US20140260613A1 - Elastic bump stops for mems devices - Google Patents
Elastic bump stops for mems devices Download PDFInfo
- Publication number
- US20140260613A1 US20140260613A1 US14/050,201 US201314050201A US2014260613A1 US 20140260613 A1 US20140260613 A1 US 20140260613A1 US 201314050201 A US201314050201 A US 201314050201A US 2014260613 A1 US2014260613 A1 US 2014260613A1
- Authority
- US
- United States
- Prior art keywords
- proof mass
- mems device
- contact surface
- contact
- coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 230000035939 shock Effects 0.000 abstract description 18
- 238000000034 method Methods 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000006399 behavior Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
- G01C19/5733—Structural details or topology
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0862—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system
- G01P2015/0871—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system using stopper structures for limiting the travel of the seismic mass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0862—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system
- G01P2015/0874—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system using means for preventing stiction of the seismic mass to the substrate
Definitions
- Various embodiments of the invention relate generally to bump stops and particularly to elastic bump stops used in microelectromechanical systems (MEMS) device.
- MEMS microelectromechanical systems
- a known problem with MEMS devices is upon experiencing a shock, the MEMS device undergoes chipping at corners when a moving structure contacts a target. This clearly leads to undesirable effects not to mention a short lifetime of the MEMS device as well as increased costs and other foreseen deterioration.
- Bump stops have been historically employed to aid in reducing the impact experienced by MEMS devices. However, such measures have yielded little positive results particularly in light of their stiffness.
- an embodiment of the invention includes a MEMS device having at least one proof mass, the at least one proof mass is capable of moving to contact at least one target structure.
- the MEMS device further includes at least one elastic bump stop coupled to the proof mass and situated at a first distance from the target structure.
- the MEMS device additionally includes at least one secondary bump stop situated at a second distance from the target structure, wherein the second distance is greater than the first distance, and further wherein the at least one elastic bump stop moves to reduce the first distance when a shock is applied.
- FIGS. 1( a ) through 2 ( b ) each show a conceptual diagram of a MEMS device, in accordance embodiments of the invention.
- FIG. 3 shows a portion of a gyroscope with elastic bump stops, in accordance with an embodiment of the invention.
- FIGS. 4( a ) through ( d ) each show various views of out-of-plane elastic bump stops, in accordance with other embodiments of the invention.
- FIGS. 5( a ) through ( f ) show various views of in-plane elastic bump stops, in accordance with yet another embodiment of the invention.
- the following specification describes a MEMS device with multiple bump stops (also referred to herein as “elastic bump” or “bump”) to reduce the affect of a shock to the MEMS device.
- bump stops also referred to herein as “elastic bump” or “bump”
- stiction is an undesirable situation which arises when surface adhesion forces are higher than the mechanical restoring force of a MEMS structure or MEMS device. Stiction is recognized to often occur in situations where two surfaces with areas in close proximity come in contact. The greater the contact area at both macroscopic and microscopic roughness levels, the greater the risk of stiction. At the microscopic level, soft materials can deform, effectively increasing contact area. Surfaces can be unintentionally brought into contact by external environmental forces including vibration, shock and surface tension forces that are present during aqueous sacrificial release steps often used in micro-fabrication processes. Adherence of the two surfaces may occur causing the undesirable stiction.
- a MEMS device having at least one proof mass.
- the proof mass is capable of moving to contact at least one target structure.
- the MEMS device further includes at least one primary bump stop that is coupled to the proof mass and situated at a first distance from the target structure.
- the primary bump stops maybe an elastic bump stop.
- the MEMS device additionally has at least one secondary bump stop situated at a second distance from the target structure. The second distance is greater than the first distance.
- the primary bump stop moves to reduce the first distance when a shock is applied to the MEMS device.
- Flexible element coupled to the proof mas reduces the impact of the force experienced by the proof mas to prevent chipping. In various embodiments of the invention, reduced impact force permits use of smaller bump stops for less stiction.
- the increased flexible element restores force for a secondary bump stop.
- the target structure is positioned at a tilt relative to the elastic bump stops and the elastic bump stops reduce chipping caused by impact at the corners of the target structure, such as the MEMS device, because the bump stop can conform to the tilt.
- elastic bump stops are utilized to help prevent chipping by compressing to help break out a secondary bump stop contact stiction.
- MEMS device may include one or more proof masses, one or more primary bump stops and one or more secondary bump stops.
- the primary bump stop may be more flexible than the secondary bump stop.
- the primary bump stop may be coupled to a target structure or connected to the proof mass.
- the secondary bump stop may be coupled to the target structure or the proof mass.
- the target structure may be a stationary or moveable.
- the MEMS device may include a first contact surface and a second contact surface coupled to the proof mass.
- the first contact surface may be on the primary bump stop or the proof mass or the target structure; the second contact surface may be on the secondary bump stop or the proof mass or the target structure or the primary bump stop.
- the first target surface may be on the primary bump stop or the proof mass or the target structure; the second target surface may be on the secondary bump stop or the proof mass or the target structure.
- the second target structure and the second contact are farther apart than the first target structure and the first contact.
- the first contact surface may be coupled to the proof mass via a flexible element or coupled directly to the proof mass.
- FIGS. 1( a ) through 2 ( b ) each show a conceptual diagram of a MEMS device, in accordance with various embodiments of the invention.
- the first contact is identified as 126 whereas the second contact is identified as 124 .
- the first and second target contacts are 110 .
- FIG. 1( a ) a conceptual diagram of MEMS device 100 with proof mass 102 flexibly extending from a fixed structure 101 , represented by the spring 104 having associated therewith a spring constant ‘k1’.
- the mass ‘m’ moves down in relation to fixed structure 101 with the spring 104 extending (or flexing) downward.
- two secondary bump stops 106 and 108 are shown connected to proof mass 102 and move downwardly with proof mass 102 .
- Secondary bump stops 106 and 108 help to protect proof mass 102 from making contact with another structure 110 especially upon the proof mass experiencing a great shock, as shown in FIG. 1( c ).
- structure 110 may be stationary, in another embodiment, structure 110 may be moveable.
