US20240038678A1 - Electronic device - Google Patents
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- US20240038678A1 US20240038678A1 US17/877,796 US202217877796A US2024038678A1 US 20240038678 A1 US20240038678 A1 US 20240038678A1 US 202217877796 A US202217877796 A US 202217877796A US 2024038678 A1 US2024038678 A1 US 2024038678A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49833—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5385—Assembly of a plurality of insulating substrates
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5386—Geometry or layout of the interconnection structure
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
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- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
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- H01L25/105—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
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- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1023—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
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- H01L2225/10—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1041—Special adaptations for top connections of the lowermost container, e.g. redistribution layer, integral interposer
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- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/10—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1047—Details of electrical connections between containers
- H01L2225/107—Indirect electrical connections, e.g. via an interposer, a flexible substrate, using TAB
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
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- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
- H01L25/162—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits the devices being mounted on two or more different substrates
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/202—Electromagnetic wavelength ranges [W]
- H01L2924/2027—Radio 1 mm - km 300 GHz - 3 Hz
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10378—Interposers
Definitions
- the present disclosure generally relates to an electronic device, and more particularly, to an electronic device including a shielding wall.
- interposer To meet characteristic impedance of an electronic device, which transmits a signal with a relatively high frequency (e.g., radio frequency (RF) signal), three or more arrays of interconnections are utilized in an interposer.
- RF radio frequency
- an electronic device includes a first interposer, a first interconnection array, a first shielding wall, and a second interconnection array.
- the first interconnection array is disposed in the first interposer and electrically connected to ground.
- the first shielding wall continuously extends at a side of the first interconnection array.
- the second interconnection array is disposed between the first shielding wall and the first interconnection array. The second interconnection array is configured to transmit a signal.
- an electronic device includes an interposer, a first interconnection, a second interconnection, and a first electrical shielding layer.
- the interposer has a first edge and a second edge opposite to the first edge.
- the first interconnection is disposed in the first interposer and configured to transmit a ground signal.
- the second interconnection is disposed in the first interposer and configured to transmit a non-ground signal.
- the first electrical shielding layer is adjacent to the first edge of the interposer.
- a projected length from the first interconnection to the second interconnection is greater than a first distance between the second interconnection and the first edge. The projected length is a projection of a length starting at the first interconnection and ending at the second interconnection as projected on an imaginary plane perpendicular to the first edge of the interposer.
- an electronic device includes a first substrate, a second substrate, an interposer, and an electrical shielding layer.
- the second substrate is disposed over the first substrate.
- the interposer is disposed between the first substrate and the second substrate.
- the interposer includes a ground connection and a signal connection.
- the electrical shielding layer extends from a side of the first substrate to a side of the second substrate. The ground connection and the electrical shielding layer are configured to prevent the signal connection from electromagnetic interference.
- FIG. 1 A is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 1 B is an enlarged view of region A of the electronic device as shown in FIG. 1 A , in accordance with an embodiment of the present disclosure.
- FIG. 1 C is a cross-sectional view along line A-A′ of the electronic device as shown in FIG. 1 A , in accordance with an embodiment of the present disclosure.
- FIG. 2 A is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 2 B is a cross-sectional view along line B-B′ of the electronic device as shown in FIG. 2 A , in accordance with an embodiment of the present disclosure.
- FIG. 3 is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 4 A is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 4 B is an enlarged view of region B of the electronic device as shown in FIG. 4 A , in accordance with an embodiment of the present disclosure.
- FIG. 5 A is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 5 B is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 6 A is a top view of an electronic device, in accordance with an embodiment of the present disclosure.
- FIG. 6 B is an enlarged view of region C of the electronic device as shown in FIG. 6 A , in accordance with an embodiment of the present disclosure.
- FIG. 7 A is a top view of an electronic device of a comparative example.
- FIG. 7 B is a cross-sectional view along line C-C′ of the electronic device as shown in FIG. 7 A .
- first and second features are formed or disposed in direct contact
- additional features may be formed or disposed between the first and second features, such that the first and second features may not be in direct contact
- present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
- FIG. 1 A is a top view of an electronic device 1 a , in accordance with an embodiment of the present disclosure.
- the electronic device 1 a may include a carrier 10 , a interposer 20 , interconnection arrays (e.g., 30 and 30 ′), interconnection arrays (e.g., 40 and 40 ′), an electrical shielding layer 50 , and electronic components (e.g., 62 ).
- the interposer 20 may be disposed over the carrier 10 .
- the interposer 20 may be configured to accommodate at least a part of an interconnection array.
- the interposer 20 may have edges 20 e 1 , 20 e 2 , 20 e 3 , and 20 e 4 .
- the edge 20 e 1 may be opposite to the edge 20 e 3 .
- Each of the edges 20 e 1 and 20 e 3 may extend along the X-axis.
- the edge 20 e 2 may be opposite to the edge 20 e 4 .
- Each of the edges 20 e 2 and 20 e 4 may extend along the Y-axis.
- Each of the edges 20 e 1 , 20 e 2 , 20 e 3 , and 20 e 4 may also be referred to as an outer edge.
- each of the interconnection arrays 30 and 30 ′ may be electrically connected to ground or be configured to transmit a ground signal.
- each of the interconnection arrays 30 and 30 ′ may have a plurality of interconnections 31 .
- the interconnection array 30 may be disposed at the edge 20 e 1 of the interposer 20 .
- the interconnection array 30 ′ may be disposed at the edge 20 e 2 of the interposer 20 .
- the plurality of interconnections 31 may surround the electronic components (e.g., 62 ).
- Each of the interconnections 31 may be aligned along the X-axis or the Y-axis.
- each of the interconnections 31 may be electrically connected to ground or be configured to transmit a ground signal.
- the interconnection array 30 may also be referred to as an inner interconnection array.
- the interconnection array 40 may be disposed between the electrical shielding layer 50 and the interconnection array 30 .
- each of the interconnection arrays 40 and 40 ′ may be electrically connected to transmit a non-ground signal or a signal (e.g., data signal).
- the interconnection array 40 may be disposed at the edge 20 e 1 of the interposer 20 .
- the interconnection array 40 ′ may be disposed at the edge 20 e 2 of the interposer 20 .
- each of the interconnection arrays 40 and 40 ′ may include a plurality of interconnections 41 . Each of the interconnections 41 may be aligned along the X-axis or the Y-axis.
- each of the interconnection 41 may be configured to transmit a non-ground signal or a data signal, such as a radio frequency (RF) signal or other signals.
- the interconnection array 30 and the interconnection array 40 may be arranged in a staggered arrangement.
- the interconnections 31 and the interconnections 41 may be arranged in a staggered arrangement.
- the interconnection 31 is free from overlapping with the interconnection 41 along an orientation (e.g., the Y-axis) perpendicular to an extending axis (e.g., the X-axis) of the electrical shielding layer 50 .
- the interconnection array 40 may also be referred to as an outer interconnection array.
- the electrical shielding layer 50 may be disposed on or over an external surface (e.g., surface 20 s 1 ) of the interposer 20 . In some embodiments, the electrical shielding layer 50 may surround or enclose the interconnection arrays 30 and 30 ′. In some embodiments, the electrical shielding layer 50 may surround or enclose the interconnection arrays 40 and 40 ′. In some embodiments, the electrical shielding layer 50 may be configured to prevent a signal (e.g., a data signal), passing through the interconnection 41 , from attenuation or distortion. In some embodiments, the electrical shielding layer 50 may be configured to protect the electronic components (e.g., 62 ) from electromagnetic interference (EMI).
- EMI electromagnetic interference
- the thickness (not annotated in the figures) is less than the diameter (not annotated in the figures) of the interconnection 31 and/or 41 .
- the thickness of the electrical shielding layer 50 may range from about 1 ⁇ m to about 10 ⁇ m, while the diameter of the interconnection 31 and/or 41 may range from about 0.1 mm to about 0.5 mm.
- the electrical shielding layer 50 may include shielding walls 50 p 1 , 50 p 2 , 50 p 3 , and 50 p 4 .
- the shielding wall 50 p 1 may continuously extend along the edge 20 e 1 of the interposer 20 .
- the shielding wall 50 p 2 may continuously extend along the edge 20 e 2 of the interposer 20 .
- the shielding wall 50 p 3 may continuously extend along the edge 20 e 3 of the interposer 20 .
- the shielding wall 50 p 4 may continuously extend along the edge 20 e 4 of the interposer 20 .
- the shielding wall 50 p 2 may extend from the shielding wall 50 p 1 .
- the shielding wall 50 p 1 may continuously extend between the edges 20 e 2 and 20 e 4 of the interposer 20 . In some embodiments, the shielding wall 50 p 1 may be in contact with the shielding wall 50 p 2 . In some embodiments, the shielding walls 50 p 1 , 50 p 2 , 50 p 3 , and 50 p 4 may be connected to each other. In some embodiments, each of the shielding walls 50 p 1 , 50 p 2 , 50 p 3 , and 50 p 4 may extend along a side of the interconnection array (e.g., 30 , 30 ′, 40 , or 40 ′)
- the interconnection array e.g., 30 , 30 ′, 40 , or 40 ′
- FIG. 1 B is an enlarged view of region A of the electronic device as shown in FIG. 1 A , in accordance with an embodiment of the present disclosure.
- the interconnections 31 and 41 may have a distance D 1 therebetween.
- the distance D 1 is a length starting at the interconnection 31 and ending at the interconnection 41 .
- the distance D 1 is a length starting at a peripheral of the interconnection 31 and ending at a peripheral the interconnection 41 .
- the distance D 1 is a length starting at a cross-sectional center of the interconnection 31 and ending at a cross-sectional center of the interconnection 41 .
- the interconnection 31 and the edge 20 e 1 of the interposer 20 (or electrical shielding layer 50 ) may have a distance D 2 (along the Y-axis) therebetween.
- the distance D 2 is a length starting at the interconnection 31 and ending at edge 20 e 1 of the interposer 20 . In some embodiments of the present disclosure, the distance D 2 is a length starting at a peripheral of the interconnection 31 and ending at edge 20 e 1 of the interposer 20 . In some embodiments of the present disclosure, the distance D 2 is a length starting at a cross-sectional center of the interconnection 31 and ending at edge 20 e 1 of the interposer 20 .
