US20090120798A1 - Method For Manufacturing Plated Resin Molded Article - Google Patents
Method For Manufacturing Plated Resin Molded Article Download PDFInfo
- Publication number
- US20090120798A1 US20090120798A1 US11/791,934 US79193406A US2009120798A1 US 20090120798 A1 US20090120798 A1 US 20090120798A1 US 79193406 A US79193406 A US 79193406A US 2009120798 A1 US2009120798 A1 US 2009120798A1
- Authority
- US
- United States
- Prior art keywords
- molded article
- resin molded
- acid
- thermoplastic resin
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 71
- 239000011347 resin Substances 0.000 title claims abstract description 71
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000007747 plating Methods 0.000 claims abstract description 53
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 46
- 239000002253 acid Substances 0.000 claims abstract description 27
- 239000007788 liquid Substances 0.000 claims abstract description 23
- 229910001385 heavy metal Inorganic materials 0.000 claims abstract description 12
- 238000005530 etching Methods 0.000 claims abstract description 11
- 238000009713 electroplating Methods 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 24
- 229920002647 polyamide Polymers 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 15
- 239000004952 Polyamide Substances 0.000 claims description 5
- 150000002736 metal compounds Chemical class 0.000 claims 1
- 229910000000 metal hydroxide Inorganic materials 0.000 claims 1
- 150000004692 metal hydroxides Chemical class 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract description 12
- -1 polypropylene Polymers 0.000 description 84
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 24
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 24
- 238000011282 treatment Methods 0.000 description 21
- 229920001577 copolymer Polymers 0.000 description 19
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 150000003839 salts Chemical class 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 229920006111 poly(hexamethylene terephthalamide) Polymers 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 229910052783 alkali metal Inorganic materials 0.000 description 10
- 239000004677 Nylon Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 229920001778 nylon Polymers 0.000 description 9
- 229920002554 vinyl polymer Polymers 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 230000003247 decreasing effect Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 7
- 238000007772 electroless plating Methods 0.000 description 7
- 230000004927 fusion Effects 0.000 description 7
- 229920001169 thermoplastic Polymers 0.000 description 7
- 239000004416 thermosoftening plastic Substances 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 6
- 235000014113 dietary fatty acids Nutrition 0.000 description 6
- 239000000194 fatty acid Substances 0.000 description 6
- 229930195729 fatty acid Natural products 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011342 resin composition Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 230000004913 activation Effects 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 229920001955 polyphenylene ether Polymers 0.000 description 4
- 150000003606 tin compounds Chemical class 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000005749 Copper compound Substances 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229920002292 Nylon 6 Polymers 0.000 description 3
- 229920002302 Nylon 6,6 Polymers 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000000701 coagulant Substances 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- 150000001880 copper compounds Chemical class 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 229910000765 intermetallic Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 3
- ZMJBYMUCKBYSCP-UHFFFAOYSA-N (+)-Erythro-hydroxycitric acid Natural products OC(=O)C(O)C(O)(C(O)=O)CC(O)=O ZMJBYMUCKBYSCP-UHFFFAOYSA-N 0.000 description 2
- CFPOJWPDQWJEMO-UHFFFAOYSA-N 2-(1,2-dicarboxyethoxy)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)OC(C(O)=O)CC(O)=O CFPOJWPDQWJEMO-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- LJKDOMVGKKPJBH-UHFFFAOYSA-N 2-ethylhexyl dihydrogen phosphate Chemical compound CCCCC(CC)COP(O)(O)=O LJKDOMVGKKPJBH-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- GVNWZKBFMFUVNX-UHFFFAOYSA-N Adipamide Chemical compound NC(=O)CCCCC(N)=O GVNWZKBFMFUVNX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 2
- 229920000571 Nylon 11 Polymers 0.000 description 2
- 229920000299 Nylon 12 Polymers 0.000 description 2
- 229920000577 Nylon 6/66 Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920000388 Polyphosphate Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229930006000 Sucrose Natural products 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- POJWUDADGALRAB-UHFFFAOYSA-N allantoin Chemical compound NC(=O)NC1NC(=O)NC1=O POJWUDADGALRAB-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000008103 glucose Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 229920000578 graft copolymer Polymers 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229920005669 high impact polystyrene Polymers 0.000 description 2
- 239000004797 high-impact polystyrene Substances 0.000 description 2
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 2
- 229940091173 hydantoin Drugs 0.000 description 2
- 150000001469 hydantoins Chemical class 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- QZUPTXGVPYNUIT-UHFFFAOYSA-N isophthalamide Chemical compound NC(=O)C1=CC=CC(C(N)=O)=C1 QZUPTXGVPYNUIT-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 150000002941 palladium compounds Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- ZJAOAACCNHFJAH-UHFFFAOYSA-N phosphonoformic acid Chemical compound OC(=O)P(O)(O)=O ZJAOAACCNHFJAH-UHFFFAOYSA-N 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000001205 polyphosphate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000008262 pumice Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000005720 sucrose Substances 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- NEXZVOLIDKSFBH-UHFFFAOYSA-N (1,1-diphenyl-2-phosphonooxyethyl) 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C(COP(O)(O)=O)(OC(=O)C(=C)C)C1=CC=CC=C1 NEXZVOLIDKSFBH-UHFFFAOYSA-N 0.000 description 1
- YRIOTLGRXFJRTJ-UHFFFAOYSA-N (1,1-diphenyl-2-phosphonooxyethyl) prop-2-enoate Chemical compound C=1C=CC=CC=1C(OC(=O)C=C)(COP(O)(=O)O)C1=CC=CC=C1 YRIOTLGRXFJRTJ-UHFFFAOYSA-N 0.000 description 1
- KIUKXJAPPMFGSW-DNGZLQJQSA-N (2S,3S,4S,5R,6R)-6-[(2S,3R,4R,5S,6R)-3-Acetamido-2-[(2S,3S,4R,5R,6R)-6-[(2R,3R,4R,5S,6R)-3-acetamido-2,5-dihydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-2-carboxy-4,5-dihydroxyoxan-3-yl]oxy-5-hydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-3,4,5-trihydroxyoxane-2-carboxylic acid Chemical compound CC(=O)N[C@H]1[C@H](O)O[C@H](CO)[C@@H](O)[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](O[C@H]3[C@@H]([C@@H](O)[C@H](O)[C@H](O3)C(O)=O)O)[C@H](O)[C@@H](CO)O2)NC(C)=O)[C@@H](C(O)=O)O1 KIUKXJAPPMFGSW-DNGZLQJQSA-N 0.000 description 1
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- UHQIQVGJUUTUDH-UHFFFAOYSA-N (3-oxo-6,7,8,9-tetraphenyl-2,4-dioxa-3lambda5-phosphabicyclo[3.2.2]nona-1(7),5,8-trien-3-yl) dihydrogen phosphate Chemical compound C=1C=CC=CC=1C1=C(C(C=2C=CC=CC=2)=C2C=3C=CC=CC=3)OP(OP(O)(=O)O)(=O)OC2=C1C1=CC=CC=C1 UHQIQVGJUUTUDH-UHFFFAOYSA-N 0.000 description 1
- QJMZKBJSJUDCMO-UHFFFAOYSA-N (3-oxo-6,7,8,9-tetraphenyl-2,4-dioxa-3lambda5-phosphabicyclo[3.3.1]nona-1(9),5,7-trien-3-yl) dihydrogen phosphate Chemical compound O1P(OP(O)(=O)O)(=O)OC(C(=C2C=3C=CC=CC=3)C=3C=CC=CC=3)=C(C=3C=CC=CC=3)C1=C2C1=CC=CC=C1 QJMZKBJSJUDCMO-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- CIOXZGOUEYHNBF-UHFFFAOYSA-N (carboxymethoxy)succinic acid Chemical compound OC(=O)COC(C(O)=O)CC(O)=O CIOXZGOUEYHNBF-UHFFFAOYSA-N 0.000 description 1
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- TXVWTOBHDDIASC-UHFFFAOYSA-N 1,2-diphenylethene-1,2-diamine Chemical compound C=1C=CC=CC=1C(N)=C(N)C1=CC=CC=C1 TXVWTOBHDDIASC-UHFFFAOYSA-N 0.000 description 1
- SFRLSTJPMFGBDP-UHFFFAOYSA-N 1,2-diphosphonoethylphosphonic acid Chemical compound OP(O)(=O)CC(P(O)(O)=O)P(O)(O)=O SFRLSTJPMFGBDP-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 description 1
- RFTORHYUCZJHDO-UHFFFAOYSA-N 1,3-dimethylimidazolidine-2,4-dione Chemical compound CN1CC(=O)N(C)C1=O RFTORHYUCZJHDO-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical class C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- MXYOPVWZZKEAGX-UHFFFAOYSA-N 1-phosphonoethylphosphonic acid Chemical compound OP(=O)(O)C(C)P(O)(O)=O MXYOPVWZZKEAGX-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XEQHLQRGOCSKSJ-UHFFFAOYSA-N 2,2-dimethylpropyl diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)(OCC(C)(C)C)OC1=CC=CC=C1 XEQHLQRGOCSKSJ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- RAEOEMDZDMCHJA-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-[2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]ethyl]amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CCN(CC(O)=O)CC(O)=O)CC(O)=O RAEOEMDZDMCHJA-UHFFFAOYSA-N 0.000 description 1
- INJFRROOFQOUGJ-UHFFFAOYSA-N 2-[hydroxy(methoxy)phosphoryl]butanedioic acid Chemical compound COP(O)(=O)C(C(O)=O)CC(O)=O INJFRROOFQOUGJ-UHFFFAOYSA-N 0.000 description 1
- OOOLSJAKRPYLSA-UHFFFAOYSA-N 2-ethyl-2-phosphonobutanedioic acid Chemical compound CCC(P(O)(O)=O)(C(O)=O)CC(O)=O OOOLSJAKRPYLSA-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- DTXOROCKOGNREW-UHFFFAOYSA-N 3-ethylbenzene-1,2-diol;phosphoric acid Chemical compound OP(O)(O)=O.CCC1=CC=CC(O)=C1O DTXOROCKOGNREW-UHFFFAOYSA-N 0.000 description 1
- MYWGVBFSIIZBHJ-UHFFFAOYSA-N 4-phosphonobutane-1,2,3-tricarboxylic acid Chemical compound OC(=O)CC(C(O)=O)C(C(O)=O)CP(O)(O)=O MYWGVBFSIIZBHJ-UHFFFAOYSA-N 0.000 description 1
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 1
- 239000004953 Aliphatic polyamide Substances 0.000 description 1
- POJWUDADGALRAB-PVQJCKRUSA-N Allantoin Natural products NC(=O)N[C@@H]1NC(=O)NC1=O POJWUDADGALRAB-PVQJCKRUSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical class [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- PHOQVHQSTUBQQK-SQOUGZDYSA-N D-glucono-1,5-lactone Chemical compound OC[C@H]1OC(=O)[C@H](O)[C@@H](O)[C@@H]1O PHOQVHQSTUBQQK-SQOUGZDYSA-N 0.000 description 1
- 239000004375 Dextrin Substances 0.000 description 1
- 229920001353 Dextrin Polymers 0.000 description 1
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 101000837308 Homo sapiens Testis-expressed protein 30 Proteins 0.000 description 1
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- NGEWQZIDQIYUNV-UHFFFAOYSA-N L-valinic acid Natural products CC(C)C(O)C(O)=O NGEWQZIDQIYUNV-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229920003189 Nylon 4,6 Polymers 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 229920000572 Nylon 6/12 Polymers 0.000 description 1
- 229920000007 Nylon MXD6 Polymers 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920001214 Polysorbate 60 Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004373 Pullulan Substances 0.000 description 1
- 229920001218 Pullulan Polymers 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 102100028631 Testis-expressed protein 30 Human genes 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- BQPNUOYXSVUVMY-UHFFFAOYSA-N [4-[2-(4-diphenoxyphosphoryloxyphenyl)propan-2-yl]phenyl] diphenyl phosphate Chemical compound C=1C=C(OP(=O)(OC=2C=CC=CC=2)OC=2C=CC=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OP(=O)(OC=1C=CC=CC=1)OC1=CC=CC=C1 BQPNUOYXSVUVMY-UHFFFAOYSA-N 0.000 description 1
- DUJHUESDNVWCBZ-UHFFFAOYSA-N [acetyloxy(2-hydroxyethyl)amino] acetate Chemical compound CC(=O)ON(CCO)OC(C)=O DUJHUESDNVWCBZ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229920003231 aliphatic polyamide Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229960000458 allantoin Drugs 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- TZYHIGCKINZLPD-UHFFFAOYSA-N azepan-2-one;hexane-1,6-diamine;hexanedioic acid Chemical compound NCCCCCCN.O=C1CCCCCN1.OC(=O)CCCCC(O)=O TZYHIGCKINZLPD-UHFFFAOYSA-N 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- WVMHLYQJPRXKLC-UHFFFAOYSA-N borane;n,n-dimethylmethanamine Chemical compound B.CN(C)C WVMHLYQJPRXKLC-UHFFFAOYSA-N 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical class Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical class [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 235000019425 dextrin Nutrition 0.000 description 1
- ASMQGLCHMVWBQR-UHFFFAOYSA-M diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)([O-])OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-M 0.000 description 1
- YHRRLJVICROTOJ-UHFFFAOYSA-N diphenyl phosphono phosphate Chemical compound C=1C=CC=CC=1OP(=O)(OP(O)(=O)O)OC1=CC=CC=C1 YHRRLJVICROTOJ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 235000010944 ethyl methyl cellulose Nutrition 0.000 description 1
- 229920005676 ethylene-propylene block copolymer Polymers 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229960005102 foscarnet Drugs 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 235000012209 glucono delta-lactone Nutrition 0.000 description 1
- 229960003681 gluconolactone Drugs 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- SRCZENKQCOSNAI-UHFFFAOYSA-H gold(3+);trisulfite Chemical compound [Au+3].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O SRCZENKQCOSNAI-UHFFFAOYSA-H 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 229920002674 hyaluronan Polymers 0.000 description 1
- 229960003160 hyaluronic acid Drugs 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- TVZISJTYELEYPI-UHFFFAOYSA-N hypodiphosphoric acid Chemical compound OP(O)(=O)P(O)(O)=O TVZISJTYELEYPI-UHFFFAOYSA-N 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 235000010355 mannitol Nutrition 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- RTWNYYOXLSILQN-UHFFFAOYSA-N methanediamine Chemical compound NCN RTWNYYOXLSILQN-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 229920003087 methylethyl cellulose Polymers 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-K pentetate(3-) Chemical compound OC(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O QPCDCPDFJACHGM-UHFFFAOYSA-K 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical class Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 229920006139 poly(hexamethylene adipamide-co-hexamethylene terephthalamide) Polymers 0.000 description 1
- 229920006140 poly(hexamethylene isophthalamide)-co-poly(hexamethylene adipamide) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920006123 polyhexamethylene isophthalamide Polymers 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920012287 polyphenylene sulfone Polymers 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019423 pullulan Nutrition 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- OBBXFSIWZVFYJR-UHFFFAOYSA-L tin(2+);sulfate Chemical compound [Sn+2].[O-]S([O-])(=O)=O OBBXFSIWZVFYJR-UHFFFAOYSA-L 0.000 description 1
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- KOWVWXQNQNCRRS-UHFFFAOYSA-N tris(2,4-dimethylphenyl) phosphate Chemical compound CC1=CC(C)=CC=C1OP(=O)(OC=1C(=CC(C)=CC=1)C)OC1=CC=C(C)C=C1C KOWVWXQNQNCRRS-UHFFFAOYSA-N 0.000 description 1
- QLORRTLBSJTMSN-UHFFFAOYSA-N tris(2,6-dimethylphenyl) phosphate Chemical compound CC1=CC=CC(C)=C1OP(=O)(OC=1C(=CC=CC=1C)C)OC1=C(C)C=CC=C1C QLORRTLBSJTMSN-UHFFFAOYSA-N 0.000 description 1
- LIPMRGQQBZJCTM-UHFFFAOYSA-N tris(2-propan-2-ylphenyl) phosphate Chemical compound CC(C)C1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C(C)C)OC1=CC=CC=C1C(C)C LIPMRGQQBZJCTM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
Definitions
- the present invention relates to a method for manufacturing plated resin molded article which has strong adhesion of plating.
- Resin molded articles such as an ABS resin and a poly amide resin have been used as automobile parts for the purpose of reducing the weight of an automobile, and plating such as copper or nickel is carried out on the resin molded articles in order to give a upscale image and a sense of beauty.
- an etching step of roughing the surface of the resin molded articles is conventionally essential to enhance the adhering strength after the removal step of fat.
- a bath of chromic acid a mix solution of chromium (III) oxide and sulfuric acid
- an etching treatment is required to be carried out at 65 to 70° C. for 10 to 15 minutes.
- poisonous hexa-valent chromic acid ion is contained in waste water. Therefore, a treatment of neutrally precipitating after reducing the hexa-valent chromic acid ion to a tri-valent ion is essential, which creates problems in wastewater treatment.
- JP-A 5-239660 and WO 98/45505 (U.S. Pat. No. 3,208,410) describe the use of direct plating method during the course of plating on the surface of resin molded article. According to the Experimental Example 1 of JP-A 5-239660, however, a pretreatment of surface roughening with pumice is applied, thus it is difficult to manufacture a resin molded article having beautiful appearance. Since WO 98/45505 (U.S. Pat. No. 3,208,410) adopts chromic acid etching, it cannot solve the problems of conventional technologies.
- An object of the present invention is to provide a method for manufacturing plated resin molded article which can eliminate the etching treatment by chromic acid and the like, which has strong adhesion between the resin molded article and the plating layer, and which provides beautiful appearance.
- the first aspect of the present invention is to provide a method for manufacturing plated resin molded article comprising the steps of: contact-treating a thermoplastic resin molded article using an acid or base free from heavy metal; treating the contact-treated thermoplastic resin molded article by a catalyst imparting liquid; forming an electrically conductive layer on the surface of the thermoplastic resin molded article using a direct plating method; and applying electroplating to the electrically conductive layer; without applying the step of etching by an acid which contains heavy metal.
- the second aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1 , wherein the direct plating method comprises the step of forming an electrically conductive layer on the surface of a thermoplastic resin molded article using a selector liquid which contains a metallic compound, a reducing compound and a metallic hydroxide.
- the third aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1 or 2 , wherein the thermoplastic resin molded article contains a polyamide.
- the fourth aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1 or 2 , wherein the thermoplastic resin molded article further contains a substance which has a solubility (23° C.) in water of 300 g/100 g or less.
- use of the direct plating method allows decreasing the man-hours compared with the inventions disclosed in JP-A 2003-82138 and 2003-166067, and eliminates the toxic reducing agent such as formalin.
- a single step may be divided into two or more of sub-steps, and two or more of steps may be integrated into a single step. Furthermore, at needed, a known step in the plating method may be added as described below.
- the degreasing treatment is applied to a thermoplastic resin molded article which is formed into a shape suitable for the use using a known method such as injection molding.
- the degreasing treatment is conducted using an aqueous solution of surfactant containing an alkali such as sodium hydroxide or sodium carbonate, or an acid such as sulfuric acid or carboxylic acid.
- an alkali such as sodium hydroxide or sodium carbonate
- an acid such as sulfuric acid or carboxylic acid.
- the present invention allows to move to succeeding step without need of the etching step using chromic acid and the like, as the surface-roughening treatment in order to increase the adhesion of plating layer, and without need of physical surface-roughening treatment (for example, a treatment of rubbing the surface with pumice, as disclosed in JP-A5-239660).
- thermoplastic resin molded article is subjected to contact-treatment by an acid or base free from heavy metal (metal such as chromium and manganese).
- the degreasing treatment as the preceding step may be eliminated, and the contact-treatment may be adopted as the first treatment step.
- the acid free from heavy metal may be hydrochloric acid, phosphoric acid, sulfuric acid, or an organic acid such as acetic acid, citric acid or formic acid.
- the base free from heavy metal may be a hydroxide of alkali metal or alkali earth metal, such as sodium hydroxide, potassium hydroxide, calcium hydroxide or magnesium hydroxide.
- a concentration of the acid or base free from heavy metal differs with the kind.
- a preferred normality is in a range from 1.5 to 3.5.
- a preferred normality is in a range from 1.8 to 3.5, and more preferably from 2 to 3.
- their concentrations may be selected so as the surface of the thermoplastic resin after the treatment, (which can be determined by, for example, a scanning electron microscope (SEM)), to become equivalent to that of the hydrogen chloride treatment.
- the treatment in the step can use a method of immersing the thermoplastic resin-molded article into an acid or base free from heavy metal.
