反応を進行させたとしても同様に密着性が向上する。 In addition, during the step of pressing the adhesive layer surface of the transfer film or sheet of the present invention against the surface of the transfer object, if the crosslinking reaction of the siloxane cross-linking resin of the adhesive layer proceeds, the adhesion between the adhesive layer and the transfer object is improved. . Methods for maintaining the cross-linking reaction point include reducing the hydrolysis rate of the cross-linking silicon alkoxy group (Si-OR) or replacing the cross-linking alkoxy group with an alkoxy group having a larger number of carbon atoms by an alkoxy exchange reaction. Or increasing the glass transition temperature of the resin part. Further, after the transfer film or the sheet substrate is peeled off, a post-treatment such as heating can be further performed. At this time, even if the crosslinking reaction is advanced in the adhesive layer, the adhesion is similarly improved.
また、 他の転写方法としては、 本発明の転写フィルムまたはシートを金型に配 置し、 樹脂部材を射出成形して成形品の表面に光触媒を転写する方法を例示する ことができる。 Further, as another transfer method, a method in which the transfer film or sheet of the present invention is placed in a mold, a resin member is injection-molded, and a photocatalyst is transferred to the surface of a molded product can be exemplified.
転写対象物の形状は、 真空圧着等の方法を用いれば、 複雑な形状でも転写する ことは可能であるが、 特に板状、 シート状、 またはフィルム状であることが好ま しい。 The transfer target can be transferred in a complicated shape by using a method such as vacuum compression bonding. However, a plate, a sheet, or a film is particularly preferable.
転写フィルムまたはシート中の基材を剥離させる工程は、 例えば転写シートに 剪断応力や引張応力等を加えて剥離させたり、 紫外線照射することにより光触媒 の酸化力を利用して剥離させる方法を例示することができる。 転写後、 シート基 材は、 剥離させなければ、 光触媒層を傷つけないようにするための保護フィルム としても働く。 The step of peeling the substrate in the transfer film or sheet is exemplified by a method in which the transfer sheet is peeled by applying shear stress, tensile stress, or the like, or a method in which the transfer sheet is peeled by using the oxidizing power of a photocatalyst by irradiating ultraviolet rays. be able to. After transfer, the sheet substrate also acts as a protective film to prevent damage to the photocatalyst layer unless it is peeled off.
本発明の方法によって得られた成形品は、 紫外線強度 3 mWZ c m 2の光を 5 0 0時間照射後、 J I S K 5 4 0 0に規定の碁盤目テープ法による光触媒層の 接着性が、 評価点数 6点以上である光触媒層を備えた成形品である。 After the molded article obtained by the method of the present invention was irradiated with light having an ultraviolet intensity of 3 mWZ cm 2 for 500 hours, the adhesiveness of the photocatalyst layer by the grid tape method specified in JISK540 was evaluated. It is a molded article provided with a photocatalyst layer having 6 or more points.
また、 本発明を用いて得られた成形品は、 光触媒層と接着層もしくは光触媒層 と無機層と接着層の合計の波長 5 5 0 n mの光の全光線透過率が 7 0 %以上であ ることを特徴とする光触媒層を備えた成形品である。 The molded article obtained by using the present invention comprises a photocatalyst layer and an adhesive layer or a photocatalyst layer. A molded article provided with a photocatalytic layer, wherein the total light transmittance of light having a total wavelength of 550 nm of the inorganic layer and the adhesive layer is 70% or more.
本発明の光触媒層を樹脂上に形成させる方法は、 光触媒を有する転写フィルム またはシート上で溶融した樹脂を押出コーティングし連続的に製造することを特 徵とする。 押出しコーティングとは、 例えば溶融した樹脂を T—ダイと呼ばれる スリッ トダイからフィルム状に押出したものを基材に塗る方法を例示することが できる。 この場合、 光触媒層含めて 3層構造のフィルム等、 又は光触媒、 接着層 を含めて 4層構造のフィルム等を連続的に製造することができる。 この場合、 転 写フィルムまたはシ一ト上にアンカ一コート層をあらかじめ設けることでより接 着性を増すことができる。 T—ダイを連続的に 2基配置するタンデムラミネ一タ —を用いた場合は、 更に 4層、 5層コートのフィルム等を連続的に製造すること ができる。 The method for forming a photocatalyst layer on a resin according to the present invention is characterized in that a molten resin is extrusion-coated on a transfer film or a sheet having a photocatalyst and is continuously manufactured. Extrusion coating can be exemplified by a method in which a molten resin is extruded into a film form from a slit die called a T-die and applied to a substrate. In this case, a film having a three-layer structure including the photocatalyst layer, or a film having a four-layer structure including the photocatalyst and the adhesive layer can be continuously manufactured. In this case, by providing an anchor coat layer on the transfer film or sheet in advance, the adhesiveness can be further increased. In the case of using a tandem radiator in which two T-dies are continuously arranged, it is possible to continuously produce films with four or five layers.
本発明の光触媒層を樹脂上に形成させるもう一つの方法は、 光触媒を有する転 写フィルムまたはシ一卜と転写される基体の間に溶融樹脂を押出しラミネートし 連続的に製造することを特徴とする。 この場合の押出しラミネートとは、 別名サ ンドイツチラミネートと呼ばれ、 溶融樹脂をスリッ トダイからフィルム状に押出 して基材に塗り、 サンド操出機と呼ばれるアンワインダ一から別の基材を供給し て同時に貼り合わせる方法のことを示す。 この場合、 転写フィルムまたはシート は、 溶融樹脂が塗られる基材としても、 アンワインダ一から供給される基材とし ても使用することができる。 この場合、 3層コートのフィルム等を連続的に製造 することができる。 Another method of forming a photocatalyst layer on a resin according to the present invention is characterized in that a molten resin is extruded and laminated between a transfer film or a sheet having a photocatalyst and a substrate to be transferred, and is continuously manufactured. I do. Extrusion lamination in this case is also called sanguinche lamination, in which molten resin is extruded from a slit die into a film and applied to the substrate, and another substrate is supplied from an unwinder called a sanding machine Then, it shows the method of bonding together. In this case, the transfer film or sheet can be used as a substrate coated with the molten resin or as a substrate supplied from the unwinder. In this case, a three-layer coated film or the like can be manufactured continuously.
