US3206382A - Electrodeposition of platinum or palladium - Google Patents
Electrodeposition of platinum or palladium Download PDFInfo
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- US3206382A US3206382A US58890A US5889060A US3206382A US 3206382 A US3206382 A US 3206382A US 58890 A US58890 A US 58890A US 5889060 A US5889060 A US 5889060A US 3206382 A US3206382 A US 3206382A
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims description 60
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims description 40
- 229910052697 platinum Inorganic materials 0.000 title claims description 23
- 229910052763 palladium Inorganic materials 0.000 title claims description 18
- 238000004070 electrodeposition Methods 0.000 title description 7
- 150000001875 compounds Chemical class 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 11
- 239000003792 electrolyte Substances 0.000 claims description 10
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims description 7
- -1 NITRITO COMPOUND Chemical class 0.000 claims description 6
- 239000002253 acid Substances 0.000 description 17
- 238000007747 plating Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 239000011591 potassium Substances 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 239000010953 base metal Substances 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 229910000510 noble metal Inorganic materials 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 150000001340 alkali metals Chemical class 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- KKKDGYXNGYJJRX-UHFFFAOYSA-M silver nitrite Chemical compound [Ag+].[O-]N=O KKKDGYXNGYJJRX-UHFFFAOYSA-M 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- 239000001117 sulphuric acid Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JKNZUZCGFROMAZ-UHFFFAOYSA-L [Ag+2].[O-]S([O-])(=O)=O Chemical compound [Ag+2].[O-]S([O-])(=O)=O JKNZUZCGFROMAZ-UHFFFAOYSA-L 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- LDMNYTKHBHFXNG-UHFFFAOYSA-H disodium;platinum(4+);hexahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Pt+4] LDMNYTKHBHFXNG-UHFFFAOYSA-H 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Definitions
- This invention relates to improvements in and relating to the electrodeposition of platinum or palladium from aqueous solutions and is more particularly concerned with the provision of an improved plating bath for electrodepositing these metals on to the noble metals, such as gold or silver or on to the base metals, such as copper, nickel, or titanium.
- An object of the invention is to provide an improved plating bath for the electrodeposition of platinum or palladium which will give consistently good results over a wider range of thicknesses than hitherto found possible.
- Another object is to enable bright adherent deposits of platinum or palladium to be obtained on noble metals, such as silver or gold, or on base metals, such as copper,
- nickel or titanium over a wide range of thicknesses vary-' ing from 0.00001 to at least 0.001".
- Alkaline plating baths have been proposed in the past for the electrodeposition of platinum which contain complex compounds of platinum, such as sodium hex-ahydroxy platinate, Na Pt(OH) or diammine dinitrito-platinum, (NH Pt(NO).
- complex compounds of platinum such as sodium hex-ahydroxy platinate, Na Pt(OH) or diammine dinitrito-platinum, (NH Pt(NO)
- Such baths have, however, proved ineiiicient mainly owing to the fact that, whilst the initial deposit is satisfactory, the baths gradually deteriorate for various reasons with consequent reduction in efliciency and are thus only suitable for the deposition of thin or flash deposits of the order of 0.00001 to 0.0001" thick, heavier deposits tending to be dull and liable to crack or chip off.
- Such baths are operated at about 70 C. and have a pH of about 8-10.
- Such a bath is, however, difiicult to operate owing to the evolution of hydrochloric acid fumes at the high temperatures employed and, moreover, is only suitable for plating on to noble metals, base metals being attacked by the acid present in the bath.
- A represents an alkali metal, alkaline earth metal, an
- X represents platinum or palladium
- R represents a monovalent acid radicle or a hydroxide ion
- R represents a divalent acid rad-icle
- a 1, 2 or 3.
- the acid radicle may advantageously be the sulphate, chloride, perchlorate, oxalate or sulphamate ion.
- the cation constituent When an alkali metal is used to form the cation constituent, the latter is preferably derived from sodium or potassium. In practice, however, we have found that the most satisfactory results are obtained by the use of a hydrogen cation.
- Suitable compounds which may be employed in carryin g out our invention are:
- the compound ave prefer to use, however, consists of dinitrito-sulphat-o-platinous acid, H Pt(NO SO or dinitrito-sulphato-palladous acid, H Pd( NO SO).
- H Pt(NO SO or dinitrito-sulphato-palladous acid H Pd( NO SO)
- Example II The same complex compound as in Example I was pre pared by reacting potassium-chloro-platinite with silver nitrite and silver sulphate.