- a method immersing the article in an acid or base free from heavy metal at a liquid temperature in a range from 10° C. to 80° C. for a period from 0.5 to 20 minutes.
- hydrochloric acid with a normality in a range from 1.5 to 3.5 is used, the article may be immersed in an aqueous solution of hydrochloric acid with the above concentration range at a temperature ranging from 20° C. to 60° C. for a period from 1 to 10 minutes.
- the step of treating with a catalyst-providing liquid is given to the thermoplastic resin-molded article after the preceding step.
- the step is a known one, and it is preferable to give a step of water-washing before and after the step.
- the catalyst-providing liquid may be a known one.
- Examples of the catalyst-providing liquid are the one containing a catalyst metal, a tin compound and an acid, and, at needed, containing other components.
- the catalyst may be a known one.
- the catalyst are a platinum compound (platinum chloride salt, and the like), a gold compound (gold sulfite salt, and the like), a palladium compound (palladium chloride, palladium sulfate, and the like), a silver compound (silver nitrate, silver sulfate, and the like).
- a preferable amount of the catalyst is in a range from 100 to 500 mg/L as metal.
- Applicable tin compound includes tin(II) chloride and tin(II) sulfate.
- a preferable use amount of the tin compound is in a range from 10 to 50 g/L as tin, and 50 to 120 times (mass basis) the amount of the catalyst metal.
- the acid is hydrochloric acid, sulfuric aid, or a mixed acid of hydrochloric acid and sulfuric acid. Alternatively, they may be mixed with sodium chloride.
- the acid is adjusted so as the pH of the catalyst-providing liquid to become around 1.
- a preferable catalyst-providing liquid is the one which contains a palladium compound as the catalyst, tin(II) chloride as the tin compound, and hydrochloric acid as the acid.
- the treatment in the step can adopt a method of immersing the thermoplastic resin-molded article into a catalyst-providing liquid at room temperature for a period approximately from 1 to 10 minutes.
- an electrically conductive layer is formed on the surface of the thermoplastic resin molded article using the direct plating method.
- the direct plating method is a known technique, and is disclosed in JP-A 5-239660, WO 98/45505 (U.S. Pat. No. 3,208,410), JP-A 2002-338636 (Paragraph No. 5), and others.
- a plating liquid called the “selector liquid” is used, thus forming a very thin electrically conductive layer compared with the plating layer (electrically conductive layer) formed by the conventionally and widely using chemical plating.
- Electroless plating method results in deposition of plating also on the jigs using in the plating, thus the replacement of jigs becomes necessary. Direct plating method, however, plating very little deposits on the jigs.
- Applicable selector liquid includes a liquid containing a metallic compound, a reducing compound, and a metallic hydroxide.
- a preferred metallic compound is a copper compound.
- the copper compound are copper(II) sulfate, copper chlorides, copper carbonates, copper oxides and copper hydroxides.
- the content of copper compound is preferably in a range from 0.1 to 5 g/L as copper, and more preferably from 0.8 to 1.2 g/L.
- the reducing compound does not include the one having strong reducing power, such as formalin and phosphinic acid, which are widely used in known electroless plating (chemical plating), and is the one having weak reducing power compared with those given above.
- Examples of the reducing compound include the following:
- tin(II) chloride sodium borohydride, dimethylamine borane, trimethylamine borane, formic acid or salt thereof, alcohol such as methanol, ethanol, propanol, ethylene glycol or glycerin, and salt thereof; and
- succharide such as glucose, sorbite, cellulose, sucrose, mannite or gluconolactone.
- the content of succharide is preferably in a range from 3 to 50 g/L, and more preferably from 10 to 20 g/L.
- Applicable metallic hydroxide includes sodium hydroxide, potassium hydroxide and lithium hydroxide.
- the content of metallic hydroxide is preferably in a range from 10 to 80 g/L, and more preferably from 30 to 50 g/L.
- the selector liquid can, at needed, further contain a complexing agent.
- Applicable complexing agent includes hydantoins and organic carboxylic acids.
- the hydantoins include hydantoin, 1-methylhydantoin, 1,3-dimethylhydantoin, 5,5-dimethylhydantoin and allantoin.
- Applicable organic carboxylic acids include citric acid, tartaric acid, succinic acid, and salt thereof.
- the content of complexing agent in the selector is preferably in a range from 2 to 50 g/L, and more preferably from 10 to 40 g/L.
- the pH of selector liquid is preferably in a range from 10.0 to 14.0, and more preferably from 11.55 to 13.5.
- Examples of the selector liquid are the plating bath described in Experimental Example 1 (C) of JP-A 5-239660, and the invention baths 1 to 8 described in WO 98/45505 (U.S. Pat. No. 3,208,410). If needed, other known components may also be added to the bath.
- the treatment in the step may adopt a method in which the temperature of the selector liquid is adjusted to a range preferably from 20° C. to 70° C., more preferably from 35° C. to 50° C., then the thermoplastic resin molded article is immersed in the liquid for a period approximately from 30 seconds to 20 minutes, preferably approximately from 3 to 5 minutes.
- the succeeding step can directly apply the electroplating.
- thermoplastic resin-molded article on which the electrically conductive layer is formed in the preceding step.
- thermoplastic resin molded article to which the manufacturing method of the present invention is applied can be obtained by molding a thermoplastic resin composition containing a combination of one or more of the thermoplastic resins described below, and, at needed, other components.
- the present invention preferably uses a polyamide-based resin, a styrene-based resin, an olefin-based resin, a polyphenylene ether resin (PPE), a polyphenylene sulfone resin (PPS), and a polysulfone resin, and more preferably uses a thermoplastic resin composition which contains a polyamide-based resin.
- thermoplastic resin is the one having a water absorption (in water at 23° C. after 24 hours have passed: ISO 62) of 0.6% or more, more preferably in a range from 0.6 to 5%, and most preferably from 0.6 to 2%.
- thermoplastic resin having poor water absorption is treated by a manufacturing method containing direct plating method, the increase in the man-hours is inevitable to attain the optimum conditions to manufacture the resin-molded article having beautiful appearance and high adhesion of plating. If, however, the resin composition which contains a thermoplastic resin having good water absorption (also good adsorption of metal) as described above, or a resin composition containing a thermoplastic resin having good water absorption is used, the direct plating method readily forms the electrically conductive layer, which is preferable because of decreasing the man-hours.
- thermoplastic resin composition containing two or more of resins it is preferable that the content of the thermoplastic resin which satisfies the above water absorption is adjusted to 30% by mass or more.
- the polyamide-based resin is a polyamide resin formed from diamine and dicarboxylic acid, and a copolymer thereof.
- the resin may be in crystalline shape, in amorphous shape, or in a mixture thereof. If crystalline shape and amorphous shape are mixed together, the crystallinity degree is preferably 60% or less, and more preferably 40% or less.
- the polyamide-based resin includes: nylon 66, polyhexamethylene sebacamide (nylon 6-10), polyhexamethylene dodecanamide (nylon 6-12), polydodecamethylene dodecanamide (nylon 1212), polymethaxylylene adipamide (nylon MXD6), polytetramethylene adipamide (nylon 46), their mixture, and a copolymer thereof; nylon 6/66, nylon 66/6T (6T: polyhexamethylene terephthalamide) containing 50% by mole or less of 6T component, nylon 66/6I (6I: plyhexamethylene isophthalamide) containing 50% by mole or less of 6I component, copolymer of nylon 6T/6I/66 and nylon 6T/6I/610; polyhexamethylene terephthalamide (nylon 6T), polyhexamethylene isophthalamide (nylon 6I), poly(2-methylpentamethylene)terephthalamide (nylon M5T), poly(2-methylpentamthy
- polyamide-based resins are a ring-opened polymer of cyclic lactam, a polycondensate of aminocarboxylic acid, and a copolymer composed of these components; specifically an aliphatic polyamide resin such as nylon 6, poly- ⁇ -undecanamide (nylon 11) or poly- ⁇ -dodecanamide (nylon 12), and a copolymer thereof, a copolymer with polyamide consisting of diamine and dicarboxylic acid, specifically nylon 6T/6, nylon 6T/11, nylon 6T/12, nylon 6T/6I/12, nylon 6T/6I/610/12, and a mixture thereof.
- preferable polyamide-based resins are PA (nylon) 6 , PA (nylon)66 and PA (nylon)6/66.
- a preferred polyamide-based resin is the one having 10 J/g or larger heat of crystal fusion, more preferably from 10 to 150 J/g, further preferably from 15 to 120 J/g, specifically preferably from 20 to 100 J/g, and most preferably from 25 to 90 J/g.
- the polyamide-based resin which has the heat of crystal fusion within the above range contains the crystal portion being determined by the heat of crystal fusion and also contains residual amorphous portions.
- the amorphous portion of the polyamide-based resin is separated from the surface of the thermoplastic resin-molded article, and the function of micropores created after the separation of the amorphous portion induces the formation of the strong plating layer, which is preferable.
- the heat of crystal fusion is determined by DSC observation. That is, 5 to 10 mg of sample is collected from the target polyamide-based resin pellets. The sample is scanned by DSC 600E (manufactured by Shimadzu Corp.) for two times of temperature scanning under the conditions of 20° C./min of temperature-rising speed and 20° C./min of temperature-lowering speed. The heat of crystal fusion observed in the second scan is adopted as the heat of crystal fusion.
- styrene-based resin examples include styrene and polymers of styrene-derivatives such as ⁇ -substitution or nucleus substitution styrene.
- copolymers composed mainly of above monomers and containing monomers such as vinyl compound such as acrylonitrile, acrylic acid, and methacrylic acid, and/or conjugate diene compound such as butadiene and isoprene.
- polystyrene examples include polystyrene, high-impact polystyrene (HIPS resin), acrylonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), styrene-methacrylate copolymer (MS resin) and styrene-butadiene copolymer (SBS resin).
- HIPS resin high-impact polystyrene
- ABS resin acrylonitrile-butadiene-styrene copolymer
- AS resin acrylonitrile-styrene copolymer
- MS resin styrene-methacrylate copolymer
- SBS resin styrene-butadiene copolymer
- the polystyrene-based resin may contain a styrene-based copolymer in which an unsaturated compound containing carboxy group is copolymerized to increase the compatibility with polyamide-based resin.
- the styrene-based copolymer in which the unsaturated compound containing carboxy group is copolymerized is a copolymer prepared by polymerizing an unsaturated compound containing carboxylic group with, at needed, other monomer which can copolymerized therewith, in the presence of a gummy polymer. Examples of the components are:
- a graft polymer prepared by polymerizing a monomer containing an aromatic vinyl monomer as the essential component or a monomer containing an aromatic vinyl compound and an unsaturated compound containing carboxy group as the essential components in the presence of a gummy polymer prepared by copolymerizing an unsaturated compound containing carboxy group; (2) a graft copolymer prepared by copolymerizing an aromatic vinyl compound and an unsaturated compound containing carboxy group as the essential components in the presence of a gummy polymer; (3) a mixture of a rubber-strengthening styrene-based resin in which the unsaturated compound containing carboxy group is not copolymerized and a copolymer of a monomer containing an unsaturated compound containing carboxy group and an aromatic vinyl compound as the essential components; (4) a mixture of the above (1) and (2), and a copolymer containing an unsaturated compound containing carboxy group and an aromatic vinyl compound as the essential compounds; and (5) a mixture
- the aromatic vinyl compound is preferably styrene, and the monomer copolymerizing with the aromatic vinyl compound is preferably acrylonitrile.
- the content of the unsaturated compound containing carboxyl group in the styrene is preferably in a range from 0.1 to 8% by mass, and more preferably from 0.2 to 7% by mass.
- the olefin-based resin is a polymer containing a main component of monomer of C2-8 olefin, which includes one or more of low-density polyethylene, high-density polyethylene, linear low-density polyethylene, polypropylene, ethylene-propylene random copolymer, ethylene-propylene block copolymer, polymethylpentene, polybutene-1, and a modified compound thereof. As of these, polypropylene and acid-modified polypropylene are preferred.
- examples of the polyphenylene ether applicable in the present invention includes poly(2,3-dimethyl-6-ethyl-1,4-phenylene ether), poly(2-methyl-6-chloromethyl-1,4-phenylene ether), poly(2-methyl-6-hydroxyethyl-1,4-phenylene ether), poly(2-methyl-6-n-butyl-1,4-phenylene ether), poly(2-ethyl-6-isopropyl-1,4-phenylene ether), poly(2-ethyl-6-n-propyl-1,4-phenylene ether), poly(2,3,6-trimethyl-1,4-phenylene ether), poly(2-(4′-methylphenyl)-1,4-phenylene ether), poly(2-bromo-6-phenyl-1,4-phenylene ether), poly(2-methyl-6-phenyl-1,4-phenylene ether), poly(2-phenyl-1,4-phenylene ether), poly(2-phenyl-1,4
- thermoplastic resin examples include a chelating agent, a water-soluble substance, a surfactant and/or a coagulant and a phosphorus-based substance from the point to increase the adhesion between the thermoplastic resin-molded article and the plating layer.
- the chelating agent is a component to bring the metal in the plating bath to easily adhere onto the surface of the resin molded article, and the one selected from the group given below may be used.
- Aliphatic diamine such as methylene diamine, ethylene diamine, trimethylene diamine, tetramethylene diamine, pentamethylene diamine or hexamethylene diamine; aromatic diamine such as o-, m- and p-phenylene diamine, benzidine or diaminostilbene;
- phosphonic acid such as ethane hydroxy-1,1-2-triphosphonic acid, ethane-1,2-dicarboxy-1,2-diphosphonic acid, methane hdyroxyphosphonic acid, and alkali metal salt or alkanolamine salt thereof;
- phosphonocarboxylic acid such as 2-phosphonobutane-1,2-dicarboxylic acid, 1-phosphonobutane-2,3,4-tricarboxylic acid, ⁇ -methylphosphono succinic acid, or alkali metal salt or alkanolamine salt thereof;
- amino acid such as aspartic acid, glutamic acid, glycine, and alkali metal salt or alkanolamine salt thereof;
- amino polyacetate such as nitrilo triacetate, imino diacetate, ethylenediamine tetraacetate, diethylene triamine penta-acetate, grycolether diamine tetra-acetate, hydroxyethylimino diacetate, triethylenetetramine hexa-acetate, dienkolic acid, and alkali metal salt or alkanolamine salt thereof;
- organic acid such as glycolic acid, diglycolic acid, oxy-disuccinic acid, carboxymethyloxy succinic acid, citric acid, malonic acid, lactic acid, tartaric acid, oxalic acid, malic acid, oxy disuccinic acid, gluconic acid, carboxymethyl succinic acid, carboxymethyl tartaric acid, ⁇ -hydroxy propionic acid, ⁇ -hydroxy isobutyric acid, and alkali metal salt or alkanolamine salt thereof;
- aminopoly(methylene sulfonic acid) or metal salt or alkanolamine salt thereof or polyethylene-polyamine-poly(methylene sulfonic acid) or alkali metal salt or alkanolamine salt thereof.
- Content of the chelating agent in the thermoplastic resin molded article is preferably in a range from 0.1 to 20 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.1 to 15 parts by mass, and further preferably from 0.1 to 10 parts by mass.
- the water-soluble substance is a substance soluble in water independent of the solubility.
- polysaccharide such as starch, dextrin, pullulan, hyaluronic acid, carboxymethyl cellulose, methyl cellulose, ethyl cellulose, and salt thereof
- polyhydric alcohol such as propylene glycol, ethylene glycol, diethylene glycol, neopentyl glycol, butanediol, pentanediol, polyoxyethylene glycol, polyoxypropylene glycol, trimethylol propane, pentaerythritol, dipentaerythritol or glycerin
- polyvinyl alcohol polyacrylic acid, polymaleic acid, polyacrylamide, polyvinylpyrrolidone, polyethylene oxide, acrylic acid-maleic acid anhydride copolymer, maleic acid anhydride-diisobutylene copolymer, maleic acid anhydride-vinyl acetate copolymer,
- preferred ones are those soluble in water with a small solubility. Specifically preferred ones are those having solubility (23° C.) in water of 300 g/100 g, more preferably 100 g/100 g or less, and most preferably 10 g/100 g or less. Examples of those compounds are pentaerythritol (7.2 g/100 g) and dipentaerythritol (0.1 g/100 g or less).
- the content of water-soluble compound in the thermoplastic resin molded article is preferably in a range from 0.01 to 50 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.01 to 30 parts by mass, and most preferably from 0.01 to 15 parts by mass.
- Applicable surfactant and/or coagulant may be a surfactant (emulsifier) left behind in the resin after used in emulsion polymerization (if applied) to manufacture the thermoplastic resin, or may be the one separately added to the thermoplastic resin if the manufacture method such as bulk polymerization which does not use emulsifier is applied.
- the surfactant and/or solidifier include the one used in the emulsion polymerization of resin, and the one other than used in the emulsion polymerization.
- a preferable surfactant includes anionic surfactant, cationic surfactant, nonionic surfactant and amphoteric surfactant.
- surfactants are: anionic surfactant such as fatty acid salt, resin acid salt, alkylsulfate, alkylbenzene sulfonate, alkyldiphenylether sulfonate, polyoxyethylene alkylether sulfonate ester, sulfosuccinic acid diester salt, ⁇ -olefinsulfuric acid ester salt or ⁇ -olefin sulfonate; cationic surfactant such as mono- or di-alkylamine or polyoxyethylene additive thereof, mono- or di-long chain alkyl quaternary ammonium salt; nonionic surfactant such as alkylglucoside, polyoxyethylene alkyl ether, polyoxyethylene alkylphenyl ether, sucrose fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene propylene block copolymer, fatty acid monogly, ani
- the content of surfactant and/or coagulant in the thermoplastic resin molded article is preferably in a range from 0.01 to 10 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.01 to 5 parts by mass, and most preferably from 0.01 to 2 parts by mass.
- the phosphorus based compound is a component to increase the adhesion of plating, and one or more of the followings may be used.
- Condensate phosphoric acid ester such as triphenyl phosphate, tricredil phosphate, trixylenyl phosphate, tris(isopropylphenyl)phosphate, tris(o- or p-phenylphenyl)phosphate, trinaphtyl phosphaate, credil diphenyl phosphate, xylenyl diphenyl phosphate, diphenyl(2-ethylhexyl)phosphate, di(isoproplylphenyl)phenyl phosphate, o-phenylpyhenyl dicresil phosphate, tris(2,6-dimethylphenyl)phosphate, tetraphenyl-m-phenylene diphosphate, tetraphenyl-p-phenylene diphosphate, phenyl resorcin-polyphosphate, bisphenol A-bis(diphenylphosphate), bisphenol A-polyphen
- Fatty acid-aromatic phosphoric acid ester including ortho-phorophoric acid ester such as diphenyl(2-ethylhexyl)phosphate, diphenyl-2-acryloyloxyethyl phosphate, diphenyl-2-methacryloyloxyethyl phosphate, diphenyl neopentyl phosphate, pentaerythritol diphenyldiphosphate or ethylpyrocatechol phosphate;
- Alkali metal salt such as melamine polyphosphate, tripolyphosphoric acid, pyrophoric acid, orthophosphoric acid or hexamethaphosphoric acid, phosphoric acid-based compound such as phytic acid, and alkali metal or alkanolamine salt thereof.
- phosphorus-based compound other than above there are applicable phosphorus-based compounds which are used in known flame-retardant and antioxidant for resins.
- the content of the phosphorus-based compound in the thermoplastic resin molded article is preferably in a range from 0.1 to 30 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.1 to 20 parts by mass, and most preferably from 0.1 to 10 parts by mass.
- the plated resin molded article prepared by applying the method of the present invention provides the adhesion between the thermoplastic resin molded article and the metallic plating layer, (JIS H8630) of preferably 10 kPa or more as the maximum value, more preferably 50 kPa or more as the maximum value, most preferably 100 kPa or more as the maximum value, and most preferably 150 kPa or more as the maximum value.
- JIS H8630 JIS H8630
- the plated resin molded article obtained by the manufacturing method of the present invention can select the shape of the plated resin molded article, the kind of plating layer, the thickness of the plating layer, and the like depending on the uses, thus allowing applications in varieties of uses.
- the plated resin-molded article according to the present invention is suitable for the automobile parts such as bumpers, emblems, wheel caps, interior parts, and exterior parts.
- the adhering strength (the highest value) between the resin molded article and a metal plating layer was measured according to the adherence test method described in appendix 6 in JIS H8630 using the plated resin molded articles obtained in Examples and Comparative Examples.
- A-1 Polyamide (polyamide 6, UBE nylon 6 1013B, water absorption 1.8%, manufactured by Ube Industries Ltd.)
