US3420665A - Heat-sensitive diazotype materials - Google Patents
Heat-sensitive diazotype materials Download PDFInfo
- Publication number
- US3420665A US3420665A US483865A US3420665DA US3420665A US 3420665 A US3420665 A US 3420665A US 483865 A US483865 A US 483865A US 3420665D A US3420665D A US 3420665DA US 3420665 A US3420665 A US 3420665A
- Authority
- US
- United States
- Prior art keywords
- heat
- diazotype
- sensitive
- materials
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title description 32
- -1 4-morpholinobenzenediazonium salt Chemical class 0.000 description 25
- 238000005859 coupling reaction Methods 0.000 description 17
- 150000008049 diazo compounds Chemical class 0.000 description 17
- 230000008878 coupling Effects 0.000 description 16
- 238000010168 coupling process Methods 0.000 description 16
- 239000002253 acid Substances 0.000 description 9
- 229940100389 Sulfonylurea Drugs 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 239000000987 azo dye Substances 0.000 description 6
- 238000009472 formulation Methods 0.000 description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 229910052717 sulfur Chemical group 0.000 description 3
- 239000011593 sulfur Chemical group 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 238000009498 subcoating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ZIRLDYOJRFPDFO-UHFFFAOYSA-N 1-butyl-1-(4-methylphenyl)sulfonylurea Chemical compound CCCCN(C(N)=O)S(=O)(=O)C1=CC=C(C)C=C1 ZIRLDYOJRFPDFO-UHFFFAOYSA-N 0.000 description 1
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 1
- ZXRDXVAFRQBJQE-UHFFFAOYSA-N 1-cyclohexyl-3-(4-methylphenyl)sulfonylthiourea Chemical compound C1=CC(C)=CC=C1S(=O)(=O)NC(=S)NC1CCCCC1 ZXRDXVAFRQBJQE-UHFFFAOYSA-N 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- KLZDEEDOBAPARF-UHFFFAOYSA-N 3-oxo-n-[2-(3-oxobutanoylamino)ethyl]butanamide Chemical compound CC(=O)CC(=O)NCCNC(=O)CC(C)=O KLZDEEDOBAPARF-UHFFFAOYSA-N 0.000 description 1
- JQVAPEJNIZULEK-UHFFFAOYSA-N 4-chlorobenzene-1,3-diol Chemical compound OC1=CC=C(Cl)C(O)=C1 JQVAPEJNIZULEK-UHFFFAOYSA-N 0.000 description 1
- NJYDJNRTEZIUBS-UHFFFAOYSA-N 4-morpholin-4-ylbenzenediazonium Chemical compound C1=CC([N+]#N)=CC=C1N1CCOCC1 NJYDJNRTEZIUBS-UHFFFAOYSA-N 0.000 description 1
- YTVSBURBOWIMMD-UHFFFAOYSA-M 4-morpholin-4-ylbenzenediazonium;chloride Chemical compound [Cl-].C1=CC([N+]#N)=CC=C1N1CCOCC1 YTVSBURBOWIMMD-UHFFFAOYSA-M 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- HFKIZHKRIDQCIY-UHFFFAOYSA-N NC1=CC=C(NCC)C=C1.NC1=CC=C(N(CC)CC)C=C1 Chemical compound NC1=CC=C(NCC)C=C1.NC1=CC=C(N(CC)CC)C=C1 HFKIZHKRIDQCIY-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- JLRGJRBPOGGCBT-UHFFFAOYSA-N Tolbutamide Chemical compound CCCCNC(=O)NS(=O)(=O)C1=CC=C(C)C=C1 JLRGJRBPOGGCBT-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- DYRDKSSFIWVSNM-UHFFFAOYSA-N acetoacetanilide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1 DYRDKSSFIWVSNM-UHFFFAOYSA-N 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000005840 aryl radicals Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000004799 bromophenyl group Chemical group 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000006193 diazotization reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- KWGFMMAPDMTJHX-UHFFFAOYSA-N sulfonylthiourea Chemical compound SC(=N)N=S(=O)=O KWGFMMAPDMTJHX-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
- G03C1/615—Substances generating bases
Definitions
- Diazotype materials comprising a base sheet (e.g., paper) coated with a diazo compound (e.g., a 4-morpholinobenzenediazonium salt), a coupling component (e.g., resorcinol) and a heat-sensitive aromatic sulfonylurea or sulfonylthiourea developing agent (e.g., N-p-toluenesulfonyl-N'-butylurea).