- the interconnection 41 and the edge 20 e 1 of the interposer 20 (or electrical shielding layer 50 ) may have a distance D 3 (along the Y-axis) therebetween.
- the distance D 3 is a length starting at the interconnection 41 and ending at edge 20 e 1 of the interposer 20 . In some embodiments of the present disclosure, the distance D 3 is a length starting at a peripheral of the interconnection 41 and ending at edge 20 e 1 of the interposer 20 . In some embodiments of the present disclosure, the distance D 3 is a length starting at a cross-sectional center of the interconnection 41 and ending at edge 20 e 1 of the interposer 20 . In some embodiments, the distance D 3 is less than the distance D 2 . In some embodiments, the distance D 3 is less than the distance D 1 . For example, the distance D 1 may range from about 0.3 mm to about 1.5 mm. The distance D 1 may be 0.6 mm. The distance D 2 may range from about 0.25 mm to about 1.5 mm. The distance D 3 may range from about 0.1 mm to about 0.4 mm. The distance D 3 may be 0.195 mm.
- the interposer 20 may have an edge 20 e 1 ′ opposite to the edge 20 e 1 .
- the edge 20 e 1 ′ may also be referred to as an inner edge.
- the interconnection 31 and the edge 20 e 1 ′ of the interposer 20 may have a distance D 2 ′ (along the Y-axis) therebetween.
- the distance D 2 ′ is a length starting at the interconnection 31 and ending at edge 20 e 1 ′ of the interposer 20 .
- the distance D 2 ′ is a length starting at a peripheral of the interconnection 31 and ending at edge 20 e 1 ′ of the interposer 20 .
- the distance D 2 ′ is a length starting at a cross-sectional center of the interconnection 31 and ending at edge 20 e 1 ′ of the interposer 20 .
- the interconnection 41 and the edge 20 e 1 ′ of the interposer 20 may have a distance D 3 ′ (along the Y-axis) therebetween.
- the distance D 3 ′ is a length starting at the interconnection 41 and ending at edge 20 e 1 ′ of the interposer 20 .
- the distance D 3 ′ is a length starting at a peripheral of the interconnection 41 and ending at edge 20 e 1 ′ of the interposer 20 .
- the distance D 3 ′ is a length starting at a cross-sectional center of the interconnection 41 and ending at edge 20 e 1 ′ of the interposer 20 .
- the distance D 2 ′ is less than the distance D 2 .
- the distance D 3 ′ is greater than the distance D 3 .
- the interconnection 31 and the interconnection 41 may have a projected length T 1 along the Y-axis.
- the projected length T 1 may be defined as a projection of a length starting at the interconnection 31 and ending at the interconnection 41 as projected to a direction, such as Y-axis.
- the projected length T 1 may be greater than the distance D 3 .
- the projected length T 1 may be less than the distance D 3 .
- Two adjacent interconnections 31 may have a distance D 4 (or a pitch) therebetween.
- the distance D 4 is a length starting at one interconnection 31 and ending at another interconnection 31 .
- the distance D 4 is a length starting at a peripheral of one interconnection 31 and ending at a peripheral another interconnection 31 .
- the distance D 4 is a length starting at a cross-sectional center of one interconnection 31 and ending at a cross-sectional center of another interconnection 31 .
- Two adjacent interconnections 41 may have a distance D 5 (or a pitch) therebetween.
- the distance D 5 is a length starting at one interconnection 41 and ending at another interconnection 41 . In some embodiments of the present disclosure, the distance D 5 is a length starting at a peripheral of one interconnection 41 and ending at a peripheral another interconnection 41 . In some embodiments of the present disclosure, the distance D 5 is a length starting at a cross-sectional center of one interconnection 41 and ending at a cross-sectional center of another interconnection 41 . In some embodiments, the distance D 4 may substantially equal the distance D 5 . In some embodiments, the distance D 1 may be less than the distance D 4 . In some embodiments, the distance D 1 may be less than the distance D 5 . For example, the distance D 4 may range from about 0.5 mm to about 2.5 mm. The distance D 5 may range from about 0.5 mm to about 2.5 mm. In addition, a width of the shielding wall may be 0.5um.
- the interconnection array 30 and the electrical shielding layer 50 may be collectively configured to reduce attenuation or distortion of a signal (e.g., an RF signal) passing through the interconnection 41 .
- the interconnection array 30 and the electrical shielding layer 50 may be configured to determine or modify a characteristic impedance.
- the characteristic impedance may depend on a frequency at which a signal operates.
- the interconnection 41 may be configured to transmit a signal with a relatively high frequency (e.g., the frequency exceeding 10 GHz), which requires a relatively large characteristic impedance to reduce signal distortion.
- FIG. 1 C is a cross-sectional view along line A-A′ of the electronic device 1 a as shown in FIG. 1 A , in accordance with an embodiment of the present disclosure.
- the carrier 10 may be or include, for example, a printed circuit board, such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated glass-fiber-based copper foil laminate.
- a printed circuit board such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated glass-fiber-based copper foil laminate.
- the carrier 10 may also be referred to as a substrate.
- the carrier 10 may have a surface 10 s 1 (which may also be referred to as a lower surface), a surface 10 s 2 (which may also be referred to as an upper surface) opposite to the surface 10 s 1 , and a surface 10 s 3 (which may also be referred to as a lateral surface) extending between the surface 10 s 1 and the surface 10 s 2 .
- the carrier 10 may include conductive pad(s), trace(s), via(s), layer(s), or other interconnection(s).
- the carrier 10 may include one or more transmission lines (e.g., communications cables) and one or more grounding lines and/or grounding planes.
- the carrier 10 may include one or more conductive pads (not shown in the figures) in proximity to, adjacent to, or embedded in and exposed by the surface 10 s 1 and/or the surface 10 s 2 of the carrier 10 .
- the carrier 10 may include a solder resist (not shown in the figures) on the surface 10 s 1 and/or the surface 10 s 2 to fully expose or expose at least a portion of the conductive pads for electrical connections.
- the electronic device 1 a may include dielectric layers 21 , 22 , and 23 .
- the dielectric layers 21 , 22 , and 23 may be disposed on or over the surface 10 s 1 of the carrier 10 .
- the dielectric layer 21 may be disposed over the surface 10 s 2 of the carrier 10 .
- the dielectric layer 22 may encapsulate a portion of the interconnection 31 and/or 41 .
- the dielectric layer 23 may encapsulate the dielectric layer 22 .
- the dielectric layer 23 may encapsulate the electronic components 62 and 63 .
- a dielectric constant of the dielectric layer 22 may be different from that of the dielectric layer 23 .
- a dielectric constant of the dielectric layer 22 may be less than that of the dielectric layer 23 , which may reduce the size of the electronic device 1 a .
- the material of the dielectric layer 22 may be different from that of the dielectric layer 23 .
- the material of the dielectric layer 21 may be different from that of the dielectric layer 23 .
- the material of the dielectric layer 22 may be different from that of the dielectric layer 21 .
- Each of the dielectric layers 21 , 22 , and 23 may include, for example, pre-impregnated composite fibers, ceramic-filled polytetrafluoroethylene (PTFE) composites, or other suitable materials.
- the dielectric layer 23 may also be referred to as an encapsulant.
- the interconnection 31 may penetrate the dielectric layers 21 , 22 , and/or 23 . In some embodiments, the interconnection 31 may be electrically connected to the carrier 10 .
- the interconnection 31 may include conductive via(s), trace(s), or other suitable elements.
- the interconnection 31 may include, for example, conductive elements 311 , 312 , 313 , 314 , and 315 . It should be noted that the structure of the interconnection 31 may depend on design requirements, and the present disclosure is not intended to limit the same.
- the interconnection 31 may include a conductive pillar extending between the carriers 10 and 70 in other embodiments. In some embodiment, the interconnection 31 may refer to the conductive element 314 .
- the conductive element 311 may be disposed over the surface 10 s 2 of the carrier 10 .
- the conductive element 311 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the conductive element 312 may be disposed over the conductive element 311 .
- the conductive element 312 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof.
- the conductive element 313 may be disposed over the conductive element 312 .
- the conductive element 313 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the conductive element 314 may be disposed over the conductive element 313 . In some embodiments, the conductive element 314 may be covered by the dielectric layer 22 . In some embodiments, the conductive element 314 may be encapsulated by the dielectric layer 22 .
- the conductive element 314 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof.
- the conductive element 315 may be disposed over the conductive element 314 .
- the conductive element 315 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the interconnection 41 may penetrate the dielectric layers 21 , 22 , and/or 23 .
- the interconnection 41 may be electrically connected to the carrier 10 and/or carrier 70 .
- the interconnection 41 may include conductive via(s), trace(s), or other suitable elements.
- the interconnection 41 may include, for example, a conductive elements 411 , 412 , 413 , 414 , and 415 . It should be noted that the structure of the interconnection 41 may depend on design requirements, and the present disclosure is not intended to limit the same.
- the interconnection 41 may include a conductive pillar extending between the carriers 10 and 70 in other embodiments.
- the interconnection 41 may refer to the conductive element 414 .
- the conductive element 411 may be disposed over the surface 10 s 2 of the carrier 10 .
- the conductive element 411 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the conductive element 412 may be disposed over the conductive element 411 .
- the conductive element 412 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof.
- the conductive element 413 may be disposed over the conductive element 412 .
- the conductive element 413 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the conductive element 414 may be disposed over the conductive element 413 . In some embodiments, the conductive element 414 may be covered by the dielectric layer 22 . In some embodiments, the conductive element 414 may be encapsulated by the dielectric layer 22 .
- the conductive element 414 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof.
- the conductive element 415 may be disposed over the conductive element 414 .
- the conductive element 415 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder.
- the interposer 20 may include the dielectric layer 22 , the conductive element 314 and the conductive element 414 .
- the conductive element 314 may also be referred to as a ground connection, which is configured to transmit a ground signal or electrically connected to ground.
- the conductive element 414 may also be referred to as a signal connection, which is configured to transmit a signal (e.g., data signal).
