US3642589A - Gold alloy electroplating baths - Google Patents
Gold alloy electroplating baths Download PDFInfo
- Publication number
- US3642589A US3642589A US861985A US3642589DA US3642589A US 3642589 A US3642589 A US 3642589A US 861985 A US861985 A US 861985A US 3642589D A US3642589D A US 3642589DA US 3642589 A US3642589 A US 3642589A
- Authority
- US
- United States
- Prior art keywords
- electroplating bath
- gold
- soluble
- alkali metal
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 44
- 229910001020 Au alloy Inorganic materials 0.000 title description 9
- 239000003353 gold alloy Substances 0.000 title description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229920000642 polymer Polymers 0.000 claims abstract description 6
- 150000001412 amines Chemical class 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 4
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 claims description 3
- 229940008406 diethyl sulfate Drugs 0.000 claims description 3
- 229940050176 methyl chloride Drugs 0.000 claims description 2
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 claims 1
- -1 alkali metal cyanide Chemical class 0.000 abstract description 19
- 229920000768 polyamine Polymers 0.000 abstract description 12
- 239000000203 mixture Substances 0.000 abstract description 11
- 229910045601 alloy Inorganic materials 0.000 abstract description 10
- 239000000956 alloy Substances 0.000 abstract description 10
- 239000002585 base Substances 0.000 abstract description 10
- 125000002947 alkylene group Chemical group 0.000 abstract description 9
- 239000000080 wetting agent Substances 0.000 abstract description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052737 gold Inorganic materials 0.000 abstract description 6
- 239000010931 gold Substances 0.000 abstract description 6
- 150000003839 salts Chemical class 0.000 abstract description 6
- 238000000151 deposition Methods 0.000 abstract description 4
- 239000000872 buffer Substances 0.000 abstract description 2
- 150000001868 cobalt Chemical class 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 20
- 238000007747 plating Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 235000021317 phosphate Nutrition 0.000 description 6
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 3
- 229920001281 polyalkylene Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 229940091258 selenium supplement Drugs 0.000 description 2
- SDKPSXWGRWWLKR-UHFFFAOYSA-M sodium;9,10-dioxoanthracene-1-sulfonate Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] SDKPSXWGRWWLKR-UHFFFAOYSA-M 0.000 description 2
- 150000003498 tellurium compounds Chemical class 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- KGTKCYPWFGFSAH-UHFFFAOYSA-N 1-n,1-n,2-n-trimethylpropane-1,2-diamine Chemical compound CNC(C)CN(C)C KGTKCYPWFGFSAH-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- IHEDBVUTTQXGSJ-UHFFFAOYSA-M 2-[bis(2-oxidoethyl)amino]ethanolate;titanium(4+);hydroxide Chemical compound [OH-].[Ti+4].[O-]CCN(CC[O-])CC[O-] IHEDBVUTTQXGSJ-UHFFFAOYSA-M 0.000 description 1
- XYUINKARGUCCQJ-UHFFFAOYSA-N 3-imino-n-propylpropan-1-amine Chemical compound CCCNCCC=N XYUINKARGUCCQJ-UHFFFAOYSA-N 0.000 description 1
- UIKUBYKUYUSRSM-UHFFFAOYSA-N 3-morpholinopropylamine Chemical compound NCCCN1CCOCC1 UIKUBYKUYUSRSM-UHFFFAOYSA-N 0.000 description 1
- BCSZNBYWPPFADT-UHFFFAOYSA-N 4-(1,2,4-triazol-4-ylmethyl)benzonitrile Chemical compound C1=CC(C#N)=CC=C1CN1C=NN=C1 BCSZNBYWPPFADT-UHFFFAOYSA-N 0.000 description 1
- 240000005020 Acaciella glauca Species 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WOFVPNPAVMKHCX-UHFFFAOYSA-N N#C[Au](C#N)C#N Chemical class N#C[Au](C#N)C#N WOFVPNPAVMKHCX-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 235000019846 buffering salt Nutrition 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- LMEDOLJKVASKTP-UHFFFAOYSA-N dibutyl sulfate Chemical class CCCCOS(=O)(=O)OCCCC LMEDOLJKVASKTP-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BVTBRVFYZUCAKH-UHFFFAOYSA-L disodium selenite Chemical compound [Na+].[Na+].[O-][Se]([O-])=O BVTBRVFYZUCAKH-UHFFFAOYSA-L 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- UPCIBFUJJLCOQG-UHFFFAOYSA-L ethyl-[2-[2-[ethyl(dimethyl)azaniumyl]ethyl-methylamino]ethyl]-dimethylazanium;dibromide Chemical compound [Br-].[Br-].CC[N+](C)(C)CCN(C)CC[N+](C)(C)CC UPCIBFUJJLCOQG-UHFFFAOYSA-L 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- PQTCMBYFWMFIGM-UHFFFAOYSA-N gold silver Chemical compound [Ag].[Au] PQTCMBYFWMFIGM-UHFFFAOYSA-N 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- CZXGXYBOQYQXQD-UHFFFAOYSA-N methyl benzenesulfonate Chemical compound COS(=O)(=O)C1=CC=CC=C1 CZXGXYBOQYQXQD-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- MNRGFUBMMILKAL-UHFFFAOYSA-N methyl phenylmethanesulfonate Chemical compound COS(=O)(=O)CC1=CC=CC=C1 MNRGFUBMMILKAL-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- HDCAZTXEZQWTIJ-UHFFFAOYSA-N n,n',n'-triethylethane-1,2-diamine Chemical compound CCNCCN(CC)CC HDCAZTXEZQWTIJ-UHFFFAOYSA-N 0.000 description 1
