[go: up one dir, main page]

US20160167089A1 - Forming sacrificial structures using phase-change materials that sublimate - Google Patents

Forming sacrificial structures using phase-change materials that sublimate Download PDF

Info

Publication number
US20160167089A1
US20160167089A1 US14/567,010 US201414567010A US2016167089A1 US 20160167089 A1 US20160167089 A1 US 20160167089A1 US 201414567010 A US201414567010 A US 201414567010A US 2016167089 A1 US2016167089 A1 US 2016167089A1
Authority
US
United States
Prior art keywords
polymer material
layer
sublimable
sacrificial
hollow space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US14/567,010
Inventor
Tse Nga Ng
Bing R. Hsieh
Steven E. Ready
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Palo Alto Research Center Inc
Original Assignee
Palo Alto Research Center Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Palo Alto Research Center Inc filed Critical Palo Alto Research Center Inc
Priority to US14/567,010 priority Critical patent/US20160167089A1/en
Assigned to PALO ALTO RESEARCH CENTER INCORPORATED reassignment PALO ALTO RESEARCH CENTER INCORPORATED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HSIEH, BING R., NG, TSE NGA, READY, STEVEN E.
Publication of US20160167089A1 publication Critical patent/US20160167089A1/en
Priority to US15/391,723 priority patent/US10245820B2/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/40Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50Multilayers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/44Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
    • B29C33/448Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles destructible
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/112Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/118Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using filamentary material being melted, e.g. fused deposition modelling [FDM]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2075/00Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material

