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WO1996007075A1 - Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction - Google Patents

Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction Download PDF

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Publication number
WO1996007075A1
WO1996007075A1 PCT/US1994/009801 US9409801W WO9607075A1 WO 1996007075 A1 WO1996007075 A1 WO 1996007075A1 US 9409801 W US9409801 W US 9409801W WO 9607075 A1 WO9607075 A1 WO 9607075A1
Authority
WO
WIPO (PCT)
Prior art keywords
image
corrector plate
imaging system
corrector
points
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1994/009801
Other languages
English (en)
Inventor
Bruce B. Mcarthur
Robert O. Hunter, Jr.
Adlai H. Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Litel Instruments Inc
Original Assignee
Litel Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US08/091,669 priority Critical patent/US5392119A/en
Priority claimed from US08/091,669 external-priority patent/US5392119A/en
Application filed by Litel Instruments Inc filed Critical Litel Instruments Inc
Priority to PCT/US1994/009801 priority patent/WO1996007075A1/fr
Priority to JP50869096A priority patent/JP3676371B2/ja
Publication of WO1996007075A1 publication Critical patent/WO1996007075A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Definitions

  • This invention relates to the correction of extant optical systems by the insertion of so-called "corrector plates” into such optical systems. More particularly, a method and resulting lens product is illustrated which results from the measurement of the aberrations of an extant lens system followed by the subsequent design and insertion of custom designed corrector plates to effect the desired correction of the error.
  • the measurements determine how optical rays traverse the optical system. From these measurements it can be deduced how ideal image rays would traverse back through the system.
  • the corrector plates then place the "real" rays on the "desired” trajectories.
  • the process and product of the process enables an optical system, for example the lens train from a stepper, to approach its theoretical diffraction limited performance.
  • This MacDonald et al. imaging system has the aspherization and aberration correction in the original imaging system design corrected by the insertion of two phase plates, these phase plates each having differing distances from the lenses of the imaging system.
  • the first phase plate is an aplanatism plate which acts as an asphere to place each light ray within the correct position on the second phase plate to satisfy the so-called "sine" condition. This sine condition is satisfied when the ratio of the sine of the angles made between corresponding rays at the object and image points and the axis of the optical system is constant.
  • the second phase plate is an axial stigmatism plate which ensures that each ray with the beam focuses at the focal point.
  • lens systems commonly contain both individual optic fabrication errors as well as mounting errors.
  • Systematic errors generally a result of design errors, are also not uncommon.
  • a system will normally include one or more primary image defects, usually referred to as the Seidel Aberrations.
  • Such aberrations can include distortion, curvature of field, spherical aberration, coma, and astigmatism.
  • This theoretically perfect optical system is sometimes referred in the art as being "diffraction limited.” It is only the diftractive properties of the light passing through the lens that limit the lens system optical performance.
  • Fig. 3B is a simplified schematic of the corresponding interferogram which could possibly be produced by comparison of the interrogating wave passing through the lens system of Fig. 3A after combination with a reference wave;
  • Detection of aberration is usually accomplished by conventional interferometry -- a technique well known in the prior art. Simply stated, an interrogating wave and a reference wave are generated. The reference wave is transmitted to and returned from an optical path that causes minimal interference with its wave front. The interrogating wave is typically transmitted through and retro-reflected through the optical system to be examined for aberration. By measuring the distortion and field curvature independently from the interferometry, any residual tilt or focus in the interferograms can be removed and ignored. This also relaxes the mechanical requirements of test fixture to maintain sub- depth-of-field positioning of the interferometry equipment to the tested optical system.
  • Fig. 3A illustrates the wave path of an interrogating wave passing through an optical system containing a defect.
  • the interrogating wave 100 -- shown in an undistorted plane front -- is transmitted to lens system L through lens 101 -- a lens which causes "perfect" focus of the interrogating wave 100 at object 0. Thereafter, the wave diverges and enters lens system L where in this case aberration causes the wave front to form the stepped wave 102.
  • This wave in turn passes through image I and onto reference retro-reflecting sphere 110. When passing through image I, the wave front will be inverted to front 104.
  • ray R In transmission to retro-reflecting sphere 110, because of lens aberration defects, ray R will be deviated above image I to image I' -- resulting in the "blur" associated with aberration. Further, in reflection from sphere 110, reversal at wave front 112 followed by inversion at wave front 114 occurs. Moreover, passage of ray R through image point I" -- a point below image I -- occurs. Ray R then passes through lens system L a second time -- where a second and added aberration of the ray occurs. Upon retro-refection through lens system L, wave front 116 results -- a wave front having twice the original defect. This wave is then interfered with a reference wave -- a wave that is substantially undisturbed by the distortions of the lens system. An example of a resulting "interferogram" is shown in Fig. 3B.
  • the aberration can be corrected for that bundle by a series of plates.
  • a ray bundle propagates through a series of plates, its transverse dimension grows.
  • the sum of the transversely scaled phases should be the negative or conjugate of the phase measured by the interferometer.
  • a set of plate positions is chosen. These are only the initial positions; final positions are chosen based on the optimization of the system's performance and ability to fabricate the plates.
  • the plate phase gradients at each ray-plate intersection point must be determined. The gradients are chosen so that the rays appear to be emanating from their respective desired apparent positions (in the absence of the plates) and the rays satisfy the sine condition; i.e., when the ratio of the sine of the angles made between corresponding rays at the object and image points and the axis of the optical system is constant. Satisfying the sine condition implies a reasonable correction for nearby points. Totally disjointed ray bundles can obviously be corrected independently and what remains is to merge the correction smoothly.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Lenses (AREA)