- YPLIFKZBNCNJJN-UHFFFAOYSA-N n,n-bis(ethylamino)ethanamine Chemical compound CCNN(CC)NCC YPLIFKZBNCNJJN-UHFFFAOYSA-N 0.000 description 1
- NYIODHFKZFKMSU-UHFFFAOYSA-N n,n-bis(methylamino)ethanamine Chemical compound CCN(NC)NC NYIODHFKZFKMSU-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- LJZPPWWHKPGCHS-UHFFFAOYSA-N propargyl chloride Chemical compound ClCC#C LJZPPWWHKPGCHS-UHFFFAOYSA-N 0.000 description 1
- 238000005956 quaternization reaction Methods 0.000 description 1
- 235000003499 redwood Nutrition 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical class [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 229960001471 sodium selenite Drugs 0.000 description 1
- 239000011781 sodium selenite Substances 0.000 description 1
- 235000015921 sodium selenite Nutrition 0.000 description 1
- VOADVZVYWFSHSM-UHFFFAOYSA-L sodium tellurite Chemical compound [Na+].[Na+].[O-][Te]([O-])=O VOADVZVYWFSHSM-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Definitions
- Optional components include a different metal salt, such as nickel or cobalt salts; a wetting agent; buffers or conductive salts; and alkylene-, aJkanol-, and aJkylol-amines, polymers thereof, or mixtures thereof.
- a different metal salt such as nickel or cobalt salts
- a wetting agent such as sodium bicarbonate
- buffers or conductive salts such as sodium bicarbonate
- the present invention relates to improved gold alloy electroplating baths. More particularly, the invention pertains to electroplating bath solutions for plating gold alloys of silver with or without other alloying metals.
- U.S. Pat. No. 2,660,554 describes a composition which is intended to produce a heavy plate from a bath containing aurous cyanide, an alky1ene-, alkylolor alkano1-amine at a pH of 8.0 to 1 1.5, together with a theoretical free alkali metal cyanide of 1.2 to 2.0 grams per liter. While this bath was satisfactory for commercial operation, there were some defects which lessened its applicability. The pH of the solution tended to rise and as such pH increase occurred, it became more difficult to secure a wide, bright plating range, particularly with baths which had been in operation for some time. Another difficulty was in maintaining the life of this bath. When the amount of gold replenished and deposited was three or four times the amount used in making a fresh bath, harmful breakdown products reduced the overall bright plating range. This made it necessaryto discard the solution and make up a new bath,
- One object of the present invention is to electroplating baths which avoid the tions of the prior art plating baths.
- Another object of the present invention is to provide stable gold-alloy electroplating baths capable of giving ductile deposits over a wide range of karats.
- a further object of the present invention is to provide improved gold-silver alloy electroplating baths.
- a still further object of the present invention is to provide an aqueous electroplating bath solution for depositing an alloy ofgold, silver and one other metal.
- improved gold-base alloy electroplating bath composition can be attained by the incorporation of a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine or the quaternaries thereof.
- a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine or the quaternaries thereof are described in British Pat. No. 1,083,681.
- the resulting compositions have an increased stability and can plate semibright to brilliant gold-base alloys for long periods of time. Both low and high karat deposits can be achieved.
- heavy or thick deposits of the gold-base alloys will not be subject to the cracking problem encountered when utilizing prior art plating baths.
- Epichlorohydrin and epibromohydrin are the preferred epihalohydrins used in the preparation of the soluble polymeric condensate.
- Preferred alkylene polyamines are those having at least one secondary amino group and at least one primary provide gold-alloy disadvantages and limitaamino group such as polyalkylene polyamine.
