WO2001065648A2 - Self-pulsing multi-section complex-coupled distributed feedback (dfb) laser - Google Patents
Self-pulsing multi-section complex-coupled distributed feedback (dfb) laser Download PDFInfo
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- WO2001065648A2 WO2001065648A2 PCT/US2001/006989 US0106989W WO0165648A2 WO 2001065648 A2 WO2001065648 A2 WO 2001065648A2 US 0106989 W US0106989 W US 0106989W WO 0165648 A2 WO0165648 A2 WO 0165648A2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0658—Self-pulsating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1215—Multiplicity of periods
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1228—DFB lasers with a complex coupled grating, e.g. gain or loss coupling
Definitions
- This invention is directed to distributed feedback (DFB) laser devices and related systems and methods of making and using DFB lasers.
- the invention is related to self-pulsing multi-section complex-coupled DFB lasers that generates a self-pulsed light signal.
- the invention is also directed to methods of making such devices, as well as systems incorporating such devices.
- Two-section DFB lasers attractive for applications such as variable-rate all-optical clock recovery, fiber backbone for broadband wireless networks, and/or for the generation of high- bit-rate optical time-division-multiplexing sources.
- two-section index-coupled DFB lasers require complicated design and fabrication to achieve strong index coupling, and require a tuning section to sustain the self-pulsation.
- U. S. Patent No. 5,936,994 issued August 10, 1999 to Jin Hong et al. discloses a two- section complex-coupled distributed feedback (DFB) laser as related to wavelength-tunable lasers, with a specific purpose of enhancing the wavelength tuning range.
- the active region has multiple quantum wells defined by a multi-layer structure that has alternating layers of P-type doped InP and P-type doped InGaAsP. These layers are etched to define two gratings with different periods in respective sections of the laser. Electrodes are formed over each section of the laser.
- the current injection in the first electrode with respect to that in the second electrode can be varied so that lasing occurs in a left or right Bragg mode across a laser stop band.
- the device can thus be controlled to lase at either the right or left Bragg mode. Current injection via the electrodes can be used to tune the left or right Bragg mode.
- This invention is directed to a self-pulsing multi-section complex-coupled distributed feedback (DFB) laser device that generates a self-pulsed light signal.
- the invention is also directed to systems that use such laser device, and related methods.
- DFB distributed feedback
- the disclosed laser device can comprise two or more sections.
- the device sections can comprise respective active regions for generation of laser light, and light confinement regions on opposite sides of the active regions, to reduce escape of light from the active regions.
- the device sections can comprise respective electrodes for injecting electric currents into respective active regions to tune the frequency of self-pulsed laser light generated by the DFB laser device.
- the grating(s) of respective sections can be defined in respective active regions of the device sections of the DFB laser device.
- either or both of the gratings of the DFB laser device can be in contact with the electrodes, or situated between the active region and electrodes, of respective sections of the DFB laser device.
- the active regions of the DFB laser device can comprise layers of indium phosphide (InP) and indium gallium arsenide phosphide (InGaAsP), or gallium arsenide (GaAs) and aluminum gallium arsenide (AlGaAs).
- the light confinement regions can comprise p-doped and n-doped InGaAsP layers in the case of a InP/InGaAsP laser device, or one or more layers of n-AlGaAs and p-AlGaAs in the case of a GaAs/AlGaAs laser device, for example.
- the respective grating lengths, grating spacings, effective refractive indices, coupling coefficients, center frequencies, gain coefficients, permittivity perturbations, guided mode wave profiles, and/or electric currents injected into the first and second sections can be established so that: (1) a mode of a first reflectivity spectrum of the first device section coincides with a side lobe of a second reflectivity spectrum of the second device section; and
- a mode of a second reflectivity spectrum of the second device section is positioned within the stop band of a first reflectivity spectrum of the first device section. Satisfaction of these two criteria assures that laser light generated by the DFB laser device is self-pulsing.
- similar parameters for a third device section can be determined so that a mode of the third reflectivity spectrum of the third device section is positioned between the modes of the first and second reflectivity spectra. This version of the device can be used to reduce jitter of self-pulsed light produced by the device.
- the disclosed laser device can be coupled to receive electric injection currents for tuning the frequency of the self-pulsation to generate a self-pulsed light signal that has a relatively constant period.
- the laser device can be incorporated into a system with jitter- reduction capability to stabilize the frequency of the self-pulsed light signal.
- the laser device can also be applied to use in recovery of an optical clock signal from an optical data signal.
- the disclosed laser device and systems incorporating it have significant utility in the optical networking industry.
- the present invention features systems comprising the self-pulsing multi-section complex-coupled distributed feedback (DFB) laser device of the present invention.
- DFB distributed feedback
- one such system comprises a radio-frequency (RF)/microwave-modulated optical source that generates an RF/micro wave-modulated signal on an optical carrier signal.
- the modulated optical carrier signal is supplied to the multi-section DFB laser device that generates self-pulsed laser light based thereon.
- the self-pulsed laser light produced by this system has reduced jitter due to the use of the modulated optical carrier signal.
- the system can be configured to operate the DFB laser device in either transmission or reflection mode.
- Another disclosed system includes a multi-section DFB laser device with at least two sections for generating self-pulsed laser light, and at least one additional section for generating laser light based on an RF signal from the system's RF source.
- the laser light resulting from the RF signal is used in the generation of the self-pulsed laser light from the other two sections of the DFB laser device.
- This self-pulsed laser light has reduced jitter due to the relatively constant period of the RF signal used in its generation.
- Methods of the invention can be used to determine the configuration and/or materials of a DFB laser device. These methods can comprise determining the configuration and/or material(s) for a multi-section complex-coupled distributed feedback (DFB) laser device, and determining reflectivity spectra for the first and second device sections of the laser device. The methods comprise determining whether the modes of the reflectivity spectra are arranged so as to cause self-pulsation. If the result of this step is negative, the methods can comprise modifying at least one of the configuration and material(s) of the laser device, and repeating the above steps.
- DFB distributed feedback
- the methods can comprise forming the laser device with the configuration and materials(s) determined to cause self-pulsation of the laser device.
- One of these methods can be used to form a three-section laser device by determining whether the mode of the reflectivity spectrum for a third section is between the modes of the reflectivity spectra of the first and second sections. If this determination is negative, this method comprises modifying at least one of the configuration and/or material(s) of the laser device and repeating previous steps. On the other hand, if this determination is affirmative, this method comprises forming the laser device with the configuration and material(s) determined to cause self-pulsation of the laser device.
- Another method of the invention comprises receiving an optical data signal with a multi-section complex-coupled distributed feedback (DFB) laser device, receiving electric currents with the DFB laser device, and generating a recovered clock signal with the DFB laser device, based on the optical data signal and the electric currents.
- DFB distributed feedback
- Fig. 1 is a schematic cross-sectional view of a two-section complex-coupled distributed feedback (DFB) laser device.
- DFB distributed feedback
- Fig. 2 is a flowchart of a method for making a self-pulsing two-section complex- coupled distributed feedback laser device.
- Fig. 3 is a graph of representative reflectivity spectra ri, r 2 versus variable ⁇ for a two- section complex-coupled DFB laser device.
- Fig. 4 is a relatively general cross-sectional view of a gain-coupled distributed feedback DFB laser device.
- Fig. 5 is a relatively detailed cross-sectional view of a gain-coupled DFB laser device.
- Fig. 6 is a relatively general cross-sectional view of a loss-coupled DFB laser device with gratings formed in contact with electrodes of respective device sections.
- Fig. 7 is a relatively detailed cross-sectional view of a loss-coupled DFB laser device with gratings formed in contact with electrodes of respective device sections.
- Fig. 8 is a relatively general cross-sectional view of a loss-coupled DFB laser device with gratings spaced apart from electrodes of respective device sections.
- Fig. 9 is a relatively detailed cross-sectional view of a loss-coupled DFB laser device with gratings spaced apart from electrodes of respective device sections.
- Figs. 10A, 10B, and IOC are cross-sectional views of square-step, saw-tooth, and undulating configurations for gratings of DFB laser devices in accordance with the invention.
- Fig. 11 is a system for reducing jitter of laser light generated by a multi-section complex-coupled distributed feedback (DFB) laser device.
- DFB distributed feedback
- Fig. 12 is a system comprising a radio-frequency (RF)/microwave-modulated optical source, a circulator, a control unit, and a multi-section complex-coupled DFB laser device, for reducing jitter in the self-pulsed optical signal generated by the DFB laser device.
- RF radio-frequency
- Fig. 13 is a relatively detailed exemplary embodiment of the system of Fig. 12.
- Fig. 14 is a cross-sectional view of a three-section complex-coupled distributed feedback (DFB) laser device.
- Fig. 15 shows graphs of representative reflectivity spectra , r 2 , r 3 versus variable ⁇ for a three-section complex-coupled DFB laser device.
- DFB distributed feedback
- Fig. 16 is a flowchart of a method for making a three-section complex-coupled DFB laser device.
- Fig. 17 is a view of a DFB laser device used for recovery of an optical clock signal from an optical data signal.
- “And/or” means “either or both”.
- “Coupled” in an electronic sense refers to joining electronic components together with a conductive line such as a wire or cable, or by transmission of signals through air or other media, or space, for example, whether directly or through intermediate device or medium.
- "Coupled” in an optical sense means joining optical, electro-optical, or opto-electrical devices together so as to permit passing of light from one to another.
- Optical coupling can be done through any transmissive media, including optical fibers, optical waveguides, air, water, space, optical adhesive, or other media, whether directly or through intermediate device or medium.
- Coupled as used in this sense should not be confused with “complex-coupled”, “gain- coupled”, “loss-coupled”, or “index-coupled” which terms refer to the manner in which optical field is exchanged between the forward- and backward-propagating light waves in a device section.
- Complex-coupled means that index-coupling, in addition to gain- or loss-coupling, are vehicles for coupling of light between the forward- and backward-propagating light modes within the section(s) of the laser device.
- Complex-coupled devices have a coupling coefficient that is a complex number.
- Index-coupled means that differences in refractive index defining the grating(s) of a distributed feedback (DFB) laser device, are the primary vehicle for coupling of light between forward-propagating and backward-propagating light modes within the device section(s) of the laser device.
- Index-coupled devices have a coupling coefficient K that is a real number;
- Gain-coupled means that differences in gain of the active region(s) associated with grating(s) of a distributed feedback (DFB) laser device, are the primary vehicle for coupling of light between forward-propagating and backward-propagating light modes within the section(s) of the laser device.
- Gain-coupled devices have a coupling coefficient K that is an imaginary or complex number;
- Gain is a measure of the amount of photons generated by the active region of the DFB laser device per unit energy input for their generation; “Grating period” refers to the length along the optical propagation direction through which the material and/or structure undergoes one complete cyclic change.
- Loss-coupled means that differences in loss of light in the gratings of the sections of the DFB laser device are the primary vehicle for coupling light between forward-propagating and backward-propagating light modes within the section(s) of the DFB laser device. Loss- coupled devices have a negative gain, i.e., the coupling coefficient is a negative imaginary or complex number.
- N-type refers to a semiconductor material doped with donor atoms.
- the donor atoms can be Si, Se in the case of gallium arsenide (GaAs)/aluminum gallium arsenide (AlGaAs) semiconductor materials, or Si in the case of the indium phosphide (InP)/indium gallium arsenide phosphide (InGaAsP).
- Primary mode refers to the mode in a device section that has the lowest threshold. Threshold is the minimum electrical injection current required for lasing of the device.
- P-type refers to a semiconductor material doped with acceptor atoms.
- the acceptor atoms can be beryllium (Be), magnesium (Mg), zinc (Zn), cadmium (Cd), silicon (Si), carbon
- AlGaAs AlGaAs semiconductor materials, or Zn, Be, Mg in the case of the indium phosphide
- InP indium gallium arsenide phosphide
- InGaAsP indium gallium arsenide phosphide
- Radio-frequency (RF)/microwave-modulated signal refers to a signal modulated in the radio-frequency or microwave range.
