US2506582A - Electrolytic polishing of metals - Google Patents
Electrolytic polishing of metals Download PDFInfo
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- US2506582A US2506582A US600631A US60063145A US2506582A US 2506582 A US2506582 A US 2506582A US 600631 A US600631 A US 600631A US 60063145 A US60063145 A US 60063145A US 2506582 A US2506582 A US 2506582A
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- 229910052751 metal Inorganic materials 0.000 title claims description 27
- 239000002184 metal Substances 0.000 title claims description 27
- 238000005498 polishing Methods 0.000 title claims description 27
- 150000002739 metals Chemical class 0.000 title description 11
- 239000003792 electrolyte Substances 0.000 claims description 17
- -1 FERROUS METALS Chemical class 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 229910052783 alkali metal Inorganic materials 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 8
- 229920006395 saturated elastomer Polymers 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-PWCQTSIFSA-N Tritiated water Chemical group [3H]O[3H] XLYOFNOQVPJJNP-PWCQTSIFSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 11
- 150000003839 salts Chemical class 0.000 description 10
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 235000011007 phosphoric acid Nutrition 0.000 description 4
- 241001275902 Parabramis pekinensis Species 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical class [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical class N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000000659 freezing mixture Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003873 salicylate salts Chemical class 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
Definitions
- My invention accordingly, comprises the electrolytic compositions possessing the relationship of one or more of the components of the paths to each of the others thereof which will be described herein as electrolytic compositions possessing markedly superior properties for the polishing of specific types of metals and the method of employing such electrolytic compositions in the polishing of such metals which includes the relationship of each of the steps to the others thereof, and my invention is not to be limited except as indicated in the appended claims.
- inorganic and organic salts which have natural buffering action, either as weak alkalis or Weak acids, give solutions having pI-Is which are ideally adapted to the polishing of certain metals.
- such salts as the alkali metal acetates, citrates, tartrates, salicylates, benzoates, oxalates', and salts of other common organic acids, when in solution act as buffers and maintain the solution within a very narrow range of pH, usually in the alkaline range, during the electrolytic polishing.
- the buffering property is not an exclusive one of alkali metal salts of organic acids but is also possessed by a number of inorganic salts, such as, the alkali metal borates, phosphates and thiosulfates.
- the alkali metal salts, i. e., sodium, potassium and lithium, of the organic acids and inorganic acids, which act as buffers, in general are alkaline in solution.
- Example I Example H Phosphor bronze was polished with a solution consisting of a mixture of 15 milliliters of 3198-. tone, milliliters of water and enough sodium borate substantially to saturate the mixture. A current density of about 0.15 ampere per square centimeter was used in the polishing which included chilling the anode by contacting it with a freezing mixture.
- the method of polishing comprises making the metal to be polished an anode in an electrolytic cell having as an electrolyte a substantially saturated solution of a selected salt in a solvent comprising water and a relatively large proportion of completely water-miscible organic solvent.
- the electrolyte consists essentially of a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of an acid selected from the group consisting of boric, thiosulfuric and orthophosphoric acids and the solvent is water, and a completely water miscible organic liquid selected from the group consisting of methyl alcohol, acetone, and glycerine, which electrolyte is self-buffering at a pH
- the salt used as the electrolyte should be one which in solution gives a pH of about the value desired for polishing the specific metal and should also be sufliciently soluble in the solvent .medium used to carry a current of polishing density.
- the specimen being polished is chilled ,during the process.
- the method of electrolytically polishing a metal selected from the group consisting of brasses, bronzes, copper, cobalt, nickel and ferrous metals comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of an acid selected from the group consisting of boric, thiosulfuric and orthophosphoric acids and the solvent is water, and a completely water miscible organic alcohol, which electrolyte is self-bufiering at a pH suitable for polishing, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell whereby a metallographic polish is effected on said specimen.
- the method of electrolytically polishing a metal selected from the group consisting of brasses, bronzes, copper, cobalt, nickel and ferrous metals comprising, making a specimen of the metal the anode of an electrolytic cell in suitable for polishing, maintaining the anode at a temperature approximately that of a solid carbon dioxide-ether mixture, and passing an electric current through said cell whereby a metallcgraphic polish isefiected on said specimen.
- the method of electrolytically polishing a specimen of steel comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of methyl alcohol and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of thiosulfuric acid and the solventis water, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is efiected on said specimen.
- the method of electrolytically polishing a specimen of bronze comprising, making specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of acetone and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of boric acid and the solvent is water, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is effected on said specimen.
