US3880728A - Manufacture of lead dioxide/titanium composite electrodes - Google Patents
Manufacture of lead dioxide/titanium composite electrodes Download PDFInfo
- Publication number
- US3880728A US3880728A US502666A US50266674A US3880728A US 3880728 A US3880728 A US 3880728A US 502666 A US502666 A US 502666A US 50266674 A US50266674 A US 50266674A US 3880728 A US3880728 A US 3880728A
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- US
- United States
- Prior art keywords
- titanium
- lead dioxide
- disilicide
- silicide
- carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 title claims abstract description 66
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 42
- 239000010936 titanium Substances 0.000 title claims abstract description 42
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 239000002131 composite material Substances 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000000034 method Methods 0.000 claims abstract description 41
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 22
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 20
- 238000000151 deposition Methods 0.000 claims abstract description 15
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims abstract description 15
- 230000008021 deposition Effects 0.000 claims abstract description 10
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 239000002245 particle Substances 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 150000004820 halides Chemical class 0.000 claims description 7
- DFJQEGUNXWZVAH-UHFFFAOYSA-N bis($l^{2}-silanylidene)titanium Chemical compound [Si]=[Ti]=[Si] DFJQEGUNXWZVAH-UHFFFAOYSA-N 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- 229910021352 titanium disilicide Inorganic materials 0.000 claims description 5
- MANYRMJQFFSZKJ-UHFFFAOYSA-N bis($l^{2}-silanylidene)tantalum Chemical compound [Si]=[Ta]=[Si] MANYRMJQFFSZKJ-UHFFFAOYSA-N 0.000 claims description 4
- GJIKIPCNQLUSQC-UHFFFAOYSA-N bis($l^{2}-silanylidene)zirconium Chemical compound [Si]=[Zr]=[Si] GJIKIPCNQLUSQC-UHFFFAOYSA-N 0.000 claims description 4
- 229910021358 chromium disilicide Inorganic materials 0.000 claims description 4
- 238000007750 plasma spraying Methods 0.000 claims description 4
- 238000001947 vapour-phase growth Methods 0.000 claims description 4
- 229910021353 zirconium disilicide Inorganic materials 0.000 claims description 4
- 238000010285 flame spraying Methods 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 230000004580 weight loss Effects 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XTDAIYZKROTZLD-UHFFFAOYSA-N boranylidynetantalum Chemical compound [Ta]#B XTDAIYZKROTZLD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229910000004 White lead Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000001652 electrophoretic deposition Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- VJPLIHZPOJDHLB-UHFFFAOYSA-N lead titanium Chemical compound [Ti].[Pb] VJPLIHZPOJDHLB-UHFFFAOYSA-N 0.000 description 1
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- -1 silicon halides Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
- H01M4/661—Metal or alloys, e.g. alloy coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- Composite electrodes of a base consisting of titanium to which lead dioxide coatings have been applied are known. Such electrodes are manufactured by conventional methods, through anodic deposition of the oxide from lead-ll salt solution onto the titanium substrate. Because titanium blocks the passage of current if it is wired as the anode in an electrolysis system, it is hovw ever not possible anodically to deposit an even and well-adhering lead dioxide coating on a titanium surface. It is known to avoid this blockage by adding fluorides to the lead salt bath or by mechanically roughening. and degreasing. the titanium surface.
- lead dioxide/titanium composite electrodes by applying seeds of finely divided platinum. palladium. gold, magnetite. graphite and/or lead dioxide to the titanium surface before the anodic deposition of lead dioxide.
- the electrodes produced in accordance with the processes which have been disclosed are not equally suitable for all applications. Thus. for example. they suffer from the disadvantage that if they are employed as anodes in electrolysis cells of high current throughput the lead dioxide layers flake off. especially after prolonged anodic polarization. and this results in the gradual formation of a blocking layer of titanium dioxide between the titanium and the lead dioxide. If the process carried out uses noble metals, such electrodes can, for example when employed as anodes in electrolysis cells with cathodes of high hydrogen overvoltage, inactivate the cathodes. Furthermore. some of the conventional processes are costly and time-consuming.
- this object is achieved by a process for the production of lead dioxide/titanium composite electrodes by anodic deposition of lead dioxide on titanium surfaces wherein an intermediate layer of a carbide or boride of an element of sub-group 4 or 5 and/or a silicide of an element of sub-group 4. 5 or 6 of the periodic table of the elements and/or silicon carbide, is applied to the titanium surface before depositing the lead dioxide.
- Particularly suitable carbides and borides are those of titanium and tantalum. and titanium carbide. tantalum carbide and tantalum boride should be singled out specifically.
