[go: up one dir, main page]

WO2001085610A1 - Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees - Google Patents

Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees Download PDF

Info

Publication number
WO2001085610A1
WO2001085610A1 PCT/US2001/014590 US0114590W WO0185610A1 WO 2001085610 A1 WO2001085610 A1 WO 2001085610A1 US 0114590 W US0114590 W US 0114590W WO 0185610 A1 WO0185610 A1 WO 0185610A1
Authority
WO
WIPO (PCT)
Prior art keywords
gaseous stream
quench
liquid
scrubber
separating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/014590
Other languages
English (en)
Inventor
Leopoldo Salinas, Iii
Dennis W. Jewell
Kimberly K. Seidel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Dow Global Technologies LLC
Original Assignee
Dow Chemical Co
Dow Global Technologies LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co, Dow Global Technologies LLC filed Critical Dow Chemical Co
Priority to EP01935093A priority Critical patent/EP1292531A1/fr
Priority to JP2001582218A priority patent/JP2003532605A/ja
Priority to BR0109709-1A priority patent/BR0109709A/pt
Priority to AU2001261217A priority patent/AU2001261217A1/en
Publication of WO2001085610A1 publication Critical patent/WO2001085610A1/fr
Priority to NO20025283A priority patent/NO20025283D0/no
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/03—Preparation from chlorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride

Definitions

  • the invention relates to gasification processes for halogenated materials, and more particularly, to methods and apparatus for producing high quality aqueous acid from gasification products.
  • metal salts present in the feeds.
  • These metal salts could be corrosion products from the processes where the halogenated materials were produced, or spent catalysts, etc. Also, within the gasification process itself, corrosion occurs producing additional metal salts (if metals were used to contain the process). Wear of the refractory, generally an alumina based material, can also cause metal salt generation. Additionally, metal salts can also be introduced in process water used for pump purges and feed towers or other vessels, for example.
  • This invention relates to the efficient and effective removal of these salts, typically metal halides and metal oxides, from the products of the gasification process so that a high quality acid product, such as hydrogen chloride (HO), can be produced cost effectively.
  • these salts typically metal halides and metal oxides
  • the invention includes methods and apparatus for producing high quality aqueous acid from a gasification process for halogenated materials.
  • the methods include in one embodiment quenching a synthesis gas from a reactor (RGS - Figure 3 A) with a first liquid (LSI - Figure 3 A) , the gas containing hydrogen halide(s).
  • the method includes separating a first washed gaseous stream (WGSl - Figure 3 A) containing hydrogen halide(s) from the quenched syngas stream (QGS - Figure 3A).
  • the method includes atomizing the first gaseous stream with a second liquid (LS2 - Figure 3 A) and separating a second washed gaseous stream (WGS2 — Figure 3 A) containing hydrogen halide(s) from the atomized stream (AGS - Figure 3 A).
  • the method includes absorbing hydrogen halide from the second washed gaseous stream into an aqueous solvent to produce a raw aqueous acid.
  • the apparatus includes a reactor in fluid communication with a quench, preferably a weir quench.
  • the quench is in fluid communication with a vapor/liquid separator drum.
  • a venturi scrubber is in fluid communication with a gaseous stream from an upper portion of the quench drum.
  • the scrubber is in fluid communication with a scrubber drum.
  • An absorber is in fluid communication with a gaseous stream from an upper portion of the scrubber drum.
  • Figure 1 illustrates in block diagram form a preferred embodiment for a gasification process for halogenated materials.
  • Figure 2 illustrates a preferred embodiment for a gasifier in a gasification process for halogenated materials.
  • Figures 3 A and 3B illustrate a preferred embodiment for a quench and a particulate removal process for producing aqueous acids and synthesis gases from reformed halogenated materials.
  • Figures 4A and 4B illustrate a preferred embodiment for an absorber and an aqueous acid clean up process for producing high quality acid and synthesis gases from the gasification of halogenated materials.
  • the feed will be assumed to be RCl's, or chlorinated organics.
  • the gasifier area 200 of a preferred embodiment consists of two reaction vessels, R- 200 and R-210, and their ancillary equipment for the principal purpose of reforming the halogenated material, typically RCl's.
  • RCl's Hydrogenated material may frequently be referred to herein as RCl's, a typical form.
  • the RCl's in the form of liquid stream 144 are preferably atomized into a primary reactor R-200, preferably with pure oxygen 291 and steam 298.
  • a synthesis gas comprised primarily of carbon monoxide, to hydrogen chloride and hydrogen, and lesser amounts of water vapor and carbon dioxide, as well as trace elements including carbon (as soot).
  • the syngas preferably flows into a secondary reactor R-210, which has been provided to allow all reactions to proceed to completion, thus yielding very high conversion efficiencies for all halogenated species and minimizing undesirable side products.
  • hot gases from the reactor area 200 are cooled in a quench area 300 by direct contact with a circulating aqueous stream, preferably by intimate mixing in a weir quench vessel.
  • the mixture then preferably flows to a vapor-liquid separator from which quenched gas passes overhead and a bottoms liquid is cooled and recycled to the weir quench. At least a slip stream of the bottoms liquid is preferably flowed to a filter unit, discussed below, to remove entrained solids. Filtrate from the filter unit is preferably recycled to the quench.
  • Particulates in the syngas passing overhead from the quench vapor-liquid separator consisting essentially of soot, are preferably scrubbed from the gas stream in an atomizer or scrubber, preferably a wet venturi scrubber.
  • the scrubber liquid is preferably operated on a circulating loop, with blowdown liquid from this scrub system being combined with the slipstream from the quench liquid recycling system and directed to a particle recovery stage 350.
  • the blowdown and slipstream liquids are preferably flowed to a filter unit, more preferably a continuous candle filter unit.
  • a primary filter first removes solids from the process streams and discharges the solids as a concentrated slurry.
  • the concentrated slurry is preferably forwarded to a secondary filter where it is filtered and dewatered to a wet cake which is discharged, such as to a RC1 feed tank for recycle to the gasifier, or to an appropriate disposal system.
  • the filter unit uses a single filter producing a dry cake, as for example in Figure 3B wherein the quench liquor slipstream 330 is fed directly to FL-350.
  • particulate free syngas from the vapor-liquid separator scrubber is next preferably introduced to an HCl absorption column 400.
  • Noncondensible syngas components pass through the absorber overheads and on to a syngas finishing area 700.
  • HCl in the syngas is absorbed to a concentrated aqueous acid bottoms stream of about 35 wt percent HCl in the HCl absorption column 400.
  • This is a high quality aqueous acid stream and is preferably filtered and passed through an adsorption bed 450 to remove final traces of particulates and extremely minute amounts of organics, yielding a high quality aqueous HCl product suitable for sales or internal use.