- a base sheet e.g., paper
- a diazo compound e.g., a 4-morpholinobenzenediazonium salt
- a coupling component e.g., resorcinol
- a heat-sensitive aromatic sulfonylurea or sulfonylthiourea developing agent e.g., N-p-toluenesulfonyl-N'-butylurea
- This invention relates to methods and compositions for developing diazotype materials with aromatic sulfonylureas and sulfonylthioureas. More particularly, this invention pertains to diazotype materials containing compounds of the general formula wherein Ar is an aromatic radical, R is a nonaromatic hydrocarbon radical and X is oxygen or sulfur.
- Heat-sensitive diazotype materials comprise a base member coated with a formulation containing a diazo compound and a coupling component with which the diazo compound reacts under proper conditions to form an azo dye which produces a visible image.
- the diazotype material is exposed to light under a translucent master. In those areas of the diazotype material which are exposed to light, the light-sensitive diazo compound is at least partially destroyed but is unaifected in the shaded areas.
- the print is then developed by heating the diazotype material and causing the alkaline donor developing agent to emit ammonia or an organic amine which produces the proper pH conditions for interaction of the diazo compound and the coupling component. These react to produce a dye image in the shaded area which corresponds to the graphic material on the master.
- the alkaline donor developer is commonly a urea or thiourea compound which on decomposition at elevated temperatures yields ammonia which induces the coupling reaction to form the azo dye.
- Urea and thiourea compounds produce diazotype materials having a relatively poor shelf life due to precoupling of the diazo compound and the coupling component at ambient temperatures.
- Other heatsensitive diazotype materials which have longer shelf lives usually require higher temperatures to induce coupling. Generally, these temperatures are too high for ofiice equipment and often they are so high that the diazo compound decomposes more rapidly than it reacts with the coupling component to form the azo dye.
- aromatic sulfonylureas and sulfonylthioureas of the foregoing general formula are particularly useful as alkaline donor developing agents in thermally developed diazotype materials.
- Ar represents aromatic radicals such as phenyl, tolyl, indenyl, hydrindenyl, xylyl and related aromatic hydrocarbon radicals.
- Ar also represents aromatic hydrocarbon radicals bearing substituents such as halogen, alkoxyl, alkyl and alkoxyalkoxyl.
- Ar can be chlorophenyl, bromophenyl, methoxyphenyl, ethoxyphenyl, ethylphenyl, butylphenyl, methoxyethoxyphenyl, ethoxyethoxyphenyl and the like.
- R represents alkyl radicals such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, amyl, hexyl, octyl, nonyl,
- alkenyl radicals such as allyl crotyl
- alicyclic radicals such as cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, cycloheptyl and cyclooctyl
- aralkyl radicals such as benzyl, phenethyl, phenylpropyl and phenylbutyl.
- the alkaline donor incorporated into the heat-sensitive diazotype formulation be stable at room temperatures, and provide sufiicient basicity at lower temperatures to neutralize theacid stabilizers so that the diazo compound can couple and produce azo-dye images. It is desirable that the alkaline donors respond at temperatures in the range of 50-l50 C. and release the amine when the diazotype material is heated to such temperature.
- This amine raises the pH of the diazotype coating to a range wherethe diazo compound reacts with the coupling component and forms a colored azo dye.
- the latter forms a visible image in the areas corresponding to the graphic material on the master.