Definitions

  • the disclosed technology relates generally to the field of forming sacrificial structures and, more particularly, to forming sacrificial structures using phase-change materials that sublimate.
  • sacrificial materials are generally needed to form temporary support structures that are later removed to leave behind voids or channels.
  • Typical sacrificial materials include polymers or waxes that are dissolvable by solvents or can be decomposed by high-temperature annealing.
  • removal procedures can disadvantageously cause problems arising from stiction (e.g., static friction that needs to be overcome to enable relative motion of stationary objects in contact) resulting from capillary force during washing. These removal procedures may also undesirably cause decomposition residues to be left behind.
  • a structure comprising a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material such as cyclododecane and then removed. This process may be repeated any of a number of times, e.g., to build up layered structures having multiple hollow spaces.
  • FIG. 1 is a block diagram illustrating the depositing and crosslinking of a photonic curable polymer material, such as UV-curable polymers and composites, in accordance with certain embodiments of the disclosed technology.
  • FIG. 2 is a block diagram illustrating the depositing of a sacrificial material (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material illustrated by FIG. 1 in accordance with certain embodiments of the disclosed technology.
  • a sacrificial material e.g., cyclododecane
  • FIG. 3 is a block diagram illustrating the depositing of a second layer of UV-curable polymer material to cover the sacrificial structure on the first layer of UV-curable polymer material as illustrated by FIG. 2 in accordance with certain embodiments of the disclosed technology.
  • FIG. 4 is a block diagram illustrating a three-dimensional (3D) structure having a channel or hollow space defined therein in accordance with certain embodiments of the disclosed technology.
  • FIG. 5 is a graphical representation illustrating an example of the viscosity versus shear rate data for cyclododecane.
  • FIG. 6 is a flowchart illustrating an example of a method of creating a structure in accordance with certain embodiments of the disclosed technology.
  • Embodiments of the disclosed technology generally pertain to the use of a sacrificial material that can be removed by sublimation, accelerated by heat and/or a low pressure environment. Such embodiments generally do not rely on the use of solvents to wash off the sacrificial materials, thus simplifying the removal process as compared to the decomposition of polymers that requires high temperature burning, for example,
  • Certain embodiments of the disclosed technology generally include the use of materials that can be sublimated at low temperature (e.g., less than 160 degrees C.) as the sacrificial structures. Use of such materials may advantageously avoid the use of a solvent or high temperature decomposition during the removal process. Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
  • low temperature e.g., less than 160 degrees C.
  • Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
  • Certain embodiments of the disclosed technology may include the use of cyclododecane, which is a hydrocarbon having a melting point around 58-60 degrees C. and high vapor pressure that allows sublimation thereof at low temperature.
  • the phase-change material may be heated to its liquid state for deposition, and then solidify upon contacting a surface below its melting point.
  • cyclododecane As cyclododecane has high vapor pressure (e.g., approximately 10 Pa), it may typically be sublimated at room temperature, though generally at slow rate. In certain embodiments, material removal may be accelerated by heating the structure in a low vacuum oven (e.g., 1 millitorr or mTorr) at a certain temperature (e.g., approximately 55 degrees C.). In such embodiments, the sacrificial cyclododecane may be sublimated within minutes, depending on the volume of materials.
  • a low vacuum oven e.g., 1 millitorr or mTorr
  • FIGS. 1-4 together illustrate an example in which a sacrificial material is used with an ultraviolet (UV)-curable polymer (e.g., polyurethane) to form a three-dimensional (3D) structure having a cavity or hollow space therein in accordance with certain embodiments of the disclosed technology.
  • UV ultraviolet
  • 3D three-dimensional
  • FIG. 1 is a block diagram 100 illustrating the depositing and crosslinking of a UV-curable polymer material and/or other composites 102 .
  • FIG. 2 is a block diagram 200 illustrating the depositing of a sacrificial ink or other suitable material 204 (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material 102 illustrated by FIG. 1 .
  • a sacrificial ink or other suitable material 204 e.g., cyclododecane
  • the sacrificial material 204 then solidifies into a sacrificial structure.
  • FIG. 3 is a block diagram 300 illustrating the depositing of a second layer of UV-curable polymer material 306 to cover the sacrificial structure 204 on the first layer of UV-curable polymer material 102 as illustrated by FIG. 2 .
  • This second layer of UV-curable polymer material 306 may be subsequently cross-linked.
  • the entire structure illustrated by FIG. 3 may be placed in a vacuum oven at a certain temperature (e.g., 55 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr).
  • the sacrificial material 204 may then be removed (e.g., by sublimation), leaving behind a structure having a channel 408 defined therein as illustrated by the block diagram 400 of FIG. 4 .
  • the sacrificial ink used in the example illustrated by FIGS. 1-4 may be composed of neat cyclododecane with no solvent, but the cyclododecane [or other sublimable material(s)] may also be mixed with an organic solvent, such as toluene or acetone, for example, in order to change the viscosity for different deposition methods. While mixing solvent with the sacrificial material may result in a structural shrinkage issue when the solvent evaporates, this potential issue may be addressed by programming the printing tool to compensate for the dimensional change.
  • FIG. 5 is a graphical representation 500 illustrating an example of the viscosity versus shear rate data for cyclododecane.
  • FIG. 6 is a flowchart illustrating an example of a method 600 of creating a structure in accordance with certain embodiments of the disclosed technology.
  • a first layer of a polymer material such as the ultraviolet (UV)-curable polymer material 102 illustrated by FIGS. 1-4 , may be deposited, e.g., onto a substrate.
  • the polymer material may also be crosslinked.
  • a sublimable material such as the sacrificial material 204 illustrated by FIGS. 2 and 3 , may be deposited onto the first layer of the polymer material.
  • the sublimable material such as cyclododecane, may be deposited from its liquid state and subsequently solidify into a sacrificial structure.
  • a second layer of the polymer material such as the UV-curable polymer material 306 illustrated by FIGS. 3 and 4 , may be deposited to cover the sacrificial structure and first layer polymer material.
  • This second layer of polymer material may also be subsequently cross-linked.
  • the process from 602 to 606 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
  • the sublimable material may be removed, e.g., by a sublimation process, to form a hollow space, such as the channel 408 illustrated by FIG. 4 , defined by the first and second layers of polymer material.
  • the entire structure may be placed in a vacuum oven at a certain temperature (e.g., approximately 120 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr).
  • the process from 602 to 608 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
  • Materials having different vapor pressure may be chosen to form sacrificial structures that are sequentially removed. For example, if a certain structural part is to be released before another, the first part may be patterned by a sacrificial material having a certain vapor pressure and the second part to be released may be patterned using a sacrificial material having a vapor pressure that is lower than that of the first sacrificial material.
  • the material may also be deposited into a well structure in order to fill in the empty space and hence provide temporary structural support.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)

Abstract

A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.