- tertiary amino groups are present they are desirably dialkylamino groups, preferably those containing up to 10 carbon atoms in the alkyl radicals.
- polypropylenepolyamines such as imino-bis-propylamine; dimethylaminopropylamine, (N,N- dimethylpropylenediamine); diethylaminopropylamine, (N ,N- diethylpropylenediamine); N-morpholinopropylamine; N,N- dimethylaminoethylamine and N,N-diethylaminoethylamine.
- alkylenepolyamines containing at least one tertiary amino group and at least one secondary amino group may also be employed, such as N,N-dimethyl-N '-methylpropylenediamine, N,N-dimethyl-N-methylethylenediamine and N,N-diethyl-N'-ethylethylenediamine.
- the molar ratio of the epihalohydrin to the a1- kylene polyamine or mixture of alkylene and polyalkylene polyamines employed to prepare the unquaternized water soluble condensate or resin should preferably range from about 0.8-1.15 to 1, although a somewhat broader range of from about 0.5-1.75 to 1 is also suitable.
- Quaternization can be carried out either in a separate step or in situ at temperatures up to 100 C. under atmospheric or elevated pressures.
- Suitable quaternizing agents are the alkyl halides such as methyl chloride, bromide and iodide, and ethyl chloride, bromide and iodide, dialkyl sulphates, such as dimethyl, diethyl, dipropyl and dibutyl sulphates, allyl halides such as allyl chloride, propargyl chloride, epihalohydrins, such as epichlorohydrin, and alkyl esters of aryl sulphonates, such as methyl toluene sulphonate and methyl benzene sulphonate.
- the quaternized or unquaternized polymeric condensate is further characterized by being substantially free from cross linking.
- alkali metal cyanide in the bath.
- the preferred cyanides are potassium and sodium cyanides.
- the amount of free alkali metal cyanide will generally range from about 2 to 60, and preferably from about 7 to 35 grams per liter.
- the metal components of the electroplating bath of the present invention comprise (a) gold metal added as a soluble gold cyanide salt, and preferably as the double alkali metal cyanide; and (b) a soluble silver salt, complex, or chelate such as the double alkali metal cyanide, the amine cyanide, hydrocyanide, nitrate, chloride and the like.
- metals which may be present in the bath include nickel, cobalt, cadmium, indium, copper, etc., in the form their salts, complexes, or chelates such as nickel sulfate, alkali metal nickel cyanide, nickel amine, cobalt sulfate, alkali metal cobalt cyanide, cobalt amine, indium sulfamate, cadmium sulfate, copper sulfate, alkali metal copper cyanide, and the like.
- the aforementioned metals are used in the form of their double alkali metal cyanide salts, and preferably where the alkali metal is sodium or potassium.
- the amounts of metals employed in the plating baths may vary widely, and the following ranges have been found suitable:
- the pH of the solution may range from about 8 to l 1.5 with a pH of from about 9.5 to l I being preferred.
- Materials such as sulfamic acid, boric acid, phosphoric acid, sulfuric acid, nitric acid, citric acid, etc., may be employed to adjust the pH of the electroplating bath.
- buffering compounds are added to the bath, whereby this tendency is minimized and the pH is maintained more closely within the optimum operating ranges.
- buffering salt employed is not critical.
- wetting agents which are compatible with the gold-base bath, can also be added to assist in preventing pitting in the gold alloy deposits.
- the wetting agent must be capable of reducing the surface tension of the aqueous plating solution without adversely affecting either the solution or the metal deposit. Examples of such materials include organic phosphates, ethylene oxide condensates of organic phosphates, and the like.
- the amount of wetting agent will range from about 0.5 to 1 gram per liter or more. The amount need only be sufficient to permit the metal'plating without pitting.
- the electroplating baths of this invention may also contain water soluble titanium, selenium or tellurium compounds as brightener additives.
- Titanium compounds such as ethanolamine titanate, triethanolamine titanate, etc., may be employed in amounts ranging from about 0.05 to grams per liter.
- Illustrative water soluble selenium and tellurium compounds are sodium selenite and sodium tellurite; and they may be employed in amounts ranging from about 0.00l to 0.1 gram per liter,
- Another feature of the present invention resides in the optional addition to the electroplating; bath of alkylol-, alkyleneor alkanol-amines having from one to 12 carbon atoms as well as polymers thereof having molecular weights of up to 2,500 or higher, preferably from about 100 to 2,500.
