US4985339A - Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a polymeric binder - Google Patents
Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a polymeric binder Download PDFInfo
- Publication number
- US4985339A US4985339A US07/217,207 US21720788A US4985339A US 4985339 A US4985339 A US 4985339A US 21720788 A US21720788 A US 21720788A US 4985339 A US4985339 A US 4985339A
- Authority
- US
- United States
- Prior art keywords
- light
- silver halide
- sensitive
- polymerizable compound
- sensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 124
- 150000001875 compounds Chemical class 0.000 title claims abstract description 94
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 94
- 239000004332 silver Substances 0.000 title claims abstract description 94
- 239000000463 material Substances 0.000 title claims abstract description 56
- 239000003638 chemical reducing agent Substances 0.000 title claims abstract description 42
- 239000011230 binding agent Substances 0.000 title description 15
- 229920005596 polymer binder Polymers 0.000 claims abstract description 11
- 239000002491 polymer binding agent Substances 0.000 claims abstract description 11
- 125000005647 linker group Chemical group 0.000 claims abstract description 6
- 229920001577 copolymer Polymers 0.000 claims description 26
- 239000000178 monomer Substances 0.000 claims description 7
- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 claims 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 claims 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 claims 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 72
- 239000010410 layer Substances 0.000 description 64
- 239000004793 Polystyrene Substances 0.000 description 48
- 239000002585 base Substances 0.000 description 38
- 239000000839 emulsion Substances 0.000 description 38
- 230000008569 process Effects 0.000 description 38
- 229920000642 polymer Polymers 0.000 description 37
- 239000000243 solution Substances 0.000 description 32
- 238000011161 development Methods 0.000 description 28
- 239000000975 dye Substances 0.000 description 27
- 239000000203 mixture Substances 0.000 description 27
- 238000002360 preparation method Methods 0.000 description 24
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 23
- 229910052782 aluminium Inorganic materials 0.000 description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 20
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 19
- 239000000126 substance Substances 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 239000002243 precursor Substances 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 17
- 239000003094 microcapsule Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 230000006870 function Effects 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 14
- 108010010803 Gelatin Proteins 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 229920000159 gelatin Polymers 0.000 description 13
- 235000019322 gelatine Nutrition 0.000 description 13
- 235000011852 gelatine desserts Nutrition 0.000 description 13
- 230000001235 sensitizing effect Effects 0.000 description 13
- 239000008273 gelatin Substances 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000003921 oil Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 239000011257 shell material Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000003505 polymerization initiator Substances 0.000 description 9
- 238000012719 thermal polymerization Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 238000007639 printing Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 230000001804 emulsifying effect Effects 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 230000008313 sensitization Effects 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011162 core material Substances 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 235000010980 cellulose Nutrition 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 150000003378 silver Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 150000004982 aromatic amines Chemical class 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000012943 hotmelt Substances 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 238000006479 redox reaction Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000006644 Lossen rearrangement reaction Methods 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 150000001241 acetals Chemical class 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000001768 carboxy methyl cellulose Substances 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- CZLCEPVHPYKDPJ-UHFFFAOYSA-N guanidine;2,2,2-trichloroacetic acid Chemical compound NC(N)=N.OC(=O)C(Cl)(Cl)Cl CZLCEPVHPYKDPJ-UHFFFAOYSA-N 0.000 description 2
- 150000002429 hydrazines Chemical class 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 125000005395 methacrylic acid group Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002667 nucleating agent Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- OTGNAAWKCGHEBE-UHFFFAOYSA-N (4-methyl-3-oxo-1-phenylpyrazolidin-4-yl)methyl octadecanoate Chemical compound N1C(=O)C(COC(=O)CCCCCCCCCCCCCCCCC)(C)CN1C1=CC=CC=C1 OTGNAAWKCGHEBE-UHFFFAOYSA-N 0.000 description 1
- OYJIGVHLPHCXPO-UHFFFAOYSA-N (4-methylphenyl)azanium;2,2,2-trichloroacetate Chemical compound OC(=O)C(Cl)(Cl)Cl.CC1=CC=C(N)C=C1 OYJIGVHLPHCXPO-UHFFFAOYSA-N 0.000 description 1
- NMIRPMWNPFPQAX-UHFFFAOYSA-N 1,1'-biphenyl;octanedioic acid Chemical compound C1=CC=CC=C1C1=CC=CC=C1.OC(=O)CCCCCCC(O)=O NMIRPMWNPFPQAX-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- SWEICGMKXPNXNU-UHFFFAOYSA-N 1,2-dihydroindazol-3-one Chemical compound C1=CC=C2C(O)=NNC2=C1 SWEICGMKXPNXNU-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
- SAUOAHBVCGWKSB-UHFFFAOYSA-N 1-hydroxy-n-methyl-n-octadecyl-4-(sulfonylamino)naphthalene-2-carboxamide Chemical compound C1=CC=CC2=C(O)C(C(=O)N(C)CCCCCCCCCCCCCCCCCC)=CC(N=S(=O)=O)=C21 SAUOAHBVCGWKSB-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- LMJAZOJVWXBFCA-UHFFFAOYSA-N 1-phenyl-2-(2,4,6-trichlorophenyl)hydrazine Chemical compound ClC1=CC(Cl)=CC(Cl)=C1NNC1=CC=CC=C1 LMJAZOJVWXBFCA-UHFFFAOYSA-N 0.000 description 1
- BRXZLTCODOTNSF-UHFFFAOYSA-N 1-phenyl-2-tritylhydrazine Chemical compound C=1C=CC=CC=1NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRXZLTCODOTNSF-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- JVVRJMXHNUAPHW-UHFFFAOYSA-N 1h-pyrazol-5-amine Chemical class NC=1C=CNN=1 JVVRJMXHNUAPHW-UHFFFAOYSA-N 0.000 description 1
- HBVFKUNWHXYJDZ-UHFFFAOYSA-N 2,2-dicyclohexyloxyethyl prop-2-enoate Chemical compound C1CCCCC1OC(COC(=O)C=C)OC1CCCCC1 HBVFKUNWHXYJDZ-UHFFFAOYSA-N 0.000 description 1
- HFFXLYHRNRKAPM-UHFFFAOYSA-N 2,4,5-trichloro-n-(5-methyl-1,2-oxazol-3-yl)benzenesulfonamide Chemical compound O1C(C)=CC(NS(=O)(=O)C=2C(=CC(Cl)=C(Cl)C=2)Cl)=N1 HFFXLYHRNRKAPM-UHFFFAOYSA-N 0.000 description 1
- RFCBVDDPAXRZCT-UHFFFAOYSA-N 2,4-dimethoxy-n'-tritylbenzohydrazide Chemical compound COC1=CC(OC)=CC=C1C(=O)NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 RFCBVDDPAXRZCT-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- IAONCYGNBVHNCT-UHFFFAOYSA-N 2-(4-chlorophenyl)sulfonylacetic acid Chemical compound OC(=O)CS(=O)(=O)C1=CC=C(Cl)C=C1 IAONCYGNBVHNCT-UHFFFAOYSA-N 0.000 description 1
- FIOWQSNWPFRUJF-UHFFFAOYSA-N 2-(4-methylsulfonylphenyl)sulfonylacetic acid Chemical compound CS(=O)(=O)C1=CC=C(S(=O)(=O)CC(O)=O)C=C1 FIOWQSNWPFRUJF-UHFFFAOYSA-N 0.000 description 1
- SQMDWSXUIQGTQV-UHFFFAOYSA-N 2-(benzenesulfonyl)acetate;carbamimidoylazanium Chemical compound NC(N)=N.OC(=O)CS(=O)(=O)C1=CC=CC=C1 SQMDWSXUIQGTQV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- BNCWNZSBTPDDME-UHFFFAOYSA-N 2-methylpyridine;2,2,2-trichloroacetic acid Chemical compound CC1=CC=CC=N1.OC(=O)C(Cl)(Cl)Cl BNCWNZSBTPDDME-UHFFFAOYSA-N 0.000 description 1
- IFTCIJGLDWOLSB-UHFFFAOYSA-N 2-pentadecylbenzene-1,4-diol Chemical compound CCCCCCCCCCCCCCCC1=CC(O)=CC=C1O IFTCIJGLDWOLSB-UHFFFAOYSA-N 0.000 description 1
- ROPDSOYFYJCSTC-UHFFFAOYSA-N 2-phenoxyundecyl prop-2-enoate Chemical compound CCCCCCCCCC(COC(=O)C=C)OC1=CC=CC=C1 ROPDSOYFYJCSTC-UHFFFAOYSA-N 0.000 description 1
- GKDOERFLZCLYEE-UHFFFAOYSA-N 3,5-dichloro-4-(2-tritylhydrazinyl)benzonitrile Chemical compound ClC1=CC(C#N)=CC(Cl)=C1NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 GKDOERFLZCLYEE-UHFFFAOYSA-N 0.000 description 1
- TZAHZVCLEPUPMM-UHFFFAOYSA-N 3,5-dichloro-n'-phenylbenzohydrazide Chemical compound ClC1=CC(Cl)=CC(C(=O)NNC=2C=CC=CC=2)=C1 TZAHZVCLEPUPMM-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- INDIALLCZKIHFF-UHFFFAOYSA-N 4-(diethylamino)phenol Chemical compound CCN(CC)C1=CC=C(O)C=C1 INDIALLCZKIHFF-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- USGNZHHNWYDCTC-UHFFFAOYSA-N 4-amino-1,4-dihydropyrazol-5-one Chemical class NC1C=NNC1=O USGNZHHNWYDCTC-UHFFFAOYSA-N 0.000 description 1
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical class NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- DQDSLTMFBAIDFX-UHFFFAOYSA-N 4-butoxy-n'-tritylbenzohydrazide Chemical compound C1=CC(OCCCC)=CC=C1C(=O)NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DQDSLTMFBAIDFX-UHFFFAOYSA-N 0.000 description 1
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- DUFPUPLYCLGLJA-UHFFFAOYSA-N 6-amino-5-hydroxy-1h-pyrimidin-4-one Chemical class NC=1N=CNC(=O)C=1O DUFPUPLYCLGLJA-UHFFFAOYSA-N 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 238000006237 Beckmann rearrangement reaction Methods 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- 101150108015 STR6 gene Proteins 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 241000221561 Ustilaginales Species 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000005210 alkyl ammonium group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229940051880 analgesics and antipyretics pyrazolones Drugs 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 235000013871 bee wax Nutrition 0.000 description 1