- the electrical shielding layer 50 may cover an external surface 20 s 1 of the interposer 20 .
- the electrical shielding layer 50 may cover the surface 20 s 1 (or a lateral surface) of the interposer 20 .
- the electrical shielding layer 50 may cover the dielectric layer 23 . shielding layer
- the electronic device 1 a may further include a carrier 70 .
- the carrier 70 may be or include, for example, a printed circuit board, such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated glass-fiber-based copper foil laminate.
- the carrier 10 may also be referred to as a lower carrier, and the carrier 70 may also be referred to as an upper carrier.
- the carrier 70 may have a surface 70 s 1 (which may also be referred to as a lower surface), a surface 70 s 2 (which may also be referred to as an upper surface) opposite to the surface 70 s 1 , and a surface 70 s 3 (which may also be referred to as a lateral surface) extending between the surface 70 s 1 and the surface 70 s 2 .
- the surface 70 s 3 of the carrier 70 may be noncoplanar with the surface 10 s 3 of the carrier 10 .
- the carrier 70 may include conductive pad(s), trace(s), via(s), layer(s), or other interconnection(s).
- the carrier 70 may include one or more conductive pads (not shown in the figures) in proximity to, adjacent to, or embedded in and exposed by the surface 70 s 1 and/or the surface 70 s 2 of the carrier 70 .
- the carrier 70 may include a solder resist (not shown in the figures) on the surface 70 s 1 and/or the surface 70 s 2 to fully expose or to expose at least a portion of the conductive pads for electrical connections.
- the electronic components 61 , 62 , 63 , and 64 may be covered by the electrical shielding layer 50 .
- Each of the electronic components 61 , 62 , 63 , and 64 may be a chip or a die including a semiconductor substrate, one or more integrated circuit (IC) devices and one or more overlying interconnection structures therein.
- the IC devices may include active devices such as transistors and/or passive devices such as resistors, capacitors, inductors, or a combination thereof.
- the electronic component 61 , 62 , 63 , and/or 64 may include a system on chip (SoC).
- SoC system on chip
- the electronic component 61 , 62 , 63 , and/or 64 may include an application-specific IC (ASIC), a radio frequency integrated circuit (RFIC), a central processing unit (CPU), a microprocessor unit (MPU), a graphics processing unit (GPU), a microcontroller unit (MCU), a field-programmable gate array (FPGA), or another type of IC.
- ASIC application-specific IC
- RFIC radio frequency integrated circuit
- CPU central processing unit
- MPU microprocessor unit
- GPU graphics processing unit
- MCU microcontroller unit
- FPGA field-programmable gate array
- Electronic components 61 , 62 , and 63 may be disposed between the carriers 10 and 70 .
- the electronic component 61 may be disposed over the surface 10 s 1 of the carrier 10 .
- the electronic component 61 may have an active surface (not annotated in the figures) facing away from the carrier 10 .
- the electronic component 62 may be disposed over the electronic component 61 .
- the electronic component 62 may have an active surface facing the electronic component 61 .
- the electronic component 62 may be electrically connected to the electronic component 61 through a redistribution structure 82 .
- the electronic component 63 may be disposed below the surface 70 s 1 of the carrier 70 .
- the electronic component 64 may be disposed over the surface 70 s 2 of the carrier 70 .
- the electronic component 63 may be electrically connected to the electronic component 64 through the carrier 70 .
- the electronic component 63 may have an active surface facing the carrier 70 .
- the electronic component 64 may have an active surface facing the carrier 70 .
- the electronic device 1 a may further include a grounding pattern 81 .
- the grounding pattern 81 may be electrically connected to ground.
- the interconnection 31 may be electrically connected to the grounding pattern 81 .
- the electrical shielding layer 50 may be electrically connected to the grounding pattern 81 .
- the grounding pattern 81 may be disposed over the surface 10 s 2 of the carrier 10 .
- the grounding pattern 81 may be disposed between the conductive elements 311 and 312 . The location of the grounding pattern 81 may depend on design requirements, and the present disclosure is not intended to limit the same.
- the dielectric layer 21 , the redistribution structure 82 , the conductive element 312 , and the conductive element 412 may be included in a substrate 71 .
- the substrate 71 may have surfaces 71 s 1 , 71 s 2 , and 71 s 3 .
- the electronic component 61 may be disposed under the surface 71 s 1 .
- the electronic component 62 may be disposed over the surface 71 s 2 .
- the surface 71 s 3 may extend between the surface 71 s 1 and 71 s 2 .
- the surface 71 s 1 may be substantially coplanar with the surface 20 s 1 .
- a comparative electronic device at least three or more interconnection arrays are included in an interposer to satisfy the requirement of a characteristic impedance of the electronic device.
- the outer array and the inner array include interconnections electrically connected to ground.
- the middle array includes interconnections configured to transmit a data signal, such as an RF signal. Since the interconnection may have a relatively large dimension, the comparative electronic device may be relatively large.
- one of interconnection arrays is replaced by a shielding wall (e.g., electrical shielding layer 50 ), which may reduce the size of the electronic device 1 a . Further, the shielding wall may provide a relatively large area for reducing attenuation of a data signal. Therefore, the electronic device 1 a may provide improved performance in comparison with the comparative electronic device.
- FIG. 2 A is a top view of an electronic device 1 a ′, in accordance with an embodiment of the present disclosure.
- FIG. 2 B is a cross-sectional view along line B-B′ of the electronic device 1 a ′ as shown in FIG. 2 A , in accordance with an embodiment of the present disclosure.
- the electronic device 1 a ′ is similar to the electronic device 1 a , with differences therebetween as follow.
- the interposer 20 may be spaced apart from the electrical shielding layer 50 .
- the interposer 20 may be spaced apart from the electrical shielding layer 50 by the dielectric layer 23 .
- the interconnection array e.g., 30 or 30 ′
- the interconnection array may be spaced apart from the interconnection array (e.g., 40 or 40 ′) by at least one medium, such as the dielectric layer 22 .
- the interconnection array (e.g., 40 or 40 ′) may be spaced apart from the shielding wall (e.g., 50 p 1 , 50 p 2 , 50 p 3 or 50 p 4 ) by at least two mediums, such as dielectric layers 22 and 23 .
- the interconnection 31 may be spaced apart from the interconnection 41 by at least one medium, such as the dielectric layer 22 .
- the interconnection 41 may be spaced apart from the electrical shielding layer 50 by at least two mediums, such as dielectric layers 22 and 23 .
- the interconnection 31 may be spaced apart from the electrical shielding layer 50 by at least two mediums, such as dielectric layers 22 and 23 .
- the conductive element 314 may be spaced apart from the conductive element 414 by at least one medium, such as the dielectric layer 22 .
- the conductive element 414 may be spaced apart from the electrical shielding layer 50 by at least two mediums, such as dielectric layers 22 and 23 .
- a signal path P 1 may be provided between the electronic components 62 and 63 .
- the signal path P 1 may pass through the redistribution structure 82 .
- the signal path P 1 may pass through the interconnection 41 .
- the signal path P 1 may pass through the conductive element 414 .
- the electronic component 62 may be electrically connected to the electronic component 63 through the signal path P 1 .
- FIG. 3 is a top view of an electronic device 1 b , in accordance with an embodiment of the present disclosure.
- the electronic device 1 b is similar to the electronic device 1 a , with differences therebetween as follow.
- the electronic device 1 b may include a plurality of interposers (e.g., 20 , 20 ′, and 20 ′′).
- the interposer 20 may be disposed at a side 62 e 1 of the electronic component 62 .
- the interposer 20 ′ may be disposed at a side 62 e 2 of the electronic component 62 .
- the interposer 20 , 20 ′, and 20 ′′ may be spaced apart from each other.
- the interconnection array 30 may be disposed in the interposer 20 .
- the interconnection array 40 may be disposed in the interposer 20 .
- the interconnection array 30 ′ may be disposed in the interposer 20 ′.
- the interconnection array 40 ′ may be disposed in the interposer 20 ′.
- the interconnection array 30 ′′ may be disposed in the interposer 20 ′′.
- the interconnection array 40 ′′ may be disposed in the interposer 20 ′′.
- the shielding wall 50 p 1 may be disposed on an external surface of the interposer 20 .
- the shielding wall 50 p 2 may be disposed on an external surface of the interposer 20 ′.
- the shielding wall 50 p 3 may be disposed on an external surface of the interposer 20 ′′.
- FIG. 4 A is a top view of an electronic device 1 c , in accordance with an embodiment of the present disclosure.
- the electronic device 1 c is similar to the electronic device 1 a , with differences therebetween as follow.
- the interconnection array 30 may further include a plurality of interconnections 32 .
- the interconnection 31 and the interconnection 32 may be aligned along the X-axis or the Y-axis.
- the interconnection 32 may be configured to transmit a power signal or a data signal with a relatively low frequency (e.g., a digital signal).
- the interconnection array 40 may further include a plurality of interconnections 42 .
- the interconnection 41 and the interconnection 42 may be aligned along the X-axis or the Y-axis.
- the interconnection 42 may be configured to transmit a power signal or a data signal with a relatively low frequency (e.g., a digital signal).
- the interconnections 32 and the 42 may be staggered.
- one of the interconnections 41 may be disposed at the corner of the interposer 20 .
- one of the interconnections 42 may be disposed at the corner of the interposer 20 .
- FIG. 4 B is an enlarged view of region B of the electronic device 1 c as shown in FIG. 4 A , in accordance with an embodiment of the present disclosure.
- Two adjacent interconnections 41 and 42 may have a distance D 6 therebetween.
- the distance D 6 is a length starting at the interconnection 41 and ending at the interconnection 42 .
- the distance D 6 is a length starting at a peripheral of the interconnection 41 and ending at a peripheral the interconnection 42 .
- the distance D 6 is a length starting at a cross-sectional center of the interconnection 41 and ending at a cross-sectional center of the interconnection 42 .
- Two adjacent interconnections 31 and 32 may have a distance D 7 (or a pitch) therebetween.