- the light-sensitive diazo compounds which are useful in two-component diazotype systems can also be used to advantage in thermally responsive diazotype materials.
- the preferred coupling component that may be employed to produce the dye image is 2,4-dihydroxynaphthalene-G-sulfonic acid.
- Other known couplers may be employed such as resorcinol, acetoacetanilide, 4-chloro resorcinol and diacetoacetylethylenediamine.
- the coupling component is preferably selected to provide a combination in which precoupling at low pH is avoided.
- the diazo salts and the couplers may, in and of themselves, tend to give a color reaction prematurely.
- an acid component to keep the pH below the level required for coupling.
- Sulfonic acid derivatives such as rn-benzenedisulfonic acid, are employed as the preferred acid components.
- Other acids may be used to produce the desired pH such as:
- aromatic sulfonylureas and sulfonylthioureas When the aromatic sulfonylureas and sulfonylthioureas are applied to sheet materials in the production of diazotype materials, they are dissolved or dispersed in fine particulate form in an organic solvent such as toluene and the resulting suspension applied to the sheet material by conventional coating procedures.
- the aromatic sulfonylureas or sulfonylthioureas are usually present in the solutions or dispersions at concentrations of 5% to 20% by weight, the range from 9% to 11% being preferred.
- the aromatic sulfonylureas and sulfonylthioureas form a thin coating of fine crystalline or solid particles which can release an organic amine when activated by heat.
- the amount of diazo compound is usually conventional. It generally constitutes 2% to 6% of the formulation with 4% being preferred. Equivalent quantities of coupling reagent are employed, following conventional practice. The coating formulations are usually applied in amounts which will provide about 15 grams of diazo compound for 3,000 square feet of surface.
- a heat-sensitive diazotype material comprising a base sheet coated with a diazo compound, a coupling component and an alkaline donor developer of the general formula wherein Ar is an aromatic radical, R is a nonaromatic hydrocarbon radical and X is oxygen or sulfur.
- a heat-sensitive diazotype material comprising a base sheet coated with a light-sensitive diazo compound, a coupling component and an alkaline donor substance of the formula wherein Z is hydrogen, alkyl, halogen, alkoxyl or alkoxyalkoxyl, R is alkyl, cycloalkyl, alkenyl or aralkyl and X is oxygen or sulfur.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
United States Patent 3,420,665 HEAT-SENSITIVE DIAZOTYPE MATERIALS Edward C. Bialczak, Mount Prospect, Ill., assignor to Addressograph-Multigraph Corporation, Cleveland, Ohio, a corporation of Delaware No Drawing. Filed Aug. 30, 1965, Ser. No. 483,865
US. Cl. 96-75 6 Claims Int. Cl. G03c 1/52 ABSTRACT OF THE DISCLOSURE Diazotype materials comprising a base sheet (e.g., paper) coated with a diazo compound (e.g., a 4-morpholinobenzenediazonium salt), a coupling component (e.g., resorcinol) and a heat-sensitive aromatic sulfonylurea or sulfonylthiourea developing agent (e.g., N-p-toluenesulfonyl-N'-butylurea).
This invention relates to methods and compositions for developing diazotype materials with aromatic sulfonylureas and sulfonylthioureas. More particularly, this invention pertains to diazotype materials containing compounds of the general formula wherein Ar is an aromatic radical, R is a nonaromatic hydrocarbon radical and X is oxygen or sulfur.