- 239000012166 beeswax Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical group 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- MSZJEPVVQWJCIF-UHFFFAOYSA-N butylazanide Chemical compound CCCC[NH-] MSZJEPVVQWJCIF-UHFFFAOYSA-N 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000001719 carbohydrate derivatives Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920001727 cellulose butyrate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- FCSHDIVRCWTZOX-DVTGEIKXSA-N clobetasol Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@H](C)[C@@](C(=O)CCl)(O)[C@@]1(C)C[C@@H]2O FCSHDIVRCWTZOX-DVTGEIKXSA-N 0.000 description 1
- 238000005354 coacervation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- MQRJBSHKWOFOGF-UHFFFAOYSA-L disodium;carbonate;hydrate Chemical compound O.[Na+].[Na+].[O-]C([O-])=O MQRJBSHKWOFOGF-UHFFFAOYSA-L 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002255 enzymatic effect Effects 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 1
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 1
- DDIZAANNODHTRB-UHFFFAOYSA-N methyl p-anisate Chemical compound COC(=O)C1=CC=C(OC)C=C1 DDIZAANNODHTRB-UHFFFAOYSA-N 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- CLWJIABBMNILFU-UHFFFAOYSA-N morpholine;2,2,2-trichloroacetic acid Chemical compound C1COCC[NH2+]1.[O-]C(=O)C(Cl)(Cl)Cl CLWJIABBMNILFU-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- UICBCXONCUFSOI-UHFFFAOYSA-N n'-phenylacetohydrazide Chemical compound CC(=O)NNC1=CC=CC=C1 UICBCXONCUFSOI-UHFFFAOYSA-N 0.000 description 1
- ZRXQVPNQFXWNAQ-UHFFFAOYSA-N n'-tritylbenzohydrazide Chemical compound C=1C=CC=CC=1C(=O)NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 ZRXQVPNQFXWNAQ-UHFFFAOYSA-N 0.000 description 1
- QZMGSMQGSPJCGG-UHFFFAOYSA-N n'-tritylnaphthalene-1-carbohydrazide Chemical compound C=1C=CC2=CC=CC=C2C=1C(=O)NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 QZMGSMQGSPJCGG-UHFFFAOYSA-N 0.000 description 1
- UBHBGMUJIQQMDW-UHFFFAOYSA-N n,n-dibutyl-4-[(tritylamino)carbamoyl]benzamide Chemical compound C1=CC(C(=O)N(CCCC)CCCC)=CC=C1C(=O)NNC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 UBHBGMUJIQQMDW-UHFFFAOYSA-N 0.000 description 1
- ZPOCZBLVSDSHKM-UHFFFAOYSA-N n-(5-tert-butyl-4-hexadecoxy-2-hydroxyphenyl)benzenesulfonamide Chemical compound C1=C(C(C)(C)C)C(OCCCCCCCCCCCCCCCC)=CC(O)=C1NS(=O)(=O)C1=CC=CC=C1 ZPOCZBLVSDSHKM-UHFFFAOYSA-N 0.000 description 1
- OXHFWUJQBSYQKN-UHFFFAOYSA-N n-[5-hexadecoxy-2-hydroxy-4-(2,4,4-trimethylpentan-2-yl)phenyl]benzenesulfonamide Chemical compound C1=C(C(C)(C)CC(C)(C)C)C(OCCCCCCCCCCCCCCCC)=CC(NS(=O)(=O)C=2C=CC=CC=2)=C1O OXHFWUJQBSYQKN-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 235000012149 noodles Nutrition 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000004989 p-phenylenediamines Chemical class 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical group 0.000 description 1
- YHSKUYNZQAYMPP-UHFFFAOYSA-N piperidine;2,2,2-trichloroacetic acid Chemical compound C1CC[NH2+]CC1.[O-]C(=O)C(Cl)(Cl)Cl YHSKUYNZQAYMPP-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical group C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000002601 radiography Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940001593 sodium carbonate Drugs 0.000 description 1
- 229940076133 sodium carbonate monohydrate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- KFZUDNZQQCWGKF-UHFFFAOYSA-M sodium;4-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=C(S([O-])=O)C=C1 KFZUDNZQQCWGKF-UHFFFAOYSA-M 0.000 description 1
- RLEBKHAOAHYZHT-UHFFFAOYSA-M sodium;pyridine-2-carboxylate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=N1 RLEBKHAOAHYZHT-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 229940032147 starch Drugs 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ZJHHPAUQMCHPRB-UHFFFAOYSA-N urea urea Chemical compound NC(N)=O.NC(N)=O ZJHHPAUQMCHPRB-UHFFFAOYSA-N 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/0285—Silver salts, e.g. a latent silver salt image
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Definitions
- the present invention relates to a light-sensitive material comprising a light-sensitive layer containing a light-sensitive silver halide, a reducing agent and a polymerizable compound provided on a support.
- Light-sensitive materials comprising a light-sensitive layer containing silver halide, a reducing agent and a polymerizable compound provided on a support can be used in an image forming method in which a latent image of silver halide is formed, and then the polymerizable compound is polymerized to form the corresponding image.
- a recording material i.e., light-sensitive material
- a light-sensitive layer containing a light-sensitive silver salt (i.e., silver halide), a reducing agent, a cross-linkable compound (i.e., polymerizable compound) and a binder provided on a support
- a cross-linkable compound i.e., polymerizable compound
- a binder provided on a support
- the above method employing the dry process and the light-sensitive material employable for such method are also described in Japanese Patent Provisional Publications Nos. 61(1986)-183640, 61(1986)-188535 and 61(1986)-228441.
- the above-mentioned image forming methods are based on the principle in which the polymerizable compound is polymerized in the portion where a latent image of the silver halide has been formed.
- Japanese Patent Provisional Publication No. 61(1986)-260241 describes another image forming method in which the polymerizable compound in a portion where a latent image of the silver halide has not been formed is polymerized.
- the reducing agent functions as polymerization inhibitor in the portion where a latent image of the silver halide has been formed, and the polymerizable compound in the other portion is polymerized.
- a polymer image of the polymerizable compound can be easily obtained on the light-sensitive material by utilizing high sensitivity of the photo-sensitive silver halide.
- PS plate Various presensitized lithographic plates (referred to hereinafter as PS plate) are proposed in Japanese Provisional Publications Nos. 57(1982)-211146 and 58(1983)-16231.
- PS plates employ a wet development process using a developing solution to prepare a lithographic plate, whereby the obtained image is apt to swell.
- An object of the present invention is to provide a light-sensitive material which can give an image relief (relief of an image) having high hardness.
- Another object of the invention is to provide a light-sensitive material which is favorablly used as a presensitized lithographic plate (PS plate).
- PS plate presensitized lithographic plate
- a light-sensitive material comprising a light-sensitive layer containing a light-sensitive silver halide, a reducing agent and a polymerizable compound provided on a hydrophilic support, wherein the light-sensitive layer contains a polymer binder having an ethylenic unsaturated double bonding group in its side chain.
- the light-sensitive material of the present invention comprises a light-sensitive layer containing a polymer binder having an ethylenic unsaturated double bonding group at its side chain, which is capable of participating in a cross-linking reaction. Accordingly, a polymer image (which may be in the form of an image relief) having high hardness can be formed by the image forming method.
- the polymer binder can form a cross-linked three-dimensional network structure together with the polymerizable compound through addition polymerization reaction after exposure to light or development following the exposure. Therefore, a polymer image (or image relief) having improved high hardness (i.e., high strength) can be obtained as compared with a polymer image (or image relief) which is formed by simple polymerization of the polymerizable compound. Accordingly, a clear image can be obtained.
- the light-sensitive material of the present invention when employed as a lithographic plate, resistance of the image relief to plate wear is improved. Further, when the light-sensitive material of the invention is employed as a lithographic plate and the heat development (i.e., dry development) is adopted, the obtained polymer image is hardly swelled. Furthermore, after the heat development, the strength of the image relief does not decrease even if a wet process is used to obtain the image relief.
- the heat development i.e., dry development
- a binder which is employed for the light-sensitive material of the invention is a polymer having an ethylenic unsaturated double bonding group in its side chain.
- copolymer of allyl (meth)acrylate and other monomer copolymerizable with the (meth)acrylate such as monohydroxyalkyl (meth)acrylate, polyethyleneglycol mono(meth)acrylate, polypropyleneglycol mono(meth)acrylate or an alkali metal salt of (meth)acrylic acid;
- (9) copolymer of vinyl (meth)acrylate and other monomer copolymerizable with the (meth)acrylate such as monohydroxyalkyl (meth)acrylate, polyethyleneglycol mono(meth)acrylate, polypropyleneglycol mono(meth)acrylate or an alkali metal salt of (meth)acrylic acid; and
- the above polymers can be used singly or in combination.
- the allyl (meth)acrylate copolymer and vinyl (meth)acrylate copolymer are preferred.
- the molecular weight of the binder polymer generally is in the range of from 10,000 to 500,000.
- the binder can be incorporated at a stage of the preparation of a light-sensitive composition comprising the later-described silver halide emulsion, reducing agent and polymerizable compound, or can be added to a coating solution for the preparation of a light-sensitive layer, in consideration of nature of the binder such as easiness of forming of an emulsion.
- the binder is preferably contained in an amount of 5 to 70 weight % based on the content of material constituting the light-sensitive layer, and more preferably 10 to 50 weight %.
- the silver halide, reducing agent, polymerizable compound and support which constitute the light-sensitive material of the invention are described below.
- the light-sensitive material is advantageously employable as a presensitized lithographic plate (PS plate). Accordingly, the light-sensitive material of the invention are described hereinbelow by referring to the case that the light-sensitive material is employed as the PS plate.
- PS plate presensitized lithographic plate
- the ligh-sensitive silver halide contained in the light-sensitive layer of the PS plate there is no specific limitation with respect to the ligh-sensitive silver halide contained in the light-sensitive layer of the PS plate.
- the silver halides include as silver chloride, silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver iodobromide, and silver chloroiodobromide in the form of grains.
- the halogen composition of individual grains may be homogeneous or heterogeneous.
- the heterogeneous grains having a multilayered structure in which the halogen composition varies from the core to the outer shell see Japanese Patent Provisional Publications Nos. 57(1982)-154232, 58(1983)-108533, 59(1984)-48755 and 59(1984)-52237, U.S. Pat. No. 4,433,048, and European Patent No. 100,984) can be employed.
- a silver halide grain having a core/shell structure in which the silver iodide content in the shell is higher than that in the core can be also employed.
- a tubular grain having an aspect ratio of not less than 3 can be used.
- the silver halide grains preferably have such a relatively low tendency to be fogged that the amount of developed silver is not more than 5 weight % based on the total amount of silver when the unexposed silver halide grains are developed in 1 l of an aqueous developing solution containing 1.0 g of metol, 15.0 g of sodium sulfite, 4.0 g of hydroquinone, 26.7 g of sodium carbonate monohydrate and 0.7 g of potassium bromide.
- Two or more kinds of silver halide grains which differ in halogen composition, crystal habit, grain size, and/or other features from each other can be used in combination.
- silver halide grains having such a grain size distribution that the coefficient of the variation is not more than 20% can be employed.
- the silver halide grains ordinarily have a mean size of 0.001 to 5 ⁇ m, more preferably 0.001 to 2 ⁇ m.
- the total silver content (including silver halide and an organic silver salt which is one of optional components) in the light-sensitive layer preferably is in the range of from 0.1 mg/m 2 to 10 g/m 2 .
- the silver content of the silver halide in the light-sensitive layer preferably is not more than 1 g/m 2 , more preferably in the range of from 1 mg to 500 mg/m 2 .
- the reducing agent employed in the PS plate has a function of reducing the silver halide and/or a function of accelerating or restraining a polymerization of the polymerizable compound.
- the reducing agents having these functions include various compounds, such as hydroquinones, catechols, p-aminophenols, p-phenylenediamines, 3-pyrazolidones, 3-aminopyrazoles, 4-amino-5-pyrazolones, 5-aminouracils, 4,5-dihydroxy-6-aminopyrimidines, reductones, aminoreductones, o- or p-sulfonamidophenols, o- or p-sulfonamidonaphthols, 2-sulfonamidoindanones, 4-sulfonamido-5-pyrazolones, 3-sulfonamidoindoles, sulfonamidopyrazolobenzimidazoles, sulfonamidopyra
- the polymerizable compound within either the area where a latent image of the silver halide has been formed or the area where a latent image of the silver halide has not been formed can be polymerized.
- 1-phenyl-3-pyrazolidone is preferably employed as the reducing agent.
- the PS plates employing the reducing agent which has these functions are described in Japanese Patent Provisional Publications Nos. 61(1986)-183640, 61(1986)-188535 and 61(1986)-228441. These reducing agents are also stated in T. James, "The Theory of the Photographic Process", 4th edition, pp. 291-334 (1977), Research Disclosure No. 17029, pp. 9-15 (June 1978), and Research Disclosure No. 17643, pp. 22-31 (Dec. 1978).
- the reducing agents described in the these publications can be employed in the PS plate of the present invention.
- "reducing agent(s)" in the present specification means to include all of the reducing agents described in the above-mentioned publications and applications.
- reducing agents can be used singly or in combination.
- a hydroquinone-type reducing agent as one reducing agent.
- certain interactions between these reducing agents can be expected.
- One of the interactions is for acceleration of reduction of silver halide (and/or an organic silver salt) through so-called superadditivity.
- Other interaction is for a chain reaction in which an oxidized state of one reducing agent formed by a reduction of silver halide (and/or an organic silver salt) induces or inhibits the polymerization of the polymerizable compound via oxidation-reduction reaction with other reducing agent. Both interactions may occur simultaneously. Thus, it is difficult to determine which of the interactions has occurred in practical use.
- Examples of these reducing agents include pentadecylhydroquinone, 5-t-butylcatechol, p-(N,N-diethylamino)phenol, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-heptadecylcarbonyloxymethyl-3-pyrazolidone, 2-phenylsulfonylamino-4-hexadecyloxy-5-t-octylphenol, 2-phenylsulfonylamino-4-t-butyl-5-hexadecyloxyphenol, 2-(N-butylcarbamoyl)-4-phenylsulfonylaminonaphtol, 2-(N-methyl-N-octadecylcarbamoyl)-4-sulfonylaminonaphthol, 1-acetyl-2-phenylhydrazine, 1-acetyl-2-(p- or
- the amount of the reducing agent in the light-sensitive layer preferably ranges from 0.1 to 1,500 mole % based on the amount of silver (contained in the above-mentioned silver halide and an organic silver salt).
- the polymerizable compound has an ethylenic unsaturated group.
- heat development i.e., thermal development
- the polymerizable compounds having a relatively higher boiling point e.g. 80° C. or higher
- the polymerizable compound employable for the PS plate are described in the above-mentioned and later-mentioned publications concerning the light-sensitive material.
- Examples of the compounds having an ethylenic unsaturated group include acrylic acid, salts of acrylic acid, acrylic esters, acrylamides, methacrylic acid, salts of methacrylic acid, methacrylic esters, methacrylamide, maleic anhydride, maleic esters, itaconic esters, styrene, styrene derivatives, vinyl ethers, vinyl esters, N-vinyl heterocyclic compounds, allyl ethers, allyl esters, and compounds carrying a group or groups corresponding to one or more of these compounds.
- a light-sensitive layer consisting of a lipophilic continuous phase which is the preferred embodiment of the invention
- the compounds reduced in hydrophilic property are preferred.
- acrylic esters include n-butyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate, benzyl acrylate, furfuryl acrylate, ethoxyethoxy acrylate, dicyclohexyloxyethyl acrylate, nonylphenyloxyethyl acrylate, hexanediol diacrylate, butanediol diacrylate, neopentylglycol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, diacrylate of polyoxyethylenated bisphenol A, polyacrylate of hydroxypolyether, polyester acrylate, and polyurethane acrylate.
- methacrylic esters examples include methyl methacrylate, butyl methacrylate, ethylene glycol dimethacrylate, butanediol dimethacrylate, neopentylglycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, and dimethacrylate of polyoxyalkylenated bisphenol A.
- the polymerizable compounds can be used singly or in combination of two or more compounds. For example, a mixture of two or more polymerizable compounds can be employed. Further, compounds formed by bonding a polymerizable group such as a vinyl group or a vinylidene group to a reducing agent or a color image forming substance are also employed as the polymerizable compounds.
- the PS plates employing these compounds which show functions as both the reducing agent and the polymerizable compound, or of the color image forming substance and the polymerizable compound are included in embodiments of the invention.
- the amount of the polymerizable compound for incorporation into the light-sensitive layer preferably ranges from 5 to 1.2 ⁇ 10 5 times (by weight) as much as the amount of silver halide, more preferably from 10 to 1 ⁇ 10 4 times as much as the silver halide.
- the PS plate of the invention can be prepared by arranging a light-sensitive layer containing the above-mentioned components on a support.
- the support there is no specific limitation with respect to the support, so long as it has a stability.
- support materials include paper, synthetic paper, plastic-laminated paper (e.g., polyethylene, polypropylene or polystyrene laminated paper), metallic sheets (e.g., zinc, iron or copper sheet), plastic film such as a film of cellulose acetate, cellulose propionate, cellulose butyrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate or polyvinyl acetal, and the metal laminated or deposited paper or plastic film.
- Paper, synthetic paper, polyethylene-terephthalate film, polycarbonate film and aluminum sheet are preferred.
- the paper support is described in more detail in Japanese Patent Provisional Publications Nos. 61(1986)-3797 and 61(1986)-112150.
- the surface of the support may be processed.
- the support may be subjected to a surface-roughing treatment (graining treatment) or a treatment for making the surface hydrophilic.
- Examples of methods for surface treatment include an electrochemical graining method wherein an aluminum sheet is grained in a hydrochloric acid or nitric acid electrolytic solution by applying an electric current thereto; and mechanical graining methods such as a wire brush grain method wherein the surface of an aluminum sheet is scratched with a metal wire, a ball grain method wherein the surface of an aluminum sheet is grained with an abrasive and an abrasive ball and a brush grain method wherein the surface of an aluminum sheet is grained with a nylon brush and an abrasive.
- Such methods can be used singly or in combination.
- the grained aluminum sheet is then etched chemically with an acid or an alkali.
- An industrially advantageous method is etching with an alkali.
- the alkaline agents include sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, sodium hydroxide, potassium hydroxide and lithium hydroxide.
