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WO1995027998A1 - Installation a plasma - Google Patents

Installation a plasma Download PDF

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Publication number
WO1995027998A1
WO1995027998A1 PCT/DE1995/000487 DE9500487W WO9527998A1 WO 1995027998 A1 WO1995027998 A1 WO 1995027998A1 DE 9500487 W DE9500487 W DE 9500487W WO 9527998 A1 WO9527998 A1 WO 9527998A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
plasma device
partition
wall
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE1995/000487
Other languages
German (de)
English (en)
Inventor
Jeng-Ming Wu
Norbert SÜSSMUTH
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19949405808 external-priority patent/DE9405808U1/de
Application filed by Individual filed Critical Individual
Publication of WO1995027998A1 publication Critical patent/WO1995027998A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the invention relates to a plasma device with a plasma chamber in which a plasma can be generated by introducing electromagnetic energy.
  • Plasma devices are used, for example, for processing objects and materials, as ion beam sources or the like. It is known on an industrial scale to remove acetylene
  • Known plasma generators use the formation of an arc between two electrodes to produce the plasma, it being possible for magnetic field coils to influence the plasma formation. Also known is the electrodeless formation of a plasma inductively with high-frequency electromagnetic waves. With this method, a reasonably uniform formation of the plasma can be achieved in a small space, for example in a discharge tube.
  • the known plasma generators require considerable effort, which in many cases prevents the processing of objects and materials with the plasma for reasons of cost. Furthermore, it is not possible with the known plasma generators to achieve a reasonably uniform formation of the plasma in larger plasma chambers.
  • a rectangular waveguide with a high-frequency generator for generating high-frequency energy in the waveguide and with a side window for coupling out high-frequency energy
  • the distribution of the radio frequency energy transmitted through the partition into the plasma chamber being able to be influenced by a metal sheet provided with through-openings in the partition and / or by an adapted geometry of the transmission space.
  • the excitation energy for the plasma is generated by a high-frequency generator in a rectangular waveguide.
  • the radio-frequency energy preferably microwave energy
  • the transmission space extends parallel to the plasma chamber, so that the partition between the plasma chamber and the transmission space forms a large side wall for both.
  • the plasma chamber and transmission space are preferably of approximately the same length and the same width.
  • Radio frequency energy can be distributed over the width and length of the plasma chamber by a suitable distribution of the Through openings are controlled so that an uneven distribution of energy can be compensated.
  • the transmission space has an adapted geometry.
  • This geometry can be predefined.
  • the geometry of the transmission space is expediently adjustable, preferably by virtue of the fact that the wall of the transmission space opposite the partition can be displaced and / or its inclination can be adjusted relative to the partition.
  • the inclination of this wall over the width of the transmission chamber is designed such that the distance between the adjustable wall and the partition wall becomes smaller as the distance from the window increases, in order to compensate for an uneven energy distribution due to the differently long propagation paths.
  • the plasma chamber and the transfer space are essentially designed as rectangular spaces, apart from the possible inclination of the adjustable wall of the transfer space relative to the partition.
  • the partition preferably has a dielectric wall which delimits the plasma chamber, so that the plasma has no direct contact with the metallic sheet. Direct contact of the plasma with the metal sheet would release metal molecules which would contaminate the plasma.
  • the window between the waveguide and the transmission space can be formed with an effective opening area increasing with increasing distance from the high-frequency generator over the length of the waveguide, so as to enable uniform lateral energy decoupling regardless of the distance from the high-frequency generator.
  • the window can enlarge continuously in a wedge-shaped or discontinuous step-like manner, or can also have a plurality of through openings lined up with an increasing opening area.
  • the size of the plasma chamber can be changed with at least one movable, electrically conductive wall, which is particularly suitable for processing objects of different sizes.
  • the movable wall is preferably opposite the partition and can be designed as a lifting table.
  • the wall opposite the partition wall can be equipped with a large number of permanent magnets in a manner known per se.
  • the wall can alternatively be formed from at least one grid, so that the plasma chamber functions as an ion source.
  • the high-frequency generator operate in the pulse mode, the pulse frequency of the high-frequency generator being adjustable in order to enable simple power adjustment for the excitation energy of the plasma.
