WO1991019142A1 - Method of and device for producing nitrogen of high purity - Google Patents
Method of and device for producing nitrogen of high purity Download PDFInfo
- Publication number
- WO1991019142A1 WO1991019142A1 PCT/JP1990/001710 JP9001710W WO9119142A1 WO 1991019142 A1 WO1991019142 A1 WO 1991019142A1 JP 9001710 W JP9001710 W JP 9001710W WO 9119142 A1 WO9119142 A1 WO 9119142A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nitrogen
- gas
- rectification column
- sub
- rectification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04642—Recovering noble gases from air
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
- F25J3/04254—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
- F25J3/0426—The cryogenic component does not participate in the fractionation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
- F25J3/04284—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using internal refrigeration by open-loop gas work expansion, e.g. of intermediate or oxygen enriched (waste-)streams
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04406—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system
- F25J3/0443—A main column system not otherwise provided, e.g. a modified double column flowsheet
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/74—Refluxing the column with at least a part of the partially condensed overhead gas
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/90—Details relating to column internals, e.g. structured packing, gas or liquid distribution
- F25J2200/94—Details relating to the withdrawal point
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2210/00—Processes characterised by the type or other details of the feed stream
- F25J2210/42—Nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/30—Helium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/42—Nitrogen or special cases, e.g. multiple or low purity N2
- F25J2215/44—Ultra high purity nitrogen, i.e. generally less than 1 ppb impurities
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/58—Argon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2220/00—Processes or apparatus involving steps for the removal of impurities
- F25J2220/42—Separating low boiling, i.e. more volatile components from nitrogen, e.g. He, H2, Ne
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2245/00—Processes or apparatus involving steps for recycling of process streams
- F25J2245/02—Recycle of a stream in general, e.g. a by-pass stream
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2250/00—Details related to the use of reboiler-condensers
- F25J2250/20—Boiler-condenser with multiple exchanger cores in parallel or with multiple re-boiling or condensing streams
Definitions
- the present invention relates to a method and an apparatus for producing high-purity nitrogen in an air separation device or the like.
- FIG. 4 shows an example of a conventional apparatus for producing this nitrogen gas.
- the raw air containing nitrogen undergoes processing such as compression and cooling, and then is carried into the molecular adsorption adsorption unit 10, where the adsorption and removal processing of impurities is performed, and then it is kept cool. It is carried into the heat exchanger 14 in the box 12. At this point, although the water and C 0 2 or the like raw material in the air is removed, hydrogen, helium, impurities neon is remaining in still gas.
- the raw material gas is directly introduced into the bottom of the rectification column 16, and in the rectification column 16, hydrocarbons such as oxygen and methane, which are high-boiling components, are removed from nitrogen by rectification. While being removed, nitrogen is removed from the rectification column 16 as a product.
- the above-mentioned impurity gas having a lower boiling point than nitrogen such as hydrogen, helium, and neon does not liquefy even in the rectification column 16, As it rises, it accumulates in the capacitor 16 1 at the top of the rectification column 16. If left untreated, the low-boiling gas will turn into non-coiling gas, degrading the operation of the condenser 161, and may have a negative effect on the purity of the extracted product slag.
- the non-condensable gas accumulated in the condenser 161 was purged together with nitrogen, and the condenser 161 was also discharged as a product from the lower stage.
- measures have been taken to minimize the mixing of the above-mentioned non-condensable gas into the product gas, thereby increasing the purity of the product nitriding as much as possible.
- the present invention employs the following configuration.
- the raw material gas is cooled and put into the main rectification column for rectification, and liquid nitrogen is taken out from the position below the uppermost stage in the main rectification column, and this liquid nitrogen is converted to the sub-rectification column.
- product nitrogen is taken out from a position below the liquid nitrogen introduction position.
- the gas rising in the main rectification column contains a large amount of low-boiling gas, but a small amount of low-boiling gas is dissolved in the liquid nitrogen derived from the rectification column. It's just Moreover, this liquid nitrogen is sub-rectified As the low-boiling gas contained in the liquid nitrogen is introduced into the tower and the rectification proceeds, the low-boiling gas contained in the liquid nitrogen evaporates under heating and escapes above the tower. By extracting nitrogen as a product from a lower position, ultra-high-purity nitrogen gas can be obtained.
- the concealment for realizing the above method includes a main rectification column and a sub-rectification column for rectification, and a raw material for introducing a cooled raw material gas into the main box distillation column.
- FIG. 1 is an overall configuration diagram showing an example of a high-purity nitrogen production apparatus for carrying out the method of the present invention
- FIG. 2 is an overall configuration diagram showing another example of the apparatus
- FIG. 3 is another example of the apparatus.
- FIG. 4 is an overall configuration diagram showing an example of a conventional apparatus for producing high-purity nitrogen.
- Fig. 1 shows an example of an apparatus for carrying out the method of the present invention. It is shown.
- This device is equipped with a molecular sieve adsorption unit 10 and a cool box 12 in which the main heat exchanger 1.4, the main rectification tower 16 and the expansion turn 18 are installed.
- a secondary rectification tower (helium tower) 20 is installed.