- Self-pulsing refers to a phenomenon in which a laser device, supplied with direct current (DC) bias or injection, generates a signal with a periodic intensity variation.
- Sege refers to a mode other than the primary mode.
- Electrodes means “one or more electrode.”
- Fig. 1 is a schematic diagram of a two-section complex-coupled distributed feedback
- the two-section DFB laser device 1 comprises device sections 2, 3.
- the device sections 2, 3 comprise respective gratings 4, 5 defined by one or more of respective repetitive units 6, 7.
- each of the repetitive units 6, 7 is specifically indicated in Fig. 1, but it should be appreciated that each has several repetitive units, and in general many more than shown in the Figures.
- the gratings 4, 5 may each have from ten to many thousand repetitive units 6, 7.
- the repetitive units 6, 7 can be defined by periodic variation in refractive index, gain, or loss of the material(s) composing such gratings, along the z-axis direction in Fig. 1.
- the configuration and/or material(s) used to form the two- section DFB laser device 1 is determined so as to cause self-pulsation of laser light produced by such device.
- electric current I ( , I 2 is injected into the device sections 4, 5, respectively.
- the electric current Ii, I 2 causes generation of photons in the active regions of the device sections 4, 5.
- These photons travel in the laser device 1 as forward- propagating light wave Fi and backward-propagating light wave Bi in the first device section 2, and as forward-propagating light wave F 2 and backward-propagating light wave B 2 in the second device section 3.
- the forward-propagating light waves Fi, F 2 and backward- propagating light waves B b B 2 are related to one another in the following way.
- a portion of the light wave Fi travels along the positive z-axis direction in Fig. 1 and passes into the second section 3. This portion of the light Fi combines with light generated within the second section 3, to form the light wave F 2 .
- the light wave F 2 travels in the positive z-axis direction to output interface 8 defined as the boundary between the second device section 3 and external medium 9.
- the external medium 9 can be air, a vacuum, an optically-transmissive medium such as an optical fiber or waveguide.
- the external medium 9 can alternatively be an optically- transmissive adhesive layer attached to an optical fiber, for example.
- a portion of the light wave F 2 travels in the positive z-axis direction through the interface 8 and into the external medium 9 as the light wave F 0UTPUT -
- Another portion of the light wave F 2 reflects from the repetitive units 6 and interface between the second section 3 and the external medium 9, and combines with a portion of the light generated in the second device section 3 to form the light wave B 2 .
- a portion of the light wave B 2 travels in the negative z-axis direction and into the first device section 2. This portion of the light wave B 2 combines with a portion of the light generated or reflected in the device section 2, to form the backward-propagating light wave Bi.
- the light wave B 2 reflects to propagate in the positive z-axis direction to combine with light generated or reflected within the first device section 2, to form the forward-propagating light wave Fi.
- the ratio of the backward- propagating light wave Bi and the forward-propagating light wave Fi is directly proportional to the reflectivity ri of the laser device 1.
- the ratio of the backward-propagating light wave B 2 and the forward-propagating light wave F 2 is proportional to the reflectivity r 2 of the second device section 3.
- the selection of the configuration and/or material(s) defines the reflectivities ⁇ r 2 whose relationship can be made such as to cause self- pulsating behavior, as described in more detail below.
- step SI the method of Fig. 3 begins.
- step S2 the configuration and/or material(s) are determined for the two-section distributed feedback (DFB) laser device 1 based on approximate analytical methods.
- step S3 the reflectivity spectra are determined for the two device sections 2, 3 of the laser device 1 using the specification of the configuration and material(s).
- step S4 a determination is made to establish whether the modes of the reflectivity spectra are arranged so as to cause self-pulsation. If not, in step S5, the configuration and/or material(s) of the laser device are modified and the method returns to step S3.
- step S6 the laser device 1 is formed with the configuration and material(s) determined to produce self-pulsation in such laser device.
- step S7 the method of Fig. 2 ends.
- the method of Fig. 2 is thus an iterative process in which configuration and material(s) of the device sections 4, 5 of the two-section DFB laser device 1 can be corrected to generate reflectivity spectra that are analyzed for proper disposition of modes in the device sections 2, 3 to cause self-pulsation of the laser device 1.
- the configuration and/or material(s) defining the laser device 1 can be selected by the grating lengths Lj, L 2 and/or the spacings A !5 ⁇ 2 of the repetitive units 6, 7.
- the structure of the gratings 4, 5 can be varied by defining the grating to have a square-step, saw-tooth, or undulating, wave-like profile, for example.
- the material(s) and dopant atoms or other chemical additives for the laser device 1 can be selected to modify the effective refractive indices ri ef n, ri ef c, the coupling coefficients ⁇ , ⁇ 2 , the center frequencies ⁇ 0 ⁇ , ⁇ 02 , gain coefficients ⁇ ⁇ 2 , the permittivity perturbations ⁇ i, ⁇ 2 , and guided mode wave profiles ⁇ y ( ⁇ :), ⁇ 2y (jc) of the respective device sections 2, 3.
- the DC currents injected into respective device sections 2, 3 of the device 1 influence the charge carrier concentrations in such sections, and thereby also the effective refractive indices n effl , ri ef c.
- the above parameters can be selected for the complex-coupled laser device 1 so that:
- a mode of a first reflectivity spectrum of the first device section coincides with a side lobe of a second reflectivity spectrum of the second device section;
- a mode of a second reflectivity spectrum of the second device section is positioned within the stop band of a first reflectivity spectrum of the first device section. Attainment of these criteria means that DFB laser device will generate self-pulsed laser light.
- the modes A and B of the first and second device sections 2, 3 are primary modes.