  • FIG. 1 - a section through a first embodiment of a plasma device according to the invention
  • Figure 3 - a side view of the device of Figure 2 with a different embodiment of the window
  • Figure 4 a side view according to Figure 3 with a further modification of the window
  • Figure 5 - a plan view of an embodiment of a metallic sheet between the transmission space and plasma chamber
  • Figure 6 - a plan view of another embodiment of the metallic sheet
  • FIG. 7 - a representation according to Figure 1 with an arrangement of permanent magnets on a wall of the plasma chamber
  • Figure 8 - a schematic representation of the arrangement of the permanent magnets according to Figure 7
  • FIG. 9 shows a representation according to FIG. 1 with the formation of a wall of the plasma chamber as a sieve to form an ion source.
  • Figure 1 shows a rectangular waveguide 1, which is delimited by metallic walls.
  • a window 2 In the longitudinal direction of the small side wall of the waveguide there is a window 2 through which a connection between the interior of the waveguide 1 and the interior of a cubic metallic housing 3 is established.
  • a transmission space 4 is formed which adjoins the interior of the waveguide 1 via the window 2 and is separated from a plasma chamber 6 by a partition wall 5 rotated through 90 ° to the plane of the window 2.
  • the partition 5 consists of a metal sheet 7 and a dielectric wall 8, which can be formed, for example, by an Al 2 O 3 ceramic or a quartz plate.
  • the transmission chamber 4 is delimited by a displaceable and adjustable metallic wall 9.
  • the metallic wall 9 is provided with four Adjusting rods 10 are connected, with which the metallic wall 9 can be adjusted both in terms of its distance and in terms of its inclination to the partition 5.
  • the plasma chamber 6 is delimited on the side opposite the partition by a metallic wall 11, which is designed to be displaceable parallel to the partition 5 and thus forms a lifting table 11 a.
  • the transmission space 4 is delimited by the walls of the cubic housing 3.
  • the plasma chamber 6, apart from the partition 5 and the metallic wall 11, is likewise delimited by the metallic walls of the cubic metallic housing 3.
  • FIG. 2 shows that a high-frequency generator 12 is arranged in the rectangular waveguide 1, the high-frequency energy which is emitted is laterally coupled out of the waveguide 1 via the window 2. Since the radio frequency energy of the
  • High-frequency generator 12 decreases at a distance from the high-frequency generator 12, in the exemplary embodiment shown in FIG. 2, the window 2 is widened in a wedge-shaped manner with increasing distance from the high-frequency generator 12, so that the greater the coupling of the high-frequency energy into the transmission space with increasing distance 4 to ensure.
  • the same effect is achieved by a stepwise widening of the window 2' with increasing distance from the high-frequency generator 12.
  • the window 2 ′′ serves to deliberately unevenly couple high-frequency energy into the transmission space 4, as a result of which, for example, a targeted weakening of the plasma can be carried out over the length of the arrangement.
  • the window ster 2 '' widens with increasing distance from the high-frequency generator 12 up to the middle of the length of the housing 3 in order to then narrow again symmetrically.
  • the high-frequency energy coupled out into the transmission space 4 enters the plasma chamber 6 through the partition 5 in order to ignite the plasma there.
  • the excitation energy is evened out with regard to the energy distribution by a suitable adjustment of the inclination of the adjustable metallic wall 9 with the aid of the adjusting rods 10.
  • the intensity of the energy introduced into the plasma chamber 6 can also be influenced by adjusting the wall 9.
  • the spatial distribution of the high-frequency energy introduced into the plasma chamber 6 is further influenced by the metal sheet 7, which for this purpose can be provided with systematically distributed through openings 13.
  • the through openings 13 are designed as circular openings 14, the openings 14 lying closer to the window 2 having a smaller diameter than the openings 14 which are respectively more distant. In this way, an uneven energy distribution can also be achieved due to the different long propagation paths.
  • the spatial distribution of the excitation energy for the plasma introduced into the plasma chamber can therefore be influenced in several ways, namely in the plasma device according to the invention
  • the high-frequency generator 12 is operated in pulse mode and its pulse frequency can be varied. In this way it is possible, for example, to provide only the lower excitation energy required for a plasma chamber 6 that is reduced in size by the lifting table 11 a.
  • FIGS. 7 and 8 show that the adjustable wall 11 of the plasma chamber can be provided with a multiplicity of permanent magnets 16, by means of which the ion density in the plasma chamber 6 can be increased and the ignition process can be facilitated in particular at low pressure in the plasma chamber 6 .
  • FIG. 8 shows a suitable distribution of the permanent magnets 16 on the underside of the wall 11.
  • the wall 11 'of the plasma chamber 6 from grid consists * walls and allows the passage of ions, so that the plasma chamber 6 acts asforementioned ⁇ area ion source.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

