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WO1993020035A1 - Process for producing cyclopropane derivative - Google Patents

Process for producing cyclopropane derivative Download PDF

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Publication number
WO1993020035A1
WO1993020035A1 PCT/JP1993/000414 JP9300414W WO9320035A1 WO 1993020035 A1 WO1993020035 A1 WO 1993020035A1 JP 9300414 W JP9300414 W JP 9300414W WO 9320035 A1 WO9320035 A1 WO 9320035A1
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formula
compound represented
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reaction
compound
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French (fr)
Japanese (ja)
Inventor
Tsutomu Inoue
Mitsumasa Takata
Tatsumi Suzuki
Kenji Saito
Keiichi Ishimitsu
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Nippon Soda Co Ltd
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Nippon Soda Co Ltd
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Priority claimed from JP11065892A external-priority patent/JP3171277B2/en
Priority claimed from JP4118334A external-priority patent/JPH05286888A/en
Priority claimed from JP2363693A external-priority patent/JPH06211780A/en
Application filed by Nippon Soda Co Ltd filed Critical Nippon Soda Co Ltd
Publication of WO1993020035A1 publication Critical patent/WO1993020035A1/en
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00Sulfones; Sulfoxides
    • C07C317/24Sulfones; Sulfoxides having sulfone or sulfoxide groups and doubly-bound oxygen atoms bound to the same carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00Sulfones; Sulfoxides
    • C07C317/44Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton
    • C07C317/46Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton the carbon skeleton being further substituted by singly-bound oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385Saturated compounds containing a keto group being part of a ring
    • C07C49/417Saturated compounds containing a keto group being part of a ring polycyclic
    • C07C49/423Saturated compounds containing a keto group being part of a ring polycyclic a keto group being part of a condensed ring system
    • C07C49/427Saturated compounds containing a keto group being part of a ring polycyclic a keto group being part of a condensed ring system having two rings
    • C07C49/433Saturated compounds containing a keto group being part of a ring polycyclic a keto group being part of a condensed ring system having two rings the condensed ring system containing seven carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/657Unsaturated compounds containing a keto groups being part of a ring containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/782Ketones containing a keto group bound to a six-membered aromatic ring polycyclic
    • C07C49/792Ketones containing a keto group bound to a six-membered aromatic ring polycyclic containing rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C62/00Compounds having carboxyl groups bound to carbon atoms of rings other than six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C62/18Saturated compounds containing keto groups
    • C07C62/24Saturated compounds containing keto groups the keto group being part of a ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/757Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety

Definitions

  • the present invention relates to a method for producing a cyclopropane derivative useful as a herbicide.
  • JP-A-5-70426 describes that the following cyclopropane derivatives are useful as herbicides.
  • G 1 represents a lower alkyl, an optionally substituted phenyl, an optionally substituted aralkyl, or an optionally substituted heterocycle.
  • G 2 is the same or different and represents a halogen, an alkoxy, an alkylthio, an alkylsulfonyl, an alkyl, an alkoxyalkyl, an alkoxycarbonyl, and n is 0-4.
  • G 3 and are the same or different and represent hydrogen or lower alkyl.
  • a stereoisomer exists between the substituent at the 5-position and the cyclic propane ring in the bicycling portion of the synthetic propane derivative.
  • C1CH 2 CH CHC0CH 3 was an unstable substance, and had problems in the control of the reaction and the yield fluctuation.
  • COCHaCHClCHiiCl is unstable and difficult to isolate.
  • references describing reactions related to the reactions D and E include WO91 / 02026, WO92 / 13821, and JP-A-4-24. 7053 and JP-A-5-704426.
  • WO91 / 02026, WO92 / 13821, and JP-A-4-24. 7053 and JP-A-5-704426 are cis.
  • the present invention provides a method for producing a desired cyclopropane derivative in high yield and high purity.
  • the present invention comprises the steps of the following reactions A to G;
  • R 1 represents an alkyl group
  • R 2 represents an optionally substituted phenyl group, an optionally substituted aralkyl group or an optionally substituted heterocyclic ring.
  • X ⁇ and X 2 are the same or different and represent a halogen atom
  • R 1 , R 3 R 4 and R 5 represent the same or different and represent hydrogen or alkyl.
  • a solvent using methylene chloride, black hole Holm, Jikuroroetan, an inert solvent such as nitrobenzene, as a catalyst, A l C l 3, A l B r 3, S nC l 4, TIC 1
  • the reaction is carried out at a temperature of from 120 ° C to the boiling point of the solvent, preferably from 0 ° C to room temperature.
  • an inert solvent such as methylene chloride, ether, or BTX is used as a solvent
  • an organic base such as DBU, a base such as potassium carbonate, sodium carbonate, sodium ethylate, and potassium ethylate are used as bases.
  • the reaction is carried out at a temperature of from 120 ° C. to the boiling point of the solvent, preferably from 0 ° C. to room temperature, using an inorganic base such as a metal alcohol such as a metal alcoholate. It can also be obtained by a two-phase reaction using a catalyst such as BTEC and a hydroxylation power, sodium hydroxide or the like as a base.
  • R 1 , R 3 and R 4 have the same meanings as described above (The reaction is carried out using a cyclopropane derivative represented by the formula [V] in the presence of a base in a suitable solvent.
  • alcohols such as methanol and ethanol, DMF or a mixed solvent thereof, and as a base, a sodium alcohol or a potassium alcohol is used.
  • the reaction is carried out at room temperature to 150 ° C., preferably at the boiling point of the alcohol used.
  • the amount of the base is 1 to 5 moles, preferably 1 to 2 moles, per mole of the cyclopropane derivative.
  • R 1 , R 2 , and R 3 have the same meanings as described above, and L ′ represents a leaving group such as halogen, alkylcarbonyloxy, alkoxycarbonyloxy, and benzoyloxy.
  • the compound [V [-1] or [VI-2] and the compound IW] are reacted in a solvent in the presence of an equimolar or excess base.
  • Bases et al used KOH, N a 0 an alkali metal hydroxide such as H, an alkaline earth metal hydroxide, tri (C, one C 6 alkyl) ⁇ Mi emissions, pyridinium Jin, carbonate sodium phosphate Sodium, methylene chloride, methylene chloride, chloroform, toluene, ethyl acetate, dimethylformamide, THF, dimethoxetane, acetonitrile and the like.
  • the reaction mixture is stirred at 0 ° C to 50 ° C until the reaction is completed. It can also be obtained by reacting in a two-phase system using a phase transfer catalyst such as BTEAC.
  • the latter rearrangement is carried out in the presence of a cyano compound and a mild base.
  • the above compound [XI-1] or compound [XI-2] can be prepared by, for example, converting 1 mol of the compound [X1 ⁇ 1] or compound [XI-2] to 1 to 4 mol of a base, preferably 1 to 2 mol.
  • the reaction is carried out with 0.1 mol of the base and 0.1 mol to 0.5 mol or more, preferably 0.1 mol.
  • the base used here any of the above bases can be used.
  • the cyano compound a polymer holding lithium cyanide, acetate cyanohydrin, hydrogen cyanide, or potassium cyanide is used.
  • the reaction is completed in a shorter time by adding a small amount of a phase transfer catalyst such as a crown ether.
  • a phase transfer catalyst such as a crown ether.
  • the reaction is carried out at a temperature lower than 80 ° C, preferably at 20 ° C to 40 ° C.
  • Solvents used are 1,2-dichloroethane, toluene, acetonitril, methylene chloride, ethyl acetate, Examples include dimethylformamide, methylisobutyl ketone, THF, and dimethoxyethane.
  • the reaction in the first half can be obtained by reacting compound [VI-1] or ["VI-2"] with compound [''! "] In a solvent with an equimolar or excess of dicyclohexylcarpoimide (DCC).
  • DCC dicyclohexylcarpoimide
  • reaction mixture is stirred at 0 ° C to 50 ° C until the reaction is completed.
  • R 2 has the same meaning as described above, and X represents a halogen atom.
  • the compound of formula [XI] is reacted with cyanide in an inert solvent in the presence of a catalyst.
  • the inert solvent include BTX solvents such as benzene and toluene, and halogenated hydrocarbons such as methylene chloride and chloroform.
  • BTX solvents such as benzene and toluene
  • halogenated hydrocarbons such as methylene chloride and chloroform.
  • cyanide for example, trialkylsilyl cyanide can be cited (Reference: Synthesis, 1979,
  • the compound represented by the formula [ ⁇ ] is reacted with a cyanide under an inert gas atmosphere at 140 to 200 ° C., preferably at I 50 to 170.
  • cyanide include copper (I) cyanide, mercury cyanide, silicon
  • inert gas include nitrogen gas (reference: Angew. Chem., 68, 425 (1956)).
  • phase transfer catalyst examples include sodium cyanide and potassium cyanide, and examples of the inert solvent include solvents such as benzene and toluene, and halogenated hydrocarbons such as methylene chloride and chloroform.
  • phase transfer catalyst examples include ammonium salts, phosphonium salts, and crown ethers, which are known as phase transfer catalysts (Reference: Tetrahedron Lett., 1979, 22775).
  • the compound represented by the formula [XI] is reacted with a cyanide in an inert solvent in the presence of a phase transfer catalyst at 50 to 100 ° C, preferably 70 to 90 ° C.
  • a phase transfer catalyst at 50 to 100 ° C, preferably 70 to 90 ° C.
  • the cyanide include copper cyanide (1), sodium cyanide, and potassium cyanide.
  • the inert solvent include DMF, DMSO, and acetonitrile, and preferably acetonitrile.
  • the phase transfer catalyst include ammonium salts, phosphonium salts, and crown ethers, which are known as phase transfer catalysts.
  • the compound represented by the formula [W ′ ′′] reacts with the compound represented by the formula [XIII] by the following reaction to produce the compound represented by the formula [XIV] in high yield.
  • R 2 has the same meaning as described above, and A represents an optionally substituted 5- to 7-membered carbocyclic ring or an optionally substituted 5- to 7-membered heterocyclic ring containing N, 0 or S.
  • the reaction is carried out by heating an equimolar mixed solution of ['] and [XIE] and a base.
  • the base include pyridine, triethylamine, DB ⁇ ⁇ ⁇ and the like.
  • the solvent methylene chloride, chloroform, acetonitrile, toluene and the like are used, and the reaction is carried out from room temperature to the boiling point of these solvents.
  • the compound represented by the formula (xm) is, for example,
  • R e , R 7 , R 8 , R 0, R 10 v R 11 are the same or different and are each independently a halogen atom, an optionally substituted alkyl group, an alkoxycarbonyl group, or an optionally substituted It represents a good alkenyl group or a phenyl group which may be substituted, and may form a 3- to 7-membered carbon ring which may be substituted by R 7 and R 8 .
  • R I2, R I3, R 14 , R 15 taken same or different from and represent hydrogen or lower alkyl.
  • R 16 represents hydrogen.
  • R 17 represents OR 18 , R 18 represents hydrogen, lower alkyl, aralkyl, lower acetyl-alkylsulfonyl, arylsulfonyl, or R 16 and R 17 may together represent a single bond.
  • Z represents oxygen, sulfur or N—R 19 , where R 18 is hydrogen, lower alkyl, optionally substituted aralkyl, optionally substituted cycloalkyl, optionally substituted phenyl, Or a heterocyclic ring which may be substituted.
  • Oxidation reaction When an alkylthio group is present in the compound [xw], it can be converted into an alkylsulfonyl group in high yield by oxidation.
  • the reaction is performed by a usual oxidation reaction.
  • the reaction is carried out by heating at least twice the molar amount of hydrogen peroxide and the compound [XIV] using sodium tungstate as a catalyst.
  • the solvent water, alcohols, or a mixed solvent thereof is used, and the reaction is carried out at a temperature other than 100 or the boiling point of these solvents.
  • R 1 , R 2 and R 3 have the same meanings as described above, and M represents a metal atom.
  • Metal atoms are alkali metals and alkaline earth metals.
  • As the solvent hydrolyzed using alcohol, water, and preferably from room temperature a mixture thereof is used to the boiling point of the solvent at room temperature N a 0 H, KOH, alkali etc. Na 2 C0 3. K 2 C 03 . Reaction ::
  • R 1 and R 2 have the same meaning as described above.
  • the reaction is carried out in a solvent in the presence of an organic acid.
  • organic acid acetic acid-formic acid, propionic acid, citric acid and the like are used, and water, alcohols and the like are used as solvents, and the reaction temperature is preferably around room temperature.
  • R 1 , R 2 and ⁇ have the same meanings as described above.
  • reaction G is carried out by adjusting the solution to an acidic or neutral condition with an acid (usually, the reaction solution of the reaction D is used as it is.
  • the acid is an inorganic acid such as hydrochloric acid, sulfuric acid or the like. Is fine.
  • R 1 and R 2 have the same meaning as described above.
  • the reaction is performed in a solvent in the presence of a base.
  • a base an organic salt group such as ammonia, (C, -C) alkylamine, di (C, -C) alkylamine, tri (C, -C) alkylamine, pyridine, or DBU is used.
  • the reaction is carried out in an organic solvent such as alcohols, ethers and THF under cooling to the boiling point of the solvent, preferably at room temperature.
  • the synthesized compound was identified by NMR, IR, MS and the like.
  • the compounds according to the present invention include a number of tautomeric forms, for example,
  • the filtrate was further separated by silica gel chromatography to obtain 8.1 g of the E-form and 27.8 g of the Z-form [cis-ethoxycarbonyl trans-methyl-form Z-cyclopropane pan; the same applies hereinafter).
  • 0.2 ml of tin tetrachloride was added to 50 ml of a methylene chloride solution of 2.6 g of 2-methyl-4-methylsulfonyl-3-cyclomethoxybenzoic acid chloride and 1.1 g of trimethylsilyl cyanide. It was added at room temperature under a nitrogen atmosphere. After stirring for 20 hours, the reaction solution was poured into water. The aqueous layer was separated, and the organic layer was washed twice with 50 ml of water, and then dried and concentrated to obtain a crude product of 3-methoxy-2-methyl-4-mesylbenzoyl cyanide.
  • Triethylamine was added to a solution of this crude product and 1.2 g of t.rans-5-ethoxycarboxyl cis-5-methyl-12-bicyclo [4.1.0] heptene-12,4-dione in 20 ml methylene chloride. 0.9 ml was added. After stirring the reaction mixture at room temperature for 5 hours, it was poured into 1N hydrochloric acid. The aqueous layer was separated, and the organic layer was washed with saturated saline. After drying and concentration, the residue was purified by silica gel column chromatography (eluent: hexane monoacetate) to obtain 1.2 g of the target compound (E-form).
  • Triethylamine ⁇ .8 was added to 2.49 g and 0.83 g of methylene chloride solution, respectively, and then 2-methyl-14-methylsulfonyl-3-methoxybenzoic acid chloride 4.2 g of methylene chloride solution 1 was added to this solution. 0 ml was added dropwise at 10 ° C for 0.1 hour. After stirring at room temperature for 2 hours, the mixture was poured into 1N hydrochloric acid and the organic layer was separated. After washing sequentially with water and a saturated aqueous sodium chloride solution, the mixture was dried over magnesium sulfate and concentrated to obtain 6.9 g of a mixture of E-form and Z-form of 0-acyl form.
  • the herbicide represented by the formula (I) can be obtained in high yield and high purity irrespective of the configuration of the compound obtained in the course of the process.
  • Compounds obtained on the way can be intermediates for agricultural chemicals, etc.