Description

    TECHNICAL FIELD
  • The disclosed technology relates generally to the field of forming sacrificial structures and, more particularly, to forming sacrificial structures using phase-change materials that sublimate.
  • BACKGROUND
  • In today's layer-by-layer printing techniques for forming three-dimensional (3D) structures, sacrificial materials are generally needed to form temporary support structures that are later removed to leave behind voids or channels. Typical sacrificial materials include polymers or waxes that are dissolvable by solvents or can be decomposed by high-temperature annealing. However, such removal procedures can disadvantageously cause problems arising from stiction (e.g., static friction that needs to be overcome to enable relative motion of stationary objects in contact) resulting from capillary force during washing. These removal procedures may also undesirably cause decomposition residues to be left behind.
  • SUMMARY
  • According to aspects illustrated herein, there is provided a structure comprising a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material such as cyclododecane and then removed. This process may be repeated any of a number of times, e.g., to build up layered structures having multiple hollow spaces.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a block diagram illustrating the depositing and crosslinking of a photonic curable polymer material, such as UV-curable polymers and composites, in accordance with certain embodiments of the disclosed technology.
  • FIG. 2 is a block diagram illustrating the depositing of a sacrificial material (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material illustrated by FIG. 1 in accordance with certain embodiments of the disclosed technology.
  • FIG. 3 is a block diagram illustrating the depositing of a second layer of UV-curable polymer material to cover the sacrificial structure on the first layer of UV-curable polymer material as illustrated by FIG. 2 in accordance with certain embodiments of the disclosed technology.
  • FIG. 4 is a block diagram illustrating a three-dimensional (3D) structure having a channel or hollow space defined therein in accordance with certain embodiments of the disclosed technology.
  • FIG. 5 is a graphical representation illustrating an example of the viscosity versus shear rate data for cyclododecane.
  • FIG. 6 is a flowchart illustrating an example of a method of creating a structure in accordance with certain embodiments of the disclosed technology.
  • DETAILED DESCRIPTION
  • Embodiments of the disclosed technology generally pertain to the use of a sacrificial material that can be removed by sublimation, accelerated by heat and/or a low pressure environment. Such embodiments generally do not rely on the use of solvents to wash off the sacrificial materials, thus simplifying the removal process as compared to the decomposition of polymers that requires high temperature burning, for example,
  • Certain embodiments of the disclosed technology generally include the use of materials that can be sublimated at low temperature (e.g., less than 160 degrees C.) as the sacrificial structures. Use of such materials may advantageously avoid the use of a solvent or high temperature decomposition during the removal process. Phase-change material may be deposited as a liquid, and the liquid state may fill in empty spaces and subsequently solidify to enable temporary planarization.
  • Certain embodiments of the disclosed technology may include the use of cyclododecane, which is a hydrocarbon having a melting point around 58-60 degrees C. and high vapor pressure that allows sublimation thereof at low temperature. The phase-change material may be heated to its liquid state for deposition, and then solidify upon contacting a surface below its melting point.
  • As cyclododecane has high vapor pressure (e.g., approximately 10 Pa), it may typically be sublimated at room temperature, though generally at slow rate. In certain embodiments, material removal may be accelerated by heating the structure in a low vacuum oven (e.g., 1 millitorr or mTorr) at a certain temperature (e.g., approximately 55 degrees C.). In such embodiments, the sacrificial cyclododecane may be sublimated within minutes, depending on the volume of materials.
  • FIGS. 1-4 together illustrate an example in which a sacrificial material is used with an ultraviolet (UV)-curable polymer (e.g., polyurethane) to form a three-dimensional (3D) structure having a cavity or hollow space therein in accordance with certain embodiments of the disclosed technology.
  • FIG. 1 is a block diagram 100 illustrating the depositing and crosslinking of a UV-curable polymer material and/or other composites 102.
  • FIG. 2 is a block diagram 200 illustrating the depositing of a sacrificial ink or other suitable material 204 (e.g., cyclododecane) from its liquid state on top of the layer of UV-crosslinked polymer material 102 illustrated by FIG. 1. The sacrificial material 204 then solidifies into a sacrificial structure.
  • FIG. 3 is a block diagram 300 illustrating the depositing of a second layer of UV-curable polymer material 306 to cover the sacrificial structure 204 on the first layer of UV-curable polymer material 102 as illustrated by FIG. 2. This second layer of UV-curable polymer material 306 may be subsequently cross-linked.
  • The entire structure illustrated by FIG. 3 may be placed in a vacuum oven at a certain temperature (e.g., 55 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr). The sacrificial material 204 may then be removed (e.g., by sublimation), leaving behind a structure having a channel 408 defined therein as illustrated by the block diagram 400 of FIG. 4.
  • The sacrificial ink used in the example illustrated by FIGS. 1-4 may be composed of neat cyclododecane with no solvent, but the cyclododecane [or other sublimable material(s)] may also be mixed with an organic solvent, such as toluene or acetone, for example, in order to change the viscosity for different deposition methods. While mixing solvent with the sacrificial material may result in a structural shrinkage issue when the solvent evaporates, this potential issue may be addressed by programming the printing tool to compensate for the dimensional change.
  • FIG. 5 is a graphical representation 500 illustrating an example of the viscosity versus shear rate data for cyclododecane.
  • FIG. 6 is a flowchart illustrating an example of a method 600 of creating a structure in accordance with certain embodiments of the disclosed technology.
  • At 602, a first layer of a polymer material, such as the ultraviolet (UV)-curable polymer material 102 illustrated by FIGS. 1-4, may be deposited, e.g., onto a substrate. The polymer material may also be crosslinked.
  • At 604, a sublimable material, such as the sacrificial material 204 illustrated by FIGS. 2 and 3, may be deposited onto the first layer of the polymer material. The sublimable material, such as cyclododecane, may be deposited from its liquid state and subsequently solidify into a sacrificial structure.
  • At 606, a second layer of the polymer material, such as the UV-curable polymer material 306 illustrated by FIGS. 3 and 4, may be deposited to cover the sacrificial structure and first layer polymer material. This second layer of polymer material may also be subsequently cross-linked. The process from 602 to 606 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
  • At 608, the sublimable material may be removed, e.g., by a sublimation process, to form a hollow space, such as the channel 408 illustrated by FIG. 4, defined by the first and second layers of polymer material. For example, the entire structure may be placed in a vacuum oven at a certain temperature (e.g., approximately 120 degrees C.) and at a certain pressure (e.g., approximately 1 millitorr or mTorr). The process from 602 to 608 may be repeated any of a number of times, e.g., to build multiple-layered structures having multiple hollow spaces defined therein.
  • Materials having different vapor pressure may be chosen to form sacrificial structures that are sequentially removed. For example, if a certain structural part is to be released before another, the first part may be patterned by a sacrificial material having a certain vapor pressure and the second part to be released may be patterned using a sacrificial material having a vapor pressure that is lower than that of the first sacrificial material.
  • In addition to patterning a sacrificial material in a layer-by-layer manner, the material may also be deposited into a well structure in order to fill in the empty space and hence provide temporary structural support.
  • It will be appreciated that several of the above-disclosed and other features and functions, or alternatives thereof, may be desirably combined into many other different systems or applications. Also that various presently unforeseen or unanticipated alternatives, modifications, variations, or improvements therein may be subsequently made by those skilled in the art which are also intended to be encompassed by the following claims.

