US20180179391A1 - Carbon-nanotube-based composite coating and production method thereof - Google Patents
Carbon-nanotube-based composite coating and production method thereof Download PDFInfo
- Publication number
- US20180179391A1 US20180179391A1 US15/739,486 US201615739486A US2018179391A1 US 20180179391 A1 US20180179391 A1 US 20180179391A1 US 201615739486 A US201615739486 A US 201615739486A US 2018179391 A1 US2018179391 A1 US 2018179391A1
- Authority
- US
- United States
- Prior art keywords
- metal
- cnts
- precursor
- carbon
- based composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000002041 carbon nanotube Substances 0.000 title claims abstract description 183
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 103
- 229910021393 carbon nanotube Inorganic materials 0.000 title claims abstract description 96
- 238000000576 coating method Methods 0.000 title claims abstract description 78
- 239000011248 coating agent Substances 0.000 title claims abstract description 70
- 239000002131 composite material Substances 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 35
- 238000005253 cladding Methods 0.000 claims abstract description 30
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 27
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 27
- 239000002243 precursor Substances 0.000 claims description 92
- 229910052751 metal Inorganic materials 0.000 claims description 79
- 239000002184 metal Substances 0.000 claims description 79
- 238000000151 deposition Methods 0.000 claims description 44
- 230000008021 deposition Effects 0.000 claims description 38
- 230000012010 growth Effects 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 32
- 239000000919 ceramic Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 25
- 239000002105 nanoparticle Substances 0.000 claims description 22
- 230000008020 evaporation Effects 0.000 claims description 21
- 238000001704 evaporation Methods 0.000 claims description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 17
- 125000002524 organometallic group Chemical group 0.000 claims description 16
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 239000011777 magnesium Substances 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 10
- 239000007921 spray Substances 0.000 claims description 10
- 229910052593 corundum Inorganic materials 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 9
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 8
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 claims description 8
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229910002451 CoOx Inorganic materials 0.000 claims description 4
- 229910016553 CuOx Inorganic materials 0.000 claims description 4
- 229910016978 MnOx Inorganic materials 0.000 claims description 4
- 229910007266 Si2O Inorganic materials 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- -1 VOx Inorganic materials 0.000 claims description 4
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 4
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- AKTIAGQCYPCKFX-FDGPNNRMSA-L magnesium;(z)-4-oxopent-2-en-2-olate Chemical compound [Mg+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O AKTIAGQCYPCKFX-FDGPNNRMSA-L 0.000 claims description 4
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 229910015189 FeOx Inorganic materials 0.000 claims description 3
- FJDJVBXSSLDNJB-LNTINUHCSA-N cobalt;(z)-4-hydroxypent-3-en-2-one Chemical compound [Co].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJDJVBXSSLDNJB-LNTINUHCSA-N 0.000 claims description 3
- 238000001764 infiltration Methods 0.000 claims description 3
- 230000008595 infiltration Effects 0.000 claims description 3
- 230000002708 enhancing effect Effects 0.000 claims description 2
- LZKLAOYSENRNKR-LNTINUHCSA-N iron;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Fe].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O LZKLAOYSENRNKR-LNTINUHCSA-N 0.000 claims description 2
- SHWZFQPXYGHRKT-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;nickel Chemical compound [Ni].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O SHWZFQPXYGHRKT-FDGPNNRMSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 239000010408 film Substances 0.000 description 15
- 239000012159 carrier gas Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 238000001878 scanning electron micrograph Methods 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 238000010926 purge Methods 0.000 description 6
- 239000002082 metal nanoparticle Substances 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000005595 acetylacetonate group Chemical group 0.000 description 3
- 229910000905 alloy phase Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- BKFAZDGHFACXKY-UHFFFAOYSA-N cobalt(II) bis(acetylacetonate) Chemical compound [Co+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O BKFAZDGHFACXKY-UHFFFAOYSA-N 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- BMGNSKKZFQMGDH-FDGPNNRMSA-L nickel(2+);(z)-4-oxopent-2-en-2-olate Chemical compound [Ni+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O BMGNSKKZFQMGDH-FDGPNNRMSA-L 0.000 description 2
- 238000010943 off-gassing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- 238000001392 ultraviolet--visible--near infrared spectroscopy Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021213 Co2C Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 241001304248 Progne modesta Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000002238 carbon nanotube film Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
- C01B32/162—Preparation characterised by catalysts
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/36—Diameter
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/734—Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.
- Y10S977/742—Carbon nanotubes, CNTs
- Y10S977/745—Carbon nanotubes, CNTs having a modified surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
- Y10S977/843—Gas phase catalytic growth, i.e. chemical vapor deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
- Y10S977/847—Surface modifications, e.g. functionalization, coating
Definitions
- the invention generally relates to a novel carbon nanotube (CNT) based composite coating and a method for producing such a coating.
- a particularly interesting aspect of the invention relates to a black coating made of a CNT-based coating.
- baffles are typically arranged around the optical axis. Such baffles are usually cylindrical or conical and may comprise vanes on their interior walls in order to trap as much stray light as possible.
- the absorptance of undesired off-axis radiation in the spectral range of the detector should be as close as possible to 100% irrespective of the incidence angle.
- the reflectance of the surfaces should ideally be Lambertian.
- Black coatings have been developed to cover all mechanical surfaces close to the optical beam. An overview can be found in: M. J. Persky, « Review of black surfaces for space-borne infrared systems » Review of scientific instruments, vol. 70, no 5, p. 2193-2217, 1999. Historically, in most spatial missions, black surfaces were obtained using paints (e.g. AeroglazeTM from Lord Corporation, DeSotoTM Flat Black from Pacific Western Paints, etc.) or anodizations (e.g. Martin BlackTM, Enhanced Martin BlackTM, or InfrablackTM from Martin Marietta Corporation, etc.).
- paints e.g. AeroglazeTM from Lord Corporation, DeSotoTM Flat Black from Pacific Western Paints, etc.
- anodizations e.g. Martin BlackTM, Enhanced Martin BlackTM, or InfrablackTM from Martin Marietta Corporation, etc.
- Acktar's inorganic coatings are fabricated using vacuum deposition technology and feature very low reflectance, high thermal stability, excellent adhesion, and low outgassing. Surrey NanoSystems have developed a super-black material (called VantablackTM) that absorbs 99.96% of surface light. VantablackTM is produced using a low-temperature carbon nanotube (CNT) growth process. When light strikes the layer of CNTs, instead of bouncing off it is trapped between the tubes before eventually becoming heat. Titanium and silicon substrates have been used to demonstrate the efficiency.
- CNT carbon nanotube
- black materials in particular black coatings, have applications in passive thermal management (requiring high emissivity), solar energy harvesting (e.g. solar water heating, concentrated solar power generation, etc.), infrared sensing (e.g. in MEMS IR sensors), thermal actuation (e.g. in MEMS thermal actuators), etc.
- solar energy harvesting e.g. solar water heating, concentrated solar power generation, etc.
- infrared sensing e.g. in MEMS IR sensors
- thermal actuation e.g. in MEMS thermal actuators
- the new type of coating could, e.g., be used in the field of energy storage (e.g. in lithium ion batteries or super-capacitors).
- German patent application DE 10 2006 033 037 A1 disclosing a one-step method for depositing a metal onto a substrate by means of a gas phase deposition method.
- a metal-containing precursor compound is dissolved in an organic solvent, which serves as a reducing agent that releases the metal species from the metalorganic precursor.
- a first aspect of the invention relates to a carbon-nanotube-based composite coating, comprising a layer of carbon nanotubes, which is characterized in that the carbon nanotubes comprise metal oxide claddings that sheathe the carbon nanotubes.
- the metal oxide claddings are preferably transparent and conformal with the CNTs. They may sheathe the carbon nanotubes on their full lengths or along sections thereof.
- the carbon-nanotube-based composite coating is typically porous. However, the pores or interstices between the metal-oxide-coated CNTs may be more or less filled with metal oxide or other material(s).
- the metal oxide coating leads to a passivation of the CNTs and may reduce the ability of the CNTs to trap organic molecules or to react with atomic oxygen or aggressive chemicals.
- the metal oxide claddings increase the mechanical stability of the CNT layer and make it more resistant against mechanical stress.
- the claddings may be adjusted (in terms of chemical composition and thickness) to achieve a compromise between light absorption, mechanical stability and protection against reaction with oxygen or aggressive chemicals.
- the CNTs of the carbon-nanotube-based composite are preferably non-aligned (i.e. entangled), thus forming an (isotropic) CNT thicket rather than a CNT forest (aligned CNTs).
- the fact that the CNTs are not aligned ensures that no direction of the incident light is privileged or special, yielding Lambertian or nearly Lambertian reflection behaviour.
- the CNTs have an average diameter in the range from 0.3 to 150 nm, more preferably in the range from 0.3 to 20 nm.
- the metal oxide claddings preferably comprise or consist of MgO.
- the carbon-nanotube-based composite coating comprises a ceramic cap layer atop the thicket of sheathed carbon nanotubes.
- the ceramic cap layer may be conformal with the carbon nanotubes, leaving the individual capped sheathed CNTs visible by (scanning electron) microscopy. That is the case if a thin cap layer is applied, where the thickness of the cap layer is of the same order of magnitude as the diameter of the sheathed CNTs).
- the cap layer may be applied such that it substantially fills the interstices between the sheathed CNTs at least in a top region thereof, leading to a substantially continuous solid capping layer.
- the ceramic cap layer preferably consists of a different material than the metal oxide claddings.
- the ceramic cap layer may e.g. consist of a material selected from the group comprising or consisting of Al 2 O 3 , Si 2 O, Si 3 N 4 , SiO x N x , AlN, AlNO, MgO, ZnO, SnO 2 , NiO, ZrO 2 , Cr 2 O 3 , MoO 2 , RuO 2 , CoO x , CuO x , VO x , FeO x , MnO x , TiO 2 , CaF 2 , BaF 2 , MgF 2 , ternary and/or complex oxides involving one or more of the elemental species of the mentioned compounds and mixtures thereof.