- the concentration of the alkaline agent in an alkaline solution is in the range of preferably from 1 to 50 weight %.
- the alkaline solution is preferably used at a temperature of 20° C. to 100° C. There are preferred such conditions under which the amount of the aluminum sheet to be dissolved is 5 to 20 g/m 2 .
- pickling is carried out to remove smuts which are left behind on the surface of the aluminum sheet.
- acid used in the pickling include nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, borofluoric acid, etc.
- Removal of smut after the electrochemical surface-roughing treatment can be effected by a method wherein the aluminum sheet is brought into contact with a 15 to 65 weight % sulfuric acid solution at a temperature of from 50° C. to 90° C., as described in Japanese Patent Provisional Publication No. 53(1978)-12739 or a method described in Japanese Patent Publication No. 48(1973)-28123.
- an aluminum support whose surface has been roughened can be obtained.
- the aluminum support can be further subjected to an anodic oxidation treatment or a chemical treatment.
- the anodic oxidation treatment may be carried out by any of conventional methods.
- the anodic oxidation treatment can be made by a method wherein direct current or an alternating current is applied to aluminum in sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid or benzenesulfonic acid, a solution composed of a combination of two or more of these acids, an aqueous solution of one of said acids or an aqueous solution containing a combination of two or more of these acids to form an oxide film on anode on the surface of the aluminum support.
- Process conditions for the anodic oxidation varies depending on the type of the electrolytic solution to be used, but are generally such that the concentration of the electrolytic solution is from 1 to 80 weight %, the temperature of the electrolytic solution is from 5° C. to 70° C., current density is from 0.5 to 60 A/dm 2 , voltage is 1 to 100 V and the period of time for the electrolytic process is from 10 to 100 seconds.
- anodic oxidation method there are particularly preferred a method wherein anodic oxidation is carried out in sulfuric acid at a high current density, as described in British Patent No. 1,412,768 and a method wherein anodic oxidation is carried out by using an electrolytic bath as phosphoric acid, as described in U.S. Pat. No. 3,511,661.
- the anodic oxidation-treated aluminum sheet may be further subjected to an alkali metal silicate treatment (for instance, a treatment wherein the sheet is immersed in an aqueous solution of sodium silicate) as described in U.S. Pat. Nos. 2,714,066 and 3,181,461.
- an undercoat layer composed of a hydrophilic cellulose (e.g., carboxymethylcellulose) containing a water-soluble salt (e.g., zinc acetate) may be provided on the treated aluminum sheet as described in U.S. Pat. No. 3,806,426.
- PS plates optional components which may be contained in the light-sensitive layer, and auxiliary layers which may be optionally arranged on the PS plates are described below.
- the light-sensitive layer can further contain optional components such as color image forming substances, sensitizing dyes, organic silver salts, radical generators, various kinds of image formation accelerators, thermal polymerization inhibitors, thermal polymerization initiators, development stopping agents, fluorescent brightening agents, discoloration inhibitors, antihalation dyes or pigments, antiirradiation dyes or pigments, matting agents, antismudging agents, plasticizers, water releasers, binders, photo polymerization initiator, solvent of the polymerizable compound and water soluble vinyl polymers.
- image formation accelerators thermal polymerization inhibitors, thermal polymerization initiators, development stopping agents, fluorescent brightening agents, discoloration inhibitors, antihalation dyes or pigments, antiirradiation dyes or pigments, matting agents, antismudging agents, plasticizers, water releasers, binders, photo polymerization initiator, solvent of the polymerizable compound and water soluble vinyl polymers.
- the color image forming substance includes both colored substance (i.e., dyes and pigments) and non-colored or almost non-colored substance (i.e., color former or dye- or pigment-precursor) which develops to give a color under application of external energy (e.g., heating, pressing, light irradiation, etc.) or by contact with other components (i.e., developer).
- external energy e.g., heating, pressing, light irradiation, etc.
- other components i.e., developer.
- the light-sensitive material using the color image forming substance is described in Japanese Patent Provisional Publication No. 61(1986)-73145 (corresponding to U.S. Pat. No. 4,629,676 and European Patent Published Specification No. 0174634A2), and the color image forming substance can be employed for the PS plate of the invention.
- sensitizing dyes there is no specific limitation with respect to the sensitizing dyes, and known sensitizing dyes used in the conventional art of photography may be employed in the PS plates.
- the sensitizing dyes include methine dyes, cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes, and hemioxonol dyes. These sensitizing dyes can be used singly or in combination. Combinations of sensitizing dyes are often used for the purpose of supersensitization.
- a substance which does not per se exhibit spectral sensitization effect or does not substantially absorb visible light but shows supersensitizing activity can be used.
- the amount of the sensitizing dye to be added generally ranges from about 10 -8 to about 10 -2 mol. per 1 mol. of silver halide.
- the sensitizing dye is preferably added in the stage of the preparation of the silver halide emulsion (simultaneously with or after the grain formation).
- an organic silver salt is preferably contained in the PS plate. It can be assumed that the organic silver salt takes part in a redox reaction using a silver halide latent image as a catalyst when heated to a temperature of 80° C. or higher. In such case, the silver halide and the organic silver salt preferably are located in contact with each other or close together.
- organic compounds employable for forming the organic silver salt include aliphatic or aromatic carboxylic acids, thiocarbonyl group-containing compounds having a mercapto group or an ⁇ -hydrogen atom, imino group-containing compounds, and the like. Benzotriazoles are most preferable.
- the organic silver salt is preferably used in an amount of from 0.01 to 10 mol., and more preferably from 0.01 to 1 mol., per 1 mol. of the light-sensitive silver halide.
- an organic compound e.g., benzotriazole
- benzotriazole which can form an organic silver salt in combination with an inorganic silver salt can be added to the light-sensitive layer to obtain the same effect.
- radical generators examples include triazene-silver, silver diazotate and an azo compound.
- the image formation accelerators have a function to accelerate the oxidation-reduction reaction between a silver halide (and/or an organic silver salt) and a reducing agent, a function to accelerate emigration of an image forming substance from a light-sensitive layer to an image-receiving material or an image-receiving layer, or a similar function.
- the image formation accelerators can be classified into inoragnic bases, organic bases, base precursors, oils, surface active agents, compounds functioning as an antifogging agent and/or a development accelerator, hot-melt solvents, antioxidants and the like. These groups, however, generally have certain combined functions, i.e., two or more of the above-mentioned effects. Thus, the above classification is for the sake of convenience, and one compound often has a plurality of functions combined.
- Preferred examples of the inorganic bases include hydroxides of alkali metals or alkaline earth metals; secondary or tertiary phosphates, borates, carbonates, quinolinates and metaborates of alkali metals or alkaline earth metals; a combination of zinc hydroxide or zinc oxide and a chelating agent (e.g., sodium picolinate); ammonium hydroxide; hydroxides of quaternary alkylammoniums; and hydroxides of other metals.
- a chelating agent e.g., sodium picolinate
- organic bases include aliphatic amines (e.g., trialkylamines, hydroxylamines and aliphatic polyamines); aromatic amines (e.g., N-alkyl-substituted aromatic amines, N-hydroxylalkyl-substituted aromatic amines and bis[p-(dialkylamino)phenyl]-methanes), heterocyclic amines, amidines, cyclic amidines, guanidines, and cyclic guanidines. Of these bases, those having a pKa of 7 or more are preferred.
- aromatic amines e.g., N-alkyl-substituted aromatic amines, N-hydroxylalkyl-substituted aromatic amines and bis[p-(dialkylamino)phenyl]-methanes
- heterocyclic amines amidines, cyclic amidines, guanidines, and cyclic guanidines.
- the base precursors preferably are those capable of releasing bases upon reaction by heating, such as salts between bases and organic acids capable of decarboxylation by heating, compounds capable of releasing amines through intramolecular nucleophilic substitution, Lossen rearrangement, or Beckmann rearrangement, and the like; and those capable of releasing bases by electrolysis.
- Preferred examples of the base precursors include guanidine trichloroacetate, piperidine trichloroacetate, morpholine trichloroacetate, p-toluidine trichloroacetate, 2-picoline trichloroacetate, guanidine phenylsulfonylacetate, guanidine 4-chlorophenylsulfonylacetate, guanidine 4-methyl-sulfonylphenylsulfonylacetate, and 4-acetylaminomethyl propionate.
- bases or base precursors are preferably used in an amount of not more than 100 weight %, and more preferably from 0.1 to 40 weight %, based on the total solid content of the light-sensitive layer. These bases or base precursors can be used singly or in combination.
- the silver halide, the reducing agent and the polymerizable compound are preferably contained in a microcapsule and the base or base precursor is prefarably arranged outside of the microcapsule in the light-sensitive layer.
- the base or base precursor can be contained in a different microcapsule from that containing the polymerizable compound.
- the base or base precursor can be contained in the microcapsule under condition that the base or base precursor is dissolved or dispersed in an aqueous solution of a water retention agent, or under condition that the base or base precursor is adsorbed on solid particles.
- the base or base precursor can be contained in a layer different from the light-sensitive layer.
- oils employable in the invention include high-boiling organic solvents which are used as solvents in emulsifying and dispersing hydrophobic compounds.
- Examples of the surface active agents employable in the invention include pyridinium salts, ammonium salts and phosphonium salts as described in Japanese Patent Provisional Publication No. 59(1984)-74547; polyalkylene oxides as described in Japanese Patent Provisional Publication No. 59(1984)-57231.
- the compounds functioning as an antifogging agent and/or a development accelerator are used to give a clear image having a clear image part and a clear non-image part.