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  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A process for producing a compound represented by general formula[I] according to scheme (A), wherein R1 represents alkyl; R2 represents alkyl, optionally substituted phenyl, optionally substituted aralkyl or optionally substituted heterocycle; R?3 and R4¿ represent each alkyl; X?1 and X2¿ represent each halogen; L represents a leaving group; and M represents a metal atom.

Description

明 細 書  Specification

シクロプロパン誘導体の製造法  Method for producing cyclopropane derivative

技術分野: Technical field:

本発明は、 除草剤として有用なシクロプロパン誘導体の製造法に関 する。  The present invention relates to a method for producing a cyclopropane derivative useful as a herbicide.

技術背景: Technical background:

W 0 9 1 / 0 0 2 6 0、 特開平 5— 7 0 4 2 6には、 下記のシクロ プロパン誘導体が除草剤として有用であることが記載されている。  W091 / 0260, JP-A-5-70426 describes that the following cyclopropane derivatives are useful as herbicides.

Figure imgf000003_0001
Figure imgf000003_0001

〔式中、 G 1 は、 低級アルキル、 置換されてもよいフヱニル、 置換さ れてもよぃァラルキル、 又は置換されてもよい複素環を表す。 G 2 は、 同一又は相異なって、 ハロゲン、 アルコキシ、 アルキルチオ、 アルキ ルスルホニル、 アルキル、 アルコキシアルキル、 アルコキシカルボ二 ルを表し、 . nは 0〜 4である。 G 3 及び は同一又は相異なって、 水素又は低級アルキルを表す。 〕 [In the formula, G 1 represents a lower alkyl, an optionally substituted phenyl, an optionally substituted aralkyl, or an optionally substituted heterocycle. G 2 is the same or different and represents a halogen, an alkoxy, an alkylthio, an alkylsulfonyl, an alkyl, an alkoxyalkyl, an alkoxycarbonyl, and n is 0-4. G 3 and are the same or different and represent hydrogen or lower alkyl. ]

このシク口プロパン誘導体のビシク口部のシク口プロパン環と 5位 の置換基との間には、 立体異性体が存在する。  A stereoisomer exists between the substituent at the 5-position and the cyclic propane ring in the bicycling portion of the synthetic propane derivative.

5位の置換基がアルキルの場合、 シクロプロパン環と 5位のアルキ ルが c i sである誘導体の方が選択性除草剤としての特性が優れるこ とから、 c i s体を合成することは、 実用上有用なことである。  When the substituent at the 5-position is alkyl, derivatives having a cyclopropane ring and an alkyl at the 5-position as cis have better properties as a selective herbicide. It is useful.

本発明に用いられる反応 A (後述) に関連する反応を記載した文献 と して下記のものがある。  The following literature describes reactions related to reaction A (described below) used in the present invention.

W 0 9 2 1 3 8 2 1には、 次の製造法が開示されている。 ' CH3 CH (COO C2 H5)2 C 1 C H2 CH = CHCOCH3 W 0 921 3 8 2 1 discloses the following production method. 'CH 3 CH (COO C 2 H 5 ) 2 C 1 CH 2 CH = CHCOCH 3

N a 0 r  N a 0 r

Figure imgf000004_0001
上記反応においては、 C1CH2CH=CHC0CH3 は不安定な物質であり、 反 応のコントロールおよび収率のフレなどに問題を持っていた。
Figure imgf000004_0001
In the above reaction, C1CH 2 CH = CHC0CH 3 was an unstable substance, and had problems in the control of the reaction and the yield fluctuation.

又、 Tezioy, Dokl. J. 3rd 1978, 6-8 には次の記載がある。  The following is described in Tezioy, Dokl. J. 3rd 1978, 6-8.

riCOCl + CH2=CHCH2Cl —— - rjCOCHzCHClCHzCl

Figure imgf000004_0002
riCOCHzCHCHzClriCOCl + CH 2 = CHCH 2 Cl ——-rjCOCHzCHClCHzCl
Figure imgf000004_0002
riCOCHzCHCHzCl

Figure imgf000004_0003
しかし、 実際には COCHaCHClCHiiCl は不安定であり、 単離すること は困難である。
Figure imgf000004_0003
However, in practice, COCHaCHClCHiiCl is unstable and difficult to isolate.

また、 本発明に用いられる反応 B (後述) に関連する反応を記載し た文献として W09 1 3 8 2 1があり、 反応 C (後述) に関連す る反応を記載した文献として、 US P 4 6 9 5 6 7 3、 特開平 4 - 2 4 7 0 5 3、 US P 4 7 8 0 1 2 7、 US P 4 9 4 6 9 8 U S P 5 0 8 5 6 8 8がある。 これらの中では、 置換べンゾィルシアナイ ド を用いる場合には触媒として Z n C 12 を用いている。 In addition, there is W0913821 as a document describing a reaction related to reaction B (described later) used in the present invention, and USP4 is described as a document describing a reaction related to reaction C (described below). 6995673, Japanese Patent Laid-Open No. 4-247053, US Pat. No. 4,780,127, US Pat. Among these, in the case of using the substituted base Nzoirushianai de uses a Z n C 1 2 as catalyst.

本発明に用いられる反応 D, E (後述) に関連する反応を記載した 文献としては、 WO 9 1ノ 0 0 2 6 0、 WO 9 2ノ 1 3 8 2 1、 特開 平 4— 2 4 7 0 5 3、 特開平 5— 7 0 4 2 6がある。 これらの中で、 シクロプロパン誘導体のシクロプロパン環と 5位のアルキルが c i s である原料化合物から c ί s体の目的物を得るには、 脱炭酸時塩酸等 により H調整することにより行われていたが、 7員環が副生する問 題があつた。 References describing reactions related to the reactions D and E (described below) used in the present invention include WO91 / 02026, WO92 / 13821, and JP-A-4-24. 7053 and JP-A-5-704426. Among these, to obtain the target compound in the form of c 原料 s from the starting compound in which the cyclopropane ring of the cyclopropane derivative and the alkyl at position 5 are cis, it is necessary to add hydrochloric acid during decarboxylation. However, there was a problem that a seven-membered ring was produced as a by-product.

本発明は、 目的とするシク口プロパン誘導体を高収率高純度で得る 製造法を提供するものである。  The present invention provides a method for producing a desired cyclopropane derivative in high yield and high purity.

発明の開示 : Disclosure of the invention:

本発明は、 下記の反応 A〜Gの工程を経ることよりなる、 式 〔 I〕  The present invention comprises the steps of the following reactions A to G;

〔 I )

Figure imgf000005_0001
(I)
Figure imgf000005_0001

〔式中、 R1 はアルキル基を表し、 R2 はアルキル基置換されてもよ いフエニル基、 置換されてもよいァラルキル基又は置換されてもよい 複素環を表す。 〕 で表わされる化合物の製造法である。 [In the formula, R 1 represents an alkyl group; R 2 represents an optionally substituted phenyl group, an optionally substituted aralkyl group or an optionally substituted heterocyclic ring. ] It is a manufacturing method of the compound represented by these.

反応 A : Reaction A:

CHz^CHCHzX1 + R5CH2C0X2 CHz ^ CHCHzX 1 + R 5 CH 2 C0X 2

〔H〕 〔ΠΓ 〕  [H] [ΠΓ]

CR'CHzCOCHzCHX^HzX1CR'CHzCOCHzCHX ^ HzX 1 )

第 1工程  1st step

Figure imgf000005_0002
式中、 X〗 、 X2 は同一又は相異なってハロゲン原子、 R1 、 R3 R4 、 R5 は同一又は相異なって水素又はアルキルを示す。 第一工程においては、 溶媒として、 塩化メチレン、 クロ口ホルム、 ジクロロェタン、 ニトロベンゼンなどの不活性溶媒を用い、 触媒とし て、 A l C l 3 、 A l B r 3 、 S nC l 4 、 T I C 14 等のルイス酸 の存在下で、 反応温度は一 2 0 °C〜溶媒の沸点まで、 好ましく は 0 °C 〜室温までで行われる。
Figure imgf000005_0002
In the formula, X〗 and X 2 are the same or different and represent a halogen atom, and R 1 , R 3 R 4 and R 5 represent the same or different and represent hydrogen or alkyl. In the first step, as a solvent, using methylene chloride, black hole Holm, Jikuroroetan, an inert solvent such as nitrobenzene, as a catalyst, A l C l 3, A l B r 3, S nC l 4, TIC 1 In the presence of a Lewis acid such as 4 , the reaction is carried out at a temperature of from 120 ° C to the boiling point of the solvent, preferably from 0 ° C to room temperature.