- the method of electrolytically polishing a specimen of brass comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of glycerine and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of orthophosphoric acid and the solvent is water, maintaining the anode at a temperaturebelow that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is effected on said specimen.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
Patented May 9, 1950 ELECTROLYTIC POLISHING OF METALS Edward der Mateosian, Washington, D. C.
No Drawing. Application June 20, 1945, Serial No. 600,631
Claims.
(Granted under the act of March 3, 1883, as amended April 30, 1928; 370 0. G. 757) My invention relates to an electrolytic composition and a method for the anodic or electrolytic polishing of metals.
It is an object of my invention to provide electrolytic compositions which can readily be prepared for polishing and used directly in the polishing of certain specific metals with a minimum amount of control of operating conditions.
Other objects and advantages of my invention will in part be obvious and in part appear hereinafter in the following detailed description of its principles and a few of its embodiments.
My invention, accordingly, comprises the electrolytic compositions possessing the relationship of one or more of the components of the paths to each of the others thereof which will be described herein as electrolytic compositions possessing markedly superior properties for the polishing of specific types of metals and the method of employing such electrolytic compositions in the polishing of such metals which includes the relationship of each of the steps to the others thereof, and my invention is not to be limited except as indicated in the appended claims. In
the examples to be given herein, several preferred embodiments of the invention will be described but my invention is not to be limited except as defined in the claims appended to this specification.
In my copending application Serial Number 600,630, I have discussed some of the underlying theory of electrolytic polishing and have there pointed out that among the requirements necessary for polishing conditions to be attained in the solution are the production of polarization within the cell, high current carrying capacity for the electrolyte, a degree of solvent capacity of the bath for the anode metal being polished, provision for the liberation of oxygen at the anode and the promotion of conditions which will induce concentration polarization within the cell. In the description of the compositions and processes of the copendi-ng application, I pointed out how the various factors affecting electrolytic polishing of metals can be controlled by selecting ingredients, adjusting the pH of the solution to be used and controlling the temperature of the metal being polished. In general, I pointed out that salts such as the alkali metal salts of the mineral acids, that is, nitric, hydrochloric, hydrobromic, hydriodic, hydrofluoric, chromic, sulfuric and phosphoric acids are sufficiently soluble and have properties which make them well suited to adjustment of their solutions to the proper polishing condition.
I have found, additionally, that many of the inorganic and organic salts which have natural buffering action, either as weak alkalis or Weak acids, give solutions having pI-Is which are ideally adapted to the polishing of certain metals. For example, such salts as the alkali metal acetates, citrates, tartrates, salicylates, benzoates, oxalates', and salts of other common organic acids, when in solution act as buffers and maintain the solution within a very narrow range of pH, usually in the alkaline range, during the electrolytic polishing. The buffering property is not an exclusive one of alkali metal salts of organic acids but is also possessed by a number of inorganic salts, such as, the alkali metal borates, phosphates and thiosulfates.
The alkali metal salts, i. e., sodium, potassium and lithium, of the organic acids and inorganic acids, which act as buffers, in general are alkaline in solution.
Buffering agents or salts which will maintain acid conditions in solution, in general, are the ammonium salts or the weak base salts of the strong acids as represented by the ammonium phosphates, ammonium sulphates and the acid salts of the polybasic acids.
I have found that such metals as cuprous metals and alloys, as represented by brasses, bronzes and copper itself, and such metals as cobalt, nickel and iron polish best in alkaline media. Knowing approximately the conditions of the electrolyte best adapted to develop a lustrous polish on a metal, it is a relatively simple matter to prepare an electrolytic solution ideally adapted to developing the polish. The method of practicing my invention will be readily understood from a consideration of the following description of a few embodiments thereof.
Example I Example H Phosphor bronze was polished with a solution consisting of a mixture of 15 milliliters of 3198-. tone, milliliters of water and enough sodium borate substantially to saturate the mixture. A current density of about 0.15 ampere per square centimeter was used in the polishing which included chilling the anode by contacting it with a freezing mixture.
Era-Triple III A sample of 70-30 brass was polished with a solution consisting of 200 milliliters of glycerine, milliliters of water and enough trisodium was used. The specimen was chilled with solid carbon dioxide during the polishing.
