WO1997044503A1 - Procede et appareil de traitement des surfaces interieures de recipients - Google Patents
Procede et appareil de traitement des surfaces interieures de recipients Download PDFInfo
- Publication number
- WO1997044503A1 WO1997044503A1 PCT/IB1997/000555 IB9700555W WO9744503A1 WO 1997044503 A1 WO1997044503 A1 WO 1997044503A1 IB 9700555 W IB9700555 W IB 9700555W WO 9744503 A1 WO9744503 A1 WO 9744503A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- container
- inner member
- plasma
- gas
- vapour
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45568—Porous nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Definitions
- the invention is in the field of the packaging industry and relates to a method according to the generic part of the first independent claim and to an apparatus for carrying out the method.
- Method and apparatus serve for treating inside surfaces of containers with a plasma enhanced treatment, in particular for treating containers with narrow openings such as bottles, which containers are made of any material, in particular of a thermosensitive material such as plastic or cardboard.
- the plasma enhanced process is a plasma enhanced chemical vapour deposition or plasma enhanced polymerization but also sputtering and other known processes are applied.
- the plasma is ignited in the area of the surface to be treated by establishing in this area an appropriately reduced pressure and an electric field alternating with a high frequency (e.g. 40 MHz) or a field of electromagnetic waves (e.g. microwaves).
- a high frequency e.g. 40 MHz
- a field of electromagnetic waves e.g. microwaves.
- DE-3632748 deals with a process for coating plastic containers. These are placed in a vacuum chamber and the open end of a gas/vapour supply tube is placed inside the container and connected to a gas/vapour source whereby the supply tube is insulated against the chamber wall.
- the chamber is evacuated and its wall is coupled to a microwave generator.
- the ignited plasma fills the volume of the whole of the chamber which does not only mean that besides the inside surface of the container also the gas/vapour supply tube, the container outside surface and the chamber wall are treated but it also means high energy consumption; both of which are not desired.
- This disadvantage is partly prevented if the container to be treated has a sufficient mechanical strength for being evacuated. It becomes then possible not to evacuate the chamber but the container only and therefore the plasma is confined to the inside of the container whereby less energy is consumed and treatment is limited to the container inside and to the gas/vapour supply tube. Furthermore, the chamber does not need to be vacuum tight.
- the publication DE-3908418 describes a similar process in which the gas/vapour supply tube is made of a metallic material and serves not only for supplying the necessary gas/vapour mixture to the inside of the container to be treated but also serves as one of two electrodes being coupled to a high frequency generator or as microwave emitter.
- a plasma will be ignited on the inside and on the outside of the container to be treated and in the case of a deposition process deposition will take place not only on the inside of the container but also on its outside surface and on the chamber wall, unless the container is strong enough for being evacuated and/or is metallic and serves itself as electrode or is not transparent for microwaves respectively.
- Publication WO-95/21948 describes a similar process for coating the inside surface of containers such as bottles.
- a vaporizer is placed on the inside of the container and may also serve as gas/vapour inlet tube and as electrode. For obtaining good treatment results, the vaporizer is moved along the container axis and the container is rotated during treatment.
- the publication WO-93/24243 describes a process for plasma enhanced treatment of the inside surface of containers in which a plasma is ignited in a separate chamber, an oxidizing gas mixture is flown through the plasma chamber whereby active species are produced and flushed into the inside of the container where they mix with other reactants forming under the influence of an alternating electric field a coating on the inside container surface.
- the plasma volume is not directly correlated to the volume of the container or the chamber respectively and can therefore be reduced to a necessary minimum.
- an electric field must be sustained in the area of the bottle also.
- the object of the invention to create a method and an apparatus for treating the inside surfaces of containers, in particular containers with a narrow opening and containers made of a heat sensitive material.
- Method and apparatus are to make it possible to keep the energy consumption during the plasma enhanced treatment low and therefore the heat load on the container to a minimum.
- the inventive method is to solve the problem of the even distribution of the reactant gas/vapour mixture in a more simple way than known such methods.
- the inventive apparatus is to be simple and adaptable for batchwise operation i.e. for simultaneous treatment of a plurality of containers within the same apparatus.
- the inventive apparatus is to be easily adaptable for different shapes and sizes of containers to be treated.
- the plasma is sustained inside the container to be treated either by establishing a high frequency electric field between an electrode placed inside the container and another one outside the container or by placing a microwave emitter inside the container.
- the plasma does not fill the entire inside volume of the container but is confined between the inner container surface and an inner member placed into the container whereby the inner member is shaped such that it fills the inside of the container but for a thin layer along the container wall with a width over the whole area of the inner container surface of 5 to 15 mm, preferably approximately 10mm which width is as constant as possible.
