WO2000044958A1 - Method of preserving surface-treated member - Google Patents
Method of preserving surface-treated member Download PDFInfo
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- WO2000044958A1 WO2000044958A1 PCT/JP2000/000439 JP0000439W WO0044958A1 WO 2000044958 A1 WO2000044958 A1 WO 2000044958A1 JP 0000439 W JP0000439 W JP 0000439W WO 0044958 A1 WO0044958 A1 WO 0044958A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/80—After-treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
Definitions
- the present invention relates to a method for storing a surface-treated member for a long time, and more particularly to a method for storing a surface-treated product that has been surface-treated using a halogen-based gas.
- a member to be processed such as a metal or a semiconductor substrate has been placed in a vacuum and subjected to surface treatment using vacuum plasma to improve wettability to solder.
- surface treatment using vacuum plasma requires not only expensive vacuum equipment but also much time and labor such as the need to reduce pressure.
- a reactive halogen-based gas such as hydrogen fluoride (HF) has been generated by atmospheric pressure discharge that does not require a vacuum device, and this halogen-based gas is used to process the workpiece under atmospheric pressure. has been put to practical use.
- HF hydrogen fluoride
- the effect of the surface treatment disappears in about three hours. That is, after performing fluoridation treatment with a treatment gas containing fluorine gas or hydrogen fluoride gas, the pH value of the surface of the surface-treated product is measured using pH test paper. If it is less than 6 but left in the atmosphere for about 3 [ ⁇ ], the pH value will be 7 and it will be neutral, and the effect of the surface treatment will be lost. For this reason, the surface treatment device is connected to the next process device (for example, a joining device), or the surface treatment device is incorporated in the next process device. Next, it is desirable to perform a process such as soldering in the next step.
- the target material whose surface has been treated for In some cases, such as when the surface treatment is not possible, it is necessary to store the surface-treated product for a long time. Therefore, it has been desired to develop a method for preserving the surface-treated product for a long time without losing the effect of the surface treatment.
- the present invention has been made in view of the above-described demands, and has as its object to enable a member to be subjected to surface treatment to be stored for a long time while maintaining the effect of the surface treatment.
- the HF detected as the pH value using the pH test paper is F that is not chemically bonded to the surface-treated member (surface-treated product), that is, the surface of the surface-treated product. It is probable that F attached to the surface reacts with water contained in the pH test paper to form HF, and this HF is detected.
- the fluoridation treatment is performed, the surface treatment is effective when the pH value is about 6 or less.
- the amount of F present on the surface of the surface-treated product is approximately equal to 10 14 / cm 2 .
- a method for storing a surface-treated product according to the present invention comprises the steps of: It is characterized by placing the workpiece in a dry atmosphere I have.
- the halogen such as F adhered to the surface of the member to be treated does not react with the moisture existing in the atmosphere, and the state of attaching to the surface of the member to be treated for a long time is maintained. Therefore, the effect of the surface treatment can be maintained for a long time.
- the temperature is set in the range of 140 ° C. to ⁇ 30 ° C.
- the dry atmosphere may be formed of any gas as long as it is stable at room temperature, and may be formed of dry air or nitrogen gas. Dry air and nitrogen gas are stable at room temperature and easy to handle, and can be obtained relatively inexpensively to reduce storage costs. Further, the dried atmosphere may be formed under reduced pressure.
- the surface-treated member is kept at a temperature equal to or lower than room temperature. If the surface-treated member is stored at a high temperature of, for example, 80 ° C or more, F or the like adhering to the surface of the member receives thermal energy from the surroundings and separates from the surface of the member. The effect of the surface treatment will be lost. For this reason, it is desirable that the member to be processed be stored at a temperature as low as possible.
- FIG. 1 is an explanatory diagram of a surface treatment apparatus used in an example.
- FIG. 2 is a view showing a relationship between a pH value and a difference in a standing atmosphere of a fluorinated solder plating copper plate in an example.
- FIG. 3 shows the results of a wetting and spreading test on a gold plating substrate with respect to differences in the atmosphere in which the fluorinated solder balls were left in the example.
- FIG. 4 is a diagram showing the relationship between the difference in the atmosphere in which the fluorinated tin pellets were left in the working example and the solid bonding strength with the gold plating substrate.
- Fig. 5 shows the leaching time, the pH value of the solder plating copper plate, the solder ball wetting and spreading, and the tin pellet when the solder plating copper plate, solder ball, and tin pellet were fluorinated and left in the air. It is a figure which shows the relationship with solid joining strength.
- FIG. 1 shows a surface treatment apparatus for fluorinating a member to be treated.
- a discharge unit 16 is connected to a source gas source 12 via a source gas pipe 14.
- the raw material gas pipe 14 is provided with a flow control valve 18 such as a mass flow controller.
- the carbon tetrafluoride gas is a stable fluorine-based gas supplied from the raw material gas source 12 to the discharge unit 16. (CF 4 ) can be adjusted at will.
- One end of a branch pipe 20 is connected to the source gas pipe 14 between the source gas source 12 and the flow control valve 18.
- the other end of the branch pipe 20 is connected to a water bubbling unit 24 via a flow control valve 22 such as a mass flow controller, and a part of the carbon tetrafluoride gas is supplied to the water bubbling unit 24.
- a flow control valve 22 such as a mass flow controller
- the water bubbling unit 24 is connected to one end of a pipe 26 connected to the raw material gas pipe 14 downstream of the flow control valve 18 so that the four baffles flowing into the water bubbling unit 24 are connected. Water (steam) is added to the carbonized gas so that it can be returned to the raw material gas piping 14.
- the discharge unit 16 is provided with a heater 28 so as to prevent condensation of water vapor flowing in with the carbon tetrafluoride gas.
- the discharge unit 16 is connected to a processing gas pipe 32 connected to a processing chamber 30 at a tip thereof, and is formed by reacting carbon tetrafluoride gas with water vapor by electric discharge.
- a reactive fluorine-based gas such as is supplied via a processing gas pipe 32 to a processing chamber 30 in which a member to be processed 34 is disposed.
- a nitrogen gas source 38 is connected to the processing gas pipe 32 via a carrier gas pipe 36.
- a flow control valve 40 is provided in the carrier gas pipe 36, and a nitrogen gas serving as a carrier gas for transporting the active fluorine-based gas generated in the discharge unit 16 to the processing chamber 30.
- One end of a branch pipe 42 is connected to the carrier gas pipe 36 on the upstream side of the flow control valve 40.
- the branch pipe 42 is provided with a flow control valve 44 and a heater 46, and has the other end connected downstream from the carrier gas pipe connection part of the processing gas pipe 32. A part of the nitrogen gas from 38 is heated and supplied to the processing gas pipe 32.
- the processing chamber 30 is formed in, for example, a rectangular parallelepiped, a cube, or a cylindrical body, and has a processing gas pipe 32 connected to an upper portion thereof and an exhaust pipe 48 connected thereto, and flows into the processing chamber 30.