- ABS resin styrene 45% by mass, acrylonitrile 15% by mass, polybutadiene-based rubber 40% by mass, water absorption 0.2%)
- ABS resin styrene 42% by mass, acrylonitrile 16% by mass, rubber 40% by mass, methacrylic acid 2% by weight, water absorption 0.2%)
- the respective components given in Table 1 were blended in a V-shape tumbler, which were then melted and kneaded in a twin-screw extruder (TEX30, cylinder temperature 230° C., manufactured by The Japan Steel Works, Ltd.) to prepare pellets.
- the pellets were fed to an injection molding machine (cylinder temperature 240° C., mold temperature 60° C.) to form molded articles of 100 ⁇ 50 ⁇ 3 mm in size.
- the molded articles were treated as the test pieces for electroless plating in accordance with the following procedure, thus obtained the plated resin molded articles.
- the adhering strength of the plating layer on these plated resin molded articles is given in Table 1.
- the resin molded articles were immersed in a 50 g/L aqueous solution (a solution temperature of 40° C.) of ACECLEAN A-220 (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 5 minutes.
- the resin molded articles were immersed in an aqueous solution of 200 ml/L (2.3 N) of 35% by weight of hydrochloric acid (a solution temperature of 40° C.) for 5 minutes.
- the resin molded articles were immersed in a mix aqueous solution (a solution temperature of 25° C.) of 150 ml/L of 35% by weight of hydrochloric acid and 40 ml/L aqueous solution of Catalyst C (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 3 minutes.
- a mix aqueous solution a solution temperature of 25° C.
- aqueous solution a solution temperature of 25° C.
- Catalyst C manufactured by OKUNO Pharmaceuticals Co., Ltd.
- the resin molded articles were immersed in a selector liquid having the following composition (at 45° C. and pH 12) for 3 minutes to form the electrically conductive layer on the surface of the resin molded article.
- the resin molded articles were immersed in the plating bath having the following composition (a solution temperature of 25° C.), and electroplate was carried out for 120 minutes.
- TOP LUCINA 2000 MU manufactured by OKUNO Pharmaceuticals Co., Ltd.: 5 ml/L
- Example 1 to 4 The appearance of the molded articles in Example 1 to 4 is smooth and beautiful.
- thermoplastic resin molded articles With the same thermoplastic resin molded articles to those in Example 2, the following-given steps without containing the direct plating method were applied to prepare the plated resin molded articles.
- the maximum value of the adhering strength of the plated resin molded articles was 100 kPa, giving smooth and beautiful appearance.
- the manufacture consumed large man-hours compared with that in Example 2.
- test piece was immersed in a 50 g/L aqueous solution (a solution temperature of 40° C.) of ACECLEAN A-220 (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 20 minutes.
- test piece was immersed in a mix aqueous solution (a solution temperature of 25° C.) of 150 ml/L of 35% by weight of hydrochloric acid and 40 ml/L aqueous solution of Catalyst C (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 3 minutes.
- a mix aqueous solution a solution temperature of 25° C.
- aqueous solution 150 ml/L of 35% by weight of hydrochloric acid
- Catalyst C manufactured by OKUNO Pharmaceuticals Co., Ltd.
- test piece was immersed in 100 ml/L aqueous solution (a solution temperature of 40° C.) of 98% by weight of sulfuric acid for 3 minutes.
- test piece was immersed in 15 g/L aqueous solution (a solution temperature of 40° C.) of sodium hydroxide for 2 minutes.
- test piece was immersed in a mix aqueous solution (a solution temperature of 40° C.) of 150 ml/L of Chemical Nickel HR-TA (manufactured by OKUNO Pharmaceuticals Co., Ltd.) and 150 ml/L of Chemical Nickel HR-TB (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 5 minutes.
- a mix aqueous solution a solution temperature of 40° C.
- test piece was immersed in 100 g/L aqueous solution (a solution temperature of 25° C.) of TOP SAN (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for one minute.
- test piece was immersed in the plating bath same to that of Example 1 (a solution temperature of 25° C.), and electroplate was carried out for 120 minutes.
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Abstract
The present invention provides a method for manufacturing plated resin molded article having strong adhesion of plating and giving beautiful appearance. Specifically, it provides a method for manufacturing plated resin molded article having the steps of: contact-treating a thermoplastic resin molded article using an acid or base free from heavy metal; treating the contact-treated thermoplastic resin molded article by a catalyst imparting liquid; forming an electrically conductive layer on the surface of the thermoplastic resin molded article using a direct plating method; and applying electroplating to the electrically conductive layer; without applying the step of etching by an acid which contains heavy metal.
Description
- The present invention relates to a method for manufacturing plated resin molded article which has strong adhesion of plating.
- Resin molded articles such as an ABS resin and a poly amide resin have been used as automobile parts for the purpose of reducing the weight of an automobile, and plating such as copper or nickel is carried out on the resin molded articles in order to give a upscale image and a sense of beauty.
- When the plating is carried out on resin molded articles such as an ABS resin, an etching step of roughing the surface of the resin molded articles is conventionally essential to enhance the adhering strength after the removal step of fat. For example, when an ABS resin molded article and a polypropylene molded article are plated, a bath of chromic acid (a mix solution of chromium (III) oxide and sulfuric acid) is used after the removal step of fat, and an etching treatment is required to be carried out at 65 to 70° C. for 10 to 15 minutes. Accordingly, poisonous hexa-valent chromic acid ion is contained in waste water. Therefore, a treatment of neutrally precipitating after reducing the hexa-valent chromic acid ion to a tri-valent ion is essential, which creates problems in wastewater treatment.
- Considering safety during a work at a spot and an influence to environment due to waste water thus, it is desirable not to carry out an etching treatment using the chromium bath, but in that case, there is a problem that the adhering strength of a plating layer to a molded article which is obtained by an ABS resin and the like cannot be enhanced.
- Inventions disclosed in JP-A 2003-82138 and JP-A 2003-166067 are superior in obtaining plated resin molded articles having high plating strength without using the chromic acid etching. They have, however, an issue of consuming large man-hours in the manufacturing process (plating step).
- JP-A 5-239660 and WO 98/45505 (U.S. Pat. No. 3,208,410) describe the use of direct plating method during the course of plating on the surface of resin molded article. According to the Experimental Example 1 of JP-A 5-239660, however, a pretreatment of surface roughening with pumice is applied, thus it is difficult to manufacture a resin molded article having beautiful appearance. Since WO 98/45505 (U.S. Pat. No. 3,208,410) adopts chromic acid etching, it cannot solve the problems of conventional technologies.
- An object of the present invention is to provide a method for manufacturing plated resin molded article which can eliminate the etching treatment by chromic acid and the like, which has strong adhesion between the resin molded article and the plating layer, and which provides beautiful appearance.
- The first aspect of the present invention is to provide a method for manufacturing plated resin molded article comprising the steps of: contact-treating a thermoplastic resin molded article using an acid or base free from heavy metal; treating the contact-treated thermoplastic resin molded article by a catalyst imparting liquid; forming an electrically conductive layer on the surface of the thermoplastic resin molded article using a direct plating method; and applying electroplating to the electrically conductive layer; without applying the step of etching by an acid which contains heavy metal.
- The second aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1, wherein the direct plating method comprises the step of forming an electrically conductive layer on the surface of a thermoplastic resin molded article using a selector liquid which contains a metallic compound, a reducing compound and a metallic hydroxide.
- The third aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1 or 2, wherein the thermoplastic resin molded article contains a polyamide.
- The fourth aspect of the present invention is to provide the method for manufacturing plated resin molded article according to claim 1 or 2, wherein the thermoplastic resin molded article further contains a substance which has a solubility (23° C.) in water of 300 g/100 g or less.
- According to the manufacturing method of the present invention, use of the direct plating method allows decreasing the man-hours compared with the inventions disclosed in JP-A 2003-82138 and 2003-166067, and eliminates the toxic reducing agent such as formalin.
- The description for individual steps is given below. Regarding the steps described below, a single step may be divided into two or more of sub-steps, and two or more of steps may be integrated into a single step. Furthermore, at needed, a known step in the plating method may be added as described below.
- First, the degreasing treatment is applied to a thermoplastic resin molded article which is formed into a shape suitable for the use using a known method such as injection molding.
- The degreasing treatment is conducted using an aqueous solution of surfactant containing an alkali such as sodium hydroxide or sodium carbonate, or an acid such as sulfuric acid or carboxylic acid. After the degreasing treatment, the present invention allows to move to succeeding step without need of the etching step using chromic acid and the like, as the surface-roughening treatment in order to increase the adhesion of plating layer, and without need of physical surface-roughening treatment (for example, a treatment of rubbing the surface with pumice, as disclosed in JP-A5-239660).
- In the next step, the thermoplastic resin molded article is subjected to contact-treatment by an acid or base free from heavy metal (metal such as chromium and manganese). The degreasing treatment as the preceding step may be eliminated, and the contact-treatment may be adopted as the first treatment step.
- The acid free from heavy metal may be hydrochloric acid, phosphoric acid, sulfuric acid, or an organic acid such as acetic acid, citric acid or formic acid. The base free from heavy metal may be a hydroxide of alkali metal or alkali earth metal, such as sodium hydroxide, potassium hydroxide, calcium hydroxide or magnesium hydroxide.
- A concentration of the acid or base free from heavy metal differs with the kind. For the case of hydrogen chloride, however, a preferred normality is in a range from 1.5 to 3.5. For the case of hydrochloric acid, a preferred normality is in a range from 1.8 to 3.5, and more preferably from 2 to 3. For other acids or bases, their concentrations may be selected so as the surface of the thermoplastic resin after the treatment, (which can be determined by, for example, a scanning electron microscope (SEM)), to become equivalent to that of the hydrogen chloride treatment.
- For instance, the treatment in the step can use a method of immersing the thermoplastic resin-molded article into an acid or base free from heavy metal. Specifically there is applied a method immersing the article in an acid or base free from heavy metal at a liquid temperature in a range from 10° C. to 80° C. for a period from 0.5 to 20 minutes. When hydrochloric acid with a normality in a range from 1.5 to 3.5 is used, the article may be immersed in an aqueous solution of hydrochloric acid with the above concentration range at a temperature ranging from 20° C. to 60° C. for a period from 1 to 10 minutes.
- Then, the step of treating with a catalyst-providing liquid is given to the thermoplastic resin-molded article after the preceding step. The step is a known one, and it is preferable to give a step of water-washing before and after the step.
- The catalyst-providing liquid may be a known one. Examples of the catalyst-providing liquid are the one containing a catalyst metal, a tin compound and an acid, and, at needed, containing other components.