- the first equation expresses the permittivity perturbation ⁇ (x,z), which is the difference between the permittivity of the device section in the presence of the grating and the permittivity of the device in the absence of the grating. Since the permittivity perturbation A ⁇ (x,z) is periodic in z, it can be expressed by a Fourier series expansion as follows:
- ⁇ (x) represents the profile of permitivity perturbation in the x-direction
- a q is a constant representing the strength of the index perturbation in the qth order of the grating
- A is the period of the grating.
- ⁇ is a variable representing the frequency of light generated by the laser device 1
- ⁇ 0 is the permittivity of free space
- ⁇ is the order of the DFB grating
- z y (x) is the guided wave profile of the light mode in the grating region, that can be determined from the eigenvalue equation:
- ⁇ (x) represents the geometry and index profiles of the unperturbed waveguide
- n eff is the effective refractive index of the guided mode.
- the grating period together with the effective refractive index of the guided mode determine the center frequency ⁇ 0 of a frequency band of light that will be reflected by the grating according to:
- variable s is defined as:
- the reflectivity r for a section can be determined from the following equation:
- Gain-Coupled Embodiment of Laser Device Fig. 4 is a view of a two-section distributed feedback (DFB) laser device 1 of the invention.
- the laser device 1 includes first and second device sections 2, 3 with respective gratings 4, 5.
- the gratings 4, 5 can be defined by respective repetitive units 6, 7.
- the laser device 1 comprises a substrate 12, a first light confinement region 14, an active region 16, and a second light confinement region 18.
- the gratings 4, 5 are formed in the active region 16.
- the substrate 12 can be composed of a material such as n-doped InP or GaAs.
- the active region 16 can be composed of alternating layers of undoped InGaAsP and undoped InP.
- the active region 16 can be composed of one or more layers of GaAs positioned between layers of AlGaAs and AlGaAs.
- the light confinement regions 14, 18 are positioned on opposite sides of the active region 16, The light confinement regions 14, 18 can be formed so that they contact the active region 16, The light confinement regions 14, 18 have a lower refractive index than the active region 1 and thus, as positioned on opposite sides of the active region 14, tend to confine light within the active region to prevent its loss.
- the light confinement layers 14, 18 can each be composed ol one or more layers of p-doped and n-doped InGaAsP layers respectively in the case of the InP/InGaAsP laser device, or one or more layers of n-AlGaAs and p- AlGaAs in the case of the GaAs/AlGaAs laser device. Electrodes 20, 22 are formed over respective gratings 4, 5 for use in injecting electric currents into the gratings to influence the concentration of charge carriers The concentration of charge carriers affects the refractive indices of the material(s) composing the gratings 4, 5, and hence the frequency of self-pulsation of the output laser light F OUTPUT o the laser device 1.
- the control unit 24 is connected to electrodes 20, 22 and generates th( electric currents supplied to the electrodes for tuning the frequency of the output laser ligh F OUTPUT -
- the control unit 24 is also coupled to the substrate 12 to ground the control unit 2 ⁇ relative to the laser device 1.
- the control unit 24 can be a commercially-available device sucl as a 3900 Mainframe Modular Laser Diode Controller produced by ILX Lightwav ⁇ Corporation, PO Box 6310, Bozeman, MT 59771.
- the configuration and materials of the lase device 1 of Figure 4 are determined to produce self-pulsation.
- the gratinj material(s) interacting with the light are selected to define the modes A, B of the respective reflectivity spectra r,, r 2 of respective sections 2, 3 according to equations (1) - (7) above.
- Selection of the materials of the DFB laser device 1 and the DC injection currents largely defines effective refractive indices r ef ⁇ , r ef n of the material(s) interacting with the light.
- Selection of the configuration of the DFB laser device 1 largely defines the grating lengths Li, L 2 , and the grating spacings ⁇ i, ⁇ 2 .
- Both configuration and material(s) composing the DFB laser device 1 impact the coupling coefficients Ki, ⁇ , the center frequencies ⁇ 0 ⁇ , ⁇ 02 , the gain coefficients ⁇ i, ⁇ 2 , the permittivity perturbations ⁇ i, ⁇ 2 , and guided mode wave profiles ⁇ ly (x), ⁇ 2y (; ).
- Fig. 5 is an relatively detailed exemplary embodiment of a laser device 1 of Fig. 4.
- the structure of the laser device 1 of Fig. 5 is similar to the laser device described in U. S. Patent No. 5,936,994, but of course differs therefrom in that configuration and materials have been determined using reflectivity spectra ⁇ r 2 to produce self-pulsation of laser light generated by the laser device 1.
- the laser device 1 of Fig. 5 is a gain-coupled laser device due to the configuration of the active region that produces a varied gain along the z-axis and x-axis directions.
- the DFB laser device 1 may also optionally be configured to vary along the y-axis direction as well, although this feature is not shown in Fig. 5.
- Fig. 5 is an relatively detailed exemplary embodiment of a laser device 1 of Fig. 4.
- the structure of the laser device 1 of Fig. 5 is similar to the laser device described in U. S. Patent No. 5,936,994, but of course differs therefrom in that configuration and
- the laser device 1 includes substrate 12, confinement region 14, active region 16, and confinement region 18.
- the substrate 12 supports the active region 16 and confinement regions 14, 18.
- the active region 16 generates laser light that is self-pulsed as defined by the configuration and material(s) of the laser device 1.
- the confinement regions 14, 18 are situated on opposite sides of the DFB laser device and help to confine the laser light within the active region 16.
- Electrodes 20, 22 are formed over respective device sections 2, 3, and are coupled to control unit 24 that injects current of charge carriers (i.e., electrons or holes) into the electrodes. The electrodes introduce the charge carriers into the active region to tune the frequency of self-pulsation of the laser light resulting from the laser device 1.
- the substrate 12 is a heavily n-doped InP substrate generally of hundreds of microns in thickness, and thus proportionally much larger than shown in Fig. 5.
- the substrate 12 is an n-type GaAs substrate.
- the confinement region 14 can include four confinement layers 30, 32, 34, 36 that are composed of n-type doped InGaAsP in the case of an InP InGaAsP device or AlGaAs in the case of a GaAs/AlGaAs. These layers have successively increasing refractive indices relative to one another from layer
- the active region 16 overlies the confinement region 14.
