US20160326044A1 - Conductive paste and method for producing a semiconductor device using the same - Google Patents
Conductive paste and method for producing a semiconductor device using the same Download PDFInfo
- Publication number
- US20160326044A1 US20160326044A1 US15/110,575 US201515110575A US2016326044A1 US 20160326044 A1 US20160326044 A1 US 20160326044A1 US 201515110575 A US201515110575 A US 201515110575A US 2016326044 A1 US2016326044 A1 US 2016326044A1
- Authority
- US
- United States
- Prior art keywords
- conductive paste
- mass
- glass frit
- amount
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 116
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 239000011521 glass Substances 0.000 claims abstract description 315
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 claims abstract description 170
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 133
- 239000002245 particle Substances 0.000 claims abstract description 92
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 83
- 229910000108 silver(I,III) oxide Inorganic materials 0.000 claims abstract description 83
- 238000001938 differential scanning calorimetry curve Methods 0.000 claims abstract description 35
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000011787 zinc oxide Substances 0.000 claims abstract description 29
- 239000002904 solvent Substances 0.000 claims abstract description 23
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 13
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 13
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 11
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052785 arsenic Inorganic materials 0.000 claims abstract description 11
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 11
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 11
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000005751 Copper oxide Substances 0.000 claims abstract description 3
- 229910000431 copper oxide Inorganic materials 0.000 claims abstract description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 92
- 229910052709 silver Inorganic materials 0.000 claims description 36
- 239000004332 silver Substances 0.000 claims description 36
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 30
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 30
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 29
- 229910052593 corundum Inorganic materials 0.000 claims description 28
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 21
- 239000013078 crystal Substances 0.000 claims description 17
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 10
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 8
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 claims description 6
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 35
- 239000010408 film Substances 0.000 description 29
- 239000000203 mixture Substances 0.000 description 29
- 238000002425 crystallisation Methods 0.000 description 25
- 230000008025 crystallization Effects 0.000 description 25
- 238000000034 method Methods 0.000 description 21
- 239000000463 material Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 16
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 16
- 239000002994 raw material Substances 0.000 description 13
- 230000008021 deposition Effects 0.000 description 12
- 238000002844 melting Methods 0.000 description 12
- 230000008018 melting Effects 0.000 description 12
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 229910010271 silicon carbide Inorganic materials 0.000 description 10
- 238000009472 formulation Methods 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 9
- 238000010334 sieve classification Methods 0.000 description 9
- IJJWOSAXNHWBPR-HUBLWGQQSA-N 5-[(3as,4s,6ar)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]-n-(6-hydrazinyl-6-oxohexyl)pentanamide Chemical compound N1C(=O)N[C@@H]2[C@H](CCCCC(=O)NCCCCCC(=O)NN)SC[C@@H]21 IJJWOSAXNHWBPR-HUBLWGQQSA-N 0.000 description 8
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 8
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 8
- 229910052681 coesite Inorganic materials 0.000 description 8
- 229910052906 cristobalite Inorganic materials 0.000 description 8
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 229910052682 stishovite Inorganic materials 0.000 description 8
- 229940116411 terpineol Drugs 0.000 description 8
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 8
- 229910052905 tridymite Inorganic materials 0.000 description 8
- 238000001354 calcination Methods 0.000 description 7
- 230000000266 injurious effect Effects 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000003028 elevating effect Effects 0.000 description 6
- 239000011800 void material Substances 0.000 description 6
- 229910000525 Si/Al2O3 Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 239000006060 molten glass Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000005337 ground glass Substances 0.000 description 3
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000004570 mortar (masonry) Substances 0.000 description 3
- 229910052573 porcelain Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- DAFHKNAQFPVRKR-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylpropanoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)C DAFHKNAQFPVRKR-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- RUJPNZNXGCHGID-UHFFFAOYSA-N (Z)-beta-Terpineol Natural products CC(=C)C1CCC(C)(O)CC1 RUJPNZNXGCHGID-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- 241000640882 Condea Species 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical class OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910008649 Tl2O3 Inorganic materials 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical class OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- XMFOQHDPRMAJNU-UHFFFAOYSA-N lead(II,IV) oxide Inorganic materials O1[Pb]O[Pb]11O[Pb]O1 XMFOQHDPRMAJNU-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QTQRFJQXXUPYDI-UHFFFAOYSA-N oxo(oxothallanyloxy)thallane Chemical compound O=[Tl]O[Tl]=O QTQRFJQXXUPYDI-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical class OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- QJVXKWHHAMZTBY-GCPOEHJPSA-N syringin Chemical compound COC1=CC(\C=C\CO)=CC(OC)=C1O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 QJVXKWHHAMZTBY-GCPOEHJPSA-N 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/122—Silica-free oxide glass compositions containing oxides of As, Sb, Bi, Mo, W, V, Te as glass formers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/125—Silica-free oxide glass compositions containing aluminium as glass former
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/127—Silica-free oxide glass compositions containing TiO2 as glass former
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/14—Compositions for glass with special properties for electro-conductive glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/18—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/14—Conductive material dispersed in non-conductive inorganic material
- H01B1/16—Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2205/00—Compositions applicable for the manufacture of vitreous enamels or glazes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83909—Post-treatment of the layer connector or bonding area
- H01L2224/83948—Thermal treatments, e.g. annealing, controlled cooling
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/1026—Compound semiconductors
- H01L2924/1027—IV
- H01L2924/10272—Silicon Carbide [SiC]
Definitions
- the present invention relates to a conductive paste comprising low melting-point glass which does not contain an injurious material, such as lead, and a method for producing a semiconductor device using the conductive paste.
- a die attach material for bonding for example, a silicon carbide (SiC) chip to a substrate, and a sealing material and a conductive paste for electronic parts, such as a ceramic package containing therein an integrated circuit device, and a display device, are desired to achieve bonding at relatively low temperatures, taking into consideration the properties of objects to be bonded or to be sealed which are extremely sensitive to heat.
- a conductive paste which can achieve bonding at low temperatures a composition comprising glass having a low melting point is used.
- Patent document 1 discloses, as glass having a low softening point, glass comprising 20 to 70% of silver oxide, 10 to 70% of an oxide of vanadium or molybdenum, and 10 to 70% of an oxide of a semi-metal selected from the group consisting of phosphorus, germanium, arsenic, antimony, bismuth, and tellurium (patent document 1).
- patent document 2 discloses low melting-point glass comprising Ag 2 O: 8 to 20%, MoO 3 : 20 to 35%, ZnO: 1 to 6%, TeO 2 : 30 to 55%, and V 2 O 5 : 5 to 19% (patent document 2).
- glass used in, for example, a die attach material there is disclosed glass comprising, for example, Ag 2 O in an amount of about 40 to 65% by mass, V 2 O 5 in an amount of about 15 to 35% by mass, and at least one oxide selected from the group consisting of TeO 2 , PbO 2 , and Pb 3 O 4 in an amount of about 0 to 50% by mass, in terms of the oxide, wherein the glass forms a Ag 2 O—V 2 O 5 —TeO 2 —PbO 2 crystal (for example, patent document 3).
- the glass disclosed in patent document 3 is used in, for example, a ceramic package containing therein a temperature-sensitive integrated circuit device as a paste for bonding the temperature sensitive device at a low temperature (for example, at 350° C.).
- the cited document 4 discloses a glass composition which comprises Tl 2 O 3 in an amount of 60 to 82.5% by weight, V 2 O 5 in an amount of about 2.5 to 27.5% by weight, and P 2 O 5 in an amount of about 2.5 to 17.5% by weight, in terms of the oxide, and which has a boundary temperature of about 350° C. or lower at which vitrification occurs (patent document 4).
- Patent document 4 discloses that the glass composition has a boundary temperature of 460° C. or lower at which no devitrification occurs.
- the devitrification means that molten glass suffers crystal deposition of part of the glass having a certain composition during, for example, solidification of the molten glass upon cooling.
- Patent document 5 discloses a paste comprising conductive metal particles, a glass composition, an organic solvent, and a resin.
- Patent document 5 has a description showing that the glass composition specifically preferably has a remelting temperature of 275° C. or lower.
- Patent document 5 has a description showing that when the glass composition contained in the paste has a high remelting temperature, the amount of the glass phase which satisfactorily wets the surface of an adherend is reduced, so that the bond strength of the paste becomes poor.
- the cited document 5 discloses that the combination of TeO 2 and PbO 2 in the respective optimal amounts provides glass having crystalline properties and low-temperature properties desirable in respect of the structure finally obtained.
- Patent document 1 Japanese Unexamined Patent Publication No. Sho 51-138711
- Patent document 2 Japanese Unexamined Patent Publication No. Hei 8-259262
- Patent document 3 Japanese Patent Application prior-to-examination Publication (kohyo) No. Hei 8-502468
- Patent document 4 U.S. Pat. No. 4,933,030 specification
- Patent document 5 U.S. Pat. No. 5,543,366 specification
- the low melting-point PbO—B 2 O 3 glass and low melting-point glass disclosed in patent documents 1 to 3 and 5 contain an injurious material, such as lead (Pb), arsenic (As), antimony (Sb), or tellurium (Te). Also in patent document 4, thallium (Tl) can become an injurious material.
- Pb lead
- As arsenic
- Sb antimony
- Te tellurium
- thallium (Tl) can become an injurious material.
- concern about the environment and the like is growing, and therefore a conductive paste using low melting-point glass containing no injurious material is desired. Further, the conductive paste is desired to use low melting-point glass that can be applied to a semiconductor device and an integrated circuit device which are extremely sensitive to heat.
- the SiC semiconductor device has a high junction temperature, as compared to a silicon (Si) semiconductor device.
- Si silicon
- the conductive paste used in a die attach material for bonding together the semiconductor chip and a substrate one which can achieve bonding at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature is desired.
- the conductive paste which can maintain the bond strength between the SiC semiconductor chip and the substrate bonded by the paste even in the operation environment for device at a relatively high temperature (for example, at 300 to 350° C.).
- the glass composition contained in the paste disclosed in patent document 5 specifically has a remelting temperature of 275° C. or lower.
- a relatively high temperature for example, at 300 to 350° C.
- a task of the present invention is to provide a conductive paste comprising low melting-point glass which does not contain an injurious material, such as lead, arsenic, tellurium, or antimony, wherein the conductive paste is advantageous not only in that the paste can achieve bonding at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature, but also in that the paste can maintain the bond strength even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- a relatively low temperature for example, at 370° C. or lower
- the paste can maintain the bond strength even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the present invention 1 is directed to a conductive paste which comprises (A) conductive particles, (B) a glass frit containing substantially no lead, arsenic, tellurium, and antimony, and (C) a solvent, the glass frit (B) having a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- the present invention 2 is directed to the conductive paste of the present invention 1, which further comprises (D) at least one metal oxide selected from the group consisting of tin oxide, zinc oxide, indium oxide, and copper oxide.
- the present invention 3 is directed to the conductive paste of the present invention 1, wherein the conductive particles (A) are contained in an amount of 60 to 90% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, and the solvent (C) is contained in an amount of 5 to 12% by mass, based on the mass of the conductive paste.
- the present invention 4 is directed to the conductive paste of the present invention 2, wherein the conductive particles (A) are contained in an amount of 60 to 85% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, the solvent (C) is contained in an amount of 5 to 10% by mass, and the metal oxide (D) is contained in an amount of 0 to 5% by mass, based on the mass of the conductive paste.
- the present invention 5 is directed to the conductive paste of any one of the present inventions 1 to 4, wherein the glass frit (B) comprises (B-1) Ag 2 O, (B-2) V 2 O 5 , and (B-3) MoO 3 .
- the present invention 6 is directed to the conductive paste according to the present invention 5, wherein the glass frit (B) further comprises (B-4) at least one oxide selected from the group consisting of ZnO, CuO, TiO 2 , MgO, Nb 2 O 5 , BaO, Al 2 O 3 , SnO, and Fe 2 O 3 .
- the present invention 7 is directed to the conductive paste of the present invention 5 or 6, wherein the glass frit (B) contains Ag 2 O (B-1) and V 2 O 5 (B-2) in a total amount of 80 to 96% by mass in terms of the oxide, based on the mass of the glass frit (B), wherein the mass ratio of Ag 2 O (B-1) to V 2 O 5 (B-2) (Ag 2 O/V 2 O 5 ) is 1.8 to 3.2.
- the present invention 8 is directed to the conductive paste of any one of the present inventions 5 to 7, wherein the glass frit (B) contains MoO 3 (B-3) in an amount of 4 to 10% by mass in terms of the oxide, based on the mass of the glass frit (B).
- the present invention 9 is directed to the conductive paste of any one of the present inventions 6 to 8, wherein the glass frit (B) contains MoO 3 (B-3) and component (B-4) in a total amount of 4 to 20% by mass in terms of the oxide, based on the mass of the glass frit (B).
- the glass frit (B) contains MoO 3 (B-3) and component (B-4) in a total amount of 4 to 20% by mass in terms of the oxide, based on the mass of the glass frit (B).
- the present invention 10 is directed to the conductive paste according to any one of the present inventions 5 to 9, wherein the glass frit (B) contains Ag 2 O (B-1) in an amount of 40 to 80% by mass, V 2 O 5 (B-2) in an amount of 16 to 40% by mass, and MoO 3 (B-3) in an amount of 4 to 10% by mass, each in terms of the oxide, based on the mass of the glass frit (B).
- the glass frit (B) contains Ag 2 O (B-1) in an amount of 40 to 80% by mass, V 2 O 5 (B-2) in an amount of 16 to 40% by mass, and MoO 3 (B-3) in an amount of 4 to 10% by mass, each in terms of the oxide, based on the mass of the glass frit (B).
- the present invention 11 is directed to the conductive paste of any one of the present inventions 6 to 10, wherein the glass frit (B) contains component (B-4) in an amount of 0 to 12% by mass in terms of the oxide, based on the mass of the glass frit (B).
- the present invention 12 is directed to the conductive paste of any one of the present inventions 1 to 11, wherein the conductive particles (A) are silver.
- the present invention 13 is directed to the conductive paste of any one of the present inventions 1 to 12, wherein the mass ratio of the conductive particles (A) and the glass frit (B) (conductive particles:glass frit) is 50:50 to 98:2.
- the present invention 14 is directed to a method for producing a semiconductor device, wherein the method comprises the steps of:
- the present invention 15 is directed to a method for producing a semiconductor device, wherein the method comprises the steps of:
- the conductive paste of the present invention is advantageous in that a SiC chip and a substrate can be bonded to each other using the conductive paste by heating at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature to obtain a semiconductor device.
- the conductive paste of the present invention is advantageous in that a semiconductor chip and a substrate can be bonded to each other using the conductive paste, and, after bonding, the bond strength between the semiconductor chip and the substrate can be maintained even in an environment at a relatively high temperature (for example, at 300 to 350° C.), and thus the obtained semiconductor device has an improved heat resistance.
- a method for producing a semiconductor device which is advantageous in that the conductive particles contained in the conductive paste are sintered to electrically connect a semiconductor chip to a substrate, so that a semiconductor device having high electrical conductive properties can be obtained.
- the present invention by heating the conductive paste to the remelting temperature of the glass frit contained in the conductive paste or higher and then gradually cooling the paste, it is possible to cause deposition of silver and crystals in the calcined film bonding the semiconductor chip to the substrate.
- the calcined film bonding the semiconductor chip to the substrate tends to have a melting temperature higher than that of the glass frit contained in the conductive paste as a raw material.
- a method for producing a semiconductor device which is advantageous in that the obtained semiconductor device having a semiconductor chip and a substrate bonded using the conductive paste can maintain the bond strength between the substrate and the semiconductor chip even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- FIG. 1 is a diagram showing the steps in an embodiment of the method for producing a semiconductor device.
- FIG. 2 shows a DSC curve of glass frit No. 25 (SC181-4) as measured by a differential scanning calorimeter.
- FIG. 3 shows scanning electron microscope (SEM) photomicrographs of the silver particles used in the respective conductive pastes, taken at magnifications of 1,000 times, 2,000 times, and 5,000 times.
- FIG. 4 shows scanning electron microscope (SEM) photomicrographs of glass frit No. 25 (SC181-4), taken at magnifications of (a) 1,000 times and (b) 500 times, wherein glass frit No. 25 is obtained after sieve classification using a 400-mesh sieve.
- SEM scanning electron microscope
- the present invention is directed to a conductive paste which comprises (A) conductive particles, (B) a glass frit containing substantially no lead (Pb), arsenic (As), antimony (Sb), and tellurium (Te), and (C) a solvent, wherein the glass frit (B) has a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- the conductive particles used in the conductive paste of the present invention for example, silver (Ag), copper (Cu), nickel (Ni), or a silver alloy of silver and a base metal (for example, Cu or Ni) can be used.
- the conductive particles are preferably silver (Ag).
- the conductive particles preferably have an average particle diameter of 0.01 to 40 ⁇ m, more preferably 0.05 to 30 ⁇ m, further preferably 0.1 to 20 ⁇ m.
- the average particle diameter of the conductive particles is in the range of from 0.01 to 40 ⁇ m, the dispersibility of the conductive particles in the paste is excellent, so that excellent sintering properties are achieved during sintering.
