US2450340A - Silver base alloy for metal evaporation - Google Patents
Silver base alloy for metal evaporation Download PDFInfo
- Publication number
- US2450340A US2450340A US520974A US52097444A US2450340A US 2450340 A US2450340 A US 2450340A US 520974 A US520974 A US 520974A US 52097444 A US52097444 A US 52097444A US 2450340 A US2450340 A US 2450340A
- Authority
- US
- United States
- Prior art keywords
- silver
- metal evaporation
- base alloy
- metal
- silver base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title description 16
- 239000004332 silver Substances 0.000 title description 16
- 229910052709 silver Inorganic materials 0.000 title description 15
- 229910045601 alloy Inorganic materials 0.000 title description 9
- 239000000956 alloy Substances 0.000 title description 9
- 238000001883 metal evaporation Methods 0.000 title description 5
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 8
- 229910052721 tungsten Inorganic materials 0.000 description 8
- 239000010937 tungsten Substances 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- 239000011574 phosphorus Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Definitions
- This invention relates to improvements in metal evaporation.
- An object of the invention is to improve the evaporation of silver and copper and their alloys.
- Figure 1 is a sectional elevation of a metal evaporation apparatus
- Figure 2 is a fragmentary cross-section of the tungsten lament coated with the metal to be evaporated.
- the metal to be evaporated is usually hung on a tungsten filament as small loops of wire. then passed through the filament toV heat it and the wire loops are melted and the fused metal Electric current isv clings to the lament and evaporates as the heating is continued.
- a tungsten filament as small loops of wire.
- the wire loops are melted and the fused metal Electric current isv clings to the lament and evaporates as the heating is continued.
- One diiculty which has been encountered with silver and copper has been the failure of these metals to wet the tungsten suiciently to cling to it during the vaporization process.
- the metal tends to ball up and drop on' the filament before it can be evaporated. It also sometimes tends to spatter during evaporation, probably due to the accumulation of the liquid metal in large globules.
- the amount of phosphorus which should be alloyed with the silver may fall within the range of .001 to 1%.
- Other alloying ingredients may be present in the silver.
- Platinum and palladium in proportions ranging from .25 to 20% are sometimes desirable for improving the wettability still further.
- nickel, cobalt or iron may be present in percentages ranging from .001 to .5%.
- Figure 1 shows a metal vaporization app-aratus comprising a bell jar l0 resting on a pump plate ll with a rubber gasket I2 between them to aiiord a gas seal.
- the bell jar is connected to a vacuum pump through pipe I3 and a Pirani g-auge i4 may be provided to measure the degree of vacuum obtained.
- the articles to be coated with a thin lm of silver or copper such as glass plates or mirror blanks I5 are mounted on the inside wall of a cylindrical container I6 supported Within the bell jar.
- the tungsten lament I1 is mounted axially Within the container and connected to insulated terminals I8 and I9.
- the silver or copper alloy to be evaporated is hung on the spiral tungsten filament as little Wire loops 20 so that when the filament heats up the loops will melt and cling to the lament.
- Figure 2 is a fragment-ary cross-section of the tungsten lament I1 coated with the fused alloy 2l of silver or copper preparatory to evaporation.
- An alloy wire for metal evaporation composed of about .04% phosphorus, 5% platinum and the balance of silver.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Contacts (AREA)
Description
Sept. 28, 1948.
F. R. HENsEL ETAL SILVER BAS ALLOY FORI METAL EVAPORATON Filed Feb. 3, 1944 x x 574974762 il.
@zag N 7'0 Vid/UM PUMP SY/ver o r Cop/ur Hilo] can Za 'ny Plus/Aunis INVENToRs 'dnz Ji. Hensel By Earl j.' anni #TTOFNEYS Patented Sept. 28, 1948 SILVER BASE ALLOY FOR METAL EVAPORATION Franz R. Hensel and Earl l. Larsen, Indianapolis,
Ind., assignors to P. R. Mallory & Co., Inc., Indianapolis, Ind., a corporation of Delaware Application February 3, 1944, Serial No. 520,97 4
(Cl. i5-173) 1 Claim. l
This invention relates to improvements in metal evaporation.
An object of the invention is to improve the evaporation of silver and copper and their alloys.
Other objects of the invention Will be apparent from the description and claim.
Figure 1 is a sectional elevation of a metal evaporation apparatus, and
Figure 2 is a fragmentary cross-section of the tungsten lament coated with the metal to be evaporated.
The vaporization process for depositing silver, copper and other metals has been known for some time and used commercially to some extent. The processing as applied to silver is described in considerable detail in the book Silver in Industry edited by Lawrence Addicks (Reinhold 1940) pages 291 to 296.
In carrying out the process the metal to be evaporated is usually hung on a tungsten filament as small loops of wire. then passed through the filament toV heat it and the wire loops are melted and the fused metal Electric current isv clings to the lament and evaporates as the heating is continued. One diiculty which has been encountered with silver and copper has been the failure of these metals to wet the tungsten suiciently to cling to it during the vaporization process. The metal tends to ball up and drop on' the filament before it can be evaporated. It also sometimes tends to spatter during evaporation, probably due to the accumulation of the liquid metal in large globules.
, We have now discovered that this diiculty can be overcome and satisfactory wetting of the tungsten filament obtained by adding a small percentage of phosphorus to the silver or copper or their alloys. For example, an alloy of Per cent Phosphorus .04 Platinum 4.97 Silver Balance was found to wet the tungsten extremely well and to give no spattering during evaporation while a similar alloy without the phosphorus content was found to operate erratically.
In general the amount of phosphorus which should be alloyed with the silver may fall within the range of .001 to 1%. Other alloying ingredients may be present in the silver. Platinum and palladium in proportions ranging from .25 to 20% are sometimes desirable for improving the wettability still further. In some cases nickel, cobalt or iron may be present in percentages ranging from .001 to .5%.
For copper and copper alloys similar percentages of phosphorus may be used and similar addition metals if desired.
Referring to the drawing, Figure 1 shows a metal vaporization app-aratus comprising a bell jar l0 resting on a pump plate ll with a rubber gasket I2 between them to aiiord a gas seal. The bell jar is connected to a vacuum pump through pipe I3 and a Pirani g-auge i4 may be provided to measure the degree of vacuum obtained.
The articles to be coated with a thin lm of silver or copper such as glass plates or mirror blanks I5 are mounted on the inside wall of a cylindrical container I6 supported Within the bell jar. The tungsten lament I1 is mounted axially Within the container and connected to insulated terminals I8 and I9.
The silver or copper alloy to be evaporated is hung on the spiral tungsten filament as little Wire loops 20 so that when the filament heats up the loops will melt and cling to the lament.
. Figure 2 is a fragment-ary cross-section of the tungsten lament I1 coated with the fused alloy 2l of silver or copper preparatory to evaporation.
While specific embodiments of the invention have been described, it is intended to cover the invention broadly within the spirit and scope of the appended claim.
What is claimed is:
An alloy wire for metal evaporation composed of about .04% phosphorus, 5% platinum and the balance of silver.
FRANZ R. EENS-EL. EARL I. LARSEN.
REFERENCES CITED The following references are of record in the le of this patent:
UNITED STATES PATENTS Number Name Date 1,652,107 Escholtz Dec. 6, 1927 2,019,984 Leach Nov. 5, 1935 2,160,714 Briggs May 30, 1939 2,162,627 MacGregor June 13, 1939 2,166,248 Hensel et al. July 18, 1939 2,196,306 Hensel et al. Apr. 9, 1940 2,259,668 Spanner Oct. 21, 1941 FOREIGN PATENTS Number Country Date 755,701 France Sept. 11, 1933 452,401 Great Britain Aug. 21, 1936
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US520974A US2450340A (en) | 1944-02-03 | 1944-02-03 | Silver base alloy for metal evaporation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US520974A US2450340A (en) | 1944-02-03 | 1944-02-03 | Silver base alloy for metal evaporation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2450340A true US2450340A (en) | 1948-09-28 |
Family
ID=24074817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US520974A Expired - Lifetime US2450340A (en) | 1944-02-03 | 1944-02-03 | Silver base alloy for metal evaporation |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US2450340A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2719085A (en) * | 1950-12-22 | 1955-09-27 | Degussa | Silver-silicon alloys |
| US2805155A (en) * | 1956-10-01 | 1957-09-03 | Stewart Warner Corp | High temperature brazing alloys |
| US2819982A (en) * | 1952-11-15 | 1958-01-14 | Philips Corp | Production of silver mirrors by volatilisation |
| US2958937A (en) * | 1955-08-27 | 1960-11-08 | Degussa | Hard soldering of difficultly solderable materials |
| US3074811A (en) * | 1957-04-22 | 1963-01-22 | Radiation Res Corp | Method for preparing sources of ionizing radiation |
| US3364075A (en) * | 1965-04-05 | 1968-01-16 | Allis Chalmers Mfg Co | Method of producing a nickel-silver-phosphorus alloy fuel cell electrode catalyst |
| US4861944A (en) * | 1987-12-09 | 1989-08-29 | Cabot Electronics Ceramics, Inc. | Low cost, hermetic pin grid array package |
| US20070128456A1 (en) * | 2003-10-16 | 2007-06-07 | Koichi Hasegawa | Sputtering target material |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1652107A (en) * | 1922-06-05 | 1927-12-06 | Westinghouse Electric & Mfg Co | Welding electrode |
| FR755701A (en) * | 1932-05-17 | 1933-11-29 | Siebert G M B H G | Alloys for shaped parts, for example dies, with high mechanical and chemical resistance, used in the artificial silk industry |
| US2019984A (en) * | 1934-09-29 | 1935-11-05 | Handy & Harman | Alloy |
| GB452401A (en) * | 1936-02-28 | 1936-08-21 | Alan Richard Powell | Improvements in and relating to alloys for dental plates |
| US2160714A (en) * | 1932-07-20 | 1939-05-30 | Hygrade Sylvania Corp | Apparatus for interiorly coating lamps, tubes, and the like |
| US2162627A (en) * | 1937-12-02 | 1939-06-13 | Alpine R Macgregor | Alloy |
| US2166248A (en) * | 1939-01-05 | 1939-07-18 | Mallory & Co Inc P R | Electrical contacting element |
| US2196306A (en) * | 1939-12-13 | 1940-04-09 | Mallory & Co Inc P R | Silver lithium alloy |
| US2259668A (en) * | 1939-10-27 | 1941-10-21 | Chemical Marketing Company Inc | Tarnish resistant silver alloy |
-
1944
- 1944-02-03 US US520974A patent/US2450340A/en not_active Expired - Lifetime
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1652107A (en) * | 1922-06-05 | 1927-12-06 | Westinghouse Electric & Mfg Co | Welding electrode |
| FR755701A (en) * | 1932-05-17 | 1933-11-29 | Siebert G M B H G | Alloys for shaped parts, for example dies, with high mechanical and chemical resistance, used in the artificial silk industry |
| US2160714A (en) * | 1932-07-20 | 1939-05-30 | Hygrade Sylvania Corp | Apparatus for interiorly coating lamps, tubes, and the like |
| US2019984A (en) * | 1934-09-29 | 1935-11-05 | Handy & Harman | Alloy |
| GB452401A (en) * | 1936-02-28 | 1936-08-21 | Alan Richard Powell | Improvements in and relating to alloys for dental plates |
| US2162627A (en) * | 1937-12-02 | 1939-06-13 | Alpine R Macgregor | Alloy |
| US2166248A (en) * | 1939-01-05 | 1939-07-18 | Mallory & Co Inc P R | Electrical contacting element |
| US2259668A (en) * | 1939-10-27 | 1941-10-21 | Chemical Marketing Company Inc | Tarnish resistant silver alloy |
| US2196306A (en) * | 1939-12-13 | 1940-04-09 | Mallory & Co Inc P R | Silver lithium alloy |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2719085A (en) * | 1950-12-22 | 1955-09-27 | Degussa | Silver-silicon alloys |
| US2819982A (en) * | 1952-11-15 | 1958-01-14 | Philips Corp | Production of silver mirrors by volatilisation |
| US2958937A (en) * | 1955-08-27 | 1960-11-08 | Degussa | Hard soldering of difficultly solderable materials |
| US2805155A (en) * | 1956-10-01 | 1957-09-03 | Stewart Warner Corp | High temperature brazing alloys |
| US3074811A (en) * | 1957-04-22 | 1963-01-22 | Radiation Res Corp | Method for preparing sources of ionizing radiation |
| US3364075A (en) * | 1965-04-05 | 1968-01-16 | Allis Chalmers Mfg Co | Method of producing a nickel-silver-phosphorus alloy fuel cell electrode catalyst |
| US4861944A (en) * | 1987-12-09 | 1989-08-29 | Cabot Electronics Ceramics, Inc. | Low cost, hermetic pin grid array package |
| US20070128456A1 (en) * | 2003-10-16 | 2007-06-07 | Koichi Hasegawa | Sputtering target material |
| US7959746B2 (en) * | 2003-10-16 | 2011-06-14 | Ishifuku Metal Industry Co., Ltd. | Sputtering target material |
| US20110211988A1 (en) * | 2003-10-16 | 2011-09-01 | Koichi Hasegawa | Sputtering target material |
| US8252127B2 (en) | 2003-10-16 | 2012-08-28 | Ishifuku Metal Industry Co., Ltd. | Sputtering target material |
| US20130094990A1 (en) * | 2003-10-16 | 2013-04-18 | Ishifuku Metal Industry Co., Ltd. | Sputtering target material |
| US8858877B2 (en) * | 2003-10-16 | 2014-10-14 | Ishifuku Metal Industry Co., Ltd. | Sputtering target material |
| US9127346B2 (en) | 2003-10-16 | 2015-09-08 | Ishifuku Metal Industry Co., Ltd. | Sputtering target material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US2432657A (en) | Process of evaporating metals | |
| US2450340A (en) | Silver base alloy for metal evaporation | |
| US2220961A (en) | Soldering alloy | |
| US4042725A (en) | Solder alloy and soldering process | |
| US2859512A (en) | Method of bonding a titanium member to a ceramic surface | |
| US2143723A (en) | Method and apparatus for applying metal coatings | |
| US3413711A (en) | Method of making palladium copper contact for soldering | |
| US2447979A (en) | Copper base alloy for metal evaporation | |
| US2413604A (en) | Method or process of evaporating metals | |
| US2539248A (en) | Method of bonding aluminum alloys to steel | |
| GB1246109A (en) | A method of manufacturing mesh grid electrodes for electric discharge vessels | |
| US2797300A (en) | Welding | |
| US2450856A (en) | Method of coating by evaporating metals | |
| US2323169A (en) | Process of plating metal bodies | |
| GB830328A (en) | Improvements in article and method of joining vitreous material | |
| US2450850A (en) | Method of coating by evaporating metals | |
| JPS6218275B2 (en) | ||
| US2731366A (en) | Method of vapor depositing coatings of aluminum | |
| US2731365A (en) | Method of vapor depositing coatings of aluminum | |
| US2413605A (en) | Process of evaporating metals | |
| US3730761A (en) | Coating of metals | |
| US2142672A (en) | Copper base alloy | |
| US2904451A (en) | Vaporization coating process and alloy therefor | |
| US2829235A (en) | Device for use in stud welding | |
| US2197380A (en) | Electric contact element |