US3505182A - Method and solution for gold electroplating - Google Patents
Method and solution for gold electroplating Download PDFInfo
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- US3505182A US3505182A US492336A US3505182DA US3505182A US 3505182 A US3505182 A US 3505182A US 492336 A US492336 A US 492336A US 3505182D A US3505182D A US 3505182DA US 3505182 A US3505182 A US 3505182A
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- gold
- solution
- pyrophosphate
- plating
- alkali metal
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- 239000010931 gold Substances 0.000 title description 37
- 229910052737 gold Inorganic materials 0.000 title description 37
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title description 36
- 238000009713 electroplating Methods 0.000 title description 15
- 238000000034 method Methods 0.000 title description 7
- 239000000243 solution Substances 0.000 description 47
- 238000007747 plating Methods 0.000 description 19
- -1 alkali metal gold cyanide Chemical class 0.000 description 17
- 235000011180 diphosphates Nutrition 0.000 description 17
- 229910052783 alkali metal Inorganic materials 0.000 description 16
- 229940048084 pyrophosphate Drugs 0.000 description 16
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000005282 brightening Methods 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000005275 alloying Methods 0.000 description 6
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 235000019445 benzyl alcohol Nutrition 0.000 description 4
- 229910052732 germanium Inorganic materials 0.000 description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 3
- 229940048086 sodium pyrophosphate Drugs 0.000 description 3
- VMDSWYDTKFSTQH-UHFFFAOYSA-N sodium;gold(1+);dicyanide Chemical compound [Na+].[Au+].N#[C-].N#[C-] VMDSWYDTKFSTQH-UHFFFAOYSA-N 0.000 description 3
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 3
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 3
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 3
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229940093916 potassium phosphate Drugs 0.000 description 2
- 235000011009 potassium phosphates Nutrition 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- KPQDSKZQRXHKHY-UHFFFAOYSA-N gold potassium Chemical compound [K].[Au] KPQDSKZQRXHKHY-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical group O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- MVGWWCXDTHXKTR-UHFFFAOYSA-J tetralithium;phosphonato phosphate Chemical compound [Li+].[Li+].[Li+].[Li+].[O-]P([O-])(=O)OP([O-])([O-])=O MVGWWCXDTHXKTR-UHFFFAOYSA-J 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
Definitions
- the solution can be utilized within the pH range of 5.5 to 6.5 to produce a thin plating which meets semiconductor alloying and heat test requirements which require much thicker plating using prior art methods.
- the solution can also be used with benzyl alcohol within the pH range of 7.0 to 8.0 to produce a bright gold plate.
- This invention relates to gold electroplating.
- the gold-plated product is often used at relatively high temperatures. Thus it is necessary that the thickness and continuity of plating be such that relatively rigid heat tests can be passed.
- a gold-plated product is alloyed to a semiconductor such as germanium, silicon, and the like.
- a semiconductor such as germanium, silicon, and the like.
- This practice which finds application in the semiconductor and device arts, has in the past required a minimum of from about 80 to 100 micro-inch thickness of gold plate to properly accomplish the alloying.
- the present invention provides a gold electroplating solution and method for its use by which a high quality film of gold may be electrodeposited.
- the film produced by the present invention need be present in thickness of only about micro-inch in order to pass comparable heat tests that previously required thicknesses of 80 to 100 micro-inch of plate, using prior art technology.
- a film of only 35 micro-inch will alloy with semiconductor material, e.g., silicon and germanium.
- the electroplating solution of the present invention can be utilized to apply a substantially 24-carat bright gold plate.
- the most common gold plating solution was of the cyanide electrolyte type.
- Such solution utilizes sodium gold cyanide or potassium gold cyanide as a source of gold, and either sodium or potassium cyanide as an electrolyte.
- sodium or potassium phosphate is present as a grain refiner in such solution.
- the pH of this type solution ranges from about 11 to 12.
- acid gold plating solutions are aqueous solutions of acid salts and organic acids, such as tartrates and citrates. They also contain either sodium or potassium gold cyanide. A common pH range for these acid gold plating solutions is about 3.5 to 4.0.