- the processing gas mixed gas of reactive fluorine-based gas and nitrogen gas
- the processing chamber 30 is provided with a heat sink 52, which heats and holds the processing target member 34 disposed in the processing chamber 30 at a predetermined temperature to easily perform surface treatment (fluorination processing). ) Is available.
- the carbon tetrafluoride gas at atmospheric pressure flowing from the source gas source 12 to the source gas pipe 14 is dried through the flow control valve 18.
- a part of the carbon tetrafluoride gas is flowed into the water publishing unit 24 to add steam, and the discharge unit is supplied through the pipe 26 and the raw material gas pipe 14.
- the discharge unit 16 generates a gas discharge through a mixed gas of carbon tetrafluoride gas and water vapor,
- the CF 4 reacts with the steam (H 2 0) to generate a reactive fluorine gas such as HF and sends it to the processing gas pipe 32 as shown in FIG.
- the reactive fluorine-based gas from the discharge unit 16 flows into the processing gas pipe 32 via the carrier gas pipe 36 and flows into the processing gas pipe 32 via the branch pipe 42. It is mixed with the dried heated nitrogen gas and flows into the processing chamber 30 as a fluorinated gas.
- the member 34 to be processed, such as a metal, disposed in the processing chamber 30 is fluorinated (surface-treated) in contact with the processing gas, and is subjected to a process for improving solder wettability.
- the processing gas obtained by surface-treating the member to be processed 34 is sent to the abatement apparatus 50 via the exhaust pipe 48 to be rendered harmless and released into the atmosphere.
- the material to be treated (surface treated product) 34 should be placed in dry air or dry nitrogen gas, or in a vacuum under reduced pressure, and kept at room temperature or lower. As a result, the surface-treated product can be stored for a long time without losing the effect of the fluoridation treatment, and the surface treatment can be performed even if the treatment cannot be immediately performed in the next process. And the flexibility of production planning can be improved.
- the sample was fluorinated using the surface treatment device 10 shown in Fig. 1, and it was examined whether the pH value, wet spread, and solid bonding strength were affected by differences in storage atmosphere.
- the conditions of the fluoridation treatment are the same, and the flow rate of dry carbon tetrafluoride gas without adding water (steam) Q! (See Fig.
- the set temperature of heater 28 provided in discharge unit 16 was set to 70 ° C, and the set temperature of heater 46 for heating nitrogen gas was set to 150 ° C.
- the discharge unit The junction of the gas from the 16 side and the heated nitrogen gas (the connection point between the processing gas pipe 32 and the branch pipe 42)
- the temperature of the nitrogen gas at A is about 120 ° C, and the processing that flows into the processing chamber 30
- the concentration of HF in the gas is 4400 ppm.
- the set temperature of the heater 52 provided in the processing chamber 30 was 135 ° C, and the heating temperature of the member to be processed (sample) 34 was 90 ° C.
- a sample with a copper plate soldered is fluorinated under the above conditions.After leaving for 3 hours in various atmospheres, the surface residual F is measured using a pH test paper wetted with water. Asked.
- the sample used was a copper plate with a length of 5 mm, a width of 5 mm, and a thickness of 0.2 mm, which was soldered with 80% tin and 20% lead.
- FIG. 2 shows the state of the atmosphere and the pH value after 3 hours.
- a mark ⁇ indicates that the state is the same as that immediately after the fluoridation treatment
- a mark X indicates that the effect of the fluoridation treatment is reduced to the same degree as that of the untreated treatment.
- a 0.74 mm diameter solder ball made of 63% tin and 37% lead solder is fluorinated under the above conditions, left in a different atmosphere for 3 hours, and then placed on a gold-plated substrate Then, a wet spread test was conducted to check the spread of the solder balls.
- the board on which the solder balls are placed is a glass epoxy board made of glass fiber and epoxy resin, with a nickel plating on the surface as a base metal and a 0.3 m thick gold plating on it. Using. Then, after placing the solder balls on the gold plating, the solder balls were melted by heating to about 240 ° C. in a nitrogen gas atmosphere, and the spread was observed.
- Figure 3 shows the results of the experiment. The meanings of the symbols ⁇ and X shown in the figure are the same as those in FIG. 2, and the symbol ⁇ indicates that the effect of the fluorine treatment is lower than immediately after the treatment.
- the atmosphere in which the fluorinated solder balls are placed is dry air (dew point: about 120 ° C), dry nitrogen gas (dew point: about 150 ° C), and vacuum (0.13 Pa ) If left at room temperature, if the holding temperature is room temperature, the effect of the fluoridation treatment on the wetting and spreading test will hardly decrease. For these reasons, it is desirable to store the product in a dry atmosphere at a temperature not higher than room temperature without heating.
- the tin pellets were fluorinated under the above fluoridation conditions, left in different atmospheres for 3 hours, and then subjected to solid bonding (bonding without melting) to the gold-plated substrate to evaluate the bonding strength.
- the tin pellet used as the sample is a disk with a diameter of 2 mm and a thickness of l mm.
- the substrate to which the tin pellets were solid-bonded was a copper substrate having a length of 10 mm, a width of 10 mm, and a thickness of 1 mm, and a gold plating of 0.3 mm thick.
- Fig. 4 shows the results.
- the symbols ⁇ , ⁇ , and X are the same as in Fig. 2.
- the copper plates, solder balls, and tin pellets used in Examples 1, 2, and 3 subjected to the solder plating are fluorinated under the above-described fluorination conditions, and then these are immersed in the air at room temperature and a relative humidity of about 40%. It was left to stand, and the changes in the pH value of the solder plating copper plate over time, the spread of the solder balls on the gold-plated substrate, and the solid bonding strength between the tin pellet and the gold-plated substrate were examined.
- Figure 5 shows the results.
- the substrate used for the solder ball wetting and spreading test was the same as in Example 2 above, and the substrate used for the solid bonding strength evaluation was the same as in Example 3 above.
- the symbols ⁇ , ⁇ , and X are the same as those in the above embodiments. And the blank is a trial Indicates that no experiment was performed.
- the effect of the fluoridation treatment does not decrease so much when one hour has passed after being left in the air after the fluoridation treatment.
- the effect of the fluoridation treatment is clearly reduced.
- the pH value becomes 7.0, and the effect of the fluoridation treatment is almost eliminated.
- the effect of the fluoridation treatment remains to some extent. From this, it can be said that the storage of the fluorinated workpiece in the atmosphere is limited to three hours or less. Also, it seems that the effect of the fluoridation treatment has little effect unless the pH value is 6 or less.
- halogens such as F adhered to the surface of the member to be treated are present in the atmosphere. It can be prevented from reacting with moisture and detaching from the surface of the member to be treated or being taken into the member to be treated, and can be kept attached to the surface of the member to be treated for a long time, Long-lasting effect of surface treatment
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Abstract
Description
明 細 表面処理品の保存方法 技術分野 Description Preservation method for surface-treated products
本発明は、 表面処理した被処理部材を長時間保存する方法に係り、 特にハロゲ ン系ガスを用いて表面処理した表面処理品の保存方法に関する。 背景技術 The present invention relates to a method for storing a surface-treated member for a long time, and more particularly to a method for storing a surface-treated product that has been surface-treated using a halogen-based gas. Background art
従来から金属や半導体基板などの被処理部材を真空中に配置し、 真空プラズマ による表面処理を行なって半田に対する濡れ性の改善などが行われていた。 しか し、 真空プラズマを利用した表面処理は、 高価な真空装置を必要とするばかりで なく、 減圧しなければならないなど多くの時間と手間とを必要とする。 このため 、 近年、 真空装置を必要としない大気圧放電によってフッ化水素 (H F ) などの 反応性のハロゲン系ガスを生成し、 このハロゲン系ガスを利用して大気圧下にお いて被処理部材の表面処理を行なうことが実用化されている。 Conventionally, a member to be processed such as a metal or a semiconductor substrate has been placed in a vacuum and subjected to surface treatment using vacuum plasma to improve wettability to solder. However, surface treatment using vacuum plasma requires not only expensive vacuum equipment but also much time and labor such as the need to reduce pressure. For this reason, in recent years, a reactive halogen-based gas such as hydrogen fluoride (HF) has been generated by atmospheric pressure discharge that does not require a vacuum device, and this halogen-based gas is used to process the workpiece under atmospheric pressure. Has been put to practical use.
ところが、 例えばフッ素ガスまたはフッ化水素ガスを含む処理ガスによって表 面処理 (フッ化処理) した被処理部材 (表面処理品) を大気中に放置すると、 3 時間程度で表面処理の効果が消失する。 すなわち、 フッ素ガスまたはフッ化水素 ガスを含む処理ガスによってフッ化処理を行なったのち、 p H試験紙を用いて表 面処理品の表面の p H値を測定すると、 表面処理直後に p H値が 6以下であつた ものが、 大気中に 3 [^間程度放置すると p H値が 7と中性となつて表面処理の効 果が消失する。 このため、 表面処理装置と次工程の装置 (例えば、 接合装置) と を連結したり、 次工程の装置中に表面処理装置を組み込むなどし、 表面処理をし た被処理部材を表面処理後に速やかに次の工程において例えば半田付け等の処理 を行なうことが望ましい。 However, if the member (surface-treated product) subjected to surface treatment (fluorination treatment) with a treatment gas containing fluorine gas or hydrogen fluoride gas is left in the air, the effect of the surface treatment disappears in about three hours. . That is, after performing fluoridation treatment with a treatment gas containing fluorine gas or hydrogen fluoride gas, the pH value of the surface of the surface-treated product is measured using pH test paper. If it is less than 6 but left in the atmosphere for about 3 [^], the pH value will be 7 and it will be neutral, and the effect of the surface treatment will be lost. For this reason, the surface treatment device is connected to the next process device (for example, a joining device), or the surface treatment device is incorporated in the next process device. Next, it is desirable to perform a process such as soldering in the next step.
しかし、 工程の都合などによって表面処理した被処理部材を速やかに次の工程 で処理できない場合等、 表面処理品を長時間保存しなければならないことがある 。 このため、 表面処理の効果を失わせることなく表面処理品を長時間保存する方 法の開発が望まれていた。 However, the target material whose surface has been treated for In some cases, such as when the surface treatment is not possible, it is necessary to store the surface-treated product for a long time. Therefore, it has been desired to develop a method for preserving the surface-treated product for a long time without losing the effect of the surface treatment.
本発明は、 上記要請に鑑みてなされたもので、 表面処理をした被処理部材を表 面処理の効果を持続させつつ長時間保存できるようにすることを目的としている The present invention has been made in view of the above-described demands, and has as its object to enable a member to be subjected to surface treatment to be stored for a long time while maintaining the effect of the surface treatment.
発明の開示 Disclosure of the invention
本発明者らの研究によると、 被処理部材を表面処理であるフッ化処理をした場 合、 p H値として検出される H Fの量とフッ化処理の効果との間には、 相関があ ることがわかった。 この場合、 p H試験紙を用いて p H値として検出される H F は、 表面処理をした被処理部材 (表面処理品) と化学的に結合していない F、 す なわち表面処理品の表面に付着している Fが p H試験紙に含ませた水と反応して H Fとなり、 この H Fが検出されるものと考えられる。 そして、 フヅ化処理をし た場合、 p H値が約 6以下のときに表面処理の効果がある。 p H値が 6であると き、 表面処理品め表面に存在する Fの量は、 おおよそ 1 0 14個/ c m 2に相当し ている。 According to the study of the present inventors, when a member to be treated is subjected to a fluoridation treatment as a surface treatment, there is a correlation between the amount of HF detected as a pH value and the effect of the fluoridation treatment. I found out. In this case, the HF detected as the pH value using the pH test paper is F that is not chemically bonded to the surface-treated member (surface-treated product), that is, the surface of the surface-treated product. It is probable that F attached to the surface reacts with water contained in the pH test paper to form HF, and this HF is detected. When the fluoridation treatment is performed, the surface treatment is effective when the pH value is about 6 or less. When the pH value is 6, the amount of F present on the surface of the surface-treated product is approximately equal to 10 14 / cm 2 .
また、 本発明者等の研究によると、 フッ化処理した被処理部材を大気中に放置 したときに、 表面処理の効果が減少する要因として大気中の水分が大きく影響す ることがわかった。 そのメカニズムは、 In addition, according to the study of the present inventors, it has been found that when the fluorinated member to be treated is left in the air, the effect of the surface treatment is largely affected by the moisture in the air. The mechanism is
( 1 ) 表面処理品の表面に付着している Fが H 2 0と反応して H Fとなり、 こ の H Fが気化して大気中に放出されて Fが減少することによる。 (1) HF next to F are reacted with H 2 0 which is attached to the surface of the surface treated product, is released by HF This is vaporized in the air F is due to be reduced.
( 2 ) 表面処理品の表面に付着している Fが H 2 0を触媒にして表面処理品自 体と反応し、 Fが表面処理品の内部に取り込まれる。 (2) F adhering to the surface of the surface-treated product is reacted with the surface treatment article itself and the H 2 0 in the catalyst, F is taken in the surface-treated product.
等が考えられる。 And so on.
本発明は、 上記の知見に基づいてなされたもので、 上記の目的を達成するため に、 本発明に係る表面処理品の保存方法は、 ハロゲン系ガスにより被処理部材を 表面処理したのち、 前記被処理部材を乾燥した雰囲気中に置くことを特徴として いる。 The present invention has been made based on the above findings, and in order to achieve the above object, a method for storing a surface-treated product according to the present invention comprises the steps of: It is characterized by placing the workpiece in a dry atmosphere I have.
このように構成した本発明は、 被処理部材の表面に付着している Fなどのハロ ゲンが大気中に存在する水分と反応せず、 長時間にわたって被処理部材の表面に 付着した状態が維持されるため、 表面処理の効果を長時間持続させることができ る。 In the present invention configured as described above, the halogen such as F adhered to the surface of the member to be treated does not react with the moisture existing in the atmosphere, and the state of attaching to the surface of the member to be treated for a long time is maintained. Therefore, the effect of the surface treatment can be maintained for a long time.
乾燥した雰囲気は、 露点を一 2 0 °C以下にする。 露点が一 2 0 °C以下であれば 、 雰囲気中に含まれる水分子の数が極めて少なくなり、 表面処理した被処理部材 の表面に付着している Fなどのハロゲンに与える実質的な影響を殆どなくすこと ができる。 より好ましくは、 一 4 0 °C〜― 3 0 °Cの範囲に設定する。 そして、 乾 燥した雰囲気は、 常温で安定なガスであればどのようガスで形成してもよく、 乾 燥空気または窒素ガスにより形成することができる。 乾燥空気や窒素ガスは、 常 温で安定であって取り扱いに容易であり、 比較的安価に入手することができて保 存コストを低減することができる。 また、 乾燥した雰囲気は、 減圧して形成して もよい。 減圧すると水分子が窒素ガス分子や酸素ガス分子とともに排出されるた めに減圧容器内に殆ど存在せず、 表面処理をした被処理部材を長期間保存したと しても、 表面処理の効果を持続させることができる。 また、 表面処理した被処理 部材は、 室温以下の温度に保持することが望ましい。 表面処理した被処理部材を 例えば 8 0 °C以上の高温状態のまま保存すると、 被処理部材の表面に付着してい る Fなどが周囲から熱エネルギーを得て被処理部材の表面から離脱し、 表面処理 の効果が失われることになる。 このため、 被処理部材は、 なるべく低い温度で保 存することが望ましい。 図面の簡単な説明 In a dry atmosphere, keep the dew point below 120 ° C. If the dew point is 120 ° C. or less, the number of water molecules contained in the atmosphere becomes extremely small, and the substantial effect on halogens such as F adhered to the surface of the surface-treated member to be treated is reduced. It can be almost eliminated. More preferably, the temperature is set in the range of 140 ° C. to −30 ° C. The dry atmosphere may be formed of any gas as long as it is stable at room temperature, and may be formed of dry air or nitrogen gas. Dry air and nitrogen gas are stable at room temperature and easy to handle, and can be obtained relatively inexpensively to reduce storage costs. Further, the dried atmosphere may be formed under reduced pressure. When the pressure is reduced, water molecules are discharged together with the nitrogen gas molecules and the oxygen gas molecules, so that they hardly exist in the decompression vessel. Can last. It is desirable that the surface-treated member is kept at a temperature equal to or lower than room temperature. If the surface-treated member is stored at a high temperature of, for example, 80 ° C or more, F or the like adhering to the surface of the member receives thermal energy from the surroundings and separates from the surface of the member. The effect of the surface treatment will be lost. For this reason, it is desirable that the member to be processed be stored at a temperature as low as possible. BRIEF DESCRIPTION OF THE FIGURES
第 1図は、 実施例に使用した表面処理装置の説明図である。 FIG. 1 is an explanatory diagram of a surface treatment apparatus used in an example.
第 2図は、 実施例におけるフッ化処理した半田メツキ銅板の放置雰囲気の相違 に対する p H値の関係を示す図である。 FIG. 2 is a view showing a relationship between a pH value and a difference in a standing atmosphere of a fluorinated solder plating copper plate in an example.
第 3図は、 実施例におけるフッ化処理した半田ボールの放置雰囲気の相違に対 する金メツキ基板に対する濡れ広がり試験の結果を示したものである。 第 4図は、 実施例におけるフッ化処理した錫ペレツ トの放置雰囲気の相違に対 する金メツキ基板との固体接合強度との関係を示す図である。 FIG. 3 shows the results of a wetting and spreading test on a gold plating substrate with respect to differences in the atmosphere in which the fluorinated solder balls were left in the example. FIG. 4 is a diagram showing the relationship between the difference in the atmosphere in which the fluorinated tin pellets were left in the working example and the solid bonding strength with the gold plating substrate.
第 5図は、 半田メツキ銅板、 半田ボール、 錫ペレッ トをフッ化処理したのち、 大気中に放置した場合における放置時間と半田メツキ銅板の p H値、 半田ボール の濡れ広がり、 錫ペレッ トの固体接合強度との関係を示す図である。 発明を実施するための最良の形態 Fig. 5 shows the leaching time, the pH value of the solder plating copper plate, the solder ball wetting and spreading, and the tin pellet when the solder plating copper plate, solder ball, and tin pellet were fluorinated and left in the air. It is a figure which shows the relationship with solid joining strength. BEST MODE FOR CARRYING OUT THE INVENTION
本発明に係る表面処理品の保存方法の好ましい実施の形態を添付図面に従って 詳細に説明する。 A preferred embodiment of the method for storing a surface-treated product according to the present invention will be described in detail with reference to the accompanying drawings.
第 1図は、 被処理部材をフッ化処理する表面処理装置を示したものである。 第 1図において、 表面処理装置 1 0は、 原料ガス源 1 2に原料ガス配管 1 4を介し て放電ュニッ ト 1 6が接続してある。 原料ガス配管 1 4には、 マスフローコント ローラなどの流量制御弁 1 8が設けてあって、 原料ガス源 1 2から放電ュニッ ト 1 6に供給する安定なフッ素系ガスである四フッ化炭素ガス (C F 4 ) の量を任 意に調整できるようになつている。 また、 原料ガス配管 1 4には、 原料ガス源 1 2と流量制御弁 1 8との間に分岐管 2 0の一端が接続してある。 この分岐管 2 0 の他端は、 マスフローコントローラなどの流量制御弁 2 2を介して水バプリング ュニッ ト 2 4に接続してあって、 四フッ化炭素ガスの一部を水バブリングュニヅ ト 2 4に導くことができるようにしてある。 そして、 水バブリングュニッ ト 2 4 には、 流量制御弁 1 8の下流側の原料ガス配管 1 4に接続した配管 2 6の一端が 接続してあって、 水バブリングユニッ ト 2 4に流入した四フッ化炭素ガスに水 ( 水蒸気) を添加して原料ガス配管 1 4に戻すことができるようにしてある。 FIG. 1 shows a surface treatment apparatus for fluorinating a member to be treated. In FIG. 1, in a surface treatment apparatus 10, a discharge unit 16 is connected to a source gas source 12 via a source gas pipe 14. The raw material gas pipe 14 is provided with a flow control valve 18 such as a mass flow controller. The carbon tetrafluoride gas is a stable fluorine-based gas supplied from the raw material gas source 12 to the discharge unit 16. (CF 4 ) can be adjusted at will. One end of a branch pipe 20 is connected to the source gas pipe 14 between the source gas source 12 and the flow control valve 18. The other end of the branch pipe 20 is connected to a water bubbling unit 24 via a flow control valve 22 such as a mass flow controller, and a part of the carbon tetrafluoride gas is supplied to the water bubbling unit 24. I can guide you. The water bubbling unit 24 is connected to one end of a pipe 26 connected to the raw material gas pipe 14 downstream of the flow control valve 18 so that the four baffles flowing into the water bubbling unit 24 are connected. Water (steam) is added to the carbonized gas so that it can be returned to the raw material gas piping 14.