第二工程は、 溶媒として、 塩化メチレン、 エーテル、 B TX等の不 活性溶媒を用い、 塩基として D BU等の有機塩基、 炭酸力リウム、 炭 酸ナトリウム、 ナトリウムェチラ一ト、 カリウムェチラートなどの金 属アルコラ一ト等の無機塩基、 好ましくは金属アルコラ一トを用い、 反応温度は一 2 0 °C〜溶媒の沸点まで、 好ましくは 0 °C〜室温までで 行われる。 又、 B TE AC等の栢間移動触媒を用い、 また塩基として 水酸化力リゥム、 水酸化ナトリゥム等を用いて二相系で反応させるこ とによっても得られる。  In the second step, an inert solvent such as methylene chloride, ether, or BTX is used as a solvent, and an organic base such as DBU, a base such as potassium carbonate, sodium carbonate, sodium ethylate, and potassium ethylate are used as bases. The reaction is carried out at a temperature of from 120 ° C. to the boiling point of the solvent, preferably from 0 ° C. to room temperature, using an inorganic base such as a metal alcohol such as a metal alcoholate. It can also be obtained by a two-phase reaction using a catalyst such as BTEC and a hydroxylation power, sodium hydroxide or the like as a base.

反応 B : Reaction B:

Figure imgf000006_0001
式中、 R1 、 R3 、 R4 は前記と同じ意味を示す ( 反応は式 〔V〕 で表わされるシクロプロパン誘導体を塩基の存在下、 適当な溶剤中で行なわれる。
Figure imgf000006_0001
In the formula, R 1 , R 3 and R 4 have the same meanings as described above ( The reaction is carried out using a cyclopropane derivative represented by the formula [V] in the presence of a base in a suitable solvent.

溶剤と してはメ タノール、 エタノール等のアルコール類、 D M Fま たはそれらの混合溶媒、 塩基と しては、 それらのナ ト リ ウムアルコラ 一トまたは力 リ ゥムアルコラ一卜が用いられる。  As a solvent, alcohols such as methanol and ethanol, DMF or a mixed solvent thereof, and as a base, a sodium alcohol or a potassium alcohol is used.

反応温度は室温から 1 5 0 °C、 好ま しく は用いたアルコールの沸点 で行う。  The reaction is carried out at room temperature to 150 ° C., preferably at the boiling point of the alcohol used.

塩基の量はシク口プロパン誘導体の 1〜 5倍モル、 好ま しく は 1〜 2倍モル用いる。 The amount of the base is 1 to 5 moles, preferably 1 to 2 moles, per mole of the cyclopropane derivative.

反応 C : Reaction C:

じ COR2 CW 〕

Figure imgf000008_0001
J COR 2 CW]
Figure imgf000008_0001

じ COR2 〔W' 〕

Figure imgf000008_0002
J COR 2 [W ']
Figure imgf000008_0002

式中、 R1 、 R2 、 R3 は前記と同じ意味を示し、 L' はハロゲン、 アルキルカルボニルォキシ、 アルコキシカルボニルォキシ、 ベンゾィ ルォキシ等の脱離基を意味する。 In the formula, R 1 , R 2 , and R 3 have the same meanings as described above, and L ′ represents a leaving group such as halogen, alkylcarbonyloxy, alkoxycarbonyloxy, and benzoyloxy.

ルー ト 1 : 〔VI— 1〕 → 〔XI_ 1〕 → 〔 [一 1〕 又は 〔VI— 2〕 → [XI- 2 ] → 〔«— 2〕 Route 1: [VI-1] → [XI_1] → [[1-1] or [VI-2] → [XI-2] → [«-2]

前半の反応は、 溶媒中、 化合物 〔V [— 1〕 又は 〔VI— 2〕 と化合物 IW 〕 とを、 等モル又は過剰の塩基の存在下に反応させる。 用いら れる塩基は、 KOH、 N a 0 H等のアルカリ金属水酸化物、 アルカリ 土類金属の水酸化物、 トリ (C , 一 C6 アルキル) ァミ ン、 ピリ ジン 、 炭酸ナト リウム、 燐酸ナト リゥム等であり、 溶媒としては、 水、 塩 ィ匕メチレン、 クロ口ホルム、 トルエン、 酢酸ェチル、 ジメチルホルム アミ ド、 THF、 ジメ トキシェタン、 ァセトニト リル等が用いられる 。 反応混合物は反応が完了するまで 0 °C~ 5 0 °Cで攪拌される。 又、 B T E A C等の相間移動触媒を用いて、 二相系で反応させることによ つても得られる。 In the first half of the reaction, the compound [V [-1] or [VI-2] and the compound IW] are reacted in a solvent in the presence of an equimolar or excess base. Bases et al used, KOH, N a 0 an alkali metal hydroxide such as H, an alkaline earth metal hydroxide, tri (C, one C 6 alkyl) § Mi emissions, pyridinium Jin, carbonate sodium phosphate Sodium, methylene chloride, methylene chloride, chloroform, toluene, ethyl acetate, dimethylformamide, THF, dimethoxetane, acetonitrile and the like. The reaction mixture is stirred at 0 ° C to 50 ° C until the reaction is completed. It can also be obtained by reacting in a two-phase system using a phase transfer catalyst such as BTEAC.

後半の転位反応はシァノ化合物及び緩和な塩基の存在下で行われる。 上述の化合物 〔XI— 1〕 又は化合物 〔XI— 2〕 を、 例えば、 1モルの 化合物 〔X1^ 1〕 又は化合物 〔XI— 2〕 を 1 ~ 4モルの塩基、 好まし く は 1〜 2モルの塩基及び 0. 0 1モルから 0. 5モル以上、 好ましく は 0. 1モルのシァノ化合物と反応させる。 ここで用いられる塩基は前記 の塩基がいずれも用いられ得る。 又シァノ化合物としてはシアン化力 リ ウム、 アセ ト ンシアンヒ ドリ ン、 シアン化水素、 シアン化カ リ ウム を保持したポリマー等が用いられる。  The latter rearrangement is carried out in the presence of a cyano compound and a mild base. The above compound [XI-1] or compound [XI-2] can be prepared by, for example, converting 1 mol of the compound [X1 ^ 1] or compound [XI-2] to 1 to 4 mol of a base, preferably 1 to 2 mol. The reaction is carried out with 0.1 mol of the base and 0.1 mol to 0.5 mol or more, preferably 0.1 mol. As the base used here, any of the above bases can be used. Further, as the cyano compound, a polymer holding lithium cyanide, acetate cyanohydrin, hydrogen cyanide, or potassium cyanide is used.

尚、 少量のクラウンエーテル等の相間移動触媒を加えることにより、 反応がより短い時間で完結する。 反応は 8 0 °Cより低い温度、 好まし く は 2 0 °C~ 4 0 °Cで行われる。 用いられる溶媒は、 1 , 2—ジクロ ロェタ ン、 トルエン、 ァセ トニ ト リル、 塩化メチレン、 酢酸ェチル、 ジメチルホルムアミ ド、 メチルイソプチルケ トン、 THF、 ジメ トキ シエタン等である。 The reaction is completed in a shorter time by adding a small amount of a phase transfer catalyst such as a crown ether. The reaction is carried out at a temperature lower than 80 ° C, preferably at 20 ° C to 40 ° C. Solvents used are 1,2-dichloroethane, toluene, acetonitril, methylene chloride, ethyl acetate, Examples include dimethylformamide, methylisobutyl ketone, THF, and dimethoxyethane.

ルート 2 : C E- 1〕 → 〔XI— 1〕 → 〔舊一 1〕 又は 〔VI— 2〕 → CXI- 2〕 → 〔 [― 2〕 Route 2: CE-1] → [XI-1] → [old 1] or [VI-2] → CXI-2] → [[-2]

前半の反応は、 溶媒中、 化合物 〔VI— 1〕 又は 〔"VI - 2〕 と化合物 〔¾!''〕 とを当モル又は過剰のジシクロへキシルカルポジイ ミ ド (D C C) と反応させることによって得られる。  The reaction in the first half can be obtained by reacting compound [VI-1] or ["VI-2"] with compound [''! "] In a solvent with an equimolar or excess of dicyclohexylcarpoimide (DCC). Can be

D C Cとの反応に於て用いられる溶媒としては、 塩化メチレン、 ト ルェン、 酢酸ェチル、 ジメチルホルムアミ ド、 THF、 ジメ トキシェ タン、 ァセトニトリル等が用いられる。 反応混合物は反応が完了する まで 0°C〜5 0°Cで攪拌される。  As a solvent used in the reaction with DCC, methylene chloride, toluene, ethyl acetate, dimethylformamide, THF, dimethoxetane, acetonitrile and the like are used. The reaction mixture is stirred at 0 ° C to 50 ° C until the reaction is completed.

後半の転位反応は前記と同様に行なう。  The rearrangement reaction in the latter half is performed in the same manner as described above.

ルート 3 ; 〔VI— 1〕 → 〔覆— 1〕 又は 〔^一 2〕 → 〔舊— 2〕 式 〔孤 ''' 〕 で表わされる化合物は次に示す方法によって製造され る。 Route 3; [VI-1] → [cover-1] or [^ 1 2] → [old-2] The compound represented by the formula [lone '' '] is produced by the following method.

X C 0 R 2 —— - NC COR2 XC 0 R 2 ——-NC COR 2

〔XII〕 〔11',' 〕  [XII] [11 ',']

式中、 R2 は前記と同じ意味を表し、 Xはハロゲン原子を表す。In the formula, R 2 has the same meaning as described above, and X represents a halogen atom.

① 不活性溶媒中、 式 〔XI〕 で表される化合物とシアン化物を触 媒存在下に反応させる。 不活性溶媒としては、 ベンゼン、 トルエン等 の BTX系溶媒類、 塩化メチレン、 クロ口ホルム等のハロゲン化炭化 水素類などが挙げられる。 シアン化物としては、 例えば、 トリアルキ ルシリルシアナイ ドが挙げられる (参考: Synthesis , 1 9 7 9,① The compound of formula [XI] is reacted with cyanide in an inert solvent in the presence of a catalyst. Examples of the inert solvent include BTX solvents such as benzene and toluene, and halogenated hydrocarbons such as methylene chloride and chloroform. As the cyanide, for example, trialkylsilyl cyanide can be cited (Reference: Synthesis, 1979,

5 2 3 ) o 5 2 3) o

② 式 〔ΧΙΠ で表される化合物とシアン化物を不活性ガス雰囲気 下、 1 4 0〜 2 0 0 °C、 好ましくは I 5 0 ~ 1 7 0でで反応させる。 シアン化物としては、 例えば、 シアン化銅 ( I ) 、 シアン化水銀、 シ アン化銀などが挙げられ、 不活性ガスとしては、 例えば、 窒素ガスで ある (参考: Angew. Chem. , 6 8 , 4 2 5 ( 1 9 5 6 ) ) 。 ② The compound represented by the formula [ΧΙΠ] is reacted with a cyanide under an inert gas atmosphere at 140 to 200 ° C., preferably at I 50 to 170. Examples of cyanide include copper (I) cyanide, mercury cyanide, silicon Examples of the inert gas include nitrogen gas (reference: Angew. Chem., 68, 425 (1956)).

③ 式 〔Χ Π〕 で表される化合物とシアン化物を不活性溶媒と水の 混合溶媒中、 相間移動触媒存在下に反応させる。 シアン化物と しては- 例えば、 シアン化ソーダ、 シアン化カリウムなどが挙げられ、 不活性 溶媒としては、 ベンゼン、 トルエン等の Β ΤΧ系溶媒類、 塩化メチレ ン、 クロ口ホルム等のハロゲン化炭化水素類などが挙げられ、 相間移 動触媒としては、 相間移動触媒として知られているアンモニゥム塩類、 ホスホニゥム塩類、 クラウンエーテル類などである (参考: Tetrahedron Lett. , 1 9 7 4 , 2 2 7 5 ) 。  ③ The compound of formula [Χ Π] and cyanide are reacted in a mixed solvent of inert solvent and water in the presence of a phase transfer catalyst. Examples of the cyanide include sodium cyanide and potassium cyanide, and examples of the inert solvent include solvents such as benzene and toluene, and halogenated hydrocarbons such as methylene chloride and chloroform. Examples of the phase transfer catalyst include ammonium salts, phosphonium salts, and crown ethers, which are known as phase transfer catalysts (Reference: Tetrahedron Lett., 1979, 22775).

