WO1999051333A1 - Treatment chamber - Google Patents
Treatment chamber Download PDFInfo
- Publication number
- WO1999051333A1 WO1999051333A1 PCT/JP1998/001617 JP9801617W WO9951333A1 WO 1999051333 A1 WO1999051333 A1 WO 1999051333A1 JP 9801617 W JP9801617 W JP 9801617W WO 9951333 A1 WO9951333 A1 WO 9951333A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- space
- processing
- air
- processing chamber
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/009—After-treatment of articles without altering their shape; Apparatus therefor using gases without chemical reaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/14—Production of inert gas mixtures; Use of inert gases in general
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B40/00—Processes, in general, for influencing or modifying the properties of mortars, concrete or artificial stone compositions, e.g. their setting or hardening ability
-
- C—CHEMISTRY; METALLURGY
- C06—EXPLOSIVES; MATCHES
- C06B—EXPLOSIVES OR THERMIC COMPOSITIONS; MANUFACTURE THEREOF; USE OF SINGLE SUBSTANCES AS EXPLOSIVES
- C06B21/00—Apparatus or methods for working-up explosives, e.g. forming, cutting, drying
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
Definitions
- the present invention relates to a processing chamber for performing processing such as welding, soldering, forging, and filling concrete.
- the inventor of the present invention has an inflow port for flowing helium gas into a space, and can replace the air from above in the space with the inflow of helium gas and discharge the air below.
- a processing chamber having a simple exhaust port and a processing space in a helium gas atmosphere in the above space was developed.
- helium gas Since helium gas is lighter than air, it is filled from above in a closed space. Therefore, it is possible to perform the work in the work where the presence of air is not preferable in the upper work room and the work in which the loss of air is not particularly problematic in the work room below. Therefore, according to the present invention, a processing space in a helium gas atmosphere can be provided above, and a non-processing space in an air atmosphere can be provided below.
- the processing space it is necessary that at least the upper end and the side wall of the processing space filled with helium gas are sealed, and it is preferable that the processing space be a closed space.
- a processing space can be constituted by a building structure. .
- the gas since the gas is present in the space filled with the helium gas, the gas is not compressed by the outside atmospheric pressure. Also, helium is lighter than air and is filled from the top. Therefore, if the upper end and the side wall are sealed, the space does not need to be a particularly strong structure. For example, by providing a coating sheet impermeable to gas, helium flows into the interior surrounded by the sheet, and it is easy to create a processing space in the helium atmosphere.
- the processing in which the processing space is provided with a processing space that generates airborne substances in an air atmosphere, the processing can be performed in an atmosphere of helium gas. Impurities such as dust and mist can be eliminated. Therefore, for example, as described later, it can be suitably applied to a coating / drying process and the like.
- an argon gas can be used instead of the helium gas. Even when argon gas is used, it can be applied to a space similar to the above. In addition, since argon gas is cheaper than helium gas, in that respect, it is necessary to employ argon gas in the present invention. Layer preferred. However, since argon gas is heavier than air, it is difficult to create a processing space similar to that of helium gas. Therefore, the present invention introduces helium gas into the processing chamber space, exhausts air heavier than helium gas from the processing chamber space, and then guides argon gas into the processing chamber space to perform processing.
- a method of filling the processing chamber with argon gas which is characterized by replacing the helium gas in the chamber space with argon gas and filling the processing chamber space with argon gas, was adopted. Further, in order to carry out the same method, an inflow port through which helium gas flows into the space, and the air can be displaced from above in the space with the inflow of the helium gas to discharge the air below.
- a processing chamber having an exhaust port, an inlet for argon gas for replacing the helium gas flowing into the space, and a processing space having an atmosphere of an argon gas in the space was employed.
- the treatment chamber of the present invention may be provided with an atmosphere of helium gas or argon gas. Therefore, a processing chamber equipped with an atmosphere of a gas layer composed of a plurality of inert gases such as helium gas and other inert gases, for example, argon gas, xenon gas, and carbon dioxide gas, or argon gas and other inert gases.
- a processing chamber having an atmosphere of a gas layer composed of a plurality of inert gases such as a gas such as xenon gas and carbon dioxide gas can be employed.
- ADVANTAGE OF THE INVENTION According to the processing chamber of this invention, storage of sensitive materials in the presence of air or any operation
- the present invention can be applied to a processing chamber in which the processing space is a welding space.
- the presence of air in the welding process is undesirable because it causes the metal of interest to be denatured.
- iron is easily oxidized and denatures welds Is often caused.
- the present invention can be noted that helium or argon is chemically stable and can hardly make compounds.
- fire may be a problem in the welding process due to the use of fire, but in a helium or argon atmosphere, everything does not burn and such problems are eliminated.
- the present invention can be configured as a processing chamber in which the processing space is a welding space for titanium.
- the processing space is a welding space for titanium.
- the presence of nitrogen in the air poses a problem. That is, in welding titanium, there is a problem that the welded portion is easily deformed by nitrogen and loses strength and the like. This problem is solved by the processing chamber of the present invention, which allows the operation to be performed in a helium or argon atmosphere.
- the present invention can be configured as a processing chamber in which the processing space is a processing space for soldering. Performing the soldering in the presence of air is not preferable because the object is oxidized. In other words, soldering can be considered as a kind of welding, and therefore, the problems that may occur in the welding operation are greatly duplicated.
- the present invention can also be configured as a processing chamber in which the processing space is a space for a forging process or a space for a rolling process for a forging product.
- the processing space is a space for a forging process or a space for a rolling process for a forging product.
- Performing such a forging process and a rolling process in the presence of air has a problem that the object is denatured.
- helium or argon can hardly produce a compound, it is possible to ensure an effect that a substance in a high energy state is not denatured even when it comes into contact with helium or argon. Therefore, it is possible to produce high-purity iron and the like without subjecting the object to denaturation.
- the processing space can be configured as a processing chamber including a processing space for filling concrete into the formwork. Performing such work in the presence of air can replace helium or argon gas with air in concrete. As a result, it is possible to prevent deaeration of buildings and deterioration of concrete after construction.
- the present invention can also be configured as a processing chamber having a space in which the processing space performs the painting step or the drying step.
- the coating operation is generally performed in the presence of oxygen, oxidation of the object to be coated may become a problem, and there is a problem that the coating film easily peels off.
- a large amount of paint mist is generated when spraying paint, but the mist generated in the air floats in the air, but falls quickly to the ground surface in helium to prevent contamination other than objects to be coated. Is possible.
- a baking step is performed by drying after coating. In this case, oxidation of the coating film or the surface of the object to be coated is prevented, and the adhesive strength is improved.
- the present invention can also be suitably used as a processing chamber in which a processing space forms a storage.
- a processing chamber filled with helium or argon gas as a storage can prevent denaturation of foods and the like, and improve storage capacity. That is, it is publicly known that in the absence of oxygen filled with an inert gas, the oxidation of food and the like does not take place, and is effective in preserving food, but all of them are those in which a container is filled with an inert gas. Yes, it was only a transaction in a market transaction.
- the present inventor has found a method for easily filling the processing chamber with helium or argon gas, and has come to an invention in which the method is used as a storage.
- Such storage is also highly susceptible to the effects of oxygen, but is excellent for storage.
- yellow phosphorus which can spontaneously ignite at certain temperatures and cannot be stored in a normal storage, does not burn in a helium or argon atmosphere and can be stored safely.
- the processing space may be a processing chamber configured as a space for packaging processing.
- the present invention can also be used as a processing chamber in which the processing space is configured as a space for polishing the blade.
- the processing space is configured as a space for polishing the blade.
- the present invention can also be adopted as a processing chamber in which the processing space is configured as a space for the processing of charging explosives.
- the processing space is configured as a space for the processing of charging explosives.