また、 本発明の光触媒層を樹脂上に形成させるもう一つの方法は、 溶融押出し された樹脂を冷却口一ル上で冷却する工程中に光触媒層を有する転写フィルムま たはシートを圧着させて連続的に製造することを特徴とする。 この方法は、 材料 を混合加熱し、 溶融した樹脂を押出機からダイを通じて連続的に押し出し成形す る方法中、 樹脂を押出し後、 冷却ロールで急冷するチルロール法において用いら れる。 本方法は、 冷却ロールで冷却する工程において、 転写フィルムを押出され た樹脂上に張り合わせて両者を一度に冷却し、 光触媒層を有する樹脂構造体を製 造する方法である。 光触媒層を有する樹脂 Another method for forming the photocatalyst layer of the present invention on a resin is to press-bond a transfer film or sheet having a photocatalyst layer during the step of cooling the melt-extruded resin on a cooling port. It is characterized by being manufactured continuously. This method is used in a method of mixing and heating materials and continuously extruding a molten resin from an extruder through a die, and in a chill roll method in which a resin is extruded and then rapidly cooled by a cooling roll. In this method, in a step of cooling with a cooling roll, a transfer film is laminated on the extruded resin and both are cooled at a time to produce a resin structure having a photocatalyst layer. Resin having photocatalyst layer
本発明において光触媒層を有するの樹脂の材質としては、 熱可塑性樹脂であれ ば特に限定されるものではなく、 具体的には、 ポリエチレン樹脂、 ポリプロピレ ン樹脂、 ポリエチレンテレフタレート樹脂等を例示することができるが、 特にァ クリル樹脂、 ポリ塩化ビニル樹脂、 ポリカーボネート樹脂、 ポリスチレン樹脂が 好ましい。 In the present invention, the material of the resin having the photocatalyst layer is not particularly limited as long as it is a thermoplastic resin, and specific examples thereof include a polyethylene resin, a polypropylene resin, and a polyethylene terephthalate resin. However, acrylic resin, polyvinyl chloride resin, polycarbonate resin and polystyrene resin are particularly preferred.
また、 これらの形状も特に限定されるものではないが、 板状、 シート状、 フィ ルム状のものが特に好ましい。 The shape is not particularly limited, but is preferably a plate, sheet, or film.
フィルムの場合その厚みは、 3〜 2 0 0〃 mの範囲が好ましくは、 更に 1 6 ~ 1 0 0 mの範囲が好ましい。 フィルム表面は平滑な方が良いが、 転写時に柄を 付ける目的で、 表面に凹凸を付けてもかまわない。 In the case of a film, the thickness is preferably in the range of 3 to 200 m, and more preferably in the range of 16 to 100 m. The film surface should be smooth, but the surface may be uneven for the purpose of patterning during transfer.
光触媒層を有する転写フィルムまたはシー卜の構造は、 転写する構造体を設置 するための基材表面上に、 光触媒層単独の構造、 光触媒層、 接着層をこの順番に 積層した構造、 又は光触媒層、 無機層、 及び接着層をこの順番に積層した構造等 を例示することができ、 転写対象物との密着性を考慮すると接着層を有する構造 体が好ましい。 その構造、 材質等について具体的には、 前述した転写フィルムま たはシートを好ましく例示することができる。 図面の簡単な説明: The structure of a transfer film or sheet having a photocatalyst layer is a structure in which a photocatalyst layer alone, a photocatalyst layer, and an adhesive layer are laminated in this order on a substrate surface on which a structure to be transferred is placed, or a photocatalyst layer. An example is a structure in which an inorganic layer, an inorganic layer, and an adhesive layer are laminated in this order. A structure having an adhesive layer is preferable in consideration of the adhesion to the transfer target. Specific examples of the structure, material, and the like are preferably the transfer film or sheet described above. BRIEF DESCRIPTION OF THE DRAWINGS:
図 1〜 3はそれぞれ、 本発明の転写フィルムにおいて好ましい構造を模式的に表 した図である。 発明を実施するための最良の形態: 1 to 3 are diagrams schematically showing preferred structures in the transfer film of the present invention. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 実施例により本発明を詳細に説明するが、 本発明の範囲は実施例に何ら 制限を受けるものではない。 Hereinafter, the present invention will be described in detail with reference to examples, but the scope of the present invention is not limited to the examples.
実施例 1 Example 1
表面処理の施されていない 2 δ z mの厚さのポリエチレンテレフタレートフィル ム (東洋紡 E 5 0 0 1 ) 上に、 シリカゾル中に光触媒粒子を分散した光触媒コー ティング液 (日本曹達のビストレイタ一 N D C— 1 3 0 C :固形分濃度 8 %) を 膜厚 0. 5 mになるようにバーコ一ターでコート後、 120°Cで乾燥し、 光触 媒層付き PETフィルム (A— 1) を作成した。 更にポリシロキサン添加シロキ サン架橋ァクリル樹脂溶液 Y (日本曹達のビストレイタ一 NRC— 300A :固 形分濃度 10%) を膜厚 5 imになるようにコート後、 120°Cで乾燥し、 転写 シート (T— 1) を作成した。 次に、 転写対象物としてのアクリル樹脂プレート 表面に、 上記転写シート (T一 1) を重ね、 180°Cで 5 k gZcm2の圧力で ラミネートし、 基材シートを剥離することにより、 最表面が光触媒層でなるァク リル樹脂プレート (P— 1) を作成した。 A photocatalyst coating liquid (Nippon Soda's Bistreita-1 NDC-1) is prepared by dispersing photocatalyst particles in silica sol on a polyethylene terephthalate film (Toyobo E5001) with a thickness of 2 δ zm that has not been subjected to surface treatment. 30 C: solid content concentration 8%) After coating with a bar coater to a film thickness of 0.5 m, it was dried at 120 ° C to prepare a PET film with a photocatalytic layer (A-1). Further, a polysiloxane-added siloxane-crosslinked acryl resin solution Y (Nippon Soda's Vistreita NRC-300A: solid content concentration 10%) is coated to a film thickness of 5 im, dried at 120 ° C, and transferred to a transfer sheet ( T-1) was created. Then, the acrylic resin plate surface as a transfer object, by superimposing the transfer sheet (T one 1), laminated with a 5 k pressure GZcm 2 at 180 ° C, peeling the substrate sheet, the outermost surface Prepared an acrylic resin plate (P-1) consisting of a photocatalyst layer.
実施例 2 Example 2
実施例 1と同様の条件で膜厚だけ 0. 2 mにした (A— 2)を作成した。更に、 ポリシロキサン添加シロキサン架橋ァクリル樹脂溶液 (日本曹達のビストレイタ -NRC- 300 A:固形分濃度 10%) を膜厚 5 mになるようにコ一ト後、 120°Cで乾燥し、 転写シート (T— 2) を作成した。 次に、 転写対象物として のアクリル樹脂プレート表面に、 上記転写シート (T一 2) を重ね、 180°Cで 5 k g/ cm2の圧力でラミネートし、 基材シートを剥離することにより、 最表 面が光触媒層でなるアクリル樹脂プレート (P— 2) を作成した。 (A-2) was produced under the same conditions as in Example 1 except that only the film thickness was 0.2 m. Furthermore, a polysiloxane-added siloxane crosslinked acryl resin solution (Nippon Soda's Vistreita -NRC-300A: solid content concentration 10%) is coated to a film thickness of 5 m, dried at 120 ° C, and transferred to a transfer sheet. (T-2) was created. Then, the acrylic resin plate surface as a transferred object, overlapping the transfer sheet (T one 2), laminated with a 5 kg / cm 2 of pressure at 180 ° C, by peeling the substrate sheet, the outermost An acrylic resin plate (P-2) with a photocatalytic layer on the surface was prepared.