- the active region 16 has a multiple quantum well structure that includes eight 1% compressively strained undoped InGaAsP or AlGaAs quantum wells 38 each five (5) nm thick, separated by seven undoped InGaAsP or AlGaAs unstrained barriers 40 with band gap corresponding to a wavelength of approximately 1.25 microns, each barrier being approximately ten (10) nm thick. In general, increasing the number of quantum wells provides higher gain per unit length of the laser cavity. Although seven layers 38, 40 are shown in Fig.
- the band gap of the quantum well structure described above provides a lasing wavelength of the device at about 1.55 microns.
- the laser device 1 includes two undoped InGaAsP or AlGaAs buffer layers 42, 44 with successively decreasing refractive indices, provided over the active region 14.
- the layers 42, 44 each have a thickness of ten (10) to one-hundred (100) nm.
- the gain of gratings 4, 6 is varied along the z-axis and x-axis directions, and optionally also along the y- axis direction, by periodically etching grooves through the active region 14.
- a resist layer can be formed over layer 44, exposed with light patterned with a mask in a photolithography system or an electron beam in an e-beam lithography system, developed, and baked for hardening.
- Etching of the exposed areas of the layers 38, 40 of the active region 16, i.e., those not covered by the resist layer, can be performed with a reactive ion etching (REE) technique, for example, to form grooves in the active region 16.
- REE reactive ion etching
- Layer 46 composed of undoped InP or AlGaAs with band gap larger than the quantum well band gap energy, is deposited in the etched grooves of the active region 14 to form the gratings 6, 7.
- the confinement region 18 including layers 48, 50, 52, 54, 56 is formed on the layer 46.
- the layer 48 includes P-type doped InP or AlGaAs of one-hundred (100) microns in thickness deposited over the layer 46.
- An etch stop layer 50 composed of P-type doped InGaAsP or AlGaAs of one (1) to ten (10) nm thickness is deposited on layer 48.
- a layer 52 composed of P-doped InP or GaAs formed to one- to five-hundred (100-500) microns in thickness is formed over the etch stop layer 50.
- An upper cladding layer 54 composed of P-type InP or GaAs is formed over the layer 56 to a thickness of one- to two-thousand (1000-2000) nm.
- a highly doped P-type InGaAs or GaAs capping layer 56 is formed over the layer 60 to a thickness of one- to five- hundred (100-500) A. All of the layers 28-56 can be formed by an epitaxial crystal growth technique such as metalorganic chemical vapor deposition (MOCND).
- MOCND metalorganic chemical vapor deposition
- a conductive metal layer can be formed over the capping layer 56.
- the metal layer can be composed of chromium (Cr), titanium (Ti), gold (Au), titanium-gold (Ti-Au) or other metal or alloy.
- the layers 52, 54, 56 and the metal layer are etched via REE, for example, to etch stop layer 50, to form electrodes 20, 22 on respective islands composed of layers 52, 54, 56.
- the control unit 24 is coupled to the electrodes 20, 22 via wires soldered to the electrodes 20, 22, for example, to control current injection into the device sections 2, 3.
- a metal electrode 26 can be formed by evaporation or sputtering, for example, on the back surface of the substrate 12. The metal electrode 26 can be used to electrically ground the laser device 1 relative to the control unit 24. 4. Loss-Coupled Embodiment of Laser Device
- Fig. 6 is a view of a loss-coupled DFB laser device 1.
- the loss-coupled laser device 1 includes a substrate 12, light confinement region 14, an active region 16, and light confinement region 18.
- the configuration and materials of the regions 12, 14, 16, 18, and the electrodes 20, 22, are selected so that the modes of reflectivity spectra ⁇ r 2 for the two device sections 2, 3 cause self-pulsation of laser light generated by the laser device 1.
- the electrodes 20, 22 are in contact with loss-coupled gratings 2, 3.
- the lossy elements, which are absorptive to light, of the grating units 6, 7 are of the same electrically conductive material as that of the electrodes.
- this embodiment allows a single-step process for the deposition of the grating elements and the electrodes.
- the manufacture of the laser device 1 is greatly simplified in the embodiment of Fig. 6.
- the control unit 24 is coupled to the electrodes 20, 22 to supply current to the device sections 2, 3 to tune the laser device 1 of Fig. 6.
- the control unit 24 is also coupled to the substrate 12 so that the laser device 1 is grounded relative to the control unit 24.
- the laser device 1 includes a substrate 12, an active region 16, and light confinement regions 14, 18.
- the substrate 12 can be composed of InP or GaAs, for example.
- the substrate 12 can be from one-hundred (100) to one-thousand (1,000) microns in thickness, for example, five- hundred (500) microns being typical.
- the laser device 1 can include a buffer layer 28 of n-type doped InP or GaAs.
- the buffer layer 28 can typically be from one (1) to five (5) microns in thickness.
- the confinement layer 14 can be composed of contiguous layers 30, 32, 34, 36 composed of n-type doped InGaAsP in the case of a GaAs/TnGaAsP device or an AlGaAs in the case of a GaAs/AlGaAs device.
- the doping or formulation of the layers 30, 32, 34, 36 can be made so that the refractive indices of these layers grade between the relatively low refractive index of the substrate 12, to the relatively high index of the active region 16.
- the layers 30, 32, 34, 36 can from five (5) to one-hundred (100) nanometers in thickness, for example, twenty (20) nanometers being a typical thickness.
- the active region 16 overlies confinement region 14.
- the active region 16 includes alternating layers 38, 40.
- the active region includes eight (8) multiple quantum well layers, but it should be understood that from five (5) to fifteen (15) of such layers can be used in the laser device 1.
- Increasing the number of multiple quantum well layers 38 increases the gain of the laser device 1.
- the multiple quantum well layers 38 can include undoped InGaAsP or AlGaAs layers.
- the layers 38 can typically be from one (1) to one-hundred (100) nanometers thick, ten (10) nm being a typical thickness for each layer.
- the layers 38 can be one-percent (1%) compressively-strained so that internal stress in the active region 16 does not result in damage.
- the layers 40 can be unstrained InGaAsP or AlGaAs layers.
- the layer 48 includes P-type doped InP or AlGaAs of one-hundred (100) microns in thickness deposited over the active region 16.
- Etch stop layer 50 composed of undoped InGaAsP or AlGaAs layer can be formed over the layer 48.
- the etch stop layer 50 can also provide a diffusion barrier to prevent impurity atoms from the upper cladding layer 18 from diffusing into the active region 16 and undesirably modifying the electro-optical performance of such region.
- a layer 52 composed of P-type doped InP formed from typically one- to five-hundred (100-500) nanometers in thickness is deposited over the etch stop layer 50.
- An upper cladding layer 54 composed of P-type InP is formed over the layer 52 to a typical thickness of one- to two-thousand (1,000-2,000) A.
- a highly-doped P-type InGaAs capping layer 56 is formed over the layer 54 to a thickness of one- to five-hundred (100-500) A.
- Layers 28-56 can be formed by MOCND processes, for example.
- a conductive metal layer is formed over the capping layer 56.
- the metal layer can be composed of chromium (Cr), titanium (Ti), gold (Au), titanium-gold (Ti-Au) or other metal or alloy.
- the metal layer can be formed by evaporation or sputtering, for example.
- the layers 52, 54, 56 and the metal layer are etched via RIE, for example, to etch stop layer 50, to form electrodes 20, 22 on respective islands composed of layers 52, 54, 56.
- the control unit 24 is coupled to the electrodes 20, 22 via wires, for example, soldered to the electrodes 20, 22 to control current injection into the device sections 2, 3.
- a metal electrode 26 can be formed on the back surface of the substrate 12.
- the metal electrode 26 is coupled to the control unit 24 to electrically ground the laser device 1 relative to such control unit. This too can be accomplished by soldering a wire to the metal electrode 26 and coupling such wire to the control unit 24.
- Fig. 8 is an alternative embodiment of a self-pulsing loss-coupled complex-coupled
- the DFB laser device 1 of Fig. 8 is similar in configuration and operation to the device of Fig. 6, with the exception that the repetitive units 6, 7 of respective gratings 4, 5 are formed in the light confinement region 18 spaced apart from respective electrodes 6, 7 and the active region 16.
- the repetitive units 6, 7 are made of a material absorptive to the laser light generated in the active region 16, to define respective loss-coupled gratings 4, 5.
- Fig. 9 is a specific implementation of the device 1 of Fig. 8.
- the device 1 of Fig. 9 comprises substrate 12, light confinement region 14, and active region 16 the same as or similar to previously-described configurations. However, the light confinement region 18 and the gratings 4, 5 are defined somewhat differently from previously-described configurations.
- layers 48, 50 and 52 are formed over the active region 16, as previously described.
- the layer 52 is etched to form periodic openings using suitable etching techniques.
- Optically- absorptive material such as chromium (Cr), titanium (Ti), or other metal or alloy, is deposited in the openings in layer 52 to form the repetitive elements 6, 7 of respective gratings 4, 5.
- Layers 54 and 56 are formed over the layer 52 and the grating elements 6, 7.
- a metal layer is deposited over layer 56 and is patterned to form electrodes 20, 22 that are electrically coupled to the coupled unit 24 to receive respective DC currents from the control unit 24. Etching can be selectively performed between the electrodes 20, 22 to the layer 50 to electrically-isolate the electrodes 20, 22 from one another.
- the gratings 4, 5 defined in respective sections 2, 3 of the laser device 1 can be formed with different configurations.
- Fig. 10A indicates a square-wavelike grating cross-section.
- Fig. 10B shows the gratings 4, 5 defined in respective sections 2, 3 with a saw-tooth configuration.
- Fig. 10C shows the gratings 4, 5 defined in the sections 2, 3 with an undulating or wave-like pattern.
- the gratings 4, 5 can be formed to have any of these and other configurations.
- the number of gratings in each section 2, 3 can be from tens to several thousands of repetitive units 6, 7, and thus many more than shown in the simplified configurations of Figs. 10 A- 10C and other Figures of this document.
- FIG. 11 is a system for reducing jitter of a multi-section complex-coupled DFB laser device 1.
- the system 64 comprises the DFB laser device 1, a control unit 24, and a radio- frequency(RF)/microwave-modulated optical source 66.
- the source 66 generates an RF/micro wave-modulated optical signal on an optical carrier signal.
- the RF/microwave modulation is either at approximately the same frequency as that of the self-pulsation or a sub- harmonic thereof.
- the source 66 is coupled to supply the RF/microwave-modulated signal on the optical carrier signal, to the multi-section complex-coupled DFB laser device 1.
- the control unit 24 generates DC injection currents and is coupled to supply such currents to the DFB laser device 1.
- the device 1 generates self-pulsed light based on the RF/microwave- modulated signal on the optical carrier signal, and the DC currents from the control unit 24.
- the self-pulsed laser light is output from the laser device 1. Due to the relatively low jitter of signals produced by the source 66, the laser device 1 generates self-pulsed light with correspondingly reduced jitter.
- FIG. 12 an alternative configuration of the system 62 is shown.
- the system 64 of Fig. 12 is similar to that of Fig. 11, with the addition of circulator 68.
- the circulator 68 is coupled to receive the RF/microwave modulated signal on the optical carrier signal, from the source 66.
- the RF/microwave modulation is either at approximately the same frequency as that of the self-pulsation or a sub-harmonic thereof.
- the circulator is coupled to supply these signals to the laser device 1.
- the laser device It receives DC injection currents from the control unit 24.
- the laser device 1 generates self-pulsed light based on the RF/microwave- modulated signal on the optical carrier signal, and the DC injection currents.
- the device 1 is coupled to supply the self-pulsed laser light to the circulator 68, and the circulator outputs the self-pulsed laser light.
- the laser device 1 produces the self-pulsed light with correspondingly low jitter.