- Preferred silicides for use in the intermediate layers are titanium disilicide. zirconium disilicide. tantalum disilicide. chromium disilicide and niobium disilicide. amongst which chromium disilicide. titanium disilicide and zirconium disilicide give particularly dense intermediate layers because of their low melting points. which are from l.500 to l.700C. Silicon carbide is also preferred.
- the intermediate layers can also consist of a mixture of these compounds.
- the base is first cleaned. preferably mechanically, for example by sandblasting or corundum blasting. Thereafter, the carbides and borides of the elements of sub-groups 4 and 5 of the periodic system (Ti, Zr. Hf. V. Nb and Ta) and the silicides of the elements of sub-groups 4 to 6 of the periodic system (Ti, Zr. Hf. V, Nb. Ta. Cr. Mo and W) and/or silicon carbide are applied.
- the plasma spraying process can be used and is advantageously carried out under a protective atmosphere of argon gas; in this process. the powders of the compounds mentioned. of particle sizes preferably from 15 to 90 ,u.
- the thickness of the intermediate layers produced in preferably from about to 200 ,u.. but where the layers contain more than 20 percent by weight of the silicides mentioned. and/or of silicon carbide, a thickness down to 20 ,u. suffices.
- the silicides or the silicon carbide can also be modified with metals or halides of the iron group. especially with iron itself.
- the proportion of metals or halides of the iron group is so chosen that the content. based on pure metal. in the silicide does not exceed 5 percent by weight.
- carbides or silicides and the silicon carbide are the flame spraying process and high vacuum vapor-coating. In these processes, as in the plasma spraying process. it is important that the electrically conducting base should be freed from oxides on the surface which is to be coated.
- a particularly suitable process for applying intermediate layers of silicon or silicon carbide to electrically conducting shapes has proved to be vapor phase deposition by a chemical reaction with application of radiant energy or heat energy.
- halides of elements of sub-groups 4 to 6 can be reacted with silanes or silicon halides and hydrogen or base metals to give silicides which deposit as dense coatings on the surface of the electrically conducting bases.
- the titanium bodies pretreated in this way are then provided with a PbO coating by conventional anodic methods.
- lead(ll) nitrate or lead(ll) perchlorate solutions which can advantageously contain up to 0.5 percentof copper( ll) nitrate and up to 0.2 percent of a wetting agent. for example based on ethoxylated alcohols.
- the current density is advantageously from 1 to A/dm and the temperature is advantageously from 40 to 80C.
- Copper is a suitable cathode material. Good convection is advantageously ensured by stirring or circulation.
- the pH value of the solution, which decreases during the electrolysis. is preferably maintained within the range 1 pH s 5 by adding basic lead carbonate.
- EXAMPLE 1 An expanded metal mesh of titanium, of dimensions 100 X 40 mm. was corundum-blasted and coated with fine-grained titanium carbide. particle size from 40 to 90 ,u, to a thickness of about 0. mm by means of a plasma torch, under a blanket or argon gas. In carrying out the coating. the plasma torch was operated with argon containing less than 0.5 percent of nitrogen. The expanded titanium metal was at a temperature of s 60C during coating.
- the expanded titanium metal mesh pretreated in this way was dipped to a depth of 5 cm, along its longitudinal axis, into a solution which was prepared by dissolving 300 g of Pb(NO;,)- 3 g of Cu(NO,,) 3 H 0 and l g of a wetting agent based on ethoxylated alcohols in water to make a total of 1 liter. and was coated at a temperature of from 60 to 70C for 3 hours, using a current of 0.8 A i 0.1 A 4 i 0.5 A/dm A copper sheet was used as the cathode.
- This treatment resulted I in the deposition of 10.96 g of PbO
- the lead dioxide/titanium composite electrode thus produced was subjected. in approx.
- the mesh was then immersed, as the anode. into a lead-ll salt bath under the same conditions as in Example l, causing the deposition of 10.68 g of PbO- EXAMPLE 3
- the mesh was first coated with tantalum boride of particle size from 40 to 90 y. and then with lead dioxide. using the methods described in Example 1. A total of 10.20 g of PbO were deposited.
- EXAMPLE 4 An expanded titanium metal mesh of dimensions 100 X 40 mm was corundum-blasted and coated with finegrained titanium disilicide, particle size from 20 to 40 u. to a thickness of about 100 ,u by means of a plasma torch. under a blanket of argon gas. In carrying out the coating. the plasma torch was operated with argon containing less than 0.5 percent of nitrogen. The expanded titanium metal was at a temperature of s 60C during coating.
- the expanded titanium metal mesh pretreated in this way was dipped to a depth of 5 cm. along its longitudinal axis. into a solution which was prepared by dissolving 300 g of Pb(NO 3 g of Cu(NO 3 H 0 and l g ofa wetting agent based on ethoxylated alcohols in water to make a total of 1 liter. and was coated at a temperature of from 60 to C for 3 hours. using a current of 0.8 A i 0.1 A 4 i 0.5 A/dm A copper sheet was used as the cathode. This treatment resulted in the deposition of 8.36 g of PbO- the geometrical surface area was 0.2 dm
- the lead dioxide/titanium composite electrode thus produced was subjected to a current of 20 A 100 A/dm in approx. 20 percent strength sulfuric acid at from 30 to 35C for 100 hours.