Claims (20)

What is claimed is:
1. A structure, comprising:
a first layer of a polymer material; and
a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
2. The structure of claim 1, wherein the sublimable material includes cyclododecane and/or other phase-change composites.
3. The structure of claim 1, wherein the sacrificial structure has been removed by way of sublimation.
4. The structure of claim 3, wherein the sublimation was performed at a pressure of approximately 1 millitorr.
5. The structure of claim 3, wherein the sublimation was performed at a temperature less than 160 degrees C.
6. The structure of claim 5, wherein the temperature was approximately 55 degrees C.
7. The structure of claim 1, wherein the polymer material is an ultraviolet-curable polymer material.
8. The structure of claim 1, wherein the hollow space is a cavity or a channel.
9. The structure of claim 1, the first and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
10. The structure of claim 1, further comprising a third layer of the polymer material on the second layer, the third and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
11. A method, comprising:
depositing a first layer of a polymer material;
depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure;
depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material; and
removing the sublimable material to form a first hollow space defined by the first and second layers of the polymer material.
12. The method of claim 11, wherein the removing includes performing sublimation.
13. The method of claim 12, wherein the sublimation includes heating at a certain temperature and at a certain pressure.
14. The method of claim 13, wherein the certain pressure is approximately 1 millitorr.
15. The method of claim 13, wherein the certain temperature is less than 160 degrees C.
16. The method of claim 15, wherein the certain temperature is approximately 55 degrees C.
17. The method of claim 11, wherein the sublimable material includes cyclododecane and/or other phase-change composites.
18. The method of claim 11, wherein the hollow space is a cavity or a channel.
19. The method of claim 11, further comprising to build multiple layered structures. depositing a second amount of sublimable material on the first layer of the polymer material to form a second sacrificial structure;
depositing a third layer of the polymer material on the second amount of sublimable material and first layer of the polymer material; and
removing the sublimable material to form a second hollow space defined by the first and third layers of the polymer material.
20. The method of claim 11, further comprising to build multiple layered structures.
depositing a second amount of sublimable material on the second layer of the polymer material to form a second sacrificial structure;
depositing a third layer of the polymer material on the second amount of sublimable material and second layer of the polymer material; and
removing the second amount of sublimable material to form a second hollow space defined by the second and third layers of the polymer material.
US14/567,010 2014-12-11 2014-12-11 Forming sacrificial structures using phase-change materials that sublimate Abandoned US20160167089A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US14/567,010 US20160167089A1 (en) 2014-12-11 2014-12-11 Forming sacrificial structures using phase-change materials that sublimate
US15/391,723 US10245820B2 (en) 2014-12-11 2016-12-27 Forming sacrificial structures using phase-change materials that sublimate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/567,010 US20160167089A1 (en) 2014-12-11 2014-12-11 Forming sacrificial structures using phase-change materials that sublimate

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US15/391,723 Division US10245820B2 (en) 2014-12-11 2016-12-27 Forming sacrificial structures using phase-change materials that sublimate

Publications (1)

Publication Number Publication Date
US20160167089A1 true US20160167089A1 (en) 2016-06-16

Family

ID=56110234

Family Applications (2)

Application Number Title Priority Date Filing Date
US14/567,010 Abandoned US20160167089A1 (en) 2014-12-11 2014-12-11 Forming sacrificial structures using phase-change materials that sublimate
US15/391,723 Active 2035-04-19 US10245820B2 (en) 2014-12-11 2016-12-27 Forming sacrificial structures using phase-change materials that sublimate

Family Applications After (1)

Application Number Title Priority Date Filing Date
US15/391,723 Active 2035-04-19 US10245820B2 (en) 2014-12-11 2016-12-27 Forming sacrificial structures using phase-change materials that sublimate

Country Status (1)

Country Link
US (2) US20160167089A1 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9761543B1 (en) 2016-12-20 2017-09-12 Texas Instruments Incorporated Integrated circuits with thermal isolation and temperature regulation
US9865537B1 (en) 2016-12-30 2018-01-09 Texas Instruments Incorporated Methods and apparatus for integrated circuit failsafe fuse package with arc arrest
US9929110B1 (en) * 2016-12-30 2018-03-27 Texas Instruments Incorporated Integrated circuit wave device and method
US20180154589A1 (en) * 2016-12-06 2018-06-07 Robert Bosch Tool Corporation Supporting solution for "in air" geometries in 3d additive manufacturing
US10074639B2 (en) 2016-12-30 2018-09-11 Texas Instruments Incorporated Isolator integrated circuits with package structure cavity and fabrication methods
US10121847B2 (en) 2017-03-17 2018-11-06 Texas Instruments Incorporated Galvanic isolation device
US10179730B2 (en) 2016-12-08 2019-01-15 Texas Instruments Incorporated Electronic sensors with sensor die in package structure cavity
US20190168473A1 (en) * 2017-12-01 2019-06-06 GM Global Technology Operations LLC Vascular channel manufacture by deflagration
US10411150B2 (en) 2016-12-30 2019-09-10 Texas Instruments Incorporated Optical isolation systems and circuits and photon detectors with extended lateral P-N junctions
US10723075B2 (en) * 2016-11-02 2020-07-28 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US10861796B2 (en) 2016-05-10 2020-12-08 Texas Instruments Incorporated Floating die package
US11211305B2 (en) 2016-04-01 2021-12-28 Texas Instruments Incorporated Apparatus and method to support thermal management of semiconductor-based components
US11413815B2 (en) 2017-04-21 2022-08-16 Hewlett-Packard Development Company, L.P. 3D forming objects using high melting temperature polymers
US11660819B2 (en) 2016-11-02 2023-05-30 R3 Printing, Inc. System and method for automated successive three-dimensional printing