- condensers (capacitors) 161 and 201 are provided, respectively.
- raw air is passed through the molecular sieve adsorption unit 10 to adsorb and remove impurities in the air. Thereafter, the air is passed through the main heat exchanger 14 through the raw gas introduction passage 11.
- the main exchanger 14 the aerator gas adiabatically expanded by the action of the expansion turbine 18 is passed, and the raw air is reduced to about one by heat exchange between the waste gas and the raw air. It is cooled to 170 and introduced into the bottom of the main rectification column 16 in this low temperature state.
- the rectification column 16 re-rectification is performed by contact between the flowing liquid and the ascending vapor, and low-boiling components are concentrated as they rise to the top, while high-boiling components fall to the bottom. It is concentrated along with.
- the low-boiling gas impurities such as hydrogen, helium, and neon
- the above-mentioned raw material air has a boiling point lower than that of nitrogen. It is concentrated, but a small amount of low-boiling gas dissolves in the descending liquid nitrogen. It's just that. Therefore, this liquid nitrogen is extracted from a lower stage than the top stage of the rectification column 16 and the liquid nitrogen transfer passage
- the liquid nitrogen is rectified, and the low-boiling gas of minute S contained therein is expelled by heating and rises. Therefore, by extracting nitrogen gas as a product from a position below the liquid nitrogen introduction position in the sub-rectification column 20, it becomes possible to obtain extremely high-purity product nitrogen.
- This product nitrogen is sent to the main heat exchanger 14 through the product nitrogen outlet passage 24, brought into a state of approximately normal temperature by heat exchange with the raw material air, and then expelled out of the equipment g.
- the heat of the nitrogen gas at the top of the main rectification column 16 is used as the heating source for the sub-rectification column 20, that is, the heat source for the repoiler. That is, the liquid nitrogen at the bottom of the sub-rectification tower 20 is led to the capacitor 16 1 of the main box tower 16 through the passage 26 (which constitutes a liquid nitrogen circulation passage). Through the passage 27 (constituting a liquid nitrogen circulation passage) to introduce the gaseous nitrogen (which may contain unevaporated liquid nitrogen) into the sub-rectification column 20. Heat exchange with nitrogen gas at the top of the main rectification column 16. As a result, the nitrogen gas is condensed, and the heat of condensation is used to evaporate the liquid nitrogen in the sub-rectification column 20. This evaporation removes the low-boiling gas in the sub-rectification column 20. Since the heating can be performed, the rectification can be efficiently performed.
- the operating pressure in the sub-rectification column 20 should be reduced by about 0.6 kg / cm 2 from the main distillation column 16, that is, the main distillation column
- the liquid nitrogen supplied from 16 to the sub-rectification column 20 through the passage 22 may be depressurized, thereby lowering its saturation temperature.
- the table below shows the concentrations of helium, neon, and hydrogen in each gas.
- gas 1 is the raw air
- gas 2 is the product nitrogen gas obtained by treating the raw air by the conventional method described in FIG. 4
- gas 3 is the raw air.
- the product air obtained by the above treatment is used as the product nitrogen
- the above-mentioned raw material air is prepared using a catalyst whose hydrogen concentration has been reduced to 0.1 ppm in advance.
- the present invention is not limited to such an embodiment, and the following embodiments can be taken as examples.
- the gas extracted from the upper part of the main rectification tower (or the sub-rectification tower) 16 is supplied to the expansion turbine (expansion means) 1 through the gas outlet passage 36.
- the gas can also be contributed to the generation of cold by sending it to the main heat exchanger 14 in an adiabatic expanded state through 8.
- the gas outlet passage 36 is used for the system. Even when the heat is sent to the main heat exchanger 14, the same effect as the above can be obtained.
- liquid nitrogen may be introduced into the sub-rectification tower 20 instead of the main rectification tower 16 to extract helium gas, or the rectification towers 16 and 20 of both may be introduced. Liquid nitriding may be sent.
- high-purity liquid nitrogen is taken out from a position below the uppermost stage in the main rectification column and put into the sub-rectification column. Since the product gas is taken out from the position below the above-mentioned liquid nitrogen introduction position while heating and evaporating the point gas, the low boiling point gas contained in the raw material gas can be effectively removed. This can greatly contribute to the production of ultra-high purity product nitrogen.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
Description
明 細 書 高純度窒素の製造方法及び装置 背景技術 Description Method and apparatus for producing high-purity nitrogen Background technology
本発明は、 空気分離装置等において高純度窒素を製 造するための方法及び装鼸に関するものである。 The present invention relates to a method and an apparatus for producing high-purity nitrogen in an air separation device or the like.
近年、 半導体の技術の進歩等に伴って、 超髙純度の 窒索ガスの需要が増大している。 In recent years, demand for ultrapure nitrogen gas has been increasing in accordance with advances in semiconductor technology.