- Example IV The compound of Example III was prepared by reacting potassium chloroplatinite with silver nitrite according to the following equation:
- Example V DINITR'ITO-SULPHATO-PIIATINOUS ACID, HaPt (N02) 2%04 This compound was prepared by boiling a solution of platino-nitrous acid, H Pt(NO prepared by passing a solution of potassium platino-nitrite, K Pt(NO through a cation exchange column, with sulphuric acid. This reaction is exemplified by the following:
- the potassium constituent in the above examples may readily be replaced by sodium to give the corresponding salts of sodium.
- - Our invention thus also includes a method of electrodepositing platinum or palladium which method comprises electrolysing an electrolyte comprising an aqueous solution of a complex nitrito-platinite' compound or nitritopalladite compound of the general formula:
- A represents an alkali metal, alkaline earth metal, an
- X represents platinum or palladium
- R represents a monovalent acid radicle or a hydroxide ion
- R represents a divalent acid radicle
- a is l, 2, or 3
- our improved bath preferably contains 5-20 grams per litre of platinum or palladium as the nitrite, 5 grns./litre being found particularly suitable for general use. If a lower concentration be used, it will be found that the deposits are liable to be uneven and dark in appearance.
- the solution should preferably have a pH of below 2, as, above this figure, black powdery deposits result and there is heavy gassing at the cathode.
- the bath is advantageously operated at a current density of 525 amps/sq. ft. the lower figure being recommended for building up heavy deposits.
- the temperature of the bath should preferably be within the range of 30-70 C. as within this range the smooth bright appearance of the deposits remains unchanged. If the bath be operated below this temperature range, the deposits are liable to be rough and have a frosted appearance.
- Example VI A fiat copper base member was plated with platinum to a thickness of 0.0001" thick by the use of a bath comprising an aqueous solution containing 5 gms. per litre of platinum as dinitrito-sulphato-platinous acid, the bath being operated at a temperature of 30 C. and a current density of 5 amps/sq. ft. with the use of insoluble platinum anodes.
- the resulting deposit was bright and the absence of porosity and cracking was proved by electrographic tests.
- Example VII ment with 25% nitric acid for a period of 16 hours.
- Electro-deposits made in accordance with this invention will be found to be bright and smooth up to thicknesses of at least 0.001" and to require no polishing.
- the plating bath of the invention will, moreover, be found to be stable, to give consistent results and not to deteriorate on standing.
- the invention may be applied to the plating of noble metals, such as silver or gold and also to base metals, particularly efiicient results being obtained on copper, brass, silver, nickel, lead and titanium. Owing to the acid nature of the bath, it cannot be used for plating platinum or palladium directly on to iron, tin, zinc or cadmium, and with these metals, an underlayer of nickel or silver is recommended.
- noble metals such as silver or gold
- base metals particularly efiicient results being obtained on copper, brass, silver, nickel, lead and titanium. Owing to the acid nature of the bath, it cannot be used for plating platinum or palladium directly on to iron, tin, zinc or cadmium, and with these metals, an underlayer of nickel or silver is recommended.
- the invention is intended to include within its scope any articles composed of, or comprising, a noble metal or base metal member when plated with platinum or palladium by the method of, or with the use of a bath in accordance with, the invention.
- a method of electrodepositing a metal selected from the group consisting of platinum and palladium which method comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution of a complex nitrito compound of the selected metal, said compound having a general formula selected from the group:
- A represents a cation selected from the group consisting of alkali metal and hydrogen cations
- X represents the selected metal
- R represents an ion selected from the group consis ing of monovalent acid radicles
- R" represents a divalent acid radicle
- a is a number selected from the group of numbers 1, 2, and 3, and electrodepositing the selected metal from said electrolyte at a current density of 5-25 amps/sq. ft. and at a temperature of 30-70 C.
- a method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-dichloro-dinitritoplatinite, K Pt(NO Cl and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
- a method of electrodepositing palladium metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-dichlorodinitrito-palladite, K Pd(NO Cl and remainder water, said electrolysis being carried out at a temperature of 30-70 C. and at a current density of 525 amps/sq. ft.
- a method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-sulphato-dinitritoplatinite, K Pt(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
- a method of electrodepositing palladium metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-sulphatodinitrito-palladite, K Pd(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/sq. ft.
- a method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of dinitrito-sulphato-platinous acid, H Pt(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
United States Patent 3,206,332 ELECTRUDEPUSETEGN 0i PLATENUM 0R PALLADTUM Lesnie Frank Wilson, Enficld, and Norman Hoplrin, London, England, assignors to Johnson Matthey & Company Limited, London, Engiand, a British company No Drawing. Filed Sept. 28, 1960, Ser. No. 58,890 (Ziaizns priority, application Great Britain, Sept. 30, 1959, 33,207/59 9 tllaims. (U. 204-47) This invention relates to improvements in and relating to the electrodeposition of platinum or palladium from aqueous solutions and is more particularly concerned with the provision of an improved plating bath for electrodepositing these metals on to the noble metals, such as gold or silver or on to the base metals, such as copper, nickel, or titanium.
An object of the invention is to provide an improved plating bath for the electrodeposition of platinum or palladium which will give consistently good results over a wider range of thicknesses than hitherto found possible.
Another object is to enable bright adherent deposits of platinum or palladium to be obtained on noble metals, such as silver or gold, or on base metals, such as copper,
nickel or titanium, over a wide range of thicknesses vary-' ing from 0.00001 to at least 0.001".
Alkaline plating baths have been proposed in the past for the electrodeposition of platinum which contain complex compounds of platinum, such as sodium hex-ahydroxy platinate, Na Pt(OH) or diammine dinitrito-platinum, (NH Pt(NO Such baths have, however, proved ineiiicient mainly owing to the fact that, whilst the initial deposit is satisfactory, the baths gradually deteriorate for various reasons with consequent reduction in efliciency and are thus only suitable for the deposition of thin or flash deposits of the order of 0.00001 to 0.0001" thick, heavier deposits tending to be dull and liable to crack or chip off.
Such baths are operated at about 70 C. and have a pH of about 8-10.
In an attempt to avoid the disadvantages accompanying the use of alkaline plating baths, it has been suggested, for the electrodeposition of platinum, to employ an essentially acid bath consisting of a solution of chloroplatinic acid in concentrated hydrochloric acid operating at temperatures above 70 C.
Such a bath is, however, difiicult to operate owing to the evolution of hydrochloric acid fumes at the high temperatures employed and, moreover, is only suitable for plating on to noble metals, base metals being attacked by the acid present in the bath.
The deposition of platinum, palladium or rhodium from a plating bath comprising a solution of a double nitrite of the metal, such as sodium platino-nitrite or sodium pallado-nitrite, has also been suggested, but, so far as we are aware, the suggestion has found no practical application.
We have now 'found that the disadvantages inherent in the use of electrolytic baths, hitherto used or proposed for theelectrodeposition of platinum or palladium, can be readily overcome by the use, as the plating bath or electrolyte of an aqueous solution of a complex nitritoplatinite compound or nitrito-palladite compound of the general formula:
A X(NO2),.Rr-,.] or A2[X(N0 )..R
wherein A represents an alkali metal, alkaline earth metal, an
ammonium or hydrogen cation; X represents platinum or palladium;
"ice
R represents a monovalent acid radicle or a hydroxide ion;
R represents a divalent acid rad-icle, and
a is 1, 2 or 3.
The acid radicle may advantageously be the sulphate, chloride, perchlorate, oxalate or sulphamate ion.
When an alkali metal is used to form the cation constituent, the latter is preferably derived from sodium or potassium. In practice, however, we have found that the most satisfactory results are obtained by the use of a hydrogen cation.
Suitable compounds which may be employed in carryin g out our invention are:
( l Potassium-dichloro-dinitrito-platinite,
K Pt(NO Cl I l (2) Potassium-dichloro-dinitrito-palladite,
K2Pd(NO2)2C12.
(3 Potassium-sulphatodinitritoaplatinite,
x rtmop so,
(4) P0tassium-sulphato-dinitrito-palladite,
K Pd('NO SO The corresponding complex compounds of sodium may also be used.
The compound ave prefer to use, however, consists of dinitrito-sulphat-o-platinous acid, H Pt(NO SO or dinitrito-sulphato-palladous acid, H Pd( NO SO The following are examples of methods of preparing complex nitrito-platinite compounds for use in carrying out our invention, it being understood that no limitation is intended thereby either as regards the complex compound itself or its manner of manufacture.
Example I POTASSIUM-rS U'LPHATO-DINI-TDRITO-PDATLNI'DE,
K2Pt(NO2)2SO4 I This complex compound was prepared by reacting potassium-platino-nitrite with sulphuric acid, according to the following equation: I I
K Pt(NO -14-1 80,, K Pt N0 Example II The same complex compound as in Example I was pre pared by reacting potassium-chloro-platinite with silver nitrite and silver sulphate.
The reaction involved is illustrated by the following equation:
K PtCl -]-'2AgNO -{-AgS04 K Pt (N0 8 0 4AgCl Example III POTA'S-SIUM-IDICHLOEO-DINITRIIYOPLATIN'ITE, K2PII(NO2) 2C12 This compound was prepared by reacting potassiumplatino-nitrite with hydrochloric acid, according to the following equation:
Example IV The compound of Example III was prepared by reacting potassium chloroplatinite with silver nitrite according to the following equation:
Example V DINITR'ITO-SULPHATO-PIIATINOUS ACID, HaPt (N02) 2%04 This compound was prepared by boiling a solution of platino-nitrous acid, H Pt(NO prepared by passing a solution of potassium platino-nitrite, K Pt(NO through a cation exchange column, with sulphuric acid. This reaction is exemplified by the following:
l-H 80 H Pt(NO2) 2804+ It will be readily appreciated that the corresponding complex palladite compounds may be prepared in a similar manner by substituting potassium-pallado-nitrite for potassium-platino-nitrite in Examples I and III, by substituting potassium-chloro-palladite for potassium chloroplatinite in Examples II and IV, and by substituting a solution of pallado-nitrous acid for a solution of platino-nitrous acid in Example V.
Moreover, the potassium constituent in the above examples may readily be replaced by sodium to give the corresponding salts of sodium.
- Our invention, thus also includes a method of electrodepositing platinum or palladium which method comprises electrolysing an electrolyte comprising an aqueous solution of a complex nitrito-platinite' compound or nitritopalladite compound of the general formula:
X(NOZ),,R :l
wherein A represents an alkali metal, alkaline earth metal, an
ammonium or hydrogen cation;
X represents platinum or palladium;
R represents a monovalent acid radicle or a hydroxide ion;
R represents a divalent acid radicle, and
a is l, 2, or 3 In carrying out the invention in practice our improved bath preferably contains 5-20 grams per litre of platinum or palladium as the nitrite, 5 grns./litre being found particularly suitable for general use. If a lower concentration be used, it will be found that the deposits are liable to be uneven and dark in appearance.
The solution should preferably have a pH of below 2, as, above this figure, black powdery deposits result and there is heavy gassing at the cathode.
The bath is advantageously operated at a current density of 525 amps/sq. ft. the lower figure being recommended for building up heavy deposits.
The temperature of the bath should preferably be within the range of 30-70 C. as within this range the smooth bright appearance of the deposits remains unchanged. If the bath be operated below this temperature range, the deposits are liable to be rough and have a frosted appearance.
The following examples illustrate the manner in which the invention may be carried out, it being understood that the invention is in no way limited thereto or thereby.
Example VI A fiat copper base member was plated with platinum to a thickness of 0.0001" thick by the use of a bath comprising an aqueous solution containing 5 gms. per litre of platinum as dinitrito-sulphato-platinous acid, the bath being operated at a temperature of 30 C. and a current density of 5 amps/sq. ft. with the use of insoluble platinum anodes. The resulting deposit was bright and the absence of porosity and cracking was proved by electrographic tests.
Example VII ment with 25% nitric acid for a period of 16 hours.
Whilst the invention will be found to be particularly suitable for the electro-deposition of platinum and has been so specifically referred to above, it is to be understood that the invention is equally applicable to the electrodeposition of palladium, it merely being necessary to use the corresponding complex palladium compound instead of the platinum compound.
Electro-deposits made in accordance with this invention will be found to be bright and smooth up to thicknesses of at least 0.001" and to require no polishing.
Electrographic tests of platinum deposited on polished copper up to 0.0005" thick in accordance with the teachings of the invention, show that the deposits are free from porosity but that above 0.001 thick they are liable to show cracking. This tendency to cracking is, however, considerably reduced if etched copper, instead of polished copper, surfaces are used.
The plating bath of the invention will, moreover, be found to be stable, to give consistent results and not to deteriorate on standing.
The invention may be applied to the plating of noble metals, such as silver or gold and also to base metals, particularly efiicient results being obtained on copper, brass, silver, nickel, lead and titanium. Owing to the acid nature of the bath, it cannot be used for plating platinum or palladium directly on to iron, tin, zinc or cadmium, and with these metals, an underlayer of nickel or silver is recommended.