- the compounds include a 5- or 6-membered nitrogen containing heterocyclic compound (e.g., a cyclic amide compound), a thiourea derivative, a thioether compound, a polyethylene glycol derivative, a thiol derivative, an acetylene compound and a sulfonamide derivative.
- the hot-melt solvents preferably are compounds which may be used as solvent of the reducing agent or those which have high dielectric constant and can accelerate physical development of silver salts.
- the hot-melt solvents include polyethylene glycols, derivatives of polyethylene oxides (e.g., oleate ester), beeswax, monostearin and high dielectric constant compounds having --SO 2 -- and/or --CO-- group described in U.S. Pat. No. 3,347,675; polar compounds described in U.S. Pat. No. 3,667,959; and 1,10-decanediol, methyl anisate and biphenyl suberate described in Research Disclosure pp. 26-28 (Dec. 1976).
- the antioxidants can be used to eliminate the influence of the oxygen which has an effect of inhibiting polymerization in the development process.
- An example of the antioxidant is a compound having two or more mercapto groups.
- the thermal polymerization initiators employable in the PS plate preferably are compounds that are decomposable under heating to generate a polymerization initiating species, particularly a radical, and those commonly used as initiators of radical polymerization.
- the thermal polymerization initiators are described in "Addition Polymerization and Ring Opening Polymerization", pp. 6-18, edited by the Editorial Committee of High Polymer Experimental Study of the High Polymer Institute, published by Kyoritsu Shuppan (1983).
- thermal polymerization initiators examples include azo compounds, e.g., azobisisobutyronitrile, 1,1'-azobis(1-cyclohexanecarbonitrile), dimethyl 2,2'-azobisisobutyrate, 2,2'-azobis(2-methylbutyronitrile), and azobisdimethylvaleronitrile; organic peroxides, e.g., benzoyl peroxide, di-tert-butyl peroxide, dicumyl peroxide, tert-butyl hydroperoxide, and cumene hydroperoxide; inorganic peroxides, e.g., hydrogen peroxide, potassium persulfate, and ammonium persulfate; and sodium p-toluenesulfinate.
- azo compounds e.g., azobisisobutyronitrile, 1,1'-azobis(1-cyclohexanecarbonitrile), dimethyl 2,2'-azobisisobut
- the thermal polymerization initiators are preferably used in an amount of from 0.1 to 120 weight %, and more preferably from 1 to 10 weight %, based on amount of the polymerizable compound.
- the thermal polymerization initiators are preferably incorporated into the light-sensitive layer.
- the light-sensitive material using the thermal polymerization initiators is described in Japanese Patent Provisional Publication No. 61(1986)-260241, and the thermal polymerization initiator can be employed for the PS plate of the invention.
- the development stopping agents employable in the PS plate are compounds that neutralize a base or react with a base to reduce the base concentration in the layer to thereby stop development, or compounds that mutually react with silver or a silver salt to suppress development. More specifically, examples of the development stopping agents include acid precursors capable of releasing acids upon heating electrophilic compounds capable of undergoing substitution reaction with a coexisting base upon heating, nitrogen-containing heterocyclic compounds, mercapto compounds, and the like. Examples of the acid precursors include oxide esters described in Japanese Patent Provisional Publication Nos. 60(1985)-108837 and 60(1985)-192939 and compounds which release acids through Lossen rearrangement stated in Japanese Patent Provisional Publication No. 60(1985)-230133. Examples of the electrophilic compounds which induce substitution reaction with bases upon heating are described in Japanese Patent Provisional Publication No. 60(1985)-230134.
- the dyes or pigments can be contained in the light-sensitive layer for the purpose of anti-halation or anti-irradiation.
- the dyes having a property of being decolorized when it is heated or irradiated with light can be used in the light-sensitive material as a yellow filter layer in a conventional silver salt photographic system.
- the antismudging agents employable in the PS plate preferably are particles which are solid at ambient temperatures.
- examples of the antismudging agents include starch particles described in U.K. Patent No. 1,232,347; polymer particles described in U.S. Pat. No. 3,625,736; microcapsule particles containing no color former stated in U.K. Patent No. 1,235,991; and cellulose particles, and inorganic particles, such as particles of talc, kaolin, bentonite, agalmatolite, zinc oxide, titanium dioxide or aluminum oxide described in U.S. Pat. No. 2,711,375.
- Such particles preferably have a mean size of 3 to 50 ⁇ m, more preferably 5 to 40 ⁇ m. The size of said particle is preferably larger than that of the microcapsule.
- the polymers are preferably adsorbed on the silver halide grains.
- the light-sensitive layer preferably has a pH value of not more than 7.
- auxiliary layers which are optionally arranged on the PS plate include an image-receiving layer, a heating layer, an antistatic layer, an anticurl layer, a release layer, a cover sheet or a protective layer, a layer containing a base or base precursor, and a base barrier layer.
- the PS plate can be prepared, for instance, by the following process.
- the PS plate is usually prepared by dissolving, emulsifying or dispersing each of the components of the light-sensitive layer in an adequate medium to obtain coating solution, and then coating the obtained coating solution on a support.
- the coating solution can be prepared by mixing liquid compositions each containing a component of the light-sensitive layer.
- a liquid composition containing two or more components can be used in the preparation of the coating solution. Some components of the light-sensitive layer can be directly added to the coating solution or the liquid composition.
- a secondary composition can be prepared by emulsifying an oily (or an aqueous) composition in an aqueous (or an oily) medium to obtain the coating solution.
- the silver halide is preferably prepared in the form of a silver halide emulsion.
- Various processes for the preparation of the silver halide emulsion are known in the conventional technology for the preparation of photographic materials.
- the silver halide emulsion can be prepared by the acid process, neutral process or ammonia process.
- a soluble silver salt and a halogen salt can be reacted in accordance with the single jet process, double jet process or a combination thereof.
- a reverse mixing method in which grains are formed in the presence of excess silver ions, or a controlled double jet process, in which a pAg value is maintained constant, can be also employed.
- concentrations or amounts or the silver salt and halogen salt to be added or the rate of their addition can be increased as described in Japanese Patent Provisional Publication Nos. 55(1980)-142329 and 55(1980)-158124, and U.S. Pat. No. 3,650,757, etc.
- the silver halide emulsion may be of a surface latent image type that forms a latent image predominantly on the surface of silver halide grains, or of an inner latent image type that forms a latent image predominantly in the interior of the grains.
- a direct reversal emulsion comprising an inner latent image type emulsion and a nucleating agent may be employed.
- the inner latent image type emulsion suitable for this purpose is described in U.S. Pat. Nos. 2,592,250 and 3,761,276, Japanese Patent Publication No. 58(1983)-3534 and Japanese Patent Provisional Publication No. 57(1982)-136641, etc.
- nucleating agent that is preferably used in combination with the inner latent image type emulsion is described in U.S. Pat. Nos. 3,227,552, 4,245,037, 4,255,511, 4,266,013 and 4,276,364, and West German Patent Provisional Publication (OLS) No. 2,635,316.
- hydrophilic colloids are advantageously used as protective colloids.
- the hydrophilic colloids include proteins, e.g., gelatin, gelatin derivatives, gelatin grafted with other polymers, albumin, and casein; cellulose derivatives, e.g., hydroxyethyl cellulose, carboxymethyl cellulose, cellulose sulfate, etc.; saccharide derivatives, e.g., sodium alginate and starch derivative; and a wide variety of synthetic hydrophilic polymers, such as polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, and polyvinylpyrazole, and copolymers comprising monomers constituting these homopolymers.
- gelatin is most preferred.
- employable gelatins include not only lime-processed gelatin, but also acid-processed gelatin and enzyme-processed gelatin. Hydrolysis products or enzymatic decomposition products of gelatin can also be used.
- ammonia an organic thioether derivative as described in Japanese Patent Publication No. 47(1972)-11386 or sulfur-containing compound as described in Japanese Patent Provisional Publication No. 53(1978)-144319 can be used as a silver halide solvent.
- a cadmium salt, a zinc salt, a lead salt, a thallium salt, or the like can be introduced into the reaction system.
- a water-soluble iridium salt e.g., iridium (III) or (IV) chloride, or ammonium hexachloroiridate, or a water-soluble rhodium salt, e.g., rhodium chloride can be used.
- soluble salts may be removed from the resulting emulsion by a known noodle washing method or a sedimentation method.
- the silver halide emulsion may be used in the primitive condition, but is usually subjected to chemical sensitization. Chemical sensitization can be carried out by the sulfur sensitization, reduction sensitization or noble metal sensitization, or a combination thereof that are known for emulsions for the preparation of the conventional light-sensitive materials, and these methods can be employed for the PS plate of the invention.
- the sensitizing dyes When the sensitizing dyes are added to the silver halide emulsion, the sensitizing dye is preferably added in the course of the preparation of the emulsion.
- the organic silver salts When the organic silver salts are introduced into the light-sensitive microcapsule, the emulsion of the organic silver salts can be prepared in the same manner as in the preparation of the silver halide emulsion.
- the polymerizable compounds are used as the medium for preparation of the liquid composition containing another component of the light-sensitive layer.
- the silver halide including the silver halide emulsion
- the polymer binder having a cross-linkable double bonding group at side chain and the reducing agent can be dissolved, emulsified or dispersed in the polymerizable compound to prepare the PS plate.
- the color image forming substance is preferably incorporated into the polymerizable compound.
- the polymer binder is preferably added to the polymerizable compound together with an organic solvent.
- the organic solvent having a low solubility of water is preferred in order to form a lipophilic continuous phase containing silver halide emulsion.
- the solvents include esters such as ethyl acetate, n-propyl acetate, butyl acetate and ethyl propionate; ketones such as methylisobutyl ketone, diethyl ketone and diisobutyl ketone; ethers such as dichloroethyl ether, isopropyl ether and anisole; hydrocarbon halides such as methylene chloride, ethylene chloride and trichloro ethane.