Heat-sensitive diazotype materials comprise a base member coated with a formulation containing a diazo compound and a coupling component with which the diazo compound reacts under proper conditions to form an azo dye which produces a visible image. In making a print, the diazotype material is exposed to light under a translucent master. In those areas of the diazotype material which are exposed to light, the light-sensitive diazo compound is at least partially destroyed but is unaifected in the shaded areas. The print is then developed by heating the diazotype material and causing the alkaline donor developing agent to emit ammonia or an organic amine which produces the proper pH conditions for interaction of the diazo compound and the coupling component. These react to produce a dye image in the shaded area which corresponds to the graphic material on the master. In conventional heat-sensitive diazotype materials the alkaline donor developer is commonly a urea or thiourea compound which on decomposition at elevated temperatures yields ammonia which induces the coupling reaction to form the azo dye. Urea and thiourea compounds produce diazotype materials having a relatively poor shelf life due to precoupling of the diazo compound and the coupling component at ambient temperatures. Other heatsensitive diazotype materials which have longer shelf lives usually require higher temperatures to induce coupling. Generally, these temperatures are too high for ofiice equipment and often they are so high that the diazo compound decomposes more rapidly than it reacts with the coupling component to form the azo dye. To cope with the problem of precoupling, increased amounts of acid have been used to stabilize the formulations, thus re- Patented Jan. 7, 1969 quiring increased amounts of alkaline donor to be incorporated into the formula to provide a sufiicient source of ammonia to give a suitably dense image. For example, British Patent No. 909,491 proposes the use of certain types of acids which lose their acidity on heating and thereby reduce the required quantity of alkaline donor since at developing temperatures the acid is dissipated.
It is an object of this invention to provide heat-sensitive diazotype materials wherein the alkaline donor is stable at ambient temperature, decomposes to produce alkaline substances at relatively low temperature and does not contribute to precoupling. It is another object of this invention to provide heat-sensitive diazotype materials which form good prints and which have extended shelf life. It is a further object to provide alkaline donor materials for heat-sensitive diazotype materials which decompose at relatively low temperatures to provide alkaline materials which induce dye formation. These and other objects are apparent from and are achieved in accordance with the following disclosure.
In accordance with the present invention, it has been discovered that aromatic sulfonylureas and sulfonylthioureas of the foregoing general formula are particularly useful as alkaline donor developing agents in thermally developed diazotype materials. In these compounds, Ar represents aromatic radicals such as phenyl, tolyl, indenyl, hydrindenyl, xylyl and related aromatic hydrocarbon radicals. Ar also represents aromatic hydrocarbon radicals bearing substituents such as halogen, alkoxyl, alkyl and alkoxyalkoxyl. For instance, Ar can be chlorophenyl, bromophenyl, methoxyphenyl, ethoxyphenyl, ethylphenyl, butylphenyl, methoxyethoxyphenyl, ethoxyethoxyphenyl and the like.
R represents alkyl radicals such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, amyl, hexyl, octyl, nonyl,
v lauryl and cetyl; alkenyl radicals such as allyl crotyl,
me'thallyl, and butenyl; alicyclic radicals such as cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, cycloheptyl and cyclooctyl; and aralkyl radicals such as benzyl, phenethyl, phenylpropyl and phenylbutyl.
It is important that the alkaline donor incorporated into the heat-sensitive diazotype formulation be stable at room temperatures, and provide sufiicient basicity at lower temperatures to neutralize theacid stabilizers so that the diazo compound can couple and produce azo-dye images. It is desirable that the alkaline donors respond at temperatures in the range of 50-l50 C. and release the amine when the diazotype material is heated to such temperature.
The aromatic sulfonylureas and sulfonylthioureas de scribed herein decompose when heated to temperatures in the range from to C. and release an amine of the formula RNH This amine raises the pH of the diazotype coating to a range wherethe diazo compound reacts with the coupling component and forms a colored azo dye. The latter forms a visible image in the areas corresponding to the graphic material on the master.
The light-sensitive diazo compounds which are useful in two-component diazotype systems can also be used to advantage in thermally responsive diazotype materials.
Examples of such compounds are the diazonium salts obtained by the diazotization of the following amines:
p-amino-N,N-diethylaniline p-amino-N-ethylaniline p-amino-N-ethyl-N-B-hydroxyethylaniline p-amino-N-methyl-N-B-hydroxyethylaniline p-amino-N,N-di fi-hydroxyethyl) aniline p-amino-m-ethoxy-N,N-diethylaniline p-amino-N-ethyl-o-toluidine p-amino-N-ethyl-m-toluidine p-amino-N,N-diethyl-m-toluidine p-amino-N-ethyl-N-fi-hydroxyethyl-m-toluidine N-p-aminophenylmorpholine 1-amino-2,5-diethoxy-4-morpholinobenzene The preferred diazo compound is the zinc chloride double salt of 4-morpholinobenzenediazonium chloride Generally, a number of coupling components may be employed. The preferred coupling component that may be employed to produce the dye image is 2,4-dihydroxynaphthalene-G-sulfonic acid. Other known couplers may be employed such as resorcinol, acetoacetanilide, 4-chloro resorcinol and diacetoacetylethylenediamine. The coupling component is preferably selected to provide a combination in which precoupling at low pH is avoided.
The diazo salts and the couplers may, in and of themselves, tend to give a color reaction prematurely. To pr..- vent precoupling and premature dye formation, there is added an acid component to keep the pH below the level required for coupling. Sulfonic acid derivatives, such as rn-benzenedisulfonic acid, are employed as the preferred acid components. Other acids may be used to produce the desired pH such as:
maleic acid malonic acid ethanesulfonic acid benzenesulfonic acid oxalic acid citric acid tartaric acid lactic acid In addition to the acid components, there may be added to the diazo formulation certain heavy metal salts such as the sulfates of zinc and cadmium. The inclusion of the heavy metal salts tends to prevent precoupling of the components at near room temperature.
By appropriate combinations of aromatic sulfonylureas and sulfonylthioureas and acids, such as those listed above, it is possible to develop pH ranges between 5 and 12 which will induce reaction between any combination of diazo compound and coupling component.
When the aromatic sulfonylureas and sulfonylthioureas are applied to sheet materials in the production of diazotype materials, they are dissolved or dispersed in fine particulate form in an organic solvent such as toluene and the resulting suspension applied to the sheet material by conventional coating procedures. The aromatic sulfonylureas or sulfonylthioureas are usually present in the solutions or dispersions at concentrations of 5% to 20% by weight, the range from 9% to 11% being preferred. After the solvent evaporates, the aromatic sulfonylureas and sulfonylthioureas form a thin coating of fine crystalline or solid particles which can release an organic amine when activated by heat.
In the photosensitive coating formulations for sheet materials, the amount of diazo compound is usually conventional. It generally constitutes 2% to 6% of the formulation with 4% being preferred. Equivalent quantities of coupling reagent are employed, following conventional practice. The coating formulations are usually applied in amounts which will provide about 15 grams of diazo compound for 3,000 square feet of surface.
The invention is disclosed in more detail by the following examples which are provided for purposes of illustration only. It will be understood by those skilled in the art that various combinations of diazo compounds, coupling components and alkaline donor developers can be used. It will also be understood that the amounts of ingredients in formulations and the operating conditions may be varied within this disclosure without departing from the invention.
EXAMPLE 1 A solution of 2.5 grams of N-p-toluenesulfonyl-N- butylurea in grams of toluene was applied to standard diazo paper (300 square feet) by a roller applicator and the excess doctored by the conventional air knife method. Then a sensitizing solution of the following formula was applied:
developed copies by exposing it to actinic light under a transparent original and subsequently developing the exposed sheet by subjecting it to a temperature of 125 C. for five seconds on a heated rotating aluminum drum, 3 clear and legible blue image being formed.
EXAMPLE 2 Polyester film base, to which a subcoating of cellulose acetate, cellulose acetate butyrate, cellulose propionate or other subcoating capable of accepting the sensitizing solution, was coated with the following sensitizing solution:
Methanol cc 60 Acetone N 40 Tartaric acid g 2 Thiourea g 3 Resorcinol g 3 p-Morpholinobenzenediazonium fluoborate g 1.5 N-p-toluenesulfonyl-N'-cyclohexylthiourea g 5 A reddish brown azo dye was formed when the film was heated to C. for approximately 4 minutes.
