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WO1985002888A1 - Procede et appareil de controle de la pression de gaz - Google Patents

Procede et appareil de controle de la pression de gaz Download PDF

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Publication number
WO1985002888A1
WO1985002888A1 PCT/JP1984/000624 JP8400624W WO8502888A1 WO 1985002888 A1 WO1985002888 A1 WO 1985002888A1 JP 8400624 W JP8400624 W JP 8400624W WO 8502888 A1 WO8502888 A1 WO 8502888A1
Authority
WO
WIPO (PCT)
Prior art keywords
value
gas pressure
gas
signal
vacuum vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP1984/000624
Other languages
English (en)
Japanese (ja)
Inventor
Noboru Kuriyama
Reiichiro Sensui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Publication of WO1985002888A1 publication Critical patent/WO1985002888A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/208—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using a combination of controlling means as defined in G05D16/2013 and G05D16/2066
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/06—Control using electricity

Definitions

  • the present invention relates to a gas EE force control method and apparatus for controlling a gas E force in a vacuum vessel to which a predetermined flow rate of gas is supplied, and particularly to a gas EE force control method for discharging gas from the vacuum vessel.
  • the present invention relates to a method and an apparatus for controlling a gas E force using a lubricator.
  • the vacuum vessel is has its vacuum container for example / 0 ⁇ I - 3
  • a gas such as a carrier gas is supplied into the vacuum vessel to control the gas E force in the vacuum vessel to a constant level or to step. Need to be controlled.
  • the gas E force control device used for this purpose controls the opening and closing of the control valve of the gas supply path according to the deviation between the pressure in the vacuum vessel and the set E force.
  • the gas E force in the vacuum vessel is controlled while keeping the air flow rate in the vacuum vessel constant.
  • control valve is opened according to the deviation between the gas flow rate in the gas supply path and the J "set gas flow rate.
  • To vary the exhaust flow rate by adjusting the valve opening] Some are designed to control gas pressure.
  • the gas supply amount and the gas pressure in the vacuum vessel are controlled independently of each other, so that there is an advantage that the control accuracy of the gas pressure can be improved.
  • the degree of opening of the valve and the exhaust speed passing through it are not proportional, and the valve becomes wireless.
  • the relationship between the pressure in the vacuum vessel, the pumping speed, and the throttling]) is determined in advance from the measurement results based on the measurement results, and the gas pressure is set based on these functional relationships. Change the throttle opening and the opening and closing speed of the throttle valve to match the pressure.
  • the present invention has been made in view of the above points, and provides a gas pressure control method and a gas pressure control method capable of easily and accurately controlling gas pressure with high control accuracy. This is the purpose. Disclosure of the invention
  • the apparatus includes an arithmetic circuit that detects a pressure in a vacuum vessel, obtains a deviation value from a set pressure value, and outputs a signal to make the deviation value zero, and outputs an output signal of the circuit.
  • a feedback circuit that performs negative feedback control so as to coincide with the above.
  • the method of the present invention detects the pressure in the vacuum vessel, obtains a deviation value between the pressure value and the set pressure, outputs a signal that makes the deviation value zero, and outputs the output signal. Is converted into a reference rotational speed value of the mechanical booter, and the rotational speed value of the mechanical dual booster is detected, and the detected value matches the reference rotational speed value.
  • the feature of this is to perform negative feedback control.
  • the linear characteristic between the exhaust speed and the rotational speed in the mechanical booter is used, so that the rotational speed of the mechanical booter is controlled. Control the pumping speed easily and reliably Therefore, the control accuracy of the gas pressure can be significantly improved.
  • Fig. / Fig. 2 is a block diagram of the gas pressure control device according to the present invention.
  • Fig. J shows the relationship between the gas pressure and the number of revolutions of the mecha-carbuster when the gas flow rate is constant.
  • the diagram shows the relationship between the gas flow rate when the gas pressure is kept constant and the number of revolutions of the mecha-cal booster.
  • Pump 7 is tied. Then, by using the mechanical booster and the auxiliary vacuum pump 7 ], the inside of the vacuum container 0 is evacuated, and the gas supply device / by the gas supply device /). Supply gas.
  • the pressure in the vacuum vessel is detected by the pressure gauge f, and this detection signal is supplied to the operational amplifier / Given to ku.
  • the operational amplifier / calculates the deviation between the detection signal and the set pressure signal, and applies a control signal to the control valve driving circuit (not shown) so that the deviation becomes zero.
  • the valve opening degree of the control valve changes s through the circuit, and the gas supply amount is controlled.
  • the gas pressure in the vacuum container ⁇ is controlled by changing the gas supply amount while keeping the exhaust flow rate of the vacuum container constant.
  • the gas supply rate and the gas pressure are independent because they are controlled.
  • a flow meter / and a control valve / «2 are provided in a gas supply path from the gas supply apparatus / to the vacuum vessel ⁇ , and the flow meter // Detection signal and current
  • the set flow rate signal set by the IS amount setting unit / J and the set flow rate signal are given to the operational amplifier / ⁇ , and the operational amplifier / calculates the deviation between the detection signal and the set flow rate signal.
  • Such a control signal is supplied to a control valve drive circuit (not shown). Then, the control valve drive circuit increases the valve opening of the control valve /
  • reference numeral 1 denotes a gas supply device, and the gas supplied from the gas supply device 1 is supplied to a vacuum vessel 4 via an on-off valve 2 and a control valve 12.
  • the exhaust port of the vacuum container 4 is provided with a main vacuum pump, a mecha-color starter 6, via an on-off valve 5, and an oil-sealed rotary vacuum pump and a liquid ring vacuum to assist this.
  • Auxiliary vacuum pumps such as pumps 7 Connected.
  • the main mosquito two mosquito Le booth and six other, called Le over Tsu vacuum Bonn-flops make action by using the auxiliary vacuum Bonn-flops 7 in the subsequent stage, wide 1 0 ⁇ 1 0 _ 3 torr working It has a range.
  • this mechanical booter The inside of the vacuum vessel is evacuated by the vacuum pump and the auxiliary vacuum pump 7 , and gas is supplied from the gas supply device / into the vacuum vessel ⁇ -.
  • a flow meter // is provided in the T path for gas supply from the gas painting device / to the vacuum vessel ⁇ , and the detection signal of the flow meter // and the set flow signal set by the flow setting device / 3 are used as a command.
  • Controller /? Give to.
  • This controller / 9 a comparator ⁇ 20 for inputting both of the signals to determine the deviation, and an input signal for the output of the comparator 2 to reduce the deviation to zero
  • An operational amplifier 2 for outputting such a control signal is provided, and the output control signal of this operational amplifier ⁇ 2 / is supplied to the control valve drive circuit 2.2.2. Then, the control valve drive circuit is ⁇ 2 ⁇ . The valve opening of the control valve / 2 is changed so that the gas supply amount is controlled to match the set flow rate.
  • ⁇ is configured to control the rotation speed of the gas to change the exhaust speed in the exhaust path and to control the gas pressure in the vacuum container ⁇
  • the mechanical booster has a linear characteristic that is approximately proportional to its pumping speed; Therefore, a detection signal of a pressure gauge / for detecting the pressure in the vacuum vessel and a set pressure signal set by a pressure setting device / 7 are given to an arithmetic circuit 2J.
  • the arithmetic circuits 2 and 2 are provided with a comparator 2 for obtaining a deviation value between the two input signals, and an input signal for the comparator J ⁇ 2, which is used to set the deviation value to zero.
  • possess an operational amplifier 3 to output the signal you 1?, It provides an output signal of the operational amplifier J 3 to speed co-emissions collected by filtration over La "2.
  • the speed controller 2 controls the rotation speed of the main vacuum pump, which is the main vacuum pump, so that the output signal of the operational amplifier J is controlled by the mechanical controller.
  • a conversion circuit 2 for converting the reference rotational speed signal of the booster, and a rotational speed of the power booster are detected, and the detected value is made to coincide with the reference rotational speed signal. It is composed of a feedback circuit ⁇ 2 that performs negative feedback control.
  • a feedback circuit ⁇ 2 that performs negative feedback control.
  • the conversion circuit 2 is composed of a function generator that converts a pressure signal into a reference rotation speed signal
  • the feedback circuit 22 is a speedometer that detects the rotation speed of the mechanical booster. 27, the detection signal and the reference rotation speed signal are input, and the comparator ⁇ 2 and the comparator ⁇ 2f for obtaining the deviation of these signals are input.
  • Operational amplifiers that output such control signals ⁇ 2?
  • an inverter 30 for pulse (frequency) modulating the control signal. Then, depending on the output signal of the inverter, the rotation speed of the induction motor J / for driving the mechanical booster
  • a flowmeter // for example, in order to control the gas pressure in the vacuum vessel to a constant value, a flowmeter //, a flow setting device /, a controller / nu, a control valve driving circuit 2.2, etc.
  • Flow using a negative feedback control loop consisting of The gas at the flow rate set by the flow rate setting device / j is supplied from the gas supply device / into the vacuum vessel. Further, the gas pressure in the vacuum vessel is detected by the pressure gauge z, and the detection signal is calculated together with the set pressure signal set by the pressure setting device / 7.
  • the output signal of the operational amplifier J 3 is converted into a reference rotation speed signal by the conversion circuit ⁇ 2.
  • the feedback circuit 2 is driven via the comparator 2 ⁇ , the operational amplifier 2 and the amplifier 3 so as to match the reference rotational speed signal.
  • the air speed of the vacuum vessel changes and the inside of the vacuum
  • the gas pressure of / s is controlled to match the value set by the pressure setting device / 7.
  • FIG. 2 shows the experimental results obtained by measuring the relationship between the rotation speed of the mechanical booster and the gas pressure at 0.] As a result, it can be seen that the rotational speed of the mechanical booter is linearly proportional.
  • Figure J shows the experimental results obtained by measuring the relationship between the gas flow rate and the rotational speed of the mecha-calvous S-star when the pressure was set to a constant value. Therefore, it is very difficult for the rotation speed of the mechanical booster to correspond to the linear with respect to the change in the gas flow rate, and within several seconds when the gas flow rate changes. ⁇ ⁇ Revolve or follow in a very short response time.
  • the present invention is different from the conventional apparatus shown in FIGS. 1 and 2 in that the mechanical booster 6 ⁇ D Since the exhaust speed of the vacuum vessel ⁇ was changed to control the gas pressure in the vacuum vessel to the set value, the gas pressure was easily controlled 1), and the / 0 force was also controlled. And the control accuracy can be significantly improved. Further, if the arithmetic circuit 23 and the speed controller «24 ⁇ are configured using a micro-rob mouth sensor, the circuit can be reduced in size and cost. Industrial applicability that enables predictive control
  • the present invention can control the gas pressure in a vacuum vessel with high accuracy, and is therefore useful for a vacuum processing apparatus that performs vacuum processing under a predetermined gas pressure. ! ? In particular, it is suitable for an etching device, a sputtering device, a CVD device and the like.

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Control Of Fluid Pressure (AREA)
  • Flow Control (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

Un appareil de contrôle de la pression de gaz comporte un circuit (23) détectant la pression à l'intérieur d'un récipient sous vide (4), obtenant une valeur de déviation de la pression détectée à partir d'une valeur de pression fixée et émettant un signal par lequel la valeur de déviation est rendue égale à zéro, un circuit convertisseur (25) convertissant une sortie de signal du circuit (23) en une valeur de vitesse de rotation de référence pour un survolteur mécanique (6), ainsi qu'un circuit de réaction inverse (26) effectuant un contrôle de réaction négative tel que la valeur de vitesse de rotation du survolteur mécanique (6) coïncide avec la valeur de vitesse de rotation de référence. En contrôlant la vitesse de rotation du survolteur mécanique (6) conformément à la pression régnant à l'intérieur du récipient sous vide (4), il est possible de contrôler la pression de gaz avec une grande précision et très facilement.
PCT/JP1984/000624 1983-12-27 1984-12-27 Procede et appareil de controle de la pression de gaz Ceased WO1985002888A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58/244706 1983-12-27
JP24470683A JPS60138291A (ja) 1983-12-27 1983-12-27 ガス圧力制御装置

Publications (1)

Publication Number Publication Date
WO1985002888A1 true WO1985002888A1 (fr) 1985-07-04

Family

ID=17122711

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1984/000624 Ceased WO1985002888A1 (fr) 1983-12-27 1984-12-27 Procede et appareil de controle de la pression de gaz

Country Status (2)

Country Link
JP (1) JPS60138291A (fr)
WO (1) WO1985002888A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699570A (en) * 1986-03-07 1987-10-13 Itt Industries, Inc Vacuum pump system
FR2706644A1 (fr) * 1993-06-11 1994-12-23 Normalab Dispositif de régulation de vide.
WO2001096972A3 (fr) * 2000-06-14 2002-04-11 Applied Materials Inc Procedes et appareil permettant de maintenir une pression dans une chambre a environnement controle

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62210387A (ja) * 1986-03-10 1987-09-16 日本真空技術株式会社 凍結真空乾燥装置の真空度の制御方法
JP2663549B2 (ja) * 1988-09-02 1997-10-15 株式会社日本自動車部品総合研究所 真空装置の圧力制御方法
JPH0318674A (ja) * 1989-06-14 1991-01-28 Hitachi Ltd ガス圧力制御方法及び真空装置
JP6729436B2 (ja) * 2017-02-06 2020-07-22 株式会社島津製作所 自動圧力調整バルブおよび真空排気システム
JP6798426B2 (ja) * 2017-05-31 2020-12-09 株式会社島津製作所 真空ポンプ用モータの回転速度制御装置、真空ポンプ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5262701A (en) * 1975-11-20 1977-05-24 Yaskawa Electric Mfg Co Ltd Operation for plural units of pumps
JPS53138501A (en) * 1977-05-09 1978-12-04 Shinko Electric Co Ltd Pressure controller
JPS56107991A (en) * 1980-01-31 1981-08-27 Nec Corp Pneumatic pressure control system
JPS58124079A (ja) * 1982-01-20 1983-07-23 Furukawa Electric Co Ltd:The 真空ポンプにおける圧力調整方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713286A (en) * 1980-06-30 1982-01-23 Toshiba Corp Operating method of vacuum pump

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5262701A (en) * 1975-11-20 1977-05-24 Yaskawa Electric Mfg Co Ltd Operation for plural units of pumps
JPS53138501A (en) * 1977-05-09 1978-12-04 Shinko Electric Co Ltd Pressure controller
JPS56107991A (en) * 1980-01-31 1981-08-27 Nec Corp Pneumatic pressure control system
JPS58124079A (ja) * 1982-01-20 1983-07-23 Furukawa Electric Co Ltd:The 真空ポンプにおける圧力調整方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699570A (en) * 1986-03-07 1987-10-13 Itt Industries, Inc Vacuum pump system
FR2706644A1 (fr) * 1993-06-11 1994-12-23 Normalab Dispositif de régulation de vide.
EP0631217A1 (fr) * 1993-06-11 1994-12-28 NORMALAB (Société anonyme) Dispositif de régulation de vide
WO2001096972A3 (fr) * 2000-06-14 2002-04-11 Applied Materials Inc Procedes et appareil permettant de maintenir une pression dans une chambre a environnement controle
JP2004510221A (ja) * 2000-06-14 2004-04-02 アプライド　マテリアルズ　インコーポレイテッド 環境が制御されたチャンバ内で圧力を維持するための装置及び方法
US6916397B2 (en) 2000-06-14 2005-07-12 Applied Materials, Inc. Methods and apparatus for maintaining a pressure within an environmentally controlled chamber

Also Published As

Publication number Publication date
JPS60138291A (ja) 1985-07-22

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