US2822326A - Bright chromium alloy plating - Google Patents
Bright chromium alloy plating Download PDFInfo
- Publication number
- US2822326A US2822326A US496067A US49606755A US2822326A US 2822326 A US2822326 A US 2822326A US 496067 A US496067 A US 496067A US 49606755 A US49606755 A US 49606755A US 2822326 A US2822326 A US 2822326A
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- US
- United States
- Prior art keywords
- chromium
- ions
- bath
- alloy
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000788 chromium alloy Substances 0.000 title claims description 20
- 229910000599 Cr alloy Inorganic materials 0.000 title claims description 17
- 238000007747 plating Methods 0.000 title description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 26
- 238000005282 brightening Methods 0.000 claims description 23
- 239000003795 chemical substances by application Substances 0.000 claims description 23
- 229910001430 chromium ion Inorganic materials 0.000 claims description 16
- 229910052742 iron Inorganic materials 0.000 claims description 16
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- -1 IRON IONS Chemical class 0.000 claims description 9
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 9
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 9
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 8
- 238000005275 alloying Methods 0.000 claims description 8
- 229910001453 nickel ion Inorganic materials 0.000 claims description 8
- 239000011651 chromium Substances 0.000 description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- 229910052804 chromium Inorganic materials 0.000 description 22
- 235000012721 chromium Nutrition 0.000 description 22
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 21
- 150000002500 ions Chemical class 0.000 description 17
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical class C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 16
- 239000000956 alloy Substances 0.000 description 14
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 13
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- 238000007792 addition Methods 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 11
- 229940070891 pyridium Drugs 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 10
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical compound NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 9
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 9
- 239000004202 carbamide Substances 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 229910000640 Fe alloy Inorganic materials 0.000 description 7
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 7
- VLCDUOXHFNUCKK-UHFFFAOYSA-N N,N'-Dimethylthiourea Chemical compound CNC(=S)NC VLCDUOXHFNUCKK-UHFFFAOYSA-N 0.000 description 7
- 150000001339 alkali metal compounds Chemical class 0.000 description 7
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 7
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 7
- 229940044197 ammonium sulfate Drugs 0.000 description 7
- 235000011130 ammonium sulphate Nutrition 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- RAGLTCMTCZHYEJ-UHFFFAOYSA-K azanium;chromium(3+);disulfate Chemical compound [NH4+].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RAGLTCMTCZHYEJ-UHFFFAOYSA-K 0.000 description 6
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 150000001844 chromium Chemical class 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 229910000531 Co alloy Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- ZZYXNRREDYWPLN-UHFFFAOYSA-N pyridine-2,3-diamine Chemical compound NC1=CC=CN=C1N ZZYXNRREDYWPLN-UHFFFAOYSA-N 0.000 description 4
- 159000000000 sodium salts Chemical class 0.000 description 4
- QZNNVYOVQUKYSC-JEDNCBNOSA-N (2s)-2-amino-3-(1h-imidazol-5-yl)propanoic acid;hydron;chloride Chemical compound Cl.OC(=O)[C@@H](N)CC1=CN=CN1 QZNNVYOVQUKYSC-JEDNCBNOSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- RSYUFYQTACJFML-DZGCQCFKSA-N afzelechin Chemical compound C1([C@H]2OC3=CC(O)=CC(O)=C3C[C@@H]2O)=CC=C(O)C=C1 RSYUFYQTACJFML-DZGCQCFKSA-N 0.000 description 3
- 229910002065 alloy metal Inorganic materials 0.000 description 3
- 239000000908 ammonium hydroxide Substances 0.000 description 3
- AXTNPHLCOKUMDY-UHFFFAOYSA-N chromium cobalt Chemical compound [Co][Cr][Co] AXTNPHLCOKUMDY-UHFFFAOYSA-N 0.000 description 3
- DSHWASKZZBZKOE-UHFFFAOYSA-K chromium(3+);hydroxide;sulfate Chemical compound [OH-].[Cr+3].[O-]S([O-])(=O)=O DSHWASKZZBZKOE-UHFFFAOYSA-K 0.000 description 3
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 description 3
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 3
- 239000011696 chromium(III) sulphate Substances 0.000 description 3
- 150000001868 cobalt Chemical class 0.000 description 3
- 229960002885 histidine Drugs 0.000 description 3
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 3
- 229960003446 histidine monohydrochloride Drugs 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000003868 ammonium compounds Chemical class 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 150000001845 chromium compounds Chemical class 0.000 description 2
- XHFVDZNDZCNTLT-UHFFFAOYSA-H chromium(3+);tricarbonate Chemical compound [Cr+3].[Cr+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O XHFVDZNDZCNTLT-UHFFFAOYSA-H 0.000 description 2
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- OMSBSIXAZZRIRW-UHFFFAOYSA-N 2-methylpyridine;hydrochloride Chemical compound Cl.CC1=CC=CC=N1 OMSBSIXAZZRIRW-UHFFFAOYSA-N 0.000 description 1
- FPFSGDXIBUDDKZ-UHFFFAOYSA-N 3-decyl-2-hydroxycyclopent-2-en-1-one Chemical compound CCCCCCCCCCC1=C(O)C(=O)CC1 FPFSGDXIBUDDKZ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 101100025412 Arabidopsis thaliana XI-A gene Proteins 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- MGJKQDOBUOMPEZ-UHFFFAOYSA-N N,N'-dimethylurea Chemical compound CNC(=O)NC MGJKQDOBUOMPEZ-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- WBWJXRJARNTNBL-UHFFFAOYSA-N [Fe].[Cr].[Co] Chemical compound [Fe].[Cr].[Co] WBWJXRJARNTNBL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- DAPUDVOJPZKTSI-UHFFFAOYSA-L ammonium nickel sulfate Chemical compound [NH4+].[NH4+].[Ni+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DAPUDVOJPZKTSI-UHFFFAOYSA-L 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- OIDPCXKPHYRNKH-UHFFFAOYSA-J chrome alum Chemical compound [K]OS(=O)(=O)O[Cr]1OS(=O)(=O)O1 OIDPCXKPHYRNKH-UHFFFAOYSA-J 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- BIJOYKCOMBZXAE-UHFFFAOYSA-N chromium iron nickel Chemical compound [Cr].[Fe].[Ni] BIJOYKCOMBZXAE-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910001447 ferric ion Inorganic materials 0.000 description 1
- IMBKASBLAKCLEM-UHFFFAOYSA-L ferrous ammonium sulfate (anhydrous) Chemical compound [NH4+].[NH4+].[Fe+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O IMBKASBLAKCLEM-UHFFFAOYSA-L 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 229910000358 iron sulfate Inorganic materials 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 229960003390 magnesium sulfate Drugs 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 235000013379 molasses Nutrition 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- FBWSRFYGDURTEJ-UHFFFAOYSA-N pyridine-2,3-diamine;hydrochloride Chemical compound Cl.NC1=CC=CN=C1N FBWSRFYGDURTEJ-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 229940001482 sodium sulfite Drugs 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
Definitions
- This invention relates to chromium-alloy coatings. More particularly, it relates to a method or process of electrodepositing coatings of chromium alloys having a bright and lustrous surface, and to the bath used and the coatings produced thereby.