- the distance D 7 is a length starting at the interconnection 31 and ending at the interconnection 32 . In some embodiments of the present disclosure, the distance D 7 is a length starting at a peripheral of the interconnection 31 and ending at a peripheral the interconnection 32 . In some embodiments of the present disclosure, the distance D 7 is a length starting at a cross-sectional center of the interconnection 31 and ending at a cross-sectional center of the interconnection 32 . In some embodiments, the distance D 6 may exceed the distance D 1 . In some embodiments, the distance D 6 may exceed the distance D 7 . When the interconnection 31 is closer to the interconnection 41 than the interconnection 32 , a signal (e.g., an RF signal) passing through the interconnection 41 may be better protected from attenuation or distortion.
- a signal e.g., an RF signal
- Two adjacent interconnections 32 may have a distance D 8 (or a pitch) therebetween.
- the distance D 8 is a length starting at one interconnection 32 and ending at another interconnection 32 .
- the distance D 8 is a length starting at a peripheral of one interconnection 32 and ending at a peripheral another interconnection 32 .
- the distance D 8 is a length starting at a cross-sectional center of one interconnection 32 and ending at a cross-sectional center of another interconnection 32 .
- Two adjacent interconnections 42 may have a distance D 9 (or a pitch) therebetween. In some embodiments, the distance D 8 may substantially equal the distance D 9 .
- the distance D 9 is a length starting at one interconnection 42 and ending at another interconnection 42 . In some embodiments of the present disclosure, the distance D 9 is a length starting at a peripheral of one interconnection 42 and ending at a peripheral another interconnection 42 . In some embodiments of the present disclosure, the distance D 9 is a length starting at a cross-sectional center of one interconnection 42 and ending at a cross-sectional center of another interconnection 42 . In some embodiments, the distance D 8 may be less than the distance D 1 . In some embodiments, the distance D 8 may be less than the distance D 4 . In some embodiments, the distance D 8 may be less than the distance D 5 .
- the outermost interconnection 31 (e.g., 311 ) may have a projection P 1 on the electrical shielding layer 50 .
- the outermost interconnection 41 (e.g., 411 ) may have a projection P 2 on the electrical shielding layer 50 .
- the outermost interconnection 42 (e.g., 421 ) may have a projection P 3 on the electrical shielding layer 50 .
- the projection P 1 may be located between the projections P 2 and P 3 .
- the interconnections may further be configured to transmit a power signal or a digital signal, which facilitates the integration of electronic components (e.g., 61 , 62 , 63 , and/or 64 ) with different functions.
- FIG. 5 A is a top view of an electronic device 1 d , in accordance with an embodiment of the present disclosure.
- the electronic device 1 d is similar to the electronic device 1 c , with differences therebetween as follow.
- the interconnections 42 may be disposed at four corners of the interposer 20 . In some embodiments, the interconnection 41 may be distant from the corner of the interposer 20 .
- FIG. 5 B is a top view of an electronic device 1 e , in accordance with an embodiment of the present disclosure.
- the electronic device 1 e is similar to the electronic device 1 c , with differences therebetween as follow.
- the interposer 20 may include a plurality of portions 20 d 1 , 20 d 2 , 20 d 3 , and 20 d 4 separate from one another.
- the interconnection 31 may be disposed within the portion 20 d 1 , 20 d 2 , 20 d 3 , and/or 20 d 4 .
- the interconnection 32 may be disposed within the portion 20 d 1 , 20 d 2 , 20 d 3 , and/or 20 d 4 .
- the interconnection 41 may be disposed within the portion 20 d 1 , 20 d 2 , 20 d 3 , and/or 20 d 4 .
- the interconnection 42 may be disposed within the portion 20 d 1 , 20 d 2 , 20 d 3 , and/or 20 d 4 .
- Each of the portions 20 d 1 , 20 d 2 , 20 d 3 , and/or 20 d 4 may be regarded as one interposer.
- FIG. 6 A is a top view of an electronic device 1 f , in accordance with an embodiment of the present disclosure.
- FIG. 6 B is an enlarged view of region C of the electronic device 1 f as shown in FIG. 6 A , in accordance with an embodiment of the present disclosure.
- the electronic device 1 f is similar to the electronic device 1 a , with differences therebetween as follow.
- the carrier 10 may include an edge 10 e 1 and an edge 10 e 2 opposite to the edge 10 e 1 .
- the interposer 20 may include edges 20 e 1 ′, 20 e 2 ′, 20 e 3 ′, and 20 e 4 ′.
- the electronic device 1 f may include an electrical shielding layer 51 .
- the electrical shielding layer 51 may be configured to prevent a signal (e.g., a data signal), passing through the interconnection 41 , from attenuation or distortion.
- the electrical shielding layer 51 may be configured to protect the electronic components (e.g., 62 ) from EMI.
- the electrical shielding layer 51 may be surrounded by the electrical shielding layer 50 .
- the electrical shielding layer 51 may include shielding walls 51 p 1 , 51 p 2 , 51 p 3 , and 51 p 4 .
- the shielding wall 51 p 1 may be disposed adjacent to the side 20 e 1 ′.
- the shielding wall 51 p 2 may be disposed adjacent to the side 20 e 2 ′.
- the shielding wall 51 p 3 may be disposed adjacent to the side 20 e 3 ′.
- the shielding wall 51 p 4 may be disposed adjacent to the side 20 e 4 ′.
- the number of the interconnection 31 may be less than that of the interconnection 41 .
- the electrical shielding layer 50 , the electrical shielding layer 51 , and the interconnection 31 may collectively be configured to protect the interconnection 41 from EMI, and thus the number of the interconnection 31 may be reduced.
- FIG. 7 A is a top view of an electronic device 2 a
- FIG. 7 B is a cross-sectional view along line C-C′ of the electronic device 2 a as shown in FIG. 7 A .
- the electronic device 2 a may include electronic components 65 , 66 , 67 , 68 , and 69 .
- Each of the electronic components 65 , 66 , and 69 may include a chip or a die.
- Each of the electronic components 67 and 68 may include a passive device, such as a capacitance, an inductor, or the like.
- the electronic components 65 , 66 , 67 , and 68 may be covered by the dielectric structure 25 .
- the electronic component 69 may be disposed over the carrier 70 .
- the electronic device 2 a may further include inner interconnection array 91 , center interconnection array 92 , and outer interconnection array 93 .
- Each of the inner interconnection array 91 , center interconnection array 92 , and outer interconnection array 93 may penetrate the dielectric structure 25 .
- Each of the inner interconnection array 91 , center interconnection array 92 , and outer interconnection array 93 may include, for example, a conductive pillar and/or other suitable elements, such as a conductive trace and a conductive pad.
- the inner interconnection array 91 may include a plurality of interconnections, each of which is electrically connected to ground.
- the center interconnection array 92 may include a plurality of interconnections, each of which is configured to transmit a data signal (e.g., RF signal or the like).
- the outer interconnection array 93 may include a plurality of interconnections, each of which is electrically connected to ground.
- the interconnection of the center interconnection array 92 may be surrounded by the interconnections of the inner interconnection array 91 and outer interconnection array 93 to reduce the attenuation of a data signal.
- the electronic device 2 a has at least three interconnection arrays to satisfy the requirement of characteristic impedance. In comparison with the electronic device 1 a , the electronic device 2 a is relatively large.
- the terms “approximately,” “substantially,” “substantial” and “about” are used to describe and account for small variations. When used in conjunction with an event or circumstance, the terms can refer to instances in which the event or circumstance occurs precisely as well as instances in which the event or circumstance occurs to a close approximation.
- the terms can refer to a range of variation less than or equal to ⁇ 10% of that numerical value, such as less than or equal to ⁇ 5%, less than or equal to ⁇ 4%, less than or equal to ⁇ 3%, less than or equal to ⁇ 2%, less than or equal to ⁇ 1%, less than or equal to ⁇ 0.5%, less than or equal to ⁇ 0.1%, or less than or equal to ⁇ 0.05%.
- two numerical values can be deemed to be “substantially” the same or equal if a difference between the values is less than or equal to ⁇ 10% of an average of the values, such as less than or equal to ⁇ 5%, less than or equal to ⁇ 4%, less than or equal to ⁇ 3%, less than or equal to ⁇ 2%, less than or equal to ⁇ 1%, less than or equal to ⁇ 0.5%, less than or equal to ⁇ 0.1%, or less than or equal to ⁇ 0.05%.
- Two surfaces can be deemed to be coplanar or substantially coplanar if a displacement between the two surfaces is no greater than 5 ⁇ m, no greater than 2 ⁇ m, no greater than 1 ⁇ m, or no greater than 0.5 ⁇ m.
- a distance between A and B may refer to a length from an edge of the A to an edge of the B or to a length from a center of the A to a center of the B.
- conductive As used herein, the terms “conductive,” “electrically conductive” and “electrical conductivity” refer to an ability to transport an electric current. Electrically conductive materials typically indicate those materials that exhibit little or no opposition to the flow of an electric current. One measure of electrical conductivity is Siemens per meter (S/m). Typically, an electrically conductive material is one having conductivity greater than approximately 104 S/m, such as at least 105 S/m or at least 106 S/m. The electrical conductivity of a material can sometimes vary with temperature. Unless otherwise specified, the electrical conductivity of a material is measured at room temperature.
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Abstract
Description
- The present disclosure generally relates to an electronic device, and more particularly, to an electronic device including a shielding wall.
- To meet characteristic impedance of an electronic device, which transmits a signal with a relatively high frequency (e.g., radio frequency (RF) signal), three or more arrays of interconnections are utilized in an interposer.
- However, in some situations, such configuration may require an undesirable increase in device size. Therefore, a new electronic device is required.
- In some embodiments, an electronic device includes a first interposer, a first interconnection array, a first shielding wall, and a second interconnection array. The first interconnection array is disposed in the first interposer and electrically connected to ground. The first shielding wall continuously extends at a side of the first interconnection array. The second interconnection array is disposed between the first shielding wall and the first interconnection array. The second interconnection array is configured to transmit a signal.
- In some embodiments, an electronic device includes an interposer, a first interconnection, a second interconnection, and a first electrical shielding layer. The interposer has a first edge and a second edge opposite to the first edge. The first interconnection is disposed in the first interposer and configured to transmit a ground signal. The second interconnection is disposed in the first interposer and configured to transmit a non-ground signal. The first electrical shielding layer is adjacent to the first edge of the interposer. A projected length from the first interconnection to the second interconnection is greater than a first distance between the second interconnection and the first edge. The projected length is a projection of a length starting at the first interconnection and ending at the second interconnection as projected on an imaginary plane perpendicular to the first edge of the interposer.
- In some embodiments, an electronic device includes a first substrate, a second substrate, an interposer, and an electrical shielding layer. The second substrate is disposed over the first substrate. The interposer is disposed between the first substrate and the second substrate. The interposer includes a ground connection and a signal connection. The electrical shielding layer extends from a side of the first substrate to a side of the second substrate. The ground connection and the electrical shielding layer are configured to prevent the signal connection from electromagnetic interference.
- Aspects of some embodiments of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that various structures may not be drawn to scale, and dimensions of the various structures may be arbitrarily increased or reduced for clarity of discussion.
-
FIG. 1A is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 1B is an enlarged view of region A of the electronic device as shown inFIG. 1A , in accordance with an embodiment of the present disclosure. -
FIG. 1C is a cross-sectional view along line A-A′ of the electronic device as shown inFIG. 1A , in accordance with an embodiment of the present disclosure. -
FIG. 2A is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 2B is a cross-sectional view along line B-B′ of the electronic device as shown inFIG. 2A , in accordance with an embodiment of the present disclosure. -
FIG. 3 is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 4A is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 4B is an enlarged view of region B of the electronic device as shown inFIG. 4A , in accordance with an embodiment of the present disclosure. -
FIG. 5A is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 5B is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 6A is a top view of an electronic device, in accordance with an embodiment of the present disclosure. -
FIG. 6B is an enlarged view of region C of the electronic device as shown inFIG. 6A , in accordance with an embodiment of the present disclosure. -
FIG. 7A is a top view of an electronic device of a comparative example. -
FIG. 7B is a cross-sectional view along line C-C′ of the electronic device as shown inFIG. 7A . - Common reference numerals are used throughout the drawings and the detailed description to indicate the same or similar components. Embodiments of the present disclosure will be readily understood from the following detailed description taken in conjunction with the accompanying drawings.
- The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to explain certain aspects of the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed or disposed in direct contact, and may also include embodiments in which additional features may be formed or disposed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
-
FIG. 1A is a top view of anelectronic device 1 a, in accordance with an embodiment of the present disclosure. - In some embodiments, the
electronic device 1 a may include acarrier 10, ainterposer 20, interconnection arrays (e.g., 30 and 30′), interconnection arrays (e.g., 40 and 40′), anelectrical shielding layer 50, and electronic components (e.g., 62). - The
interposer 20 may be disposed over thecarrier 10. Theinterposer 20 may be configured to accommodate at least a part of an interconnection array. In some embodiments, theinterposer 20 may have edges 20 e 1, 20 e 2, 20 e 3, and 20 e 4. The edge 20 e 1 may be opposite to the edge 20 e 3. Each of the edges 20 e 1 and 20 e 3 may extend along the X-axis. The edge 20 e 2 may be opposite to the edge 20 e 4. Each of the edges 20 e 2 and 20 e 4 may extend along the Y-axis. Each of the edges 20 e 1, 20 e 2, 20 e 3, and 20 e 4 may also be referred to as an outer edge. - In some embodiments, each of the
30 and 30′ may be electrically connected to ground or be configured to transmit a ground signal. In some embodiments, each of theinterconnection arrays 30 and 30′ may have a plurality ofinterconnection arrays interconnections 31. Theinterconnection array 30 may be disposed at the edge 20 e 1 of theinterposer 20. Theinterconnection array 30′ may be disposed at the edge 20 e 2 of theinterposer 20. The plurality ofinterconnections 31 may surround the electronic components (e.g., 62). Each of theinterconnections 31 may be aligned along the X-axis or the Y-axis. In some embodiments, each of theinterconnections 31 may be electrically connected to ground or be configured to transmit a ground signal. Theinterconnection array 30 may also be referred to as an inner interconnection array. - In some embodiments, the
interconnection array 40 may be disposed between theelectrical shielding layer 50 and theinterconnection array 30. In some embodiments, each of the 40 and 40′ may be electrically connected to transmit a non-ground signal or a signal (e.g., data signal). Theinterconnection arrays interconnection array 40 may be disposed at the edge 20 e 1 of theinterposer 20. Theinterconnection array 40′ may be disposed at the edge 20 e 2 of theinterposer 20. In some embodiments, each of the 40 and 40′ may include a plurality ofinterconnection arrays interconnections 41. Each of theinterconnections 41 may be aligned along the X-axis or the Y-axis. In some embodiments, each of theinterconnection 41 may be configured to transmit a non-ground signal or a data signal, such as a radio frequency (RF) signal or other signals. In some embodiments, theinterconnection array 30 and theinterconnection array 40 may be arranged in a staggered arrangement. In some embodiments, theinterconnections 31 and theinterconnections 41 may be arranged in a staggered arrangement. For example, theinterconnection 31 is free from overlapping with theinterconnection 41 along an orientation (e.g., the Y-axis) perpendicular to an extending axis (e.g., the X-axis) of theelectrical shielding layer 50. Theinterconnection array 40 may also be referred to as an outer interconnection array. - In some embodiments, the
electrical shielding layer 50 may be disposed on or over an external surface (e.g., surface 20 s 1) of theinterposer 20. In some embodiments, theelectrical shielding layer 50 may surround or enclose the 30 and 30′. In some embodiments, theinterconnection arrays electrical shielding layer 50 may surround or enclose the 40 and 40′. In some embodiments, theinterconnection arrays electrical shielding layer 50 may be configured to prevent a signal (e.g., a data signal), passing through theinterconnection 41, from attenuation or distortion. In some embodiments, theelectrical shielding layer 50 may be configured to protect the electronic components (e.g., 62) from electromagnetic interference (EMI). In some embodiments, the thickness (not annotated in the figures) is less than the diameter (not annotated in the figures) of theinterconnection 31 and/or 41. For example, the thickness of theelectrical shielding layer 50 may range from about 1 μm to about 10 μm, while the diameter of theinterconnection 31 and/or 41 may range from about 0.1 mm to about 0.5 mm. - In some embodiments, the
electrical shielding layer 50 may include shielding walls 50 p 1, 50 p 2, 50 p 3, and 50 p 4. In some embodiments, the shielding wall 50 p 1 may continuously extend along the edge 20 e 1 of theinterposer 20. In some embodiments, the shielding wall 50 p 2 may continuously extend along the edge 20 e 2 of theinterposer 20. In some embodiments, the shielding wall 50 p 3 may continuously extend along the edge 20 e 3 of theinterposer 20. In some embodiments, the shielding wall 50 p 4 may continuously extend along the edge 20 e 4 of theinterposer 20. The shielding wall 50 p 2 may extend from the shielding wall 50 p 1. In some embodiments, the shielding wall 50 p 1 may continuously extend between the edges 20 e 2 and 20 e 4 of theinterposer 20. In some embodiments, the shielding wall 50 p 1 may be in contact with the shielding wall 50 p 2. In some embodiments, the shielding walls 50 p 1, 50 p 2, 50 p 3, and 50 p 4 may be connected to each other. In some embodiments, each of the shielding walls 50 p 1, 50 p 2, 50 p 3, and 50 p 4 may extend along a side of the interconnection array (e.g., 30, 30′, 40, or 40′) -
FIG. 1B is an enlarged view of region A of the electronic device as shown inFIG. 1A , in accordance with an embodiment of the present disclosure. - The
31 and 41 may have a distance D1 therebetween. In some embodiments of the present disclosure, the distance D1 is a length starting at theinterconnections interconnection 31 and ending at theinterconnection 41. In some embodiments of the present disclosure, the distance D1 is a length starting at a peripheral of theinterconnection 31 and ending at a peripheral theinterconnection 41. In some embodiments of the present disclosure, the distance D1 is a length starting at a cross-sectional center of theinterconnection 31 and ending at a cross-sectional center of theinterconnection 41. Theinterconnection 31 and the edge 20 e 1 of the interposer 20 (or electrical shielding layer 50) may have a distance D2 (along the Y-axis) therebetween. In some embodiments of the present disclosure, the distance D2 is a length starting at theinterconnection 31 and ending at edge 20 e 1 of theinterposer 20. In some embodiments of the present disclosure, the distance D2 is a length starting at a peripheral of theinterconnection 31 and ending at edge 20 e 1 of theinterposer 20. In some embodiments of the present disclosure, the distance D2 is a length starting at a cross-sectional center of theinterconnection 31 and ending at edge 20 e 1 of theinterposer 20. Theinterconnection 41 and the edge 20 e 1 of the interposer 20 (or electrical shielding layer 50) may have a distance D3 (along the Y-axis) therebetween. In some embodiments of the present disclosure, the distance D3 is a length starting at theinterconnection 41 and ending at edge 20 e 1 of theinterposer 20. In some embodiments of the present disclosure, the distance D3 is a length starting at a peripheral of theinterconnection 41 and ending at edge 20 e 1 of theinterposer 20. In some embodiments of the present disclosure, the distance D3 is a length starting at a cross-sectional center of theinterconnection 41 and ending at edge 20 e 1 of theinterposer 20. In some embodiments, the distance D3 is less than the distance D2. In some embodiments, the distance D3 is less than the distance D1. For example, the distance D1 may range from about 0.3 mm to about 1.5 mm. The distance D1 may be 0.6 mm. The distance D2 may range from about 0.25 mm to about 1.5 mm. The distance D3 may range from about 0.1 mm to about 0.4 mm. The distance D3 may be 0.195 mm. - The
interposer 20 may have an edge 20 e 1′ opposite to the edge 20 e 1. The edge 20 e 1′ may also be referred to as an inner edge. Theinterconnection 31 and the edge 20 e 1′ of theinterposer 20 may have a distance D2′ (along the Y-axis) therebetween. In some embodiments of the present disclosure, the distance D2′ is a length starting at theinterconnection 31 and ending at edge 20 e 1′ of theinterposer 20. In some embodiments of the present disclosure, the distance D2′ is a length starting at a peripheral of theinterconnection 31 and ending at edge 20 e 1′ of theinterposer 20. In some embodiments of the present disclosure, the distance D2′ is a length starting at a cross-sectional center of theinterconnection 31 and ending at edge 20 e 1′ of theinterposer 20. Theinterconnection 41 and the edge 20 e 1′ of theinterposer 20 may have a distance D3′ (along the Y-axis) therebetween. In some embodiments of the present disclosure, the distance D3′ is a length starting at theinterconnection 41 and ending at edge 20 e 1′ of theinterposer 20. In some embodiments of the present disclosure, the distance D3′ is a length starting at a peripheral of theinterconnection 41 and ending at edge 20 e 1′ of theinterposer 20. In some embodiments of the present disclosure, the distance D3′ is a length starting at a cross-sectional center of theinterconnection 41 and ending at edge 20 e 1′ of theinterposer 20. In some embodiments, the distance D2′ is less than the distance D2. In some embodiments, the distance D3′ is greater than the distance D3. Theinterconnection 31 and theinterconnection 41 may have a projected length T1 along the Y-axis. The projected length T1 may be defined as a projection of a length starting at theinterconnection 31 and ending at theinterconnection 41 as projected to a direction, such as Y-axis. In some embodiments, the projected length T1 may be greater than the distance D3. In some embodiments, the projected length T1 may be less than the distance D3. - Two
adjacent interconnections 31 may have a distance D4 (or a pitch) therebetween. In some embodiments of the present disclosure, the distance D4 is a length starting at oneinterconnection 31 and ending at anotherinterconnection 31. In some embodiments of the present disclosure, the distance D4 is a length starting at a peripheral of oneinterconnection 31 and ending at a peripheral anotherinterconnection 31. In some embodiments of the present disclosure, the distance D4 is a length starting at a cross-sectional center of oneinterconnection 31 and ending at a cross-sectional center of anotherinterconnection 31. Twoadjacent interconnections 41 may have a distance D5 (or a pitch) therebetween. In some embodiments of the present disclosure, the distance D5 is a length starting at oneinterconnection 41 and ending at anotherinterconnection 41. In some embodiments of the present disclosure, the distance D5 is a length starting at a peripheral of oneinterconnection 41 and ending at a peripheral anotherinterconnection 41. In some embodiments of the present disclosure, the distance D5 is a length starting at a cross-sectional center of oneinterconnection 41 and ending at a cross-sectional center of anotherinterconnection 41. In some embodiments, the distance D4 may substantially equal the distance D5. In some embodiments, the distance D1 may be less than the distance D4. In some embodiments, the distance D1 may be less than the distance D5. For example, the distance D4 may range from about 0.5 mm to about 2.5 mm. The distance D5 may range from about 0.5 mm to about 2.5 mm. In addition, a width of the shielding wall may be 0.5um. - In some embodiments, the
interconnection array 30 and theelectrical shielding layer 50 may be collectively configured to reduce attenuation or distortion of a signal (e.g., an RF signal) passing through theinterconnection 41. In some embodiments, theinterconnection array 30 and theelectrical shielding layer 50 may be configured to determine or modify a characteristic impedance. The characteristic impedance may depend on a frequency at which a signal operates. In some embodiments, theinterconnection 41 may be configured to transmit a signal with a relatively high frequency (e.g., the frequency exceeding 10 GHz), which requires a relatively large characteristic impedance to reduce signal distortion. -
FIG. 1C is a cross-sectional view along line A-A′ of theelectronic device 1 a as shown inFIG. 1A , in accordance with an embodiment of the present disclosure. - In some embodiments, the
carrier 10 may be or include, for example, a printed circuit board, such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated glass-fiber-based copper foil laminate. In this disclosure, thecarrier 10 may also be referred to as a substrate. - The
carrier 10 may have a surface 10 s 1 (which may also be referred to as a lower surface), a surface 10 s 2 (which may also be referred to as an upper surface) opposite to the surface 10 s 1, and a surface 10 s 3 (which may also be referred to as a lateral surface) extending between the surface 10 s 1 and the surface 10 s 2. - In some embodiments, the
carrier 10 may include conductive pad(s), trace(s), via(s), layer(s), or other interconnection(s). For example, thecarrier 10 may include one or more transmission lines (e.g., communications cables) and one or more grounding lines and/or grounding planes. For example, thecarrier 10 may include one or more conductive pads (not shown in the figures) in proximity to, adjacent to, or embedded in and exposed by the surface 10 s 1 and/or the surface 10 s 2 of thecarrier 10. Thecarrier 10 may include a solder resist (not shown in the figures) on the surface 10 s 1 and/or the surface 10 s 2 to fully expose or expose at least a portion of the conductive pads for electrical connections. - The
electronic device 1 a may include 21, 22, and 23. The dielectric layers 21, 22, and 23 may be disposed on or over the surface 10 s 1 of thedielectric layers carrier 10. Thedielectric layer 21 may be disposed over the surface 10 s 2 of thecarrier 10. In some embodiments, thedielectric layer 22 may encapsulate a portion of theinterconnection 31 and/or 41. In some embodiments, thedielectric layer 23 may encapsulate thedielectric layer 22. In some embodiments, thedielectric layer 23 may encapsulate the 62 and 63. In some embodiments, a dielectric constant of theelectronic components dielectric layer 22 may be different from that of thedielectric layer 23. In some embodiments, a dielectric constant of thedielectric layer 22 may be less than that of thedielectric layer 23, which may reduce the size of theelectronic device 1 a. In some embodiments, the material of thedielectric layer 22 may be different from that of thedielectric layer 23. In some embodiments, the material of thedielectric layer 21 may be different from that of thedielectric layer 23. In some embodiments, the material of thedielectric layer 22 may be different from that of thedielectric layer 21. Each of the 21, 22, and 23 may include, for example, pre-impregnated composite fibers, ceramic-filled polytetrafluoroethylene (PTFE) composites, or other suitable materials. Thedielectric layers dielectric layer 23 may also be referred to as an encapsulant. - In some embodiments, the
interconnection 31 may penetrate the 21, 22, and/or 23. In some embodiments, thedielectric layers interconnection 31 may be electrically connected to thecarrier 10. Theinterconnection 31 may include conductive via(s), trace(s), or other suitable elements. In some embodiments, theinterconnection 31 may include, for example, 311, 312, 313, 314, and 315. It should be noted that the structure of theconductive elements interconnection 31 may depend on design requirements, and the present disclosure is not intended to limit the same. For example, theinterconnection 31 may include a conductive pillar extending between the 10 and 70 in other embodiments. In some embodiment, thecarriers interconnection 31 may refer to theconductive element 314. - The
conductive element 311 may be disposed over the surface 10 s 2 of thecarrier 10. Theconductive element 311 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - The
conductive element 312 may be disposed over theconductive element 311. Theconductive element 312 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof. - The
conductive element 313 may be disposed over theconductive element 312. Theconductive element 313 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - The
conductive element 314 may be disposed over theconductive element 313. In some embodiments, theconductive element 314 may be covered by thedielectric layer 22. In some embodiments, theconductive element 314 may be encapsulated by thedielectric layer 22. Theconductive element 314 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof. - The
conductive element 315 may be disposed over theconductive element 314. Theconductive element 315 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - The
interconnection 41 may penetrate the 21, 22, and/or 23. In some embodiments, thedielectric layers interconnection 41 may be electrically connected to thecarrier 10 and/orcarrier 70. Theinterconnection 41 may include conductive via(s), trace(s), or other suitable elements. In some embodiments, theinterconnection 41 may include, for example, a 411, 412, 413, 414, and 415. It should be noted that the structure of theconductive elements interconnection 41 may depend on design requirements, and the present disclosure is not intended to limit the same. For example, theinterconnection 41 may include a conductive pillar extending between the 10 and 70 in other embodiments. In some embodiment, thecarriers interconnection 41 may refer to theconductive element 414. - The
conductive element 411 may be disposed over the surface 10 s 2 of thecarrier 10. Theconductive element 411 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - The
conductive element 412 may be disposed over theconductive element 411. Theconductive element 412 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof. - The
conductive element 413 may be disposed over theconductive element 412. Theconductive element 413 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - The
conductive element 414 may be disposed over theconductive element 413. In some embodiments, theconductive element 414 may be covered by thedielectric layer 22. In some embodiments, theconductive element 414 may be encapsulated by thedielectric layer 22. Theconductive element 414 may include a conductive material such as a metal or metal alloy. Examples of the conductive material include gold (Au), silver (Ag), copper (Cu), platinum (Pt), Palladium (Pd), other metal(s) or alloy(s), or a combination thereof. - The
conductive element 415 may be disposed over theconductive element 414. Theconductive element 415 may include a solder material, such as alloys of gold and tin solder or alloys of silver and tin solder. - In some embodiments, the
interposer 20 may include thedielectric layer 22, theconductive element 314 and theconductive element 414. Theconductive element 314 may also be referred to as a ground connection, which is configured to transmit a ground signal or electrically connected to ground. Theconductive element 414 may also be referred to as a signal connection, which is configured to transmit a signal (e.g., data signal). - In some embodiments, the
electrical shielding layer 50 may cover an external surface 20 s 1 of theinterposer 20. For example, theelectrical shielding layer 50 may cover the surface 20 s 1 (or a lateral surface) of theinterposer 20. In some embodiments, theelectrical shielding layer 50 may cover thedielectric layer 23. shielding layer - The
electronic device 1 a may further include acarrier 70. Thecarrier 70 may be or include, for example, a printed circuit board, such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated glass-fiber-based copper foil laminate. In this disclosure, thecarrier 10 may also be referred to as a lower carrier, and thecarrier 70 may also be referred to as an upper carrier. - The
carrier 70 may have a surface 70 s 1 (which may also be referred to as a lower surface), a surface 70 s 2 (which may also be referred to as an upper surface) opposite to the surface 70 s 1, and a surface 70 s 3 (which may also be referred to as a lateral surface) extending between the surface 70 s 1 and the surface 70 s 2. In some embodiments, the surface 70 s 3 of thecarrier 70 may be noncoplanar with the surface 10 s 3 of thecarrier 10. - In some embodiments, the
carrier 70 may include conductive pad(s), trace(s), via(s), layer(s), or other interconnection(s). Thecarrier 70 may include one or more conductive pads (not shown in the figures) in proximity to, adjacent to, or embedded in and exposed by the surface 70 s 1 and/or the surface 70 s 2 of thecarrier 70. Thecarrier 70 may include a solder resist (not shown in the figures) on the surface 70 s 1 and/or the surface 70 s 2 to fully expose or to expose at least a portion of the conductive pads for electrical connections. - In some embodiments, the
61, 62, 63, and 64 may be covered by theelectronic components electrical shielding layer 50. Each of the 61, 62, 63, and 64 may be a chip or a die including a semiconductor substrate, one or more integrated circuit (IC) devices and one or more overlying interconnection structures therein. The IC devices may include active devices such as transistors and/or passive devices such as resistors, capacitors, inductors, or a combination thereof. For example, theelectronic components 61, 62, 63, and/or 64 may include a system on chip (SoC). For example, theelectronic component 61, 62, 63, and/or 64 may include an application-specific IC (ASIC), a radio frequency integrated circuit (RFIC), a central processing unit (CPU), a microprocessor unit (MPU), a graphics processing unit (GPU), a microcontroller unit (MCU), a field-programmable gate array (FPGA), or another type of IC.electronic component -
61, 62, and 63 may be disposed between theElectronic components 10 and 70. Thecarriers electronic component 61 may be disposed over the surface 10 s 1 of thecarrier 10. In some embodiments, theelectronic component 61 may have an active surface (not annotated in the figures) facing away from thecarrier 10. Theelectronic component 62 may be disposed over theelectronic component 61. In some embodiments, theelectronic component 62 may have an active surface facing theelectronic component 61. In some embodiments, theelectronic component 62 may be electrically connected to theelectronic component 61 through aredistribution structure 82. - The
electronic component 63 may be disposed below the surface 70 s 1 of thecarrier 70. Theelectronic component 64 may be disposed over the surface 70 s 2 of thecarrier 70. In some embodiments, theelectronic component 63 may be electrically connected to theelectronic component 64 through thecarrier 70. In some embodiments, theelectronic component 63 may have an active surface facing thecarrier 70. In some embodiments, theelectronic component 64 may have an active surface facing thecarrier 70. - In some embodiments, the
electronic device 1 a may further include agrounding pattern 81. In some embodiments, thegrounding pattern 81 may be electrically connected to ground. In some embodiments, theinterconnection 31 may be electrically connected to thegrounding pattern 81. In some embodiments, theelectrical shielding layer 50 may be electrically connected to thegrounding pattern 81. In some embodiments, thegrounding pattern 81 may be disposed over the surface 10 s 2 of thecarrier 10. In some embodiments, thegrounding pattern 81 may be disposed between the 311 and 312. The location of theconductive elements grounding pattern 81 may depend on design requirements, and the present disclosure is not intended to limit the same. - In some embodiments, the
dielectric layer 21, theredistribution structure 82, theconductive element 312, and theconductive element 412 may be included in asubstrate 71. Thesubstrate 71 may have surfaces 71 s 1, 71 s 2, and 71 s 3. Theelectronic component 61 may be disposed under the surface 71 s 1. Theelectronic component 62 may be disposed over the surface 71 s 2. The surface 71 s 3 may extend between the surface 71 s 1 and 71 s 2. The surface 71 s 1 may be substantially coplanar with the surface 20 s 1. - In a comparative electronic device, at least three or more interconnection arrays are included in an interposer to satisfy the requirement of a characteristic impedance of the electronic device. The outer array and the inner array include interconnections electrically connected to ground. The middle array includes interconnections configured to transmit a data signal, such as an RF signal. Since the interconnection may have a relatively large dimension, the comparative electronic device may be relatively large. In the embodiments of the present disclosure, one of interconnection arrays is replaced by a shielding wall (e.g., electrical shielding layer 50), which may reduce the size of the
electronic device 1 a. Further, the shielding wall may provide a relatively large area for reducing attenuation of a data signal. Therefore, theelectronic device 1 a may provide improved performance in comparison with the comparative electronic device. -
FIG. 2A is a top view of anelectronic device 1 a′, in accordance with an embodiment of the present disclosure.FIG. 2B is a cross-sectional view along line B-B′ of theelectronic device 1 a′ as shown inFIG. 2A , in accordance with an embodiment of the present disclosure. Theelectronic device 1 a′ is similar to theelectronic device 1 a, with differences therebetween as follow. - As shown in
FIG. 2A , theinterposer 20 may be spaced apart from theelectrical shielding layer 50. In some embodiments, theinterposer 20 may be spaced apart from theelectrical shielding layer 50 by thedielectric layer 23. In some embodiments, the interconnection array (e.g., 30 or 30′) may be spaced apart from the interconnection array (e.g., 40 or 40′) by at least one medium, such as thedielectric layer 22. In some embodiments, the interconnection array (e.g., 40 or 40′) may be spaced apart from the shielding wall (e.g., 50 p 1, 50 p 2, 50 p 3 or 50 p 4) by at least two mediums, such as 22 and 23.dielectric layers - As shown in
FIG. 2B , theinterconnection 31 may be spaced apart from theinterconnection 41 by at least one medium, such as thedielectric layer 22. In some embodiments, theinterconnection 41 may be spaced apart from theelectrical shielding layer 50 by at least two mediums, such as 22 and 23. In some embodiments, thedielectric layers interconnection 31 may be spaced apart from theelectrical shielding layer 50 by at least two mediums, such as 22 and 23. In some embodiments, thedielectric layers conductive element 314 may be spaced apart from theconductive element 414 by at least one medium, such as thedielectric layer 22. In some embodiments, theconductive element 414 may be spaced apart from theelectrical shielding layer 50 by at least two mediums, such as 22 and 23.dielectric layers - In some embodiments, a signal path P1 may be provided between the
62 and 63. The signal path P1 may pass through theelectronic components redistribution structure 82. The signal path P1 may pass through theinterconnection 41. The signal path P1 may pass through theconductive element 414. Theelectronic component 62 may be electrically connected to theelectronic component 63 through the signal path P1. -
FIG. 3 is a top view of anelectronic device 1 b, in accordance with an embodiment of the present disclosure. Theelectronic device 1 b is similar to theelectronic device 1 a, with differences therebetween as follow. - In some embodiments, the
electronic device 1 b may include a plurality of interposers (e.g., 20, 20′, and 20″). Theinterposer 20 may be disposed at a side 62 e 1 of theelectronic component 62. Theinterposer 20′ may be disposed at a side 62 e 2 of theelectronic component 62. The 20, 20′, and 20″ may be spaced apart from each other. In some embodiments, theinterposer interconnection array 30 may be disposed in theinterposer 20. In some embodiments, theinterconnection array 40 may be disposed in theinterposer 20. In some embodiments, theinterconnection array 30′ may be disposed in theinterposer 20′. In some embodiments, theinterconnection array 40′ may be disposed in theinterposer 20′. In some embodiments, theinterconnection array 30″ may be disposed in theinterposer 20″. In some embodiments, theinterconnection array 40″ may be disposed in theinterposer 20″. The shielding wall 50 p 1 may be disposed on an external surface of theinterposer 20. The shielding wall 50 p 2 may be disposed on an external surface of theinterposer 20′. The shielding wall 50 p 3 may be disposed on an external surface of theinterposer 20″. -
FIG. 4A is a top view of anelectronic device 1 c, in accordance with an embodiment of the present disclosure. Theelectronic device 1 c is similar to theelectronic device 1 a, with differences therebetween as follow. - In some embodiments, the
interconnection array 30 may further include a plurality ofinterconnections 32. In some embodiments, theinterconnection 31 and theinterconnection 32 may be aligned along the X-axis or the Y-axis. In some embodiments, theinterconnection 32 may be configured to transmit a power signal or a data signal with a relatively low frequency (e.g., a digital signal). - In some embodiments, the
interconnection array 40 may further include a plurality ofinterconnections 42. In some embodiments, theinterconnection 41 and theinterconnection 42 may be aligned along the X-axis or the Y-axis. In some embodiments, theinterconnection 42 may be configured to transmit a power signal or a data signal with a relatively low frequency (e.g., a digital signal). In some embodiments, theinterconnections 32 and the 42 may be staggered. In some embodiments, one of theinterconnections 41 may be disposed at the corner of theinterposer 20. In some embodiments, one of theinterconnections 42 may be disposed at the corner of theinterposer 20. -
FIG. 4B is an enlarged view of region B of theelectronic device 1 c as shown inFIG. 4A , in accordance with an embodiment of the present disclosure. - Two
41 and 42 may have a distance D6 therebetween. In some embodiments of the present disclosure, the distance D6 is a length starting at theadjacent interconnections interconnection 41 and ending at theinterconnection 42. In some embodiments of the present disclosure, the distance D6 is a length starting at a peripheral of theinterconnection 41 and ending at a peripheral theinterconnection 42. In some embodiments of the present disclosure, the distance D6 is a length starting at a cross-sectional center of theinterconnection 41 and ending at a cross-sectional center of theinterconnection 42. Two 31 and 32 may have a distance D7 (or a pitch) therebetween. In some embodiments of the present disclosure, the distance D7 is a length starting at theadjacent interconnections interconnection 31 and ending at theinterconnection 32. In some embodiments of the present disclosure, the distance D7 is a length starting at a peripheral of theinterconnection 31 and ending at a peripheral theinterconnection 32. In some embodiments of the present disclosure, the distance D7 is a length starting at a cross-sectional center of theinterconnection 31 and ending at a cross-sectional center of theinterconnection 32. In some embodiments, the distance D6 may exceed the distance D1. In some embodiments, the distance D6 may exceed the distance D7. When theinterconnection 31 is closer to theinterconnection 41 than theinterconnection 32, a signal (e.g., an RF signal) passing through theinterconnection 41 may be better protected from attenuation or distortion. - Two
adjacent interconnections 32 may have a distance D8 (or a pitch) therebetween. In some embodiments of the present disclosure, the distance D8 is a length starting at oneinterconnection 32 and ending at anotherinterconnection 32. In some embodiments of the present disclosure, the distance D8 is a length starting at a peripheral of oneinterconnection 32 and ending at a peripheral anotherinterconnection 32. In some embodiments of the present disclosure, the distance D8 is a length starting at a cross-sectional center of oneinterconnection 32 and ending at a cross-sectional center of anotherinterconnection 32. Twoadjacent interconnections 42 may have a distance D9 (or a pitch) therebetween. In some embodiments, the distance D8 may substantially equal the distance D9. In some embodiments of the present disclosure, the distance D9 is a length starting at oneinterconnection 42 and ending at anotherinterconnection 42. In some embodiments of the present disclosure, the distance D9 is a length starting at a peripheral of oneinterconnection 42 and ending at a peripheral anotherinterconnection 42. In some embodiments of the present disclosure, the distance D9 is a length starting at a cross-sectional center of oneinterconnection 42 and ending at a cross-sectional center of anotherinterconnection 42. In some embodiments, the distance D8 may be less than the distance D1. In some embodiments, the distance D8 may be less than the distance D4. In some embodiments, the distance D8 may be less than the distance D5. - Referring back to
FIG. 4A , the outermost interconnection 31 (e.g., 311) may have a projection P1 on theelectrical shielding layer 50. The outermost interconnection 41 (e.g., 411) may have a projection P2 on theelectrical shielding layer 50. The outermost interconnection 42 (e.g., 421) may have a projection P3 on theelectrical shielding layer 50. In some embodiments, the projection P1 may be located between the projections P2 and P3. - In this embodiment, the interconnections (e.g., 32 and 42) may further be configured to transmit a power signal or a digital signal, which facilitates the integration of electronic components (e.g., 61, 62, 63, and/or 64) with different functions.
-
FIG. 5A is a top view of anelectronic device 1 d, in accordance with an embodiment of the present disclosure. Theelectronic device 1 d is similar to theelectronic device 1 c, with differences therebetween as follow. - In some embodiments, the
interconnections 42 may be disposed at four corners of theinterposer 20. In some embodiments, theinterconnection 41 may be distant from the corner of theinterposer 20. -
FIG. 5B is a top view of anelectronic device 1 e, in accordance with an embodiment of the present disclosure. Theelectronic device 1 e is similar to theelectronic device 1 c, with differences therebetween as follow. - In some embodiments, the
interposer 20 may include a plurality of portions 20 d 1, 20 d 2, 20 d 3, and 20 d 4 separate from one another. In some embodiments, theinterconnection 31 may be disposed within the portion 20 d 1, 20 d 2, 20 d 3, and/or 20 d 4. In some embodiments, theinterconnection 32 may be disposed within the portion 20 d 1, 20 d 2, 20 d 3, and/or 20 d 4. In some embodiments, theinterconnection 41 may be disposed within the portion 20 d 1, 20 d 2, 20 d 3, and/or 20 d 4. In some embodiments, theinterconnection 42 may be disposed within the portion 20 d 1, 20 d 2, 20 d 3, and/or 20 d 4. Each of the portions 20 d 1, 20 d 2, 20 d 3, and/or 20 d 4 may be regarded as one interposer. -
FIG. 6A is a top view of anelectronic device 1 f, in accordance with an embodiment of the present disclosure.FIG. 6B is an enlarged view of region C of theelectronic device 1 f as shown inFIG. 6A , in accordance with an embodiment of the present disclosure. Theelectronic device 1 f is similar to theelectronic device 1 a, with differences therebetween as follow. - The
carrier 10 may include an edge 10 e 1 and an edge 10 e 2 opposite to the edge 10 e 1. Theinterposer 20 may include edges 20 e 1′, 20 e 2′, 20 e 3′, and 20 e 4′. In some embodiments, theelectronic device 1 f may include anelectrical shielding layer 51. Theelectrical shielding layer 51 may be configured to prevent a signal (e.g., a data signal), passing through theinterconnection 41, from attenuation or distortion. In some embodiments, theelectrical shielding layer 51 may be configured to protect the electronic components (e.g., 62) from EMI. Theelectrical shielding layer 51 may be surrounded by theelectrical shielding layer 50. Theelectrical shielding layer 51 may include shielding walls 51 p 1, 51 p 2, 51 p 3, and 51 p 4. The shielding wall 51 p 1 may be disposed adjacent to the side 20 e 1′. The shielding wall 51 p 2 may be disposed adjacent to the side 20 e 2′. The shielding wall 51 p 3 may be disposed adjacent to the side 20 e 3′. The shielding wall 51 p 4 may be disposed adjacent to the side 20 e 4′. - In some embodiments, the number of the
interconnection 31 may be less than that of theinterconnection 41. In this embodiment, theelectrical shielding layer 50, theelectrical shielding layer 51, and theinterconnection 31 may collectively be configured to protect theinterconnection 41 from EMI, and thus the number of theinterconnection 31 may be reduced. - Referring to
FIG. 7A andFIG. 7B ,FIG. 7A is a top view of anelectronic device 2 a, andFIG. 7B is a cross-sectional view along line C-C′ of theelectronic device 2 a as shown inFIG. 7A . - The
electronic device 2 a may include 65, 66, 67, 68, and 69. Each of theelectronic components 65, 66, and 69 may include a chip or a die. Each of theelectronic components 67 and 68 may include a passive device, such as a capacitance, an inductor, or the like. Theelectronic components 65, 66, 67, and 68 may be covered by theelectronic components dielectric structure 25. Theelectronic component 69 may be disposed over thecarrier 70. - The
electronic device 2 a may further includeinner interconnection array 91,center interconnection array 92, andouter interconnection array 93. Each of theinner interconnection array 91,center interconnection array 92, andouter interconnection array 93 may penetrate thedielectric structure 25. Each of theinner interconnection array 91,center interconnection array 92, andouter interconnection array 93 may include, for example, a conductive pillar and/or other suitable elements, such as a conductive trace and a conductive pad. - The
inner interconnection array 91 may include a plurality of interconnections, each of which is electrically connected to ground. Thecenter interconnection array 92 may include a plurality of interconnections, each of which is configured to transmit a data signal (e.g., RF signal or the like). Theouter interconnection array 93 may include a plurality of interconnections, each of which is electrically connected to ground. The interconnection of thecenter interconnection array 92 may be surrounded by the interconnections of theinner interconnection array 91 andouter interconnection array 93 to reduce the attenuation of a data signal. Further, theelectronic device 2 a has at least three interconnection arrays to satisfy the requirement of characteristic impedance. In comparison with theelectronic device 1 a, theelectronic device 2 a is relatively large. - Spatial descriptions, such as “above,” “below,” “up,” “left,” “right,” “down,” “top,” “bottom,” “vertical,” “horizontal,” “side,” “higher,” “lower,” “upper,” “over,” “under,” and so forth, are indicated with respect to the orientation shown in the figures unless otherwise specified. It should be understood that the spatial descriptions used herein are for purposes of illustration only, and that practical implementations of the structures described herein can be spatially arranged in any orientation or manner, provided that the merits of embodiments of this disclosure are not deviated from by such an arrangement.
- As used herein, the terms “approximately,” “substantially,” “substantial” and “about” are used to describe and account for small variations. When used in conjunction with an event or circumstance, the terms can refer to instances in which the event or circumstance occurs precisely as well as instances in which the event or circumstance occurs to a close approximation. For example, when used in conjunction with a numerical value, the terms can refer to a range of variation less than or equal to ±10% of that numerical value, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%. For example, two numerical values can be deemed to be “substantially” the same or equal if a difference between the values is less than or equal to ±10% of an average of the values, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%.
- Two surfaces can be deemed to be coplanar or substantially coplanar if a displacement between the two surfaces is no greater than 5 μm, no greater than 2 μm, no greater than 1 μm, or no greater than 0.5 μm.
- As used herein, the singular terms “a,” “an,” and “the” may include plural referents unless the context clearly dictates otherwise.
- As used herein, the term “a distance between A and B” may refer to a length from an edge of the A to an edge of the B or to a length from a center of the A to a center of the B.
- As used herein, the terms “conductive,” “electrically conductive” and “electrical conductivity” refer to an ability to transport an electric current. Electrically conductive materials typically indicate those materials that exhibit little or no opposition to the flow of an electric current. One measure of electrical conductivity is Siemens per meter (S/m). Typically, an electrically conductive material is one having conductivity greater than approximately 104 S/m, such as at least 105 S/m or at least 106 S/m. The electrical conductivity of a material can sometimes vary with temperature. Unless otherwise specified, the electrical conductivity of a material is measured at room temperature.
- Additionally, amounts, ratios, and other numerical values are sometimes presented herein in a range format. It is to be understood that such range format is used for convenience and brevity and should be understood flexibly to include numerical values explicitly specified as limits of a range, but also to include all individual numerical values or sub-ranges encompassed within that range as if each numerical value and sub-range is explicitly specified.
- While the present disclosure has been described and illustrated with reference to specific embodiments thereof, these descriptions and illustrations are not limiting. It should be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the true spirit and scope of the present disclosure as defined by the appended claims. The illustrations may not be necessarily drawn to scale. There may be distinctions between the artistic renditions in the present disclosure and the actual apparatus due to manufacturing processes and tolerances. There may be other embodiments of the present disclosure which are not specifically illustrated. The specification and drawings are to be regarded as illustrative rather than restrictive. Modifications may be made to adapt a particular situation, material, composition of matter, method, or process to the objective, spirit and scope of the present disclosure. All such modifications are intended to be within the scope of the claims appended hereto. While the methods disclosed herein have been described with reference to particular operations performed in a particular order, it will be understood that these operations may be combined, sub-divided, or re-ordered to form an equivalent method without departing from the teachings of the present disclosure. Accordingly, unless specifically indicated herein, the order and grouping of the operations are not limitations of the present disclosure.
Claims (20)
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