- the container is placed in a chamber.
- the pressures established in the system are the following: pressure inside the inner member: too high for plasma ignition; pressure between inner member and container wall: appropriately reduced for plasma ignition; pressure outside the container: according to mechanical strength of the container, preferably either too high or too low for plasma ignition.
- the inner member such serves for confimng the plasma within a narrow layer along the inner container surface. Furthermore it serves as supply device for supplying the gas/vapour mixture necessary for the plasma enhanced treatment. It is therefore hollow and perforated or porous, i.e. causing a predetermined pressure drop in a gas stream pressed through its wall perforation or through its pores. For being applicable for treating containers with a narrow opening or mouth, it is furthermore preferably inflatable from a narrow shape introducible through the container opening to an operative inflated shape adapted to the shape of the inside of the container, whereby the supply pressure of the gas/vapour mixture keeps the inner member in its operative inflated shape. It may also have its operative shape without an inner over pressure and be brought into a narrow shape by an reducing its inner pressure.
- the perforation or porosity of the inner member is designed such that sufficient gas/vapour flows from the inside of the inner member to its outside at a pressure difference which is high enough for preventing plasma ignition on the inside of the inner member and allowing plasma ignition on the outside.
- the inner member is made of a material totally transparent for microwaves or other electromagnetic waves employed or for an electric field.
- An electrode or wave emitter e.g. microwave emitter
- microwave emitter is placed on the inside of the inner member.
- the perforation or porosity of the wall of the inner member forms a regular pattern over the surface of the inner member. If the plasma area, e.g. due to a complicated shape of the container to be treated, contains regions of different widths, the perforation pattern is designed such that in regions of wider plasma (larger distance between inner member and container wall) accordingly more gas/vapour passes through the wall of the inner member due to more and/or larger perforations or pores in this area. It is shown that using the inventive method for e.g. depositing an inorganic barrier layer of e.g.
- FIG 1 shows the principle of the inventive method and of the inventive apparatus
- Figures 2 and 3 show two exemplified inner members for specific applications in more detail.
- Figure 1 shows the principle of the inventive method with the help of a diagrammatic section through an exemplified embodiment of the inventive apparatus.
- the container 1 to be treated is positioned inside a chamber 2 which chamber is openable (not shown) for introduction of the container 1 and is connected to a vacuum pump (not shown) for controlled evacuation.
- the mouth of the container 1 is closed towards the chamber and is also connected to a vacuum pump (not shown) for controlled evacuation of the container 1.
- a vacuum pump not shown
- Inside the container an inner member 3 is shown in its inflated operational state (3) and in its deflated narrow state (3'), which deflated state enables it to be introduced through the mouth of the container.
- the mouth of the inner member 3 is connected through the mouth of the container to an arrangement 6 for quantitative preparation of the gas/vapour flow from gas and/or vapour supply vessels 6' or similar sources.
- Chamber 2 consists e.g of two parts, a support part in which the vacuum connection to the container 1, the inner member 3 and its supply connection and the electrode or emitter 4 respectively are installed permanently and a cover part tightly positionable on the support part.
- the chamber 2 may be equipped for simultaneous treatment of a plurality of containers, i.e. comprise a plurality of adequately spaced inner members with electrodes or emitters.
- the inventive method is carried out as follows: Gas/vapour supply to the inner member 3 is stopped and therefore the inner member is deflated either by loss of overpressure or actively by evaporation.
- the chamber 2 is opened and a container is positioned over the inner member 3 and its mouth is locked onto the corresponding vacuum connection.
- the chamber 2 is closed and chamber 2 and container 1 are simultaneously evacuated. Then gas/vapour supply and power are switched on and thereby the inner member
- the container 3 is inflated and the plasma ignited by means of the alternating field or the field of electromagnetic waves. Under these conditions and with a controlled flow of gas/vapour mixture from the inner member 3 through the plasma area into the exhaust (vacuum connection) of the container the container is treated for a predetermined time. Then the power is switched off and the system flushed, the chamber 2 is opened and the container 1 is removed.
- Working pressures are e.g.: p ⁇ in the plasma area between inner member and container wall: between 10 "3 and 10 2 mbar; p, inside the hollow inner member: between 10 and 100 mbar; p 3 in the chamber: lower than 10 "3 or higher than 100 mbar.
- p 3 can be equal to ambient pressure and the chamber can be open to atmosphere or can even be omitted provided that, when using microwave the container is impermeable for microwaves.
- the inventive method and the inventive apparatus are applicable for various plasma enhanced treatments for coating, cleaning, activating and/or sterilizing the inner surface of the container.