- alkylol-, alkyleneor alkanol-amines having from one to 12 carbon atoms as well as polymers thereof having molecular weights of up to 2,500 or higher, preferably from about 100 to 2,500. Examples of such amines and their polymers are:
- Ethylene diamine Diethylene triamine Tetraethylene pentamine Hydroxyethyl ethylene diamine Aminoethyl ethanolamine Monoethanolamine Triethanolamine Triisopropanolamine Polymerized tetraethylene pentamine (average mol. wt.
- Polymerized tetraethylene pentamine (average mol. wt. 1,200), etc. Mixtures of the amines and/or polymeric amines may also be employed. These amines may also be present in minor amounts, and generally are used in the range of about I to 100 grams per liter. These amines must be used in conjunction with the epihalohydrin-alkylene polyamine condensation products, since they are unsatisfactory when used alone.
- An aqueous electroplating bath solution is prepared from Organic phosphate wetting agent I Water Make up to l liter The pH is adjusted with boric acid to a'value of ID. The solution is agitated during plating at a temperature of F. and a current density 5 amperes per square foot. Resulting deposits are bright and crack free even up to 20 microns.
- the karat is approximately 16 to 18 kt.
- EXAMPLE 2 An aqueous electroplating bath solution is prepared from the following formulation:
- EXAMPLE 3 An aqueous electroplating bath solution is prepared from the following formulation:
- EXAMPLE 4 An aqueous electroplating bath solution is prepared from the following formulation:
- the above data show that electroplating bath solutions of this invention can be effectively employed for the deposition of gold-base alloys.
- the metal deposits are characterized by the desired brightness, ductility and variety of karat values.
- An electroplating bath for producing gold-base alloy deposits comprising an aqueous, alkaline solution of a soluble gold salt, a soluble silver salt, a free alkali metal cyanide content of at least about 2 grams per liter and up to about 60 grams per liter of solution, and a minor amount of a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine, the molar ratio of the epihalohydrin to alkylene polyamine being in the range of 0.5-1 .75 to l, and the soluble polymeric condensate being present in concentration of from about 0.1 to 100 grams per liter ofsolution.
- aqueous solution also contains a soluble form of a metal selected from the group consisting of nickel, cobalt, indium, cadmium, and copper.
- aqueous solution also contains an amine selected from the group consisting alkylol-, alkyleneand alkanol-amines having from one to 12 carbon atoms and polymers thereof.
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Abstract
An electroplating bath solution for depositing gold-base alloys containing soluble gold and silver salts as well as a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine. The solution also contains free alkali metal cyanide. Optional components include a different metal salt, such as nickel or cobalt salts; a wetting agent; buffers or conductive salts; and alkylene-, alkanol-, and alkylol-amines, polymers thereof, or mixtures thereof.
Description
[54] GOLD ALLOY ELECTROPLATING BATHS [72] Inventors: Fred 1. Nobel, 75 Fern Drive; Barnet D.
Ostrow, 125 Redwood Drive, both of Roslyn, NY. 11576 [22] Filed: Sept. 29, 1969 [211 App]. No.: 861,985
521 .204/44, 204/43, 204/46 511 ..C23b5/42 [58] FieldofSearch ..204/46,43,44,l23;106/l; 117/1301;
[56] References Cited UNITED STATES PATENTS R 2 1, 5s2 12/1958 Rinker 3,227,638 1/1966 13 1 15761 5] Feb. 15, 1972 A. G. Gray, Modern Electroplating, pp. 8-l0 (I953) TS 670E46 1953 Primary Examiner-G. L. Kaplan Attorney-E. J. Berry and L. Rosen ABSTRACT An electroplating bath solution for depositing gold-base alloys containing soluble gold and silver salts as well as a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine. The solution also contains free alkali metal cyanide. Optional components include a different metal salt, such as nickel or cobalt salts; a wetting agent; buffers or conductive salts; and alkylene-, aJkanol-, and aJkylol-amines, polymers thereof, or mixtures thereof.
9 Claims, No Drawings GOLD ALLOY ELECTROPLATING BATHS The present invention relates to improved gold alloy electroplating baths. More particularly, the invention pertains to electroplating bath solutions for plating gold alloys of silver with or without other alloying metals.
It has been customary for many years to deposit gold-base alloys from aqueous solutions containing gold metal as a soluble cyanide plus other metal salts. Various materials such as sulfites, thiosulfates, certain amines, phosphates, glues, and the like have been added to these solutions in an effort to obtain improved results. Under the requirements of present day industry it is important to have available electroplating baths capable of plating heavy gold alloy deposits to thicknesses as high as microns or more with good brightness and ductility. Previous electroplating baths were not able to fulfill these requirements.