- The catalyst may be a known one. Examples of the catalyst are a platinum compound (platinum chloride salt, and the like), a gold compound (gold sulfite salt, and the like), a palladium compound (palladium chloride, palladium sulfate, and the like), a silver compound (silver nitrate, silver sulfate, and the like). A preferable amount of the catalyst is in a range from 100 to 500 mg/L as metal.
- Applicable tin compound includes tin(II) chloride and tin(II) sulfate. A preferable use amount of the tin compound is in a range from 10 to 50 g/L as tin, and 50 to 120 times (mass basis) the amount of the catalyst metal.
- The acid is hydrochloric acid, sulfuric aid, or a mixed acid of hydrochloric acid and sulfuric acid. Alternatively, they may be mixed with sodium chloride. The acid is adjusted so as the pH of the catalyst-providing liquid to become around 1.
- A preferable catalyst-providing liquid is the one which contains a palladium compound as the catalyst, tin(II) chloride as the tin compound, and hydrochloric acid as the acid. The treatment in the step can adopt a method of immersing the thermoplastic resin-molded article into a catalyst-providing liquid at room temperature for a period approximately from 1 to 10 minutes.
- In the next step, an electrically conductive layer is formed on the surface of the thermoplastic resin molded article using the direct plating method. The direct plating method is a known technique, and is disclosed in JP-A 5-239660, WO 98/45505 (U.S. Pat. No. 3,208,410), JP-A 2002-338636 (Paragraph No. 5), and others. During the step, a plating liquid called the “selector liquid” is used, thus forming a very thin electrically conductive layer compared with the plating layer (electrically conductive layer) formed by the conventionally and widely using chemical plating.
- Use of the direct plating method is superior in the following items to the manufacturing method of the inventions of JP-A 2003-82138 and 2003-166067, containing the electroless plating method (chemical plating method).
- (1) Safety is high because of strong reducing power of formalin and the like and of free from toxic substances as seen in the case of electroless plating method (chemical plating method).
(2) Manufacturing time can be decreased and manufacturing cost can be decreased because of not-need of activation step after the catalyst-providing step, thus decreasing the man-hours.
(3) Although the electroless plating method (chemical plating method) needs further pluralities of steps before the electroplating, the direct plating method allows immediately entering the electroplating so that the man-hours can be decreased, the manufacturing time can be decreased, and the manufacturing cost can be decreased.
(4) Electroless plating method (chemical plating method) results in deposition of plating also on the jigs using in the plating, thus the replacement of jigs becomes necessary. Direct plating method, however, plating very little deposits on the jigs. - Applicable selector liquid includes a liquid containing a metallic compound, a reducing compound, and a metallic hydroxide.
- A preferred metallic compound is a copper compound. Examples of the copper compound are copper(II) sulfate, copper chlorides, copper carbonates, copper oxides and copper hydroxides. The content of copper compound is preferably in a range from 0.1 to 5 g/L as copper, and more preferably from 0.8 to 1.2 g/L.
- The reducing compound does not include the one having strong reducing power, such as formalin and phosphinic acid, which are widely used in known electroless plating (chemical plating), and is the one having weak reducing power compared with those given above. Examples of the reducing compound include the following:
- tin(II) chloride, sodium borohydride, dimethylamine borane, trimethylamine borane, formic acid or salt thereof, alcohol such as methanol, ethanol, propanol, ethylene glycol or glycerin, and salt thereof; and
- reducing saccharide such as glucose, sorbite, cellulose, sucrose, mannite or gluconolactone. The content of succharide is preferably in a range from 3 to 50 g/L, and more preferably from 10 to 20 g/L.
- Applicable metallic hydroxide includes sodium hydroxide, potassium hydroxide and lithium hydroxide. The content of metallic hydroxide is preferably in a range from 10 to 80 g/L, and more preferably from 30 to 50 g/L.
- The selector liquid can, at needed, further contain a complexing agent. Applicable complexing agent includes hydantoins and organic carboxylic acids. The hydantoins include hydantoin, 1-methylhydantoin, 1,3-dimethylhydantoin, 5,5-dimethylhydantoin and allantoin. Applicable organic carboxylic acids include citric acid, tartaric acid, succinic acid, and salt thereof. The content of complexing agent in the selector is preferably in a range from 2 to 50 g/L, and more preferably from 10 to 40 g/L.
- The pH of selector liquid is preferably in a range from 10.0 to 14.0, and more preferably from 11.55 to 13.5.
- Examples of the selector liquid are the plating bath described in Experimental Example 1 (C) of JP-A 5-239660, and the invention baths 1 to 8 described in WO 98/45505 (U.S. Pat. No. 3,208,410). If needed, other known components may also be added to the bath.
- The treatment in the step may adopt a method in which the temperature of the selector liquid is adjusted to a range preferably from 20° C. to 70° C., more preferably from 35° C. to 50° C., then the thermoplastic resin molded article is immersed in the liquid for a period approximately from 30 seconds to 20 minutes, preferably approximately from 3 to 5 minutes.
- Since the treatment of the step forms a very thin electrically conductive layer on the surface of the thermoplastic resin-molded article, the succeeding step can directly apply the electroplating.
- After that, a know method is used to conduct electroplating of copper, nickel, chromium, and the like onto the thermoplastic resin-molded article on which the electrically conductive layer is formed in the preceding step.
- The thermoplastic resin molded article to which the manufacturing method of the present invention is applied can be obtained by molding a thermoplastic resin composition containing a combination of one or more of the thermoplastic resins described below, and, at needed, other components.
- Although the thermoplastic resin can be arbitrarily selected among the known ones responding to the uses, the present invention preferably uses a polyamide-based resin, a styrene-based resin, an olefin-based resin, a polyphenylene ether resin (PPE), a polyphenylene sulfone resin (PPS), and a polysulfone resin, and more preferably uses a thermoplastic resin composition which contains a polyamide-based resin.
- A preferable thermoplastic resin is the one having a water absorption (in water at 23° C. after 24 hours have passed: ISO 62) of 0.6% or more, more preferably in a range from 0.6 to 5%, and most preferably from 0.6 to 2%.
- If a thermoplastic resin having poor water absorption is treated by a manufacturing method containing direct plating method, the increase in the man-hours is inevitable to attain the optimum conditions to manufacture the resin-molded article having beautiful appearance and high adhesion of plating. If, however, the resin composition which contains a thermoplastic resin having good water absorption (also good adsorption of metal) as described above, or a resin composition containing a thermoplastic resin having good water absorption is used, the direct plating method readily forms the electrically conductive layer, which is preferable because of decreasing the man-hours.
- If a thermoplastic resin composition containing two or more of resins is used, it is preferable that the content of the thermoplastic resin which satisfies the above water absorption is adjusted to 30% by mass or more.
- The polyamide-based resin is a polyamide resin formed from diamine and dicarboxylic acid, and a copolymer thereof. The resin may be in crystalline shape, in amorphous shape, or in a mixture thereof. If crystalline shape and amorphous shape are mixed together, the crystallinity degree is preferably 60% or less, and more preferably 40% or less.
- The polyamide-based resin includes: nylon 66, polyhexamethylene sebacamide (nylon 6-10), polyhexamethylene dodecanamide (nylon 6-12), polydodecamethylene dodecanamide (nylon 1212), polymethaxylylene adipamide (nylon MXD6), polytetramethylene adipamide (nylon 46), their mixture, and a copolymer thereof; nylon 6/66, nylon 66/6T (6T: polyhexamethylene terephthalamide) containing 50% by mole or less of 6T component, nylon 66/6I (6I: plyhexamethylene isophthalamide) containing 50% by mole or less of 6I component, copolymer of nylon 6T/6I/66 and nylon 6T/6I/610; polyhexamethylene terephthalamide (nylon 6T), polyhexamethylene isophthalamide (nylon 6I), poly(2-methylpentamethylene)terephthalamide (nylon M5T), poly(2-methylpentamthylene)isophthalamide (nylon M5I), and copolymer of nylon 6T/6I and of nylon 6T/M5T. Other than the above, a copolymer nylon such as amorphous nylon is applicable. An example of the amorphous nylon is polycondensate of terephthalic acid and trimethyl hexamethylene diamine.
- Other applicable polyamide-based resins are a ring-opened polymer of cyclic lactam, a polycondensate of aminocarboxylic acid, and a copolymer composed of these components; specifically an aliphatic polyamide resin such as nylon 6, poly-ω-undecanamide (nylon 11) or poly-ω-dodecanamide (nylon 12), and a copolymer thereof, a copolymer with polyamide consisting of diamine and dicarboxylic acid, specifically nylon 6T/6, nylon 6T/11, nylon 6T/12, nylon 6T/6I/12, nylon 6T/6I/610/12, and a mixture thereof.
- As of these, preferable polyamide-based resins are PA (nylon)6, PA (nylon)66 and PA (nylon)6/66.
- A preferred polyamide-based resin is the one having 10 J/g or larger heat of crystal fusion, more preferably from 10 to 150 J/g, further preferably from 15 to 120 J/g, specifically preferably from 20 to 100 J/g, and most preferably from 25 to 90 J/g. The polyamide-based resin which has the heat of crystal fusion within the above range contains the crystal portion being determined by the heat of crystal fusion and also contains residual amorphous portions.
- By specifying the heat of crystal fusion of the polyamide-based resin to the above range, the amorphous portion of the polyamide-based resin is separated from the surface of the thermoplastic resin-molded article, and the function of micropores created after the separation of the amorphous portion induces the formation of the strong plating layer, which is preferable.
- The heat of crystal fusion is determined by DSC observation. That is, 5 to 10 mg of sample is collected from the target polyamide-based resin pellets. The sample is scanned by DSC 600E (manufactured by Shimadzu Corp.) for two times of temperature scanning under the conditions of 20° C./min of temperature-rising speed and 20° C./min of temperature-lowering speed. The heat of crystal fusion observed in the second scan is adopted as the heat of crystal fusion.
- Examples of the styrene-based resin are styrene and polymers of styrene-derivatives such as α-substitution or nucleus substitution styrene. There are also included copolymers composed mainly of above monomers and containing monomers such as vinyl compound such as acrylonitrile, acrylic acid, and methacrylic acid, and/or conjugate diene compound such as butadiene and isoprene. Examples of them are polystyrene, high-impact polystyrene (HIPS resin), acrylonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), styrene-methacrylate copolymer (MS resin) and styrene-butadiene copolymer (SBS resin).