実施例 3 Example 3
実施例 2と同様にして (A— 2) を作成し、 (A— 2) フィルム上に無機層コ 一ティング液 (日本合成ゴムのグラス力 T 2106溶液とグラス力 H 501溶液 を 95 : 5で混合した液) を膜厚 0. 3 になるようにバーコ一ターでコート 後、 120°Cで乾燥し、 光触媒層 無機層付き PETフィルム (B— 1) を作成 した。 更に、 ポリシロキサン添加シロキサン架橋アクリル樹脂溶液 (日本曹達の ビストレイタ一NRC— 300 A:固形分濃度 10%) を膜厚 5 になるよう にコート後、 120°Cで乾燥し、 転写シート (T— 3) を作成した。 次に、 転写 対象物としてのァクリル樹脂プレート表面に、上記転写シ一ト (T一 3)を重ね、 180°Cで 5 k gZc m2の圧力でラミネートし、 基材シ一トを剥離することに より、 最表面が光触媒層でなるアクリル樹脂プレート (P— 3) を作成した。 実施例 4 (A-2) was prepared in the same manner as in Example 2, and (A-2) a coating solution of an inorganic layer (a glass power T 2106 solution and a glass power H 501 solution of Nippon Synthetic Rubber: 95: 5 Was coated with a bar coater to a thickness of 0.3 and dried at 120 ° C to produce a PET film (B-1) with an inorganic layer of a photocatalyst layer. Furthermore, a polysiloxane-added siloxane cross-linked acrylic resin solution (Nippon Soda's Vistreta-NRC-300A: solid content concentration 10%) is coated to a film thickness of 5, dried at 120 ° C, and transferred to a transfer sheet (T- 3) was created. Next, the Akuriru resin plate surface as a transfer object, the transfer sheet overlaid one bets (T one 3), laminated with a 5 k pressure GZC m 2 at 180 ° C, peeling the substrate sheet one DOO In this way, an acrylic resin plate (P-3) with a photocatalyst layer on the outermost surface was prepared. Example 4
実施例 1と同様にして調整した転写シート (T一 1) をアクリル樹脂フィルム (鐘淵化学製サンジュレン 004NAT、 厚さ 50 m) に重ね、 140°Cで 5 k g/ cm2の圧力で加熱加圧ロールを用いて転写した。 転写シ—ト基材を剥離 することにより、 最表面が光触媒層でなるアクリル樹脂フィルム (P— 4) を作 成した。 A transfer sheet (T-1) prepared in the same manner as in Example 1 was used as an acrylic resin film. (Kanebuchi Chemical Sanjuren 004NAT, thickness 50 m) and transferred at 140 ° C with a pressure of 5 kg / cm 2 using a heating and pressing roll. By peeling the transfer sheet substrate, an acrylic resin film (P-4) with the photocatalyst layer on the outermost surface was created.
実施例 5 Example 5
実施例 3と同様にして調整した転写シート (T— 3) をアクリル樹脂フィルム (鐘淵化学製サンジュレン 004NAT、 厚さ 50 /m) に重ね、 140°Cで 5 k cm2の圧力で加熱加圧ロールを用いて転写した。 転写シート基材を剥離 することにより、 最表面が光触媒層でなるアクリル樹脂フィルム (P— 5) を作 成した。 The transfer sheet (T-3) prepared in the same manner as in Example 3 was overlaid on an acrylic resin film (Sanjuren 004NAT manufactured by Kaneka Chemical Co., thickness 50 / m) and heated at 140 ° C under a pressure of 5 kcm 2. Transfer was performed using a pressure roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-5) having a photocatalyst layer on the outermost surface was created.
実施例 6 Example 6
実施例 1と同様にして調整した転写シート(T— 1)をポリスチレン樹脂板(二 ッソ一樹脂製、 厚さ 2 mm) に重ね、 80°Cで 5 k gZcm2の圧力で加熱加圧 ロールを用いて転写した。 転写シート基材を剥離することにより、 最表面が光触 媒層でなるアクリル樹脂フィルム (P— 6) を作成した。 The same manner as in Example 1 transfer sheet was adjusted (T-1) a polystyrene resin plate (two Tsu Seo one resin, 2 mm thickness) overlaid, heat and pressure at 5 k gZcm 2 pressure at 80 ° C Transfer was performed using a roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-6) with the outermost surface being a photocatalyst layer was prepared.
実施例 7 Example 7
実施例 3と同様にして調整した転写シ一ト(T一 3 )をポリスチレン樹脂板(二 ッソ一樹脂製、 厚さ 2 mm) に重ね、 80°Cで 5 k g/cm2の圧力で加熱加圧 ロールを用いて転写した。 転写シート基材を剥離することにより、 最表面が光触 媒層でなるアクリル樹脂フィルム (P— 7) を作成した。 The transfer sheet (T-13) adjusted in the same manner as in Example 3 was placed on a polystyrene resin plate (made of Nippon Resin, 2 mm thick), and at 80 ° C. and a pressure of 5 kg / cm 2 . Transfer was performed using a heating and pressing roll. By peeling off the transfer sheet substrate, an acrylic resin film (P-7) having the photocatalyst layer on the outermost surface was created.
実施例 8 Example 8
実施例 1と同様にして調整した転写シート (T一 1) 上に、 共重合ポリエステ ル溶液バイロン 300 (東洋紡 (株) 製) を膜厚 0. 5 μπιになるようにバーコ 一ターによりコ一ト後、 120°Cで乾燥しプライマ一層付き転写シート (T— 4) を作成した。 On a transfer sheet (T-1) prepared in the same manner as in Example 1, a copolymer polyester solution Byron 300 (manufactured by Toyobo Co., Ltd.) was coated with a bar coater so as to have a film thickness of 0.5 μπι. After drying, the sheet was dried at 120 ° C to prepare a transfer sheet (T-4) with a single primer layer.