- the system 64 of Fig. 13 incorporates the multi-section complex-coupled DFB laser device 1 of any of the previous embodiments.
- the system 64 comprises DFB laser device 1, control unit 24, radio-frequency (RF)/microwave-modulated optical source 66, and circulator 68.
- the source 66 comprises a laser diode (LD) driver 70, a standard DFB laser device 72, a thermo-electric (TE) controller 74, optic fiber 76, polarization controller 78, Mach- Zender modulator 80, radio-frequency (RF) signal source 82, radio-frequency (RF) amplifier 84, and direct current (DC) voltage source 86.
- the LD driver 70 supplies a bias current for the DFB laser 72..
- the DFB laser device 72 is also coupled to the TE controller 74 that controls the temperature of such device. Accordingly, the TE controller 74 can be used to maintain the temperature of the laser device 72 to make the wavelength of light generated by such device relatively constant. The wavelength of light generated by the laser device 72 can be tuned slightly by temperature.
- the DFB laser device 72 is coupled to supply its light signal via the optical fiber 76 to the polarization controller 78.
- the unit 78 controls polarization of the mode traveling in the light generated by DFB laser device 72.
- the polarization controller 78 is coupled to supply the polarization-controlled light to the Mach-Zender modulator 80.
- the RF signal source 82 generates an RF signal that is either at the frequency of self-pulsation of laser light from the DFB laser device 1 or a sub-harmonic thereof.
- the RF signal source 82 should have a frequency at 40GHz, or a sub-harmonic thereof, 20GHz, 10GHz, 5GHz, etc.
- the source 82 is coupled to supply the RF signal to the amplifier 84. Based on this RF signal, the amplifier 84 generates an amplified signal.
- the amplifier 84 is coupled to supply the amplified signal to the Mach-Zender modulator 80.
- the Mach-Zender modulator 80 is also coupled to receive a DC voltage from the source 86.
- the Mach-Zender modulator 80 generates an RF/microwave-modulated optical signal on an optical carrier signal, based on the polarization-controlled light, the amplified RF signal, and the DC voltage received from units 78, 82, 86, respectively.
- the Mach-Zender modulator 80 is optically-coupled to supply the modulated signal on the optical carrier signal to the circulator 68.
- the circulator 68 is in turn coupled to supply the RF/microwave-modulated light to the DFB laser device 1 of the invention.
- the device 1 receives DC injection currents from the control unit 24.
- the device 1 generates self-pulsed laser light based on the modulated signal on the optical carrier signal, and the DC injection currents from the control unit 24.
- Electric currents supplied to the respective device sections 2, 3 by the control unit 24 can be used to tune the frequency of pulsation of the light generated by the device 1.
- the self-pulsed light generated by the system 64 can be supplied to downstream elements) such as a modulator for modulating a data signal via return- to-zero (RZ), non-return-to-zero (NRZ), or other modulation scheme.
- Fig. 14 is a system that includes a three-section distributed feedback (DFB) laser device 1, control unit 24, a radio-frequency (RF) signal source 82, and an RF amplifier 84.
- the system of Fig. 14 accomplishes similar objectives to those of the system of Fig. 13, namely, production of a self-pulsation light signal with relatively reduced jitter.
- the three-section DFB laser device 1 has device sections 2, 3, and 86. These device sections can be the same or similar to the embodiments previously disclosed.
- the device section 86 serves the purpose of reducing jitter of the pulsed light signal F OUTPUT produced by the device sections 2, 3 of the laser device 1.
- the device section 86 has a grating 87 defined by repetitive elements 88.
- the spacing ⁇ 3 of elements 88, the length Li of the grating 87, the effective refractive index n ⁇ , coupling coefficient ⁇ 3 , center frequency ⁇ 03 , gain coefficient ⁇ 3 , permittivity perturbation ⁇ 3 , and guided mode wave profile ⁇ 3y (x), are selected to produce a reflectivity spectrum r 3 having a mode positioned strategically with respect to the modes of the reflectivity spectra ri, r 2 of the device sections 2, 3, respectively. More specifically, by selecting and/or modifying one or more of these parameters, the device section 86 is configured and composed of materials that produce a mode of reflectivity r 3 that is between the modes defined by reflectivities rj, r 2 .
- the RF signal source 82 generates an RF signal at the self-pulsation frequency of the output light F OUTPUT ) or a sub-harmonic thereof.
- the RF signal source 82 is coupled to supply the RF signal to the amplifier 84.
- the amplifier 84 generates an amplified RF signal based on the received RF signal.
- the third device section 86 includes an electrode 90.
- the amplifier 84 is coupled to supply the amplified RF signal to the electrode 90, generally with the aid of an impedance matching circuit (not shown).
- the electrode 90 is coupled to receive DC injection current I 3 from the control unit 24.
- the third device section 86 Based on the amplified RF signal and the DC injection current, the third device section 86 generates forward-propagating light wave F 3 and backward-propagating light wave B 3 .
- a portion of the light wave F 3 travels in the laser device 1 along the positive z-axis direction and passes from the third device section 86 into the second device section 2 as a portion of the forward-propagating light Fi.
- a portion of the light wave Bi passing from the second device section 2 to the third device section 86 combines with light generated in the third device section 86 to form the light wave B 3 .
- the three-section device 86 has an end at which the reflective face 10 is positioned.
- the backward-propagating light wave B 3 reflects from the end face 10 of the third device section 86 to combine with light traveling in the positive z-axis direction to form the forward-propagating light wave F 3 .
- Propagation of forward- and backward-propagating light waves F ⁇ B ⁇ F 2 , B 2 in the gratings sections 2, 3 is similar to that previously described with respect to Fig. 1, and results in generation of the self-pulsed laser light F OUTPUT output from the three-section device 1.
- Use of the RF signal generated by the source 82 in the three- section DFB laser device 1 of Fig. 14 results in a self-pulsed laser light F OUTPUT with a relatively low jitter.
- Fig. 15 is a view of exemplary reflectivity spectra r r 2 , r 3 versus ⁇ for a self-pulsing three-section complex-coupled distributed feedback (DFB) laser device 1.
- the third section 86 of the laser device 1 has a primary mode C in its reflectivity spectrum r 3 occurring between the modes A, B and equally spaced from the modes A, B of the reflectivity spectra r b r 2 .
- the reflectivity spectra r,, r 2 , r 3 can be used to generate self-pulsed laser light F OUTPUT that is relatively free from jitter.
- modes A, B, C are primary modes in Figs. 15 it is possible that they could as well be other modes and produce self-pulsed light.
- Fig. 16 is a flowchart of a method for making a three-section distributed feedback (DFB) laser device 1.
- step SI the method begins.
- step S2 the configuration and/or material(s) composing device sections 2, 3 are determined. This determination can be made by selection of the grating lengths L b L 2 , grating spacings ⁇ i, ⁇ 2 , effective refractive indices ri e m, ri ef c, coupling coefficients Ki, ⁇ 2 , center frequencies ⁇ 0 ⁇ , ⁇ 02 , gain coefficients ⁇ i, ⁇ 2 , permittivity perturbations ⁇ i » ⁇ 2 , guided mode wave profiles ⁇ x), ⁇ 2y (x), and DC injection currents Ii, I 2 .
- step S3 the reflectivity spectra ri, r 2 for the sections 2, 3 of the three- section DFB laser device 1 are determined.
- step S4 a determination is made to establish whether modes A, B of the reflectivity spectra rj, r 2 are arranged to cause self-pulsation of laser light generated by the device 1. If the determination in step S4 is negative, in step S5 the configuration and or material(s) used to form the laser device 1 are modified, and the method returns to step S3. On the other hand, if the determination in step S4 is affirmative, in step S6 the reflectivity spectrum r 3 for the third section of the laser device 1 is determined.
- step S7 a determination is made to establish whether the mode C of reflectivity r 3 of the third section 86 is between the modes A, B of the reflectivity spectra ⁇ u r 2 . If not, in step S5, the configuration and/or material(s) of the three-section DFB laser device 1 are modified and the method returns to step S3. This can be done by modifying the grating length L 3 , grating spacing ⁇ 3 , effective refractive index rie f ⁇ , coupling coefficient 3 , center frequency ⁇ 03) gain coefficient ⁇ 3 , permittivity perturbation ⁇ 3 , and/or the guided mode wave profile ⁇ 3y (x).
- step S8 the three-section DFB laser device 1 is formed according to the configuration and material(s) established in the preceding steps.
- step S9 the method of Fig. 14 ends.
- the optical data signal includes optical data modulated on an optical carrier signal.
- the optical data signal can be a return-to- zero (RZ), non-return-to-zero (NRZ) or other format.
- the optical data signal F ⁇ NPUT travels into the device 1 that is configured and tuned via DC injection currents for self-pulsation as previously described, at approximately the frequency of the clock signal used in generation of the optical data signal.
- the device 1 extracts and outputs the optical clock signal F OUTPUT from the optical data signal.
- the recovered clock signal F OUTPUT can be used in the recovery of data from the optical data signal.
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| AU6291801A AU6291801A (en) | 2000-03-03 | 2001-03-02 | Self-pulsing multi-section complex-coupled distributed feedback (dfb) laser device and related systems and methods |
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| US18659100P | 2000-03-03 | 2000-03-03 | |
| US60/186,591 | 2000-03-03 |
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Cited By (1)
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| JP2016154203A (en) * | 2014-04-25 | 2016-08-25 | 住友電工デバイス・イノベーション株式会社 | Semiconductor laser element and semiconductor laser element manufacturing method |
-
2001
- 2001-03-02 AU AU6291801A patent/AU6291801A/en active Pending
- 2001-03-02 WO PCT/US2001/006989 patent/WO2001065648A2/en not_active Ceased
Non-Patent Citations (4)
| Title |
|---|
| MOEHRLE M ET AL: "GIGAHERTZ SELF-PULSATION IN 1.5 M WAVELENGTH MULTISECTION DFB LASERS" IEEE PHOTONICS TECHNOLOGY LETTERS, IEEE INC. NEW YORK, US, vol. 4, no. 9, 1 September 1992 (1992-09-01), pages 976-978, XP000305539 ISSN: 1041-1135 * |
| WANG X ET AL: "Frequency stabilization of fast self-pulsations in two-section gain-coupled DFB lasers" LEOS '99. IEEE LASERS AND ELECTRO-OPTICS SOCIETY 1999 12TH ANNUAL MEETING SAN FRANCISCO, CA, USA 8-11 NOV. 1999, PISCATAWAY, NJ, USA,IEEE, US, 8 November 1999 (1999-11-08), pages 722-723, XP010360927 ISBN: 0-7803-5634-9 * |
| XINHONG WANG ET AL: "High frequency intensity oscillations in the multi-section gain-coupled DFB lasers" TECHNICAL DIGEST. SUMMARIES OF PAPERS PRESENTED AT THE CONFERENCE ON LASERS AND ELECTRO-OPTICS. POSTCONFERENCE EDITION. CLEO '99. CONFERENCE ON LASERS AND ELECTRO-OPTICS (IEEE CAT. NO.99CH37013), TECHNICAL DIGEST. SUMMARIES OF PAPERS PRESENTED AT THE, page 151 XP002195595 1999, Washington, DC, USA, Opt. Soc. America, USA ISBN: 1-55752-595-1 * |
| XINHONG WANG ET AL: "Spatiotemporal dynamics and high-frequency self-pulsations in two-section distributed feedback lasers" JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B (OPTICAL PHYSICS), NOV. 1999, OPT. SOC. AMERICA, USA, vol. 16, no. 11, pages 2030-2039, XP002195594 ISSN: 0740-3224 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016154203A (en) * | 2014-04-25 | 2016-08-25 | 住友電工デバイス・イノベーション株式会社 | Semiconductor laser element and semiconductor laser element manufacturing method |
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| WO2001065648A3 (en) | 2002-07-04 |
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