- a further object of the present invention is to provide a versatile plating solution which achieves the foregoing objects within certain pH ranges yet which can be simply adjusted by raising pH and adding a small amount of brightening agent to make the plating solution capable of providing substantially 24-carat bright gold plate.
- the present invention provides a gold electroplating solution which has as its electrolyte a solution of alkali metal pyrophosphate.
- the preferred pyrophosphate is potassium.
- the gold electroplating solution of the present invention consists essentially of a solution of alkali metal gold cyanide and alkali metal pyrophosphate, and is preferably utilized within the pH range of 5.5 to 6.5 or 7.0 to 8.0, depending upon the desired type of plating to be achieved. It a thin plate for purposes of alloying and passing heat test is desired, the lower pH will be selected. If a bright gold plate is desired, a brightening agent is added to the solution and pH is adjusted to a higher value.
- the pH range preferred is about 5.5 to 6.5.
- the pH is preferably adjusted with phosphoric acid plus phosphorous pentoxide, which in effect provides phosphoric acid content.
- a brightening agent specifically an aryl alkyl alcohol such as benzyl alcohol
- the pH is adjusted to between about 7 and 8 with ammonium hydroxide.
- the concentration of alkali metal pyrophosphate is preferably such that on the order of about one lb./ gallon of pyrophosphate is provided. Best results appear to be achieved when the alkali metal pyrophosphate concentration is within about 10% of such concentration.
- the gold content provided by the alkali metal gold is such that on the order of about one oz. troy gold/ gallon of solution is provided.
- Potassium gold cyanidel.49 troy oz./gallon Potassium pyrophosphate-2.00 lbs./ gallon The pH of the foregoing solution is adjusted to 6.5 with so-called 105% phosphoric acid (phosphoric acid plus phosphorus pentoxide, known in the trade as Phospholeum).
- the resulting solution is seen to have a gold concentration of approximately one oz. gold/gallon. Its specific gravity is about 22-26 Baum.
- This solution is brought to a temperature of about F. and electroplating is conducted, using a platinized titanium anode and a nickel plated stainless steel article as the cathode.
- Current density is approximately one ampere/sq. ft.
- the plate is found to be of high enough quality to pass a heat test which consists of baking in air at 500 C. for a period of 20 minutes. Moreover, the resulting plate is found to alloy well with germanium and silicon.
- EXAMPLE 2 The preceding example is repeated, however, sodium gold cyanide in quantity of 1.38 troy oz./ gallon is used in place of the potassium gold cyanide employed therein.
- Plating is conducted in accordance with the same set of conditions, except that a high purity carbon anode is used in place of the platinized titanium anode therein employed. Substantially the same results are obtained, with a 35 micro-inch thickness plate being deposited which passes the heat test referred to above and alloys satisfactorily with germanium and silicon.
- Example 1 is repeated, but at a pH of 6.5 and a current density of 0.75 ampere/ sq. ft. Potassium gold cyanide is employed as the gold-bearing material in this particular instance.
- a layer of 35 micro-inch plate in accordance with this example passes both the heat test and alloying requirements.
- EXAMPLE 4 The foregoing example is repeated, however pH is approximately 5.5 (as adjusted with 105% phosphoric acid) and current density about 1.25 ampere/sq. ft. Substantially the same results are obtained, with plating of the same type and general quality.
- EXAMPLE 5 The solution set forth in Example 1 has added to it a brightening agent in minor proportions.
- the agent employed in this particular example is benzyl alcohol, in quantity of 0.05% by weight, based on the total solution.
- the pH of the plating solution is adjusted to 7.5 by addition of ammonium hydroxide.
- Plating with the same conditions as those described in Example 1 provides 24'carat bright plate.
- EXAMPLE 6 The preceding example is repeated, however, sodium pyrophosphate is substituted for potassium pyrophosphate. Moreover, equal quantities of methanol, ethanol, n-propanol, tertiary butanol and benzyl alcohol are added until a combined additive quantity of 0.07% by Weight, based on the weight of solution, is obtained, Upon plating, the results obtained are substantially the same as those described above.
- Lithium pyrophosphate and other alkali metal pyrophosphates may be utilized in the present invention, but potassium and sodium pyrophosphate, respectively, are presently thought best.