- a preferred aspect of the present invention relates to a black coating, preferably a matte black coating, more preferably a superblack coating, comprising a carbon-nanotube-based composite coating as described herein.
- black qualifies a surface with a total hemispherical reflectivity (THR) of no more than 5% over the entire wavelength range from 400 nm to 1 ⁇ m and for any incidence angle (angle between the surface and the incoming beam) greater than 20°.
- THR total hemispherical reflectivity
- a “matte” surface is a surface, whose reflectivity in the specular direction amounts to no more than 5% of the THR, for any incidence angle greater than 20°.
- a “superblack” surface is a matte black surface having, over the entire wavelength range from 400 nm to 2.5 ⁇ m, a total hemispherical reflectivity (THR) of no more than 1% around normal incidence (incidence angle)20° and no more than 10% for grazing incidence (incidence angle ⁇ 20°).
- THR total hemispherical reflectivity
- a black coating consisting of the carbon-nanotube-based composite coating of the present invention offers good absorptance and can be tuned to meet the requirements of a superblack coating. Furthermore, Lambertian reflection behavior can be achieved.
- the carbon-nanotube-based composite coating is suitable for heat radiation (emittance) and can thus be used in thermal elements and on baffles, vanes or optical elements that need that type of cooling.
- the carbon-nanotube-based composite coating is compatible with different kinds of substrates, it can be produced with any desired thickness in the range from 50 nm to 5000 ⁇ m.
- the surface density (mass per unit area) is compatible with most applications.
- the fabrication process of the carbon-nanotube-based composite coating uses chemical vapor deposition (CVD), which involves deposition at elevated temperatures and which may be carried out at low pressures, conditions that are unfavourable for the incorporation of volatile organic molecules or water into the coating, outgassing is not an important issue with the carbon-nanotube-based composite coating. That point is especially advantageous for space and high-vacuum applications.
- CVD chemical vapor deposition
- the encapsulation of the CNTs prevents the absorption of humidity and organic molecules along the post-deposition handling, processing, storage, assembling and repair.
- Another advantage of the carbon-nanotube-based composite coating is its ability to withstand direct sun illumination or, more generally speaking, intense radiation without alteration.
- chemical inertness of carbon-nanotube-based composite coating is an advantage (e.g. low sensitivity to atomic oxygen) appreciated in many applications.
- a further aspect of the present invention relates to a method for producing carbon nanotubes by CVD.
- CVD is intended to include different formats of CVD, such as, e.g., metalorganic CVD (MOCVD), atomic layer deposition (ALD), pulsed-spray evaporation CVD, etc.
- MOCVD metalorganic CVD
- ALD atomic layer deposition
- PLD photo-initiated CVD
- the method comprises:
- the precursor for CNTs comprises a hydrocarbon, alcohol being most preferred.
- Other possible but somewhat less preferred precursors for the CNTs are aldehydes, thiols, amines, and ethers.
- the precursor for CNTs may serve as a solvent for the precursors selected for the deposition of the first and/or the second metal, in which case the precursor solution serves as the feedstock for both the CNT growth and as an organic reducing agent for the deposition of the first and/or the second metal.
- the precursor for the CNTs and the precursors for the first and/or the second metal are introduced from different sources.
- the second metal forms an alloy phase with the first metal, the alloy phase causing the enhanced CNT-growth-catalysing activity.
- the use of Mg-based alloys or carbide compounds involving Fe, Co or Ni as CNT growth catalysts has never been reported in the literature. It is the inventor's merit to have recognized that the growth of CNTs can be carried out at significantly lower temperatures without having to resort to plasma enhancement or photo-initiation. While CNT growth typically requires a substrate temperature above 800° C. (if no plasma or light is used as an additional energy source), the growth of the CNTs according to a preferred embodiment of the present invention is carried out in the temperature range from 300 to 600° C., more preferably in the temperature range from 350° C. to 500° C., and even more preferably in the range from 350 to 450° C. As indicated above, the growth of the CNTs need no longer be plasma-induced or radiation-induced in these temperature ranges.
- the second metal forms a metal oxide cladding sheathing the CNTs.
- the second metal is Mg, leading to the formation of MgO claddings around the CNTs. It is worthwhile noting that the growth of the claddings occurs concomitantly with the growth of the CNTs. Accordingly, the degree of coverage of the CNTs by the claddings can be adjusted and modulated by controlling the amounts of the precursors delivered into the reaction chamber during the growth phase.
- the method may comprise depositing a ceramic cap layer atop the CNTs.
- a ceramic cap layer may e.g. consist of a material selected from the group comprising or consisting of Al 2 O 3 , Si 2 O, Si 3 N 4 , MgF 2 , SiO x N x , AlN, AlNO, MgO, ZnO, SnO 2 , NiO, ZrO 2 , Cr 2 O 3 , MoO 2 , RuO 2 , CoO x , CuO x , VO x , FeO x , MnO x , TiO 2 , CaF 2 , BaF 2 , ternary and/or complex oxides involving one or more elemental species of the mentioned compounds, and mixtures thereof.
- the metal nanoparticles are preferably deposited from an inorganic, metalorganic or organometallic precursors for the first metal.
- Inorganic precursors for the first or the second metal may e.g. be halides, carbonyls, nitrates, etc.
- Metalorganic or organometallic precursors are, however, preferred, as they are typically less toxic and corrosive and have lesser demands regarding recovery and disposal of reaction products.
- pulsed spray evaporation CVD is used to deposit the metal and/or metal carbide nanoparticles, to grow the CNTs and, if applicable, the metal oxide claddings.
- the metal and/or metal carbide nanoparticles are preferably deposited from a first precursor solution comprising a metalorganic or organometallic precursor for the first metal dissolved in a solvent (preferably an organic solvent such as, e.g. an alcohol or an aldehyde), the second metal being deposited from a second precursor solution containing the metalorganic or organometallic precursor selected for the deposition of the second metal dissolved in alcohol serving as the precursor for the CNTs.
- a solvent preferably an organic solvent such as, e.g. an alcohol or an aldehyde
- the metalorganic precursor for the first metal comprises cobalt acetylacetonate and/or nickel acetylacetonate and/or iron acetylacetonate
- the metalorganic precursor selected for the deposition of the second metal comprises magnesium acetylacetonate
- the CVD method described herein enables the growth of uniform films even on highly structured surfaces.
- the overall structure features a layer of highly entangled CNTs that are partially or totally sheathed with metal oxide claddings.
- the coated CNTs strongly absorb visible light because of the inter-band transition of the metal phase and the intrinsic absorption bands of the carbon phase.
- the scattering and absorption efficiencies can be manipulated through the adjustment of the size of the particles and the proportion of carbon to metal.
- the proposed fabrication method may involve only moderate heating of the substrate (e.g. up to 500° C.) and thereby offers a great range of possibilities regarding the choice of the substrate. Aluminium parts or other metallic parts in a precise metallurgical state (that shall not be altered) could thus serve as substrates.
- Another noteworthy advantage of the proposed method is that it is not a so-called line-of-sight process (where shadowing is a concern) and complex geometries may thus be coated. Complex three-dimensional parts (e.g. baffles with vanes, etc.) can thus be coated much more easily than in those processes.
- the precursor(s) of the first metal (hereinafter: the first precursor(s)) and the precursors of the second metal and the CNTs (hereinafter: the second precursors) are introduced into the reaction chamber at respective times, the reaction chamber being purged there between (e.g. by using a chemically inert gas like N 2 or the like), the introductions of the first precursor(s) and the second precursors being repeated plural times.
- the number of cycles may depend on several parameters, in particular the desired thickness, the degree of entanglement of the CNTs, the length of the CNTs, the duration of exposure of the substrate to each of the first and second precursors, the type of materials involved, etc.
- first and second metal may form alloy, carbide compounds or metal-metal nanoparticles in the interstices between the coated CNTs. These nanoparticles may serve as starting points of further CNTs, leading to a ramified thicket of coated CNTs and nanoparticles.
- FIG. 1 is a cross-sectional schematic of a CNT-based coating comprising metal-oxide-sheathed CNTs;
- FIG. 2 is a cross-sectional schematic of a CNT-based coating as in FIG. 1 with a ceramic cap layer on top;
- FIG. 3 is a cross-sectional schematic of a CNT-based coating as in FIG. 2 with a thicker ceramic cap layer on top;
- FIG. 4 is a schematic illustration of the so-called base-growth mechanism
- FIG. 5 is a schematic illustration of the so-called tip-growth mechanism
- FIG. 6 is a schematic drawing of a CVD reactor equipped for pulsed-spray evaporation CVD;
- FIG. 7 is flow chart of an example of a pulsed-spray evaporation CVD process in accordance with a preferred embodiment of a method for growing oxide-coated CNTs;
- FIG. 8 is a diagram comparing the total hemispherical reflectivity of the coatings described as examples 1 to 3;
- FIG. 9 is a scanning electron micrograph (SEM) of a CNT-based coating according to a preferred embodiment of the invention.
- FIG. 10 is a top view SEM of a CNT-based composite coating capped with an Al 2 O 3 layer;
- FIG. 11 is a cross sectional view SEM of a CNT-based composite coating capped with an Al 2 O 3 layer;
- FIG. 12 is a close up of the capped tips of the CNTs of FIG. 11 ;
- FIG. 13 is a cross-sectional schematic of a CNT-based coating with a porous ceramic cap infiltration of the layer of CNTs;
- FIG. 14 is a cross-sectional schematic of a CNT-based coating with a relatively dense ceramic cap infiltration of the layer of CNTs.
- a carbon-nanotube-based composite coating 10 is schematically depicted in FIG. 1 .
- the CNT-based composite coating 10 is applied as a black coating on substrate 12 . It comprises a layer 14 of strongly entangled, non-aligned CNTs 16 that are individually covered with metal oxide claddings 18 .
- the non-aligned coated CNTs 20 form a CNT thicket on the surface of the substrate 12 . It is worthwhile noting that the CNT thicket may be much denser than shown in FIG. 1 .
- FIGS. 2 and 3 shows a CNT-based composite coating 10 ′ comprising a ceramic cap layer 22 atop the layer 14 of CNTs.
- the ceramic cap layer 22 is preferably deposited by CVD or ALD after the CNT growth has been terminated.
- the ceramic cap layer 22 is very thin (i.e. of approximately the same thickness as the coated CNTs 20 or thinner), the ceramic cap layer may still be discontinuous or conformal to the CNTs.
- the ceramic cap layer 22 grows thicker (see in particular FIG. 3 ) the islands of ceramic cap material on the tips of the CNTs join and begin to form continuous but still porous layer.
- the ceramic capping material may substantially (e.g. completely) infiltrate the layer of carbon nanotubes, substantially filling up the interstices between the coated CNTs 20 , thereby leading to the formation of a dense film (consisting of the thicket of coated CNTs surrounded by the capping material).
- a CNT-based composite coating 10 ′′ comprising a ceramic cap layer 22 infiltrating the layer 14 of CNTs is shown in FIGS. 13 and 14 .
- FIGS. 4 and 5 illustrate two CNT growth mechanisms that may lead to the formation of metal-oxide-coated CNTs.
- FIG. 4 illustrates the so-called base base-growth mechanism.
- a metal nanoparticle 24 on the surface of the substrate 12 dissociates the hydrocarbon molecules that serve as the precursors of the CNTs into a carbon and a hydrogen fraction.
- the hydrogen gas leaves the reaction zone, while the carbon is dissolved in the metal until the solubility limit is reached.
- the carbon crystallises out in the form of a CNT on the face of the nanoparticle turned away from the substrate. While the CNT grows, the nanoparticle remains in contact with the substrate.
- FIG. 5 illustrates the so-called tip-growth mechanism.
- the carbon crystallised out as a CNT on the interface between the nanoparticle 24 and the substrate, causing the nanoparticle 24 to lift off and to remain at the tip of the CNT as growth thereof goes on.
- the metal and/or metal carbide nanoparticles 24 comprise CNT-growth-catalysing metal and/or metal carbide involving elements selected from Fe, Co and Ni (or mixtures thereof).
- a second metal species, preferably Mg, is provided from a metalorganic or organometallic precursor, in parallel with the hydrocarbon (preferably alcohol) molecules that serve as the feedstock for the CNT growth.
- the precursors of the CNTs and the second metal are represented as precursor vapour 26 .
- the presence of the second metal facilitates the formation of the CNTs at lower temperatures. Furthermore, a metal oxide cladding is formed that coats the CNT but does not hinder CNT growth. Regarding the reaction mechanisms, they have to be investigated further. Accordingly, the above scenarios shall be regarded as hypotheses to which the inventor does not intend to be bound. After further investigations, it may turn out that they do not accurately or not completely describe the enhanced CNT growth and/or the formation of metal oxide claddings thereon.
- the fraction of each phase in the CNT-based composite coating (i.e. the CNT phase, the metal oxide cladding phase and the alloy phase of the modified nanoparticles) can be adjusted by controlling the delivery recipe.
- FIG. 6 illustrates a CVD reactor 30 for carrying out pulsed-spray evaporation CVD of a carbon-nanotube-based composite coating.
- the CVD reactor 30 comprises a main chamber 32 having arranged therein a substrate holder 34 with a substrate heater 36 .
- the substrate (not shown in FIG. 4 ) may be placed on the substrate heater 36 by a manipulator (not shown).
- a vacuum pump 38 is connected to the main chamber 32 , as well as a trap for the carrier gas (not shown).
- the precursors and the carrier gas may be introduced into the main chamber 32 through a tubular evaporation and transport chamber 40 .
- the evaporation and transport chamber 40 is equipped with heaters (not shown) allowing it to be brought to sufficiently high temperatures for the evaporation of the precursor solutions and the transport of the resulting vapour.
- the liquid precursor solutions are injected by respective injectors 42 into an evaporation zone 44 of the evaporation and transport chamber 40 .
- precursor vapours are then formed, which are transported by the carrier gas through a so-called transport zone 46 leading into the main chamber 32 .
- the carrier gas (represented by arrow 48 ) may be introduced at a controlled flow rate through carrier gas inlet 50 .
- FIG. 7 shows a flow chart illustrating pulsed-spray evaporation CVD (PSE-CVD) according to a preferred embodiment of the invention.
- PSE-CVD pulsed-spray evaporation CVD
- the sequence used and the numerical values in FIG. 7 are illustrative only and may be varied depending on the composition of the coating to deposit.
- S 51 the various parts of the reactor that is used to produce a black CNT-based composite coating are heated to the desired temperatures.
- a first deposition phase of metal nanoparticles from a first precursors or a first group of precursors is then started.
- a first precursor solution containing the first precursor(s) is injected into the evaporation zone (step S 52 ) at a predefined rate (4 Hz in the example) and with predefined opening times of the injector (2 ms for each injection in the example).
- the precursor vapour formed in the evaporation zone is transported by the carried gas into the main chamber of the reactor, where the ceramic matrix is deposited on the substrate.
- the injection regime of the first precursor solution is maintained for a predefined amount of time (10 minutes in the example), before the injections of the first precursor solution are stopped and the reactor is purged using the flux of carrier gas (step S 53 ) during a first purge time (30 s with nitrogen in the illustrated example).
- a second precursor solution containing the precursors for the second metal (and thus for the metal oxide cladding) and for the CNTs is then injected into the evaporation zone (step S 52 ) at a predefined rate (4 Hz in the example) and with predefined opening times of the injector (2 ms for each injection in the example).
- the vapour formed from the second precursors is transported into the main chamber, where coated CNTs are formed as illustrated in FIG. 4 or 5 .
- the injection regime of the second precursor solution is maintained for a predefined amount of time (20 minutes in the illustrated example), whereupon the reactor is again purged.
- the deposition steps are repeated a certain number of times.
- the injection parameters may be varied in accordance with the desired deposition profile.
- the last deposition step is not necessarily a coated CNT growth step but could be one of depositing a ceramic cap (using a third precursor solution).
- the reactor is cooled down and the grown samples are taken out of the reactor.
- the growth process of FIG. 7 may be greatly varied depending on the desired end product and the chemistry involved. For instance, while it may be preferable for practical reasons to have all first precursors necessary for the deposition of the nanoparticles in one solution, separate precursor sources could also be used. The same holds for the second precursors. It is also possible to mix the precursors 1 and precursors 2 in the same solution feedstock.
- the flux of the carrier gas may be held constant throughout the entire growth process. Alternatively, the flux of carrier gas could be varied so as to adjust or optimize the deposition conditions.
- the temperature of the evaporation and transport chamber is also preferably held constant while the deposition goes on. If necessary or deemed advantageous, however, that parameter could also be changed over time. The same is true for the temperature of the substrate.
- a carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using a CVD reactor of the Luxembourg Institute of Science and Technology (LIST), equipped with a PSE unit for the controlled injection of liquid feedstock.
- the precursors selected were metal acetylacetonates that are easy to handle, store and implement. These precursors are soluble in ethanol and a large number of other solvents.
- the first precursor solution (for the deposition of the CNT-growth catalysing nanoparticle) was a 5 mM (5 mmol/l) solution of cobalt acetylacetonate (Co(acac) 2 ) in ethanol.
- the second precursor solution (serving as feedstock for the coated CNTs) was a 5 mM solution of magnesium acetylacetonate (Mg(acac) 2 ) in ethanol.
- the precursor solutions were injected as pulsed sprays into an evaporation tube maintained at 220° C. under vacuum.
- the precursors' delivery was performed by 2 ms opening of the injector with a frequency of 4 Hz, which yielding respective feeding rates of 2.5 ml/min.
- the carrier gas was nitrogen introduced with a flow rate of 40 sccm (standard cubic centimetres per minute) maintained constant through the entire deposition process.
- Precursor 1 Co(acac) 2 in ethanol 0.005 mol/l Delivery of the precursor 1 4 Hz, 2 ms opening time
- Precursor 2 Mg(acac) 2 in ethanol 0.005 mol/l Delivery of the precursor 2 4 Hz, 2 ms opening time
- the deposition cycle was the following:
- the deposition cycle was carried out 5 times, followed by a final deposition of precursor solution 2. After the total deposition time of 175 minutes, a film thickness of 1.2 ⁇ m was reached, which corresponded to an average growth rate of 6.8 nm/min.
- the CNT-based composite coating according to example 1 had an Mg/Co atomic ratio of 0.62, which was measured by EDX (Energy-dispersive X-ray analysis).
- a carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 1, with the sole exception that the substrate temperature was set to 400° C. After the total deposition time of 175 minutes, a film thickness of 7.03 ⁇ m was reached, which corresponded to an average growth rate of 40.2 nm/min.
- a carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in examples 1 and 2, with the sole exception that the substrate temperature was set to 450° C. After the total deposition time of 175 minutes, a film thickness of 11.5 ⁇ m was reached, which corresponded to an average growth rate of 69.7 nm/min.
- Examples 1 to 3 suggest that the growth rate in this limited range (350-450° C.) using separate precursors delivery (cobalt and magnesium acetylacetonate) linearly depends on the deposition temperature.
- the total hemispherical reflectivity (THR) of the three obtained coatings was evaluated in the spectral range from 250 nm to 2300 nm for an incidence angle of 8° (diffuse and specular reflections were integrated). The results are displayed in FIG. 8 . All obtained CNT films feature a very low reflection in the UV-Vis-NIR spectral range. At the first glance, the film obtained at 350° C. exhibits lower optical performance since a somehow higher reflectance is measured. Nevertheless, it should be highlighted that the film of example 1, obtained at 350° C. is 10 times thinner than the film of example 3, which was grown at 450° C.
- FIG. 9 shows a scanning electron micrograph of the coating obtained in example 1.
- the thicket of CNTs is clearly visible.
- the CNTs appear rough and of irregular diameter, which is due to the cladding of MgO sheathing the CNTs.
- a carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 3, with the exception that the first precursor was Ni(acac) 2 . After a total deposition time of 206 minutes, a film thickness of 5 ⁇ m was reached, which corresponded to an average growth rate of 24.27 nm/min. The integrated total hemispherical reflection over the 300-2300 nm spectral range was measured at 0.54%.
- the CNT-based composite coating according to example 4 had an Mg/Ni atomic ratio of 0.38, which was measured by EDX.
- a carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 3, with the exception that the precursor 1 and precursor 2 were physically mixed (feedstock was ethanol with 2.5 mM of Mg(acac) 2 and 2.5 mM of Co(acac) 2 ). After a total deposition time of 120 minutes, the films featured an integrated total hemispherical reflection over the 300-2300 nm spectral range as low as 0.35%.
- a carbon-nanotube-based composite coating according to example 3 above was capped with a 20 nm thick conformal Al 2 O 3 layer. This layer was applied at 120° C. (substrate temperature) and 3 mbar pressure using the following deposition cycle:
- TMA trimethylaluminum
- Steps 1 to 4 were carried out 125 times. The purges with nitrogen were implemented to prevent parasitic CVD reactions.
- FIG. 10 shows a SEM of the surface obtained (top view) in example 4.
- FIG. 11 is a cross sectional SEM of the CNT-based composite coating capped with the Al 2 O 3 layer.
- FIG. 12 is a close up of the tips of the CNTs coated with the Al 2 O 3 layer.
- Capping the CNT-based composite coating inherently changes the optical performance.
- the deposition of the alumina layer (20 nm) yielded an increase of the reflectance in the UV-Vis-NIR from 0.55% (example 3) to 1.1% (example 4). It is worthwhile noting that this reflectance is still exceptionally low despite use of an oxide with relatively high refractive index as the cap layer. Further improvements in terms of low reflectance are expected if SiO 2 or MgF 2 is used for capping the coated CNTs. It was observed that the deposition of up to 80 nm SiO 2 induced a marginal change of the THR.
- the integrated total hemispherical reflection over the 300-2300 nm spectral range was measured at 0.69%, 0.66%, 0.79% and 0.89% for SiO 2 capping layer thicknesses of 20 nm, 37 nm, 80 nm and 200 nm, respectively.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Carbon And Carbon Compounds (AREA)
- Catalysts (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
- The invention generally relates to a novel carbon nanotube (CNT) based composite coating and a method for producing such a coating. A particularly interesting aspect of the invention relates to a black coating made of a CNT-based coating.
- The performance of certain optical devices strongly depends on the ability of avoiding and/or eliminating stray light. Stray light reduction is an important issue especially in space-borne astronomical instruments, where it may notably affect both the geometric and the radiometric image quality. To prevent light originating from outside the desired field of view of the instrument, baffles are typically arranged around the optical axis. Such baffles are usually cylindrical or conical and may comprise vanes on their interior walls in order to trap as much stray light as possible. In such systems, the absorptance of undesired off-axis radiation in the spectral range of the detector should be as close as possible to 100% irrespective of the incidence angle. Furthermore, the reflectance of the surfaces should ideally be Lambertian. Black coatings have been developed to cover all mechanical surfaces close to the optical beam. An overview can be found in: M. J. Persky, « Review of black surfaces for space-borne infrared systems », Review of scientific instruments, vol. 70, no 5, p. 2193-2217, 1999. Historically, in most spatial missions, black surfaces were obtained using paints (e.g. Aeroglaze™ from Lord Corporation, DeSoto™ Flat Black from Pacific Western Paints, etc.) or anodizations (e.g. Martin Black™, Enhanced Martin Black™, or Infrablack™ from Martin Marietta Corporation, etc.). Other advanced optically black diffuse surfaces such as plasma sprayed boron-on-beryllium, plasma sprayed boron carbide-on-silicon carbide and plasma sprayed beryllium-on-beryllium have been developed. These are diffuse absorptive surfaces that employ microscopic structures to absorb, scatter or trap light. Other black surfaces can be obtained by electrodeposition (e.g. black chrome, black cobalt) or by electroless nickel coating. In the 21st century, several advanced coatings have been developed by various companies. Acktar's inorganic coatings (Nano black™, Magic black™, Vacuum black™, Fractal black™ and Ultra black™) are fabricated using vacuum deposition technology and feature very low reflectance, high thermal stability, excellent adhesion, and low outgassing. Surrey NanoSystems have developed a super-black material (called Vantablack™) that absorbs 99.96% of surface light. Vantablack™ is produced using a low-temperature carbon nanotube (CNT) growth process. When light strikes the layer of CNTs, instead of bouncing off it is trapped between the tubes before eventually becoming heat. Titanium and silicon substrates have been used to demonstrate the efficiency.
- Apart from optical instruments, black materials, in particular black coatings, have applications in passive thermal management (requiring high emissivity), solar energy harvesting (e.g. solar water heating, concentrated solar power generation, etc.), infrared sensing (e.g. in MEMS IR sensors), thermal actuation (e.g. in MEMS thermal actuators), etc.
- It is an object of an aspect of the present invention to provide a CNT-based composite coating that may serve as a black coating. More generally, however, it is an object of the invention to provide a new type of coating. The new type of coating could, e.g., be used in the field of energy storage (e.g. in lithium ion batteries or super-capacitors).
- Aspects of the methods used in the context of the present invention have been developed from earlier works in which the inventor contributed. The interested reader is referred to (1) Bahlawane N, Premkumar P A, Onwuka K, Reiss G, Kohse-Hoinghaus K. Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films. Microelectronic Engineering. 2007; 84(11):2481-2485; (2) Bahlawane N, Premkumar P A, Onwuka K, Rott K, Reiss G, Kohse-Hoinghaus K. Catalytically enhanced H2-free CVD of transition metals using commercially available precursors. Surface & Coatings Technology. 2007; 201(22-23):8914-8918; (3) Premkumar P A, Bahlawane N, Kohse-Hoinghaus K. CVD of metals using alcohols and metal acetylacetonates, Part I: Optimization of process parameters and electrical characterization of synthesized films. Chemical Vapor Deposition. 2007; 13(5):219-226; (4) Premkumar P A, Bahlawane N, Reiss G, Kohse-Hoinghaus K. CVD of metals using alcohols and metal acetylacetonates, Part II: Role of solvent and characterization of metal films made by pulsed spray evaporation CVD. Chemical Vapor Deposition. 2007; 13(5):227-231; (5) Premkumar P A, Turchanin A, Bahlawane N. Effect of solvent on the growth of Co and Co2C using pulsed-spray evaporation chemical vapor deposition. Chemistry of Materials. 2007;19(25):6206-6211; and (6) German
patent application DE 10 2006 033 037 A1, disclosing a one-step method for depositing a metal onto a substrate by means of a gas phase deposition method. According to DE 10 2006 033 037 A1, a metal-containing precursor compound is dissolved in an organic solvent, which serves as a reducing agent that releases the metal species from the metalorganic precursor. - A first aspect of the invention relates to a carbon-nanotube-based composite coating, comprising a layer of carbon nanotubes, which is characterized in that the carbon nanotubes comprise metal oxide claddings that sheathe the carbon nanotubes. The metal oxide claddings are preferably transparent and conformal with the CNTs. They may sheathe the carbon nanotubes on their full lengths or along sections thereof. The carbon-nanotube-based composite coating is typically porous. However, the pores or interstices between the metal-oxide-coated CNTs may be more or less filled with metal oxide or other material(s).
- As will be appreciated, the metal oxide coating leads to a passivation of the CNTs and may reduce the ability of the CNTs to trap organic molecules or to react with atomic oxygen or aggressive chemicals. Furthermore, the metal oxide claddings increase the mechanical stability of the CNT layer and make it more resistant against mechanical stress. The claddings may be adjusted (in terms of chemical composition and thickness) to achieve a compromise between light absorption, mechanical stability and protection against reaction with oxygen or aggressive chemicals.
- The CNTs of the carbon-nanotube-based composite are preferably non-aligned (i.e. entangled), thus forming an (isotropic) CNT thicket rather than a CNT forest (aligned CNTs). With regard to the application of the CNT-based composite coating as a black coating, the fact that the CNTs are not aligned ensures that no direction of the incident light is privileged or special, yielding Lambertian or nearly Lambertian reflection behaviour.
- Preferably, the CNTs have an average diameter in the range from 0.3 to 150 nm, more preferably in the range from 0.3 to 20 nm.
- The metal oxide claddings preferably comprise or consist of MgO.
- According to a preferred embodiment of the invention, the carbon-nanotube-based composite coating comprises a ceramic cap layer atop the thicket of sheathed carbon nanotubes. The ceramic cap layer may be conformal with the carbon nanotubes, leaving the individual capped sheathed CNTs visible by (scanning electron) microscopy. That is the case if a thin cap layer is applied, where the thickness of the cap layer is of the same order of magnitude as the diameter of the sheathed CNTs). Alternatively, the cap layer may be applied such that it substantially fills the interstices between the sheathed CNTs at least in a top region thereof, leading to a substantially continuous solid capping layer.
- The ceramic cap layer preferably consists of a different material than the metal oxide claddings. The ceramic cap layer may e.g. consist of a material selected from the group comprising or consisting of Al2O3, Si2O, Si3N4, SiOxNx, AlN, AlNO, MgO, ZnO, SnO2, NiO, ZrO2, Cr2O3, MoO2, RuO2, CoOx, CuOx, VOx, FeOx, MnOx, TiO2, CaF2, BaF2, MgF2, ternary and/or complex oxides involving one or more of the elemental species of the mentioned compounds and mixtures thereof.
- A preferred aspect of the present invention relates to a black coating, preferably a matte black coating, more preferably a superblack coating, comprising a carbon-nanotube-based composite coating as described herein. In the context of the present document, the term “black” qualifies a surface with a total hemispherical reflectivity (THR) of no more than 5% over the entire wavelength range from 400 nm to 1 μm and for any incidence angle (angle between the surface and the incoming beam) greater than 20°. A “matte” surface is a surface, whose reflectivity in the specular direction amounts to no more than 5% of the THR, for any incidence angle greater than 20°. As used herein, a “superblack” surface is a matte black surface having, over the entire wavelength range from 400 nm to 2.5 μm, a total hemispherical reflectivity (THR) of no more than 1% around normal incidence (incidence angle)20° and no more than 10% for grazing incidence (incidence angle <20°).
- As will be appreciated, a black coating consisting of the carbon-nanotube-based composite coating of the present invention offers good absorptance and can be tuned to meet the requirements of a superblack coating. Furthermore, Lambertian reflection behavior can be achieved. The carbon-nanotube-based composite coating is suitable for heat radiation (emittance) and can thus be used in thermal elements and on baffles, vanes or optical elements that need that type of cooling. The carbon-nanotube-based composite coating is compatible with different kinds of substrates, it can be produced with any desired thickness in the range from 50 nm to 5000 μm. The surface density (mass per unit area) is compatible with most applications. As the fabrication process of the carbon-nanotube-based composite coating uses chemical vapor deposition (CVD), which involves deposition at elevated temperatures and which may be carried out at low pressures, conditions that are unfavourable for the incorporation of volatile organic molecules or water into the coating, outgassing is not an important issue with the carbon-nanotube-based composite coating. That point is especially advantageous for space and high-vacuum applications. The encapsulation of the CNTs prevents the absorption of humidity and organic molecules along the post-deposition handling, processing, storage, assembling and repair. Another advantage of the carbon-nanotube-based composite coating is its ability to withstand direct sun illumination or, more generally speaking, intense radiation without alteration. Last but not least, chemical inertness of carbon-nanotube-based composite coating is an advantage (e.g. low sensitivity to atomic oxygen) appreciated in many applications.
- A further aspect of the present invention relates to a method for producing carbon nanotubes by CVD. As used herein, “CVD” is intended to include different formats of CVD, such as, e.g., metalorganic CVD (MOCVD), atomic layer deposition (ALD), pulsed-spray evaporation CVD, etc. Preferably, however, the CVD is carried out without using a plasma or radiation to enhance or initiate the growth of the CNTs and, if applicable, its metal oxide claddings. Plasma-enhanced CVD (PECVD) and photo-initiated CVD (PICVD) are thus preferably excluded. The method comprises:
-
- providing, in a reaction chamber, a substrate with metal or metal carbide nanoparticles on its surface or a mixture thereof, the nanoparticles comprising a first, CNT-growth-catalysing, metal species selected from the group comprising or consisting of Fe, Co, Ni;
- introducing an inorganic, metalorganic or organometallic precursor into the reaction chamber, together with a precursor for CNTs, the metalorganic or organometallic precursor selected for the deposition of a second metal;
- growing CNTs from the precursor for CNTs, the second metal obtained from the inorganic, metalorganic or organometallic precursor enhancing CNT-growth-catalysing activity of the first metal.
- Preferably, the precursor for CNTs comprises a hydrocarbon, alcohol being most preferred. Other possible but somewhat less preferred precursors for the CNTs are aldehydes, thiols, amines, and ethers. The precursor for CNTs may serve as a solvent for the precursors selected for the deposition of the first and/or the second metal, in which case the precursor solution serves as the feedstock for both the CNT growth and as an organic reducing agent for the deposition of the first and/or the second metal. Alternatively, the precursor for the CNTs and the precursors for the first and/or the second metal are introduced from different sources.
- Preferably, the second metal forms an alloy phase with the first metal, the alloy phase causing the enhanced CNT-growth-catalysing activity. To the best knowledge of the inventor, the use of Mg-based alloys or carbide compounds involving Fe, Co or Ni as CNT growth catalysts has never been reported in the literature. It is the inventor's merit to have recognized that the growth of CNTs can be carried out at significantly lower temperatures without having to resort to plasma enhancement or photo-initiation. While CNT growth typically requires a substrate temperature above 800° C. (if no plasma or light is used as an additional energy source), the growth of the CNTs according to a preferred embodiment of the present invention is carried out in the temperature range from 300 to 600° C., more preferably in the temperature range from 350° C. to 500° C., and even more preferably in the range from 350 to 450° C. As indicated above, the growth of the CNTs need no longer be plasma-induced or radiation-induced in these temperature ranges.
- Preferably, upon deposition, the second metal forms a metal oxide cladding sheathing the CNTs.
- The second metal is Mg, leading to the formation of MgO claddings around the CNTs. It is worthwhile noting that the growth of the claddings occurs concomitantly with the growth of the CNTs. Accordingly, the degree of coverage of the CNTs by the claddings can be adjusted and modulated by controlling the amounts of the precursors delivered into the reaction chamber during the growth phase.
- The method may comprise depositing a ceramic cap layer atop the CNTs. Such cap layer may e.g. consist of a material selected from the group comprising or consisting of Al2O3, Si2O, Si3N4, MgF2, SiOxNx, AlN, AlNO, MgO, ZnO, SnO2, NiO, ZrO2, Cr2O3, MoO2, RuO2, CoOx, CuOx, VOx, FeOx, MnOx, TiO2, CaF2, BaF2, ternary and/or complex oxides involving one or more elemental species of the mentioned compounds, and mixtures thereof.
- The metal nanoparticles are preferably deposited from an inorganic, metalorganic or organometallic precursors for the first metal. Inorganic precursors for the first or the second metal may e.g. be halides, carbonyls, nitrates, etc. Metalorganic or organometallic precursors are, however, preferred, as they are typically less toxic and corrosive and have lesser demands regarding recovery and disposal of reaction products.
- According to a preferred embodiment of the method, pulsed spray evaporation CVD is used to deposit the metal and/or metal carbide nanoparticles, to grow the CNTs and, if applicable, the metal oxide claddings. The metal and/or metal carbide nanoparticles are preferably deposited from a first precursor solution comprising a metalorganic or organometallic precursor for the first metal dissolved in a solvent (preferably an organic solvent such as, e.g. an alcohol or an aldehyde), the second metal being deposited from a second precursor solution containing the metalorganic or organometallic precursor selected for the deposition of the second metal dissolved in alcohol serving as the precursor for the CNTs.
- According to a currently most preferred implementation of the method, the metalorganic precursor for the first metal comprises cobalt acetylacetonate and/or nickel acetylacetonate and/or iron acetylacetonate, and the metalorganic precursor selected for the deposition of the second metal comprises magnesium acetylacetonate.
- As will be appreciated, the CVD method described herein enables the growth of uniform films even on highly structured surfaces. The overall structure features a layer of highly entangled CNTs that are partially or totally sheathed with metal oxide claddings. The coated CNTs strongly absorb visible light because of the inter-band transition of the metal phase and the intrinsic absorption bands of the carbon phase. The scattering and absorption efficiencies can be manipulated through the adjustment of the size of the particles and the proportion of carbon to metal.
- The proposed fabrication method may involve only moderate heating of the substrate (e.g. up to 500° C.) and thereby offers a great range of possibilities regarding the choice of the substrate. Aluminium parts or other metallic parts in a precise metallurgical state (that shall not be altered) could thus serve as substrates.
- Another noteworthy advantage of the proposed method is that it is not a so-called line-of-sight process (where shadowing is a concern) and complex geometries may thus be coated. Complex three-dimensional parts (e.g. baffles with vanes, etc.) can thus be coated much more easily than in those processes.
- A considerable degree of freedom is available to optimize the optical properties of the CNT-based coating, including:
-
- Thickness
- Degree of coverage of the CNTs by the metal oxide
- Nature of the involved metal oxide
- Presence or absence of a ceramic capping layer.
- According to a preferred embodiment of the method, the precursor(s) of the first metal (hereinafter: the first precursor(s)) and the precursors of the second metal and the CNTs (hereinafter: the second precursors) are introduced into the reaction chamber at respective times, the reaction chamber being purged there between (e.g. by using a chemically inert gas like N2 or the like), the introductions of the first precursor(s) and the second precursors being repeated plural times. The number of cycles may depend on several parameters, in particular the desired thickness, the degree of entanglement of the CNTs, the length of the CNTs, the duration of exposure of the substrate to each of the first and second precursors, the type of materials involved, etc. It is worthwhile noting that the first and second metal may form alloy, carbide compounds or metal-metal nanoparticles in the interstices between the coated CNTs. These nanoparticles may serve as starting points of further CNTs, leading to a ramified thicket of coated CNTs and nanoparticles.
- By way of example, preferred, non-limiting embodiments of the invention will now be described in detail with reference to the accompanying drawings, in which:
-
FIG. 1 : is a cross-sectional schematic of a CNT-based coating comprising metal-oxide-sheathed CNTs; -
FIG. 2 : is a cross-sectional schematic of a CNT-based coating as inFIG. 1 with a ceramic cap layer on top; -
FIG. 3 : is a cross-sectional schematic of a CNT-based coating as inFIG. 2 with a thicker ceramic cap layer on top; -
FIG. 4 : is a schematic illustration of the so-called base-growth mechanism; -
FIG. 5 : is a schematic illustration of the so-called tip-growth mechanism; -
FIG. 6 : is a schematic drawing of a CVD reactor equipped for pulsed-spray evaporation CVD; -
FIG. 7 : is flow chart of an example of a pulsed-spray evaporation CVD process in accordance with a preferred embodiment of a method for growing oxide-coated CNTs; -
FIG. 8 : is a diagram comparing the total hemispherical reflectivity of the coatings described as examples 1 to 3; -
FIG. 9 : is a scanning electron micrograph (SEM) of a CNT-based coating according to a preferred embodiment of the invention; -
FIG. 10 : is a top view SEM of a CNT-based composite coating capped with an Al2O3 layer; -
FIG. 11 : is a cross sectional view SEM of a CNT-based composite coating capped with an Al2O3 layer; -
FIG. 12 : is a close up of the capped tips of the CNTs ofFIG. 11 ; -
FIG. 13 : is a cross-sectional schematic of a CNT-based coating with a porous ceramic cap infiltration of the layer of CNTs; -
FIG. 14 : is a cross-sectional schematic of a CNT-based coating with a relatively dense ceramic cap infiltration of the layer of CNTs. - A carbon-nanotube-based
composite coating 10 according to a first preferred embodiment of the invention is schematically depicted inFIG. 1 . The CNT-basedcomposite coating 10 is applied as a black coating onsubstrate 12. It comprises alayer 14 of strongly entangled,non-aligned CNTs 16 that are individually covered withmetal oxide claddings 18. The non-aligned coatedCNTs 20 form a CNT thicket on the surface of thesubstrate 12. It is worthwhile noting that the CNT thicket may be much denser than shown inFIG. 1 . -
FIGS. 2 and 3 shows a CNT-basedcomposite coating 10′ comprising aceramic cap layer 22 atop thelayer 14 of CNTs. Theceramic cap layer 22 is preferably deposited by CVD or ALD after the CNT growth has been terminated. When theceramic cap layer 22 is very thin (i.e. of approximately the same thickness as thecoated CNTs 20 or thinner), the ceramic cap layer may still be discontinuous or conformal to the CNTs. When theceramic cap layer 22 grows thicker (see in particularFIG. 3 ) the islands of ceramic cap material on the tips of the CNTs join and begin to form continuous but still porous layer. Eventually, as the CVD or ALD growth of the ceramic cap layer goes on, more and more pores are filled with ceramic material, leading to a continuous overgrowth of the ceramic cap layer with little or no apparent pores. Depending on the deposition conditions, the species involved, etc., the ceramic capping material may substantially (e.g. completely) infiltrate the layer of carbon nanotubes, substantially filling up the interstices between thecoated CNTs 20, thereby leading to the formation of a dense film (consisting of the thicket of coated CNTs surrounded by the capping material). A CNT-basedcomposite coating 10″ comprising aceramic cap layer 22 infiltrating thelayer 14 of CNTs is shown inFIGS. 13 and 14 . -
FIGS. 4 and 5 illustrate two CNT growth mechanisms that may lead to the formation of metal-oxide-coated CNTs. -
FIG. 4 illustrates the so-called base base-growth mechanism. Ametal nanoparticle 24 on the surface of thesubstrate 12 dissociates the hydrocarbon molecules that serve as the precursors of the CNTs into a carbon and a hydrogen fraction. The hydrogen gas leaves the reaction zone, while the carbon is dissolved in the metal until the solubility limit is reached. As from that point, the carbon crystallises out in the form of a CNT on the face of the nanoparticle turned away from the substrate. While the CNT grows, the nanoparticle remains in contact with the substrate. -
FIG. 5 illustrates the so-called tip-growth mechanism. In that case, the carbon crystallised out as a CNT on the interface between thenanoparticle 24 and the substrate, causing thenanoparticle 24 to lift off and to remain at the tip of the CNT as growth thereof goes on. - According to the method proposed in the context of the present invention, the metal and/or
metal carbide nanoparticles 24 comprise CNT-growth-catalysing metal and/or metal carbide involving elements selected from Fe, Co and Ni (or mixtures thereof). A second metal species, preferably Mg, is provided from a metalorganic or organometallic precursor, in parallel with the hydrocarbon (preferably alcohol) molecules that serve as the feedstock for the CNT growth. In bothFIGS. 4 and 5 , the precursors of the CNTs and the second metal are represented asprecursor vapour 26. - It is currently believed that the exposure of the metal nanoparticles to the precursor for the second metal and the CNT feedstock molecule drives the following scenarios:
-
- The metal species from the inorganic, metalorganic or organometallic precursor for the second metal forms an alloys or carbide compound with the Fe, Co and/or Ni containing phases already present as nanoparticles on the growth surface. In case of cobalt as the first metal and Mg as the second metal, CoMg2, MgCo2, or MgCo3C0.5 are likely to be obtained.
- The CNT feedstock molecule is decomposed on the surface of the nanoparticles modified by the second metal and the carbon crystallises out in the form of a single- or multi-walled CNT.
- The inorganic, metalorganic or organometallic precursor for the second metal decomposes on the surface of the nanoparticle to yield metal oxide deposit.
- It is observed that the presence of the second metal facilitates the formation of the CNTs at lower temperatures. Furthermore, a metal oxide cladding is formed that coats the CNT but does not hinder CNT growth. Regarding the reaction mechanisms, they have to be investigated further. Accordingly, the above scenarios shall be regarded as hypotheses to which the inventor does not intend to be bound. After further investigations, it may turn out that they do not accurately or not completely describe the enhanced CNT growth and/or the formation of metal oxide claddings thereon.
- Notwithstanding that, the experimental results (see in examples 1 to 6 hereinafter) suggest that the three scenarios occur but in a given logic. The modification of the first metal phases (Fe, Co, Ni) by the precursor of the second metal (Mg(acac)2 in the examples) seems to be the most favourable scenario from the kinetic point of view. The formed phases feature a stronger catalytic activity towards the growth of CNTs. As a consequence, the formation of CNTs is substantially enhanced. The growth of the metal oxide claddings occurs with more modest kinetics leading to coverage of the CNTs without hindering their growth.
- The fraction of each phase in the CNT-based composite coating (i.e. the CNT phase, the metal oxide cladding phase and the alloy phase of the modified nanoparticles) can be adjusted by controlling the delivery recipe.
-
FIG. 6 illustrates aCVD reactor 30 for carrying out pulsed-spray evaporation CVD of a carbon-nanotube-based composite coating. TheCVD reactor 30 comprises amain chamber 32 having arranged therein asubstrate holder 34 with asubstrate heater 36. The substrate (not shown inFIG. 4 ) may be placed on thesubstrate heater 36 by a manipulator (not shown). Avacuum pump 38 is connected to themain chamber 32, as well as a trap for the carrier gas (not shown). The precursors and the carrier gas may be introduced into themain chamber 32 through a tubular evaporation andtransport chamber 40. The evaporation andtransport chamber 40 is equipped with heaters (not shown) allowing it to be brought to sufficiently high temperatures for the evaporation of the precursor solutions and the transport of the resulting vapour. The liquid precursor solutions are injected byrespective injectors 42 into anevaporation zone 44 of the evaporation andtransport chamber 40. In theevaporation zone 44, precursor vapours are then formed, which are transported by the carrier gas through a so-calledtransport zone 46 leading into themain chamber 32. The carrier gas (represented by arrow 48) may be introduced at a controlled flow rate throughcarrier gas inlet 50. -
FIG. 7 shows a flow chart illustrating pulsed-spray evaporation CVD (PSE-CVD) according to a preferred embodiment of the invention. The sequence used and the numerical values inFIG. 7 are illustrative only and may be varied depending on the composition of the coating to deposit. In a first step (S51), the various parts of the reactor that is used to produce a black CNT-based composite coating are heated to the desired temperatures. A first deposition phase of metal nanoparticles from a first precursors or a first group of precursors is then started. In the illustrated case, a first precursor solution containing the first precursor(s) is injected into the evaporation zone (step S52) at a predefined rate (4 Hz in the example) and with predefined opening times of the injector (2 ms for each injection in the example). The precursor vapour formed in the evaporation zone is transported by the carried gas into the main chamber of the reactor, where the ceramic matrix is deposited on the substrate. The injection regime of the first precursor solution is maintained for a predefined amount of time (10 minutes in the example), before the injections of the first precursor solution are stopped and the reactor is purged using the flux of carrier gas (step S53) during a first purge time (30 s with nitrogen in the illustrated example). A second precursor solution containing the precursors for the second metal (and thus for the metal oxide cladding) and for the CNTs is then injected into the evaporation zone (step S52) at a predefined rate (4 Hz in the example) and with predefined opening times of the injector (2 ms for each injection in the example). The vapour formed from the second precursors is transported into the main chamber, where coated CNTs are formed as illustrated inFIG. 4 or 5 . The injection regime of the second precursor solution is maintained for a predefined amount of time (20 minutes in the illustrated example), whereupon the reactor is again purged. The deposition steps are repeated a certain number of times. The injection parameters may be varied in accordance with the desired deposition profile. It should also be noted that the last deposition step is not necessarily a coated CNT growth step but could be one of depositing a ceramic cap (using a third precursor solution). When the growth of the carbon-nanotube-based composite coating has completed, the reactor is cooled down and the grown samples are taken out of the reactor. - The growth process of
FIG. 7 may be greatly varied depending on the desired end product and the chemistry involved. For instance, while it may be preferable for practical reasons to have all first precursors necessary for the deposition of the nanoparticles in one solution, separate precursor sources could also be used. The same holds for the second precursors. It is also possible to mix theprecursors 1 andprecursors 2 in the same solution feedstock. - The flux of the carrier gas may be held constant throughout the entire growth process. Alternatively, the flux of carrier gas could be varied so as to adjust or optimize the deposition conditions.
- The temperature of the evaporation and transport chamber is also preferably held constant while the deposition goes on. If necessary or deemed advantageous, however, that parameter could also be changed over time. The same is true for the temperature of the substrate.
- A carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using a CVD reactor of the Luxembourg Institute of Science and Technology (LIST), equipped with a PSE unit for the controlled injection of liquid feedstock. The precursors selected were metal acetylacetonates that are easy to handle, store and implement. These precursors are soluble in ethanol and a large number of other solvents. In this example, the first precursor solution (for the deposition of the CNT-growth catalysing nanoparticle) was a 5 mM (5 mmol/l) solution of cobalt acetylacetonate (Co(acac)2) in ethanol. The second precursor solution (serving as feedstock for the coated CNTs) was a 5 mM solution of magnesium acetylacetonate (Mg(acac)2) in ethanol. The precursor solutions were injected as pulsed sprays into an evaporation tube maintained at 220° C. under vacuum. The precursors' delivery was performed by 2 ms opening of the injector with a frequency of 4 Hz, which yielding respective feeding rates of 2.5 ml/min. The carrier gas was nitrogen introduced with a flow rate of 40 sccm (standard cubic centimetres per minute) maintained constant through the entire deposition process.
- The deposition conditions are summarised in the following table:
-
Pressure during deposition 5 mbar Carrier gas: nitrogen 40 sccm Precursor 1: Co(acac)2 in ethanol 0.005 mol/l Delivery of the precursor 14 Hz, 2 ms opening time Precursor 2: Mg(acac)2 in ethanol 0.005 mol/l Delivery of the precursor 24 Hz, 2 ms opening time Temperature of evaporation and transport 220° C. Deposition temperature 350° C. - The deposition cycle was the following:
- 1.
Precursor solution 1 during 10 minutes - 2. Purge with nitrogen during 30 s,
- 3.
Precursor solution 2 during 20 minutes, - 4. Purge with nitrogen during 30 s.
- The deposition cycle was carried out 5 times, followed by a final deposition of
precursor solution 2. After the total deposition time of 175 minutes, a film thickness of 1.2 μm was reached, which corresponded to an average growth rate of 6.8 nm/min. - The CNT-based composite coating according to example 1 had an Mg/Co atomic ratio of 0.62, which was measured by EDX (Energy-dispersive X-ray analysis).
- In a comparative experiment, it was shown that the cobalt nanoparticles deposited in the same conditions as in example 1 catalysed the growth of carbon nanotubes after a reducing heat treatment and exposure to acetylene-hydrogen at temperatures far exceeding 500° C. It was found that the growth rate of CNTs in the absence of magnesium was marginal below 600° C., which is clear evidence for the enhancement of the CNT-growth catalysing activity by the addition of Mg.
- A carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 1, with the sole exception that the substrate temperature was set to 400° C. After the total deposition time of 175 minutes, a film thickness of 7.03 μm was reached, which corresponded to an average growth rate of 40.2 nm/min.
- A carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in examples 1 and 2, with the sole exception that the substrate temperature was set to 450° C. After the total deposition time of 175 minutes, a film thickness of 11.5 μm was reached, which corresponded to an average growth rate of 69.7 nm/min.
- Examples 1 to 3 suggest that the growth rate in this limited range (350-450° C.) using separate precursors delivery (cobalt and magnesium acetylacetonate) linearly depends on the deposition temperature. The total hemispherical reflectivity (THR) of the three obtained coatings was evaluated in the spectral range from 250 nm to 2300 nm for an incidence angle of 8° (diffuse and specular reflections were integrated). The results are displayed in
FIG. 8 . All obtained CNT films feature a very low reflection in the UV-Vis-NIR spectral range. At the first glance, the film obtained at 350° C. exhibits lower optical performance since a somehow higher reflectance is measured. Nevertheless, it should be highlighted that the film of example 1, obtained at 350° C. is 10 times thinner than the film of example 3, which was grown at 450° C. - Integration of the THR over the 250-2300 nm spectral range yields a reflectance of 2.47% for the film obtained at 350° C., a reflectance of 0.6% for the film obtained at 400° C. and a reflectance of 0.55% for the film obtained at 450° C.
-
FIG. 9 shows a scanning electron micrograph of the coating obtained in example 1. The thicket of CNTs is clearly visible. The CNTs appear rough and of irregular diameter, which is due to the cladding of MgO sheathing the CNTs. - A carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 3, with the exception that the first precursor was Ni(acac)2. After a total deposition time of 206 minutes, a film thickness of 5 μm was reached, which corresponded to an average growth rate of 24.27 nm/min. The integrated total hemispherical reflection over the 300-2300 nm spectral range was measured at 0.54%. The CNT-based composite coating according to example 4 had an Mg/Ni atomic ratio of 0.38, which was measured by EDX.
- A carbon-nanotube-based composite coating with CNTs coated with MgO claddings was grown using the same deposition conditions as in example 3, with the exception that the
precursor 1 andprecursor 2 were physically mixed (feedstock was ethanol with 2.5 mM of Mg(acac)2 and 2.5 mM of Co(acac)2). After a total deposition time of 120 minutes, the films featured an integrated total hemispherical reflection over the 300-2300 nm spectral range as low as 0.35%. - A carbon-nanotube-based composite coating according to example 3 above was capped with a 20 nm thick conformal Al2O3 layer. This layer was applied at 120° C. (substrate temperature) and 3 mbar pressure using the following deposition cycle:
- 1. Exposure of the CNTs to trimethylaluminum (TMA) during 200 ms
- 2. Purge with nitrogen (flow rate of 350 sccm) during 2 s;
- 3. Exposure of the CNTs to water vapour during 200 ms
- 4. Purge with nitrogen (flow rate of 350 sccm) during 2 s;
-
Steps 1 to 4 were carried out 125 times. The purges with nitrogen were implemented to prevent parasitic CVD reactions. -
FIG. 10 shows a SEM of the surface obtained (top view) in example 4.FIG. 11 is a cross sectional SEM of the CNT-based composite coating capped with the Al2O3 layer.FIG. 12 is a close up of the tips of the CNTs coated with the Al2O3 layer. - Capping the CNT-based composite coating inherently changes the optical performance. The deposition of the alumina layer (20 nm) yielded an increase of the reflectance in the UV-Vis-NIR from 0.55% (example 3) to 1.1% (example 4). It is worthwhile noting that this reflectance is still exceptionally low despite use of an oxide with relatively high refractive index as the cap layer. Further improvements in terms of low reflectance are expected if SiO2 or MgF2 is used for capping the coated CNTs. It was observed that the deposition of up to 80 nm SiO2 induced a marginal change of the THR. The integrated total hemispherical reflection over the 300-2300 nm spectral range was measured at 0.69%, 0.66%, 0.79% and 0.89% for SiO2 capping layer thicknesses of 20 nm, 37 nm, 80 nm and 200 nm, respectively.
- While specific embodiments have been described herein in detail, those skilled in the art will appreciate that various modifications and alternatives to those details could be developed in light of the overall teachings of the disclosure. Accordingly, the particular arrangements disclosed are meant to be illustrative only and not limiting as to the scope of the invention, which is to be given the full breadth of the appended claims and any and all equivalents thereof.
Claims (20)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LU92758 | 2015-06-29 | ||
| LU92758A LU92758B1 (en) | 2015-06-29 | 2015-06-29 | Carbon-nanotube-based composite coating and production method thereof |
| PCT/EP2016/065016 WO2017001406A2 (en) | 2015-06-29 | 2016-06-28 | Carbon-nanotube-based composite coating and production method thereof |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2016/065016 A-371-Of-International WO2017001406A2 (en) | 2015-06-29 | 2016-06-28 | Carbon-nanotube-based composite coating and production method thereof |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US17/710,087 Continuation US12024635B2 (en) | 2015-06-29 | 2022-03-31 | Carbon-nanotube-based composite coating and production method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20180179391A1 true US20180179391A1 (en) | 2018-06-28 |
Family
ID=53539892
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US15/739,486 Abandoned US20180179391A1 (en) | 2015-06-29 | 2016-06-28 | Carbon-nanotube-based composite coating and production method thereof |
| US17/710,087 Active 2036-09-29 US12024635B2 (en) | 2015-06-29 | 2022-03-31 | Carbon-nanotube-based composite coating and production method thereof |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US17/710,087 Active 2036-09-29 US12024635B2 (en) | 2015-06-29 | 2022-03-31 | Carbon-nanotube-based composite coating and production method thereof |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20180179391A1 (en) |
| EP (1) | EP3313942B1 (en) |
| ES (1) | ES2928795T3 (en) |
| IL (1) | IL256232B (en) |
| LU (1) | LU92758B1 (en) |
| RU (1) | RU2727604C2 (en) |
| WO (1) | WO2017001406A2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180297837A1 (en) * | 2017-04-13 | 2018-10-18 | Robert Bosch Gmbh | Method for protecting a mems unit against infrared investigations and mems unit |
| US11002608B2 (en) * | 2018-01-11 | 2021-05-11 | Tsinghua University | Blackbody radiation source |
| US11047740B2 (en) * | 2018-01-11 | 2021-06-29 | Tsinghua University | Plane source blackbody |
| US11204284B2 (en) * | 2018-01-11 | 2021-12-21 | Tsinghua University | Blackbody radiation source |
| US11226238B2 (en) * | 2018-01-11 | 2022-01-18 | Tsinghua University | Blackbody radiation source |
| KR102396863B1 (en) * | 2020-11-17 | 2022-05-10 | 한국전기연구원 | Manufacturing method of sulfur deposited carbon nano tube electrode, sulfur deposited carbon nano tube electrode by the same and lithium-sulfur battery comprising the same |
| US12024635B2 (en) | 2015-06-29 | 2024-07-02 | Luxembourg Institute Of Science And Technology (List) | Carbon-nanotube-based composite coating and production method thereof |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110031116A (en) * | 2018-01-11 | 2019-07-19 | 清华大学 | Cavate blackbody radiation source |
| DE112019000577T5 (en) | 2018-01-29 | 2020-11-12 | Massachusetts Institute Of Technology | BACK-GATE FIELD EFFECT TRANSISTORS AND METHOD FOR MANUFACTURING THEREOF |
| US11561195B2 (en) | 2018-06-08 | 2023-01-24 | Massachusetts Institute Of Technology | Monolithic 3D integrated circuit for gas sensing and method of making and system using |
| WO2020086181A2 (en) | 2018-09-10 | 2020-04-30 | Massachusetts Institute Of Technology | Systems and methods for designing integrated circuits |
| CN112840448B (en) | 2018-09-24 | 2024-10-11 | 麻省理工学院 | Tunable doping of carbon nanotubes by engineered atomic layer deposition |
| WO2020113205A1 (en) | 2018-11-30 | 2020-06-04 | Massachusetts Institute Of Technology | Rinse - removal of incubated nanotubes through selective exfoliation |
| CN110282974B (en) * | 2019-06-28 | 2020-12-29 | 华南理工大学 | Oriented arrangement of magnetic carbon fiber graphene composite film and its preparation method and application |
| CN114671710B (en) * | 2022-03-10 | 2023-04-07 | 西北工业大学 | Double-period multilayer TaC/HfC ultrahigh-temperature ceramic anti-ablation coating and preparation method thereof |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2442310A1 (en) | 2001-03-26 | 2002-10-03 | Eikos, Inc. | Coatings containing carbon nanotubes |
| WO2003060209A1 (en) | 2002-01-11 | 2003-07-24 | The Trustees Of Boston College | Reinforced carbon nanotubes |
| US7459013B2 (en) * | 2004-11-19 | 2008-12-02 | International Business Machines Corporation | Chemical and particulate filters containing chemically modified carbon nanotube structures |
| CN100434210C (en) * | 2005-01-17 | 2008-11-19 | 武汉科技大学 | A kind of carbon-coated metal nanoparticles and preparation method thereof |
| RU2310601C2 (en) * | 2005-10-19 | 2007-11-20 | Химический факультет МГУ им. М.В. Ломоносова | Method of production of the carbonic nanotubes with the incapculated particles of nickel and cobalt and the installation for the synthesis of the materials based on the carbonic nanotubes and nanoparticles of nickel and cobalt |
| DE102006033037A1 (en) | 2006-07-14 | 2008-01-24 | Universität Bielefeld | One step process for applying a metal layer to a substrate |
| TWI343929B (en) * | 2007-03-27 | 2011-06-21 | Nat Univ Tsing Hua | Tio2-coated cnt, tio2-coated cnt reinforcing polymer composite and methods of preparation thereof |
| US9078942B2 (en) * | 2007-05-14 | 2015-07-14 | Northwestern University | Titanium dioxide, single-walled carbon nanotube composites |
| EP2398955B8 (en) * | 2009-02-17 | 2020-06-03 | Applied NanoStructured Solutions, LLC | Composites comprising carbon nanotubes on fiber |
| US8246860B2 (en) * | 2009-10-23 | 2012-08-21 | Tsinghua University | Carbon nanotube composite, method for making the same, and electrochemical capacitor using the same |
| DE102009054427B4 (en) * | 2009-11-25 | 2014-02-13 | Kme Germany Ag & Co. Kg | Method for applying mixtures of carbon and metal particles to a substrate, substrate obtainable by the method and its use |
| US8999453B2 (en) * | 2010-02-02 | 2015-04-07 | Applied Nanostructured Solutions, Llc | Carbon nanotube-infused fiber materials containing parallel-aligned carbon nanotubes, methods for production thereof, and composite materials derived therefrom |
| CA2712051A1 (en) * | 2010-08-12 | 2012-02-12 | The Governors Of The University Of Alberta | Method of fabricating a carbon nanotube array |
| GB2501872B8 (en) * | 2012-05-03 | 2022-08-17 | Dyson Technology Ltd | Coated Structured Surfaces |
| AU2013330962B2 (en) | 2012-10-19 | 2017-10-19 | Georgia Tech Research Corporation | Multilayer coatings formed on aligned arrays of carbon nanotubes |
| US10847810B2 (en) | 2013-10-22 | 2020-11-24 | Cornell University | Nanostructures for lithium air batteries |
| LU92758B1 (en) | 2015-06-29 | 2016-12-30 | Luxembourg Inst Of Science And Tech (List) | Carbon-nanotube-based composite coating and production method thereof |
-
2015
- 2015-06-29 LU LU92758A patent/LU92758B1/en active
-
2016
- 2016-06-28 ES ES16734274T patent/ES2928795T3/en active Active
- 2016-06-28 RU RU2018101471A patent/RU2727604C2/en active
- 2016-06-28 US US15/739,486 patent/US20180179391A1/en not_active Abandoned
- 2016-06-28 EP EP16734274.0A patent/EP3313942B1/en active Active
- 2016-06-28 WO PCT/EP2016/065016 patent/WO2017001406A2/en not_active Ceased
-
2017
- 2017-12-10 IL IL256232A patent/IL256232B/en unknown
-
2022
- 2022-03-31 US US17/710,087 patent/US12024635B2/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12024635B2 (en) | 2015-06-29 | 2024-07-02 | Luxembourg Institute Of Science And Technology (List) | Carbon-nanotube-based composite coating and production method thereof |
| US20180297837A1 (en) * | 2017-04-13 | 2018-10-18 | Robert Bosch Gmbh | Method for protecting a mems unit against infrared investigations and mems unit |
| US10793425B2 (en) * | 2017-04-13 | 2020-10-06 | Robert Bosch Gmbh | Method for protecting a MEMS unit against infrared investigations and MEMS unit |
| US11002608B2 (en) * | 2018-01-11 | 2021-05-11 | Tsinghua University | Blackbody radiation source |
| US11047740B2 (en) * | 2018-01-11 | 2021-06-29 | Tsinghua University | Plane source blackbody |
| US11204284B2 (en) * | 2018-01-11 | 2021-12-21 | Tsinghua University | Blackbody radiation source |
| US11226238B2 (en) * | 2018-01-11 | 2022-01-18 | Tsinghua University | Blackbody radiation source |
| KR102396863B1 (en) * | 2020-11-17 | 2022-05-10 | 한국전기연구원 | Manufacturing method of sulfur deposited carbon nano tube electrode, sulfur deposited carbon nano tube electrode by the same and lithium-sulfur battery comprising the same |
| WO2022107907A1 (en) * | 2020-11-17 | 2022-05-27 | 한국전기연구원 | Method for manufacturing sulfur-carrying carbon nanotube electrode, sulfur-carrying carbon nanotube electrode manufactured thereby, and lithium-sulfur battery comprising same |
Also Published As
| Publication number | Publication date |
|---|---|
| RU2018101471A (en) | 2019-07-30 |
| WO2017001406A3 (en) | 2017-04-27 |
| US12024635B2 (en) | 2024-07-02 |
| EP3313942A2 (en) | 2018-05-02 |
| WO2017001406A2 (en) | 2017-01-05 |
| RU2727604C2 (en) | 2020-07-22 |
| LU92758B1 (en) | 2016-12-30 |
| IL256232B (en) | 2022-02-01 |
| ES2928795T3 (en) | 2022-11-22 |
| US20220220317A1 (en) | 2022-07-14 |
| EP3313942B1 (en) | 2022-08-17 |
| RU2018101471A3 (en) | 2019-11-19 |
| IL256232A (en) | 2018-02-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US12024635B2 (en) | Carbon-nanotube-based composite coating and production method thereof | |
| Garcia et al. | Thermal barrier coatings produced by chemical vapor deposition | |
| EP1836326B1 (en) | Composite materials and method of its manufacture | |
| JP2012523544A (en) | Solar heat receiver with carbon nanotube leached coating | |
| CN101999012A (en) | penetration barrier | |
| CN86104496A (en) | The manufacture method of amorphous multi-metal alloy coatings | |
| US20070154385A1 (en) | Method for manufacturing zinc oxide nanowires and device having the same | |
| US10710935B2 (en) | Ceramic composite and production method thereof | |
| Koh et al. | Microplasma-based synthesis of vertically aligned metal oxide nanostructures | |
| Awan et al. | Role of Thin Film in Deposition Techniques | |
| EP3513423B1 (en) | Device and method for performing atmospheric pressure plasma enhanced chemical vapour deposition at low temperature | |
| Shujah et al. | Effect of deposition temperature variation on thin films synthesis via AACVD | |
| 木村禎一 | High-speed deposition of yttria-stabilized zirconia and titania films by laser chemical vapor deposition | |
| Yussuf | Growth and Application of Titanium Nanorods with Branches Using Physical Vapor Deposition | |
| Aitchison et al. | Novel optical coating technology for freeform and conformal optics | |
| Jeje et al. | Synthesis and Characterization of Tantalum Oxide Deposited By Metal-Organic Chemical Vapour Deposition (MOCVD) | |
| EP2236649A1 (en) | Deposition process of a nanocomposite film and apparatus therefor | |
| Hu | Production technology and application of thin film materials in micro fabrication | |
| CN120577904A (en) | An ultra-black film structure with low deposition temperature and low reflectivity | |
| JP5245697B2 (en) | Laminated body having porous aluminum oxide film | |
| KR20210023661A (en) | Cracking device and deposition apparatus including the same | |
| EP3655563A1 (en) | Plasma device for depositing functional composite film comprising crystallized particles embedded in a matrix and method of deposition thereof | |
| Westin et al. | CERAMIC MATRIX COMPOSITES FOR SOLAR ENERGY APPLICATIONS; FROM SOLUTION TO PRODUCT | |
| Goto | Laser CVD process for high speed deposition of YSZ films | |
| Badalyan et al. | Formation of thin nanostructured layers during heterogeneous gas-phase synthesis from small-size volatile metal complexes on the surface of semiconductors and dielectrics |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LI Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:BAHLAWANE, NAOUFAL;REEL/FRAME:045095/0470 Effective date: 20180115 |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |