WO1996033098A3 - Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication - Google Patents
Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication Download PDFInfo
- Publication number
- WO1996033098A3 WO1996033098A3 PCT/US1996/003815 US9603815W WO9633098A3 WO 1996033098 A3 WO1996033098 A3 WO 1996033098A3 US 9603815 W US9603815 W US 9603815W WO 9633098 A3 WO9633098 A3 WO 9633098A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- impermeable
- chemically inert
- gases
- conducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/206—Filters comprising particles embedded in a solid matrix
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
La présente invention décrit un procédé de fabrication d'une structure de parois de conteneur imperméable aux gaz et chimiquement inerte, consistant à effectuer les étapes suivantes: préparer une couche de base dans un matériau polymère organique; apporter de préférence par injection de gaz pulsé un couple de gaz réactifs sur la surface de la couche de base; chauffer les gaz de préférence par impulsions d'énergie à ondes ultracourtes suffisamment pour créer un plasma qui amène la réaction des gaz à former un composé de vapeur inorganique qui se dépose sur la surface; continuer l'apport des gaz et leur chauffage jusqu'à ce que le dépôt du composé de vapeur sur la surface forme sur la surface une barrière chimiquement inerte et imperméable aux gaz et d'épaisseur désirée. L'invention décrit également diverses structures de parois et les dispositifs pour les fabriquer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU52576/96A AU5257696A (en) | 1995-04-13 | 1996-03-21 | Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42153695A | 1995-04-13 | 1995-04-13 | |
| US08/421,536 | 1995-04-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO1996033098A2 WO1996033098A2 (fr) | 1996-10-24 |
| WO1996033098A3 true WO1996033098A3 (fr) | 1996-12-12 |
Family
ID=23670949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US1996/003815 Ceased WO1996033098A2 (fr) | 1995-04-13 | 1996-03-21 | Structure de conteneur impermeable aux gaz et chimiquement inerte ainsi que son procede de fabrication |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU5257696A (fr) |
| IL (1) | IL117653A0 (fr) |
| WO (1) | WO1996033098A2 (fr) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384924A (en) * | 1992-08-03 | 1995-01-31 | Mallinckrodt Medical, Inc. | Warming blanket having multiple inlets |
| FR2814382B1 (fr) * | 2000-09-28 | 2003-05-09 | Cebal | Procede de depot d'un revetement interne dans un recipient en matiere plastique |
| US6514870B2 (en) | 2001-01-26 | 2003-02-04 | Applied Materials, Inc. | In situ wafer heat for reduced backside contamination |
| DE10139305A1 (de) | 2001-08-07 | 2003-03-06 | Schott Glas | Verbundmaterial aus einem Substratmaterial und einem Barriereschichtmaterial |
| DE10258678B4 (de) * | 2002-12-13 | 2004-12-30 | Schott Ag | Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten |
| DE10258680B4 (de) * | 2002-08-07 | 2008-09-11 | Schott Ag | Herstellen eines Verbundmaterials mit einem biologisch abbaubaren Kunststoffsubstrat und zumindest einer Beschichtung |
| DE10242086A1 (de) * | 2002-09-11 | 2004-04-15 | Sig Technology Ltd. | Behälter zur Verpackung von Produkten, Vorrichtung zur Verarbeitung von Kunstoff sowie Verfahren zur Behälterherstellung |
| JP2005280718A (ja) * | 2004-03-26 | 2005-10-13 | Yoshino Kogyosho Co Ltd | 高いガスバリア性を有する合成樹脂製容器 |
| DE102006048658B4 (de) * | 2006-10-14 | 2014-03-27 | Khs Corpoplast Gmbh | PICVD-Beschichtung für Kunststoffbehälter und Verfahren zu deren Herstellung |
| DE102019107660A1 (de) * | 2019-03-26 | 2020-10-01 | Krones Ag | Verfahren und Vorrichtung zum Beschichten von Behältnissen |
| CN112030134A (zh) * | 2020-07-22 | 2020-12-04 | 深圳市八六三新材料技术有限责任公司 | 一种基于微波等离子体化学气相沉积的阻隔容器 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
| EP0289402A1 (fr) * | 1987-04-22 | 1988-11-02 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Revêtement protecteur du type SiCxNyOzHt obtenu par traitement avec un plasma |
| US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
| JPH03236474A (ja) * | 1989-11-02 | 1991-10-22 | Mitsubishi Heavy Ind Ltd | プラスチック表面の硬化保護膜形成方法及び装置 |
| DE4113221A1 (de) * | 1991-04-23 | 1992-10-29 | Leybold Ag | Flexible, transparente polymerfolien |
| WO1993024243A1 (fr) * | 1992-05-28 | 1993-12-09 | Polar Materials, Inc. | Procedes et dispositif de depot de couches d'arret |
-
1996
- 1996-03-21 WO PCT/US1996/003815 patent/WO1996033098A2/fr not_active Ceased
- 1996-03-21 AU AU52576/96A patent/AU5257696A/en not_active Abandoned
- 1996-03-26 IL IL11765396A patent/IL117653A0/xx unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
| EP0289402A1 (fr) * | 1987-04-22 | 1988-11-02 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Revêtement protecteur du type SiCxNyOzHt obtenu par traitement avec un plasma |
| US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
| JPH03236474A (ja) * | 1989-11-02 | 1991-10-22 | Mitsubishi Heavy Ind Ltd | プラスチック表面の硬化保護膜形成方法及び装置 |
| DE4113221A1 (de) * | 1991-04-23 | 1992-10-29 | Leybold Ag | Flexible, transparente polymerfolien |
| WO1993024243A1 (fr) * | 1992-05-28 | 1993-12-09 | Polar Materials, Inc. | Procedes et dispositif de depot de couches d'arret |
Non-Patent Citations (1)
| Title |
|---|
| DATABASE WPI Section Ch Week 9148, Derwent World Patents Index; Class A32, AN 91-350965, XP002016317 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1996033098A2 (fr) | 1996-10-24 |
| AU5257696A (en) | 1996-11-07 |
| IL117653A0 (en) | 1996-07-23 |
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| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| 122 | Ep: pct application non-entry in european phase | ||
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