  • a caustic scrubber, gas superheater, carbon bed adsorber, and syngas flare system can make up syngas finishing unit 700.
  • the caustic scrubber, or syngas finishing column uses cell effluent in the lower section of the column to absorb final traces of HCl and C12 from the syngas stream. Water can be used in the upper section of the column as a final wash of the product syngas. If the customer is unable to take the syngas, it can be flared to a dedicated flare system. The spent solution from the column bottoms can flow to an appropriate wastewater treatment system or is otherwise disposed of.
  • Gasifier area 200 in a particularly preferred embodiment, as discussed above, consists of two reaction vessels R-200 and R-210 and their ancillary equipment for the principal purpose of fully effective halogenated feed material conversion.
  • the halogenated material will be assumed to comprise RCl's, a typical form.
  • the RC1 liquid steam is preferably atomized into a primary reactor R-200 with preferably a pure oxygen stream 291 and a steam stream 298 through a main burner or nozzle BL-200.
  • RC1 components are partially oxidized and converted to synthesis gas (syngas) comprised primarily of carbon monoxide, hydrogen, hydrogen chloride, and lesser amounts of water vapor and carbon dioxide.
  • syngas synthesis gas
  • the syngas preferably flows into a secondary reactor R-210 provided to allow all reactions to proceed to completion, thus yielding very high conversion efficiencies for all halogenated species and minimizing undesirable side products.
  • Primary gasifier R-200 functions as a down fired, jet stirred reactor, the principal purposes of which are to atomize the liquid fuel, evaporate the liquid fuel, and thoroughly mix the fuel with oxygen, moderator, and hot reaction products.
  • the gasifier operates at approximately 1450°C and 5 bars, gauge (barg) (75 psig). These harsh conditions insure near complete conversion of all halogenated feed components.
  • the secondary gasifier R-210 in the preferred embodiment functions to allow the reactions initiated in the primary gasifier to proceed to equilibrium.
  • the secondary gasifier R-210 operates at approximately 1400°C and 5 barg (75 psig). These conditions are simply a function of the conditions established in the primary gasifier, less limited heat loss.
  • the reactions specifically desired in the secondary gasifier reduce or eliminate undesirable byproducts from the primary gasifier.
  • Example 1 The following example is provided for background. Example 1
  • Chlorinated organic material 9037 kg/hr
  • Gaseous stream 210 containing hydrogen halide(s) from a reactor is cooled in a quench unit 300, typically from approximately 1400°C, to typically approximately 100° C as illustrated in Figures 3 A and 3B. It will be assumed in further discussion of the preferred embodiments herein that the halogenated material feed into the gasifier is a chlorinated organic fuel.
  • Quenching is preferably achieved in a single contacting step where a recirculating, cooled aqueous hydrogen chloride liquid stream 317 is vigorously contacted with a hot gaseous stream 210 from a reactor.
  • This contacting step is preferably carried out in a weir quench Q-310.
  • a weir quench essentially includes a short vertical weir cylinder which penetrates a flat plate. Quench liquor flows into an annular volume created between vessel walls and the centralized cylinder, above the flat plate. The liquor preferably continually overflows the top of the cylinder and flows down the wall of the cylinder. Simultaneously, gas flows down through the cylinder into the region below.
  • liquid flowrate can be so high that back-up of the liquid occurs, to the point that the weir functions as a submersed orifice.
  • a weir quench requires that a heat balance be maintained and that the liquid flowrate preferably remains approximately within the second weir flow regime, as described above. This range may be approximately 1900 liters/min (500 gpm) to 5700 liters/min (1500 gpm) for acceptable weir performance.
  • a weir quench would preferably operate at a gasifier system pressure, approximately 5 barg (75 psig). Inlet temperature would be normally approximately 1400°C, and exit temperature normally would be approximately 100°C. Quench liquid flowrate might be approximately 5200 liters/minute ( 1400 gpm) at 60°C.
  • Quench liquor stream 317 supplied to the weir quench is preferably a circulating solution.
  • the two-phase stream 310 that exits the weir quench chamber preferably flows to a vapor-liquid separator, such as drum D-310. Liquid droplets are separated from the vapor stream in the drum, allowing a relatively liquid-free gaseous stream to pass overhead, as a first washed gas stream (WGSl), preferably into a particulate scrubbing system. Collected bottoms liquid from the drum is preferably pumped, as by pump P-310, through a graphite plate and frame heat exchanger E-310 and back to the weir quench as quench liquor.
  • the heat exchanger rejects the heat duty of quenching the gas, typically from about 1400°C to approximately 100°C, which heat duty could entail approximately 37MM kJ hr (35 MMBTU/hr).
  • the circulation rate and exchanger outlet temperature could be varied to achieve desired quench outlet temperatures within the operational constraints of the weir device and within heat exchanger boundaries, which might further be defined by a water balance efficiency and a contaminant removal efficiency.
  • Both pump P-310 and cooler E- 310 could be operated with two units and one as spare. Due to the preferable vigorous gas-liquid contact in the quench, the quench liquid
  • Make-up liquor stream 315 for the quench system can come from a particulate filter unit 350, which is at a high enough HCl concentration to avoid absorbing HCl from the gas and rather let it pass through where it can be captured as saleable acid in the absorber.
  • a weir quench functions effectively as a gas wash for removing at least first order contaminants, due to the weir quench's inherent gas-liquid contact. Both particulate and other trace gas species are removed to a certain extent - with removal efficiency increasing with increasing liquid operating rate.
  • a weir quench coupled with a downstream particulate scrubber VS-320 preferably enables the removal of essentially all aqueous acid soluble impurities from a gas stream so that an aqueous acid produced in a downstream absorber can cost effectively meet the impurities limits of aqueous HCl specifications.
  • the aforementioned impurities are anticipated to include primarily NH 3 , metals, and metal salts.
  • Metal salts that are entrained in gaseous stream WGSl exiting a quench knockout drum, such as a quench drum D-310, are preferably fed to an atomizing scrubber, such as a wet venturi scrubber VS-320.
  • the purpose of the venturi scrubber is to further scrub particulates, mostly soot, from the synthesis gas.
  • a venturi scrubber functions well to additionally remove entrained metal salts.
  • a venturi scrubbing system would typically be anticipated to operate at 90 -110°C and at a syngas system operating pressure, for example, approximately 4.8 barg (70 psig).
  • Normal vapor load is anticipated to be 1 actual cubic meter per second under operating conditions (2100 actual cubic feet/min), requiring approximately 1900 liters/min (500 gpm) aqueous scrubbing (for 30-35 wt percent HCl).
  • Pressure drop across a venturi would typically be 0.7 bars (10 psi). Solids concentration in a circulating scrub liquor LS2, is anticipated to run about 0.5 wt percent.
  • Venturi technology is one of the more efficient technologies for removing very fine solids from a vapor stream. While a gas wash effect of a quench can effectively remove larger solids, as just discussed, the high energy expended through a venturi can improve the capture efficiency for particles of all sizes, in particular as compared to other wet scrubbing devices.
  • the particles and metal salts penetrate and become trapped in liquid droplets through the fluid acceleration and deceleration created by the venturi.
  • Pressure drop can be optimized to maximize atomization and velocity differentials for particle capture. Pressure drop can, however, drop below a point where atomization of the liquid becomes too fine, creating droplets which are too small to practically separate in a downstream vapor-liquid separator.
  • a three-phase gaseous stream 320 discharges from venturi VS-320, preferably tangentially, into a vapor-liquid separation drum D-320.
  • the tangential entry can create a cyclonic effect, the centrifugal force of which can force the liquid droplets (with captured solids) to the walls where they can coalesce and gravity drain to the bottoms.
  • a radial vane demister followed by a chevron vane demister, or other suitable demisting devices, (not shown) may be placed in the upper half of the separator drum to maximize liquid droplet removal from the gas stream.
  • an essentially particle free gaseous stream WGS2 flows on to the acid, or HCl, absorption system.
  • a bottoms liquid stream 322 from a scrub vapor-liquid separator D-320 is preferably pumped directly back to the inlet of the venturi scrubber.
  • Most (for example, 80 percent) of the scrub liquid is preferably atomized directly to the center of the venturi throat via a pressure atomization nozzle.
  • Remaining liquid can be introduced via several tangential nozzles to create a swirling film of liquid which wets the walls of the venturi into the throat.
  • liquid to gas ratios are best maintained at or near 33 liters of scrub liquor per actual cubic meter of gas (0.25 gallons/actual cubic foot of gas).
  • make-up liquor stream 406 for the scrub system can come from absorber system bottoms, which should be at a high enough HCl concentration to avoid absorbing HCl from the gas and rather let it pass through where it can be captured as saleable acid in the absorber.
  • a continuous blowdown stream 325 to a particulate recovery unit 350, or filter unit, can be used to control the solids and metal salt concentration in this circulating scrub liquid. This blowdown also serves to control the aqueous chemistry, limiting salt and metal concentrations to acceptable levels.
  • a venturi scrubber also functions as a gas wash for removing contaminants due to its inherent gas-liquid contact. Again, both particulate and other trace gas species are removed to a certain extent.
  • the venturi scrubber coupled with the upstream weir quench, can optimally remove essentially all aqueous acid soluble impurities from a gas stream so that aqueous acid produced in a downstream absorber T-410 can each effectively meet the impurities limits of aqueous HCl specifications.
  • these impurities include primarily NH 3 , metal and metal salts.
  • HCl in raw syngas from a venturi can be absorbed in an HCl absorption tower, such as tower T-410 of Figure 4 A.
  • HCl might be approximately 25 percent of the inlet syngas gaseous stream 321, and can preferably be removed to roughly 0.05 percent in a syngas overhead product stream 418.
  • the remaining syngas gaseous stream 418 can pass to a syngas finishing area for final removal of trace components to produce a saleable or useable product.
  • Aqueous hydrogen chloride liquid stream 410 flows through an absorber bottoms cooler E-420 and preferably flows as stream 421 to an activated carbon bed system 450 (Figure 4B).
  • a prefilter FL-450 for the carbon bed T-460 system may remove particulate matter which may have been captured in the acid through the absorber system. Carbon beds can serve as a guard against very small amounts of semivolatile and heavier organic compounds in the product acid. Organic species which might have broken through a reactor and into the absorber are adsorbed to the carbon surface, and thus removed from the acid stream.
  • An after filter FL-460 can remove final traces of solids which may break through carbon bed discharge screens.
  • Two carbon beds T-460, illustrated in Figure 4B, are preferably operated singly, with the second bed as a spare.
  • Product acid stream 460 which is suitable for sales or other internal use HCl , can be stored in vat V-480. From there it can be pumped, as stream 481, to a site distribution header. Some degassing of an aqueous acid will occur in vat V-480. The drop in pressure to this atmospheric tank liberates noncondensibles absorbed from the syngas in the HCl absorber. These gases 482 can be vented to a vent blower knockout drum to be forwarded on to an Outside Block Limits vent treatment system.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

L'invention concerne des procédés et des dispositifs destinés à la production d'acide aqueux de haute qualité lors du reformage de matières organiques halogénées. Ces méthodes et ces dispositifs consistent à tremper un flux gazeux provenant d'un réacteur ; à séparer un flux gazeux du flux gazeux trempé afin de former un premier flux gazeux nettoyé ; à pulvériser un liquide d'épuration sur ce premier flux gazeux nettoyé ; à séparer un flux gazeux du flux gazeux pulvérisé afin de former un second flux gazeux nettoyé ; et à absorber une partie du second flux gazeux nettoyé afin de produire un acide aqueux brut.
PCT/US2001/014590 2000-05-05 2001-05-04 Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees Ceased WO2001085610A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP01935093A EP1292531A1 (fr) 2000-05-05 2001-05-04 Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees
JP2001582218A JP2003532605A (ja) 2000-05-05 2001-05-04 ハロゲン化有機材料の改質時の高品質水性酸の製造
BR0109709-1A BR0109709A (pt) 2000-05-05 2001-05-04 Produção de ácido aquoso de alta qualidade por reforma de materiais orgánicos halogenados
AU2001261217A AU2001261217A1 (en) 2000-05-05 2001-05-04 Production of high quality aqueous acid upon the reformation of halogenated organic materials
NO20025283A NO20025283D0 (no) 2000-05-05 2002-11-04 Fremstilling av höykvalitets vannholdig syre ved reformering av halogenerte organiske materialer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56619800A 2000-05-05 2000-05-05
US09/566,198 2000-05-05