- the weight loss of the anode at this current density was approx. 0.7 mg/ampere hour.
- EXAMPLE 5 An expanded titanium metal mesh was coated with tantalum disilicide of particle size from 20 to 40 ,U. by the method described in Example 4.
- the mesh was then immersed, as the anode, into a lead-ll salt bath under the same conditions as in Example 4, causing the deposition of 9.84 g of PbO
- the weight loss of the lead dioxide/titanium composite electrode thus produced was approx. 0.9 mg/ampere hour under the conditions specified in Example 1.
- EXAMPLE 6 Using the method described in Example 4. the mesh was first coated with chromium disilicide of particle size from 20 to 40 ,u and then with lead dioxide. 1 L g of PbOg deposited and the weight loss under the conditions specified in Example I was approx. 0.6 mg/ampere hour.
- EXAMPLE 7 Using the method described in Example 4. the mesh was first coated with silicon carbide of particle size from 20 to 40 ,u. and then with lead dioxide. 9.41 g of Pb0 deposited and the weight loss under the conditions specified in Example 1 was approx. 0.5 mg/ampere hour.
- a process for the manufacture of a lead dioxide/- titanium composite electrode by anodic deposition of lead dioxide on a titanium surface wherein an intermediate layer of a carbide or boride of an element of subgroup 4 or 5 and/or a silicide of an element of subgroup 4, 5 or 6 of the periodic table of the elements and/or silicon carbide, is applied to the titanium surface before depositing the lead dioxide.
- a process as claimed in claim 1 wherein the intermediate layer applied is from 60 to 200 p. thick if it contains less than 20 percent by weight of silicide and- /or silicon carbide.
- intermediate layer applied is from 20 to 200 p. thick if it contains more than 20 percent by weight of silicide and/or silicon carbide.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
A method of producing lead dioxide/titanium composite electrodes by anodic deposition of lead dioxide on a titanium surface, in which an intermediate layer of a carbide or boride of an element of sub-group 4 or 5 and/or silicide of an element of sub-group 4, 5 or 6 of the periodic table of the elements and/or silicon carbide, is applied to the titanium surface before depositing the lead dioxide.
Description
United States Patent 1 Habermann et al.
[451 Apr. 29, 1975 1 MANUFACTURE OF LEAD DIOXIDE/TITANIUM COMPOSITE ELECTRODES [75] Inventors: Wolfgang Habermann, Mainz; Heinz Nohe, Meckenheim; Peter Jaeger, Ludwigshafen, all of Germany [73] Assignee: BASF Aktiengesellschaft,
Ludwigshafen (Rhine), Germany [22] Filed: Sept. 3, 1974 [21] Appl. No.: 502,666
[52] US. Cl. 204/38 A; 136/26; 204/290 F [51] Int. Cl. B0lk 3/06; C23f 17/00 [58] Field of Search 204/38 A, 290 F, 57, 42;
[56] References Cited UNITED STATES PATENTS 2.636.856 4/1953 Suggs et al. 204/290 F 3.486.940 12/1969 Ruben.... 136/26 3,499,795 3/1970 Ruben 136/26 X 3.649.485 3/1972 Chisholm.... 204/290 F X 3.770.613 11/1973 Chisholm 204/290 F X Primary Examiner-G. L. Kaplan I Attorney, Agent, or Firm.lohnston, Keil, Thompson & Shurtleff [57] ABSTRACT 8 Claims, N0 Drawings MANUFACTURE OF LEAD DIOXIDE/TITANIUM COMPOSITE ELECTRODES This invention relates to a process for the production of lead dioxide/titanium composite electrodes which are specifically useful as anodes in electrolysis cells of high current density.
Composite electrodes of a base consisting of titanium to which lead dioxide coatings have been applied are known. Such electrodes are manufactured by conventional methods, through anodic deposition of the oxide from lead-ll salt solution onto the titanium substrate. Because titanium blocks the passage of current if it is wired as the anode in an electrolysis system, it is hovw ever not possible anodically to deposit an even and well-adhering lead dioxide coating on a titanium surface. It is known to avoid this blockage by adding fluorides to the lead salt bath or by mechanically roughening. and degreasing. the titanium surface.
According to a known proposal, smooth. even, very well-adhering coatings of lead dioxide on titanium surfaces. which even as thin coatings are stable to anodic polarization. are attained by using oxidative treatment in the presence of compounds of metals of sub-groups l. 6. 7 and 8 of the periodic table and of aluminum. vanadium and bismuth to produce a titanium dioxide coating. modified with the oxides of these metals. on the titanium surface prior to depositing the lead dioxide coatings.
