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WO1997003175B1 - Composition de nettoyage des residus subsistant apres une attaque chimique contenant des reactifs redox - Google Patents

Composition de nettoyage des residus subsistant apres une attaque chimique contenant des reactifs redox

Info

Publication number
WO1997003175B1
WO1997003175B1 PCT/US1996/010807 US9610807W WO9703175B1 WO 1997003175 B1 WO1997003175 B1 WO 1997003175B1 US 9610807 W US9610807 W US 9610807W WO 9703175 B1 WO9703175 B1 WO 9703175B1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaner composition
group
weight
redox reagent
redox
Prior art date
Application number
PCT/US1996/010807
Other languages
English (en)
Other versions
WO1997003175A1 (fr
Filing date
Publication date
Priority claimed from US08/499,355 external-priority patent/US5612304A/en
Application filed filed Critical
Priority to AU63392/96A priority Critical patent/AU6339296A/en
Publication of WO1997003175A1 publication Critical patent/WO1997003175A1/fr
Publication of WO1997003175B1 publication Critical patent/WO1997003175B1/fr

Links

Abstract

L'invention porte sur une composition de nettoyage non corrosive des résidus subsistant après une attaque chimique comportant: (a) de 1 à 70 % en poids d'un solvant organique polaire présentant un moment dipolaire de plus de 3,5; (b) de 1 à 70 % en poids de composés amine sélectionnés présentant au moins un groupe hydroxyle et dont la température d'ébullition est de plus de 150 °C à la pression atmosphérique; (c) de 0,1 à 10 % en poids d'un acide aminé sélectionné présentant au moins un groupe hydroxyle; (d) de 1 à 20 % en poids d'un réactif redox sélectionné présentant un potentiel redox compris entre +1,0V et -2,0V par rapport à une électrode normale à hydrogène (pour un pH de 7); et: (e) de 0 à 90 % en poids d'eau.
PCT/US1996/010807 1995-07-07 1996-06-24 Composition de nettoyage des residus subsistant apres une attaque chimique contenant des reactifs redox WO1997003175A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU63392/96A AU6339296A (en) 1995-07-07 1996-06-24 Redox reagent-containing post-etch residue cleaning composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US499,355 1995-07-07
US08/499,355 US5612304A (en) 1995-07-07 1995-07-07 Redox reagent-containing post-etch residue cleaning composition

Publications (2)

Publication Number Publication Date
WO1997003175A1 WO1997003175A1 (fr) 1997-01-30
WO1997003175B1 true WO1997003175B1 (fr) 1997-02-13

Family

ID=23984951

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/010807 WO1997003175A1 (fr) 1995-07-07 1996-06-24 Composition de nettoyage des residus subsistant apres une attaque chimique contenant des reactifs redox

Country Status (3)

Country Link
US (1) US5612304A (fr)
AU (1) AU6339296A (fr)
WO (1) WO1997003175A1 (fr)

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