- Chro mium-iron alloy plate is particularly hard to bull and is excessively costly.
- one of the objects of this invention is to provide a smooth, bright, and lustrous chromium-alloy coat.
- Another object is to reduce or eliminate the mechanical bufi'ing heretofore required for brightening chromiumalloy electroplates.
- Another object is to provide a method for brightening chromium-alloy plate as it is electrodeposited.
- the methyl pridium chloride was a supplementary brightening agent.
- a steel panel was immersed in the bath as the cathode, while the anode was constructed of a chromium-iron alloy Cr, 15% Fe).
- the bath was maintained at a temperature of 115 F., having a pH of from 1.8 to 2.0.
- the cathode current density was 200 amperes per square foot and the anode current density was approximately 60 amperes per square foot.
- the cathode efliciency was 29 percent.
- the leveling action of the plates was about 30 percent per 0.0005 inch of plate.
- the coating was found to comprise about 85 percent chromium and 15 percent iron.
- the appearance of the resulting plate was mirrorbright and very smooth.
- Example [I A bath was prepared similar to that used in Example I except that instead of methyl pyridium chloride being added as a brightening agent 0.1 g./l. of-diamino pyridine was used.
- the cathode current density was amperes per square foot and the anode current density was about 250 amperes per square foot.
- a platinum anode was used instead of the chromium-iron alloy. Otherwise, operating conditions were about the same.
- the coating was found to comprise about 85 percent chromium and 15 percent iron.
- the appearance of the resulting plate was setnibright and smooth.
- Example III Example IV A bath was prepared similar to that used in Example I except that instead of methyl pyridium chloride being added as a brightening agent 1.0 percent by volume formamide was used.
- the cathode current density was about 100 amperes per square foot while the anode current density was about 250 amperes per square foot.
- a platinum anode was used. Otherwise, operating conditions were about the same. I
- the coating was found to comprise about 85 percent chromium and 15 percentiron.
- the appearance of the resulting plate was semibright and smooth.
- the urea was the supplementary brightening agent.
- the anode was made of a chromium-iron alloy.
- the cathode current density wasfrom 300 to 400 amperes per square foot while theanode current density was approximately 100 amperes per square foot.
- the cathode efiiciency was from .26 to 34 percent.
- the resulting plate exhibited asemibright and smooth surface.
- Example VI A deposit of about 75 percent chromium and 25 percent iron was obtained from the following aqueous solution:
- the resulting plate exhibited a bright surface. Hardness measurements taken on samples from this bath ranged from 770 to 1098 Knoop.
- Example VII A bathwaspreparedsimilar-to that used in Example VI except 50 g./l. of ammonium sulfate were added and 0.3 g./l. of dimethylthiourea was used in place of the urea. The temperature was maintained at 130 Fi'and the pH adjusted to from 1.5 to 1.8.
- Example IX A deposit of approximately-98rpercent chromium and two percent nickel was. obtained. from the following aqueous-"solutions Gtll.” Chromium ammonium sulfate [Cr (SO (NI-l SO -24H O] 300 Ammonium sulfate [(NH.;) 80 150 Nickel sulfate [NiSO -(NH SO -6H O] 1.5 Sodium salt of sulfonated-saccharin 2 The sodiumsalfof sulfonated saceharin was the supplementany brightening agent. The, bath .was maintained. at.about.115 F.,- anduthepH;wasmaintained atfrom 1.4 to 1.5.. Theanode was-, madei. of platinum. The cathode current density was from to 250 amperes per square footand ,the anode, current density was up to 1000 amperes per square foot. The leveling action was about 40 percent per..0.0005- inch of plate;
- the resulting plate was semibright and smooth.
- Example A bath was prepared similar to that used in Example. IX except that, instead of 2 g./l. of sodium salt of sulfonated saccharin being used, 4 g./l. were used. Also. 3 g./l. instead of 1.5 g./l. of nickel sulfate were added. The pH was maintained at 1.6, and the cathode current density, maintained at 250 amperes per square foot. Otherwise, operating conditions were the same.
- the resulting plate comprised about 98 percent chm-.- mium and two percent nickel. and exhibited a mirrorbright surface that was very smooth.
- Example XI A bath was prepared similar to that used in Example IX except that, instead of sodium salt of sulfonated saccharin. being, used as a brightening agent 0.5 g./l. of methyl pyridium chloride was used. Also 3 g./l. instead. of. 1.5 g./1. of nickel sulfate were added. The pH was, maintained at 1.0. The cathode current density was,125 amperes per square foot and the anode current density was 500 amperes per square foot. Otherwise, operating conditions were the same.
- the resulting plate comprised about 98 percent chromium and two percent nickel and exhibited amirrorbright surface that was smooth.
- Example XII A bath was prepared similar to that used in Example IX except that, instead of sodium salt of sulfonated saccharin being usedas a brightening agent 0.5 g./l. of histidine. monohydrochloride was added. The pH was maintainedat 1.6. The cathode current density was amperes per square foot and the anode current density was 600 amperes per square foot. Otherwise,,operating.v conditions were the same.
- the resulting plate comprised about 98percent chromium and 'two percent nickel and exhibited a semibrig'ht, smooth surface.
- Chromium-alloy plates maybe obtainedgfrom these baths'bymsingapH'of from about 0.2to about 3.5; how.- ever, to obtainthe--best results, the preferredrange is from about1.4'to'2.5.'-
- the pH maybe adjusted by adding acid or alkaline reagents such'as sulfuric acid or ammonium hydroxide, to the solutions; Plating baths made up of chromium ammonium sulfate; chromium potassium sulfate; chromium sulfate,- are-acid-in nature and require initialadditions of alkalihe.reagents,. such as ammonium hydroxidedoobtain:the-properpH. Trivalent chromium hathsmadewp, lfromtbasic. chromium; sulfate. chromium.
- the addition agents or brightening additions of this invention may be any of the principal organic ammonia derivatives or mixtures of the principal organic ammonia derivatives.
- principal organic ammonia derivatives is meant any organic amine or amide. Best results are obtained by making additions of methyl pyridine chloride, diamino pyridine, formamide, urea, dimethylthiourea, histidine monohydrochloride, and sulfonated saccharin.