- the present invention can also be adopted as a processing chamber in which the processing space is a space for vapor deposition processing. This is effective because high-quality vapor deposition can be performed without vapor deposition in a vacuum.
- the present invention can also be adopted as a processing room in which the processing space is constituted by a space for food processing.
- the processing space is constituted by a space for food processing.
- food deteriorates in the presence of oxygen, and it is difficult to store it for a long time, but there are problems in the manufacturing process.
- Food includes not only food but also drinks.
- it is also applied to processing such as roasting of coffee beans.
- plastic production, molding, metal refining, molding, and glass production and melt molding in the presence of air in the air is not preferable because the respective objects are susceptible to denaturation.
- some operations use fire, which may cause fire problems. Performing such an operation in a processing chamber provided with a processing space in a helium or argon atmosphere can prevent denaturation and prevent a fire problem.
- the present invention can also be applied to a processing chamber in which the processing space forms a clean room. Because helium is lighter than air, airborne substances such as dust fall quickly to the ground surface in a helium atmosphere. Therefore, it is preferable to use the processing space as a clean room that does not like the presence of dust and the like. In addition, there are many bacterial species that can survive only in the presence of oxygen, and in a helium or argon atmosphere, the growth of such bacterial species can be prevented.
- the present invention can also be applied as a processing chamber in which the processing space is a kneading space for cement.
- the processing space is a kneading space for cement.
- the present invention can be applied to a processing chamber in which a processing space forms a space for a semiconductor assembling process or a manufacturing process.
- the present invention can be applied to a processing room in which the processing space forms a space for fire extinguishing work. If a fire occurs in a space with an air atmosphere, the helium gas flows into the processing chamber, causing helium to accumulate in a layer above, so that the fire does not spread above the helium layer and is easily extinguished. A fire is set.
- helium gas is introduced from the inlet of the processing chamber, and is replaced with air from above in the space of the processing chamber as the helium gas flows in, and the air is discharged from the exhaust port below.
- a treatment method in a treatment space in a helium gas atmosphere, or introduction of lithium gas from the inlet of the treatment chamber, and replacement of air from above in the treatment chamber space with the inflow of helium gas is employed.
- Helium gas is introduced from the inlet of the processing chamber, and is replaced with air from above in the space of the processing chamber along with the inflow of the helium gas, and the air is discharged from the exhaust port below, and then helium is discharged.
- Helium gas is introduced from the processing chamber obtained in the processing space in a gas atmosphere or from the inlet of the processing chamber, and is replaced with air from above in the processing chamber space as the helium gas flows in. After the air is exhausted from the exhaust port at the lower part, it is processed in a processing space in a helium gas atmosphere, whereby a processed product obtained can be produced. Therefore, it is possible to solve the above-mentioned technical problems that have been treated in an air atmosphere. BRIEF DESCRIPTION OF THE FIGURES 1 P98 / 01617
- FIG. 1 is a conceptual diagram showing the entire processing chamber according to the present invention.
- FIG. 2 is a conceptual diagram of a processing room including a processing space having a helium gas atmosphere on the upper floor and a processing space having an air atmosphere on the lower floor.
- FIG. 3 is a schematic diagram of a simplified processing chamber according to the present invention. BEST MODE FOR CARRYING OUT THE INVENTION
- FIG. 1 is a view showing the concept of a processing chamber according to the present invention.
- the processing chamber according to the present invention has four closed side walls and a closed ceiling, and requires at least an exhaust port 1 for exhausting air and an inlet 2 for inflow of helium gas.
- the exhaust port 1 needs to be provided below the processing chamber, but the location of the inlet 2 is not particularly limited. However, in order to effectively make the air layer exist below the helium layer, it is preferable to provide the inflow port 2 above the processing chamber.
- the treatments considered to be effective are not limited to those described above, but require the storage and production of materials that do not favor contact with air, work to generate large amounts of dust, and removal of dust. It can be widely and safely used for these tasks.
- Fig. 2 shows a conceptual diagram of a processing room consisting of a processing space with a helium gas atmosphere upstairs and a processing space with an air atmosphere downstairs.
- 3 in the figure indicates the threshold for separating both layers. You.
- the outlet 1 be provided to some extent above. In other words, it is unlikely that helium accumulates below the position of the outlet 1, so that air can be reliably maintained below the outlet 1.
- the sheet When the processing space in the helium atmosphere is constituted by the covering sheet, the sheet may be covered on the work object, and the helium gas may flow from the bottom. Helium is replaced with air in sheet ⁇ , and eventually helium is filled in the sheet.
- This treatment space is effective outdoors, for example, when filling and painting concrete in the building construction process.By changing the size of the sheet, it can be used in a helium atmosphere regardless of the size of the target object. This is preferable in that a processing space can be created.
- the mechanism for filling the processing chamber with helium gas will be described in more detail. In FIGS.
- the helium gas flowing in from the inflow port 2 accumulates upward in the processing chamber and pushes air downward.
- HE in the figure indicates a helium layer
- A indicates an air layer.
- the helium gas continues to flow, the thickness of the helium layer HE increases, and the air constituting the air layer A is exhausted from the outlet 1 to the outside of the processing chamber. Therefore, the air layer that has existed in the processing chamber is eventually replaced by the helium layer, and the processing chamber is filled with helium gas.
- helium gas is contained at a certain concentration in the gas discharged from the exhaust port, it can be considered that the gas in the processing chamber is filled with helium gas.
- the specific concentration of the exhaust gas may be freely set according to the anaerobic degree of the treatment, and is not particularly limited.
- a helium layer must be used on the upper floor and an air layer must be used on the lower floor.
- there are 3 floors above and below It is necessary to provide a gap to allow sufficient ventilation between the lower part, and the size of the gap may be determined by the inflow speed of the helium gas.
- the inlet 2 for helium gas inflow provided in the upper part of the processing chamber is used as an outlet for helium gas exhaust, and It is preferable that the air exhaust port 1 provided at the lower part be used as an argon gas inlet.
- helium gas is introduced into the processing chamber space, air that is heavier than helium gas is exhausted from the processing chamber space, and helium gas lighter than argon gas is discharged from the lower part of the processing chamber.
- the gas can be exhausted from the helium gas inlet 2 provided in the upper part of the processing chamber.
- the processing chamber can have an atmosphere of helium gas at the top of the processing chamber and an atmosphere of argon gas at the bottom.
- the processing in the processing chamber of the present invention can be performed by introducing a robot or the like into the processing chamber, but the processing can also be configured to be performed by the operator himself.
- an outer wall 5 constituting a closed space 4 filled with an inert gas, and a continuous space provided on the outer wall 5, connected to an outer space 6 inside the closed space 4, It is possible to employ a processing room provided with a work partition 7 into which workers enter.
- the outer wall 5 may be an inelastic structure, but may be made of an elastic material or an elastic body such as rubber or elastomer together with the working partition 7.
- the working partition 7 has a human shape, which facilitates the work. 8 indicates an operator.
- Fig. 3 is a schematic diagram of a simplified processing chamber, so this type of processing chamber has an inlet for helium gas and an outlet for air, and a loading port for the processing object into the space. Provided.
- a space filled with high-purity oxygen can be created by using the above-described filling method.
- an inert gas such as helium gas or argon gas
- a space filled with high-purity oxygen can be created by using the above-described filling method.
- helium gas is introduced into the processing chamber space, air that is heavier than helium gas is exhausted from the processing chamber space, and then oxygen gas is introduced into the processing chamber space, and helium gas in the processing chamber space is removed.
- An oxygen gas filling method in which the processing chamber space is filled with oxygen gas instead of oxygen gas can also be employed.
- the processing chamber of the present invention is used for welding processing, soldering, fabrication, rolling of structures, bleeding of concrete, painting and drying, storage of foods and the like, packaging, cutting of blades, polishing of explosives, etc.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Ventilation (AREA)
Abstract
Description
明 細 書 処理室 技術分野 Description Processing room Technical field
本発明は、溶接、はんだ付け、铸造、コンクリートの充填等の処理を 行うための処理室に関するものである。 背景技術 The present invention relates to a processing chamber for performing processing such as welding, soldering, forging, and filling concrete. Background art
日常的に行われている作業、工程の中には、空気の存在が好ましく ないものが種々存在するが、従来、かかる作業を行うにあたっては空気 の存在がない状態、すなわち真空の作業空間を作りだし、その中にお いて該作業を行っていた。 There are various types of work and processes that are routinely performed, for which the presence of air is undesirable.However, conventionally, when performing such work, the absence of air, that is, the creation of a vacuum work space , In which the work was performed.
しかしながら、真空空間を作り出すには、真空ポンプなどの設備が必 要であり、設備投資のためのコストがかかる。また、完全に空気の存在 をなくすことは困難であり、そのためにかかるコストは前記設備の比にな らない。さらに真空にした場合は、空間外からの大気圧を支える必要が あり、処理空間を構成する処理室は強固にしておかなければならない。 また、処理対象に見合った大きさの処理室を予め予想して設計してお かなければならず、対象物が大きい場合など簡便に用いることは困難 であった。 However, to create a vacuum space, equipment such as a vacuum pump is required, which costs capital investment. Further, it is difficult to completely eliminate the presence of air, and thus the cost is not as high as that of the above-mentioned equipment. Further, when a vacuum is applied, it is necessary to support the atmospheric pressure from outside the space, and the processing chamber constituting the processing space must be solid. In addition, a processing chamber having a size appropriate for the processing target had to be expected and designed in advance, and it was difficult to easily use the processing chamber when the target was large.
一方、粉塵が大量に発生する場合や粉塵が存在しない雰囲気下で 行わなければならない場合のように、粉塵の除去を必要とする作業を 行う場合、粉塵は空気中に浮遊し落下に時間がかかるので、除去が 困難であり、何らかの除去手段を設けなければならず、コスト的にも問 題があった。 発明の開示 On the other hand, when performing work that requires dust removal, such as when a large amount of dust is generated or when the work must be performed in an atmosphere where no dust exists, the dust floats in the air and takes time to drop. Therefore, removal was difficult and some means of removal had to be provided, and there was a problem in terms of cost. Disclosure of the invention
本発明者はかかる問題を解決すべく、 空間内にヘリウムガスを流入 するための流入口と、ヘリウムガスの流入に伴って上記空間内の上方 から空気と置換して下方において該空気を排出可能な排気口を有し、 上記空間内にヘリウムガスの雰囲気の処理空間を備えた処理室を開 発した。 In order to solve such a problem, the inventor of the present invention has an inflow port for flowing helium gas into a space, and can replace the air from above in the space with the inflow of helium gas and discharge the air below. A processing chamber having a simple exhaust port and a processing space in a helium gas atmosphere in the above space was developed.
かかる処理空間内は空気の存在がないので、 上記空気存在下で行 うことが好ましくない作業において問題となることはない。また、真空とな つているわけではないので、大気圧からうける圧力を考慮して作業室を 強固にする必要性が少ないだけでなく、原料及び作業員の出入りの際、 作業室内に空気が入り込むおそれは少ないので、 処理室内に原料の 補充などが容易である。さらに、ヘリウムは空気より軽いため密閉された 空間内では上方にたまり、 下方に空気を押し下げるため、 空間内にお ける置換が簡便にできる。 Since there is no air in the processing space, there is no problem in the operation where it is not preferable to perform the operation in the presence of the air. In addition, since there is no vacuum, it is not necessary to harden the work room in consideration of the pressure from the atmospheric pressure, and air enters the work room when raw materials and workers enter and leave. Since there is little fear, it is easy to replenish raw materials in the processing chamber. Furthermore, helium is lighter than air and accumulates upwards in a closed space and pushes down air downwards, making replacement in the space easier.
処理空間内のヘリウムは加圧されていても問題はない。すなわち後述 の被覆シートによって構成される処理空間の場合は、加圧ヘリウム雰 囲気とした方が作業空間の確保ができ好ましい。 There is no problem even if the helium in the processing space is pressurized. That is, in the case of a processing space constituted by a covering sheet described later, it is preferable to use a pressurized helium atmosphere because a working space can be secured.
ヘリウムガスを空間内に充填し、ヘリウム雰囲気とするには、ヘリウムの 分子量に注目し、 空気と置換させる方法をとるようにすれば簡便である。 すなわち、 空間にヘリウムの流入口を設け、 該流入口からヘリウムを流 入すると、ヘリウムは軽いので空間の上方にたまり、 空気は空間の下方 に押しやられる。そこで空間の下方に空気を排出するための排出 口を 設けてやれば、 該排出 口から空気は排出し、 空間内にはヘリウムが充 填される。また、排出口からヘリウムが排出されるようになれば、空間内 はヘリウムで充填されていると考えられるから、 ヘリウムの流入を止めれ ばよい。 In order to fill the space with helium gas and create a helium atmosphere, it is convenient to focus on the molecular weight of helium and to replace it with air. In other words, when a helium inlet is provided in the space and helium flows through the inlet, the helium is light and thus accumulates above the space, and the air is pushed down the space. Therefore, if a discharge port for discharging air is provided below the space, the air is discharged from the discharge port, and the space is filled with helium. Also, if helium is discharged from the outlet, it is considered that the space is filled with helium. I just need.
ヘリウムガスは空気より軽いため、密閉された空間内では上方から充 填されていく。 したがって、 空気の存在が好ましくない作業の作業室を 上方に、 空気の損時が特に問題とならない作業を下方の作業室で行 うようにすることも可能である。従って、本発明は、 上方にヘリウムガス雰 囲気の処理空間、 下方に空気雰囲気の非処理空間を備えることがで きる。 Since helium gas is lighter than air, it is filled from above in a closed space. Therefore, it is possible to perform the work in the work where the presence of air is not preferable in the upper work room and the work in which the loss of air is not particularly problematic in the work room below. Therefore, according to the present invention, a processing space in a helium gas atmosphere can be provided above, and a non-processing space in an air atmosphere can be provided below.
ヘリウムガスを充填する処理空間は少なくとも上端及び側壁が密閉さ れていることが必要であり、 好ましくは密閉空間とすることが望ましいが、 かかる処理空間を建築構造物で構成することも可能である。 It is necessary that at least the upper end and the side wall of the processing space filled with helium gas are sealed, and it is preferable that the processing space be a closed space. However, such a processing space can be constituted by a building structure. .
また、ヘリウムガスを充填した空間内にはガスが存在するので外の大 気圧により圧縮されることがない。また、ヘリウムは空気より軽いので上 方から充填されていく。したがって、 上端及び側壁が密閉されていれば その空間は特に強固な構造物である必要はない。例えばガスを通さな い被覆シートを設けることでそのシートに囲まれた内部にヘリウムを流入 し、 上記ヘリウム雰囲気の処理空間を作り出すことが簡単に可能であ る。 Further, since the gas is present in the space filled with the helium gas, the gas is not compressed by the outside atmospheric pressure. Also, helium is lighter than air and is filled from the top. Therefore, if the upper end and the side wall are sealed, the space does not need to be a particularly strong structure. For example, by providing a coating sheet impermeable to gas, helium flows into the interior surrounded by the sheet, and it is easy to create a processing space in the helium atmosphere.