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11034087B2 (en) * 2017-08-24 2021-06-15 Seiko Epson Corporation Shaping material supply device and three-dimensional shaping apparatus
US11491749B2 (en) 2019-12-03 2022-11-08 GM Global Technology Operations LLC Methods for forming composite components with sealed bi-material interfaces
US11667091B2 (en) 2019-12-03 2023-06-06 GM Global Technology Operations LLC Methods for forming vascular components
CN111775443A (en) * 2020-06-16 2020-10-16 华融普瑞(北京)科技有限公司 High-density ABS material FDM forming process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030148222A1 (en) * 2002-02-06 2003-08-07 Bowman Lawrence E. Three dimensional microstructures and method of making

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6524488B1 (en) 1998-06-18 2003-02-25 3M Innovative Properties Company Method of filtering certain particles from a fluid using a depth loading filtration media
US20060096705A1 (en) 2002-05-22 2006-05-11 Hongqin Shi Removal of sacrificial materials in MEMS fabrications
US7087444B2 (en) 2002-12-16 2006-08-08 Palo Alto Research Center Incorporated Method for integration of microelectronic components with microfluidic devices
WO2005089090A2 (en) * 2003-10-14 2005-09-29 North Dakota State University Direct write and freeform fabrication apparatus and method
US20050170670A1 (en) 2003-11-17 2005-08-04 King William P. Patterning of sacrificial materials
US7850861B1 (en) 2007-06-18 2010-12-14 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Microfluidic device, and related methods
US8636496B2 (en) * 2008-05-05 2014-01-28 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
EP2731783A4 (en) * 2011-07-13 2016-03-09 Nuvotronics Llc Methods of fabricating electronic and mechanical structures

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030148222A1 (en) * 2002-02-06 2003-08-07 Bowman Lawrence E. Three dimensional microstructures and method of making

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11211305B2 (en) 2016-04-01 2021-12-28 Texas Instruments Incorporated Apparatus and method to support thermal management of semiconductor-based components
US12176298B2 (en) 2016-05-10 2024-12-24 Texas Instruments Incorporated Floating die package
US10861796B2 (en) 2016-05-10 2020-12-08 Texas Instruments Incorporated Floating die package
US10723075B2 (en) * 2016-11-02 2020-07-28 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US12337539B2 (en) 2016-11-02 2025-06-24 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US12325188B2 (en) 2016-11-02 2025-06-10 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US20230373164A1 (en) * 2016-11-02 2023-11-23 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US11760017B2 (en) 2016-11-02 2023-09-19 R3 Printing, Inc. System for automated successive three-dimensional printing
US11731355B2 (en) 2016-11-02 2023-08-22 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US11660819B2 (en) 2016-11-02 2023-05-30 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US11167489B2 (en) 2016-11-02 2021-11-09 R3 Printing, Inc. System and method for automated successive three-dimensional printing
US11110658B2 (en) * 2016-11-02 2021-09-07 R3 Printing, Inc. System and method for automated successive three-dimensional printing
GB2568209A (en) * 2016-12-06 2019-05-08 Bosch Gmbh Robert Supporting solution for "in air" geometries in 3D additive manufacturing
WO2018104205A3 (en) * 2016-12-06 2018-08-16 Robert Bosch Gmbh Supporting solution for "in air" geometries in 3d additive manufacturing
US11279122B2 (en) * 2016-12-06 2022-03-22 Robert Bosch Tool Corportation Supporting solution for “in air” geometries in 3D additive manufacturing
CN110023061A (en) * 2016-12-06 2019-07-16 罗伯特·博世有限公司 Support solution for " hanging " geometry in 3D increasing material manufacturing
US20180154589A1 (en) * 2016-12-06 2018-06-07 Robert Bosch Tool Corporation Supporting solution for "in air" geometries in 3d additive manufacturing
US12187601B2 (en) 2016-12-08 2025-01-07 Texas Instruments Incorporated Electronic sensors with sensor die in package structure cavity
US10179730B2 (en) 2016-12-08 2019-01-15 Texas Instruments Incorporated Electronic sensors with sensor die in package structure cavity
US9761543B1 (en) 2016-12-20 2017-09-12 Texas Instruments Incorporated Integrated circuits with thermal isolation and temperature regulation
US11264369B2 (en) 2016-12-30 2022-03-01 Texas Instruments Incorporated Isolator integrated circuits with package structure cavity and fabrication methods
US9929110B1 (en) * 2016-12-30 2018-03-27 Texas Instruments Incorporated Integrated circuit wave device and method
US10411150B2 (en) 2016-12-30 2019-09-10 Texas Instruments Incorporated Optical isolation systems and circuits and photon detectors with extended lateral P-N junctions
US9865537B1 (en) 2016-12-30 2018-01-09 Texas Instruments Incorporated Methods and apparatus for integrated circuit failsafe fuse package with arc arrest
US10074639B2 (en) 2016-12-30 2018-09-11 Texas Instruments Incorporated Isolator integrated circuits with package structure cavity and fabrication methods
US10424551B2 (en) 2016-12-30 2019-09-24 Texas Instruments Incorporated Integrated circuit wave device and method
US10636778B2 (en) 2016-12-30 2020-04-28 Texas Instruments Incorporated Isolator integrated circuits with package structure cavity and fabrication methods
US10529796B2 (en) 2017-03-17 2020-01-07 Texas Instruments Incorporated Galvanic isolation device
US10121847B2 (en) 2017-03-17 2018-11-06 Texas Instruments Incorporated Galvanic isolation device
US11413815B2 (en) 2017-04-21 2022-08-16 Hewlett-Packard Development Company, L.P. 3D forming objects using high melting temperature polymers
US11904537B2 (en) 2017-04-21 2024-02-20 Hewlett-Packard Development Company, L.P. 3D forming objects using high melting temperature polymers
US20190168473A1 (en) * 2017-12-01 2019-06-06 GM Global Technology Operations LLC Vascular channel manufacture by deflagration
US10744682B2 (en) * 2017-12-01 2020-08-18 GM Global Technology Operations LLC Vascular channel manufacture by deflagration