- Trivalent chromium ions can be supplied to the plating baths by the addition of trivalent chromium compounds, such as chromium ammonium sulfate, chromium sulfate, basic chromium sulfate, chromium carbonate, chromium potassium sulfate, and chromic oxide.
- trivalent chromium compounds such as chromium ammonium sulfate, chromium sulfate, basic chromium sulfate, chromium carbonate, chromium potassium sulfate, and chromic oxide.
- the amount of trivalent chromium ions used in the baths is dependent on the current density and the temperature at which the bath is operated. Satisfactory results have been obtained with concentrations ranging from g./l. to saturation. However, the most satisfactory results are obtained with concentrations of from 30 to 75 g./l.
- chromic oxide or chromium carbonate are used as the source of trivalent ions, additions of a sulfuric acid are necessary to provide sulfate ion concentrations which, for best results, should not be less than 80 g./l. If chromium potassium sulfate is used, the potassium ion concentration should not exceed 150 g./l.
- Trivalent chromium salts are commercially prepared by reducing chromic acid or sodium dichromate with an organic reducing agent such as alcohol, molasses, or with sulfur dioxide.
- the product contains residual reducing agents, and oxidation products thereof, since an excess of the reducing agent is used to complete the reduction.
- plain solutions made up of trivalent chromium salts will contain these harmful impurities.
- the excess reducing agents, and oxidizing products thereof, and any other harmful impurities in the bath can be removed by the addition of a small amount of activated carbon, preferably by means of a slurry of the finely divided powder in Water.
- the activated carbon removes the impurities by means of absorption.
- the purification of the plating baths by means of activated carbon results in smoother and better plates.
- the alloying constituents of the plating baths are added to the bath in the form of metal salts such as iron or nickel sulfate.
- the valence of the alloying metals is not as important a factor in the resulting plate as is the valence of the chromium.
- iron may be added either as ferrous or ferric ammonium sulfate, ferrous or ferric sulfate, or by means of a mixture of ferrous and ferric salts.
- the reduced or ferrous salts are preferred.
- Nickel, as an alloying element may be added as nickel sulfate or nickel ammonium sulfate. The amount of alloying metal ions added to the bath is dependent on the composition of the alloy plates desired.
- Alloy plates can be produced that are predominantly iron or nickel in composition; however, by combining the ferrous or ferric ion. concentrations to from 0.6 to 2.5 g./l., of the nickel ions to from 0.1 to 1.0 g./l., better alloy plates are obtained.
- the electroplating baths of this invention may-also be readily 6 adapted to chromium-cobalt alloys.
- cobalt salts such as cobaltammonium sulfate
- the preferred range for cobalt ions is substantially the same as the preferred range for nickel, that is from 0.1 to 1.0 g./l.
- ternary or even quaternary combinations of these metals can be electrodeposited in the form of hard alloy plates.
- a bright chromium-iron-nickel alloy or a bright chromium-iron-cobalt alloy can be electrodeposited by means of the electroplating baths of this invention.
- Nickel or cobalt salts or both nickel and cobalt salts are added to the bath in addition to iron salts and trivalent chromium compounds to obtain ternary or quaternary bright alloy plates.
- Alkali metal compounds are added to the bath to ob tain. improved throwing power.
- the term alkali metal compound is intended to include ammonium compound. Ammonium sulfate and sodium sulfate have proved to be satisfactory when used for this purpose, but other alkali metal compounds, such as potassium sulfate may be used as well. Ammonium compounds have proved to be the most effective for this purpose.
- the alkali metal compounds may be added separately or as mixtures. Addition of alkali metal compounds are particularly effective when plating is done with low current density and low concentrations of trivalent chromium ions. Concentration of the alkali metal compounds in the plating bath are dependent, to some extent, on the trivalent chromium salt or compound used.
- total alkali metal ion concentration should be within the concentration range of from 10 to 50 g./l. In baths where sulfate salts are employed, total sulfate ion concentrations should be within the range of from to 600 g./l.
- the plating bath may be operated over a wide range of temperatures providing the pH is properly adjusted. There is some danger of chrome alum or chromium ammonium sulfate precipitating from the bath where the concentration of the chromium is in excess of 70 g./l. and the temperature is allowed to drop below F.
- the preferred temperature range for the trivalent chromium baths of this invention is from 110 F. to F.
- the anode may be made of any material that will conduct an electric current and that will not react with the plating bath to adversely contaminate the plating solutions. It is preferable to use either chromium alloy anodes corresponding to the desired plate composition, or platinum, or platinum-covered silver anodes. When using chromium alloy anodes, either chromium-iron alloy or chromium-nickel alloy, it is preferable to adjust the anode current density to between 50 and 100 amperes per square foot. By this means, the metal is dissolved from the anodes at the same rate as metal is deposited on the cathodes. If platinum or platinum-covered silver anodes are used, the anode current density is not critical and may be between 50 and 1000 amperes per square foot.
- Brightening agent Range g. l. 7 Methyl pyridium chloride 1- 1O iam py d nea -i-a-r----as----- 1. 10
- a compositijon ofgmatter for electrodepositing aw chromium-nickel alloy plate which comprises an aqueous bath containing from 30 to g./l. of trivalent chromiums.
- a chromium-cobalt alloyplate which comprises an aqueous bath containing from 30 t0'75-g./l. of trivalent chromium ions, 10-to-50 g./l.- of-alkali metal-ions, 0.1 to1.0 g./l. of cobalt ions andcoutaining additionally at least one brighteningagentin-the range specified selected from the group consisting of:
- e inaagent Range e U395; i Methyl pyridium:chloride .1-10 Diamino; pyridine, .1-10 Formamid e- .1-10 Dimethylthiourea .110 Histidine, monohydrochloridea .1-10 Su-lfona ted; saccharin .l-lO
- Brightening agent Range g./l.
- the method of electrodepositing a bright chromiumiron alloy plate which'comprises electrolyzing an'aqueous bathcontainingfrom 30 to 75 g./l. of trivalent chromium ions, 10 to 50 -g./1. of alkali metal ions, 0.6 to 2.5 g./l.
- a composition of matter for electrodepositing a chromium-alloy plate which comprises an aqueous bath containing 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, the ions of at least one alloying metal selected from the group consisting of from 0.6 to 2.5 g./l. of iron ions, from 0.1 to 1.0 g./l. of nickel ions, and from 0.1 to 1.0 g./l. of cobalt ions, and containing additionally at least one brightening agent in the range specified, selected from the group consisting of:
- Brightening agent Range g./l. Urea .l-188 Methyl pyridium chloride .1-10 Diamino pyridine .1-10 Formamide .1-10 Dimethylthiourea .1-10 Histidine monohydrochloride .110 Sulfonated saccharin .1-10
- a composition of matter for electrodepositing a chromium alloy material which comprises a conductive aqueous solution containing from 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, the ions of at least one alloying metal selected from the group consisting of from 0.6 to 2.5 g./l. of iron ions, from 0.1 to 1.0 g./l. of nickel ions, from 0.1 to 1.0 g./l.