L'invention concerne une installation à plasma qui comprend une chambre (6) dans laquelle un plasma peut être produit par introduction d'une énergie électromagnétique. Une structure simple et une diffusion contrôlée du plasma sont obtenues grâce au fait que cette installation comporte: un guide d'ondes (1) rectangulaire comportant un générateur de hautes fréquences (12) qui produit de l'énergie haute fréquence dans ledit guide d'ondes, et une fenêtre latérale (2, 2', 2') pour faire sortir l'énergie haute fréquence, une chambre de transfert (4) raccordée latéralement au guide d'ondes (1) et reliée à lui par l'intermédiaire de la fenêtre (2, 2', 2'), et s'étendant parallèlement à la chambre à plasma (6), et une cloison de séparation (5) située entre la chambre de transfert (4) et la chambre à plasma (6). La diffusion de l'énergie haute fréquence transférée dans la chambre à plasma (6) par la cloison de séparation (5) peut être modulée à l'aide d'une plaque de métal (7) pourvue d'ouvertures de passage (13), située dans la cloison de séparation (5) et/ou grâce à une configuration géométrique appropriée de la chambre de transfert (4).
PCT/DE1995/000487 1994-04-11 1995-04-08 Installation a plasma Ceased WO1995027998A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DEG9405808.3U 1994-04-11
DE19949405808 DE9405808U1 (de) 1994-04-11 1994-04-11 Plasma-Bearbeitungsgerät
DE4431785A DE4431785A1 (de) 1994-04-11 1994-09-07 Plasmagerät
DEP4431785.9 1994-09-07

Publications (1)

Publication Number Publication Date
WO1995027998A1 true WO1995027998A1 (fr) 1995-10-19

Family

ID=25939892

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1995/000487 Ceased WO1995027998A1 (fr) 1994-04-11 1995-04-08 Installation a plasma

Country Status (1)

Country Link
WO (1) WO1995027998A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112074071A (zh) * 2020-10-05 2020-12-11 四川大学 一种多路微波源的大功率等离子体发生装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0183561A2 (fr) * 1984-11-30 1986-06-04 Fujitsu Limited Appareil et procédé de traitement à plasma à micro-ondes
EP0382065A2 (fr) * 1989-02-08 1990-08-16 Hitachi, Ltd. Appareil de traitement par plasma
DE4008195A1 (de) * 1990-03-15 1991-09-26 Fraunhofer Ges Forschung Vorrichtung zur anregung des gases einer gasentladungsstrecke mit mikrowellenenergie
EP0480273A1 (fr) * 1990-10-06 1992-04-15 Röhm Gmbh Radiateur à micro-ondes
EP0564082A1 (fr) * 1992-03-30 1993-10-06 Daihen Corporation Appareil de traitement à plasma pour générer un plasma uniforme en forme de bande
DE9405808U1 (de) * 1994-04-11 1994-06-09 Süßmuth, Norbert, Dipl.-Ing., 38106 Braunschweig Plasma-Bearbeitungsgerät

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0183561A2 (fr) * 1984-11-30 1986-06-04 Fujitsu Limited Appareil et procédé de traitement à plasma à micro-ondes
EP0382065A2 (fr) * 1989-02-08 1990-08-16 Hitachi, Ltd. Appareil de traitement par plasma
DE4008195A1 (de) * 1990-03-15 1991-09-26 Fraunhofer Ges Forschung Vorrichtung zur anregung des gases einer gasentladungsstrecke mit mikrowellenenergie
EP0480273A1 (fr) * 1990-10-06 1992-04-15 Röhm Gmbh Radiateur à micro-ondes
EP0564082A1 (fr) * 1992-03-30 1993-10-06 Daihen Corporation Appareil de traitement à plasma pour générer un plasma uniforme en forme de bande
DE9405808U1 (de) * 1994-04-11 1994-06-09 Süßmuth, Norbert, Dipl.-Ing., 38106 Braunschweig Plasma-Bearbeitungsgerät

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112074071A (zh) * 2020-10-05 2020-12-11 四川大学 一种多路微波源的大功率等离子体发生装置

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