ポリエステルフィルムコスモサンシャイン A— 4100 (東洋紡 (株) 製、 膜 厚 0. 5 /m) 上にインクで印刷を施した表面に、 上記転写シート (T一 4) を 重ね、 140°C、 5 k g/c m2の圧力でラミネートし、 基材シートを剥離する ことにより、 最表面が光触媒層でなるシート (P— 8) を作成した。 実施例 9 Polyester film Cosmo Sunshine A—4100 (manufactured by Toyobo Co., Ltd., 0.5 / m thick), the above transfer sheet (T-14) is superimposed on the surface printed with ink at 140 ° C, 5 kg By laminating at a pressure of / cm 2 and peeling off the base sheet, a sheet (P-8) having a photocatalyst layer on the outermost surface was prepared. Example 9
実施例 2と同様にして調整した転写シート (T一 2) 上に、 アクリルシリコン 樹脂溶液ゼムラック YC 3623 (鐘淵化学 (株) 製) を膜厚 0. 5 mになる ようにバーコ一ターによりコート後、 120°Cで乾燥しプライマー層付き転写シ ―ト (T—5) を作成した。 On a transfer sheet (T-12) prepared in the same manner as in Example 2, an acrylic silicon resin solution ZEMRAC YC 3623 (manufactured by Kanegafuchi Chemical Co., Ltd.) was applied with a bar coater to a thickness of 0.5 m. After coating, it was dried at 120 ° C. to prepare a transfer sheet (T-5) with a primer layer.
ポリカーボネート板表面に、 上記転写シート (T— 5) を重ね、 150°C、 5 kg/ cm2の圧力でラミネートし、 基材シートを剥離することにより、 最表面 が光触媒層でなるポリカーボネートプレート (P— 9) を作成した。 The transfer sheet (T-5) is laminated on the surface of the polycarbonate plate, laminated at 150 ° C and a pressure of 5 kg / cm 2 , and the substrate sheet is peeled off. P-9) was created.
実施例 10 Example 10
実施例 3と同様にして調整した転写シート (T— 3) 上に、 アクリルシリコン 樹脂溶液ゼムラック YC 3623 (鐘淵化学 (株) 製) を膜厚 0. 5 mになる ようにバーコ一夕一によりコ一ト後、 120°Cで乾燥しプライマ一層付き転写シ 一ト (T— 6) を作成した。 On a transfer sheet (T-3) prepared in the same manner as in Example 3, an acrylic silicon resin solution Zemurac YC 3623 (manufactured by Kanegafuchi Chemical Co., Ltd.) was applied to the transfer sheet (0.5 mm) to a thickness of 0.5 m. After coating, the resultant was dried at 120 ° C. to prepare a transfer sheet (T-6) with a single primer layer.
ポリカーボネート板表面に、 上記転写シート (T— 6) を重ね、 150°C、 5 kgZ cm2の圧力でラミネートし、 基材シートを剥離することにより、 最表面 が光触媒層でなるポリカーボネートプレート (P— 10) を作成した。 A polycarbonate plate surface, overlaid the transfer sheet (T- 6), 150 ° C , 5 laminated at a pressure of KGZ cm 2, by peeling off the substrate sheet, a polycarbonate plate outermost surface made of a photocatalytic layer (P — Created 10).
実施例 11 Example 11
実施例 3において無機層コ一ティング液に水 Zエタノール = 1 Z 1で固形分濃 度 1 %に調整した日産化学スノーテックス I P A— S Tを用いる以外同様にして 光触媒層ノ無機層付き P ETフィルム (B— 2)、 転写シート (T一 7)、 樹脂プ レート (P— 11) を調整した。 A PET film with a photocatalytic layer and an inorganic layer in the same manner as in Example 3 except that Nissan Chemical Snowtex IPA-ST adjusted to 1% solid content with water Z ethanol = 1 Z1 as the inorganic layer coating liquid was used. (B-2), transfer sheet (T-17), and resin plate (P-11) were adjusted.
実施例 12 Example 12
実施例 3において無機層コ一ティング液に水/エタノール = 1 1で固形分濃 度 1 %に調整した日産化学スノーテックス XSを用いる以外同様にして光触媒層 無機層付き P ETフィルム (B— 3)、転写シ一ト (T— 8)、樹脂プレート (P — 12) を調整した。 In the same manner as in Example 3, except that Nissan Chemical Snowtex XS adjusted to a solid content of 1% with water / ethanol = 1 1 was used as the inorganic layer coating liquid, a PET film with an inorganic layer (B-3) ), Transfer sheet (T-8) and resin plate (P-12) were adjusted.
実施例 13 Example 13
実施例 10において、 ァクリルシリコン樹脂溶液ゼムラック YC3623 (鐘 淵化学 (株) 製) の代わりに酢酸ェチル Zs—ブタノール/エタノール =2ノ 2 6で固形分濃度を 1%に調整したァクリルシリコン樹脂溶液ゼムラック YC 3 315 (鐘淵化学 (株) 製) を用いる以外同様にして、 プライマ一層付き転写シ ―ト (T— 9)、 樹脂プレート (P— 13) を調整した。 In Example 10, acetyl silicone resin solution ZEMRAC YC3623 (Kanebuchi Chemical Co., Ltd.) was replaced with ethyl acetate Zs—butanol / ethanol = 2 2 Transfer sheet with primer layer (T-9), resin in the same manner except that Acryl silicone resin solution Zemurac YC3315 (Kanebuchi Chemical Co., Ltd.) whose solid content concentration was adjusted to 1% in step 6 was used. The plate (P-13) was adjusted.
実施例 14 Example 14
実施例 10において、 ァクリルシリコン樹脂溶液ゼムラック YC 3623 (鐘 淵化学 (株) 製) の代わりに酢酸ェチル s—ブタノール Zエタノール =2ノ 2 ノ 6で固形分濃度を 1%に調整したァクリルシリコン樹脂溶液ゼムラック YC 5 920 (鐘淵化学 (株) 製) を用いる以外同様にして、 プライマ一層付き転写シ ―ト (T— 10)、 樹脂プレート (P— 14) を調整した。 In Example 10, acryl was prepared by adjusting the solid content concentration to 1% with ethyl acetate s-butanol Z ethanol = 2 to 2 in place of acrylacrylic resin solution ZEMRAC YC 3623 (manufactured by Kaneguchi Chemical Co., Ltd.). A transfer sheet with a primer layer (T-10) and a resin plate (P-14) were prepared in the same manner except that a silicone resin solution ZEMRAC YC5920 (manufactured by Kaneka Chemical Co., Ltd.) was used.
実施例 15 Example 15
実施例 3と同様にして光触媒層 無機層付き PETフィルム (B— 1) を作成 した。さらに、その表面にァクリルシリコン樹脂溶液ゼムラック YC 3623 (鐘 淵化学 (株) 製) を膜厚 0. になるようにバーコ一ターによりコート後、 In the same manner as in Example 3, a PET film (B-1) with a photocatalyst layer and an inorganic layer was prepared. Further, the surface is coated with acryl silicone resin solution ZEMRAC YC 3623 (manufactured by Kane-buchi Chemical Co., Ltd.) using a bar coater so that the film thickness becomes 0.
