US3787302A - Photo-sensitive cross-linking agents for high molecular weight materials - Google Patents
Photo-sensitive cross-linking agents for high molecular weight materials Download PDFInfo
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- US3787302A US3787302A US00082219A US3787302DA US3787302A US 3787302 A US3787302 A US 3787302A US 00082219 A US00082219 A US 00082219A US 3787302D A US3787302D A US 3787302DA US 3787302 A US3787302 A US 3787302A
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- high molecular
- molecular weight
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- 239000000463 material Substances 0.000 title claims abstract description 24
- 239000003431 cross linking reagent Substances 0.000 title claims abstract description 19
- 125000003118 aryl group Chemical group 0.000 claims abstract description 43
- 229920001744 Polyaldehyde Polymers 0.000 claims abstract description 36
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000002605 large molecules Chemical class 0.000 claims description 51
- 238000004132 cross linking Methods 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 25
- -1 polyethylene Polymers 0.000 claims description 24
- 230000005855 radiation Effects 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 19
- 229920001971 elastomer Polymers 0.000 claims description 18
- 239000005060 rubber Substances 0.000 claims description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- IZALUMVGBVKPJD-UHFFFAOYSA-N benzene-1,3-dicarbaldehyde Chemical compound O=CC1=CC=CC(C=O)=C1 IZALUMVGBVKPJD-UHFFFAOYSA-N 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000004698 Polyethylene Substances 0.000 claims description 9
- 229920001577 copolymer Polymers 0.000 claims description 9
- 229920000573 polyethylene Polymers 0.000 claims description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 8
- 239000004793 Polystyrene Substances 0.000 claims description 8
- 229920002223 polystyrene Polymers 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 244000043261 Hevea brasiliensis Species 0.000 claims description 7
- 229920003052 natural elastomer Polymers 0.000 claims description 7
- 229920001194 natural rubber Polymers 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 229920006305 unsaturated polyester Polymers 0.000 claims description 7
- 229920000877 Melamine resin Polymers 0.000 claims description 6
- 239000002033 PVDF binder Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 6
- 229920001807 Urea-formaldehyde Polymers 0.000 claims description 6
- 229920000180 alkyd Polymers 0.000 claims description 6
- 229920005549 butyl rubber Polymers 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 6
- 239000007849 furan resin Substances 0.000 claims description 6
- 239000005011 phenolic resin Substances 0.000 claims description 6
- 229920000058 polyacrylate Polymers 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 125000003367 polycyclic group Chemical group 0.000 claims description 6
- 229920000647 polyepoxide Polymers 0.000 claims description 6
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 6
- 229920003048 styrene butadiene rubber Polymers 0.000 claims description 6
- 229920001328 Polyvinylidene chloride Polymers 0.000 claims description 5
- HDNHWROHHSBKJG-UHFFFAOYSA-N formaldehyde;furan-2-ylmethanol Chemical compound O=C.OCC1=CC=CO1 HDNHWROHHSBKJG-UHFFFAOYSA-N 0.000 claims description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 5
- 229920001084 poly(chloroprene) Polymers 0.000 claims description 5
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 229920000193 polymethacrylate Polymers 0.000 claims description 5
- 229920002635 polyurethane Polymers 0.000 claims description 5
- 239000004814 polyurethane Substances 0.000 claims description 5
- 239000004800 polyvinyl chloride Substances 0.000 claims description 5
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 5
- 239000005033 polyvinylidene chloride Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 claims description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 claims description 3
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 claims description 2
- 239000004705 High-molecular-weight polyethylene Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 description 16
- 150000003254 radicals Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 9
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 8
- 230000009471 action Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 125000003172 aldehyde group Chemical group 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920001038 ethylene copolymer Polymers 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- HDERJYVLTPVNRI-UHFFFAOYSA-N ethene;ethenyl acetate Chemical group C=C.CC(=O)OC=C HDERJYVLTPVNRI-UHFFFAOYSA-N 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- IBNLLMKGXOOWHH-UHFFFAOYSA-N 2,4,6-trimethylbenzene-1,3,5-tricarbaldehyde Chemical compound CC1=C(C=O)C(C)=C(C=O)C(C)=C1C=O IBNLLMKGXOOWHH-UHFFFAOYSA-N 0.000 description 2
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 2
- FPYUJUBAXZAQNL-UHFFFAOYSA-N 2-chlorobenzaldehyde Chemical compound ClC1=CC=CC=C1C=O FPYUJUBAXZAQNL-UHFFFAOYSA-N 0.000 description 2
- AVPYQKSLYISFPO-UHFFFAOYSA-N 4-chlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1 AVPYQKSLYISFPO-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011243 crosslinked material Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 2
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- CWGBFIRHYJNILV-UHFFFAOYSA-N (1,4-diphenyl-1,2,4-triazol-4-ium-3-yl)-phenylazanide Chemical compound C=1C=CC=CC=1[N-]C1=NN(C=2C=CC=CC=2)C=[N+]1C1=CC=CC=C1 CWGBFIRHYJNILV-UHFFFAOYSA-N 0.000 description 1
- ZSQCNVWYBBKUHS-UHFFFAOYSA-N (2,3-dimethylphenyl)-phenylmethanone Chemical compound CC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1C ZSQCNVWYBBKUHS-UHFFFAOYSA-N 0.000 description 1
- GRDGBWVSVMLKBV-UHFFFAOYSA-N (2-amino-5-nitrophenyl)-(2-chlorophenyl)methanone Chemical compound NC1=CC=C([N+]([O-])=O)C=C1C(=O)C1=CC=CC=C1Cl GRDGBWVSVMLKBV-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- YBKWKURHPIBUEM-UHFFFAOYSA-N 2-methyl-n-[6-(2-methylprop-2-enoylamino)hexyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCCCCNC(=O)C(C)=C YBKWKURHPIBUEM-UHFFFAOYSA-N 0.000 description 1
- CMWKITSNTDAEDT-UHFFFAOYSA-N 2-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=CC=C1C=O CMWKITSNTDAEDT-UHFFFAOYSA-N 0.000 description 1
- HXUIDZOMTRMIOE-UHFFFAOYSA-N 3-oxo-3-phenylpropionic acid Chemical compound OC(=O)CC(=O)C1=CC=CC=C1 HXUIDZOMTRMIOE-UHFFFAOYSA-N 0.000 description 1
- BXRFQSNOROATLV-UHFFFAOYSA-N 4-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(C=O)C=C1 BXRFQSNOROATLV-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229920003345 ElvaxĀ® Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 159000000032 aromatic acids Chemical class 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 description 1
- 239000004299 sodium benzoate Substances 0.000 description 1
- 235000010234 sodium benzoate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01Ā -Ā C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
Definitions
- ABSTRACT novel photo-sensitive cross-linking agents for high molecular weight materials comprising aromatic polyaldehydes and derivatives thereof, of the formula:
- a divalent benzene ring a substituted divalent benzene ring or a divalent polycyclic aromatic ring.
- the aforementioned formulae may be substituted by a variety of groups described hereinafter in the specification. However, ortho-dialdehydes are excluded from the scope of the present invention.
- the present invention relates to a process for modifying a high molecular weight compound or a product thereof by radiation with light, and more particularly, to a process for modifying a high molecular weight compound by incorporating therein a small amount of an aromatic polyaldehyde, or a derivative thereof, or a small amount of an aromatic polyaldehyde, or a derivative thereof, and a photo-active cross-linking agent and subjecting it to light radiation.
