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US20210280326A1 - Triggering Exothermic Reactions Under High Hydrogen Loading Rates - Google Patents

Triggering Exothermic Reactions Under High Hydrogen Loading Rates Download PDF

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Publication number
US20210280326A1
US20210280326A1 US16/497,503 US201816497503A US2021280326A1 US 20210280326 A1 US20210280326 A1 US 20210280326A1 US 201816497503 A US201816497503 A US 201816497503A US 2021280326 A1 US2021280326 A1 US 2021280326A1
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Prior art keywords
hydrogen
condition
loading ratio
absorbing material
loading
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Abandoned
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US16/497,503
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English (en)
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Julie A. Morris
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IHJ Holdings Ltd
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Industrial Heat LLC
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Priority to US16/497,503 priority Critical patent/US20210280326A1/en
Assigned to INDUSTRIAL HEAT LLC reassignment INDUSTRIAL HEAT LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MORRIS, JULIE A.
Publication of US20210280326A1 publication Critical patent/US20210280326A1/en
Assigned to IHJ HOLDINGS LTD. reassignment IHJ HOLDINGS LTD. NUNC PRO TUNC ASSIGNMENT (SEE DOCUMENT FOR DETAILS). Assignors: INDUSTRIAL HEAT, LLC
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/0005—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes
    • C01B3/001—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof
    • C01B3/0026—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof of one single metal or a rare earth metal; Treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B4/00—Hydrogen isotopes; Inorganic compounds thereof prepared by isotope exchange, e.g. NH3 + D2 → NH2D + HD
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B3/00—Low temperature nuclear fusion reactors, e.g. alleged cold fusion reactors
    • G21B3/002—Fusion by absorption in a matrix
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0236—Metal based
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0837—Details relating to the material of the electrodes
    • B01J2219/0841—Metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/32—Hydrogen storage

Definitions

  • the present invention relates generally to heat generation in an exothermic reaction, and more specifically, to controlling a hydrogen or deuterium loading rate to trigger an exothermic reaction.
  • the present application discloses novel and advantageous methods and apparatus for triggering an exothermic reaction consistently.
  • the present disclosure relates to triggering conditions for an exothermic reaction.
  • hydrogen is used to refer to a hydrogen gas comprising pure deuterium, trillium , or any combination of the three isotopes.
  • a device configured for hosting an exothermic reaction comprises a hydrogen absorbing material and one or more input ports.
  • the one or more input ports are configured for receiving a gas inlet and one or more controlling devices.
  • the one or more controlling devices are configured to apply a condition to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated.
  • a method for triggering an exothermic reaction in a reaction chamber comprises the following steps. First, a hydrogen gas is introduced into the reaction chamber. The reaction chamber contains a hydrogen absorbing material. While the hydrogen gas is loaded into the hydrogen absorbing material, a condition is applied to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated.
  • a method of triggering an exothermic reaction in a reaction chamber is disclosed.
  • a hydrogen gas is first introduced into the metal container before a first condition is applied. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a first hydrogen loading ratio within a first time period. Afterwards, a second condition is applied. Under the second condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio within a second time period. The second loading ratio is higher than the first loading ratio and the second time period is shorter than the first time period. An exothermic reaction may be initiated under the second condition. In some embodiments, applying the first condition is optional.
  • a device configured for triggering and sustaining an exothermic reaction.
  • the device comprises a container, one or more electrodes, and one or more input ports.
  • the device is configured to host a type of exothermic reaction that involves a transition metal loaded with hydrogen.
  • the metal container is plated with a hydrogen absorbing material and receives the one or more electrodes through a port at the end of the metal container.
  • the one or more input ports are configured to receive one or more controlling devices.
  • the one or more controlling devices are configured to apply different conditions under which a hydrogen gas can be loaded into the hydrogen absorbing material. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading ratio within a first time period. Under a second condition, the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading ratio within a second time period. The second hydrogen loading ratio is higher than the first hydrogen loading ratio.
  • An exothermic reaction is triggered under the second condition.
  • a device configured for an exothermic reaction comprises an electrolytic cell.
  • the device comprises a container filled with an electrolyte.
  • the device further comprises one or more input ports for receiving a cathode and an anode.
  • the cathode is plated with a hydrogen absorbing material and can absorb or adsorb a hydrogen gas. When the hydrogen gas is loaded into the hydrogen absorbing material at a high hydrogen loading rate that exceeds a threshold, an exothermic reaction may be triggered.
  • FIG. 1 illustrates an exemplary reactor configured for heat generation.
  • FIG. 2 illustrates an exemplary curve showing a hydrogen loading process in a metal lattice.
  • FIG. 3 illustrates an exemplary curve showing another hydrogen loading process in a metal lattice.
  • FIG. 4 is a flow chart illustrating an exemplary triggering method of an exothermic reaction under a high hydrogen loading rate.
  • FIG. 1 illustrates an exemplary reactor 100 configured for exothermic reactions.
  • the reactor 100 comprises a container 102 , one or more electrodes 104 , and a lid 106 .
  • the lid 106 is placed at one end of the reactor 100 and is used to accommodate the one or more electrodes 104 , input/output ports 114 , and a removable electrical pass-through 116 .
  • the one or more electrodes 104 may be made of tungsten, molybdenum, cobalt, or nickel, or other rugged metal that can withstand high voltage and high temperature environment.
  • the positive electrode is made of or plated with palladium.
  • the negative electrode is platinum.
  • One of the input/output ports 114 can be used to introduce reaction gases into the reactor 100 or extract resultant gases from the reactor 100 .
  • the input/output ports 114 can also be used to accommodate pressure controlling devices, which can be used to apply a vacuum, extract gases or input gases.
  • the reactor 100 shown in FIG. 1 can be configured as follows.
  • the container 102 is made of metal.
  • the interior wall of the container 102 is first plated with gold 108 or another material (e.g., silver).
  • the plated gold or silver functions as a seal to prevent reaction gasses in the chamber from escaping through the wall of the reaction chamber 100 .
  • a layer of hydrogen absorbing material is plated. Outside the reactor 100 , a magnet may be optionally placed.
  • the exemplary reactor 100 is configured as an electrolytic cell.
  • the container 102 may be filled with an electrolyte.
  • the container 102 further comprises two electrodes, a cathode and an anode, which are accommodated through the input/output ports 114 .
  • Power lines may be accommodated through the electrical pass-through 116 .
  • the reactor 100 needs to be preconditioned for an exothermic reaction to happen.
  • One of the prerequisite conditions is that the hydrogen absorbing material 110 is loaded with hydrogen/deuterium.
  • an exothermic reaction can be triggered when the hydrogen loading ratio exceeds a threshold.
  • a hydrogen loading ratio describes how much hydrogen or deuterium has been absorbed or adsorbed into the hydrogen absorbing material, e.g., palladium.
  • the reaction chamber 100 is an electrolytic cell
  • the cathode of the electrolytic cell is plated with palladium.
  • an exothermic reaction may be triggered when the loading ratio exceeds a certain threshold.
  • the loading ratio of hydrogen is important in triggering an exothermic reaction. While a general correlation between high hydrogen loading ratios and excess heat generation has been observed, no triggering mechanism that can be used to consistently initiate an exothermic reaction has been identified. One postulation is that a high hydrogen loading ratio is a necessary but insufficient condition for triggering an exothermic reaction. On the other hand, a high loading rate may provide a consistent triggering mechanism for excess heat generation. In some embodiments, an exothermic reaction may be triggered under a fast hydrogen loading rate. A hydrogen loading rate describes how fast the hydrogen is being absorbed or adsorbed into the hydrogen absorbing material.
  • a high hydrogen/deuterium loading rate triggers an exothermic reaction.
  • a hydrogen gas is pressurized into the reaction chamber 100
  • a large flow of hydrogen/deuterium gas is introduced into the reaction chamber 100 in a short period of time.
  • an exothermic reaction can be induced.
  • the exothermic reaction may be between the hydrogen/deuterium atoms/ions that are “jammed” into the metal lattice, which plays a catalytic role in the exothermic reaction.
  • a high hydrogen/deuterium loading rate can be achieved by applying a magnetic field or imposing a voltage. Hydrogen ions are accelerated to a high speed when under the influence of a strong magnetic field or a high voltage (electric field). When high speed hydrogen/deuterium ions enter a metal lattice, an exothermic reaction may be induced, due to the high kinetic energy of the hydrogen/deuterium ions loaded into the metal lattice.
  • the distribution of hydrogen atoms/ions inside the metal lattice may be uneven. Within certain areas, the hydrogen/deuterium loading ratio may be higher than the average loading ratio. Within certain pockets, the hydrogen/deuterium loading ratio can exceed the threshold required for triggering an exothermic reaction.
  • FIG. 2 illustrates an exemplary hydrogen absorbing process 200 in a hydrogen absorbing material such as palladium.
  • the x-axis shows the elapsed time and the y-axis shows the hydrogen loading ratio measured as the ratio between the hydrogen atoms/ions loaded into the metal lattice and the palladium atoms of the hydrogen absorbing material.
  • the hydrogen or deuterium gas is being adsorbed and absorbed quickly.
  • the hydrogen loading process slows down, until the hydrogen absorbing material is “saturated” with hydrogen/deuterium.
  • the hydrogen loading ratio remains substantially stable after t′.
  • FIG. 3 illustrates an exemplary hydrogen loading process 300 .
  • the first loading condition may include a pressure P 1 and a temperature T 1 . Additionally, the first loading condition may include a voltage V 1 , a magnetic field B 1 , etc.
  • the hydrogen loading ratio steadily increases from r 0 to r 1 during the time period between t 0 and t 1 .
  • the loading rate during this time period is:
  • a second condition is applied inside the reaction chamber 100 .
  • the second condition may include one or more of the following: a pressure P 2 , a temperature T 2 , a voltage V 2 , a magnetic field B 2 , etc.
  • the hydrogen is being loaded into the hydrogen absorbing material faster than under the first condition.
  • the loading ratio increases from r 1 to r 2 during the second time period between t 1 and t 2 .
  • the loading rate under the second condition during the second time period is:
  • the device 100 comprises a metal container 102 that is plated with palladium or nickel.
  • Hydrogen or deuterium is present in the closed container under normal pressure conditions (e.g., ⁇ 2 PSI).
  • a negative voltage or ground is applied to the hydrogen absorbing lattice while a positive voltage is applied to the electrode 104 .
  • the voltage is about 5000V. In another embodiment, the voltage ranges between 3000V to 6000V.
  • This voltage change creates a strong electric field that causes the hydrogen or deuterium to “slam” into the palladium/nickel wall, yielding a loading rate higher than normal. Under this fast loading rate, loaded hydrogen atoms/ions are distributed in the metal lattice unevenly and small areas with high hydrogen loading ratio may be formed.
  • the metal container 102 in the reaction chamber 100 holds palladium or nickel nanoparticles.
  • the container 102 is initially set at a vacuum, e.g., 10 ⁇ circumflex over ( ) ⁇ 7 Torr or higher.
  • Deuterium or hydrogen is introduced into the container quickly, causing pressure to increase from a vacuum to at least 100 PSI within a short period of time.
  • the pressure increases from a high vacuum to 100 PSI in 15 seconds. This sudden increase of pressure creates areas of high concentration hydrogen/deuterium. Within those areas, hydrogen/deuterium loading ratios are high, and an abnormal heat generation event can be triggered to promote excess heat generation.
  • FIG. 4 illustrates an exemplary triggering process 400 of an exothermic reaction under a high hydrogen loading rate.
  • a hydrogen gas is first introduced into the metal container (step 402 ).
  • a first condition is applied.
  • the hydrogen gas is loaded into the hydrogen absorbing material to reach a first hydrogen loading ratio within a first time period (step 404 ).
  • a second condition is applied.
  • the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio (step 406 ).
  • the second hydrogen loading ratio is higher than the first hydrogen loading ratio.
  • an exothermic reaction is triggered in the reaction chamber 100 (step 408 ).

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PCT/US2018/024790 WO2018183460A1 (fr) 2017-03-29 2018-03-28 Déclenchement de réactions exothermiques sous des niveaux de charge d'hydrogène élevés
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CN113409961A (zh) * 2021-06-03 2021-09-17 长春理工大学 电磁触发气体与金属产生过热的低能核反应装置及其产热方法

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JP2020515872A (ja) 2020-05-28
US20230290526A1 (en) 2023-09-14
EP3601156A4 (fr) 2020-12-09
US12327644B2 (en) 2025-06-10
AU2018246253A1 (en) 2019-10-17
RU2019130440A (ru) 2021-04-29
EP3601156A1 (fr) 2020-02-05
CA3058446A1 (fr) 2018-10-04
CN110831895A (zh) 2020-02-21
WO2018183460A1 (fr) 2018-10-04

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