120°Cで乾燥し転写シート (T一 1 1) を作成した。 After drying at 120 ° C, a transfer sheet (T-111) was prepared.
次に、 転写対象物としてのアクリル樹脂プレート表面に、 上記転写シート (T - 1 1) を重ね、 180°Cで 5 k gZc m2の圧力でラミネートし、 基材シート を剥離することにより、 最表面が光触媒層でなるアクリル樹脂プレート (P— 1 5) を作成した。 Then, the acrylic resin plate surface as a transfer object, the transfer sheet (T - 1 1) a lap, laminated with a 5 k pressure GZC m 2 at 180 ° C, by peeling the base sheet, An acrylic resin plate (P-15) with a photocatalyst layer on the outermost surface was prepared.
比較例 1 Comparative Example 1
表面処理の施されていない 25 /mの厚さのポリエチレンテレフタレートフィ ルム (東洋紡 E 5001) 上に、 石原産業の光触媒粉末 ST— 01をエタノール に分散後、ボールミル粉砕し、固形分濃度 2%の分散性良好なコート液を調製し、 この液を膜厚 0. 5 /mになるようにバーコ一ターでコート後、 120°Cで乾燥 し、光触媒層付き P ETフィルムを作成し、以下 T一 1と同条件で転写シート(T - 12) を作成した。 次に、 転写対象物としてのアクリル樹脂プレート表面に、 上記転写シート (T一 12) を重ね、 180°Cで 5 k g/c m2の圧力でラミネ ートし、 基材シートを剥離することにより、 最表面が光触媒層でなるアクリル樹 脂プレート (P— 16) を作成した。 On a 25 / m-thick polyethylene terephthalate film (Toyobo E5001) with no surface treatment, Ishihara Sangyo Photocatalyst Powder ST-01 is dispersed in ethanol, and then ball-milled to obtain a solid content of 2%. A coating solution having good dispersibility was prepared, and this solution was coated with a bar coater to a thickness of 0.5 / m, and dried at 120 ° C to form a PET film with a photocatalytic layer. A transfer sheet (T-12) was prepared under the same conditions as in 1. Then, the acrylic resin plate surface as a transferred object, overlapping the transfer sheet (T one 12), and laminating over preparative at 5 kg / cm 2 of pressure at 180 ° C, by peeling the base sheet Then, an acrylic resin plate (P-16) with a photocatalyst layer on the outermost surface was prepared.
比較例 2 シロキサン架橋型樹脂でな L、接着層用コーティング液として、 昭和インク製ァ クリル樹脂系透明インクを (A—1) フィルム上に膜厚 5 mになるようにコー ト後、 60°Cで乾燥し、 転写シート (T一 13) を作成した。 Comparative Example 2 L, a siloxane cross-linkable resin, is coated with an acrylic resin-based transparent ink manufactured by Showa Ink Co., Ltd. as a coating liquid for the adhesive layer (A-1) to a thickness of 5 m on the film, and then dried at 60 ° C. Then, a transfer sheet (T-1 13) was created.
次に、 転写対象物としてのアクリル樹脂プレート表面に、 上記転写シート (T一 13) を重ね、 180°Cで 5 k g/ cm 2の圧力でラミネートし、 基材シ一トを 剥離することにより、最表面が光触媒層でなるァクリル樹脂プレート (P— 17) を作成した。 Next, the above-mentioned transfer sheet (T-13) is laminated on the surface of the acrylic resin plate as the transfer object, laminated at 180 ° C under a pressure of 5 kg / cm 2 , and the base sheet is peeled off. Then, an acryl resin plate (P-17) having a photocatalyst layer on the outermost surface was prepared.
[実施例の評価方法] [Evaluation method of Examples]
実施例で得た試験プレート (P— 1) 〜 (P— 17) の特性を下記の方法で評 価した。 The characteristics of the test plates (P-1) to (P-17) obtained in the examples were evaluated by the following methods.
1) 接着性評価 1) Adhesion evaluation
J I S K 5400に規定する碁盤目テープ法試験により接着性の評価を行つ た。 切り傷の間隔を 2mmとし、 ます目の数を 25コとした。 評価点数は、 J I S K 5400に記載の基準で行った。 The adhesiveness was evaluated by a cross-cut tape test specified in JIS K5400. The interval between cuts was 2 mm, and the number of squares was 25. The evaluation score was based on the criteria described in JIS K5400.
2) 全光線透過率とヘイズ率 2) Total light transmittance and haze rate
ヘイズメーター (日本電色工業製 NDH— 300 A型) で測定した。 全光線 透過率 80%以上、 ヘイズ率 3%以下を合格とした。 It was measured with a haze meter (Nippon Denshoku Industries NDH-300A type). The total light transmittance was 80% or more and the haze rate was 3% or less.
3) 耐久性評価 3) Durability evaluation
ブラックライ トで紫外線強度 3 mWZ cm 2の光を 500時間照射後、 J I S K 5400に規定の碁盤目テープ法による接着性を測定し、 耐久性の評価とし た。 評価点数は、 接着性評価と同じである。 After irradiating with a black light a light having an ultraviolet intensity of 3 mWZ cm 2 for 500 hours, the adhesion was measured by a grid tape method specified in JISK 5400, and the durability was evaluated. The evaluation score is the same as for the adhesiveness evaluation.
4) サラダ油分解活性 (防汚特性) 4) Salad oil decomposition activity (antifouling property)
5 cmx 5 cm角に切りだした試料、 若しくは光触媒塗布面積がほぼ 25 cm 2になるよう切り出した試料の表面に市販のサラダ油 (日清精油 (株) 製) をテ ィッシュペーパーを使用して塗布量が O.lmgZcm2になるよう塗布し調製し た試料に、 15 Wブラックライトブル一蛍光灯 3本を並べて UV— A領域の紫外 線強度が 3 mWZ c m 2になるよう試料との距離を調節して光照射し、 照射中の 重量変化を 0.1 m gまで測定可能な精密天秤で秤量して記録した。 72時間後 における塗布サラダ油の重量残存率により評価した。 評価基準は以下の通りとし た。 Apply a commercially available salad oil (manufactured by Nisshin Seimitsu Oil Co., Ltd.) on the surface of a sample cut into 5 cm x 5 cm squares or a sample cut so that the photocatalyst application area is approximately 25 cm2 using tissue paper. the amount coated was adjusted to be O.LmgZcm 2 sample, the distance between the sample to 15 W black light ultraviolet ray intensity table by arranging one fluorescent lamp three UV-a region is 3 mWZ cm 2 The light was adjusted and irradiated, and the weight change during irradiation was weighed and recorded on a precision balance capable of measuring up to 0.1 mg. The evaluation was made based on the residual weight of the applied salad oil after 72 hours. The evaluation criteria are as follows Was.