- the primary object of the present invention is to improve the physiochemical and mechanical properties of high molecular weight compounds or shaped material made from such compounds, such as solvent resistance, mechanical characteristics, heat resistance, and electrical characteristics by conducting a cross-linking reaction by light radiation to form a three-dimensional network structure.
- photo-sensitizers used for such a purpose there are benzophenone and 2- methylanthraquinone.
- other sensitizers such as aromatic carbonyl compounds such as chlorobenzophenone, dimethylbenzophenone, acetophenone, benzoin, and benzoylacetic acid; aromatic acids, acid amides, acid esters, salts and derivatives thereof, such as benzoic acid, benzamide, methyl benzoate, sodium benzoate, isophthalic acid, and the like; organic compounds containing a photosensitive halogen atom such as monochloroacetic acid, trichloroacetic acid, etc.; and aromatic aldehydes such as benzaldehyde, nitrobenzaldehyde, chlorobenzaldehyde and the like.
- Such a photosensitizer is decomposed by absorbing light having wave lengths of 200-600 mg to provide a free radical, which catches hydrogen from the high molecular weight compound to provide a polymer radical.
- the high molecular weight compound is cross-linked by the polymer radicals combining with each other.
- sensitizers are known as mentioned above, very few have been utilized industrially, since when such sensitizers are added to high molecular weight compounds, the industrially-required cross-linking rate cannot be obtained, and further, when high molecular weight compounds are crosslinked by the action of light using such sensitizers, the properties, particularly the mechanical strength, of the high molecular weight compounds are reduced compared with the compounds before the cross-linking operation.
- the present inventors have endeavored to develop sensitizers having industrially suitable properties without having the aforesaid disadvantages, and as a result thereof, it has been discovered that aromatic polyaldehydes and derivatives thereof are very effective for the above-mentioned purposes.
- the present invention provides novel photo-sensitive cross-linking agents for high molecular weight materials comprising aromatic polyaldehydes and derivatives thereof, of the formula:
- a divalent benzene ring a substituted divalent benzene ring or a divalent polycyclic aromatic ring.
- the aforementioned formulae may be substituted by a variety of groups described hereinafter in the specification.
- ortho-dialdehydes are excluded from the scope of the present invention.
- Il -R and R -R each may be a monovalent group such as a hydrogen atom, an alkyl group, a nitro group or a halogen atom, or an aldehyde group. Furthermore, at least two of these groups may be substituted by divalent groups bonded by a bridged or a ring structure, such as, for example, groups having the following structures:
- aromatic heterocyclic groups having a cross-linked structure, wherein a carbon atom, an oxygen atom, a silicon atom or a phosphorus atom is the bridging atom, and substituted groups thereof, or directly bonded rings and substituted rings thereof such as biphenylene, naphthalene, and anthracene.
- aromatic polyaldehydes and derivatives thereof are isophthaldialdehyde, terephthaldialdehyde, mesitylene trialdehyde, 2-methylterephthaldialdehyde, 3methyl-terephthaldehyde, 2- chloroterephthaldialdehyde, 2,4-dimethylterephthaldialdehyde, 2-nitroisophthaldialdehyde, and also compounds having the following structures:
- the aromatic polyaldehydes of the present invention are effective as sensitizers for effecting cross-linking by the action of light and when they are introduced into high molecular weight compounds, they maintain their sensitivity. That is, when the aromatic polyaldehydes are introduced into straight-chain high molecular weight compounds by means of copolymerization or condensation, the high molecular weight compounds also have sensitivity and when the photosensitive high molecular weight compounds are used as sensitizers, a uniform distribution of the sensitizing groups in the high molecular weight compounds to be cross-linked is obtained and the transfer of the sensitizer molecules in the high molecular weight compounds, as is usually observed in monomer sensitizers, can be prevented.
- thermosetting high molecular weight compounds as unsaturated polyesters, alkyd resin, an epoxy resin, a phenol resin, a furan resin, a xylol resin, a urea-formaldehyde resin, a melamine resin, etc.; such thermoplastic high molecular weight compounds as polyolefins, e.g., polyethylene, polypropylene, an ethylenevinyl acetate copolymer, etc.; polystyrene, polyacrylates, polymethacrylates, a poly(acrylic acid-butyl acrylate) copolymer, polyvinyl chloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyesters, polyamides, polyurethanes
- silicon-polymers and fluorine-polymers such as polyvinylidene fluoride can be effectively used in this invention'
- fluorine-polymers specifically, polytetrafluoroethylene in which all the hydrogen atoms bonded to the carbon atoms have been substituted with fluorine atoms, decomposition occurs rather than cross-linking.
- the sensitizers shown above have had compatibility with water-soluble polyvinyl alcoholic polymers. Therefore, when such polymers are employed, effective cross-linkage cannot be obtained.
- the amount of the aromatic polyaldehyde to be added to the high molecular weight compound for cross-linking is 0.01-20 percent by weight, preferably 0.1-5 percent by weight, based on the weight of the high molecular weight compound. If the amount is lower than 0.01 percent, the cross-linking effect is less, while if the amount is higher than 20 percent by weight, the cost for the sensitizer is increased, the sensitizer combines with each other when the system is subjected to active light exposure, and, in addition, the permeability of active light through the cross-linking system is lowered, which results in a lowering of the crosslinking rate and a reduction in the properties of the high molecular weight compound after cross-linking.
- aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any combination of the aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any aromatic polyaldehy
- the sensitizer is homogeneously mixed with the high molecular weight compound
- the sensitizer is homogeneously mixed with the high molecular weight compound
- any suitable method may be employed.
- the high molecular weight compound can be provided with photosensitivity by adding thereto only the aromatic polyaldehyde of the present invention.
- a photoactive cross-linking agent shown below together with the aforesaid sensitizer the cross-linking rate can be increased and the properties of the crosslinked high molecular weight compound can be improved.
- the photo-active cross-linking agent is a compound which is activated by absorbing energy from the sensitizer, whereby it contributes to the cross-linking of the high molecular weight compound.
- Examples of such compounds are N,N'-hexame' thylenebisacrylamide, N,N-hexamethylenebismethacrylamide, 5-acrylamino-N-acrylocaproamide, ethyleneglycol dimethacrylate, and a polyethyleneglycoldimethacrylate such as triethyleneglycol dimethacrylate.
- the amount of the photoactive cross-linking agent which may be employed is 1-50 percent by weight, preferably 5-10 percent by weight, based on the weight of the high molecular weight compound. If the amount added is lower than 1 percent by weight, the effect of addition is less and if the amount is higher than 50 percent by weight, the cross-linking density of the high molecular weight compound thus cross-linked is too high, and hence the elasticity and plasticity of the cross-linked product are reduced.
- a low potential, high potential or super-high potential mercury lamp, a xenon lamp, a carbon arc and the like which can emit light having wave lengths of 200-600 my.
- a low potential or high potential mercury lamp which is an ultraviolet source of light having wave lengths of 200-400 mu is preferably used.
- the present invention will now be explained by referring to a general embodiment thereof. That is, 0.01 percent by weight or more of the aromatic polyaldehyde of the present invention is first added to the high molecular weight compound or a solution thereof and then formed into a shaped article by means of casting, pressing or extruding.
- the shaped article can be sufficiently cross-linked and modified within from several seconds to several ten minutes.
- the cross-linked high molecular weight compound obtained by the above method is not colored and the appearance thereof is the same as that of the compound before cross-linking.
- the cross-linked material 1S immersed in a solvent the material is not dissolved in the solvent and only the undissolved portion the high molecular weight compound is remarkably improved.