U.S. Pat. No. 2,660,554 describes a composition which is intended to produce a heavy plate from a bath containing aurous cyanide, an alky1ene-, alkylolor alkano1-amine at a pH of 8.0 to 1 1.5, together with a theoretical free alkali metal cyanide of 1.2 to 2.0 grams per liter. While this bath was satisfactory for commercial operation, there were some defects which lessened its applicability. The pH of the solution tended to rise and as such pH increase occurred, it became more difficult to secure a wide, bright plating range, particularly with baths which had been in operation for some time. Another difficulty was in maintaining the life of this bath. When the amount of gold replenished and deposited was three or four times the amount used in making a fresh bath, harmful breakdown products reduced the overall bright plating range. This made it necessaryto discard the solution and make up a new bath,
- which obviously increased the cost of operation.
The use of these particular amines is also described in U.S. Pat. No. 2,967,135 in the formulation of gold-base alloy electroplating baths further characterized as having a pH within the range of 2.5 to 6.5 and bythe absence of free alkali metal cyanides. While these electroplating solutions were definitely superior to those previously available, it was found that they were not capable of producing ductile deposits greater than about 10 microns. At greater thicknesses-the deposits tended to crack due to very high internal stresses which rendered them unsuitable for commercial use. it was further found that the electroplating baths of U.S. Pat. No. 2,967,135 could not be effectively employed for very low karat deposits, e.g., 5 to 14 kt.
One object of the present invention is to electroplating baths which avoid the tions of the prior art plating baths.
Another object of the present invention is to provide stable gold-alloy electroplating baths capable of giving ductile deposits over a wide range of karats.
A further object of the present invention is to provide improved gold-silver alloy electroplating baths.
A still further object of the present invention is to provide an aqueous electroplating bath solution for depositing an alloy ofgold, silver and one other metal.
These and other objects will become apparent from the ensuing description of the present invention.
In accordance with this invention, it has now been found that improved gold-base alloy electroplating bath composition can be attained by the incorporation of a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine or the quaternaries thereof. Such materials and similar materials as well as their method of preparation are described in British Pat. No. 1,083,681. The resulting compositions have an increased stability and can plate semibright to brilliant gold-base alloys for long periods of time. Both low and high karat deposits can be achieved. Moreover, heavy or thick deposits of the gold-base alloys will not be subject to the cracking problem encountered when utilizing prior art plating baths.
Epichlorohydrin and epibromohydrin are the preferred epihalohydrins used in the preparation of the soluble polymeric condensate. Preferred alkylene polyamines are those having at least one secondary amino group and at least one primary provide gold-alloy disadvantages and limitaamino group such as polyalkylene polyamine. When tertiary amino groups are present they are desirably dialkylamino groups, preferably those containing up to 10 carbon atoms in the alkyl radicals.
Illustrative .materials polyamines, such diethylenetriamine,
include lower as polyethylene polyamine,
triethylene-tetramine, and tetraethylenepentamine; polypropylenepolyamines, such as imino-bis-propylamine; dimethylaminopropylamine, (N,N- dimethylpropylenediamine); diethylaminopropylamine, (N ,N- diethylpropylenediamine); N-morpholinopropylamine; N,N- dimethylaminoethylamine and N,N-diethylaminoethylamine. Other alkylenepolyamines containing at least one tertiary amino group and at least one secondary amino group may also be employed, such as N,N-dimethyl-N '-methylpropylenediamine, N,N-dimethyl-N-methylethylenediamine and N,N-diethyl-N'-ethylethylenediamine.
In general, the molar ratio of the epihalohydrin to the a1- kylene polyamine or mixture of alkylene and polyalkylene polyamines employed to prepare the unquaternized water soluble condensate or resin should preferably range from about 0.8-1.15 to 1, although a somewhat broader range of from about 0.5-1.75 to 1 is also suitable.
Quaternization can be carried out either in a separate step or in situ at temperatures up to 100 C. under atmospheric or elevated pressures. Suitable quaternizing agents are the alkyl halides such as methyl chloride, bromide and iodide, and ethyl chloride, bromide and iodide, dialkyl sulphates, such as dimethyl, diethyl, dipropyl and dibutyl sulphates, allyl halides such as allyl chloride, propargyl chloride, epihalohydrins, such as epichlorohydrin, and alkyl esters of aryl sulphonates, such as methyl toluene sulphonate and methyl benzene sulphonate.
The quaternized or unquaternized polymeric condensate is further characterized by being substantially free from cross linking.
Only minor amounts of the above-described polymeric condensate need be employed in formulating the plating baths of this invention. However, a sufficient amount should be present to attain the requisite brightness, and the maximum amount is limited only by practical or economic considerations. For most purposes, at least 0.1 grams per liter of the polymeric condensate can be employed, and a suitable range covers from polyalkylene about 0.1 to 100 grams per liter of the plating solution.