- potassium and sodium gold cyanide are the preferred gold-carrying agents, others might be utilized, e.g., lithium or cesium gold cyanide or other alkali metal gold cyanides.
- the present invention provides a plating solution which is quite versatile in that it may be utilized at two different pH ranges, both close to neutral, contrasted to relatively high and low pH prior art solutions.
- a plating solution which is quite versatile in that it may be utilized at two different pH ranges, both close to neutral, contrasted to relatively high and low pH prior art solutions.
- the lower pH range between about 5.5 and 6.5, an extremely thin film may be obtained which is adequate for alloying with semiconductor material. Such film is also adequate to pass rigorous heat tests.
- the higher pH of about 7 to 8 with the addition of a small amount of brightening agent, a bright, substantially 24-carat plate is produced.
- the present invention utilizes an alkali metal pyrophosphate as an electrolyte. This is to be contrasted to the normally employed cyanide electrolyte of the prior art and certain organic acid salts. Moreover, the pyrophosphate of the present invention is to be contrasted to prior art technology involving ordinary phosphates and phosphites.
- a gold electroplating aqueous solution consisting essentially of a solution of alkali metal gold cyanide in sufiicient quantity to provide about one ounce troy of gold per gallon of solution, and alkali metal pyrophosphate in sufi'icient quantity to provide, on a pyrophosphate basis, about one pound of pyrophosphate per gal- 1011 of solution, said solution having a pH from about 7 to 8 and containing benzyl alcohol as a brightening agent in sufiicient quantity to produce a substantially 24 carat gold plate.
- the step which comprises passing a current from an inactive anode through the gold electroplating solution of claim 1 in which said article serves as the cathode, and wherein said alkali metal pyrophosphate is potassium pyrophosphate.
- the step which comprises passing a current from an inactive anode through the gold electroplating solution of claim 1 in which said article serves as the cathode, and wherein said alkali metal pyrophosphate is sodium pyrophosphate.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
United States Patent 3,505,182 METHOD AND SOLUTION FOR GOLD ELECTROPLATING Donald S. Pokras, Richardson, Tex., assignor to Texas Instruments Incorporated, Dallas, Tex., a corporation of Delaware No Drawing. Filed Oct. 1, 1965, Ser. No. 492,336 Int. Cl. C23b /28, 5/46 US. Cl. 204-46 4 Claims ABSTRACT OF THE DISCLOSURE Disclosed is a gold electroplating solution and method for its use. The solution consists essentially of a solution of alkali metal gold cyanide and an alkali metal pyrophosphate. The solution can be utilized within the pH range of 5.5 to 6.5 to produce a thin plating which meets semiconductor alloying and heat test requirements which require much thicker plating using prior art methods. The solution can also be used with benzyl alcohol within the pH range of 7.0 to 8.0 to produce a bright gold plate.
This invention relates to gold electroplating.
In many instances it is desired to provide a thin gold plate on another metal, e.g., on copper, nickel, Kovar and the like.
The gold-plated product is often used at relatively high temperatures. Thus it is necessary that the thickness and continuity of plating be such that relatively rigid heat tests can be passed.
In other instances, a gold-plated product is alloyed to a semiconductor such as germanium, silicon, and the like. This practice, which finds application in the semiconductor and device arts, has in the past required a minimum of from about 80 to 100 micro-inch thickness of gold plate to properly accomplish the alloying.
The present invention provides a gold electroplating solution and method for its use by which a high quality film of gold may be electrodeposited. The film produced by the present invention need be present in thickness of only about micro-inch in order to pass comparable heat tests that previously required thicknesses of 80 to 100 micro-inch of plate, using prior art technology. Moreover, a film of only 35 micro-inch will alloy with semiconductor material, e.g., silicon and germanium.
By addition of a brightening agent and adjustment of pH, the electroplating solution of the present invention can be utilized to apply a substantially 24-carat bright gold plate.
For many years, the most common gold plating solution was of the cyanide electrolyte type. Such solution utilizes sodium gold cyanide or potassium gold cyanide as a source of gold, and either sodium or potassium cyanide as an electrolyte. Commonly, sodium or potassium phosphate is present as a grain refiner in such solution. The pH of this type solution ranges from about 11 to 12.