④ 式 〔XI〕 で表される化合物とシアン化物を不活性溶媒中、 相 間移動触媒存在下に 5 0 ~ 1 0 0 °C、 好ましく は 7 0〜 9 0 °Cで反応 させる。 シアン化物としては、 例えば、 シアン化銅 ( 1 ) 、 シアン化 ソ一ダ、 シアン化カリウムなどが挙げられ、 不活性溶媒としては、 DMF、 DMS O、 ァセ トニトリルなどが挙げられ、 好ましくはァセ トニトリルであり、 相間移動触媒としては、 相間移動触媒として知ら れているアンモニゥム塩類、 ホスホニゥム塩類、 クラウンエーテル類 などである。  化合物 The compound represented by the formula [XI] is reacted with a cyanide in an inert solvent in the presence of a phase transfer catalyst at 50 to 100 ° C, preferably 70 to 90 ° C. Examples of the cyanide include copper cyanide (1), sodium cyanide, and potassium cyanide. Examples of the inert solvent include DMF, DMSO, and acetonitrile, and preferably acetonitrile. Examples of the phase transfer catalyst include ammonium salts, phosphonium salts, and crown ethers, which are known as phase transfer catalysts.

式 〔W''' 〕 で表される化合物は下記の反応により式 〔XIII〕 で表 される化合物と反応し、 式 〔XIV〕 で表される化合物を高収率で製造 することができる。  The compound represented by the formula [W ′ ″] reacts with the compound represented by the formula [XIII] by the following reaction to produce the compound represented by the formula [XIV] in high yield.

Figure imgf000011_0001
Figure imgf000011_0001

[xm] [XIV] 式中、 R2 は前記と同じ意味を表し、 Aは置換されてもよい 5〜 7 員の炭素環または置換されてもよい 5〜 7員の N, 0または Sを含む ヘテロ環を表す。 [xm] [XIV] In the formula, R 2 has the same meaning as described above, and A represents an optionally substituted 5- to 7-membered carbocyclic ring or an optionally substituted 5- to 7-membered heterocyclic ring containing N, 0 or S.

反応は、 〔 ' 〕 と 〔XIE〕 及び塩基の当モル混合溶液を加熱す ることにより行なわれる。 塩基としては例えばピリ ジン、 トリエチル ァミ ン、 D B ϋなどがあげられる。 溶媒としては塩化メチレン、 クロ 口ホルム、 ァセトニトリル、 トルエンなどが用いられ、 反応は室温か らこれらの溶媒の沸点で行われる。  The reaction is carried out by heating an equimolar mixed solution of ['] and [XIE] and a base. Examples of the base include pyridine, triethylamine, DB エ チ ル and the like. As the solvent, methylene chloride, chloroform, acetonitrile, toluene and the like are used, and the reaction is carried out from room temperature to the boiling point of these solvents.

式 〔xm〕 で表される化合物は、 例えば、  The compound represented by the formula (xm) is, for example,

Figure imgf000012_0001
等である。 〔ここで、 Re 、 R7 、 R8 、 R 0 、 R1 0 v R11は同一ま たは相異なってハロゲン原子、 置換されてもよいアルキル基、 アルコ キシカルボニル基、 置換されてもよいアルケニル基、 置換されてもよ いフヱニル基を表し、 また R7 と R8 で置換されてもよい 3〜7員の 炭素環を形成してもよい。 RI2、 RI3、 R14、 R15は、 同一又は相異 なって、 水素又は低級アルキルを表す。 R16は、 水素を表す。 R17は、 OR18を表し、 R18は水素、 低級アルキル、 ァラルキル、 低級ァシル- アルキルスルホニル、 ァリールスルホニルを表し、 または R 16と R 17 は一緒になって単結合を表してもよい。 また、 Zは、 酸素、 硫黄又は N— R19を表し、 R18は水素、 低級アルキル、 置換されてもよいァラ ルキル、 置換されてもよいシクロアルキル、 置換されてもよいフエ二 ル、 又は置換されてもよい複素環を表す。
Figure imgf000012_0001
And so on. (Where R e , R 7 , R 8 , R 0, R 10 v R 11 are the same or different and are each independently a halogen atom, an optionally substituted alkyl group, an alkoxycarbonyl group, or an optionally substituted It represents a good alkenyl group or a phenyl group which may be substituted, and may form a 3- to 7-membered carbon ring which may be substituted by R 7 and R 8 . R I2, R I3, R 14 , R 15 , taken same or different from and represent hydrogen or lower alkyl. R 16 represents hydrogen. R 17 represents OR 18 , R 18 represents hydrogen, lower alkyl, aralkyl, lower acetyl-alkylsulfonyl, arylsulfonyl, or R 16 and R 17 may together represent a single bond. Z represents oxygen, sulfur or N—R 19 , where R 18 is hydrogen, lower alkyl, optionally substituted aralkyl, optionally substituted cycloalkyl, optionally substituted phenyl, Or a heterocyclic ring which may be substituted.

酸化反応: 化合物 〔xw〕 中にアルキルチオ基が存在する場合は酸化すること により高収率でこれをアルキルスルホニル基にすることができる。 反応は、 通常の酸化反応で行なわれる。 例えばタ ングステン酸ナ ト リウムを触媒として 2倍モル以上の過酸化水素と化合物 〔XIV〕 を加 熱することにより行われる。 溶媒としては、 水、 アルコール類、 又は これらの混合溶媒が用いられ、 反応は 1 0 0でないしこれらの溶媒の 沸点で行われる。 Oxidation reaction: When an alkylthio group is present in the compound [xw], it can be converted into an alkylsulfonyl group in high yield by oxidation. The reaction is performed by a usual oxidation reaction. For example, the reaction is carried out by heating at least twice the molar amount of hydrogen peroxide and the compound [XIV] using sodium tungstate as a catalyst. As the solvent, water, alcohols, or a mixed solvent thereof is used, and the reaction is carried out at a temperature other than 100 or the boiling point of these solvents.

反応 D : Reaction D:

Figure imgf000013_0001
Figure imgf000013_0001

〔《— 2〕 〔IX— 2〕 式中、 R1 、 R2 、 R3 は前記と同じ意味を示し、 Mは金属原子を 示す。 金属原子としてはアルカリ金属、 アルカリ土類金属である。 溶媒としては、 アルコール類、 水、 およびその混合溶媒が用いられ 室温から溶媒の沸点まで好ましく は室温で N a 0 H、 KOH、 Na2C03. K2 C 03 などアルカリを用いて加水分解する。 反応 Έ : [<<-2] [IX-2] In the formula, R 1 , R 2 and R 3 have the same meanings as described above, and M represents a metal atom. Metal atoms are alkali metals and alkaline earth metals. As the solvent, hydrolyzed using alcohol, water, and preferably from room temperature a mixture thereof is used to the boiling point of the solvent at room temperature N a 0 H, KOH, alkali etc. Na 2 C0 3. K 2 C 03 . Reaction ::

Figure imgf000014_0001
式中、 R 1 、 R 2 は前記と同じ意味を示す。
Figure imgf000014_0001
In the formula, R 1 and R 2 have the same meaning as described above.

反応は溶媒中、 有機酸存在下に行なわれる。 有機酸としては、 酢酸- ギ酸、 プロピオン酸、 クェン酸等が用いられ、 溶媒として水、 アルコ —ル類等が使用され、 反応温度は室温付近が望ましい。  The reaction is carried out in a solvent in the presence of an organic acid. As the organic acid, acetic acid-formic acid, propionic acid, citric acid and the like are used, and water, alcohols and the like are used as solvents, and the reaction temperature is preferably around room temperature.

反応 F : Reaction F:

Figure imgf000014_0002
式中、 R 1 、 R 2 、 Μは前記と同じ意味を示す。
Figure imgf000014_0002
In the formula, R 1 , R 2 and Μ have the same meanings as described above.

反応は、 液を酸で酸性または中性条件にすることにより行なわれる ( 通常、 反応 Dの反応液をそのまま用いる。 酸は塩酸、 硫酸等の無機酸- 酢酸等の有機酸など通常用いられる酸でよい。 反応 G The reaction is carried out by adjusting the solution to an acidic or neutral condition with an acid ( usually, the reaction solution of the reaction D is used as it is. The acid is an inorganic acid such as hydrochloric acid, sulfuric acid or the like. Is fine. Reaction G

Figure imgf000015_0001
式中、 R1 、 R2 は前記と同じ意味を示す。
Figure imgf000015_0001
In the formula, R 1 and R 2 have the same meaning as described above.

反応は溶媒中、 塩基存在下に行なわれる。 塩基としては、 アンモニ ァ、 ( C , - C ) アルキルァ ミ ン、 ジ ( C , - C ) アルキルアミ ン、 ト リ (C, - C ) アルキルァミ ン、 ピリ ジン、 D BU等有機塩 基を用い、 アルコール類、 エーテル類、 TH F等の有機溶媒中冷却下 から溶媒の沸点まで好ましくは室温で反応させる。  The reaction is performed in a solvent in the presence of a base. As the base, an organic salt group such as ammonia, (C, -C) alkylamine, di (C, -C) alkylamine, tri (C, -C) alkylamine, pyridine, or DBU is used. The reaction is carried out in an organic solvent such as alcohols, ethers and THF under cooling to the boiling point of the solvent, preferably at room temperature.

反応終了後は、 通常の後処理を行なう ことにより目的物を得ること ができる。 合成した化合物は、 NMR、 I R、 MS等より同定した。 尚、 本発明に関する化合物には、 多数の互変性の形、 例えば、  After completion of the reaction, the desired product can be obtained by performing ordinary post-treatment. The synthesized compound was identified by NMR, IR, MS and the like. The compounds according to the present invention include a number of tautomeric forms, for example,

Figure imgf000015_0002
の形で存在し得る 発明を実施するための最良の形態:
Figure imgf000015_0002
Can exist in the form of BEST MODE FOR CARRYING OUT THE INVENTION

次に実施例を挙げ、 本発明を更に具体的に説明する。  Next, the present invention will be described more specifically with reference to examples.

実施例 1 (反応 A) Example 1 (Reaction A)

( 2—ァセチルシクロプロピル) メチルマロン酸ジェチルの合成  Synthesis of (2-acetylcyclopropyl) methylmalonate getyl

CHsCOCl + CH2 = CHCH2C1 → CCH3C0CH2CHC1CH2C1 〕 CHsCOCl + CH 2 = CHCH 2 C1 → CCH 3 C0CH 2 CHC1CH 2 C1]

Figure imgf000016_0001
塩化メチレン 6 0 m 1中に塩化アルミニウム 8. 7 gを加え、 さらに 氷冷下ァセチルク口ライ ド 5. 1 gおよびァリルクロライ ド 10. 0 gを 滴下し、 その後室温で 3時間反応を続けた。 反応終了後、 氷水にあけ 分解し、 塩化メチレンで抽出、 水洗、 乾燥を行なった。 次にこの中間 体 5, 4 —ジクロロペンタノン一 2を単離することなく、 この溶液を エタノール 6 O m l中ソジゥムエトキサィ ド 14. 4 %エタノール溶液 を 67. 5 g.およびメチルマロン酸ジェチルエステル 11. 3 gを溶解さ せた液に氷冷下滴下し、 その後室温で 1時間反応を続けた。 反応終了 後、 氷水に入れ塩化メチレン抽出し、 水洗、 乾燥、 溶媒を留去の後、 得られたオイル状物をカラムクロマ トグラフィ一により分離精製を行 なって目的物 14. 1 gを得た。 b. p. 1 3 0〜 1 3 5 V/ 2 mmHg. 得ら れた化合物はすべて t r a n s配置であつた。
Figure imgf000016_0001
8.7 g of aluminum chloride was added to 60 ml of methylene chloride, and 5.1 g of acetyl chloride and 10.0 g of aryl chloride were added dropwise under ice cooling, and the reaction was continued at room temperature for 3 hours. After completion of the reaction, the reaction mixture was poured into ice water, decomposed, extracted with methylene chloride, washed with water, and dried. Then, without isolating the intermediate 5,4-dichloropentanone-12, this solution was mixed with 67.5 g of a 14.4% solution of sodium methoxide in 6 O ml of ethanol and 67.5 g of methylmalonone. The solution in which 11.3 g of acid getyl ester was dissolved was added dropwise under ice cooling, and the reaction was continued at room temperature for 1 hour. After completion of the reaction, the reaction mixture was placed in ice water, extracted with methylene chloride, washed with water, dried, and the solvent was distilled off. The obtained oil was separated and purified by column chromatography to obtain 14.1 g of the desired product. bp 130-135 V / 2 mmHg. All the compounds obtained were in the trans configuration.

