US20160167089A1 - Forming sacrificial structures using phase-change materials that sublimate - Google Patents
Forming sacrificial structures using phase-change materials that sublimate Download PDFInfo
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- US20160167089A1 US20160167089A1 US14/567,010 US201414567010A US2016167089A1 US 20160167089 A1 US20160167089 A1 US 20160167089A1 US 201414567010 A US201414567010 A US 201414567010A US 2016167089 A1 US2016167089 A1 US 2016167089A1
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- polymer material
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- sublimable
- sacrificial
- hollow space
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- 239000012782 phase change material Substances 0.000 title description 4
- 239000002861 polymer material Substances 0.000 claims abstract description 45
- 239000000463 material Substances 0.000 claims abstract description 41
- 239000011796 hollow space material Substances 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 15
- DDTBPAQBQHZRDW-UHFFFAOYSA-N cyclododecane Chemical compound C1CCCCCCCCCCC1 DDTBPAQBQHZRDW-UHFFFAOYSA-N 0.000 claims description 13
- 238000000859 sublimation Methods 0.000 claims description 8
- 230000008022 sublimation Effects 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
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- 238000000354 decomposition reaction Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
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- 238000004132 cross linking Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
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- 238000005092 sublimation method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/44—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
- B29C33/448—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles destructible
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/112—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/118—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using filamentary material being melted, e.g. fused deposition modelling [FDM]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2075/00—Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material
Definitions
- the disclosed technology relates generally to the field of forming sacrificial structures and, more particularly, to forming sacrificial structures using phase-change materials that sublimate.
- sacrificial materials are generally needed to form temporary support structures that are later removed to leave behind voids or channels.
- Typical sacrificial materials include polymers or waxes that are dissolvable by solvents or can be decomposed by high-temperature annealing.
- removal procedures can disadvantageously cause problems arising from stiction (e.g., static friction that needs to be overcome to enable relative motion of stationary objects in contact) resulting from capillary force during washing. These removal procedures may also undesirably cause decomposition residues to be left behind.
- a structure comprising a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material such as cyclododecane and then removed. This process may be repeated any of a number of times, e.g., to build up layered structures having multiple hollow spaces.
- FIG. 1 is a block diagram illustrating the depositing and crosslinking of a photonic curable polymer material, such as UV-curable polymers and composites, in accordance with certain embodiments of the disclosed technology.
- FIG. 2 is a block diagram illustrating the depositing of a sacrificial material (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material illustrated by FIG. 1 in accordance with certain embodiments of the disclosed technology.
- a sacrificial material e.g., cyclododecane
- FIG. 3 is a block diagram illustrating the depositing of a second layer of UV-curable polymer material to cover the sacrificial structure on the first layer of UV-curable polymer material as illustrated by FIG. 2 in accordance with certain embodiments of the disclosed technology.
- FIG. 4 is a block diagram illustrating a three-dimensional (3D) structure having a channel or hollow space defined therein in accordance with certain embodiments of the disclosed technology.
- FIG. 5 is a graphical representation illustrating an example of the viscosity versus shear rate data for cyclododecane.
- FIG. 6 is a flowchart illustrating an example of a method of creating a structure in accordance with certain embodiments of the disclosed technology.
- Embodiments of the disclosed technology generally pertain to the use of a sacrificial material that can be removed by sublimation, accelerated by heat and/or a low pressure environment. Such embodiments generally do not rely on the use of solvents to wash off the sacrificial materials, thus simplifying the removal process as compared to the decomposition of polymers that requires high temperature burning, for example,
- Certain embodiments of the disclosed technology generally include the use of materials that can be sublimated at low temperature (e.g., less than 160 degrees C.) as the sacrificial structures. Use of such materials may advantageously avoid the use of a solvent or high temperature decomposition during the removal process. Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
- low temperature e.g., less than 160 degrees C.
- Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
- Certain embodiments of the disclosed technology may include the use of cyclododecane, which is a hydrocarbon having a melting point around 58-60 degrees C. and high vapor pressure that allows sublimation thereof at low temperature.
- the phase-change material may be heated to its liquid state for deposition, and then solidify upon contacting a surface below its melting point.