- a high molecular weight compound cross-linked using a conventional sensitizer such as benzophenone, 2- methylanthraquinone, benzaldehyde, etc., has an inferior cross-linking rate, inferior mechanical properties and a lower heat resistance.
- equation (2) occurs to reduce the proportion of the polymer radical and hence the rate of the cross-linking reaction by the combination of the polymer radicals with each other is reduced, and in addition the number of cross-linked points is reduced, whereby the increase of the mechanical strength and the heat resistance of the high molecular weight compound is obstructed.
- the sensitizing group grafted to the high molecular weight compound by the reaction shown in equation (2) has the photosensitive aldehyde group, and it is thought that, as shown in the following reaction equation (3), a radical is formed by the photodecomposition of the aldehyde group and this radical is recombined with other polymer radicals to induce the cross-linking mas a-
- a radical is formed by the photodecomposition of the aldehyde group and this radical is recombined with other polymer radicals to induce the cross-linking mas a-
- the sensitizer is also introduced into the chain of the cross-link as the structure of -R, a benzol ring such as in the case of isophthalaldehyde, and the formation of the structure of the cross-link is considered to be an important factor in improving the mechanical properties and the heat resistance of the high molecular weight compound.
- a photo cross-linking process has the advantage that the cross-linking can be conducted continuously by using an inexpensive apparatus without using heat as compared with a thermal cross-linking method using a peroxide or the like and a cross-linking method by high energy radiation.
- EXAMPLE 1 High pressure method polyethylene have a density of 0.918 and a melt index of 1.2 was mixed with 0.5 percent isophthaldialdehyde and a film having a thickness of 100 p. was prepared from the mixture by means of press molding.
- the film was then exposed to a commercially available 400 watt high potential mercury lamp (main wave length: 300-360 m) at a distance of 20 cm at room temperature in air.
- the exposed film was not colored and the appearance thereof was almost the same as that of the original film.
- the treated film was immersed in hot xylol, the film was not completely dissolved and insoluble gel was formed.
- the weight percentage of the weight of the insoluble gel to the weight of the polymer before immersion in the solvent was defined to be the gel ratio and the change of the gel ratio was measured, the results of which are shown in Table l. The maximum value was obtained after about 5-10 minutes.
- the gel ratio is not inferior to a gel ratio of 78 percent obtained by another cross-linking method, for example, a thermal crosslinking method (2.5 percent dicumyl peroxide was added and the mixture was heated for 1 hour to 150C) and it will be understood how quickly the gel ratio was obtained.
- EXAMPLE 3 After mastificating a natural rubber (pale crepe) for about 5 minutes by means of a roll, 0.5 percent of isophthaldialdehyde was mixed with the rubber and then the mixture was dissolved in toluene. From the solution was prepared a film of a thickness of p by means of casting and the film was then exposed to light as in Example 1, whereby the film was immediately endowed with rubber elastivity, which indicated the start of cross-linking. On the other hand, in case of light exposing only the natural rubber without adding the sensitizer, the rubber was degraded by the light exposure,
- Silicone oil (Silicone Oil KF-99, trade name, made by Shinetsu Chemical Co.) was mixed with 1 percent of mesitylene trialdehyde and the mixture was light exposed as in Example 1. The viscosity of the liquid oil was increased by the radiation and the whole oil because a solid gel completely after about 5 minutes. When the product was immersed in a solvent, it was only swelled without being dissolved, which showed the formation of the network structure.
- EXAMPLE 5 To an unsaturated polyester (a solution mixture of styrene and a polyester prepared from maleic anhydride, phthalic acid, and ethylene glycol), e.g., Nitron P-l2l (trade name, made by Nitto Denki Kogyo l(.K.) was added 1 percent of terephthalaldehyde and the liquid was light-exposed according to the manner of Example 1, whereby the viscosity was immediately increased and after 10 minutes, the liquid was completely converted into a hard solid.
- Nitron P-l2l trade name, made by Nitto Denki Kogyo l(.K.
- EXAMPLE 6 A vinyl acetate-ethylene copolymer containing 45 percent vinyl acetate (Evalex No. 15, trade name, made by Mitsui Polychemical Co.) was dissolved in xylol and after adding thereto 0.5 percent of isophthaldialdehyde and 10 percent of tetraethylene glycol dimethacrylate, based on the weight of the resin, a film was prepared from the solution as in Example 2 and light-exposed.
- the addition of the photoactive cross-linking agent increased the cross-linking effect and also increased the rate of the formation of the gel ratio as shown in vinylisophthaldialdehyde was dissolved in toluene in a monomer concentration of 30 percent and benzoyl peroxide in an amount of 0.5 percent based on the weight of the monomers was added to the solution, and the system was copolymerized for 5 hours at C. By reprecipitating the polymer thus formed from methanol, the copolymer was purified and separated.
- the copolymer was added to polystyrene (Stylon 666, trade name, made by Asahi Dow Co.) in an amount of 10 percent based on the weight of polystyrene and a film was prepared from the mixture and exposed to light as in Example 1.
- polystyrene Stylon 666, trade name, made by Asahi Dow Co.
- a gel ratio of 70 percent was obtained by radiation for 5 minutes.
- COMPARISON EXAMPLE l As in Example 2 and Example 6, a film was prepared from a mixture of a vinyl acetate-ethylene copolymer containing 45 percent vinyl acetate (Evaflex No. 15', trade name, made by Mitsui Polychemical Co.) and 0.5 percent by weight of a conventional sensitizer such as benzophenone, 2-methyl anthraquinone, isophthalic acid, benzoin, trichloroacetic acid, benzaldehyde, pchlorobenzaldehyde, terephthalaldehydric acid, 0- hydroxybenzaldehyde, p-nitrobenzaldehyde, and pmethylbenzaldehyde and the film was exposed to a 400 watt high potential mercury lamp for one minute. The gel ratios of the various cases were measured, the results of which are shown in the following table 5.
- a conventional sensitizer such as benzophenone, 2-methyl anthraquinone, isophthalic acid, benzo
- COMPARISON EXAMPLE 2 Three kinds of films, each having a thickness of [.L, were prepared from mixtures of high pressure method polyethylene having a density of 0.918 and a melt index of 1.2 and 0.5 percent by weight of each of isophthaldialdehyde, 2-methylanthraquinone, and pchlorobenzaldehyde, respectively, and then each of the films was light exposed for various periods of time. From the films a sample of 1.0 cm X 7 cm was cut and the zero strength temperature thereof was measured. The zero strength temperature was the temperature at which the film was broken when a load of 20 g was suspended from an end of the sample film and the temperature was increased from room temperature at the rate of 3C/min.
- the zero strength temperature shows the heat resistance of the film sample.
- the results are acetate (Elvax, trade name. made by Mitsui Polychemical Co.) and 0.5 percent by weight of ophthaldialdehyde was light exposed for 30 minutes. a product having a gel ratio of only 3 percent was obshown in Table 6. 5 tained.
- composition of claim 1 wherein, said aromatic polyaldehyde is present in. an amount of from 0.01 to 20 percent, by weight, based on the weight of said high molecular weight material.