第 4図は、 この窒素ガスを製造するための従来装置 の一例を示したものである。 こ iD装置において、 窒素 を含む原料空気が圧縮、 冷却等の処理を受けた後にモ レキュラシ一ブス吸着ユニッ ト 1 0 に搬入され、 ここ で不純物の吸着除去処理がなされも後、 さ らに保冷箱 1 2内の熱交換器 1 4に搬入される。 この時点で、 原 料空気中の水分や C 0 2 等は除去されているが、 水素 、 ヘリ ウム、 ネオン等の不純物は依然ガス中に残存し ている。 このような状態で、 原料ガスはそのまま精留 塔 1 6の底部に導入され、 この精留塔 1 6内で精留に よ り窒素から高沸点成分である酸素やメタン.等の炭化 水素が除去される一方、 この精留塔 1 6から製品と し て窒素が取出される。 FIG. 4 shows an example of a conventional apparatus for producing this nitrogen gas. In this iD device, the raw air containing nitrogen undergoes processing such as compression and cooling, and then is carried into the molecular adsorption adsorption unit 10, where the adsorption and removal processing of impurities is performed, and then it is kept cool. It is carried into the heat exchanger 14 in the box 12. At this point, although the water and C 0 2 or the like raw material in the air is removed, hydrogen, helium, impurities neon is remaining in still gas. In such a state, the raw material gas is directly introduced into the bottom of the rectification column 16, and in the rectification column 16, hydrocarbons such as oxygen and methane, which are high-boiling components, are removed from nitrogen by rectification. While being removed, nitrogen is removed from the rectification column 16 as a product.
ここで、 上記の水素、 ヘリ ウム、 ネオンといった窒 素よ りも沸点の低い不純物ガス (以下、 低沸点ガスと 称す。 ) は、 上記精留塔 1 6内においても液化せず、 そのまま上昇して精留塔 1 6の最上段にあるコンデン サ 1 6 1 内に蓄積する。 これを放置しておく と、 上記 低沸点ガスが不凝粽ガスとなってコンデンサ 1 6 1 の 働きを低下させるとともに、 取出される製品窒索の純 度に悪影響を与えるおそれが生じる。 Here, the above-mentioned impurity gas having a lower boiling point than nitrogen such as hydrogen, helium, and neon (hereinafter referred to as low-boiling gas) does not liquefy even in the rectification column 16, As it rises, it accumulates in the capacitor 16 1 at the top of the rectification column 16. If left untreated, the low-boiling gas will turn into non-coiling gas, degrading the operation of the condenser 161, and may have a negative effect on the purity of the extracted product slag.
そこで従来は、 上記コンデンサ 1 6 1 内に蓄積する 不凝縮ガスを窒素とともにパージし、 さ らには、 この コンデンサ 1 6 1 ょ リも下の段から製品と して窒素ガ スを抜出すことにより、 この製品ガス中に上記不凝縮 ガスがなるべく混入しないようにし、 これによつて製 品窒索の純度を極力高めるといつた対策が施されてい る。 Therefore, conventionally, the non-condensable gas accumulated in the condenser 161 was purged together with nitrogen, and the condenser 161 was also discharged as a product from the lower stage. As a result, measures have been taken to minimize the mixing of the above-mentioned non-condensable gas into the product gas, thereby increasing the purity of the product nitriding as much as possible.
ところが、 このような従来技術には、 以下に記すよ うな問題点がある。 However, such a conventional technique has the following problems.
前述のように、 近年の半導体技術の進歩に伴い、 製 品窒素ガスと してよリ純度の高いものが求められてお リ、 現在では、 上記低沸点ガス、 すなわち水素やヘリ ゥム、 ネオンといったガスも不純物として除去するこ とが必要とされ始めている。 As described above, with the advance of semiconductor technology in recent years, high purity nitrogen gas has been required as a product nitrogen gas, and at present, the above low boiling gas, that is, hydrogen, nitrogen, neon, etc. It is beginning to be necessary to remove such gases as impurities.
ところが、 これらの低沸点ガスは窒素よ りも低い沸 点を有するので、 賴留塔 1 6内に導入された後も、 上 記低沸点ガスは精留塔 1 6内を上昇するガス中に多分 に含まれており、 具体的には、 この上昇ガス中の低沸 点ガス濃度は、 この精留塔 1 6の底部に導入されるガ ス中の濃度とほぼ同程度となっている。 従って、 従来 のようにコンデンサ 1 6 1 をパージし、 あるいはこの コンデンサ 1 6 1 よりも下の段から製品窒素を抜く と いった操作を行うだけでは、 上記不凝縮ガスに起因す る低沸点ガスの濃縮は防げるものの、 製品ガス中の低 沸点ガス濃度を積極的に下げることは困難である。 However, since these low-boiling gases have a boiling point lower than that of nitrogen, even after being introduced into the distillation column 16, the low-boiling gas remains in the gas rising in the rectification column 16. It is probably contained, and specifically, the concentration of the low-boiling gas in the ascending gas is almost the same as the concentration in the gas introduced into the bottom of the rectification column 16. Therefore, By simply purging the condenser 161 as in the above or removing the product nitrogen from the stage below the condenser 161, the concentration of the low-boiling gas caused by the non-condensable gas can be reduced. Although it can be prevented, it is difficult to actively lower the low boiling point gas concentration in product gas.
なお、 上記低沸点ガスのうちの水素については、 こ の水素を触媒を用いて原料空気中の酸素と反応させる ことによ り、 O. lppm のオーダーまで除去することが 従来可能とされているが、 この残った O. lppm の水素 は依然除去することができず、 それ以上の濃度の低減 は望めない。 発明の開示 It has been conventionally possible to remove hydrogen from the low boiling point gas to the order of 0.1 ppm by reacting this hydrogen with oxygen in the raw material air using a catalyst. However, the remaining O. lppm of hydrogen cannot be removed, and further reduction of the concentration cannot be expected. Disclosure of the invention
上記問題点を解決するため、 本発明は次のような構 成を採用した。 In order to solve the above problems, the present invention employs the following configuration.
すなわち本発明は原料ガスを冷却状態で主精留塔に 入れて精留し、 この主精留塔において最上段よ リも下 方の位置から液体窒素を取出し、 この液体窒素を副精 留塔内に入れて精留し、 この副耥留塔において上記液 体窒素の導入位置よリも下方の位匱から製品窒素を取 出すものである。 That is, in the present invention, the raw material gas is cooled and put into the main rectification column for rectification, and liquid nitrogen is taken out from the position below the uppermost stage in the main rectification column, and this liquid nitrogen is converted to the sub-rectification column. In this sub-column, product nitrogen is taken out from a position below the liquid nitrogen introduction position.
この方法において、 主精留塔内を上昇するガス中に は低沸点ガスが多分に含まれるが、 この精留塔内から 導出される液体窒素中には微量の低沸点ガスが溶け込 んでいるに過ぎない。 しかも、 この液体窒素が副精留 塔内に導入され、 精留が進められることにより、 上記 液体窒素中に含まれる低沸点ガスが加熱にょリ蒸発し て塔の上方に逃げるので、 この副精留塔において上記 液体窒素の導入位置よ りも下方の位置から窒素を製品 と して取出すことによ り、 超高純度の窒素ガスが得ら れることとなる。 In this method, the gas rising in the main rectification column contains a large amount of low-boiling gas, but a small amount of low-boiling gas is dissolved in the liquid nitrogen derived from the rectification column. It's just Moreover, this liquid nitrogen is sub-rectified As the low-boiling gas contained in the liquid nitrogen is introduced into the tower and the rectification proceeds, the low-boiling gas contained in the liquid nitrogen evaporates under heating and escapes above the tower. By extracting nitrogen as a product from a lower position, ultra-high-purity nitrogen gas can be obtained.
また、 上記方法を実現する装匿と しては、 精留を行 う主精留塔および副精留塔と、 冷却状態にある原料ガ スを上記主箱留塔内に導入するための原料ガス導入通 路と、 上記主精留塔において最上段よりも下方の位置 から液体窒素を導出し、 この液体窒素を副精留塔内に 導入するための液体窒素移送通路と、 上記副精留塔に おいて上記液体窒素移送通路による液体窒素の導入位 置よ りも下方の位置から製品窒素を導出するための製 品窒素導出通路とを備えたものが好適である。 図面の簡単な説明 In addition, the concealment for realizing the above method includes a main rectification column and a sub-rectification column for rectification, and a raw material for introducing a cooled raw material gas into the main box distillation column. A gas introduction passage, a liquid nitrogen transfer passage for extracting liquid nitrogen from a position below the uppermost stage in the main rectification column and introducing the liquid nitrogen into the sub rectification column, It is preferable that the column is provided with a product nitrogen outlet passage for extracting product nitrogen from a position below the liquid nitrogen introduction position in the liquid nitrogen transfer passage in the tower. BRIEF DESCRIPTION OF THE FIGURES
第 1 図は本発明方法を実施するための高純度窒素製 造装置の一例を示す全体構成図、 第 2図は他の装置例 を示す全体構成図、 第 3図は他の装置例を示す全体構 成図、 第 4図は高純度窒素を製造するための従来装置 の一例を示す全体構成図である。 発明を実施するための最良の形態 FIG. 1 is an overall configuration diagram showing an example of a high-purity nitrogen production apparatus for carrying out the method of the present invention, FIG. 2 is an overall configuration diagram showing another example of the apparatus, and FIG. 3 is another example of the apparatus. FIG. 4 is an overall configuration diagram showing an example of a conventional apparatus for producing high-purity nitrogen. BEST MODE FOR CARRYING OUT THE INVENTION
第 1 図は、.本発明方法を実施するための装置の一例 を示したものである。 この装置は、 モレキュラシーブ ス吸着ユニッ ト 1 0、 および保冷箱 1 2を備え、 この 保冷箱 1 2内には、 主熱交換器 1 .4、 主精留塔 1 6、 膨脹ター ン 1 8の他、 副精留塔 (ヘリ ウム塔) 2 0 が配設されている。 また、 主精留塔 1 6および副精留 塔 2 0の最上段には、 各々コンデンサ (凝綰器) 1 6 1 , 2 0 1が設けられている。 Fig. 1 shows an example of an apparatus for carrying out the method of the present invention. It is shown. This device is equipped with a molecular sieve adsorption unit 10 and a cool box 12 in which the main heat exchanger 1.4, the main rectification tower 16 and the expansion turn 18 are installed. In addition, a secondary rectification tower (helium tower) 20 is installed. At the top of the main rectification tower 16 and the sub-rectification tower 20, condensers (capacitors) 161 and 201 are provided, respectively.
次に、 この装置にょ リ行われる高純度窒素の製造方 法を説明する。 Next, a method for producing high-purity nitrogen by this apparatus will be described.
まず、 原料空気をモレキユラシーブ吸着ユニッ ト 1 0に通すことによ り、 空気中の不純物を吸着除去し、 その後、 原料ガス導入通路 1 1 を通して主熱交換器 1 4内を通通させる。 一方、 この主然交換器 1 4内には 、 膨脹タービン 1 8の作用で断熱膨脹した麁ガスを通 過させ、 この廃ガスと上記原料空気との熱交換によつ て原料空気を約一 170 まで冷却し、 この低温状態の ま ま主精留塔 1 6の底都に導入する。 First, raw air is passed through the molecular sieve adsorption unit 10 to adsorb and remove impurities in the air. Thereafter, the air is passed through the main heat exchanger 14 through the raw gas introduction passage 11. On the other hand, in the main exchanger 14, the aerator gas adiabatically expanded by the action of the expansion turbine 18 is passed, and the raw air is reduced to about one by heat exchange between the waste gas and the raw air. It is cooled to 170 and introduced into the bottom of the main rectification column 16 in this low temperature state.
この精留塔 1 6内では、 流下する液と上昇する蒸気 との接触によリ精留が行われ、 低沸点成分は塔頂に上 がるにつれて濃縮され、 高沸点成分は塔底に下がるに つれて濃縮される。 ここで、 上記原料空気に含まれて いる低沸点ガス (水素、 ヘリ ウム、 ネオンといった不 純物) はいずれも窒素よ り沸点が低いので、 上昇する 蒸気中に多分に含まれ、 塔上部で濃縮されるが、 下降 する液体窒素中には微小量の低沸点ガスが溶け込んで いるに過ぎない。 そこで、 この液体窒素を精留塔 1 6 の最上段よ リも低い段から抽出し、 液体窒素移送通路In the rectification column 16, re-rectification is performed by contact between the flowing liquid and the ascending vapor, and low-boiling components are concentrated as they rise to the top, while high-boiling components fall to the bottom. It is concentrated along with. Here, the low-boiling gas (impurities such as hydrogen, helium, and neon) contained in the above-mentioned raw material air has a boiling point lower than that of nitrogen. It is concentrated, but a small amount of low-boiling gas dissolves in the descending liquid nitrogen. It's just that. Therefore, this liquid nitrogen is extracted from a lower stage than the top stage of the rectification column 16 and the liquid nitrogen transfer passage
2 2を通じて副精留塔 2 0の中段へ送り込む。 It is sent to the middle stage of the sub-rectification column 20 through 22.
この副精留塔 2 0内では、 上記液体窒素が耱留され 、 その中に含まれる微小 Sの低沸点ガスは加熱によつ て追い出されて上昇する。 従って、 この副精留塔 2 0 において上記液体窒素の導入位置よ リも下方の位置か ら窒素ガスを製品として取出すことによ り、 極めて高 純度の製品窒素を得ることが可能になる。 この製品窒 素については、 製品窒素導出通路 2 4を通じて主熱交 換器 1 4へ送り込み、 原料空気との熱交換によって略 常温の状態にした後、 装 g外へ速び出すようにする。 In the sub-rectification column 20, the liquid nitrogen is rectified, and the low-boiling gas of minute S contained therein is expelled by heating and rises. Therefore, by extracting nitrogen gas as a product from a position below the liquid nitrogen introduction position in the sub-rectification column 20, it becomes possible to obtain extremely high-purity product nitrogen. This product nitrogen is sent to the main heat exchanger 14 through the product nitrogen outlet passage 24, brought into a state of approximately normal temperature by heat exchange with the raw material air, and then expelled out of the equipment g.
なお、 上記工程において、 副精留塔 2 0底郁の加熱 源、 すなわちリポイラの熱源としては、 主精留塔 1 6 の頂部にある窒素ガスの熱を利用することが望ま しい 。 すなわち、 副精留塔 2 0の底部にある液体窒素を通 路 (液体窒素循環通路を構成) 2 6 を通じて主箱留塔 1 6のコ ンデンサ 1 6 1 に導き、 かっこのコ ンデンサ 1 6 1 から通路 2 7 (液体窒素循環通路を構成) を通 じて副精留塔 2 0内に蒸発したガス窒素 (蒸発されて いない液体窒素を含んでいても良い。 ) を導入するこ とによ り、 主精留塔 1 6の頂部にある窒素ガスと熱交 換させればよい。 これにより、 上記窒素ガスが凝縮し 、 その凝縮熱を利用して副精留塔 2 0内の液体窒素を 蒸発させ、 この蒸発で副精留塔 2 0内の低沸点ガスを 加熱することができるので、 上記精留を効率良く実行 することが可能となる。 In the above step, it is desirable to use the heat of the nitrogen gas at the top of the main rectification column 16 as the heating source for the sub-rectification column 20, that is, the heat source for the repoiler. That is, the liquid nitrogen at the bottom of the sub-rectification tower 20 is led to the capacitor 16 1 of the main box tower 16 through the passage 26 (which constitutes a liquid nitrogen circulation passage). Through the passage 27 (constituting a liquid nitrogen circulation passage) to introduce the gaseous nitrogen (which may contain unevaporated liquid nitrogen) into the sub-rectification column 20. Heat exchange with nitrogen gas at the top of the main rectification column 16. As a result, the nitrogen gas is condensed, and the heat of condensation is used to evaporate the liquid nitrogen in the sub-rectification column 20. This evaporation removes the low-boiling gas in the sub-rectification column 20. Since the heating can be performed, the rectification can be efficiently performed.
この際、 上記熱交換を円滑に行うには、 副精留塔 2 0での操作圧を主賴留塔 1 6 よ りも約 0. 6kg/cm2下げ ること、 すなわち、 主耩留塔 1 6から通路 2 2 を通じ て副精留塔 2 0へ供給する液体窒素を減圧し、 これに よってその飽和温度を下げるようにすればよい。 At this time, in order to carry out the heat exchange smoothly, the operating pressure in the sub-rectification column 20 should be reduced by about 0.6 kg / cm 2 from the main distillation column 16, that is, the main distillation column The liquid nitrogen supplied from 16 to the sub-rectification column 20 through the passage 22 may be depressurized, thereby lowering its saturation temperature.
また上記工程では、 副賴留塔 2 0内において、 低沸 点ガスとともに多分の窒素ガスが上昇しているので、 この窒素ガスを副精留塔 2 0の上部で液.化させ回収す ることが望ま しい。 この場合、 主精留塔 1 6の底部に 溜った液体空気を液体供耠通路 2 8 を通じて減圧状態 で副精留塔 2 0の上部に送リ込み、 これによつて副精 留塔 2 0の上都を冷却するようにすれば、 上記窒素ガ スを効率良く液化し、 回収することができる。 また、 主精留塔 1 6の中間部にある液体を上記液体供耠通路 2 8と同様の通路を通じて減圧状態で副精留塔 2 0の 上部に送リこむようにしても、 同様の効果が得られる。 以上説明したように、 本方法では、 主精留塔 1 6に おいて最上段よ リも低い段から髙純度の液体窒素を取 出し、 さ らにこの液体窒素を副精留塔 2 0内に導入し てこの導入位置よ りも下方の位置から製品窒素を抜き 出すようにしているので、 原料空気中の水素-. へリ ウ ム、 ネオンといった低沸点ガスを効果的に除去するこ とができ、 これによつて、 製品窒素の純度を大幅に向 上させることができる。 Also, in the above process, since nitrogen gas possibly rises together with the low-boiling gas in the sub-rectification column 20, this nitrogen gas is liquefied at the upper part of the sub-rectification column 20 and collected. It is desirable. In this case, the liquid air collected at the bottom of the main rectification tower 16 is sent to the upper part of the sub-rectification tower 20 under reduced pressure through the liquid supply passage 28, whereby the sub-rectification tower 20 If the upper city is cooled, the nitrogen gas can be efficiently liquefied and recovered. The same effect can be obtained by sending the liquid in the middle part of the main rectification column 16 to the upper part of the sub-rectification column 20 under reduced pressure through the same passage as the liquid supply passage 28. Can be As described above, in this method, high-purity liquid nitrogen is extracted from the lower stage than the uppermost stage in the main rectification column 16, and this liquid nitrogen is further separated into the sub-rectification column 20. And the product nitrogen is extracted from a position below this introduction position, so that low boiling gas such as hydrogen and helium in the raw material air can be effectively removed. As a result, the purity of product nitrogen can be greatly improved.
下記の表は、 各ガス中でのヘリ ウム、 ネオン、 およ び水素の濃度を示したものである。 The table below shows the concentrations of helium, neon, and hydrogen in each gas.
同表において、 ガス 1 は原料空気、 ガス 2は上記原 料空気を前記第 4図で説明した従来方法で処理するこ とにょ リ得られた製品窒素ガス、 ガス 3は上記原料空 気を本方法で処理することにより得られた製品窒素で ぁリ、 上記原料空気と しては、 予め触媒を用いて水素 濃度を O. lppm まで下げたものを用いている。 In the table, gas 1 is the raw air, gas 2 is the product nitrogen gas obtained by treating the raw air by the conventional method described in FIG. 4, and gas 3 is the raw air. The product air obtained by the above treatment is used as the product nitrogen, and the above-mentioned raw material air is prepared using a catalyst whose hydrogen concentration has been reduced to 0.1 ppm in advance.
この表から明らかなように、 従来法では、 原料空気 中に含まれる低沸点ガスをほとんど除去できないのに 対し、 本方法によれば、 各低沸点ガスを効果的に除去 することか可能である。 表 As is clear from this table, while the conventional method can hardly remove low-boiling gas contained in the raw material air, this method can effectively remove each low-boiling gas. . table
(単位は ppm) なお、 本発明はこのような実施例に限定されるもの でなく、 例として次のような態様をとることも可能で め 。 ( 1) 上記実施例の工程では、 第 1 図に示されるよう に、 各精留塔 1 6 , 2 0から抜き出したヘリ ウムガス を直接装置外へ取出すようにしているが、 第 2図に示 されるように、 上記ヘリ ウムガスをヘリ ウムガス導出 通路 3 1 , 3 2 を通じて主熱交換器 1 4へ送リ込み、 その後に回収するようにしてもよい。 このような操作 を行う ことによ リ、 低温のヘリ ウムガスを主熱交換器 1 4内での寒冷発生に寄与させることができ、 装 S全 体の熱効率をよ り高めることができる。 (Unit: ppm) The present invention is not limited to such an embodiment, and the following embodiments can be taken as examples. (1) In the process of the above embodiment, as shown in FIG. 1, the helium gas extracted from each of the rectification columns 16 and 20 is directly taken out of the apparatus, but as shown in FIG. As described above, the helium gas may be sent to the main heat exchanger 14 through the helium gas outlet passages 31 and 32 and then recovered. By performing such an operation, the low-temperature helium gas can contribute to the generation of cold in the main heat exchanger 14, and the thermal efficiency of the entire equipment S can be further improved.
また、 同図及び前記第 1図に示されるように、 主精 留塔 (副精留塔でも良い。 ) 1 6の上部から導出した ガスをガス導出通路 3 6を通じて膨張タービン (膨張 手段) 1 8に通し、 断熱膨張させた状態で主熱交換器 1 4へ送リ込むことによつても、 上記ガスを寒冷発生 に寄与させることができる。 Further, as shown in FIG. 1 and FIG. 1, the gas extracted from the upper part of the main rectification tower (or the sub-rectification tower) 16 is supplied to the expansion turbine (expansion means) 1 through the gas outlet passage 36. The gas can also be contributed to the generation of cold by sending it to the main heat exchanger 14 in an adiabatic expanded state through 8.
また、 第 3図に示すように、 主賴留塔 1 6の上部に 液体窒素導入通路 3 4を通じて液体窒素を導人し、 そ の蒸発潜熱装置を冷却するシステムにおいて上記ガス 導出通路 3 6 を通じて主熱交換器 1 4へ送リ こむよう にしても、 上記と同棣の効果を得ることができる。 ま た、 主精留塔 1 6でなく副精留塔 2 0に液体窒索を導 入してヘリ ウムガスを取リ出すようにしても良いし、 双方の精留塔 1 6, 2 0に液体窒索を送リ こむように してもよい。 In addition, as shown in FIG. 3, in the system for guiding liquid nitrogen through the liquid nitrogen introduction passage 34 above the main distillation column 16 and cooling the latent heat of vaporization, the gas outlet passage 36 is used for the system. Even when the heat is sent to the main heat exchanger 14, the same effect as the above can be obtained. Also, liquid nitrogen may be introduced into the sub-rectification tower 20 instead of the main rectification tower 16 to extract helium gas, or the rectification towers 16 and 20 of both may be introduced. Liquid nitriding may be sent.
(2) 本発明方法は、 空気分離装置に適用されるにと どま らず、 窒素および低沸点ガスを含む原料ガスから 高純度窒素を製造する場合に広く適用され.得るもので め 産業上の利用性 (2) As the method of the present invention is applied to an air separation device, Not only that, it is widely applied to the production of high-purity nitrogen from source gases containing nitrogen and low-boiling gases.
以上のように本発明は、 主精留塔において最上段よ リも下方の位置から純度の高い液体窒素を取出して副 精留塔内に入れ、 さ らに、 この副精留塔において低沸 点ガスを加熱、 蒸発させながら、 上記液体窒素の導入 位置よりも下方の位置から製品窒素を取出すようにし たものであるので、 原料ガス中に含まれる低沸点ガス を効果的に除去することができ、 このため、 超高純度 の製品窒素の製造に大きく寄与することができる。 As described above, according to the present invention, high-purity liquid nitrogen is taken out from a position below the uppermost stage in the main rectification column and put into the sub-rectification column. Since the product gas is taken out from the position below the above-mentioned liquid nitrogen introduction position while heating and evaporating the point gas, the low boiling point gas contained in the raw material gas can be effectively removed. This can greatly contribute to the production of ultra-high purity product nitrogen.
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE69023141T DE69023141T2 (en) | 1990-05-31 | 1990-12-26 | METHOD AND DEVICE FOR PRODUCING HIGH PURITY NITROGEN. |
| EP91901554A EP0485612B1 (en) | 1990-05-31 | 1990-12-26 | Method of and device for producing nitrogen of high purity |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2/143761 | 1990-05-31 | ||
| JP14376190 | 1990-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1991019142A1 true WO1991019142A1 (en) | 1991-12-12 |
Family
ID=15346410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1990/001710 Ceased WO1991019142A1 (en) | 1990-05-31 | 1990-12-26 | Method of and device for producing nitrogen of high purity |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0485612B1 (en) |
| DE (1) | DE69023141T2 (en) |
| WO (1) | WO1991019142A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0520738A1 (en) * | 1991-06-24 | 1992-12-30 | The Boc Group, Inc. | Production of nitrogen of ultra-high purity |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5205127A (en) * | 1990-08-06 | 1993-04-27 | Air Products And Chemicals, Inc. | Cryogenic process for producing ultra high purity nitrogen |
| JP2983393B2 (en) * | 1991-10-15 | 1999-11-29 | レール・リキード・ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Method for removing hydrogen by cryogenic distillation in the production of high purity nitrogen |
| JP2893562B2 (en) * | 1992-09-22 | 1999-05-24 | 日本エア・リキード株式会社 | Ultra high purity nitrogen production method and apparatus |
| FR2774753B1 (en) * | 1998-02-06 | 2000-04-28 | Air Liquide | AIR DISTILLATION SYSTEM COMPRISING MULTIPLE CRYOGENIC DISTILLATION UNITS OF THE SAME TYPE |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5439343B2 (en) * | 1971-09-21 | 1979-11-27 | ||
| JPS62141485A (en) * | 1985-12-16 | 1987-06-24 | 日本酸素株式会社 | High purity nitrogen production method |
| JPS63176986A (en) * | 1987-01-14 | 1988-07-21 | 株式会社神戸製鋼所 | High-pressure nitrogen production unit |
| JPH0261482A (en) * | 1988-08-24 | 1990-03-01 | Hitachi Ltd | Ultra-high purity nitrogen manufacturing method and equipment |
| JPH0217795B2 (en) * | 1981-10-15 | 1990-04-23 | Nippon Oxygen Co Ltd |
-
1990
- 1990-12-26 DE DE69023141T patent/DE69023141T2/en not_active Expired - Lifetime
- 1990-12-26 EP EP91901554A patent/EP0485612B1/en not_active Expired - Lifetime
- 1990-12-26 WO PCT/JP1990/001710 patent/WO1991019142A1/en not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5439343B2 (en) * | 1971-09-21 | 1979-11-27 | ||
| JPH0217795B2 (en) * | 1981-10-15 | 1990-04-23 | Nippon Oxygen Co Ltd | |
| JPS62141485A (en) * | 1985-12-16 | 1987-06-24 | 日本酸素株式会社 | High purity nitrogen production method |
| JPS63176986A (en) * | 1987-01-14 | 1988-07-21 | 株式会社神戸製鋼所 | High-pressure nitrogen production unit |
| JPH0261482A (en) * | 1988-08-24 | 1990-03-01 | Hitachi Ltd | Ultra-high purity nitrogen manufacturing method and equipment |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0520738A1 (en) * | 1991-06-24 | 1992-12-30 | The Boc Group, Inc. | Production of nitrogen of ultra-high purity |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0485612A1 (en) | 1992-05-20 |
| EP0485612A4 (en) | 1993-03-10 |
| DE69023141D1 (en) | 1995-11-23 |
| DE69023141T2 (en) | 1996-04-04 |
| EP0485612B1 (en) | 1995-10-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3294390B2 (en) | Ultra high purity nitrous oxide production method and apparatus | |
| KR860001999A (en) | Ultra high purity oxygen production method | |
| JP2005060225A (en) | Method and device for concentrating ammonia | |
| US2482304A (en) | Recovery of the constituents of gaseous mixtures | |
| JP2000088455A (en) | Method and apparatus for recovering and purifying argon | |
| JP3940461B2 (en) | Air separation method and apparatus | |
| JPH0914832A (en) | Method and equipment for manufacturing ultra-high purity oxygen | |
| KR950006408A (en) | Liquid oxygen pumping method and apparatus | |
| JP2594604B2 (en) | Argon recovery method | |
| JP3538338B2 (en) | Oxygen gas production method | |
| JPH06249575A (en) | Cryogenic separating method of air | |
| JPH10132458A (en) | Oxygen gas production method and apparatus | |
| WO1991019142A1 (en) | Method of and device for producing nitrogen of high purity | |
| JP3929799B2 (en) | Method and apparatus for producing ultra high purity oxygen | |
| JP2680082B2 (en) | Ultra high purity oxygen production method | |
| JP3424101B2 (en) | High purity argon separation equipment | |
| KR20230173524A (en) | Equipment and method of recovering silane | |
| JP2569243B2 (en) | Method and apparatus for producing high-purity nitrogen | |
| CN102278867A (en) | Rare gases recovery process for triple column oxygen plant | |
| JP3082092B2 (en) | Oxygen purification method and apparatus | |
| JPH07127971A (en) | Argon separator | |
| CN112577262A (en) | High-purity oxygen production equipment | |
| JP4960277B2 (en) | Method for producing ultra-high purity oxygen | |
| JP2002115965A (en) | Method of recovering rare gas | |
| JP2656403B2 (en) | Cryogenic separation of air |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): JP US |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB GR IT LU NL SE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1991901554 Country of ref document: EP |
|
| WWP | Wipo information: published in national office |
Ref document number: 1991901554 Country of ref document: EP |
|
| WWG | Wipo information: grant in national office |
Ref document number: 1991901554 Country of ref document: EP |