- a treatment is coating containers of plastic material such as e.g. poly- ethylentetraphthalate, PEN, polyethylene, polyamide or polypropylene with a silicon oxide.
- This coating is carried out as a plasma enhanced chemical vapour deposition using a gas/vapour mixture consisting of an organosilicon compound (e.g.
- hexamethyldisiloxane 1,1,3,3-tetramethylsiloxane, methyldi- methoxisilane, vinyltrimethylsilane or vinyltrimethoxisilane), oxygen and an inert gas such as helium or argon.
- inorganic or organic compounds are deposited on containers not only of plastic materials but also of e.g. cardboard, paper, metal, ceramic or glass. All these processes are applicable for treating inside surfaces of containers according to the inventive method. If the plasma enhanced process is a coating process coating of the inner member cannot be prevented. If though the inner member is inflated and deflated between successive coating cycles, the coating of the inner member is removed by this deformation as soon as it has achieved a critical thickness. Therefore such an inner member is automatically self-cleaning.
- Figure 2 shows in section and in more detail than Figure 1 an exemplified inner member 3 for treating a container 2 with a specific inside shape.
- the inner member 3 is shown in its inflated operational state and in its deflated state (3', in dash-dotted lines) in which the member is introduced through the mouth 11 of container 1.
- the inner member 3 is made of an elasticly extensible material, e.g. a polymer material. Its change of shape with increasing pressure difference is determined e.g. by its local thickness, which is higher in areas where it is to stretch little and is lower in areas where it is to stretch more. It is porous or perforated with a fine pattern of perforations, whereby it is advantageous to provide more and/or larger perforations in areas in which the gap between container wall and inner member is larger (areas A).
- the material of the inner member 3 is chosen in such a way that the member is self supporting at least in its deflated state.
- Figure 3 shows also in section a further exemplified inner member 3 positioned in a container 1 to be coated on its inside surface.
- the inner member 3 consists of a porous material, e.g. of a polymer foam.
- the shape of the inner member is adapted to the inner shape of the container.
- vacuum is applied to the inner member through the supply tube 30 connected to the inner member. By the effect of the vacuum the pore size in the member is reduced and therefore the overall size of it also.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Chemical Vapour Deposition (AREA)
- Containers Having Bodies Formed In One Piece (AREA)
Abstract
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09541920A JP2000510910A (ja) | 1996-05-22 | 1997-05-15 | 容器の内面を処理する方法及び装置 |
| AU26482/97A AU2648297A (en) | 1996-05-22 | 1997-05-15 | Method and apparatus for treating inside surfaces of containers |
| EP97918304A EP0907761A1 (fr) | 1996-05-22 | 1997-05-15 | Procede et appareil de traitement des surfaces interieures de recipients |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1283/96 | 1996-05-22 | ||
| CH128396 | 1996-05-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1997044503A1 true WO1997044503A1 (fr) | 1997-11-27 |
Family
ID=4206808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/IB1997/000555 Ceased WO1997044503A1 (fr) | 1996-05-22 | 1997-05-15 | Procede et appareil de traitement des surfaces interieures de recipients |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0907761A1 (fr) |
| JP (1) | JP2000510910A (fr) |
| AU (1) | AU2648297A (fr) |
| WO (1) | WO1997044503A1 (fr) |
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001048788A1 (fr) * | 1999-12-24 | 2001-07-05 | Tetra Laval Holdings & Finance S.A. | Dispositif permettant d'injecter de l'energie microonde dans un compartiment de traitement |