放電ユニッ ト 1 6には、 ヒー夕 2 8が設けてあって、 四フヅ化炭素ガスととも に流入する水蒸気の凝結を防止するようにしてある。 また、 放電ュニッ ト 1 6は 、 先端に処理室 3 0を接続した処理ガス配管 3 2が接続してあって、 放電によつ て四フッ化炭素ガスと水蒸気とを反応させて生成した H Fなどの反応性フッ素系 ガスを、 処理ガス配管 3 2を介して被処理部材 3 4を配置した処理室 3 0に供給 する。 処理ガス配管 3 2には、 キヤリアガス配管 3 6を介して窒素ガス源 3 8が接続 してある。 そして、 キャリアガス配管 3 6には、 流量制御弁 4 0が設けてあって 、 放電ュニッ ト 1 6において生成した活性なフッ素系ガスを処理室 3 0に搬送す るためのキヤリァガスとなる窒素ガスの量を任意に調節できるようになつている 。 また、 キャリアガス配管 3 6の流量制御弁 4 0の上流側には、 分岐管 4 2の一 端が接続してある。 この分岐管 4 2は、 流量制御弁 4 4とヒータ 4 6とが設けて あるとともに、 他端が処理ガス配管 3 2のキャリアガス配管接続部より下流側に 接続してあって、 窒素ガス源 3 8からの窒素ガスの一部を加熱して処理ガス配管 3 2に供給するようにしてある。 The discharge unit 16 is provided with a heater 28 so as to prevent condensation of water vapor flowing in with the carbon tetrafluoride gas. The discharge unit 16 is connected to a processing gas pipe 32 connected to a processing chamber 30 at a tip thereof, and is formed by reacting carbon tetrafluoride gas with water vapor by electric discharge. A reactive fluorine-based gas such as is supplied via a processing gas pipe 32 to a processing chamber 30 in which a member to be processed 34 is disposed. A nitrogen gas source 38 is connected to the processing gas pipe 32 via a carrier gas pipe 36. A flow control valve 40 is provided in the carrier gas pipe 36, and a nitrogen gas serving as a carrier gas for transporting the active fluorine-based gas generated in the discharge unit 16 to the processing chamber 30. The amount can be adjusted arbitrarily. One end of a branch pipe 42 is connected to the carrier gas pipe 36 on the upstream side of the flow control valve 40. The branch pipe 42 is provided with a flow control valve 44 and a heater 46, and has the other end connected downstream from the carrier gas pipe connection part of the processing gas pipe 32. A part of the nitrogen gas from 38 is heated and supplied to the processing gas pipe 32.
処理室 3 0は、 例えば直方体や立方体もしくは円筒体に形成してあって、 上部 に処理ガス配管 3 2が接続してあるとともに、 排気管 4 8が接続してあり、 処理 室 3 0に流入してフッ化処理したのちの処理ガス (反応性フッ素系ガスと窒素ガ スとの混合ガス) を除害装置 5 0に導入できるようにしてある。 また、 処理室 3 0には、 ヒー夕 5 2が設けてあって、 処理室 3 0内に配置した被処理部材 3 4を 所定の温度に加熱、 保持して容易に表面処理 (フッ化処理) ができるようにして ある。 The processing chamber 30 is formed in, for example, a rectangular parallelepiped, a cube, or a cylindrical body, and has a processing gas pipe 32 connected to an upper portion thereof and an exhaust pipe 48 connected thereto, and flows into the processing chamber 30. After that, the processing gas (mixed gas of reactive fluorine-based gas and nitrogen gas) after the fluorination treatment can be introduced into the abatement apparatus 50. Further, the processing chamber 30 is provided with a heat sink 52, which heats and holds the processing target member 34 disposed in the processing chamber 30 at a predetermined temperature to easily perform surface treatment (fluorination processing). ) Is available.
このように構成した従来の表面処理装置 1 0においては、 原料ガス源 1 2から 原料ガス配管 1 4に流入した大気圧状態の四フッ化炭素ガスを、 流量制御弁 1 8 を介して乾燥状態で放電ュニッ ト 1 6に供給するとともに、 四フッ化炭素ガスの 一部を水パブリングユニッ ト 2 4に流入させて水蒸気を添加し、 配管 2 6、 原料 ガス配管 1 4を介して放電ュニッ ト 1 6に供給する。 放電ュニッ ト 1 6は、 四フ ッ化炭素ガスと水蒸気との混合ガスを介した気体放電を発生し、 In the conventional surface treatment apparatus 10 configured as described above, the carbon tetrafluoride gas at atmospheric pressure flowing from the source gas source 12 to the source gas pipe 14 is dried through the flow control valve 18. At the same time, a part of the carbon tetrafluoride gas is flowed into the water publishing unit 24 to add steam, and the discharge unit is supplied through the pipe 26 and the raw material gas pipe 14. To 16 The discharge unit 16 generates a gas discharge through a mixed gas of carbon tetrafluoride gas and water vapor,
C F 4 + H 2 0→C O F 2+ 2 H F CF 4 + H 20 → COF 2 + 2 HF
C O F 2+ H 2 0→C O 2+ 2 H F COF 2 + H 20 → CO 2 + 2 HF
のように C F 4と水蒸気 (H 2 0 ) とを反応させ、 H Fなどの反応性フッ素系ガ スを生成して処理ガス配管 3 2に送出する。 放電ュニッ 卜 1 6からの反応性フッ素系ガスは、 キヤリァガス配管 3 6を介し て処理ガス配管 3 2に流入する乾燥窒素ガスと、 分岐管 4 2を介して処理ガス配 管 3 2に流入する乾燥した加熱窒素ガスと混合され、 フッ化処理ガスとして処理 室 3 0に流入する。 そして、 処理室 3 0内に配置された金属などの被処理部材 3 4は、 処理ガスと接触してフッ化 (表面処理) され、 半田に対する濡れ性の改善 のための処理などが行われる。 また、 被処理部材 3 4を表面処理した処理ガスは 、 排気管 4 8を介して除害装置 5 0に送られて無害化されて大気中に放出される 上記のようにしてフッ化処理した被処理部材 (表面処理品) 3 4は、 乾燥空気 や乾いた窒素ガス中、 または減圧した真空中に配置し、 室温以下の温度に保持し て保存する。 これにより、 フッ化処理の効果を失わせることなく表面処理品を長 時間保存することができ、 次工程において直ぐに処理することができない場合で あっても表面処理を行なうことができ、 工程の調整が容易となって生産計画等の 柔軟性を向上することができる。 The CF 4 reacts with the steam (H 2 0) to generate a reactive fluorine gas such as HF and sends it to the processing gas pipe 32 as shown in FIG. The reactive fluorine-based gas from the discharge unit 16 flows into the processing gas pipe 32 via the carrier gas pipe 36 and flows into the processing gas pipe 32 via the branch pipe 42. It is mixed with the dried heated nitrogen gas and flows into the processing chamber 30 as a fluorinated gas. The member 34 to be processed, such as a metal, disposed in the processing chamber 30 is fluorinated (surface-treated) in contact with the processing gas, and is subjected to a process for improving solder wettability. Further, the processing gas obtained by surface-treating the member to be processed 34 is sent to the abatement apparatus 50 via the exhaust pipe 48 to be rendered harmless and released into the atmosphere. The material to be treated (surface treated product) 34 should be placed in dry air or dry nitrogen gas, or in a vacuum under reduced pressure, and kept at room temperature or lower. As a result, the surface-treated product can be stored for a long time without losing the effect of the fluoridation treatment, and the surface treatment can be performed even if the treatment cannot be immediately performed in the next process. And the flexibility of production planning can be improved.