Finally. it is also known to manufacture lead dioxide/titanium composite electrodes by applying seeds of finely divided platinum. palladium. gold, magnetite. graphite and/or lead dioxide to the titanium surface before the anodic deposition of lead dioxide.
The electrodes produced in accordance with the processes which have been disclosed are not equally suitable for all applications. Thus. for example. they suffer from the disadvantage that if they are employed as anodes in electrolysis cells of high current throughput the lead dioxide layers flake off. especially after prolonged anodic polarization. and this results in the gradual formation of a blocking layer of titanium dioxide between the titanium and the lead dioxide. If the process carried out uses noble metals, such electrodes can, for example when employed as anodes in electrolysis cells with cathodes of high hydrogen overvoltage, inactivate the cathodes. Furthermore. some of the conventional processes are costly and time-consuming.
[t is an object of the present invention to provide a process for the production of lead dioxide/titanium composite electrodes which provides electrodes which do not show the said disadvantages and which can be used as anodes in electrolysis cells of high current throughput without showing the disadvantage that the lead dioxide layers flake off. Other objects will be apparent from the description.
We have found that this object is achieved by a process for the production of lead dioxide/titanium composite electrodes by anodic deposition of lead dioxide on titanium surfaces wherein an intermediate layer of a carbide or boride of an element of sub-group 4 or 5 and/or a silicide of an element of sub-group 4. 5 or 6 of the periodic table of the elements and/or silicon carbide, is applied to the titanium surface before depositing the lead dioxide.
Particularly suitable carbides and borides are those of titanium and tantalum. and titanium carbide. tantalum carbide and tantalum boride should be singled out specifically.
Preferred silicides for use in the intermediate layers are titanium disilicide. zirconium disilicide. tantalum disilicide. chromium disilicide and niobium disilicide. amongst which chromium disilicide. titanium disilicide and zirconium disilicide give particularly dense intermediate layers because of their low melting points. which are from l.500 to l.700C. Silicon carbide is also preferred.
Of course. the intermediate layers can also consist of a mixture of these compounds.
To manufacture the electrodes. the base is first cleaned. preferably mechanically, for example by sandblasting or corundum blasting. Thereafter, the carbides and borides of the elements of sub-groups 4 and 5 of the periodic system (Ti, Zr. Hf. V. Nb and Ta) and the silicides of the elements of sub-groups 4 to 6 of the periodic system (Ti, Zr. Hf. V, Nb. Ta. Cr. Mo and W) and/or silicon carbide are applied. For this purpose. the plasma spraying process can be used and is advantageously carried out under a protective atmosphere of argon gas; in this process. the powders of the compounds mentioned. of particle sizes preferably from 15 to 90 ,u. are fed to a plasma torch with argon plasma. The thickness of the intermediate layers produced in preferably from about to 200 ,u.. but where the layers contain more than 20 percent by weight of the silicides mentioned. and/or of silicon carbide, a thickness down to 20 ,u. suffices.
To improve the electron conductivity. the silicides or the silicon carbide can also be modified with metals or halides of the iron group. especially with iron itself. The proportion of metals or halides of the iron group is so chosen that the content. based on pure metal. in the silicide does not exceed 5 percent by weight.
Further suitable methods for applying the borides. carbides or silicides and the silicon carbide are the flame spraying process and high vacuum vapor-coating. In these processes, as in the plasma spraying process. it is important that the electrically conducting base should be freed from oxides on the surface which is to be coated.
A particularly suitable process for applying intermediate layers of silicon or silicon carbide to electrically conducting shapes has proved to be vapor phase deposition by a chemical reaction with application of radiant energy or heat energy. Thus, for example. halides of elements of sub-groups 4 to 6 can be reacted with silanes or silicon halides and hydrogen or base metals to give silicides which deposit as dense coatings on the surface of the electrically conducting bases.
In this process it is again possible to produce intermediate layers modified with metals or halides of the iron group. by introducing metals or halides of the iron group into the vapor phase. A particularly advantageous feature of the chemical vapor phase deposition method is that non-porous coatings can be produced on the base.
in addition to this process. it is also possible to deposit or produce the silicides or the silicon carbide by cathodic spraying. electrophoretic deposition from suspensions. or chemical reduction.
The titanium bodies pretreated in this way are then provided with a PbO coating by conventional anodic methods.
For this purpose. they are anodically polarized in aqueous l to 25 per cent strength lead(ll) nitrate or lead(ll) perchlorate solutions which can advantageously contain up to 0.5 percentof copper( ll) nitrate and up to 0.2 percent of a wetting agent. for example based on ethoxylated alcohols. The current density is advantageously from 1 to A/dm and the temperature is advantageously from 40 to 80C. Copper is a suitable cathode material. Good convection is advantageously ensured by stirring or circulation. The pH value of the solution, which decreases during the electrolysis. is preferably maintained within the range 1 pH s 5 by adding basic lead carbonate.
It is an advantage of the process that the intermediate layers thus produced can be re-used as a base for fresh PbO coatings even after the PbO has detached completely. which permits the use of the electrodes in secondary batteries.
EXAMPLE 1 An expanded metal mesh of titanium, of dimensions 100 X 40 mm. was corundum-blasted and coated with fine-grained titanium carbide. particle size from 40 to 90 ,u, to a thickness of about 0. mm by means of a plasma torch, under a blanket or argon gas. In carrying out the coating. the plasma torch was operated with argon containing less than 0.5 percent of nitrogen. The expanded titanium metal was at a temperature of s 60C during coating.
The expanded titanium metal mesh pretreated in this way was dipped to a depth of 5 cm, along its longitudinal axis, into a solution which was prepared by dissolving 300 g of Pb(NO;,)- 3 g of Cu(NO,,) 3 H 0 and l g of a wetting agent based on ethoxylated alcohols in water to make a total of 1 liter. and was coated at a temperature of from 60 to 70C for 3 hours, using a current of 0.8 A i 0.1 A 4 i 0.5 A/dm A copper sheet was used as the cathode. This treatment resulted I in the deposition of 10.96 g of PbO The lead dioxide/titanium composite electrode thus produced was subjected. in approx. percent strength sulfuric acid at from to C, to a current of 4 A 20 A/dm for 24 hours, a current of 10 A 50 A/dm for 24 hours and a current of 20 A 100 A/dm for 20 hours. The cell potentials remained constant within $0.2 V for the period of observation at a given current. The anode potential against a silver electrode (Ag/AgCl. saturated KCl) was approx. 2.1 V at a current density of 20 A/dm The weight loss of the anode was about 0.6 mg/ampere hour at a current density of I00 A/dm EXAMPLE 2 An expanded titanium metal mesh was coated with tantalum carbide of particle size from to 90 u as described in Example 1.
The mesh was then immersed, as the anode. into a lead-ll salt bath under the same conditions as in Example l, causing the deposition of 10.68 g of PbO- EXAMPLE 3 The mesh was first coated with tantalum boride of particle size from 40 to 90 y. and then with lead dioxide. using the methods described in Example 1. A total of 10.20 g of PbO were deposited.
EXAMPLE 4 An expanded titanium metal mesh of dimensions 100 X 40 mm was corundum-blasted and coated with finegrained titanium disilicide, particle size from 20 to 40 u. to a thickness of about 100 ,u by means of a plasma torch. under a blanket of argon gas. In carrying out the coating. the plasma torch was operated with argon containing less than 0.5 percent of nitrogen. The expanded titanium metal was at a temperature of s 60C during coating.
The expanded titanium metal mesh pretreated in this way was dipped to a depth of 5 cm. along its longitudinal axis. into a solution which was prepared by dissolving 300 g of Pb(NO 3 g of Cu(NO 3 H 0 and l g ofa wetting agent based on ethoxylated alcohols in water to make a total of 1 liter. and was coated at a temperature of from 60 to C for 3 hours. using a current of 0.8 A i 0.1 A 4 i 0.5 A/dm A copper sheet was used as the cathode. This treatment resulted in the deposition of 8.36 g of PbO- the geometrical surface area was 0.2 dm
The lead dioxide/titanium composite electrode thus produced was subjected to a current of 20 A 100 A/dm in approx. 20 percent strength sulfuric acid at from 30 to 35C for 100 hours. The weight loss of the anode at this current density was approx. 0.7 mg/ampere hour.
In the case ofa lead dioxide/titanium composite electrode produced analogously to the above but having an intermediate layer of zirconium disilicide instead of titanium disilicide. the weight loss under these conditions was approx. 0.8 mg/ampere hour. and if the intermediate layer consisted of niobium disilicide the weight loss was again approx. 0.8 mg/ampere hour.
EXAMPLE 5 An expanded titanium metal mesh was coated with tantalum disilicide of particle size from 20 to 40 ,U. by the method described in Example 4.
The mesh was then immersed, as the anode, into a lead-ll salt bath under the same conditions as in Example 4, causing the deposition of 9.84 g of PbO The weight loss of the lead dioxide/titanium composite electrode thus produced was approx. 0.9 mg/ampere hour under the conditions specified in Example 1.
EXAMPLE 6 Using the method described in Example 4. the mesh was first coated with chromium disilicide of particle size from 20 to 40 ,u and then with lead dioxide. 1 L g of PbOg deposited and the weight loss under the conditions specified in Example I was approx. 0.6 mg/ampere hour.
EXAMPLE 7 Using the method described in Example 4. the mesh was first coated with silicon carbide of particle size from 20 to 40 ,u. and then with lead dioxide. 9.41 g of Pb0 deposited and the weight loss under the conditions specified in Example 1 was approx. 0.5 mg/ampere hour.
EXAMPLE 8 moles of tantalum pentachloride at +800C, additional heat being supplied to the vapor mixture. To achieve a uniform coating, the reaction gases were fed into the reactor at different positions simultaneously. After a tantalum disilicide coating of 80 pt had deposited, the titanium mesh was coated with PbO- as described in Example 1, 10.08 g of PbO being deposited. Under the conditions specified in Example 1, the weight loss was approx. 0.5 mg/ampere hour.
We claim:
1. A process for the manufacture of a lead dioxide/- titanium composite electrode by anodic deposition of lead dioxide on a titanium surface, wherein an intermediate layer of a carbide or boride of an element of subgroup 4 or 5 and/or a silicide of an element of subgroup 4, 5 or 6 of the periodic table of the elements and/or silicon carbide, is applied to the titanium surface before depositing the lead dioxide.
2. A process as claimed in claim 1, wherein the carbide, boride. silicide and/0r silicon carbide is applied by a plasma spraying process, a flame spraying process or vapor deposition.
3. A process as claimed in claim 1, wherein a carbide or boride is applied in the form of a powder having a particle size of from 15 to a.
4. A process as claimed in claim 1, wherein a silicide and/or silicon carbide is applied by chemical vapor phase deposition.
5. A process as claimed in claim 1 wherein the intermediate layer applied is from 60 to 200 p. thick if it contains less than 20 percent by weight of silicide and- /or silicon carbide.
6. A process as claimed in claim 1 wherein a carbide or boride of titanium or tantalum or titanium disilicide, zirconium disilicide. tantalum disilicide, chromium disilicide or niobium disilicide is applied.
7. A process as claimed in claim 1, wherein a silicide is applied which is modified with a metal or halide of a metal of the iron group and the content of the modifying material, based on the pure metal, does not exceed a total of 5 percent by weight.
8. A process as claimed in claim 1 wherein the intermediate layer applied is from 20 to 200 p. thick if it contains more than 20 percent by weight of silicide and/or silicon carbide.
UNITED STATES PATENT AND TRADEMARK OFFICE CERTIFICATE OF CORRECTION PATENT NO. I 3,880,728 DATED April 29, 1975 |NV ENTOR(S) Wolfgang Haber'mann et a1.
It is certified that error appears in the above-identified patent and that said Letters Patent are hereby corrected as shown below:
In the Heading, insert [30] Foreign Application Priority Data- September 5, 1973 Germany 2344645 and July 29, 1974 Germany 2436394-- Signed and Sealed this SEAL! f rth Day of May 1976 A nest:
RUTH C. M A SON C. MARSHALL DANN Anestmg ()jjrver ('ummissimu'r uflahf'lls and Trademarks
Claims (8)
1. A PROCESS FOR THE MANUFACTURE OF A LEAD DIOXIDE/TITANIUM COMPOSITE ELECTRODE BY ANODIC DEPOSITION OF LEAD DIOXIDE ON A TITANIUM SURFACE, WHEREIN AN INTERMEDIATE LAYER OF A CARBIDE OR BORIDE OF AN ELEMENT OF SUB-GROUP 4 OR 5 AND/OR A SILICIDE OF AN ELEMENT OF SUB-GROUP 4, 5 OR 6 OF THE PERIOSIC TABLE OF THE ELEMENTS AND/OR SILICON CARBIDE, IS APPLIED TO THE TITANIUM SURFACE BEFORE DEPOSITING THE LEAD DIOXIDE.
2. A process as claimed in claim 1, wherein the carbide, boride, silicide and/or silicon carbide is applied by a plasma spraying process, a flame Spraying process or vapor deposition.
3. A process as claimed in claim 1, wherein a carbide or boride is applied in the form of a powder having a particle size of from 15 to 90 Mu .
4. A process as claimed in claim 1, wherein a silicide and/or silicon carbide is applied by chemical vapor phase deposition.
5. A process as claimed in claim 1 wherein the intermediate layer applied is from 60 to 200 Mu thick if it contains less than 20 percent by weight of silicide and/or silicon carbide.
6. A process as claimed in claim 1 wherein a carbide or boride of titanium or tantalum or titanium disilicide, zirconium disilicide, tantalum disilicide, chromium disilicide or niobium disilicide is applied.
7. A process as claimed in claim 1, wherein a silicide is applied which is modified with a metal or halide of a metal of the iron group and the content of the modifying material, based on the pure metal, does not exceed a total of 5 percent by weight.
8. A process as claimed in claim 1 wherein the intermediate layer applied is from 20 to 200 Mu thick if it contains more than 20 percent by weight of silicide and/or silicon carbide.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19732344645 DE2344645C3 (en) | 1973-09-05 | Process for the production of lead dioxide-titanium composite electrodes | |
| DE2436394A DE2436394A1 (en) | 1974-07-29 | 1974-07-29 | Lead dioxide coated titanium electrode mfr - with intermediate layer of carbide, boride or silicide of a transition metal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3880728A true US3880728A (en) | 1975-04-29 |
Family
ID=25765740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US502666A Expired - Lifetime US3880728A (en) | 1973-09-05 | 1974-09-03 | Manufacture of lead dioxide/titanium composite electrodes |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3880728A (en) |
| JP (1) | JPS5072878A (en) |
| CA (1) | CA1030482A (en) |
| CH (1) | CH592162A5 (en) |
| FR (1) | FR2242783B1 (en) |
| GB (1) | GB1476487A (en) |
| IT (1) | IT1019188B (en) |
| SE (1) | SE392622B (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038170A (en) * | 1976-03-01 | 1977-07-26 | Rhees Raymond C | Anode containing lead dioxide deposit and process of production |
| US4039403A (en) * | 1975-03-05 | 1977-08-02 | Imperial Metal Industries (Kynoch) Limited | Electrowinning metals |
| US4051000A (en) * | 1974-11-04 | 1977-09-27 | The International Nickel Company, Inc. | Non-contaminating anode suitable for electrowinning applications |
| US4057679A (en) * | 1974-09-06 | 1977-11-08 | P. R. Mallory & Co. Inc. | Organic electrolyte batteries |
| US4236978A (en) * | 1980-02-08 | 1980-12-02 | Rsr Corporation | Stable lead dioxide anode and method for production |
| ES2037614A1 (en) * | 1991-12-26 | 1993-06-16 | Tudor Acumulador | Bi-polar lead-lead di:oxide accumulator plate prodn. |
| US5407556A (en) * | 1992-11-11 | 1995-04-18 | Permelec Electrode Ltd. | Process of producing metallic foil by electrolysis |
| US20030136669A1 (en) * | 2002-01-03 | 2003-07-24 | Fritz Gestermann | Electrode for electrolysis in acidic media |
| US20090269666A1 (en) * | 2008-04-28 | 2009-10-29 | Edgar Lara-Curzio | Lightweight, Durable Lead-Acid Batteries |
| WO2013106419A1 (en) * | 2012-01-13 | 2013-07-18 | Energy Power Systems Llc. | Improved substrate for electrode of electrochemical cell |
| US8808914B2 (en) | 2012-01-13 | 2014-08-19 | Energy Power Systems, LLC | Lead-acid battery design having versatile form factor |
| CN104562094A (en) * | 2015-01-20 | 2015-04-29 | 昆明理工恒达科技股份有限公司 | Preparation method of gradient composite anode for nonferrous metals electrodeposition |
| US9263721B2 (en) | 2012-01-13 | 2016-02-16 | Energy Power Systems LLC | Lead-acid battery design having versatile form factor |
| US9595360B2 (en) | 2012-01-13 | 2017-03-14 | Energy Power Systems LLC | Metallic alloys having amorphous, nano-crystalline, or microcrystalline structure |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4040939A (en) * | 1975-12-29 | 1977-08-09 | Diamond Shamrock Corporation | Lead dioxide electrode |
| JPS5923890A (en) * | 1982-07-29 | 1984-02-07 | Plasma Giken Kogyo Kk | Insoluble electrode |
| CH665429A5 (en) * | 1985-04-04 | 1988-05-13 | Bbc Brown Boveri & Cie | Electrochemical cell anode - with titanium carbide layer between titanium support and lead di:oxide layer |
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|---|---|---|---|---|
| US2636856A (en) * | 1948-06-29 | 1953-04-28 | Mallory & Co Inc P R | Electrode for electrochemical oxidation |
| US3486940A (en) * | 1968-07-30 | 1969-12-30 | Samuel Ruben | Storage battery having a positive electrode comprising a supporting base of titanium nitride having a surface film of non-polarizing material |
| US3499795A (en) * | 1968-04-08 | 1970-03-10 | Samuel Ruben | Storage battery having electrodes comprising a supporting base of titanium nitride |
| US3649485A (en) * | 1968-10-02 | 1972-03-14 | Ppg Industries Inc | Electrolysis of brine using coated carbon anodes |
-
1974
- 1974-08-30 SE SE7411031A patent/SE392622B/en unknown
- 1974-08-30 JP JP49099067A patent/JPS5072878A/ja active Pending
- 1974-09-03 CA CA208,327A patent/CA1030482A/en not_active Expired
- 1974-09-03 US US502666A patent/US3880728A/en not_active Expired - Lifetime
- 1974-09-04 FR FR7430050A patent/FR2242783B1/fr not_active Expired
- 1974-09-04 GB GB3859574A patent/GB1476487A/en not_active Expired
- 1974-09-04 IT IT7452873A patent/IT1019188B/en active
- 1974-09-05 CH CH1207174A patent/CH592162A5/xx not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2636856A (en) * | 1948-06-29 | 1953-04-28 | Mallory & Co Inc P R | Electrode for electrochemical oxidation |
| US3499795A (en) * | 1968-04-08 | 1970-03-10 | Samuel Ruben | Storage battery having electrodes comprising a supporting base of titanium nitride |
| US3486940A (en) * | 1968-07-30 | 1969-12-30 | Samuel Ruben | Storage battery having a positive electrode comprising a supporting base of titanium nitride having a surface film of non-polarizing material |
| US3649485A (en) * | 1968-10-02 | 1972-03-14 | Ppg Industries Inc | Electrolysis of brine using coated carbon anodes |
| US3770613A (en) * | 1968-10-02 | 1973-11-06 | Nora Int Co | Novel electrode |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4057679A (en) * | 1974-09-06 | 1977-11-08 | P. R. Mallory & Co. Inc. | Organic electrolyte batteries |
| US4051000A (en) * | 1974-11-04 | 1977-09-27 | The International Nickel Company, Inc. | Non-contaminating anode suitable for electrowinning applications |
| US4039403A (en) * | 1975-03-05 | 1977-08-02 | Imperial Metal Industries (Kynoch) Limited | Electrowinning metals |
| US4038170A (en) * | 1976-03-01 | 1977-07-26 | Rhees Raymond C | Anode containing lead dioxide deposit and process of production |
| US4236978A (en) * | 1980-02-08 | 1980-12-02 | Rsr Corporation | Stable lead dioxide anode and method for production |
| ES2037614A1 (en) * | 1991-12-26 | 1993-06-16 | Tudor Acumulador | Bi-polar lead-lead di:oxide accumulator plate prodn. |
| US5407556A (en) * | 1992-11-11 | 1995-04-18 | Permelec Electrode Ltd. | Process of producing metallic foil by electrolysis |
| US7211177B2 (en) * | 2002-01-03 | 2007-05-01 | Bayer Aktiengesellschaft | Electrode for electrolysis in acidic media |
| US20030136669A1 (en) * | 2002-01-03 | 2003-07-24 | Fritz Gestermann | Electrode for electrolysis in acidic media |
| CN100415937C (en) * | 2002-01-03 | 2008-09-03 | 拜尔材料科学股份公司 | Electrode for electrolysis in acidic media |
| US20090269666A1 (en) * | 2008-04-28 | 2009-10-29 | Edgar Lara-Curzio | Lightweight, Durable Lead-Acid Batteries |
| US8017273B2 (en) * | 2008-04-28 | 2011-09-13 | Ut-Battelle Llc | Lightweight, durable lead-acid batteries |
| US8445138B2 (en) | 2008-04-28 | 2013-05-21 | Ut-Battelle Llc | Lightweight, durable lead-acid batteries |
| WO2013106419A1 (en) * | 2012-01-13 | 2013-07-18 | Energy Power Systems Llc. | Improved substrate for electrode of electrochemical cell |
| US8808914B2 (en) | 2012-01-13 | 2014-08-19 | Energy Power Systems, LLC | Lead-acid battery design having versatile form factor |
| US9263721B2 (en) | 2012-01-13 | 2016-02-16 | Energy Power Systems LLC | Lead-acid battery design having versatile form factor |
| US9595360B2 (en) | 2012-01-13 | 2017-03-14 | Energy Power Systems LLC | Metallic alloys having amorphous, nano-crystalline, or microcrystalline structure |
| CN104562094A (en) * | 2015-01-20 | 2015-04-29 | 昆明理工恒达科技股份有限公司 | Preparation method of gradient composite anode for nonferrous metals electrodeposition |
| CN104562094B (en) * | 2015-01-20 | 2016-11-16 | 昆明理工恒达科技股份有限公司 | A kind of preparation method of non-ferrous metal electrodeposition graded composite anode |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2242783B1 (en) | 1981-04-17 |
| SE392622B (en) | 1977-04-04 |
| GB1476487A (en) | 1977-06-16 |
| JPS5072878A (en) | 1975-06-16 |
| SE7411031L (en) | 1975-03-06 |
| FR2242783A1 (en) | 1975-03-28 |
| CH592162A5 (en) | 1977-10-14 |
| CA1030482A (en) | 1978-05-02 |
| IT1019188B (en) | 1977-11-10 |
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