72時間光照射後のサラダ油残存率 評価 Evaluation of salad oil residual rate after 72 hours light irradiation
10%以下 A 10% or less A
30〜: L 0% B 30 ~: L 0% B
50〜30% C 50-30% C
80〜50% D 80-50% D
80 %以上 E 80% or more E
5) 親水性 5) hydrophilic
試料表面の光触媒層をエタノールで洗浄後、 60°Cで 30分間乾燥し、 親水 性測定試料とした。 試料にブラックライ トで紫外線強度 2 mWZ cm2の光を 2 4時間照射後の表面の蒸留水に対する接触角を接触角測定器 (エルマ製 360 S 型) で測定した。 親水性の評価基準は以下の通りとした。 After washing the photocatalyst layer on the sample surface with ethanol, it was dried at 60 ° C for 30 minutes to obtain a hydrophilicity measurement sample. After irradiating the sample with light having an ultraviolet intensity of 2 mWZ cm 2 for 24 hours using black light, the contact angle of the surface with distilled water was measured with a contact angle measuring instrument (Elma 360 S type). The evaluation criteria for hydrophilicity were as follows.
24時間光照射後の水の接触角 評価 Evaluation of water contact angle after 24 hours light irradiation
5° 以下 A 5 ° or less A
5 0 B 5 0 B
10〜30C C 10-30 C C
30° 以上 D 30 ° or more D
第 1表 Table 1
* 1 : ァクリル樹脂プレー 卜の全光線透過率 9 3 %、 ヘイズ率 0. 3 % * 1: Total light transmittance of acryl resin plate: 93%, haze ratio: 0.3%
* 2 :乳白色のため測定できず。 第 1 表に示すように、 実施例の試料 (P— 1 ) 〜 (P _ 1 5 ) は、 外観が良 好で、 しかも、 全光線透過率が非常に高く、 曇り(ヘイズ率の低い)のないプレー トが得られている。 膜の接着性は、 初期および耐久性試験後で全く問題がなく、 光触媒活性 (サラダ油の分解および親水性) も非常に高いものが得られている。 * 2: Cannot be measured due to milky white color. As shown in Table 1, the samples (P-1) to (P_15) of the examples had good appearance, very high total light transmittance, and haze (low haze). A plate with no gaps is obtained. The adhesion of the membrane was satisfactory without any problem at the initial stage and after the durability test, and the photocatalytic activity (decomposition and hydrophilicity of salad oil) was very high.
これに対して、 比較例 1では、 光触媒層中に金属酸化物ゲルもしくは金属水酸 化物ゲルが含有されていないので、 転写が不完全となり、 外観が損なわれている ばかりか、 接着性、 耐久性、 光触媒活性も悪いものしか得られていない。 比較例 2では、 接着層に通常の転写用樹脂を使用しているため、 光触媒の光酸化作用に より樹脂が分解し、 耐久性試験で膜が剥離してしまった。 On the other hand, in Comparative Example 1, since the metal oxide gel or metal hydroxide gel was not contained in the photocatalyst layer, the transfer was incomplete and the appearance was impaired, as well as the adhesiveness and durability. Only those with poor properties and poor photocatalytic activity were obtained. In Comparative Example 2, since a normal transfer resin was used for the adhesive layer, the resin was decomposed by the photooxidation action of the photocatalyst, and the film was peeled off in the durability test.
実施例 1 6 Example 16
表面処理の施されていない 2 5 / mの厚さのポリエチレンテレフタレートフィ ルム (東洋紡 E 5 0 0 1 ) 上に、 シリカゾル中に光触媒粒子を分散した光触媒コ 一ティング液 X (日本曹達のビストレイタ一 NDC— 130 C:固形分濃度 8%) を膜厚 0.3 mになるように口一ルコ一ターを用い 2 OmZ分の速度で塗布し、 120°Cで乾燥し、 光触媒層付き PETフィルム (A— 3) を作成した。 更にポ リシロキサン添加シロキサン架橋ァクリル樹脂溶液 Y (日本曹達のビストレイタ -NRC- 300 A :固形分濃度 10%) を膜厚 3 μπιになるようにロールコ一 ターを用い 2 OmZ分の速度でコート後、 120°Cで乾燥し、 転写シート (T_ 13) を作成した。 次に、 転写シート (Τ— 13) 上にポリカーボネィ トの溶融 物を Τ—ダイから押出し、冷却ロールで急冷し基材シートを剥離することにより、 最表面が光触媒層でなるポリカーボネイ トシート (P— 18) を作成した。 A photocatalyst core in which photocatalyst particles are dispersed in silica sol on a 25 / m-thick polyethylene terephthalate film (Toyobo E5001) with no surface treatment Apply a coating solution X (Nippon Soda's bistreiter NDC-130 C: solids concentration 8%) with a mouth coater at a rate of 2 OmZ to a film thickness of 0.3 m at 120 ° C. After drying, a PET film with a photocatalyst layer (A-3) was prepared. Furthermore, a polysiloxane-added siloxane-crosslinked acryl resin solution Y (Nippon Soda's bistreiter -NRC-300A: solid content concentration 10%) was coated at a rate of 2 OmZ using a roll coater to a film thickness of 3 μπι. After drying at 120 ° C, a transfer sheet (T_13) was prepared. Next, the molten polycarbonate is extruded from a die on a transfer sheet (Τ-13), rapidly cooled by a cooling roll, and the base sheet is peeled off. P-18) was created.
実施例 17 Example 17
ァク リル樹脂フィルム(鐘淵化学製サンジュレン 004 Ν ΑΤ、厚さ 50 ^m) と実施例 16で調整した転写シートの中間に溶融したポリエチレンを挟んで押し 出しラミネートし、 転写シート基材を剥離することにより、 最表面が光触媒層で なるアク リル樹脂フィルム (P— 19) を作成した。 Extruded and laminated with molten polyethylene sandwiched between an acrylic resin film (Sanjuren 004 ΑΤ 鐘, thickness 50 ^ m, manufactured by Kanegabuchi Chemical Co., Ltd., thickness 50 ^ m) and the transfer sheet prepared in Example 16, and peeled the transfer sheet base material. As a result, an acrylic resin film (P-19) having a photocatalyst layer on the outermost surface was prepared.