- the average particle diameter of the conductive particles indicates a D50 (median diameter) in the volume cumulative distribution as measured using a laser diffraction-scattering type measurement apparatus for particle diameter and particle size distribution (for example, MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd.).
- the conductive particles may have a spherical shape, a shape of flakes or scales, or a polyhedral shape.
- silver particles When silver particles are used as the conductive particles, silver particles having a size at a nano-level or silver particles having pores filled with a resin may be used.
- the glass frit used in the conductive paste of the present invention contains substantially no lead, arsenic, antimony, and tellurium.
- the glass frit used in the conductive paste of the present invention is characterized by having a remelting temperature (Tr) of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve in the temperature region of from 320 to 360° C. as measured by a differential scanning calorimeter.
- the remelting temperature (Tr) can be determined from an endothermic peak appearing in a DSC curve in the range of from 50 to 370° C. as measured using a differential scanning calorimeter (for example, SHIMADZU DSC-50), wherein the DSC curve is prepared by elevating the temperature of the glass frit to 370° C. under conditions, for example, at a temperature elevation rate of 15° C./min in an atmosphere under atmospheric pressure.
- the temperature at the first point of inflection in the DSC curve of the glass frit indicates a glass transition temperature (Tg).
- Tg glass transition temperature
- the exothermic peak appears with a positive (+) value.
- the endothermic peak appears with a negative ( ⁇ ) value.
- a plurality of exothermic peaks may appear. Further, in the DSC curve of the glass frit, a plurality of endothermic peaks may appear.
- the glass frit used in the conductive paste of the present invention when the DSC curve has a plurality of endothermic peaks, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. is used, wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more among the endothermic peaks.
- the peak top of at least one endothermic peak having an endotherm of 20 J/g or more of the glass frit is present in the temperature region of from 320 to 360° C.
- the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve is present in the temperature region of from 320 to 360° C.
- the peak tops of any other endothermic peaks having an endotherm of 20 J/g or more may be present in the temperature region of higher than 360° C.
- the glass frit used in the conductive paste of the present invention has a remelting temperature (Tr) in the temperature region of from 320 to 360° C., wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- the glass transition temperature (Tg) and crystallization temperature (Tc) shown in the DSC curve of the glass frit are lower than the remelting temperature (Tr).
- the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.
- the glass frit contained in the conductive paste is molten, making it possible to bond together adherends.
- the conductive paste of the present invention can bond together adherends at a relatively low temperature (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), and therefore can be advantageously used in, for example, a semiconductor device and an integrated circuit device which are sensitive to heat.
- the remelting temperature (Tr) of the glass frit in the conductive paste is 320° C. or higher, and therefore a semiconductor device having a semiconductor chip and a substrate bonded together using the conductive paste can maintain the bond strength even when operated in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the glass frit used in the conductive paste of the present invention has a remelting temperature (Tr) in the temperature region of from 320 to 360° C., wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. Therefore, when the glass frit is heated to the remelting temperature (Tr) or higher and then cooled, crystals are further formed in the calcined film formed from the conductive paste.
- Tr remelting temperature
- the temperature read at the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter tends to be higher than the remelting temperature of 320 to 360° C.
- the reason for such a tendency is not clear, but is presumed as follows.
- the conductive paste is heated to a temperature which is higher than the crystallization temperature (Tc) of the glass frit and which is the remelting temperature (Tr) of the glass frit or higher, and then cooled.
- the crystallized glass which has undergone crystallization is remelted, and then is cooled to undergo further crystallization.
- One of the reasons why the temperature read at the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter tends to be higher than the remelting temperature of 320 to 360° C.
- the remelting temperature (Tr) of the glass frit used in the conductive paste of the present invention is a temperature indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter, and the endotherm of 20 J/g or more confirms the state in which the crystals in the glass frit are completely molten.
- Tr remelting temperature
- the conductive paste When the conductive paste is heated at a temperature as relatively low as the remelting temperature of the glass frit or higher (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), there is a possibility that the crystals in the glass frit contained in the conductive paste are not completely molten.
- the crystals of the glass frit contained in the conductive paste remain as such in the calcined film obtained by calcining the conductive paste, the conductive properties of the calcined film with the semiconductor chip and substrate may become poor.
- the bond strength between the semiconductor chip and the substrate may become poor. Furthermore, there is a possibility that the semiconductor device obtained by bonding a semiconductor chip to a substrate using the conductive paste cannot maintain the bond strength in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the glass frit preferably has a glass transition temperature (Tg) of 180° C. or lower, more preferably 170° C. or lower, further preferably 168° C. or lower, especially preferably 165° C. or lower.
- Tg glass transition temperature
- the glass frit preferably has a crystallization temperature (Tc) of 280° C. or lower, more preferably 270° C. or lower, further preferably 260° C. or lower, wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- the glass frit preferably has a crystallization temperature (Tc) of 160° C. or higher, more preferably 165° C. or higher, further preferably 170° C.
- the glass frit preferably has a crystallization temperature (Tc) in the temperature region of from 160 to 280° C., wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- the glass frit more preferably has a crystallization temperature (Tc) in the temperature region of from 170 to 270° C., wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- Tc crystallization temperature
- the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in the DSC curve is present in the temperature region of from 160 to 280° C.
- the peak tops of any other exothermic peaks having an exotherm of 20 J/g or more may be present in the temperature region of higher than 280° C.
- the glass frit preferably has a volume-based average particle diameter (median diameter) of 1 to 200 ⁇ m, more preferably 3 to 180 ⁇ m, further preferably 3 to 160 ⁇ m, especially preferably 5 to 150 ⁇ m.
- the glass frit can be obtained by placing raw materials for the glass frit in a porcelain crucible, and placing the crucible in a melt furnace (oven) to heat and melt the materials, obtaining molten glass, and feeding the molten glass between rollers made of stainless steel to shape the glass into a sheet form, and grinding the obtained sheet-form glass using a mortar, and subjecting the ground glass to sieve classification using, for example, 100-mesh and 200-mesh test sieves.
- the mesh size of the test sieve there is no particular limitation, and the glass frit having a smaller average particle diameter (median diameter) can be obtained by sieve classification using a fine-mesh test sieve.
- the average particle diameter of the glass frit can be measured using a laser diffraction-scattering type measurement apparatus for particle diameter and particle size distribution (for example, MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd.).
- the average particle diameter of the glass frit indicates a D50 (median diameter) in the volume cumulative distribution.
- the glass frit comprises (B-1) Ag 2 O, (B-2) V 2 O 5 , and (B-3) MoO 3 .
- the glass frit contains substantially no lead (Pb), arsenic (As), tellurium (Te), and antimony (Sb). Further, the glass frit contains substantially no thallium (Tl).
- an injurious material such as lead (Pb), arsenic (As), tellurium (Te), or antimony (Sb)
- a conductive paste having high safety such that the paste does not adversely affect the environment can be obtained.
- the glass frit contains Ag 2 O (B-1) and V 2 O 5 (B-2) in a total amount of 80 to 96% by mass in terms of the oxide, based on the mass of glass frit (B), wherein the mass ratio of Ag 2 O (B-1) to V 2 O 5 (B-2) (Ag 2 O/V 2 O 5 ) is 1.8 to 3.2.
- the amounts of the respective components contained in the glass frit are individually expressed in % by mass in terms of the oxide, based on the mass of the glass frit, unless otherwise specified.
- the glass frit contains Ag 2 O (B-1) and V 2 O 5 (B-2) in a total amount of 82 to 95% by mass, based on the mass of glass frit (B). Further, in the glass frit, the mass ratio of Ag 2 O (B-1) to V 2 O 5 (B-2) (Ag 2 O/V 2 O 5 ) is preferably 1.8 to 3.2, more preferably 1.95 to 2.7, further preferably 1.95 to 2.6. When the total amount of components (B-1) and (B-2) contained in the glass frit is 82 to 95% by mass, the glass frit having a relatively low remelting temperature (Tr) can be obtained.
- Tr remelting temperature
- the glass frit contains MoO 3 (B-3) in an amount of 4 to 10% by mass, based on the mass of the glass frit.
- the amount of component (B-3) contained in the glass frit is 4 to 10% by mass, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- the glass frit further comprises (B-4) at least one oxide selected from the group consisting of ZnO, CuO, TiO 2 , MgO, Nb 2 O 5 , BaO, Al 2 O 3 , SnO, and Fe 2 O 3 .
- the oxides as component (B-4) may be used individually or in combination.
- the glass frit contains MoO 3 (B-3) and component (B-4) in a total amount of 4 to 20% by mass, based on the mass of the glass frit.
- the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- the glass frit preferably contains component (B-4) in an amount of 0 to 12% by mass, more preferably 0.5 to 10% by mass, further preferably 1 to 8% by mass, especially preferably 2 to 8% by mass, in terms of the oxide, based on the mass of the glass frit.
- component (B-4) contained is in the range of from 0 to 12% by mass, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), and MoO 3 (B-3), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), and MoO 3 (B-3) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 80% by mass, more preferably 45 to 75% by mass, further preferably 50 to 70% by mass; the amount of V 2 O 5 (B-2) is preferably 16 to 40% by mass, more preferably 17 to 35% by mass, further preferably 18 to 30% by mass; and the amount of MoO 3 (B-3) is preferably 4 to 10% by mass, more preferably 5 to 9% by mass, more preferably 6 to 8% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and ZnO (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and ZnO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of ZnO (B-4) is preferably 0.5 to 12% by mass, more preferably 1 to 12% by mass, and the mass ratio of Ag 2 O (B-1) to V 2 O 5 (B-2) (Ag 2 O/V 2 O 5 ) is preferably 1.95 to 2.6.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and CuO (B-4)
- Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and CuO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of CuO (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 1 to 8% by mass, especially preferably 1 to 4% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and TiO 2 (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and TiO 2 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass;
- the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass;
- the amount of MoO 3 (B-3) is preferably 4 to 10% by mass;
- the amount of TiO 2 (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 4 to 10% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and MgO (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and MgO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass;
- the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass;
- the amount of MoO 3 (B-3) is preferably 4 to 10% by mass;
- the amount of MgO (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 2 to 8% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Nb 2 O 5 (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Nb 2 O 5 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of Nb 2 O 5 (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 1 to 8% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and BaO (B-4)
- Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and BaO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of BaO (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 1 to 2% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Al 2 O 3 (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Al 2 O 3 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass;
- the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass;
- the amount of MoO 3 (B-3) is preferably 4 to 10% by mass, more preferably 5 to 8% by mass, further preferably 6 to 8% by mass;
- the amount of Al 2 O 3 (B-4) is preferably 0.5 to 12% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and SnO (B-4), it is preferred that Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and SnO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of SnO (B-4) is preferably 1 to 12% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Fe 2 O 3 (B-4)
- Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and Fe 2 O 3 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO 3 (B-3) is preferably 4 to 10% by mass; and the amount of Fe 2 O 3 (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 2 to 8% by mass.
- the glass frit substantially comprises Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), ZnO (B-4), and CuO (B-4′)
- Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), ZnO (B-4), and CuO (B-4′) have their respective compositions shown below, based on the mass of the glass frit.
- the amount of Ag 2 O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass;
- the amount of V 2 O 5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass;
- the amount of MoO 3 (B-3) is preferably 4 to 10% by mass;
- the amount of ZnO (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 2 to 8% by mass;
- solvents there can be used one type or two or more types of solvents selected from alcohols (for example, terpineol, ⁇ -terpineol, and ⁇ -terpineol), esters (for example, hydroxyl group-containing esters, such as 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate and butyl carbitol acetate), paraffin mixtures (for example, Linpar, manufactured by Condea Chemie GmbH), and polyhydric alcohols (for example, 2-ethyl-1,3-hexanediol).
- alcohols for example, terpineol, ⁇ -terpineol, and ⁇ -terpineol
- esters for example, hydroxyl group-containing esters, such as 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate and butyl carbitol acetate
- paraffin mixtures for example, Linpar, manufactured by Condea Che
- one type or two or more types of, for example, a resin, a binder, and a filler may be added to the solvent.
- the conductive paste of the present invention contains at least one metal oxide selected from the group consisting of SnO, ZnO, In 2 O 3 , and CuO. This metal oxide is not the oxide contained in the glass frit.
- the bond strength can be further improved, making it possible to obtain a semiconductor device which can maintain the bond strength even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- a plasticizer for example, a plasticizer, an anti-foaming agent, a dispersant, a leveling agent, a stabilizer, and an adhesion promoter can be further incorporated into the paste if necessary.
- a plasticizer one selected from, for example, phthalates, glycolates, phosphates, sebacates, adipates, and citrates can be used.
- the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 90% by mass, glass frit (B) in an amount of 5 to 35% by mass, and solvent (C) in an amount of 5 to 12% by mass.
- the unit “% by mass” for the respective components indicates amounts of the respective components contained, based on the mass of the conductive paste (100% by mass).
- the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 90% by mass, glass frit (B) in an amount of 5 to 35% by mass, and solvent (C) in an amount of 5 to 12% by mass, by heating the conductive paste to the remelting temperature (Tr) of glass frit (B) or higher, the conductive particles are diffused through the molten conductive paste to suffer deposition, making it possible to form a calcined film having excellent conductive properties.
- the conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- the conductive paste of the present invention contains metal oxide (D)
- the conductive paste contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0 to 5% by mass.
- the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0.1 to 5% by mass.
- the unit “% by mass” for the respective components indicates amounts of the respective components contained, based on the mass of the conductive paste (100% by mass).
- the conductive paste contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0 to 5% by mass, by heating the conductive paste to the remelting temperature (Tr) of glass frit (B) or higher, the conductive particles are diffused through the molten conductive paste to suffer deposition, making it possible to form a calcined film having excellent conductive properties.
- the conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- the mass ratio of conductive particles (A) and glass frit (B) ⁇ conductive particles (A):glass frit (B) ⁇ is preferably 50:50 to 98:2, more preferably 60:40 to 90:10, further preferably 65:35 to 85:15, especially preferably 70:30 to 80:20.
- the mass ratio of conductive particles (A) and glass frit (B) ⁇ conductive particles (A):glass frit (B) ⁇ is 50:50 to 98:2
- the conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- the method for producing the conductive paste of the present invention has a step for mixing conductive particles, a glass frit, and a solvent with one another.
- the conductive paste can be produced by adding to a solvent conductive particles, a glass frit, and optionally another additive and/or additive particles, and mixing and dispersing them in the solvent.
- Mixing can be performed by means of, for example, a planetary mixer.
- Dispersing can be performed by means of a three-roll mill. The methods for mixing and dispersing are not limited to these methods, and various known methods can be used.
- the method of the present invention for producing a semiconductor device comprises the steps of: applying the conductive paste of the present invention to a substrate and/or a semiconductor chip; placing the semiconductor chip on the substrate through the conductive paste; heating the conductive paste to the remelting temperature of glass frit (B) contained in the conductive paste or higher to sinter conductive particles
- a substrate and a semiconductor chip are placed through the conductive paste and the conductive paste is heated to the remelting temperature (Tr) of glass frit (B) contained in the conductive paste or higher, so that the glass frit is molten in the conductive paste and further the conductive particles are diffused through the conductive paste and sintered to exhibit excellent conductive properties, making it possible to electrically connect the substrate and the semiconductor chip to each other.
- Tr remelting temperature
- FIG. 1 is a diagram showing the steps in an embodiment of the method of the present invention for producing a semiconductor device.
- FIG. 1( a ) shows an example of the method of applying conductive paste 1 to a semiconductor chip.
- gap 2 for containing the conductive paste is formed using polyimide tapes at the ends of semiconductor chip 3 .
- Conductive paste 1 is applied to semiconductor chip 3 by dispensing the paste onto the surface of the semiconductor chip using, for example, a mechanical dispenser (manufactured by Musashi Engineering, Inc.).
- the method of applying the conductive paste of the present invention is not limited to the dispensing or printing method, and the conductive paste of the present invention can be applied by other methods.
- FIG. 1( b ) shows the state in which semiconductor chip 3 is placed on substrate 4 through conductive paste 1 .
- FIG. 1( c ) shows the state in which conductive paste 1 bonding semiconductor chip 3 to substrate 4 is calcined.
- semiconductor chip 3 is placed on substrate 4 through conductive paste 1 .
- conductive paste 1 is then calcined using, for example, a reflow oven. Conductive paste 1 is heated to the remelting temperature of the glass frit contained in conductive paste 1 or higher.
- conductive paste 1 the conductive particles contained in conductive paste 1 are sintered, so that calcined film 1 ′ electrically connecting semiconductor chip 3 and substrate 4 to each other is obtained.
- the conductive paste is calcined by, for example, inserting the substrate, conductive paste, and semiconductor chip into, for example, a reflow oven, and elevating the temperature to 350 to 400° C. at a temperature elevation rate of 5 to 20° C./min using a heat lamp at 5 to 20° C. and performing calcination for 1 to 30 minutes.
- the substrate, conductive paste, and semiconductor chip are preferably calcined at a temperature of 370° C. or lower at a temperature elevation rate of 15 to 20° C./min for 5 to 10 minutes.
- the remelting temperature of the glass frit is 360° C.
- calcination at a temperature of higher than 360 to 370° C. for 5 to 10 minutes is preferably performed. Then, the substrate, conductive paste, and semiconductor chip are removed from the reflow oven, and gradually cooled.