- the polymer binder of the present invention may be added to a solution containing the polymerizable compound before emulsifying and dispersing the silver halide, or added to a coating solution for preparation of the light-sensitive layer after emulsifying or dispersing the silver halide emulsion in consideration of the suitability such as the emulsifying condition depending on the kinds of binders.
- the necessary components for preparation of a microcapsule, such as shell material can be incorporated into the polymerizable compound.
- the silver halide is contained in the oil droplets of the polymerizable compound which are dispersed in the light-sensitive layer.
- the reducing agent, the color image forming substance and other optional components can be contained in the oil droplets or arranged outside of the oil droplets in the light-sensitive layer.
- the reducing agent is preferably contained in the oil droplets, because the reaction can progress smoothly in such case.
- five or more silver halide grains are preferably contained in the oil droplets.
- the oil droplets of the polymerizable compound are preferably in the form of microcapsules, and various known manners can be employed.
- Examples of the process for the preparation of the microcapsules include a process utilizing coacervation of hydrophilic wall-forming materials as described in U.S. Pat. Nos. 2,800,457 and 2,800,458; an interfacial polymerization process as described in U.S. Pat. No. 3,287,154, U.K. Patent No. 990,443 and Japanese Patent Publication Nos. 38(1963)-19574, 42(1967)-446 and 42(1967)-771; a process utilizing precipitation of polymers as described in U.S. Pat. Nos. 3,418,250 and 3,660,304; a process of using isocyanate-polyol wall materials as described in U.S. Pat. No.
- the microcapsule is prepared by emulsifying core materials containing the polymerizable compound and forming a polymeric membrane (i.e., shell or wall) over the core materials.
- the shell material of the microcapsule there is no specific limitation on the shell material of the microcapsule, and various known materials can be used. However, it is preferred that the shell material which is used in the invention is lipophilic and has a contact angle of not less than 40°.
- the shell material include polyurea, polyurethane, polyethylene, polyamide, polyester, polycarbonate, polyethyleneamine, phenol-formalin resin, melamine resin, vinyl polymer and vinyl copolymer, polyacrylonitrile, polyvinyl acetal resin, cellulose acetate, polypropylene, polybutadiene and their mixtures.
- the light-sensitive composition which is the polymerizable compound containing the silver halide can be prepared using the silver halide emulsion.
- the silver halide emulsion is dispersed in the lipophilic continuous phase in the same manner as the process for incorporating the silver halide emulsion into the polymerizable compound.
- the light-sensitive composition can be also prepared using silver halide powders which can be prepared by lyophilization. These light-sensitive composition can be obtained by stirring the polymerizable compound and the silver halide using a homogenizer, a blender, a mixer or other conventional stirring device.
- Polymers having a principal chain consisting essentially of a hydrocarbon chain substituted in part with hydrophilic groups which contain, in their terminal groups, --OH or nitrogen having a lone electron-pair are preferably introduced into the polymerizable compound prior to the preparation of the light-sensitive composition.
- the polymer has a function of dispersing silver halide or other component in the polymerizable compound very uniformly as well as a function of keeping thus dispered state. Further, the polymer has another function of gathering silver halide along the interface between the polymerizable compound (i.e., light-sensitive composition) and the aqueous medium in preparation of the microcapsule. Therefore, using this polymer, silver halide can be easily introduced into the shell material of the microcapsule.
- the light-sensitive composition can be also prepared by dispersing microcapsule containing silver halide emulsion as a core structure in the polymerizable compound instead of employing the above polymer.
- the color image forming substances may dissolved, emulsified or dispersed in the light-sensitive composition.
- the necessary components for preparation of the microcapsule, such as shell wall-forming materials can be incorporated into in the light-sensitive composition.
- the emulsion itself can be used as a coating solution for preparation of the light-sensitive layer.
- Other emulsions may be mixed with the silver halide emulsion, binder and optionally organic silver salt emulsion to prepare a coating solution.
- the PS plate of the invention can be prepared by coating and drying the above-prepared coating solution on a support.
- the coating solution is coated on the support in a conventional manner.
- a protective layer is preferably provided on the light-sensitive layer to prevent a polymerization inhibition by oxygen when the polymerizable compound is polymerized.
- the protective layer preferably has a non-permeability to oxygen, no tackiness under high temperature and high moisture, improved in adhesive property to the light-sensitive layer and improved in ink adhesion when printing.
- the protective layer consisting of polyvinyl pyrrolidone, polyvinyl alcohol, gelatin and gum arabic described in Japanese Patent Publication No. 46(1971)-32714, or copolymers of carboxylic acid unsaturated and ethylenic unsaturated compound are preferred.
- Solid particles of polyfluoroethylene addition polymer described in Japanese Patent Publication No. 47(1972)-469, or betain type surface active agent may be contained in the protective layer.
- the latent image of the silver halide is obtained by imagewise exposure to radiation including visible light.
- the type of light source and exposure can be selected depending upon the light-sensitive wavelengths determined by spectral sensitization or sensitivity of silver halide.
- the light sources include mercury vapor lamp, metal halide lamp, xenon lamp, chemical lamp, carbon arc lamp, tungsten lamp and infrared lamp.
- Scanning exposure with laser beams can be used in the invention.
- the laser beams include semiconductor laser, helium-neon laser, argon laser, krypton laser and helium-cadmium laser beams.
- a heat (thermal) development process is preferred, because the process can be simply operated and the development can be conducted within a short time.
- a heat development process is described in more detail in Japanese Patent Provisional Publication No. 61(1986)-69062.
- Heating in the heat development process can be conducted in various known manners.
- the heating layer which is arranged on the PS plate can be used as the heating means in the same manner as the light-sensitive material described in Japanese Patent Provisional Publication No. 61(1986)-294434, or a process wherein the heat development is carried out while controlling the amount of oxygen present in the light-sensitive material as in the image forming method disclosed in Japanese Patent Provisional Publication No. 62(1987)-210461.
- Heating temperatures for the development process generally ranges from 80° C. to 200° C., and preferably from 100° C. to 160° C.
- the heating time is generally from 1 second to 5 minutes, and preferably from 5 seconds to 1 minute.
- a base sheet i.e., a sheet in which a base is contained
- a base sheet is preferably employed.
- a polymerizable compound within the area where a latent image of the silver halide has been formed or within the area where a latent image of the silver halide has not been formed is polymerized.
- the polymerizable compound within the area where the latent image has been formed is polymerized. If the nature or amount of the reducing agent is controlled, the polymerizable compound within the area where the latent image has not been formed can be polymerized in the same manner as in the light-sensitive material described in Japanese Patent Provisional Publication No. 61(1986)-260241.
- a polymerization reaction crosslinking reaction between the polymerizable compound and the binder polymer, and/or among molecules of the binder polymers
- a part where the polymerizable compound and the binder polymer of the invention are present in the exposed part proceeds to form an image area (ink-receptive part).
- a part where the polymerizable compound and the binder of the invention are present in a unexposed part remain still uncured to form a non-image area (hydrophilic part) by developing to remove using ethanol.
- the protective layer is provided, the unexposed area is removed by wash-off after exposure and development.
- the PS plate having the image area (i.e., lipophilic part) and the non-image area (i.e., hydrophilic part) can be prepared.
- a lithographic plate wherein the polymerizable compound within the area where a latent image of silver halide has been formed is polymerized.
- a lithographic plate can also be prepared by a method wherein the polymerizable compound within the area where a latent image of silver halide has not been formed is polymerized as described above.
- the light-sensitive material of the present invention has been described by referring to the case of using for the PS plate.
- the light-sensitive material of the invention can further be used for monochromatic or color photography, printing, radiography, diagnosis (e.g., CRT photography of diagnostic device using supersonic wave), copy (e.g., computer-graphic hard copy), etc.
- a surface of an aluminum sheet having a thickness of 0.30 mm was grained using a nylon brush and an aqueous suspension containing a pumice powder on 400 mesh, and then the sheet was washed with water.
- the aluminum sheet was immersed in 10% aqueous sodium hydroxide solution at 70° C. for 60 seconds for etching. Thereafter, the sheet was washed with running water, neutralized, and then washed using 20% aqueous solution of nitric acid.
- the electrochemical surface-roughing treatment was effected in the anoidically electric amount of 160 coulomb/dm 2 under such conditions as anoidically voltage of 12.7 V and the cathode electric amount ratio to the anoidically electric amount of 0.8 using sine wave alternating-corrugated current.
- the center line average height (Ra) was 0.6 ⁇ m.
- the sheet was immersed in 30% aqueous sulfuric acid and desmutted at 55° C. for 2 minutes. The sheet was subjected to anoidic electric treatment to give an anoidized layer of a thickness of 2.7 g/dm 2 at current density of 2 A/dm 2 .
- aqueous solution of polyvinyl alcohol (viscosity: 5.3 ⁇ 0.5 cP (measured using Hoppler viscometer in 4% aqueous solution at the temperature of 20° C.), saponification degree: 86.5 to 89.0 mole %, polymerization degree: more than 1,000) and dried to give an over coat layer of 1.5 g/m 2 .
- a PS plate (A) having an aluminum support, a light-sensitive layer and an overcoat layer was obtained.
- the lithographic plate was mounted on a Heidelberg KOR-D type printing machine, and a printing operation was performed. As a result, a print having a clear image was obtained.
- Each of the PS plates (B) and (C) was developed after exposure in the same manner as in Example 1, lithographic plates (B) and (C) were prepared. Each of the lithographic plates (B) and (C) was mounted on the Heidelberg KOR-D type printing machine, and a printing operation was performed. As a result, a print having a clear image was obtained.
- a light-sensitive composition was prepared in the same manner as in Example 1, except that the copolymer (II) was not used, and then to the light-sensitive composition was added 24.6 g of 20% methanol solution of the following copolymer (V) (molecular weight: 100,000) to obtain a coating solution for the preparation of the light-sensitive layer.
- V copolymer
- a PS plate (D) was prepared.
- the PS plate (D) was developed after exposure in the same manner as in Example 1, and was further developed in water at temperature of 30° C. for 2 minutes to obtain a lithographic plate (D).
- the lithographic plate (D) was mounted in the Heidelberg KOR-D type printing machine, and a printing operation was performed. As a result, a print having a clear image was obtained.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
______________________________________
Trimethylolpropane triacrylate
2.68 g
Copolymer (I) 0.16 g
Copolymer (II) 5.36 g
(molecular weight: approx 20,000)
Ethyl acetate 41.00 g
Emulex NP-8 0.72 g
(tradename of Nippon Emulsion Co., Ltd.)
Silver halide emulsion 8.0 g
10% Aqueous solution of potassium bromide
0.68 g
10% Methanol solution of 1-phenyl-5-mercapto
0.68 g
tetrazole
0.1% Methanol solution of Sensitizing dye (a)
0.50 g
______________________________________
(Copolymer (I))
##STR1##
(Copolymer (II))
##STR2##
Remark: numbers attached to brackets mean mole % in each
repeating units, similar to hereinafter.
(Sensitizing dye (a))
##STR3##
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-172400 | 1987-07-10 | ||
| JP62172400A JPH0721633B2 (en) | 1987-07-10 | 1987-07-10 | Photosensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4985339A true US4985339A (en) | 1991-01-15 |
Family
ID=15941242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/217,207 Expired - Lifetime US4985339A (en) | 1987-07-10 | 1988-07-11 | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a polymeric binder |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4985339A (en) |
| EP (1) | EP0298522B1 (en) |
| JP (1) | JPH0721633B2 (en) |
| DE (1) | DE3864207D1 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5227278A (en) * | 1992-02-27 | 1993-07-13 | E. I. Du Pont De Nemours And Company | Positive-working, low silver wash-off contact film |
| US5230969A (en) * | 1990-08-09 | 1993-07-27 | Physical Optics Corporation | Composite graft optical polymer |
| US5290659A (en) * | 1990-11-27 | 1994-03-01 | Fuji Photo Film Co., Ltd. | Light-sensitive material comprising light-sensitive layer, polymerizable layer and image formation accelerating layer provided on support |
| US5441843A (en) * | 1991-07-15 | 1995-08-15 | Fuji Photo Film Co., Ltd. | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and color image forming substance |
| EP0695971A1 (en) | 1994-08-03 | 1996-02-07 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| US5599648A (en) * | 1990-08-03 | 1997-02-04 | Canon Kabushiki Kaisha | Surface reforming method, process for production of printing plate, printing plate and printing process |
| EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
| US5800968A (en) * | 1995-10-09 | 1998-09-01 | Fuji Photo Film Co., Ltd. | Method for heat developing photosensitive material and apparatus therefor |
| US5972556A (en) * | 1995-09-14 | 1999-10-26 | Agfa-Gevaert N.V. | Thermographic and photothermographic materials for producing lithographic printing elements and processes therefor |
| US20020011171A1 (en) * | 2000-07-18 | 2002-01-31 | Fuji Photo Film Co., Ltd. | Planographic printing plate packaging structure and method for packaging planographic printing plate |
| US20060046187A1 (en) * | 2004-08-26 | 2006-03-02 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3115745B2 (en) * | 1993-07-12 | 2000-12-11 | 富士写真フイルム株式会社 | Photosensitive material |
| US6845016B2 (en) * | 2001-09-13 | 2005-01-18 | Seiko Epson Corporation | Electronic device and method of manufacturing the same, and electronic instrument |
| JP4404769B2 (en) | 2002-08-15 | 2010-01-27 | 富士フイルム株式会社 | Antireflection film, polarizing plate, and image display device |
| DE602004021525D1 (en) | 2003-03-26 | 2009-07-30 | Fujifilm Corp | Planographic printing and presensitized plate |
| US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
| US7146909B2 (en) | 2004-07-20 | 2006-12-12 | Fuji Photo Film Co., Ltd. | Image forming material |
| US20060032390A1 (en) | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
| DE602005005403T2 (en) | 2004-08-24 | 2009-04-23 | Fujifilm Corp. | Process for the preparation of a lithographic printing plate |
| JP2006062188A (en) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | Color image forming material and original plate of lithographic printing plate |
| JP5089866B2 (en) * | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | Planographic printing method |
| US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
| JP2006181838A (en) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | Original plate of lithographic printing plate |
| JP2007055224A (en) | 2005-01-26 | 2007-03-08 | Fujifilm Corp | Lithographic printing plate precursor, lithographic printing method and lithographic printing plate precursor package |
| EP3086177B1 (en) | 2005-02-28 | 2018-11-14 | Fujifilm Corporation | Method for preparing a lithographic printing place precursor |
| JP4759343B2 (en) | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | Planographic printing plate precursor and planographic printing method |
| JP4701042B2 (en) | 2005-08-22 | 2011-06-15 | 富士フイルム株式会社 | Photosensitive planographic printing plate |
| JP4945432B2 (en) | 2006-12-28 | 2012-06-06 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
| EP2447780B1 (en) | 2007-01-17 | 2013-08-28 | Fujifilm Corporation | Method for preparation of lithographic printing plate |
| JP4881756B2 (en) | 2007-02-06 | 2012-02-22 | 富士フイルム株式会社 | Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dye |
| JP2008230024A (en) | 2007-03-20 | 2008-10-02 | Fujifilm Corp | Preparation of lithographic printing plate precursor and lithographic printing plate |
| DE602008001572D1 (en) | 2007-03-23 | 2010-08-05 | Fujifilm Corp | Negative lithographic printing plate precursor and lithographic printing method therewith |
| JP5046744B2 (en) | 2007-05-18 | 2012-10-10 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method using the same |
| JP5376844B2 (en) | 2007-06-21 | 2013-12-25 | 富士フイルム株式会社 | Planographic printing plate precursor and planographic printing method |
| US8426102B2 (en) | 2007-06-22 | 2013-04-23 | Fujifilm Corporation | Lithographic printing plate precursor and plate making method |
| EP2011643B1 (en) | 2007-07-02 | 2010-10-13 | FUJIFILM Corporation | Planographic printing plate precursor and printing method using the same |
| JP2009069761A (en) | 2007-09-18 | 2009-04-02 | Fujifilm Corp | Planographic printing plate making method |
| JP5322537B2 (en) | 2007-10-29 | 2013-10-23 | 富士フイルム株式会社 | Planographic printing plate precursor |
| JP5155677B2 (en) | 2008-01-22 | 2013-03-06 | 富士フイルム株式会社 | Planographic printing plate precursor and its plate making method |
| JP2009184188A (en) | 2008-02-05 | 2009-08-20 | Fujifilm Corp | Planographic printing plate precursor and printing method |
| JP2009214428A (en) | 2008-03-11 | 2009-09-24 | Fujifilm Corp | Original plate of lithographic printing plate and lithographic printing method |
| JP2009236942A (en) | 2008-03-25 | 2009-10-15 | Fujifilm Corp | Planographic printing plate precursor and plate making method of the same |
| JP4914864B2 (en) | 2008-03-31 | 2012-04-11 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
| EP2110261B1 (en) | 2008-04-18 | 2018-03-28 | FUJIFILM Corporation | Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
| JP5296434B2 (en) | 2008-07-16 | 2013-09-25 | 富士フイルム株式会社 | Master for lithographic printing plate |
| JP5408942B2 (en) | 2008-09-22 | 2014-02-05 | 富士フイルム株式会社 | Planographic printing plate precursor and plate making method |
| JP5449898B2 (en) | 2008-09-22 | 2014-03-19 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method using the same |
| CN102165374B (en) | 2008-09-24 | 2013-07-31 | 富士胶片株式会社 | Process for producing lithographic printing plate |
| JP5660268B2 (en) | 2008-09-30 | 2015-01-28 | 富士フイルム株式会社 | Planographic printing plate precursor, lithographic printing plate making method and polymerizable monomer |
| EP2554381B1 (en) | 2010-03-30 | 2018-05-02 | FUJIFILM Corporation | Method for producing lithographic printing plate |
| EP2610067B1 (en) | 2010-08-27 | 2014-11-26 | FUJIFILM Corporation | Master planographic printing plate for on-press development, and plate-making method using said master planographic printing plate |
| JP5789448B2 (en) | 2010-08-31 | 2015-10-07 | 富士フイルム株式会社 | Planographic printing plate precursor and plate making method |
| JP5705584B2 (en) | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | Planographic printing plate making method |
| JP5244987B2 (en) | 2011-02-28 | 2013-07-24 | 富士フイルム株式会社 | Planographic printing plate precursor and plate making method |
| JP5740275B2 (en) | 2011-09-30 | 2015-06-24 | 富士フイルム株式会社 | Printing method using on-press development type lithographic printing plate precursor |
| JP5771738B2 (en) | 2012-02-23 | 2015-09-02 | 富士フイルム株式会社 | Color-forming composition, color-forming curable composition, lithographic printing plate precursor and plate making method, and color-forming compound |
| WO2014045783A1 (en) | 2012-09-20 | 2014-03-27 | 富士フイルム株式会社 | Original planographic printing plate, and plate making method |
| WO2014132721A1 (en) | 2013-02-27 | 2014-09-04 | 富士フイルム株式会社 | Infrared-sensitive chromogenic composition, infrared-curable chromogenic composition, lithographic printing plate precursor, and plate formation method |
| JP6271594B2 (en) | 2014-01-31 | 2018-01-31 | 富士フイルム株式会社 | Infrared photosensitive coloring composition, lithographic printing plate precursor, lithographic printing plate making method, and infrared photosensitive coloring agent |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4293635A (en) * | 1980-05-27 | 1981-10-06 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition with polymeric binder |
| US4350759A (en) * | 1981-03-30 | 1982-09-21 | Polaroid Corporation | Allyl amine polymeric binders for photographic emulsions |
| US4353978A (en) * | 1979-08-14 | 1982-10-12 | E. I. Du Pont De Nemours And Company | Polymeric binders for aqueous processable photopolymer compositions |
| US4448850A (en) * | 1982-07-23 | 1984-05-15 | Eastman Kodak Company | Vinyl acetate polymers and latex compositions containing same |
| US4537855A (en) * | 1982-10-18 | 1985-08-27 | Mitsubishi Chemical Industries Limited | Photopolymerizable photosensitive composition |
| US4557997A (en) * | 1981-06-23 | 1985-12-10 | Fuji Photo Film Co., Ltd. | Photo-polymerizable process of image formation using unsaturated materials and silver halide |
| EP0203613A2 (en) * | 1985-05-30 | 1986-12-03 | Fuji Photo Film Co., Ltd. | Light-sensitive material containing microcapsules and image-recording method using the same |
| US4629676A (en) * | 1984-09-12 | 1986-12-16 | Fuji Photo Film Co., Ltd. | Image forming method |
| US4687727A (en) * | 1982-09-21 | 1987-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition |
| US4722885A (en) * | 1984-03-09 | 1988-02-02 | Fuji Photo Film Co., Ltd. | Photographic light-sensitive material containing a specified graft polymer or copolymer |
| US4764451A (en) * | 1986-01-10 | 1988-08-16 | Fuji Photo Film Co., Ltd. | Image-forming method employing light-sensitive material containing silver halide, reducing agent, polymerizable compound and a photopolymerization initiator |
| US4806450A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element having a terpolymer binder in the photopolymerizable layer |
| US4806449A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element containing a terpolymer binder |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0202490B1 (en) * | 1985-04-22 | 1988-09-21 | Fuji Photo Film Co., Ltd. | Method for forming a polymer image and image recording material therefor |
-
1987
- 1987-07-10 JP JP62172400A patent/JPH0721633B2/en not_active Expired - Fee Related
-
1988
- 1988-07-11 DE DE8888111039T patent/DE3864207D1/en not_active Expired - Lifetime
- 1988-07-11 US US07/217,207 patent/US4985339A/en not_active Expired - Lifetime
- 1988-07-11 EP EP88111039A patent/EP0298522B1/en not_active Expired
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4353978A (en) * | 1979-08-14 | 1982-10-12 | E. I. Du Pont De Nemours And Company | Polymeric binders for aqueous processable photopolymer compositions |
| US4293635A (en) * | 1980-05-27 | 1981-10-06 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition with polymeric binder |
| US4350759A (en) * | 1981-03-30 | 1982-09-21 | Polaroid Corporation | Allyl amine polymeric binders for photographic emulsions |
| US4557997A (en) * | 1981-06-23 | 1985-12-10 | Fuji Photo Film Co., Ltd. | Photo-polymerizable process of image formation using unsaturated materials and silver halide |
| US4448850A (en) * | 1982-07-23 | 1984-05-15 | Eastman Kodak Company | Vinyl acetate polymers and latex compositions containing same |
| US4687727A (en) * | 1982-09-21 | 1987-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition |
| US4537855A (en) * | 1982-10-18 | 1985-08-27 | Mitsubishi Chemical Industries Limited | Photopolymerizable photosensitive composition |
| US4722885A (en) * | 1984-03-09 | 1988-02-02 | Fuji Photo Film Co., Ltd. | Photographic light-sensitive material containing a specified graft polymer or copolymer |
| US4629676A (en) * | 1984-09-12 | 1986-12-16 | Fuji Photo Film Co., Ltd. | Image forming method |
| EP0203613A2 (en) * | 1985-05-30 | 1986-12-03 | Fuji Photo Film Co., Ltd. | Light-sensitive material containing microcapsules and image-recording method using the same |
| US4764451A (en) * | 1986-01-10 | 1988-08-16 | Fuji Photo Film Co., Ltd. | Image-forming method employing light-sensitive material containing silver halide, reducing agent, polymerizable compound and a photopolymerization initiator |
| US4806450A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element having a terpolymer binder in the photopolymerizable layer |
| US4806449A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element containing a terpolymer binder |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5599648A (en) * | 1990-08-03 | 1997-02-04 | Canon Kabushiki Kaisha | Surface reforming method, process for production of printing plate, printing plate and printing process |
| US5230969A (en) * | 1990-08-09 | 1993-07-27 | Physical Optics Corporation | Composite graft optical polymer |
| US5290659A (en) * | 1990-11-27 | 1994-03-01 | Fuji Photo Film Co., Ltd. | Light-sensitive material comprising light-sensitive layer, polymerizable layer and image formation accelerating layer provided on support |
| US5441843A (en) * | 1991-07-15 | 1995-08-15 | Fuji Photo Film Co., Ltd. | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and color image forming substance |
| US5227278A (en) * | 1992-02-27 | 1993-07-13 | E. I. Du Pont De Nemours And Company | Positive-working, low silver wash-off contact film |
| EP0695971A1 (en) | 1994-08-03 | 1996-02-07 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| US5972556A (en) * | 1995-09-14 | 1999-10-26 | Agfa-Gevaert N.V. | Thermographic and photothermographic materials for producing lithographic printing elements and processes therefor |
| US5800968A (en) * | 1995-10-09 | 1998-09-01 | Fuji Photo Film Co., Ltd. | Method for heat developing photosensitive material and apparatus therefor |
| EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
| US20020011171A1 (en) * | 2000-07-18 | 2002-01-31 | Fuji Photo Film Co., Ltd. | Planographic printing plate packaging structure and method for packaging planographic printing plate |
| US7069859B2 (en) * | 2000-07-18 | 2006-07-04 | Fuji Photo Film Co., Ltd. | Planographic printing plate packaging structure and method for packaging planographic printing plate |
| US20060046187A1 (en) * | 2004-08-26 | 2006-03-02 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material |
| US20070065754A1 (en) * | 2004-08-26 | 2007-03-22 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0298522A2 (en) | 1989-01-11 |
| JPH0721633B2 (en) | 1995-03-08 |
| EP0298522B1 (en) | 1991-08-14 |
| JPS6417047A (en) | 1989-01-20 |
| EP0298522A3 (en) | 1990-03-14 |
| DE3864207D1 (en) | 1991-09-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4985339A (en) | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a polymeric binder | |
| EP0232721B1 (en) | Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| EP0235751B1 (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US4879201A (en) | Method of making a lithographic plate comprising microcapsules | |
| EP0224214B1 (en) | Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same | |
| US4933256A (en) | Image-forming method employing light-sensitive material having microcapsules and fine polymer particles and image-receiving material | |
| EP0234580B1 (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US4871641A (en) | Light-sensitive material containing silver halide reducing agent and polymerizable compound and process for preparation thereof | |
| US4916041A (en) | Presensitized lithographic plate comprising silver halide, reducing agent and polymerizable compound all in microcapsules | |
| US4824756A (en) | Image-forming method employing light-sensitive material containing silver halide, reducing agent and a mixture of polymerizable compounds | |
| EP0237048B1 (en) | Light-sensitive material comprising light-sensitive layer provided on support | |
| US4920027A (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US4891299A (en) | Image-forming method employing light-sensitive material and a transparent image-receiving material | |
| US4868087A (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound and further comprising a white pigment | |
| US4945025A (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound wherein the light-sensitive layer is provided with a cover sheet | |
| EP0404192B1 (en) | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor | |
| EP0232865B1 (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| EP0247396B1 (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US5053308A (en) | Light-sensitive composition comprising silver halide dispersed in polymerizable compound and light-sensitive material employing the same | |
| EP0237057B1 (en) | Image-forming method employing light-sensitive material and image-receiving material | |
| EP0237059B1 (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US4767690A (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | |
| US4945023A (en) | Light-sensitive material containing silver halide, reducing agent and polymerizable compound wherein the silver halide is monodispersed | |
| US4977057A (en) | Image-forming method using silver halide and polymerizable compound | |
| EP0251203B1 (en) | Image-forming method using light-sensitive material and image-receiving material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: FUJI PHOTO FILM CO., LTD., NO. 210, NAKANUMA, MINA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:KOIZUMI, SHIGEO;HAYAKAWA, YOSHIHIDE;REEL/FRAME:004964/0684 Effective date: 19880705 Owner name: FUJI PHOTO FILM CO., LTD., JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KOIZUMI, SHIGEO;HAYAKAWA, YOSHIHIDE;REEL/FRAME:004964/0684 Effective date: 19880705 |
|
| STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
| FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
| FPAY | Fee payment |
Year of fee payment: 4 |
|
| FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Free format text: PAYER NUMBER DE-ASSIGNED (ORIGINAL EVENT CODE: RMPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
| FPAY | Fee payment |
Year of fee payment: 8 |
|
| FPAY | Fee payment |
Year of fee payment: 12 |
|
| REMI | Maintenance fee reminder mailed | ||
| AS | Assignment |
Owner name: FUJIFILM CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.);REEL/FRAME:018904/0001 Effective date: 20070130 Owner name: FUJIFILM CORPORATION,JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.);REEL/FRAME:018904/0001 Effective date: 20070130 |