実施例 18 Example 18
ポリスチレンを T一ダイ法及びチルロール法を用いてフィルムに成形する工程 において、 実施例 16で調整した転写シート (T_ 13) を冷却ロール上で貼り 合わせポリスチレン樹脂と一緒に冷却工程をとおり、 転写シ一ト基材を剥離する ことにより、 最表面が光触媒層でなるポリスチレンフィルム (Ρ— 20) を作成 した。 In the step of forming the polystyrene into a film using the T-die method and the chill roll method, the transfer sheet (T_13) prepared in Example 16 was laminated on a cooling roll, and the transfer sheet was subjected to the cooling step together with the polystyrene resin. By peeling off the base material, a polystyrene film (20-20) having the photocatalyst layer on the outermost surface was created.
実施例 16〜18で得た試験プレート (Ρ— 18) 〜 (Ρ-20) の特性を前 述した方法で評価し、 その結果を第 2表に示す。 第 2表 The characteristics of the test plates (Ρ-18) to (Ρ-20) obtained in Examples 16 to 18 were evaluated by the method described above, and the results are shown in Table 2. Table 2
* 1 : 原料アクリルフィルム全光線透過率 93 %、 ヘイズ率 0. 6% 第 2表に示すように、 実施例 1 6〜1 8は、 外観が良好であった。 実施例 1 6 と 1 7は、 アクリルフィルムの透明性を全く損なわない、 全光線透過率が非常に 高く、曇り(ヘイズ率の低い)のない光触媒付きァクリルフィルムが得られている。 膜の接着性は、 初期および耐久性試験後で全く問題がなく、 光触媒活性 (サラダ 油の分解および親水性) も非常に高いものが得られている。 産業上の利用可能性: * 1: Raw material acrylic film total light transmittance 93%, haze ratio 0.6% As shown in Table 2, Examples 16 to 18 had good appearance. In Examples 16 and 17, a photocatalyst-containing acryl film having very high total light transmittance and no haze (low haze ratio) was obtained without impairing the transparency of the acrylic film at all. The adhesion of the membrane has no problem at the initial stage and after the durability test, and a very high photocatalytic activity (decomposition and hydrophilicity of salad oil) has been obtained. Industrial applicability:
以上述べたように、 接着層に二酸化ケイ素換算で 0. 5〜6 0重量%のシリコ 一ンを含有するシロキサン架橋型樹脂を使用することにより、 光触媒層を転写対 象物へ強固に接着することができ、 しかも、 光触媒の強力な光酸化作用でもその 接着性は損なう事がなく、 長期的に光触媒による抗菌、 消臭、 有害物質の分解除 去、 防汚、 防曇、 流滴等の機能を持続させることができる。 また、 上記した接着 層を用いなくても、 特定の性質を有する樹脂を用いることでも同様の機能を有す る構造体を転写によつて得ることができる。 As described above, the photocatalyst layer is firmly adhered to the object to be transferred by using the siloxane cross-linkable resin containing 0.5 to 60% by weight of silicon as silicon dioxide in the adhesive layer. In addition, the strong photooxidation effect of the photocatalyst does not impair its adhesiveness, and in the long term, antibacterial, deodorant, release of harmful substances by photocatalyst, antifouling, antifogging, drip, etc. Function can be maintained. Further, a structure having a similar function can be obtained by transfer without using the above-mentioned adhesive layer and using a resin having specific properties.
また、 本発明の方法によれば、 光触媒層を直接コートすることができないよう な耐溶剤性や耐熱性のないような板、 シー ト、 フィルムにも、 更に表面の平滑性 に問題があり、 光触媒層をコートすると外観が損なわれるような板、 シート、 フ イルムにも、 透明性、 接着性良好な光触媒層を接着することができ、 しかも、 光 触媒の強力な光酸化作用でもその接着性は損なう事がなく、 長期的に光触媒によ る抗菌、 消臭、 有害物質の分解除去、 防汚、 防曇、 流滴等の機能を持続させるこ とができるようなフィルム等を工業的に連続製造することができる。 Further, according to the method of the present invention, even plates, sheets, and films having no solvent resistance or heat resistance that cannot directly coat the photocatalyst layer have a problem in surface smoothness. A good photocatalytic layer can be adhered to a plate, sheet, or film whose appearance will be impaired if coated with a photocatalytic layer. Films that can maintain the functions of antibacterial, deodorant, decompose and remove harmful substances, antifouling, antifogging, and drip by photocatalyst for a long time without damage It can be manufactured continuously.
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001528521A JP4675535B2 (en) | 1999-10-01 | 2000-10-02 | Photocatalyst transfer sheet |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28099399 | 1999-10-01 | ||
| JP11/280993 | 1999-10-01 | ||
| JP11/280994 | 1999-10-01 | ||
| JP28099499 | 1999-10-01 | ||
| JP2000/63135 | 2000-03-08 | ||
| JP2000063135 | 2000-03-08 |
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| WO2001025362A1 true WO2001025362A1 (en) | 2001-04-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/JP2000/006825 Ceased WO2001025362A1 (en) | 1999-10-01 | 2000-10-02 | Sheet for transferring photocatalyst |
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| WO (1) | WO2001025362A1 (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005194309A (en) * | 2003-12-26 | 2005-07-21 | Nippon Soda Co Ltd | Composition for forming adhesive layer and photocatalyst-carrying structure |
| JP2005296841A (en) * | 2004-04-13 | 2005-10-27 | Fukuda Corporation:Kk | Method for decorating resin base or metal base |
| JP2007326276A (en) * | 2006-06-07 | 2007-12-20 | National Institute Of Advanced Industrial & Technology | Production method and product of functional film |
| KR100892031B1 (en) | 2008-12-04 | 2009-04-07 | 김동현 | Silicone transfer sheet with excellent adhesion and adhesion |
| JP2010082965A (en) * | 2008-09-30 | 2010-04-15 | Nissha Printing Co Ltd | Transfer sheet which has metal thin film in part of sheet surface and has acrylic anchor layer, and process for manufacturing the same |
| JP2010099651A (en) * | 2008-09-25 | 2010-05-06 | Panasonic Electric Works Co Ltd | Composite material and method for producing the same |
| ITBO20120317A1 (en) * | 2012-06-07 | 2013-12-08 | Next Technology Tecnotessile Societ A Naz D | METHOD OF REALIZING AN ANTIBACTERIAL PANEL. |
| WO2016139705A1 (en) * | 2015-03-02 | 2016-09-09 | パナソニックIpマネジメント株式会社 | Transfer film and method for manufacturing transfer film |
| WO2020116234A1 (en) * | 2018-12-04 | 2020-06-11 | ハリマ化成株式会社 | Mold resin with attached hard coat layer, and method for producing same |
| WO2020116231A1 (en) * | 2018-12-04 | 2020-06-11 | ハリマ化成株式会社 | Multilayer sheet and transfer material |
| CN111332056A (en) * | 2019-11-19 | 2020-06-26 | 江苏学泰印务有限公司 | Antibacterial corrosion-resistant heat transfer printing film and production process thereof |