It is to be understood that the invention is intended to include within its scope any articles composed of, or comprising, a noble metal or base metal member when plated with platinum or palladium by the method of, or with the use of a bath in accordance with, the invention.
What we claim is:
l. A method of electrodepositing a metal selected from the group consisting of platinum and palladium which method comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution of a complex nitrito compound of the selected metal, said compound having a general formula selected from the group:
A represents a cation selected from the group consisting of alkali metal and hydrogen cations;
X represents the selected metal;
R represents an ion selected from the group consis ing of monovalent acid radicles;
R" represents a divalent acid radicle, and
a is a number selected from the group of numbers 1, 2, and 3, and electrodepositing the selected metal from said electrolyte at a current density of 5-25 amps/sq. ft. and at a temperature of 30-70 C.
2. A method according to claim 1 in which the acid radicle is selected from the group of ions consisting of the sulphate, chloride, perchlorate and oxalate ions.
3. A method according to claim 1 in which A is an alkali metal cation derived from the group consisting of potassium and sodium.
4. A method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-dichloro-dinitritoplatinite, K Pt(NO Cl and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
5. A method of electrodepositing palladium metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-dichlorodinitrito-palladite, K Pd(NO Cl and remainder water, said electrolysis being carried out at a temperature of 30-70 C. and at a current density of 525 amps/sq. ft.
6. A method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-sulphato-dinitritoplatinite, K Pt(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
7. A method of electrodepositing palladium metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of potassium-sulphatodinitrito-palladite, K Pd(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/sq. ft.
8. A method of electrodepositing platinum metal which comprises electrolysing an electrolyte having a pH value below 2 and consisting essentially of an aqueous solution consisting essentially of dinitrito-sulphato-platinous acid, H Pt(NO SO and remainder water, said electrolysis being carried out at a temperature of 3070 C. and at a current density of 5-25 amps/ sq. ft.
9. A method of electrodepositing palladium metal References Cited by the Examiner UNITED STATES PATENTS 1,993,623 3/35 Raper 20447 2,027,358 1/ 36 Powell et a1 20447 2,067,534 1/37 Keitel 20447 2,984,603 5/61 Duva et al. 20447 2,984,604 5/61 Duva et al 20447 OTHER REFERENCES Mellor: Comprehensive Treatise on Inorganic and Theoretical Chemistry, 1937, vol. 8, pages 514 and 522.
JOHN H. MACK, Primary Examiner.
JOHN R. SPECK, MURRAY TILLMAN, Examiners.
Claims (1)
1. A METHOD OF ELECTRODEPOSITING A METAL SELECTED FROM THE GROUP CONSISTING OF PLATINUM AND PALLADIUM WHICH METHOD COMPRISES ELECTROLYSING AN ELECTROLYTE HAVING A PH VALUE BELOW 2 AND CONSISTING ESSENTIALLY OF AN AQUEOUS SOLUTION OF A COMPLEX NITRITO COMPOUND OF THE SELECTED METAL, SAID COMPOUND HAVING A GENERAL FORMULA SELECTED FROM THE GROUP: A2(X(NO2)2 R''(4-A)) AND A2(X(NO2)A R"((4-A)/2)) WHEREIN
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB33207/59A GB897690A (en) | 1959-09-30 | 1959-09-30 | Improvements in and relating to the electrodeposition of platinum or palladium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3206382A true US3206382A (en) | 1965-09-14 |
Family
ID=10349948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US58890A Expired - Lifetime US3206382A (en) | 1959-09-30 | 1960-09-28 | Electrodeposition of platinum or palladium |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3206382A (en) |
| DE (1) | DE1182924B (en) |
| GB (1) | GB897690A (en) |
| MC (1) | MC228A1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3285754A (en) * | 1962-07-05 | 1966-11-15 | Johnson Matthey Co Ltd | Deposition of palladium |
| DE3400139A1 (en) * | 1983-01-07 | 1984-07-12 | Omi International Corp., Warren, Mich. | GALVANIC BATH FOR THE QUICK DEPOSIT OF PALLADIUM AND A METHOD FOR THE GALVANIC QUICK DEPOSIT OF PALLADIUM |
| US5102509A (en) * | 1988-09-07 | 1992-04-07 | Johnson Matthey Public Limited Company | Plating |
| US6306277B1 (en) | 2000-01-14 | 2001-10-23 | Honeywell International Inc. | Platinum electrolyte for use in electrolytic plating |
| KR20220100497A (en) | 2021-01-08 | 2022-07-15 | 니혼 엘렉트로플레이팅 엔지니어스 가부시키가이샤 | Platinum electrolytic plating bath and platinum plated product |
| WO2025170855A1 (en) | 2024-02-09 | 2025-08-14 | Heraeus Precious Metals North America LLC | Aqueous sulfuric acid solution suitable for electroplating a platinum film |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4427502A (en) | 1981-11-16 | 1984-01-24 | Bell Telephone Laboratories, Incorporated | Platinum and platinum alloy electroplating baths and processes |
| TWI876427B (en) | 2022-08-04 | 2025-03-11 | 英商強生麥特公司 | Method of manufacturing a plating solution comprising a platinum (ii) complex and platinum plating solution produced thereby |
| GB202217304D0 (en) | 2022-11-18 | 2023-01-04 | Johnson Matthey Plc | High efficiency platinum electroplating solutions |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1993623A (en) * | 1931-07-11 | 1935-03-05 | Int Nickel Co | Electrodeposition of platinum metals |
| US2027358A (en) * | 1931-03-12 | 1936-01-07 | Johnson Matthey Co Ltd | Electrodeposition of metals of the platinum group |
| US2067534A (en) * | 1937-01-12 | Method of and electrolyte for | ||
| US2984603A (en) * | 1958-08-06 | 1961-05-16 | Sel Rex Corp | Platinum plating composition and process |
| US2984604A (en) * | 1958-08-06 | 1961-05-16 | Sel Rex Corp | Platinum plating composition and process |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA347364A (en) * | 1935-01-08 | Richardson Raper Alan | Platinum metal electrodeposition |
-
1959
- 1959-09-30 GB GB33207/59A patent/GB897690A/en not_active Expired
-
1960
- 1960-09-28 US US58890A patent/US3206382A/en not_active Expired - Lifetime
- 1960-09-29 DE DEJ18785A patent/DE1182924B/en active Pending
- 1960-09-29 MC MC254A patent/MC228A1/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2067534A (en) * | 1937-01-12 | Method of and electrolyte for | ||
| US2027358A (en) * | 1931-03-12 | 1936-01-07 | Johnson Matthey Co Ltd | Electrodeposition of metals of the platinum group |
| US1993623A (en) * | 1931-07-11 | 1935-03-05 | Int Nickel Co | Electrodeposition of platinum metals |
| US2984603A (en) * | 1958-08-06 | 1961-05-16 | Sel Rex Corp | Platinum plating composition and process |
| US2984604A (en) * | 1958-08-06 | 1961-05-16 | Sel Rex Corp | Platinum plating composition and process |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3285754A (en) * | 1962-07-05 | 1966-11-15 | Johnson Matthey Co Ltd | Deposition of palladium |
| DE3400139A1 (en) * | 1983-01-07 | 1984-07-12 | Omi International Corp., Warren, Mich. | GALVANIC BATH FOR THE QUICK DEPOSIT OF PALLADIUM AND A METHOD FOR THE GALVANIC QUICK DEPOSIT OF PALLADIUM |
| US5102509A (en) * | 1988-09-07 | 1992-04-07 | Johnson Matthey Public Limited Company | Plating |
| US6306277B1 (en) | 2000-01-14 | 2001-10-23 | Honeywell International Inc. | Platinum electrolyte for use in electrolytic plating |
| US6521113B2 (en) | 2000-01-14 | 2003-02-18 | Honeywell International Inc. | Method of improving the oxidation resistance of a platinum modified aluminide diffusion coating |
| KR20220100497A (en) | 2021-01-08 | 2022-07-15 | 니혼 엘렉트로플레이팅 엔지니어스 가부시키가이샤 | Platinum electrolytic plating bath and platinum plated product |
| KR20230095905A (en) | 2021-01-08 | 2023-06-29 | 이이쟈 가부시키가이샤 | Platinum electrolytic plating bath and platinum plated product |
| WO2025170855A1 (en) | 2024-02-09 | 2025-08-14 | Heraeus Precious Metals North America LLC | Aqueous sulfuric acid solution suitable for electroplating a platinum film |
Also Published As
| Publication number | Publication date |
|---|---|
| GB897690A (en) | 1962-05-30 |
| MC228A1 (en) | 1961-04-18 |
| DE1182924B (en) | 1964-12-03 |
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