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WO2001084193A1 - Masque de phase se composant d'un ensemble de plusieurs elements de diffraction destines a la fabrication precise, simultanee et de masse, d'ensembles coupleurs optiques, et procede associe de fabrication - Google Patents

Masque de phase se composant d'un ensemble de plusieurs elements de diffraction destines a la fabrication precise, simultanee et de masse, d'ensembles coupleurs optiques, et procede associe de fabrication Download PDF

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Publication number
WO2001084193A1
WO2001084193A1 PCT/US2001/014400 US0114400W WO0184193A1 WO 2001084193 A1 WO2001084193 A1 WO 2001084193A1 US 0114400 W US0114400 W US 0114400W WO 0184193 A1 WO0184193 A1 WO 0184193A1
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WO
WIPO (PCT)
Prior art keywords
gratings
grating
phase mask
light
volume
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/014400
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English (en)
Inventor
Thomas K. Gaylord
Elias N. Glytsis
James D. Meindl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Georgia Tech Research Institute
Georgia Tech Research Corp
Original Assignee
Georgia Tech Research Institute
Georgia Tech Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Georgia Tech Research Institute, Georgia Tech Research Corp filed Critical Georgia Tech Research Institute
Priority to AU2001261183A priority Critical patent/AU2001261183A1/en
Publication of WO2001084193A1 publication Critical patent/WO2001084193A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements

Definitions

  • TECHNICAL FIELD This application relates to the field of optical coupling, and more particularly, to the field of diffractive grating in-coupling and out-coupling of guided optical waves.
  • optical fibers and optical circuits manufactured today are microscopic in size, where typical optical waveguides feature a cross-section of but a few microns in diameter.
  • the present invention solves the above-described problems by providing a phase mask for creating multiple diffraction gratings simultaneously.
  • a diffraction grating can be created to be used as an optical coupler.
  • the present invention provides a phase mask incorporating multiple diffraction gratings for simultaneous production of multiple diffractive optical couplers.
  • the present invention allows the optical couplers described in U.S. Patent Application 09/165,822 to be produced in large quantities while significantly reducing the cost and labor required.
  • the phase mask is produced by creating a plurality of diffraction gratings using the method disclosed in 09/165,822.
  • the method disclosed in 09/165,822 teaches splitting a coherent light beam into a first coherent light beam and a second light beam.
  • the first coherent light beam is directed into a first lens and onto an optical component, such as a prism.
  • the second coherent light beam is directed into a second lens and onto the optical component.
  • the optical component optically transmits the first and second coherent light beams into a recording material to create a grating.
  • the phase mask can be designed to produce a plurality of volume gratings on a recording material, hi one embodiment, the phase mask uses a pair of volume gratings to produce an interference pattern to create a third volume grating on the recording material. In another embodiment, the phase mask can incorporate multiple volume gratings to simultaneously create multiple third volume gratings on the recording material.
  • FIG. 1 is an illustration of an exemplary embodiment of the present invention in its operating environment.
  • Fig. 2 is an illustration of an exemplary embodiment of a volume grating fabrication system for creating volume gratings on a phase mask.
  • Figs. 3 a - 3c illustrate an exemplary method of creating a plurality of volume gratings on a phase mask.
  • Fig. 4 is an illustration of an exemplary embodiment of a phase mask for creating a single volume grating.
  • Fig. 5 is a flow diagram illustrating an exemplary implementation of a method for making a phase mask.
  • Fig. 6 is a flow diagram illustrating an exemplary implementation of a method for making a plurality of volume gratings using a phase mask.
  • Fig. 1 is an illustration of an exemplary embodiment of the present invention in its operating environment.
  • the phase mask may be used to simultaneously create a plurality of diffraction gratings to be used as optical couplers.
  • Fig. 1 shows a phase mask 145 comprising a substrate 150 and a recording material
  • volume gratings 120, 125 or essentially equivalent surface- relief gratings have predetermined characteristics to diffract light 105 emitted from a light source 135 to a predetermined focus region on a second recording material 115 disposed on a second substrate 140.
  • the focus region may be a point, a line, a diffraction limited spot, or a multidimensional region, including a plane.
  • a diffraction limited spot is the smallest spot of focus for a given diameter lens system.
  • the light 105 emitted from the light source 135 is coherent light, such as laser light.
  • the volume gratings 120, 125 or essentially equivalent surface-relief gratings are designed to diffract light propagating in a specific light propagation direction.
  • each volume grating 120, 125 or essentially equivalent surface-relief grating is designed to receive light 105 at an angle of incidence that is substantially perpendicular to the planar surface of the phase mask 145 on which the volume grating 120 or essentially equivalent surface-relief grating is disposed.
  • the method for designing a grating with predetermined characteristics is described in U.S. Patent Application 09/165,822.
  • U.S. Patent Application 09/165,822 is hereby incorporated by reference in its entirety as if fully set forth herein.
  • each volume grating 120, 125 or essentially equivalent surface-relief grating created on the phase mask 145 has a predetermined surface grating pattern having a surface grating period varying along the length of the volume grating 120, 125 or essentially equivalent surface-relief grating, and a plurality of slanted grating fringes having a variable slant angle along the length of the grating 120.
  • the predetermined surface grating pattern may include a varying radius of curvature along the length of the grating 120, 125.
  • the recording material 110, 115 may be, but is not limited to, a photosensitive recording material such as a photo-refractive crystal material or an organic volume phase holographic material, or other suitable material known in the art.
  • the substrate 150 is glass such as fused silica, BK-7, or other similar glasses.
  • the substrate 150 may be any material suitable for use in a phase mask for propagating light through the phase mask.
  • the first and second volume gratings 120 and 125 create an interference pattern on the second recording material 115 to create a third volume grating 130 when they are excited by a coherent light wave.
  • Fig. 2 is an illustration of an exemplary embodiment of a volume grating fabrication system for creating volume gratings on a phase mask.
  • the volume grating fabrication system 200 may be used to create a phase mask 145.
  • the volume grating fabrication system 200 may be used to individually create volume gratings for use in other devices.
  • the volume grating fabrication system 200 is also described in U.S. Patent
  • Fig. 2 shows a volume grating fabrication system 200 comprising a laser 203 which emits a coherent light source, laser beam 206, two lenses 223 and 233, and an optical component 226.
  • the source laser beam 206 is directed into a beam splitter 209, which splits the source laser beam 206 into a first laser beam 213 and a second laser beam 216, the first and second laser beams 213 and 216 being mutually coherent.
  • two distinct mutually coherent lasers could be used instead of splitting the source laser beam 206 into a first and second laser beam 213 and 216.
  • any coherent light source may be used in place of the laser beam.
  • a mirror 219 directs the first laser beam 213 into a first lens 223 and onto an optical component 226, such as a prism.
  • the second laser beam 216 propagates straight through the beam splitter 209 into a second lens 233 and onto the optical component 226.
  • the optical component 226 may be, for example, a prism or other optical coupling device.
  • the optical component 226 optically transmits the first and second laser beams 213 and 216 into a recording material 110 which, for example, rests on a substrate 150.
  • the recording material 110 may be, for example, a photosensitive recording material such as a photo-refractive crystal material or an organic volume phase holographic material, or other suitable material known in the art.
  • An optical coupling solution (not shown) may be employed between the optical component 226 and the recording material 110 to facilitate the optical transmission of the first and second laser beams 213 and 216 from the optical component 226 to the recording material 110.
  • first and second lenses 223 and 233 with the optical component 226 create an interference pattern at the position of incidence of the light on the recording material 110.
  • the precise shape, focal length, and positioning of the first and second lenses 223 and 233 to achieve this interference pattern is determined as discussed in U.S. Patent Application 09/165,822.
  • the first lens 223 has an increased positive spherical aberration
  • the second lens 233 has a minimized positive spherical aberration, although other lens configurations may be employed.
  • a predetermined volume grating is created in the phase mask 145 by subjecting the recording material 110 to the interference pattern as shown.
  • the recording material 110 is subjected to uniform ultraviolet light to ensure that all polymers in the recording material 110 are cross-linked in the exposed recording material 110.
  • the article "Design of a high-efficiency volume grating coupler for line focusing” by Stephen M. Schultz, Elias N. Glytsis, and Thomas Gaylord (Applied Optics, vol. 37, no. 12, page 2278, 20 April 1998) is hereby incorporated by reference in its entirety as if fully set forth herein. This article describes in detail how to design and optimize a volume grating for outcoupling and line focusing of waveguided infrared light and the desired interference pattern to produce the grating.
  • Figs. 3a - 3c illustrate an exemplary method of creating a plurality of volume gratings on a phase mask.
  • a phase mask 145 may be used to simultaneously create numerous volume gratings on a circuit board or substrate. Additionally, a phase mask 145 may be designed to be used to create more phase masks.
  • An original phase mask 145 may be created using the volume grating fabrication system 200 described in Fig. 2. In order to create a phase mask 145, a plurality of volume gratings 120 and 125 or essentially equivalent surface-relief gratings must be created. Figs.
  • FIG. 3a, b, and c show the volume grating fabrication system 200 placed in three different positions to create three different volume gratings 120, 125 on the recording material 110 of the mask.
  • the volume grating or essentially equivalent surface-relief grating fabrication system 200 can be used to create gratings 120, 125 having predetermined characteristics at predetermined locations.
  • the method for determining the characteristics needed in the grating 120, 125 and the method for creating the gratings 120, 125 are described in U.S. Patent Application 09/165,822.
  • Fig. 4 is an illustration of an exemplary embodiment of a phase mask 145 for creating a single volume grating 130.
  • the operation of the phase mask 145 is similar to the operation of the volume grating fabrication system 200 except, however, the phase mask
  • first and second volume gratings 120 and 125 uses first and second volume gratings 120 and 125 or essentially equivalent surface- relief gratings to replace the first and second lenses 223 and 233.
  • the first and second gratings 120 and 125 focus two separate beams of light to a given location on a second recording material 115 to create an interference pattern at the position of light incident on the recording material 115 where a volume grating or essentially equivalent surface-relief gratings 130 is desired.
  • the third volume grating or essentially equivalent surface-relief grating 130 thus is created by subjecting recording material 115 to an interference pattern created by transmitting light through the first and second gratings 120 and 125 of the phase mask.
  • Fig. 5 is a flow diagram illustrating an exemplary implementation of a method for making a phase mask.
  • a phase mask 145 may be made using a volume grating fabrication system 200 using the method described in Fig. 5.
  • a phase mask 145 is created using a substrate capable of passing light waves and a recording material 110 for creating a volume grating 120.
  • the phase mask 145 is created by first aligning the volume grating fabrication system 200 to produce a predetermined volume grating 120 or essentially equivalent surface-relief grating in a desired location 505. Once the volume grating fabrication system 200 is properly aligned, two mutually coherent light beams are generated 510.
  • the two mutually coherent light beams may be generated separately, or by splitting a light beam into two light beams.
  • the mutually coherent light beams are lasers.
  • the pair of mutually coherent light beams are directed 515 into an optical component to transmit the light beams into the recording material 110.
  • the optical component 226 may be, but is not limited to, a prism.
  • any device capable of transmitting the coherent light beams to the recording material 110 of the mask 145 may be used.
  • the two light beams When the two light beams are directed through the optical component 226 to the recording material 110, the two light beams combine to create an interference pattern on the recording material 110 of the mask 145 at a focus region creating a grating 120.
  • the mutually coherent light beams are focused through two lenses 223 and 233 to create an interference pattern 520.
  • the interference pattern is designed to create the predetermined volume grating or essentially equivalent surface-relief grating 120 in the recording material 110 of the phase mask 145.
  • a phase mask 145 may have one grating, but typically has numerous gratings 120.
  • a pair of two volume gratings 120, 125 or essentially equivalent surface-relief gratings is created on the phase mask 145 for each grating 130 desired to be created by the phase mask 145.
  • more than two volume gratings 120, 125 or essentially equivalent surface-relief gratings could be used to create each grating 130.
  • Fig. 6 is a flow diagram illustrating an exemplary implementation of a method for making a plurality of volume gratings using a phase mask.
  • a phase mask 145 is used to create a plurality of volume gratings 130 or essentially equivalent surface-relief gratings.
  • the plurality of volume gratings 130 may be created using the method described in Fig. 6.
  • the gratings 130 are created on a microelectronic integrated circuit or a substrate or a printed wiring board.
  • the gratings 130 are used as optical couplers to couple light from a waveguide into a microelectronic integrated circuit.
  • the phase mask 145 is aligned over recording material 115 on which the gratings 130 are to be created.
  • the recording material 115 is coated on a microelectronic integrated circuit.
  • a coherent light produced by a light source is optically coupled through the phase mask 145 to the recording material 115 to create gratings 130 in the recording material 115.
  • a plurality of volume gratings 130 or essentially equivalent surface-relief gratings may be created substantially simultaneously as the light is coupled to the recording material 115.
  • the method of Fig. 6 may be used to mass produce circuit boards containing optical couplers inexpensively and in great quantity. This is made possible because many optical couplers may be created at one time without repositioning the a device to create each volume grating 130 or essentially equivalent surface-relief grating.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'invention concerne un masque de phase (145) conçu pour produire plusieurs réseaux de diffraction volumique (130) utiles en tant que coupleurs optiques; elle concerne également un procédé de création de ce masque de phase. On produit ce masque en créant plusieurs réseaux de diffraction volumique (120, 125) possédant des caractéristiques déterminées, lesquelles permettent à ce masque de phase, lorsqu'il est excité par une onde lumineuse cohérente, de produire plusieurs réseaux de diffraction volumique dans un matériau d'enregistrement (115).
PCT/US2001/014400 2000-05-03 2001-05-03 Masque de phase se composant d'un ensemble de plusieurs elements de diffraction destines a la fabrication precise, simultanee et de masse, d'ensembles coupleurs optiques, et procede associe de fabrication Ceased WO2001084193A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001261183A AU2001261183A1 (en) 2000-05-03 2001-05-03 Phase mask consisting of an array of multiple diffractive elements for simultaneous accurate fabrication of large arrays of optical couplers and method for making same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20163900P 2000-05-03 2000-05-03
US60/201,639 2000-05-03

Publications (1)

Publication Number Publication Date
WO2001084193A1 true WO2001084193A1 (fr) 2001-11-08

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WO (1) WO2001084193A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006013215A1 (fr) * 2004-08-06 2006-02-09 Optaglio Sro Procede destine a creer une image tridimensionnelle, element a diffraction et procede de creation correspondant
US7551335B2 (en) 2002-11-22 2009-06-23 Ovd Kinegram Ag Optically variable element and the use thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3536371A (en) * 1967-07-20 1970-10-27 Daniel Post Method and means for producing and utilizing arrays of diffraction type lenses for micro-electronics mask making
US4682841A (en) * 1981-06-15 1987-07-28 Afian Viktor V Light radiation concentrator and method of making the same
US5071207A (en) * 1990-09-25 1991-12-10 The United States Of America As Represented By The United States Department Of Energy Broadband diffractive lens or imaging element
US5760960A (en) * 1995-05-19 1998-06-02 Cornell Research Foundation, Inc. Cascaded self-induced holography

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3536371A (en) * 1967-07-20 1970-10-27 Daniel Post Method and means for producing and utilizing arrays of diffraction type lenses for micro-electronics mask making
US4682841A (en) * 1981-06-15 1987-07-28 Afian Viktor V Light radiation concentrator and method of making the same
US5071207A (en) * 1990-09-25 1991-12-10 The United States Of America As Represented By The United States Department Of Energy Broadband diffractive lens or imaging element
US5760960A (en) * 1995-05-19 1998-06-02 Cornell Research Foundation, Inc. Cascaded self-induced holography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7551335B2 (en) 2002-11-22 2009-06-23 Ovd Kinegram Ag Optically variable element and the use thereof
WO2006013215A1 (fr) * 2004-08-06 2006-02-09 Optaglio Sro Procede destine a creer une image tridimensionnelle, element a diffraction et procede de creation correspondant

Also Published As

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