- The polystyrene-based resin may contain a styrene-based copolymer in which an unsaturated compound containing carboxy group is copolymerized to increase the compatibility with polyamide-based resin. The styrene-based copolymer in which the unsaturated compound containing carboxy group is copolymerized is a copolymer prepared by polymerizing an unsaturated compound containing carboxylic group with, at needed, other monomer which can copolymerized therewith, in the presence of a gummy polymer. Examples of the components are:
- (1) a graft polymer prepared by polymerizing a monomer containing an aromatic vinyl monomer as the essential component or a monomer containing an aromatic vinyl compound and an unsaturated compound containing carboxy group as the essential components in the presence of a gummy polymer prepared by copolymerizing an unsaturated compound containing carboxy group;
(2) a graft copolymer prepared by copolymerizing an aromatic vinyl compound and an unsaturated compound containing carboxy group as the essential components in the presence of a gummy polymer;
(3) a mixture of a rubber-strengthening styrene-based resin in which the unsaturated compound containing carboxy group is not copolymerized and a copolymer of a monomer containing an unsaturated compound containing carboxy group and an aromatic vinyl compound as the essential components;
(4) a mixture of the above (1) and (2), and a copolymer containing an unsaturated compound containing carboxy group and an aromatic vinyl compound as the essential compounds; and
(5) a mixture of the above (1), (2), (3) and (4), and a copolymer containing the essential component of an aromatic vinyl compound. - In above 1) to 5), the aromatic vinyl compound is preferably styrene, and the monomer copolymerizing with the aromatic vinyl compound is preferably acrylonitrile. The content of the unsaturated compound containing carboxyl group in the styrene is preferably in a range from 0.1 to 8% by mass, and more preferably from 0.2 to 7% by mass.
- The olefin-based resin is a polymer containing a main component of monomer of C2-8 olefin, which includes one or more of low-density polyethylene, high-density polyethylene, linear low-density polyethylene, polypropylene, ethylene-propylene random copolymer, ethylene-propylene block copolymer, polymethylpentene, polybutene-1, and a modified compound thereof. As of these, polypropylene and acid-modified polypropylene are preferred.
- As for the polyphenylene ether resin, examples of the polyphenylene ether applicable in the present invention includes poly(2,3-dimethyl-6-ethyl-1,4-phenylene ether), poly(2-methyl-6-chloromethyl-1,4-phenylene ether), poly(2-methyl-6-hydroxyethyl-1,4-phenylene ether), poly(2-methyl-6-n-butyl-1,4-phenylene ether), poly(2-ethyl-6-isopropyl-1,4-phenylene ether), poly(2-ethyl-6-n-propyl-1,4-phenylene ether), poly(2,3,6-trimethyl-1,4-phenylene ether), poly(2-(4′-methylphenyl)-1,4-phenylene ether), poly(2-bromo-6-phenyl-1,4-phenylene ether), poly(2-methyl-6-phenyl-1,4-phenylene ether), poly(2-phenyl-1,4-phenylene ether), poly(2-chloro-1,4-phenylene ether), poly(2-methyl-1,4-phenylene ether), poly(2-chloro-6-ethyl-1,4-phenyelen ether), poly(2-chloro-6-bromo-1,4-phenylene ether), poly(2,6-di-n-propyl-1,4-phenylene ether), poly(2-methyl-6-isopropyl-1,4-phenylene ether), poly(2-chloro-6-methyl-1,4-phenylene ether), poly(2-methyl-6-ethyl-1,4-phenylene ether), poly(2,6-dibromo-1,4-phenylene ether), poly-2,6-dichloro-1,4-phenylene ether), poly(2,6-diethyl-1,4-phenylene ether) and poly(2,6-dimethyl-1,4-phenylene ether). As of these, specifically preferred one is poly(2,6-dimethyl-1,4-phenylene ether).
- Other components being blended, at needed, in the thermoplastic resin include a chelating agent, a water-soluble substance, a surfactant and/or a coagulant and a phosphorus-based substance from the point to increase the adhesion between the thermoplastic resin-molded article and the plating layer.
- The chelating agent is a component to bring the metal in the plating bath to easily adhere onto the surface of the resin molded article, and the one selected from the group given below may be used.
- Aliphatic diamine such as methylene diamine, ethylene diamine, trimethylene diamine, tetramethylene diamine, pentamethylene diamine or hexamethylene diamine; aromatic diamine such as o-, m- and p-phenylene diamine, benzidine or diaminostilbene;
- ethane-1,1-diphosphonic acid, ethane-1,1,2-triphosphonic acid, ethane-1-hydroxy-1,1-diphosphonic acid, and derivative thereof; phosphonic acid such as ethane hydroxy-1,1-2-triphosphonic acid, ethane-1,2-dicarboxy-1,2-diphosphonic acid, methane hdyroxyphosphonic acid, and alkali metal salt or alkanolamine salt thereof;
- phosphonocarboxylic acid such as 2-phosphonobutane-1,2-dicarboxylic acid, 1-phosphonobutane-2,3,4-tricarboxylic acid, α-methylphosphono succinic acid, or alkali metal salt or alkanolamine salt thereof;
- amino acid such as aspartic acid, glutamic acid, glycine, and alkali metal salt or alkanolamine salt thereof;
- amino polyacetate such as nitrilo triacetate, imino diacetate, ethylenediamine tetraacetate, diethylene triamine penta-acetate, grycolether diamine tetra-acetate, hydroxyethylimino diacetate, triethylenetetramine hexa-acetate, dienkolic acid, and alkali metal salt or alkanolamine salt thereof;
- organic acid such as glycolic acid, diglycolic acid, oxy-disuccinic acid, carboxymethyloxy succinic acid, citric acid, malonic acid, lactic acid, tartaric acid, oxalic acid, malic acid, oxy disuccinic acid, gluconic acid, carboxymethyl succinic acid, carboxymethyl tartaric acid, α-hydroxy propionic acid, α-hydroxy isobutyric acid, and alkali metal salt or alkanolamine salt thereof;
- alkali metal salt or alkanolamine salt of aluminosilicate represented by zeolite A;
- aminopoly(methylene sulfonic acid) or metal salt or alkanolamine salt thereof, or polyethylene-polyamine-poly(methylene sulfonic acid) or alkali metal salt or alkanolamine salt thereof.
- Content of the chelating agent in the thermoplastic resin molded article is preferably in a range from 0.1 to 20 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.1 to 15 parts by mass, and further preferably from 0.1 to 10 parts by mass.
- The water-soluble substance is a substance soluble in water independent of the solubility. Examples thereof are: polysaccharide such as starch, dextrin, pullulan, hyaluronic acid, carboxymethyl cellulose, methyl cellulose, ethyl cellulose, and salt thereof; polyhydric alcohol such as propylene glycol, ethylene glycol, diethylene glycol, neopentyl glycol, butanediol, pentanediol, polyoxyethylene glycol, polyoxypropylene glycol, trimethylol propane, pentaerythritol, dipentaerythritol or glycerin; polyvinyl alcohol, polyacrylic acid, polymaleic acid, polyacrylamide, polyvinylpyrrolidone, polyethylene oxide, acrylic acid-maleic acid anhydride copolymer, maleic acid anhydride-diisobutylene copolymer, maleic acid anhydride-vinyl acetate copolymer, naphthalene sulfonic acid salt-formalin condensate, and salt thereof.
- As of these, preferred ones are those soluble in water with a small solubility. Specifically preferred ones are those having solubility (23° C.) in water of 300 g/100 g, more preferably 100 g/100 g or less, and most preferably 10 g/100 g or less. Examples of those compounds are pentaerythritol (7.2 g/100 g) and dipentaerythritol (0.1 g/100 g or less).
- The content of water-soluble compound in the thermoplastic resin molded article is preferably in a range from 0.01 to 50 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.01 to 30 parts by mass, and most preferably from 0.01 to 15 parts by mass.
- Applicable surfactant and/or coagulant may be a surfactant (emulsifier) left behind in the resin after used in emulsion polymerization (if applied) to manufacture the thermoplastic resin, or may be the one separately added to the thermoplastic resin if the manufacture method such as bulk polymerization which does not use emulsifier is applied.
- The surfactant and/or solidifier include the one used in the emulsion polymerization of resin, and the one other than used in the emulsion polymerization. A preferable surfactant includes anionic surfactant, cationic surfactant, nonionic surfactant and amphoteric surfactant.
- Examples of these surfactants are: anionic surfactant such as fatty acid salt, resin acid salt, alkylsulfate, alkylbenzene sulfonate, alkyldiphenylether sulfonate, polyoxyethylene alkylether sulfonate ester, sulfosuccinic acid diester salt, α-olefinsulfuric acid ester salt or α-olefin sulfonate; cationic surfactant such as mono- or di-alkylamine or polyoxyethylene additive thereof, mono- or di-long chain alkyl quaternary ammonium salt; nonionic surfactant such as alkylglucoside, polyoxyethylene alkyl ether, polyoxyethylene alkylphenyl ether, sucrose fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene propylene block copolymer, fatty acid monoglyceride or amine oxide; and amphoteric surfactant such as carbobetaine, sulfobetaine or hydroxysulfobetaine.
- The content of surfactant and/or coagulant in the thermoplastic resin molded article is preferably in a range from 0.01 to 10 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.01 to 5 parts by mass, and most preferably from 0.01 to 2 parts by mass.
- The phosphorus based compound is a component to increase the adhesion of plating, and one or more of the followings may be used.
- Condensate phosphoric acid ester such as triphenyl phosphate, tricredil phosphate, trixylenyl phosphate, tris(isopropylphenyl)phosphate, tris(o- or p-phenylphenyl)phosphate, trinaphtyl phosphaate, credil diphenyl phosphate, xylenyl diphenyl phosphate, diphenyl(2-ethylhexyl)phosphate, di(isoproplylphenyl)phenyl phosphate, o-phenylpyhenyl dicresil phosphate, tris(2,6-dimethylphenyl)phosphate, tetraphenyl-m-phenylene diphosphate, tetraphenyl-p-phenylene diphosphate, phenyl resorcin-polyphosphate, bisphenol A-bis(diphenylphosphate), bisphenol A-polyphenyl phosphate or dipyrocatechol hypodiphosphate;
- Fatty acid-aromatic phosphoric acid ester including ortho-phorophoric acid ester such as diphenyl(2-ethylhexyl)phosphate, diphenyl-2-acryloyloxyethyl phosphate, diphenyl-2-methacryloyloxyethyl phosphate, diphenyl neopentyl phosphate, pentaerythritol diphenyldiphosphate or ethylpyrocatechol phosphate;
- Alkali metal salt such as melamine polyphosphate, tripolyphosphoric acid, pyrophoric acid, orthophosphoric acid or hexamethaphosphoric acid, phosphoric acid-based compound such as phytic acid, and alkali metal or alkanolamine salt thereof.