In accordance with another feature of this invention it has been found advantageous to have some alkali metal cyanide in the bath. The preferred cyanides are potassium and sodium cyanides. The amount of free alkali metal cyanide will generally range from about 2 to 60, and preferably from about 7 to 35 grams per liter.
The metal components of the electroplating bath of the present invention comprise (a) gold metal added as a soluble gold cyanide salt, and preferably as the double alkali metal cyanide; and (b) a soluble silver salt, complex, or chelate such as the double alkali metal cyanide, the amine cyanide, hydrocyanide, nitrate, chloride and the like. Other metals which may be present in the bath include nickel, cobalt, cadmium, indium, copper, etc., in the form their salts, complexes, or chelates such as nickel sulfate, alkali metal nickel cyanide, nickel amine, cobalt sulfate, alkali metal cobalt cyanide, cobalt amine, indium sulfamate, cadmium sulfate, copper sulfate, alkali metal copper cyanide, and the like. For many commercial applications, the aforementioned metals are used in the form of their double alkali metal cyanide salts, and preferably where the alkali metal is sodium or potassium.
The amounts of metals employed in the plating baths may vary widely, and the following ranges have been found suitable:
Metal Grams per Liter (g.ll.)
Gold 4 to 12 Silver 1 to 8 Nickel l to 10 Cobalt 1 to 10 Indium 0.1 to S Cadmium l to 10 Copper 1 to IS The pH of the solution may range from about 8 to l 1.5 with a pH of from about 9.5 to l I being preferred. Materials such as sulfamic acid, boric acid, phosphoric acid, sulfuric acid, nitric acid, citric acid, etc., may be employed to adjust the pH of the electroplating bath. As the operation with the baths of the present invention proceeds, in some cases there may be a tendency for the pH to change. To overcome this, some form of buffering compounds are added to the bath, whereby this tendency is minimized and the pH is maintained more closely within the optimum operating ranges. Among such compounds are water soluble citrates, borates, phosphates, carbonates, and the like. The amount of buffering salt employed is not critical.
In some instances wetting agents, which are compatible with the gold-base bath, can also be added to assist in preventing pitting in the gold alloy deposits. The wetting agent must be capable of reducing the surface tension of the aqueous plating solution without adversely affecting either the solution or the metal deposit. Examples of such materials include organic phosphates, ethylene oxide condensates of organic phosphates, and the like. Generally, the amount of wetting agent will range from about 0.5 to 1 gram per liter or more. The amount need only be sufficient to permit the metal'plating without pitting.
The electroplating baths of this invention may also contain water soluble titanium, selenium or tellurium compounds as brightener additives. Titanium compounds such as ethanolamine titanate, triethanolamine titanate, etc., may be employed in amounts ranging from about 0.05 to grams per liter. Illustrative water soluble selenium and tellurium compounds are sodium selenite and sodium tellurite; and they may be employed in amounts ranging from about 0.00l to 0.1 gram per liter,
Another feature of the present invention resides in the optional addition to the electroplating; bath of alkylol-, alkyleneor alkanol-amines having from one to 12 carbon atoms as well as polymers thereof having molecular weights of up to 2,500 or higher, preferably from about 100 to 2,500. Examples of such amines and their polymers are:
Ethylene diamine Diethylene triamine Tetraethylene pentamine Hydroxyethyl ethylene diamine Aminoethyl ethanolamine Monoethanolamine Triethanolamine Triisopropanolamine Polymerized tetraethylene pentamine (average mol. wt.
Polymerized tetraethylene pentamine (average mol. wt. 1,200), etc. Mixtures of the amines and/or polymeric amines may also be employed. These amines may also be present in minor amounts, and generally are used in the range of about I to 100 grams per liter. These amines must be used in conjunction with the epihalohydrin-alkylene polyamine condensation products, since they are unsatisfactory when used alone.
The invention will be more fully understood by reference to the following illustrative embodiments,
EXAMPLE I An aqueous electroplating bath solution is prepared from Organic phosphate wetting agent I Water Make up to l liter The pH is adjusted with boric acid to a'value of ID. The solution is agitated during plating at a temperature of F. and a current density 5 amperes per square foot. Resulting deposits are bright and crack free even up to 20 microns. The karat is approximately 16 to 18 kt.