| WO2001054164A1 (fr) * | 2000-01-19 | 2001-07-26 | Tetra Laval Holding & Finance S.A. | Dispositif d'injection d'energie micro-ondes avec adaptation d'impedance |
| DE10004274A1 (de) * | 2000-02-01 | 2001-08-02 | Tetra Laval Holdings & Finance | Vorrichtung zum Beschichten der inneren Oberfläche eines Hohlkörpers |
| FR2807912A1 (fr) * | 2000-04-17 | 2001-10-19 | Lasers Et Tech Avancees Bureau | Procede et torche a plasma pour traiter une surface dans une cavite, et installation de remplissage bouchage s'y rapportant |
| US6328805B1 (en) | 1999-10-25 | 2001-12-11 | Sidel | Equipment for processing a container using a low-pressure plasma having an improved vacuum circuit |
| WO2002036850A3 (fr) * | 2000-11-03 | 2002-07-18 | Ver Foerderung Inst Kunststoff | Procede et dispositif de revetement de corps creux |
| JP2002540364A (ja) * | 1999-03-30 | 2002-11-26 | シデル | 改良された圧力分配回路を含む中空体の処理のための旋回台を備える機械 |
| JP2003523483A (ja) * | 2000-02-18 | 2003-08-05 | ユーロピアン コミュニティ(イーシー) | 誘導結合プラズマ処理方法及び装置 |
| EP1619266A4 (fr) * | 2003-03-12 | 2008-07-23 | Toyo Seikan Kaisha Ltd | Procede et appareil permettant de traiter un recipient en plastique par plasma chimique |
| DE102007045216A1 (de) * | 2007-09-21 | 2009-04-02 | Khs Corpoplast Gmbh & Co. Kg | Vorrichtung zur Plasmabehandlung von Werkstücken |
| WO2009127294A1 (fr) * | 2008-04-14 | 2009-10-22 | Iplas Innovative Plasma Systems Gmbh | Dispositif et procédé de traitement de la surface intérieure de corps creux |
| WO2010009795A1 (fr) * | 2008-07-21 | 2010-01-28 | Khs Ag | Procédé et dispositif de stérilisation et/ou de désinfection |
| DE102004020185B4 (de) * | 2004-04-22 | 2013-01-17 | Schott Ag | Verfahren und Vorrichtung für die Innenbeschichtung von Hohlkörpern sowie Verwendung der Vorrichtung |
| DE102012201955A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung |
| DE102012206081A1 (de) * | 2012-04-13 | 2013-10-17 | Krones Ag | Beschichtung von Behältern mit Plasmadüsen |
| EP2503023A3 (fr) * | 2003-03-12 | 2013-11-06 | Toyo Seikan Kaisha, Ltd. | Élément d'alimentation en gaz pour dispositif de traitement au plasma micro-ondes |
| EP2704960A1 (fr) * | 2011-05-05 | 2014-03-12 | Beiersdorf AG | Contenants pour produits cosmétiques et dermatologiques |
| CN103866290A (zh) * | 2012-12-18 | 2014-06-18 | 上海品吉技术有限公司 | Pecvd 装置、使用其制备不规则表面膜的方法及其应用 |
| DE102013226814A1 (de) * | 2013-12-20 | 2015-06-25 | Christof-Herbert Diener | Plasmaanlage mit einem separat transportierbaren Gefäß |
| EP3500373A1 (fr) * | 2016-08-22 | 2019-06-26 | Innano AS | Procédé et système de traitement d'une surface |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2872718B1 (fr) * | 2004-07-08 | 2006-10-20 | Sidel Sa Sa | Procede de traitement d'un recipient comportant des phases de pompage a vide et machine pour sa mise en oeuvre |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4008405C1 (fr) * | 1990-03-16 | 1991-07-11 | Schott Glaswerke, 6500 Mainz, De | |
| WO1994000247A1 (fr) * | 1992-06-26 | 1994-01-06 | Polar Materials, Inc. | Procedes et appareils permettant de traiter l'exterieur d'un recipient par son remplissage avec un gaz de polarisation |
| DE4318084A1 (de) * | 1993-06-01 | 1994-12-08 | Kautex Werke Gmbh | Verfahren und Einrichtung zum Herstellen einer polymeren Deckschicht in Kunststoff-Hohlkörpern |
-
1997
- 1997-05-15 WO PCT/IB1997/000555 patent/WO1997044503A1/fr not_active Ceased
- 1997-05-15 AU AU26482/97A patent/AU2648297A/en not_active Abandoned
- 1997-05-15 JP JP09541920A patent/JP2000510910A/ja active Pending
- 1997-05-15 EP EP97918304A patent/EP0907761A1/fr not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4008405C1 (fr) * | 1990-03-16 | 1991-07-11 | Schott Glaswerke, 6500 Mainz, De | |
| WO1994000247A1 (fr) * | 1992-06-26 | 1994-01-06 | Polar Materials, Inc. | Procedes et appareils permettant de traiter l'exterieur d'un recipient par son remplissage avec un gaz de polarisation |
| DE4318084A1 (de) * | 1993-06-01 | 1994-12-08 | Kautex Werke Gmbh | Verfahren und Einrichtung zum Herstellen einer polymeren Deckschicht in Kunststoff-Hohlkörpern |
