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WO1996036441A1 - COATING OF TiO2 PIGMENT BY GAS-PHASE AND SURFACE REACTIONS - Google Patents

COATING OF TiO2 PIGMENT BY GAS-PHASE AND SURFACE REACTIONS Download PDF

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Publication number
WO1996036441A1
WO1996036441A1 PCT/US1996/007886 US9607886W WO9636441A1 WO 1996036441 A1 WO1996036441 A1 WO 1996036441A1 US 9607886 W US9607886 W US 9607886W WO 9636441 A1 WO9636441 A1 WO 9636441A1
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Prior art keywords
metal
reactor
coating
precursor
group
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PCT/US1996/007886
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French (fr)
Inventor
Toivo Kodas
Quint Powell
Bruce Anderson
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Kemira Pigments Inc
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Kemira Pigments Inc
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Priority to AU62501/96A priority Critical patent/AU6250196A/en
Publication of WO1996036441A1 publication Critical patent/WO1996036441A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • C23C16/402Silicon dioxide
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36Compounds of titanium
    • C09C1/3607Titanium dioxide
    • C09C1/3653Treatment with inorganic compounds
    • C09C1/3661Coating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36Compounds of titanium
    • C09C1/3607Titanium dioxide
    • C09C1/3669Treatment with low-molecular organic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/403Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/405Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/50Solid solutions
    • C01P2002/52Solid solutions containing elements as dopants
    • C01P2002/54Solid solutions containing elements as dopants one element only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/04Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/80Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values

Definitions

  • This invention pertains to a process of coating titanium dioxide particles with metal oxides by gas-phase reaction.
  • the gas-phase reaction of TiCl 4 and 0 2 is used to make particulate Ti0 2 often of a size useful as a white pigment.
  • the pigment particles are usually not used in typical applications such as paint without first coating them with materials including, but not limited to, Si0 2 , A1 2 0 3 and mixtures thereof. To coat the particles, they are typically collected from the gas and dispersed in a liquid where the coating is applied by precipitation. This liquid-phase coating process often results in coatings with high surfaces areas, high oil absorption, and non-uniform thickness.
  • U.S. Patent 4,803,056 describes a method for increasing the capacity of a titanium dioxide producing process. Titanium tetrachloride is added at a second point in the system downstream of the main inlet for titanium tetrachloride to increase the yield of Ti0 2 . The process is exclusively used for the production of uncoated titanium dioxide. The addition of other reagents at the second point of introduction in order to produce a coating on the Ti0 2 particles is not suggested or disclosed.
  • Huncr and Katz disclose a process for forming coated particles in a flame.
  • non-pigmentary Ti0 2 can be coated with Si0 2 in a flame reactor whereby TiCl 4 and SiCl 4 are added simultaneously into the same flame.
  • the reaction conditions must be carefully adjusted such that Ti0 2 condenses before Si0 2 in order to achieve a coating of Si0 2 on the already formed Ti0 2 particles. It is difficult to reliably produce Si0 2 -coated Ti0 2 particles of a uniform quality in terms of size and coating hardness with this process.
  • the process for making pigment-grade Ti0 2 coated with a metal oxide according to the present invention is primarily characterized by the following steps: introducing a thermally decomposable volatile titanium-containing precursor into a reactor; thermally decomposing the titanium- containing precursor within the reactor to form Ti0 2 pigment particles; subsequently injecting at least one thermally decomposable volatile metal-containing coating precursor into the reactor; and reacting the at least one metal- containing coating precursor within the reactor to form a coating of at least one metal oxide on the Ti0 2 pigment particles.
  • the coating is selected from the group consisting of Si0 2 , Al 2 0 3 , Zr0 2 , and mixed metal oxide.
  • the titanium-containing precursor is selected from the group consisting of TiCl 4 , TiBr 4 , and Ti(OR) 4 , wherein R is an alkyl group.
  • the method advantageously further comprises the step of adding a thermally decomposable volatile aluminum-containing precursor to the titanium-containing precursor to form Al-doped Ti0 2 .
  • a thermally decomposable volatile aluminum-containing precursor to the titanium-containing precursor to form Al-doped Ti0 2 .
  • water may also be added to control the particle size of the formed Ti0 2 pigment particles.
  • the metal-containing coating precursor is selected from the group consisting of SiX 4 , A1X 3 , and ZrX 4 , wherein X is Cl, Br or OR, R being an alkyl group.
  • X is Cl, Br or OR, R being an alkyl group.
  • other metal-containing coating precursors can be used equally successfully.
  • metal alkyls metal alkenyls, metal alkynes, metal allyls, metallocenes, metal cyclopentadienes, metal arenes, metal alkoxides, and metal ⁇ -diketonates, all well known to a person skilled in the art. It is also possible to use metal carbonyls, metal oxyhalides, and metal hydrides.
  • the method further comprises the step of adding a co-reactant, preferably water, to the metal-containing coating precursor.
  • a co-reactant preferably water
  • water may be used to modify or control the reaction of the coating precursor.
  • the reactor is advantageously a tubular flow reactor.
  • the method further comprises the step of selecting a location for an injection element for injecting the at least one metal-containing coating precursor downstream of a Ti0 2 -formation zone of the tubular flow reactor.
  • the injection element is selected from the group consisting of a slot, a porous wall element, an annular segment of a coaxial tube of the tubular flow reactor, and a radially extending injection port.
  • At least two of the metal-containing coating precursors are injected at a single point through an injection element selected from the group consisting of a slot and a porous wall segment.
  • the inventive method according to another embodiment further comprises the step of selecting a plurality of locations for injection elements for injecting at least two of the metal- containing coating precursors downstream of a Ti0 2 -formation zone of the tubular flow reactor.
  • the coating precursors may be injected as mixtures, or separately but simultaneously at the same point in the reactor, or may be injected separately at different points in the reactor to produce mixed oxide coatings or to produce a coating comprising separate layers of metal oxides.
  • the injection elements are selected from the group consisting of a slot, a porous wall element, an annular segment of coaxial tube of the tubular flow reactor, and a radially extending injection port.
  • each separate coating layer has a thickness of 1-100 nm.
  • the coating has a total thickness of 1-100 nm.
  • the step of thermally decomposing includes the step of heating by fuel combustion, by conduction or by a plasma arc for initiating the formation of Ti0 2 .
  • the step of introducing the titanium- coating precursor includes the step of selecting a first and a second location of introduction, wherein the second location is arranged downstream of the first location.
  • the step of introducing the titanium- containing precursor and/or the step of injecting the metal-containing coating precursor may include the step of employing a carrier gas, for example, oxygen.
  • the method further comprises the step of collecting the Ti0 2 pigment particles downstream of the flow reactor.
  • the reactor is maintained at atmospheric pressure during the inventive process. It is also possible to maintain less than atmospheric pressure (vacuum) within the reactor or perform the inventive process at a pressure of 1 to 10 atm (atmospheres) within the reactor.
  • the present invention describes a gas- phase method for making coated pigment grade Ti0 2 . It allows multi-component coatings and multilayer coatings.
  • the coatings produced by the inventive process are dense and have low oil absorption. The inventive process eliminates the need to collect the particles before the coating can be applied thereby simplifying the manufacturing process.
  • Ti0 2 pigment particles are produced by a gas-phase reaction of titanium-containing precursors, for example, TiX 4 , suspended in a gas stream and are then coated with a coating of metal oxide(s) produced by gas-phase and surface reactions of thermally decomposable volatile metal atom- or ion-containing coating reactants introduced at a single point or multiple points into a tubular flow system at a location downstream of the formation zone in which the Ti0 2 pigment particles are fully formed.
  • titanium-containing precursors for example, TiX 4
  • the inventive system or apparatus consists of three sections including sequentially: a tubular flow formation zone in which the Ti0 2 particles are formed, a zone in which the thermally decomposable volatile metal atom- or ion-containing coating reactants (precursors) are introduced into the gas stream carrying the Ti0 2 particles to be coated, and a coating zone in which the Ti0 2 particles are coated by the metal oxide(s) being formed from the metal-containing coating precursor(s) .
  • the titanium dioxide particles are formed by gas-phase reaction.
  • the volatile metal-containing coating precursors are injected which react in the gas phase as well as on the surface of the titanium dioxide particles to form a coating.
  • the coated particles are then collected at the exit of the flow reactor.
  • the inventive system consists of the following components: a pigment particle generator (particle formation zone) , an introduction zone for the thermally decomposable volatile metal- containing coating precursor (reactant) , and a coating zone.
  • a pigment particle generator particle formation zone
  • an introduction zone for the thermally decomposable volatile metal- containing coating precursor reactant
  • a coating zone In the particle formation zone, TiCl 4 reacts with 0 2 to form respective Ti0 2 particles (illustrated as small circles) .
  • the drawing shows the introduction of three thermally decomposable volatile metal-containing coating reactants downstream of the particle formation zone: ML n , M'L n , and M''L n where M, M' , M' ' represent a metal atom and L represents a ligand attached to the metal atom. However, the reaction of only one coating reactant ML n is shown.
  • reaction to form the metal oxide can take place in the gas phase (formation of small particles, illustrated by small cross-hatched circles) which are then captured by the preformed Ti0 2 particles to form the coating or can take place at the surface of the Ti0 2 particles resulting in a direct coating of the Ti0 2 particle (the produced coating is schematically represented by cross-hatching) .
  • Preferred compounds are, for example,
  • organic ligands such as metal alkyls, metal alkenyls, metal alkynes, metal allyls, metallocenes, metal cyclopentadienes, metal arenes, metal alkoxides, and metal ⁇ - diketonates
  • inorganic ligands such as metal carbonyls, metal oxyhalides, and metal hydrides.
  • the given compounds are examples only and not meant to limit the scope of the inventive process
  • the drawing shows the sequential nature of the process in which the particles are formed first, followed by introduction of the thermally decomposable volatile metal-containing coating reactants, and then coating. It is also obvious that only one or a plurality of thermally decomposable volatile metal-containing coating reactants can be used, as desired and needed for the Ti0 2 pigment product properties. Thus, the invention is not limited with respect to the number of thermally decomposable volatile metal- containing coating reactants that can be used, the order in which they are introduced into the reactor, or the type of thermally decomposable volatile metal-containing coating reactant.
  • TiCl 4 as a titanium precursor can be mixed with A1C1 3 , introduced into the reactor with oxygen (carrier gas) at a temperature of about 900 °C or higher, and reacted in a tubular flow system to give Ti0 2 particles containing Al.
  • oxygen carrier gas
  • water can be added, as is well known in the art, in order to help adjust or control the Ti0 2 particle size.
  • the gist of the present invention is the addition (injection) of a thermally decomposable volatile metal-containing coating reactant into a reactor tube at a location downstream of the zone in which the Ti0 2 particles are formed, but where the temperature is still high enough to cause reaction of the thermally decomposable volatile metal-containing coating reactants both in the gas phase and on the surfaces of the Ti0 2 pigment particles.
  • thermally decomposable volatile metal-containing coating reactants it is also possible to add two thermally decomposable volatile metal-containing coating reactants at the same time to give a single coating which is a mixed oxide of the two metals.
  • SiX 4 and A1X 3 can be added together resulting in a mixed oxide [Si0 2 ] x [Al 2 0 3 ] y wherein essentially any ratio between the two oxides is possible.
  • two or more thermally decomposable volatile metal-containing coating reactants are added sequentially to give a coating comprised of two or more layers of individual metal oxides.
  • the invention can be carried out in a variety of apparatus configurations.
  • the preferred embodiment is a tubular flow system in which the thermally decomposable volatile metal- containing coating reactants are introduced from the exterior of the reactor tube into the reactor tube at points downstream of the zone in which the Ti0 2 particles are formed but where the temperature is still high enough to cause reaction of the thermally decomposable volatile metal- containing coating reactants both in the gas phase and on the surfaces of the particles.
  • Various approaches can be used to introduce the thermally decomposable volatile metal-containing coating reactants into the reactor.
  • the thermally decomposable volatile metal-containing coating reactants can be 10 added through a porous wall or through radially extending injection points. It is also possible to use coaxial injection.
  • the temperature at which the thermally decomposable volatile metal-containing coating reactants are to be decomposed must be sufficiently high in order for the coating reactants to react at the surface of the Ti0 2 20 particles or for the particles of the coating material, formed in the gas phase, to be able to collide with the Ti0 2 pigment particles and fuse into their surfaces. Temperatures that are too low result in formation of separate particles 25 comprised of the coating material that are not incorporated into the coating. Temperatures that are too high result in reaction of the coating
  • the temperature For the coating of Ti0 2 with Si0 2 using SiCl 4 , the temperature must be greater than 1300°C. When Ti0 2 is to be coated with Al 2 0 3 , the temperature must be greater than 1100°C. For coating Ti0 2 with a mixed Si/Al oxide, the temperature must be greater than 1200°C. However, in any case, the temperature must not be too high in order to prevent interdiffusion and/or reaction between Ti0 2 and the coating material.
  • the flow reactor can be heated to the required reaction temperature by conventional methods such as fuel combustion, conduction, a plasma arc or other means well known to a person skilled in the art.
  • the energy derived from the exothermic reaction of the Ti-containing precursor with oxygen for heating the flow reactor to the desired reaction temperature when the gaseous reactants (Ti- containing precursor and oxygen) are preheated to a suitable preheating temperature.
  • the exothermicity of the reaction aids in reaching the required temperature in all possible process variations.
  • the inventive process can be carried out under various pressures.
  • the reactor can simply be maintained at atmospheric pressure during the inventive process. It is also possible to maintain less than atmospheric pressure (vacuum) within the reactor or perform the inventive process at a pressure of 1 to 10 atm (atmospheres) within the reactor.
  • Example 1 Formation of Ti0 2 particles coated with SiO,
  • a tubular flow reactor was used at a temperature of 1500 °C.
  • Oxygen gas carrier gas
  • the resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 seconds.
  • the gas mixture reacted to form Ti0 2 particles in the reactor.
  • Liquid SiCl 4 was vaporized by heating at
  • the surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy.
  • the composition of the coating was confirmed by energy dispersive spectroscopy which showed only Si and O. X-ray diffraction showed only Ti0 2 and confirmed that the coating process did not degrade the properties of the pigment by forming additional undesired phases.
  • Example 2 Formation of Ti0 2 particles coated with A1 2 0 3 .
  • a tubular flow reactor was used at a temperature of 1500 °C.
  • Oxygen (carrier gas) was guided through TiCl 4 to vaporize and introduce TiCl 4 into the carrier gas.
  • the resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 sec. The gas mixture reacted to form Ti0 2 particles in the reactor.
  • A1C1 3 was vaporized by heating at less than 250 °C and passing a carrier gas over the powder. The vapor was introduced into the hot region of the reactor using tubes inserted from the exit of the reactor. This allowed A1C1 3 to be introduced into the reactor in a region where the temperature was near 1500°C. A1C1 3 reacted both in the gas phase and on the surfaces of the formed Ti0 2 particles. The gas phase reaction of the metal-containing coating precursor A1C1 3 resulted in the formation of small particles of Al 2 0 3 which were captured by the Ti0 2 particles and incorporated into the surface as a coating by sintering. Because of the small size of the Al 2 0 3 particles, sintering was rapid.
  • the particles were collected on a filter after exiting the reactor.
  • the surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy.
  • the composition of the coating was confirmed by energy dispersive spectroscopy which showed only Al and 0. X-ray diffraction showed only Ti0 2 and confirmed that the coating process did not degrade the properties of the Ti0 2 pigment particles by forming additional undesired phases.
  • a tubular flow reactor was used at a temperature of 1500 °C.
  • Oxygen carrier gas
  • TiCl 4 was guided through TiCl 4 to vaporize and introduce TiCl 4 into the carrier gas.
  • the resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 sec. The gas mixture reacted to form Ti0 2 particles in the reactor.
  • SiCl 4 was vaporized by heating at 25°C without a carrier gas, and A1C1 3 was vaporized by heating at less than 250°C with carrier gas flowing over the AlCl 3 powder.
  • the streams were combined and introduced as a vapor into the hot region of the reactor using tubes inserted from the exit of the reactor. This allowed the SiCl 4 and A1C1 3 to be introduced into the reactor in a region where the temperature was near 1500°C.
  • SiCl 4 and A1C1 3 reacted both in the gas phase and on the surfaces of the particles.
  • the gas phase reaction resulted in the formation of small metal oxide particles which were captured by the formed Ti0 2 particles and incorporated into the surface as a coating by sintering.
  • the coated Ti0 2 pigment particles were collected onto a filter after exiting the reactor.
  • the surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy.
  • the composition of the coating was confirmed by energy dispersive spectroscopy which showed only Si, Al and 0. X- ray diffraction showed only Ti0 2 and confirmed that the coating process did not degrade the properties of the pigment by forming additional undesired phases.

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  • Organic Chemistry (AREA)
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  • Engineering & Computer Science (AREA)
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  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

In a process for making pigment-grade TiO2 coated with a metal oxide, a thermally decomposable volatile titanium-containing precursor is introduced into a reactor. The titanium-containing precursor is thermally decomposed within the reactor to form TiO2 pigment particles. Subsequently, one or more thermally decomposable volatile metal-containing coating precursors are injected into the reactor. The one or more metal-containing coating precursors are reacted within the reactor to form a coating of the one or more metal oxides on the TiO2 pigment particles.

Description

COATING OF TiOo PIGMENT BY GAS-PHASE AND SURFACE
REACTIONS Technical Field
This invention pertains to a process of coating titanium dioxide particles with metal oxides by gas-phase reaction. Background Art
The gas-phase reaction of TiCl4 and 02 is used to make particulate Ti02 often of a size useful as a white pigment. The pigment particles are usually not used in typical applications such as paint without first coating them with materials including, but not limited to, Si02, A1203 and mixtures thereof. To coat the particles, they are typically collected from the gas and dispersed in a liquid where the coating is applied by precipitation. This liquid-phase coating process often results in coatings with high surfaces areas, high oil absorption, and non-uniform thickness.
U.S. Patent 4,803,056 describes a method for increasing the capacity of a titanium dioxide producing process. Titanium tetrachloride is added at a second point in the system downstream of the main inlet for titanium tetrachloride to increase the yield of Ti02. The process is exclusively used for the production of uncoated titanium dioxide. The addition of other reagents at the second point of introduction in order to produce a coating on the Ti02 particles is not suggested or disclosed.
Huncr and Katz (J. Mater. Res., 7, 1861 (1992)) disclose a process for forming coated particles in a flame. For example, non-pigmentary Ti02 can be coated with Si02 in a flame reactor whereby TiCl4 and SiCl4 are added simultaneously into the same flame. The reaction conditions must be carefully adjusted such that Ti02 condenses before Si02 in order to achieve a coating of Si02 on the already formed Ti02 particles. It is difficult to reliably produce Si02-coated Ti02 particles of a uniform quality in terms of size and coating hardness with this process.
It is therefore an object of the present invention to provide a simple and reliable process for coating Ti02 pigment particles in the gas phase to give coatings with low surfaces areas, low oil absorption, and uniform thickness. Disclosure of the Invention
The process for making pigment-grade Ti02 coated with a metal oxide according to the present invention is primarily characterized by the following steps: introducing a thermally decomposable volatile titanium-containing precursor into a reactor; thermally decomposing the titanium- containing precursor within the reactor to form Ti02 pigment particles; subsequently injecting at least one thermally decomposable volatile metal-containing coating precursor into the reactor; and reacting the at least one metal- containing coating precursor within the reactor to form a coating of at least one metal oxide on the Ti02 pigment particles. Preferably, the coating is selected from the group consisting of Si02, Al203, Zr02, and mixed metal oxide. The mixed metal oxide is expediently [Si02]x[Al203]y with x = 0-1 and y = 0-1. The titanium-containing precursor is selected from the group consisting of TiCl4, TiBr4, and Ti(OR)4, wherein R is an alkyl group.
The method advantageously further comprises the step of adding a thermally decomposable volatile aluminum-containing precursor to the titanium-containing precursor to form Al-doped Ti02. As is well known in the art, water may also be added to control the particle size of the formed Ti02 pigment particles. The metal-containing coating precursor is selected from the group consisting of SiX4, A1X3, and ZrX4, wherein X is Cl, Br or OR, R being an alkyl group. However, other metal-containing coating precursors can be used equally successfully. For example, they may be selected from the group consisting of metal alkyls, metal alkenyls, metal alkynes, metal allyls, metallocenes, metal cyclopentadienes, metal arenes, metal alkoxides, and metal β-diketonates, all well known to a person skilled in the art. It is also possible to use metal carbonyls, metal oxyhalides, and metal hydrides.
The method further comprises the step of adding a co-reactant, preferably water, to the metal-containing coating precursor. It is known to a person skilled in the art that water may be used to modify or control the reaction of the coating precursor. The reactor is advantageously a tubular flow reactor.
The method further comprises the step of selecting a location for an injection element for injecting the at least one metal-containing coating precursor downstream of a Ti02-formation zone of the tubular flow reactor.
The injection element is selected from the group consisting of a slot, a porous wall element, an annular segment of a coaxial tube of the tubular flow reactor, and a radially extending injection port.
In a preferred embodiment of the present invention, at least two of the metal-containing coating precursors are injected at a single point through an injection element selected from the group consisting of a slot and a porous wall segment.
The inventive method according to another embodiment further comprises the step of selecting a plurality of locations for injection elements for injecting at least two of the metal- containing coating precursors downstream of a Ti02-formation zone of the tubular flow reactor. The coating precursors may be injected as mixtures, or separately but simultaneously at the same point in the reactor, or may be injected separately at different points in the reactor to produce mixed oxide coatings or to produce a coating comprising separate layers of metal oxides. The injection elements are selected from the group consisting of a slot, a porous wall element, an annular segment of coaxial tube of the tubular flow reactor, and a radially extending injection port.
Preferably, each separate coating layer has a thickness of 1-100 nm. Advantageously, the coating has a total thickness of 1-100 nm.
The step of thermally decomposing includes the step of heating by fuel combustion, by conduction or by a plasma arc for initiating the formation of Ti02. The step of introducing the titanium- coating precursor includes the step of selecting a first and a second location of introduction, wherein the second location is arranged downstream of the first location. The step of introducing the titanium- containing precursor and/or the step of injecting the metal-containing coating precursor may include the step of employing a carrier gas, for example, oxygen. Preferably, the method further comprises the step of collecting the Ti02 pigment particles downstream of the flow reactor.
Advantageously, the reactor is maintained at atmospheric pressure during the inventive process. It is also possible to maintain less than atmospheric pressure (vacuum) within the reactor or perform the inventive process at a pressure of 1 to 10 atm (atmospheres) within the reactor. The present invention describes a gas- phase method for making coated pigment grade Ti02. It allows multi-component coatings and multilayer coatings. The coatings produced by the inventive process are dense and have low oil absorption. The inventive process eliminates the need to collect the particles before the coating can be applied thereby simplifying the manufacturing process.
According to the present invention Ti02 pigment particles are produced by a gas-phase reaction of titanium-containing precursors, for example, TiX4, suspended in a gas stream and are then coated with a coating of metal oxide(s) produced by gas-phase and surface reactions of thermally decomposable volatile metal atom- or ion-containing coating reactants introduced at a single point or multiple points into a tubular flow system at a location downstream of the formation zone in which the Ti02 pigment particles are fully formed.
The inventive system or apparatus consists of three sections including sequentially: a tubular flow formation zone in which the Ti02 particles are formed, a zone in which the thermally decomposable volatile metal atom- or ion-containing coating reactants (precursors) are introduced into the gas stream carrying the Ti02 particles to be coated, and a coating zone in which the Ti02 particles are coated by the metal oxide(s) being formed from the metal-containing coating precursor(s) .
In a first step, the titanium dioxide particles are formed by gas-phase reaction. Subsequently, the volatile metal-containing coating precursors are injected which react in the gas phase as well as on the surface of the titanium dioxide particles to form a coating. The coated particles are then collected at the exit of the flow reactor. Thus, the invention described here relies on sequential particle formation and particle coating.
Brief Description of the Drawing
The object and advantages of the present invention will appear more clearly from the following specification in conjunction with the accompanying drawing, in which the only Figure schematically shows the system for coating particles according to the present invention for a specific embodiment. Best Modes for Carrying our the Invention The present invention will now be described in detail with the aid of several specific embodiments utilizing the only Figure in which a specific embodiment is illustrated.
The inventive system consists of the following components: a pigment particle generator (particle formation zone) , an introduction zone for the thermally decomposable volatile metal- containing coating precursor (reactant) , and a coating zone. In the particle formation zone, TiCl4 reacts with 02 to form respective Ti02 particles (illustrated as small circles) . The drawing shows the introduction of three thermally decomposable volatile metal-containing coating reactants downstream of the particle formation zone: MLn, M'Ln, and M''Ln where M, M' , M' ' represent a metal atom and L represents a ligand attached to the metal atom. However, the reaction of only one coating reactant MLn is shown. It is schematically shown that the reaction to form the metal oxide can take place in the gas phase (formation of small particles, illustrated by small cross-hatched circles) which are then captured by the preformed Ti02 particles to form the coating or can take place at the surface of the Ti02 particles resulting in a direct coating of the Ti02 particle (the produced coating is schematically represented by cross-hatching) . Preferred compounds are, for example,
SiCl4, SiBr4, Si(OR)4, AlCl3, AlBr3, A1(0R)3, ZrCl4, ZrBr4, and Zr(OR)4. It is obvious to those skilled in the art that other types of precursors of various structures can be used, for example, coating precursors with organic ligands such as metal alkyls, metal alkenyls, metal alkynes, metal allyls, metallocenes, metal cyclopentadienes, metal arenes, metal alkoxides, and metal β- diketonates or coating precursors with inorganic ligands such as metal carbonyls, metal oxyhalides, and metal hydrides. The given compounds are examples only and not meant to limit the scope of the inventive process
The drawing shows the sequential nature of the process in which the particles are formed first, followed by introduction of the thermally decomposable volatile metal-containing coating reactants, and then coating. It is also obvious that only one or a plurality of thermally decomposable volatile metal-containing coating reactants can be used, as desired and needed for the Ti02 pigment product properties. Thus, the invention is not limited with respect to the number of thermally decomposable volatile metal- containing coating reactants that can be used, the order in which they are introduced into the reactor, or the type of thermally decomposable volatile metal-containing coating reactant.
It is also possible to use an additional metal compound as a dopant together with the titanium-containing precursor. For example, TiCl4 as a titanium precursor can be mixed with A1C13, introduced into the reactor with oxygen (carrier gas) at a temperature of about 900 °C or higher, and reacted in a tubular flow system to give Ti02 particles containing Al. It is obvious to those skilled in the art that other types of dopants can be added to the titanium-containing precursor without departing from the scope of the present invention. In this context it should also be mentioned that water can be added, as is well known in the art, in order to help adjust or control the Ti02 particle size.
It is well known to persons skilled in the art that the particle formation and particle coating within the reactor occur over a short period of time. The gas stream exiting from the reactor is cooled to allow collection of the coated particles.
The gist of the present invention is the addition (injection) of a thermally decomposable volatile metal-containing coating reactant into a reactor tube at a location downstream of the zone in which the Ti02 particles are formed, but where the temperature is still high enough to cause reaction of the thermally decomposable volatile metal-containing coating reactants both in the gas phase and on the surfaces of the Ti02 pigment particles.
It is possible to add only a single thermally decomposable volatile metal-containing coating reactant, such as SiCl4, in order to give a coating of one material (Si02 in the given example) .
However, it is also possible to add two thermally decomposable volatile metal-containing coating reactants at the same time to give a single coating which is a mixed oxide of the two metals. For example, SiX4 and A1X3 can be added together resulting in a mixed oxide [Si02]x[Al203]y wherein essentially any ratio between the two oxides is possible. In this case it is desirable to match the reaction temperatures of the thermally decomposable volatile metal-containing coating reactants to allow reaction at the same location in the reactor.
In another embodiment of the present invention, two or more thermally decomposable volatile metal-containing coating reactants are added sequentially to give a coating comprised of two or more layers of individual metal oxides.
The invention can be carried out in a variety of apparatus configurations. The preferred embodiment is a tubular flow system in which the thermally decomposable volatile metal- containing coating reactants are introduced from the exterior of the reactor tube into the reactor tube at points downstream of the zone in which the Ti02 particles are formed but where the temperature is still high enough to cause reaction of the thermally decomposable volatile metal- containing coating reactants both in the gas phase and on the surfaces of the particles. 5 Various approaches can be used to introduce the thermally decomposable volatile metal-containing coating reactants into the reactor. For example, the thermally decomposable volatile metal-containing coating reactants can be 10 added through a porous wall or through radially extending injection points. It is also possible to use coaxial injection. Those skilled in the art realize other methods that are also equally viable. 15 The temperature at which the thermally decomposable volatile metal-containing coating reactants are to be decomposed must be sufficiently high in order for the coating reactants to react at the surface of the Ti02 20 particles or for the particles of the coating material, formed in the gas phase, to be able to collide with the Ti02 pigment particles and fuse into their surfaces. Temperatures that are too low result in formation of separate particles 25 comprised of the coating material that are not incorporated into the coating. Temperatures that are too high result in reaction of the coating
• material with the particle to be coated, i.e., the metal (s) of the coating material and the Ti02
«• 30 particle react to form mixed metal oxide phases thus degrading the Ti02 pigment particle properties.
For the coating of Ti02 with Si02 using SiCl4, the temperature must be greater than 1300°C. When Ti02 is to be coated with Al203, the temperature must be greater than 1100°C. For coating Ti02 with a mixed Si/Al oxide, the temperature must be greater than 1200°C. However, in any case, the temperature must not be too high in order to prevent interdiffusion and/or reaction between Ti02 and the coating material.
The flow reactor can be heated to the required reaction temperature by conventional methods such as fuel combustion, conduction, a plasma arc or other means well known to a person skilled in the art.
Especially for large scale production processes, it is known in the art to use the energy derived from the exothermic reaction of the Ti-containing precursor with oxygen for heating the flow reactor to the desired reaction temperature when the gaseous reactants (Ti- containing precursor and oxygen) are preheated to a suitable preheating temperature. Of course, the exothermicity of the reaction aids in reaching the required temperature in all possible process variations. The inventive process can be carried out under various pressures. The reactor can simply be maintained at atmospheric pressure during the inventive process. It is also possible to maintain less than atmospheric pressure (vacuum) within the reactor or perform the inventive process at a pressure of 1 to 10 atm (atmospheres) within the reactor. Example 1. Formation of Ti02 particles coated with SiO,
A tubular flow reactor was used at a temperature of 1500 °C. Oxygen gas (carrier gas) was guided through TiCl4 to vaporize and introduce TiCl4 into the carrier gas. The resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 seconds. The gas mixture reacted to form Ti02 particles in the reactor. Liquid SiCl4 was vaporized by heating at
25°C and introduced as a vapor into the hot region of the reactor using tubes inserted from the exit of the reactor. This allowed the SiCl4 to be introduced into the reactor in a region where the temperature was near 1500 °C. The SiCl4 reacted both in the gas phase and on the surfaces of the formed Ti02 particles. The gas phase reaction of the metal-containing coating precursor resulted in the formation of small metal oxide particles which were captured by the Ti02 particles and incorporated into the surface as a coating by sintering. Because of the small size of the metal oxide particles, sintering was rapid. The coated Ti02 pigment particles were collected on a filter after exiting the reactor.
The surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy. The composition of the coating was confirmed by energy dispersive spectroscopy which showed only Si and O. X-ray diffraction showed only Ti02 and confirmed that the coating process did not degrade the properties of the pigment by forming additional undesired phases.
Example 2. Formation of Ti02 particles coated with A1203. A tubular flow reactor was used at a temperature of 1500 °C. Oxygen (carrier gas) was guided through TiCl4 to vaporize and introduce TiCl4 into the carrier gas. The resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 sec. The gas mixture reacted to form Ti02 particles in the reactor.
A1C13 was vaporized by heating at less than 250 °C and passing a carrier gas over the powder. The vapor was introduced into the hot region of the reactor using tubes inserted from the exit of the reactor. This allowed A1C13 to be introduced into the reactor in a region where the temperature was near 1500°C. A1C13 reacted both in the gas phase and on the surfaces of the formed Ti02 particles. The gas phase reaction of the metal-containing coating precursor A1C13 resulted in the formation of small particles of Al203 which were captured by the Ti02 particles and incorporated into the surface as a coating by sintering. Because of the small size of the Al203 particles, sintering was rapid. The particles were collected on a filter after exiting the reactor. The surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy. The composition of the coating was confirmed by energy dispersive spectroscopy which showed only Al and 0. X-ray diffraction showed only Ti02 and confirmed that the coating process did not degrade the properties of the Ti02 pigment particles by forming additional undesired phases.
Example 3. Formation of Ti02 particles coated with [Si02]x[Al203]y.
A tubular flow reactor was used at a temperature of 1500 °C. Oxygen (carrier gas) was guided through TiCl4 to vaporize and introduce TiCl4 into the carrier gas. The resulting gas mixture was then introduced into a reactor tube with a residence time of less than 10 sec. The gas mixture reacted to form Ti02 particles in the reactor.
SiCl4 was vaporized by heating at 25°C without a carrier gas, and A1C13 was vaporized by heating at less than 250°C with carrier gas flowing over the AlCl3 powder. The streams were combined and introduced as a vapor into the hot region of the reactor using tubes inserted from the exit of the reactor. This allowed the SiCl4 and A1C13 to be introduced into the reactor in a region where the temperature was near 1500°C. SiCl4 and A1C13 reacted both in the gas phase and on the surfaces of the particles. The gas phase reaction resulted in the formation of small metal oxide particles which were captured by the formed Ti02 particles and incorporated into the surface as a coating by sintering. Sintering was rapid because of the small size of the metal oxide particles. The coated Ti02 pigment particles were collected onto a filter after exiting the reactor. The surface reaction resulted in the direct deposition of a uniform continuous coating with a thickness of 10 nm as shown by Transmission Electron Microscopy. The composition of the coating was confirmed by energy dispersive spectroscopy which showed only Si, Al and 0. X- ray diffraction showed only Ti02 and confirmed that the coating process did not degrade the properties of the pigment by forming additional undesired phases.
The present invention is, of course, in no way restricted to the specific disclosure of the specification, examples and drawings, but also encompasses any modifications within the scope of the appended claims.

Claims

CLAIMS:
1. A process for making pigment-grade Ti02 coated with a metal oxide, said method comprising the steps of: introducing a thermally decomposable volatile titanium-containing precursor into a reactor; thermally decomposing the titanium- containing precursor within the reactor to form Ti02 pigment particles; subsequently injecting at least one thermally decomposable volatile metal-containing coating precursor into the reactor; and reacting the at least one metal- containing coating precursor within the reactor to form a coating of at least one metal oxide on the Ti02 pigment particles.
2. A method according to claim 1, wherein said coating is selected from the group consisting of Si02, Al203, Zr02, and mixed metal oxide.
3. A method according to claim 2, wherein the mixed metal oxide is [Si02]x[Al203]y.
4. A method according to claim 1, wherein the titanium-containing precursor is selected from the group consisting of TiCl4, TiBr4, and Ti(0R)4 wherein R is an alkyl group.
5. A method according to claim 1, further comprising the step of adding a thermally decomposable volatile aluminum-containing compound to the titanium-containing precursor to form Al- doped Ti02.
6. A method according to claim 1, wherein the metal-containing coating precursor is selected from the group consisting of SiX4, A1X3, and ZrX4, wherein X is Cl, Br or OR.
7. A method according to claim 6, further comprising the step of adding a co- reactant to the metal-containing coating precursor.
8. A method according to claim 7, wherein the co-reactant is water.
9. A method according to claim 1, wherein the reactor is a tubular flow reactor.
10. A method according to claim 9, further comprising the step of selecting a location for an injection element for injecting the at least one metal-containing coating precursor downstream of a Ti02-formation zone of the tubular flow reactor.
11. A method according to claim 10, wherein the injection element is selected from the group consisting of a slot, a porous wall element, an annular segment of coaxial tube of the tubular flow reactor, and a radially extending injection port.
12. A method according to claim 10, wherein at least two of the metal-containing coating precursors are injected at a single point through an injection element selected from the group consisting of a slot and a porous wall segment.
13. A method according to claim 1, further comprising the step of selecting a plurality of locations for injection elements for injecting at least two of the metal-containing coating precursors downstream of a Ti02-formation zone of the tubular flow reactor to produce a coating comprising separate layers of metal oxides.
14. A method according to claim 13, wherein the injection elements are selected from the group consisting of a slot, a porous wall element, an annular segment of coaxial tube of the tubular flow reactor, and a radially extending injection port.
15. A method according to claim 13, wherein each separate layer of the coating has a thickness of 1-100 nm.
16. A method according to claim 1, wherein the coating has a total thickness of 1-100 nm.
17. A method according to claim 1, wherein the step of thermally decomposing includes the step of heating by fuel combustion for initiating the formation of Ti02.
18. A method according to claim 1, wherein the step of thermally decomposing includes the step of heating by conduction for initiating the formation of Ti02.
19. A method according to claim 1, wherein the step of thermally decomposing includes the step of heating with a plasma arc for initiating the formation of Ti02.
20. A method according to claim 1, wherein in the step of introducing the titanium- containing precursor includes the step of selecting a first and a second location of introduction, wherein the second location is arranged downstream of the first location.
21. A method according to claim 1, wherein the step of introducing includes the step of employing a carrier gas.
22. A method according to claim 1, wherein the step of injecting includes the step of employing a carrier gas.
23. A method according to claim 1, further comprising the step of collecting the Ti02 pigment particles downstream of the flow reactor.
24. A method according to claim 1, further comprising the step of maintaining atmospheric pressure within the reactor.
25. A method according to claim 1, further comprising the step of maintaining less than atmospheric pressure within the reactor.
26. A method according to claim 1, further comprising the step of maintaining a pressure of 1 to 10 atm within the reactor.
27. A method according to claim 1, wherein the metal-containing coating precursor is selected from the group consisting of metal alkyls, metal alkenyls, metal alkynes, metal allyls, metallocenes, metal cyclopentadienes, metal arenes, metal alkoxides, and metal β- diketonates.
28. A method according to claim 1, wherein the metal-containing coating precursor is selected from the group consisting of metal carbonyls, metal oxyhalides, and metal hydrides.
PCT/US1996/007886 1995-05-17 1996-05-17 COATING OF TiO2 PIGMENT BY GAS-PHASE AND SURFACE REACTIONS Ceased WO1996036441A1 (en)

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