- cyclododecane As cyclododecane has high vapor pressure (e.g., approximately 10 Pa), it may typically be sublimated at room temperature, though generally at slow rate. In certain embodiments, material removal may be accelerated by heating the structure in a low vacuum oven (e.g., 1 millitorr or mTorr) at a certain temperature (e.g., approximately 55 degrees C.). In such embodiments, the sacrificial cyclododecane may be sublimated within minutes, depending on the volume of materials.
- a low vacuum oven e.g., 1 millitorr or mTorr
- FIGS. 1-4 together illustrate an example in which a sacrificial material is used with an ultraviolet (UV)-curable polymer (e.g., polyurethane) to form a three-dimensional (3D) structure having a cavity or hollow space therein in accordance with certain embodiments of the disclosed technology.
- UV ultraviolet
- 3D three-dimensional
- FIG. 1 is a block diagram 100 illustrating the depositing and crosslinking of a UV-curable polymer material and/or other composites 102 .
- FIG. 2 is a block diagram 200 illustrating the depositing of a sacrificial ink or other suitable material 204 (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material 102 illustrated by FIG. 1 .
- a sacrificial ink or other suitable material 204 e.g., cyclododecane
- the sacrificial material 204 then solidifies into a sacrificial structure.
- FIG. 3 is a block diagram 300 illustrating the depositing of a second layer of UV-curable polymer material 306 to cover the sacrificial structure 204 on the first layer of UV-curable polymer material 102 as illustrated by FIG. 2 .
- This second layer of UV-curable polymer material 306 may be subsequently cross-linked.
- the entire structure illustrated by FIG. 3 may be placed in a vacuum oven at a certain temperature (e.g., 55 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr).
- the sacrificial material 204 may then be removed (e.g., by sublimation), leaving behind a structure having a channel 408 defined therein as illustrated by the block diagram 400 of FIG. 4 .
- the sacrificial ink used in the example illustrated by FIGS. 1-4 may be composed of neat cyclododecane with no solvent, but the cyclododecane [or other sublimable material(s)] may also be mixed with an organic solvent, such as toluene or acetone, for example, in order to change the viscosity for different deposition methods. While mixing solvent with the sacrificial material may result in a structural shrinkage issue when the solvent evaporates, this potential issue may be addressed by programming the printing tool to compensate for the dimensional change.
- FIG. 5 is a graphical representation 500 illustrating an example of the viscosity versus shear rate data for cyclododecane.
- FIG. 6 is a flowchart illustrating an example of a method 600 of creating a structure in accordance with certain embodiments of the disclosed technology.
- a first layer of a polymer material such as the ultraviolet (UV)-curable polymer material 102 illustrated by FIGS. 1-4 , may be deposited, e.g., onto a substrate.
- the polymer material may also be crosslinked.
- a sublimable material such as the sacrificial material 204 illustrated by FIGS. 2 and 3 , may be deposited onto the first layer of the polymer material.
- the sublimable material such as cyclododecane, may be deposited from its liquid state and subsequently solidify into a sacrificial structure.
- a second layer of the polymer material such as the UV-curable polymer material 306 illustrated by FIGS. 3 and 4 , may be deposited to cover the sacrificial structure and first layer polymer material.
- This second layer of polymer material may also be subsequently cross-linked.
- the process from 602 to 606 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
- the sublimable material may be removed, e.g., by a sublimation process, to form a hollow space, such as the channel 408 illustrated by FIG. 4 , defined by the first and second layers of polymer material.
- the entire structure may be placed in a vacuum oven at a certain temperature (e.g., approximately 120 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr).
- the process from 602 to 608 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
- Materials having different vapor pressure may be chosen to form sacrificial structures that are sequentially removed. For example, if a certain structural part is to be released before another, the first part may be patterned by a sacrificial material having a certain vapor pressure and the second part to be released may be patterned using a sacrificial material having a vapor pressure that is lower than that of the first sacrificial material.
- the material may also be deposited into a well structure in order to fill in the empty space and hence provide temporary structural support.
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Abstract
A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
Description
- The disclosed technology relates generally to the field of forming sacrificial structures and, more particularly, to forming sacrificial structures using phase-change materials that sublimate.
- In today's layer-by-layer printing techniques for forming three-dimensional (3D) structures, sacrificial materials are generally needed to form temporary support structures that are later removed to leave behind voids or channels. Typical sacrificial materials include polymers or waxes that are dissolvable by solvents or can be decomposed by high-temperature annealing. However, such removal procedures can disadvantageously cause problems arising from stiction (e.g., static friction that needs to be overcome to enable relative motion of stationary objects in contact) resulting from capillary force during washing. These removal procedures may also undesirably cause decomposition residues to be left behind.
- According to aspects illustrated herein, there is provided a structure comprising a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material such as cyclododecane and then removed. This process may be repeated any of a number of times, e.g., to build up layered structures having multiple hollow spaces.
-
FIG. 1 is a block diagram illustrating the depositing and crosslinking of a photonic curable polymer material, such as UV-curable polymers and composites, in accordance with certain embodiments of the disclosed technology. -
FIG. 2 is a block diagram illustrating the depositing of a sacrificial material (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material illustrated byFIG. 1 in accordance with certain embodiments of the disclosed technology. -
FIG. 3 is a block diagram illustrating the depositing of a second layer of UV-curable polymer material to cover the sacrificial structure on the first layer of UV-curable polymer material as illustrated byFIG. 2 in accordance with certain embodiments of the disclosed technology. -
FIG. 4 is a block diagram illustrating a three-dimensional (3D) structure having a channel or hollow space defined therein in accordance with certain embodiments of the disclosed technology. -
FIG. 5 is a graphical representation illustrating an example of the viscosity versus shear rate data for cyclododecane. -
FIG. 6 is a flowchart illustrating an example of a method of creating a structure in accordance with certain embodiments of the disclosed technology. - Embodiments of the disclosed technology generally pertain to the use of a sacrificial material that can be removed by sublimation, accelerated by heat and/or a low pressure environment. Such embodiments generally do not rely on the use of solvents to wash off the sacrificial materials, thus simplifying the removal process as compared to the decomposition of polymers that requires high temperature burning, for example,
- Certain embodiments of the disclosed technology generally include the use of materials that can be sublimated at low temperature (e.g., less than 160 degrees C.) as the sacrificial structures. Use of such materials may advantageously avoid the use of a solvent or high temperature decomposition during the removal process. Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
- Certain embodiments of the disclosed technology may include the use of cyclododecane, which is a hydrocarbon having a melting point around 58-60 degrees C. and high vapor pressure that allows sublimation thereof at low temperature. The phase-change material may be heated to its liquid state for deposition, and then solidify upon contacting a surface below its melting point.
- As cyclododecane has high vapor pressure (e.g., approximately 10 Pa), it may typically be sublimated at room temperature, though generally at slow rate. In certain embodiments, material removal may be accelerated by heating the structure in a low vacuum oven (e.g., 1 millitorr or mTorr) at a certain temperature (e.g., approximately 55 degrees C.). In such embodiments, the sacrificial cyclododecane may be sublimated within minutes, depending on the volume of materials.