- FIG. 1( a ) is primary contact 114 that flexibly extends downward via and along with a spring 116 that has a spring constant 12 ′.
- Structure 114 makes contact with structure 110 at contact 118 , as shown in FIG. 1( c ), when structure 114 moves downwardly toward the structure 110 .
- the structure 114 is shown, in FIG. 1( a ), to be at a distance 120 , ‘g1’, from structure 110 .
- Secondary bump stops 106 and 108 are shown to be at a distance, ‘g1+g2’ away from structure 110 prior to proof mass 102 experiencing a shock or moving down toward the structure 110 .
- the elastic bump stop operation shown in FIGS. 1( a )-( c ) has at least two advantages.
- One such advantage is to reduce the impact force between secondary bump stops 106 and 108 and structure 110 , another is to have extra restoring force for structure 110 .
- MEMS device 100 is a gyroscope or an accelerometer. While the MEMS device is at rest position, secondary bump stop stops 106 and 108 are not compressed.
- primary bump stop 114 contacts structure 110 to reduce g1 to almost zero and secondary bump stops 106 and 108 are at distance 113 away from structure 110 .
- the force upon proof mass 102 is less than the force proof mass 102 of the embodiment of FIG. 1( c ) experiences.
- the primary bump stop 114 moves translationally toward the structure 110 .
- FIG. 1( a ) secondary bump stops 106 and 108 are shown at a distance that is the sum of g1 and g2 at rest and primary bump stop 114 is shown at the gap 120 or the distance of g1 at rest.
- the distance g1 is nearly zero and the distance 113 is smaller than the distance g1+g2 (of FIG. 1( a )).
- the distances g1 and g2, i.e. gaps 120 and 122 , respectively, are zero. ‘g1’ and ‘g2’ each represent the gaps at rest.
- FIG. 1( a ) shows primary bump stop 114 , with secondary contacts 106 and 108 , between proof mass 102 and the structure 110 at rest, which limits the primary bump stop 114 deflection.
- primary bump stop 114 comes in contact with structure 110 before the secondary bumps 106 and 108 come in contact with structure 110 .
- the contact force between the primary bump stop 114 and structure 110 are indicated with the following:
- f_bounceMax is the maximum force experienced by primary bump stop 114 .
- v0 is smaller than it is in the embodiment of FIG. 1( c ).
- v0 is high as in shown in FIG. 1( c )
- secondary bump stops 106 and 108 move to establish contact with the structure 110
- f_Max is the maximum force determined by the stiffness and deflection of primary bump stop 114 .
- Eq. (1) indicates, either f_bounceMax or f_Max are lowered by low elastic bump stop stiffness k2.
- the elastic member (spring 116 with stiffness k2) applies an extra force f_Max to restore secondary bump stops 106 and 108 and target structure 110 .
- Secondary bump stops 106 and 108 are compressed to help break out the secondary bump stop contact stiction.
- FIGS. 2( a ) and 2 ( b ) show that the bump stops can conform to the contact target tilt at rest position, as shown in FIG. 2( a ).
- primary bump stop 114 can conform to the tilted contact target, or structure 110 .
- structure 110 is not stationary.
- FIGS. 2( a ) and 2 ( b ) show another advantage of an elastic bump stop and that is, it conforms to the contact target structure with its rotational compliance. By conforming to two contact surfaces, the contact area increases thus the contact stress, i.e., contact force divided by contact area, decreases. This reduces the risk of breakage at contact surfaces.
- secondary bump stops 106 and 108 can also be implemented between two moving structures such as proof mass 102 and structure 110 .
- Elastic bump stops have the following advantages. One is flexible contacts that reduce the impact force to proof mass 102 to prevent chipping, thereby permitting use of smaller bump stops with less stiction. Another is increasing the flexible contact to restore the force of the secondary bump stop 124 and reduce the elastic bump stops thereby reducing chipping caused by impact at the corners of proof mass 102 . This is because the bump stop can conform to the tilt (shown in FIGS. 2( a ) and 2 ( b )).
- FIG. 3 shows a portion of a gyroscope with elastic bump stops, in accordance with an embodiment of the invention.
- the gyroscope has anchor at 311 , a system of springs, proof masses, and linking structures.
- the proof mass 313 is the main sensing element; its motion during shock is constrained by bump stops 316 (and other elastic bump stops in circles) against linking structures 312 , 314 , and 315 .
- Elastic bump stops engage in either the Y-directional shock, or the Z-directional shock.
- proof mass 313 initially only has Z-motion, but due to the constraint of the springs, the Z-motion energy is partially transferred to RX (rotation around X-axis) motion.
- the elastic bump stops also rotate in RX direction, and engage to close the contacts.
- Each primary bump stop 362 is supported by a flexible beam 361 to the proof mass 364 .
- the structure 363 is at the opposing structure.
- the flexible beam 361 (also referred to herein as “flexible element”) is a cantilever beam.
- the flexible beam 361 is a clamped-clamped beam.
- the gap 367 closes, due to the flexibility of the flexible beam 361 , the contact force between 362 and the structure 363 are reduced. If the shock is large enough, the gaps 365 and 366 also close, to prevent further relative motion between the proof mass 364 and the structure 363 .
- FIGS. 4( a ) through ( d ) each show various views of elastic bump stops in an accelerometer where the motion of the proof mass is out-of-plane, in accordance with other embodiments of the invention.
- FIG. 4( a ) shows an accelerometer to sense linear acceleration along the Z-axis.
- FIG. 4( b ) shows a portion of the accelerometer enlarged.
- motion along the Z axis is initiated by asymmetric proof mass couple 423 and 424 , supported by pivot springs 422 to anchor 421 with the proof mass 423 being heavier than the proof mass 424 .
- Proof masses 424 and 423 are anchored by anchor 421 to substrate 420 .
- Bump stops are situated on each side of the masses 423 and 424 . Either bump stop can contact the substrate 420 depending on the direction of the Z directional shock.
- Primary bump stop 426 is shown coupled to the proof mass 423 by flexure beam 425 . A portion of proof mass 423 that extends beyond flexure beam 425 functions as a secondary bump stop.