| WO2020203567A1 (en) * | 2019-03-29 | 2020-10-08 | 大日本印刷株式会社 | Transfer foil |
| KR20200143713A (en) | 2018-04-12 | 2020-12-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Photocatalytic transfer film and manufacturing method thereof |
| KR20200143714A (en) | 2018-04-12 | 2020-12-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Photocatalytic transfer film and manufacturing method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0420581A (en) * | 1990-05-14 | 1992-01-24 | Furukawa Electric Co Ltd:The | Ultraviolet-curing self-adhesive sheet for surface protection and method of protecting surface |
| JPH08183934A (en) * | 1994-12-28 | 1996-07-16 | Toshiba Silicone Co Ltd | Adhesive sheet |
| WO1996029375A1 (en) * | 1995-03-20 | 1996-09-26 | Toto Ltd. | Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material |
| JPH09263742A (en) * | 1996-03-28 | 1997-10-07 | Sekisui Chem Co Ltd | Adhesive composition and adhesive item using the same |
| JPH10157021A (en) * | 1996-11-27 | 1998-06-16 | Matsushita Electric Works Ltd | Silicone transfer film and its transfer constituted body |
| JPH10180948A (en) * | 1996-12-24 | 1998-07-07 | Toto Ltd | Transfer sheet and method for transferring photocatalytic hydrophilic thin film |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2823249B2 (en) * | 1989-06-28 | 1998-11-11 | 鐘淵化学工業株式会社 | Primer for inorganic substrate |
| JPH09227169A (en) * | 1995-12-22 | 1997-09-02 | Toto Ltd | Transfer sheet, and transferring of photocatalytic and hydrophilic thin film |
-
2000
- 2000-10-02 WO PCT/JP2000/006825 patent/WO2001025362A1/en not_active Ceased
- 2000-10-02 JP JP2001528521A patent/JP4675535B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0420581A (en) * | 1990-05-14 | 1992-01-24 | Furukawa Electric Co Ltd:The | Ultraviolet-curing self-adhesive sheet for surface protection and method of protecting surface |
| JPH08183934A (en) * | 1994-12-28 | 1996-07-16 | Toshiba Silicone Co Ltd | Adhesive sheet |
| WO1996029375A1 (en) * | 1995-03-20 | 1996-09-26 | Toto Ltd. | Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material |
| JPH09263742A (en) * | 1996-03-28 | 1997-10-07 | Sekisui Chem Co Ltd | Adhesive composition and adhesive item using the same |
| JPH10157021A (en) * | 1996-11-27 | 1998-06-16 | Matsushita Electric Works Ltd | Silicone transfer film and its transfer constituted body |
| JPH10180948A (en) * | 1996-12-24 | 1998-07-07 | Toto Ltd | Transfer sheet and method for transferring photocatalytic hydrophilic thin film |
Cited By (23)
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|---|---|---|---|---|
| JP2005194309A (en) * | 2003-12-26 | 2005-07-21 | Nippon Soda Co Ltd | Composition for forming adhesive layer and photocatalyst-carrying structure |
| JP2005296841A (en) * | 2004-04-13 | 2005-10-27 | Fukuda Corporation:Kk | Method for decorating resin base or metal base |
| JP2007326276A (en) * | 2006-06-07 | 2007-12-20 | National Institute Of Advanced Industrial & Technology | Production method and product of functional film |
| JP2010099651A (en) * | 2008-09-25 | 2010-05-06 | Panasonic Electric Works Co Ltd | Composite material and method for producing the same |
| JP2010082965A (en) * | 2008-09-30 | 2010-04-15 | Nissha Printing Co Ltd | Transfer sheet which has metal thin film in part of sheet surface and has acrylic anchor layer, and process for manufacturing the same |
| KR100892031B1 (en) | 2008-12-04 | 2009-04-07 | 김동현 | Silicone transfer sheet with excellent adhesion and adhesion |
| ITBO20120317A1 (en) * | 2012-06-07 | 2013-12-08 | Next Technology Tecnotessile Societ A Naz D | METHOD OF REALIZING AN ANTIBACTERIAL PANEL. |
| WO2016139705A1 (en) * | 2015-03-02 | 2016-09-09 | パナソニックIpマネジメント株式会社 | Transfer film and method for manufacturing transfer film |
| JPWO2016139705A1 (en) * | 2015-03-02 | 2017-06-08 | パナソニックIpマネジメント株式会社 | Transfer film and transfer film manufacturing method |
| US11987682B2 (en) | 2018-04-12 | 2024-05-21 | Shin-Etsu Chemical Co., Ltd. | Photocatalyst transfer film and production method thereof |
| KR20200143713A (en) | 2018-04-12 | 2020-12-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Photocatalytic transfer film and manufacturing method thereof |
| US11319422B2 (en) | 2018-04-12 | 2022-05-03 | Shin-Etsu Chemical Co., Ltd. | Photocatalyst transfer film and production method thereof |
| KR20200143714A (en) | 2018-04-12 | 2020-12-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Photocatalytic transfer film and manufacturing method thereof |
| WO2020116231A1 (en) * | 2018-12-04 | 2020-06-11 | ハリマ化成株式会社 | Multilayer sheet and transfer material |
| KR20210098980A (en) * | 2018-12-04 | 2021-08-11 | 하리마카세이 가부시기가이샤 | Multi-layer sheet and transfer material |
| JPWO2020116231A1 (en) * | 2018-12-04 | 2021-10-14 | ハリマ化成株式会社 | Multi-layer sheet and transfer material |
| JPWO2020116234A1 (en) * | 2018-12-04 | 2021-10-21 | ハリマ化成株式会社 | Molded resin with hard coat layer and its manufacturing method |
| JP7345501B2 (en) | 2018-12-04 | 2023-09-15 | ハリマ化成株式会社 | Multilayer sheets and transfer materials |
| JP7434174B2 (en) | 2018-12-04 | 2024-02-20 | ハリマ化成株式会社 | Mold resin with hard coat layer and manufacturing method thereof |
| WO2020116234A1 (en) * | 2018-12-04 | 2020-06-11 | ハリマ化成株式会社 | Mold resin with attached hard coat layer, and method for producing same |
| KR102768189B1 (en) * | 2018-12-04 | 2025-02-13 | 하리마카세이 가부시기가이샤 | Multilayer sheets and transfer materials |
| WO2020203567A1 (en) * | 2019-03-29 | 2020-10-08 | 大日本印刷株式会社 | Transfer foil |
| CN111332056A (en) * | 2019-11-19 | 2020-06-26 | 江苏学泰印务有限公司 | Antibacterial corrosion-resistant heat transfer printing film and production process thereof |
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