実施例 2 (反応 B) Example 2 (Reaction B)

Eおよび Z— 5 ーェトキシカルボ二ルー 5—メチルビシク口 〔4, 1, 0 〕 ヘプ夕ン一 2 , 4—ジオン

Figure imgf000017_0001
E and Z—5-ethoxycarbone 5-methylbisic mouth [4,1,0] heptane 1,2,4-dione
Figure imgf000017_0001

(E) (Z)  (E) (Z)

( 2—ァセチルシク口プロピル) メチルマロン酸ジェチル 330.7 g を 14. 4 %ナ ト リ ウムェチラ一 トェタノ一ル溶液 9 75. 6 g中に入れ 3時間加熱還流させた。 冷却後、 冷塩酸水中に入れ、 塩化メチレンで 抽出し、 飽和食塩水で洗浄した。 硫酸マグネシウムで脱水後溶媒を減 圧で留去し残液にエーテルを加えることにより白色結晶と して E体(2-Acetylcyclopropyl) 330.7 g of methylethyl malonate was placed in 97.5.6 g of a 14.4% sodium ethylethanol solution and heated under reflux for 3 hours. After cooling, the mixture was placed in cold hydrochloric acid, extracted with methylene chloride, and washed with saturated saline. After dehydration with magnesium sulfate, the solvent was distilled off under reduced pressure, and ether was added to the remaining solution to give E-form as white crystals.

[ t r a n s—エ トキシカルボ二ルー c i s—メチル体/シクロプロ パン ; 以下同じ〕 87. 6 gを得た。 [trans-ethoxycarbonyl cis-methyl form / cyclopropane; the same applies hereinafter) 87.6 g was obtained.

さ らにこの濾液をシリ力ゲルクロマ トにより分離し E体 8. 1 gと Z 体 〔c i s—エ トキシカルボ二ルー t r a n s—メチル体 Zシクロプ 口パン ; 以下同じ〕 27. 8 gを得た。  The filtrate was further separated by silica gel chromatography to obtain 8.1 g of the E-form and 27.8 g of the Z-form [cis-ethoxycarbonyl trans-methyl-form Z-cyclopropane pan; the same applies hereinafter).

実施例 3 (反応 C関連) Example 3 (Reaction C related)

3—メ トキシー 2—メチルー 4ーメチルチオべンゾィルシアナイ ド の合成  Synthesis of 3-Methoxy-2-methyl-4-methylthiobenzoyl cyanide

(参考 ; Tetrahedron Lett. , 2 6, 2 2 7 5 ( 1 9 7 4 ) )

Figure imgf000018_0001
(Reference: Tetrahedron Lett., 26, 2275 (1974))
Figure imgf000018_0001

3—メ トキシー 2—メチルー 4ーメチルチオ安息香酸ク口ライ ド 2 3 gとテトラブチルアンモニゥムブロマイ ド 3 gのジクロロェタン 2 0 0 m l溶液に、 0で窒素気流下で 1 0 %シアン化ナトリゥム水溶 液 5 0 gを 1時間かけて滴下する。 1時間攪拌した後有機層を分取し. 水、 飽和塩化ナ ト リゥム水溶液で順次洗浄し、 硫酸マグネシゥムで乾 3-Methoxy-2-methyl-4-methylthiobenzoic acid (23 g) and tetrabutylammonium bromide (3 g) in a 200 ml solution of dichloroethane in 0 ml, 10% sodium cyanide under a nitrogen stream at 0 50 g of the aqueous solution is added dropwise over 1 hour. After stirring for 1 hour, separate the organic layer. Wash sequentially with water and saturated aqueous sodium chloride solution, and dry with magnesium sulfate.

6  6

燥した。 溶媒を減圧にて留去し、 目的物 14.8 gを得た。 mp 1 1 5 〜 8 °C。 Dried. The solvent was distilled off under reduced pressure to obtain 14.8 g of the desired product. mp 115-8 ° C.

実施例 4 (反応。) Example 4 (reaction)

t r a n s— 5—ェトキシカルボ二ルー 3— ( 3—メ トキシ一 2— メチルー 4—メチルチオべンゾィル) 一 c i s— 5—メチル一 2—ビ シクロ 〔4.1.0 〕 ヘプテン一 2, 4—ジオンの合成  t r ans— 5-ethoxyethoxycarbonyl 3— (3-Methoxy-12-methyl-4-methylthiobenzoyl) -c i s—5-Methyl-12-bicyclo [4.1.0] Synthesis of heptene-1,2,4-dione

Figure imgf000018_0002
Figure imgf000018_0002

(E)  (E)

Figure imgf000018_0003
Figure imgf000018_0003

(E) 実施例 3で得た 3—メ トキシー 2—メチル一 4 ーメチルチオべンゾ ィルシアナイ ド 2. 2 gと t r a n s— 5—ェ トキシカルボニル一 cis 一 5—メチルー 2—ビシクロ 〔4.1.0 〕 ヘプテン一 2, 4 ージオン 2. 1 gを 2 0 m 1の塩化メチレンに溶解する。 この溶液に 卜 リェチル ァミ ン 1. 2 gを室温にて添加した。 室温にて 1 8時間攪拌した後、 氷 水にあけ濃塩酸で酸性化し有機層を分取した。 この有機層を水洗、 硫 酸マグネシウムで乾燥、 溶媒を減圧にて留去し、 目的物 3. 5 g (E体) を得た。 m p 1 1 1〜 1 1 2 °C (E体) (E) 2.2 g of 3-methoxy-2-methyl-1-methylthiobenzoyl cyanide obtained in Example 3 and trans-5-ethoxycarbonyl-cis-15-methyl-2-bicyclo [4.1.0] heptene-1 2 Dissolve 2.1 g of, 4 dione in 20 ml of methylene chloride. To this solution, 1.2 g of triethylamine was added at room temperature. After stirring at room temperature for 18 hours, the mixture was poured into iced water, acidified with concentrated hydrochloric acid, and the organic layer was separated. The organic layer was washed with water, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain 3.5 g of the desired product (E-form). mp 1 1 1 to 1 1 2 ° C (E type)

実施例 5 (反応 C) Example 5 (Reaction C)

c i s— 5—エ トキシカルボ二ルー 3— ( 3—メ トキシー 2—メチ ルー 4—メチルチオベンゾィル) 一 t r a n s— 5—メチルー 2—ビ シクロ 〔4.1.0 〕 ヘプテン一 2, 4ージオンの合成  cis—5—Ethoxycarbonyl 3 -— (3-Methoxy-2-methyl 4-methylthiobenzoyl) -trans—5-Methyl-2-bicyclo [4.1.0] Synthesis of heptene-1,2, dione

5—エ トキシカルボ二ルー 5—メチルー 2—ビシクロ 〔4.1.0 〕 へ プテン一 2, 4ージオン 2. 1 gの E体の代りに Z体を用いる他は、 実 施例 4に準じて反応、 後処理し、 ァモルファスな目的物 3. 4 g (Z体) を得た。 .  5-Ethoxycarbonyl 5-methyl-2-bicyclo [4.1.0] to 2,4-dione butene 2.1 reaction except that the Z-isomer is used in place of the E-form of 2.1 g. After post-treatment, 3.4 g (Z form) of the desired product was obtained. .

実施例 6 (酸化反応) Example 6 (oxidation reaction)

t r a n. s— 5—エ トキシカルボニル一 3— ( 4—メ シルー 3—メ トキシ一 2—メチルべンゾィル) 一 c i s— 5—メチル一 2—ビシク 口 〔4.1.0 〕 ヘプテン一 2, 4—ジオンの合成 tra n. s—5—ethoxycarbonyl-3- (4-mesyl-3-methoxy1-2-methylbenzoyl) cis—5-methyl-12-bisic mouth [4.1.0] heptene 1,2,4 —Synthesis of dione

Figure imgf000020_0001
Figure imgf000020_0001

(E)  (E)

Figure imgf000020_0002
Figure imgf000020_0002

(E) 実施例 4で得たビシクロ璟化合物 2.2 gの 2 Om lメタノ一ル溶液 にタングステン酸ナトリ ゥム 0.1 6 gを加えたのち、 3 5 %過酸化水 素水 1.7 gを室温にて添加した。 2時間還流後希塩酸を注加し有機層 を分取した。 水洗、 硫酸マグネシウムで乾燥、 溶媒を減圧留去し、 目 的物 1.8 3 gを得た。  (E) 0.16 g of sodium tungstate was added to a 2 Om1 methanol solution of 2.2 g of the bicyclo compound obtained in Example 4, and 1.7 g of 35% aqueous hydrogen peroxide was added at room temperature. Was added. After refluxing for 2 hours, dilute hydrochloric acid was added, and the organic layer was separated. The extract was washed with water, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain 1.83 g of the desired product.

実施例 7 (酸化反応) Example 7 (oxidation reaction)

5— c i s—ェトキシカルボ二ルー 3— ( 4—メ シルー 3—メ トキ シ一 2—メチルべンゾィル) 一 t r a n s— 5—メチル一 2 _ビシク 口 〔4.1.0 〕 ヘプテン一 2, 4—ジオンの合成  5—cis—ethoxycarbone 3— (4—mesyl 3—methoxy 1—2-methylbenzoyl) 1 trans—5—methyl 1 2 _bisik mouth [4.1.0] 1-heptene 2,4-dione Synthesis

ビシクロ環化合物 2.2 gの E体の代りに Z体 (実施例 5で得た) を 用いる他は実施例 6に準じて反応、 後処理し、 目的物 1.9 4 g (Z体) を得た。  The reaction and work-up were conducted in the same manner as in Example 6 except that the Z-form (obtained in Example 5) was used instead of the E-form of 2.2 g of the bicyclo ring compound to obtain 1.94 g of the desired product (Z-form).

実施例 8 (反応 C) Example 8 (Reaction C)

t r a n s - 5一エトキシカルボ二ルー 3— ( 4—メシルー 3—メ トキシ一 2—メチルベンゾィル) 一 c i s— 5—メチルー 2—ビシク 口 〔4.1.0 〕 ヘプテン— 2 , 4 -ジオンの合成 trans-5-ethoxycarbonyl-2- 3- (4-mesyl-3-methoxy-2-methylbenzoyl) -cis-5-methyl-2-bisic Mouth [4.1.0] Synthesis of Heptene-2,4-dione

Figure imgf000021_0001
Figure imgf000021_0001

(E)  (E)

2—メチルー 4ーメチルスルホニルー 3—メ トキシ安息香酸ク ロラ ィ ド 2. 6 gと ト リ メチルシ リ ルシアナイ ド 1. 1 gの塩化メチレン溶液 5 0 m l に四塩化スズ 0. 2 m 1を室温、 窒素雰囲気下にて添加した。 2 0時間攪拌後、 反応溶液を水に注いだ。 水層を分離し、 有機層を 5 0 m lの水で 2回洗浄した後、 乾燥濃縮して、 3—メ トキシー 2— メチル— 4—メシルベンゾィルシアナイ ドの粗生成物を得た。 この粗 生成物と t .r a n s— 5—ェトキシカルボ二ルー c i s— 5—メチル 一 2— ビシクロ 〔4.1.0 〕 ヘプテン一 2 , 4—ジオン 1. 2 gの 2 0 m 1塩化メチレン溶液にト リェチルァミ ン 0. 9 m 1を加えた。 5時間 反応混合物を室温で攪拌したのち、 1規定塩酸に注いだ。 水層を分離 し、 有機層を飽和食塩水で洗浄した。 乾燥濃縮後、 シリカゲルカラム クロマ トグラフィ一 (溶出液:へキサン一酢酸ェチル) で精製して目 的化合物 (E体) 1. 2 gを得た。 0.2 ml of tin tetrachloride was added to 50 ml of a methylene chloride solution of 2.6 g of 2-methyl-4-methylsulfonyl-3-cyclomethoxybenzoic acid chloride and 1.1 g of trimethylsilyl cyanide. It was added at room temperature under a nitrogen atmosphere. After stirring for 20 hours, the reaction solution was poured into water. The aqueous layer was separated, and the organic layer was washed twice with 50 ml of water, and then dried and concentrated to obtain a crude product of 3-methoxy-2-methyl-4-mesylbenzoyl cyanide. Triethylamine was added to a solution of this crude product and 1.2 g of t.rans-5-ethoxycarboxyl cis-5-methyl-12-bicyclo [4.1.0] heptene-12,4-dione in 20 ml methylene chloride. 0.9 ml was added. After stirring the reaction mixture at room temperature for 5 hours, it was poured into 1N hydrochloric acid. The aqueous layer was separated, and the organic layer was washed with saturated saline. After drying and concentration, the residue was purified by silica gel column chromatography (eluent: hexane monoacetate) to obtain 1.2 g of the target compound (E-form).