- tip 427 of the primary bump stop 426 comes in contact with the substrate 420 . Due to the flexibility of primary bump stop 426 , the contact force is reduced.
- FIG. 4( d ) shows the accelerometer when a higher intensity shock along the Z-axis, proof mass 423 comes in contact with substrate 420 at 428 .
- the restoration force from flexure beam 425 creates a strong restoring force for secondary bump 428 in addition to the weaker restoration force from pivot springs 422 .
- FIG. 5( a ) shows a z-axis accelerometer for sensing linear acceleration along the Z-axis where the bump stops are in the plane of the substrate. 502 identifies a bump stop similar to that of FIG. 5( d ).
- FIGS. 5( b ) through 5 ( f ) show implementations of the five embodiments of the bump stop 520 and elastic member 510 .
- the elastic member may be a clamp-clamp beam.
- FIG. 5( c ) shows elastic member 510 being coupled to proof mass 530 .
- Bump 520 is coupled to fixed structure 540 .
- Target structure 540 may be a fixed structure.
- elastic member 510 contacts bump stop 520 before secondary bump stops 512 contact the target structure 540 .
- FIG. 5( d ) shows bump stop 520 coupled to proof mass 530 by elastic member 510 .
- FIG. 5( e ) shows bump stop 520 coupled to target structure 540 by elastic member 510 .
- bump stop 520 contacts proof mass 530 before the secondary bump stops 512 contact the proof mass 530 .
- FIG. 5( f ) bump stop 520 is coupled to proof mass 530 .
- FIG. 5 ( g ) is another embodiment of FIG. 5 ( d ) wherein secondary bump stops 524 are coupled to the target structure 540 .
- secondary bump stops 512 may by a flat structure whereas secondary bump stop 524 may be extensions on the fixed structure.
- an elastic bump stop design with a second contact that limits the elastic bump stop deflection so as to prevent the bump stop function is disclosed.
- the elastic bump stop design with the second contact helps restore the second contact and conforms to the contact surface by the rotational compliance of the elastic member.
- the elastic bump stop design with the first contact member either flattens out, or not, against the contact target. Both behaviors can be implemented by specific elastic bump stop designs.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
- Gyroscopes (AREA)
Abstract
A MEMS device includes at least one proof mass, the at least one proof mass is capable of moving to contact at least one target structure. The MEMS device further includes at least one elastic bump stop coupled to the proof mass and situated at a first distance from the target structure. The MEMS device additionally includes at least one secondary bump stop situated at a second distance from the target structure, wherein the second distance is greater than the first distance, and further wherein the at least one elastic bump stop moves to reduce the first distance when a shock is applied.
Description
- This application claims priority to U.S. Provisional Application No. 61/790,300 filed on Mar. 15, 2013, by Qiu et al., and entitled “Elastic Bump Stops for MEMS Devices”.
- Various embodiments of the invention relate generally to bump stops and particularly to elastic bump stops used in microelectromechanical systems (MEMS) device. A known problem with MEMS devices is upon experiencing a shock, the MEMS device undergoes chipping at corners when a moving structure contacts a target. This clearly leads to undesirable effects not to mention a short lifetime of the MEMS device as well as increased costs and other foreseen deterioration. Bump stops have been historically employed to aid in reducing the impact experienced by MEMS devices. However, such measures have yielded little positive results particularly in light of their stiffness.
- What is needed is a MEMS device with reduced impact force upon encountering a shock.
- Briefly, an embodiment of the invention includes a MEMS device having at least one proof mass, the at least one proof mass is capable of moving to contact at least one target structure. The MEMS device further includes at least one elastic bump stop coupled to the proof mass and situated at a first distance from the target structure. The MEMS device additionally includes at least one secondary bump stop situated at a second distance from the target structure, wherein the second distance is greater than the first distance, and further wherein the at least one elastic bump stop moves to reduce the first distance when a shock is applied.
- A further understanding of the nature and the advantages of particular embodiments disclosed herein may be realized by reference of the remaining portions of the specification and the attached drawings.
-
FIGS. 1( a) through 2(b) each show a conceptual diagram of a MEMS device, in accordance embodiments of the invention. -
FIG. 3 shows a portion of a gyroscope with elastic bump stops, in accordance with an embodiment of the invention. -
FIGS. 4( a) through (d) each show various views of out-of-plane elastic bump stops, in accordance with other embodiments of the invention. -
FIGS. 5( a) through (f) show various views of in-plane elastic bump stops, in accordance with yet another embodiment of the invention. - The following specification describes a MEMS device with multiple bump stops (also referred to herein as “elastic bump” or “bump”) to reduce the affect of a shock to the MEMS device.
- As used herein “stiction” is an undesirable situation which arises when surface adhesion forces are higher than the mechanical restoring force of a MEMS structure or MEMS device. Stiction is recognized to often occur in situations where two surfaces with areas in close proximity come in contact. The greater the contact area at both macroscopic and microscopic roughness levels, the greater the risk of stiction. At the microscopic level, soft materials can deform, effectively increasing contact area. Surfaces can be unintentionally brought into contact by external environmental forces including vibration, shock and surface tension forces that are present during aqueous sacrificial release steps often used in micro-fabrication processes. Adherence of the two surfaces may occur causing the undesirable stiction.
- Particular embodiments and methods of the invention disclose a MEMS device having at least one proof mass. The proof mass is capable of moving to contact at least one target structure. The MEMS device further includes at least one primary bump stop that is coupled to the proof mass and situated at a first distance from the target structure. The primary bump stops maybe an elastic bump stop. The MEMS device additionally has at least one secondary bump stop situated at a second distance from the target structure. The second distance is greater than the first distance. The primary bump stop moves to reduce the first distance when a shock is applied to the MEMS device. Flexible element coupled to the proof mas reduces the impact of the force experienced by the proof mas to prevent chipping. In various embodiments of the invention, reduced impact force permits use of smaller bump stops for less stiction. Additionally, the increased flexible element restores force for a secondary bump stop. In some embodiments, the target structure is positioned at a tilt relative to the elastic bump stops and the elastic bump stops reduce chipping caused by impact at the corners of the target structure, such as the MEMS device, because the bump stop can conform to the tilt. Stated differently, elastic bump stops are utilized to help prevent chipping by compressing to help break out a secondary bump stop contact stiction.