In general the method of polishing, as can be seen from the examples, comprises making the metal to be polished an anode in an electrolytic cell having as an electrolyte a substantially saturated solution of a selected salt in a solvent comprising water and a relatively large proportion of completely water-miscible organic solvent.
which the electrolyte consists essentially of a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of an acid selected from the group consisting of boric, thiosulfuric and orthophosphoric acids and the solvent is water, and a completely water miscible organic liquid selected from the group consisting of methyl alcohol, acetone, and glycerine, which electrolyte is self-buffering at a pH The salt used as the electrolyte should be one which in solution gives a pH of about the value desired for polishing the specific metal and should also be sufliciently soluble in the solvent .medium used to carry a current of polishing density. The specimen being polished is chilled ,during the process.
I have found that various baths, of which the ones given above are typical, when made. up and used as described will polish. The alkaline baths are exemplified by those noted in the examples and slightly acid baths are readily made up by .using corresponding ammonium salts.
These examples and descriptions have been given to illustrate the method and the general nature of the bath used in the practice of the method. In general, as stated in my copending application, Serial Number 600,630, filed of even date herewith, the best conditions for obtaining the most lustrous polish exist in the solution when its composition is such that a uniform gelatinous precipitate forms over the surface of the sample being polished.
Since certain changes in carrying out the polishing may be made in the steps of the method and wide modifications in the composition of the bath which embody the invention can be made without departing from the scope of the invention, it is intended that all matter contained in the above discussion, description and examples shall be interpreted as illustrative and not in a limiting sense. I
- The invention described herein may be manufactured and used by or for the Government of the United States of America for governmental purposes without the payment of any royalties thereon or therefor.
Having described my invention, what I claim as new and desire to secure by Letters Patent of the United States is:
1. The method of electrolytically polishing a metal selected from the group consisting of brasses, bronzes, copper, cobalt, nickel and ferrous metals comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of an acid selected from the group consisting of boric, thiosulfuric and orthophosphoric acids and the solvent is water, and a completely water miscible organic alcohol, which electrolyte is self-bufiering at a pH suitable for polishing, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell whereby a metallographic polish is effected on said specimen.
' 2. The method of electrolytically polishing a metal selected from the group consisting of brasses, bronzes, copper, cobalt, nickel and ferrous metals comprising, making a specimen of the metal the anode of an electrolytic cell in suitable for polishing, maintaining the anode at a temperature approximately that of a solid carbon dioxide-ether mixture, and passing an electric current through said cell whereby a metallcgraphic polish isefiected on said specimen.
3. The method of electrolytically polishing a specimen of steel comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of methyl alcohol and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of thiosulfuric acid and the solventis water, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is efiected on said specimen.
4. The method of electrolytically polishing a specimen of bronze comprising, making specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of acetone and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of boric acid and the solvent is water, maintaining the anode at a temperature below that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is effected on said specimen.
5. The method of electrolytically polishing a specimen of brass comprising, making a specimen of the metal the anode of an electrolytic cell in which the electrolyte consists essentially of glycerine and a solution, substantially saturated at room temperature, in which the solute is an alkali metal salt of orthophosphoric acid and the solvent is water, maintaining the anode at a temperaturebelow that of the electrolyte, and passing an electric current through said cell, whereby a metallographic polish is effected on said specimen.
EDWARD DER MATEOSIAN.
REFERENCES CITED The following references are of record in the file of this patent:
UNITED STATES PATENTS Number Name Date 7 2,093,824 Woronoff Sept. 21, 1987 2,096,309 Pullen Oct. 19, 1937 2,154,468 Oplinger Apr. 18, 1939 2,375,394 Tosterud May 8, 1945 2,378,002 Drum'mond et a1. June 12, 1945 2,428,141 Burkhardt Sept. 30, 1947 FOREIGN PATENTS Number Country Date 12,030 Great Britain of 1886 550,176 Great Britain a Dec. 28, 1942 OTHER REFERENCES Handbook of Chemistry and Physics, 28th edition (1944), pages 1283, 1286.