Publications (1)

Publication Number Publication Date
WO2001085610A1 true WO2001085610A1 (fr) 2001-11-15

Family

ID=24261909

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/014590 Ceased WO2001085610A1 (fr) 2000-05-05 2001-05-04 Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees

Country Status (7)

Country Link
EP (1) EP1292531A1 (fr)
JP (1) JP2003532605A (fr)
CN (1) CN1426375A (fr)
AU (1) AU2001261217A1 (fr)
BR (1) BR0109709A (fr)
NO (1) NO20025283D0 (fr)
WO (1) WO2001085610A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102398895B (zh) * 2010-09-16 2014-09-24 上海化学试剂研究所 一种超纯电子级化学试剂的生产方法
CN102502499B (zh) * 2011-10-26 2013-08-28 上海哈勃化学技术有限公司 一种超净高纯盐酸的制备工艺

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4468376A (en) * 1982-05-03 1984-08-28 Texaco Development Corporation Disposal process for halogenated organic material
US5269235A (en) * 1988-10-03 1993-12-14 Koch Engineering Company, Inc. Three stage combustion apparatus
EP0595492A1 (fr) * 1992-10-30 1994-05-04 Tioxide Group Services Limited Traitement de déchet contenant des chlorides de métaux
WO1999032397A1 (fr) * 1997-12-22 1999-07-01 The Dow Chemical Company Production d'un ou plusieurs produits utiles, a partir de materiaux halogenes de valeur inferieure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4468376A (en) * 1982-05-03 1984-08-28 Texaco Development Corporation Disposal process for halogenated organic material
US5269235A (en) * 1988-10-03 1993-12-14 Koch Engineering Company, Inc. Three stage combustion apparatus
EP0595492A1 (fr) * 1992-10-30 1994-05-04 Tioxide Group Services Limited Traitement de déchet contenant des chlorides de métaux
WO1999032397A1 (fr) * 1997-12-22 1999-07-01 The Dow Chemical Company Production d'un ou plusieurs produits utiles, a partir de materiaux halogenes de valeur inferieure

Also Published As

Publication number Publication date
NO20025283L (no) 2002-11-04
CN1426375A (zh) 2003-06-25
JP2003532605A (ja) 2003-11-05
BR0109709A (pt) 2003-02-04
AU2001261217A1 (en) 2001-11-20
NO20025283D0 (no) 2002-11-04
EP1292531A1 (fr) 2003-03-19

Similar Documents

Publication Publication Date Title
US7687041B2 (en) Apparatus and methods for urea production
US5364604A (en) Solute gas-absorbing procedure
CN101848902B (zh) 用于从供氧管线移除粒状固体的湿式洗涤
EP0040493A1 (fr) Scrubber avec pulvérisateur à courant inverse et procédé de lavage d'un courant gazeux
US20020110511A1 (en) Horizontal scrubber system
KR101885932B1 (ko) 플래시 용기의 탈기 시스템
JP6762306B2 (ja) 尿素製造方法及び尿素製造装置
JP2004518102A (ja) ホットガスの急冷のための装置及び方法
KR101538341B1 (ko) 철 킬레이트 수용액을 이용한 고농도 황화수소 제거 시스템
JP4218618B2 (ja) 排ガス分解処理装置
CN111470941A (zh) 一种高品质环己醇生产装置及工艺
US11021667B2 (en) Integrated process and unit operation for conditioning a soot-containing syngas
CN212581530U (zh) 四氯化硅冷氢化系统
EP0958238B1 (fr) Procede de production de peroxyde d'hydrogene par hydratation d'une solution chinonique et dispositif utilise a cet effet
EP1286915B1 (fr) Elimination de particules pour reformer des materiaux organiques halogenes
EP1292531A1 (fr) Production d'acide aqueux de haute qualite lors du reformage de matieres organiques halogenees
CN112158848A (zh) 四氯化硅冷氢化系统
CN214513725U (zh) 一种四氯化钛尾气处理系统
EP4347552A1 (fr) Procédé de production d'isophoronediamine
EP1292530B1 (fr) Procede et appareil d'amelioration de la production de gaz dans un procede d'oxydation
JPS59122452A (ja) 尿素合成管
CA3072442C (fr) Procede integre et operation physique unitaire pour conditionner le gaz de synthese contenant de la suie
KR100221356B1 (ko) 멜라민 제조시 폐가스 함유 공정수로부터 암모니아 및 이산화탄 소를 분리 정제하는 공정
HUP0203023A2 (hu) Eljárás foszgénes szintéziseknél keletkező technológiai véggázok sósavtartalmának tisztítására
IL31936A (en) Production of methanol

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2001935093

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 2001 582218

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 018084338

Country of ref document: CN

WWP Wipo information: published in national office

Ref document number: 2001935093

Country of ref document: EP

WWW Wipo information: withdrawn in national office

Ref document number: 2001935093

Country of ref document: EP

DPE2 Request for preliminary examination filed before expiration of 19th month from priority date (pct application filed from 20040101)