-
FIGS. 1-4 together illustrate an example in which a sacrificial material is used with an ultraviolet (UV)-curable polymer (e.g., polyurethane) to form a three-dimensional (3D) structure having a cavity or hollow space therein in accordance with certain embodiments of the disclosed technology. -
FIG. 1 is a block diagram 100 illustrating the depositing and crosslinking of a UV-curable polymer material and/orother composites 102. -
FIG. 2 is a block diagram 200 illustrating the depositing of a sacrificial ink or other suitable material 204 (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinkedpolymer material 102 illustrated byFIG. 1 . Thesacrificial material 204 then solidifies into a sacrificial structure. -
FIG. 3 is a block diagram 300 illustrating the depositing of a second layer of UV-curable polymer material 306 to cover thesacrificial structure 204 on the first layer of UV-curable polymer material 102 as illustrated byFIG. 2 . This second layer of UV-curable polymer material 306 may be subsequently cross-linked. - The entire structure illustrated by
FIG. 3 may be placed in a vacuum oven at a certain temperature (e.g., 55 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr). Thesacrificial material 204 may then be removed (e.g., by sublimation), leaving behind a structure having achannel 408 defined therein as illustrated by the block diagram 400 ofFIG. 4 . - The sacrificial ink used in the example illustrated by
FIGS. 1-4 may be composed of neat cyclododecane with no solvent, but the cyclododecane [or other sublimable material(s)] may also be mixed with an organic solvent, such as toluene or acetone, for example, in order to change the viscosity for different deposition methods. While mixing solvent with the sacrificial material may result in a structural shrinkage issue when the solvent evaporates, this potential issue may be addressed by programming the printing tool to compensate for the dimensional change. -
FIG. 5 is agraphical representation 500 illustrating an example of the viscosity versus shear rate data for cyclododecane. -
FIG. 6 is a flowchart illustrating an example of amethod 600 of creating a structure in accordance with certain embodiments of the disclosed technology. - At 602, a first layer of a polymer material, such as the ultraviolet (UV)-
curable polymer material 102 illustrated byFIGS. 1-4 , may be deposited, e.g., onto a substrate. The polymer material may also be crosslinked. - At 604, a sublimable material, such as the
sacrificial material 204 illustrated byFIGS. 2 and 3 , may be deposited onto the first layer of the polymer material. The sublimable material, such as cyclododecane, may be deposited from its liquid state and subsequently solidify into a sacrificial structure. - At 606, a second layer of the polymer material, such as the UV-
curable polymer material 306 illustrated byFIGS. 3 and 4 , may be deposited to cover the sacrificial structure and first layer polymer material. This second layer of polymer material may also be subsequently cross-linked. The process from 602 to 606 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein. - At 608, the sublimable material may be removed, e.g., by a sublimation process, to form a hollow space, such as the
channel 408 illustrated byFIG. 4 , defined by the first and second layers of polymer material. For example, the entire structure may be placed in a vacuum oven at a certain temperature (e.g., approximately 120 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr). The process from 602 to 608 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein. - Materials having different vapor pressure may be chosen to form sacrificial structures that are sequentially removed. For example, if a certain structural part is to be released before another, the first part may be patterned by a sacrificial material having a certain vapor pressure and the second part to be released may be patterned using a sacrificial material having a vapor pressure that is lower than that of the first sacrificial material.
- In addition to patterning a sacrificial material in a layer-by-layer manner, the material may also be deposited into a well structure in order to fill in the empty space and hence provide temporary structural support.
- It will be appreciated that several of the above-disclosed and other features and functions, or alternatives thereof, may be desirably combined into many other different systems or applications. Also that various presently unforeseen or unanticipated alternatives, modifications, variations, or improvements therein may be subsequently made by those skilled in the art which are also intended to be encompassed by the following claims.
Claims (20)
1. A structure, comprising:
a first layer of a polymer material; and
a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
2. The structure of claim 1 , wherein the sublimable material includes cyclododecane and/or other phase-change composites.
3. The structure of claim 1 , wherein the sacrificial structure has been removed by way of sublimation.
4. The structure of claim 3 , wherein the sublimation was performed at a pressure of approximately 1 millitorr.
5. The structure of claim 3 , wherein the sublimation was performed at a temperature less than 160 degrees C.
6. The structure of claim 5 , wherein the temperature was approximately 55 degrees C.
7. The structure of claim 1 , wherein the polymer material is an ultraviolet-curable polymer material.
8. The structure of claim 1 , wherein the hollow space is a cavity or a channel.
9. The structure of claim 1 , the first and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
10. The structure of claim 1 , further comprising a third layer of the polymer material on the second layer, the third and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
11. A method, comprising:
depositing a first layer of a polymer material;
depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure;
depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material; and
removing the sublimable material to form a first hollow space defined by the first and second layers of the polymer material.
12. The method of claim 11 , wherein the removing includes performing sublimation.
13. The method of claim 12 , wherein the sublimation includes heating at a certain temperature and at a certain pressure.
14. The method of claim 13 , wherein the certain pressure is approximately 1 millitorr.
15. The method of claim 13 , wherein the certain temperature is less than 160 degrees C.
16. The method of claim 15 , wherein the certain temperature is approximately 55 degrees C.
17. The method of claim 11 , wherein the sublimable material includes cyclododecane and/or other phase-change composites.
18. The method of claim 11 , wherein the hollow space is a cavity or a channel.
19. The method of claim 11 , further comprising to build multiple layered structures. depositing a second amount of sublimable material on the first layer of the polymer material to form a second sacrificial structure;
depositing a third layer of the polymer material on the second amount of sublimable material and first layer of the polymer material; and
removing the sublimable material to form a second hollow space defined by the first and third layers of the polymer material.
20. The method of claim 11 , further comprising to build multiple layered structures.
depositing a second amount of sublimable material on the second layer of the polymer material to form a second sacrificial structure;
depositing a third layer of the polymer material on the second amount of sublimable material and second layer of the polymer material; and
removing the second amount of sublimable material to form a second hollow space defined by the second and third layers of the polymer material.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/567,010 US20160167089A1 (en) | 2014-12-11 | 2014-12-11 | Forming sacrificial structures using phase-change materials that sublimate |
| US15/391,723 US10245820B2 (en) | 2014-12-11 | 2016-12-27 | Forming sacrificial structures using phase-change materials that sublimate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/567,010 US20160167089A1 (en) | 2014-12-11 | 2014-12-11 | Forming sacrificial structures using phase-change materials that sublimate |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US15/391,723 Division US10245820B2 (en) | 2014-12-11 | 2016-12-27 | Forming sacrificial structures using phase-change materials that sublimate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20160167089A1 true US20160167089A1 (en) | 2016-06-16 |
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| US15/391,723 Active 2035-04-19 US10245820B2 (en) | 2014-12-11 | 2016-12-27 | Forming sacrificial structures using phase-change materials that sublimate |
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| US15/391,723 Active 2035-04-19 US10245820B2 (en) | 2014-12-11 | 2016-12-27 | Forming sacrificial structures using phase-change materials that sublimate |
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| US9761543B1 (en) | 2016-12-20 | 2017-09-12 | Texas Instruments Incorporated | Integrated circuits with thermal isolation and temperature regulation |
| US9865537B1 (en) | 2016-12-30 | 2018-01-09 | Texas Instruments Incorporated | Methods and apparatus for integrated circuit failsafe fuse package with arc arrest |
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| US6524488B1 (en) | 1998-06-18 | 2003-02-25 | 3M Innovative Properties Company | Method of filtering certain particles from a fluid using a depth loading filtration media |
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| US7087444B2 (en) | 2002-12-16 | 2006-08-08 | Palo Alto Research Center Incorporated | Method for integration of microelectronic components with microfluidic devices |
| WO2005089090A2 (en) * | 2003-10-14 | 2005-09-29 | North Dakota State University | Direct write and freeform fabrication apparatus and method |
| US20050170670A1 (en) | 2003-11-17 | 2005-08-04 | King William P. | Patterning of sacrificial materials |
| US7850861B1 (en) | 2007-06-18 | 2010-12-14 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Microfluidic device, and related methods |
| US8636496B2 (en) * | 2008-05-05 | 2014-01-28 | Georgia Tech Research Corporation | Systems and methods for fabricating three-dimensional objects |
| EP2731783A4 (en) * | 2011-07-13 | 2016-03-09 | Nuvotronics Llc | Methods of fabricating electronic and mechanical structures |
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- 2014-12-11 US US14/567,010 patent/US20160167089A1/en not_active Abandoned
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| US20030148222A1 (en) * | 2002-02-06 | 2003-08-07 | Bowman Lawrence E. | Three dimensional microstructures and method of making |
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| US11904537B2 (en) | 2017-04-21 | 2024-02-20 | Hewlett-Packard Development Company, L.P. | 3D forming objects using high melting temperature polymers |
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Also Published As
| Publication number | Publication date |
|---|---|
| US10245820B2 (en) | 2019-04-02 |
| US20170106605A1 (en) | 2017-04-20 |
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