特に、処理空間が、 空気雰囲気下では空中浮遊物の発生を伴う処 理空間を備えた本発明の処理室の場合は、ヘリウムガスの雰囲気下 で処理できるため、 空中浮遊物を地表に落下されることができ、ホコリ やミスト等の不純物を排除することができる。従って、 例えば後述の様 に、塗装 ·乾燥処理等に好適に適用することができる。 In particular, in the case of the processing chamber of the present invention in which the processing space is provided with a processing space that generates airborne substances in an air atmosphere, the processing can be performed in an atmosphere of helium gas. Impurities such as dust and mist can be eliminated. Therefore, for example, as described later, it can be suitably applied to a coating / drying process and the like.
一方、本発明は、 上記ヘリウムガスにかえてアルゴンガスを利用するこ ともできる。アルゴンガスを利用した場合でも、 上記と同様な空間に対し て適用することができる。また、アルゴンガスはヘリウムガスと比較して安 価であるため、その点ではアルゴンガスを上記発明に採用することが一 層好ましい。し力 し、アルゴンガスは空気より重たいため、前記ヘリウムガ スと同様な処理空間をつくることは困難である。そこで、 本発明は、 処 理室空間内にヘリウムガスを導入して、ヘリウムガスより重たい空気を処 理室空間内から排気した後、 当該処理室空間内にアルゴンガスを導 人して、処理室空間内のヘリウムガスをアルゴンガスと置換してアルゴン ガスを処理室空間に充填することを特徴とする処理室内へのアルゴン ガスの充填方法を採用した。また、 同方法を実施するため、 空間内に ヘリウムガスを流入するための流入口と、ヘリウムガスの流入に伴って上 記空間内の上方から空気と置換して下方において該空気を排出可能 な排気口と、 空間内に流入した上記ヘリウムガスと置換するアルゴンガ スの流入口を有し、 上記空間内にアルゴンガスの雰囲気の処理空間 を備えた処理室を採用した。 On the other hand, in the present invention, an argon gas can be used instead of the helium gas. Even when argon gas is used, it can be applied to a space similar to the above. In addition, since argon gas is cheaper than helium gas, in that respect, it is necessary to employ argon gas in the present invention. Layer preferred. However, since argon gas is heavier than air, it is difficult to create a processing space similar to that of helium gas. Therefore, the present invention introduces helium gas into the processing chamber space, exhausts air heavier than helium gas from the processing chamber space, and then guides argon gas into the processing chamber space to perform processing. A method of filling the processing chamber with argon gas, which is characterized by replacing the helium gas in the chamber space with argon gas and filling the processing chamber space with argon gas, was adopted. Further, in order to carry out the same method, an inflow port through which helium gas flows into the space, and the air can be displaced from above in the space with the inflow of the helium gas to discharge the air below. A processing chamber having an exhaust port, an inlet for argon gas for replacing the helium gas flowing into the space, and a processing space having an atmosphere of an argon gas in the space was employed.
なお、本発明の処理室は、ヘリウムガス又はアルゴンガスの雰囲気を 備えていれば差し支えない。従って、ヘリウムガスと他の不活性ガス例 えばアルゴンガス、 キセノンガス、 二酸化炭素ガス等の複数の不活性ガ スからなるガス層の雰囲気を備えた処理室や、アルゴンガスと他の不活 性ガス例えばキセノンガス、 二酸化炭素ガス等の複数の不活性ガスか らなるガス層の雰囲気を備えた処理室を採用することができる。 Note that the treatment chamber of the present invention may be provided with an atmosphere of helium gas or argon gas. Therefore, a processing chamber equipped with an atmosphere of a gas layer composed of a plurality of inert gases such as helium gas and other inert gases, for example, argon gas, xenon gas, and carbon dioxide gas, or argon gas and other inert gases. A processing chamber having an atmosphere of a gas layer composed of a plurality of inert gases such as a gas such as xenon gas and carbon dioxide gas can be employed.
本発明の処理室によれば、 空気の存在下において影響を受けやす い材料の保管あるいはあらゆる作業を簡単に、かつ安全に行うことがで きる。また、粉塵が気体中を浮遊しにくく、すぐに地面に落下するので、 粉塵を大量に発生する作業及び粉塵の存在下で行うことが好ましくな い作業の作業効率を向上させることができる。 ADVANTAGE OF THE INVENTION According to the processing chamber of this invention, storage of sensitive materials in the presence of air or any operation | work can be performed easily and safely. In addition, since the dust is unlikely to float in the gas and immediately falls to the ground, it is possible to improve the work efficiency of the work that generates a large amount of dust and the work that is not preferable to be performed in the presence of the dust.
また、 本発明は、 処理空間を溶接空間とした処理室に適用できる。 溶接処理において空気の存在は、その対象となる金属の変性を引き 起こし好ましくない。例えば鉄などは酸化されやすく、 溶接部分の変性 を起こしていることが多い。 本発明は、ヘリウム又はアルゴンが化学的に 安定であり、 ほとんど化合物をつくり得ないことに注目することができる。 さらに火を用いる作業であるため溶接工程において火災が問題にある こともあるが、ヘリウム又はアルゴン雰囲気においては、あらゆるものは燃 焼せずこのような問題も解消される。 Further, the present invention can be applied to a processing chamber in which the processing space is a welding space. The presence of air in the welding process is undesirable because it causes the metal of interest to be denatured. For example, iron is easily oxidized and denatures welds Is often caused. The present invention can be noted that helium or argon is chemically stable and can hardly make compounds. In addition, fire may be a problem in the welding process due to the use of fire, but in a helium or argon atmosphere, everything does not burn and such problems are eliminated.
また、本発明は、 処理空間がチタン同士の溶接空間である処理室と して構成できる。チタン同士の溶接においては空気中の窒素の存在が 問題となる。すなわちチタンの溶接において、溶接部分が窒素により変 性されやすく、 強度などを失うといった問題があった。かかる問題は作 業をヘリウム又はアルゴン雰囲気で行うことができる本発明の処理室に より解消される。 In addition, the present invention can be configured as a processing chamber in which the processing space is a welding space for titanium. In welding titanium to titanium, the presence of nitrogen in the air poses a problem. That is, in welding titanium, there is a problem that the welded portion is easily deformed by nitrogen and loses strength and the like. This problem is solved by the processing chamber of the present invention, which allows the operation to be performed in a helium or argon atmosphere.
また、本発明は、 処理空間がはんだ付けの処理空間である処理室と して構成できる。 はんだ付けを空気の存在下で行うことは、 対象物が酸 化を引き起こし好ましくない。すなわち、 はんだ付けは一種の溶接であ ると考えることも可能であるため、溶接作業において起こりうる問題を重 複するところが大きい。 Further, the present invention can be configured as a processing chamber in which the processing space is a processing space for soldering. Performing the soldering in the presence of air is not preferable because the object is oxidized. In other words, soldering can be considered as a kind of welding, and therefore, the problems that may occur in the welding operation are greatly duplicated.
また、本発明は、 処理空間が錄造処理の空間或いは铸造物の圧延 処理の空間である処理室としても構成することができる。かかる鎵造処 理及び圧延処理を空気の存在下で行うことは、対象物が変性するとい つた問題を有する。上述のようにヘリウム又はアルゴンはほとんど化合物 をつくり得ないため、 高エネルギー状態の物質がヘリウム又はアルゴンと 接触しても変性しない効果を確保できる。したがって、 対象物が変性を うけることがなく純度の高い铸鉄などの製造が可能となる。 Further, the present invention can also be configured as a processing chamber in which the processing space is a space for a forging process or a space for a rolling process for a forging product. Performing such a forging process and a rolling process in the presence of air has a problem that the object is denatured. As described above, since helium or argon can hardly produce a compound, it is possible to ensure an effect that a substance in a high energy state is not denatured even when it comes into contact with helium or argon. Therefore, it is possible to produce high-purity iron and the like without subjecting the object to denaturation.