In the last several years, so-called acid gold plating solutions have been developed. These are aqueous solutions of acid salts and organic acids, such as tartrates and citrates. They also contain either sodium or potassium gold cyanide. A common pH range for these acid gold plating solutions is about 3.5 to 4.0.
A relatively recent development, akin to the acid gold solution type, involves the use of certain phosphates or phosphites as electrolyte. In combination with such electrolyte, hydrazine or substituted hydrazine is utilized. For example, see United States Patent 3,156,635 involving this system.
The various prior art baths or solutions referred to above are good for certain specific purposes; however, for
providing a thin quality film to pass high heat tests that is suitable for alloying with semiconductor materials, both the basic and acid gold plating solutions have not proved entirely satisfactory.
It is an object of the present invention to provide a new and improved plating solution for gold which is superior to prior art solutions for certain purposes.
Moreover, it is an object of the present invention to provide such a solution by which a comparatively thin coat of gold plate may be applied to accomplish what by prior art technology required a much thicker coat.
A further object of the present invention is to provide a versatile plating solution which achieves the foregoing objects within certain pH ranges yet which can be simply adjusted by raising pH and adding a small amount of brightening agent to make the plating solution capable of providing substantially 24-carat bright gold plate.
Generally speaking, the present invention provides a gold electroplating solution which has as its electrolyte a solution of alkali metal pyrophosphate. The preferred pyrophosphate is potassium.
The gold electroplating solution of the present invention consists essentially of a solution of alkali metal gold cyanide and alkali metal pyrophosphate, and is preferably utilized within the pH range of 5.5 to 6.5 or 7.0 to 8.0, depending upon the desired type of plating to be achieved. It a thin plate for purposes of alloying and passing heat test is desired, the lower pH will be selected. If a bright gold plate is desired, a brightening agent is added to the solution and pH is adjusted to a higher value.
For thin plating which alloys well and yet passes heat tests, the pH range preferred is about 5.5 to 6.5. The pH is preferably adjusted with phosphoric acid plus phosphorous pentoxide, which in effect provides phosphoric acid content.
For bright plating, a brightening agent (specifically an aryl alkyl alcohol such as benzyl alcohol) is added to the pyrophosphate electrolyte-gold solution in minor proportions. In this instance, the pH is adjusted to between about 7 and 8 with ammonium hydroxide.
At whatever pH range the present invention may be practiced, the concentration of alkali metal pyrophosphate is preferably such that on the order of about one lb./ gallon of pyrophosphate is provided. Best results appear to be achieved when the alkali metal pyrophosphate concentration is within about 10% of such concentration.
Preferably the gold content provided by the alkali metal gold is such that on the order of about one oz. troy gold/ gallon of solution is provided.
The following specific examples are ofiered by way of illustration of the present invention and are not intended to be taken as limiting its scope.
EXAMPLE 1 A solution having the following composition is prepared:
Potassium gold cyanidel.49 troy oz./gallon Potassium pyrophosphate-2.00 lbs./ gallon The pH of the foregoing solution is adjusted to 6.5 with so-called 105% phosphoric acid (phosphoric acid plus phosphorus pentoxide, known in the trade as Phospholeum).
The resulting solution is seen to have a gold concentration of approximately one oz. gold/gallon. Its specific gravity is about 22-26 Baum.
This solution is brought to a temperature of about F. and electroplating is conducted, using a platinized titanium anode and a nickel plated stainless steel article as the cathode. Current density is approximately one ampere/sq. ft.
Thirty-five micro-inch of gold plate is deposited on the nickel plated stainless steel article. The plate is found to be of high enough quality to pass a heat test which consists of baking in air at 500 C. for a period of 20 minutes. Moreover, the resulting plate is found to alloy well with germanium and silicon.
EXAMPLE 2 The preceding example is repeated, however, sodium gold cyanide in quantity of 1.38 troy oz./ gallon is used in place of the potassium gold cyanide employed therein.
Plating is conducted in accordance with the same set of conditions, except that a high purity carbon anode is used in place of the platinized titanium anode therein employed. Substantially the same results are obtained, with a 35 micro-inch thickness plate being deposited which passes the heat test referred to above and alloys satisfactorily with germanium and silicon.
EXAMPLE 3 Example 1 is repeated, but at a pH of 6.5 and a current density of 0.75 ampere/ sq. ft. Potassium gold cyanide is employed as the gold-bearing material in this particular instance.
A layer of 35 micro-inch plate in accordance with this example passes both the heat test and alloying requirements.
EXAMPLE 4 The foregoing example is repeated, however pH is approximately 5.5 (as adjusted with 105% phosphoric acid) and current density about 1.25 ampere/sq. ft. Substantially the same results are obtained, with plating of the same type and general quality.
EXAMPLE 5 The solution set forth in Example 1 has added to it a brightening agent in minor proportions. The agent employed in this particular example is benzyl alcohol, in quantity of 0.05% by weight, based on the total solution. The pH of the plating solution is adjusted to 7.5 by addition of ammonium hydroxide. Plating with the same conditions as those described in Example 1 provides 24'carat bright plate.
EXAMPLE 6 The preceding example is repeated, however, sodium pyrophosphate is substituted for potassium pyrophosphate. Moreover, equal quantities of methanol, ethanol, n-propanol, tertiary butanol and benzyl alcohol are added until a combined additive quantity of 0.07% by Weight, based on the weight of solution, is obtained, Upon plating, the results obtained are substantially the same as those described above.
Lithium pyrophosphate and other alkali metal pyrophosphates may be utilized in the present invention, but potassium and sodium pyrophosphate, respectively, are presently thought best.
While potassium and sodium gold cyanide are the preferred gold-carrying agents, others might be utilized, e.g., lithium or cesium gold cyanide or other alkali metal gold cyanides.
It is seen that the present invention provides a plating solution which is quite versatile in that it may be utilized at two different pH ranges, both close to neutral, contrasted to relatively high and low pH prior art solutions. At the lower pH range, between about 5.5 and 6.5, an extremely thin film may be obtained which is adequate for alloying with semiconductor material. Such film is also adequate to pass rigorous heat tests. At the higher pH of about 7 to 8, with the addition of a small amount of brightening agent, a bright, substantially 24-carat plate is produced.
The present invention utilizes an alkali metal pyrophosphate as an electrolyte. This is to be contrasted to the normally employed cyanide electrolyte of the prior art and certain organic acid salts. Moreover, the pyrophosphate of the present invention is to be contrasted to prior art technology involving ordinary phosphates and phosphites.
What is claimed is:
1. A gold electroplating aqueous solution consisting essentially of a solution of alkali metal gold cyanide in sufiicient quantity to provide about one ounce troy of gold per gallon of solution, and alkali metal pyrophosphate in sufi'icient quantity to provide, on a pyrophosphate basis, about one pound of pyrophosphate per gal- 1011 of solution, said solution having a pH from about 7 to 8 and containing benzyl alcohol as a brightening agent in sufiicient quantity to produce a substantially 24 carat gold plate.
2. The electroplating solution of claim 1 in Which said alkali metal pyrophosphate is potassium pyr'ophosphatc, the concentration thereof being about two pounds per gallon of solution.
3. In the method of electroplating an article with gold, the step which comprises passing a current from an inactive anode through the gold electroplating solution of claim 1 in which said article serves as the cathode, and wherein said alkali metal pyrophosphate is potassium pyrophosphate.
4. In the method of electroplating an article with gold, the step which comprises passing a current from an inactive anode through the gold electroplating solution of claim 1 in which said article serves as the cathode, and wherein said alkali metal pyrophosphate is sodium pyrophosphate.
References Cited UNITED STATES PATENTS 3,193,350 7/ 1965 Beltz et al. 23-165 2,871,171 1/ 1959 Atkinson 204-52 XR 923,864 6/ 1909 Levy 20446 XR 2,812,299 11/ 1957 Volk 204--46 XR 3,039,942 6/1962 Cox 20446 XR 3,057,789 10/1962 Smith 204-46 FOREIGN PATENTS 695,628 10/ 1964 Canada. 1,314,288 11/ 1962 France.
354,643 7/ 1961 Switzerland.