- In the described embodiments, MEMS device may include one or more proof masses, one or more primary bump stops and one or more secondary bump stops. The primary bump stop may be more flexible than the secondary bump stop. The primary bump stop may be coupled to a target structure or connected to the proof mass. Similarly, the secondary bump stop may be coupled to the target structure or the proof mass. The target structure may be a stationary or moveable.
- The MEMS device may include a first contact surface and a second contact surface coupled to the proof mass. In some embodiments, the first contact surface may be on the primary bump stop or the proof mass or the target structure; the second contact surface may be on the secondary bump stop or the proof mass or the target structure or the primary bump stop. In some embodiments, the first target surface may be on the primary bump stop or the proof mass or the target structure; the second target surface may be on the secondary bump stop or the proof mass or the target structure. The second target structure and the second contact are farther apart than the first target structure and the first contact. The first contact surface may be coupled to the proof mass via a flexible element or coupled directly to the proof mass.
- In the described embodiments, elastic member, flexible element, spring, and flexible structure maybe used interchangingly.
FIGS. 1( a) through 2(b) each show a conceptual diagram of a MEMS device, in accordance with various embodiments of the invention. InFIG. 1( a) the first contact is identified as 126 whereas the second contact is identified as 124. The first and second target contacts are 110. - Referring now to
FIG. 1( a), a conceptual diagram ofMEMS device 100 withproof mass 102 flexibly extending from afixed structure 101, represented by thespring 104 having associated therewith a spring constant ‘k1’. The mass ‘m’ moves down in relation tofixed structure 101 with thespring 104 extending (or flexing) downward. Along withproof mass 102, two secondary bump stops 106 and 108 are shown connected toproof mass 102 and move downwardly withproof mass 102. Secondary bump stops 106 and 108 help to protectproof mass 102 from making contact with anotherstructure 110 especially upon the proof mass experiencing a great shock, as shown inFIG. 1( c). In anembodiment structure 110 may be stationary, in another embodiment,structure 110 may be moveable. - Further shown in
FIG. 1( a) isprimary contact 114 that flexibly extends downward via and along with aspring 116 that has a spring constant 12′.Structure 114 makes contact withstructure 110 atcontact 118, as shown inFIG. 1( c), whenstructure 114 moves downwardly toward thestructure 110. - The
structure 114 is shown, inFIG. 1( a), to be at adistance 120, ‘g1’, fromstructure 110. Secondary bump stops 106 and 108 are shown to be at a distance, ‘g1+g2’ away fromstructure 110 prior toproof mass 102 experiencing a shock or moving down toward thestructure 110. The elastic bump stop operation, shown inFIGS. 1( a)-(c) has at least two advantages. One such advantage is to reduce the impact force between secondary bump stops 106 and 108 andstructure 110, another is to have extra restoring force forstructure 110. - In
FIG. 1( a), in an embodiment of the invention,MEMS device 100 is a gyroscope or an accelerometer. While the MEMS device is at rest position, secondary bump stop stops 106 and 108 are not compressed. Whenproof mass 102 starts to move with a velocity v0 and when the velocity is small, as shown inFIG. 1( b), primary bump stop 114contacts structure 110 to reduce g1 to almost zero and secondary bump stops 106 and 108 are atdistance 113 away fromstructure 110. In the embodiment ofFIG. 1( b), the force uponproof mass 102 is less than the forceproof mass 102 of the embodiment ofFIG. 1( c) experiences. In an embodiment and method of the invention, the primary bump stop 114 moves translationally toward thestructure 110. - In
FIG. 1( a), secondary bump stops 106 and 108 are shown at a distance that is the sum of g1 and g2 at rest andprimary bump stop 114 is shown at thegap 120 or the distance of g1 at rest. Whereas, inFIG. 1( b), the distance g1 is nearly zero and thedistance 113 is smaller than the distance g1+g2 (ofFIG. 1( a)). InFIG. 1( a)-(c), the distances g1 and g2, i.e. 120 and 122, respectively, are zero. ‘g1’ and ‘g2’ each represent the gaps at rest.gaps - Stated differently,
FIG. 1( a) showsprimary bump stop 114, with 106 and 108, betweensecondary contacts proof mass 102 and thestructure 110 at rest, which limits the primary bump stop 114 deflection. Obviously,primary bump stop 114 comes in contact withstructure 110 before the 106 and 108 come in contact withsecondary bumps structure 110. The contact force between theprimary bump stop 114 andstructure 110 are indicated with the following: -
f bounceMax =v 0√{square root over (mk 2)},f Max =k 2 g 2. Eq. (1) - If v0 is low and the secondary bump stops 106 and 108 are not engaged during impact, f_bounceMax is the maximum force experienced by
primary bump stop 114. In the embodiment ofFIG. 1( b), v0 is smaller than it is in the embodiment ofFIG. 1( c). If v0 is high as in shown inFIG. 1( c), secondary bump stops 106 and 108 move to establish contact with thestructure 110, and f_Max is the maximum force determined by the stiffness and deflection ofprimary bump stop 114. As Eq. (1) indicates, either f_bounceMax or f_Max are lowered by low elastic bump stop stiffness k2. If the secondary bump stops 106 and 108 move to contactstructure 110, the elastic member (spring 116 with stiffness k2) applies an extra force f_Max to restore secondary bump stops 106 and 108 andtarget structure 110. Secondary bump stops 106 and 108 are compressed to help break out the secondary bump stop contact stiction. -
FIGS. 2( a) and 2(b) show that the bump stops can conform to the contact target tilt at rest position, as shown inFIG. 2( a). At contact state (shown inFIG. 2( b)), primary bump stop 114 can conform to the tilted contact target, orstructure 110. In this embodiment,structure 110 is not stationary.FIGS. 2( a) and 2(b) show another advantage of an elastic bump stop and that is, it conforms to the contact target structure with its rotational compliance. By conforming to two contact surfaces, the contact area increases thus the contact stress, i.e., contact force divided by contact area, decreases. This reduces the risk of breakage at contact surfaces. - As shown in
FIG. 2 , secondary bump stops 106 and 108 can also be implemented between two moving structures such asproof mass 102 andstructure 110. Elastic bump stops have the following advantages. One is flexible contacts that reduce the impact force toproof mass 102 to prevent chipping, thereby permitting use of smaller bump stops with less stiction. Another is increasing the flexible contact to restore the force of thesecondary bump stop 124 and reduce the elastic bump stops thereby reducing chipping caused by impact at the corners ofproof mass 102. This is because the bump stop can conform to the tilt (shown inFIGS. 2( a) and 2(b)). -
FIG. 3 shows a portion of a gyroscope with elastic bump stops, in accordance with an embodiment of the invention. InFIG. 3 , only a quarter of the gyroscope is shown, with the lower left corner pointing as the symmetric center. The gyroscope has anchor at 311, a system of springs, proof masses, and linking structures. Theproof mass 313 is the main sensing element; its motion during shock is constrained by bump stops 316 (and other elastic bump stops in circles) against linking 312, 314, and 315. Elastic bump stops engage in either the Y-directional shock, or the Z-directional shock. During a Z-directional shock,structures proof mass 313 initially only has Z-motion, but due to the constraint of the springs, the Z-motion energy is partially transferred to RX (rotation around X-axis) motion. Following this proof mass RX motion, the elastic bump stops also rotate in RX direction, and engage to close the contacts. Eachprimary bump stop 362 is supported by aflexible beam 361 to theproof mass 364. Thestructure 363 is at the opposing structure. There are three 365, 366, 367 in the elastic bump stop structure. In an embodiment, the flexible beam 361 (also referred to herein as “flexible element”) is a cantilever beam. In an embodiment of the invention, thegaps flexible beam 361 is a clamped-clamped beam. - When a shock is applied, first the
gap 367 closes, due to the flexibility of theflexible beam 361, the contact force between 362 and thestructure 363 are reduced. If the shock is large enough, the 365 and 366 also close, to prevent further relative motion between thegaps proof mass 364 and thestructure 363. -
FIGS. 4( a) through (d) each show various views of elastic bump stops in an accelerometer where the motion of the proof mass is out-of-plane, in accordance with other embodiments of the invention.FIG. 4( a) shows an accelerometer to sense linear acceleration along the Z-axis.FIG. 4( b) shows a portion of the accelerometer enlarged. InFIGS. 4( a)-4(d), motion along the Z axis is initiated by asymmetric proof 423 and 424, supported by pivot springs 422 to anchor 421 with themass couple proof mass 423 being heavier than theproof mass 424. 424 and 423 are anchored byProof masses anchor 421 tosubstrate 420. Bump stops are situated on each side of the 423 and 424. Either bump stop can contact themasses substrate 420 depending on the direction of the Z directional shock. The side view of operations, shown inFIGS. 4( c) and 4(d), shows the bumps on theheavier mass 423.Primary bump stop 426 is shown coupled to theproof mass 423 byflexure beam 425. A portion ofproof mass 423 that extends beyondflexure beam 425 functions as a secondary bump stop. During low intensity shock along the Z-axis,tip 427 of theprimary bump stop 426 comes in contact with thesubstrate 420. Due to the flexibility ofprimary bump stop 426, the contact force is reduced.FIG. 4( d) shows the accelerometer when a higher intensity shock along the Z-axis,proof mass 423 comes in contact withsubstrate 420 at 428. The restoration force fromflexure beam 425 creates a strong restoring force forsecondary bump 428 in addition to the weaker restoration force from pivot springs 422. -
FIG. 5( a) shows a z-axis accelerometer for sensing linear acceleration along the Z-axis where the bump stops are in the plane of the substrate. 502 identifies a bump stop similar to that ofFIG. 5( d). -
FIGS. 5( b) through 5(f) show implementations of the five embodiments of thebump stop 520 andelastic member 510. In one embodiment, the elastic member may be a clamp-clamp beam.FIG. 5( c) showselastic member 510 being coupled toproof mass 530.Bump 520 is coupled to fixedstructure 540.Target structure 540 may be a fixed structure. When the MEMS device experiences acceleration along the Z-axis,elastic member 510 contacts bump stop 520 before secondary bump stops 512 contact thetarget structure 540.FIG. 5( d) shows bump stop 520 coupled toproof mass 530 byelastic member 510. Whenproof mass 530 moves, bump stop 520contacts target structure 540 before secondary bump stops 512 contacts thetarget structure 540.FIG. 5( e) shows bump stop 520 coupled to targetstructure 540 byelastic member 510. Whenproof mass 530 moves, bump stop 520 contactsproof mass 530 before the secondary bump stops 512 contact theproof mass 530. InFIG. 5( f), bump stop 520 is coupled toproof mass 530. InFIG. 5 (g) is another embodiment ofFIG. 5 (d) wherein secondary bump stops 524 are coupled to thetarget structure 540. When proof mass moves towards target structure, bump stop 520contacts target structure 540 before secondary bump stops 524 contact theproof mass 530. In an embodiment, secondary bump stops 512 may by a flat structure whereas secondary bump stop 524 may be extensions on the fixed structure. - Thus, in accordance with the various embodiments and methods of the invention, an elastic bump stop design with a second contact that limits the elastic bump stop deflection so as to prevent the bump stop function is disclosed. The elastic bump stop design with the second contact helps restore the second contact and conforms to the contact surface by the rotational compliance of the elastic member. The elastic bump stop design with the first contact member either flattens out, or not, against the contact target. Both behaviors can be implemented by specific elastic bump stop designs.
- The embodiments and methods disclosed herein can also apply to a compass, in addition to a gyroscope, with the compass comprising of moveable elements. Although the description has been described with respect to particular embodiments thereof, these particular embodiments are merely illustrative, and not restrictive.
- As used in the description herein and throughout the claims that follow, “a”, “an”, and “the” includes plural references unless the context clearly dictates otherwise. Also, as used in the description herein and throughout the claims that follow, the meaning of “in” includes “in” and “on” unless the context clearly dictates otherwise.