- a composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 mp. consisting essentially of a high molecular weight material selected from the group consisting of polyethylene, polypropylene, ethylene-vinyl acetate copolymers, polystyrene, polyacrylates, polymethacrylates, polyvinylchloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyamides, polyurethanes, unsaturated polyesters, epoxy resins, xylol resins, ureaformaldehyde resins, melamine resins, natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrene-butadiene copolymer rubbers, neoprene rubbers, alkyd resins, phenol resins, furan resins, a silicon resin, and polyvinylidene fluoride, a photoactive cross-linking agent selected from the group
- R through R and R through R are each selected from-the group consisting of a hydrogen atom, an alkyl group, a nitro group, a halogen atom and an aldehyde group, and wherein R is a divalent group selected from the group consisting of an alkylene chain of 1 to 3 carbon atoms, a silicon of and a sulfur of SO wherein R and R are selected from those groups which will not adversely affect the properties of said aromatic polyaldehyde, with the proviso that the CHO- groups in said formula are not ortho with respect to each other, said high molecular weight material being capable of being cross-linked by the action of light in the presence of said photosensitive cross-linking agent.
- composition of claim 3 wherein said photoactive cross-linking agent is present in an amount of from 1 to 50 percent, by weight, based on the weight of said high molecular weight material.
- a composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 my. consisting essentially of a high molecular weight polyethylene and isophthaldialdehyde.
- R is a divalent benzene group, a substituted divalent benzene group, a divalent polycyclic aromatic or e ssele ssi item best w misting of wherein R through R, and R, through R are each selected from the group consisting of a hydrogen atom, an alkyl group, a nitro group, a halogen atom and an aldehyde group, and wherein R is a divalent group selected from the group consisting of an alkylene chain of 1 to 3 carbon atoms, a silicon of a phosphorus of 7.
- said aromatic polyaldehyde is present in an amount of from 0.01 to 20 percent by weight, based on the weight of said high molecular weight material.
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Abstract
The present invention provides novel photo-sensitive crosslinking agents for high molecular weight materials comprising aromatic polyaldehydes and derivatives thereof, of the formula: CHO-R-CHO wherein R is an aromatic radical of the formulae:
A DIVALENT BENZENE RING, A SUBSTITUTED DIVALENT BENZENE RING OR A DIVALENT POLYCYCLIC AROMATIC RING. The afore-mentioned formulae may be substituted by a variety of groups described hereinafter in the specification. However, ortho-dialdehydes are excluded from the scope of the present invention.
A DIVALENT BENZENE RING, A SUBSTITUTED DIVALENT BENZENE RING OR A DIVALENT POLYCYCLIC AROMATIC RING. The afore-mentioned formulae may be substituted by a variety of groups described hereinafter in the specification. However, ortho-dialdehydes are excluded from the scope of the present invention.
Description
nited States Patent [191 him et al.
[451 Jan. 22, 1974 Filed: Oct. 19, 1970 Appl. No.: 82,219
Assignee:
[52] US. Cl..... 204/159.2, 204/l59.l3, 204/lS9.l4, 204/159.l5, 204/I59.16, 204/159.17, 204/l59.l9, 204/l59.23, 204/l60.1, 260/4 Int. Cl. B0lj 1/10, C08f 1/20 {58] Field of Search 204/159.23, 159.14, 159.2,
References Cited UNITED STATES PATENTS Burg 204 159.23
Roed'el 204/l59.14
FOREIGN PATENTS OR APPLICATIONS 665,813 7/1963 Canada 204/l59.2
Primary Examiner-John C. Bleutge Attorney, Agent, or Firm-Sughrue, Rothwell, Mion, Zinn & Macpeak [5 7] ABSTRACT The present invention provides novel photo-sensitive cross-linking agents for high molecular weight materials comprising aromatic polyaldehydes and derivatives thereof, of the formula:
CI-IO-R-CI-IO wherein R is an aromatic radical of th e formulae: v
Q'QQ,
a divalent benzene ring, a substituted divalent benzene ring or a divalent polycyclic aromatic ring. The aforementioned formulae may be substituted by a variety of groups described hereinafter in the specification. However, ortho-dialdehydes are excluded from the scope of the present invention.
8 Claims, No Drawings PHOTO-SENSITIVE CROSS-LINKING AGENTS FOR HIGH MOLECULAR WEIGHT MATERIALS BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process for modifying a high molecular weight compound or a product thereof by radiation with light, and more particularly, to a process for modifying a high molecular weight compound by incorporating therein a small amount of an aromatic polyaldehyde, or a derivative thereof, or a small amount of an aromatic polyaldehyde, or a derivative thereof, and a photo-active cross-linking agent and subjecting it to light radiation.
2. Description ofthe Prior Art The primary object of the present invention is to improve the physiochemical and mechanical properties of high molecular weight compounds or shaped material made from such compounds, such as solvent resistance, mechanical characteristics, heat resistance, and electrical characteristics by conducting a cross-linking reaction by light radiation to form a three-dimensional network structure.
In general, in order to cross-link a high molecular weight material by the action of light, it is necessary that the material have a photosensitive group in its structure. However, conventional high molecular weight materials do not exhibit photosensitivity due to the lack of such a photosensitive group. Therefore, in order to render these high molecular weight materials photosensitive, it has been suggested to add a small amount of a photosensitizer to the compounds.
As well-known photo-sensitizers used for such a purpose, there are benzophenone and 2- methylanthraquinone. In addition, there are generally known other sensitizers such as aromatic carbonyl compounds such as chlorobenzophenone, dimethylbenzophenone, acetophenone, benzoin, and benzoylacetic acid; aromatic acids, acid amides, acid esters, salts and derivatives thereof, such as benzoic acid, benzamide, methyl benzoate, sodium benzoate, isophthalic acid, and the like; organic compounds containing a photosensitive halogen atom such as monochloroacetic acid, trichloroacetic acid, etc.; and aromatic aldehydes such as benzaldehyde, nitrobenzaldehyde, chlorobenzaldehyde and the like.
It is believed that such a photosensitizer is decomposed by absorbing light having wave lengths of 200-600 mg to provide a free radical, which catches hydrogen from the high molecular weight compound to provide a polymer radical. The high molecular weight compound is cross-linked by the polymer radicals combining with each other.
However, although many sensitizers are known as mentioned above, very few have been utilized industrially, since when such sensitizers are added to high molecular weight compounds, the industrially-required cross-linking rate cannot be obtained, and further, when high molecular weight compounds are crosslinked by the action of light using such sensitizers, the properties, particularly the mechanical strength, of the high molecular weight compounds are reduced compared with the compounds before the cross-linking operation.
The present inventors have endeavored to develop sensitizers having industrially suitable properties without having the aforesaid disadvantages, and as a result thereof, it has been discovered that aromatic polyaldehydes and derivatives thereof are very effective for the above-mentioned purposes.
SUMMARY OF THE INVENTION The present invention provides novel photo-sensitive cross-linking agents for high molecular weight materials comprising aromatic polyaldehydes and derivatives thereof, of the formula:
CHO-R-CHO wherein R is an aromatic radical of the formulae:
a divalent benzene ring, a substituted divalent benzene ring or a divalent polycyclic aromatic ring. The aforementioned formulae may be substituted by a variety of groups described hereinafter in the specification.
However, ortho-dialdehydes are excluded from the scope of the present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS group thereof, or a divalent polycyclic aromatic ring.
wherein Il -R and R -R each may be a monovalent group such as a hydrogen atom, an alkyl group, a nitro group or a halogen atom, or an aldehyde group. Furthermore, at least two of these groups may be substituted by divalent groups bonded by a bridged or a ring structure, such as, for example, groups having the following structures:
/\ l 2 I 1 I h/ R is a divalent group, for example, an alkylene chain having 1-3 carbon atoms, a silicon atom of a group such as a phosphorus atom of a group such as a sulfur atom of SO wherein R and R are individually selected from the group consisting of H, X, Cl-l C l-l C H CH =CH, wherein X is a halogen atom.