Also Published As

Publication number Publication date
US10245820B2 (en) 2019-04-02
US20170106605A1 (en) 2017-04-20

Similar Documents

Publication Publication Date Title
US10245820B2 (en) Forming sacrificial structures using phase-change materials that sublimate
US6520084B1 (en) Method for making printing plate using inkjet
JP2016155371A5 (en)
US11446741B2 (en) System and method for forming material substrate printer
Gottlieb et al. Thermal scanning probe lithography for the directed self-assembly of block copolymers
WO2018090019A1 (en) Particle stereolithography
US20160129718A1 (en) Embossed heat transfer labels
US9632408B1 (en) Graphoepitaxy directed self assembly
WO2003028985B1 (en) Selective deposition modeling with curable phase change materials
US20190054666A1 (en) Treatment of Polymeric Surfaces of Objects
WO2019060184A3 (en) Improved fill material to mitigate pattern collapse
JP2016013688A5 (en)
Chu et al. Three‐Dimensional Block Copolymer Nanostructures by the Solvent‐Annealing‐Induced Wetting in Anodic Aluminum Oxide Templates
JP2014186773A (en) Pattern formation method and method for manufacturing magnetic recording medium
CN105140393B (en) A kind of structure of composite membrane polymer flexibility substrate and preparation method thereof
US8978737B2 (en) Molding system
EP3198660A1 (en) Method for applying a protective layer, protective layer and semi-finished product with a protective layer
JP2020517981A5 (en)
US20220234058A1 (en) Methods and Devices for Thickness-Limited Electrospray Additive Manufacturing
KR100601264B1 (en) Micro pattern formation method using polymer mold
US20180304547A1 (en) Method of Producing a Plurality of Engineered-Components Using an Additive Manufacturing Process
US11415881B2 (en) Method for functionalising a substrate
JP2015139936A (en) Manufacturing method of structure
Thanumoorthy et al. Constant‐temperature embossing of supercooled polymer films
JP5206225B2 (en) Decoration method, composition for decoration, and object for decoration

Legal Events

Date Code Title Description
AS Assignment

Owner name: PALO ALTO RESEARCH CENTER INCORPORATED, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NG, TSE NGA;HSIEH, BING R.;READY, STEVEN E.;REEL/FRAME:034478/0330

Effective date: 20141210

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION