US3298834A - Diazotype photoprinting material susceptible to thermal development - Google Patents
Diazotype photoprinting material susceptible to thermal development Download PDFInfo
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- US3298834A US3298834A US292098A US29209863A US3298834A US 3298834 A US3298834 A US 3298834A US 292098 A US292098 A US 292098A US 29209863 A US29209863 A US 29209863A US 3298834 A US3298834 A US 3298834A
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- acid
- naphthalene
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- heating
- salt
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- 239000000463 material Substances 0.000 title claims description 35
- 239000002253 acid Substances 0.000 claims description 24
- 150000003839 salts Chemical class 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 16
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims description 13
- 230000007935 neutral effect Effects 0.000 claims description 12
- 239000003381 stabilizer Substances 0.000 claims description 12
- 150000001989 diazonium salts Chemical class 0.000 claims description 11
- 238000006149 azo coupling reaction Methods 0.000 claims description 10
- 230000008878 coupling Effects 0.000 claims description 9
- 238000010168 coupling process Methods 0.000 claims description 9
- 238000005859 coupling reaction Methods 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 230000002028 premature Effects 0.000 claims description 5
- 239000000203 mixture Substances 0.000 description 14
- 230000001235 sensitizing effect Effects 0.000 description 12
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- -1 DIAZO Chemical class 0.000 description 8
- 150000003863 ammonium salts Chemical class 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical class OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Chemical class OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000000987 azo dye Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Natural products OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- VILFVXYKHXVYAB-UHFFFAOYSA-N naphthalene-2,7-disulfonic acid Chemical class C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 VILFVXYKHXVYAB-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- GJMFIOIYHBJNOY-UHFFFAOYSA-N 2-(4-amino-n-methylanilino)ethanol Chemical compound OCCN(C)C1=CC=C(N)C=C1 GJMFIOIYHBJNOY-UHFFFAOYSA-N 0.000 description 1
- NXCOSEIUCIOFNB-UHFFFAOYSA-N 2-aminobenzenediazonium Chemical compound NC1=CC=CC=C1[N+]#N NXCOSEIUCIOFNB-UHFFFAOYSA-N 0.000 description 1
- WEMYXYMZQRSPIA-UHFFFAOYSA-N 4-(2,4-dihydroxyphenyl)sulfanylbenzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1SC1=CC=C(O)C=C1O WEMYXYMZQRSPIA-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001756 Polyvinyl chloride acetate Polymers 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- SAQSTQBVENFSKT-UHFFFAOYSA-M TCA-sodium Chemical compound [Na+].[O-]C(=O)C(Cl)(Cl)Cl SAQSTQBVENFSKT-UHFFFAOYSA-M 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical class NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000012445 acidic reagent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 238000006193 diazotization reaction Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 229940071826 hydroxyethyl cellulose Drugs 0.000 description 1
- 239000003230 hygroscopic agent Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical class OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 150000002689 maleic acids Chemical class 0.000 description 1
- 150000002691 malonic acids Chemical class 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical class C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 1
- HEWDOWUUTBCVJP-UHFFFAOYSA-N naphthalene-1,6-disulfonic acid Chemical class OS(=O)(=O)C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 HEWDOWUUTBCVJP-UHFFFAOYSA-N 0.000 description 1
- ZXHIJRQFXADDRH-UHFFFAOYSA-N naphthalene-1,8-diol naphthalene-2,3-diol Chemical compound OC1=CC=CC2=CC=CC(=C12)O.OC1=CC2=CC=CC=C2C=C1O ZXHIJRQFXADDRH-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002913 oxalic acids Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- QPILZZVXGUNELN-UHFFFAOYSA-M sodium;4-amino-5-hydroxynaphthalene-2,7-disulfonate;hydron Chemical compound [Na+].OS(=O)(=O)C1=CC(O)=C2C(N)=CC(S([O-])(=O)=O)=CC2=C1 QPILZZVXGUNELN-UHFFFAOYSA-M 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Chemical class OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
Definitions
- Two-component diazotype material comprises a supporting sheet, such as paper or film, having in a surface coating or layer, an azo coupling component and a stabilized light-sensitive diazonium compound, stablized against premature coupling by inclusion of an acid stabilizer.
- a supporting sheet such as paper or film
- an azo coupling component and a stabilized light-sensitive diazonium compound, stablized against premature coupling by inclusion of an acid stabilizer.
- the light-sensitive diazonium compound On exposure of such coating to actinic light under an opaque pattern on a translucent background, the light-sensitive diazonium compound is destroyed in the light-struck areas, and upon subsequent exposure to an alkaline developing medium such as gaseous ammonia, the acid stabilizer is neutralized and the residual diazonium compound couples with the azo coupling component to form an azo dye image corresponding to the opaque pattern of the original.