実施例 9 (反応 C) Example 9 (Reaction C)

3— ( 3—メ トキシー 2—メチルー 4—メチルスルホニルベンゾィ ル) 一 t 3 11 8 — 5—ェ トキシカノレボニルー 0 i s — 5—メ チルー c i s—ビシクロ 〔4.1.0 〕 ヘプタン一 2 , 4—ジオン及び 3 ( 3 ーメ トキシー 2—メチルー 4ーメチルスルホニルべンゾィル) cis — 5—エ トキシカノレポ'二ゾレ一 t r a n s— 5—メ チノレ一 c i s ビシ クロ 〔4.1.0 〕 ヘプタン一 2 , 4—ジオンの合成 3— (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) 1 t 3 11 8 — 5—ethoxycanolebonyl 0 is — 5—methyl cis-Bicyclo [4.1.0] heptane-1,2,4-dione and 3 (3-methoxy-2-methyl-4-methylsulfonylbenzoyl) Synthesis of cis bicyclo [4.1.0] heptane-1,2,4-dione

Figure imgf000022_0001
Figure imgf000022_0001

(E, Z) 金属ソ一ダ 0.79 gをエタノール 13.7 gに溶解し、 これに DMF (E, Z) Dissolve 0.79 g of metallic soda in 13.7 g of ethanol and add DMF

1.4 6 gを加えた混合溶液の還流下に ( 2—ァセチルシク口プロピル) メチルマロン酸ジェチルを 1 0分間で滴下した。 3時間還流後、 氷冷 した希塩酸にあけ、 塩化メチレンで 2回抽出した。 塩化メチレン層を あわせて、 水、 飽和塩化ナトリゥムで順次洗浄し硫酸マグネシウムで 乾燥後、 溶媒を減圧留去した。 5—エトキシカルボ二ルー 5—メチル ビシクロ 〔4.1.0 〕 ヘプタン一 2, 4—ジオンの E体及び Z体が約 3Under reflux of the mixed solution to which 1.46 g was added, (2-acetylcyclopropyl) methylmalonate getyl was added dropwise over 10 minutes. After refluxing for 3 hours, the mixture was poured into ice-cooled diluted hydrochloric acid and extracted twice with methylene chloride. The methylene chloride layers were combined, washed sequentially with water and saturated sodium chloride, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. E- and Z-forms of 5-ethoxyethoxycarbonyl-5-methylbicyclo [4.1.0] heptane-1,2,4-dione

: 1のクル一ド混合物 4.8 4 gを得た。 4.8 4 g of a mixture of the following compounds were obtained.

このものの塩化メチレン溶液 5 O m lに 3—メ トキシー 2—メチル - —メチルチオべンゾィルシアナイ ド 2.7 gと トリェチルァミ ン 2.7 g of 3-methoxy-2-methyl-methylthiobenzoyl cyanide and triethylamine in 5 O ml of methylene chloride solution of this product

1.5 gを順次、 室温で添加した。 そのまま室温で 1 8時間攪拌後、 水 にあけ塩酸で酸性化した。 有機層を分離し、 水、 飽和塩化ナ ト リゥム 水溶液で洗浄し硫酸マグネシウムで乾燥後、 溶媒を減圧留去した。 5 —エ トキシカルボニル一 3— ( 3—メ トキシ一 2—メチルー 4ーメチ ルチオベンゾィル) 一 5—メチル— ビシクロ 〔4.1.0 〕 ヘプテン一 2 , 4ージオンの E体と Z体約 3 : 1のクルー ド混合物 5. 8 gを得た。 この粗生成物 5. 8 gのメ タノール溶液 1 0 0 m l に N a 2 W04 (夕 ングステン酸ソ一ダ) 0. 0 6 gと 3 0 %過酸化水素水 4. 1 gを順次室 温で添加した。 この溶液を 2時間加熱還流して反応を完結させた。 反 応溶液を氷水にあけ塩酸で酸性化してから塩化メチレンで 2回抽出し た。 分離した有機層を、 ハイポ水溶液、 水及び飽和塩化ナト リゥム水 溶液で順次洗浄した。 有機層を硫酸マグネシウムで乾燥後、 溶液中の 目的物の E体及び Z体を H P L Cで分析した。 * 1.5 g were added sequentially at room temperature. After stirring at room temperature for 18 hours, The mixture was acidified with hydrochloric acid. The organic layer was separated, washed with water and a saturated aqueous solution of sodium chloride, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. 5-Ethoxycarbonyl-3- (3-Methoxy-1-methyl-4-methylthiobenzoyl) -1-5-methyl-bicyclo [4.1.0] Heptene 1,2,4-dione E-form and Z-form about 3: 1 crew 5.8 g of the metal mixture was obtained. N a 2 W0 4 in methanol solution 1 0 0 ml of the crude product 5. 8 g (evening tungsten Sansoichida) 0. 0 6 g and 3 0% hydrogen peroxide 4. sequentially chamber to 1 g Was added warm. This solution was heated under reflux for 2 hours to complete the reaction. The reaction solution was poured into ice water, acidified with hydrochloric acid, and extracted twice with methylene chloride. The separated organic layer was washed sequentially with a hypo aqueous solution, water and a saturated aqueous sodium chloride solution. After the organic layer was dried over magnesium sulfate, the E-form and Z-form of the target compound in the solution were analyzed by HPLC. *

その結果、 E体 2. 2 g及び Z体 0. 9 gの存在を確認した。  As a result, it was confirmed that 2.2 g of the E form and 0.9 g of the Z form were present.

* E体及び Z体の標品を用いた絶対値  * Absolute value using E and Z samples

実施例 1 0 (反応 C) Example 10 (Reaction C)

3— ( 3—メ トキシー 2—メチルー 4ーメチルスルホニルベンゾィ ル) 一 t r a n s— 5—エ トキシカノレボニル一 c i s— 5—メチルー c i s—ビシクロ 〔4.1.0 〕 ヘプタ ン一 2 , 4—ジオン及び 3— ( 3 —メ トキシ一 2—メチルー 4ーメチルスルホニルベンゾィル) 一 cis — 5—エ トキシカルボ二ルー t r a n s— 5—メチルー c i s—ビシ クロ 〔4.1.0 〕 ヘプタン一 2 , 4—ジオンの合成 3- (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) -1-trans-5-ethoxycanolebonyl cis-5-methyl-cis-bicyclo [4.1.0] heptane-1,2,4-dione And 3-((3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) -cis-5-ethoxycarbonyl-2-trans-5-methyl-cis-bicyclo [4.1.0] heptane-1,2,4-dione Synthesis of

Figure imgf000024_0001
Figure imgf000024_0001

(E, Z)  (E, Z)

Figure imgf000024_0002
Figure imgf000024_0002

(E, Z)  (E, Z)

5—エトキシカルボニル一 5—メチルビシクロ 〔4.1.0 〕 ヘプタン - 2, 4ージオンの E体と Z体 E- and Z-forms of 5-ethoxycarbonyl-1-5-methylbicyclo [4.1.0] heptane-2,4-dione

それぞれ 2.4 9 gと 0.8 3 gの塩化メチレン溶液にト リェチルァミ ン丄.8 を添加後、 この溶液に 2—メチル一 4ーメチルスルホニルー 3—メ トキシ安息香酸クロライ ド 4.2 gの塩化メチレン溶液 1 0m l を 1 0 °C、 .1時間で滴下した。 2時間室温で攪拌後、 1 N塩酸にあけ 有機層を分取した。 水、 飽和塩化ナトリゥム水溶液で順次洗浄後、 硫 酸マグネシウムで乾燥し濃縮して、 0—ァシル体の E体と Z体の混合 物 6.9 gを得た。  Triethylamine ァ .8 was added to 2.49 g and 0.83 g of methylene chloride solution, respectively, and then 2-methyl-14-methylsulfonyl-3-methoxybenzoic acid chloride 4.2 g of methylene chloride solution 1 was added to this solution. 0 ml was added dropwise at 10 ° C for 0.1 hour. After stirring at room temperature for 2 hours, the mixture was poured into 1N hydrochloric acid and the organic layer was separated. After washing sequentially with water and a saturated aqueous sodium chloride solution, the mixture was dried over magnesium sulfate and concentrated to obtain 6.9 g of a mixture of E-form and Z-form of 0-acyl form.

この粗生成物 6.9 gと トリェチルァミ ン 2.0 gのァセ トニト リル溶 液 2 5 m 1に KCN0. 1 gを加え、 室温で 1 8時間攪拌した。 反応終 了後、 溶媒を滅圧留去してから、 塩化メチレン、 水を加え pH 1に調 整した。 有機層を分取し、 水、 飽和塩化ナトリゥム水溶液で順次洗浄 後、 無水硫酸マグネシウムで乾燥し、 溶媒を減圧濃縮した。 目的物の E体及び Z体の結晶を 7.2 g得た。 実施例 1 1 (反応 D, E) 0.1 g of KCN was added to 25 ml of an acetonitrile solution of 6.9 g of this crude product and 2.0 g of triethylamine, and the mixture was stirred at room temperature for 18 hours. After completion of the reaction, the solvent was distilled off under reduced pressure, and methylene chloride and water were added to adjust the pH to 1. The organic layer was separated, washed sequentially with water and a saturated aqueous sodium chloride solution, dried over anhydrous magnesium sulfate, and the solvent was concentrated under reduced pressure. 7.2 g of the desired E-form and Z-form crystals were obtained. Example 11 (Reaction D, E)

3 - ( 3—メ トキシー 2—メチル一 4ーメチルスルホニルべンゾィ ル) 一 c i s— 5—メチルー c i s—ビシクロ 〔4.1.0 〕 ヘプタン一 2 , 4—ジオンの合成  Synthesis of 3- (3-methoxy-2-methyl-1-methylsulfonylbenzoyl) -1-cis-5-methyl-cis-bicyclo [4.1.0] heptane-1,2,4-dione

Figure imgf000025_0001
メ タノール 5 O m l中 3— ( 3—メ トキシ一 2—メチルー 4ーメチ ルスルホニルべンゾィル) 一 t r a n s— 5—エ トキシカルボニル— c i s— 5—メチル一 c i s —ビシクロ 〔4.1.0 〕 ヘプタ ン一 2 , 4 ージオン 21. 1 g ( 5 0 mmol) を溶かした溶液に水 5 0 m l中に NaOH 6. 0 g ( 1 5 0匪 ol) を溶かした液を室温で滴下し、 その後一夜、 攪 拌を続けた。 翌日冷却下水 1 0 0 m l 中に酢酸 9. 0 g ( 1 5 0 mmol) を溶かした液を 4 0分にわたり滴下し、 その後濃塩酸で p H 2— 3に すると白色結晶が析出した。 析出した結晶を口過し、 冷メタノール洗 浄、 乾燥することにより目的物 17.3 g (m. p. 1 5 0— 1 5 3 °C) を 得た。
Figure imgf000025_0001
3- (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) mono trans-5-ethoxycarbonyl cis-5-methyl cis bicyclo [4.1.0] heptane in 5 ml of methanol A solution prepared by dissolving 20.1 g (50 mmol) of 2,4 dione and 6.0 g (150 bandol) of NaOH in 50 ml of water was added dropwise at room temperature, and then stirred overnight. Stirring was continued. The next day, a solution of 9.0 g (150 mmol) of acetic acid dissolved in 100 ml of chilled water was added dropwise over 40 minutes, and then concentrated hydrochloric acid was added to pH 2-3. Then, white crystals precipitated. The precipitated crystals were collected, washed with cold methanol, and dried to obtain 17.3 g of the desired product (mp 150-153 ° C).

実施例 1 2 (反応 D, F) Example 12 (Reaction D, F)

3— (3—メ トキシー 2—メチル一 4—メチルスルホニルベンゾィ ノレ) 一 c i s _ 5—ヒ ドロキシカノレボニル一 t r a n s— 5—メチノレ — c i s—ビシクロ 〔4.1.0 〕 ヘプタンー 2 , 4—ジオンの合成  3- (3-Methoxy-2-methyl-14-methylsulfonylbenzoyl) -cis-5-hydroxycanolebonyl-trans-5-methynole-cis-bicyclo [4.1.0] heptane-2,4-dione Synthesis of

Figure imgf000026_0001
Figure imgf000026_0001

(Z)  (Z)

Figure imgf000026_0002
メタノール 5 Om l中 3— (3—メ トキシー 2—メチルー 4—メチ ルスルホニルベンゾィル) — c i s— 5—エトキシカルボ二ルー t r a n s— 5—メチル一 c i s—ビシクロ 〔4.1.0 〕 ヘプタン一 2 , 4ージオン 21.1 g ( 5 0 mmol) を溶かした溶液に水 5 0 m 1中に NaOH6.0 g ( 1 5 0匪 ol) を溶かした液を室温で滴下し、 その後一夜 攪拌を続けた。
Figure imgf000026_0002
3- (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) in 5 Oml of methanol — cis—5-ethoxycarbonyl trans—5-methyl-1-cis-bicyclo [4.1.0] heptane 1 2 In a solution of 21.1 g (50 mmol) of 2,4 dione, a solution of 6.0 g (150 marol) of NaOH in 50 ml of water was added dropwise at room temperature, followed by stirring overnight.

濃塩酸で p H 2— 3にすると白色結晶が析出した。 反応終了後、 ジ クロロメタンにより抽出、 水洗、 乾燥し、 溶媒留去することにより目 的物 18.7 gを得た。 1 H - N M R ( 2 0 0 MH z ) δ ; 1.1(1H, m), 1.6(3H, s), 1.9(1H, in), 2.2C3H, s), 2.1-2.3(2H, m), 3.2(3H, s), 3.9(3H, s), 6.9(1H, d, J=8Hz), 7.8(1H, d, J=8Hz), 17.6-17.8(1H, brs) When the pH was adjusted to 2-3 with concentrated hydrochloric acid, white crystals precipitated. After completion of the reaction, extraction with dichloromethane, washing with water, and drying were performed, and the solvent was distilled off to obtain 18.7 g of the desired product. 1 H-NMR (200 MHz) δ; 1.1 (1H, m), 1.6 (3H, s), 1.9 (1H, in), 2.2C3H, s), 2.1-2.3 (2H, m), 3.2 (3H, s), 3.9 (3H, s), 6.9 (1H, d, J = 8Hz), 7.8 (1H, d, J = 8Hz), 17.6-17.8 (1H, brs)

実施例 1 3 (反応 G) Example 13 (Reaction G)

3 - ( 3—メ トキシー 2—メチルー 4—メチルスルホニルべンゾィ ル) 一 c i s— 5—メチルー c i s—ビシクロ 〔4.1.0 〕 ヘプタ ン一 2, 4ージォンの合成  Synthesis of 3- (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) -cis-5-methyl-cis-bicyclo [4.1.0] heptane-12,4-dione

Figure imgf000027_0001
メタノール 4 O m l中に 3— ( 3—メ トキシー 2—メチルー 4ーメ チルスルホニルベンゾィル) — c i s— 5—ヒ ドロキシカルボ二ルー t r a n s— 5—メチル一 c i s—ビシクロ 〔4.1.0 〕 ヘプタン一 2 , 4ージオン 3. 9 gを入れ、 さらに ト リェチルァ ミ ンを室温で一滴加 える。 その後 6時間反応を続けた。 反応終了後、 溶媒を留去し、 得ら れた結晶をメ夕ノ一ルで再結晶することにより 2. 9 gを得た。 m. p. 1 5 0 - 1 5 3 °C
Figure imgf000027_0001
3- (3-Methoxy-2-methyl-4-methylsulfonylbenzoyl) -cis-5-Hydroxycarbonyl trans-5-Methyl-1-cis-bicyclo [4.1.0] Heptane-1 in 4 O ml of methanol Add 3.9 g of 2,4-dione, and add a drop of triethylamine at room temperature. Thereafter, the reaction was continued for 6 hours. After completion of the reaction, the solvent was distilled off, and the obtained crystals were recrystallized from methanol to obtain 2.9 g. mp 150-15 3 ° C

実施例 1 4 (反応 D, E, F, G) Example 14 (Reaction D, E, F, G)

3 - ( 3—メ トキシー 2—メチル— 4—メチルスルホニルペンゾィ ル) 一 c i s— 5—メチル一 c i s—ビシクロ 〔4.1.0 〕 ヘプタン 2, 4—ジオンの合成 3- (3-Methoxy-2-methyl-4-methylsulfonylpentyso 1) Synthesis of 1 cis-5-methyl-1-cis-bicyclo [4.1.0] heptane 2,4-dione

Figure imgf000028_0001
Figure imgf000028_0001

(E, Z)  (E, Z)

Figure imgf000028_0002
Figure imgf000028_0002

3— ( 3—メ トキシ一 2—メチル一 4ーメチルスルホニルベンゾィ ル) 一 5—エトキシカルボ二ルー 5—メチルービシクロ 〔4.1.0 〕 へ ブタン— 2, 4 -ジオンの E体及び Z体 (3 : 1 ) の粗锆晶 7.2 gの メタノール溶液 2 0 m 1を 2.6 N水酸化ナトリゥム水溶液 2 0 m 1に 室温、 0.5時間で滴下した。 その後 4 0°Cで 1 8時間攪拌してから、 5でにて 1 0 %酢酸水溶液 3 0 in 1を 1時間かけて滴下した。 同温度 で 1時間攪拌後、 濃塩酸で p H 2.2に調整した。 スラ リー状になった この反応液にさらに 2 5 %アンモニア水 0.2 5m lを加え室温で 2日 間攪拌を続けた。 反応終了後濾過して得た結晶をメタノールで洗浄、 乾燥し目的物 4.0 gを得た。 3- (3-Methoxy-1-2-methyl-1-methylsulfonylbenzoyl) -1-5-ethoxycarboxy-5-methyl-bicyclo [4.1.0] to butane- E and Z of 2,4-dione A methanol solution (20 ml) of 7.2 g of the crude crystal of the compound (3: 1) was added dropwise to a 2.6 N aqueous sodium hydroxide solution (20 ml) at room temperature for 0.5 hour. Thereafter, the mixture was stirred at 40 ° C for 18 hours, and then, at 5 was added dropwise a 10% aqueous acetic acid solution 30 in 1 over 1 hour. After stirring at the same temperature for 1 hour, the pH was adjusted to 2.2 with concentrated hydrochloric acid. 0.25 ml of 25% aqueous ammonia was further added to the slurry-like reaction solution, and stirring was continued at room temperature for 2 days. After completion of the reaction, the crystals obtained by filtration were washed with methanol and dried to obtain 4.0 g of the desired product.

産業上の利用可能性: Industrial applicability:

本発明の製造法により、 前記式 〔 I〕 で表わされる除草剤が、 途中 で得られる化合物の立体配置に関係なく 高収率 ·高純度で得られる, また途中で得られる化合物は農医薬等の中間体となり得る According to the production method of the present invention, the herbicide represented by the formula (I) can be obtained in high yield and high purity irrespective of the configuration of the compound obtained in the course of the process. Compounds obtained on the way can be intermediates for agricultural chemicals, etc.