EXAMPLE 2 An aqueous electroplating bath solution is prepared from the following formulation:
Grams/Liter Gold-in the form of KAu(CN), l0 Silverin the form of KAg(CN) 2 Nickel-in the form of KNi(CN) 2 Reaction product of epichlorohydrin and triethylcne tetramine X Tetraethylene pentamine 30 Free potassium cyanide 25 Organic phosphate wetting agent 25 Water Make up to l liter The pH is adjusted with sulfamic acid to a value of 10.5. Plating conditions were the same as in Example 1 except for a current density of 4 amperes per square foot. Resulting deposits were bright and crack-free even up to 20 microns. The karat is approximately 16 to 18 kt.
EXAMPLE 3 An aqueous electroplating bath solution is prepared from the following formulation:
is approximately 16 to 18 kt.
EXAMPLE 4 An aqueous electroplating bath solution is prepared from the following formulation:
Grams/Liter Gold-in the form of KAu(CN), 8 Silver-in the form of KAgtCN), 6 Reaction product of epichlorohydrin and dicthylcne triaminequaternized with diethyl sulfate 5 Aminocthyl ethanolaminc 20 Tetracthylene pentamine 50 Potassium carbonate 20 Free potassium cyanide 20 Water Make up to l liter The pH is adjusted with sulfamic acid to a value of 9.5. At a current density of 7 amperes per square foot and with good agitation, the solution plated bright, crack-free l0-karat deposits in heavy thicknesses.
The above data show that electroplating bath solutions of this invention can be effectively employed for the deposition of gold-base alloys. The metal deposits are characterized by the desired brightness, ductility and variety of karat values.
Although the invention has been illustrated in conjunction with above embodiments, it will be understood that the invention is subject to variations and modifications without departing from its broader aspects.
What is claimed is:
1. An electroplating bath for producing gold-base alloy deposits comprising an aqueous, alkaline solution of a soluble gold salt, a soluble silver salt, a free alkali metal cyanide content of at least about 2 grams per liter and up to about 60 grams per liter of solution, and a minor amount of a soluble polymeric condensate of an epihalohydrin and an alkylene polyamine, the molar ratio of the epihalohydrin to alkylene polyamine being in the range of 0.5-1 .75 to l, and the soluble polymeric condensate being present in concentration of from about 0.1 to 100 grams per liter ofsolution.
2. The electroplating bath of claim 1 wherein said polymeric condensate is quaternized.
3. The electroplating bath of claim 2 wherein said polymeric condensate is quaternized with methyl chloride.
4. The electroplating bath of claim 2 wherein said polymeric condensate is quaternized with diethyl sulfate.
5. The electroplating bath of claim 1 wherein the aqueous solution also contains a soluble form of a metal selected from the group consisting of nickel, cobalt, indium, cadmium, and copper.
6. The electroplating bath of claim 1 wherein the pH of the aqueous solution ranges from about 8 to l 1.5.
7. The electroplating bath of claim 1 wherein the soluble gold salt is gold-alkali metal cyanide, and the soluble silver salt is silver-alkali metal cyanide.
8. The electroplating bath of claim 1 wherein the aqueous solution also contains an amine selected from the group consisting alkylol-, alkyleneand alkanol-amines having from one to 12 carbon atoms and polymers thereof.
9. The electroplating bath of claim 1 wherein the molar ratio is within the range of about 0.8-1 l 5 to to 1.
Claims (8)
- 2. The electroplating bath of claim 1 wherein said polymeric condensate is quaternized.
- 3. The electroplating bath of claim 2 wherein said polymeric condensate is quaternized with methyl chloride.
- 4. The electroplating bath of claim 2 wherein said polymeric condensate is quaternized with diethyl sulfate.
- 5. The electroplating bath of claim 1 wherein the aqueous solution also contains a soluble form of a metal selected from the group consisting of nickel, cobalt, indium, cadmium, and copper.
- 6. The electroplating bath of claim 1 wherein the pH of the aqueous solution ranges from about 8 to 11.5.
- 7. The electroplating bath of claim 1 wherein the soluble gold salt is gold-alkali metal cyanide, and the soluble silver salt is silver-alkali metal cyanide.
- 8. The electroplating bath of claim 1 wherein the aqueous solution also contains an amine selected from the group consisting alkylol-, alkylene- and alkanol-amines having from one to 12 carbon atoms and polymers thereof.
- 9. The electroplating bath of claim 1 wherein the molar ratio is within the range of about 0.8- 1.15 to to 1.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86198569A | 1969-09-29 | 1969-09-29 |
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| US3853718A (en) * | 1973-01-05 | 1974-12-10 | Oxy Metal Finishing Corp | Method to improve zinc deposition employing multi-nitrogen quaternaries |
| US3864222A (en) * | 1973-03-26 | 1975-02-04 | Technic | Baths for Electrodeposition of Gold and Gold Alloys and Method Therefore |
| FR2348286A1 (en) * | 1976-04-13 | 1977-11-10 | Oxy Metal Industries Corp | ELECTROLYTIC DEPOSIT BATHS OF SILVER-GOLD ALLOYS, CONTAINING A POLYALKYLENEIMINE AND AN ALKYLENEPOLYAMINE |
| US4062736A (en) * | 1974-11-15 | 1977-12-13 | Oxy Metal Industries Corporation | Gold and gold alloy deposition |
| US4121982A (en) * | 1978-02-03 | 1978-10-24 | American Chemical & Refining Company Incorporated | Gold alloy plating bath and method |
| DE2829979A1 (en) * | 1977-07-08 | 1979-01-18 | Systemes Traitements Surfaces | ELECTROLYSIS BATH FOR THE DEPOSITION OF GOLD-COPPER-CADMIUM ALLOYS AND ITS APPLICATION IN GALVANO TECHNOLOGY |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| FR2434873A1 (en) * | 1978-08-31 | 1980-03-28 | Lea Ronal Uk Ltd | BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF A GOLD ALLOY |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| US20060283714A1 (en) * | 2005-06-02 | 2006-12-21 | Rohm And Haas Electronic Materials Llc | Gold alloy electrolytes |
| US20090014335A1 (en) * | 2007-06-06 | 2009-01-15 | Rohm And Haas Electronic Materials Llc | Acidic gold alloy plating solution |
| US20090075102A1 (en) * | 2007-08-28 | 2009-03-19 | Rohm And Haas Electronic Materials Llc | Electrochemically deposited indium composites |
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| JP2009287118A (en) * | 2008-04-22 | 2009-12-10 | Rohm & Haas Electronic Materials Llc | Method of replenishing indium ions in indium electroplating composition |
| US20100024930A1 (en) * | 2006-10-03 | 2010-02-04 | The Swatch Group Research And Development Ltd. | Electroforming method and part or layer obtained via the method |
| US20100206739A1 (en) * | 2007-09-21 | 2010-08-19 | The Swatch Group Research And Development Ltd. | Method of obtaining a yellow gold alloy deposition by galvanoplasty without using toxic metals or metalloids |
| US20110089040A1 (en) * | 2009-10-15 | 2011-04-21 | The Swatch Group Research And Development Ltd | Method of obtaining a yellow gold alloy deposition by galvanoplasty without using toxic materials |
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| US3864222A (en) * | 1973-03-26 | 1975-02-04 | Technic | Baths for Electrodeposition of Gold and Gold Alloys and Method Therefore |
| US4062736A (en) * | 1974-11-15 | 1977-12-13 | Oxy Metal Industries Corporation | Gold and gold alloy deposition |
| FR2348286A1 (en) * | 1976-04-13 | 1977-11-10 | Oxy Metal Industries Corp | ELECTROLYTIC DEPOSIT BATHS OF SILVER-GOLD ALLOYS, CONTAINING A POLYALKYLENEIMINE AND AN ALKYLENEPOLYAMINE |
| US4088549A (en) * | 1976-04-13 | 1978-05-09 | Oxy Metal Industries Corporation | Bright low karat silver gold electroplating |
| DE2829979C3 (en) * | 1977-07-08 | 1990-06-21 | Systemes Traitements Surfaces | AQUEOUS BATH FOR GALVANIC DEPOSITION OF GOLD COPPER CADMIUM ALLOYS |
| DE2829979A1 (en) * | 1977-07-08 | 1979-01-18 | Systemes Traitements Surfaces | ELECTROLYSIS BATH FOR THE DEPOSITION OF GOLD-COPPER-CADMIUM ALLOYS AND ITS APPLICATION IN GALVANO TECHNOLOGY |
| US4121982A (en) * | 1978-02-03 | 1978-10-24 | American Chemical & Refining Company Incorporated | Gold alloy plating bath and method |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| FR2434873A1 (en) * | 1978-08-31 | 1980-03-28 | Lea Ronal Uk Ltd | BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF A GOLD ALLOY |
| EP0068807A3 (en) * | 1981-06-24 | 1984-07-25 | M & T Chemicals, Inc. | Acid copper electroplating baths containing brightening and levelling additives |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| US20060283714A1 (en) * | 2005-06-02 | 2006-12-21 | Rohm And Haas Electronic Materials Llc | Gold alloy electrolytes |
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| US20090104463A1 (en) * | 2006-06-02 | 2009-04-23 | Rohm And Haas Electronic Materials Llc | Gold alloy electrolytes |
| US20100024930A1 (en) * | 2006-10-03 | 2010-02-04 | The Swatch Group Research And Development Ltd. | Electroforming method and part or layer obtained via the method |
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