Claims (1)
1. THE METHOD OF ELECTROLYTICALLY POLISHING A METAL SELECTED FROM THE GROUP CONSISTING OF BRASSES, BRONZES, COPPER, COBALT, NICKEL AND FERROUS METALS COMPRISING, MAKING A SPECIMEN OF THE METAL THE ANODE OF AN ELECTROLYTIC CELL IN WHICH THE ELECTROLYTE CONSISTS ESSENTIALLY OF A SOLUTION, SUBSTANTIALLY SATURATED AT ROOM TEMPERATURE, IN WHICH THE SOLUTE IS AN ALKALI METAL SALT OF AN ACID SLECTED FROM THE GROUP CONSISTING OF BORIC, THIOSULFURIC AND ORTHOPHOSPHORIC ACIDS AND THE SOLVENT IS WATER, AND A COMPLETELY WATER MISCIBLE ORGANIC ALCOHOL, WHICH ELECTROLYTE IS SELF-BUFFERING AT A PH SUITABLE FOR POLISHING, MAINTAINING THE ANODE AT A TEMPERATURE BELOW THAT OF THE ELCTROLYTE, AND PASSING AN ELECTRIC CURRENT THROUGH SAID CELL WHEREBY A METALLOGRAPHIC POLISH IS EFFECTED ON SAID SPECIMEN.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US600631A US2506582A (en) | 1945-06-20 | 1945-06-20 | Electrolytic polishing of metals |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US600631A US2506582A (en) | 1945-06-20 | 1945-06-20 | Electrolytic polishing of metals |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2506582A true US2506582A (en) | 1950-05-09 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US600631A Expired - Lifetime US2506582A (en) | 1945-06-20 | 1945-06-20 | Electrolytic polishing of metals |
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| Country | Link |
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| US (1) | US2506582A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2582020A (en) * | 1947-07-15 | 1952-01-08 | Gen Motors Corp | Electrolytic polishing |
| US2752304A (en) * | 1950-11-10 | 1956-06-26 | Centre Nat Rech Scient | Electrolytic polishing of metals |
| US3355369A (en) * | 1962-12-11 | 1967-11-28 | Agie Ag Ind Elektronik | Process using a fluoride electrolyte for the electrolytic and electrochemical working of metals |
| EP0352594A1 (en) * | 1988-07-28 | 1990-01-31 | Siemens Aktiengesellschaft | Electropolishing process for decontamination purposes |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US2093824A (en) * | 1935-08-15 | 1937-09-21 | Paul A Woronoff | Detergent cloth |
| US2096309A (en) * | 1934-12-17 | 1937-10-19 | British Aluminum Company Ltd | Surface treatment of aluminum and aluminum alloys |
| US2154468A (en) * | 1934-07-28 | 1939-04-18 | Du Pont | Bright dip |
| GB550176A (en) * | 1941-06-21 | 1942-12-28 | Macnesium Metal Corp Ltd | Improvements in and relating to the treatment of magnesium and of magnesium base alloys |
| US2375394A (en) * | 1942-12-08 | 1945-05-08 | Aluminum Co Of America | Method of brightening surfaces of aluminum-silicon alloys |
| US2378002A (en) * | 1940-12-20 | 1945-06-12 | Himmel Brothers Company | Electrolytic apparatus |
| US2428141A (en) * | 1940-09-25 | 1947-09-30 | Gen Motors Corp | Process for cleaning, stripping, and polishing metal surfaces |
-
1945
- 1945-06-20 US US600631A patent/US2506582A/en not_active Expired - Lifetime
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2154468A (en) * | 1934-07-28 | 1939-04-18 | Du Pont | Bright dip |
| US2096309A (en) * | 1934-12-17 | 1937-10-19 | British Aluminum Company Ltd | Surface treatment of aluminum and aluminum alloys |
| US2093824A (en) * | 1935-08-15 | 1937-09-21 | Paul A Woronoff | Detergent cloth |
| US2428141A (en) * | 1940-09-25 | 1947-09-30 | Gen Motors Corp | Process for cleaning, stripping, and polishing metal surfaces |
| US2378002A (en) * | 1940-12-20 | 1945-06-12 | Himmel Brothers Company | Electrolytic apparatus |
| GB550176A (en) * | 1941-06-21 | 1942-12-28 | Macnesium Metal Corp Ltd | Improvements in and relating to the treatment of magnesium and of magnesium base alloys |
| US2375394A (en) * | 1942-12-08 | 1945-05-08 | Aluminum Co Of America | Method of brightening surfaces of aluminum-silicon alloys |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2582020A (en) * | 1947-07-15 | 1952-01-08 | Gen Motors Corp | Electrolytic polishing |
| US2752304A (en) * | 1950-11-10 | 1956-06-26 | Centre Nat Rech Scient | Electrolytic polishing of metals |
| US3355369A (en) * | 1962-12-11 | 1967-11-28 | Agie Ag Ind Elektronik | Process using a fluoride electrolyte for the electrolytic and electrochemical working of metals |
| EP0352594A1 (en) * | 1988-07-28 | 1990-01-31 | Siemens Aktiengesellschaft | Electropolishing process for decontamination purposes |
| US5019228A (en) * | 1988-07-28 | 1991-05-28 | Siemens Aktiengesellschaft | Electropolishing method for decontamination purposes |
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