US2862860A - Cadmium electroplating - Google Patents
Cadmium electroplating Download PDFInfo
- Publication number
- US2862860A US2862860A US682261A US68226157A US2862860A US 2862860 A US2862860 A US 2862860A US 682261 A US682261 A US 682261A US 68226157 A US68226157 A US 68226157A US 2862860 A US2862860 A US 2862860A
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- United States
- Prior art keywords
- cadmium
- bath
- acid
- electroplating
- cyanide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 229910052793 cadmium Inorganic materials 0.000 title claims description 36
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 title claims description 36
- 238000009713 electroplating Methods 0.000 title description 20
- 239000002253 acid Substances 0.000 claims description 13
- 238000004070 electrodeposition Methods 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 description 15
- 239000001257 hydrogen Substances 0.000 description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 13
- 229940024606 amino acid Drugs 0.000 description 13
- 150000001413 amino acids Chemical class 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 150000001661 cadmium Chemical class 0.000 description 7
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 5
- 230000003111 delayed effect Effects 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 4
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 239000004471 Glycine Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- FUOOLUPWFVMBKG-UHFFFAOYSA-N 2-Aminoisobutyric acid Chemical compound CC(C)(N)C(O)=O FUOOLUPWFVMBKG-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229960003767 alanine Drugs 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- NHMJUOSYSOOPDM-UHFFFAOYSA-N cadmium cyanide Chemical compound [Cd+2].N#[C-].N#[C-] NHMJUOSYSOOPDM-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- ZTFYJIXFKGPCHV-UHFFFAOYSA-N 2-propan-2-ylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(C)C)=CC=C21 ZTFYJIXFKGPCHV-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QWCKQJZIFLGMSD-UHFFFAOYSA-N alpha-aminobutyric acid Chemical compound CCC(N)C(O)=O QWCKQJZIFLGMSD-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000008121 dextrose Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920006316 polyvinylpyrrolidine Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/26—Electroplating: Baths therefor from solutions of cadmium
Definitions
- This invention relates to a process for the electrodeposition of cadmium and to new electroplating baths therefor.
- cadmium from a bath comprising an aqueous ammoniacal solution of a cadmium salt other than a cyanide and an alkyl monoaminomonocarboxylic acid of 2 to carbon atoms in which the molar ratio of amino acid to cadmium is from 1:1 to 2:1 and the pH may range up to about 11.2, preferably up to about 10, and optimally is from about 9 to 10.
- the amino acid is present in the aqueous ammoniacal solution as a complex with cadmium.
- the presence of the cadmium-amino acid complex also contributes to obtaining a good plate.
- the complex formed in the ammoniacal solution between the cadmium and the amino acid is a chelate and is thus distinguished from the complex of cadmium and ammonia which is characterized by being a salt in which four NH groups are attached to cadmium.
- the electroplating baths of the invention can be made up in simple manner by dissolving the cadmium salt and the amino acid in a volume of water or of dilute ammonium hydroxide which is slightly less than that of the final volume of the solution and adjusting the pH and/ or volume of the solution to the desired level by addition of concentrated ammonium hydroxide and water as required.
- Suitable cadmium salts for preparation of the new baths are, for example, cadmium sulfate, chloride, bromide, acetate, citrate, tartrate, etc.
- Suitable amino acids therefor are, for example, glycine, /3-alanine, a amino-n-butyric acid, a-amino-isobutyric acid, [it-aminon-valeric acid, 'y-amino-n-valeric acid, ,B-amino-isovaleric
- concentration of c-adimum in the bath may range between about 0.5 and 2 molar and preferably is between about 1 and 2 molar.
- the amino acids can be present in the bath in molar concentrations from one to two times that of the cadimum.
- the molar ratio of cadmium and amino acid in the bath as stated above, may range between 1:1 and 1:2, with no apparent advantage to be had by the use of higher ratios of amino acid to cadmium.
- composition of typical electroplating baths in accordance with the invention are contained in the table below in which the weight of the starting components is in grams per liter of aqueous ammoniacal solution.
- the load applied was 75% of the ultimate tensile strength of the unplated bar. This represents very severe test conditions.
- the steel bars were sandblasted rather than pickled before being plated, simply to eliminate the embrittlement known to be caused by pickling alone. All specimens in the series were loaded immediately after being plated and examined microscopically. Criteria for acceptable plating of the tensile bars included coverage by cadmium of the root of the notch as judged by microscopic examination of a metallographic section.
- the delayed fracture test used for determination of hydrogen embrittlement was that of Raring and Rinebolt, ASTM Bulletin No. 213, pages 74-76, April 1956. From the standpoint of reduced hydrogen embrittlement, glycine and a-amino-nbutyric acid are preferred amino acids for preparing electroplating baths of the invention.
- Additives which have been heretofore employed in cadmium electroplating such as wetting agents, e. g., iso propyl naphthalene sulfonic acid, brighteners, e. g., dextrose, polyvinyl pyrrolidine, may be employed in the electroplating baths of the invention for particular im provement effects in the plating.
- wetting agents e. g., iso propyl naphthalene sulfonic acid
- brighteners e. g., dextrose, polyvinyl pyrrolidine
- the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 11.2 in which is dissolved an alkyl rnonoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in a molar ratio of from about 1:1 to 2: 1.
- the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in a molar ratio of from about 1:1 to 2:1.
- the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadirnum salt in a molar ratio of about 2:1.
- the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in a molar ratio of from about 1:1 to2:1.
- the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in a molar ratio of about 2:1.
- a cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 11.2.
- a cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 10.
- a cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 10.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
cAnMnJM ELECTROPLATING Peppino N. Vlannes, Fort Washington Forest, Md., and Simon W. Strauss and Benjamin F. Brown, Washington, D. C.
No Drawing. Application September 5, 1957 Serial No. sszmn 8 Claims. (Cl. 20450) (Granted under Title 35, U. S. Code (1952), sec. 266) The invention described herein may be manufactured and used by or for the Government of the United States of America for governmental purposes without the payment of any royalties thereon or therefor.
This invention relates to a process for the electrodeposition of cadmium and to new electroplating baths therefor.
Experience with cadmium plated high-strength steels has shown that fracture may occur in service after a period of time under an essentially constant stress much lower than the yield strength. This phenomenon, described variously as delayed fracture or static fatigue, is known to be associated with the presence of hydrogen in the steel. In recent years there has been a mounting incidence of service failures in which cadmium electroplated high-strength steel articles fail by delayed fracture.
It has long been known that hydrogen is introduced into the steel and other metals in the electroplating with cadmium from the cyanide bath. It is a characteristic of the cyanide bath process that both hydrogen and cadmium are deposited at the surface of the cathode. Part of the deposited hydrogen is eliminated by bubblingaway, but part of it becomes dissolved in the metal undergoing plating. The presence of this dissolved hydrogen reduces the fatigue strength of the metal and renders it susceptible to delayed fracture through hydrogen embrittlement.
It is an object of the present invention to provide a new process for electroplating cadmium. It is a further object to provide a process for cadmium electroplating in which deposition of hydrogen and consequent hydrogen embrittlement of the metal is markedly reduced over that occurring in the cyanide bath process. It is another object to provide new electroplating baths. It is also an object to provide new electroplating baths which are non-cyanide in composition.
We have found that the above and other objects can be accomplished in accordance with our invention by electrodepositing cadmium from a bath comprising an aqueous ammoniacal solution of a cadmium salt other than a cyanide and an alkyl monoaminomonocarboxylic acid of 2 to carbon atoms in which the molar ratio of amino acid to cadmium is from 1:1 to 2:1 and the pH may range up to about 11.2, preferably up to about 10, and optimally is from about 9 to 10. In the alkaline range of pH, the amino acid is present in the aqueous ammoniacal solution as a complex with cadmium.
It is known that the ease with which hydrogen is discharged in an electrode process depends partly on the concentration of hydrogen in the bath, i. e., on the pH of the bath. To lessen hydrogen discharge, therefore, it is preferable to work in the alkaline range. However, over a wide range of pH, cadmium tends to precipitate from ammoniacal'solution as the hydroxide unless it is properly complexed. The presence of cadmium in the electroplating baths of our invention as a complex with the amino acid permits working in the alkaline range acid, etc.
ice
without precipitation of cadmium as the hydroxide. The presence of the cadmium-amino acid complex also contributes to obtaining a good plate. The complex formed in the ammoniacal solution between the cadmium and the amino acid is a chelate and is thus distinguished from the complex of cadmium and ammonia which is characterized by being a salt in which four NH groups are attached to cadmium.
The electroplating baths of the invention can be made up in simple manner by dissolving the cadmium salt and the amino acid in a volume of water or of dilute ammonium hydroxide which is slightly less than that of the final volume of the solution and adjusting the pH and/ or volume of the solution to the desired level by addition of concentrated ammonium hydroxide and water as required. Suitable cadmium salts for preparation of the new baths are, for example, cadmium sulfate, chloride, bromide, acetate, citrate, tartrate, etc. Suitable amino acids therefor are, for example, glycine, /3-alanine, a amino-n-butyric acid, a-amino-isobutyric acid, [it-aminon-valeric acid, 'y-amino-n-valeric acid, ,B-amino-isovaleric The concentration of c-adimum in the bath may range between about 0.5 and 2 molar and preferably is between about 1 and 2 molar. The amino acids can be present in the bath in molar concentrations from one to two times that of the cadimum. The molar ratio of cadmium and amino acid in the bath, as stated above, may range between 1:1 and 1:2, with no apparent advantage to be had by the use of higher ratios of amino acid to cadmium.
The composition of typical electroplating baths in accordance with the invention are contained in the table below in which the weight of the starting components is in grams per liter of aqueous ammoniacal solution.
Weight Weight pH of Amino Acid Amino 30 (18 04.81350 solution Acid Glycine 305 9-10 fl-ala-nine 320 465 910 a-amino-n-butyric acid. 150 9-10 a-amino-isobutyric acid. 150 190 9-10 on iron, copper and copper-rich alloys and on other metals to be plated with cadmium. From the practical standpoint, the electroplating is carried out at room temperature, although the process may also be conducted at temperatures which are considerably below or above room temperature, as low as about 4 C. and as high as the boiling point of the ammoniacal solution of the amino acid-cadmium complex, with the production of a uniform, adhering deposit of cadmium on the metal to be plated using current densities of from .0027 to .027 amps/cm. (2.55 to 25.51 amps/ft?) An average current density for operation of the electrodeposition process of the invention is 15 amps/ft? Comparative tests involving electroplating a cylindrical notched bar of A181 4340 steel of approximately 285,000 p. s. i. ultimate tensile strength as substrate from baths of the composition set forth in the table above and from a standard cadmium-cyanide bath demonstrated the marked reduction in hydrogen deposition and hydrogen embrittlement which can be obtained by electroplating with the process of the invention. The baths of the .3. composition of the invention were at near saturation with respect to the amino acid and ammoniated to the optimum pH range. The current density therefor was 15 amps/ft. in each case. The current density for the standard cadmium-cyanide bath was 25 amps/ft The platings were carried out at room temperature for a plating time of 15 minutes. The plate thickness on the barrel of the specimen was about .0007 inch.
For the delayed fracture test of the plated specimens, the load applied was 75% of the ultimate tensile strength of the unplated bar. This represents very severe test conditions. The steel bars were sandblasted rather than pickled before being plated, simply to eliminate the embrittlement known to be caused by pickling alone. All specimens in the series were loaded immediately after being plated and examined microscopically. Criteria for acceptable plating of the tensile bars included coverage by cadmium of the root of the notch as judged by microscopic examination of a metallographic section. The delayed fracture test used for determination of hydrogen embrittlement was that of Raring and Rinebolt, ASTM Bulletin No. 213, pages 74-76, April 1956. From the standpoint of reduced hydrogen embrittlement, glycine and a-amino-nbutyric acid are preferred amino acids for preparing electroplating baths of the invention.
Additives which have been heretofore employed in cadmium electroplating, such as wetting agents, e. g., iso propyl naphthalene sulfonic acid, brighteners, e. g., dextrose, polyvinyl pyrrolidine, may be employed in the electroplating baths of the invention for particular im provement effects in the plating.
Since the principle of the invention herein described may be variously practiced without departing from the spirit or scope of the invention, it is to be understood that specific embodiments appearing in the above description are to be taken as illustrative and not in limitation except as may be required by the appended claims.
What is claimed is:
1. In the electrodeposition of cadmium from aqueous bath, the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 11.2 in which is dissolved an alkyl rnonoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in a molar ratio of from about 1:1 to 2: 1.
2. In the electrodeposition of cadmium from aqueous bath, the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in a molar ratio of from about 1:1 to 2:1.
3. In the electrodeposition of cadmium from aqueous bath, the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadirnum salt in a molar ratio of about 2:1.
4. In the electrodeposition of cadmium from aqueous bath, the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in a molar ratio of from about 1:1 to2:1.
5. In the electrodeposition of cadmium from aqueous bath, the improvement which comprises electrodepositing cadmium from a cyanide-free aqueous ammoniacal bath of pH up to about 10 in which is dissolved an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in a molar ratio of about 2:1.
6. A cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 11.2.
7. A cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and a cadmium salt in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 10.
8. A cyanide-free aqueous electroplating bath comprising an aqueous ammoniacal solution of an alkyl monoaminomonocarboxylic acid of from 2 to 5 carbon atoms and cadmium sulfate in the molar ratio of from about 1:1 to 2:1 in which the pH is up to about 10.
References Cited in the file of this patent UNITED STATES PATENTS 2,377,228 Harford May 29, 1945
Claims (1)
1. IN THE ELECTRODEPOSITION OF CADMIUM FROM AQUEOUS BATH, THE IMPROVEMENT WHICH COMPRISES ELECTRODEPOSITING CADMIUM FROM A CYANIDE-FREE AQUEOUS AMMONIACAL BATH OF PH UP TO ABOUT 11.2 IN WHICH IS DISSOLVED AN ALKYL MONOAMINOMONOCARBOXYLIC ACID OF FROM 2 TO 5 CARBON ATOMS AND A CADMIUM SALT IN A MOLAR RATIO OF FROM ABOUT 1:1 TO 2:1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US682261A US2862860A (en) | 1957-09-05 | 1957-09-05 | Cadmium electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US682261A US2862860A (en) | 1957-09-05 | 1957-09-05 | Cadmium electroplating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2862860A true US2862860A (en) | 1958-12-02 |
Family
ID=24738917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US682261A Expired - Lifetime US2862860A (en) | 1957-09-05 | 1957-09-05 | Cadmium electroplating |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US2862860A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2938840A (en) * | 1958-12-19 | 1960-05-31 | Simon W Strauss | Process for electrodeposition of cadmium |
| US2990344A (en) * | 1958-12-31 | 1961-06-27 | Peppino N Vlannes | Cadmium electroplating and plating baths therefor |
| US3847784A (en) * | 1972-07-28 | 1974-11-12 | Mallory Battery Canada | Porous cadmium anode and a method of forming it, and a primary cell using the anode |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2377228A (en) * | 1937-07-03 | 1945-05-29 | Little Inc A | Electrolytic deposition of cadmium |
-
1957
- 1957-09-05 US US682261A patent/US2862860A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2377228A (en) * | 1937-07-03 | 1945-05-29 | Little Inc A | Electrolytic deposition of cadmium |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2938840A (en) * | 1958-12-19 | 1960-05-31 | Simon W Strauss | Process for electrodeposition of cadmium |
| US2990344A (en) * | 1958-12-31 | 1961-06-27 | Peppino N Vlannes | Cadmium electroplating and plating baths therefor |
| US3847784A (en) * | 1972-07-28 | 1974-11-12 | Mallory Battery Canada | Porous cadmium anode and a method of forming it, and a primary cell using the anode |
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