As such divalent polycyclic aromatic rings, there may be illustrated aromatic heterocyclic groups having a cross-linked structure, wherein a carbon atom, an oxygen atom, a silicon atom or a phosphorus atom is the bridging atom, and substituted groups thereof, or directly bonded rings and substituted rings thereof such as biphenylene, naphthalene, and anthracene.
Examples of the aforesaid aromatic polyaldehydes and derivatives thereof are isophthaldialdehyde, terephthaldialdehyde, mesitylene trialdehyde, 2-methylterephthaldialdehyde, 3methyl-terephthaldehyde, 2- chloroterephthaldialdehyde, 2,4-dimethylterephthaldialdehyde, 2-nitroisophthaldialdehyde, and also compounds having the following structures:
OHC- --0H0,
CHO HO if I w l CH 0CHO, and
However, it has further been discovered that arositizers since the light absorbed by such polyaldehydes does not contribute to the cross-linkage and, further, they have the effect of releasing the absorbed light as light having longer wave lengths.
It has also been discovered that the aromatic polyaldehydes of the present invention are effective as sensitizers for effecting cross-linking by the action of light and when they are introduced into high molecular weight compounds, they maintain their sensitivity. That is, when the aromatic polyaldehydes are introduced into straight-chain high molecular weight compounds by means of copolymerization or condensation, the high molecular weight compounds also have sensitivity and when the photosensitive high molecular weight compounds are used as sensitizers, a uniform distribution of the sensitizing groups in the high molecular weight compounds to be cross-linked is obtained and the transfer of the sensitizer molecules in the high molecular weight compounds, as is usually observed in monomer sensitizers, can be prevented.
Any high molecular weight compound may be used as the high molecular weight compound which can be cross-linked by the action of light by incorporating therein the above-mentioned aromatic polyaldehydes a sen z For example, there are illustrated such thermosetting high molecular weight compounds as unsaturated polyesters, alkyd resin, an epoxy resin, a phenol resin, a furan resin, a xylol resin, a urea-formaldehyde resin, a melamine resin, etc.; such thermoplastic high molecular weight compounds as polyolefins, e.g., polyethylene, polypropylene, an ethylenevinyl acetate copolymer, etc.; polystyrene, polyacrylates, polymethacrylates, a poly(acrylic acid-butyl acrylate) copolymer, polyvinyl chloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyesters, polyamides, polyurethanes, polyesters, etc.; and rubbery high molecular weight compounds such as natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrenebutadiene copolymer rubbers, neoprene rubbers, etc.
It has also been found that silicon-polymers and fluorine-polymers such as polyvinylidene fluoride can be effectively used in this invention' However, among certain fluorine-polymers, specifically, polytetrafluoroethylene in which all the hydrogen atoms bonded to the carbon atoms have been substituted with fluorine atoms, decomposition occurs rather than cross-linking. In addition, the sensitizers shown above have had compatibility with water-soluble polyvinyl alcoholic polymers. Therefore, when such polymers are employed, effective cross-linkage cannot be obtained.
The amount of the aromatic polyaldehyde to be added to the high molecular weight compound for cross-linking is 0.01-20 percent by weight, preferably 0.1-5 percent by weight, based on the weight of the high molecular weight compound. If the amount is lower than 0.01 percent, the cross-linking effect is less, while if the amount is higher than 20 percent by weight, the cost for the sensitizer is increased, the sensitizer combines with each other when the system is subjected to active light exposure, and, in addition, the permeability of active light through the cross-linking system is lowered, which results in a lowering of the crosslinking rate and a reduction in the properties of the high molecular weight compound after cross-linking.
The aromatic polyaldehydes of this invention may be incorporated in the high molecular weight compound to be cross-linked by various methods. Generally, any
method by which the sensitizer is homogeneously mixed with the high molecular weight compound may be employed; specifically, by roll kneading or by adding the sensitizer to a solution of the high molecular weight compound in a suitable solvent or by immersing the high molecular weight compound in a solution of the sensitizer in a suitable solvent. It is clear to one of ordinary skill in the art that any suitable method may be employed.
The high molecular weight compound can be provided with photosensitivity by adding thereto only the aromatic polyaldehyde of the present invention. However, by further adding to the high molecular weight material a photoactive cross-linking agent shown below together with the aforesaid sensitizer, the cross-linking rate can be increased and the properties of the crosslinked high molecular weight compound can be improved.
Although the exact mechanism by which the photoactive cross-linking agent which may be used in this invention functions has not yet been determined, the photo-active cross-linking agent is a compound which is activated by absorbing energy from the sensitizer, whereby it contributes to the cross-linking of the high molecular weight compound.
Examples of such compounds are N,N'-hexame' thylenebisacrylamide, N,N-hexamethylenebismethacrylamide, 5-acrylamino-N-acrylocaproamide, ethyleneglycol dimethacrylate, and a polyethyleneglycoldimethacrylate such as triethyleneglycol dimethacrylate.
The amount of the photoactive cross-linking agent which may be employed is 1-50 percent by weight, preferably 5-10 percent by weight, based on the weight of the high molecular weight compound. If the amount added is lower than 1 percent by weight, the effect of addition is less and if the amount is higher than 50 percent by weight, the cross-linking density of the high molecular weight compound thus cross-linked is too high, and hence the elasticity and plasticity of the cross-linked product are reduced.
As the source for the light radiation, sun light, a low potential, high potential or super-high potential mercury lamp, a xenon lamp, a carbon arc and the like, which can emit light having wave lengths of 200-600 my. may be utilized in the present invention. A low potential or high potential mercury lamp which is an ultraviolet source of light having wave lengths of 200-400 mu is preferably used.
The present invention will now be explained by referring to a general embodiment thereof. That is, 0.01 percent by weight or more of the aromatic polyaldehyde of the present invention is first added to the high molecular weight compound or a solution thereof and then formed into a shaped article by means of casting, pressing or extruding.
Thereafter, by subjecting the shaped article to light radiation at room temperature or at a higher temperature, the shaped article can be sufficiently cross-linked and modified within from several seconds to several ten minutes.
The cross-linked high molecular weight compound obtained by the above method is not colored and the appearance thereof is the same as that of the compound before cross-linking. When the cross-linked material 1S immersed in a solvent, the material is not dissolved in the solvent and only the undissolved portion the high molecular weight compound is remarkably improved.
On the other hand, as will be understood from the comparison examples shown below, a high molecular weight compound cross-linked using a conventional sensitizer such as benzophenone, 2- methylanthraquinone, benzaldehyde, etc., has an inferior cross-linking rate, inferior mechanical properties and a lower heat resistance.
It is not clear why these excellent results are obtained when the aromatic polyaldehydes of the present invention are used as compared with the use of conventional sensitizers, particularly aromatic monoaldehydes, but this is believed to be caused not only by the large proportion of aldehyde groups having photosensitivity but also by the way the sensitizer itself contributes to the cross-linkage. That is, as shown in the following reaction equation l the cross-linkage of a high molecular weight compound usually occurs by first forming a sensitizer radical R- by the decomposition of the sensitizer, and the polymer radicals formed by catching the hydrogen from the high molecular weight compound are combined again with each other.
In addition to the above reaction, the following bonding reaction of the sensitizer radical R' and the polymer r ical i q dqr to WL.
When a mono-functional monoaldehyde is used, the reaction shown in equation (2) occurs to reduce the proportion of the polymer radical and hence the rate of the cross-linking reaction by the combination of the polymer radicals with each other is reduced, and in addition the number of cross-linked points is reduced, whereby the increase of the mechanical strength and the heat resistance of the high molecular weight compound is obstructed.
