USH1090H - Light-sensitive silver halide photographic material - Google Patents
Light-sensitive silver halide photographic material Download PDFInfo
- Publication number
- USH1090H USH1090H US07/617,950 US61795090A USH1090H US H1090 H USH1090 H US H1090H US 61795090 A US61795090 A US 61795090A US H1090 H USH1090 H US H1090H
- Authority
- US
- United States
- Prior art keywords
- group
- silver halide
- light
- alkyl group
- isothiazolone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 114
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 61
- 239000004332 silver Substances 0.000 title claims abstract description 61
- 239000000463 material Substances 0.000 title claims abstract description 32
- 150000001875 compounds Chemical class 0.000 claims abstract description 78
- 239000000839 emulsion Substances 0.000 claims abstract description 23
- 239000000084 colloidal system Substances 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 43
- 125000003118 aryl group Chemical group 0.000 claims description 32
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 24
- 125000000623 heterocyclic group Chemical group 0.000 claims description 21
- 125000003545 alkoxy group Chemical group 0.000 claims description 16
- 125000001424 substituent group Chemical group 0.000 claims description 16
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 125000001624 naphthyl group Chemical group 0.000 claims description 8
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 6
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 5
- 125000004414 alkyl thio group Chemical group 0.000 claims description 5
- 125000005110 aryl thio group Chemical group 0.000 claims description 5
- 125000005647 linker group Chemical group 0.000 claims description 5
- 230000001737 promoting effect Effects 0.000 claims description 5
- 238000001179 sorption measurement Methods 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 4
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 4
- 125000004076 pyridyl group Chemical group 0.000 claims description 4
- 125000004434 sulfur atom Chemical group 0.000 claims description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- DHNRXBZYEKSXIM-UHFFFAOYSA-N chloromethylisothiazolinone Chemical compound CN1SC(Cl)=CC1=O DHNRXBZYEKSXIM-UHFFFAOYSA-N 0.000 claims description 3
- BEGLCMHJXHIJLR-UHFFFAOYSA-N methylisothiazolinone Chemical compound CN1SC=CC1=O BEGLCMHJXHIJLR-UHFFFAOYSA-N 0.000 claims description 3
- CVZDIUZSWUDGOP-UHFFFAOYSA-N 4,5-dichloro-2-methyl-1,2-thiazol-3-one Chemical compound CN1SC(Cl)=C(Cl)C1=O CVZDIUZSWUDGOP-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 125000004422 alkyl sulphonamide group Chemical group 0.000 claims description 2
- 125000005361 aryl sulfoxide group Chemical group 0.000 claims description 2
- 125000004421 aryl sulphonamide group Chemical group 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 abstract 1
- 101150035983 str1 gene Proteins 0.000 abstract 1
- 238000000034 method Methods 0.000 description 27
- 239000000243 solution Substances 0.000 description 25
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- 235000002566 Capsicum Nutrition 0.000 description 10
- 239000006002 Pepper Substances 0.000 description 10
- 241000722363 Piper Species 0.000 description 10
- 235000016761 Piper aduncum Nutrition 0.000 description 10
- 235000017804 Piper guineense Nutrition 0.000 description 10
- 235000008184 Piper nigrum Nutrition 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 8
- 230000008313 sensitization Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 108010010803 Gelatin Proteins 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 229920000159 gelatin Polymers 0.000 description 6
- 239000008273 gelatin Substances 0.000 description 6
- 235000019322 gelatine Nutrition 0.000 description 6
- 235000011852 gelatine desserts Nutrition 0.000 description 6
- 239000003112 inhibitor Substances 0.000 description 6
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 6
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 125000004442 acylamino group Chemical group 0.000 description 4
- 125000003282 alkyl amino group Chemical group 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000002619 bicyclic group Chemical group 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000003755 preservative agent Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- 238000010189 synthetic method Methods 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- 150000003852 triazoles Chemical group 0.000 description 3
- LUBJCRLGQSPQNN-UHFFFAOYSA-N 1-Phenylurea Chemical compound NC(=O)NC1=CC=CC=C1 LUBJCRLGQSPQNN-UHFFFAOYSA-N 0.000 description 2
- LTACQVCHVAUOKN-UHFFFAOYSA-N 3-(diethylamino)propane-1,2-diol Chemical compound CCN(CC)CC(O)CO LTACQVCHVAUOKN-UHFFFAOYSA-N 0.000 description 2
- SPOCKFADQXUWGS-UHFFFAOYSA-N 3-oxo-n-propyl-1,2-thiazole-2-carboxamide Chemical compound CCCNC(=O)N1SC=CC1=O SPOCKFADQXUWGS-UHFFFAOYSA-N 0.000 description 2
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 2
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 239000004606 Fillers/Extenders Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 2
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000006172 buffering agent Substances 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- HBNYJWAFDZLWRS-UHFFFAOYSA-N ethyl isothiocyanate Chemical compound CCN=C=S HBNYJWAFDZLWRS-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 125000001391 thioamide group Chemical group 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- NLOGTNAOFKDKBC-UHFFFAOYSA-N 1-ethyl-2-(2-methylphenyl)hydrazine Chemical compound CCNNC1=CC=CC=C1C NLOGTNAOFKDKBC-UHFFFAOYSA-N 0.000 description 1
- ANFXTILBDGTSEG-UHFFFAOYSA-N 1-methyl-4,5-dihydroimidazole Chemical compound CN1CCN=C1 ANFXTILBDGTSEG-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N 1-propanol Substances CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- AXCGIKGRPLMUDF-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one;sodium Chemical compound [Na].OC1=NC(Cl)=NC(Cl)=N1 AXCGIKGRPLMUDF-UHFFFAOYSA-N 0.000 description 1
- BDOOJCJSTQZQDM-UHFFFAOYSA-N 2-(1-phenylethyl)-1,2-thiazol-3-one Chemical compound S1C=CC(=O)N1C(C)C1=CC=CC=C1 BDOOJCJSTQZQDM-UHFFFAOYSA-N 0.000 description 1
- WDZJNLOCKSPDFK-UHFFFAOYSA-N 2-(2,4,4-trimethylpentan-2-yl)-1,2-thiazol-3-one Chemical compound CC(C)(C)CC(C)(C)N1SC=CC1=O WDZJNLOCKSPDFK-UHFFFAOYSA-N 0.000 description 1
- VDYGJABWVCDOMW-UHFFFAOYSA-N 2-(2-ethoxyhexyl)-1,2-thiazol-3-one Chemical compound CCCCC(OCC)CN1SC=CC1=O VDYGJABWVCDOMW-UHFFFAOYSA-N 0.000 description 1
- HSFILUIYMMOOFQ-UHFFFAOYSA-N 2-(2-phenylethyl)-1,2-thiazol-3-one Chemical compound O=C1C=CSN1CCC1=CC=CC=C1 HSFILUIYMMOOFQ-UHFFFAOYSA-N 0.000 description 1
- KBBVCHDMBBVVCS-UHFFFAOYSA-N 2-(3,4-dichlorophenyl)-1,2-thiazol-3-one Chemical compound C1=C(Cl)C(Cl)=CC=C1N1C(=O)C=CS1 KBBVCHDMBBVVCS-UHFFFAOYSA-N 0.000 description 1
- ZDWLTASUXFDUOP-UHFFFAOYSA-N 2-(3,4-dichlorophenyl)-4-methyl-1,2-thiazol-3-one Chemical compound O=C1C(C)=CSN1C1=CC=C(Cl)C(Cl)=C1 ZDWLTASUXFDUOP-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- NFSXZGMSASBOHO-UHFFFAOYSA-N 2-(4-nitrophenyl)-1,2-thiazol-3-one Chemical compound C1=CC([N+](=O)[O-])=CC=C1N1C(=O)C=CS1 NFSXZGMSASBOHO-UHFFFAOYSA-N 0.000 description 1
- OPMCKYBELMAPEN-UHFFFAOYSA-N 2-(hydroxymethyl)-1,2-thiazol-3-one Chemical compound OCN1SC=CC1=O OPMCKYBELMAPEN-UHFFFAOYSA-N 0.000 description 1
- JGWRIEPVQMQWHX-UHFFFAOYSA-N 2-[(2,4-dichlorophenyl)methyl]-1,2-thiazol-3-one Chemical compound ClC1=CC(Cl)=CC=C1CN1C(=O)C=CS1 JGWRIEPVQMQWHX-UHFFFAOYSA-N 0.000 description 1
- HKJBTCVEERVODK-UHFFFAOYSA-N 2-[(2-chlorophenyl)methyl]-1,2-thiazol-3-one Chemical compound ClC1=CC=CC=C1CN1C(=O)C=CS1 HKJBTCVEERVODK-UHFFFAOYSA-N 0.000 description 1
- YQMPKMMIBGGAJX-UHFFFAOYSA-N 2-[(3,4-dichlorophenyl)methyl]-1,2-thiazol-3-one Chemical compound C1=C(Cl)C(Cl)=CC=C1CN1C(=O)C=CS1 YQMPKMMIBGGAJX-UHFFFAOYSA-N 0.000 description 1
- PQIJDRCKMJCOFO-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-1,2-thiazol-3-one Chemical compound C1=CC(Cl)=CC=C1CN1C(=O)C=CS1 PQIJDRCKMJCOFO-UHFFFAOYSA-N 0.000 description 1
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- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- JDBGUOYETQDGBL-UHFFFAOYSA-N n,5-dimethyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CNC(=O)N1SC(C)=CC1=O JDBGUOYETQDGBL-UHFFFAOYSA-N 0.000 description 1
- SETSHPKWWPIJQT-UHFFFAOYSA-N n-(2-chlorophenyl)-5-methyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound S1C(C)=CC(=O)N1C(=O)NC1=CC=CC=C1Cl SETSHPKWWPIJQT-UHFFFAOYSA-N 0.000 description 1
- WGYAVEROXSCCDD-UHFFFAOYSA-N n-(2-methoxyphenyl)-3-oxo-1,2-thiazole-2-carboxamide Chemical compound COC1=CC=CC=C1NC(=O)N1C(=O)C=CS1 WGYAVEROXSCCDD-UHFFFAOYSA-N 0.000 description 1
- PKQAXRYBQYEDCD-UHFFFAOYSA-N n-(3-chlorophenyl)-3-oxo-1,2-thiazole-2-carboxamide Chemical compound ClC1=CC=CC(NC(=O)N2C(C=CS2)=O)=C1 PKQAXRYBQYEDCD-UHFFFAOYSA-N 0.000 description 1
- ZLJITXLJFQVLKX-UHFFFAOYSA-N n-(3-chlorophenyl)-4-cyano-5-methylsulfanyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound O=C1C(C#N)=C(SC)SN1C(=O)NC1=CC=CC(Cl)=C1 ZLJITXLJFQVLKX-UHFFFAOYSA-N 0.000 description 1
- VPGPOJYDQBKTOH-UHFFFAOYSA-N n-(3-chlorophenyl)-5-methyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound S1C(C)=CC(=O)N1C(=O)NC1=CC=CC(Cl)=C1 VPGPOJYDQBKTOH-UHFFFAOYSA-N 0.000 description 1
- JIHBJVYDJRUMEP-UHFFFAOYSA-N n-(3-nitrophenyl)-3-oxo-1,2-thiazole-2-carboxamide Chemical compound [O-][N+](=O)C1=CC=CC(NC(=O)N2C(C=CS2)=O)=C1 JIHBJVYDJRUMEP-UHFFFAOYSA-N 0.000 description 1
- HMJKGINKCNRDPP-UHFFFAOYSA-N n-(4-methoxyphenyl)-3-oxo-1,2-thiazole-2-carboxamide Chemical compound C1=CC(OC)=CC=C1NC(=O)N1C(=O)C=CS1 HMJKGINKCNRDPP-UHFFFAOYSA-N 0.000 description 1
- IBRJHJANXBOOQC-UHFFFAOYSA-N n-(4-nitrophenyl)-3-oxo-1,2-thiazole-2-carboxamide Chemical compound C1=CC([N+](=O)[O-])=CC=C1NC(=O)N1C(=O)C=CS1 IBRJHJANXBOOQC-UHFFFAOYSA-N 0.000 description 1
- HQPSBTFNKVNNSM-UHFFFAOYSA-N n-butyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CCCCNC(=O)N1SC=CC1=O HQPSBTFNKVNNSM-UHFFFAOYSA-N 0.000 description 1
- NKMSQSZVYLBQRG-UHFFFAOYSA-N n-dodecyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CCCCCCCCCCCCNC(=O)N1SC=CC1=O NKMSQSZVYLBQRG-UHFFFAOYSA-N 0.000 description 1
- QDSRDMJXSQGYGM-UHFFFAOYSA-N n-ethyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CCNC(=O)N1SC=CC1=O QDSRDMJXSQGYGM-UHFFFAOYSA-N 0.000 description 1
- PCKGHRKNRYYUJY-UHFFFAOYSA-N n-ethyl-5-methyl-3-oxo-1,2-thiazole-2-carbothioamide Chemical compound CCNC(=S)N1SC(C)=CC1=O PCKGHRKNRYYUJY-UHFFFAOYSA-N 0.000 description 1
- XPOIDNGCJWQQCT-UHFFFAOYSA-N n-ethyl-5-methyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CCNC(=O)N1SC(C)=CC1=O XPOIDNGCJWQQCT-UHFFFAOYSA-N 0.000 description 1
- FYXNYYCUQPPCNJ-UHFFFAOYSA-N n-methyl-3-oxo-1,2-thiazole-2-carbothioamide Chemical compound CNC(=S)N1SC=CC1=O FYXNYYCUQPPCNJ-UHFFFAOYSA-N 0.000 description 1
- ARBGYZLXHACKCD-UHFFFAOYSA-N n-methyl-3-oxo-1,2-thiazole-2-carboxamide Chemical compound CNC(=O)N1SC=CC1=O ARBGYZLXHACKCD-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- JPMIIZHYYWMHDT-UHFFFAOYSA-N octhilinone Chemical compound CCCCCCCCN1SC=CC1=O JPMIIZHYYWMHDT-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000003452 oxalyl group Chemical group *C(=O)C(*)=O 0.000 description 1
- CELWCAITJAEQNL-UHFFFAOYSA-N oxan-2-ol Chemical compound OC1CCCCO1 CELWCAITJAEQNL-UHFFFAOYSA-N 0.000 description 1
- 150000004989 p-phenylenediamines Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- QWYZFXLSWMXLDM-UHFFFAOYSA-M pinacyanol iodide Chemical class [I-].C1=CC2=CC=CC=C2N(CC)C1=CC=CC1=CC=C(C=CC=C2)C2=[N+]1CC QWYZFXLSWMXLDM-UHFFFAOYSA-M 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000005554 pyridyloxy group Chemical group 0.000 description 1
- 125000005030 pyridylthio group Chemical group N1=C(C=CC=C1)S* 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- 235000011083 sodium citrates Nutrition 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000003206 sterilizing agent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/37—Antiseptic agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/061—Hydrazine compounds
Definitions
- This invention relates to a light-sensitive silver halide photographic material which gives images of high contrast, more particularly to improvement of trouble generated in high contrasting technique with a hydrazide compound.
- printing sensitive material light-sensitive silver halide photographic material for printing
- printing sensitive material has been generally endowed with the so called “lith development” processing aptitude for accomplishing high quality.
- lith development it is impossible in mechanism to contain sulfite ion which is the preservative at high concentration in the development processing solution, and therefore stability of the developer is very poor, as is well known to those skilled in the art.
- the image forming method by use of these hydrazide compounds can obtain images of very high contrast.
- development processing solution may suffer from fog generation, etc. undesirable in photographic performance when no adequate development supplementing agent is supplemented, but in the method by use of hydrazide, even when the fatigue degree of the development processing solution is not so great, generation of black dots like black sesame (hereinafter called pepper fog) is seen at the unexposed portion, for example, between the dots during halftoning by use of a contact screen in printing sensitive material, whereby a trouble may be caused to occur which can be a vital defect in commercial value.
- pepper fog black dots like black sesame
- the present inventors have studied intensively and consequently have developed a light-sensitive silver halide photographic material which does not impair high contrast while inhibiting the fog including pepper fog which is the drawback of the tone hardening technique by use of a hydrazide compound.
- a first object of the present invention is to provide a light-sensitive silver halide photographic material capable of forming a stable image of high contrast by use of a hydrazide compound.
- a second object of the present invention is to provide a light-sensitive silver halide photographic material with high contrast without generation of fog including pepper fog.
- a light-sensitive silver halide photographic material having a hydrophilic colloid layer containing at least one layer of a light-sensitive silver halide emulsion layer provided on a support, wherein a hydrazide derivative is contained in said light-sensitive silver halide emulsion layer, and the above hydrophilic colloid layer contains at least one of the compounds represented by Formulae [II] and [III] shown below: ##STR3## wherein R 1 represents hydrogen atom, a straight or branched alkyl group, a cyclic alkyl group, an alkenyl group, an aralkyl group, an aryl group, a heterocyclic group, an alkylamide group, an arylamide group, an alkylthioamide group, an arylthioamide group, an alkylsulfonamide group or an arylsulfonamide group, R 2 and R 3 each represent hydrogen atom, a halogen atom, an al
- the hydrazide derivative to be used in the present invention may include the compounds represented by the following formulae [I -a], [I - b] and [I - c]. ##STR5## wherein R 1 and R 2 each represent an aryl group or a heterocyclic group, R represents a divalent organic linking group, n is 0 to 6, m is 0 or 1, and when n is 2 or more, respective R's may be either the same or different).
- R 21 represents an aliphatic group, an aromatic group or a heterocyclic group
- R 22 represents hydrogen atom, an alkoxy group which may be substituted, a heterocyclic oxy group, an amino group or an aryloxy group
- P 1 and P 2 each represent hydrogen atom, an acyl group or a sulfinic acid group.
- Ar represents an aryl group containing at least one of diffusion resistant group or silver halide adsorption promoting group
- R 31 represents a substituted alkyl group.
- R 1 and R 2 each represent an aryl group or a heterocyclic group
- R represents a divalent organic linking group
- n represents 0 to 6 and m represents 0 or 1.
- the aryl group represented by R 1 and R 2 may include phenyl group, naphthyl group, and the heterocyclic group represented by R 1 and R 2 may include pyridyl group, benzothiazolyl group, quinolyl group, thienyl group, etc., but R 1 and R 2 may be preferably aryl groups.
- the aryl group or heterocyclic group represented by R 1 and R 2 can introduce various substituents therein. Examples of substituents may include halogen atoms (e.g. chlorine, fluorine, etc.) alkyl groups (e.g. methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g.
- acylamino groups e.g. acetylamino, pivalylamino, benzoylamino, tetradecanoylamino, ⁇ -(2,4-di-t-amylphenoxy) butyrylamino, etc.
- sulfonylamino groups e.g. methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino, etc.
- urea groups e.g.
- phenylurea, ethylurea, etc. thiourea groups (e.g. phenylthiourea, ethylthiourea, etc.), hydroxy group, amino group, alkylamino groups (e.g. methylamino, dimethylamino, etc.), carboxy group, alkoxycarbonyl groups (e.g. ethoxycarbonyl), carbamoyl group, sulfo group and so on.
- Examples of the divalent organic linking group represented by R may include alkylene groups (e.g. methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g.
- R 3 represents hydrogen atom, an alkyl group, an aryl group), sulfonyl group, etc. in the bond.
- R Into the group represented by R can be introduced various substituents.
- substituents may include --CONHNHR 4 (R 4 has the same meaning as R 1 and R 2 as described above), alkyl groups, alkoxy groups, halogen atoms, hydroxy group, carboxy group, acyl groups, aryl groups, etc.
- R may be preferably a alkylene group.
- the aliphatic group represented by R 21 may be preferably one having 6 or more carbon atoms, particularly a straight, branched or cyclic alkyl group having 8 to 50 carbon atoms.
- the branched alkyl group may be cyclized so as to form a saturated hetero ring containing one or more hetero atoms.
- the alkyl group may have substituent such as aryl group, alkoxy group, sulfoxy group, etc.
- the aromatic group represented by R 21 is a monocyclic or bicyclic aryl group or unsaturated heterocyclic group.
- the unsaturated heterocyclic group may be condensed with the monocyclic or bicyclic group to form a heteroaryl group.
- benzene ring there may be included benzene ring, naphthalene ring, pyridine ring, pyrimidine group, imidazole ring, pyrazole ring, quinoline ring, isoquinoline ring, benzimidazole ring, thiazole ring, benzothiazole ring, etc., but amount them those containing benzene ring are preferred.
- R 22 particularly preferred is an aryl group.
- the aryl group or unsaturated heterocyclic group represented by R 21 may be substituted, and representative substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (having preferably 2 to 30 carbon atoms), sulfonamide groups (having preferably 1 to 30 carbon atoms), ureido groups (having preferably 1 to 30 carbon atoms) and others.
- substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon
- the alkoxy group which may be substituted may have 1 to 20 carbon atoms and may be substituted with halogen atoms, aryl groups, etc.
- the aryloxy group or the heterocyclic oxy group which may be also substituted may be preferably monocyclic, and the substituent may include halogen atoms, alkyl groups, alkoxy group, cyano group, etc.
- R 22 Of the groups represented by R 22 , preferable are alkoxy groups or amino groups which may be also substituted.
- a 1 and A 2 in the group ##STR12## may be an alkyl group, alkoxy group which may be substituted, or a cyclic structure containing --O--, --S--, --N-- group bond.
- R 22 cannot be hydrazino group.
- R 21 or R 22 in Formula [I - b] may be one having a ballast group conventionally used in the immobile additive for photography such as coupler, etc. incorporated therein.
- the ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
- R 21 or R 22 in Formula [I - b] may be also one having a group for strengthening adsorption to the surface of silver halide grains incorporated therein.
- adsorptive groups there may be included the groups as disclosed in U.S. Pat. No. 4,355,105 such as thiourea group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
- the compounds represented by the group [I - b] are particularly preferable. ##STR13## In the Formula [I - b - a],
- R 23 and R 24 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, butyl, dodecyl, 2-hydroxypropyl, 2-cyanoethyl, 2-chloroethyl group), a phenyl, naphthyl, cyclohexyl, pyridyl, pyrrolidyl group which may be substituted (e.g.
- phenyl p-methylphenyl, naphthyl, ⁇ -hydroxy-naphthyl, cyclohexyl, p-methylcyclohexyl, pyridyl, 4-propyl-2-pyridyl, pyrrolidyl, 4-methyl-2-pyrrolidyl group);
- R 25 represents hydrogen atom or a benzyl, alkoxy and alkyl group which may be substituted (e.g. benzyl, p-methylbenzyl, methoxy, ethoxy, ethyl, butyl group);
- R 26 and R 27 each represent a divalent aromatic group (e.g. phenylene or naphthylene group), Y represents sulfur atoms or oxygen atom, L represents a divalent linking group (e.g. --SO 2 CH 2 CH 2 NH--SO 2 NH--, --OCH 2 SO 2 NH--, --O--, --CH ⁇ N--);
- R 28 represents --NR'R" or --OR 29 ;
- R', R" and R 29 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, dodecyl group), a phenyl group which may be substituted (e.g. phenyl, p-methylphenyl, p-methoxyphenyl group) or a naphthyl group which may be substituted (e.g. ⁇ -naphthyl group, ⁇ -naphthyl group), m, n represent 0 or 1, and when
- R 28 represents OR 29
- Y should preferably represent sulfur atom.
- Represenatative compounds represented by the above Formulae [I - b] and [I - b - a] are shown below.
- Ar represents an aryl group containing at least one of diffusion resistant groups or silver halide adsorption promoting groups, and as the diffusion resistant group, a ballast group conventionally used in immobile additives for photography such as coupler, etc. is preferable.
- the ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
- silver halide adsorption promoting group there may be included the groups as disclosed in U.S. Pat. No. 4,385,108 such as thiourea group, thiourethane group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
- R 31 represents a substituted alkyl group, and the alkyl group may be a straight, branched or cyclic alkyl group, including methyl, ethyl, propyl, butyl, isopropyl, pentyl, cyclohexyl and the like.
- alkoxy e.g. methoxy, ethoxy
- aryloxy e.g. phenoxy, p-chlorophenoxy
- heterocyclic oxy e.g. pyridyloxy
- mercapto alkylthio (e.g. methylthio, ethylthio), arylthio (e.g. phenylthio, p-chlorophenylthio), heterocyclic thio (e.g. pyridylthio, pyrimidylthio, thiadiazolylthio), alkylsulfonyl (e.g.
- acetyloxy acetyloxy, benzoyloxy
- alkylaminocarbonyloxy e.g. methylaminocarbonyloxy
- arylaminocarbonyloxy e.g. phenylaminocarbonyloxy
- sulfo sulfamoyl
- alkylsulfamoyl e.g. methylsulfamoyl
- arylsulfamoyl e.g. phenylsulfamoyl
- the hydrogen atom of hydrazide may be also substituted with a substituent such as sulfonyl group (e.g. methanesulfonyl, toluenesulfonyl), acyl group (e.g. acetyl, trifluoroacetyl), oxalyl group (e.g. ethoxalyl), etc.
- sulfonyl group e.g. methanesulfonyl, toluenesulfonyl
- acyl group e.g. acetyl, trifluoroacetyl
- oxalyl group e.g. ethoxalyl
- the amount of the compounds of Formulae [I - a], [I - b] and [I - c] contained in the light-sensitive silver halide material of the present invention should be preferably within the range of from 5 ⁇ 10 -7 to 5 ⁇ 10 -1 mol, more preferably 1 ⁇ 10 -5 to 1 ⁇ 10 -2 mol, per mol of silver halide contained in the light-sensitive silver halide photographic material.
- R 1 represents hydrogen atom, a straight or branched alkyl group, a cyclic alkyl group, an alkenyl group, an aralykyl group, an aryl group, a heterocyclic group, an alkylamino group, an arylamide groups, an alkylthioamide group, an arylthioamide group, an alkylsulfoamide group, an arylsulfoamide group;
- R 2 , R 3 each represent hydrogen atom, a halogen atom, an alkyl group, a cyclic alkyl group, an aryl group, a cyano group, an alkylthio group, an arylthio group, an alkylsulfoxide group, an alkylsulfonyl group, a heterocyclic group.
- the above alkyl group, cyclic alkyl group, alkenyl group, heteocyclic group, aralkyl group and aryl group may have substitu
- the alkyl group and the alkenyl group may have 1 to 36, more preferably 1 to 18 carbon atoms.
- the cyclic alkyl group may have 3 to 12, more preferably 3 to 6 carbon atoms.
- These alkyl groups, alkenyl groups, cyclic alkyl groups, aralkyl groups, aryl groups, heterocyclic groups may have substituents, and the substituent may be chosen from halogen atom, nitro, cyano, thiocyano, aryl, alkoxy, aryloxy, carboxy, sulfoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, sulfo, acyloxy, sufamoyl, carbamoyl, acylamino, diacylamino, ureido, thioureido, urethane, thiourethane, sulfonamide, heterocyclic group
- the alkyl group may have 1 to 18, more preferably 1 to 9 carbon atoms.
- the cyclic alkyl group may have 3 to 12, more preferably 3 to 6 carbon atoms.
- These alkyl groups, cyclic alkyl groups and aryl groups may have substituents, and the substituent may include halogen atom, nitro group, sulfone group, aryl group, hydroxy group, etc.
- R 1 represents hydrogen, a lower alkyl group or hydroxymethyl group
- R 2 represents hydrogen or a lower alkyl group
- R 1 represents hydrogen, a lower alkyl group or hydroxymethyl group
- R 2 represents hydrogen or a lower alkyl group
- the lower alkyl group one having 1 to 5 carbon atoms, particularly 1 carbon atom, is preferred.
- the compound represented by Formulae [II] or [III] may be used in an amount preferably within the range of 1 ⁇ 10 -3 to 10% by weight, preferably 1 ⁇ 10 -3 to 3% by weight, more preferably 5 ⁇ 10 -3 to 3% by weight, based on the hydrophilic colloid.
- the above range may be more or less varied depending on the kind of the light-sensitive silver halide photograpic material, the layer into which it is added, the coating method, etc., as a matter of course.
- a light-sensitive silver halide photographic material according to the invention may contain a hydrazide derivative in an amount of 1 ⁇ 10 -5 to 1 ⁇ 10 -2 mol per mol of silver halide, and at least one member selected from the group of 2-methyl-3-isothiazolone, 5-chloro-2-methyl-3-isothiazolone, 4,5-dichloro-2-methyl-3-isothiazolone and a compound represented by the formula III-1: ##STR23## in an amount of 1 ⁇ 10 -3 to 3% by weight based on the hydrophilic colloid.
- the compound of the present invention may be dissolved in a solvent which has no deleterious influence on photographic performance, chosen from water and organic solvents such as methanol, isopropanol, acetone, etc. and added as the solution into the hydrophilic colloid, or coated on the protective layer or incorporated by dipping into a sterilizing agent solution.
- a solvent which has no deleterious influence on photographic performance chosen from water and organic solvents such as methanol, isopropanol, acetone, etc.
- a solvent which the compound is dissolved in a high boiling solvent, a low boiling solvent or a solvent mixture of both, then emulsified in the presence of a surfactant and then added into a solution containing the hydrophilic colloid or further coated on the protective layer, etc.
- the silver halide to be used in the present invention may be either one of silver chlorobromide, silver chloroiodobromide, silver iodobromide.
- the grain size of the silver halide is not particularly limited, but one with a mean grain size of 0.5 ⁇ m or less may be preferable, and the so called mono-dispersed grains with 90% or more of the total grains falling within ⁇ 40% from the mean grain size as the center are preferred.
- the silver halide grains may have a crystal habit which may be either cubic, tetradecahedral and octahedral, and may be also the tablet type grain as disclosed in Japanese Unexamined Patent Publication No. 108525/1983.
- the silver halide grains in the silver halide emulsion layer of the present invention may be prepared according to any one of the single jet method such as the normal mixing method, the reverse mixing method, etc. or the double jet method according to the simultaneous mixing method, more preferably the simultaneous mixing method. Also, any of the ammonia method, the neutral method, the acidic method or the modified ammonia method as disclosed in Japanese Patent Publication No. 3232/1983, more preferably the acidic method or the neutral method, may be employed.
- metal atoms such as iridium, rhodium, osmium, bismuth, cobalt, nickel, ruthenium, iron, copper, zinc, lead, cadmium, etc. may be contained.
- the content may be preferably within the range of 10 -8 to 10 -5 mol per mol of silver halide.
- the silver halide grains may be preferably of the surface latent image type.
- the silver halide photographic emulsion in the silver halide emulsion layer according to the present invention can be applied with chemical sensitization.
- the chemical sensitization method is inclusive of sulfur sensitization, reduction sensitization and noble metal sensitization, but in the present invention, it is preferable to perform chemical sensitization by sulfur sensitization alone.
- sulfur sensitizer other than sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines, etc. can be employed, and specifically the sulfur sensitizers as disclosed in U.S. Pat. Nos. 1,574,944, 2,410,689, 2,728,668 and Japanese Patent Publication No. 11892/1984 can be employed.
- the silver halide photographic emulsion of the present invention can be imparted with photosensitivities to the respective desired photosensitive wavelength regions.
- optical sensitization may be also effected by use of one or two or more kinds of spectral sensitizers.
- optically spectral sensitizers which can be used advantageously in the present invention may include cyanines, carbocyanines, melocyanines, trinucleus or tetranucleus melocyanines, trinucleus or tetranucleus cyanines, styryls, holopolar cyanines, hemine cyanines, oxonols, hemioxonols, etc., and these optically spectral sensitizers should preferably contain a basic group such as thiazoline, thiazole, etc.
- nucleus such as rhodanine, thiohydantoin, oxsazolidinedione, barbituric acid, thiobarbituric acid, pyrazolone, etc. as a part of the structure as the nitrogen containing heterocyclic nucleus, and such nucleus can be also substituted with alkyl, hydroxyalkylhalogen, phenyl, cyano, alkoxy, and also these optically spectral sensitizers may be condensed with carbon ring or heterocyclic ring.
- the silver halide photographic emulsion of the present invention it is possible to add stabilizers such as tetrazaindenes, antifoggants such as triazoles, tetrazoles, covering power enhancers, antiirradiation agents such as oxanol dyes, dialkylaminobenzylidene dyes, etc., humectants such as polymer latices, and other additives used for photographic emulsions in general such as extenders, film hardeners to be used in combination outside of the present invention.
- stabilizers such as tetrazaindenes, antifoggants such as triazoles, tetrazoles, covering power enhancers, antiirradiation agents such as oxanol dyes, dialkylaminobenzylidene dyes, etc., humectants such as polymer latices, and other additives used for photographic emulsions in general such as extenders, film hardeners
- the support of the light-sensitive silver halide photographic material of the present invention may be one conventionally used such as polyester base, TAC base, baryta paper, laminated paper, glass plate, etc.
- the developer to be used for the light-sensitive silver halide photographic material of the present invention there can be used either one of the developer used for light-sensitive silver halide photographic materials in general and the lith developer.
- the developing agent in these developers may include dihydroxybenzenes such as hydroquinone, chlorohydroquinone, catechol; 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone; and further p-aminophenols such as N-methyl-p-aminophenol, N-(4-hydroxyphenyl)glycine; p-phenylenediamines such as ⁇ -methanesulfonamide ester, ethylaminotoluidine, N,N-diethyl-p-phenylenediamine; and ascorbic acids, etc., and
- the developer can be constituted by adding otherwise preservatives such as sodium sulfite, potassium sulfite, formaldehyde, sodium hydrogen sulfite, hydroxylamine, ethylene urea; developing inhibitors of inorganic salts such as sodium bromide, potassium bromide, potassium iodide; at least one organic inhibitor such as 1-phenyl-5-mercaptotetrazole, 5-nitrobenzimidazole, 5-nitrobenzotriazole, 5-nitroindazole, 5-methylbenzotriazole, 4-thiazolin-2-thione, etc.; alkali agents such as sodium hydroxide, potassium hydroxide, etc.; alkanolamines having development accelerating effect such as diethanolamine, triethanolamine, 3-diethylamine-1-propanol, 2-methylamino-1-ethanol, 3-diethylamino-1,2-propanediol, diisopropylamine, 5-amino-1-pentanol, 6-amino-1-
- the pH of the developer is not particularly limited, but may be preferably within the range of pH 9 to 13.
- An example of the construction of the preferable developer for developing the light-sensitive silver halide photographic material of the present invention is as follows. That is, it is a developer prepared by adding 20 to 60 g/liter of hydroquinone and 0.1 to 2 g/liter of 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone or 0.1 to 2 g/liter of 1-phenyl-4,4-dimethyl-3-pyrazolidone as the developing agent, 10 to 200 g/liter of sodium sulfite or 10 to 200 g/liter of potassium sulfite as the developer preservative, 1 to 10 g of sodium bromide or potassium bromide as the developing inhibitor of inorganic salt, 1 to 50 g/liter of alkanolamines having development accelerating effect, 0.05 to 2 g/liter of 5-methylbenzotriazole or 0.01 to 2 g/liter of 5-nitroindazole as the organic inhibitor, 1 to 50 g/liter of sodium carbonate or 10 to 800 ml/liter of an a
- the light-sensitive silver halide photographic material of the present invention is developed with the developer as described above, and then the image is fixed via the process of fixing, water washing and drying.
- the developing temperature and the developing time in the developing process are not particularly limited, but the developing temperature may be preferably in the range of 20° to 45° C., and the developing time in the range of 15 seconds to 200 seconds.
- aqueous gelatin solution maintained at 40° C. were added simultaneously over 60 minutes an aqueous silver nitrate solution and an aqueous halide solution (KBr 40 mol %, NaCl 60 mol %) according to the controlled double jet method while maintaining pH at 3.0 and pAg at 7.7 to prepare a mono-dispersed silver chlorobromide emulsion with a mean grain size of 0.30 ⁇ m.
- the emulsion was desalted and washed with water in conventional manners, and then 15 mg of sodium thiosulfate was per mol of silver chlorobromide, followed by chemical ripening at 60° C. for 60 minutes.
- aqueous gelatin solution containing an aqueous sodium 1-decyl-2-(3-isopentyl)succinate-2-sulfonate solution, a methyl methacrylate copolymer with a mean particle size of 3.0 ⁇ m as the matte agent, and 2-hydroxy-4,6-dichloro-1,3,5-triazine sodium salt as the film hardener to prepare a coating solution for protective layer, which was coated by simultaneous overlaying together with the above emulsion coating solution on a PET base, followed by drying.
- aqueous sodium 1-decyl-2-(3-isopentyl)succinate-2-sulfonate solution a methyl methacrylate copolymer with a mean particle size of 3.0 ⁇ m as the matte agent
- 2-hydroxy-4,6-dichloro-1,3,5-triazine sodium salt as the film hardener
- the amount of gelatin attached was 2.5 g/m 2 in the emulsion layer, 1.0 g/m 2 in the protective layer, the amount of AgX grains attaches was 3.5 g/m 2 as calculated on silver, the amount of the butyl acrylate latex polymer attached was 2 g/m 2 , the amount of the matte agent attached was 30 mg/m 2 , the amount of the film hardener attached was 2 g/100 g gelatin based on the amount of gelatin attached of the the emulsion layer and the protective layer inclusive.
- the amount of Compound of Formula II added corresponds to 1.3 ⁇ 10 -2 to 2.1 ⁇ 10 -2 % by weight based on the hydrophilic colloid.
- the above composition A and the composition B were dissolved in this order in 500 ml of water, and made up to one liter before use.
- the pH of the fixer was adjusted to 6 with acetic acid.
- Amount of compound was made 2 ⁇ 10 -5 mol/Ag1 mol for Formula [I], and 3 ⁇ 10 -5 mol/Ag1 mol for Formula [III]: which corresponds to 1.9 ⁇ 10 -2 to 2.4 ⁇ 10 -2 % by weight based on the hydrophilic colloid.
- a light-sensitive silver halide photographic material which is extremely high in contrast, and also improved in generation of peper fog without impairing tone hardening could be provided.
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Abstract
Disclosed is a light-sensitive silver halide photographic material having a hydrophilic colloid layer containing at least one layer of a light-sensitive silver halide emulsion layer provided on a support, wherein a hydrazide derivative is contained in the light-sensitive silver halide emulsion layer, and the above hydrophilic colloid layer contains at least one of the compounds represented by Formulae [II] and [III] shown below: ##STR1## wherein R1, R2 and R3 are as defined in the specification, ##STR2## wherein R1 and R2 are as defined in the specification.
Description
This application is a continuation of application Ser. No. 07/392,738, filed Aug. 11, 1989, now abandoned.
This invention relates to a light-sensitive silver halide photographic material which gives images of high contrast, more particularly to improvement of trouble generated in high contrasting technique with a hydrazide compound.
In recent years, in the field of printing photomechanical process, color formation and complication of printing are under remarkable progress. Accordingly, improvement of quality and stability of quality for light-sensitive silver halide photographic material for printing (hereinafter called printing sensitive material) which is the intermediate medium for printing have been increasingly demanded year by year. In the prior art, printing sensitive material has been generally endowed with the so called "lith development" processing aptitude for accomplishing high quality. However, in "lith development", it is impossible in mechanism to contain sulfite ion which is the preservative at high concentration in the development processing solution, and therefore stability of the developer is very poor, as is well known to those skilled in the art.
As the technique for cancelling instability of "lith development", and obtaining images of high contrast comparable to the "lith development", some attempts can be found in disclosures of patent literatures. For example, techniques for obtaining tone hardened images by use of hydrazide compounds are disclosed in Japanese Unexamined Patent Publications Nos. 16623/1978, 20921/1978, 20922/1978, 49429/1978, 66731/1978, 66732/1978, 77616/1978, 84714/1978, 137133/1978, 37732/1979, 40629/1979, 52050/1980, 90940/1980, 67843/1981 and others. In the processing method in the image forming method by use of these hydrazide compounds, in order to obtaining an image of high contrast, it is required that the pH value of the developer containing the hydrazide compound or pH value of the processing developer for the light-sensitive photographic material containing the hydrazide compound should be at high level, and such high pH value disadvantageously lowers the effective life of the developer.
In contrast, in Japanese Unexamined Patent Publication No. 106244/1981, it is described that an image of high contrast can be formed at relatively lower pH (11-11.5) by having a hydrazide compound and a development promoting amount of an amino compound contained during formation of image.
The image forming method by use of these hydrazide compounds can obtain images of very high contrast. Generally speaking, development processing solution may suffer from fog generation, etc. undesirable in photographic performance when no adequate development supplementing agent is supplemented, but in the method by use of hydrazide, even when the fatigue degree of the development processing solution is not so great, generation of black dots like black sesame (hereinafter called pepper fog) is seen at the unexposed portion, for example, between the dots during halftoning by use of a contact screen in printing sensitive material, whereby a trouble may be caused to occur which can be a vital defect in commercial value. In Japanese Unexamined Patent Publications Nos. 16623/1978 and 20921/1978 as previously mentioned, generation of fog containing pepper fog as mentioned above is inhibited by incorporating benzotriazole which is an inhibitor in the silver halide photographic emulsion, but its effect is not sufficient, and high contrast may be sometimes impaired, and it can hardly be said to be a completed technique.
The present inventors have studied intensively and consequently have developed a light-sensitive silver halide photographic material which does not impair high contrast while inhibiting the fog including pepper fog which is the drawback of the tone hardening technique by use of a hydrazide compound.
A first object of the present invention is to provide a light-sensitive silver halide photographic material capable of forming a stable image of high contrast by use of a hydrazide compound. A second object of the present invention is to provide a light-sensitive silver halide photographic material with high contrast without generation of fog including pepper fog.
The above objects of the present invention can be accomplished by a light-sensitive silver halide photographic material having a hydrophilic colloid layer containing at least one layer of a light-sensitive silver halide emulsion layer provided on a support, wherein a hydrazide derivative is contained in said light-sensitive silver halide emulsion layer, and the above hydrophilic colloid layer contains at least one of the compounds represented by Formulae [II] and [III] shown below: ##STR3## wherein R1 represents hydrogen atom, a straight or branched alkyl group, a cyclic alkyl group, an alkenyl group, an aralkyl group, an aryl group, a heterocyclic group, an alkylamide group, an arylamide group, an alkylthioamide group, an arylthioamide group, an alkylsulfonamide group or an arylsulfonamide group, R2 and R3 each represent hydrogen atom, a halogen atom, an alkyl group, a cyclic alkyl group, an aryl group, a cyano group, an alkylthio group, an arylthio group, an arylsulfoxide group or an alkylsulfonyl group; with proviso that the above alkyl group, the cylic alkyl group, the alkenyl group, aralkyl group, aryl group and heterocyclic group may have substituent, ##STR4## wherein R1 represents hydrogen atom, a lower alkyl group or a hydroxymethyl group, and R2 represents hydrogen atom or a lower alkyl group.
In the following, the constitution of the present invention is to be described in detail. The hydrazide derivative to be used in the present invention may include the compounds represented by the following formulae [I -a], [I - b] and [I - c]. ##STR5## wherein R1 and R2 each represent an aryl group or a heterocyclic group, R represents a divalent organic linking group, n is 0 to 6, m is 0 or 1, and when n is 2 or more, respective R's may be either the same or different). ##STR6## wherein R21 represents an aliphatic group, an aromatic group or a heterocyclic group, R22 represents hydrogen atom, an alkoxy group which may be substituted, a heterocyclic oxy group, an amino group or an aryloxy group, P1 and P2 each represent hydrogen atom, an acyl group or a sulfinic acid group. ##STR7## wherein Ar represents an aryl group containing at least one of diffusion resistant group or silver halide adsorption promoting group, and R31 represents a substituted alkyl group.
In the following, Formulae [I - a], [I -b] and [I - c] are to be described in more detail below. ##STR8##
In the formula, R1 and R2 each represent an aryl group or a heterocyclic group, R represents a divalent organic linking group, and n represents 0 to 6 and m represents 0 or 1.
Here, the aryl group represented by R1 and R2 may include phenyl group, naphthyl group, and the heterocyclic group represented by R1 and R2 may include pyridyl group, benzothiazolyl group, quinolyl group, thienyl group, etc., but R1 and R2 may be preferably aryl groups. The aryl group or heterocyclic group represented by R1 and R2 can introduce various substituents therein. Examples of substituents may include halogen atoms (e.g. chlorine, fluorine, etc.) alkyl groups (e.g. methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g. methoxy, ethoxy, isopropoxy, butoxy, octyloxy, dodecyloxy, etc.), acylamino groups (e.g. acetylamino, pivalylamino, benzoylamino, tetradecanoylamino, α-(2,4-di-t-amylphenoxy) butyrylamino, etc.), sulfonylamino groups (e.g. methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino, etc.), urea groups (e.g. phenylurea, ethylurea, etc.), thiourea groups (e.g. phenylthiourea, ethylthiourea, etc.), hydroxy group, amino group, alkylamino groups (e.g. methylamino, dimethylamino, etc.), carboxy group, alkoxycarbonyl groups (e.g. ethoxycarbonyl), carbamoyl group, sulfo group and so on. Examples of the divalent organic linking group represented by R may include alkylene groups (e.g. methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g. phenylene, naphthylene, etc.), aralkylene groups, etc., and the alkylene group may contain oxy group, thio group,seleno group, carbonyl group, ##STR9## (R3 represents hydrogen atom, an alkyl group, an aryl group), sulfonyl group, etc. in the bond. Into the group represented by R can be introduced various substituents.
Examples of substituents may include --CONHNHR4 (R4 has the same meaning as R1 and R2 as described above), alkyl groups, alkoxy groups, halogen atoms, hydroxy group, carboxy group, acyl groups, aryl groups, etc.
R may be preferably a alkylene group.
Of the compounds represented by Formula [I - a], preferable are compounds wherein R1 and R2 are substituted or unsubstituted phenyl groups, n=m=1 and R represents an alkylene group.
Representative compounds represented by the above Formula [I - a] are shown below. ##STR10##
In the following, Formula [I - b] is to be described. ##STR11## The aliphatic group represented by R21 may be preferably one having 6 or more carbon atoms, particularly a straight, branched or cyclic alkyl group having 8 to 50 carbon atoms. Here, the branched alkyl group may be cyclized so as to form a saturated hetero ring containing one or more hetero atoms. The alkyl group may have substituent such as aryl group, alkoxy group, sulfoxy group, etc.
The aromatic group represented by R21 is a monocyclic or bicyclic aryl group or unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with the monocyclic or bicyclic group to form a heteroaryl group.
For example, there may be included benzene ring, naphthalene ring, pyridine ring, pyrimidine group, imidazole ring, pyrazole ring, quinoline ring, isoquinoline ring, benzimidazole ring, thiazole ring, benzothiazole ring, etc., but amount them those containing benzene ring are preferred.
As R22, particularly preferred is an aryl group.
The aryl group or unsaturated heterocyclic group represented by R21 may be substituted, and representative substituents may include straight, branched or cyclic alkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 20 carbon atoms), alkoxy groups (having preferably 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (having preferably 2 to 30 carbon atoms), sulfonamide groups (having preferably 1 to 30 carbon atoms), ureido groups (having preferably 1 to 30 carbon atoms) and others.
Of the groups represented by R22 in the formula [I - b], the alkoxy group which may be substituted may have 1 to 20 carbon atoms and may be substituted with halogen atoms, aryl groups, etc.
Of the groups represented by R22 in the formula [I - b], the aryloxy group or the heterocyclic oxy group which may be also substituted may be preferably monocyclic, and the substituent may include halogen atoms, alkyl groups, alkoxy group, cyano group, etc.
Of the groups represented by R22, preferable are alkoxy groups or amino groups which may be also substituted.
In the case of an amino group, A1 and A2 in the group ##STR12## may be an alkyl group, alkoxy group which may be substituted, or a cyclic structure containing --O--, --S--, --N-- group bond. However, R22 cannot be hydrazino group.
R21 or R22 in Formula [I - b] may be one having a ballast group conventionally used in the immobile additive for photography such as coupler, etc. incorporated therein. The ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
R21 or R22 in Formula [I - b] may be also one having a group for strengthening adsorption to the surface of silver halide grains incorporated therein. As such adsorptive groups, there may be included the groups as disclosed in U.S. Pat. No. 4,355,105 such as thiourea group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc. Among the compounds represented by the group [I - b], the compounds represented by Formula [I - b - a] are particularly preferable. ##STR13## In the Formula [I - b - a],
R23 and R24 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, butyl, dodecyl, 2-hydroxypropyl, 2-cyanoethyl, 2-chloroethyl group), a phenyl, naphthyl, cyclohexyl, pyridyl, pyrrolidyl group which may be substituted (e.g. phenyl, p-methylphenyl, naphthyl, α-hydroxy-naphthyl, cyclohexyl, p-methylcyclohexyl, pyridyl, 4-propyl-2-pyridyl, pyrrolidyl, 4-methyl-2-pyrrolidyl group);
R25 represents hydrogen atom or a benzyl, alkoxy and alkyl group which may be substituted (e.g. benzyl, p-methylbenzyl, methoxy, ethoxy, ethyl, butyl group);
R26 and R27 each represent a divalent aromatic group (e.g. phenylene or naphthylene group), Y represents sulfur atoms or oxygen atom, L represents a divalent linking group (e.g. --SO2 CH2 CH2 NH--SO2 NH--, --OCH2 SO2 NH--, --O--, --CH═N--);
R28 represents --NR'R" or --OR29 ;
R', R" and R29 each represent hydrogen atom, an alkyl group which may be substituted (e.g. methyl, ethyl, dodecyl group), a phenyl group which may be substituted (e.g. phenyl, p-methylphenyl, p-methoxyphenyl group) or a naphthyl group which may be substituted (e.g. α-naphthyl group, β-naphthyl group), m, n represent 0 or 1, and when
R28 represents OR29, Y should preferably represent sulfur atom.
Represenatative compounds represented by the above Formulae [I - b] and [I - b - a] are shown below.
Specific compounds of Formula [I-b]: ##STR14##
Of the above specific compounds, by taking examples of the compounds I - b - 45 and I - b - 47, their synthetic methods are shown below.
A mixture of 153 g of 4-nitrophenylhydrazide and 500 ml of diethyloxalate is refluxed for one hour. While the reaction is proceeded, ethanol is removed and finally the mixture is cooled to precipitate crystals. After filtration, the product is washed several times with petroleum ether and recrystallized. Then, 50 g of the crystals (A) obtained are dissolved by heating in 1000 ml of methanol, and reduced in a H2 atmosphere pressurized at 50 psi in the presence of Pd/C (palladium-carbon) catalyst to obtain the compound (B).
To a solution of 22 g of the compound (B) dissolved in 200 ml of acetonitrile and 16 g of pyridine is added an acetonitrile solution containing 24 g of the compound (C) at room temperature. After the insolubles are filtered off, the filtrate is concentrated and purified by recrystallization to obtain 31 g of the compound (D).
Thirty (30) g of the compound (D) is hydrogenated similarly as described above to obtain 20 g of the compound (E).
To a solution of 10 g of the compound (E) dissolved in 100 ml of acetonitrile is added 3.0 g of ethylisothio-cyanate, and the mixture is refluxed for one hour. After evaporation of the solvent, the residue is purified by recrystallization to obtain 7.0 g of the compound (F). To a solution of 5.0 g of the compound (F) dissolved in 50 ml of methanol is added methylamine (8 ml of aqueous 40% solution), followed by stirring. After concentrating slightly methanol, the precipitated solid is taken out and purified by recrystallization to obtain Compound I - b - 45.
Into a stirred solution of 22 g of the compound (B) dissolved in 200 ml of pyridine, 22 g of p-nitrobenzenesulfonyl chloride is added. The reaction mixture is poured into water, and the post-precipitated solid is taken out to obtain the compound (C). From the compound (C), according to the same reactions as in the case of Compound I - b - 45 following the synthesis scheme, Compound I - b - 47 is obtained.
Next, Formula [I - c] is to be described. ##STR17##
In Formula [I - c], Ar represents an aryl group containing at least one of diffusion resistant groups or silver halide adsorption promoting groups, and as the diffusion resistant group, a ballast group conventionally used in immobile additives for photography such as coupler, etc. is preferable. The ballast group is a group having 8 or more carbon atoms relatively inert to photographic characteristic, and can be chosen from, for example, alkyl groups, alkoxy groups, phenyl groups, alkylphenyl groups, phenoxy groups, alkylphenoxy groups, etc.
As the silver halide adsorption promoting group, there may be included the groups as disclosed in U.S. Pat. No. 4,385,108 such as thiourea group, thiourethane group, heterocyclic thioamide group, mercaptoheterocyclic group, triazole group, etc.
R31 represents a substituted alkyl group, and the alkyl group may be a straight, branched or cyclic alkyl group, including methyl, ethyl, propyl, butyl, isopropyl, pentyl, cyclohexyl and the like.
As the substituent to be introduced into these alkyl group, there may be included groups of alkoxy (e.g. methoxy, ethoxy), aryloxy (e.g. phenoxy, p-chlorophenoxy), heterocyclic oxy (e.g. pyridyloxy), mercapto, alkylthio (e.g. methylthio, ethylthio), arylthio (e.g. phenylthio, p-chlorophenylthio), heterocyclic thio (e.g. pyridylthio, pyrimidylthio, thiadiazolylthio), alkylsulfonyl (e.g. methanesulfonyl, butanesulfonyl), arylsulfonyl (e.g. benzenesulfonyl), heterocyclic sulfonyl (e.g. pyridylsulfonyl, morpholinosulfonyl), acyl (e.g. acetyl, benzoyl), cyano, chloro, bromo, alkoxycarbonyl (e.g. ethoxycarbonyl, methoxycarbonyl), aryloxycarbonyl (e.g. phenoxycarbonyl), carboxy, carbamoyl, alkylcarbamoyl (e.g. N-methylcarbamoyl, N,N-dimethylcarbamoyl), arylcarbamoyl (e.g. N-phenylcarbamoyl), amino, alkylamino (e.g. methylamino, N,N-dimethylamino), arylamino (e.g. phenylamino, naphthylamino), acylamino (e.g. acetylamino, benzoylamino), alkoxycarbonylamino (e.g. ethoxycarbonylamino), aryloxycarbonylamino (e.g. phenoxycarbonylamino), acyloxy (e.g. acetyloxy, benzoyloxy), alkylaminocarbonyloxy (e.g. methylaminocarbonyloxy), arylaminocarbonyloxy (e.g. phenylaminocarbonyloxy), sulfo, sulfamoyl, alkylsulfamoyl (e.g. methylsulfamoyl), arylsulfamoyl (e.g. phenylsulfamoyl), etc.
The hydrogen atom of hydrazide may be also substituted with a substituent such as sulfonyl group (e.g. methanesulfonyl, toluenesulfonyl), acyl group (e.g. acetyl, trifluoroacetyl), oxalyl group (e.g. ethoxalyl), etc.
Representative compounds represented by the above Formula [I - c] are shown below. ##STR18##
Next, a synthesis example of Compound I - c - 5 is described.
According to the procedure similar to the synthetic method of Compound I - b - 45, Compound I - c - 5 is obtained.
The amount of the compounds of Formulae [I - a], [I - b] and [I - c] contained in the light-sensitive silver halide material of the present invention should be preferably within the range of from 5×10-7 to 5×10-1 mol, more preferably 1×10-5 to 1×10-2 mol, per mol of silver halide contained in the light-sensitive silver halide photographic material.
Next, Formula [II] of the present invention is to be described. ##STR20##
In Formula, R1 represents hydrogen atom, a straight or branched alkyl group, a cyclic alkyl group, an alkenyl group, an aralykyl group, an aryl group, a heterocyclic group, an alkylamino group, an arylamide groups, an alkylthioamide group, an arylthioamide group, an alkylsulfoamide group, an arylsulfoamide group; R2, R3 each represent hydrogen atom, a halogen atom, an alkyl group, a cyclic alkyl group, an aryl group, a cyano group, an alkylthio group, an arylthio group, an alkylsulfoxide group, an alkylsulfonyl group, a heterocyclic group. However, the above alkyl group, cyclic alkyl group, alkenyl group, heteocyclic group, aralkyl group and aryl group may have substituents.
In R1 in Formula [II], the alkyl group and the alkenyl group may have 1 to 36, more preferably 1 to 18 carbon atoms. The cyclic alkyl group may have 3 to 12, more preferably 3 to 6 carbon atoms. These alkyl groups, alkenyl groups, cyclic alkyl groups, aralkyl groups, aryl groups, heterocyclic groups may have substituents, and the substituent may be chosen from halogen atom, nitro, cyano, thiocyano, aryl, alkoxy, aryloxy, carboxy, sulfoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, sulfo, acyloxy, sufamoyl, carbamoyl, acylamino, diacylamino, ureido, thioureido, urethane, thiourethane, sulfonamide, heterocyclic group, arylsulfonyloxy, alkylsulfonyloxy, arylsulfonyl, alkylsulfonyl group, arylthio, alkylthio, alkylsulfinyl, arylsulfinyl, alkylamino, dialkylamino, N-alkylanilino, N-arylanilino, N-acylamino, hydroxy and mercapto group, etc.
In R2, R3 in Formula [II], the alkyl group may have 1 to 18, more preferably 1 to 9 carbon atoms. The cyclic alkyl group may have 3 to 12, more preferably 3 to 6 carbon atoms. These alkyl groups, cyclic alkyl groups and aryl groups may have substituents, and the substituent may include halogen atom, nitro group, sulfone group, aryl group, hydroxy group, etc.
Representative examples of the compounds represented by the above Formula [II] (hereinafter called compounds of the present invention) are shown below, but the compounds of the present invention are not limited to these.
2-methyl-3-isothiazolone;
2-(N-methylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-methylcarbamoyl)-3-isothiazolone;
2-(N-methylthiocarbamoyl)-3-isothiazolone;
4-bromo-5-methyl-2-(N-methylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylthio-2-(N-methylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylsulfinyl-2-(N-methylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylsulfonyl-2-(N-methylcarbamoyl)-3-isothiazolone;
2-(N-n-butylcarbamoyl)-3-isothiazolone;
2-(N-t-octylcarbamoyl)-3-isothiazolone;
3-methyl-2-(N-phenylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylthio-2-(N-phenylcarbamoyl)-3-isothiazolone;
4-bromo-5-methyl-2-(N-3-chlorophenylcarbamoyl)-3-isothiazolone;
5-bromomethyl-2-(N-3-chlorophenylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-3-chlorophenylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylthio-2-(N-3-chlorophenylcarbamoyl)-3-isothiazolone;
2-(N-3-chlorophenylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-2-chlorophenylcarbamoyl)-3-isothiazolone;
5-bromomethyl-3-(N-2-chlorophenylcarbamoyl)-3-isothiazolone;
4-bromo-5-methyl-2-(N-3,4-dichlorophenylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-3,4-dichlorophenylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylthio-2-(N-3,4-dichlorophenylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-4-tosylcarbamoyl)-3-isothiazolone;
4-cyano-5-methylthio-2-(N-4-tosylcarbamoyl)-3-isothiazolone;
4-bromo-5-methyl-2-(N-4-tosylcarbamoyl)-3-isothiazolone;
2-(N-n-propylcarbamoyl)-3-isothiazolone;
2-(N-ethylcarbamoyl)-3-isothiazolone;
2-(N-i-propylcarbamoyl)-3-isothiazolone;
4-bromo-2-(N-methylcarbamoyl)-3-isothiazolone;
2-(N-4-methoxyphenylcarbamoyl)-3-isothiazolone;
2-(N-2-methoxyphenylcarbamoyl)-3-isothiazolone;
2-(N-3-nitrophenylcarbamoyl)-3-isothiazolone;
2-(N-3,4-dichlorophenylcarbamoyl)-3-isothiazolone;
2-(N-n-dodecylcarbamoyl)-3-isothiazolone;
2-(N-2,5-dichlorophenylcarbamoyl)-3-isothiazolone;
2-(N-carboethoxymethylcarbamoyl)-3-isothiazolone;
2-(N-4-nitrophenylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-ethylcarbamoyl)-3-isothiazolone;
5-methyl-2-(N-ethylthiocarbamoyl)-3-isothiazolone;
5-chloro-2-(N-ethylcarbamoyl)-3-isothiazolone;
2-n-propyl-3-isothiazolone;
2-t-butyl-3-isothiazolone;
2-n-butyl-3-isothiazolone;
2-cyclohexyl-3-isothiazolone;
2-t-octyl-3-isothiazolone;
2-benzyloxy-3-isothiazolone;
5-chloro-2-methyl-3-isothiazolone;
5-chloro-2-benzyl-3-isothiazolone;
4,5-dichloro-2-methyl-3-isothizaolone;
2,4-dimethyl-3-isothizaolone;
4-methyl-2-(3,4-dichlorophenyl)-3-isothiazolone;
2-(3,4-dichlorophenyl)-3-isothiazolone;
4,5-dichloro-2-benzyl-3-isothiazolone;
4-bromo-5-chloro-2-methyl-3-isothiazolone;
4-bromo-2-methyl-3-isothiazolone;
2-hydroxymethyl-3-isothiazolone;
2-(α,β-diethylaminoethyl)-3-isothiazolone;
2-n-propyl-3-isothiazolone hydrochloride;
5-chloro-2-methyl-3-isothiazolone hydrochloride;
2-ethyl-3-isothiazolone hydrochloride;
2-methyl-3-isothiazolone hydrochloride;
2-benzyl-3-isothiazolone hydrochloride;
2-n-dodecyl-3-isothiazolone;
2-n-tetradecyl-3-isothiazolone;
2-(4-chlorobenzyl)-3-isothiazolone;
2-(2-chlorobenzyl)-3-isothiazolone;
2-(2,4-dichlorobenzyl)-3-isothiazolone;
2-(3,4-dichlorobenzyl)-3-isothiazolone;
2-(4-methoxybenzyl)-3-isothiazolone;
2-(4-methylbenzyl)-3-isothiazolone;
2-(2-ethoxyhexyl)-3-isothiazolone;
2-(2-phenylethyl)-3-isothiazolone;
2-(2-phenylethyl)-4-chloro-3-isothiazolone;
2-(1-phenylethyl)-3-isothiazolone;
2-n-decyl-3-isothiazolone;
2-n-octyl-3-isothiazolone;
2-t-octyl-4-chloro-3-isothiazolone;
2-t-octyl-4-bromo-3-isothiazolone;
2-n-nonyl-3-isothiazolone;
2-n-octyl-5-chloro-3-isothiazolone;
2-(4-nitrophenyl)-3-isothiazolone;
2-(carboethoxyphenyl)-3-isothiazolone;
5-chloro-2-methyl-3-isothiazolone monochloroacetate;
4,5-dichloro-2-methyl-3-isothiazolone monochloroacetate;
2-ethyl-3-isothiazolone monochloroacetate;
2-n-propyl-3-isothiazolone monochloroacetate;
2-benzyl-3-isothiazolone monochloroacetate.
With respect to these exemplary compounds, are described in French Patent 1,555,416, etc. about their synthetic methods and application examples to other fields.
Next, the compound represented by Formula [III] is to be described. ##STR21## wherein R1 represents hydrogen, a lower alkyl group or hydroxymethyl group, and R2 represents hydrogen or a lower alkyl group.
In the above Formula, R1 represents hydrogen, a lower alkyl group or hydroxymethyl group, R2 represents hydrogen or a lower alkyl group, and as the lower alkyl group, one having 1 to 5 carbon atoms, particularly 1 carbon atom, is preferred.
These compounds can be synthesized by referring to the following literatures, and also a part of them are commercially available from Mitsubishi Sekiyu K.K.
(1) Henry. Ecueil des travaux chimiques des Rays-Bas. 16 251
(2) Maas. Chemisches Zentralblatt. 1899 I 179
(3) E. Schmidt. Berichte der Deutchen Chemischen Gesellschaft. 52 387
(4) E. Schmidt. ibid. 55 317
(5) Henry. Chemisches Zentralblatt 1897 11 338
The compound represented by Formulae [II] or [III] may be used in an amount preferably within the range of 1×10-3 to 10% by weight, preferably 1×10-3 to 3% by weight, more preferably 5×10-3 to 3% by weight, based on the hydrophilic colloid. However, the above range may be more or less varied depending on the kind of the light-sensitive silver halide photograpic material, the layer into which it is added, the coating method, etc., as a matter of course.
In one aspect of the invention, a light-sensitive silver halide photographic material according to the invention may contain a hydrazide derivative in an amount of 1×10-5 to 1×10-2 mol per mol of silver halide, and at least one member selected from the group of 2-methyl-3-isothiazolone, 5-chloro-2-methyl-3-isothiazolone, 4,5-dichloro-2-methyl-3-isothiazolone and a compound represented by the formula III-1: ##STR23## in an amount of 1×10-3 to 3% by weight based on the hydrophilic colloid.
The compound of the present invention may be dissolved in a solvent which has no deleterious influence on photographic performance, chosen from water and organic solvents such as methanol, isopropanol, acetone, etc. and added as the solution into the hydrophilic colloid, or coated on the protective layer or incorporated by dipping into a sterilizing agent solution. Alternatively, there may be also employed the method in which the compound is dissolved in a high boiling solvent, a low boiling solvent or a solvent mixture of both, then emulsified in the presence of a surfactant and then added into a solution containing the hydrophilic colloid or further coated on the protective layer, etc.
The silver halide to be used in the present invention may be either one of silver chlorobromide, silver chloroiodobromide, silver iodobromide.
The grain size of the silver halide is not particularly limited, but one with a mean grain size of 0.5 μm or less may be preferable, and the so called mono-dispersed grains with 90% or more of the total grains falling within ±40% from the mean grain size as the center are preferred.
The silver halide grains may have a crystal habit which may be either cubic, tetradecahedral and octahedral, and may be also the tablet type grain as disclosed in Japanese Unexamined Patent Publication No. 108525/1983.
The silver halide grains in the silver halide emulsion layer of the present invention may be prepared according to any one of the single jet method such as the normal mixing method, the reverse mixing method, etc. or the double jet method according to the simultaneous mixing method, more preferably the simultaneous mixing method. Also, any of the ammonia method, the neutral method, the acidic method or the modified ammonia method as disclosed in Japanese Patent Publication No. 3232/1983, more preferably the acidic method or the neutral method, may be employed.
Also, within these silver halide grains, metal atoms such as iridium, rhodium, osmium, bismuth, cobalt, nickel, ruthenium, iron, copper, zinc, lead, cadmium, etc. may be contained.
When these metal atoms are to be contained, the content may be preferably within the range of 10-8 to 10-5 mol per mol of silver halide. The silver halide grains may be preferably of the surface latent image type.
The silver halide photographic emulsion in the silver halide emulsion layer according to the present invention (hereinafter called the silver halide photographic emulsion of the present invention) can be applied with chemical sensitization. The chemical sensitization method is inclusive of sulfur sensitization, reduction sensitization and noble metal sensitization, but in the present invention, it is preferable to perform chemical sensitization by sulfur sensitization alone. As the sulfur sensitizer, other than sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines, etc. can be employed, and specifically the sulfur sensitizers as disclosed in U.S. Pat. Nos. 1,574,944, 2,410,689, 2,728,668 and Japanese Patent Publication No. 11892/1984 can be employed.
The silver halide photographic emulsion of the present invention can be imparted with photosensitivities to the respective desired photosensitive wavelength regions. Here, optical sensitization may be also effected by use of one or two or more kinds of spectral sensitizers. Examples of optically spectral sensitizers which can be used advantageously in the present invention may include cyanines, carbocyanines, melocyanines, trinucleus or tetranucleus melocyanines, trinucleus or tetranucleus cyanines, styryls, holopolar cyanines, hemine cyanines, oxonols, hemioxonols, etc., and these optically spectral sensitizers should preferably contain a basic group such as thiazoline, thiazole, etc. or a nucleus such as rhodanine, thiohydantoin, oxsazolidinedione, barbituric acid, thiobarbituric acid, pyrazolone, etc. as a part of the structure as the nitrogen containing heterocyclic nucleus, and such nucleus can be also substituted with alkyl, hydroxyalkylhalogen, phenyl, cyano, alkoxy, and also these optically spectral sensitizers may be condensed with carbon ring or heterocyclic ring.
In the silver halide photographic emulsion of the present invention, it is possible to add stabilizers such as tetrazaindenes, antifoggants such as triazoles, tetrazoles, covering power enhancers, antiirradiation agents such as oxanol dyes, dialkylaminobenzylidene dyes, etc., humectants such as polymer latices, and other additives used for photographic emulsions in general such as extenders, film hardeners to be used in combination outside of the present invention.
The support of the light-sensitive silver halide photographic material of the present invention may be one conventionally used such as polyester base, TAC base, baryta paper, laminated paper, glass plate, etc.
As the developer to be used for the light-sensitive silver halide photographic material of the present invention, there can be used either one of the developer used for light-sensitive silver halide photographic materials in general and the lith developer. The developing agent in these developers may include dihydroxybenzenes such as hydroquinone, chlorohydroquinone, catechol; 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone; and further p-aminophenols such as N-methyl-p-aminophenol, N-(4-hydroxyphenyl)glycine; p-phenylenediamines such as β-methanesulfonamide ester, ethylaminotoluidine, N,N-diethyl-p-phenylenediamine; and ascorbic acids, etc., and it is used as an aqueous solution containing at least one of such developing agents.
The developer can be constituted by adding otherwise preservatives such as sodium sulfite, potassium sulfite, formaldehyde, sodium hydrogen sulfite, hydroxylamine, ethylene urea; developing inhibitors of inorganic salts such as sodium bromide, potassium bromide, potassium iodide; at least one organic inhibitor such as 1-phenyl-5-mercaptotetrazole, 5-nitrobenzimidazole, 5-nitrobenzotriazole, 5-nitroindazole, 5-methylbenzotriazole, 4-thiazolin-2-thione, etc.; alkali agents such as sodium hydroxide, potassium hydroxide, etc.; alkanolamines having development accelerating effect such as diethanolamine, triethanolamine, 3-diethylamine-1-propanol, 2-methylamino-1-ethanol, 3-diethylamino-1,2-propanediol, diisopropylamine, 5-amino-1-pentanol, 6-amino-1-hexanol, etc.; buffering agents having buffering effect in developer such as sodium carbonate, sodium phosphate, aqueous carbonic acid solution, aqueous phosphoric acid solution, etc.; salts such as sodium sulfate, sodium acetate, sodium citrate, etc.; hard water softeners according to the chelation effect such as sodium ethylenediaminetetraacetate, sodium nitrilotriacetate, sodium hydroxydiaminetriacetate, etc.; development film hardners such as glutaralhehyde; solvents for developing agents and organic inhibitors such as diethylene glycol, dimethylformaldehyde, ethyl alcohol, benzyl alcohol; development controlling agents such as methylimidazoline, methylimidazole, polyethylene glycol, dodecylpyridinium bromide, etc.
The pH of the developer is not particularly limited, but may be preferably within the range of pH 9 to 13.
An example of the construction of the preferable developer for developing the light-sensitive silver halide photographic material of the present invention is as follows. That is, it is a developer prepared by adding 20 to 60 g/liter of hydroquinone and 0.1 to 2 g/liter of 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone or 0.1 to 2 g/liter of 1-phenyl-4,4-dimethyl-3-pyrazolidone as the developing agent, 10 to 200 g/liter of sodium sulfite or 10 to 200 g/liter of potassium sulfite as the developer preservative, 1 to 10 g of sodium bromide or potassium bromide as the developing inhibitor of inorganic salt, 1 to 50 g/liter of alkanolamines having development accelerating effect, 0.05 to 2 g/liter of 5-methylbenzotriazole or 0.01 to 2 g/liter of 5-nitroindazole as the organic inhibitor, 1 to 50 g/liter of sodium carbonate or 10 to 800 ml/liter of an aqueous phosphoric acid solution (1 mol/liter) as the buffering agent, 0.1 to 10 g/liter of disodium ethylenediaminetetraacetate as the chelating agent, and adjusting the pH to 11.0 to 12.5 with the use of an appropriate alkali agent (e.g. potassium hydroxide).
The light-sensitive silver halide photographic material of the present invention is developed with the developer as described above, and then the image is fixed via the process of fixing, water washing and drying. At this time, the developing temperature and the developing time in the developing process are not particularly limited, but the developing temperature may be preferably in the range of 20° to 45° C., and the developing time in the range of 15 seconds to 200 seconds.
The present invention is described in more detail by referring to Examples, but the present invention is not limited thereto.
Into an aqueous gelatin solution maintained at 40° C. were added simultaneously over 60 minutes an aqueous silver nitrate solution and an aqueous halide solution (KBr 40 mol %, NaCl 60 mol %) according to the controlled double jet method while maintaining pH at 3.0 and pAg at 7.7 to prepare a mono-dispersed silver chlorobromide emulsion with a mean grain size of 0.30 μm. The emulsion was desalted and washed with water in conventional manners, and then 15 mg of sodium thiosulfate was per mol of silver chlorobromide, followed by chemical ripening at 60° C. for 60 minutes.
Next, to the emulsion was added 1 g/Ag1 mol of 6-methyl-4-hydroxy-1,3-3a,7-tetrazaindene. As the sensitizing dye, 300 mg/Ag1 mol of the following compound (M) was added, and also 250 mg/Ag1 mol of a polyethylene glycol with a molecular weight of about 4000, the hydrazide compound of the present invention, and the compound represented by Formula [II] were added as shown in Table 1. Further, 1×10-3 mol/Ag1 mol and 5×10-3 mol of hydroquinone, a butyl acrylate latex polymer and an aqueous saponin solution as the extender were added to prepare an emulsion coating solution. Further, into the aqueous gelatin solution were added an aqueous sodium 1-decyl-2-(3-isopentyl)succinate-2-sulfonate solution, a methyl methacrylate copolymer with a mean particle size of 3.0 μm as the matte agent, and 2-hydroxy-4,6-dichloro-1,3,5-triazine sodium salt as the film hardener to prepare a coating solution for protective layer, which was coated by simultaneous overlaying together with the above emulsion coating solution on a PET base, followed by drying. At this time, the amount of gelatin attached was 2.5 g/m2 in the emulsion layer, 1.0 g/m2 in the protective layer, the amount of AgX grains attaches was 3.5 g/m2 as calculated on silver, the amount of the butyl acrylate latex polymer attached was 2 g/m2, the amount of the matte agent attached was 30 mg/m2, the amount of the film hardener attached was 2 g/100 g gelatin based on the amount of gelatin attached of the the emulsion layer and the protective layer inclusive.
For the compound [II] of the present invention added in the silver halide emulsion layer, the compound of [II - 1], [II - 2], [II - 3], [II - 4] or [II - 5] shown below was employed. ##STR24##
TABLE 1
______________________________________
Hydrazide compound of the
Sam- present invention Compound of Formula [II]
ple Compound Amount added
Compound
Amount added
No. No. mol/Ag · 1 mol
No. mol/Ag · 1 mol
______________________________________
1 -- -- -- --
2 a 2 × 10.sup.-5
-- --
3 b 2 × 10.sup.-5
-- --
4 I-a-8 2 × 10.sup.-5
-- --
5 I-b-5 2 × 10.sup.-5
-- --
6 I-c-3 2 × 10.sup.-5
-- --
7 I-c-11 2 × 10.sup.-5
-- --
8 a 2 × 10.sup.-5
II-1 3 × 10.sup.-5
9 b 2 × 10.sup.-5
II-2 3 × 10.sup.-5
10 I-a-8 2 × 10.sup.-5
II-2 3 × 10.sup.-5
11 I-a-8 2 × 10.sup.-5
II-3 3 × 10.sup.-5
12 I-b-5 2 × 10.sup.-5
II-3 3 × 10.sup.-5
13 I-b-5 2 × 10.sup.-5
II-4 3 × 10.sup.-5
14 I-c-3 2 × 10.sup.-5
II-2 3 × 10.sup.-5
15 I-c-3 2 × 10.sup.-5
II-3 3 × 10.sup.-5
16 I-c-3 2 × 10.sup.-5
II-5 3 × 10.sup.-5
17 I-c-11 2 × 10.sup.-5
II-1 3 × 10.sup.-5
18 I-c-11 2 × 10.sup.-5
II-2 3 × 10.sup.-5
______________________________________
The amount of Compound of Formula II added corresponds to 1.3×10-2 to 2.1×10-2 % by weight based on the hydrophilic colloid.
As the comparative compound added in the silver halide emulsion layer, the compounds (a)-(b) shown below were employed. ##STR25##
After the above samples of No. 1 to 18 were given stepwise exposure with a tungsten light source through a film wedge in conventional manner, they were developed with the developer shown below at 38° C. for 30 seconds, fixed, washed with water and dried, followed by evaluation of sensitivity, contrast and pepper fog. The contrast is represented by the slope (tan θ value) at the linear portion of the characteristic curve, and the degree of generation of pepper fog ranked at the four ranks of (5) no generation at all, (4) 1 to 2 in one field of vision, (3) small but low quality, (2) remarkably generated.
______________________________________
(Developer recipe)
Hydroquinone 34 g
N-methyl-p-aminophenol 0.23 g
Disodium ethylenediaminetetraacetate
1 g
3-Diethylamino-1,2-propane diol
15 g
5-Methylbenztriazole 0.4 g
Na.sub.2 SO.sub.3 76 g
NaBr 3 g
NaCl 1.3 g
1 mol/liter phosphoric acid solution
400 ml
(after addition of NaOH necessary for adjusting to pH
11.5, made up to one liter with water)
(Fixer recipe)
(Composition A)
Ammonium thiosulfate (72.5% W/V aqueous solution)
240 ml
Sodium sulfite 17 g
Sodium acetate trihydrate 6.5 g
Boric acid 6 g
Sodium citrate dihydrate 2 g
(Composition B)
Pure water (deionized water)
17 ml
Sulfuric acid (50% W/V aqueous solution)
4.7 g
Aluminum sulfate (aqueous solution
26.5 g
containing 8.1% W/V as calculated on Al.sub.2 O.sub.3)
______________________________________
During use of the fixer, the above composition A and the composition B were dissolved in this order in 500 ml of water, and made up to one liter before use. The pH of the fixer was adjusted to 6 with acetic acid.
The results are shown in Table 2.
TABLE 2
______________________________________
Pepper
Sample No.
Sample content
Sensitivity
Contrast
fog
______________________________________
1 Comparison 50 8 5
2 Comparison 98 12 2
3 Comparison 100 15 2
4 Comparison 120 17 2
5 Comparison 140 18 2
6 Comparison 130 18 2
7 Comparison 130 17 2
8 Comparison 95 10 2
9 Comparison 100 11 3
10 Present invention
120 16 5
11 Present invention
120 16 4
12 Present invention
140 17 5
13 Present invention
135 18 5
14 Present invention
120 18 5
15 Present invention
125 17 4
16 Present invention
130 17 4
17 Present invention
125 17 5
18 Present invention
125 16 5
______________________________________
As is apparent from the results in Table 2, it can be appreciated that the samples obtained according to the present invention inhibit remarkably generation of pepper fog without impairing sensitivity and contrast. In Table 2, sensitivity is relative sensitivity.
Samples were obtained by coating and drying in entirely the same manner as in Example 1 except for using the compound [III] in place of the compound [II], and exposure-treated and evaluated in the same manner. The sample contents and results are shown in Table 3.
TABLE 3
______________________________________
Sample
Compound Compound Relative Pepper
No. [I] [III] sensitivity
Contrast
fog
______________________________________
19 -- -- 50 8 5
20 a III-1 98 10 2
21 b III-1 100 11 3
22 I-a-8 III-1 120 16 5
23 I-a-8 III-2 120 16 4
24 I-b-5 III-1 140 17 5
25 I-b-5 III-3 135 18 5
26 I-c-3 III-1 120 18 5
27 I-c-3 III-4 125 17 5
28 I-c-11 III-6 125 17 5
______________________________________
Amount of compound was made 2×10-5 mol/Ag1 mol for Formula [I], and 3×10-5 mol/Ag1 mol for Formula [III]: which corresponds to 1.9×10-2 to 2.4×10-2 % by weight based on the hydrophilic colloid.
As is apparent from Table 3, it could be confirmed that the samples No. 22 to No. 28 by use of the compounds of the present invention had the effect of pepper fog inhibiting effect without impairing sensitivity and contrast as compared with comparative samples No. 19 to 21.
According to the present invention, a light-sensitive silver halide photographic material which is extremely high in contrast, and also improved in generation of peper fog without impairing tone hardening could be provided.
Claims (7)
1. A light-sensitive silver halide photographic material having
a hydrophilic colloid layer containing at least one layer of a light-sensitive silver halide emulsion layer provided on a support,
said light sensitive silver halide emulsion containing
silver halide grains having a mean grain size of 0.5 μm or less and
a hydrazide derivative wherein said hydrazide derivative is a compound represented by the formula (I-b-a) or (I-c): ##STR26## wherein R23 and R24 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, a phenyl, naphthyl, cyclohexyl, pyridyl, pyrrolidyl group, or a substituted pyrrolidyl group; R25 represents a hydrogen atom, a benzyl, alkoxy, alkyl group, or a substituted alkyl group; R26 and R27 each represents a divalent aromatic group, Y represents a sulfur atom or oxygen atom, L represents a divalent linking group; R28 represents --NR'R" or --OR29 ; R', R" and R29 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, a phenyl group, a substituted phenyl group, a naphthyl group or a substituted naphthyl group; m and n each represents 0 or 1, and when R28 represents --OR29, Y represents a sulfur atom or ##STR27## wherein Ar represents an aryl group containing at least one of a diffusion resistant group or a silver halide adsorption promoting group, and R31 represents a substituted alkyl group;
and said hydrophilic colloid layer contains a compound represented by Formula II or Formula III present in an amount effective to inhibit fog formation: ##STR28## where R1 represents hydrogen atom, a straight or branched alkyl group, a cyclic alkyl group, an alkenyl group, an aralkyl group, an aryl group, a heterocyclic group, an alkylamide group, an arylamide group, an alkylthioamide group, an arylthioamide group, an alkylsulfonamide group or an arylsulfonamide group, R2 and R3 each represent hydrogen atom, a halogen atom, an alkyl group, a cyclic alkyl group, an aryl group, a cyano group, an alkylthio group, an arylthio group, an arylsulfoxide group or an alkylsulfonyl group; with proviso that the above alkyl group, the cyclic alkyl group, the alkenyl group, aralkyl group, aryl group and heterocyclic group may have substituents; or ##STR29## wherein R1 represents hydrogen atom, a lower alkyl group or a hydroxymethyl group, and R2 represents hydrogen atom or a lower alkyl group.
2. The light-sensitive silver halide photographic material according to claim 1, wherein the content of said hydrazide derivative is within the range of from 5×10-7 to 5×10-1 mol per mol of silver halide contained in the light-sensitive silver halide photographic material.
3. The light-sensitive silver, halide photographic material according to claim 2, wherein the content of said hydrazide derivative is within the range of from 1×10-5 to 1×10-2 mol per mol of silver halide contained in the light-sensitive silver halide photographic material.
4. The light-sensitive silver halide photographic material according to claim 1, wherein said compound represented by Formula III is ##STR30##
5. The light-sensitive silver halide photographic material according to claim 1, wherein the content of said compound represented by Formula III is within the range of 1×10-3 to 10% by weight based on the hydrophilic colloid.
6. The light-sensitive silver halide photographic material according to claim 5, wherein the content of said compound represented by Formula III is within the range of 1×10-3 to 3% by weight based on the hydrophilic colloid.
7. The light-sensitive silver halide photographic material according to claim 1, wherein said material contains: a hydrazide derivative in an amount of 1×10-5 to 1×10-2 mol per mol of silver halide, and at least one of 2-methyl-3-isothiazolone, 5-chloro-2-methyl-3-isothiazolone, 4,5-dichloro-2-methyl-3-isothiazolone and a compound represented by the formula: ##STR31## in an amount of 1×10-3 to 3% by weight based on the hydrophilic colloid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/617,950 USH1090H (en) | 1988-08-17 | 1990-11-27 | Light-sensitive silver halide photographic material |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-205229 | 1988-08-17 | ||
| JP20522988A JPH0253047A (en) | 1988-08-17 | 1988-08-17 | Silver halide photographic sensitive material |
| US39273889A | 1989-08-11 | 1989-08-11 | |
| US07/617,950 USH1090H (en) | 1988-08-17 | 1990-11-27 | Light-sensitive silver halide photographic material |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US39273889A Continuation | 1988-08-17 | 1989-08-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USH1090H true USH1090H (en) | 1992-08-04 |
Family
ID=26514936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/617,950 Abandoned USH1090H (en) | 1988-08-17 | 1990-11-27 | Light-sensitive silver halide photographic material |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USH1090H (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5399479A (en) * | 1993-12-16 | 1995-03-21 | Eastman Kodak Company | Photographic element exhibiting improved speed and stability |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4460462A (en) | 1982-05-07 | 1984-07-17 | Arneson Products, Inc. | Leaf trap and main drain assembly |
| US4686167A (en) | 1985-09-26 | 1987-08-11 | Anitec Image Corporation | Compositions comprising ethane dioic acid hydrazide compounds and derivatives useful as dot-promoting agents |
| US4816373A (en) | 1986-01-31 | 1989-03-28 | Mitsubishi Paper Mills, Ltd. | Method of producing images |
| US4971888A (en) | 1988-05-11 | 1990-11-20 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4985338A (en) | 1988-03-10 | 1991-01-15 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4999282A (en) | 1988-05-18 | 1991-03-12 | Konica Corporation | Silver halide photographic material |
-
1990
- 1990-11-27 US US07/617,950 patent/USH1090H/en not_active Abandoned
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4460462A (en) | 1982-05-07 | 1984-07-17 | Arneson Products, Inc. | Leaf trap and main drain assembly |
| US4686167A (en) | 1985-09-26 | 1987-08-11 | Anitec Image Corporation | Compositions comprising ethane dioic acid hydrazide compounds and derivatives useful as dot-promoting agents |
| US4816373A (en) | 1986-01-31 | 1989-03-28 | Mitsubishi Paper Mills, Ltd. | Method of producing images |
| US4985338A (en) | 1988-03-10 | 1991-01-15 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4971888A (en) | 1988-05-11 | 1990-11-20 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
| US4999282A (en) | 1988-05-18 | 1991-03-12 | Konica Corporation | Silver halide photographic material |
| US5059516A (en) | 1988-05-18 | 1991-10-22 | Konica Corporation | Silver halide photographic material |
Non-Patent Citations (1)
| Title |
|---|
| Research Disclosure, No. 235, Nov. 1983, pp. 346-352, disclosure No. 23510, Havant Hampshire, Great Britain; "Development Nucleation by Hydrazine and Hydrazine Derivatives". |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5399479A (en) * | 1993-12-16 | 1995-03-21 | Eastman Kodak Company | Photographic element exhibiting improved speed and stability |
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