- Furthermore, as the phosphorus-based compound other than above, there are applicable phosphorus-based compounds which are used in known flame-retardant and antioxidant for resins.
- The content of the phosphorus-based compound in the thermoplastic resin molded article is preferably in a range from 0.1 to 30 parts by mass to 100 parts by mass of the thermoplastic resin, more preferably from 0.1 to 20 parts by mass, and most preferably from 0.1 to 10 parts by mass.
- The plated resin molded article prepared by applying the method of the present invention provides the adhesion between the thermoplastic resin molded article and the metallic plating layer, (JIS H8630) of preferably 10 kPa or more as the maximum value, more preferably 50 kPa or more as the maximum value, most preferably 100 kPa or more as the maximum value, and most preferably 150 kPa or more as the maximum value.
- The plated resin molded article obtained by the manufacturing method of the present invention can select the shape of the plated resin molded article, the kind of plating layer, the thickness of the plating layer, and the like depending on the uses, thus allowing applications in varieties of uses. In particular, the plated resin-molded article according to the present invention is suitable for the automobile parts such as bumpers, emblems, wheel caps, interior parts, and exterior parts.
- The adhering strength (the highest value) between the resin molded article and a metal plating layer was measured according to the adherence test method described in appendix 6 in JIS H8630 using the plated resin molded articles obtained in Examples and Comparative Examples.
- (Components in the Thermoplastic Resin Molded Article)
- A-1 Polyamide (polyamide 6, UBE nylon 6 1013B, water absorption 1.8%, manufactured by Ube Industries Ltd.)
- B-1 ABS resin (styrene 45% by mass, acrylonitrile 15% by mass, polybutadiene-based rubber 40% by mass, water absorption 0.2%)
- B-2 AS resin (styrene 75% by mass, acrylonitrile 25% by mass, water absorption 0.2%)
- B-3 Acid-modified ABS resin (styrene 42% by mass, acrylonitrile 16% by mass, rubber 40% by mass, methacrylic acid 2% by weight, water absorption 0.2%)
- The respective components given in Table 1 were blended in a V-shape tumbler, which were then melted and kneaded in a twin-screw extruder (TEX30, cylinder temperature 230° C., manufactured by The Japan Steel Works, Ltd.) to prepare pellets. The pellets were fed to an injection molding machine (cylinder temperature 240° C., mold temperature 60° C.) to form molded articles of 100×50×3 mm in size. The molded articles were treated as the test pieces for electroless plating in accordance with the following procedure, thus obtained the plated resin molded articles. The adhering strength of the plating layer on these plated resin molded articles is given in Table 1.
- (1) Degreasing Step
- The resin molded articles were immersed in a 50 g/L aqueous solution (a solution temperature of 40° C.) of ACECLEAN A-220 (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 5 minutes.
- (2) Etching Step
- The resin molded articles were immersed in an aqueous solution of 200 ml/L (2.3 N) of 35% by weight of hydrochloric acid (a solution temperature of 40° C.) for 5 minutes.
- (3) Catalyst Imparting Step
- The resin molded articles were immersed in a mix aqueous solution (a solution temperature of 25° C.) of 150 ml/L of 35% by weight of hydrochloric acid and 40 ml/L aqueous solution of Catalyst C (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 3 minutes.
- (4) Direct Plating Step
- The resin molded articles were immersed in a selector liquid having the following composition (at 45° C. and pH 12) for 3 minutes to form the electrically conductive layer on the surface of the resin molded article.
- Copper(II) sulfate 3 g/L
- Sodium hydroxide 30 g/L
- Glucose 10 g/L
- Hydantoin 10 g/L
- (5) Electroplate Step of Copper
- The resin molded articles were immersed in the plating bath having the following composition (a solution temperature of 25° C.), and electroplate was carried out for 120 minutes.
- (Composition of Plating Bath)
- Copper sulfate (CuSO4.5H2O): 200 g/L
- Sulfuric acid (98%): 50 g/L
- Chlorine ion (Cl−): 5 ml/L
- TOP LUCINA 2000 MU (manufactured by OKUNO Pharmaceuticals Co., Ltd.): 5 ml/L
-
TABLE 1 Examples 1 2 3 4 (A) A-1 60 60 40 40 (B) B-1 30 30 50 50 B-2 B-3 10 10 10 10 (C) C-1 10 10 Adhering 85 110 50 60 strength (kPa) (A)-(B): total 100% by mass (C): parts by mass to 100 parts by mass of the sum of (A) and (B) - The appearance of the molded articles in Example 1 to 4 is smooth and beautiful.
- With the same thermoplastic resin molded articles to those in Example 2, the following-given steps without containing the direct plating method were applied to prepare the plated resin molded articles. The maximum value of the adhering strength of the plated resin molded articles was 100 kPa, giving smooth and beautiful appearance. However, the manufacture consumed large man-hours compared with that in Example 2.
- (1) Degreasing Step
- The test piece was immersed in a 50 g/L aqueous solution (a solution temperature of 40° C.) of ACECLEAN A-220 (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 20 minutes.
- (2) Contact Treatments Step with an Acid
- The test piece was immersed in 100 mL 1.0 N hydrochloric acid (liquid temperature=40° C.) for 5 minutes.
- (3) Catalyst Imparting Step
- The test piece was immersed in a mix aqueous solution (a solution temperature of 25° C.) of 150 ml/L of 35% by weight of hydrochloric acid and 40 ml/L aqueous solution of Catalyst C (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 3 minutes.
- (4) The First Activation Step
- The test piece was immersed in 100 ml/L aqueous solution (a solution temperature of 40° C.) of 98% by weight of sulfuric acid for 3 minutes.
- (5) The Second Activation Step
- The test piece was immersed in 15 g/L aqueous solution (a solution temperature of 40° C.) of sodium hydroxide for 2 minutes.
- (6) Electroless Plating Step of Nickel
- The test piece was immersed in a mix aqueous solution (a solution temperature of 40° C.) of 150 ml/L of Chemical Nickel HR-TA (manufactured by OKUNO Pharmaceuticals Co., Ltd.) and 150 ml/L of Chemical Nickel HR-TB (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for 5 minutes.
- (7) Acid Activation Step
- The test piece was immersed in 100 g/L aqueous solution (a solution temperature of 25° C.) of TOP SAN (manufactured by OKUNO Pharmaceuticals Co., Ltd.) for one minute.
- (8) Electroplate Step of Copper
- The test piece was immersed in the plating bath same to that of Example 1 (a solution temperature of 25° C.), and electroplate was carried out for 120 minutes.
Claims (5)
1. A method for manufacturing a plated resin molded article, comprising the steps of: contact-treating a thermoplastic resin molded article with an acid or base being free from heavy metal; treating the contact-treated thermoplastic resin molded article with a catalyst-imparting liquid; forming an electrically conductive layer on the surface of the thermoplastic resin molded article by direct plating method; and applying electroplating to the electrically conductive layer; without any etching step by an acid, which contains heavy metal.
2. The method for manufacturing plated resin molded article according to claim 1 , wherein the direct plating method comprises the step of forming an electrically conductive layer on the surface of a thermoplastic resin molded article with a selector liquid which contains a metal compound, a reducing compound and a metal hydroxide.
3. The method for manufacturing plated resin molded article according to claim 1 , wherein the thermoplastic resin molded article comprises a polyamide.
4. The method for manufacturing plated resin molded article according to claim 1 , wherein the thermoplastic resin molded article further comprises a substance which has a solubility (23° C.) in water of 300 g/100 g or less.
5. The method for manufacturing plated resin molded article according to claim 1 , wherein the thermoplastic resin molded article comprises a polyamide, and further a substance which has a solubility (23° C.) in water of 300 g/100 g or less.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005-008607 | 2005-01-17 | ||
| JP2005008607 | 2005-01-17 | ||
| JP2006000673 | 2006-01-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20090120798A1 true US20090120798A1 (en) | 2009-05-14 |
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ID=40622681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/791,934 Abandoned US20090120798A1 (en) | 2005-01-17 | 2006-01-12 | Method For Manufacturing Plated Resin Molded Article |
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| Country | Link |
|---|---|
| US (1) | US20090120798A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9951433B2 (en) | 2014-01-27 | 2018-04-24 | Okuno Chemical Industries Co., Ltd. | Conductive film-forming bath |
| US10036097B2 (en) | 2012-12-21 | 2018-07-31 | Okuno Chemical Industries Co., Ltd. | Conductive coating film forming bath |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4315045A (en) * | 1978-12-19 | 1982-02-09 | Crown City Plating Co. | Conditioning of polyamides for electroless plating |
| US6099964A (en) * | 1997-02-06 | 2000-08-08 | Wacker-Chemie Gmbh | Metal deposits on mesoscopic organopolysiloxane particles |
| US6331239B1 (en) * | 1997-04-07 | 2001-12-18 | Okuno Chemical Industries Co., Ltd. | Method of electroplating non-conductive plastic molded products |
| US20030059621A1 (en) * | 2001-09-11 | 2003-03-27 | Toshihiro Tai | Plating resin molded article and process for producing the same |
-
2006
- 2006-01-12 US US11/791,934 patent/US20090120798A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4315045A (en) * | 1978-12-19 | 1982-02-09 | Crown City Plating Co. | Conditioning of polyamides for electroless plating |
| US6099964A (en) * | 1997-02-06 | 2000-08-08 | Wacker-Chemie Gmbh | Metal deposits on mesoscopic organopolysiloxane particles |
| US6331239B1 (en) * | 1997-04-07 | 2001-12-18 | Okuno Chemical Industries Co., Ltd. | Method of electroplating non-conductive plastic molded products |
| US20030059621A1 (en) * | 2001-09-11 | 2003-03-27 | Toshihiro Tai | Plating resin molded article and process for producing the same |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10036097B2 (en) | 2012-12-21 | 2018-07-31 | Okuno Chemical Industries Co., Ltd. | Conductive coating film forming bath |
| US9951433B2 (en) | 2014-01-27 | 2018-04-24 | Okuno Chemical Industries Co., Ltd. | Conductive film-forming bath |
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