On the other hand, in the case of using the polyfunctional aromatic polyaldehydes of the present invention, the sensitizing group grafted to the high molecular weight compound by the reaction shown in equation (2) has the photosensitive aldehyde group, and it is thought that, as shown in the following reaction equation (3), a radical is formed by the photodecomposition of the aldehyde group and this radical is recombined with other polymer radicals to induce the cross-linking mas a- As mentioned above, it is considered that in case of is swelled, which shows that the solvent resistance of using the aromatic polyaldehydes of the present invention, the consumption of the polymer radical as in the case of using the monoaldehyde is not observed and hence the rate of cross-linking and the number of crosslinked points are not reduced and the mechanical strength and the heat resistance of the cross-linked high molecular weight compound are remarkably improved.
Furthermore, the sensitizer is also introduced into the chain of the cross-link as the structure of -R, a benzol ring such as in the case of isophthalaldehyde, and the formation of the structure of the cross-link is considered to be an important factor in improving the mechanical properties and the heat resistance of the high molecular weight compound.
As mentioned above, the fact that when the aromatic polyaldehydes of the present invention are used to cross-link a high molecular weight compound by the action of light, the rate of cross-linking is greatly increased and the various properties, particularly the mechanical properties and the heat resistance of the high molecular compound, are remarkably improved as compared with conventional sensitizers, increases the range of high molecular weight compounds to which the present invention is applied and also greatly increases the value of the utilization of cross-linking by the action of light.
For example, a photo cross-linking process has the advantage that the cross-linking can be conducted continuously by using an inexpensive apparatus without using heat as compared with a thermal cross-linking method using a peroxide or the like and a cross-linking method by high energy radiation.
In order to effectively utilize the important features of a photo cross-liking method, cross-linking by light radiation must be conducted in a short period of time. By using conventional sensitizers, the rate of crosslinking sufficient to achieve these advantages and the improvements of various properties of the cross-linked high molecular weight compound cannot be obtained. On the other hand, by using the aromatic polyaldehydes of this invention, the high rate of cross-linking sufficient for effectively conducting continuous photo cross-linking can be obtained while improving the various properties, particularly the heat resistance, mechanical properties, and solvent resistance of the crosslinked high molecular weight compound. On considering these facts as mentioned above, it will be understood that the sensitizers of this invention are industrially very acceptable.
The present invention will be explained in more detail by referring to the following examples, although the invention is not intended to be limited to them only.
EXAMPLE 1 High pressure method polyethylene have a density of 0.918 and a melt index of 1.2 was mixed with 0.5 percent isophthaldialdehyde and a film having a thickness of 100 p. was prepared from the mixture by means of press molding.
The film was then exposed to a commercially available 400 watt high potential mercury lamp (main wave length: 300-360 m) at a distance of 20 cm at room temperature in air. The exposed film was not colored and the appearance thereof was almost the same as that of the original film. However, when the treated film was immersed in hot xylol, the film was not completely dissolved and insoluble gel was formed.
The weight percentage of the weight of the insoluble gel to the weight of the polymer before immersion in the solvent was defined to be the gel ratio and the change of the gel ratio was measured, the results of which are shown in Table l. The maximum value was obtained after about 5-10 minutes. The gel ratio is not inferior to a gel ratio of 78 percent obtained by another cross-linking method, for example, a thermal crosslinking method (2.5 percent dicumyl peroxide was added and the mixture was heated for 1 hour to 150C) and it will be understood how quickly the gel ratio was obtained.
Table 1 Radiation time Gel ratio 0 30 sec. 1 min. 5 min. 10 min. 30 min.
EXAMPLE 2 Table 2 Radiation time Gel ratio 15 sec. 8.5 30 sec. 39 l min. 76 5 min. 88 I0 min. 30 min. 82
EXAMPLE 3 After mastificating a natural rubber (pale crepe) for about 5 minutes by means of a roll, 0.5 percent of isophthaldialdehyde was mixed with the rubber and then the mixture was dissolved in toluene. From the solution was prepared a film of a thickness of p by means of casting and the film was then exposed to light as in Example 1, whereby the film was immediately endowed with rubber elastivity, which indicated the start of cross-linking. On the other hand, in case of light exposing only the natural rubber without adding the sensitizer, the rubber was degraded by the light exposure,
the rubber became sticky, and the rubber was not endowed with rubber-like elasticity. The change of the gel ratio to the radiation time is shown in the following table.
Table 3 Radiation time Gel ratio 30 sec. 16
l min. 48
min. 66
min. 66
30 min. 67
EXAMPLE 4 Silicone oil (Silicone Oil KF-99, trade name, made by Shinetsu Chemical Co.) was mixed with 1 percent of mesitylene trialdehyde and the mixture was light exposed as in Example 1. The viscosity of the liquid oil was increased by the radiation and the whole oil because a solid gel completely after about 5 minutes. When the product was immersed in a solvent, it was only swelled without being dissolved, which showed the formation of the network structure.
EXAMPLE 5 To an unsaturated polyester (a solution mixture of styrene and a polyester prepared from maleic anhydride, phthalic acid, and ethylene glycol), e.g., Nitron P-l2l (trade name, made by Nitto Denki Kogyo l(.K.) was added 1 percent of terephthalaldehyde and the liquid was light-exposed according to the manner of Example 1, whereby the viscosity was immediately increased and after 10 minutes, the liquid was completely converted into a hard solid.
EXAMPLE 6 A vinyl acetate-ethylene copolymer containing 45 percent vinyl acetate (Evalex No. 15, trade name, made by Mitsui Polychemical Co.) was dissolved in xylol and after adding thereto 0.5 percent of isophthaldialdehyde and 10 percent of tetraethylene glycol dimethacrylate, based on the weight of the resin, a film was prepared from the solution as in Example 2 and light-exposed.
The addition of the photoactive cross-linking agent increased the cross-linking effect and also increased the rate of the formation of the gel ratio as shown in vinylisophthaldialdehyde was dissolved in toluene in a monomer concentration of 30 percent and benzoyl peroxide in an amount of 0.5 percent based on the weight of the monomers was added to the solution, and the system was copolymerized for 5 hours at C. By reprecipitating the polymer thus formed from methanol, the copolymer was purified and separated.
The copolymer was added to polystyrene (Stylon 666, trade name, made by Asahi Dow Co.) in an amount of 10 percent based on the weight of polystyrene and a film was prepared from the mixture and exposed to light as in Example 1.
A gel ratio of 70 percent was obtained by radiation for 5 minutes.
COMPARISON EXAMPLE l As in Example 2 and Example 6, a film was prepared from a mixture of a vinyl acetate-ethylene copolymer containing 45 percent vinyl acetate (Evaflex No. 15', trade name, made by Mitsui Polychemical Co.) and 0.5 percent by weight of a conventional sensitizer such as benzophenone, 2-methyl anthraquinone, isophthalic acid, benzoin, trichloroacetic acid, benzaldehyde, pchlorobenzaldehyde, terephthalaldehydric acid, 0- hydroxybenzaldehyde, p-nitrobenzaldehyde, and pmethylbenzaldehyde and the film was exposed to a 400 watt high potential mercury lamp for one minute. The gel ratios of the various cases were measured, the results of which are shown in the following table 5.
As shown in Table 5, it will be understood that the aromatic polyaldehydes of this invention gave a high rate of cross-linking as compared with other sensitizers, particularly aromatic monoaldehydes.
Amont the known sensitizers used in the comparison example, Z-methylanthraquinone and pchlorobenzaldehyde gave rates of cross-linking near those obtained by the addition of the aromatic polyaldehydes of this invention, but it will further be understood as shown in Comparison Examples 2 and 3 that the mechanical properties and the heat resistance of these cross-linked materials were lower than those of the material produced using the present sensitizers.
COMPARISON EXAMPLE 2 Three kinds of films, each having a thickness of [.L, were prepared from mixtures of high pressure method polyethylene having a density of 0.918 and a melt index of 1.2 and 0.5 percent by weight of each of isophthaldialdehyde, 2-methylanthraquinone, and pchlorobenzaldehyde, respectively, and then each of the films was light exposed for various periods of time. From the films a sample of 1.0 cm X 7 cm was cut and the zero strength temperature thereof was measured. The zero strength temperature was the temperature at which the film was broken when a load of 20 g was suspended from an end of the sample film and the temperature was increased from room temperature at the rate of 3C/min. The zero strength temperature shows the heat resistance of the film sample. The results are acetate (Elvax, trade name. made by Mitsui Polychemical Co.) and 0.5 percent by weight of ophthaldialdehyde was light exposed for 30 minutes. a product having a gel ratio of only 3 percent was obshown in Table 6. 5 tained.
Table 6 (Zero strength temperature C) Radiation time l mini min. 10 min. 30 min.
lsophlhaldialdehyde 98 I24 I63 I70 I76 2-Methylanthraquinonc 98 124 I52 I60 l53 p-Chlorobenzaldehyde 98 105 123 I40 I52 By the test method, the zero strength of polyethylene obtained by the thermal cross-linking (2.5 percent dicumyl peroxide was added and the mixture was subjected to press vulcanization for 1 hour at 150C) was By comparing these results with the results obtained by the photo-cross-linking, it will be understood that the product obtained by using the isophthaldialdehyde of this invention had a higher heat resistance and achieved it more quickly as compared with the case of COMPARISON EXAMPLE 5 A mixture of 10g of dried polyvinyl alcohol having a polymerization degree of 1700 and 0.5 percent by weight of isophthaldialdehyde was dissolved in water to provide an aqueous solution having a polymer concentration of about 15 percent and then a film of 50 p. in thickness was prepared from the solution by means of casting. I 7 7 W The film obtained was subjected to light exposure according to the manner in Example 1 and when the film When a film prepared from a mixture of a vinyl acetate-ethylene copolymer containing 45 percent vinyl thermal cross-linking and also those of the case of using was treated m bollmg. Water and h gel who was meathe conventional sensitizers sured, almost no undlssolved portion was observed and in the case of the product exposed for about min- COMPARISON EXAMPLE 3 utes, only cotton dust-like gel was formed. However,
AS in Examples 2 and 6 and Comparison Example 1 the measurement of the weight of the undissolved matthree kinds of films, each having a thickness of 100 l W1 P9$-$!P were prepared from mixtures of a vinyl acetate- What is claimed iSI ethylene copolymer containing 15 percent vinyl ace- A composition capable of being cross'linked y [are (Ev fl N 15, trade name, d b Mi i P l posure to light radiation having a wavelength of from chemical C d 0,5 percent b i h f h of 2- 200 to 600 my. consisting essentially of a high molecumethylanthraquinone, isophth ldi ld h d d lar weight material selected from the group consisting chlorobenzaldehyde, respectively, and they were we of polyethylene, polypropylene, ethylene-vinyl acetate posed to light. copolymers, polystyrene, polyacrylates, polymethacryl- The mechanical strength of the film at various radiaates, p y ly hl id p lyvinyli ne C lor polytion times was measured according to the method of yl ni ril p lycarbonates, polyamides, polyure- JlK 6723, the results of which are shown in Table 7. thanes, unsaturated polyesters, epoxy resins, xylol res- Table 7 Radiation time 0 l min. 5 min. 30 min.
Mechanical H *4 s characteristics Kg/cm" '71 Kg/cm 7r Kg/cm 71 Kg/cm Scnsitizer lsophthaltlialdchyde 70 900 92 820 I20 600 no 500 Z-mcthylanthra- 320 quinonc 70 900 52 800 35 400 24 p-chlorohenzalsun dchydc 70 900 60 x 45 650 32 i "=Elongation From the above results, it will be unde stoo that ins, ureaformaldehyde resins, melamine resins, natural when isophthaldialdehyde was used, the strength of the rubbers, butyl rubbers, ethylene-propylene copolymer film was increased by the cross-linking and the reducrubbers, styrene-butadiene copolymer rubbers, neotion in strength was not observed even under exposure prene rubbers, alkyd resins, phenol resins, furan resins, for a long period of time, while when 2- a silicon resin, and polyvinylidene fluoride, and a phomethylanthraquinone or p-chlorobenzaldehyde was tosensitive cross-linking agent consisting essentially of used, the strength of the film was not improved and on an aromatic polyaldehyde of the formula: H
the contrary was reduced. i i W COMPARISON EXAMPLE 4 OHC R CH0 wherein R is a divalent benzene group, a substituted divalentbenzene group, a divalent polycyclic aromatic wherein R through R, and R through R,, are each selected from the group consisting of a hydrogen atom, an alkyl group, a nitro group, a halogen atom and an aldehyde group, and wherein R is a divalent group selected from the group consisting of an alkylene chain of l to 3 carbon atoms, a silicon of and a sulfur of 50 wherein R and R are selected from those groups which will not adversely affect the properties of said aromatic polyaldehyde, with the provision that the CHO- groups in said formula are not ortho with respect to each other, said high molecular weight material being capable of being crosslinked by the action of light in the presence of said photosensitive cross-linking agent.
2. The composition of claim 1 wherein, said aromatic polyaldehyde is present in. an amount of from 0.01 to 20 percent, by weight, based on the weight of said high molecular weight material.
3. A composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 mp. consisting essentially of a high molecular weight material selected from the group consisting of polyethylene, polypropylene, ethylene-vinyl acetate copolymers, polystyrene, polyacrylates, polymethacrylates, polyvinylchloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyamides, polyurethanes, unsaturated polyesters, epoxy resins, xylol resins, ureaformaldehyde resins, melamine resins, natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrene-butadiene copolymer rubbers, neoprene rubbers, alkyd resins, phenol resins, furan resins, a silicon resin, and polyvinylidene fluoride, a photoactive cross-linking agent selected from the group consisting of N,N'-methylenebisacrylamide, N,N'- hexamethylenebismethacrylamide, S-acrylamino-N- acrylocapromamaide, ethylene glycol dimethacrylate Ol-lC R cno wherein R is a divalent benzene group, a substituted divalent benzene group, a divalent polycyclic aromatic 14 ring, or a group selected from the group consisting of R1 R1 R: R'} R& i R, x R, R- R: R4 R's R'4 R] R R; R:
wherein R through R and R through R, are each selected from-the group consisting of a hydrogen atom, an alkyl group, a nitro group, a halogen atom and an aldehyde group, and wherein R is a divalent group selected from the group consisting of an alkylene chain of 1 to 3 carbon atoms, a silicon of and a sulfur of SO wherein R and R are selected from those groups which will not adversely affect the properties of said aromatic polyaldehyde, with the proviso that the CHO- groups in said formula are not ortho with respect to each other, said high molecular weight material being capable of being cross-linked by the action of light in the presence of said photosensitive cross-linking agent.
4. The composition of claim 3 wherein said photoactive cross-linking agent is present in an amount of from 1 to 50 percent, by weight, based on the weight of said high molecular weight material.
5. A composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 my. consisting essentially of a high molecular weight polyethylene and isophthaldialdehyde.
6. A process for cross-linking a high molecular weight compound selected from the group consisting of polyethylene, polypropylene, ethylene-vinyl acetate copolymers, polystyrene, polyacrylates, polymethacrylates, polyvinylchloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyamides, polyurethanes, unsaturated polyesters, epoxy resins, xylol resins, urea-formaldehyde resins, melamine resins, natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrene-butadiene copolymer rubbers, neoprene rubbers, alkyd resins, phenol resins, furan resins, a silicon resin, and polyvinylidene fluoride, consisting essentially of adding an aromatic polyaldehyde to said compound and subjecting the resulting mixture to light radiation having a wavelength of from 200 to 600 mn, said aromatic polyaldehyde being represented by the formula:
OHC R CHO wherein R is a divalent benzene group, a substituted divalent benzene group, a divalent polycyclic aromatic or e ssele ssi item best w misting of wherein R through R, and R, through R are each selected from the group consisting of a hydrogen atom, an alkyl group, a nitro group, a halogen atom and an aldehyde group, and wherein R is a divalent group selected from the group consisting of an alkylene chain of 1 to 3 carbon atoms, a silicon of a phosphorus of 7. The composition of claim 3 wherein said aromatic polyaldehyde is present in an amount of from 0.01 to 20 percent by weight, based on the weight of said high molecular weight material.
8. The process of claim 6 wherein the amount of said aromatic polyaldehyde added to said high molecular weight compound is from 0.01 to 20 percent by weight, based on the weight of said high molecular weight compound.
Claims (7)
- 2. The composition of claim 1 wherein said aromatic polyaldehyde is present in an amount of from 0.01 to 20 percent, by weight, based on the weight of said high molecular weight material.
- 3. A composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 m Mu consisting essentially of a high molecular weight material selected from the group consisting of polyethylene, polypropylene, ethylene-vinyl acetate copolymers, polystyrene, polyacrylates, polymethacrylates, polyvinylchloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyamides, polyurethanes, unsaturated polyesters, epoxy resins, xylol resins, ureaformaldehyde resins, melamine resins, natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrene-butadiene copolymer rubbers, neoprene rubbers, alkyd resins, phenol resins, furan resins, a silicon resin, and polyvinylidene fluoride, a photo-active cross-linking agent selected from the group consisting of N,N''-methylenebisacrylamide, N,N''-hexamethylenebismethacrylamide, 5-acrylamino-N-acrylocapromamaide, ethylene glycol dimethacrylate and triethylene glycol dimethacrylate, and a photosensitive cross-linking agent consisting essentially of an aromatic polyaldehyde of the formula: OHC - R - CHO wherein R is a divalent benZene group, a substituted divalent benzene group, a divalent polycyclic aromatic ring, or a group selected from the group consisting of
- 4. The composition of claim 3 wherein said photoactive cross-linking agent is present in an amount of from 1 to 50 percent, by weight, based on the weight of said high molecular weight material.
- 5. A composition capable of being cross-linked by exposure to light radiation having a wavelength of from 200 to 600 m Mu consisting essentially of a high molecular weight polyethylene and isophthaldialdehyde.
- 6. A process for cross-linking a high molecular weight compound selected from the group consisting of polyethylene, polypropylene, ethylene-vinyl acetate copolymers, polystyrene, polyacrylates, polymethacrylates, polyvinylchloride, polyvinylidene chloride, polyacrylonitrile, polycarbonates, polyamides, polyurethanes, unsaturated polyesters, epoxy resins, xylol resins, urea-formaldehyde resins, melamine resins, natural rubbers, butyl rubbers, ethylene-propylene copolymer rubbers, styrene-butadiene copolymer rubbers, neoprene rubbers, alkyd resins, phenol resins, furan resins, a silicon resin, and polyvinylidene fluoride, consisting essentially of adding an aromatic polyaldehyde to said compound and subjecting the resulting mixture to light radiation having a wavelength of from 200 to 600 m Mu , said aromatic polyaldehyde being represented by the formula: OHC - R - CHO wherein R is a divalent benzene group, a substituted divalent benzene group, a divalent polycyclic aromatic ring, or a group selected from the group consisting of
- 7. The composition of claim 3 wherein said aromatic polyaldehyde is present in an amount of from 0.01 to 20 percent by weight, based on the weight of said high molecular weight material.
- 8. The process of claim 6 wherein the amount of said aromatic polyaldehyde added to said high molecular weight compound is from 0.01 to 20 percent by weight, based on the weight of said high molecular weight compound.
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|---|---|---|---|
| US8221970A | 1970-10-19 | 1970-10-19 |
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| EP0001578A1 (en) * | 1977-10-13 | 1979-05-02 | Bayer Ag | Modified polycarbonates and process for their preparation |
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| EP0001578A1 (en) * | 1977-10-13 | 1979-05-02 | Bayer Ag | Modified polycarbonates and process for their preparation |
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| US4230548A (en) * | 1977-10-13 | 1980-10-28 | Bayer Aktiengesellschaft | Polycarbonates with end groups containing bonds which can be crosslinked by UV light |
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| US5468786A (en) * | 1990-08-01 | 1995-11-21 | Siemens Aktiengesellschaft | Radiation-curable reaction resin system |
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| US20100111849A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for administering compartmentalized frozen particles |
| US20100114592A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111835A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111832A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for surface abrasion with frozen particles |
| US20100111846A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for delivery of frozen particle adhesives |
| US20100111845A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111844A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111938A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for biological remodeling with frozen particle compositions |
| US20100111847A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for administering compartmentalized frozen particles |
| US20100114545A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for surface abrasion with frozen particles |
| US20100111836A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100114497A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, S Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111833A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for surface abrasion with frozen particles |
| US20100111850A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Delaware | Compositions and methods for administering compartmentalized frozen particles |
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| US20100113614A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc., A Limited Liability Corporation Of The State Of Delaware | Compositions and Methods for delivery of frozen particle adhesives |
| US20100114268A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for surface abrasion with frozen particles |
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| US20100112093A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for therapeutic delivery with frozen particles |
| US20100111848A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for administering compartmentalized frozen particles |
| US20100111837A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Compositions and methods for biological remodeling with frozen particle compositions |
| US20100114348A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc, A Limited Liability Corporation Of The States Of Delaware | Frozen compositions and methods for piercing a substrate |
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| US20100111830A1 (en) * | 2008-10-31 | 2010-05-06 | Searete Llc | Compositions and methods for surface abrasion with frozen particles |
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| US20100111857A1 (en) * | 2008-10-31 | 2010-05-06 | Boyden Edward S | Compositions and methods for surface abrasion with frozen particles |
| US20100121466A1 (en) * | 2008-10-31 | 2010-05-13 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Frozen compositions and methods for piercing a substrate |
| US20100119557A1 (en) * | 2008-10-31 | 2010-05-13 | Searete Llc, A Limited Liability Corporation Of The State Of Delaware | Frozen compositions and methods for piercing a substrate |
| US20100143243A1 (en) * | 2008-10-31 | 2010-06-10 | Searete Llc, A Limited Liability Corporation Of The State Of Delware | Frozen compositions and methods for piercing a substrate |
| US20100152880A1 (en) * | 2008-10-31 | 2010-06-17 | Searete Llc, A Limited Liability Corporation Of The State Of Delware | Systems, devices, and methods for making or administering frozen particles |
| US20100168900A1 (en) * | 2008-10-31 | 2010-07-01 | Searete Llc | Systems, devices, and methods for making or administering frozen particles |
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