- FIG. 1( d ) shows semiconductor device 5 .
- semiconductor chip 3 and substrate 4 are electrically connected to each other due to calcined film 1 ′ obtained by calcining the conductive paste, so that semiconductor device 5 is produced.
- Calcined film 1 ′ formed between semiconductor chip 3 and substrate 4 contains silver deposited in calcined film 1 ′ and crystallized glass caused by crystallization of part of the glass frit. By virtue of the silver deposited in calcined film 1 ′, the semiconductor chip and the substrate are electrically connected to each other by calcined film 1 ′.
- semiconductor device 5 having the semiconductor chip and the substrate bonded by calcined film 1 ′ can maintain the bond strength between semiconductor chip 3 and substrate 4 even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the method of the present invention for producing a semiconductor device comprises the steps of: applying the conductive paste of the present invention to a substrate and/or a semiconductor chip; placing the semiconductor chip on the substrate through the conductive paste; heating the conductive paste to reduce Ag 2 O (B-1) in glass frit (B) contained in the conductive paste; further heating the conductive paste to the remelting temperature of glass frit (B) contained in the conductive paste or higher; and gradually cooling the conductive paste to cause crystals to be precipitated.
- a substrate and a semiconductor chip are placed through the conductive paste and the conductive paste is heated, so that Ag 2 O (B-1) in glass frit (B) contained in the conductive paste is reduced.
- Ag 2 O has a reducing temperature of about 140 to 200° C.
- the conductive paste is heated to the temperature at which Ag 2 O is reduced or higher (at a temperature of higher than about 200° C.) to reduce Ag 2 O, causing silver (Ag) contained in glass frit (B) to suffer deposition.
- the conductive paste is further heated to the remelting temperature of the glass frit contained in the conductive paste or higher (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), so that the glass frit in the conductive paste is molten.
- the conductive paste is gradually cooled to obtain a calcined film.
- silver derived from the glass frit contained in the conductive paste suffers deposition.
- the silver as well as crystallized glass caused by recrystallization of part of the glass frit suffer deposition.
- adherends can be bonded together at a temperature which is the remelting temperature of the glass frit contained in the conductive paste or higher and whish is a low temperature such that the heat energy consumption can be reduced (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.).
- the conductive paste is heated and cooled and, in the resultant calcined film, silver and crystals derived from the glass frit contained in the conductive paste suffer deposition.
- the melting temperature of the calcined film tends to be higher than the remelting temperature (Tr) of the glass frit.
- the calcined film can maintain the bond strength between the semiconductor chip and the substrate even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the conductive paste of the present invention and the method for producing a semiconductor device using the same can be advantageously used in a die attach material for bonding a SiC semiconductor chip having a high junction temperature, as compared to a silicon (Si) semiconductor chip. Further, the conductive paste of the present invention and the method for producing a semiconductor device using the same can reduce the heat energy consumption for bonding, and further can provide a semiconductor device which can maintain the bond strength even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.). By the conductive paste of the present invention and the method for producing a semiconductor device using the same, there can be provided a semiconductor device having excellent thermal cycling properties and excellent storage properties in a high-temperature environment as well as high reliability.
- a combination of a semiconductor chip (die) and a substrate which can be bonded by the present invention there can be mentioned a combination of a chip having a non-metallized surface and a substrate having a non-metallized surface.
- Examples of such combinations include a combination of a Si chip (die) and a Si substrate, a combination of a SiC chip (die) and a Si substrate, and a combination of a Si chip and a ceramic (Al 2 O 3 ) substrate.
- a combination of a semiconductor chip (die) and a substrate there can be mentioned a combination of a chip having a metallized surface and a substrate having a metallized surface.
- examples of such combinations include a combination of a Au-plated SiC chip (die) and a Au-plated substrate, and a combination of a Au- or Ag-plated Si chip and a Ag-plated copper substrate.
- a combination of a semiconductor chip (die) and a substrate there can be mentioned a combination of a chip having a metallized surface and a substrate having a non-metallized surface.
- examples of such combinations include a combination of a Au-plated Si chip and a ceramic (Al 2 O 3 ) substrate.
- the method of applying the conductive paste to a substrate is not limited to dispending or printing, and various methods conventionally known can be used.
- the temperature elevation to, for example, 370° C. can be performed under atmospheric pressure in an atmosphere which is not limited to an inert gas atmosphere, such as a nitrogen gas atmosphere.
- a semiconductor chip and a substrate can be bonded to each other without applying a pressure from the outside or applying a load from the outside to the semiconductor chip.
- the glass frit is first described below.
- the glass frit used in the conductive paste of the present invention is not limited by the following Examples.
- Table 1 shows a glass frit substantially comprising Ag 2 O (B-1), V 2 O 5 (B-2), and MoO 3 (B-3), and a glass frit substantially comprising Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and ZnO (B-4).
- Table 2 shows a glass frit substantially comprising Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and one oxide (B-4) of TiO 2 , MgO, Nb 2 O 5 , BaO, Al 2 O 3 , SnO, and Fe 2 O 3 .
- Table 3 shows a glass frit substantially comprising Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), and CuO (B-4), and a glass frit substantially comprising Ag 2 O (B-1), V 2 O 5 (B-2), MoO 3 (B-3), ZnO (B-4), and CuO (B-4′).
- Tables 1 to 3 the values shown for components (B-1) to (B-4) are expressed in % by mass.
- the method for producing the glass frit is as follows.
- oxide powders shown in Tables 1 to 3 were weighed and mixed together, and placed in a crucible (for example, a porcelain crucible, manufactured by Fisher Brand; high temperature porcelain; size: 10 mL).
- the crucible containing therein the raw materials for glass frit was placed in an oven (oven; manufactured by JELENKO, JEL-BURN JM, MODEL: 335300).
- the temperature of the raw materials for glass frit was elevated in the oven to the melt temperature indicated at the column “Melt Temp” shown in each of Tables 1 to 3, and the melt temperature was maintained so that the raw materials were satisfactorily molten.
- the crucible containing therein the molten raw materials for glass frit was removed from the oven, and the molten raw materials for glass frit were uniformly stirred. Subsequently, the molten raw materials for glass frit were placed on two rolls made of stainless steel having a diameter of 1.86 inch and rotating at room temperature, and the two rolls were rotated by a motor (BODUNE. D,C. MOTOR 115 V) to knead the molten raw materials for glass frit while quickly cooing at room temperature, forming sheet-form glass.
- a motor BODUNE. D,C. MOTOR 115 V
- the sheet-form glass was ground using a mortar and rendered in a uniformly dispersed state, and subjected to sieve classification using a 100-mesh sieve and a 200-mesh sieve to produce a sieved glass frit.
- sieve classification so that the glass frit was passed through the 100-mesh sieve and remained on the 200-mesh sieve, the glass frit having an average particle diameter of 149 ⁇ m (median diameter) was obtained.
- the mesh size of the sieve used for glass frit the glass frit having a larger average particle diameter or a smaller average particle diameter can be obtained.
- a DSC curve was measured using a differential scanning calorimeter under the conditions shown below.
- a glass transition temperature (Tg), a crystallization temperature (Tc), and a remelting temperature (Tr) were determined from the DSC curve as measured by a differential scanning calorimeter.
- the glass transition temperature (Tg), crystallization temperature (Tc), and remelting temperature (Tr) of each glass frit are shown in Tables 1 to 3.
- a DSC curve in the temperature region of from about 50 to about 370° C. was measured using a differential scanning calorimeter DSC-50, manufactured by SHIMADZU Corporation, under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min.
- a glass transition temperature (Tg) was determined from the temperature at the first point of inflection in the DSC curve. When no point of inflection was recognized, symbol “-” indicating unmeasurable was shown in the table.
- a crystallization temperature (Tc) was determined as a temperature indicated by the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in a DSC curve, as measured using a differential scanning calorimeter (DSC-50, manufactured by SHIMADZU Corporation) under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min.
- DSC-50 differential scanning calorimeter
- a remelting temperature (Tr) was determined as a temperature indicated by the peak top of at least one endothermic peak having an endotherm of ( ⁇ ) 20 J/g or more in a DSC curve, as measured using a differential scanning calorimeter (DSC-50, manufactured by SHIMADZU Corporation) under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min.
- DSC-50 differential scanning calorimeter
- the obtained glass frits were individually visually observed, and evaluated according to the following criteria: Excellent: The glass frit is satisfactorily homogeneous; Good: The glass frit is homogeneous; Fair: The glass frit is slightly heterogeneous; and void: A void is visually recognized in the glass frit.
- Excellent The glass frit is satisfactorily homogeneous; Good: The glass frit is homogeneous; Fair: The glass frit is slightly heterogeneous; and void: A void is visually recognized in the glass frit.
- Tables 1 to 3 The results are shown in Tables 1 to 3.
- Reference 3 8 9 10 Reference 4 11 12 No SC128-4 SC129-4 SC157-5 SC158-5 SC130-4 SC131-4 SC132-4 Lot 060611 060611 062011 062011 060611 060611 061411 mesh 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag 2 O 62.73 62.04 61.36 60.67 62.73 62.04 60.67 (B-2) V 2 O 5 28.77 28.46 28.14 27.83 28.77 28.46 27.83 (B-3) MoO 3 7.50 7.50 7.50 7.50 7.50 7.50 (B-4) ZnO CuO TiO 2 SiO 2 Bi 2 O 3 Al 2 O 3 SnO MnO 2 MgO 1.00 2.00 3.00 4.00 Nb 2 O 5 Fe 2 O 3 1.00 2.00 4.00 BaO Others TeO 2 Sb 2 O 3 Total 100.00 100.00 100.00 100.00 100.00 100.00 100.00 100.00 Ag 2 O/V 2 O 5 2.18 2.18 2.18 2.18 2.18
- FIG. 2 shows a DSC curve of glass frit No. 25 ⁇ SC181-4 (100713) ⁇ as measured by a differential scanning calorimeter.
- the glass frit had an average particle diameter (D50) of 13.3 ⁇ m.
- the glass transition temperature (Tg) was 144° C.
- the crystallization temperature (Tc) was 189° C.
- the remelting temperature (Tr) was 342° C. or 352° C.
- the crystallization temperature (Tc cool) upon gradually cooling after removal from the oven was 326° C.
- the reason that there is a very small difference between glass frit No. 25 (No. SC181-4, Lot. 071411) shown in Table 1 and glass frit No. 25 (No. SC181-4, Lot. 100713) shown in FIG. 2 with respect to each of the glass transition temperature (Tg), crystallization temperature (Tc), and remelting temperature (Tr) resides in the difference of the lot number (Lot) for glass frit No. 25
- the materials for conductive paste having the formulation shown in Table 4 were kneaded by means of a three-roll mill to prepare a conductive paste.
- a thermal resistance (Rth) test was performed to measure an electric resistivity, evaluating the electrical conductive properties.
- a die shear stress (DSS) test was performed to measure a bond strength, evaluating the heat resistance.
- a heat resistant tape was put on slide glass, and a groove having a width of 3 mm, a length of 60 mm, and a thickness of about 200 ⁇ m was formed in the tape, and the conductive paste was applied into the groove by squeezing, and calcined at 370° C. for 10 minutes. Then, an electric resistance between both ends of the resultant coating film was measured by means of a digital multimeter, and a dimension of the coating film was measured, and an electric resistivity was calculated from the measured values.
- the conductive paste was dispensed in an appropriate amount on an alumina sheet, and a 2 mm ⁇ 2 mm silicon chip was mounted on the dispensed paste, and a downward load was applied to the chip so that the thickness of the bonding portion (conductive paste) became about 30 ⁇ m using a spacer, followed by calcination at 370° C. for 10 minutes, to prepare a specimen.
- the prepared specimen was placed in an environment at 300° C. and subjected to die shear stress (DSS) test (300° C.) at a rate of 200 ⁇ sec using Multipurpose Bondtester, manufactured by Dage Japan Co., Ltd., to measure a bond strength.
- DSS die shear stress
- the conductive pastes in Examples maintained the bond strength at 8 kgf or more even in an environment at a temperature as relatively high as 300° C.
- the conductive paste in Comparative Example 1 using the glass frit in Reference 11 and the conductive paste in Comparative Example 2 using the glass frit in Reference Example 12 exhibited a bond strength of less than 8 kgf in an environment at a temperature as relatively high as 300° C.
- the remelting temperature indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter is not present in the temperature region of from 320 to 360° C.
- the glass frit in Reference 12 comprises tellurium oxide (TeO 2 ) as a raw material.
- Conductive pastes having the respective formulations shown in Table 7 were produced, and a thermal resistance (Rth) test was performed with respect to each of the produced conductive pastes to measure an electric resistivity, evaluating the electrical conductive properties. Further, with respect to each of the conductive pastes in Examples and Comparative Examples, a die shear stress (DSS) test was performed to measure a bond strength, evaluating the heat resistance.
- Rth thermal resistance
- DSS die shear stress
- FIG. 3 shows scanning electron microscope (SEM) photomicrographs of the silver particles used in Examples 9 to 14, taken at magnifications of 1,000 times, 2,000 times, and 5,000 times.
- Silver particles P318-8, K-0082P (manufactured by Metalor Technologies Corporation); The mass ratio of P318-8 silver particles and K-0082P silver particles (P318-8:K-0082) is 50:50.
- Glass frit No. 25 (SC181-4);
- the specific surface area (Specific surface) of the glass frit measured by a BET method and the particle diameter of the glass frit measured by a laser diffraction-scattering method using MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd., are shown in Table 6.
- FIG. 4 shows scanning electron microscope (SEM) photomicrographs of glass frit No. 25 (SC181-4), taken at magnifications of (a) 1,000 times and (b) 500 times, wherein glass frit No. 25 was obtained after grinding by means of a ball mill for 48 hours and subsequent sieve classification using a 400-mesh sieve.
- Zinc oxide Zinc oxide (ZnO) powder (manufactured by Stream Chemicals, Inc.), which was added in an amount of 0.55% by weight in order to improve the die attach properties.
- the silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulation shown in Table 7 and kneaded by means of a three-roll mill to prepare a conductive paste.
- Table 7 shows the formulations of the conductive pastes used in Examples 9 to 14, the sizes of glass frits, and the results of the DSS test and Rth test.
- Example 9 Using the conductive paste in Example 9 (MP12-102-1), the semiconductor chip (die) and substrate shown below were bonded together, and a die shear stress (DSS) test at room temperature or a thermal resistance (Rth) test was performed in the same manner as in Examples 1 to 8. The results are shown in Table 7. In Table 7, the die shear stress (DSS) test at room temperature is indicated by “RT”, and the die shear stress (DSS) test at 300° C. is indicated by “300 C”.
- indications ‘0.25′′’, ‘0.1′′’, ‘0.2′′’, ‘0.3′′’, and ‘0.4′′’ mean a size of the die (chip) or substrate.
- ‘0.25′′’ indicates a 0.25 inch ⁇ 0.25 inch die (chip)
- ‘0.1′′’ indicates a 0.1 inch ⁇ 0.1 inch die (chip)
- ‘0.2′′’ indicates a 0.2 inch ⁇ 0.2 inch die (chip)
- ‘0.3′′ ’ indicates a 0.3 inch ⁇ 0.3 inch die (chip).
- ‘0.4′′’ indicates a 0.4 inch ⁇ 0.4 inch substrate.
- Conductive pastes (MP12-65-2, MP12-101-1, MP12-102-1, MP12-103-1, MP12-105-1) having different zinc oxide (ZnO) contents in the range of 0.14 to 2.2% by weight were individually produced.
- Silver particles P318-8, K-0082P (manufactured by Metalor Technologies Corporation); The mass ratio of P318-8 silver particles and K-0082P silver particles (P318-8:K-0082P) is 50:50.
- Glass frit Glass frit No. 25 (SC181-4); 18.4% by weight Organic solvent: Terpineol; 8.1% by weight
- the silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulations shown in Table 6 and kneaded by means of a three-roll mill to prepare conductive pastes.
- the electric resistivities of the conductive pastes are shown in Table 7.
- the chip (die) and substrate shown below were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen.
- the results are shown in Table 7.
- Conductive paste (MP12-67-1) using the silver particles in which the mass ratio of SA-1507 and K-0082P (SA-1507:K-0082P) is 50:50.
- Conductive paste (MP12-67-2) using the silver particles in which the mass ratio of P318-8 and K-0082P (P318-8:K-0082P) is 50:50.
- Zinc oxide (ZnO) 0.14% by weight
- Glass frit Glass frit No. 25 (SC181-4); 9.23% by weight
- Organic solvent Terpineol; 7.7% by weight
- the silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulations shown in Table 6 and kneaded by means of a three-roll mill to prepare conductive pastes.
- the electric resistivities of the conductive pastes are shown in Table 7.
- the Si chip (die) and Si substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen (0.3′′ Si/0.4′′ Si), and a DSS test (RT) and an Rth test were conducted with respect to the specimen.
- the results are shown in Table 7.
- the mass ratio of P318-8 and K-0082P was changed in the range of from 1:1 to 3:1.
- the conductive paste (MP12-99-1) and conductive paste (MP12-99-2) contain glass frit No. 25 (SC181-4) in an amount of 18.4% by weight and contain no zinc oxide (ZnO).
- the conductive paste (MP12-101-1) and conductive paste (MP12-101-2) contain glass frit No. 25 (SC181-4) in an amount of 18.4% by weight and zinc oxide (ZnO) in an amount of 0.27% by weight.
- the chip (die) and substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen.
- Silver particles The mass ratio of P318-8 and K-0082P contained (P318-8:K-0082P) is 1:1.
- Zinc oxide Zinc oxide (ZnO); 0.14% by weight
- the chip (die) and substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen.
- the results are shown in Table 7.
- the conductive paste (MP12-102-1) exhibited excellent bond strength between the metallized chip (die) or non-metallized chip (die) and the substrate and excellent electric resistivity.
- the conductive pastes (MP12-65-2, MP12-101-1, MP12-102-1, MP12-103-1, MP12-105-1) having zinc oxide (ZnO) added thereto exhibited excellent electric resistivity and excellent bond strength.
- the conductive pastes (MP12-67-1, MP12-67-2) using silver particles in which the mass ratio of P318-8 and K-0082P (P318-8:K-0082P) is 50:50 exhibited excellent properties.
- the conductive pastes (MP12-99-1, MP12-99-2) containing no zinc oxide (ZnO) were slightly increased in electric resistivity, and thus exhibited poor electric resistivity, as compared to the conductive paste having added thereto zinc oxide (ZnO).
- the conductive paste of the present invention is advantageous not only in that an injurious material, such as lead (Pb), arsenic (As), tellurium (Te), or antimony (Sb), is substantially not contained in the paste, but also in that, for example, a semiconductor chip and a substrate can be bonded by the paste at a relatively low temperature (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.) to obtain a semiconductor device.
- a relatively low temperature for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.
- the semiconductor device obtained by bonding a semiconductor chip to a substrate using the conductive paste of the present invention can maintain the bond strength between the semiconductor chip and the substrate even when the device is present in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- the conductive paste of the present invention can be advantageously used in forming a die attach material, a sealing material, or an electrode which can be applied to electronic parts, such as a ceramic package containing therein an integrated circuit device and a display device, i.e., objects to be bonded or adherends which are extremely sensitive to heat.
- the conductive paste of the present invention and the method for producing a semiconductor device using the same can be advantageously used in a die attach material for bonding a SiC semiconductor chip which causes only a small loss in the electric power conversion and which can be stably operated even at high temperatures, and thus are of great industrial significance.
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Abstract
A conductive paste including (A) conductive particles, (B) a glass frit containing substantially no lead, arsenic, tellurium, and antimony, and (C) a solvent. The glass frit (B) has a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by a peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. The conductive paste can also include at least one metal oxide (D) selected from the group consisting of tin oxide, zinc oxide, indium oxide, and copper oxide. The glass frit (B) can further include (B-1) Ag2O, (B-2) V2O5, and (B-3) MoO3. The conductive paste can achieve binding at a relatively low temperature (such as 370° C. or lower) and maintains a bond strength at a relatively high temperature (such as 300 to 360° C.).
Description
- The present invention relates to a conductive paste comprising low melting-point glass which does not contain an injurious material, such as lead, and a method for producing a semiconductor device using the conductive paste.
- A die attach material for bonding, for example, a silicon carbide (SiC) chip to a substrate, and a sealing material and a conductive paste for electronic parts, such as a ceramic package containing therein an integrated circuit device, and a display device, are desired to achieve bonding at relatively low temperatures, taking into consideration the properties of objects to be bonded or to be sealed which are extremely sensitive to heat. As a conductive paste which can achieve bonding at low temperatures, a composition comprising glass having a low melting point is used.
- Conventionally, as low melting-point glass, PbO—B2O3 glass having a low melting point has been known.
Patent document 1 discloses, as glass having a low softening point, glass comprising 20 to 70% of silver oxide, 10 to 70% of an oxide of vanadium or molybdenum, and 10 to 70% of an oxide of a semi-metal selected from the group consisting of phosphorus, germanium, arsenic, antimony, bismuth, and tellurium (patent document 1). - With respect to glass which can be calcined at a temperature lower than the calcination temperature for the conventional low melting-point PbO—B2O3 glass,
patent document 2 discloses low melting-point glass comprising Ag2O: 8 to 20%, MoO3: 20 to 35%, ZnO: 1 to 6%, TeO2: 30 to 55%, and V2O5: 5 to 19% (patent document 2). - With respect to glass used in, for example, a die attach material, there is disclosed glass comprising, for example, Ag2O in an amount of about 40 to 65% by mass, V2O5 in an amount of about 15 to 35% by mass, and at least one oxide selected from the group consisting of TeO2, PbO2, and Pb3O4 in an amount of about 0 to 50% by mass, in terms of the oxide, wherein the glass forms a Ag2O—V2O5—TeO2—PbO2 crystal (for example, patent document 3). The glass disclosed in
patent document 3 is used in, for example, a ceramic package containing therein a temperature-sensitive integrated circuit device as a paste for bonding the temperature sensitive device at a low temperature (for example, at 350° C.). - The cited
document 4 discloses a glass composition which comprises Tl2O3 in an amount of 60 to 82.5% by weight, V2O5 in an amount of about 2.5 to 27.5% by weight, and P2O5 in an amount of about 2.5 to 17.5% by weight, in terms of the oxide, and which has a boundary temperature of about 350° C. or lower at which vitrification occurs (patent document 4).Patent document 4 discloses that the glass composition has a boundary temperature of 460° C. or lower at which no devitrification occurs. The devitrification means that molten glass suffers crystal deposition of part of the glass having a certain composition during, for example, solidification of the molten glass upon cooling. -
Patent document 5 discloses a paste comprising conductive metal particles, a glass composition, an organic solvent, and a resin.Patent document 5 has a description showing that the glass composition specifically preferably has a remelting temperature of 275° C. or lower.Patent document 5 has a description showing that when the glass composition contained in the paste has a high remelting temperature, the amount of the glass phase which satisfactorily wets the surface of an adherend is reduced, so that the bond strength of the paste becomes poor. The citeddocument 5 discloses that the combination of TeO2 and PbO2 in the respective optimal amounts provides glass having crystalline properties and low-temperature properties desirable in respect of the structure finally obtained. - Patent document 1: Japanese Unexamined Patent Publication No. Sho 51-138711
- Patent document 2: Japanese Unexamined Patent Publication No. Hei 8-259262
- Patent document 3: Japanese Patent Application prior-to-examination Publication (kohyo) No. Hei 8-502468
- Patent document 4: U.S. Pat. No. 4,933,030 specification
- Patent document 5: U.S. Pat. No. 5,543,366 specification
- However, it is likely that the low melting-point PbO—B2O3 glass and low melting-point glass disclosed in
patent documents 1 to 3 and 5 contain an injurious material, such as lead (Pb), arsenic (As), antimony (Sb), or tellurium (Te). Also inpatent document 4, thallium (Tl) can become an injurious material. In recent years, concern about the environment and the like is growing, and therefore a conductive paste using low melting-point glass containing no injurious material is desired. Further, the conductive paste is desired to use low melting-point glass that can be applied to a semiconductor device and an integrated circuit device which are extremely sensitive to heat. - Further, in recent years, a SiC semiconductor device which causes only a small loss in the electric power conversion and which can be stably operated even at high temperatures is attracting attention. The SiC semiconductor device has a high junction temperature, as compared to a silicon (Si) semiconductor device. In such a SiC semiconductor device, with respect to the conductive paste used in a die attach material for bonding together the semiconductor chip and a substrate, one which can achieve bonding at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature is desired. On the other hand, there is desired the conductive paste which can maintain the bond strength between the SiC semiconductor chip and the substrate bonded by the paste even in the operation environment for device at a relatively high temperature (for example, at 300 to 350° C.). The glass composition contained in the paste disclosed in
patent document 5 specifically has a remelting temperature of 275° C. or lower. With respect to the semiconductor device obtained by bonding a semiconductor chip to a substrate using the paste disclosed inpatent document 5, it is presumed that when the semiconductor device is placed in an environment at a relatively high temperature (for example, at 300 to 350° C.), the bond strength between the semiconductor chip and the substrate becomes poor. - Accordingly, a task of the present invention is to provide a conductive paste comprising low melting-point glass which does not contain an injurious material, such as lead, arsenic, tellurium, or antimony, wherein the conductive paste is advantageous not only in that the paste can achieve bonding at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature, but also in that the paste can maintain the bond strength even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- The
present invention 1 is directed to a conductive paste which comprises (A) conductive particles, (B) a glass frit containing substantially no lead, arsenic, tellurium, and antimony, and (C) a solvent, the glass frit (B) having a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. - The
present invention 2 is directed to the conductive paste of thepresent invention 1, which further comprises (D) at least one metal oxide selected from the group consisting of tin oxide, zinc oxide, indium oxide, and copper oxide. - The
present invention 3 is directed to the conductive paste of thepresent invention 1, wherein the conductive particles (A) are contained in an amount of 60 to 90% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, and the solvent (C) is contained in an amount of 5 to 12% by mass, based on the mass of the conductive paste. - The
present invention 4 is directed to the conductive paste of thepresent invention 2, wherein the conductive particles (A) are contained in an amount of 60 to 85% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, the solvent (C) is contained in an amount of 5 to 10% by mass, and the metal oxide (D) is contained in an amount of 0 to 5% by mass, based on the mass of the conductive paste. - The
present invention 5 is directed to the conductive paste of any one of thepresent inventions 1 to 4, wherein the glass frit (B) comprises (B-1) Ag2O, (B-2) V2O5, and (B-3) MoO3. - The present invention 6 is directed to the conductive paste according to the
present invention 5, wherein the glass frit (B) further comprises (B-4) at least one oxide selected from the group consisting of ZnO, CuO, TiO2, MgO, Nb2O5, BaO, Al2O3, SnO, and Fe2O3. - The present invention 7 is directed to the conductive paste of the
present invention 5 or 6, wherein the glass frit (B) contains Ag2O (B-1) and V2O5 (B-2) in a total amount of 80 to 96% by mass in terms of the oxide, based on the mass of the glass frit (B), wherein the mass ratio of Ag2O (B-1) to V2O5 (B-2) (Ag2O/V2O5) is 1.8 to 3.2. - The present invention 8 is directed to the conductive paste of any one of the
present inventions 5 to 7, wherein the glass frit (B) contains MoO3 (B-3) in an amount of 4 to 10% by mass in terms of the oxide, based on the mass of the glass frit (B). - The present invention 9 is directed to the conductive paste of any one of the present inventions 6 to 8, wherein the glass frit (B) contains MoO3 (B-3) and component (B-4) in a total amount of 4 to 20% by mass in terms of the oxide, based on the mass of the glass frit (B).
- The present invention 10 is directed to the conductive paste according to any one of the
present inventions 5 to 9, wherein the glass frit (B) contains Ag2O (B-1) in an amount of 40 to 80% by mass, V2O5 (B-2) in an amount of 16 to 40% by mass, and MoO3 (B-3) in an amount of 4 to 10% by mass, each in terms of the oxide, based on the mass of the glass frit (B). - The present invention 11 is directed to the conductive paste of any one of the present inventions 6 to 10, wherein the glass frit (B) contains component (B-4) in an amount of 0 to 12% by mass in terms of the oxide, based on the mass of the glass frit (B).
- The present invention 12 is directed to the conductive paste of any one of the
present inventions 1 to 11, wherein the conductive particles (A) are silver. - The present invention 13 is directed to the conductive paste of any one of the
present inventions 1 to 12, wherein the mass ratio of the conductive particles (A) and the glass frit (B) (conductive particles:glass frit) is 50:50 to 98:2. - The present invention 14 is directed to a method for producing a semiconductor device, wherein the method comprises the steps of:
- applying the conductive paste of any one of the
present inventions 1 to 13 to a substrate and/or a semiconductor chip; - placing the semiconductor chip on the substrate through the conductive paste;
- heating the conductive paste to the remelting temperature of the glass frit (B) contained in the conductive paste or higher to sinter the conductive particles (A) contained in the conductive paste so that the semiconductor chip and the substrate are electrically connected to each other; and
- gradually cooling the conductive paste.
- The present invention 15 is directed to a method for producing a semiconductor device, wherein the method comprises the steps of:
- applying the conductive paste of any one of the
present inventions 1 to 13 to a substrate and/or a semiconductor chip; - placing the semiconductor chip on the substrate through the conductive paste;
- heating the conductive paste to reduce Ag2O (B-1) in the glass frit (B) contained in the conductive paste;
- further heating the conductive paste to the remelting temperature of the glass frit (B) contained in the conductive paste or higher; and
- gradually cooling the conductive paste to cause crystals to be precipitated.
- The conductive paste of the present invention is advantageous in that a SiC chip and a substrate can be bonded to each other using the conductive paste by heating at a relatively low temperature (for example, at 370° C. or lower) as a heating temperature to obtain a semiconductor device. In addition, the conductive paste of the present invention is advantageous in that a semiconductor chip and a substrate can be bonded to each other using the conductive paste, and, after bonding, the bond strength between the semiconductor chip and the substrate can be maintained even in an environment at a relatively high temperature (for example, at 300 to 350° C.), and thus the obtained semiconductor device has an improved heat resistance.
- Further, in the present invention, there is provided a method for producing a semiconductor device, which is advantageous in that the conductive particles contained in the conductive paste are sintered to electrically connect a semiconductor chip to a substrate, so that a semiconductor device having high electrical conductive properties can be obtained.
- In the present invention, by heating the conductive paste to the remelting temperature of the glass frit contained in the conductive paste or higher and then gradually cooling the paste, it is possible to cause deposition of silver and crystals in the calcined film bonding the semiconductor chip to the substrate. The calcined film bonding the semiconductor chip to the substrate tends to have a melting temperature higher than that of the glass frit contained in the conductive paste as a raw material. In the present invention, there is provided a method for producing a semiconductor device, which is advantageous in that the obtained semiconductor device having a semiconductor chip and a substrate bonded using the conductive paste can maintain the bond strength between the substrate and the semiconductor chip even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.).
-
FIG. 1 is a diagram showing the steps in an embodiment of the method for producing a semiconductor device. -
FIG. 2 shows a DSC curve of glass frit No. 25 (SC181-4) as measured by a differential scanning calorimeter. -
FIG. 3 shows scanning electron microscope (SEM) photomicrographs of the silver particles used in the respective conductive pastes, taken at magnifications of 1,000 times, 2,000 times, and 5,000 times. -
FIG. 4 shows scanning electron microscope (SEM) photomicrographs of glass frit No. 25 (SC181-4), taken at magnifications of (a) 1,000 times and (b) 500 times, wherein glass frit No. 25 is obtained after sieve classification using a 400-mesh sieve. - The present invention is directed to a conductive paste which comprises (A) conductive particles, (B) a glass frit containing substantially no lead (Pb), arsenic (As), antimony (Sb), and tellurium (Te), and (C) a solvent, wherein the glass frit (B) has a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
- [(A) Conductive Particles]
- With respect to the conductive particles used in the conductive paste of the present invention, for example, silver (Ag), copper (Cu), nickel (Ni), or a silver alloy of silver and a base metal (for example, Cu or Ni) can be used. Especially the conductive particles are preferably silver (Ag).
- With respect to the shape and average particle diameter of the conductive particles, there is no particular limitation, and those known in the corresponding field can be used. The conductive particles preferably have an average particle diameter of 0.01 to 40 μm, more preferably 0.05 to 30 μm, further preferably 0.1 to 20 μm. When the average particle diameter of the conductive particles is in the range of from 0.01 to 40 μm, the dispersibility of the conductive particles in the paste is excellent, so that excellent sintering properties are achieved during sintering. The average particle diameter of the conductive particles indicates a D50 (median diameter) in the volume cumulative distribution as measured using a laser diffraction-scattering type measurement apparatus for particle diameter and particle size distribution (for example, MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd.). With respect to the shape of the conductive particles, the conductive particles may have a spherical shape, a shape of flakes or scales, or a polyhedral shape.
- When silver particles are used as the conductive particles, silver particles having a size at a nano-level or silver particles having pores filled with a resin may be used.
- [(B) Glass Frit]
- The glass frit used in the conductive paste of the present invention contains substantially no lead, arsenic, antimony, and tellurium. The glass frit used in the conductive paste of the present invention is characterized by having a remelting temperature (Tr) of 320 to 360° C., wherein the remelting temperature is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve in the temperature region of from 320 to 360° C. as measured by a differential scanning calorimeter.
- The remelting temperature (Tr) can be determined from an endothermic peak appearing in a DSC curve in the range of from 50 to 370° C. as measured using a differential scanning calorimeter (for example, SHIMADZU DSC-50), wherein the DSC curve is prepared by elevating the temperature of the glass frit to 370° C. under conditions, for example, at a temperature elevation rate of 15° C./min in an atmosphere under atmospheric pressure. The temperature at the first point of inflection in the DSC curve of the glass frit indicates a glass transition temperature (Tg). Further, in the DSC curve of the glass frit, an exothermic peak attributed to crystallization of the glass frit and an endothermic peak attributed to fusion of the glass frit appear. In the DSC curve of the glass frit, the exothermic peak appears with a positive (+) value. In the DSC curve of the glass frit, the endothermic peak appears with a negative (−) value. In the DSC curve of the glass frit, a plurality of exothermic peaks may appear. Further, in the DSC curve of the glass frit, a plurality of endothermic peaks may appear.
- With respect to the glass frit used in the conductive paste of the present invention, when the DSC curve has a plurality of endothermic peaks, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. is used, wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more among the endothermic peaks. When a plurality of endothermic peaks appear in the DSC curve of the glass frit, the peak top of at least one endothermic peak having an endotherm of 20 J/g or more of the glass frit is present in the temperature region of from 320 to 360° C. In the glass frit, as long as the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve is present in the temperature region of from 320 to 360° C., the peak tops of any other endothermic peaks having an endotherm of 20 J/g or more may be present in the temperature region of higher than 360° C.
- The glass frit used in the conductive paste of the present invention has a remelting temperature (Tr) in the temperature region of from 320 to 360° C., wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. The glass transition temperature (Tg) and crystallization temperature (Tc) shown in the DSC curve of the glass frit are lower than the remelting temperature (Tr). By heating the conductive paste comprising the glass frit at a temperature of the remelting temperature of the glass frit or higher (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), the glass frit contained in the conductive paste is molten, making it possible to bond together adherends. The conductive paste of the present invention can bond together adherends at a relatively low temperature (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), and therefore can be advantageously used in, for example, a semiconductor device and an integrated circuit device which are sensitive to heat. Further, the remelting temperature (Tr) of the glass frit in the conductive paste is 320° C. or higher, and therefore a semiconductor device having a semiconductor chip and a substrate bonded together using the conductive paste can maintain the bond strength even when operated in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- The glass frit used in the conductive paste of the present invention has a remelting temperature (Tr) in the temperature region of from 320 to 360° C., wherein the remelting temperature (Tr) is indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. Therefore, when the glass frit is heated to the remelting temperature (Tr) or higher and then cooled, crystals are further formed in the calcined film formed from the conductive paste. With respect to the glass frit which has been heated to the remelting temperature (Tr) or higher and molten and subsequently cooled, the temperature read at the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter tends to be higher than the remelting temperature of 320 to 360° C. The reason for such a tendency is not clear, but is presumed as follows. The conductive paste is heated to a temperature which is higher than the crystallization temperature (Tc) of the glass frit and which is the remelting temperature (Tr) of the glass frit or higher, and then cooled. With respect to the glass frit contained in the conductive paste, the crystallized glass which has undergone crystallization is remelted, and then is cooled to undergo further crystallization. There is a difference in the way of crystal deposition between the crystallized glass caused by crystallization of part of the glass frit and the crystallized glass caused by the first crystallization. One of the reasons why the temperature read at the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter tends to be higher than the remelting temperature of 320 to 360° C. is presumed to reside in the difference in the way of crystal deposition between the crystallized glass caused by crystallization of the molten glass frit and the crystallized glass caused by the first crystallization. By virtue of such crystals deposited in the calcined film formed by heating the conductive paste and cooling it, the bond strength between the semiconductor chip and the substrate bonded using the conductive paste can be maintained even when the semiconductor device is operated in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- The remelting temperature (Tr) of the glass frit used in the conductive paste of the present invention is a temperature indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter, and the endotherm of 20 J/g or more confirms the state in which the crystals in the glass frit are completely molten. When there is an endothermic peak having an endotherm of less than 20 J/g in a DSC curve as measured by a differential scanning calorimeter, it is considered that crystals remain in the glass frit. When the conductive paste is heated at a temperature as relatively low as the remelting temperature of the glass frit or higher (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), there is a possibility that the crystals in the glass frit contained in the conductive paste are not completely molten. When the crystals of the glass frit contained in the conductive paste remain as such in the calcined film obtained by calcining the conductive paste, the conductive properties of the calcined film with the semiconductor chip and substrate may become poor. Further, when the crystals of the glass frit contained in the conductive paste remain as such in the calcined film by calcining the conductive paste, the bond strength between the semiconductor chip and the substrate may become poor. Furthermore, there is a possibility that the semiconductor device obtained by bonding a semiconductor chip to a substrate using the conductive paste cannot maintain the bond strength in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- The glass frit preferably has a glass transition temperature (Tg) of 180° C. or lower, more preferably 170° C. or lower, further preferably 168° C. or lower, especially preferably 165° C. or lower.
- The glass frit preferably has a crystallization temperature (Tc) of 280° C. or lower, more preferably 270° C. or lower, further preferably 260° C. or lower, wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. The glass frit preferably has a crystallization temperature (Tc) of 160° C. or higher, more preferably 165° C. or higher, further preferably 170° C. or higher, wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. The glass frit preferably has a crystallization temperature (Tc) in the temperature region of from 160 to 280° C., wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. The glass frit more preferably has a crystallization temperature (Tc) in the temperature region of from 170 to 270° C., wherein the crystallization temperature (Tc) is indicated by the peak top of at least one exothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter. When a plurality of exothermic peaks appear in the DSC curve of the glass frit, the peak top of at least one exothermic peak having an exotherm of 20 J/g or more of the glass frit is present in the temperature region of from 160 to 280° C. In the glass frit, as long as the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in the DSC curve is present in the temperature region of from 160 to 280° C., the peak tops of any other exothermic peaks having an exotherm of 20 J/g or more may be present in the temperature region of higher than 280° C.
- With respect to the size of the glass frit, there is no particular limitation. The glass frit preferably has a volume-based average particle diameter (median diameter) of 1 to 200 μm, more preferably 3 to 180 μm, further preferably 3 to 160 μm, especially preferably 5 to 150 μm. The glass frit can be obtained by placing raw materials for the glass frit in a porcelain crucible, and placing the crucible in a melt furnace (oven) to heat and melt the materials, obtaining molten glass, and feeding the molten glass between rollers made of stainless steel to shape the glass into a sheet form, and grinding the obtained sheet-form glass using a mortar, and subjecting the ground glass to sieve classification using, for example, 100-mesh and 200-mesh test sieves. With respect to the mesh size of the test sieve, there is no particular limitation, and the glass frit having a smaller average particle diameter (median diameter) can be obtained by sieve classification using a fine-mesh test sieve. The average particle diameter of the glass frit can be measured using a laser diffraction-scattering type measurement apparatus for particle diameter and particle size distribution (for example, MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd.). The average particle diameter of the glass frit indicates a D50 (median diameter) in the volume cumulative distribution.
- It is preferred that the glass frit comprises (B-1) Ag2O, (B-2) V2O5, and (B-3) MoO3. The glass frit contains substantially no lead (Pb), arsenic (As), tellurium (Te), and antimony (Sb). Further, the glass frit contains substantially no thallium (Tl). When the glass frit does not contain an injurious material, such as lead (Pb), arsenic (As), tellurium (Te), or antimony (Sb), a conductive paste having high safety such that the paste does not adversely affect the environment can be obtained.
- It is preferred that the glass frit contains Ag2O (B-1) and V2O5 (B-2) in a total amount of 80 to 96% by mass in terms of the oxide, based on the mass of glass frit (B), wherein the mass ratio of Ag2O (B-1) to V2O5 (B-2) (Ag2O/V2O5) is 1.8 to 3.2. In the present specification, the amounts of the respective components contained in the glass frit are individually expressed in % by mass in terms of the oxide, based on the mass of the glass frit, unless otherwise specified.
- It is more preferred that the glass frit contains Ag2O (B-1) and V2O5 (B-2) in a total amount of 82 to 95% by mass, based on the mass of glass frit (B). Further, in the glass frit, the mass ratio of Ag2O (B-1) to V2O5 (B-2) (Ag2O/V2O5) is preferably 1.8 to 3.2, more preferably 1.95 to 2.7, further preferably 1.95 to 2.6. When the total amount of components (B-1) and (B-2) contained in the glass frit is 82 to 95% by mass, the glass frit having a relatively low remelting temperature (Tr) can be obtained.
- It is preferred that the glass frit contains MoO3 (B-3) in an amount of 4 to 10% by mass, based on the mass of the glass frit. When the amount of component (B-3) contained in the glass frit is 4 to 10% by mass, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- It is preferred that the glass frit further comprises (B-4) at least one oxide selected from the group consisting of ZnO, CuO, TiO2, MgO, Nb2O5, BaO, Al2O3, SnO, and Fe2O3. The oxides as component (B-4) may be used individually or in combination.
- It is preferred that the glass frit contains MoO3 (B-3) and component (B-4) in a total amount of 4 to 20% by mass, based on the mass of the glass frit. When the total amount of components (B-3) and (B-4) contained in the glass frit is 4 to 20% by mass, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- The glass frit preferably contains component (B-4) in an amount of 0 to 12% by mass, more preferably 0.5 to 10% by mass, further preferably 1 to 8% by mass, especially preferably 2 to 8% by mass, in terms of the oxide, based on the mass of the glass frit. When the amount of component (B-4) contained is in the range of from 0 to 12% by mass, the glass frit having a remelting temperature (Tr) in the temperature region of from 320 to 360° C. can be obtained.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), and MoO3 (B-3), it is preferred that Ag2O (B-1), V2O5 (B-2), and MoO3 (B-3) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 80% by mass, more preferably 45 to 75% by mass, further preferably 50 to 70% by mass; the amount of V2O5 (B-2) is preferably 16 to 40% by mass, more preferably 17 to 35% by mass, further preferably 18 to 30% by mass; and the amount of MoO3 (B-3) is preferably 4 to 10% by mass, more preferably 5 to 9% by mass, more preferably 6 to 8% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and ZnO (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and ZnO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of ZnO (B-4) is preferably 0.5 to 12% by mass, more preferably 1 to 12% by mass, and the mass ratio of Ag2O (B-1) to V2O5 (B-2) (Ag2O/V2O5) is preferably 1.95 to 2.6.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and CuO (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and CuO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of CuO (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 1 to 8% by mass, especially preferably 1 to 4% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and TiO2 (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and TiO2 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of TiO2 (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 4 to 10% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and MgO (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and MgO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of MgO (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 2 to 8% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Nb2O5 (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Nb2O5 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of Nb2O5 (B-4) is preferably 1 to 12% by mass, more preferably 1 to 10% by mass, further preferably 1 to 8% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and BaO (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and BaO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of BaO (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 1 to 2% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Al2O3 (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Al2O3 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass, more preferably 5 to 8% by mass, further preferably 6 to 8% by mass; and the amount of Al2O3 (B-4) is preferably 0.5 to 12% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and SnO (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and SnO (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of SnO (B-4) is preferably 1 to 12% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Fe2O3 (B-4), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and Fe2O3 (B-4) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; and the amount of Fe2O3 (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 2 to 8% by mass.
- When the glass frit substantially comprises Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), ZnO (B-4), and CuO (B-4′), it is preferred that Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), ZnO (B-4), and CuO (B-4′) have their respective compositions shown below, based on the mass of the glass frit.
- The amount of Ag2O (B-1) is preferably 40 to 70% by mass, more preferably 45 to 70% by mass, further preferably 50 to 65% by mass; the amount of V2O5 (B-2) is preferably 10 to 40% by mass, more preferably 12 to 35% by mass, further preferably 15 to 30% by mass; the amount of MoO3 (B-3) is preferably 4 to 10% by mass; the amount of ZnO (B-4) is preferably 1 to 12% by mass, more preferably 2 to 10% by mass, further preferably 2 to 8% by mass; and the amount of CuO (B-4′) is preferably 1 to 10% by mass, more preferably 2 to 8% by mass, further preferably 2 to 6% by mass, and the mass ratio of ZnO (B-4) and CuO (B-4′) {ZnO (B-4):CuO (B-4′)} is preferably 10:1 to 1:10, more preferably 5:1 to 1:5, further preferably 3:1 to 1:3, especially preferably 2:1 to 1:2.
- (C) Solvent
- As a solvent, there can be used one type or two or more types of solvents selected from alcohols (for example, terpineol, α-terpineol, and β-terpineol), esters (for example, hydroxyl group-containing esters, such as 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate and butyl carbitol acetate), paraffin mixtures (for example, Linpar, manufactured by Condea Chemie GmbH), and polyhydric alcohols (for example, 2-ethyl-1,3-hexanediol).
- With respect to the solvent, for adjusting the viscosity of the conductive paste to that suitable for application, one type or two or more types of, for example, a resin, a binder, and a filler may be added to the solvent.
- (D) Metal Oxide
- It is preferred that the conductive paste of the present invention contains at least one metal oxide selected from the group consisting of SnO, ZnO, In2O3, and CuO. This metal oxide is not the oxide contained in the glass frit.
- When the conductive paste contains at least one metal oxide selected from the group consisting of SnO, ZnO, In2O3, and CuO, the bond strength can be further improved, making it possible to obtain a semiconductor device which can maintain the bond strength even in an environment at a relatively high temperature (for example, at 300 to 350° C.).
- Other Additives
- In the conductive paste of the present invention, as another additive selected from, for example, a plasticizer, an anti-foaming agent, a dispersant, a leveling agent, a stabilizer, and an adhesion promoter can be further incorporated into the paste if necessary. Of the above plasticizer, one selected from, for example, phthalates, glycolates, phosphates, sebacates, adipates, and citrates can be used.
- Conductive Paste
- It is preferred that the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 90% by mass, glass frit (B) in an amount of 5 to 35% by mass, and solvent (C) in an amount of 5 to 12% by mass. The unit “% by mass” for the respective components indicates amounts of the respective components contained, based on the mass of the conductive paste (100% by mass).
- When the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 90% by mass, glass frit (B) in an amount of 5 to 35% by mass, and solvent (C) in an amount of 5 to 12% by mass, by heating the conductive paste to the remelting temperature (Tr) of glass frit (B) or higher, the conductive particles are diffused through the molten conductive paste to suffer deposition, making it possible to form a calcined film having excellent conductive properties. The conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- When the conductive paste of the present invention contains metal oxide (D), it is preferred that the conductive paste contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0 to 5% by mass. Further, it is more preferred that the conductive paste of the present invention contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0.1 to 5% by mass. The unit “% by mass” for the respective components indicates amounts of the respective components contained, based on the mass of the conductive paste (100% by mass).
- When the conductive paste contains conductive particles (A) in an amount of 60 to 85% by mass, glass frit (B) in an amount of 5 to 35% by mass, solvent (C) in an amount of 5 to 10% by mass, and metal oxide (D) in an amount of 0 to 5% by mass, by heating the conductive paste to the remelting temperature (Tr) of glass frit (B) or higher, the conductive particles are diffused through the molten conductive paste to suffer deposition, making it possible to form a calcined film having excellent conductive properties. The conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- In the conductive paste of the present invention, the mass ratio of conductive particles (A) and glass frit (B) {conductive particles (A):glass frit (B)} is preferably 50:50 to 98:2, more preferably 60:40 to 90:10, further preferably 65:35 to 85:15, especially preferably 70:30 to 80:20. When the mass ratio of conductive particles (A) and glass frit (B) {conductive particles (A):glass frit (B)} is 50:50 to 98:2, by heating the conductive paste to the remelting temperature (Tr) of glass frit (B) or higher, the conductive particles are diffused through the molten conductive paste to suffer deposition, making it possible to form a calcined film having excellent conductive properties. The conductive paste of the present invention can electrically connect adherends (for example, a substrate and a semiconductor chip) to each other.
- The method for producing the conductive paste of the present invention is described below.
- [Method for Producing the Conductive Paste]
- The method for producing the conductive paste of the present invention has a step for mixing conductive particles, a glass frit, and a solvent with one another. For example, the conductive paste can be produced by adding to a solvent conductive particles, a glass frit, and optionally another additive and/or additive particles, and mixing and dispersing them in the solvent.
- Mixing can be performed by means of, for example, a planetary mixer. Dispersing can be performed by means of a three-roll mill. The methods for mixing and dispersing are not limited to these methods, and various known methods can be used.
- Hereinbelow, a method for producing a semiconductor device using the conductive paste of the present invention is described.
- [Method (1) for producing a semiconductor device]
- The method of the present invention for producing a semiconductor device comprises the steps of: applying the conductive paste of the present invention to a substrate and/or a semiconductor chip; placing the semiconductor chip on the substrate through the conductive paste; heating the conductive paste to the remelting temperature of glass frit (B) contained in the conductive paste or higher to sinter conductive particles
- (A) contained in the conductive paste so that the semiconductor chip and the substrate are electrically connected to each other; and gradually cooling the conductive paste.
- In the method of the present invention for producing a semiconductor device, a substrate and a semiconductor chip are placed through the conductive paste and the conductive paste is heated to the remelting temperature (Tr) of glass frit (B) contained in the conductive paste or higher, so that the glass frit is molten in the conductive paste and further the conductive particles are diffused through the conductive paste and sintered to exhibit excellent conductive properties, making it possible to electrically connect the substrate and the semiconductor chip to each other.
-
FIG. 1 is a diagram showing the steps in an embodiment of the method of the present invention for producing a semiconductor device.FIG. 1(a) shows an example of the method of applyingconductive paste 1 to a semiconductor chip. As shown inFIG. 1(a) ,gap 2 for containing the conductive paste is formed using polyimide tapes at the ends ofsemiconductor chip 3.Conductive paste 1 is applied tosemiconductor chip 3 by dispensing the paste onto the surface of the semiconductor chip using, for example, a mechanical dispenser (manufactured by Musashi Engineering, Inc.). The method of applying the conductive paste of the present invention is not limited to the dispensing or printing method, and the conductive paste of the present invention can be applied by other methods. -
FIG. 1(b) shows the state in whichsemiconductor chip 3 is placed onsubstrate 4 throughconductive paste 1.FIG. 1(c) shows the state in whichconductive paste 1bonding semiconductor chip 3 tosubstrate 4 is calcined. As shown inFIG. 1(b) ,semiconductor chip 3 is placed onsubstrate 4 throughconductive paste 1. As shown inFIG. 1(c) ,conductive paste 1 is then calcined using, for example, a reflow oven.Conductive paste 1 is heated to the remelting temperature of the glass frit contained inconductive paste 1 or higher. Inconductive paste 1, the conductive particles contained inconductive paste 1 are sintered, so that calcinedfilm 1′ electrically connectingsemiconductor chip 3 andsubstrate 4 to each other is obtained. The conductive paste is calcined by, for example, inserting the substrate, conductive paste, and semiconductor chip into, for example, a reflow oven, and elevating the temperature to 350 to 400° C. at a temperature elevation rate of 5 to 20° C./min using a heat lamp at 5 to 20° C. and performing calcination for 1 to 30 minutes. The substrate, conductive paste, and semiconductor chip are preferably calcined at a temperature of 370° C. or lower at a temperature elevation rate of 15 to 20° C./min for 5 to 10 minutes. For example, when the remelting temperature of the glass frit is 360° C., calcination at a temperature of higher than 360 to 370° C. for 5 to 10 minutes is preferably performed. Then, the substrate, conductive paste, and semiconductor chip are removed from the reflow oven, and gradually cooled. -
FIG. 1(d) showssemiconductor device 5. As shown inFIG. 1(d) ,semiconductor chip 3 andsubstrate 4 are electrically connected to each other due to calcinedfilm 1′ obtained by calcining the conductive paste, so thatsemiconductor device 5 is produced.Calcined film 1′ formed betweensemiconductor chip 3 andsubstrate 4 contains silver deposited in calcinedfilm 1′ and crystallized glass caused by crystallization of part of the glass frit. By virtue of the silver deposited in calcinedfilm 1′, the semiconductor chip and the substrate are electrically connected to each other bycalcined film 1′. Further, by virtue of the silver deposited in calcinedfilm 1′ and crystallized glass incalcined film 1′,semiconductor device 5 having the semiconductor chip and the substrate bonded bycalcined film 1′ can maintain the bond strength betweensemiconductor chip 3 andsubstrate 4 even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.). - [Method (2) for Producing a Semiconductor Device]
- The method of the present invention for producing a semiconductor device comprises the steps of: applying the conductive paste of the present invention to a substrate and/or a semiconductor chip; placing the semiconductor chip on the substrate through the conductive paste; heating the conductive paste to reduce Ag2O (B-1) in glass frit (B) contained in the conductive paste; further heating the conductive paste to the remelting temperature of glass frit (B) contained in the conductive paste or higher; and gradually cooling the conductive paste to cause crystals to be precipitated.
- In the method of the present invention for producing a semiconductor device, a substrate and a semiconductor chip are placed through the conductive paste and the conductive paste is heated, so that Ag2O (B-1) in glass frit (B) contained in the conductive paste is reduced. Ag2O has a reducing temperature of about 140 to 200° C.
- The conductive paste is heated to the temperature at which Ag2O is reduced or higher (at a temperature of higher than about 200° C.) to reduce Ag2O, causing silver (Ag) contained in glass frit (B) to suffer deposition. The conductive paste is further heated to the remelting temperature of the glass frit contained in the conductive paste or higher (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.), so that the glass frit in the conductive paste is molten. Then, the conductive paste is gradually cooled to obtain a calcined film. In the calcined film, silver derived from the glass frit contained in the conductive paste suffers deposition. Further, in the calcined film, the silver as well as crystallized glass caused by recrystallization of part of the glass frit suffer deposition.
- The method for producing a semiconductor device using the conductive paste of the present invention is unlikely to thermally affect the adherends. In the method for producing a semiconductor device using the conductive paste of the present invention, adherends can be bonded together at a temperature which is the remelting temperature of the glass frit contained in the conductive paste or higher and whish is a low temperature such that the heat energy consumption can be reduced (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.). Further, in the method of the present invention, after bonding, the conductive paste is heated and cooled and, in the resultant calcined film, silver and crystals derived from the glass frit contained in the conductive paste suffer deposition. In the calcined film, silver and crystals derived from the glass frit contained in the conductive paste suffer deposition, and therefore the melting temperature of the calcined film tends to be higher than the remelting temperature (Tr) of the glass frit. The calcined film can maintain the bond strength between the semiconductor chip and the substrate even in an environment at a relatively high temperature (for example, at 300 to 350° C.). The conductive paste of the present invention and the method for producing a semiconductor device using the same can be advantageously used in a die attach material for bonding a SiC semiconductor chip having a high junction temperature, as compared to a silicon (Si) semiconductor chip. Further, the conductive paste of the present invention and the method for producing a semiconductor device using the same can reduce the heat energy consumption for bonding, and further can provide a semiconductor device which can maintain the bond strength even when placed in an environment at a relatively high temperature (for example, at 300 to 350° C.). By the conductive paste of the present invention and the method for producing a semiconductor device using the same, there can be provided a semiconductor device having excellent thermal cycling properties and excellent storage properties in a high-temperature environment as well as high reliability.
- By the conductive paste of the present invention and the method for producing a semiconductor device using the same, various combinations of chips and substrates can be bonded to each other. As an example of a combination of a semiconductor chip (die) and a substrate which can be bonded by the present invention, there can be mentioned a combination of a chip having a non-metallized surface and a substrate having a non-metallized surface. Examples of such combinations include a combination of a Si chip (die) and a Si substrate, a combination of a SiC chip (die) and a Si substrate, and a combination of a Si chip and a ceramic (Al2O3) substrate.
- As another example of the combination of a semiconductor chip (die) and a substrate, there can be mentioned a combination of a chip having a metallized surface and a substrate having a metallized surface. Examples of such combinations include a combination of a Au-plated SiC chip (die) and a Au-plated substrate, and a combination of a Au- or Ag-plated Si chip and a Ag-plated copper substrate.
- As a further example of the combination of a semiconductor chip (die) and a substrate, there can be mentioned a combination of a chip having a metallized surface and a substrate having a non-metallized surface. Examples of such combinations include a combination of a Au-plated Si chip and a ceramic (Al2O3) substrate.
- In the conductive paste of the present invention and the method for producing a semiconductor device using the same, the method of applying the conductive paste to a substrate is not limited to dispending or printing, and various methods conventionally known can be used.
- In the conductive paste and method of the present invention, the temperature elevation to, for example, 370° C. can be performed under atmospheric pressure in an atmosphere which is not limited to an inert gas atmosphere, such as a nitrogen gas atmosphere.
- By the conductive paste and method of the present invention, a semiconductor chip and a substrate can be bonded to each other without applying a pressure from the outside or applying a load from the outside to the semiconductor chip.
- The glass frit is first described below. The glass frit used in the conductive paste of the present invention is not limited by the following Examples.
- [Glass Frit]
- Table 1 shows a glass frit substantially comprising Ag2O (B-1), V2O5 (B-2), and MoO3 (B-3), and a glass frit substantially comprising Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and ZnO (B-4). Table 2 shows a glass frit substantially comprising Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and one oxide (B-4) of TiO2, MgO, Nb2O5, BaO, Al2O3, SnO, and Fe2O3. Table 3 shows a glass frit substantially comprising Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), and CuO (B-4), and a glass frit substantially comprising Ag2O (B-1), V2O5 (B-2), MoO3 (B-3), ZnO (B-4), and CuO (B-4′). In Tables 1 to 3, the values shown for components (B-1) to (B-4) are expressed in % by mass.
- The method for producing the glass frit is as follows.
- As raw materials for the glass frit, oxide powders shown in Tables 1 to 3 were weighed and mixed together, and placed in a crucible (for example, a porcelain crucible, manufactured by Fisher Brand; high temperature porcelain; size: 10 mL). The crucible containing therein the raw materials for glass frit was placed in an oven (oven; manufactured by JELENKO, JEL-BURN JM, MODEL: 335300). The temperature of the raw materials for glass frit was elevated in the oven to the melt temperature indicated at the column “Melt Temp” shown in each of Tables 1 to 3, and the melt temperature was maintained so that the raw materials were satisfactorily molten. Then, the crucible containing therein the molten raw materials for glass frit was removed from the oven, and the molten raw materials for glass frit were uniformly stirred. Subsequently, the molten raw materials for glass frit were placed on two rolls made of stainless steel having a diameter of 1.86 inch and rotating at room temperature, and the two rolls were rotated by a motor (BODUNE. D,C. MOTOR 115 V) to knead the molten raw materials for glass frit while quickly cooing at room temperature, forming sheet-form glass. Finally, the sheet-form glass was ground using a mortar and rendered in a uniformly dispersed state, and subjected to sieve classification using a 100-mesh sieve and a 200-mesh sieve to produce a sieved glass frit. By performing sieve classification so that the glass frit was passed through the 100-mesh sieve and remained on the 200-mesh sieve, the glass frit having an average particle diameter of 149 μm (median diameter) was obtained. By appropriately selecting the mesh size of the sieve used for glass frit, the glass frit having a larger average particle diameter or a smaller average particle diameter can be obtained.
- With respect to each of the glass frits, a DSC curve was measured using a differential scanning calorimeter under the conditions shown below. A glass transition temperature (Tg), a crystallization temperature (Tc), and a remelting temperature (Tr) were determined from the DSC curve as measured by a differential scanning calorimeter. The glass transition temperature (Tg), crystallization temperature (Tc), and remelting temperature (Tr) of each glass frit are shown in Tables 1 to 3.
- [Glass Transition Temperature (Tg)]
- With respect to the glass frit, a DSC curve in the temperature region of from about 50 to about 370° C. was measured using a differential scanning calorimeter DSC-50, manufactured by SHIMADZU Corporation, under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min. A glass transition temperature (Tg) was determined from the temperature at the first point of inflection in the DSC curve. When no point of inflection was recognized, symbol “-” indicating unmeasurable was shown in the table.
- [Crystallization Temperature (Tc)]
- A crystallization temperature (Tc) was determined as a temperature indicated by the peak top of at least one exothermic peak having an exotherm of 20 J/g or more in a DSC curve, as measured using a differential scanning calorimeter (DSC-50, manufactured by SHIMADZU Corporation) under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min. When a plurality of exothermic peaks appeared, the temperature (° C.) at the peak top of the first exothermic peak was indicated by TC1, the temperature (° C.) at the peak top of the second exothermic peak was indicated by TC2, and the temperature (° C.) at the peak top of the third exothermic peak was indicated by TC3.
- [Remelting Temperature (Tr)]
- A remelting temperature (Tr) was determined as a temperature indicated by the peak top of at least one endothermic peak having an endotherm of (−) 20 J/g or more in a DSC curve, as measured using a differential scanning calorimeter (DSC-50, manufactured by SHIMADZU Corporation) under conditions such that the temperature was elevated to 370° C. at a temperature elevation rate of 15° C./min. When a plurality of endothermic peaks appeared, the temperature (° C.) at the peak top of the first endothermic peak was indicated by TR1, the temperature (° C.) at the peak top of the second endothermic peak was indicated by TR2, and the temperature (° C.) at the peak top of the third endothermic peak was indicated by TR3. When the peak top of endothermic peak was not able to be measured, symbol “-” indicating unmeasurable was shown in the table.
- The obtained glass frits were individually visually observed, and evaluated according to the following criteria: Excellent: The glass frit is satisfactorily homogeneous; Good: The glass frit is homogeneous; Fair: The glass frit is slightly heterogeneous; and void: A void is visually recognized in the glass frit. The results are shown in Tables 1 to 3.
-
TABLE 1 glass flit No. 1 Reference 1 13 14 15 16 22 No SC112-4 SC103-1 SC140-4 SC141-4 SC142-4 SC143-4 SC176-4 Lot 52511 61611 61611 61611 61611 71211 mesh 100/200 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 63.40 61.70 62.73 62.04 60.67 57.93 56.56 (B-2) V2O5 29.10 28.30 28.77 28.46 27.83 26.57 25.94 (B-3) MoO3 7.5 10.00 7.50 7.50 7.50 7.50 7.50 (B-4) ZnO 1.00 2.00 4.00 8.00 10.00 CuO TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO Nb2O5 Fe2O3 BaO Othes TeO2 Sb2O3 Total 100.0 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 600 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 550 Precrystallize — — — — — — — Tg 147.16 152.84 149.23 150.62 154.03 160.2 159.5 TC1 − Tg 25.88 26.13 32.93 44.84 71.72 80 68.09 TC1 173.04 178.97 182.16 195.46 225.75 240.2 227.59 TC1 (J/g) 31.13 31.12 37.56 38.61 43.22 50.58 36.72 TC2 294.36 297.88 256.23 TC2 (J/g) 2.94 0.96 2.48 TC3 287.23 TC3 (J/g) 0.53 TR1 351.23 361.92 341.45 352.09 342.08 342.74 341.67 TR1 (J/g) −49.43 −27.56 −43.54 −37.77 −46.48 −38.36 −31.46 TR2 384.15 TR2 (J/g) −15.98 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g 10 g Melt pour GOOD Good Excellent Excellent Excellent Excellent good void glass flit No. 23 24 25 26 27 28 Reference 7 No SC177-4 SC230-4 SC181-4 SC183-4 SC182-4 SC184-4 SC223-4 Lot 71211 81111 71411 71411 71411 71411 80511 mesh 100/200 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 55.19 64.44 63.07 58.96 60.33 56.21 54.84 (B-2) V2O5 25.31 29.56 28.93 27.04 27.67 25.79 25.16 (B-3) MoO3 7.50 4.00 4.00 10.00 4.00 10.00 12.00 (B-4) ZnO 12.00 2.00 4.00 4.00 8.00 8.00 8.00 CuO TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO Nb2O5 Fe2O3 BaO Othes TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 700 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 550 Precrystallize — — — — — — — Tg 161.63 139.87 144.69 161.12 152.74 167.88 172.5 TC1 − Tg 62.27 53.06 62.29 73.97 64.16 87.11 75.21 TC1 223.9 192.93 206.98 235.09 216.9 254.99 247.71 TC1 (J/g) 34.59 32.42 42.24 47.74 37.15 51.86 48.32 TC2 254.12 305.78 303.17 265.45 295.49 TC2 (J/g) 3.46 11.77 2.09 3.54 0.91 TC3 TC3 (J/g) TR1 341.61 352.7 343.64 341.49 351.75 342.31 340.27 TR1 (J/g) −31.1 −68.62 −66.86 −43.66 −54.15 −78.99 −9.18 TR2 365.31 TR2 (J/g) −2.86 TR3 391.02 TR3 (J/g) −26.93 Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Excellent Excellent Excellent Excellent Excellent Excellent Good + void glass flit No. Reference 10 37 Reference 11 38 Reference 12 Reference 13 No SC316-4 SC317-4 SC318-4 SC322-4 SC185-4 SC215-4 Lot 102312 101812 101812 102312 62111 72811 mesh 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 52.71 59.22 62.48 54.20 65.81 60.67 (B-2) V2O5 29.29 22.78 19.52 27.80 30.19 27.83 (B-3) MoO3 10.00 10.00 10.00 10.00 7.50 (B-4) ZnO 8.00 8.00 8.00 8.00 CuO TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO Nb2O5 Fe2O3 BaO Othes TeO2 4.00 Sb2O3 4.00 Total 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 1.80 2.60 3.20 1.95 2.18 2.18 Melt Temp 700 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 Precrystallize — — — — — — Tg 181.2 159.75 145.97 178.12 125.96 161.39 TC1 − Tg 70.15 54.44 41.31 76.15 37.49 22 TC1 251.35 214.19 187.28 254.27 163.45 183.39 TC1 (J/g) 56.01 43.62 12.25 52.33 36.4 21 TC2 313.91 267.61 296.64 255.98 304.02 TC2 (J/g) 7.22 3.12 0.27 4.04 4.18 TC3 290.06 TC3 (J/g) 8.74 TR1 340.61 344.55 416.17 341.05 304.99 — TR1 (J/g) −15.98 −32.06 −7.09 −38.08 −16.53 — TR2 460.79 359.11 TR2 (J/g) −18.47 −46.21 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Excellent Fair + void good Excellent Excellent Fair -
TABLE 2 glass flit No. 2 3 4 5 6 Reference 2 7 No SC120-4 SC122-4 SC123-4 SC134-4 SC135-4 SC127-4 SC173-4 Lot 060211 060211 060211 061411 061411 060211 071211 mesh 100/200 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 62.73 62.73 62.04 60.67 57.93 62.04 60.67 (B-2) V2O5 28.77 28.77 28.46 27.83 26.57 28.46 27.83 (B-3) MoO3 7.50 7.50 7.50 7.50 7.50 7.50 7.50 (B-4) ZnO CuO TiO2 2.00 4.00 SiO2 Bi2O3 Al2O3 SnO 1.00 MnO2 MgO Nb2O5 1.00 2.00 4.00 8.00 Fe2O3 BaO Others TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 700 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 550 Precrystallize — — — — — — — Tg 149.4 151.47 156.2 164.63 174.88 151.88 146.91 TC1 − Tg 23.99 30.08 33.62 58.05 40.95 29.59 28.09 TC1 173.39 181.55 189.82 222.68 215.83 181.47 175 TC1 (J/g) 33.67 33.71 34.2 35.69 29.72 32.04 32.33 TC2 289.15 286.23 TC2 (J/g) 2.69 3.43 TC3 TC3 (J/g) TR1 349.34 356.6 338.87 358.4 359.21 365.38 352.87 TR1 (J/g) −38.7 −42.6 −23.47 −30.67 −25.99 −39.99 −44.51 TR2 396.4 411.03 416.87 TR2 (J/g) −28.65 −21.84 −31.71 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Good Good Excellent Fair + void Good Good glass flit No. Reference 3 8 9 10 Reference 4 11 12 No SC128-4 SC129-4 SC157-5 SC158-5 SC130-4 SC131-4 SC132-4 Lot 060611 060611 062011 062011 060611 060611 061411 mesh 100/200 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 62.73 62.04 61.36 60.67 62.73 62.04 60.67 (B-2) V2O5 28.77 28.46 28.14 27.83 28.77 28.46 27.83 (B-3) MoO3 7.50 7.50 7.50 7.50 7.50 7.50 7.50 (B-4) ZnO CuO TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO 1.00 2.00 3.00 4.00 Nb2O5 Fe2O3 1.00 2.00 4.00 BaO Others TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 700 800 800 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 550 Precrystallize — — — — — — — Tg 155 161.66 178.6 190.91 153.5 158.26 158.86 TC1 − Tg 47.1 74.97 89.75 74.54 26.05 51.2 49.98 TC1 202.1 236.63 268.35 265.45 179.55 209.46 208.84 TC1 (J/g) 35.58 45.29 37.7 31.56 35.38 36.43 37.51 TC2 341.51 305.08 300.98 302.63 280.71 TC2 (J/g) 3.71 1.92 0.79 0.63 1.31 TC3 TC3 (J/g) TR1 360.87 358.61 352.43 352.95 374.35 346.01 344.86 TR1 (J/g) −32.35 −30.25 −31.12 −25.94 −78.97 −56.15 −70.52 TR2 416.32 410.01 400.51 401.27 TR2 (J/g) −5.98 −4.5 −5.7 −4.12 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Good Good Excellent Excellent Good Good Fair glass flit No. 20 21 Reference 6 Reference 8 31 Reference 9 No SC153-4 SC154-4 SC155-4 SC106-1 SC100-1 SC101-1 Lot 061711 061711 062011 052611 052311 052311 mesh 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 62.73 62.04 60.67 64.78 63.10 61.40 (B-2) V2O5 28.77 28.46 27.83 29.72 28.90 28.10 (B-3) MoO3 7.50 7.50 7.50 5.00 7.50 10.00 (B-4) ZnO CuO TiO2 SiO2 Bi2O3 Al2O3 0.50 0.50 0.50 SnO MnO2 MgO Nb2O5 Fe2O3 BaO 1.00 2.00 4.00 Others TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.19 Melt Temp 700 700 700 600 600 600 Dwell at melting temp. 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 Precrystallize — — — — — — Tg 148.19 151.21 151.27 141.62 144.04 150.8 TC1 − Tg 32.48 38.23 63 27.7 29.94 29.2 TC1 180.67 189.44 214.27 169.32 173.98 180 TC1 (J/g) 35.61 36.09 34.74 31.15 28.74 30.64 TC2 277.9 262.55 264.18 TC2 (J/g) 7.55 6.44 3 TC3 300.46 TC3 (J/g) 2.13 TR1 353.02 355.87 361.35 362.14 357.04 354.39 TR1 (J/g) −48.88 −43.24 −51.52 −52.87 −59.78 −19.24 TR2 387.18 TR2 (J/g) −5.37 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Excellent Excellent Excellent Fair Good Good -
TABLE 3 glass flit No. 17 18 19 Reference 5 29 30 No SC144-4 SC145-4 SC146-4 SC147-4 SC185-4 SC186-4 Lot 061611 061611 061611 061611 071411 080511 mesh 100/200 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 62.73 62.04 60.67 57.93 63.07 60.33 (B-2) V2O5 28.77 28.46 27.83 26.57 28.93 27.67 (B-3) MoO3 7.50 7.50 7.50 7.50 4.00 4.00 (B-4) ZnO CuO 1.00 2.00 4.00 8.00 4.00 8.00 TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO Nb2O5 Fe2O3 BaO Others TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 15 Preheat Temp 550 550 550 550 550 550 Precrystallize — — — — — — Tg 149.29 152.33 158 172.43 151.38 164.95 TC1 − Tg 33.29 44.46 70.15 57.27 70.54 57.67 TC1 182.58 196.79 228.15 229.7 221.92 222.62 TC1 (J/g) 36.42 42.29 47.53 43.32 40.22 35.13 TC2 290.65 295.55 303.81 TC2 (J/g) 2.33 0.49 2.13 TC3 TC3 (J/g) TR1 351.22 358.64 348.37 352.24 350.22 348.8 TR1 (J/g) −43.45 −37.33 −21.99 −13.67 −52.54 −52.55 TR2 406.63 406.49 TR2 (J/g) −32.14 −36.61 TR3 TR3 (J/g) Comments bach size 10 g 10 g 10 g 10 g 10 g 10 g Melt pour Excellent Excellent Excellent Excellent Excellent Excellent glass flit No. 32 33 34 35 36 No SC148-4 SC149-4 SC150-4 SC151-4 SC152-4 Lot 061711 061711 061711 061711 061711 mesh 100/200 100/200 100/200 100/200 100/200 (B-1) Ag2O 60.67 59.30 59.30 57.93 55.19 (B-2) V2O5 27.83 27.20 27.20 26.57 25.31 (B-3) MoO3 7.50 7.50 7.50 7.50 7.50 (B-4) ZnO 2.00 2.00 4.00 4.00 8.00 CuO 2.00 4.00 2.00 4.00 4.00 TiO2 SiO2 Bi2O3 Al2O3 SnO MnO2 MgO Nb2O5 Fe2O3 BaO 0.00 Others TeO2 Sb2O3 Total 100.00 100.00 100.00 100.00 100.00 Ag2O/V2O5 2.18 2.18 2.18 2.18 2.18 Melt Temp 700 700 700 700 700 Dwell at melting temp. 15 15 15 15 15 Preheat Temp 550 550 550 550 550 Precrystallize — — — — — Tg 157.81 162.96 164.41 167.4 181.31 TC1 − Tg 67.95 55.02 60.96 52.58 43.58 TC1 225.76 218 225.37 219.98 224.89 TC1 (J/g) 42.76 43.37 41.68 40.71 33.97 TC2 298.82 301.36 321.83 254.53 TC2 (J/g) 1.23 0.7 3.96 1.38 TC3 325.99 TC3 (J/g) 3.87 TR1 346.83 345 345.18 342.85 341.92 TR1 (J/g) −32.33 −28.51 −36.83 −27.53 −23.07 TR2 401.14 395.22 400.09 388.34 TR2 (J/g) −20.98 −21.75 −2.2 TR3 418.71 TR3 (J/g) −3.01 Comments bach size 10 g 10 g 10 g 10 g 10 g Melt pour Excellent Excellent Excellent Excellent Excellent - As seen from Table 1, with respect to the glass frit (Reference 13: SC215-4) comprising antimony oxide (Sb2O3) as a raw material, a remelting temperature was not able to be measured.
-
FIG. 2 shows a DSC curve of glass frit No. 25 {SC181-4 (100713)} as measured by a differential scanning calorimeter. The glass frit had an average particle diameter (D50) of 13.3 μm. InFIG. 2 , the glass transition temperature (Tg) was 144° C., the crystallization temperature (Tc) was 189° C., the remelting temperature (Tr) was 342° C. or 352° C., and the crystallization temperature (Tc cool) upon gradually cooling after removal from the oven was 326° C. The reason that there is a very small difference between glass frit No. 25 (No. SC181-4, Lot. 071411) shown in Table 1 and glass frit No. 25 (No. SC181-4, Lot. 100713) shown inFIG. 2 with respect to each of the glass transition temperature (Tg), crystallization temperature (Tc), and remelting temperature (Tr) resides in the difference of the lot number (Lot) for glass frit No. 25. - Next, using the glass frits of Nos. 1, 4, 8, 13, 25, 28, 29, 37, and 38 and Nos. Reference 10, Reference 11, and Reference 12, and using the raw materials shown below, the conductive pastes in Examples and Comparative Examples were prepared.
- <Materials for the Conductive Paste>
- Materials for the conductive paste are shown below. The formulations of the conductive pastes in Examples 1 to 8 and Comparative Examples 1 and 2 are shown in Table 4.
-
- Conductive particles: Ag; spherical; BET value: 0.6 m2/g; average particle diameter D50: 6.4 μm; 6 g {71.6% by mass, based on the mass of the conductive paste (100% by mass)}; trade name: EA-0001 (manufactured by Metalor Technologies Corporation). The average particle diameter of the conductive particles is a D50 (median diameter) in the volume cumulative distribution as measured using a laser diffraction-scattering type measurement apparatus for particle diameter and particle size distribution (for example, MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd.).
- Solvent: Terpineol; 0.88 g {10.5% by mass, based on the mass of the conductive paste (100% by mass)}
- Glass frit: Glass frits of Nos. 1, 4, 8, 13, 25, 28, 29, 37, and 38 and Reference 10, 11, and 12; 1.5 g {17.9% by mass, based on the mass of the conductive paste (100% by mass)}. With respect to each glass frit, one obtained by grinding one type of glass frit using a mortar and subjecting the ground glass frit to sieve classification using a 325-mesh sieve was used. The glass frit obtained after the sieve classification has an average particle diameter (D50) of about 13 to about 20 μm.
-
TABLE 4 (g) Mass % Silver particles 6.00 71.6 Glass frit 1.50 17.9 Solvent (Terpineol) 0.88 10.5 Total 8.38 100 - <Method for Producing the Conductive Paste>
- The materials for conductive paste having the formulation shown in Table 4 were kneaded by means of a three-roll mill to prepare a conductive paste.
- With respect to each of the conductive pastes in Examples and Comparative Examples, a thermal resistance (Rth) test was performed to measure an electric resistivity, evaluating the electrical conductive properties. Further, with respect to each of the conductive pastes in Examples and Comparative Examples, a die shear stress (DSS) test was performed to measure a bond strength, evaluating the heat resistance.
- [Thermal Resistance (Rth) Test (Electric Resistivity)]
- A heat resistant tape was put on slide glass, and a groove having a width of 3 mm, a length of 60 mm, and a thickness of about 200 μm was formed in the tape, and the conductive paste was applied into the groove by squeezing, and calcined at 370° C. for 10 minutes. Then, an electric resistance between both ends of the resultant coating film was measured by means of a digital multimeter, and a dimension of the coating film was measured, and an electric resistivity was calculated from the measured values.
- [Die Shear Stress (DSS) Test (Bond Strength)]
- The conductive paste was dispensed in an appropriate amount on an alumina sheet, and a 2 mm×2 mm silicon chip was mounted on the dispensed paste, and a downward load was applied to the chip so that the thickness of the bonding portion (conductive paste) became about 30 μm using a spacer, followed by calcination at 370° C. for 10 minutes, to prepare a specimen. The prepared specimen was placed in an environment at 300° C. and subjected to die shear stress (DSS) test (300° C.) at a rate of 200 μsec using Multipurpose Bondtester, manufactured by Dage Japan Co., Ltd., to measure a bond strength.
-
TABLE 5 Electric Glass flit resistivity (RT) Bond strength at Paste No. No. No. (×10−4Ω · cm) 300° C. (kgf) Example 1 1 SC112-4 16.3 15.8 Example 2 25 SC181-4 12.5 12.7 Example 3 38 SC322-4 14.2 13.3 Example 4 37 SC317-4 9.5 10.3 Example 5 29 SC185-4 12.1 12.2 Example 6 28 SC184-4 10.6 8.2 Example 7 13 SC140-4 14.9 13.2 Example 8 8 SC129-4 8.2 8.3 Comparative Reference SC318-4 12.2 7.0 example 1 11 Comparative Reference SC165-4 12.9 7.7 example 2 12 [kgf] - The conductive pastes in Examples maintained the bond strength at 8 kgf or more even in an environment at a temperature as relatively high as 300° C. In contrast, the conductive paste in Comparative Example 1 using the glass frit in Reference 11 and the conductive paste in Comparative Example 2 using the glass frit in Reference Example 12 exhibited a bond strength of less than 8 kgf in an environment at a temperature as relatively high as 300° C. In the glass frit in Reference 11, the remelting temperature indicated by the peak top of at least one endothermic peak having an endotherm of 20 J/g or more as measured by a differential scanning calorimeter is not present in the temperature region of from 320 to 360° C. The glass frit in Reference 12 comprises tellurium oxide (TeO2) as a raw material.
- Conductive pastes having the respective formulations shown in Table 7 were produced, and a thermal resistance (Rth) test was performed with respect to each of the produced conductive pastes to measure an electric resistivity, evaluating the electrical conductive properties. Further, with respect to each of the conductive pastes in Examples and Comparative Examples, a die shear stress (DSS) test was performed to measure a bond strength, evaluating the heat resistance.
-
FIG. 3 shows scanning electron microscope (SEM) photomicrographs of the silver particles used in Examples 9 to 14, taken at magnifications of 1,000 times, 2,000 times, and 5,000 times. - Silver particles: P318-8, K-0082P (manufactured by Metalor Technologies Corporation); The mass ratio of P318-8 silver particles and K-0082P silver particles (P318-8:K-0082) is 50:50.
- Glass frit: No. 25 (SC181-4); The specific surface area (Specific surface) of the glass frit measured by a BET method and the particle diameter of the glass frit measured by a laser diffraction-scattering method using MICROTRAC HRA9320-X100, manufactured by Nikkiso Co., Ltd., are shown in Table 6. With respect to glass frit No. 25, one obtained by grinding 100 g of the glass frit by means of a ball mill for 48 hours and subjecting the ground glass frit to sieve classification using a 400-mesh sieve was used.
FIG. 4 shows scanning electron microscope (SEM) photomicrographs of glass frit No. 25 (SC181-4), taken at magnifications of (a) 1,000 times and (b) 500 times, wherein glass frit No. 25 was obtained after grinding by means of a ball mill for 48 hours and subsequent sieve classification using a 400-mesh sieve. - Zinc oxide: Zinc oxide (ZnO) powder (manufactured by Stream Chemicals, Inc.), which was added in an amount of 0.55% by weight in order to improve the die attach properties.
- Organic solvent: Terpineol
- The silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulation shown in Table 7 and kneaded by means of a three-roll mill to prepare a conductive paste. Table 7 shows the formulations of the conductive pastes used in Examples 9 to 14, the sizes of glass frits, and the results of the DSS test and Rth test.
-
TABLE 6 Glass flit No. 25 Glass powder SC 181-4 Lot No. 100713 Milling time 48 hours SSA (m2/g) 0.274 D10 6.31 mm D25 8.89 mm D50 13.32 mm D75 19.44 mm D90 26.52 mm - Using the conductive paste in Example 9 (MP12-102-1), the semiconductor chip (die) and substrate shown below were bonded together, and a die shear stress (DSS) test at room temperature or a thermal resistance (Rth) test was performed in the same manner as in Examples 1 to 8. The results are shown in Table 7. In Table 7, the die shear stress (DSS) test at room temperature is indicated by “RT”, and the die shear stress (DSS) test at 300° C. is indicated by “300 C”.
-
-
- Si die on Al2O3 substrate: 0.25″ Si/Al2O3 (bare); DSS test (RT)
- Si die on Si substrate: 0.3″ Si/0.4″ Si (bare); Rth test
-
-
- Au-plated Si die on Al2O3 substrate: 0.1″ AuSi/Al2O3 (metallized); DSS test
- (RT)
-
-
- Au-plated Si die on Ag-plated Cu substrate: 0.1″ AuSi/AgCu (metallized); DSS test (RT)
- Au-plated SiC die on Ag-plated Cu substrate: 0.1″ AuSiC/AgCu (metallized); DSS test (RT)
- Au-plated Si die on Au-plated Si substrate: 0.3″ AuSi/0.4″ AuSi (metallized); DSS test (RT), Rth test
- In Table 7, indications ‘0.25″’, ‘0.1″’, ‘0.2″’, ‘0.3″’, and ‘0.4″’ mean a size of the die (chip) or substrate.
- For example, ‘0.25″’ indicates a 0.25 inch×0.25 inch die (chip), ‘0.1″’ indicates a 0.1 inch×0.1 inch die (chip), ‘0.2″’ indicates a 0.2 inch×0.2 inch die (chip), and ‘0.3″ ’ indicates a 0.3 inch×0.3 inch die (chip). ‘0.4″’ indicates a 0.4 inch×0.4 inch substrate.
- Using the conductive paste (MP12-102-1), a thermal die shear stress test at 300° C. was performed for the chip (die) and substrate shown below. The results are shown in Table 7.
-
- Au-plated Si die on Al2O3 substrate: 0.1″ AuSi/Al2O3 (metallized); DSS test (300° C.)
- Conductive pastes (MP12-65-2, MP12-101-1, MP12-102-1, MP12-103-1, MP12-105-1) having different zinc oxide (ZnO) contents in the range of 0.14 to 2.2% by weight were individually produced.
- Silver particles: P318-8, K-0082P (manufactured by Metalor Technologies Corporation); The mass ratio of P318-8 silver particles and K-0082P silver particles (P318-8:K-0082P) is 50:50.
- Glass frit: Glass frit No. 25 (SC181-4); 18.4% by weight Organic solvent: Terpineol; 8.1% by weight
- The silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulations shown in Table 6 and kneaded by means of a three-roll mill to prepare conductive pastes. The electric resistivities of the conductive pastes are shown in Table 7.
- Using each of the conductive pastes, the chip (die) and substrate shown below were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen. The results are shown in Table 7.
-
- Au-plated Si die on Al2O3 substrate: 0.1″ AuSi/Al2O3 (metallized); DSS test (RT)
- Au-plated Si die on Au-plated Si substrate: 0.3″ AuSi/0.4″ AuSi (metallized); Rth test
- Conductive pastes having different combinations of silver particles were individually produced.
- Silver particles
- Conductive paste (MP12-67-1) using the silver particles in which the mass ratio of SA-1507 and K-0082P (SA-1507:K-0082P) is 50:50.
- Conductive paste (MP12-67-2) using the silver particles in which the mass ratio of P318-8 and K-0082P (P318-8:K-0082P) is 50:50.
- Zinc oxide (ZnO): 0.14% by weight
- Glass frit: Glass frit No. 25 (SC181-4); 9.23% by weight
- Organic solvent: Terpineol; 7.7% by weight
- The silver particles, glass frit, zinc oxide powder, and organic solvent were mixed in the formulations shown in Table 6 and kneaded by means of a three-roll mill to prepare conductive pastes. The electric resistivities of the conductive pastes are shown in Table 7.
- Using each of the conductive pastes, the Si chip (die) and Si substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen (0.3″ Si/0.4″ Si), and a DSS test (RT) and an Rth test were conducted with respect to the specimen. The results are shown in Table 7.
- Conductive pastes were individually produced using the materials shown below.
- Silver particles
- The mass ratio of P318-8 and K-0082P (P318-8:K-0082P) was changed in the range of from 1:1 to 3:1.
- The conductive paste (MP12-99-1) and conductive paste (MP12-99-2) contain glass frit No. 25 (SC181-4) in an amount of 18.4% by weight and contain no zinc oxide (ZnO).
- The conductive paste (MP12-101-1) and conductive paste (MP12-101-2) contain glass frit No. 25 (SC181-4) in an amount of 18.4% by weight and zinc oxide (ZnO) in an amount of 0.27% by weight.
- Using each of the conductive pastes, the chip (die) and substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen.
- The results are shown in Table 7.
- Conductive pastes having different glass frit contents were individually produced.
- Conductive paste (MP12-88-1) containing the glass frit in an amount of 9.23% by weight
- Conductive paste (MP12-65-2) containing the glass frit in an amount of 18.46% by weight
- Conductive paste (MP12-88-2) containing the glass frit in an amount of 27.69% by weight
- Silver particles: The mass ratio of P318-8 and K-0082P contained (P318-8:K-0082P) is 1:1.
- Zinc oxide: Zinc oxide (ZnO); 0.14% by weight
- Using each of the conductive pastes, the chip (die) and substrate shown in Table 7 were bonded together by elevating the temperature to 370° C. at a temperature elevation rate of 20° C./min and maintaining that temperature for 10 minutes to prepare a specimen, and a DSS test and an Rth test were conducted with respect to the specimen. The results are shown in Table 7.
-
TABLE 7 Ag/Glass Paste MP12-65-2 MP12-67-1 MP12-67-2 MP12-88-1 MP12-88-2 MP12-99-1 Example(s) 11, 14 12 12 14 14 13 Paste Formulation K-0082P (Ag) (weight %) 36.68 41.47 41.46 32.24 36.74 P318-3 (Ag) (weight %) 36.68 41.47 41.46 32.24 36.74 SA-1507 (Ag) (weight %) 41.47 41.47 Znc Oxide (99.7%) (weight %) 0.14 0.14 0.14 0.14 0.14 0 Terpineol (Slovent) (weight %) 8.14 7.70 7.70 7.70 7.70 8.14 SC181-4 Glass (weight %) 18.46 9.23 9.23 9.23 27.69 18.37 Total (weight %) 100.09 100.01 100.01 99.99 100.00 100.00 Glass mesh cut −400 −400 −400 −400 −400 −400 Glass particel size (D50) (μm) 20 μm 13 μm 13 μm 20 μm 20 μm 13 μm Heat Treatment Temperature (° C.) 370° C. 370° C. 370° C. 370° C. 370° C. 370° C. Resistivity (μΩ-cm) 8.9 6 3.8 8.3 Die Shear Stress (DSS) (Mpa) 0.25″Si/Al2O3 (bare) RT 27.5 0.1″Si/Al2O3 (bare) RT 33.1 43.4 38.6 37.9 0.1″AuSi/Al2O3 (metalized) RT 35.2 26.2 37.9 39.3 0.1″AuSi/Al2O3 (metalized) 300 C. 0.1″AuSi/AgCu (metallized) RT 46.2 0.1″AuSiC/AgCu (metallized) RT 42.1 Thermal Resistance (Rth) (Kcm2/W) 0.3″Si/0.4″Si (bare) RT 0.0283 0.023 0.0221 0.0398 0.0497 0.3″AuSi/0.4″AuSi (metallized) RT 0.0103 0.0223 Ag/Glass Paste MP12-99-2 MP12-101-1 MP12-101-2 MP12-102-1 MP12-103-1 MP12-105-1 Example(s) 13 11, 13 13 9, 10, 11 11 11 Paste Formulation K-0082P (Ag) (weight %) 18.37 36.61 18.23 36.47 36.19 35.64 P318-3 (Ag) (weight %) 55.12 36.61 54.98 36.47 36.19 35.64 SA-1507 (Ag) (weight %) Znc Oxide (99.7%) (weight %) 0 0.27 0.27 0.55 1.20 2.20 Terpineol (Slovent) (weight %) 8.14 8.14 8.14 8.14 8.14 8.14 SC181-4 Glass (weight %) 18.37 18.46 18.37 18.37 18.37 18.37 Total (weight %) 100.00 100.08 99.99 100.00 100.10 100.00 Glass mesh cut −400 −400 −400 −400 −400 −400 Glass particel size (D50) (μm) 13 μm 13 μm 13 μm 13 μm 13 μm 13 μm Heat Treatment Temperature (° C.) 370° C. 370° C. 370° C. 370° C. 370° C. 370° C. Resistivity (μΩ-cm) 8.5 7.5 6.9 8.1 Die Shear Stress (DSS) (Mpa) 0.25″Si/Al2O3 (bare) RT 0.1″Si/Al2O3 (bare) RT 48.9 0.1″AuSi/Al2O3 (metalized) RT 35.2 37.9 38.6 44.1 37.2 39.3 0.1″AuSi/Al2O3 (metalized) 300 C. 26.2 0.1″AuSi/AgCu (metallized) RT 51.7 0.1″AuSiC/AgCu (metallized) RT 22.8 40.0 32.4 Thermal Resistance (Rth) (Kcm2/W) 0.3″Si/0.4″Si (bare) RT 0.0391 0.3″AuSi/0.4″AuSi (metallized) RT 0.0207 0.0100 0.0118 0.0097 0.0079 0.0136 - [Observations on the Results]
- The conductive paste (MP12-102-1) exhibited excellent bond strength between the metallized chip (die) or non-metallized chip (die) and the substrate and excellent electric resistivity.
- The conductive pastes (MP12-65-2, MP12-101-1, MP12-102-1, MP12-103-1, MP12-105-1) having zinc oxide (ZnO) added thereto exhibited excellent electric resistivity and excellent bond strength.
- The conductive pastes (MP12-67-1, MP12-67-2) using silver particles in which the mass ratio of P318-8 and K-0082P (P318-8:K-0082P) is 50:50 exhibited excellent properties.
- The conductive pastes (MP12-88-1, MP12-65-2, MP12-88-2) having different glass frit contents exhibited excellent bond strength.
- The conductive pastes (MP12-99-1, MP12-99-2) containing no zinc oxide (ZnO) were slightly increased in electric resistivity, and thus exhibited poor electric resistivity, as compared to the conductive paste having added thereto zinc oxide (ZnO).
- The conductive paste of the present invention is advantageous not only in that an injurious material, such as lead (Pb), arsenic (As), tellurium (Te), or antimony (Sb), is substantially not contained in the paste, but also in that, for example, a semiconductor chip and a substrate can be bonded by the paste at a relatively low temperature (for example, at 370° C. or lower; for example, when the remelting temperature of the glass frit is 360° C., at a temperature of higher than 360 to 370° C.) to obtain a semiconductor device. Further, the semiconductor device obtained by bonding a semiconductor chip to a substrate using the conductive paste of the present invention can maintain the bond strength between the semiconductor chip and the substrate even when the device is present in an environment at a relatively high temperature (for example, at 300 to 350° C.). The conductive paste of the present invention can be advantageously used in forming a die attach material, a sealing material, or an electrode which can be applied to electronic parts, such as a ceramic package containing therein an integrated circuit device and a display device, i.e., objects to be bonded or adherends which are extremely sensitive to heat. Particularly, the conductive paste of the present invention and the method for producing a semiconductor device using the same can be advantageously used in a die attach material for bonding a SiC semiconductor chip which causes only a small loss in the electric power conversion and which can be stably operated even at high temperatures, and thus are of great industrial significance.
-
-
- 1: Conductive paste
- 1′: Calcined film formed from the conductive paste
- 2: Gap
- 3: Semiconductor chip
- 4: Substrate
- 5: Semiconductor device
Claims (15)
1. A conductive paste comprising:
(A) conductive particles,
(B) a glass frit containing substantially no lead, arsenic, tellurium, and antimony, and
(C) a solvent,
the glass frit (B) having a remelting temperature of 320 to 360° C., wherein the remelting temperature is indicated by a peak top of at least one endothermic peak having an endotherm of 20 J/g or more in a DSC curve as measured by a differential scanning calorimeter.
2. The conductive paste according to claim 1 , further comprising (D) at least one metal oxide selected from the group consisting of tin oxide, zinc oxide, indium oxide, and copper oxide.
3. The conductive paste according to claim 1 , wherein the conductive particles (A) are contained in an amount of 60 to 90% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, and the solvent (C) is contained in an amount of 5 to 12% by mass, based on the mass of the conductive paste.
4. The conductive paste according to claim 2 , wherein the conductive particles (A) are contained in an amount of 60 to 85% by mass, the glass frit (B) is contained in an amount of 5 to 35% by mass, the solvent (C) is contained in an amount of 5 to 10% by mass, and the at least one metal oxide (D) is contained in an amount of 0 to 5% by mass, based on the mass of the conductive paste.
5. The conductive paste according to claim 1 , wherein the glass frit (B) comprises (B-1) Ag2O, (B-2) V2O5, and (B-3) MoO3.
6. The conductive paste according to claim 5 , wherein the glass frit (B) further comprises (B-4) at least one oxide selected from the group consisting of ZnO, CuO, TiO2, MgO, Nb2O5, BaO, Al2O3, SnO, and Fe2O3.
7. The conductive paste according to claim 5 , wherein the glass frit (B) contains Ag2O (B-1) and V2O5 (B-2) in a total amount of 80 to 96% by mass in terms of the oxide, based on the mass of the glass frit (B), wherein a mass ratio of Ag2O (B-1) to V2O5 (B-2) (Ag2O/V2O5) is 1.8 to 3.2.
8. The conductive paste according to claim 5 , wherein the glass frit (B) contains MoO3 (B-3) in an amount of 4 to 10% by mass in terms of the oxide, based on the mass of the glass frit (B).
9. The conductive paste according to claim 6 , wherein the glass frit (B) contains MoO3 (B-3) and the at least one oxide (B-4) in a total amount of 4 to 20% by mass in terms of the oxide, based on the mass of the glass frit (B).
10. The conductive paste according to claim 5 , wherein the glass frit (B) contains Ag2O (B-1) in an amount of 40 to 80% by mass, V2O5 (B-2) in an amount of 16 to 40% by mass, and MoO3 (B-3) in an amount of 4 to 10% by mass, each in terms of the oxide, based on the mass of the glass frit (B).
11. The conductive paste according to claim 6 , wherein the glass frit (B) contains the at least one oxide (B-4) in an amount of 0 to 12% by mass in terms of the oxide, based on the mass of the glass frit (B).
12. The conductive paste according to claim 1 , wherein the conductive particles (A) are silver.
13. The conductive paste according to claim 1 , wherein a mass ratio of the conductive particles (A) and the glass frit (B) (conductive particles:glass frit) is 50:50 to 98:2.
14. A method for producing a semiconductor device comprising the steps of:
applying the conductive paste according to claim 1 to at least one of a substrate and a semiconductor chip;
placing the semiconductor chip on the substrate through the conductive paste;
heating the conductive paste to the remelting temperature or higher of the glass frit (B) contained in the conductive paste to sinter the conductive particles (A) contained in the conductive paste so that the semiconductor chip and the substrate are electrically connected to each other; and
gradually cooling the conductive paste.
15. A method for producing a semiconductor device comprising the steps of:
applying the conductive paste according to claim 1 to at least one of a substrate and a semiconductor chip;
placing the semiconductor chip on the substrate through the conductive paste;
heating the conductive paste to reduce Ag2O (B-1) in the glass frit (B) contained in the conductive paste;
further heating the conductive paste to the remelting temperature or higher of the glass frit (B) contained in the conductive paste; and
gradually cooling the conductive paste to cause crystals to be deposited.
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| JP5819751B2 (en) * | 2012-02-29 | 2015-11-24 | 三ツ星ベルト株式会社 | Conductive laminate, manufacturing method and precursor thereof |
| US20150249167A1 (en) | 2012-10-15 | 2015-09-03 | Dow Global Technologies Llc | Conductive composition |
| US9824900B2 (en) * | 2012-11-09 | 2017-11-21 | Hitachi, Ltd. | Bonded structure and production method therefor |
| US9776909B2 (en) * | 2013-02-01 | 2017-10-03 | Namics Corporation | Glass frit |
-
2015
- 2015-01-14 TW TW104101157A patent/TWI652694B/en active
- 2015-01-15 JP JP2016547128A patent/JP6560684B2/en active Active
- 2015-01-15 KR KR1020167021962A patent/KR102265576B1/en active Active
- 2015-01-15 CN CN201580003406.8A patent/CN105934799B/en active Active
- 2015-01-15 DE DE112015000424.6T patent/DE112015000424B4/en active Active
- 2015-01-15 US US15/110,575 patent/US9540275B2/en active Active
- 2015-01-15 WO PCT/JP2015/051743 patent/WO2015108205A1/en not_active Ceased
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US20160181568A1 (en) * | 2014-12-19 | 2016-06-23 | Samsung Display Co., Ltd. | Display device and method of manufacturing the same |
| US10590319B2 (en) | 2015-08-03 | 2020-03-17 | Namics Corporation | High performance, thermally conductive surface mount (die attach) adhesives |
| US11161775B2 (en) * | 2017-04-28 | 2021-11-02 | Sumitomo Metal Mining Co., Ltd. | Conductive composition, method for producing conductor, and method for forming wire of electronic component |
| US11174193B2 (en) * | 2017-04-28 | 2021-11-16 | Sumitomo Metal Mining Co., Ltd. | Conductive composition and method for producing terminal electrode |
| US11196019B2 (en) * | 2018-11-05 | 2021-12-07 | Samsung Display Co., Ltd. | Display device and method of fabricating the same |
| US20220059797A1 (en) * | 2018-11-05 | 2022-02-24 | Samsung Display Co., Ltd. | Display device and method of fabricating the same |
| US11751418B2 (en) * | 2018-11-05 | 2023-09-05 | Samsung Display Co., Ltd. | Display device and method of fabricating the same |
| EP4027397A4 (en) * | 2019-09-05 | 2023-09-20 | Proterial, Ltd. | METHOD FOR MANUFACTURING THERMOELECTRIC CONVERSION MODULE |
| US11877513B2 (en) | 2019-09-05 | 2024-01-16 | Proterial, Ltd. | Method for manufacturing thermoelectric conversion module |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105934799B (en) | 2018-10-02 |
| TWI652694B (en) | 2019-03-01 |
| US9540275B2 (en) | 2017-01-10 |
| TW201530561A (en) | 2015-08-01 |
| DE112015000424B4 (en) | 2023-05-11 |
| JP6560684B2 (en) | 2019-08-14 |
| WO2015108205A1 (en) | 2015-07-23 |
| KR102265576B1 (en) | 2021-06-17 |
| KR20160106739A (en) | 2016-09-12 |
| DE112015000424T5 (en) | 2016-10-13 |
| CN105934799A (en) | 2016-09-07 |
| JP2017505977A (en) | 2017-02-23 |
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