I claim:
1. A heat-sensitive diazotype material comprising a base sheet coated with a diazo compound, a coupling component and an alkaline donor developer of the general formula wherein Ar is an aromatic radical, R is a nonaromatic hydrocarbon radical and X is oxygen or sulfur.
2. A heat-sensitive diazotype material as defined in claim 1 wherein Ar is an aryl radical, R is an alkyl radical and X is oxygen.
3. A heat-sensitive diazotype material comprising a base sheet coated with a light-sensitive diazo compound, a coupling component and an alkaline donor substance of the formula wherein Z is hydrogen, alkyl, halogen, alkoxyl or alkoxyalkoxyl, R is alkyl, cycloalkyl, alkenyl or aralkyl and X is oxygen or sulfur.
4. A heat-sensitive diazotype material as defined by claim 3 wherein Z is alkyl and R is alkyl.
5. A heat-sensitive diazotype material as defined by claim 4 wherein Z is methyl and R is n-butyl.
6. A heat-sensitive diazotype material as defined by claim 4 wherein Z is methyl and R is cyclohexyl.
References Cited UNITED STATES PATENTS FOREIGN PATENTS 11/1960 France. 7/1963 France.
OTHER REFERENCES Kosar, J., Photographic Science & Eng, vol. 5, No. 4, August 1961, pp. 239243.
L tz 96-91 J. TRAVIS BROWN, Primary Examiner. von Glahn et a1. 9691 Botkin et a1. 10 C. BOWERS, Asszstant Exammer.
Sus et a1 96-91 XR US. Cl. X.R. Klirnkowski et a1 9691 96--49, 91
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48386565A | 1965-08-30 | 1965-08-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3420665A true US3420665A (en) | 1969-01-07 |
Family
ID=23921813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US483865A Expired - Lifetime US3420665A (en) | 1965-08-30 | 1965-08-30 | Heat-sensitive diazotype materials |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3420665A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307170A (en) * | 1980-06-18 | 1981-12-22 | James River Graphics, Inc. | Negative-working diazo type photoreproduction having improved pH control |
| US4411979A (en) * | 1981-01-28 | 1983-10-25 | Ricoh Company, Ltd. | Diazo type thermosensitive recording material |
| EP0120403A3 (en) * | 1983-03-16 | 1984-11-28 | Fuji Photo Film Co., Ltd. | Heat developable color photographic materials |
| US6280913B1 (en) | 2000-06-13 | 2001-08-28 | Eastman Kodak Company | Photographic element comprising an ion exchanged photographically useful compound |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1857920A (en) * | 1929-02-09 | 1932-05-10 | Anciens Ets Salvatori & Cie | Light sensitive papers and other bases and light sensitive layers therefore |
| US2432549A (en) * | 1945-12-12 | 1947-12-16 | Gen Aniline & Film Corp | Diazotype layers containing thiourea derivatives of hydroxy benzene |
| US2727820A (en) * | 1952-04-29 | 1955-12-20 | Gen Aniline & Film Corp | Light-sensitive diazotype layers containing carboxamides |
| FR1249913A (en) * | 1959-11-23 | 1961-01-06 | Bauchet & Cie Ets | Heat-developable diazotype product |
| FR1336307A (en) * | 1962-07-19 | 1963-08-30 | Bauchet & Cie Ets | Photosensitive heat-developable diazotype product and method of preparation thereof |
| US3272627A (en) * | 1963-11-26 | 1966-09-13 | Keuffel & Esser Co | Photothermographic diazo material and its method of use for photocopying |
| US3316092A (en) * | 1963-05-09 | 1967-04-25 | Dietzgen Co Eugene | Diazotype material comprising a metal sulfate nitrogenous compound and polymeric anhydride |
-
1965
- 1965-08-30 US US483865A patent/US3420665A/en not_active Expired - Lifetime
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1857920A (en) * | 1929-02-09 | 1932-05-10 | Anciens Ets Salvatori & Cie | Light sensitive papers and other bases and light sensitive layers therefore |
| US2432549A (en) * | 1945-12-12 | 1947-12-16 | Gen Aniline & Film Corp | Diazotype layers containing thiourea derivatives of hydroxy benzene |
| US2727820A (en) * | 1952-04-29 | 1955-12-20 | Gen Aniline & Film Corp | Light-sensitive diazotype layers containing carboxamides |
| FR1249913A (en) * | 1959-11-23 | 1961-01-06 | Bauchet & Cie Ets | Heat-developable diazotype product |
| FR1336307A (en) * | 1962-07-19 | 1963-08-30 | Bauchet & Cie Ets | Photosensitive heat-developable diazotype product and method of preparation thereof |
| US3316092A (en) * | 1963-05-09 | 1967-04-25 | Dietzgen Co Eugene | Diazotype material comprising a metal sulfate nitrogenous compound and polymeric anhydride |
| US3272627A (en) * | 1963-11-26 | 1966-09-13 | Keuffel & Esser Co | Photothermographic diazo material and its method of use for photocopying |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307170A (en) * | 1980-06-18 | 1981-12-22 | James River Graphics, Inc. | Negative-working diazo type photoreproduction having improved pH control |
| US4411979A (en) * | 1981-01-28 | 1983-10-25 | Ricoh Company, Ltd. | Diazo type thermosensitive recording material |
| EP0120403A3 (en) * | 1983-03-16 | 1984-11-28 | Fuji Photo Film Co., Ltd. | Heat developable color photographic materials |
| US6280913B1 (en) | 2000-06-13 | 2001-08-28 | Eastman Kodak Company | Photographic element comprising an ion exchanged photographically useful compound |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3166422A (en) | Diazotype heat development photographic paper comprising a sugar brightening agent | |
| US3046128A (en) | Thermally developable diazotype photoprinting material and production thereof | |
| US2653091A (en) | Photographic diazotype composition and heat development thereof | |
| US3469984A (en) | Heat-sensitive diazotype materials | |
| US2209087A (en) | Production of photographic diazotype prints | |
| US3420665A (en) | Heat-sensitive diazotype materials | |
| US3303028A (en) | Formation of diazo couplers in situ | |
| US3146348A (en) | Heat-sensitive copy-sheet | |
| US2552354A (en) | Diazotype layers containing diazos of n-(2-hydroxypropyl)-phenylenediamines | |
| US3367776A (en) | Heat sensitive diazotype materials | |
| US3169067A (en) | Heat developable diazotype material comprising an unsymmetrical urea as the base release agent | |
| US3309200A (en) | Data reproduction process | |
| US2326782A (en) | Photosensitive material | |
| US3529964A (en) | Heat developable diazo compositions and diazotype reproduction media | |
| US3480433A (en) | Thermally activatable diazotype compositions | |
| US2495827A (en) | Diazotype materials stabilized with an alpha-alkylidene-polymethylene dicarboxylic acid | |
| US3389996A (en) | Two-component heat developable diazotypes | |
| US3272627A (en) | Photothermographic diazo material and its method of use for photocopying | |
| US3331690A (en) | Development of diazotype papers without a coupler | |
| US3660581A (en) | Thermally developable diazotype printing paper and composition therefor | |
| US3389995A (en) | Two-component heat developable diazotypes containing amidine compounds | |
| US4055425A (en) | Diazotype material and graphic reproduction processes employing the same | |
| US3512978A (en) | Diazosulfonate composition,copying material,and method of use | |
| US3288627A (en) | Heat-sensitive diazotype material coated sheet | |
| US2523889A (en) | Diazotypes containing dialkoxy phenols |