- Thus, while particular embodiments have been described herein, latitudes of modification, various changes, and substitutions are intended in the foregoing disclosures, and it will be appreciated that in some instances some features of particular embodiments will be employed without a corresponding use of other features without departing from the scope and spirit as set forth. Therefore, many modifications may be made to adapt a particular situation or material to the essential scope and spirit.
Claims (19)
1. A MEMS device comprising:
at least one proof mass capable of moving relative to a substrate;
a first contact surface coupled to the at least one proof mass;
a second contact surface coupled to the at least one proof mass;
a first target surface facing the first contact surface and separated from the first contact surface by a first distance;
a second target surface facing the second contact surface and separated from the second contact surface by a second distance; and
the first contact surface is coupled to the proof mass by a flexible element or the first target surface is coupled to the flexible element,
wherein the at least one proof mass is coupled to the substrate by a spring,
wherein when the at least one proof mass moves, the first contact surface moves to reduce the first distance until the first contact surface contacts the first target surface,
wherein when the first contact surface and the first target surface are in contact and the at least one proof mass moves, at least one flexible element flexes and the second contact surface moves to reduce the second distance until the second contact surface contacts the second target surface.
2. The MEMS device of claim 1 , wherein the at least one proof mass moves at a plane substantially parallel to the substrate.
3. The MEMS device of claim 1 , wherein the at least one proof mass moves out of a plane parallel to the substrate.
4. The MEMS device of claim 1 , wherein the flexible element is a torsional spring.
5. The MEMS device of claim 1 , wherein the first target surface is stationary with respect to the substrate.
6. The MEMS device of claim 5 , wherein the flexible element is coupled to the at least one proof mass.
7. The MEMS device of claim 1 , wherein the flexible element is a clamped-clamped beam.
8. The MEMS device of claim 7 , further comprising a first structure coupled to the first target surface, thereby extending a portion of the first target surface towards the at least one proof mass.
9. The MEMS device of claim 7 , further comprising a first structure coupled to the first contact surface thereby extending a portion of the first contact surface towards the at least one proof mass
10. The MEMS device of claim 9 , further comprising a second structure coupled to the second target surface or the second contact surface.
11. The MEMS device of claim 10 , wherein the second structure is a secondary bump stop.
12. The MEMS device of claim 10 , wherein the second structure is less flexible than the at least one flexible element.
13. The MEMS device of claim 1 , wherein the second target surface is stationary with respect to the substrate.
14. The MEMS device of claim 1 , wherein the first contact surface is smaller than the second contact surface.
15. The MEMS device of claim 1 , where in the MEMS device is a gyroscope or an accelerometer.
16. The MEMS device of claim 1 , wherein the at least one proof mass moves translationally.
17. The MEMS device of claim 1 , wherein the at least one proof mass moves rotationally.
18. The MEMS device of claim 1 , further comprising a structure coupled to the at least one proof mass by a second flexible element,
wherein the first contact surface is formed on a the first surface of the structure,
wherein the second target surface is formed on a second surface of the structure,
wherein the second contact surface is formed on the at least one proof mass.
19. The MEMS device of claim 18 , wherein the second flexible element is a cantilever beam.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/050,201 US20140260613A1 (en) | 2013-03-15 | 2013-10-09 | Elastic bump stops for mems devices |
| US16/044,463 US10527420B2 (en) | 2013-03-15 | 2018-07-24 | Elastic bump stops for MEMS devices |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361790300P | 2013-03-15 | 2013-03-15 | |
| US14/050,201 US20140260613A1 (en) | 2013-03-15 | 2013-10-09 | Elastic bump stops for mems devices |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/044,463 Continuation US10527420B2 (en) | 2013-03-15 | 2018-07-24 | Elastic bump stops for MEMS devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20140260613A1 true US20140260613A1 (en) | 2014-09-18 |
Family
ID=51521264
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US14/050,201 Abandoned US20140260613A1 (en) | 2013-03-15 | 2013-10-09 | Elastic bump stops for mems devices |
| US16/044,463 Active US10527420B2 (en) | 2013-03-15 | 2018-07-24 | Elastic bump stops for MEMS devices |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/044,463 Active US10527420B2 (en) | 2013-03-15 | 2018-07-24 | Elastic bump stops for MEMS devices |
Country Status (1)
| Country | Link |
|---|---|
| US (2) | US20140260613A1 (en) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170023606A1 (en) * | 2015-07-23 | 2017-01-26 | Freescale Semiconductor, Inc. | Mems device with flexible travel stops and method of fabrication |
| US20170082519A1 (en) * | 2015-09-22 | 2017-03-23 | Murata Manufacturing Co., Ltd. | Semi-flexible proof-mass |
| CN108423633A (en) * | 2017-02-14 | 2018-08-21 | 恩智浦美国有限公司 | With off-axis shockproof MEMS device |
| US20180252744A1 (en) * | 2017-03-03 | 2018-09-06 | Hitachi, Ltd. | Acceleration sensor |
| US20190078886A1 (en) * | 2017-09-14 | 2019-03-14 | Kabushiki Kaisha Toshiba | Sensor device |
| US20190120872A1 (en) * | 2017-10-24 | 2019-04-25 | Nxp Usa, Inc. | Mems device with two-stage motion limit structure |
| US10330472B2 (en) * | 2016-06-30 | 2019-06-25 | Kabushiki Kaisha Toshiba | Angular velocity acquisition device |
| US10732199B2 (en) * | 2017-12-20 | 2020-08-04 | Apple Inc. | Multi-stage MEMS accelerometer for mixed g-level operation |
| IT201900009651A1 (en) * | 2019-06-20 | 2020-12-20 | St Microelectronics Srl | MEMS INERTIAL SENSOR WITH HIGH RESISTANCE TO THE PHENOMENON OF ADHESION |
| IT201900024475A1 (en) * | 2019-12-18 | 2021-06-18 | St Microelectronics Srl | MICROMECHANICAL DEVICE WITH ELASTIC GROUP WITH VARIABLE ELASTIC CONSTANT |
| US11242240B2 (en) * | 2017-09-25 | 2022-02-08 | Robert Bosch Gmbh | Micromechanical sensor system |
| CN114229786A (en) * | 2020-09-09 | 2022-03-25 | 罗伯特·博世有限公司 | Micromechanical structure and micromechanical sensor |
| EP4095484A1 (en) * | 2021-05-25 | 2022-11-30 | STMicroelectronics S.r.l. | Microelectromechanical device with out-of-plane stopper structure and process for manufacturing a microelectromechanical device |
| US11519932B2 (en) * | 2020-03-16 | 2022-12-06 | Stmicroelectronics S.R.L. | MEMS inertial sensor with high resilience to the phenomenon of stiction |
| US11619647B2 (en) * | 2020-05-04 | 2023-04-04 | Robert Bosch Gmbh | Micromechanical sensor system, method for using a micromechanical sensor system |
| US11661332B2 (en) | 2019-02-20 | 2023-05-30 | Invensense, Inc. | Stiction reduction system and method thereof |
| CN117589164A (en) * | 2024-01-18 | 2024-02-23 | 苏州亿波达微系统技术有限公司 | High overload resistance inertial sensor |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11768220B2 (en) | 2021-09-09 | 2023-09-26 | Nxp Usa, Inc. | Accelerometer having an over travel stop with a stop gap less than a minimum etch size |
| US11846648B2 (en) | 2022-01-07 | 2023-12-19 | Invensense, Inc. | Low stress overtravel stop |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030217597A1 (en) * | 2002-05-24 | 2003-11-27 | Mitsubishi Denki Kabushiki Kaisha | Inertia force sensor |
| US6694814B2 (en) * | 2001-02-02 | 2004-02-24 | Denso Corporation | Dynamic sensor having capacitance varying according to dynamic force applied thereto |
| US20040112133A1 (en) * | 2002-12-16 | 2004-06-17 | Glenn Max C. | Methods and systems for decelerating proof mass movements within mems structures |
| US20070220973A1 (en) * | 2005-08-12 | 2007-09-27 | Cenk Acar | Multi-axis micromachined accelerometer and rate sensor |
| US20080022770A1 (en) * | 2005-02-01 | 2008-01-31 | Yoshihisa Fukuda | Semiconductor Acceleration Sensor |
| US20100000323A1 (en) * | 2006-09-19 | 2010-01-07 | Commissariat A L'energie Atomique | Resonant-beam accelerometer with rotating articulated lever arm |
| DE102008043753A1 (en) * | 2008-11-14 | 2010-05-20 | Robert Bosch Gmbh | Sensor arrangement has substrate and seismic mass, where seismic mass is fixed to substrate by hanging springs, where seismic mass is movably provided in direction of substrate element |
| US20120216616A1 (en) * | 2011-02-24 | 2012-08-30 | Freescale Semiconductor, Inc. | MEMS Device With Enhanced Resistance to Stiction |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8011247B2 (en) * | 2008-06-26 | 2011-09-06 | Honeywell International Inc. | Multistage proof-mass movement deceleration within MEMS structures |
| DE102012207939B4 (en) * | 2012-05-11 | 2024-12-05 | Robert Bosch Gmbh | Spring-loaded stop for acceleration sensor |
-
2013
- 2013-10-09 US US14/050,201 patent/US20140260613A1/en not_active Abandoned
-
2018
- 2018-07-24 US US16/044,463 patent/US10527420B2/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6694814B2 (en) * | 2001-02-02 | 2004-02-24 | Denso Corporation | Dynamic sensor having capacitance varying according to dynamic force applied thereto |
| US20030217597A1 (en) * | 2002-05-24 | 2003-11-27 | Mitsubishi Denki Kabushiki Kaisha | Inertia force sensor |
| US20040112133A1 (en) * | 2002-12-16 | 2004-06-17 | Glenn Max C. | Methods and systems for decelerating proof mass movements within mems structures |
| US20080022770A1 (en) * | 2005-02-01 | 2008-01-31 | Yoshihisa Fukuda | Semiconductor Acceleration Sensor |
| US20070220973A1 (en) * | 2005-08-12 | 2007-09-27 | Cenk Acar | Multi-axis micromachined accelerometer and rate sensor |
| US20100000323A1 (en) * | 2006-09-19 | 2010-01-07 | Commissariat A L'energie Atomique | Resonant-beam accelerometer with rotating articulated lever arm |
| DE102008043753A1 (en) * | 2008-11-14 | 2010-05-20 | Robert Bosch Gmbh | Sensor arrangement has substrate and seismic mass, where seismic mass is fixed to substrate by hanging springs, where seismic mass is movably provided in direction of substrate element |
| US20120216616A1 (en) * | 2011-02-24 | 2012-08-30 | Freescale Semiconductor, Inc. | MEMS Device With Enhanced Resistance to Stiction |
Cited By (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170023606A1 (en) * | 2015-07-23 | 2017-01-26 | Freescale Semiconductor, Inc. | Mems device with flexible travel stops and method of fabrication |
| US20170082519A1 (en) * | 2015-09-22 | 2017-03-23 | Murata Manufacturing Co., Ltd. | Semi-flexible proof-mass |
| WO2017051241A1 (en) * | 2015-09-22 | 2017-03-30 | Murata Manufacturing Co., Ltd. | Semi-flexible proof-mass |
| CN108027386A (en) * | 2015-09-22 | 2018-05-11 | 株式会社村田制作所 | Semi-flexible sensitive-mass block |
| JP2018530765A (en) * | 2015-09-22 | 2018-10-18 | 株式会社村田製作所 | Semi-flexible proof mass |
| US10190938B2 (en) * | 2015-09-22 | 2019-01-29 | Murata Manufacturing Co., Ltd. | Semi-flexible proof-mass |
| US10330472B2 (en) * | 2016-06-30 | 2019-06-25 | Kabushiki Kaisha Toshiba | Angular velocity acquisition device |
| CN108423633A (en) * | 2017-02-14 | 2018-08-21 | 恩智浦美国有限公司 | With off-axis shockproof MEMS device |
| US10247753B2 (en) | 2017-02-14 | 2019-04-02 | Nxp Usa, Inc. | MEMS device with off-axis shock protection |
| US20180252744A1 (en) * | 2017-03-03 | 2018-09-06 | Hitachi, Ltd. | Acceleration sensor |
| US10935566B2 (en) * | 2017-03-03 | 2021-03-02 | Hitachi, Ltd. | Acceleration sensor |
| US10760910B2 (en) * | 2017-09-14 | 2020-09-01 | Kabushiki Kaisha Toshiba | Sensor device employing MEMS |
| EP3457082A1 (en) * | 2017-09-14 | 2019-03-20 | Kabushiki Kaisha Toshiba | Sensor device |
| US20190078886A1 (en) * | 2017-09-14 | 2019-03-14 | Kabushiki Kaisha Toshiba | Sensor device |
| US11242240B2 (en) * | 2017-09-25 | 2022-02-08 | Robert Bosch Gmbh | Micromechanical sensor system |
| US20190120872A1 (en) * | 2017-10-24 | 2019-04-25 | Nxp Usa, Inc. | Mems device with two-stage motion limit structure |
| US10502759B2 (en) * | 2017-10-24 | 2019-12-10 | Nxp Usa, Inc. | MEMS device with two-stage motion limit structure |
| CN109696164A (en) * | 2017-10-24 | 2019-04-30 | 恩智浦美国有限公司 | MEMS device with two stages movement limiting structure |
| US10732199B2 (en) * | 2017-12-20 | 2020-08-04 | Apple Inc. | Multi-stage MEMS accelerometer for mixed g-level operation |
| US11661332B2 (en) | 2019-02-20 | 2023-05-30 | Invensense, Inc. | Stiction reduction system and method thereof |
| US11543428B2 (en) * | 2019-06-20 | 2023-01-03 | Stmicroelectronics S.R.L. | MEMs inertial sensor with high resistance to stiction |
| EP3754343A1 (en) * | 2019-06-20 | 2020-12-23 | STMicroelectronics S.r.l. | Mems inertial sensor with high resistance to stiction |
| US12117464B2 (en) | 2019-06-20 | 2024-10-15 | Stmicroelectronics S.R.L. | Mems inertial sensor with high resistance to stiction |
| IT201900009651A1 (en) * | 2019-06-20 | 2020-12-20 | St Microelectronics Srl | MEMS INERTIAL SENSOR WITH HIGH RESISTANCE TO THE PHENOMENON OF ADHESION |
| US11698388B2 (en) | 2019-12-18 | 2023-07-11 | Stmicroelectronics S.R.L. | Micromechanical device with elastic assembly having variable elastic constant |
| IT201900024475A1 (en) * | 2019-12-18 | 2021-06-18 | St Microelectronics Srl | MICROMECHANICAL DEVICE WITH ELASTIC GROUP WITH VARIABLE ELASTIC CONSTANT |
| CN113009181A (en) * | 2019-12-18 | 2021-06-22 | 意法半导体股份有限公司 | Micromechanical device with elastic component with variable elastic constant |
| EP3839520A1 (en) | 2019-12-18 | 2021-06-23 | STMicroelectronics S.r.l. | Micromechanical device with elastic assembly having variable elastic constant |
| US11519932B2 (en) * | 2020-03-16 | 2022-12-06 | Stmicroelectronics S.R.L. | MEMS inertial sensor with high resilience to the phenomenon of stiction |
| US12038454B2 (en) * | 2020-03-16 | 2024-07-16 | Stmicroelectronics S.R.L. | MEMS inertial sensor with high resilience to the phenomenon of stiction |
| US11619647B2 (en) * | 2020-05-04 | 2023-04-04 | Robert Bosch Gmbh | Micromechanical sensor system, method for using a micromechanical sensor system |
| CN114229786A (en) * | 2020-09-09 | 2022-03-25 | 罗伯特·博世有限公司 | Micromechanical structure and micromechanical sensor |
| EP4095484A1 (en) * | 2021-05-25 | 2022-11-30 | STMicroelectronics S.r.l. | Microelectromechanical device with out-of-plane stopper structure and process for manufacturing a microelectromechanical device |
| US12325628B2 (en) | 2021-05-25 | 2025-06-10 | Stmicroelectronics S.R.L. | Microelectromechanical device with out-of-plane stopper structure |
| CN117589164A (en) * | 2024-01-18 | 2024-02-23 | 苏州亿波达微系统技术有限公司 | High overload resistance inertial sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| US20180347984A1 (en) | 2018-12-06 |
| US10527420B2 (en) | 2020-01-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10527420B2 (en) | Elastic bump stops for MEMS devices | |
| US8354900B2 (en) | Microelectromechanical device provided with an anti-stiction structure, and corresponding anti-stiction method | |
| FI126598B (en) | Microelectromechanical device with motion limiter | |
| EP3121145B1 (en) | Mems device with flexible travel stops and method of fabrication | |
| FI126797B (en) | Operating Limits Configuration | |
| US10502759B2 (en) | MEMS device with two-stage motion limit structure | |
| CN108027386B (en) | Semi-flexible sensitive mass block | |
| US10287159B2 (en) | MEMS device | |
| US8516891B2 (en) | Multi-stage stopper system for MEMS devices | |
| US20220091154A1 (en) | Micromechanical structure and micromechanical sensor | |
| JP7287438B2 (en) | Premature collision motion limiter for MEMS devices | |
| US10696542B2 (en) | Micromechanical component and method for producing a micromechanical component | |
| US20240069061A1 (en) | Low stress overtravel stop | |
| JP7235095B2 (en) | low impact motion limiter | |
| JP2019505013A (en) | Device for refracting a laser beam in two dimensions | |
| WO2012015301A2 (en) | Micro-electromechanical system | |
| JP6999669B2 (en) | Attenuation system for moving masses of MEMS devices | |
| CN107082405B (en) | MEMS device structure | |
| US20250187902A1 (en) | MEMS Device | |
| EP4641216A1 (en) | Multi-stage mems stopper device and method | |
| EP4439010A1 (en) | Microelectromechanical device with movable mass and stopper mechanism |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: INVENSENSE, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:QIU, JIN;SEEGER, JOSEPH;SIGNING DATES FROM 20131002 TO 20131008;REEL/FRAME:031376/0427 |
|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO PAY ISSUE FEE |