Claims

請 求 の 範 囲 The scope of the claims 1. 下記工程 a gを含む、 式 〔I〕 1. Formula [I] including the following steps ag
Figure imgf000030_0001
Figure imgf000030_0001
〔式中、 R1 はアルキル基を表し、 R2 はアルキル基、 置換されても よいフヱニル基、 置換されてもよいァラルキル基又は置換されてもよ い複素環を示す。 〕 で表される化合物の製造法。 [In the formula, R 1 represents an alkyl group, and R 2 represents an alkyl group, an optionally substituted phenyl group, an optionally substituted aralkyl group, or an optionally substituted heterocyclic ring. ] The manufacturing method of the compound represented by these. 工程 a :式 〔H〕  Step a: Formula [H] H2 — C Γ1 H 2 〔I〕  H2 — C Γ1 H 2 [I] 〔式中、 X1 はハロゲン原子を示す。 〕 で表される化合物と、 式 〔III〕 [In the formula, X 1 represents a halogen atom. A compound represented by the formula (III): CH3 COX2 CUT) (CH 3 COX 2 CUT) 〔式中、 X2 はハロゲン原子を示す。 〕 で表される化合物を反応させ. 次いで式 〔ΙΠ [In the formula, X 2 represents a halogen atom. The compound represented by the formula [ΙΠ C 0 OR4 C 0 OR 4 R1 CH 〕 R 1 CH) C 00 R3 C 00 R 3 〔式中、 R1 は前記と同じ意味を示し、 R3 及び R4 はアルキル基を 示す。 〕 [Wherein, R 1 has the same meaning as described above, and R 3 and R 4 each represent an alkyl group. ] で表される化合物を反応させて、 式 〔V〕 〔V〕
Figure imgf000031_0001
Reacting the compound represented by the formula (V) [V]
Figure imgf000031_0001
〔式中、 R' 、 R3 及び R4 は前記と同じ意味を示す。 〕 で表される 化合物を製造する工程 [Wherein, R ′, R 3 and R 4 have the same meaning as described above. A process for producing the compound represented by 工程 b :式 〔V〕 で表される化合物を閉環させて、 式 〔 ?1一 1〕 及び 式 〔"VI - 2〕 Step b: The compound represented by the formula [V] is ring-closed to form a compound represented by the formula [? 11] and the formula ["VI-2".
Figure imgf000031_0002
Figure imgf000031_0002
〔式中、 R1 及び R3 は前記と同じ意味を示す。 〕 で表される.化合物 を製造する工程 [Wherein, R 1 and R 3 have the same meaning as described above. The process for producing the compound 工程 c :式 .〔V [— 1〕 及び式 〔VI— 2〕 で表される化合物と、 式 〔 〕 Step c: a compound represented by the formula [V [-1] and the formula [VI-2]; L C OR2 〔W〕 LC OR 2 [W] 〔式中、 Lは脱離基を示し、 R2 は前記と同じ意味を示す。 〕 で表さ れる化合物を反応させて、 式 〔 1ー 1〕 及び式 〔¾一 2〕 [Wherein, L represents a leaving group, and R 2 has the same meaning as described above. And reacting the compound represented by the formula [1-1] and the formula [¾1-2]
Figure imgf000031_0003
〔式中、 R1 、 R2 及び R3 は前記と同じ意味を示す。 〕 で表される 化合物を製造する工程
Figure imgf000031_0003
[Wherein, R 1 , R 2 and R 3 have the same meaning as described above. A process for producing the compound represented by
工程 d :式 〔¾— 1〕 及び式 〔1 [一 2〕 で表される化合物をアル力リ で加水分解して、 式 〔K— 1〕 及び式 〔Κ— 2〕 Step d: The compound represented by the formula [¾-1] and the formula [1 [1-2] is hydrolyzed with an alcohol to obtain the formula [K-1] and the formula [Κ-2]
Figure imgf000032_0001
Figure imgf000032_0001
CK- 1〕 CK- 2〕  CK-1) CK-2) 〔式中、 R1 及び R2 は前記と同じ意味を示し、 Μは金属原子を示 す。 〕 で表される化合物を製造する工程 [Wherein, R 1 and R 2 have the same meanings as described above, and Μ represents a metal atom. A process for producing the compound represented by 工程 e :式 〔IX— 1〕 で表される化合物を有機酸存在下に脱炭酸させ て、 式 〔 I〕 Step e: The compound represented by the formula [IX-1] is decarboxylated in the presence of an organic acid to obtain a compound represented by the formula [I]
Figure imgf000032_0002
Figure imgf000032_0002
〔式中、 R1 及び R2 は前記と同じ意味を示す。 〕 で表される化合 物を製造する工程 [Wherein, R 1 and R 2 have the same meaning as described above. The process for producing the compound represented by 工程 f :式 〔K— 2〕 で表される化合物を中性又は酸性条件にして、 式 〔ΙΧ— 2' 〕 Step f: The compound represented by the formula [K-2] is subjected to neutral or acidic conditions, and the compound represented by the formula [ΙΧ-2 '] CK- 2' 〕
Figure imgf000032_0003
〔式中、 R1 及び R2 は前記と同じ意味を示す。 〕 で表される化合物 を製造する工程
CK-2 ')
Figure imgf000032_0003
[Wherein, R 1 and R 2 have the same meaning as described above. A process for producing the compound represented by the formula
工程 g :式 〔K一 2 ' 〕 で表ざれる化合物を塩基存在下に脱炭酸及び 反転させて、 式 〔 I〕 Step g: Decarboxylation and inversion of the compound represented by the formula [K-I 2 '] in the presence of a base to give a compound of the formula [I]
Figure imgf000033_0001
Figure imgf000033_0001
〔式中、 R' 及び R2 は前記と同じ意味を示す。 〕 で表される化合物 を製造する工程 [Wherein, R ′ and R 2 have the same meaning as described above. A process for producing the compound represented by the formula
2. 式 〔Π〕  2. Formula [Π] C in 2 = レ H H2 X 〔  C in 2 = D H H2 X 〔 で表わされる化合物と式 〔ΙΠ' 〕 And a compound represented by the formula [ΙΠ '] R5 C H2 COX2 cm' 〕 R 5 CH 2 COX 2 cm '] (式中、 X1 , X2 は前記と同じ意味を表し、 R5 は水素又はアルキ ルを示す。 ) を反応させ、 次いで式 〔IV〕 (Wherein X 1 and X 2 represent the same meaning as described above, and R 5 represents hydrogen or alkyl). C 00 R4 C 00 R 4 R1 CH R 1 CH C 00 R3 C 00 R 3 (式中、 R' 、 R3 、 R4 は同一又は相異なって前記と同じ意味を示 す。 ) (In the formula, R ′, R 3 and R 4 are the same or different and have the same meaning as described above.) を反応させることを特徴とする式 〔V' 〕 CV 〕
Figure imgf000034_0001
Reacting with the formula [V '] CV]
Figure imgf000034_0001
(式中、 R1 〜R5 は前記と同じ意味を示す。 ) の製造法 < 3. 式 〔XIE— a〕 (Wherein, R 1 to R 5 have the same meaning as described above.) <3. Formula [XIE—a]
Figure imgf000034_0002
Figure imgf000034_0002
〔式中、 R2Dはハロゲン原子または のアルキル基を表し、 R21 および R22は同一または相異なって d-6 のアルキル基を表し、 pは 0〜2の整数を示し、 Qは 0〜 2の整数を示す。 〕 で表される化合物 ( Wherein R 2D represents a halogen atom or an alkyl group of R 21 and R 22 are the same or different and represent an alkyl group of d-6, p represents an integer of 0 to 2, and Q represents 0 to Indicates an integer of 2. A compound represented by the formula (
4. 式 〔ΧΕ' 〕 4. Equation [ΧΕ '] CXI' 〕CXI ']
Figure imgf000034_0003
Figure imgf000034_0003
〔式中、 R2°, R21, R22, pおよび qは前記と同じ意味を示し、 X はハロゲン原子を示す。 〕 で表される化合物とシアン化物を反応させ ることを特徵とする式 〔XH— a〕 [Wherein, R 2 °, R 21 , R 22 , p and q have the same meanings as described above, and X represents a halogen atom. [XH—a], which comprises reacting a compound represented by the formula 〔ΧΊΙ— a〕[ΧΊΙ—a]
Figure imgf000034_0004
Figure imgf000034_0004
〔式中、 R2e, R21, R22, p, qは前記と同じ意味を示す。 〕 で表 される化合物の製法。 [Wherein, R 2e , R 21 , R 22 , p, and q have the same meaning as described above. ] Of the compound to be prepared.
5. 式 〔XH— a〕  5. Formula [XH—a] 〔X H— a〕[X H—a]
Figure imgf000035_0001
Figure imgf000035_0001
〔式中、 R2D, R21, R22, pおよび Qは前記と同じ意味を示す。 〕 で表される化合物と式 〔ΧΠΙ〕 [Wherein, R 2D , R 21 , R 22 , p and Q have the same meaning as described above. And a compound represented by the formula [ΧΠΙ] 〔xm〕(Xm)
Figure imgf000035_0002
Figure imgf000035_0002
〔式中、 Aは置換されてもよい 5〜 7員の炭素環または置換されても よい 5〜 7員の N, 0もしくは Sを含む複素環を表す。 〕 で表される 化合物を反応させることを特徴とする式 〔 XIV— a〕 . [In the formula, A represents an optionally substituted 5- to 7-membered carbon ring or an optionally-substituted 5- to 7-membered heterocyclic ring containing N, 0 or S. A compound represented by the formula [XIV-a]: 〔 XIV— a ][XIV—a]
Figure imgf000035_0003
Figure imgf000035_0003
〔式中、 R2°, R21, R22, p, Qおよび Aは前記と同じ意味を表 す。 〕 で示される化合物の製法。 [In the formula, R 2 °, R 21 , R 22 , p, Q and A represent the same meaning as described above. ] The manufacturing method of the compound shown by these.
6. 式 〔X I— a ' 〕 POR21 6. Formula [XI—a '] POR 21 2 CXH - a' 〕 2 CXH-a ')
Figure imgf000036_0001
Figure imgf000036_0001
〔式中、 R2 R21, R22および pは前記と同じ意味を示す。 〕 で 表される化合物と式 〔XII〕 [Wherein, R 2 R 21 , R 22 and p have the same meaning as described above. And a compound represented by the formula (XII)
Figure imgf000036_0002
Figure imgf000036_0002
〔式中、 Aは前記と同じ意味を表す。 〕 で表される化合物を反応させ. 次いで酸化することを特徵とする式 〔 XIV— a' 〕 [Wherein, A represents the same meaning as described above. A compound represented by the formula [XIV-a '] 〔 XIV- a' 〕[XIV-a ']
Figure imgf000036_0003
Figure imgf000036_0003
〔式中、 R2D, R21, R2Z, pおよび Aは前記と同じ意味を表す。 〕 で表される化合物の製法。 [Wherein, R 2D , R 21 , R 2Z , p and A represent the same meaning as described above. ] The manufacturing method of the compound represented by these.
7. 式 〔 — 1〕 7. Formula 〔— 1〕 〔珊一 1〕
Figure imgf000036_0004
〔式中、 R1 、 R2 、 R3 は前記と同じ意味を示す。 〕 で表わされる 化合物を有機酸の存在下脱炭酸させることを特徴とする一般式 〔 I〕
(San-ichi 1)
Figure imgf000036_0004
[Wherein, R 1 , R 2 and R 3 have the same meaning as described above. Wherein the compound represented by the general formula [I] is decarboxylated in the presence of an organic acid.
Figure imgf000037_0001
Figure imgf000037_0001
(式中、 R1 、 R2 は前記と同じ意味を示す。 ) で表わされる化合物 の製法。 (Wherein, R 1 and R 2 have the same meanings as described above.).
8. 式 〔IX - 2 ' 〕  8. Formula [IX-2 '] 〔K一 2 ' 〕
Figure imgf000037_0002
[K-1 2 ']
Figure imgf000037_0002
〔式中、 R1 、 R2 は前記と同じ意味を示す。 〕 で表わされる化合 物 < [Wherein, R 1 and R 2 have the same meanings as described above. The compound represented by
9. 式 〔舊— 2〕  9. Expression [old—2] 〔«— 2〕
Figure imgf000037_0003
[«-2]
Figure imgf000037_0003
(式中、 R1 、 R2 、 R3 は前記と同じ意味を示す。 ) で表わされ る化合物を加水分解することを特徴とする一般式 〔Κ_ 2 ' 〕 〔K一 2' 〕
Figure imgf000038_0001
(Wherein, R 1 , R 2 and R 3 have the same meanings as described above.) Wherein the compound represented by the general formula [Κ_ 2 '] is hydrolyzed. [K-1 2 ']
Figure imgf000038_0001
(式中、 R1 、 R2 は前記と同じ意味を示す。 ) で表わされる化合物 の製造法。 (Wherein, R 1 and R 2 have the same meanings as described above.).
1 0. 式 〔IX— 2 ' 〕  1 0. Formula [IX-2 '] 〔IX— 2 ' 〕
Figure imgf000038_0002
[IX-2 ']
Figure imgf000038_0002
(式中、 R1 及び R2 は前記と同じ意味を示す。 ) で表わされる化合 物を塩基の存在下脱炭酸させることを特徵とする一般式 〔 I〕 (Wherein, R 1 and R 2 have the same meanings as described above.) A compound represented by the general formula [I] characterized by decarboxylation in the presence of a base: 〔 I )
Figure imgf000038_0003
(I)
Figure imgf000038_0003
(式中、 R1 、 R2 は前記と同じ意味を示す。 ) で表わされる化合物 の製造法。 (Wherein, R 1 and R 2 have the same meanings as described above.).
PCT/JP1993/000414 1992-04-03 1993-04-01 Process for producing cyclopropane derivative Ceased WO1993020035A1 (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP4/110658 1992-04-03
JP11065892A JP3171277B2 (en) 1992-04-03 1992-04-03 Process for producing (2-acylcyclopropyl) alkylmalonic acid diester
JP4/118333 1992-04-10
JP4/118334 1992-04-10
JP11833392 1992-04-10
JP4118334A JPH05286888A (en) 1992-04-10 1992-04-10 New production of bicyclo(4,1,0)heptane--2,4-dione derivative
JP5/23636 1993-01-19
JP2363693A JPH06211780A (en) 1993-01-19 1993-01-19 Benzoyl cyanide derivative, its production and reaction using the same

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WO1993020035A1 true WO1993020035A1 (en) 1993-10-14

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3171277B2 (en) 1992-04-03 2001-05-28 日本曹達株式会社 Process for producing (2-acylcyclopropyl) alkylmalonic acid diester
CN114794105A (en) * 2022-06-13 2022-07-29 广西民族大学 Application of carane-3,4-diol in herbicide or preparation

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6087238A (en) * 1983-09-16 1985-05-16 ストウフアー・ケミカル・カンパニー 2-(2-substituted benzoyl)-1,3-cyclohexandione
JPH03255047A (en) * 1989-07-04 1991-11-13 Nippon Soda Co Ltd Substituted bicycloheptadione derivative, its preparation and herbicide
JPH04247052A (en) * 1991-01-31 1992-09-03 Nippon Soda Co Ltd Bicyclo(4,1,0)heptane-2,4-dione derivative and its production
JPH04247053A (en) * 1991-01-31 1992-09-03 Nippon Soda Co Ltd Production of bicyclo(4,1,0)heptane-2,4-dione derivative
JPH0570426A (en) * 1991-06-04 1993-03-23 Nippon Soda Co Ltd 3-substituted benzoyl-bicyclo(4,1,0)heptane-2,4-dione derivative, herbicide and herbicidal composition containing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6087238A (en) * 1983-09-16 1985-05-16 ストウフアー・ケミカル・カンパニー 2-(2-substituted benzoyl)-1,3-cyclohexandione
JPH03255047A (en) * 1989-07-04 1991-11-13 Nippon Soda Co Ltd Substituted bicycloheptadione derivative, its preparation and herbicide
JPH04247052A (en) * 1991-01-31 1992-09-03 Nippon Soda Co Ltd Bicyclo(4,1,0)heptane-2,4-dione derivative and its production
JPH04247053A (en) * 1991-01-31 1992-09-03 Nippon Soda Co Ltd Production of bicyclo(4,1,0)heptane-2,4-dione derivative
JPH0570426A (en) * 1991-06-04 1993-03-23 Nippon Soda Co Ltd 3-substituted benzoyl-bicyclo(4,1,0)heptane-2,4-dione derivative, herbicide and herbicidal composition containing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3171277B2 (en) 1992-04-03 2001-05-28 日本曹達株式会社 Process for producing (2-acylcyclopropyl) alkylmalonic acid diester
CN114794105A (en) * 2022-06-13 2022-07-29 广西民族大学 Application of carane-3,4-diol in herbicide or preparation
CN114794105B (en) * 2022-06-13 2024-03-15 广西民族大学 Application of carane-3, 4-diol as or in preparation of herbicide

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