- a composition of matter for electrodepositing a chromium-iron alloy material which comprises a conductive aqueous solution containing from to 75 g./l. of trivalent chromium ions, 10 to g./l. of alkali metal ions, from 0.6 to 2.5 g./l. of iron ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
- a composition of matter for electrodepositing a chromium-nickel alloy material which comprises a conductive aqueous solution containing from 30 to g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, from 0.1 to 1.0 g./l. of nickel ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
- a composition of matter for electrodepositing a chromium-cobalt alloy material which comprises a conductive aqueous solution containing from 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, from 0.1 to 1.0 g./l. of cobalt ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
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Description
United BRIGHT CHROMIUM ALLOY PLATING No Drawing. Application March 22, 1955 Serial No. 496,067
16 Claims. (Cl. 204-43) This invention relates to chromium-alloy coatings. More particularly, it relates to a method or process of electrodepositing coatings of chromium alloys having a bright and lustrous surface, and to the bath used and the coatings produced thereby.
It has been found that suitable trivalent chromium baths can be used to electrodeposit chromium or chromium alloy plate with a high degree of success. In U. S. Patent 2,693,444, there has been disclosed a chromiumalloy plating bath containing chromium ammonium sulfate, magnesium sulfate, ammonium sulfate, sodium sulfite, salts of alloy metals, ammonium hydroxide, and water. Other baths containing trivalent chromium ions, ions capable of conducting an electric current, and ions of alloy metals are disclosed in copending application Serial No. 487,697. Although the plates acquired by the baths of these two disclosures vary as to brightness, they must all be mechanically buffed to a considerable extent to obtain a commercially acceptable bright and lustrous finish.
Except as a result of mechanical buffing, no method was previously known for producing bright chromiumalloy plates, particularly chromium-iron and chromiumnickel plates. Although many brightening agents have been discovered for copper, nickel, zinc, and other plating baths, representative agents of these classes of brightening agents either do not cause chromium-iron or chromium-nickel plate to be brightened, or greatly reduce cathode efficiency to an intolerable or impossible value.
Buifing of electroplates is a costly operation. Chro mium-iron alloy plate is particularly hard to bull and is excessively costly.
It has now been discovered that by the process and bath of this invention, an electrodeposited coating from trivalent chromium baths can be produced, which overcomes the undesirable features of the prior-art electroplates.
Accordingly, one of the objects of this invention is to provide a smooth, bright, and lustrous chromium-alloy coat.
Another object is to reduce or eliminate the mechanical bufi'ing heretofore required for brightening chromiumalloy electroplates.
Another object is to provide a method for brightening chromium-alloy plate as it is electrodeposited.
Other objects and advantageous features will be ap-' amides. Best results are obtained while using the fol-, lowing organic ammonia derivatives: methyl pyridium. chloride, diamino pyridine, formamide, urea, dimethyh:
atent Example I An aqueous bath of the following composition was prepared:
. G./l. Chromium ammonium sulfate [Cr (SO (NH SO -24H O] Ammonium sulfate [(NH SO 150 Ferrous ammonium sulfate [FeSO (NH S0 -6H O] Methyl pyridium chloride 0.5,
The methyl pridium chloride was a supplementary brightening agent. A steel panel was immersed in the bath as the cathode, while the anode was constructed of a chromium-iron alloy Cr, 15% Fe). The bath was maintained at a temperature of 115 F., having a pH of from 1.8 to 2.0. The cathode current density was 200 amperes per square foot and the anode current density was approximately 60 amperes per square foot. The cathode efliciency was 29 percent. The leveling action of the plates was about 30 percent per 0.0005 inch of plate. The coating was found to comprise about 85 percent chromium and 15 percent iron.
The appearance of the resulting plate was mirrorbright and very smooth.
Example [I A bath was prepared similar to that used in Example I except that instead of methyl pyridium chloride being added as a brightening agent 0.1 g./l. of-diamino pyridine was used. The cathode curent density was amperes per square foot and the anode current density was about 250 amperes per square foot. A platinum anode was used instead of the chromium-iron alloy. Otherwise, operating conditions were about the same.
The coating was found to comprise about 85 percent chromium and 15 percent iron. The appearance of the resulting plate was setnibright and smooth.
Example III Example IV A bath was prepared similar to that used in Example I except that instead of methyl pyridium chloride being added as a brightening agent 1.0 percent by volume formamide was used. The cathode current density was about 100 amperes per square foot while the anode current density was about 250 amperes per square foot. A platinum anode was used. Otherwise, operating conditions were about the same. I
The coating was found to comprise about 85 percent chromium and 15 percentiron. The appearance of the resulting plate was semibright and smooth.
Example "V i A similar deposit of about 94 percentchromium Patented Feb. 4, 1958 3. the'balance-iron-was obtained fronrthefollowingaqueous solution: I
The urea was the supplementary brightening agent. The bath'wa'smaintainedat a temperatureof'from 115 F. to 118 F., with a pH of from 1.9 to 2.0. The anode was made of a chromium-iron alloy. The cathode current density wasfrom 300 to 400 amperes per square foot while theanode current density was approximately 100 amperes per square foot. The cathode efiiciency was from .26 to 34 percent.
The resulting plate exhibited asemibright and smooth surface.
Example VI A deposit of about 75 percent chromium and 25 percent iron was obtained from the following aqueous solution:
GI/l. Basic chromium sulfate [Cr (SO -Na O-5H O]' 450 Ferrous sulfate [Fe (SO -7H Ol l Urea 188 The urea was the supplementary brightening agent. The bath was maintained at 115 F. and thepl-i maintained at from 1.7 to 2.0. The anode was made of a chromiumiron alloy (85% Cr, 15% Fe). The cathode. current density was from 300 to 400 while the anode current density was about 100 amperes per square foot. The cathode efiiciency was from 22 to 26 percent.
The resulting plate exhibited a bright surface. Hardness measurements taken on samples from this bath ranged from 770 to 1098 Knoop.
Example VII A bathwaspreparedsimilar-to that used in Example VI except 50 g./l. of ammonium sulfate were added and 0.3 g./l. of dimethylthiourea was used in place of the urea. The temperature was maintained at 130 Fi'and the pH adjusted to from 1.5 to 1.8.
Eicample VIII A deposit of about-85 percent chromiumiandli percent iron was obtained. from. the followingsolution:
Basic chromium. sulfate..[Cr (SO -Na O-5H O] 450 Ammonium sulfate [(NHQ SOJ 50 Ferrous. ammoniumsulfate [FeSO (NI-19 80 6H O] 10 Boric acid [H BO 30.
Dimethyl urea ,4.0
Example IX A deposit of approximately-98rpercent chromium and two percent nickel was. obtained. from the following aqueous-"solutions Gtll." Chromium ammonium sulfate [Cr (SO (NI-l SO -24H O] 300 Ammonium sulfate [(NH.;) 80 150 Nickel sulfate [NiSO -(NH SO -6H O] 1.5 Sodium salt of sulfonated-saccharin 2 The sodiumsalfof sulfonated saceharin was the supplementany brightening agent. The, bath .was maintained. at.about.115 F.,- anduthepH;wasmaintained atfrom 1.4 to 1.5.. Theanode was-, madei. of platinum. The cathode current density was from to 250 amperes per square footand ,the anode, current density was up to 1000 amperes per square foot. The leveling action was about 40 percent per..0.0005- inch of plate;
The resulting plate was semibright and smooth.
Example A bath was prepared similar to that used in Example. IX except that, instead of 2 g./l. of sodium salt of sulfonated saccharin being used, 4 g./l. were used. Also. 3 g./l. instead of 1.5 g./l. of nickel sulfate were added. The pH was maintained at 1.6, and the cathode current density, maintained at 250 amperes per square foot. Otherwise, operating conditions were the same.
The resulting plate comprised about 98 percent chm-.- mium and two percent nickel. and exhibited a mirrorbright surface that was very smooth.
Example XI A bath was prepared similar to that used in Example IX except that, instead of sodium salt of sulfonated saccharin. being, used as a brightening agent 0.5 g./l. of methyl pyridium chloride was used. Also 3 g./l. instead. of. 1.5 g./1. of nickel sulfate were added. The pH was, maintained at 1.0. The cathode current density was,125 amperes per square foot and the anode current density was 500 amperes per square foot. Otherwise, operating conditions were the same.
The resulting plate comprised about 98 percent chromium and two percent nickel and exhibited amirrorbright surface that was smooth.
Example XII A bath was prepared similar to that used in Example IX except that, instead of sodium salt of sulfonated saccharin being usedas a brightening agent 0.5 g./l. of histidine. monohydrochloride was added. The pH was maintainedat 1.6. The cathode current density was amperes per square foot and the anode current density was 600 amperes per square foot. Otherwise,,operating.v conditions were the same.
Theresulting plate comprised about 98percent chromium and 'two percent nickel and exhibited a semibrig'ht, smooth surface.
Incarrying'out most ofthe plating operations, glass tanks were'used. However, it should be obvious that any material can, be used thatwillnot react with the electrolyte, during I the. plating process. Rubber-lined steel tankshave provided to be satisfactory.
Chromium-alloy plates maybe obtainedgfrom these baths'bymsingapH'of from about 0.2to about 3.5; how.- ever, to obtainthe--best results, the preferredrange is from about1.4'to'2.5.'- The pH maybe adjusted by adding acid or alkaline reagents such'as sulfuric acid or ammonium hydroxide, to the solutions; Plating baths made up of chromium ammonium sulfate; chromium potassium sulfate; chromium sulfate,- are-acid-in nature and require initialadditions of alkalihe.reagents,. such as ammonium hydroxidedoobtain:the-properpH. Trivalent chromium hathsmadewp, lfromtbasic. chromium; sulfate. chromium.
carbonate. and. chromium oxide; require acid additions to .obtain thepproperin-itialpH. During. operat on of thee baths cithenthose in. which :C lIOml mQmmDDlD IL Qlc' fate.or other. trivalent ,chromiumcomppunds,have.been.
addediitmaybe necessary toadd small amounts of acid to prevent the pH from rising. Boric acid may be added to the baths as a buffer reagent to stabilize the pH. If alkaline reagents, such as ammonium hydroxide, are added to the bath after it has been prepared, special care should be taken to avoid the formation of precipitates which are relatively insoluble.
The addition agents or brightening additions of this invention may be any of the principal organic ammonia derivatives or mixtures of the principal organic ammonia derivatives. By principal organic ammonia derivatives is meant any organic amine or amide. Best results are obtained by making additions of methyl pyridine chloride, diamino pyridine, formamide, urea, dimethylthiourea, histidine monohydrochloride, and sulfonated saccharin.
While satisfactory results can be obtained by additions of any of the preferred compounds over a range of from a trace to the saturation point of the brightening agent, best results are obtained by maintaining the concentration at from 0.1 to g./l. In the case of urea, there appears to be no preferred range in that additions of from 0.1 to 180 g./l. are effective.
Trivalent chromium ions can be supplied to the plating baths by the addition of trivalent chromium compounds, such as chromium ammonium sulfate, chromium sulfate, basic chromium sulfate, chromium carbonate, chromium potassium sulfate, and chromic oxide. The amount of trivalent chromium ions used in the baths is dependent on the current density and the temperature at which the bath is operated. Satisfactory results have been obtained with concentrations ranging from g./l. to saturation. However, the most satisfactory results are obtained with concentrations of from 30 to 75 g./l. If chromic oxide or chromium carbonate are used as the source of trivalent ions, additions of a sulfuric acid are necessary to provide sulfate ion concentrations which, for best results, should not be less than 80 g./l. If chromium potassium sulfate is used, the potassium ion concentration should not exceed 150 g./l.
Trivalent chromium salts are commercially prepared by reducing chromic acid or sodium dichromate with an organic reducing agent such as alcohol, molasses, or with sulfur dioxide. The product contains residual reducing agents, and oxidation products thereof, since an excess of the reducing agent is used to complete the reduction. Thus, plain solutions made up of trivalent chromium salts will contain these harmful impurities. The excess reducing agents, and oxidizing products thereof, and any other harmful impurities in the bath can be removed by the addition of a small amount of activated carbon, preferably by means of a slurry of the finely divided powder in Water. The activated carbon removes the impurities by means of absorption. The purification of the plating baths by means of activated carbon results in smoother and better plates.
The alloying constituents of the plating baths are added to the bath in the form of metal salts such as iron or nickel sulfate. The valence of the alloying metals is not as important a factor in the resulting plate as is the valence of the chromium. For instance, iron may be added either as ferrous or ferric ammonium sulfate, ferrous or ferric sulfate, or by means of a mixture of ferrous and ferric salts. However, for best results, the reduced or ferrous salts are preferred. Nickel, as an alloying element may be added as nickel sulfate or nickel ammonium sulfate. The amount of alloying metal ions added to the bath is dependent on the composition of the alloy plates desired. Alloy plates can be produced that are predominantly iron or nickel in composition; however, by combining the ferrous or ferric ion. concentrations to from 0.6 to 2.5 g./l., of the nickel ions to from 0.1 to 1.0 g./l., better alloy plates are obtained.
While the examples heretofore given have related only to chromium-iron and chromium-nickel alloys, the electroplating baths of this invention may-also be readily 6 adapted to chromium-cobalt alloys. To electroplate a chromium-cobalt alloy, cobalt salts, such as cobaltammonium sulfate, can be substituted for the ferrous or nickel compounds in the plating solution. The preferred range for cobalt ions is substantially the same as the preferred range for nickel, that is from 0.1 to 1.0 g./l.
Various ternary or even quaternary combinations of these metals can be electrodeposited in the form of hard alloy plates. For example, a bright chromium-iron-nickel alloy or a bright chromium-iron-cobalt alloy can be electrodeposited by means of the electroplating baths of this invention. Nickel or cobalt salts or both nickel and cobalt salts are added to the bath in addition to iron salts and trivalent chromium compounds to obtain ternary or quaternary bright alloy plates.
Alkali metal compounds are added to the bath to ob tain. improved throwing power. The term alkali metal compound is intended to include ammonium compound. Ammonium sulfate and sodium sulfate have proved to be satisfactory when used for this purpose, but other alkali metal compounds, such as potassium sulfate may be used as well. Ammonium compounds have proved to be the most effective for this purpose. The alkali metal compounds may be added separately or as mixtures. Addition of alkali metal compounds are particularly effective when plating is done with low current density and low concentrations of trivalent chromium ions. Concentration of the alkali metal compounds in the plating bath are dependent, to some extent, on the trivalent chromium salt or compound used. For instance, when using basic chromium sulfate, sufficient sodium sulfate may be present in the bath after dissolving this chromium salt to carry on the plating operation with further additions of alkali metal compounds. For best results, total alkali metal ion concentration should be within the concentration range of from 10 to 50 g./l. In baths where sulfate salts are employed, total sulfate ion concentrations should be within the range of from to 600 g./l.
The plating bath may be operated over a wide range of temperatures providing the pH is properly adjusted. There is some danger of chrome alum or chromium ammonium sulfate precipitating from the bath where the concentration of the chromium is in excess of 70 g./l. and the temperature is allowed to drop below F. The preferred temperature range for the trivalent chromium baths of this invention is from 110 F. to F.
Satisfactory plating has been obtained by using current densities of from 100 to 600 amperes per square foot. The selection of the proper current density is dependent upon the concentration of the chromium and alloy salts. Other factors alfecting the choice of the proper current density include the size of the plating tank, the shape and contour of the parts, and the time required to produce a given thickness.
The anode may be made of any material that will conduct an electric current and that will not react with the plating bath to adversely contaminate the plating solutions. It is preferable to use either chromium alloy anodes corresponding to the desired plate composition, or platinum, or platinum-covered silver anodes. When using chromium alloy anodes, either chromium-iron alloy or chromium-nickel alloy, it is preferable to adjust the anode current density to between 50 and 100 amperes per square foot. By this means, the metal is dissolved from the anodes at the same rate as metal is deposited on the cathodes. If platinum or platinum-covered silver anodes are used, the anode current density is not critical and may be between 50 and 1000 amperes per square foot.
When insoluble anodes are used, such as a platinum anode described above, the bath is not replenished in chromium or the alloy metal. As a result of continuous operation, the concentration of the chromium and the alloying metal will diminish proportionally with the time of electrodeposition, These metals must be constantly 7 replaced by addition of metal; compounds, such as, the trivaleng chromium salts or compounds originallyv .used, and theiralloying salts or soluble metal,,oxi de,or hyiali -x It will, of course, be understood that thevarious details of the process may bevaried without departingfrom the principles of this invention.
What is claimed is;
1. The method of electrodepositing a bright; chromiumiron. alloy plate which comprises electrolyzingian aqueous bath containingfrom 30 to 75 g./1. oftrivalentchrorninm ions, 10. to 50 ,g./l. of alkali metal ions, 0.6 to 2.5 g./ l. of; ironaions, and containing additionally atileast one brightening agent in the range specified selected from the group consisting of:
Brightening agent:
. Methyl pyridium chloride Diamino pyridine Formarnide .1+ 10 Dimethylthiourea .1 .10 Histidine monohydrochloride ,1 10 Sulfonated saccharin, .1-, 10
2. Themethodof electrodepositinga bright chromiumnickel alloys plate which comprises electrolyzingan: aqueous' bath-containing from 30 to 75 g./l. of -trivalent chromium-ions, 10m 50 g./l.of-alkali metal=ions, 0.1 to-1.0 g. /l. of nickel ionsand containing additionallyat least one brightening agent in -the range specified selected from the group consistingof:
Brightening agent: Range g. l. 7 Methyl pyridium chloride 1- 1O iam py d nea -i-a-r----as----- 1. 10
Formamide .1' 10 Dimethylthiourea l- 10 Histidine monohydrochloridm" .1 10 Sulfonated saccharin .1- 10 3. The-method of'electrodepositing a bright chromiumcobalt--alloy platewhich comprises electrolyzing an aqueousbath containing from 30-to 75 g./l. of trivalentchromium ions, 10 to-50 g./l. of-alkali metal;ions,- 0.1 to 1.0 g.-/l. of cobalt ions and'containing additionally at least one brightening agent inthe range; specified selected fromthe groupconsistingof:
Range gy l.
4..A composition ofi matters-for 'electrodepositingi-a chromium-iron alloy platev which "comprises; an 1 aqueousbath: containing from=30 toJS g/l. oftrivalentchromium' ions, :10 to 50.g./l; ofalkalimetaltions, 0.6 to 2.5 g./l;- of. iron ions, and containing additionally-atleast onebrightening agent in the rangespecified selected fromthegroup consisting of:
5."A compositijon ofgmatter for electrodepositing aw chromium-nickel alloy plate which comprises an aqueous bath containing from 30 to g./l. of trivalent chromiums.
ions,; 10 to; 5 0 g. /l. of alkali metal ions, 0.1 to- 1.0 g./l; of nickel ions, and; containing additionally at least one brighteningagent in therange specified selected fromthe group consisting of:
6.-A-con1position of matter for electrodepositing a chromium-cobalt alloyplatewhich comprises an aqueous bath containing from 30 t0'75-g./l. of trivalent chromium ions, 10-to-50 g./l.- of-alkali metal-ions, 0.1 to1.0 g./l. of cobalt ions andcoutaining additionally at least one brighteningagentin-the range specified selected from the group consisting of:
e inaagent: Range e U395; i Methyl pyridium:chloride .1-10 Diamino; pyridine, .1-10 Formamid e- .1-10 Dimethylthiourea .110 Histidine, monohydrochloridea .1-10 Su-lfona ted; saccharin .l-lO
7. The method of ,electrodepositing a brightchromiumalloy plate,,which,comprises electro1yzing an; aqueous bathcontainingfil) to 75 g./ l. of trivalent chromium ions,
10m 50 g./l. of alkali metal ions, the ions of at least, one alloying-.metal selected from the .group, consisting of from, 0.6 .,,to ,2.5 ,g./l., of iron ions, from- 0.1 to 1.0,
g./l. of nickel ions, from ,0.1 to 1.0 g./l. ofcobalt ions,:, and containing additionally at least one brighteningagent in the range specified, selected from the group consisting of:
Brightening agent: Range g./l.
Urea .1-188 Methyl pyridium chloride .1-10 Diamino pyridine .1-10 Formamide .1-10
Dimethylthiourea .1-10 I-listidine rnonohydrochloride .1-10 Sulfonated saccharin .l-10
8. A method of-electrodepositing a bright-chromiumalloy plate which :comprises= electrolyzingjan aqueous bath containing from-30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, the'ions of at leasbone alloyinggmetal selected from the group. consistingof from-0.6 to 2.5' g./l. of iron ions, from 0.1 to. 1.0 g./l. of nickel ions, and f1'om 0.1 to 1.0 g./l. of cobalt ions, and containing additionally from1 to 10 g./l. of sulfonated saccharin.
9. The method of electrodepositing a bright chromiumiron alloy plate which'comprises electrolyzing an'aqueous bathcontainingfrom 30 to 75 g./l. of trivalent chromium ions, 10 to 50 -g./1. of alkali metal ions, 0.6 to 2.5 g./l.
of= iron; ions, and. containing additionally from .1 to 10 g./l. of, sulfonated saccharin.
lO The method of electrodepositing a bright chromiumnickel alloy plate-,whichcomprises electrolyzing an aqueous batlncontaining from 30 to 75 g./1. of trivalent chromium ions,, lOotofil) ;g./ l. of alkali. metal ions,- 0.1 to 1.0 g./l.
Qflnickel ions,; and cpntaining additionally from .1 to 10 I of s lfona ed: cha in-i 11. The methodvof electrodepositing;a.bright;chromiumv cobaltalloy plate, whichvcomprises electrolyzing anaqueous hathcontainingfrom 30 to 75 g./ l. of trivalent chromium, ions, 10 to 50 g./l. of alkali metal ions, 0.1 to 1.0 g./l.
9 of cobalt ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
12. A composition of matter for electrodepositing a chromium-alloy plate, which comprises an aqueous bath containing 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, the ions of at least one alloying metal selected from the group consisting of from 0.6 to 2.5 g./l. of iron ions, from 0.1 to 1.0 g./l. of nickel ions, and from 0.1 to 1.0 g./l. of cobalt ions, and containing additionally at least one brightening agent in the range specified, selected from the group consisting of:
Brightening agent: Range g./l. Urea .l-188 Methyl pyridium chloride .1-10 Diamino pyridine .1-10 Formamide .1-10 Dimethylthiourea .1-10 Histidine monohydrochloride .110 Sulfonated saccharin .1-10
13. A composition of matter for electrodepositing a chromium alloy material which comprises a conductive aqueous solution containing from 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, the ions of at least one alloying metal selected from the group consisting of from 0.6 to 2.5 g./l. of iron ions, from 0.1 to 1.0 g./l. of nickel ions, from 0.1 to 1.0 g./l.
10 of cobalt ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
14. A composition of matter for electrodepositing a chromium-iron alloy material which comprises a conductive aqueous solution containing from to 75 g./l. of trivalent chromium ions, 10 to g./l. of alkali metal ions, from 0.6 to 2.5 g./l. of iron ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
15. A composition of matter for electrodepositing a chromium-nickel alloy material which comprises a conductive aqueous solution containing from 30 to g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, from 0.1 to 1.0 g./l. of nickel ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
16. A composition of matter for electrodepositing a chromium-cobalt alloy material which comprises a conductive aqueous solution containing from 30 to 75 g./l. of trivalent chromium ions, 10 to 50 g./l. of alkali metal ions, from 0.1 to 1.0 g./l. of cobalt ions, and containing additionally from .1 to 10 g./l. of sulfonated saccharin.
References Cited in the file of this patent UNITED STATES PATENTS 2,377,229 Harford May 29, 1945 2,655,471 Chester Oct. 13, 1953 2,704,273 Yoshida Mar. 15, 1955 2,766,196 Yoshida Oct. 9, 1956 of the above numbered patent requiring U. S. DEPARTMENT OF COMMERCE PATENT OFFICE CERTIFICATE OF CORRECTION Patent No, 2,822,326 February 4, 1958 William H., Safranek appears in the printed specification It is hereby certified that error correction and that the said Letters Patent should read as corrected below.
Column 2, line 16, for "pridium read pyridium column 8, line 12, for "Diamino pyiuldine read Dimethglthiourea Signed and sealed this 25th day of March 1958 (SEAL) Attest:
L Ho AXLINE KAR ROBERT C. WATSON Attesting Officer Conmissioner of Patents
Claims (1)
- 7. THE METHOD OF ELECTRODEPOSITING A BRIGHT CHROMIUMALLOY PLATE, WHICH COMPRISES ELECTROLYZING AN AQUEOUS BATH CONTAINING 30 TO 75 G./L. OF TRIVALENT CHROMIUM IONS, 10 TO 50 G./L. OF ALKALI METAL IONS, THE IONS OF AT LEAST ONE ALLOYING METAL SELECTED FROM THE GROUP CONSISTING OF FROM 0.6 TO 2.5 G./L. OF IRON IONS, FROM 0.1 TO 1.0 G./L. OF NICKEL IONS, FROM 0.1 TO 1.0 G./L. OF COBALT IONS, AND CONTAINING ADDITIONALLY AT LEAST ONE BRIGHTENING AGENT IN THE RANGE SPECIFIED, SELECTED FROM THE GROUP CONSISTING OF:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US496067A US2822326A (en) | 1955-03-22 | 1955-03-22 | Bright chromium alloy plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US496067A US2822326A (en) | 1955-03-22 | 1955-03-22 | Bright chromium alloy plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2822326A true US2822326A (en) | 1958-02-04 |
Family
ID=23971097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US496067A Expired - Lifetime US2822326A (en) | 1955-03-22 | 1955-03-22 | Bright chromium alloy plating |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US2822326A (en) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2938842A (en) * | 1959-03-16 | 1960-05-31 | Yawata Iron & Steel Co | Electrodeposition of fe-cr alloy |
| US3032486A (en) * | 1958-10-01 | 1962-05-01 | Ncr Co | Electrolytic bath for use in electrodeposition of ferromagnetic compositions |
| US3112553A (en) * | 1960-06-08 | 1963-12-03 | William H Safranek | Electroforming of gun liners |
| US3157585A (en) * | 1959-12-18 | 1964-11-17 | Gen Motors Corp | Chromium plating |
| FR2072091A1 (en) * | 1969-12-29 | 1971-09-24 | Int Lead Zinc Res | |
| US3833485A (en) * | 1971-02-23 | 1974-09-03 | J Crowther | Electroplating chromium and chromium alloys |
| US4062737A (en) * | 1974-12-11 | 1977-12-13 | International Business Machines Corporation | Electrodeposition of chromium |
| US4093521A (en) * | 1975-12-18 | 1978-06-06 | Stanley Renton | Chromium electroplating |
| US4141803A (en) * | 1975-12-03 | 1979-02-27 | International Business Machines Corporation | Method and composition for electroplating chromium and its alloys and the method of manufacture of the composition |
| US4161432A (en) * | 1975-12-03 | 1979-07-17 | International Business Machines Corporation | Electroplating chromium and its alloys |
| WO1982003095A1 (en) * | 1981-03-09 | 1982-09-16 | Battelle Development Corp | High-rate chromium alloy plating |
| US4417955A (en) * | 1977-01-26 | 1983-11-29 | International Business Machines Corporation | Method of and solution for electroplating chromium and chromium alloys and method of making the solution |
| US4450052A (en) * | 1982-07-28 | 1984-05-22 | M&T Chemicals Inc. | Zinc and nickel tolerant trivalent chromium plating baths |
| US4502927A (en) * | 1981-11-18 | 1985-03-05 | International Business Machines Corporation | Electrodeposition of chromium and its alloys |
| US4673471A (en) * | 1984-08-27 | 1987-06-16 | Nippon Kokan Kabushiki Kaisha | Method of electrodepositing a chromium alloy deposit |
| DK151643B (en) * | 1977-06-14 | 1987-12-21 | Ibm | Aqueous solution containing a chromium (III) THIOCYANATE complex for electroplating chromium or a chromium alloy |
| US20090255823A1 (en) * | 2008-04-11 | 2009-10-15 | Shenzhen Futaihong Precision Industry Co., Ltd. | Method for electroplating a plastic substrate |
| EP3372710A1 (en) * | 2017-03-09 | 2018-09-12 | EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt | Electrodeposition of stainless steel layer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2377229A (en) * | 1937-07-03 | 1945-05-29 | Little Inc A | Electrolytic deposition of chromium |
| US2655471A (en) * | 1951-12-21 | 1953-10-13 | Poor & Co | Chromium electroplating |
| US2704273A (en) * | 1951-09-28 | 1955-03-15 | Yoshida Tadashi | Process for chromium electrodeposition |
| US2766196A (en) * | 1953-11-09 | 1956-10-09 | Yoshida Tadashi | Process for the electrodeposition of iron-chromium alloys |
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1955
- 1955-03-22 US US496067A patent/US2822326A/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2377229A (en) * | 1937-07-03 | 1945-05-29 | Little Inc A | Electrolytic deposition of chromium |
| US2704273A (en) * | 1951-09-28 | 1955-03-15 | Yoshida Tadashi | Process for chromium electrodeposition |
| US2655471A (en) * | 1951-12-21 | 1953-10-13 | Poor & Co | Chromium electroplating |
| US2766196A (en) * | 1953-11-09 | 1956-10-09 | Yoshida Tadashi | Process for the electrodeposition of iron-chromium alloys |
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3032486A (en) * | 1958-10-01 | 1962-05-01 | Ncr Co | Electrolytic bath for use in electrodeposition of ferromagnetic compositions |
| US2938842A (en) * | 1959-03-16 | 1960-05-31 | Yawata Iron & Steel Co | Electrodeposition of fe-cr alloy |
| US3157585A (en) * | 1959-12-18 | 1964-11-17 | Gen Motors Corp | Chromium plating |
| US3112553A (en) * | 1960-06-08 | 1963-12-03 | William H Safranek | Electroforming of gun liners |
| FR2072091A1 (en) * | 1969-12-29 | 1971-09-24 | Int Lead Zinc Res | |
| US3833485A (en) * | 1971-02-23 | 1974-09-03 | J Crowther | Electroplating chromium and chromium alloys |
| US4062737A (en) * | 1974-12-11 | 1977-12-13 | International Business Machines Corporation | Electrodeposition of chromium |
| USRE31508E (en) | 1974-12-11 | 1984-01-24 | International Business Machines Corporation | Electrodeposition of chromium |
| US4141803A (en) * | 1975-12-03 | 1979-02-27 | International Business Machines Corporation | Method and composition for electroplating chromium and its alloys and the method of manufacture of the composition |
| US4161432A (en) * | 1975-12-03 | 1979-07-17 | International Business Machines Corporation | Electroplating chromium and its alloys |
| US4093521A (en) * | 1975-12-18 | 1978-06-06 | Stanley Renton | Chromium electroplating |
| US4417955A (en) * | 1977-01-26 | 1983-11-29 | International Business Machines Corporation | Method of and solution for electroplating chromium and chromium alloys and method of making the solution |
| DK151643B (en) * | 1977-06-14 | 1987-12-21 | Ibm | Aqueous solution containing a chromium (III) THIOCYANATE complex for electroplating chromium or a chromium alloy |
| WO1982003095A1 (en) * | 1981-03-09 | 1982-09-16 | Battelle Development Corp | High-rate chromium alloy plating |
| JPS58500253A (en) * | 1981-03-09 | 1983-02-17 | バツテル・デイベロプメント・コ−ポレ−シヨン | High speed chrome alloy plating |
| US4502927A (en) * | 1981-11-18 | 1985-03-05 | International Business Machines Corporation | Electrodeposition of chromium and its alloys |
| US4450052A (en) * | 1982-07-28 | 1984-05-22 | M&T Chemicals Inc. | Zinc and nickel tolerant trivalent chromium plating baths |
| US4673471A (en) * | 1984-08-27 | 1987-06-16 | Nippon Kokan Kabushiki Kaisha | Method of electrodepositing a chromium alloy deposit |
| US20090255823A1 (en) * | 2008-04-11 | 2009-10-15 | Shenzhen Futaihong Precision Industry Co., Ltd. | Method for electroplating a plastic substrate |
| EP3372710A1 (en) * | 2017-03-09 | 2018-09-12 | EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt | Electrodeposition of stainless steel layer |
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