JOHN H. MACK, Primary Examiner G. L. KAPLAN, Assistant Examiner
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49233665A | 1965-10-01 | 1965-10-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3505182A true US3505182A (en) | 1970-04-07 |
Family
ID=23955864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US492336A Expired - Lifetime US3505182A (en) | 1965-10-01 | 1965-10-01 | Method and solution for gold electroplating |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3505182A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1980001221A1 (en) * | 1978-11-29 | 1980-06-12 | Nasa | Catalytic surface for redox cell electrode |
| US4243729A (en) * | 1978-07-31 | 1981-01-06 | Semi-Alloys, Inc. | Metallic hermetic sealing cover for a container |
| US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
| US20030102226A1 (en) * | 2001-10-02 | 2003-06-05 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
| US20090007631A1 (en) * | 2004-08-02 | 2009-01-08 | Daikin Industries, Ltd. | Oxygen Electrode |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US923864A (en) * | 1908-02-03 | 1909-06-08 | Alfred Levy | Process for the electric dissociation of metals by the wet method. |
| US2812299A (en) * | 1949-05-05 | 1957-11-05 | Birle & Co K G | Electrolytic deposition of gold and gold alloys |
| US2871171A (en) * | 1956-05-10 | 1959-01-27 | Atkinson James Thomas Nesbitt | Method of electroplating copper on aluminum |
| CH354643A (en) * | 1959-11-24 | 1961-05-31 | Mermillod Jean | Bath for the galvanic deposition of shiny gold alloy, method of preparation and use of said bath |
| US3039942A (en) * | 1961-09-20 | 1962-06-19 | Cox George Chandler | Electrodeposition of metals using pyrophosphates |
| US3057789A (en) * | 1959-02-26 | 1962-10-09 | Paul T Smith | Gold plating bath and process |
| FR1314288A (en) * | 1961-02-08 | 1963-01-04 | Engelhard Ind Ltd | Gold electrolytic deposition process |
| CA695628A (en) * | 1964-10-06 | G. Foulke Donald | Bright gold plating | |
| US3193350A (en) * | 1960-03-05 | 1965-07-06 | Knapsack Ag | Method of producing higher polyphosphoric acids |
-
1965
- 1965-10-01 US US492336A patent/US3505182A/en not_active Expired - Lifetime
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA695628A (en) * | 1964-10-06 | G. Foulke Donald | Bright gold plating | |
| US923864A (en) * | 1908-02-03 | 1909-06-08 | Alfred Levy | Process for the electric dissociation of metals by the wet method. |
| US2812299A (en) * | 1949-05-05 | 1957-11-05 | Birle & Co K G | Electrolytic deposition of gold and gold alloys |
| US2871171A (en) * | 1956-05-10 | 1959-01-27 | Atkinson James Thomas Nesbitt | Method of electroplating copper on aluminum |
| US3057789A (en) * | 1959-02-26 | 1962-10-09 | Paul T Smith | Gold plating bath and process |
| CH354643A (en) * | 1959-11-24 | 1961-05-31 | Mermillod Jean | Bath for the galvanic deposition of shiny gold alloy, method of preparation and use of said bath |
| US3193350A (en) * | 1960-03-05 | 1965-07-06 | Knapsack Ag | Method of producing higher polyphosphoric acids |
| FR1314288A (en) * | 1961-02-08 | 1963-01-04 | Engelhard Ind Ltd | Gold electrolytic deposition process |
| US3039942A (en) * | 1961-09-20 | 1962-06-19 | Cox George Chandler | Electrodeposition of metals using pyrophosphates |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4243729A (en) * | 1978-07-31 | 1981-01-06 | Semi-Alloys, Inc. | Metallic hermetic sealing cover for a container |
| WO1980001221A1 (en) * | 1978-11-29 | 1980-06-12 | Nasa | Catalytic surface for redox cell electrode |
| US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
| US20030102226A1 (en) * | 2001-10-02 | 2003-06-05 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
| US6773573B2 (en) * | 2001-10-02 | 2004-08-10 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
| US20090007631A1 (en) * | 2004-08-02 | 2009-01-08 | Daikin Industries, Ltd. | Oxygen Electrode |
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