また、 本発明は、 処理空間が型枠内へのコンクリートの充填処理空 間を含む処理室として構成できる。かかる作業を空気存在下で行うこと は、ヘリウム又はアルゴンガスをコンクリート中の空気と置換することがで きるため、 建造物の脱気と、建造後のコンクリートの変質等を防止等す ることができる。 Further, according to the present invention, the processing space can be configured as a processing chamber including a processing space for filling concrete into the formwork. Performing such work in the presence of air can replace helium or argon gas with air in concrete. As a result, it is possible to prevent deaeration of buildings and deterioration of concrete after construction.
また、本発明は、 処理空間が塗装工程又は乾燥工程を行う空間を 持つ処理室としても構成できる。 塗装作業一般を酸素存在下で行う 場合は被塗物の酸化が問題となる場合があり、塗膜の剥離がおきやす いという問題がある。また塗料吹き付けの際に塗料のミストが大量に発 生するが、 空気中で生じたミストは空気中を浮遊するが、ヘリウム中で は早く地表に落下し、被塗物以外の汚染を防ぐことが可能である。また、 塗装後の乾燥で焼く付け工程をとる場合があるが、 この場合における 塗膜又は被塗物表面の酸化が防止され、接着力が向上する。 Further, the present invention can also be configured as a processing chamber having a space in which the processing space performs the painting step or the drying step. When the coating operation is generally performed in the presence of oxygen, oxidation of the object to be coated may become a problem, and there is a problem that the coating film easily peels off. In addition, a large amount of paint mist is generated when spraying paint, but the mist generated in the air floats in the air, but falls quickly to the ground surface in helium to prevent contamination other than objects to be coated. Is possible. In some cases, a baking step is performed by drying after coating. In this case, oxidation of the coating film or the surface of the object to be coated is prevented, and the adhesive strength is improved.
また、 本発明は、処理空間が貯蔵庫を構成する処理室としても好適 に使用できる。 ヘリウム又はアルゴンガスで満たされた処理室を貯蔵庫 として利用することは、食品などの変性を防止することができ、 貯蔵能 力が向上する。すなわち、 不活性ガスを充填した酸素がない状態では 食料などの酸化は行われず、食品の保存に効果を奏することは公知で あるが、 これはいずれも容器内に不活性ガスを充填したものであり、 巿 場取引における処理でしかなかった。本発明者は、簡単に処理室内を ヘリウム又はアルゴンガスで充満させる方法を見いだし、これを貯蔵庫と して利用する発明をするに至った。また、かかる貯蔵庫は酸素の影響を 顕著に受けやすいものの保存にも優れている。例えば、 黄リンなど温度 によっては自然発火し、 通常の貯蔵庫に保存できないようなものであつ ても、ヘリウム又はアルゴン雰囲気では燃焼することはないため、安全に 貯蔵することができる。 Further, the present invention can also be suitably used as a processing chamber in which a processing space forms a storage. Using a processing chamber filled with helium or argon gas as a storage can prevent denaturation of foods and the like, and improve storage capacity. That is, it is publicly known that in the absence of oxygen filled with an inert gas, the oxidation of food and the like does not take place, and is effective in preserving food, but all of them are those in which a container is filled with an inert gas. Yes, it was only a transaction in a market transaction. The present inventor has found a method for easily filling the processing chamber with helium or argon gas, and has come to an invention in which the method is used as a storage. Such storage is also highly susceptible to the effects of oxygen, but is excellent for storage. For example, yellow phosphorus, which can spontaneously ignite at certain temperatures and cannot be stored in a normal storage, does not burn in a helium or argon atmosphere and can be stored safely.
また、ヘリウム又はアルゴン雰囲気下で普通に包装作業を行うと、 当 然、容器内にヘリウム又はアルゴンガスが充填し、従来行われている不 活性ガス充填包装処理と同様の効果をなす。すなわち何等の設備を 必要とすることなく不活性ガス充填をすることができ、 設備投資を減少 することも可能である。本発明は、処理空間を包装処理の空間で構成 する処理室とすることもできる。 In addition, when the packaging operation is performed normally in a helium or argon atmosphere, the container is naturally filled with helium or argon gas, which has the same effect as the conventional inert gas filling and packaging processing. In other words, what kind of equipment Inert gas filling can be performed without the need, and capital investment can be reduced. According to the present invention, the processing space may be a processing chamber configured as a space for packaging processing.
また、本発明は、 処理空間が刃物の研磨処理の空間で構成する処 理室としても使用できる。 刃物の研磨処理工程では、 刃先が空気中の 酸素のはたらきによって焼き付けを起こし、脆くなるといった問題を有し ていた。かかる作業をヘリウム又はアルゴン雰囲気下で行うことにより焼 き付けを防止することができ、切れ味の優れた刃物の製造が容易となる ものである。 Further, the present invention can also be used as a processing chamber in which the processing space is configured as a space for polishing the blade. In the polishing process of the blade, there was a problem that the blade edge was baked by the action of oxygen in the air and became brittle. By performing such an operation in an atmosphere of helium or argon, burning can be prevented, and the production of a blade having excellent sharpness becomes easy.
また、本発明は、 処理空間が爆発物の充填処理の空間で構成する 処理室としても採用できる。爆薬を製造する際に爆発物を管に充填す る必要があるが、かかる工程において取扱いを誤ると爆発を起こし危険 であることが多い。爆発は爆発物と空気中の酸素の急激な燃焼である と考えられているため、酸素が存在しない雰囲気下においては爆発す るおそれが顕著に軽減できる。 Further, the present invention can also be adopted as a processing chamber in which the processing space is configured as a space for the processing of charging explosives. When manufacturing explosives, it is necessary to fill the tube with explosives, but mishandling in such a process often causes an explosion and is dangerous. Since the explosion is considered to be the rapid combustion of explosives and oxygen in the air, the risk of explosion in an atmosphere without oxygen can be significantly reduced.
また、本発明は、 処理空間が蒸着処理の空間で構成する処理室とし ても採用できる。これにより、真空中で蒸着しなくても、 高品質の蒸着 処理ができるため、効果的である。 Further, the present invention can also be adopted as a processing chamber in which the processing space is a space for vapor deposition processing. This is effective because high-quality vapor deposition can be performed without vapor deposition in a vacuum.
また、本発明は、 処理空間が食品の製造処理の空間で構成する処 理室としても採用できる。既述のように酸素存在下においては食品が 変質し、保存を長期間することは困難であるが、製造過程においてもか かる問題は生じる。すなわち、食品の製造過程において、ヘリウム又は アルゴン雰囲気の処理空間内で行うことにより食品の酸化を防止し、 長期間の保存を可能としたものである。 なお、食料品には食べ物のみ ならず飲み物が含まれる。例えば、コーヒー豆の焙煎などの加工処理に 対しても適用される。 空気中でプラスチックを製造、 成形作業、金属の精製、 成形作業、 及びガラスの製造、溶融成形作業を空気の存在下で行うことはそれぞ れの対象物が変性をうけやすく好ましくない。 また、 作業によっては火を 使用するため、火災の問題を生じることもある。かかる作業をヘリウム又 はアルゴン雰囲気の処理空間を備えた処理室で行うことにより、変性を 防止することができさらに、火災の問題を防ぐことが可能となる。 Further, the present invention can also be adopted as a processing room in which the processing space is constituted by a space for food processing. As mentioned above, food deteriorates in the presence of oxygen, and it is difficult to store it for a long time, but there are problems in the manufacturing process. In other words, in the process of producing food, by performing the treatment in a treatment space in an atmosphere of helium or argon, oxidation of the food is prevented, and long-term storage is enabled. Food includes not only food but also drinks. For example, it is also applied to processing such as roasting of coffee beans. Performing plastic production, molding, metal refining, molding, and glass production and melt molding in the presence of air in the air is not preferable because the respective objects are susceptible to denaturation. Also, some operations use fire, which may cause fire problems. Performing such an operation in a processing chamber provided with a processing space in a helium or argon atmosphere can prevent denaturation and prevent a fire problem.