- Diazotype photoprinting material containing such reagents can be developed after exposure to light under an opaque pattern by heating at a temperature causing the aforesaid conversion or decomposition.
- the alkaline reaction product formed thereby neutralizes the acid stabilizer and causes imagewise coupling of the residual diazonium compound with the azo coupling component.
- 2,653,- 091 discloses inclusion in a two-component diazotype photoprinting layer of trichloroacetic acid as a stabilizer and an alkali metal, ammonium or nitrogen base salt of said acid as a heat sensitive alkali generating compound, said salt being decomposed on heating to yield an alkaline carbonate which promotes coupling.
- Acid stabilizers included in two-component diazotype material are usually organic acids such as citric acid, tartaric acid or the like.
- the stability of the photoprinting material aiforded by such stabilizers tends, how ever, to be reduced by the presence of the neutral to acid reagents which form an alkaline compound upon heating and this causes a critical reduction of the shelf life of the heat developable photoprinting material. While this effect can be reduced by increasing the amount of acid stabilizer, this has the disadvantage of impairing the development properties or requiring increased amounts of the heat-sensitive alkali generating reagents.
- the quantity of naphthalene sulfonic acid salt employed is preferably at least 5% of the other non-volatile ingredients of the sensitizing composition. Suitable proportions range up to about 25% of the other non-volatile ingredients of the sensitizing composition.
- the concentration of the naphthalene sulfonic acid salt in the sensitizing solution generally ranges from 1 to 10% by weight.
- the sensitizing compositions of this invention may contain as light-sensitive stable diazonium compounds, those listed in U.S.P. 2,501,874 and in the article by Van der Grinten in the Photographic Journal, volume 92-3 (1952), page 46. They are especially diazonium compounds derived from N-monoand N-disubstituted pphenylenediamines, e.g., the diazotization products of:
- Azo coupling components which can be incorporated in the photoprinting materials of the invention are:
- Heat responsive reagents having an acid to neutral reaction at room temperatures, but which are adapted on heating to temperatures between and 200 C. to yield an alkaline reacting component for neutralization of the acid stabilizer in the light-sensitive photoprinting material of the invention include the monoalkali metal salts of strong organic acids which are decomposed on heating to form basic compounds, such as the monoalkali metal salts of malonic, maleic or oxalic acids; alkali metal salts of aliphatic mono-carboxylic acids and especially the alkali metal (Na, K) and nitrogen base sats of trichloroacetic acid.
- reagents commonly employed in diazotype photoprinting materials for example hygroscopic agent such as glycerin; and wetting agents such as saponin, lauryl sulfate, keryl benzene sulfonate or oleyl-N-methyltaurine.
- finely divided or colloidal silica or alumina aqueous dispersions or colloidal solutions of organic film-forming binders, such as colloidally water-soluble polyvinyl alcohol, methyl cellulose, hydroxy ethyl cellulose, gelatin or the like or latex-like dispersions or resins such as polyvinyl acetate, polyvinyl chloride, polyvinyl chlorideacetate, polyvinylidene chloride, apolyacryl-onitrile or polymethylmethacrylate.
- organic film-forming binders such as colloidally water-soluble polyvinyl alcohol, methyl cellulose, hydroxy ethyl cellulose, gelatin or the like or latex-like dispersions or resins such as polyvinyl acetate, polyvinyl chloride, polyvinyl chlorideacetate, polyvinylidene chloride, apolyacryl-onitrile or polymethylmethacrylate.
- the components of the sensitizing composition are preferably incorporated in a single solution or suspension, and applied in a single coating step to the base.
- the latter may be paper or film, such as polyethylene-terephthalate (Mylar) and similar plastic materials which are capable of withstanding the elevated development temperatures.
- Mylar polyethylene-terephthalate
- the various components of the sensitizing compositions can be applied in successive coatings, one containing for example, the diazonium salt and another, the alkali generating heat-sensitive acid to neutral reagent, the azo coupling component being incorporated in either of the two layers.
- Materials coated in accordance with the invention are developed after exposure to actinic light under an opaque pattern by heating at temperatures between 100 and 200 C. or preferably between 120 and 160 C. at which decomposition or conversion of the acid to neutral heat sensitive reagent to an alkaline reacting material occurs, causing coupling of the residual diazonium compound With the azo coupling component in the areas corresponding to the opaque pattern to form an azo dye image thereof.
- Diazotype photoprinting materials containing naphthalene sulfonic acid salts in accordance with the present invention are characterized by superior shelf life and stability to decomposition in storage, without impairment of the rate and effectiveness of the heat development.
- Example I The following composition was coated on a paper base sheet and dried:
- a similar composition from which the naphthalene-1,3,6-trisulfonic acid salt was omitted was also coated on a paper sheet and dried.
- the dried materials were exposed under an opaque pattern to actinic light, and developed by passing the sheet over a cylinder heated at from 150 to 175 C. Similar development of an azo dye image was obtained with both materials.
- the two materials were then subjected to forced aging, and again tested as indicated above for making a photoprint of an opaque pattern.
- the results demonstrated that the material containing the naphthalene-trisulfonic acid salt was characterized by superior shelf life as compared with the material lacking said salt.
- Example II The procedures of Example I were repeated, except that for naphthalene-1,3,6-trisodium sulfonate, there was substituted an equal amount of naphthalene-2,7-disodium sulfonate. The results obtained were substantially the same as in the preceding example.
- Example 111 Paper was coated with the following sensitizing composition:
- Finely-divided silica (average particle size; 3-6
- compositions as well as one in which naphthalene-1,3,6-trisodiurn sulfonate is omitted were tested for photoprinting, and found to give substantially equal results on heat development. After forced aging, it was found that the material containing naphthalenetrisodium sulfonate was characterized by greatly superior shelf life as compared with the composition lacking said ingredient.
- sodium trichloroacetate can be replaced by the corresponding potassium salts, or by nitrogen base salts, e.g., trichloroacetates of diethanolamine or triethanolamine.
- nitrogen base salts e.g., trichloroacetates of diethanolamine or triethanolamine.
- monoalkali metal salts of heat decomposable organic acids such as the monoalkali metal salts of oxalic, maleic or malonic acid, as well as other heat-decomposable reagents of neutral to acid reaction mentioned in the discussion preceding the examples.
- naphthalene-1,3, 6-trisodium sulfonate instead of naphthalene-1,3, 6-trisodium sulfonate, other alkali metal or ammonium salts of naphthalene-1,3,6- trisulfo acid can be used, as well as corresponding amounts of alkali metal or ammonium salts of other naphthalene diand tri-sulfonic acids.
- the heat developable two-component diazotype photoprint materials of the invention are characterized in each case by superior shelf life as compared with similar materials lacking the naphthalene dior tri-sulfonic acid salts.
- Two-component diazotype photoprinting material susceptible to development on heating having on a surface of a supporting sheet, a light-sensitive layer containing an azo coupling component, a light-sensitive diazonium compound, an acid stabilizer against premature coupling, a neutral to acid monoalkali metal salt of a strong acid which is decomposed to yield an alkaline reacting compound on heating to a temperature between 100 and 200 C. and a neutral salt of a naphthalene sulfonic acid having the formula:
- n is an integer from 2 to 3, amounting to at least 5% by weight of the components of the light-sensitive layer.
- Diazotype photoprinting material as defined in claim 1 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-1,3,6-trisulfonic acid.
- Diazotype photoprinting materials as defined in claim 1 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-2,7-disulfonic acid.
- Diazotype photoprinting material as defined in claim 1, wherein the amount of said naphthalene sulfonic acid salt is from 5 to 25% of the remaining components of the light-sensitive layer.
- a sensitizing composition for two-component diazotype photoprinting material susceptible to development on heating containing in an aqueous medium, an azo coupling component, a light-sensitive diazonium compound, an acid stabilizer against premature coupling, a neutral to acid monoalkali metal salt of a strong acid which is decomposed to yield an alkaline reacting compound on heating to a temperature between 100 and 200 C. and at least 1% of a neutral salt of a naphthalenesulfonic acid having the formula:
- n is an integer from 2 to 3.
- a sensitizing composition as defined in claim 5 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-2,7-disu1fonic acid- S.
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Description
United States Patent 3,298,834 DIAZO'IYPE PHOTOPRINTING MATERIAL SUS- CEPTIBLE T0 THERMAL DEVELOPMENT Robert I. Eldred, Jr., Endicott, and John Joseph McKinney, Binghamton, N.Y., assignors to General Aniline & Film Corporation, New York, N .Y., a corporation of Delaware No Drawing. Filed July 1, 1963, Ser. No. 292,098 8 Claims. (Cl. 96-91) This invention relates to an improvement in two-component light-sensitive diazotype photoprinting material susceptible to development by heating.
Two-component diazotype material comprises a supporting sheet, such as paper or film, having in a surface coating or layer, an azo coupling component and a stabilized light-sensitive diazonium compound, stablized against premature coupling by inclusion of an acid stabilizer. On exposure of such coating to actinic light under an opaque pattern on a translucent background, the light-sensitive diazonium compound is destroyed in the light-struck areas, and upon subsequent exposure to an alkaline developing medium such as gaseous ammonia, the acid stabilizer is neutralized and the residual diazonium compound couples with the azo coupling component to form an azo dye image corresponding to the opaque pattern of the original.
It has been proposed to include in two-component light-sensitive diazotype photoprinting material, one or more reagents having an acid to neutral reaction which, on heating, are decomposed or converted to yield an alkaline reacting compound. Diazotype photoprinting material containing such reagents can be developed after exposure to light under an opaque pattern by heating at a temperature causing the aforesaid conversion or decomposition. The alkaline reaction product formed thereby neutralizes the acid stabilizer and causes imagewise coupling of the residual diazonium compound with the azo coupling component.
Incorporation in diazotype materials of various reagents or combination which provide an alkaline environment on heating have been disclosed in the prior art. Thus, United States Patents 2,228,562, 2,681,277, 2,732,- 299 and 2,774,669 disclose two-component diazotype photoprinting material containing nitrogen compounds (eg urea derivatives) which on heating, decompose to form ammonia or nitrogen bases which cause coupling in the two-component diazotype system. U.S.P. 2,653,- 091 discloses inclusion in a two-component diazotype photoprinting layer of trichloroacetic acid as a stabilizer and an alkali metal, ammonium or nitrogen base salt of said acid as a heat sensitive alkali generating compound, said salt being decomposed on heating to yield an alkaline carbonate which promotes coupling.
Acid stabilizers included in two-component diazotype material are usually organic acids such as citric acid, tartaric acid or the like. The stability of the photoprinting material aiforded by such stabilizers tends, how ever, to be reduced by the presence of the neutral to acid reagents which form an alkaline compound upon heating and this causes a critical reduction of the shelf life of the heat developable photoprinting material. While this effect can be reduced by increasing the amount of acid stabilizer, this has the disadvantage of impairing the development properties or requiring increased amounts of the heat-sensitive alkali generating reagents.
We have found that greatly improved shelf life can be obtained in heat developable diazotype photoprinting material of the nature described above, by incorporating ice in the sensitizing solution and consequently in the resultant light-sensitive layer a salt of a naphthalene sulfonic acid having two to three sulfonic acid groups e.g., the
sodium, potassium or ammonium salts of naphthalene-2, 7-disulfonic acid, naphthalene-1,6-disulfonic acid or naphthalene-1,3,6-trisulfonic acid.
The quantity of naphthalene sulfonic acid salt employed is preferably at least 5% of the other non-volatile ingredients of the sensitizing composition. Suitable proportions range up to about 25% of the other non-volatile ingredients of the sensitizing composition. The concentration of the naphthalene sulfonic acid salt in the sensitizing solution generally ranges from 1 to 10% by weight.
The sensitizing compositions of this invention may contain as light-sensitive stable diazonium compounds, those listed in U.S.P. 2,501,874 and in the article by Van der Grinten in the Photographic Journal, volume 92-3 (1952), page 46. They are especially diazonium compounds derived from N-monoand N-disubstituted pphenylenediamines, e.g., the diazotization products of:
N,N-diethyl-p-phenylenediamine N-benzyl-N-ethyl-p-phenylenediamine N-ethyl-p-phenylenediamine N,N-diethyl-2-ethoxy-p-phenylenediamine N-ethyl-2-methyl-p-phenylenediamine N,N-bis-hydroxyethyl-p-phenylenedia-mine N-beta-hydroxyethyl-N-methyl-p-phenylenediamine These compounds are preferably stabilized in the form of their double salts with zinc chloride, tin chloride, cadmium chloride and the like.
Azo coupling components which can be incorporated in the photoprinting materials of the invention are:
2,3-dihydroxynaphthalene 1,8-dihydroxynaphthalene 2-methy1 resorcinol 4,4'-diresorcyl sulfide Resorcinol Octylresorcinol Alpha-resorcylamide 3-methyl-1-phenyl-5 -pyrazolone H-acid 2,3 -dihydroxynaphthalene-6-sulfonic acid 2,5 -xylenol Acid stabilizers against premature coupling of the diazoni-um salt and azo coupling component include citric acid, tartaric acid, and similar acidic reagents.
Heat responsive reagents having an acid to neutral reaction at room temperatures, but which are adapted on heating to temperatures between and 200 C. to yield an alkaline reacting component for neutralization of the acid stabilizer in the light-sensitive photoprinting material of the invention, include the monoalkali metal salts of strong organic acids which are decomposed on heating to form basic compounds, such as the monoalkali metal salts of malonic, maleic or oxalic acids; alkali metal salts of aliphatic mono-carboxylic acids and especially the alkali metal (Na, K) and nitrogen base sats of trichloroacetic acid.
In addition to the foregoing materials, there can also be included reagents commonly employed in diazotype photoprinting materials, for example hygroscopic agent such as glycerin; and wetting agents such as saponin, lauryl sulfate, keryl benzene sulfonate or oleyl-N-methyltaurine.
Moreover, there can be included finely divided or colloidal silica or alumina, aqueous dispersions or colloidal solutions of organic film-forming binders, such as colloidally water-soluble polyvinyl alcohol, methyl cellulose, hydroxy ethyl cellulose, gelatin or the like or latex-like dispersions or resins such as polyvinyl acetate, polyvinyl chloride, polyvinyl chlorideacetate, polyvinylidene chloride, apolyacryl-onitrile or polymethylmethacrylate.
The components of the sensitizing composition are preferably incorporated in a single solution or suspension, and applied in a single coating step to the base. The latter may be paper or film, such as polyethylene-terephthalate (Mylar) and similar plastic materials which are capable of withstanding the elevated development temperatures. However, if desired, the various components of the sensitizing compositions can be applied in successive coatings, one containing for example, the diazonium salt and another, the alkali generating heat-sensitive acid to neutral reagent, the azo coupling component being incorporated in either of the two layers.
Materials coated in accordance with the invention are developed after exposure to actinic light under an opaque pattern by heating at temperatures between 100 and 200 C. or preferably between 120 and 160 C. at which decomposition or conversion of the acid to neutral heat sensitive reagent to an alkaline reacting material occurs, causing coupling of the residual diazonium compound With the azo coupling component in the areas corresponding to the opaque pattern to form an azo dye image thereof.
Diazotype photoprinting materials containing naphthalene sulfonic acid salts in accordance with the present invention are characterized by superior shelf life and stability to decomposition in storage, without impairment of the rate and effectiveness of the heat development.
The invention will be illustrated by the following examples, wherein parts and percentages are by weight, unless otherwise indicated.
Example I The following composition was coated on a paper base sheet and dried:
Citric acid 0.5 Sucrose 5.0 N-ethyl-N-2-hydroxyethyl p aminobenzene diazonium chlorozincate 0.7 2,3-dihydroxynaphthalene-o-sodium sulfonate 3.0
For purposes of comparison, a similar composition from which the naphthalene-1,3,6-trisulfonic acid salt was omitted was also coated on a paper sheet and dried. The dried materials were exposed under an opaque pattern to actinic light, and developed by passing the sheet over a cylinder heated at from 150 to 175 C. Similar development of an azo dye image was obtained with both materials. The two materials were then subjected to forced aging, and again tested as indicated above for making a photoprint of an opaque pattern. The results demonstrated that the material containing the naphthalene-trisulfonic acid salt was characterized by superior shelf life as compared with the material lacking said salt.
Example II The procedures of Example I were repeated, except that for naphthalene-1,3,6-trisodium sulfonate, there was substituted an equal amount of naphthalene-2,7-disodium sulfonate. The results obtained were substantially the same as in the preceding example.
4 Example 111 Paper was coated with the following sensitizing composition:
Finely-divided silica (average particle size; 3-6
microns) gr 4.0 Zinc chloride gr 0.5 Magnesium chloride .gr 0.1 Naphthalene-1,3,6-trisodium sulfonate gr 3.0
The foregoing composition, as well as one in which naphthalene-1,3,6-trisodiurn sulfonate is omitted were tested for photoprinting, and found to give substantially equal results on heat development. After forced aging, it was found that the material containing naphthalenetrisodium sulfonate was characterized by greatly superior shelf life as compared with the composition lacking said ingredient.
Inthe foregoing examples, sodium trichloroacetate can be replaced by the corresponding potassium salts, or by nitrogen base salts, e.g., trichloroacetates of diethanolamine or triethanolamine. Moreover, instead of these compounds, there can be used the monoalkali metal salts of heat decomposable organic acids such as the monoalkali metal salts of oxalic, maleic or malonic acid, as well as other heat-decomposable reagents of neutral to acid reaction mentioned in the discussion preceding the examples.
Instead of naphthalene-1,3, 6-trisodium sulfonate, other alkali metal or ammonium salts of naphthalene-1,3,6- trisulfo acid can be used, as well as corresponding amounts of alkali metal or ammonium salts of other naphthalene diand tri-sulfonic acids. The heat developable two-component diazotype photoprint materials of the invention are characterized in each case by superior shelf life as compared with similar materials lacking the naphthalene dior tri-sulfonic acid salts.
Variations and modifications which will be obvious to those skilled in the art can be made in the foregoing procedures and materials without departing from the scope and spirit of the invention.
We claim:
1. Two-component diazotype photoprinting material susceptible to development on heating, having on a surface of a supporting sheet, a light-sensitive layer containing an azo coupling component, a light-sensitive diazonium compound, an acid stabilizer against premature coupling, a neutral to acid monoalkali metal salt of a strong acid which is decomposed to yield an alkaline reacting compound on heating to a temperature between 100 and 200 C. and a neutral salt of a naphthalene sulfonic acid having the formula:
wherein n is an integer from 2 to 3, amounting to at least 5% by weight of the components of the light-sensitive layer.
2. Diazotype photoprinting material as defined in claim 1 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-1,3,6-trisulfonic acid.
3. Diazotype photoprinting materials as defined in claim 1 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-2,7-disulfonic acid.
4. Diazotype photoprinting material as defined in claim 1, wherein the amount of said naphthalene sulfonic acid salt is from 5 to 25% of the remaining components of the light-sensitive layer.
5. A sensitizing composition for two-component diazotype photoprinting material susceptible to development on heating, containing in an aqueous medium, an azo coupling component, a light-sensitive diazonium compound, an acid stabilizer against premature coupling, a neutral to acid monoalkali metal salt of a strong acid which is decomposed to yield an alkaline reacting compound on heating to a temperature between 100 and 200 C. and at least 1% of a neutral salt of a naphthalenesulfonic acid having the formula:
wherein n is an integer from 2 to 3.
6. A sensitizing composition as defined in claim 5 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-1,3,6-trisulfonic acid.
7. A sensitizing composition as defined in claim 5 wherein said naphthalene sulfonic acid salt is a member of the group consisting of the sodium, potassium and ammonium salts of naphthalene-2,7-disu1fonic acid- S. A sensitizing composition as defined in claim 5 wherein the concentration of said naphthalene sulfonic acid salt is from 1 to 10% by weight.
References Cited by the Examiner UNITED STATES PATENTS 2,65 3,091 9/ 1953 Grieg 9649 2,694.009 1 1/ 1954 Sus 9649 X 2,727,820 12/ 1955' Botkin 964-9 2,732,299 1/ 1956 Morrison 9649 3,102,812 9/ 1963 Welch 9 6- 49 X FOREIGN PATENTS 609,912 3/ 1962 Belgium.
750,080 5/ 1 933 France. 1,249,913 11/ 1962 France.
816,601 7/ 1959 Great Britain.
OTHER REFERENCES Kosar, Photographic Science and Engineering, vol. 5, No. 4, July-August, 196-1, pages 239-243.
I. TRAVIS BROWN, Primary Examiner.
NORMAN G. TORCH'IN, Examiner.
R. L. STONE, Assistant Examiner.
Claims (1)
1. TWO-COMPONENT DIAZOTYPE PHOTOPRINTING MATERIAL SUSCEPTIBLE TO DEVELOPMENT ON HEATING, HAVING ON A SURFACE OF A SUPPORTING SHEET, A LIGHT-SENSITIVE LAYER CONTAINING AN AZO COUPLING COMPONENT, A LIGHT-SENSITIVE DIAZONIUM COMPOUND, AN ACID STABILIZER AGAINST PREMATURE COUPLING, A NEUTRAL TO ACID MONOALKALI METAL SALT OF A STRONG ACID WHICH IS DECOMPOSED TO YIELD AN ALKALINE REACTING COMPOUND ON HEATING TO A TEMPERATURE BETWEEN 100 AND 200*V. AND A NEUTRAL SALT OF A NAPHTHALENE SULFONIC ACID HAVING THE FORMULA:
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US284364A US3326686A (en) | 1963-05-31 | 1963-05-31 | Light-sensitive two-component diazotype materials adapted for heat development |
| US292097A US3301679A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype light-sensitive photoprinting material susceptible to thermal development |
| US292115A US3255011A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype photoprinting material susceptible to thermal development |
| US292066A US3294534A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292098A US3298834A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292114A US3166422A (en) | 1963-05-31 | 1963-07-01 | Diazotype heat development photographic paper comprising a sugar brightening agent |
| GB21014/64A GB1063132A (en) | 1963-05-31 | 1964-05-21 | Improvements in or relating to light-sensitive two-component diazotype materials adapted for heat development |
| NL6406013A NL6406013A (en) | 1963-05-31 | 1964-05-28 | |
| BE648593D BE648593A (en) | 1963-05-31 | 1964-05-29 | |
| FR976481A FR1405427A (en) | 1963-05-31 | 1964-05-29 | Two-component diazo-type materials, photosensitive for thermal development |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US284364A US3326686A (en) | 1963-05-31 | 1963-05-31 | Light-sensitive two-component diazotype materials adapted for heat development |
| US292097A US3301679A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype light-sensitive photoprinting material susceptible to thermal development |
| US292115A US3255011A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype photoprinting material susceptible to thermal development |
| US292066A US3294534A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292098A US3298834A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292114A US3166422A (en) | 1963-05-31 | 1963-07-01 | Diazotype heat development photographic paper comprising a sugar brightening agent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3298834A true US3298834A (en) | 1967-01-17 |
Family
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| US284364A Expired - Lifetime US3326686A (en) | 1963-05-31 | 1963-05-31 | Light-sensitive two-component diazotype materials adapted for heat development |
| US292097A Expired - Lifetime US3301679A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype light-sensitive photoprinting material susceptible to thermal development |
| US292066A Expired - Lifetime US3294534A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292114A Expired - Lifetime US3166422A (en) | 1963-05-31 | 1963-07-01 | Diazotype heat development photographic paper comprising a sugar brightening agent |
| US292115A Expired - Lifetime US3255011A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype photoprinting material susceptible to thermal development |
| US292098A Expired - Lifetime US3298834A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
Family Applications Before (5)
| Application Number | Title | Priority Date | Filing Date |
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| US284364A Expired - Lifetime US3326686A (en) | 1963-05-31 | 1963-05-31 | Light-sensitive two-component diazotype materials adapted for heat development |
| US292097A Expired - Lifetime US3301679A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype light-sensitive photoprinting material susceptible to thermal development |
| US292066A Expired - Lifetime US3294534A (en) | 1963-05-31 | 1963-07-01 | Diazotype photoprinting material susceptible to thermal development |
| US292114A Expired - Lifetime US3166422A (en) | 1963-05-31 | 1963-07-01 | Diazotype heat development photographic paper comprising a sugar brightening agent |
| US292115A Expired - Lifetime US3255011A (en) | 1963-05-31 | 1963-07-01 | Two-component diazotype photoprinting material susceptible to thermal development |
Country Status (4)
| Country | Link |
|---|---|
| US (6) | US3326686A (en) |
| BE (1) | BE648593A (en) |
| GB (1) | GB1063132A (en) |
| NL (1) | NL6406013A (en) |
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| US3379531A (en) * | 1965-03-30 | 1968-04-23 | Gen Aniline & Film Corp | Two-component heat developing diazotypes |
| US3389996A (en) * | 1964-10-15 | 1968-06-25 | Gen Aniline & Film Corp | Two-component heat developable diazotypes |
| US3408192A (en) * | 1964-06-10 | 1968-10-29 | Ibm | Light-sensitive diazotype compositions and elements |
| US3420666A (en) * | 1964-10-15 | 1969-01-07 | Gaf Corp | Two-component heat developing diazotypes |
| US3529964A (en) * | 1966-01-14 | 1970-09-22 | L L Ridgway Enterprises Inc | Heat developable diazo compositions and diazotype reproduction media |
| US3650750A (en) * | 1968-12-28 | 1972-03-21 | Ricoh Kk | Heat-developable diazo-type light-sensitive material |
| US3793030A (en) * | 1971-09-02 | 1974-02-19 | Ricoh Kk | Process for producing diazotype light-sensitive material |
| US3900324A (en) * | 1972-06-25 | 1975-08-19 | Ozalid Co Ltd | Treatment of synthetic polyester film products |
| US4478926A (en) * | 1981-12-28 | 1984-10-23 | Andrews Paper & Chemical Co., Inc. | Zinc sulfonates and their use in diazotypy |
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| FR1377476A (en) * | 1963-09-24 | 1964-11-06 | Bauchet & Cie Ets | Process for manufacturing heliographic sheets and similar articles for the reproduction of documents by diazotyping and photosensitive sheets produced by the implementation of this process |
| US3300471A (en) * | 1964-01-02 | 1967-01-24 | Universal Oil Prod Co | p-(nu-cyanoalkyl-nu-hydrocarbylamino)-benzenediazonium chlorides |
| US3536490A (en) * | 1964-04-28 | 1970-10-27 | Pitney Bowes Inc | Novel diazotype copying process |
| US3389995A (en) * | 1964-09-15 | 1968-06-25 | Gen Aniline & Film Corp | Two-component heat developable diazotypes containing amidine compounds |
| US3431109A (en) * | 1964-10-16 | 1969-03-04 | Addressograph Multigraph | Heat sensitive diazotype materials |
| US3525618A (en) * | 1964-12-04 | 1970-08-25 | Geigy Ag J R | Diazotype film materials |
| USB417241I5 (en) * | 1964-12-09 | |||
| US3406072A (en) * | 1964-12-21 | 1968-10-15 | Gaf Corp | One-component diazotypes |
| US3409455A (en) * | 1965-01-04 | 1968-11-05 | Gaf Corp | Process of reproduction on benzene diazonium fluoborate sheet by heat exposure |
| DE1572155A1 (en) * | 1965-08-10 | 1970-01-02 | Dr Eduard Roell | Light or radiation sensitive material and process for its production |
| US3522048A (en) * | 1965-12-09 | 1970-07-28 | Gaf Corp | Two-component heat developing diazotypes |
| NL136527C (en) * | 1966-11-07 | |||
| US3539345A (en) * | 1967-02-01 | 1970-11-10 | Gaf Corp | Thermal diazotype papers |
| NL6800539A (en) * | 1968-01-12 | 1969-07-15 | ||
| US3779758A (en) * | 1969-03-25 | 1973-12-18 | Photocircuits Corp | Photosensitive process for producing printed circuits employing electroless deposition |
| JPS4832722B1 (en) * | 1969-09-01 | 1973-10-08 | ||
| GB1488005A (en) * | 1974-01-25 | 1977-10-05 | Ici Ltd | Diazotype materials |
| US4168171A (en) * | 1977-08-05 | 1979-09-18 | Minnesota Mining And Manufacturing Company | Light-sensitive thermal developable diazotype sheets with imidazoles |
| US4230789A (en) * | 1978-03-13 | 1980-10-28 | Minnesota Mining And Manufacturing Company | Thermal diazotype sheets |
| FR2455303A1 (en) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Syst | PROCESS FOR THE MANUFACTURE OF A INVIOLABLE IDENTIFICATION CARD COMPRISING PHOTOGRAPHS AND CARD OBTAINED ACCORDING TO THIS PROCESS |
| FR2470984B1 (en) * | 1979-11-28 | 1986-06-13 | Schaeffer Andre | DIAZOTYPE MATERIAL DEVELOPABLE BY VAPOR, WATER OR HEAT |
| BR8107605A (en) * | 1981-11-23 | 1983-07-05 | Oce Nederland Bv | DIAZOTYPE MATERIAL |
| JPS5898729A (en) * | 1981-12-08 | 1983-06-11 | Ricoh Co Ltd | Production of heat developing type diazo copying material |
| JPS58143336A (en) * | 1982-02-19 | 1983-08-25 | Ricoh Co Ltd | Heat-developable diazo copying material |
| US4508808A (en) * | 1982-11-12 | 1985-04-02 | Xidex Corporation | Method of using diazotype photographic materials with preexposure treatment to form uniform sites of refractive index change |
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| US3408192A (en) * | 1964-06-10 | 1968-10-29 | Ibm | Light-sensitive diazotype compositions and elements |
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| US3529964A (en) * | 1966-01-14 | 1970-09-22 | L L Ridgway Enterprises Inc | Heat developable diazo compositions and diazotype reproduction media |
| US3650750A (en) * | 1968-12-28 | 1972-03-21 | Ricoh Kk | Heat-developable diazo-type light-sensitive material |
| US3793030A (en) * | 1971-09-02 | 1974-02-19 | Ricoh Kk | Process for producing diazotype light-sensitive material |
| US3900324A (en) * | 1972-06-25 | 1975-08-19 | Ozalid Co Ltd | Treatment of synthetic polyester film products |
| US4478926A (en) * | 1981-12-28 | 1984-10-23 | Andrews Paper & Chemical Co., Inc. | Zinc sulfonates and their use in diazotypy |
Also Published As
| Publication number | Publication date |
|---|---|
| US3294534A (en) | 1966-12-27 |
| BE648593A (en) | 1964-09-16 |
| NL6406013A (en) | 1964-12-01 |
| GB1063132A (en) | 1967-03-30 |
| US3326686A (en) | 1967-06-20 |
| US3301679A (en) | 1967-01-31 |
| US3166422A (en) | 1965-01-19 |
| US3255011A (en) | 1966-06-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: R Q O HOLDING COMPANY INC 111 WEST 2ND ST JAMESTOW Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:GAF CORPORATION;REEL/FRAME:004006/0585 Effective date: 19820526 Owner name: R Q O HOLDING COMPANY INC, NEW YORK Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:GAF CORPORATION;REEL/FRAME:004006/0585 Effective date: 19820526 |