Abstract

Un objet (O) est projeté à travers le système de lentilles (L) pour être corrigé par rapport au plan d'image au niveau duquel on peut facilement déterminer la position de l'image idéale (I) limitée par la diffraction. On mesure au moins un défaut d'image primaire en une aberration de Seidel. Ces aberrations comprennent la distorsion, la courbure de champ en la courbure de Petzual, l'aberration sphérique, l'aberration en coma et l'astigmatisme. L'interférométrie est une technique qu'on utilise classiquement pour mesurer les aberrations du système. Avec ces mesures on peut calculer l'emplacement d'un objet apparent.
PCT/US1994/009801 1993-07-13 1994-08-29 Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction Ceased WO1996007075A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US08/091,669 US5392119A (en) 1993-07-13 1993-07-13 Plate correction of imaging systems
PCT/US1994/009801 WO1996007075A1 (fr) 1993-07-13 1994-08-29 Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction
JP50869096A JP3676371B2 (ja) 1994-08-29 1994-08-29 回析限界に近づくための現存の像形成装置の補正板補正

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/091,669 US5392119A (en) 1993-07-13 1993-07-13 Plate correction of imaging systems
PCT/US1994/009801 WO1996007075A1 (fr) 1993-07-13 1994-08-29 Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction

Publications (1)

Publication Number Publication Date
WO1996007075A1 true WO1996007075A1 (fr) 1996-03-07

Family

ID=26784217

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1994/009801 Ceased WO1996007075A1 (fr) 1993-07-13 1994-08-29 Correction de la plaque correctrice des systemes d'imagerie existants permettant d'approcher la limite de la diffraction

Country Status (1)

Country Link
WO (1) WO1996007075A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7283204B2 (en) 2002-12-10 2007-10-16 Carl Zeiss Smt Ag Method of producing an optical imaging system
DE102023115801A1 (de) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Projektionsobjektivs, Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
US5013133A (en) * 1988-10-31 1991-05-07 The University Of Rochester Diffractive optical imaging lens systems
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
US5013133A (en) * 1988-10-31 1991-05-07 The University Of Rochester Diffractive optical imaging lens systems
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7283204B2 (en) 2002-12-10 2007-10-16 Carl Zeiss Smt Ag Method of producing an optical imaging system
DE102023115801A1 (de) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Projektionsobjektivs, Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
WO2024256376A1 (fr) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Procédé de production d'un objectif de projection, objectif de projection, installation de lithographie par projection et procédé de lithographie par projection

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