また、 本発明は、 処理空間がクリーン室を構成する処理室にも適用 できる。ヘリウムは空気より軽いため、ヘリウム雰困気下においてはホコリ などの空中浮遊物が迅速に地表面に落下する。したがって、ホコリなど の存在を好まないクリーンルームとして処理空間を使用することは好適 である。 さらに酸素存在下でのみ生存できる菌種も多数存在し、へリウ ム又はアルゴン雰囲気下においてはかかる菌種の増殖の防止にもな る。 Further, the present invention can also be applied to a processing chamber in which the processing space forms a clean room. Because helium is lighter than air, airborne substances such as dust fall quickly to the ground surface in a helium atmosphere. Therefore, it is preferable to use the processing space as a clean room that does not like the presence of dust and the like. In addition, there are many bacterial species that can survive only in the presence of oxygen, and in a helium or argon atmosphere, the growth of such bacterial species can be prevented.
また、 本発明は、処理空間がセメントの混練空間である処理室として も適用できる。セメントの混練作業においては、セメントの粉末が空気中 に浮遊し、衛生上好ましくないのみならず、近隣に存在する他のものへ の付着により汚染を引き起こすと言った問題があった。かかる混練作業 をヘリウム雰囲気の作業空間により行うことは、浮遊したセメント粉末が 迅速に地表に落下することからかかる問題を解消することが可能であ る。 Further, the present invention can also be applied as a processing chamber in which the processing space is a kneading space for cement. During the kneading of cement, there was a problem that the cement powder floated in the air, which was not only unfavorable for hygiene, but also caused contamination by adhesion to other nearby substances. Performing such a kneading operation in a working space in a helium atmosphere can solve such a problem because the suspended cement powder quickly falls to the ground surface.
半導体などの製造及び組立作業においてもヘリウム雰囲気の処理 空間内で行うことは粉塵の除去という観点から好ましい。すなわち半導 体などは不純物を完全に除去する必要があるため、クリーンルーム内で の作業が好ましく、そのための設備を必要としていた。かかる作業をヘリ ゥム雰囲気下において行うことでホコリなどの空中浮遊物を地表に早く 落下させることができ、 半導体の製造組立作業において好結果を奏す ることが可能である。本発明は、処理空間が半導体の組立処理或い は製造工程の空間を構成する処理室に適用できる。 It is preferable from the viewpoint of removing dust that the manufacturing and assembling operations of semiconductors and the like are performed in the processing space in the helium atmosphere. In other words, since it is necessary to completely remove impurities from semiconductors and the like, it is preferable to work in a clean room, and equipment for this is required. Performing such work in a helicopter atmosphere allows airborne substances such as dust to quickly fall to the surface of the ground, and achieves good results in semiconductor manufacturing and assembly work. It is possible to INDUSTRIAL APPLICABILITY The present invention can be applied to a processing chamber in which a processing space forms a space for a semiconductor assembling process or a manufacturing process.
また、 本発明は、処理空間が消火作業の空間を構成する処理室とし ても適用できる。 空気雰囲気の空間内で火災が発生した場合、 処理 室内にヘリウムガスを流入することによって、ヘリウムが上方に層を成し てたまるため、ヘリウム層より上方に火災が広がることはなく、 容易に消 火が われる。 Further, the present invention can be applied to a processing room in which the processing space forms a space for fire extinguishing work. If a fire occurs in a space with an air atmosphere, the helium gas flows into the processing chamber, causing helium to accumulate in a layer above, so that the fire does not spread above the helium layer and is easily extinguished. A fire is set.
このように、本発明は、処理室の流入口からヘリウムガスを導入し、へ リウムガスの流入に伴って上記処理室の空間内の上方から空気と置 換して下方において該空気を排気口から排出した後、 ヘリウムガス雰 囲気の処理空間で処理する処理方法や、 処理室の流入口からへリウ ムガスを導入し、 ヘリウムガスの流入に伴って上記処理室の空間内の 上方から空気と置換して下方において該空気を排気口から排出した 後、アルゴンガスを流入口から導入して、アルゴンガス雰囲気の処理空 間で処理する処理方法を実施できる処理室を採用することができるの で、 処理室の流入口からヘリウムガスを導入し、ヘリウムガスの流入に 伴って上記処理室の空間内の上方から空気と置換して下方において 該空気を排気口から排出した後、ヘリウムガス雰囲気の処理空間で処 理されて得られた処理物や、 処理室の流入口からヘリウムガスを導入 し、ヘリウムガスの流入に伴って上記処理室の空間内の上方から空気 と置換して下方において該空気を排気口から排出した後、ヘリウムガス 雰囲気の処理空間で処理されて得られた処理物を製造することができ る。従って、 空気雰囲気下で処理していた既述の技術的問題点を解 決することができる。 図面の簡単な説明 1 P98/01617 As described above, according to the present invention, helium gas is introduced from the inlet of the processing chamber, and is replaced with air from above in the space of the processing chamber as the helium gas flows in, and the air is discharged from the exhaust port below. After discharge, a treatment method in a treatment space in a helium gas atmosphere, or introduction of lithium gas from the inlet of the treatment chamber, and replacement of air from above in the treatment chamber space with the inflow of helium gas Then, after the air is discharged from the exhaust port below, a processing chamber capable of implementing a processing method in which argon gas is introduced from the inflow port and processed in a processing space in an argon gas atmosphere can be employed. Helium gas is introduced from the inlet of the processing chamber, and is replaced with air from above in the space of the processing chamber along with the inflow of the helium gas, and the air is discharged from the exhaust port below, and then helium is discharged. Helium gas is introduced from the processing chamber obtained in the processing space in a gas atmosphere or from the inlet of the processing chamber, and is replaced with air from above in the processing chamber space as the helium gas flows in. After the air is exhausted from the exhaust port at the lower part, it is processed in a processing space in a helium gas atmosphere, whereby a processed product obtained can be produced. Therefore, it is possible to solve the above-mentioned technical problems that have been treated in an air atmosphere. BRIEF DESCRIPTION OF THE FIGURES 1 P98 / 01617
第 1図は、本発明にかかる処理室の全体を示す概念図である。 FIG. 1 is a conceptual diagram showing the entire processing chamber according to the present invention.
第 2図は、 階上がヘリウムガス雰囲気を備えた処理空間、 階下が空 気の雰囲気を備えた処理空間で構成された処理室の概念図である。 FIG. 2 is a conceptual diagram of a processing room including a processing space having a helium gas atmosphere on the upper floor and a processing space having an air atmosphere on the lower floor.
第 3図は、本発明にかかる簡易型処理室の概略図である。 発明を実施するための最良の形態 FIG. 3 is a schematic diagram of a simplified processing chamber according to the present invention. BEST MODE FOR CARRYING OUT THE INVENTION
第 1図は本発明にかかる処理室の概念を示した図である。本発明に かかる処理室は四周の側壁及び天井は密閉されており、少なくとも、 空気を排気するための排気口 1、および、ヘリウムガス流入のための流 入口 2を必要とする。処理室内に物資を送るための搬入口、及び人間 が出入りするための出入り口は設けられている。 排気口 1は処理室の 下方に設けられることが必要であるが、 流入口 2は特に場所が限定さ れるわけではない。ただし、有効に空気層をヘリウム層の下部に存在さ せるためには、流入口 2を処理室上部に設ける方が好ましい。 FIG. 1 is a view showing the concept of a processing chamber according to the present invention. The processing chamber according to the present invention has four closed side walls and a closed ceiling, and requires at least an exhaust port 1 for exhausting air and an inlet 2 for inflow of helium gas. There is an entry port for sending supplies into the processing chamber and an entrance port for humans. The exhaust port 1 needs to be provided below the processing chamber, but the location of the inlet 2 is not particularly limited. However, in order to effectively make the air layer exist below the helium layer, it is preferable to provide the inflow port 2 above the processing chamber.
本発明にかかる処理室内は酸素の存在がないため、 人間が入って 作業を行う場合は、 何らかの処置をとる必要があるが、この処置には広 く公知のものが使用できる。例えばガスマスクや全身を密閉し、酸素な どの供給排気装置を備えたものが例示できる。 Since there is no oxygen in the processing chamber according to the present invention, it is necessary to take some kind of treatment when humans enter the work, and widely known treatments can be used for this treatment. For example, a gas mask or a whole body hermetically sealed and provided with a supply and exhaust device such as oxygen can be exemplified.
かかる処理室内において、有効と思われる処理としては既述のものに 限られず、 空気との接触が好ましくない材料の貯蔵、製造など、及び、 粉塵を大量に発生する作業、粉塵の除去を必要とする材料の製造な どが挙げられ、 これらの作業に広く安全に利用できる。 In such a treatment chamber, the treatments considered to be effective are not limited to those described above, but require the storage and production of materials that do not favor contact with air, work to generate large amounts of dust, and removal of dust. It can be widely and safely used for these tasks.
処理室をヘリウム雰囲気の階上と空気雰囲気の階下の 2層にするこ とも可能である。第 2図は階上がヘリウムガス雰囲気を備えた処理空間、 階下が空気の雰囲気を備えた処理空間で構成された処理室の概念 図を示したものである。図中の 3は両層を仕切るためのしきりを示してい る。 また、 階下の空気層を確実に維持するため、排出 口 1はある程度 上部に設けることが好ましい。すなわち、排出 口 1の位置よりも下層に ヘリウムがたまることは考えられないため、排出口 1以下には空気が確 実に維持できる。 It is also possible to have two layers of treatment room, one above the helium atmosphere and one below the air atmosphere. Fig. 2 shows a conceptual diagram of a processing room consisting of a processing space with a helium gas atmosphere upstairs and a processing space with an air atmosphere downstairs. 3 in the figure indicates the threshold for separating both layers. You. In addition, in order to reliably maintain the air space downstairs, it is preferable that the outlet 1 be provided to some extent above. In other words, it is unlikely that helium accumulates below the position of the outlet 1, so that air can be reliably maintained below the outlet 1.
ヘリウム雰囲気の処理空間を被覆シートにより構成する場合は、 作業 対象物の上にシートをかぶせ、裾からヘリウムガスを流入させればよい。 シート內ではヘリウムと空気の置換が行われ、最終的にはシート内にへ リウムが充満することとなる。本処理空間は、屋外において、例えビル建 造工程においてコンクリートの充填及び塗装作業を行うときなどに有効 であり、 シートの大きさを変えることによって、 対象物の大きさにかかわら ず、ヘリウム雰囲気の処理空間を作り出すことができる点で好ましい。 以下、 処理室にヘリウムガスを充填させる機構についてさらに詳述す る。処理空間が構造物である処理室を示している第 1図及び第 2図に おいて、 流入口 2より流入されたヘリウムガスは処理室内の上方へたま り、 空気を下方に押し下げる。 図中の H Eはヘリウム層、 Aは空気層を 示している。ヘリウムガスの流入が引き続き行われると、ヘリウム層 H Eは 厚みを増し、 空気層 Aを構成している空気は排出 口 1から処理室外へ 排出される。したがって、最終的には処理室内に存在していた空気層 はヘリウム層にすベて置換され処理室内にヘリウムガスが充填されるこ とになる。排気口 1力ゝら排出されるガス中にヘリウムガスが一定濃度で 含まれる場合は処理室内のガスがヘリウムガスで満たされていると考え ることもできる。排出ガスの具体的濃度は処理の嫌気度にしたがって自 由に設定すればよく特に限定されるものではない。 When the processing space in the helium atmosphere is constituted by the covering sheet, the sheet may be covered on the work object, and the helium gas may flow from the bottom. Helium is replaced with air in sheet 、, and eventually helium is filled in the sheet. This treatment space is effective outdoors, for example, when filling and painting concrete in the building construction process.By changing the size of the sheet, it can be used in a helium atmosphere regardless of the size of the target object. This is preferable in that a processing space can be created. Hereinafter, the mechanism for filling the processing chamber with helium gas will be described in more detail. In FIGS. 1 and 2 in which the processing space is a processing chamber having a structure, the helium gas flowing in from the inflow port 2 accumulates upward in the processing chamber and pushes air downward. HE in the figure indicates a helium layer, and A indicates an air layer. As the helium gas continues to flow, the thickness of the helium layer HE increases, and the air constituting the air layer A is exhausted from the outlet 1 to the outside of the processing chamber. Therefore, the air layer that has existed in the processing chamber is eventually replaced by the helium layer, and the processing chamber is filled with helium gas. If helium gas is contained at a certain concentration in the gas discharged from the exhaust port, it can be considered that the gas in the processing chamber is filled with helium gas. The specific concentration of the exhaust gas may be freely set according to the anaerobic degree of the treatment, and is not particularly limited.
第 2図においては階上をヘリウム層、 階下を空気層とする必要がある ため、しきり 3より下部に排出 口を設ける必要がある。また、空気層の確 保のため、最下部に設けることは好ましくない。またしきり 3には階上と階 下の間の換気を十分に行うことができるように、 隙間を設けておく必要 があり、かかる隙間の大きさはヘリウムガスの流入速度等によって決定 すればよい。 In Fig. 2, a helium layer must be used on the upper floor and an air layer must be used on the lower floor. In addition, it is not preferable to provide it at the bottom in order to secure an air space. In addition, there are 3 floors above and below It is necessary to provide a gap to allow sufficient ventilation between the lower part, and the size of the gap may be determined by the inflow speed of the helium gas.
なお、アルゴンガスを利用する場合は、例えば、 第 1図において、処理 室の上部に設けられているヘリウムガス流入のための流入口 2をへリウ ムガス排気のための流出 口とし、 処理室の下部に設けられている空気 の排気口 1をアルゴンガスの流入口とすることが好ましい。このようにする ことで、 処理室空間内にヘリウムガスを導入して、ヘリウムガスより重た い空気を処理室空間内から排気した後、アルゴンガスより軽いヘリウム ガスを、処理室下部からのアルゴンガスの流入により、処理室の上部に 設けられたヘリウムガスの流入口 2から排気することができる。 なお、ヘリ ゥムガスの排気を完全に行わない様にすることもでき、この場合は処理 室の上部にヘリウムガス、 下部にアルゴンガスの雰囲気を持つ処理室と することができる。 When argon gas is used, for example, in FIG. 1, the inlet 2 for helium gas inflow provided in the upper part of the processing chamber is used as an outlet for helium gas exhaust, and It is preferable that the air exhaust port 1 provided at the lower part be used as an argon gas inlet. In this way, helium gas is introduced into the processing chamber space, air that is heavier than helium gas is exhausted from the processing chamber space, and helium gas lighter than argon gas is discharged from the lower part of the processing chamber. By the inflow of the gas, the gas can be exhausted from the helium gas inlet 2 provided in the upper part of the processing chamber. Note that it is also possible not to completely exhaust the Helium gas. In this case, the processing chamber can have an atmosphere of helium gas at the top of the processing chamber and an atmosphere of argon gas at the bottom.
なお、 本発明の処理室内での処理は、 ロボットなどを処理室内に導 入して処理することができるが、作業者自身が処理できる様に構成する こともできる。 例えば、 第 3図に示す様に、 不活性ガスが充填された密 閉空間 4を構成する外壁 5と、 当該外壁 5に連続して設けられ、 上記 密閉空間 4内部において外部空間 6とつながり、 作業者が入り込む作 業用隔壁 7を備えた処理室を採用することができる。 外壁 5は非弾性 の構造物であっても差し支えないが、作業用隔壁 7と共にゴム、エラスト マーなどの弾性材料乃至弾性体によって構成することもできる。なお、 第 3図において、 作業用隔壁 7は人間の形状をしており、作業し易くし ている。 8は作業者を示している。 また、外壁 5内部の密閉空間 4の圧 力は外壁 5外部の外部空間 6の圧力とはほぼ均等か又は外部空間の 圧力の方が大きくしておくことが好ましい。これによつて、 作業用隔壁 7 内部において作業者の作業ができる空間を確保することができる。また、 第 3図は簡易型処理室の概略図であるため、 実際のこの種の処理室 にはヘリウムガスの流入口と空気の排気口を備え、 空間内部への処理 対象物の装填口が備えられている。 The processing in the processing chamber of the present invention can be performed by introducing a robot or the like into the processing chamber, but the processing can also be configured to be performed by the operator himself. For example, as shown in FIG. 3, an outer wall 5 constituting a closed space 4 filled with an inert gas, and a continuous space provided on the outer wall 5, connected to an outer space 6 inside the closed space 4, It is possible to employ a processing room provided with a work partition 7 into which workers enter. The outer wall 5 may be an inelastic structure, but may be made of an elastic material or an elastic body such as rubber or elastomer together with the working partition 7. In FIG. 3, the working partition 7 has a human shape, which facilitates the work. 8 indicates an operator. Further, it is preferable that the pressure in the closed space 4 inside the outer wall 5 is almost equal to the pressure in the outer space 6 outside the outer wall 5 or that the pressure in the outer space is larger. As a result, the working bulkhead 7 A space in which a worker can work can be secured inside. Fig. 3 is a schematic diagram of a simplified processing chamber, so this type of processing chamber has an inlet for helium gas and an outlet for air, and a loading port for the processing object into the space. Provided.
なお、また本発明は、ヘリウムガス、アルゴンガス等の不活性ガスの充 填方法について開示しているが、 上記充填方法を利用して純度の高 い酸素が充填された空間をつくることもできる。例えば、処理室空間内 にヘリウムガスを導入して、ヘリウムガスより重たい空気を処理室空間内 から排気した後、 当該処理室空間内に酸素ガスを導入して、 処理室 空間内のヘリウムガスを酸素ガスと置換して酸素ガスを処理室空間に 充填する酸素ガスの充填方法を採用することもできる。 産業上の利用性 Although the present invention discloses a method of filling an inert gas such as helium gas or argon gas, a space filled with high-purity oxygen can be created by using the above-described filling method. . For example, helium gas is introduced into the processing chamber space, air that is heavier than helium gas is exhausted from the processing chamber space, and then oxygen gas is introduced into the processing chamber space, and helium gas in the processing chamber space is removed. An oxygen gas filling method in which the processing chamber space is filled with oxygen gas instead of oxygen gas can also be employed. Industrial applicability
以上の様に、 本発明の処理室は、溶接処理、 はんだ付け、鐯造、铸 造物の圧延、コンクリートのエア抜き、塗装 ·乾燥、 食品などの貯蔵、包 装、 刃物の研磨、爆発物の充填、蒸着、プラスチックを製造、 成形作 業、金属の精製、成形作業、及びガラスの製造、溶融成形、クリーンル ーム、セメントの混練、 半導体などの製造及び組立、 消火作業などの 処理室として有用である。 As described above, the processing chamber of the present invention is used for welding processing, soldering, fabrication, rolling of structures, bleeding of concrete, painting and drying, storage of foods and the like, packaging, cutting of blades, polishing of explosives, etc. Processing room for filling, vapor deposition, manufacturing plastics, forming work, metal refining, forming work, glass manufacturing, melt forming, clean room, kneading cement, manufacturing and assembling semiconductors, fire fighting work, etc. Useful.
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU65238/98A AU6523898A (en) | 1998-04-06 | 1998-04-06 | Treatment chamber |
| PCT/JP1998/001617 WO1999051333A1 (en) | 1998-04-06 | 1998-04-06 | Treatment chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP1998/001617 WO1999051333A1 (en) | 1998-04-06 | 1998-04-06 | Treatment chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1999051333A1 true WO1999051333A1 (en) | 1999-10-14 |
Family
ID=14208010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1998/001617 Ceased WO1999051333A1 (en) | 1998-04-06 | 1998-04-06 | Treatment chamber |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU6523898A (en) |
| WO (1) | WO1999051333A1 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH026069A (en) * | 1987-12-24 | 1990-01-10 | Westinghouse Electric Corp <We> | Welding room that receives shielding gas and how to use it |
| JPH0576615A (en) * | 1991-09-24 | 1993-03-30 | Araki Giken Kogyo Kk | Work method and gas chamber and human body respiration protector related thereto |
-
1998
- 1998-04-06 WO PCT/JP1998/001617 patent/WO1999051333A1/en not_active Ceased
- 1998-04-06 AU AU65238/98A patent/AU6523898A/en not_active Abandoned
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH026069A (en) * | 1987-12-24 | 1990-01-10 | Westinghouse Electric Corp <We> | Welding room that receives shielding gas and how to use it |
| JPH0576615A (en) * | 1991-09-24 | 1993-03-30 | Araki Giken Kogyo Kk | Work method and gas chamber and human body respiration protector related thereto |
Also Published As
| Publication number | Publication date |
|---|---|
| AU6523898A (en) | 1999-10-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109803777B (en) | Multi-packaging movable additive manufacturing equipment | |
| EP1829834B1 (en) | Chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for simultaneous and continuous production | |
| EP3744444B1 (en) | Treatment and de-powdering processes and systems for additively formed components | |
| JP2022173300A (en) | Powder feeding device, thermal spraying apparatus, powder feeding method, and thermal spraying method | |
| JP2009525183A (en) | Laser processing apparatus and method comprising a vacuum evacuation system and at least a first containment zone to contain a deposit of released hazardous material | |
| WO1999051333A1 (en) | Treatment chamber | |
| TWI447258B (en) | Raw material gas generating device | |
| EP0314299A2 (en) | Method of and apparatus for treating waste gas from semiconductor manufacturing process | |
| JP3955592B2 (en) | Processing apparatus and processing method | |
| TW201709266A (en) | Substrate processing apparatus and method of cleaning chamber | |
| JPH10156577A (en) | Treatment room | |
| JPWO1999051333A1 (en) | Processing chamber | |
| KR102131664B1 (en) | Vacuum processing apparatus and operating method of vacuum processing apparatus | |
| CN210057641U (en) | Filter equipment of metal 3D printer | |
| WO2017060616A1 (en) | Method and device for pumping a product by suction | |
| TW201202645A (en) | Operation method of powder sintering factory | |
| TWI887699B (en) | Additive manufacturing apparatus | |
| JP5897832B2 (en) | Atmospheric pressure plasma processing system | |
| KR200270975Y1 (en) | Laser Welding Gas Purification Apparatus of Metal Parts | |
| KR100988169B1 (en) | Plasma processing equipment | |
| JPS55154537A (en) | Method and apparatus for carrying molten metal | |
| JPH0225558A (en) | Thermal spraying method | |
| JPS6230803B2 (en) | ||
| JP7158379B2 (en) | Plasma processing equipment | |
| JP2003053316A (en) | Hazardous material disposal system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GE GH GM GW HU ID IL IS JP KE KG KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG US UZ VN YU ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| 122 | Ep: pct application non-entry in european phase | ||
| REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
| NENP | Non-entry into the national phase |
Ref country code: CA |
|
| NENP | Non-entry into the national phase |
Ref country code: JP Ref document number: 2000542094 Format of ref document f/p: F |