US2891897A - Apparatus for the microscopic observation of electrolytic or chemical etching or polishing operations - Google Patents
Apparatus for the microscopic observation of electrolytic or chemical etching or polishing operations Download PDFInfo
- Publication number
- US2891897A US2891897A US624704A US62470456A US2891897A US 2891897 A US2891897 A US 2891897A US 624704 A US624704 A US 624704A US 62470456 A US62470456 A US 62470456A US 2891897 A US2891897 A US 2891897A
- Authority
- US
- United States
- Prior art keywords
- electrolytic
- microscopic observation
- workpiece
- polishing operations
- chemical etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims description 12
- 238000000866 electrolytic etching Methods 0.000 title claims description 7
- 238000003486 chemical etching Methods 0.000 title description 4
- 239000012780 transparent material Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000013019 agitation Methods 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Definitions
- a shell-like or plate-like partition having a transparent Window through which the etching or polishing operation can be observed is disposed between the objective of the microscope and the workpiece area to be treated and observed, the partition acting as a closure means in respect of the liquid.
- That boundary wall of the bath which is opposite the transparent window has an aperture against which the workpiece area to be etched or polished is urged from the outside through the agency of a spring.
- the electrically conductive wall which bounds the bath and which has the transparent window or the metal holder of the microscope objective or a ring therearound is formed as cathode, the workpiece surface to be etched or polished being used as anode.
- means for agitating the liquid are provided.
- Fig. 1 diagrammatically illustrates an observation device of the kind specified, used in co-operation with an electrolytic etching or polishing apparatus, and
- Fig. 2 illustrates a diierent type of chamber in which etching or polishing can be carried out.
- a workpiece 1 which is to be electrolytically etched or polished is held on a hollow retaining arm 2 through the agency of a releasable cover 4 having an aperture 3.
- Sealing means 5 close the interior of the arm 2 in sealing-tight manner.
- Ihe workpiece 1 is connected to the positive pole of a current source (not shown) by way of a resilient contact pin 6 and a cable 7 which is connected thereto and which extends through the arm 2.
- the cathode consists of a part-spherical shell 8 partly immersed in the elec- ICC trolyte 9.
- An aperture 11 closed by a glass disc 10 is contrived in the base of the shell 8.
- the workpiece 1 can be observed through the glass disc 10 during etching or polishing by means of the microscope 12, but the objective 13 immediately above the workpiece does not come into contact with the electrolyte or etching liquid.
- the arm 2 is rotatably and liftably mounted in the bearing 14 so that it can be swung forwards and raised to change the workpiece below the microscope or cathode.
- a pump 16 driven by a motor 15 has a delivery aperture 17 directed between the two electrodes, maintains the bath in continuous agitation and thus prevents the formation of blisters or streaks above the anode.
- Fig. 2 shows an insulated shell 18 which is connected to a metal plate 19 used as cathode.
- the workpiece 20 to be etched or polished is also used as anode and, through the agency of a resilient bowed member 21, is urged inwards against an aperture 22 in the shell 18.
- an aperture 23 contrived in the plate 19 and closed with transparent material the etching or polishing operation can be observed by means of a microscope 24. Also, to reduce the formation of blisters and streaks, the bath liquid can be agitated through the two apertures 25 and 26.
- An apparatus adapted for the microscopic observation of electrolytic etching and polishing operations on metallic workpieces, comp-rising ran upper wall member composed of electrical conducting material and serving as a cathode, said upper wall member having a window of transparent material for viewing therethrough with a microscope, Work holding means for holding said workpiece in viewing position in close proximity below, and in vertical alignment with said transparent window, said work holding means vhaving an aperture therein in vertical alignment with said transparent window and spring means for pressing said workpiece against said aperture, said workpiece constituting the anode when in operative position in the apparatus.
- An apparatus including agitating means intermediate said upper wall member and work holding means for agitating electrolyte during the use of the apparatus.
- said upper wall member comprises a cup-shaped member extending downwardly in close proximity to said work holding means.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Description
I June 23, 1959 R. zE'rzscHE APPARATUS FOR. THE MICROSCOPIC, OBSERVATION OF ELECTROLYTIC OR- CHEMICAL ETCHING OR POLISHING OPERATIONS Filed Nov. 27, 195s INVENT OR United States Patent O APPARATUS FOR THE MICROSCOPIC OBSERVA- TION OF ELECTROLYTIC OR CHEMICAL ETCH- ING OR POLISHING OPERATIONS Rolf Zetzsche, Jena, Germany, assign'or to VEB Cari Zeiss Jena, Jena, Germany Application November 27, 1956, Serial No. 624,704
Claims priority, application Germany December 10, 1955 4 Claims. (Cl. 204-273) In metallography it is important to be able to observe the structure of the metal during electrolytic or chemical etching or polishing. This invention relates to an apparatus for the microscopic observation of such operations.
According to the invention, a shell-like or plate-like partition having a transparent Window through which the etching or polishing operation can be observed is disposed between the objective of the microscope and the workpiece area to be treated and observed, the partition acting as a closure means in respect of the liquid.
Advantageously, to make the apparatus more easy to handle, that boundary wall of the bath which is opposite the transparent window has an aperture against which the workpiece area to be etched or polished is urged from the outside through the agency of a spring.
If the apparatus is used for the electrolytic etching or polishing of electrically conductive workpieces, the electrically conductive wall which bounds the bath and which has the transparent window or the metal holder of the microscope objective or a ring therearound is formed as cathode, the workpiece surface to be etched or polished being used as anode.
To obviate blisters or streaks, means for agitating the liquid are provided.
Two embodiments of the subject matter of the invention are illustrated in the drawings wherein:
Fig. 1 diagrammatically illustrates an observation device of the kind specified, used in co-operation with an electrolytic etching or polishing apparatus, and
Fig. 2 illustrates a diierent type of chamber in which etching or polishing can be carried out.
As can be seen in Fig. 1, a workpiece 1 which is to be electrolytically etched or polished is held on a hollow retaining arm 2 through the agency of a releasable cover 4 having an aperture 3. Sealing means 5 close the interior of the arm 2 in sealing-tight manner.
Ihe workpiece 1 is connected to the positive pole of a current source (not shown) by way of a resilient contact pin 6 and a cable 7 which is connected thereto and which extends through the arm 2. The cathode consists of a part-spherical shell 8 partly immersed in the elec- ICC trolyte 9. An aperture 11 closed by a glass disc 10 is contrived in the base of the shell 8. The workpiece 1 can be observed through the glass disc 10 during etching or polishing by means of the microscope 12, but the objective 13 immediately above the workpiece does not come into contact with the electrolyte or etching liquid.
The arm 2 is rotatably and liftably mounted in the bearing 14 so that it can be swung forwards and raised to change the workpiece below the microscope or cathode.
A pump 16 driven by a motor 15 has a delivery aperture 17 directed between the two electrodes, maintains the bath in continuous agitation and thus prevents the formation of blisters or streaks above the anode.
Fig. 2 shows an insulated shell 18 which is connected to a metal plate 19 used as cathode. The workpiece 20 to be etched or polished is also used as anode and, through the agency of a resilient bowed member 21, is urged inwards against an aperture 22 in the shell 18. Through an aperture 23 contrived in the plate 19 and closed with transparent material, the etching or polishing operation can be observed by means of a microscope 24. Also, to reduce the formation of blisters and streaks, the bath liquid can be agitated through the two apertures 25 and 26.
I claim:
1. An apparatus adapted for the microscopic observation of electrolytic etching and polishing operations on metallic workpieces, comp-rising ran upper wall member composed of electrical conducting material and serving as a cathode, said upper wall member having a window of transparent material for viewing therethrough with a microscope, Work holding means for holding said workpiece in viewing position in close proximity below, and in vertical alignment with said transparent window, said work holding means vhaving an aperture therein in vertical alignment with said transparent window and spring means for pressing said workpiece against said aperture, said workpiece constituting the anode when in operative position in the apparatus.
2. An apparatus according to claim 1 including agitating means intermediate said upper wall member and work holding means for agitating electrolyte during the use of the apparatus.
3. An apparatus according to claim 1 wherein said upper wall member comprises a cup-shaped member extending downwardly in close proximity to said work holding means.
4. An apparatus according to claim 1 wherein said upper wall member comprises a horizontally disposed plate.
References Cited in the le of this patent UNITED STATES PATENTS 2,498,220 Porter Feb. 21, 1950
Claims (1)
1. AN APPARATUS ADAPTED FOR THE MICROSCOPIC OBSERVATION OF ELECTROLYTIC ETCHING AND POLISHING OPERATIONS ON METALLIC WORKPIECES, COMPRISING AN UPPER WALL MEMBER COMPOSED OF ELECTRICAL CONDUCTING MATERIAL AND SERVING AS A CATHODE, SAID UPPER WALL MEMBER HAVING A WINDOW OF TRANSPARENT MATERIAL FOR VEIWING THERETHROUGH WITH A MICROSCOPE, WORK HOLDING MEANS FOR HOLDING SAID WORKPIECE IN VIEWING POSITION IN CLOSE PROXIMITY BELOW AND IN VERTICAL ALIGNMENT WITH SAID TRANSPARENT WINDOW SAID WORK HOLDING MEANS HAVING AN APERTURE THEREIN IN VERTICAL ALIGNMENT WITH SAID TRANSPARENT WINDOW AND
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2891897X | 1955-12-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2891897A true US2891897A (en) | 1959-06-23 |
Family
ID=8000599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US624704A Expired - Lifetime US2891897A (en) | 1955-12-10 | 1956-11-27 | Apparatus for the microscopic observation of electrolytic or chemical etching or polishing operations |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US2891897A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3065669A (en) * | 1960-07-19 | 1962-11-27 | American Cyanamid Co | Tissue culture chamber |
| US3271282A (en) * | 1963-06-18 | 1966-09-06 | Photo Engravers Res Inc | Process for etching photoengraving copper |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2498220A (en) * | 1946-04-17 | 1950-02-21 | Mitchel Tyler Company | Microscope auxiliary stage with electrodes |
-
1956
- 1956-11-27 US US624704A patent/US2891897A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2498220A (en) * | 1946-04-17 | 1950-02-21 | Mitchel Tyler Company | Microscope auxiliary stage with electrodes |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3065669A (en) * | 1960-07-19 | 1962-11-27 | American Cyanamid Co | Tissue culture chamber |
| US3271282A (en) * | 1963-06-18 | 1966-09-06 | Photo Engravers Res Inc | Process for etching photoengraving copper |
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