【実施例】 【Example】
第 1図に示した表面処理装置 1 0を用いて試料をフッ化処理し、 保存雰囲気の 相違によって p H値、 濡れ広がり、 固体接合強度が影響を受けるか否かを調べた 以下のいずれのフッ化処理においても、 フッ化処理の条件は同じであって、 水 (水蒸気) を添加しない乾いた四フッ化炭素ガスの流量 Q ! (第 1図参照) が 1 0 m l /分、 分岐管 2 0を介して水バプリングユニッ ト 2 4に供給し、 水バブリ ングュニッ ト 2 4によって水蒸気を添加した四フッ化炭素ガスの流量 Q 2が 3 0 m l /分、 キャリアガス配管 3 6を介してキャリアガスとして供給した加熱しな い乾いた (乾燥) 窒素ガスの流量 Q 3が 3 0 0 m l /分、 ヒータ 4 6によって加 熱した分岐管 4 2を介して希釈ガスとして供給した乾燥窒素ガスの流量 Q 4が 3 0 0 m l /分である。 The sample was fluorinated using the surface treatment device 10 shown in Fig. 1, and it was examined whether the pH value, wet spread, and solid bonding strength were affected by differences in storage atmosphere. In the fluoridation treatment, the conditions of the fluoridation treatment are the same, and the flow rate of dry carbon tetrafluoride gas without adding water (steam) Q! (See Fig. 1) Flow rate of carbon tetrafluoride gas supplied at 10 ml / min to the water coupling unit 24 through the branch pipe 20 and to which water vapor was added by the water coupling unit 24 2 3 0 ml / min, dry have a heated and fed as a carrier gas through the carrier gas pipe 3 6 (dry) flow rate Q 3 of nitrogen gas 3 0 0 ml / min, pressure heat by the heater 4 6 branch pipes 4 2 dry nitrogen gas at a flow rate Q 4 was supplied as a diluent gas via that is 3 0 0 ml / min.
また、 放電ュニッ ト 1 6に設けたヒー夕 2 8の設定温度を 7 0 °Cにし、 窒素ガ スを加熱するヒ一夕 4 6の設定温度を 1 5 0 °Cにした。 このとき、 放電ユニッ ト 16側からのガスと加熱した窒素ガスとの合流点 (処理ガス配管 32と分岐管 4 2との接続位置) Aにおける窒素ガスの温度が約 120°Cであり、 処理室 30に 流入する処理ガスの HFの濃度が 4400 ppmである。 さらに、 処理室 30に 設けたヒ一夕 52の設定温度を 135°Cとし、 被処理部材 (試料) 34の加熱温 度を 9 0 °Cにした。 The set temperature of heater 28 provided in discharge unit 16 was set to 70 ° C, and the set temperature of heater 46 for heating nitrogen gas was set to 150 ° C. At this time, the discharge unit The junction of the gas from the 16 side and the heated nitrogen gas (the connection point between the processing gas pipe 32 and the branch pipe 42) The temperature of the nitrogen gas at A is about 120 ° C, and the processing that flows into the processing chamber 30 The concentration of HF in the gas is 4400 ppm. Furthermore, the set temperature of the heater 52 provided in the processing chamber 30 was 135 ° C, and the heating temperature of the member to be processed (sample) 34 was 90 ° C.
フッ化処理は、 まず処理室 30に試料を配置し、 処理室 30を乾いた窒素ガス によって 10分間置換したのち、 HF濃度が 4400 p pmの処理ガスを処理室 30に導入して試料のフッ化処理を 90秒間行い、 フッ化処理終了後に直ちに乾 いた窒素ガスを処理室 30に導入し、 10分間窒素ガスによる置換を行なった。. 《実施例 1》 In the fluoridation treatment, a sample is first placed in the processing chamber 30, the processing chamber 30 is replaced with dry nitrogen gas for 10 minutes, and then a processing gas having an HF concentration of 4400 ppm is introduced into the processing chamber 30 to fluorinate the sample. Immediately after the completion of the fluoridation treatment, a dry nitrogen gas was introduced into the treatment chamber 30 and replaced with nitrogen gas for 10 minutes. << Example 1 >>
銅板に半田メツキをした試料を上記の条件によるフッ化処理をし、 各種の雰囲 気中に 3時間放置したのちの表面残留 Fを、 水に濡らした p H試験紙を用いて p H値として求めた。 使用した試料は、 縦 5mm、 横 5 mm、 厚さ 0. 2 mmの銅 板に錫 80%、 鉛 20%の半田メツキをしたものである。 第 2図は、 雰囲気の状 態と 3時間後の pH値とを示したものである。 A sample with a copper plate soldered is fluorinated under the above conditions.After leaving for 3 hours in various atmospheres, the surface residual F is measured using a pH test paper wetted with water. Asked. The sample used was a copper plate with a length of 5 mm, a width of 5 mm, and a thickness of 0.2 mm, which was soldered with 80% tin and 20% lead. FIG. 2 shows the state of the atmosphere and the pH value after 3 hours.
第 2図から明らかなように、 フッ化処理した試料を大気 (相対湿度約 40%) 中に 3時間放置すると、 pH値が 7. 0と中性を示し、 pH試験もフッ化処理前 と変わらないものとなる。 これは、 大気中の水分が試料に付着している Fと反応 して HFとなって大気中に蒸発し、 水分が触媒となって Fが半田メツキ中に取り 込まれたためと考えられる。 また、 放置雰囲気が乾いた (ドライな) 窒素ガス中 であっても、 保持温度が 100°Cの高温である場合、 3時間経過するとフッ化処 理の効果が消失する。 これは、 試料に付着していた Fが熱エネルギーを得て試料 から離脱するためと考えられる。 そして、 放置雰囲気が窒素ガスであったとして も、 水分を添加した相対湿度が 76%の窒素ガス中では、 3時間経過するとフッ 化処理の効果がなくなる。 この理由は、 窒素ガス中に含まれる水分によるものと 考えられ、 水分が表面処理の効果を失わせる大きな要因であることがわかる。 一方、 放置雰囲気が乾燥空気 (露点約— 20°C)、 乾いた窒素ガス (露点約一 5 0°C)、 乾いた酸素ガス、 真空 (真空度◦ . 13Pa)の場合、 3時間経過したの ちにおいてもフッ化処理直後と同じ p H値を示し、 p H試験も良好であった。 このようなことから、 フッ化処理した表面処理品は、 室温の乾燥空気中、 乾い た窒素ガス中または真空中などの乾燥した雰囲気中に置くことにより、 長時間表 面処理の効果を失わせることなく保存することができる。 As is evident from Fig. 2, when the fluorinated sample was left in the atmosphere (relative humidity of about 40%) for 3 hours, the pH value showed a neutral value of 7.0. It will not change. This is considered to be because the moisture in the atmosphere reacts with F adhering to the sample to become HF and evaporates into the atmosphere, and the moisture acts as a catalyst, and F is taken into the solder plating. In addition, even if the storage atmosphere is dry (dry) nitrogen gas, if the holding temperature is as high as 100 ° C, the effect of the fluoridation treatment disappears after 3 hours. This is probably because F attached to the sample gained thermal energy and separated from the sample. Even if the standing atmosphere is nitrogen gas, the effect of the fluoridation treatment is lost after 3 hours in nitrogen gas to which water is added and the relative humidity is 76%. The reason for this is thought to be due to the moisture contained in the nitrogen gas, indicating that moisture is a major factor in losing the effect of the surface treatment. On the other hand, if the storage atmosphere is dry air (dew point: about -20 ° C), dry nitrogen gas (dew point: about 150 ° C), dry oxygen gas, and vacuum (vacuum degree: 13Pa), 3 hours have passed. of The pH value was the same as that immediately after the fluorination treatment, and the pH test was also good. For this reason, surface treatment products that have undergone fluoridation can lose their long-term surface treatment effects by placing them in a dry atmosphere at room temperature, in dry air, in dry nitrogen gas, or in a vacuum. Can be stored without having to.
なお、 第 2図中、 〇印はフッ化処理直後と同じ状態であることを示し、 X印は フッ化処理の効果が未処理と同程度まで低下していることを示す。 In FIG. 2, a mark 〇 indicates that the state is the same as that immediately after the fluoridation treatment, and a mark X indicates that the effect of the fluoridation treatment is reduced to the same degree as that of the untreated treatment.
《実施例 2》 << Example 2 >>
錫 6 3 %、 鉛 3 7 %の半田からなる直径 0 . 7 4 mmの半田ボールを上記の条 件でフッ化処理し、 異なる雰囲気中に 3時間放置したのち、 金メッキした基板の 上に配置して加熱し、 半田ボールの広がり具合を調べる濡れ広がり試験を行なつ た。 半田ボールを配置した基板は、 ガラス繊維とエポキシ樹脂とからなるガラス エポキシ基板であって、 表面に下地金属としてニッケルメツキをし、 その上に厚 さ 0 . 3 mの金メッキがしてあるものを用いた。 そして、 金メッキの上に半田 ボールを配置したのち、 窒素ガス雰囲気中で約 2 4 0 °Cに加熱して半田ボールを 溶融し、 その広がり具合を観察した。 第 3図は、 その実験結果を示したものであ る。 なお、 図中に示した〇印、 X印の意味は、 第 2図と同様であり、 △印はフッ 化処理の効果が処理直後より低下していることを示す。 A 0.74 mm diameter solder ball made of 63% tin and 37% lead solder is fluorinated under the above conditions, left in a different atmosphere for 3 hours, and then placed on a gold-plated substrate Then, a wet spread test was conducted to check the spread of the solder balls. The board on which the solder balls are placed is a glass epoxy board made of glass fiber and epoxy resin, with a nickel plating on the surface as a base metal and a 0.3 m thick gold plating on it. Using. Then, after placing the solder balls on the gold plating, the solder balls were melted by heating to about 240 ° C. in a nitrogen gas atmosphere, and the spread was observed. Figure 3 shows the results of the experiment. The meanings of the symbols Δ and X shown in the figure are the same as those in FIG. 2, and the symbol Δ indicates that the effect of the fluorine treatment is lower than immediately after the treatment.
図に示したあるように、 フッ化処理した半田ボールを大気 (相対湿度約 4 0 % ) 中または 1 0 0 °Cの乾いた窒素ガス中に 3時間放置すると、 濡れ広がり試験に おいては、 フッ化処理の効果が殆ど消失する。 なお、 図中 2つの記号 (印) が記 載してあるものは、 これらの中間の状態を示しており、 例えば、 △印と X印とが 記載されているものはフッ化処理の効果が大きく低下しているが、 未処理の場合 と比較してわずかに処理の効果が認められることを示している。 As shown in the figure, when the fluorinated solder balls are left in the atmosphere (about 40% relative humidity) or in dry nitrogen gas at 100 ° C for 3 hours, the wetting and spreading test The effect of the fluoridation treatment almost disappears. The two symbols (marks) in the figure indicate the intermediate state between them. For example, those marked with a △ mark and an X mark indicate that the effect of the fluoridation treatment is Although it is greatly reduced, it shows that the effect of treatment is slightly smaller than that of the case without treatment.
また、 湿った窒素ガス (相対湿度約 7 6 % ) 中に放置した場合、 3時間経過す ると完全にフッ化処理の効果がなくなる。 一方、 フッ化処理した半田ボールを放 置雰囲気が乾燥空気 (露点約一 2 0 °C )、 乾いた窒素ガス (露点約一 5 0 °C)、 真 空 (真空度 0 . 1 3 P a ) 中に放置した場合、 保持温度が室温であれば濡れ広が り試験に対するフッ化処理の効果は殆ど低下しない。 これらから、 乾燥した雰囲気であって、 加熱していない室温以下の温度で保存 することが望ましい。 Also, if left in humid nitrogen gas (relative humidity about 76%), the effect of the fluoridation treatment is completely lost after 3 hours. On the other hand, the atmosphere in which the fluorinated solder balls are placed is dry air (dew point: about 120 ° C), dry nitrogen gas (dew point: about 150 ° C), and vacuum (0.13 Pa ) If left at room temperature, if the holding temperature is room temperature, the effect of the fluoridation treatment on the wetting and spreading test will hardly decrease. For these reasons, it is desirable to store the product in a dry atmosphere at a temperature not higher than room temperature without heating.
《実施例 3》 << Example 3 >>
錫のペレツトを上記したフッ化処理の条件でフッ化処理し、 異なる雰囲気に 3 時間放置したのち、 金メッキをした基板との固体接合 (溶融せずに接合) して接 合強度の評価を行なった。 試料となる錫ペレットは、 直径が 2 mm、 厚さが l m mの円板状である。 また、 錫ペレットを固体接合した基板は、 縦 1 0 mm、 横 1 0 mm、 厚さ 1 mmの銅基板に厚さ 0 . 3〃mの金メッキを施したものである。 そして、 接合に際しては、 両者を約 1 0 0 °Cに加熱するとともに、 錫ペレットに 総荷重 6 k g fの接合圧力を加えて金メッキ銅基板に圧接した。 第 4図は、 その 結果を示したもので、 〇印、 △印、 X印は、 第 2図と同様である。 The tin pellets were fluorinated under the above fluoridation conditions, left in different atmospheres for 3 hours, and then subjected to solid bonding (bonding without melting) to the gold-plated substrate to evaluate the bonding strength. Was. The tin pellet used as the sample is a disk with a diameter of 2 mm and a thickness of l mm. The substrate to which the tin pellets were solid-bonded was a copper substrate having a length of 10 mm, a width of 10 mm, and a thickness of 1 mm, and a gold plating of 0.3 mm thick. At the time of joining, both were heated to about 100 ° C., and a joining pressure of a total load of 6 kgf was applied to the tin pellet to press it against the gold-plated copper substrate. Fig. 4 shows the results. The symbols 〇, △, and X are the same as in Fig. 2.
フッ化処理した錫ペレツトを露点約— 2 0 °Cの乾燥空気、 露点約一 5 0 °Cの乾 いた窒素ガス中に室温で 3時間放置したのちであっても、 フッ化処理の効果は処 理直後と殆ど同じであった。 これに対して、 湿度約 4 0 %の大気中に放置すると 、 保持温度が室温であっても固体接合強度が処理直後より低下する。 また、 湿度 約 7 6 %の室温の窒素ガス中に放置した場合、 固体接合強度試験においては、 未 処理と同程度まで低下する。 Even after leaving the fluorinated tin pellets at room temperature for 3 hours in dry air with a dew point of about --20 ° C and dry nitrogen gas with a dew point of about 150 ° C, the effect of the fluorination treatment is still significant. It was almost the same as immediately after the treatment. On the other hand, when left in the air at a humidity of about 40%, the solid bonding strength is lower than immediately after the treatment even when the holding temperature is room temperature. In addition, when left in a nitrogen gas at room temperature with a humidity of about 76%, in the solid bonding strength test, it decreases to the same level as that of untreated.
このことから、 乾燥した雰囲気であって、 加熱していない室温以下の温度で保 存することが望ましい。 For this reason, it is desirable to store the product in a dry atmosphere at a temperature not higher than room temperature without heating.
《比較例》 << Comparative Example >>
前記実施例 1、 2、 3において使用した半田メツキした銅板、 半田ボール、 錫 ペレットを上記のフッ化処理の条件でフッ化処理したのち、 これらを室温、 相対 湿度約 4 0 %の大気中に放置し、 時間の経過に対する半田メツキ銅板の p H値、 半田ボールの金メッキ基板に対する濡れ広がり、 錫ペレツトと金メッキ基板との 固体接合強度の変化を調べた。 第 5図は、 その結果を示したものである。 なお 、 半田ボールの濡れ広がり試験に使用した基板は前記実施例 2の場合と同様であ り、 固体接合強度評価に使用した基板は前記実施例 3の場合と同様である。 また 、 図中の〇印、 厶印、 X印は、 前記各実施例と同様である。 そして、 空欄は、 試 験を行なわなかったことを示す。 The copper plates, solder balls, and tin pellets used in Examples 1, 2, and 3 subjected to the solder plating are fluorinated under the above-described fluorination conditions, and then these are immersed in the air at room temperature and a relative humidity of about 40%. It was left to stand, and the changes in the pH value of the solder plating copper plate over time, the spread of the solder balls on the gold-plated substrate, and the solid bonding strength between the tin pellet and the gold-plated substrate were examined. Figure 5 shows the results. The substrate used for the solder ball wetting and spreading test was the same as in Example 2 above, and the substrate used for the solid bonding strength evaluation was the same as in Example 3 above. Further, in the drawings, the symbols 〇, 印, and X are the same as those in the above embodiments. And the blank is a trial Indicates that no experiment was performed.
第 5図に示したように、 フッ化処理後、 大気中に放置して 1時間が経過した状 態では、 フッ化処理の効果はそれほど低下しない。 しかし、 2時間を経過すると 、 フッ化処理の効果がはっきり低下する。 そして、 3時間を経過すると、 p H値 も 7 . 0となってフッ化処理の効果が殆どなくなる。 ただし、 固体接合をした場 合、 フッ化処理の効果がある程度残存している。 このことから、 フッ化処理した 被処理部材を大気中において保存する場合、 3時間以内が限度といえる。 また、 フッ化処理の効果は、 p H値で 6以下でないとほとんどないものと思われる。 産業上の利用可能性 As shown in Fig. 5, the effect of the fluoridation treatment does not decrease so much when one hour has passed after being left in the air after the fluoridation treatment. However, after 2 hours, the effect of the fluoridation treatment is clearly reduced. After 3 hours, the pH value becomes 7.0, and the effect of the fluoridation treatment is almost eliminated. However, in the case of solid joining, the effect of the fluoridation treatment remains to some extent. From this, it can be said that the storage of the fluorinated workpiece in the atmosphere is limited to three hours or less. Also, it seems that the effect of the fluoridation treatment has little effect unless the pH value is 6 or less. Industrial applicability
以上に説明したように、 本発明によれば、 表面処理した被処理物を乾燥した雰 囲気中に置くことにより、 被処理部材の表面に付着している Fなどのハロゲンが 大気中に存在する水分と反応して被処理部材の表面から離脱したり、 被処理部材 の中に取り込まれるのを防ぐことができ、 長時間にわたつて被処理部材の表面に 付着した状態が維持されるため、 表面処理の効果を長時間保持させることができ る As described above, according to the present invention, by placing a surface-treated object in a dry atmosphere, halogens such as F adhered to the surface of the member to be treated are present in the atmosphere. It can be prevented from reacting with moisture and detaching from the surface of the member to be treated or being taken into the member to be treated, and can be kept attached to the surface of the member to be treated for a long time, Long-lasting effect of surface treatment
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU23201/00A AU2320100A (en) | 1999-01-29 | 2000-01-27 | Method of preserving surface-treated member |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2161599 | 1999-01-29 | ||
| JP11/21615 | 1999-01-29 |
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| WO2000044958A1 true WO2000044958A1 (en) | 2000-08-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/JP2000/000439 Ceased WO2000044958A1 (en) | 1999-01-29 | 2000-01-27 | Method of preserving surface-treated member |
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| AU (1) | AU2320100A (en) |
| WO (1) | WO2000044958A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007535599A (en) * | 2004-04-30 | 2007-12-06 | ソルヴェイ(ソシエテ アノニム) | Polyolefin treatment to separate volatile materials |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07268649A (en) * | 1994-03-25 | 1995-10-17 | Benkan Corp | High activation and stabilization treatment method for hydrogen storage metal materials |
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2000
- 2000-01-27 AU AU23201/00A patent/AU2320100A/en not_active Abandoned
- 2000-01-27 WO PCT/JP2000/000439 patent/WO2000044958A1/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07268649A (en) * | 1994-03-25 | 1995-10-17 | Benkan Corp | High activation and stabilization treatment method for hydrogen storage metal materials |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007535599A (en) * | 2004-04-30 | 2007-12-06 | ソルヴェイ(ソシエテ アノニム) | Polyolefin treatment to separate volatile materials |
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| AU2320100A (en) | 2000-08-18 |
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