Cited By (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002540364A (ja) * | 1999-03-30 | 2002-11-26 | シデル | 改良された圧力分配回路を含む中空体の処理のための旋回台を備える機械 |
| US6328805B1 (en) | 1999-10-25 | 2001-12-11 | Sidel | Equipment for processing a container using a low-pressure plasma having an improved vacuum circuit |
| WO2001048788A1 (fr) * | 1999-12-24 | 2001-07-05 | Tetra Laval Holdings & Finance S.A. | Dispositif permettant d'injecter de l'energie microonde dans un compartiment de traitement |
| WO2001054164A1 (fr) * | 2000-01-19 | 2001-07-26 | Tetra Laval Holding & Finance S.A. | Dispositif d'injection d'energie micro-ondes avec adaptation d'impedance |
| DE10001936A1 (de) * | 2000-01-19 | 2001-07-26 | Tetra Laval Holdings & Finance | Einkoppelanordnung für Mikrowellenenergie mit Impedanzanpassung |
| DE10004274A1 (de) * | 2000-02-01 | 2001-08-02 | Tetra Laval Holdings & Finance | Vorrichtung zum Beschichten der inneren Oberfläche eines Hohlkörpers |
| WO2001056706A1 (fr) * | 2000-02-01 | 2001-08-09 | Tetra Laval Holdings & Finance S.A. | Dispositif de revetement de la surface interieure d'un corps creux |
| JP2003523483A (ja) * | 2000-02-18 | 2003-08-05 | ユーロピアン コミュニティ(イーシー) | 誘導結合プラズマ処理方法及び装置 |
| FR2807912A1 (fr) * | 2000-04-17 | 2001-10-19 | Lasers Et Tech Avancees Bureau | Procede et torche a plasma pour traiter une surface dans une cavite, et installation de remplissage bouchage s'y rapportant |
| WO2001080607A1 (fr) * | 2000-04-17 | 2001-10-25 | Steriplasma | Procede et torche a plasma pour traiter une surface dans une cavite, et installation de remplissage-bouchage s'y rapportant |
| WO2002036850A3 (fr) * | 2000-11-03 | 2002-07-18 | Ver Foerderung Inst Kunststoff | Procede et dispositif de revetement de corps creux |
| EP2503023A3 (fr) * | 2003-03-12 | 2013-11-06 | Toyo Seikan Kaisha, Ltd. | Élément d'alimentation en gaz pour dispositif de traitement au plasma micro-ondes |
| EP1619266A4 (fr) * | 2003-03-12 | 2008-07-23 | Toyo Seikan Kaisha Ltd | Procede et appareil permettant de traiter un recipient en plastique par plasma chimique |
| US8680424B2 (en) | 2003-03-12 | 2014-03-25 | Toyo Seikan Kaisha, Ltd. | Microwave plasma processing device |
| DE102004020185B4 (de) * | 2004-04-22 | 2013-01-17 | Schott Ag | Verfahren und Vorrichtung für die Innenbeschichtung von Hohlkörpern sowie Verwendung der Vorrichtung |
| DE102007045216A1 (de) * | 2007-09-21 | 2009-04-02 | Khs Corpoplast Gmbh & Co. Kg | Vorrichtung zur Plasmabehandlung von Werkstücken |
| WO2009127294A1 (fr) * | 2008-04-14 | 2009-10-22 | Iplas Innovative Plasma Systems Gmbh | Dispositif et procédé de traitement de la surface intérieure de corps creux |
| WO2010009795A1 (fr) * | 2008-07-21 | 2010-01-28 | Khs Ag | Procédé et dispositif de stérilisation et/ou de désinfection |
| EP2704960A1 (fr) * | 2011-05-05 | 2014-03-12 | Beiersdorf AG | Contenants pour produits cosmétiques et dermatologiques |
| DE102012201955A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung |
| DE102012206081A1 (de) * | 2012-04-13 | 2013-10-17 | Krones Ag | Beschichtung von Behältern mit Plasmadüsen |
| CN103866290A (zh) * | 2012-12-18 | 2014-06-18 | 上海品吉技术有限公司 | Pecvd 装置、使用其制备不规则表面膜的方法及其应用 |
| DE102013226814A1 (de) * | 2013-12-20 | 2015-06-25 | Christof-Herbert Diener | Plasmaanlage mit einem separat transportierbaren Gefäß |
| WO2015091104A1 (fr) | 2013-12-20 | 2015-06-25 | Christof-Herbert Diener | Installation à plasma comportant un récipient transportable séparément |
| EP3500373A1 (fr) * | 2016-08-22 | 2019-06-26 | Innano AS | Procédé et système de traitement d'une surface |
| IL264974B1 (en) * | 2016-08-22 | 2025-07-01 | Innano As | Method and system for treating a surface |
| IL264974B2 (en) * | 2016-08-22 | 2025-11-01 | Innano As | Surface treatment method and system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000510910A (ja) | 2000-08-22 |
| AU2648297A (en) | 1997-12-09 |
| EP0907761A1 (fr) | 1999-04-14 |
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